CN1827524A - Electronic-grade dental gas purification process - Google Patents
Electronic-grade dental gas purification process Download PDFInfo
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- CN1827524A CN1827524A CN 200510033358 CN200510033358A CN1827524A CN 1827524 A CN1827524 A CN 1827524A CN 200510033358 CN200510033358 CN 200510033358 CN 200510033358 A CN200510033358 A CN 200510033358A CN 1827524 A CN1827524 A CN 1827524A
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- molecular sieve
- purification
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- laughing gas
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Abstract
The invention relates to a refinement process for electronic grade laughing gas. Its flow process is as follows: laughing gas of low purity-chemical purification-molecular sieve purification, heating-low temperature distillation for deeper purification-electronic grade laughing gas. The invention applies molecular sieve and low temperature distillation to remove impurity in laughing gas and produces raw laughing gas with wet-type heating method, so its safety coefficient is improved a lot, possesses the characteristic of unique craft, convenient operability and full localization of manufactures. Furthermore, it has the quality of advanced world level, replacing import goods and exporting abroad.
Description
Technical field
The present invention relates to a kind of electronic-grade dental gas purification process.
Background technology
Ultrapure extraordinary electronic gas: laughing gas is modern optical electronics, microelectronics, large-scale unicircuit, the important basic material in optical fiber manufacturing field, is called as " grain " or " source " of IT industry.Say there is not reliable ultrapure extraordinary electronic gas in a sense, photoelectron, microelectronics will be " cooking a meal without rice ".Empirical evidence, order of magnitude of the every raising of electronic gas purity, its derived product (IC) will have qualitative leap.
Along with the continuous development of China's electron trade, photoelectron, microelectronics to be had higher requirement, high-performance, multi-functional, large vol, microminiaturization and mass have become the inexorable trend of its development.Therefore, electronic gas has been proposed higher specification of quality, gas purity will reach 99.999%-99.9999%, and foreign matter content requires the ppm-ppb level, and dust particle 0.1 μ m is no more than 3/cubic metre.Its technical indicator is orientated mega bit order (ULSI) as, and technical characterictic shows as " ultrapure ", " ultra-clean ".
Yet present domestic electron trade is produced required laughing gas, all adopts the low-purity laughing gas to substitute, if from external import, needs the high expense of cost, and price is 600 yuan/kilogram at present.So, both have influence on the quality of domestic electronic product and the stability of production, had a strong impact on the overall development of domestic electron trade again.Because China's electron production producer quantity of operation at present constantly increases, every family all needs a large amount of electronic-grade dental gas, therefore carry out the research of semi-conductor with ultrapure electronic gas, passive situation that can fine solution dependence on import, satisfy China's IT industry to the base mateiral demand, and will produce huge social and economic benefit.
Summary of the invention
The objective of the invention is at the problems referred to above, a kind of electronic-grade dental gas purification process is provided, can effectively address the above problem.
Technical scheme of the present invention is as follows: electronic-grade dental gas purification process, and its flow process is as follows:
Low-purity laughing gas → chemical purification → molecular sieve purification, heating → low-temperature distillation degree of depth purifying → electronic-grade dental gas.
Above-mentioned chemical purification divides two-stage impurity to handle, and wherein first step impurity is handled and adopted 30%NaOH to handle, and second stage impurity is handled and adopted solid NaOH alkali sheet to handle.
Above-mentioned molecular sieve purification is divided three grades, and wherein first step molecular sieve purification adopts silica gel and gac to fill, and second stage molecular sieve purification adopts 13X molecular sieve filled, and third stage molecular sieve purification employing 3A molecular sieve and 5A are molecular sieve filled.
The present invention adopts molecular sieve and low-temperature distillation method to remove impurity and wet type heating method raw materials for production laughing gas in the laughing gas, the safety performance coefficient improves greatly, have the technology uniqueness, be convenient to operation, workable, realize characteristics such as production domesticization fully, and quality is reached advanced world standards, but the import substitution product, and export to foreign countries.
Description of drawings
Fig. 1 is the idiographic flow schematic diagram of the embodiment of the invention.
Now the invention will be further described in conjunction with the accompanying drawings and embodiments:
Embodiment
Select the low-purity laughing gas for use, its foreign matter content is: N
2: 1000～2000PPM; H
2O:300～3000PPM; CO
2: 50～500PPM.
Above-mentioned low-purity laughing gas is pressed the described flow processing of Fig. 1:
1, chemical purification--impurity handles 1
The container profile: external diameter 229MM, high 1100MM,
Pharmaceutical chemicals: 30%NaOH,
2, chemical purification--impurity handles 2
The container profile: external diameter 229MM, high 1100MM,
Pharmaceutical chemicals: solid NaOH alkali sheet
3, molecular sieve purification 1
The container profile: external diameter 2109MM, high 1500MM,
Heat with the 4000KW resistance wire outside
Pharmaceutical chemicals: 1 kilogram of Kiselgel A is respectively adorned at two ends, middle dress cocoanut active charcoal
Remarks: during work, normal temperature is work down, and when pressure-controlling was regenerated at 0.3～1MPA, temperature was controlled at 250 degrees centigrade, and drying nitrogen purged 4 hours, and back 180 degrees centigrade, naturally cooling
4, molecular sieve purification 2
Container profile: external diameter 210MM, high 2000MM
Heat with the 4500KW resistance wire outside
Weighting material: 13X molecular sieve
Remarks: during work, normal temperature is work down, and when pressure-controlling was regenerated at 0.3～1MPa., temperature was controlled at 380 degrees centigrade, and drying nitrogen purged 4 hours, and back 180 degrees centigrade, naturally cooling
5, molecular sieve purification 3
Container profile: external diameter 210MM, high 2000MM
Heat with the 4500KW resistance wire outside
Weighting material: upper end dress 3A molecular sieve, end dress 5A molecular sieve
Remarks: during work, normal temperature is work down, and pressure-controlling is at 0.3～1MPa.During regeneration, temperature is controlled at 380 degrees centigrade, and drying nitrogen purged 4 hours, and back 180 degrees centigrade, naturally cooling.
6, low-temperature distillation degree of depth purifying
Through above-mentioned 6 electronic-grade dental gas that step obtains, purity is 99.999%, foreign matter content (≤10
-6):
NH
3 5；
CO
2 2；
CO 1；
C1～C5 1；
NO 1。
Claims (5)
1. electronic-grade dental gas purification process, its flow process is as follows:
Low-purity laughing gas → chemical purification → molecular sieve purification, heating → low-temperature distillation degree of depth purifying → electronic-grade dental gas.
2. electronic-grade dental gas purification process according to claim 1, chemical purification wherein divide two-stage impurity to handle.
3. electronic-grade dental gas purification process according to claim 2, wherein first step impurity is handled and is adopted 30%NaOH to handle, and second stage impurity is handled and is adopted solid NaOH alkali sheet to handle.
4. electronic-grade dental gas purification process according to claim 1, molecular sieve purification wherein divide three grades.
5. electronic-grade dental gas purification process according to claim 4, wherein first step molecular sieve purification adopts silica gel and gac to fill, and second stage molecular sieve purification adopts 13X molecular sieve filled, and third stage molecular sieve purification employing 3A molecular sieve and 5A are molecular sieve filled.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200510033358 CN1827524A (en) | 2005-03-03 | 2005-03-03 | Electronic-grade dental gas purification process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200510033358 CN1827524A (en) | 2005-03-03 | 2005-03-03 | Electronic-grade dental gas purification process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1827524A true CN1827524A (en) | 2006-09-06 |
Family
ID=36946115
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200510033358 Pending CN1827524A (en) | 2005-03-03 | 2005-03-03 | Electronic-grade dental gas purification process |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1827524A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102046524A (en) * | 2008-04-02 | 2011-05-04 | 巴斯夫欧洲公司 | Process for purifying N2O |
| CN102872678A (en) * | 2012-09-24 | 2013-01-16 | 广西大学 | Method for purifying and recycling carbon dioxide generated through beer fermentation through variable voltage variable frequency adsorption |
| CN102910599A (en) * | 2012-10-16 | 2013-02-06 | 上海化工研究院 | Method for preparing stable isotope 15N marked nitrous oxide |
| CN103130203A (en) * | 2011-11-29 | 2013-06-05 | 岳阳昌德化工实业有限公司 | Preparation method of nitrous oxide |
| CN104140085A (en) * | 2014-07-28 | 2014-11-12 | 中昊光明化工研究设计院有限公司 | Device and method for deep removing water and carbon dioxide in nitrous oxide |
| CN105110304A (en) * | 2015-09-01 | 2015-12-02 | 上海交通大学 | Device and method for preparing high-purity nitrogen monoxide from adipic acid production tail gases |
| CN105271144A (en) * | 2015-10-10 | 2016-01-27 | 山东金博环保科技有限公司 | Device and method for extraction and refinement of N2O from petrochemical industrial tail gas |
-
2005
- 2005-03-03 CN CN 200510033358 patent/CN1827524A/en active Pending
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102046524A (en) * | 2008-04-02 | 2011-05-04 | 巴斯夫欧洲公司 | Process for purifying N2O |
| CN102046524B (en) * | 2008-04-02 | 2013-07-03 | 巴斯夫欧洲公司 | Process for purifying N2O |
| CN103130203A (en) * | 2011-11-29 | 2013-06-05 | 岳阳昌德化工实业有限公司 | Preparation method of nitrous oxide |
| CN103130203B (en) * | 2011-11-29 | 2014-08-20 | 岳阳昌德化工实业有限公司 | Preparation method of nitrous oxide |
| CN102872678A (en) * | 2012-09-24 | 2013-01-16 | 广西大学 | Method for purifying and recycling carbon dioxide generated through beer fermentation through variable voltage variable frequency adsorption |
| CN102872678B (en) * | 2012-09-24 | 2014-12-03 | 广西大学 | Method for purifying and recycling carbon dioxide generated through beer fermentation through variable voltage variable frequency adsorption |
| CN102910599A (en) * | 2012-10-16 | 2013-02-06 | 上海化工研究院 | Method for preparing stable isotope 15N marked nitrous oxide |
| CN102910599B (en) * | 2012-10-16 | 2015-12-16 | 上海化工研究院 | A kind of stable isotope 15n marks the preparation method of Nitrous Oxide |
| CN104140085A (en) * | 2014-07-28 | 2014-11-12 | 中昊光明化工研究设计院有限公司 | Device and method for deep removing water and carbon dioxide in nitrous oxide |
| CN104140085B (en) * | 2014-07-28 | 2016-06-22 | 中昊光明化工研究设计院有限公司 | The apparatus and method of water and carbon dioxide in a kind of deep removal nitrous oxide |
| CN105110304A (en) * | 2015-09-01 | 2015-12-02 | 上海交通大学 | Device and method for preparing high-purity nitrogen monoxide from adipic acid production tail gases |
| CN105271144A (en) * | 2015-10-10 | 2016-01-27 | 山东金博环保科技有限公司 | Device and method for extraction and refinement of N2O from petrochemical industrial tail gas |
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