CN1789190A - Dielectric materials for plasma display panel - Google Patents
Dielectric materials for plasma display panel Download PDFInfo
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- CN1789190A CN1789190A CN 200510134333 CN200510134333A CN1789190A CN 1789190 A CN1789190 A CN 1789190A CN 200510134333 CN200510134333 CN 200510134333 CN 200510134333 A CN200510134333 A CN 200510134333A CN 1789190 A CN1789190 A CN 1789190A
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Abstract
The invention provides a dielectric material for a plasma display panel. The invention is characterized in that the dielectric material is composed of Nb2O5+La2O3+WO3 glass powder which takes 1 to 30 percent of the mass of ZnO-B2O3-K2O non-lead glass.
Description
Technical field
The present invention relates to dielectric material for plasma display plate, particularly be used for forming on the glass substrate in front the dielectric substance of transparency dielectric layer.
Background technology
Plasma display is a kind of self luminous flat display, has excellent characteristics such as light and slim, wide viewing angle, and owing to can make big picture, is a kind of noticeable very promising display unit.
On the front glass substrate of plasma display panel, form the plasma discharge scan electrode that constitutes by Ag or Cr-Cu-Cr, formation in the above is used for keeping the transparency dielectric layer of about 30～40 μ m of discharge.
In general, front glass substrate or back side glass substrate for plasma display panel, use soda-lime glass or high deformation point glass, when on glass substrate, forming dielectric layer, in order to prevent the glass substrate distortion, the reaction of inhibition and electrode has been adopted and carried out the agglomerating method under the temperature range about 500～600 ℃.Therefore, for dielectric substance, require to adapt, and can under 500～600 ℃, carry out sintering with the thermal expansivity of glass substrate.
In addition, dielectric layer is owing to be necessary to have high withstand voltage, and has high transparent, so for dielectric substance, require to remove easily bubble when sintering, for example can not become big bubble having under the residual situation of bubble.
As the material of being satisfied with the above-mentioned requirements characteristic, utilize as opening disclosed PbO-B in the flat 11-11979 communique the spy
2O
3-SiO
2The dielectric substance of the lead glass powder of class is employed, but in recent years along with the raising of environmental requirement and the minimizing of carrying capacity of environment material are used, utilizes as the spy and open the ZnO-B as shown in the 2000-313635 communique
2O
3-K
2The dielectric substance of the non-lead glass powder of O class also is employed.
Summary of the invention
But the specific inductivity of opening disclosed plumbous class glass in the flat 11-11979 communique the spy is 9～12, in contrast, opens disclosed ZnO-B in the 2000-313635 communique the spy
2O
3-K
2The specific inductivity of the non-lead glass of O class is reduced to below 7, therefore, utilizes in the dielectric layer that above-mentioned non-lead glass makes, and the discharge characteristic that is used for mirroring image also descends.In order obtaining and the same discharging efficiency of dielectric layer that constitutes by plumbous class glass powder, just to be necessary the thickness of attenuate dielectric layer, but when the thickness of attenuate dielectric layer, just to be difficult to guarantee insulativity.Therefore, can not under similarity condition, use non-plumbous class glass and plumbous class glass just to become problem.
The purpose of this invention is to provide a kind of dielectric material for plasma display plate, even this dielectric substance uses non-plumbous class glass powder, its specific inductivity height, and has a thermal expansivity that adapts with glass substrate, can under the temperature below 600 ℃, carry out sintering, form the excellent dielectric layer of the transparency.
The inventor etc. have carried out all experiments, even found that by ZnO-B
2O
3-K
2The dielectric substance that the non-lead glass powder of O class constitutes is adding Nb
2O
5, La
2O
3And WO
3During any composition, just can improve specific inductivity, thereby propose the present invention.
That is, dielectric material for plasma display plate of the present invention is characterised in that, by at ZnO-B
2O
3-K
2The Nb that contains 1～30 quality % in the non-lead glass of O class
2O
5+ La
2O
3+ WO
3Glass powder constitute.
Dielectric material for plasma display plate of the present invention, its specific inductivity height, and have the thermal expansivity that adapts with glass substrate, and can under the temperature below 600 ℃, carry out sintering, can obtain the excellent dielectric substance of the transparency.Therefore be suitable as dielectric material for plasma display plate.
Embodiment
Dielectric material for plasma display plate of the present invention is with ZnO-B
2O
3-K
2The non-lead glass of O class is as essentially consist.This type of glass has can suppress and electrode composition Ag or Cu reaction the characteristic of inhibition glass coloring.Have again, in this type of glass, add Nb
2O
5, La
2O
3And WO
3In any composition.So, even the dielectric substance that is made of non-plumbous class glass powder also can access specific inductivity height, dielectric layer that the transparency is excellent.
Under 25 ℃, 1MHz, specific inductivity is adjusted to more than 8.0, and is preferred especially more than 8.2.When specific inductivity less than 8.0 the time, for guaranteeing discharge characteristic, thickness that must the attenuate dielectric layer makes to be difficult to guarantee insulativity.Therefore, be difficult to the same condition of the plumbous class glass powder that always uses under use.
In order to make specific inductivity is more than 8.0, at ZnO-B
2O
3-K
2Must add up to the Nb that contains more than 1% in the O class glass
2O
5, La
2O
3And WO
3But when its content surpassed 30%, glass generation crystallization was difficult to obtain transparent sintered membrane, and the softening temperature of glass improves, and is difficult in and carries out sintering under the temperature below 600 ℃, so not preferred.Preferred range is 2～25%, is more preferably 3～20%.
When using above-mentioned ZnO-B
2O
3-K
2During O class glass, in order under the temperature below 600 ℃, to carry out sintering, B
2O
3The value of/ZnO is preferably in 0.415～0.680 scope.Work as B
2O
3The value of/ZnO had and separates out the crystalline tendency easily less than 0.415 o'clock, was difficult to obtain transparent sintered membrane.In addition, when this value greater than 0.680 the time, the tendency of the softening temperature of rising glass is arranged, be difficult under the temperature below 600 ℃, carry out sintering.More preferably 0.420～0.675, particularly preferably in 0.450～0.675.
The ZnO-B of Shi Yonging in the present invention
2O
3-K
2O class glass powder, as long as the transparency is excellent, has the thermal expansivity that adapts with glass substrate, in the sintering below 600 ℃, demonstrate good flowability just without limits, but preferred especially the use do not contain PbO in fact, is 20～50% ZnO, 10～40% B in Quality Percentage and contain
2O
3, 2～20% K
2O, 0～10% Li
2O+Na
2O, 0～20% SiO
2, 0～5% Al
2O
3, 0～20% CaO+SrO+BaO and 1～30% Nb
2O
5+ La
2O
3+ WO
3Glass.
The reason that in the present invention composition of glass is limited to as above scope is as follows.
ZnO is the main component that constitutes glass, still reduces the composition of softening temperature.Its content is 20～50%, is preferably 25～47%.When the content of ZnO very little the time, be difficult to obtain above-mentioned effect.In addition, when content is excessive, the tendency that makes the glass crystallization is easily arranged, be difficult to obtain transparent sintered membrane.
B
2O
3Form the skeleton of glass, still enlarge the composition of vitrifying scope simultaneously, its content is 10～40%, is preferably 15～35%.Work as B
2O
3Content very little the time, glass has the tendency of easy crystallization, is difficult to obtain transparent sintered membrane.In addition, when too high levels, the tendency that improves glass softening point is arranged, be difficult under the temperature below 600 ℃, carry out sintering.Thermal expansivity has the tendency greater than glass substrate, is difficult to match with the thermal expansivity of glass substrate.
In order to obtain transparency excellence and can under the temperature below 600 ℃, to carry out agglomerating dielectric layer, B
2O
3The value of/ZnO is 0.415～0.680 in the scope of (more preferably 0.420～0.675, be preferably 0.450～0.675 especially).When being worth less than this, have and separate out the crystalline tendency easily, be difficult to obtain transparent sintered membrane.And be worth when excessive when this, the tendency that has the softening temperature that makes glass to raise is difficult to carry out sintering under the temperature below 600 ℃.
K
2O has the effect that the softening temperature that makes glass reduces, regulates thermal expansivity, also is to suppress to react and the composition of flavescence with electrode composition Ag or Cu, and its content is 2～20%, is preferably 3～15%.Work as K
2The content of O is difficult to obtain above-mentioned effect very little the time.And when its too high levels, thermal expansivity has the tendency greater than glass substrate, is difficult to match with the thermal expansivity of glass substrate.
Li
2O and Na
2O etc. are used to that the glass eutectic is revealed, adjust thermal expansivity and the composition that adds, and these become subtotaling amounts is 0～10%, and preferred 0～5%.The total quantitative change of these compositions for a long time, even use K
2O also is difficult to prevent to react and flavescence with electrode.In addition, have and separate out the crystalline tendency easily, be difficult to obtain transparent sintered membrane.
Also have, use Li
2O and Na
2Under the situation of O etc.,, be (Li preferably with molar ratio computing in order to prevent with electrode reaction flavescence or to separate out crystallization
2O+Na
2O)/K
2O≤1.
SiO
2Be the composition that forms the glass skeleton, its content is 0～20%, is preferably 3～15%.Work as SiO
2Content when too much, the tendency of the softening temperature of rising glass is arranged, be difficult under the temperature below 600 ℃, carry out sintering.
Al
2O
3In the branch phasic property that suppresses glass, still improve the composition of weathering resistance, its content is 0～5%, is preferably 0～3%.Work as Al
2O
3Content when too much, the tendency of the softening temperature of rising glass is arranged, be difficult under the temperature below 600 ℃, carry out sintering.
CaO, SrO and BaO are the softening temperatures that is used for reducing glass, adjust thermal expansivity and the composition that adds, and the total amount of these compositions is 0～20%, is preferably 0～16%.When the content of these compositions was too much, thermal expansivity had the tendency greater than glass substrate, was difficult to match with the thermal expansivity of glass substrate.
Nb
2O
5, La
2O
3And WO
3Be the composition that improves the glass specific inductivity, the total amount of these compositions is 1～30%, is preferably 2～25%, more preferably 3～20%.When the total amount of these compositions less than 1% the time, be difficult to obtain above-mentioned effect.And when the total amount of these compositions greater than 30% the time, glass can not obtain transparent sintered membrane by crystallization, the softening temperature of glass raises, and can not carry out sintering under the temperature below 600 ℃.
Because La
2O
3And WO
3The composition that thermal expansivity is increased, under the not too big situation of thermal expansivity, be with Nb
2O
5Assign to use preferred as required La as essential one-tenth
2O
3And WO
3And use.The preferred Nb of the content of various compositions in the case
2O
5Be 1～25%, La
2O
3Be 0～15%, WO
3Be 0～15%.
Because Nb
2O
5And WO
3Cost of material apparently higher than other composition, suppressing under the situation that cost raises, be with La
2O
3As essential composition, and add Nb as required
2O
5And WO
3, preferably with BaO and usefulness.In the case, the preferred La of the content of various compositions
2O
3Be 1～25%, Nb
2O
5Be 0～15%, WO
3Be 0～15%, BaO is 0～18%.
Except mentioned component, in the scope of the harmless characteristic that requires, can also add various compositions.For example in order to reduce the softening temperature of glass, can add until the total amount is 10% Cs
2O or Rb
2O etc. react and flavescence with Ag or Cu for further inhibition, and can add until the total amount is 10% CuO, Bi
2O
3, Sb
2O
3, CeO
2, MnO etc., in order to make stabilizationization, improve its water tolerance and resistance to chemical reagents etc., can add until the total amount is 10% TiO
2, ZrO
2, SnO
2, Ta
2O
5, P
2O
5Deng.
In dielectric material for plasma display plate of the present invention, the median size D of the granularity of the preferred glass powder that uses
50Below 3.0 μ m, maximum particle diameter D
MaxBelow 20 μ m.Because prescribe a time limit when any surpasses on it, easy residual big bubble in sintered membrane.
Dielectric material for plasma display plate of the present invention, can be as the transparent dielectric that uses on the plate in front, perhaps also can be as the addressing dielectric medium (address dielectric substance) that uses on the plate overleaf, can certainly be used in the purposes beyond these.Under situation about using as addressing dielectric medium (address dielectric substance), in order to regulate later intensity of sintering or outward appearance, can contain ceramic powder such as aluminum oxide in 45 quality % scopes, zircon, zirconium white, mullite, silicon-dioxide, titanium oxide, stannic oxide.
The following describes the using method of dielectric material for plasma display plate of the present invention.Material of the present invention can use with the form of for example mashed prod and tellite etc.
Under situation about using with the form of mashed prod, aforesaid glass powder uses with thermoplastic resin, softening agent, solvent etc.Glass powder accounts for the ratio of mashed prod integral body, generally about 30～90 quality %.Also can use ceramic powder as required.
Thermoplastic resin is to be used for improving dried film toughness, and gives the composition of flexibility, and its content is generally about 0.1～20 quality %.As thermoplastic resin, can use poly-n-butyl methacrylate, polyvinyl butyral, polymethylmethacrylate, polyethyl methacrylate, ethyl cellulose etc., they can be used alone or as a mixture.
Softening agent is to be used for controlling rate of drying, gives the composition of desciccator diaphragm flexibility simultaneously, and its content is generally about 0～10 quality %.As softening agent, can use butyl benzyl phthalate, dioctyl phthalate (DOP), dimixo-octyl phthalate, didecyl phthalate, dibutyl phthalate etc., they can be used alone or as a mixture.
Solvent is the material that is used for making the material gelatinization, and its content is generally about 10～30 quality %.Can be used alone or as a mixture for example terpinol, diethyl glycol monobutyl ether acetic ester, 2,2,4-trimethylammonium-1,3-pentanediol mono isobutyrate etc. as solvent.
The manufacturing of mashed prod can be by preparing glass powder, ceramic powder, thermoplastic resin, softening agent, solvent etc., and with predetermined ratio with its mixing carrying out.
When using such mashed prod to form dielectric layer, at first use silk screen print method or the such mashed prod of step coating method coating, after the coating layer that forms predetermined thickness, carry out drying.Sintering just can access predetermined dielectric layer then.
Use under the situation of material of the present invention in form, use thermoplastic resin, softening agent etc. with above-mentioned glass powder with tellite.Also can add ceramic powder as required.
The shared ratio of glass powder in tellite is generally about 60～80 quality %.
As thermoplastic resin and softening agent, the thermoplastic resin similarly and the softening agent that use in the time of can using with above-mentioned preparation mashed prod, the blending ratio of thermoplastic resin is generally about 5～30 quality %, the blending ratio of softening agent is generally about 0～10 quality %.
As the general method of making tellite, prepare above-mentioned glass powder, ceramic powder, thermoplastic resin, softening agent etc., add main solvents such as toluene in these, solubility promoters such as Virahol are made slurries, and these slurries are configured as sheet by scraping the skill in using a kitchen knife in cookery on polyethylene terephthalate films such as (PET).After the shaping sheet, remove solute and solvent through super-dry, just can make tellite.
With the tellite that as above obtains, on the position that should form glass coating, carry out hot pressing and form coating layer, carry out sintering equally with the situation of above-mentioned mashed prod then, obtain dielectric layer.
In the above description, as dielectric formation method, be illustrated as example with the method for using mashed prod or tellite, but dielectric material for plasma display plate of the present invention not only is defined in such method, and other formation methods such as photosensitivity mashed prod method, photosensitive printing circuit substrate also are suitable for obtaining these materials.
(embodiment)
Describe dielectric material for plasma display plate of the present invention in detail based on embodiment below.
Table 1～6 expression embodiments of the invention (sample No.1～19) and comparative examples (sample No.20～22).And sample No.22 represents the currently available products that is made of plumbous class glass.
Table 1
| No.1 | No.2 | No.3 | No.4 | |
| Glass is formed (quality %) ZnO B 2O 3 K 2O Li 2O Na 2O SiO 2 Al 2O 3 CaO SrO BaO ZrO 2 Nb 2O 5 La 2O 3 WO 3 | 43.0 28.0 9.0 - - 8.0 1.0 - - - - 10.0 1.0 - | 44.0 28.0 9.0 - - 8.0 1.0 - - - - 6.0 - 4.0 | 43.0 28.0 8.0 - - 7.0 1.0 - - - - 13.0 - - | 44.0 27.0 13.0 - - 7.0 - 1.0 - - - 8.0 - - |
| B 2O 3/ ZnO (mass ratio) | 0.651 | 0.636 | 0.651 | 0.614 |
| (Li 2O+Na 2O)/K 2O (mol ratio) | - | - | - | - |
| Specific inductivity | 8.4 | 8.4 | 8.7 | 8.4 |
| Thermal expansivity (* 10 -7/℃) | 67 | 69 | 65 | 78 |
| Softening temperature (℃) | 603 | 598 | 601 | 577 |
| Sintering temperature (℃) | 600 | 600 | 600 | 580 |
| Glass has non-coloring | ◎ | ◎ | ◎ | ◎ |
| Have or not crystallization to separate out | ◎ | ◎ | ◎ | ◎ |
Table 2
| No.5 | No.6 | No.7 | No.8 | |
| Glass is formed (quality %) ZnO B 2O 3 K 2O Li 2O Na 2O SiO 2 Al 2O 3 CaO SrO BaO ZrO 2 Nb 2O 5 La 2O 3 WO 3 | 44.0 25.0 12.0 - - 6.0 1.0 - - - - 12.0 - - | 40.0 25.0 11.0 - - 7.0 - - 1.0 1.0 - 15.0 - - | 44.0 28.0 9.0 - - 8.0 1.0 - - - - 6.0 2.0 2.0 | 43.0 28.0 7.0 1.0 1.0 8.0 1.0 - - - - 10.0 1.0 - |
| B 2O 3/ ZnO (mass ratio) | 0.568 | 0.625 | 0.636 | 0.651 |
| (Li 2O+Na 2O)/K 2O (mol ratio) | - | - | - | 0.67 |
| Specific inductivity | 8.9 | 8.4 | 8.4 | 8.4 |
| Thermal expansivity (* 10 -7/℃) | 79 | 78 | 69 | 67 |
| Softening temperature (℃) | 580 | 585 | 598 | 603 |
| Sintering temperature (℃) | 580 | 580 | 600 | 600 |
| Glass has non-coloring | ◎ | ◎ | ◎ | ◎ |
| Have or not crystallization to separate out | ◎ | ◎ | ◎ | ◎ |
Table 3
| No.9 | No.10 | No.11 | No.12 | |
| Glass is formed (quality %) ZnO B 2O 3 K 2O Li 2O Na 2O SiO 2 Al 2O 3 CaO SrO BaO ZrO 2 Nb 2O 5 La 2O 3 WO 3 | 43.0 28.0 6.5 2.0 0.5 8.0 1.0 - - - - 10.0 1.0 - | 46.5 20.5 11.0 - - 6.0 1.0 - - - - 15.0 - - | 41.0 30.0 8.0 - - 8.0 1.0 - - - - 13.0 - - | 39.0 19.0 5.0 - 3.0 10.0 - - - 12.0 1.0 - 11.0 - |
| B 2O 3/ ZnO (mass ratio) | 0.651 | 0.441 | 0.732 | 0.487 |
| (Li 2O+Na 2O)/K 2O (mol ratio) | 1.09 | - | - | 0.91 |
| Specific inductivity | 8.4 | 9.1 | 8.7 | 9.5 |
| Thermal expansivity (* 10 -7/℃) | 67 | 75 | 68 | 84 |
| Softening temperature (℃) | 603 | 590 | 605 | 590 |
| Sintering temperature (℃) | 600 | 590 | 600 | 590 |
| Glass has non-coloring | ○ | ◎ | ◎ | ◎ |
| Have or not crystallization to separate out | ○ | ○ | ◎ | ◎ |
Table 4
| No.13 | No.14 | No.15 | No.16 | |
| Glass is formed (quality %) ZnO B 2O 3 K 2O Li 2O Na 2O SiO 2 Al 2O 3 CaO SrO BaO ZrO 2 Nb 2O 5 La 2O 3 WO 3 | 45.0 21.0 5.0 - 3.0 10.0 - - - 13.0 - - 3.0 - | 43.5 20.5 4.0 - 1.5 10.0 - - - 12.5 - - 8.0 - | 41.0 24.0 4.0 - 1.5 9.0 - - - 12.5 - - 8.0 - | 41.5 18.0 5.5 - 3.0 9.0 - - - 10.5 - - 12.5 - |
| B 2O 3/ ZnO (mass ratio) | 0.466 | 0.471 | 0.585 | 0.434 |
| (Li 2O+Na 2O)/K 2O (mol ratio) | 0.91 | 0.57 | 0.57 | 0.91 |
| Specific inductivity | 8.9 | 9.8 | 9.7 | 9.4 |
| Thermal expansivity (* 10 -7/℃) | 80 | 74 | 73 | 84 |
| Softening temperature (℃) | 580 | 590 | 590 | 580 |
| Sintering temperature (℃) | 580 | 590 | 590 | 580 |
| Glass has non-coloring | ◎ | ◎ | ◎ | ◎ |
| Have or not crystallization to separate out | ◎ | ◎ | ◎ | ◎ |
Table 5
| No.17 | No.18 | No.19 | No.20 | |
| Glass is formed (quality %) ZnO B 2O 3 K 2O Li 2O Na 2O SiO 2 Al 2O 3 CaO SrO BaO ZrO 2 Nb 2O 5 La 2O 3 WO 3 | 46.0 20.5 4.0 - 2.5 10.0 - - - 14.0 1.5 - 1.5 - | 43.5 18.5 3.0 - 1.5 10.5 - - - 12.5 3.0 - 7.5 - | 42.5 18.5 3.0 0.5 2.0 10.5 - - - 10.5 - - 12.5 - | 40.0 22.0 6.0 - - - - - - - - 25.0 3.5 3.5 |
| B 2O 3/ ZnO (mass ratio) | 0.446 | 0.425 | 0.435 | 0.550 |
| (Li 2O+Na 2O)/K 2O (mol ratio) | 0.95 | 0.76 | 1.53 | - |
| Specific inductivity | 9.0 | 9.7 | 9.0 | 9.8 |
| Thermal expansivity (* 10 -7/℃) | 75 | 75 | 82 | 64 |
| Softening temperature (℃) | 585 | 600 | 580 | 650 |
| Sintering temperature (℃) | 585 | 600 | 580 | - |
| Glass has non-coloring | ◎ | ◎ | ○ | × |
| Have or not crystallization to separate out | ◎ | ◎ | ◎ | × |
Table 6
| No.21 | No.22 | |
| Glass is formed (quality %) ZnO B 2O 3 K 2O Li 2O Na 2O SiO 2 Al 2O 3 CaO SrO BaO ZrO 2 Nb 2O 5 La 2O 3 WO 3 PbO | 35.0 39.0 15.0 - - 10.0 1.0 - - - - - - - - | - 10.0 - - - 25.0 - - - - - - - - 65.0 |
| B 2O 3/ ZnO (mass ratio) | 0.897 | - |
| (Li 2O+Na 2O)/K 2O (mol ratio) | - | - |
| Specific inductivity | 6.8 | 10.4 |
| Thermal expansivity (* 10 -7/℃) | 64 | 78 |
| Softening temperature (℃) | 620 | 560 |
| Sintering temperature (℃) | 610 | 560 |
| Glass has non-coloring | ◎ | ◎ |
| Have or not crystallization to separate out | ◎ | ◎ |
Each sample in the table, preparation as follows.
At first form the various raw materials of preparation, with its uniform mixing according to the glass shown in the table in quality %.Then it is added in the platinum crucible and after 2 hours, form laminal melten glass 1300 ℃ of following fusions.Then it can be pulverized in the pulverizer at fluid, obtain by median size D by air classification
50Below 3.0 μ m, maximum particle diameter D
MaxThe sample that glass powder below 20 μ m is formed.The glass powder that so obtains is carried out the evaluation that specific inductivity, thermal expansivity, softening temperature, glass have non-coloring and have or not crystallization to separate out.
By the table in as can be seen, as sample No.1～19 of embodiment, specific inductivity is up to more than 8.4, thermal expansivity is 65～84 * 10
-7/ ℃, match with glass substrate.Softening temperature can carry out sintering below 605 ℃ under the temperature below 600 ℃.Glass is painted does not hardly separate out crystallization yet, obtains transparent sintered membrane.
In contrast, sample No.20 as a comparative example, its specific inductivity are also up to 9.8, and softening temperature, is separated out crystallization and made it become oyster white even carry out sintering under near the temperature the softening temperature up to 650 ℃ in the glass, do not obtain transparent sintered membrane.And the specific inductivity of sample No.21 is low to moderate 6.8.
For specific inductivity, be that each sample is carried out the moulding of powder mould, after the sintering, attrition process becomes the tabular body of 2mm, measures according to the method for JIS C2141, obtains the value under 25 ℃ and 1MHz.
For thermal expansivity, be that each sample is carried out the moulding of powder mould, after the sintering, attrition process becomes diameter 4mm, and long 40mm's is cylindric, measures according to the method for JIS R3102, obtains the value in 30～300 ℃ of temperature ranges.
For the softening temperature of glass, be to use miniature differential thermal analyzer to measure, with the value of the 4th flex point as softening temperature.
For sintering temperature, measure as follows.At first, each sample is mixed the mixing mashed prod that becomes in three roller mixing rolls with 5% terpinol solution of ethyl cellulose.Then by silk screen print method, this mashed prod is coated on the glass substrate and dry, keep carrying out sintering in 10 minutes after sending in the electric furnace, obtain the sintered membrane of about 30 μ m.On the sintered membrane that so obtains, be coated with oil-based ink, use the ethanol wiping then, with do not catch printing ink can fine wiping the temperature in following time as sintering temperature.
Non-coloring is arranged and have or not crystallization to separate out for glass, with the mashed prod for preparing as mentioned above, be coated on the soda-lime glass substrate that has formed the Ag electrode with silk screen print method,, keep obtaining in 10 minutes the sintered membrane of about 30 μ m under the sintering temperature in table in drying and after putting into electric furnace.For the sintered membrane that so obtains, the evaluation that part around the visual observation electrode or sintered membrane integral body have non-coloring has or not crystallization to separate out with the optics microscopic evaluation then.On observed sintered membrane, do not have painted fully or crystallization is separated out, in table, be designated as " ◎ ", can recognize a small amount of painted or crystallization and separate out, be designated as " zero ", separate out, be designated as " * " and recognize significantly painted or crystallization.
Claims (5)
1. dielectric material for plasma display plate is characterized in that:
By at ZnO-B
2O
3-K
2The Nb that contains 1～30 quality % in the non-lead glass of O class
2O
5+ La
2O
3+ WO
3Glass powder constitute.
2. the dielectric material for plasma display plate described in claim 1 is characterized in that: the B of non-lead glass
2O
3The value of/ZnO is 0.415～0.680 with mass ratio.
3. the dielectric material for plasma display plate described in claim 1 or 2, it is characterized in that: it is 20～50% ZnO, 10～40% B in Quality Percentage that non-lead glass contains
2O
3, 2～20% K
2O, 0～10% Li
2O+Na
2O, 0～20% SiO
2, 0～5% Al
2O
3, 0～20% CaO+SrO+BaO and 1～30% Nb
2O
5+ La
2O
3+ WO
3
4. as each described dielectric material for plasma display plate in the claim 1～3, it is characterized in that: the specific inductivity under 25 ℃, 1MHz is more than 8.0.
5. as each described dielectric material for plasma display plate in the claim 1～4, it is characterized in that: the median size D of the granularity of glass powder
50Below 3.0 μ m, maximum particle diameter D
MaxBelow 20 μ m.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004361224 | 2004-12-14 | ||
| JP2004361224 | 2004-12-14 | ||
| JP2005261043 | 2005-09-08 |
Publications (1)
| Publication Number | Publication Date |
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| CN1789190A true CN1789190A (en) | 2006-06-21 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200510134333 Pending CN1789190A (en) | 2004-12-14 | 2005-12-14 | Dielectric materials for plasma display panel |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7956541B2 (en) | 2007-08-06 | 2011-06-07 | Panasonic Corporation | Plasma display panel having front panel with bismuth trioxide-containing dielectric layer |
| US8013531B2 (en) | 2007-11-21 | 2011-09-06 | Panasonic Corporation | Plasma display panel having a plurality of layers containing calcium oxide and barium oxide |
| CN103319096A (en) * | 2013-06-21 | 2013-09-25 | 四川虹欧显示器件有限公司 | Novel dielectric layer material for plasma display panel and application of novel dielectric layer material |
| CN109264988A (en) * | 2018-11-19 | 2019-01-25 | 中国建筑材料科学研究总院有限公司 | Glass composition, the glass slurry containing the glass composition, vacuum glass and resistance unit and preparation method containing the glass composition |
-
2005
- 2005-12-14 CN CN 200510134333 patent/CN1789190A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7956541B2 (en) | 2007-08-06 | 2011-06-07 | Panasonic Corporation | Plasma display panel having front panel with bismuth trioxide-containing dielectric layer |
| US7965041B2 (en) | 2007-08-06 | 2011-06-21 | Panasonic Corporation | Plasma display panel |
| US8013531B2 (en) | 2007-11-21 | 2011-09-06 | Panasonic Corporation | Plasma display panel having a plurality of layers containing calcium oxide and barium oxide |
| CN103319096A (en) * | 2013-06-21 | 2013-09-25 | 四川虹欧显示器件有限公司 | Novel dielectric layer material for plasma display panel and application of novel dielectric layer material |
| CN109264988A (en) * | 2018-11-19 | 2019-01-25 | 中国建筑材料科学研究总院有限公司 | Glass composition, the glass slurry containing the glass composition, vacuum glass and resistance unit and preparation method containing the glass composition |
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Open date: 20060621 |