CN1766712A - Integrated micro-optical backlight lighting system apparatus and making method thereof - Google Patents
Integrated micro-optical backlight lighting system apparatus and making method thereof Download PDFInfo
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- CN1766712A CN1766712A CN 200410052001 CN200410052001A CN1766712A CN 1766712 A CN1766712 A CN 1766712A CN 200410052001 CN200410052001 CN 200410052001 CN 200410052001 A CN200410052001 A CN 200410052001A CN 1766712 A CN1766712 A CN 1766712A
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- 230000003287 optical effect Effects 0.000 claims description 51
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- 238000005530 etching Methods 0.000 claims description 9
- 238000009826 distribution Methods 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 238000000992 sputter etching Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 238000005516 engineering process Methods 0.000 abstract description 6
- 230000010485 coping Effects 0.000 abstract 1
- 230000010354 integration Effects 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 230000001795 light effect Effects 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
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Abstract
The invention discloses an integration micro optics negative phototropic illuminating system and it's preparing method. It at least comprises a light source, a lamp cover, a light guiding plate and a reflecting plate, wherein the light guiding plate at least comprises an incidence side, an exit side and a bottom side with scattering points. The exit side of the light guiding plate has micro optics array structure. The method for preparing comprises: 1) using the optics software to design the geometry array structure of the light guiding plate; 2) using binary optics and micro optics technology to design the micro optics array structure of the exit side of the light guiding plate; 3) coping with large block offer by the prepared mould; 4) arranging the light source, the lamp cover and the reflecting plate.
Description
Technical field
The present invention relates to a kind of integrated micro and learn backlight illuminating system device and preparation method thereof, relate in particular to a kind of integrated micro of binary optical and micro-optic technical design that utilizes and learn backlight illuminating system device and preparation method thereof.
Background technology
Because advantages such as the liquid crystal indicator tool is light, thin, power consumption is little are widely used in modernized information equipments such as notebook, mobile phone, personal digital assistant.Because liquid crystal itself is not had a characteristics of luminescence, being required to be it provides light-source system to realize Presentation Function.
Existing light-source system comprises light source and light guide plate, the incidence surface setting of the relative light guide plate of light source, and the transmission direction of the light beam that this light-guide plate guides is sent from light source converts line source or pointolite to the area source outgoing.
A plurality of sites that distribute, the bottom surface of this light guide plate in order to the total reflection condition of broken beam in the light guide plate internal transmission, and make its scattering improving the homogeneity of light guide plate outgoing beam, and then promote the overall performance of light-source system.
The density of this site, size all can have different designs to adapt to different light-source systems.
A kind of existing light-source system device can be consulted the United States Patent (USP) the 6th of bulletin on September 3rd, 2002,443, No. 583 (referring to Fig. 1), this light-source system 100 comprise that a fluorescent tube 110, one are retained on light guide plate 200 in the lampshade 120 around the lampshade 120 of fluorescent tube 110 and an end.This light guide plate 200 comprises incidence surface 201, bottom surface 202 and exiting surface 203, and wherein, these fluorescent tube 110 relative these incidence surfaces 201 are provided with.During work, in these light guide plate 200 internal transmission, and be converted to area source through exiting surface 203 outgoing from the light beam of fluorescent tube 110 and lampshade 120.Be to increase the utilization factor of light beam, this light-source system 100 further comprises the reflecting plate 210 of a side of a bottom surface 202 that is arranged at light guide plate 200, the segment beam of reflecting plate 210 202 outgoing from the bottom surface.And this light-source system 100 is arranged a diffuser plate 220 in order to strengthening the uniformity coefficient of light guide plate 200 outgoing beams in regular turn in a side of light guide plate 200 exiting surfaces 203, and digonous runner plate 230 and 240 play the optically focused effect, with the brightness of enhancing light guide plate 200.
But, adopt these existing light guide plate 200 light-source systems 100 to need to adopt digonous runner plate 230 and 240 to improve brightness with the light beam of assembling from 203 outgoing of light guide plate 200 exiting surfaces, adopt reflecting plate 210 to improve the light beam utilization factor, make its complex structure, material cost height and assembling inconvenience.In addition, have more optical interface in this light-source system 100, light beam therebetween need experience repeatedly optical effect, causes bigger luminous energy loss, thereby influences the brightness of light-source system 100.
Summary of the invention
The objective of the invention is to overcome the defective of prior art, provide a kind of simple in structure, in light weight, with low cost, low energy consumption and its emitting brightness are higher, and light-emitting uniformity is better, and multifunctional integrated integrated micro is learned the backlight illuminating system device.
Another object of the present invention provides a kind of method that this integrated micro is learned the backlight illuminating system device of making.
In order to solve the technical matters of above-mentioned existence, the present invention can adopt following technical scheme:
The present invention comprises a light source at least, and a lampshade also comprises light guide plate, reflecting plate, wherein, light guide plate comprises a plane of incidence, an exit facet and a bottom surface at least, and the bottom surface of light guide plate is distributed with scattering point, contains the micro optical array structure on the exit facet of described light guide plate.
Described light source is two light sources, and described lampshade is two lampshades, and the plane of incidence of described light guide plate is two planes of incidence, and this light source, lampshade place the both sides of the plane of incidence respectively.
The micro optical array structure that contains on the exit facet of described light guide plate is surperficial continuous type embossment array structure, the cellular construction cycle of this micro optical array structure is in 0.5 μ m to 200 mu m range, characteristic dimension is a μ m level, size and density can evenly distribute or other distributions fill factor, curve factor 30%～100%.
The micro optical array structure that contains on the exit facet of described light guide plate is a surface step type embossment array structure, this stepped ramp type embossment array structure is the binary optical array structure that step quantizes, quantizing exponent number is in 2 to 32 order ranges, the cellular construction cycle is in 0.5 μ m to 200 mu m range, characteristic dimension is a μ m level, fill factor, curve factor 30%～100%, the etching maximum phase degree of depth is the integral multiple of 2 π or 2 π, this cellular construction size and density can evenly distribute or other distributions.
The cellular construction of the micro optical array structure that contains on the exit facet of described light guide plate can be a cone shape, also can be truncated conical shape, or the top has the cone shape of depression.
The method for making that integrated micro of the present invention is learned the backlight illuminating system device comprises following step:
1) utilize the optics software design to go out the geometric array structure of light guide plate exit facet of the present invention;
2) utilize binary optical and micro-optic technical design to go out micro optical array structure on the exit facet of light guide plate;
3) make template;
4) according to the template of producing, duplicate in enormous quantities;
5) assembling light source and lampshade and reflecting plate.
Step 2 of the present invention) be divided into following step:
A) according to the geometry of design, obtain one group of data that can be used for laser or electron-beam direct writing;
B) on laser or electron-beam direct writing machine, carry out the laser or the electron-beam direct writing of light guide plate exit facet;
Step 2 of the present invention) can also be divided into following step:
A) according to the micro optical array structure of the exit facet of light guide plate, this structure is carried out many steps quantize;
B) make mask set according to quantized result;
C) resist coating on the light guide plate exit facet utilizes the mask of having made to expose on litho machine;
D) on ion etching machine, carry out the substrate etching then;
E) repeatedly repeat c), d) step, multiplicity is by quantizing the number of steps decision, maximum etching phase bit depth is the integral multiple of 2 π or 2 π.
The invention has the beneficial effects as follows: compare prior art, light guide plate of the present invention adopts binary optical and micro-optic technology, only use one deck light guide plate with regard to the integrated function of light guide plate, diffuser plate and double-deck cross prisms plate in the traditional backlight lighting system structure, structure is simpler, and the more traditional light guide plate of cost is more cheap.
The exit facet of light guide plate is distributed with binary optical array structure or laser direct-writing array structure, has optically focused and even light effect simultaneously, and homogeneity reaches more than 85%, and brightness strengthens more than 1.5 times.Adopt the backlight illuminating system of light guide plate of the present invention can cut down optical texture, economical with materials reduces cost; Reduce optical effect, cut down the consumption of energy, improve the light beam utilization factor.
Description of drawings
Fig. 1 is a United States Patent (USP) the 6th, 443, No. 583 backlight illuminating system apparatus structure synoptic diagram;
Fig. 2 is the structural representation of embodiment of the present invention 1;
Fig. 3 is to be the structural representation of embodiment of the present invention 2.
Fig. 4 is the binary optical array structure vertical view on the light guide plate exit facet of the present invention;
Fig. 5 is that cellular construction 8 steps of the binary optical array on the light guide plate exit facet of the present invention quantize synoptic diagram;
Fig. 6 is that the cellular construction of the micro optical array on the light guide plate exit facet of the present invention is conical synoptic diagram;
Fig. 7 is that the cellular construction of the micro optical array on the light guide plate exit facet of the present invention is the truncated cone-shaped synoptic diagram;
Fig. 8 is the tapered profile synoptic diagram of the cellular construction of the micro optical array on the light guide plate exit facet of the present invention for top band depression;
Fig. 9 is the conical schematic perspective view of the cellular construction of the micro optical array on the light guide plate exit facet of the present invention for top band depression;
Figure 10 is a light guide plate exit facet continuous relief micro optical array structural representation of the present invention;
Figure 11 is the circular scattering point distribution schematic diagram on the bottom surface of light guide plate of the present invention.
Embodiment
The present invention utilizes binary optical and the novel integrated micro of micro-optic technical design backlight illuminating system to learn light guide plate, the function of light guide plate, diffuser plate and double-deck prism plate in the traditional backlight illuminator that this light guide plate is integrated, comprise that at least one is used for the plane of incidence of receiving beam, an exit facet relative and one and exit facet opposed bottom surface with the plane of incidence.Light guide plate exit facet of the present invention is distributed with the micro optical array structure, and the cellular construction of micro optical array has little taper shape, little truncated cone-shaped or other similar shape of deriving of basic configuration thus, consults Fig. 6, Fig. 7, Fig. 8, Fig. 9.Be characterized in that this element structural cycle is in 0.5 μ m to 200 mu m range, characteristic dimension is a μ m level, fill factor, curve factor 100%.Integrated micro of the present invention is learned the backlight illuminating system device has following two types to realize:
Embodiment of the present invention 1 is consulted Fig. 2, Fig. 4, Fig. 5, Figure 11, and integrated micro of the present invention is learned backlight illuminating system device 100, comprises a light source 200 and a lampshade 210, and a light guide plate 300 and a reflecting plate 400.This light guide plate 300 is a wedge shape light guide plate.Described light guide plate 300 comprises at least one and is used for the plane of incidence 310 of receiving beam, exit facet 320 relative with the plane of incidence 310 and and one and exit facet 320 opposed bottom surface 340, be distributed with the micro optical array structure that adopts the laser direct-writing technology to form on the exit facet 320 of light guide plate 300.Described light source 200 can be line source (as cathode fluorescent tube) or pointolite (as light emitting diode), and its relative plane of incidence 310 is provided with.Be evenly distributed with fill factor, curve factor on this light guide plate exit facet 320 and be the binary optical array structure that 100% 8 rank quantize, it has optically focused and even light function.Be distributed with the square scattering point (also can be polygon, circle or arbitrary shape) that size and density increase gradually along the direction away from the plane of incidence 310 on this bottom surface 340, it can allow emergent light be evenly distributed.
Embodiment of the present invention 2 is consulted Fig. 3, Fig. 4, Fig. 5, Figure 11, and light guide plate integrated micro of the present invention is learned backlight illuminating system device 100 and comprised two light sources, 200, two lampshades 210, and a light guide plate 300 and a reflecting plate 400.This light guide plate 300 is a flat light guide plate, comprise 310, one exit facets 320 that intersect with the plane of incidence 310 of the plane of incidence, and one and exit facet 320 opposed bottom surface 340, light source 200 is line source (as a cathode fluorescent tube), and the light source 200 relative planes of incidence 310 are provided with.Be evenly distributed with fill factor, curve factor on this light guide plate exit facet 320 and be the binary optical array structure that 100% 8 rank quantize, it has optically focused and even light function.Be evenly distributed with square scattering point (also can be polygon, circle or arbitrary shape) on this bottom surface 340, it can allow emergent light be evenly distributed.
Embodiment of the present invention 3, the micro optical array structure of the exit facet 320 of light guide plate 300 of the present invention is surperficial continuous type embossment array structure, the cellular construction cycle is in 0.5 μ m to 200 mu m range, characteristic dimension is a μ m level, this cellular construction size and density can evenly distribute or other distributions fill factor, curve factor 100%.
Another micro optical array structure is on the exit facet 320 of light guide plate 300 of the present invention:
Embodiment of the present invention 4, the micro optical array structure of the exit facet 320 of light guide plate 300 of the present invention is a surface step type array structure, the binary optical array junctions that this structure quantizes according to surperficial continuous type embossment micro optical array structural ledge, quantizing exponent number is in 2 to 32 order ranges, the cellular construction cycle is in 0.5 μ m to 200 mu m range, characteristic dimension is a μ m level, fill factor, curve factor 100%, the etching maximum phase degree of depth is the integral multiple of 2 π or 2 π, and this cellular construction size and density can evenly distribute or other distributions.
The bottom surface 340 of two types of light guide plate 300 of the present invention a plurality of scattering points that all distribute equably or regularly, that the shape of this scattering point can be is square, circular, polygon and other arbitrary shape, and its size and density can increase gradually along the direction away from the plane of incidence.Scattering point on the bottom surface 340 of light guide plate 300 of the present invention can destroy the total reflection condition that light is propagated in the light guide plate, forms preliminary uniform light field before entering the light guide plate exit facet.
As the material of light guide plate, can from translucent material, choose, use propenyl or polycarbonate resin usually, it is 1.49 PMMA that refractive index is typically arranged, light guide plate be shaped as parallel flat or section plate wedge, thickness is generally about 1～10mm.
Embodiment of the present invention 5, consult Fig. 2, Figure 10, Figure 11, the embodiment 5 that integrated micro of the present invention is learned the backlight illuminating system device compares with embodiment 1, it is characterized in that the pattern on the exit facet 320 of light guide plate 300 of the present invention adopts laser or direct electronic beam writing technology, what form is that surperficial fill factor, curve factor is 100% continuous relief structure, and characteristic dimension is a μ m level.
Embodiment of the present invention 6, see also Fig. 3, Figure 10, Figure 11, integrated micro of the present invention is learned backlight illuminating system device embodiments 6 and is compared with embodiment 2, it is characterized in that the pattern on the exit facet 320 of light guide plate 300 of the present invention adopts laser direct-writing or direct electronic beam writing technology, what form is that surperficial fill factor, curve factor is 100% continuous relief structure, and characteristic dimension is a μ m level.
Embodiment of the present invention 7, referring to Fig. 6, Fig. 7, Fig. 8, Fig. 9, the cellular construction of surperficial continuous type embossment micro optical array structure of the present invention is the conical structure of conical structure or truncated cone-shaped structure or top band depression.
The common ground of light guide plate 300 of the present invention is: light guide plate 300 bottom surfaces 340 a plurality of scattering points that all distribute equably or regularly, that its shape can be is square, circular, polygon and other arbitrary shape, and its size and density can increase gradually along the direction away from the plane of incidence.
Method for making of the present invention comprises following step:
1) goes out the geometric array structure of light guide plate exit facet of the present invention with the optics software design;
2) utilize binary optical and micro-optic technical design to go out micro optical array structure on the exit facet of light guide plate;
3) make template;
4) according to the template of producing, duplicate in enormous quantities;
5) assembling light source and lampshade and reflecting plate.
When the present invention is the method for light guide plate of continuous type embossment array structure in the micro optical array structure of making exit facet, step 2) be divided into following step:
A) according to the geometry of design, obtain one group of data that can be used for laser or electron-beam direct writing;
B) on laser or electron-beam direct writing machine, carry out the laser or the electron-beam direct writing of light guide plate exit facet;
When the present invention is the method for light guide plate of surface step type array structure in the micro optical array structure of making exit facet, step 2) be divided into following step:
A) according to the micro optical array structure of the exit facet of light guide plate, this structure is carried out many steps quantize;
B) make mask set according to quantized result;
C) resist coating on the light guide plate exit facet utilizes the mask of having made to expose on litho machine;
D) on ion etching machine, carry out the substrate etching then;
E) repeatedly repeat c), d) step, multiplicity is by quantizing the number of steps decision, maximum etching phase bit depth is the integral multiple of 2 π or 2 π.
It is of the present invention that to carry out that many steps quantize be to carry out 2～32 rank to quantize.
Claims (10)
1, a kind of integrated micro is learned the backlight illuminating system device, at least comprise a light source, a lampshade, also comprise light guide plate, reflecting plate, wherein, light guide plate comprises a plane of incidence, an exit facet and a bottom surface at least, and the bottom surface of light guide plate is distributed with scattering point, it is characterized in that: contain the micro optical array structure on the exit facet of described light guide plate.
2, integrated micro according to claim 1 is learned the backlight illuminating system device, it is characterized in that: described light source is two light sources, described lampshade is two lampshades, and the plane of incidence of described light guide plate is two planes of incidence, and this light source, lampshade place the both sides of the plane of incidence respectively.
3, integrated micro according to claim 1 is learned the backlight illuminating system device, it is characterized in that: the micro optical array structure that contains on the exit facet of described light guide plate is surperficial continuous type embossment array structure, the cellular construction cycle of this micro optical array is in 0.5 μ m to 200 mu m range, characteristic dimension is a μ m level, size and density can evenly distribute or other distributions fill factor, curve factor 30%～100%.
4, integrated micro according to claim 1 is learned the backlight illuminating system device, it is characterized in that: the micro optical array structure that contains on the exit facet of described light guide plate is a surface step type embossment array structure, this stepped ramp type embossment array structure is the binary optical array structure that step quantizes, quantizing exponent number is in 2 to 32 order ranges, the cellular construction cycle is in 0.5 μ m to 200 mu m range, characteristic dimension is a μ m level, fill factor, curve factor 30%～100%, the etching maximum phase degree of depth is the integral multiple of 2 π or 2 π, and this cellular construction size and density can evenly distribute or other distributions.
5, integrated micro according to claim 1 is learned the backlight illuminating system device, and it is characterized in that: the cellular construction of the micro optical array that contains on the exit facet of described light guide plate is a cone shape.
6, integrated micro according to claim 1 is learned the backlight illuminating system device, and it is characterized in that: the cellular construction of the micro optical array that contains on the exit facet of described light guide plate is a truncated conical shape.
7, integrated micro according to claim 1 is learned the backlight illuminating system device, and it is characterized in that: the cellular construction of the micro optical array that contains on the exit facet of described light guide plate is the cone shape that the top has depression.
8, a kind of integrated micro is learned the method for making of backlight illuminating system device, it is characterized in that: comprise following step:
1) utilize the optics software design to go out the geometric array structure of light guide plate exit facet of the present invention;
2) utilize binary optical and micro-optic technical design to go out micro optical array structure on the light guide plate exit facet;
3) make template;
4) according to the template massive duplication of producing;
5) assembling light source, lampshade and reflecting plate.
9, integrated micro according to claim 8 is learned the method for making of backlight illuminating system device, it is characterized in that: described step 2) be divided into following step:
A) according to the geometry of design, obtain one group of data that can be used for laser or electron-beam direct writing;
B) on laser or electron-beam direct writing machine, carry out the laser or the electron-beam direct writing of light guide plate exit facet;
10, described according to Claim 8 integrated micro is learned the method for making of backlight illuminating system device, and it is characterized in that: described step 2 also is divided into following step:
A) according to the micro optical array structure of the exit facet of light guide plate, this structure is carried out many steps quantize;
B) make mask set according to quantized result;
C) resist coating on the light guide plate exit facet utilizes the mask of having made to expose on litho machine;
D) on ion etching machine, carry out the substrate etching then;
E) repeatedly repeat c), d) step, multiplicity is by quantizing the number of steps decision, maximum etching phase bit depth is the integral multiple of 2 π or 2 π.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100520017A CN100517014C (en) | 2004-10-29 | 2004-10-29 | Integrated micro-optical backlight lighting system apparatus and making method thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100520017A CN100517014C (en) | 2004-10-29 | 2004-10-29 | Integrated micro-optical backlight lighting system apparatus and making method thereof |
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| Publication Number | Publication Date |
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| CN1766712A true CN1766712A (en) | 2006-05-03 |
| CN100517014C CN100517014C (en) | 2009-07-22 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101988688A (en) * | 2009-07-30 | 2011-03-23 | 乐金显示有限公司 | Light guide plate and liquid crystal display device including the same |
-
2004
- 2004-10-29 CN CNB2004100520017A patent/CN100517014C/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101988688A (en) * | 2009-07-30 | 2011-03-23 | 乐金显示有限公司 | Light guide plate and liquid crystal display device including the same |
| CN101988688B (en) * | 2009-07-30 | 2013-07-10 | 乐金显示有限公司 | Light guide plate and liquid crystal display device including the same |
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| Publication number | Publication date |
|---|---|
| CN100517014C (en) | 2009-07-22 |
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Assignee: SHENZHEN BAOMING SEIKO Co.,Ltd. Assignor: Shenzhen University Contract record no.: 2010440001380 Denomination of invention: Integrated micro-optical backlight lighting system apparatus and making method thereof Granted publication date: 20090722 License type: Exclusive License Open date: 20060503 Record date: 20100915 |
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