CN1718541A - A kind of preparation method who lacks hole SBA-15 mesoporous silicon sill - Google Patents

A kind of preparation method who lacks hole SBA-15 mesoporous silicon sill Download PDF

Info

Publication number
CN1718541A
CN1718541A CN 200410062793 CN200410062793A CN1718541A CN 1718541 A CN1718541 A CN 1718541A CN 200410062793 CN200410062793 CN 200410062793 CN 200410062793 A CN200410062793 A CN 200410062793A CN 1718541 A CN1718541 A CN 1718541A
Authority
CN
China
Prior art keywords
sba
template
mesoporous silicon
preparation
silicon sill
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN 200410062793
Other languages
Chinese (zh)
Other versions
CN1302991C (en
Inventor
包信和
张贺
孙军明
缪少军
谭大力
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Golden Armor Instrument (dalian) Co Ltd
Original Assignee
Dalian Institute of Chemical Physics of CAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dalian Institute of Chemical Physics of CAS filed Critical Dalian Institute of Chemical Physics of CAS
Priority to CNB2004100627936A priority Critical patent/CN1302991C/en
Publication of CN1718541A publication Critical patent/CN1718541A/en
Application granted granted Critical
Publication of CN1302991C publication Critical patent/CN1302991C/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

The present invention relates to a kind of preparation method who lacks hole SBA-15 mesoporous silicon sill, it is characterized in that in the system of the synthetic SBA-15 of tradition, introducing a large amount of organic cosolvents, in system, set up a large amount of gaps, and at F -Katalysis under, the quick hydrolysis of TEOS has been obtained a kind of SBA-15 mesopore material with short hole.

Description

A kind of preparation method who lacks hole SBA-15 mesoporous silicon sill
Technical field
The present invention relates to the preparation of short hole SBA-15 mesopore material, specifically a kind of method that adds a large amount of organic cosolvents that adopts is utilized this cosolvent and micellar reactive force to suppress growth on the direction of duct, and then is obtained lacking hole SBA-15 mesoporous silicon sill.
Background technology
Mesoporous silicon sill MCM-41 and SBA-15 have obtained broad research owing to have the pore passage structure and the high-specific surface area of high-sequential at aspects such as catalysis, separation, absorption and assembled semiconductors.Regulation and control to pattern, aperture and the granular size of mesopore material have become focus in recent years.Organic cosolvent, as TMB (1), alkane and amine etc. has been used in the research of adjustment aperture.For example, decane has reaming performance preferably in MCM-41 synthetic, but the material that obtains has often lost high-sequential.
Short hole and high-sequential SBA-15 mesoporous silicon sill more help the diffusion of reaction molecular, therefore receive very big concern.And the realization in short hole can be adopted two kinds of methods usually: a kind of is to reduce size of particles.Another kind is the direction that changes the duct.The SBA-15 that traditional method makes is vermiform, and the duct direction is main consistent with long axis direction, and orifice throat length is about 1 μ m.Therefore short hole SBA-15 can make its duct direction realize with the particulate short-axis direction is consistent.Nano level mesopore material MCM-41 preparation is in the news.And short being prepared into of hole SBA-15 do not seen bibliographical information so far as yet.
Summary of the invention
The object of the present invention is to provide a kind of preparation more to help the method for the short hole SBA-15 mesoporous silicon sill of reaction molecular diffusion.
The object of the present invention is achieved like this, a large amount of organic cosolvents is incorporated in the synthetic system of SBA-15, and under the prerequisite that does not influence the micella order, a large amount of spaces that utilize organic cosolvent to set up in system suppress the growth of SBA-15 duct direction.
Purpose of the present invention mainly is achieved in that
At first prepare the aqueous hydrochloric acid of 1.0-2.0M concentration, add an amount of template then and make the concentration of template in OK range, a large amount of organic cosolvents is joined in the system, stir for some time under the certain temperature.Add NH 4F and tetraethoxy (TEOS) heat up to stir 20-24h, during this period, a large amount of spaces that organic cosolvent is set up in system and with the micellar phase mutual effect, thereby suppress the growth of micella duct direction.
The concentration of template is extremely important in the hydrochloric acid soln among the present invention, otherwise template can not form micella, thereby can not get mesopore material.In addition, hydrochloric acid mainly contains two effects: the first, and one side H +Carry out protonated to template and tetraethoxy; On the other hand, effect in the middle of the chlorion between plays fits together the formation micella with protonated template and protonated tetraethoxy by the Coulomb's force effect; The second, the acidity that hydrochloric acid produces helps the hydrolysis of tetraethoxy, and suitable concentration helps the hydrolysis and the condensation of tetraethoxy, thereby forms the mesoporous silicon material.
Its key step is as follows:
(a) under the normal temperature, with template EO 20PO 70EO 20Adding concentration is in the aqueous hydrochloric acid of 1.2-2.0M, obtains transparent liquid with magnetic stirrer, adds organic cosolvent then, and the mass ratio of organic cosolvent and template is 1-60, and continues to stir 10-100 minute, obtains a mixing solutions;
(b) with NH 4F joins in the mixing solutions of step a preparation after the dissolving, adds tetraethyl orthosilicate, continues to stir 20-24 hour in the 303-373K temperature range, obtains milky white solution;
(c) milky white solution that step b is obtained changes in the reactor, and the sealing back is at 313-423K crystallization 48h; Behind cooling, filtration, the natural airing, removed template in 3-7 hour, can obtain the SBA-15 mesoporous silicon sill in short hole in the 750-780K roasting;
Count tetraethoxy: template: HCl: NH in molar ratio 4F=1: 0.0068-0.034: 0.082-0.142: 0.003-3.
The present invention has following advantage:
The SBA-15 orifice throat length homogeneous that 1. obtains (~200nm), short duct helps the diffusion of reaction molecular.
2. duct high-sequential, the aperture can reach 12nm.
Description of drawings
Fig. 1 is the scanning picture of the short hole SBA-15 mesoporous silicon sill for preparing of cosolvent with the decane for the present invention.
Fig. 2 is the high resolution scanning picture of the short hole SBA-15 mesoporous silicon sill sample for preparing of cosolvent with the decane for the present invention.
Fig. 3 is the scanning picture of the short hole SBA-15 mesoporous silicon sill for preparing of cosolvent with the dodecane for the present invention.
Fig. 4 the present invention is the high resolution scanning picture of the short hole SBA-15 mesoporous silicon sill sample for preparing of cosolvent with the dodecane.
Embodiment
The present invention is further described below by example, but application of the present invention is not subjected to the restriction of these examples.
Embodiment 1
Under the normal temperature, the template P123 of 2.4g is dissolved in the aqueous hydrochloric acid of 84ml (1.20M), obtain transparent liquid, add the decane of 14.0g then and under this temperature, continue and stir 1h, obtain a white mixing solutions with magnetic stirrer.NH with 0.0276g 4After F joins and dissolves in the mixing solutions, be warming up to 313K after adding the TEOS of 5.5ml and stirring 5-10min.Under this temperature, continue to stir 20-24h, obtain milky white solution.
(b) milky white solution that (a) obtained changes in the stainless steel still, and the sealing back is at 473K crystallization 48h.Behind cooling, filtration, the natural airing, 5h removes template in the 773K roasting, can obtain the SBA-15 mesoporous silicon sill in short hole.
The scanner uni high resolution scanning picture of gained sample is seen Fig. 1,2.
Embodiment 2
Under the normal temperature, the template P123 of 2.4g is dissolved in the aqueous hydrochloric acid of 75ml (2.0M), obtain transparent liquid, add the undecane of 15.6g then and under this temperature, continue and stir 2h, obtain a white mixing solutions with magnetic stirrer.NH with 0.0276g 4After F joins and dissolves in the mixing solutions, be warming up to 308K after adding the TEOS of 5.5ml and stirring 10min, under this temperature, continue to stir 20-24h, obtain milky white solution.
(b) milky white solution that (a) obtained changes in the stainless steel still, and the sealing back is at 353K crystallization 48h.Behind cooling, filtration, the natural airing, 5h removes template in the 773K roasting, can obtain the SBA-15 mesoporous silicon sill in short hole.
Embodiment 3
Under the normal temperature, the template P123 of 2.4g is dissolved in the aqueous hydrochloric acid of 84ml (1.70M), obtain transparent liquid, add the dodecane of 17.0g then and under this temperature, continue and stir 1h, obtain a white mixing solutions with magnetic stirrer.NH with 0.0276g 4After F joins and dissolves in the mixing solutions, be warming up to 313K after adding the TEOS of 5.5ml and stirring 5-10min.Under this temperature, continue to stir 20-24h, obtain milky white solution.
(b) milky white solution that (a) obtained changes in the stainless steel still, and the sealing back is at 373K crystallization 48h.Behind cooling, filtration, the natural airing, 5h removes template in the 773K roasting, can obtain the SBA-15 mesoporous silicon sill in short hole.
The scanner uni high resolution scanning Electronic Speculum picture of gained sample is seen Fig. 3 .4.

Claims (3)

1. preparation method who lacks hole SBA-15 mesoporous silicon sill, key step is as follows:
(a) under the normal temperature, with template EO 20PO 70EO 20Adding concentration is in the aqueous hydrochloric acid of 1.2-2.0M, obtains transparent liquid with magnetic stirrer, adds organic cosolvent then, and the mass ratio of organic cosolvent and template is 1-60, and continues to stir 10-100 minute, obtains mixing solutions;
(b) with NH 4F joins in the mixing solutions of step a preparation after the dissolving, adds tetraethoxy, continues to stir 20-24 hour in the 303-373K temperature range, obtains milky white solution;
(c) milky white solution that step b is obtained changes in the reactor, and the sealing back is at 313-423K crystallization 48h; Behind cooling, filtration, the natural airing, removed template in 3-7 hour, can obtain the SBA-15 mesoporous silicon sill in short hole in the 750-780K roasting;
Count tetraethoxy: template: HCl: NH in molar ratio 4F=1: 0.0068-0.034: 0.082-0.142: 0.003-3.What are the add-on of cosolvent?
2. the method for claim 1 is characterized in that, organic cosolvent is decane, undecane or dodecane.
3. the method for claim 1 is characterized in that, reactor is a stainless steel cauldron.
CNB2004100627936A 2004-07-09 2004-07-09 Preparation method of short hole SBA-15 mesopore silicon base material Expired - Fee Related CN1302991C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNB2004100627936A CN1302991C (en) 2004-07-09 2004-07-09 Preparation method of short hole SBA-15 mesopore silicon base material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNB2004100627936A CN1302991C (en) 2004-07-09 2004-07-09 Preparation method of short hole SBA-15 mesopore silicon base material

Publications (2)

Publication Number Publication Date
CN1718541A true CN1718541A (en) 2006-01-11
CN1302991C CN1302991C (en) 2007-03-07

Family

ID=35930503

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2004100627936A Expired - Fee Related CN1302991C (en) 2004-07-09 2004-07-09 Preparation method of short hole SBA-15 mesopore silicon base material

Country Status (1)

Country Link
CN (1) CN1302991C (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1166599C (en) * 2002-08-21 2004-09-15 复旦大学 Process for preparing nano catalyst used to prepare propene by oxidizing and dehydrogenating propane

Also Published As

Publication number Publication date
CN1302991C (en) 2007-03-07

Similar Documents

Publication Publication Date Title
Antonietti Surfactants for novel templating applications
Su et al. Silver-modified nanosized ferroelectrics as a novel photocatalyst
CN105749766B (en) A kind of Kynoar/TiO2The preparation method of Nano sol composite hyperfiltration membrane
CN102515744B (en) CaCu3Ti4O12 micro nano sized fiber and its preparation method
CN101618889B (en) Method for preparing lead titanate nano column automatically assembled by perovskite structure nano pieces
CN106587077B (en) Three-dimensional ordered macroporous-mesopore oxide material of one kind and preparation method thereof
Truong et al. Controlled synthesis of titania using water-soluble titanium complexes: A review
CN104069801A (en) Preparation method for attapulgite clay nanorod crystal composite microsphere adsorbent
CN1730392A (en) Large aperture capacity silicon oxide vesicle, foamed material and process for preparing the same
JPWO2014068631A1 (en) Method for producing chiral metal oxide structure, and chiral porous structure
CN102294179B (en) Preparation method of inorganic mesoporous membrane
CN104528670A (en) Preparation methods of graphite-phase boron nitride nano wafer and colloid thereof
CN1302991C (en) Preparation method of short hole SBA-15 mesopore silicon base material
CN1748845A (en) Process for preparing organic-inorganic hybridized osmotic evaporation film
CN104556219B (en) One prepares nano-TiO2Method
CN104556220B (en) One prepares nano-TiO2Method
RU2734633C1 (en) Quaternary ammonium cation based on morpholinium and obtained using zeolite of aei type
CN1120801C (en) Dual-pore molecular sieve and its preparing process
CN1733611A (en) Zirconium dioxide nano powder material preparation method
US11401651B2 (en) Carbon cloth material coated with iodine-doped bismuthyl carbonate, preparation method thereof, and application in oil-water separation
CN100351007C (en) Method for preparing molecular engram CS/TEOS hybridized film by separation of phenylalanine isomer
CN1907852A (en) Method of synthesizing ordered mesoporous silica dioxide using cation alkyl glycoside as template agent
CN111229194A (en) (TiO)2-ZrO2-SiO2) @ inverse opal structure SiO2Preparation and use of catalysts
CN1298626C (en) Metaporous silicon dioxide material and its preparing method
CN1274594C (en) Self-assembling silicon dioxide porous materials and method for preparing same

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
ASS Succession or assignment of patent right

Owner name: JINKAI INSTRUMENT (DALIAN) CO., LTD.

Free format text: FORMER OWNER: DALIAN INSTITUTE OF CHEMICAL PHYSICS, CHINESE ACADEMY OF SCIENCES

Effective date: 20141010

C41 Transfer of patent application or patent right or utility model
TR01 Transfer of patent right

Effective date of registration: 20141010

Address after: 506, room 911, Chinese Academy of science and Technology Innovation Park, 116023 Huangpu Road, hi tech Zone, Liaoning, Dalian

Patentee after: Golden Armor instrument (Dalian) Co. Ltd.

Address before: 116023 Zhongshan Road, Liaoning, No. 457,

Patentee before: Dalian Institute of Chemical Physics, Chinese Academy of Sciences

CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20070307

Termination date: 20160709

CF01 Termination of patent right due to non-payment of annual fee