CN1713001A - Vertical microlens and production thereof - Google Patents
Vertical microlens and production thereof Download PDFInfo
- Publication number
- CN1713001A CN1713001A CN 200510085684 CN200510085684A CN1713001A CN 1713001 A CN1713001 A CN 1713001A CN 200510085684 CN200510085684 CN 200510085684 CN 200510085684 A CN200510085684 A CN 200510085684A CN 1713001 A CN1713001 A CN 1713001A
- Authority
- CN
- China
- Prior art keywords
- column structure
- film
- macromolecule
- micro
- microlens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Abstract
A method for preparing micro-lens in stand type includes utilizing micro-image processing to form polymer columnar structure, immersing top end of structure in polymer solution being mixed uniformly, absorbing liquid polymer on top end of structure, presenting absorbed liquid polymer in form of bowstring on top end because of its tension coherence, removing out solvent and then curing by heat treatment for obtaining micro-lens component.
Description
Technical field
The present invention relates to a kind ofly make, be used for the method for making of the vertical microlens integrated in micro-optic or low-light electric system in general manufacture of semiconductor mode.
Background technology
In existing plane micro-optic or the low-light electric system, for building of simplified system put, the photoelectric subassembly that adopts laterally (being the direction of parallel system substrate) emission, transmission usually or receive; Above-mentioned existing cross-member has active region 11 as shown in Figure 1, it presents the aperture of long and narrow in the YZ section, so the aperture of shape often cause and waveguide (as optical fiber) between coupling efficiency not good, therefore also between emission or receiving unit and waveguide, often need assign the optical device of optical mode attitude conversion (light beam sphering) or focusing function.
K.Kato and Y.Tohmori (K.Kato, and Y.Tohmori, 2000, PLC HybridIntegration Technology and Its Application to Photonic Component, IEEEJournal of Selected Topics in Quantum Electronics, 6 (1): 4-13) described optical transceiver secondary module is to utilize the gradual change type optical waveguide, to reach the purpose of revising light beam mode and promoting coupling efficiency; Yet this mode involves meticulousr complicated processing procedure, as tapered waveguide etching, the etching of laser minute surface, and secondary crystalline substance of heap of stone etc.; Moreover the gradual change type waveguide causes the doubt on the assembly yield for directly being additional to the light output end of light emission component (semiconductor laser) in this example.
And in U.S. Pat 5,963,577 and US 6,160,672 in then disclose to utilize and add the optical device (as spherical lens, cylinder lenses etc.) put on the substrate of plane low-light electric system, to reach the purpose that promotes coupling efficiency; Yet the optical device size that this mode is used is all in the millimeter grade, and system substrate must have the putting groove of corresponding size, has so increased the system substrate size, and the complexity in the preparation; Moreover optical device must impose the mechanical property of mechanism of ammonium fixation (as sticker) with enhanced system.
In U.S. Pat 5,420, then disclosed laser module in 722, this laser module is to utilize lenticule uprightly to be carried on light output end, to reach the purpose of revising light beam mode; But should invention also need extra mechanism of ammonium fixation, and the application of single component must be cut after in the lenticule lift-launch.
In addition in U.S. Pat 5,646, disclosed light stores and reads in the micro-optic read/write head of usefulness in 928, utilize the semiconductor micro electromechanical processing procedure, form required optical device respectively at silicon (Si) substrate surface, as Fresnel lens, optical splitter (Beam splitter), reverberator (Reflector) etc., again it is lifted the upright micro-optical systems that forms the optical axis parallel substrate, necessary support is provided simultaneously; This invention is put very complexity except building, and this micro-system machinery and thermal stability still have many restrictions and consider on using.
In addition, U.S. Pat 5,079,130, US 5,225,935, US 5,286,338, US 5,298,366, US 5,324,623 and US 6,249,034 grade all discloses with the high-temperature baking photoresistance, make it form lenticular mode or its application of deriving, it utilizes the prepared slick and sly lens surface of photoresistance surface tension, though can be for the usefulness of improving optical system coupled efficient, but institute addresses and is all planar microlens (optical axis vertical substrate), therefore can't directly apply to the plane micro-optic or the low-light electric system of optical axis parallel substrate.
Yet the technology of high-temperature baking photoresistance is except can be used for making the plane lenticule, it also can be applicable to microsphere lens, people such as H.Yang (H.Yang, C.K.Chao, C.P.Lin, S.C.Shen, Micro-ballLens Array Modeling and Fabrication Using Thermal Reflow in Two Polymers, Journal of Micromechanics and Microengineering, 2004,14:277-282) exposure makes its upper strata photoresistance form microsphere lens with the double-deck light resistance structure of high-temperature baking, can be used for micro-optical systems to promote light source and optical coupling efficiency, but the upper strata photoresistance that is adopted is the thermal plastic high polymer material, is not suitable in the hot environment, and the big young pathbreaker of the microsphere lens of manufacturing is subject to the thickness of photoresistance coating.
Summary of the invention
The object of the present invention is to provide the high vertical microlens of a kind of thermal stability.
Another object of the present invention is to provide a kind of method for making of vertical microlens, put to simplify building of micro-optical systems.
Another purpose of the present invention is to provide a kind of method for making of vertical microlens, and can arrange in pairs or groups light emission component and optical fiber receive module make light emission component and optical fiber receive module can obtain lifting on the coupling efficiency.
Technical solution of the present invention is: a kind of vertical microlens, and for the xsect that is attached on the macromolecule column structure top is the macromolecule material biconvex lenticule that string is justified shape.
A kind of method for making of vertical microlens comprises the following steps:
Step 1, provide the base material of micro-optic or low-light electric system, comprise the macromolecule membranous layer on substrate and the substrate at least;
Step 2, employing micro-photographing process, definition column structure zone on this macromolecule membranous layer, the back forms the macromolecule column structure in developing;
Step 3, provide microscope carrier for the preparation uniform liquid macroimolecule film;
Step 4, this macromolecule column structure is inverted, is vertically immersed in the prepared even liquid macroimolecule film of step 3, separate after leaving standstill a period of time, make that the liquid macroimolecule film is outstanding to be invested on this column structure, and because of the poly-lensing that is in the surface tension;
Step 5, remove the outstanding solvent in the liquid macroimolecule lens on the column structure that invests, form the biconvex lenticule of tool thermal stability by thermal treatment.
Utilize column structure to immerse the method for polymeric membrane, promptly utilize micro-photographing process to form the column structure of macromolecule material, with in the liquid macroimolecule solution of the even mixing of column structure top immersion (as photoresistance, polyimide Polyimide etc.), liquid macroimolecule is adsorbed in column structure thing top, this is attached to the liquid macroimolecule on the column structure top, because of poly-in the surface tension, its xsect is string circle shape, after appropriate heat treatment is removed solvent and solidified, promptly can be used as the lenticule assembly in the micro-optical systems.By selecting for use of macromolecule material, this vertical microlens can be constituted by single material or by different material.
For light emission component and the optical fiber receive module of arranging in pairs or groups, vertical microlens can also be made by following steps:
Step 1: the base material that micro-optic or low-light electric system are provided;
Step 2: on base material, apply etch shield, after the definitions component land regions, promptly carry out etch process to form component platform;
Step 3: have on the base material of component platform in this, be covered with the photosensitive macromolecular material in the rotary coating mode;
Step 4: define the column structure zone by micro-photographing process on this photosensitive macromolecular material layer, the back of developing forms the macromolecule column structure;
Step 5: provide microscope carrier to use for the uniform liquid photosensitive macromolecular film of preparation;
Step 6: the described macromolecule column structure of step 4 is inverted, vertical this uniform liquid photosensitive macromolecular film that immerses, separate after leaving standstill a period of time, make outstanding this column structure and this component platform both sides and the top of investing of polymeric membrane, the wherein outstanding liquid macroimolecule film that invests on this column structure is because of the poly-lensing that is in the surface tension;
Step 7: remove this outstanding solvent that invests the liquid macroimolecule film of column structure and this component platform both sides and top by thermal treatment;
Step 8: remove outstanding attached photosensitive macromolecular material on this component platform by micro-photographing process, stay outstanding attached lensing photosensitive macromolecular material on this column structure, the stand-type macromolecule biconvex lenticule that promptly have component platform and tool thermal stability on the base material this moment.
Described substrate can be selected silicon, aluminium oxide, glass, gallium arsenide for use, or material such as indium phosphide is made.
Described macromolecular material can be polymethyl methyl esters (PMMA), dimethyl silicone polymer (PDMS), AZ PLP-100 photoresistance (Clariant company product), NR9-8000 photoresistance (Futurrex company product), SU-8 photoresistance (Micro Resist Technology company product), or Polyimide (Polyimide) that can be high temperature resistant etc.
The degree of depth that the present invention is immersed Polymer Solution by this column structure of control, and then control the lens size (mirror height) of this microlens structure, but and the difference of the coefficient of viscosity of mat Polymer Solution or solvent amount, with control macromolecule lenticular radius-of-curvature size.
The vertical microlens that utilizes column structure to immerse polymeric membrane method made provided by the present invention with aforementioned case and other prior art quoted as proof mutually relatively the time, has more following advantage:
1, the method for making of vertical microlens of the present invention, processing procedure is simple, can simplify building of micro-optical systems puts, can also be by the degree of depth of control column structure immersion liquid macroimolecule film, and then control the lens size (mirror height) of this microlens structure, and can control the lenticular radius-of-curvature size of macromolecule by the coefficient of viscosity of control Polymer Solution or the difference of solvent.
2, the thermal stability height of vertical microlens provided by the present invention.
3, can arrange in pairs or groups light emission component and optical fiber receive module of vertical microlens of the present invention makes light emission component and optical fiber receive module can obtain lifting on the coupling efficiency.
Description of drawings
Fig. 1 is emitted transverse, the transmission of prior art or the assembly synoptic diagram that receives;
Fig. 2 A to Fig. 2 E is the diagrammatic cross-section of each process stage structure of lenticule among the embodiment 1;
Fig. 3 A to Fig. 3 C is the diagrammatic cross-section of each process stage structure of lenticule among the embodiment 2;
Fig. 4 is the schematic perspective view of the vertical microlens of formation in embodiment 1 and 2;
Fig. 5 A to Fig. 5 G is the diagrammatic cross-section of each process stage structure of low-light level platform among the embodiment 3.
11, the active region of cross-member, 20, silicon substrate, 21, SU-8 thick film photoresistance, 21a, SU-8 photoresistance column structure, 22, the exposure shielding, 23, the SU-8 thick film is born photoresistance, 23a, the SU-8 photoresistance, 24, silicon substrate, 31, substrate with groove, 32, SU-8 photoresistance liquid, 32a, the SU-8 photoresistance, 33, recess sidewall, 41, column structure, 42, biconvex lens, 51, silicon substrate, 51a, component platform, 52, etch shield, 53, the SU-8 photoresistance, 53a, the SU-8 column structure, 54, silicon substrate, 55, SU-8 photoresistance film, 55a, the SU-8 photoresistance, 55b, SU-8 photoresistance lens.
Embodiment
Below utilize three embodiment to describe the method for making of vertical microlens in detail, the column works all adopts SU-8 series photoresistance (Micro Resist Technology company product) to form on silicon substrate via micro-photographing process among the embodiment, and the macromolecular material as lens also is the SU-8 photoresistance on the column structure thing and be attached to.
Embodiment one
See also Fig. 2, present embodiment is made vertical microlens by SU-8 material column structure being immersed in the liquid SU-8 film of the thickness of a rotary coating on Silicon Wafer, and this lenticule is a biconvex lens.
Shown in Fig. 2 A, at first on silicon substrate 20, utilize rotary coating evenly to apply one deck SU-8 thick film photoresistance 21, remove solvent through baking in 115 ℃, 30 minutes after, photoresistance thickness is about 150 to 200 microns; Utilize exposure shielding 22 again, and by micro-photographing process definition and formation SU-8 photoresistance column structure 21a, this column structure width is about 30 to 50 microns, highly is about 150 to 200 microns (shown in Fig. 2 B).
After SU-8 photoresistance column structure 21a finishes, can make the outstanding macromolecule material lens that invest on this column structure 21a; As the lens material,, immerse photoresistance with the SU-8 photoresistance with absorption SU-8 for this column structure 21a that finishes by the liquid SU-8 film of preparation; The SU-8 photoresistance is removable unnecessary solvent after bakingout process, and further increases the thermotolerance and stability of material behind irradiation; In addition, use and the identical material of this column structure thing 21a, also can reduce the reflection loss of light source through the different materials interface.
Shown in Fig. 2 C, utilize method of spin coating on silicon substrate 24, evenly to be coated with the negative photoresistance 23 of SU-8 thick film of last layer viscous fluid attitude; Shown in Fig. 2 D, be inverted this column structure 21a this moment, and vertically immerse from top to bottom in the negative photoresistance 23 of this SU-8 thick film, after leaving standstill about 1 minute, shown in Fig. 2 E, after the negative photoresistance 23 of this column structure 21a and SU-8 thick film separated, SU-8 photoresistance 23a promptly is attached to this column structure top, and this is attached to the SU-8 photoresistance 23a on this column structure 21a top, because of poly-in the surface tension, its xsect is string circle shape, through 115 ℃, after the interior solvent of photoresistance is removed in baking in 30 minutes, promptly form the biconvex lens of SU-8 resistance material, place exposure under the UV light source at last, make photoresistance intermolecular crosslinked mutually, to improve material temperature tolerance and stability.
Embodiment two
See also Fig. 3, present embodiment is by immersing SU-8 resistance material column structure in the liquid SU-8 film of the thickness of containing in groove, make vertical microlens, this lenticule also is a biconvex lens, recess sidewall among this embodiment can provide the support of column structure substrate, and then makes column structure keep fixing immersion depth and keep level of base plate.
Because when considering embodiment one and being applied to the poly-lens processing procedure, level and the degree of depth control when homogeneity that lens are made and controllability need be relied on column structure and immersed downwards; Therefore, as shown in Figure 3A, the SU-8 photoresistance liquid 32 of thickness liquid state is contained earlier on the substrate 31 with groove, give with the appropriateness rotation and treat that SU-8 photoresistance liquid 32 evenly is covered with groove after, for another example shown in Fig. 3 B, the SU-8 column structure 21a that makes is inverted in the also vertical SU-8 photoresistance liquid 32 that immerses in the groove, and column structure silicon substrate 20 is kept its level because of being supported on the recess sidewall 33.By the actual depth of groove H that records, column structure height h and photoresistance liquid level t etc., can estimate lens size (mirror height) d according to following formula:
d＝h-(H-t)
After leaving standstill 1 minute approximately, column structure 21a is separated with SU-8 photoresistance liquid 32, SU-8 photoresistance 32a promptly is attached to this column structure 21a top, this is attached to the SU-8 light 32a on the column structure 21a top, because of poly-in the surface tension, its xsect is string circle shape, after 115 ℃, 30 minutes toast the solvent of removing in the photoresistance, promptly form SU-8 material biconvex lens, shown in Fig. 3 C; Place exposure under the UV light source at last, make photoresistance intermolecular crosslinked mutually, to improve material temperature tolerance and stability.
The vertical microlens that forms among aforementioned two embodiment, its mirror height all can be controlled by the degree of depth that column structure immerses SU-8 photoresistance liquid, and its radius-of-curvature can reach the requirements of micro-optic/low-light electric system by the coefficient of viscosity, solvent amount and the baking condition of adjusting photoresistance liquid; In addition, the negative photoresistance (Micro Resist Technology company product) of SU-8 series thick film after the exposure of UV light source is a thermosets, its thermal cracking temperature is about 350 ℃ under 5% loss in weight, at this below temperature, SU-8 after the exposure is difficult for because of temperature effect is out of shape, loss, therefore is fit to the material as vertical microlens in the foregoing description.
The schematic perspective view that is formed vertical microlens in the foregoing description shown in Figure 4, it comprises column structure 41 and biconvex lens attached to it 42, the effect that this vertical microlens has convergence or focuses in Z-direction cross-member shown in Figure 1.
Embodiment three
See also Fig. 5, make the photoelectric subassembly platform in the present embodiment and carry preposition biconvex lens, platform etc. are higher than the lens center so that the mechanism of passive aligning to be provided, and this embodiment can be considered the blank that the present invention is applied to micro-optic/low-light electric system.
Shown in Fig. 5 A, with etch shield 52 definitions component platform on silicon substrate 51, and utilize the inductive coupling electricity to starch reactive ion etching processing procedure (Inductively Coupled Plasma-Reactive IonEtching, ICP-RIE) the etching silicon substrate 51, form the platform 51a as Fig. 5 B, this component platform can be for the photoelectric subassembly of placing as shown in Figure 1; Etching gas adopts the composition of SF6/C4F8, and etch-rate can reach about 1.3 μ m/min, and the platform etch depth is about 100 microns.
The SU-8 photoresistance 53 that adopts Micro Resist Technology company to produce in the present embodiment, put on the test piece surface in 2000rpm rotary coating mode, and after carrying out baking in 30 minutes under 115 ℃, this moment, photoresistance distributed shown in Fig. 5 C, and its thickness to platform bottom can reach about 150 microns; Then with micro-photographing process definition and formation column structure 53a, its width is about 50 microns, shown in Fig. 5 D.
Shown in Fig. 5 E, after forming this SU-8 column structure 53a, utilize method of spin coating evenly to be coated with the SU-8 photoresistance film 55 of last layer viscous fluid attitude on another silicon substrate 54, be inverted this component platform 51a and column structure 53a this moment, and vertically immerse from top to bottom in this SU-8 photoresistance film 55; After leaving standstill about 1 minute, with this component platform 51a and this column structure 53a with after this SU-8 photoresistance film 55 separates, SU-8 photoresistance 55a, 55b promptly is attached to this column structure 53a and component platform 51a top, shown in Fig. 5 F, is attached to the SU-8 photoresistance 55b on the column structure top, because of poly-in the surface tension, its xsect is string circle shape, after 115 ℃, 30 minutes toast the solvent of removing in the photoresistance, promptly forms the biconvex lens of SU-8 resistance material.
The SU-8 photoresistance 55a that is attached to component platform 51a top influences the placement of light emission component, and may cause the error of optical axis alignment, therefore must be removed; Present embodiment utilizes micro-photographing process, make and be attached to the photoresistance 55a that component platform 51a top is exposed and it removed by developer solution, photoresistance lens 55b on the column structure 53a is then because of intermolecular crosslinked reservation the mutually in the back photoresistance that exposes, shown in Fig. 5 G.Light emission component is placed on the platform 51a of present embodiment, can reach the purpose of mode correction or light beam sphering; And optical fiber receive module is placed on the component platform 51a of present embodiment, then can reach the purpose that restrains or be focused into irradiating light beam; Both all can obtain the lifting on the coupling efficiency.
Claims (10)
1. vertical microlens is characterized in that: it is to be attached to the macromolecule material biconvex lenticule that xsect on the macromolecule column structure top is string circle shape.
2. the method for making of a vertical microlens comprises following step:
Step 1: the base material of micro-optic or low-light electric system is provided, comprises the macromolecule membranous layer on substrate and the substrate at least;
Step 2: adopt micro-photographing process, definition column structure zone on this macromolecule membranous layer, the back forms the macromolecule column structure in developing;
Step 3: provide microscope carrier for the uniform liquid macroimolecule film of preparation;
Step 4: this macromolecule column structure is inverted, is vertically immersed in the prepared even liquid macroimolecule film of step 3, separate after leaving standstill a period of time, make that the liquid macroimolecule film is outstanding to be invested on this column structure, and because of the poly-lensing that is in the surface tension;
Step 5: remove the outstanding solvent in the liquid macroimolecule lens on the column structure that invests by thermal treatment, form the biconvex lenticule of tool thermal stability.
3. the method for making of a vertical microlens comprises following step:
Step 1: the base material that micro-optic or low-light electric system are provided;
Step 2: on base material, apply etch shield, after the definitions component land regions, promptly carry out etch process to form component platform;
Step 3: have on the base material of component platform in this, be covered with the photosensitive macromolecular material in the rotary coating mode;
Step 4: define the column structure zone by micro-photographing process on this photosensitive macromolecular material layer, the back of developing forms the macromolecule column structure;
Step 5: provide microscope carrier to use for the uniform liquid photosensitive macromolecular film of preparation;
Step 6: the described macromolecule column structure of step 4 is inverted, vertical this uniform liquid photosensitive macromolecular film that immerses, separate after leaving standstill a period of time, make outstanding this column structure and this component platform both sides and the top of investing of polymeric membrane, the wherein outstanding liquid macroimolecule film that invests on this column structure is because of the poly-lensing that is in the surface tension;
Step 7: remove this outstanding solvent that invests the liquid macroimolecule film of column structure and this component platform both sides and top by thermal treatment;
Step 8: remove outstanding attached photosensitive macromolecular material on this component platform by micro-photographing process, stay outstanding attached lensing photosensitive macromolecular material on this column structure, the stand-type macromolecule biconvex lenticule that promptly have component platform and tool thermal stability on the base material this moment.
4. according to the method for making of claim 2 or 3 described vertical microlens, it is characterized in that: described substrate can be silicon, aluminium oxide, glass, gallium arsenide, or made substrate such as indium phosphide.
5. according to the method for making of claim 2 or 3 described vertical microlens, it is characterized in that: described microscope carrier is a flat surfaces, can be for holding the liquid macroimolecule film.
6. according to the method for making of claim 2 or 3 described vertical microlens, it is characterized in that: described microscope carrier has groove, can be for holding the liquid macroimolecule film.
7. according to the method for making of claim 2 or 3 described vertical microlens, it is characterized in that: wherein the thermal cracking temperature of liquid macroimolecule film is higher than 200 ℃.
8. according to the method for making of claim 2 or 3 described vertical microlens, it is characterized in that: wherein this biconvex lenticule can be single material lenticule or composite lenticule by the selecting for use of macromolecular material.
9. according to the method for making of claim 2 or 3 described vertical microlens, it is characterized in that: wherein the lenticular radius-of-curvature of this biconvex can be controlled by the viscosity of adjusting the liquid macroimolecule film.
10. according to the method for making of claim 2 or 3 described vertical microlens, it is characterized in that: wherein the lenticular mirror height of this biconvex can be controlled by the degree of depth that immerses the liquid macroimolecule film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200510085684 CN1713001A (en) | 2005-07-26 | 2005-07-26 | Vertical microlens and production thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200510085684 CN1713001A (en) | 2005-07-26 | 2005-07-26 | Vertical microlens and production thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1713001A true CN1713001A (en) | 2005-12-28 |
Family
ID=35718690
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200510085684 Pending CN1713001A (en) | 2005-07-26 | 2005-07-26 | Vertical microlens and production thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1713001A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100461003C (en) * | 2006-01-04 | 2009-02-11 | 台湾积体电路制造股份有限公司 | Hemi-spherical structure and method for fabricating the same |
| CN106154375A (en) * | 2015-03-24 | 2016-11-23 | 福州高意光学有限公司 | A kind of compound micro-aspheric surface or micro-aspheric cylindrical mirror manufacture method |
| CN113608285A (en) * | 2021-06-30 | 2021-11-05 | 中国科学院高能物理研究所 | Ni column-assisted PMMA (polymethyl methacrylate) microlens array and preparation method thereof |
-
2005
- 2005-07-26 CN CN 200510085684 patent/CN1713001A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100461003C (en) * | 2006-01-04 | 2009-02-11 | 台湾积体电路制造股份有限公司 | Hemi-spherical structure and method for fabricating the same |
| CN106154375A (en) * | 2015-03-24 | 2016-11-23 | 福州高意光学有限公司 | A kind of compound micro-aspheric surface or micro-aspheric cylindrical mirror manufacture method |
| CN106154375B (en) * | 2015-03-24 | 2018-12-28 | 福州高意光学有限公司 | A kind of compound micro- aspherical or micro- aspherical cylindrical mirror production method |
| CN113608285A (en) * | 2021-06-30 | 2021-11-05 | 中国科学院高能物理研究所 | Ni column-assisted PMMA (polymethyl methacrylate) microlens array and preparation method thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN1341224A (en) | Optical fiber component with shaped optical element and method of making same | |
| EP2916151B1 (en) | Method of forming a fiber coupling device | |
| CN109079318B (en) | Femtosecond laser preparation system and method for silicon photonic crystal waveguide device | |
| JPS6252502A (en) | Manufacture of microlens | |
| JP2004505816A (en) | Solid buried lens structure and method of manufacturing solid buried lens structure | |
| EP1865377A2 (en) | Method of manufacturing high sag micro-lens and high sag micro-lens manufactured thereby | |
| RU2745516C2 (en) | Ink composition for impressing, method of impressing, light device, optical sensor and photoelectric device with optical element | |
| US5871888A (en) | Method of forming multiple-layer microlenses and use thereof | |
| CN1713001A (en) | Vertical microlens and production thereof | |
| Yuan et al. | Soft-lithography-enabled fabrication of large numerical aperture refractive microlens array in hybrid SiO2–TiO2 sol-gel glass | |
| CN1688516A (en) | Lens array, method for fabricating the lens array and photosensitive glass plate | |
| KR20050084025A (en) | Polymeric optical device structures having controlled topographic and refractive index profiles | |
| CN1451531A (en) | Optical material, optical element, stacked diffraction optical element, optical system and method for forming optical element | |
| TW200420901A (en) | Method for making optical device structures | |
| US7635555B2 (en) | Method for fabricating polymer ridged waveguides by using tilted immersion lithography | |
| CN1751255A (en) | Passive alignment of optical fibers with optical elements | |
| CN1875304A (en) | Waveguide forming methods and waveguides fabricated therefrom | |
| CN215067651U (en) | Liquid crystal lens, optical device, light modulation device, and imaging apparatus | |
| US7097778B2 (en) | Process for fabricating a micro-optical lens | |
| Goraus et al. | 3D photonic crystals for direct applications in light emitting devices | |
| CN1246848C (en) | Miniature optical pickup head module, and its manufacture method and view finding objective lens manufacturing method | |
| CN1797043A (en) | Method for fabricating microlens | |
| US20230393357A1 (en) | Integrated Freeform Optical Couplers And Fabrication Methods Thereof | |
| JPH02165932A (en) | Manufacture of microlens array | |
| CN114280706B (en) | Preparation method of double-photoresist micro-array lens based on UV laser direct writing photoetching |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |