CN1708402A - Method and device for feeding dampening water in offset printing press - Google Patents
Method and device for feeding dampening water in offset printing press Download PDFInfo
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- CN1708402A CN1708402A CN 200380102157 CN200380102157A CN1708402A CN 1708402 A CN1708402 A CN 1708402A CN 200380102157 CN200380102157 CN 200380102157 CN 200380102157 A CN200380102157 A CN 200380102157A CN 1708402 A CN1708402 A CN 1708402A
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Abstract
A method of feeding appropriate dampening water in an offset printing press, comprising the steps of detecting the viscosity of dampening water at room temperature, selectively adding at least two of water and a surface active agent to the dampening water so that the viscosity of the dampening water becomes a target value, and feeding the dampening water having the target viscosity to the offset printing press at the room temperature, whereby since the viscosity of the dampening water (13) can be brought near into the target value suitable for printing by adding water or the surface active agent to the dampening water (13), the dampening water (13) can be fed at the room temperature without heating or cooling the dampening water.
Description
Technical field
The present invention relates to a kind of method and apparatus that is used at the supply Wetting Solution of offset press.
Background technology
In offset printing technology, for the repulsive interaction by water and oils China ink is optionally used China ink at grade the printing zone of forme, at first by using the Wetting Solution feedway on the whole surface of forme, to use Wetting Solution (or water) equably, then by using ink roller on the whole surface of forme, to be coated with China ink.The reason that Clicks here because the non-printing zone of forme has been carried out hydrophilic treated, on the other hand, has been carried out the lipophilic processing to printing zone, has formed the film of Wetting Solution and be not coated with China ink on non-printing zone, and China ink only is coated in printing zone.China ink on the forme on the printing zone is in case transfer on the rubber surface of blanket cylinder, thereafter just by the gap between blanket cylinder and the impression cylinder as image transfer to printing sheets, i.e. paper web.
As mentioned above, in hectographic printing, used Wetting Solution, and in this Wetting Solution, added the etchant solution (etchant) of similar weak acid solution, thereby reduced the affinity of the printing zone of forme for oil.Usually consider that the pH value that Wetting Solution has in 4.5 to 6.5 scopes is more appropriate.Be lower than in the pH value under the situation of above-mentioned scope (promptly, hydrogen ion concentration improves), forme is corroded, its serviceable bife shortens thus, on the contrary, under the pH value is higher than the situation of above-mentioned scope (that is, hydrogen ion concentration reduces), the estranged ability of printing zone reduces, or causes producing the risk of the black emulsification generation of the pollution in the printing on the forme (printing is polluted).Usually, in order to make printing quality stable, the concentration of etchant is controlled by indicated pH value.
In addition, require Wetting Solution on the non-printing zone of forme, to be diffused as film.Therefore, in the prior art, add the surfactant such as the ethanol class in Wetting Solution, for example isopropyl alcohol, alcohol etc. make Wetting Solution evenly diffuse throughout on the non-printing zone of forme.Can use other surfactant instead of ethanol class such as ethylene glycol.
Yet, even the concentration of Wetting Solution etchant with pointed pH value control, in some cases, is printed and is polluted and will take place inevitably.In this case, known by experience, the temperature control or the management of Wetting Solution are very important for stablizing printing quality.That is, under the very big situation about changing of the temperature of Wetting Solution, Wetting Solution also greatly changes for the coating or the adhesion of non-printing zone, and the character of China ink also changes, and has caused unsettled printing quality.For example, in summer, the temperature of Wetting Solution raises along with the rising of environment temperature, and therefore, the quantitative change that is retained in the Wetting Solution of non-printing zone gets inhomogeneous, and it is easy to cause printing the generation of pollution.By the temperature of control Wetting Solution, Wetting Solution can be diffused on the non-printing zone of forme fully, therefore, can improve printing quality.In addition, expectation remains on the temperature of Wetting Solution in 9 to 15 ℃ the scope.
In conventional art,, adopted the Wetting Solution automatic adjustment equipment in order to manage the pH value and the temperature of Wetting Solution.This Wetting Solution automatic adjustment equipment by response from the signal that is arranged on the pH value detector in the Wetting Solution adjustment jar and the Wetting Solution in Wetting Solution adjustment jar adds etchant or water and carries out the pH of Wetting Solution and adjust, and operate refrigerator or heater by response from the signal of temperature measuring equipment and carry out Wetting Solution temperature adjustment (for example, disclosed) as the open No.SHO60-3994 of Japan Patent.
In addition, pH value and the temperature that is used to control or manage the faintly acid Wetting Solution keeps constant traditional Wetting Solution method of adjustment and equipment can comprise following shortcoming.
(1) owing to will control the temperature of Wetting Solution, so will drive refrigerator and heater throughout the year, this causes that power consumption increases.
(2) owing to be used for the power supply of refrigerator or heater, promptly thermal source is arranged near the printing machine, so the environmental condition variation around the workplace, particularly in summer.
(3) owing to will control the temperature of Wetting Solution, Wetting Solution circulates between the water storage part (as wetting source) of Wetting Solution device that must be in being arranged at offset press and the temperature control unit, thereby cooling or heating Wetting Solution for this reason, must always drive circulating pump.
(4) because Wetting Solution contacts with ink roller, and Wetting Solution is subjected to the pollution of China ink, solvent etc. always circulate between wetting source and temperature control unit, thereby need filter to filter contaminated Wetting Solution.
(5) because dew is easy to be formed on the Wetting Solution feed path, particularly in summer, between the room temperature of temperature and the printing office of this place's Wetting Solution, there is bigger difference, must blocks circulating water channel or pipe, wetting source etc. between printing machine and the temperature control unit by using isolated part.In addition, do not isolate or situation that isolated part peels off under, dew can be dropped on the printing paper, and has hindered black transfer, destroys printing quality, causes inconvenience thus.
(6) to adjust equipment itself relatively more expensive for Wetting Solution, and the ability of considering refrigerator and heater is necessary for printing machine usually a Wetting Solution adjustment equipment is set, and this has caused the increase of printing cost and maintenance cost, brings problem thus.
(7) because contaminated Wetting Solution will circulate, must change filter or periodically clean the Wetting Solution jar, its detection or safeguard is pretty troublesomely made troubles thus.
For fear of above-mentioned shortcoming and defect, therefore purpose of the present invention is to provide a kind of feeding dampening water method and equipment that is used for offset press.
Summary of the invention
Below will introduce the present invention.In addition, for convenience for understanding understanding of the present invention, although the Reference numeral that uses on accompanying drawing is added with bracket, the present invention is not limited in the accompanying drawing to be introduced therefrom
Embodiment.
Present inventor conception is to solve problem or the defective that faces in the prior art with the normal temperature Wetting Solution, and by using physical device etc. to utilize Wetting Solution repetition test under the room temperature, by these tests, finds the following fact.
(1) as shown in Figure 3, when the temperature of Wetting Solution exceeded 18 ℃ or the left and right sides, the viscosity of Wetting Solution was impaired, and the quantitative change that remains on the lip-deep Wetting Solution of forme gets inhomogeneous, it will cause the amount part of Wetting Solution on the plate face to be accumulated, and cause the pollution on it thus.This situation about not expecting solves by the viscosity that increases Wetting Solution in advance, even in for example 40 ℃ the temperature of Wetting Solution, be the value that reaches the temperature place of 16 ℃ of Wetting Solutions thereby keep viscosity.In addition, although add the undue increase that etchant (etching solution) can cause pH value for increasing the Wetting Solution viscosity, this situation with by utilize interpolation not or the less additive that the pH value is exerted an influence increase its viscosity and solve.Otherwise this situation can solve by adding surfactant or viscosity dose.The viscosity dose can be included in the etchant, but it can add mutually independently with etchant, thereby increases viscosity.Promptly, printing quality obviously with relevant its temperature that is far more than of viscosity of Wetting Solution itself, therefore, become can be by measuring Wetting Solution viscosity and add viscosity dose such as the additive of ethylene glycol subsequently thereby to keep the viscosity of Wetting Solution be predetermined value, and on the plate face, keep solution film thickness certain, even the temperature of Wetting Solution changes.
(2) consider pH value, because chemical reaction activates according to the increase of temperature, acidity weakens in an alkaline side, pH value increase thus.Yet this situation is with by suitably adding water or etchant solves.
The present invention proposes on the basis of considering above-mentioned knowledge and discovery, invention according to claim 1 provides a kind of method of supplying with Wetting Solution for offset press, it comprises step: the viscosity that detects Wetting Solution at normal temperatures, thereby optionally add the Wetting Solution that water and surfactant at least obtain the target k value, and at normal temperatures the Wetting Solution of target viscosity is supplied to offset press to Wetting Solution.
The invention of claim 2 provides a kind of method of supplying with Wetting Solution for offset press, comprise step: the viscosity that detects Wetting Solution at normal temperatures, thereby optionally add the Wetting Solution that water at least, surfactant or viscosity dose 31 obtain the target k values, and at normal temperatures the Wetting Solution of target viscosity is supplied to offset press to Wetting Solution.
In addition, the invention of claim 3 provides a kind of method of supplying with Wetting Solution for offset press, comprise step: the viscosity that detects Wetting Solution 13 at normal temperatures, optionally to Wetting Solution 13 add water at least, etchant (etching solution) thus 18 and the viscosity dose obtain the Wetting Solution of target pH value and target viscosity, and at normal temperatures the Wetting Solution 13 of target pH value and target viscosity is supplied to offset press.
The invention of claim 4 be according in the claim 1 to 3 any one describedly supply with the method for Wetting Solution for offset press, wherein Wetting Solution 13 by one way system to be supplied to offset press extraly with the corresponding amount of its consumption.
In addition, the invention of claim 5 provides a kind of equipment that is used for supplying with to offset press Wetting Solution, thus comprise the blending tank 14 that is used for adjusting at normal temperatures Wetting Solution, be used for measuring the viscosity of blending tank Wetting Solution 13 viscosity measuring unit 35, be used for Wetting Solution to blending tank and optionally add the feed unit that water and surfactant at least obtain the adding device 36 of target viscosity and is used for supplying with to offset press at normal temperatures the Wetting Solution with target viscosity.
The invention of claim 6 provides a kind of equipment that is used for supplying with to offset press Wetting Solution, thereby comprise the blending tank 14 that is used for adjusting at normal temperatures Wetting Solution, be used for measuring the viscosity of blending tank Wetting Solution 13 viscosity measuring unit 35, be used for Wetting Solution 13 to blending tank and optionally add the feed unit that water, surfactant and viscosity dose 31 at least obtain the adding device 32,36 of target viscositys and be used for supplying with to offset press at normal temperatures the Wetting Solution with target viscosity.
In addition, the invention of claim 7 provides a kind of equipment that is used for supplying with to offset press Wetting Solution, comprises the blending tank 14 that is used for adjusting at normal temperatures Wetting Solution, be used for measuring the pH measurement of concetration unit 29 of blending tank Wetting Solution 13pH value, be used for measuring the viscosity measuring unit 35 of the viscosity of blending tank Wetting Solution, be used for optionally adding water at least to the Wetting Solution of blending tank, thereby etchant and viscosity dose 31 obtain the adding device 36 of target pH value and target viscosity, 26,32, and the feed unit 44 that is used for supplying with to offset press at normal temperatures Wetting Solution 13 with target pH value and target viscosity.
The invention of claim 8 provides according to any described equipment that is used for supplying with to offset press Wetting Solution in the claim 5 to 7, wherein be used for to the feed unit that offset press is supplied with Wetting Solution 13 be provided with connect blending tank 14 to the unidirectional conduit 44 in wetting source 5, be used to detect the water level meter 45 of wetting source Wetting Solution water level and be used to respond supply with the valve 46 of Wetting Solutions extraly to wetting source 5 by opening unidirectional conduit 44 from the signal of water level meter 45.
Description of drawings
Fig. 1 is the diagrammatic side view of a unit of offset press;
Fig. 2 is the system block diagram that illustrates according to the Wetting Solution feedway of first embodiment of the invention 1;
Fig. 3 shows the curve that concerns between expression viscosity of Wetting Solution and the temperature;
Fig. 4 is the system block diagram that illustrates according to the Wetting Solution feedway of second embodiment of the invention 2; And
Fig. 5 is the system block diagram that illustrates according to the Wetting Solution feedway of third embodiment of the invention 3.
The specific embodiment
Below, will introduce each embodiment of the present invention.
[first embodiment 1]
As shown in Figure 1, offset press (or printing machine) is provided with Wetting Solution transfer device 2, ink transfer device 3 and blanket cylinder 4, and they are listed in as roll row around the plate cylinder 1 along its direction of rotation.The quantity of unit and arranging obviously according to the type of printing machine and difference.
Wetting Solution transfer device 2 be provided with the storage Wetting Solution water (solution) boat 5, with wetting source 5 in the contacted dampening roller 6 of Wetting Solution, be wrapped on every side forme (not shown) of plate cylinder 1, and the contacted wetting forming rolls of plate face (dampening form roller) 7 of forme and be arranged in single or multiple intermediate calender rolls 8 between roller 6 and 7.Along with the rotation of dampening roller 6, Wetting Solution takes out from wetting source 1, transfers to wetting forming rolls 7 through intermediate calender rolls 8, and with after wetting forming rolls 7 is transferred to the surface of plate cylinder 1.In this operating period, the solution in the wetting source 1 adheres to the surface of plate cylinder 1 as film through dampening roller 6, intermediate calender rolls 8 and wetting forming rolls 7.
Sheet rubber be wrapped in blanket cylinder 4 outer surfaces around, adhere to the surface that the China ink on the printing zone of plate cylinder 1 plate face shifted and adhered to this sheet rubber.For this blanket cylinder 4, impression cylinder (not shown) or another blanket cylinder contact with it, and the China ink on the blanket cylinder 4 transfers on the printing paper by blanket cylinder 4 and impression cylinder, and promptly paper web carries out printing operation thus.
Wetting Solution is supplied with Wetting Solution transfer device 2 by feeding dampening water method and the equipment that will introduce below.
As previously mentioned, the feeding dampening water method is utilized following true, promptly thereby to make the viscosity of Wetting Solution reach the water film thickness of predetermined value on can the holding plate face constant by add water or viscosity dose in Wetting Solution, even solution temperature changes, and thus can be by suitably add the problem that water or etchant solve relevant Wetting Solution pH value to Wetting Solution.Therefore, in the method, detect the viscosity of Wetting Solution under the normal temperature, optionally add water, etchant and viscosity dose at least to Wetting Solution, make the pH value and the viscosity of Wetting Solution reach predetermined target value respectively, subsequently, the Wetting Solution of target pH value and viscosity is supplied with offset press at normal temperatures.
In addition, in this feeding dampening water method, the expectation Wetting Solution with unidirectional supply mode additionally supplying with in offset press with the corresponding amount of its consumption, and the Wetting Solution that do not circulate therein.
Wetting Solution described herein is by utilizing for example 30 to 50 times of normal-temperature water dilution etchants (or etching solution) preparation, the pH value that expectation is used for keeping printing quality is for example 4.5 to 6.5, and it can be according to the type of printing sheets, printing zone, China ink, plate cylinder etc. and difference.In addition, the viscosity of expectation is about 1.3 pools.
Etchant has different compositions according to the kind of forme, for example, comprises weak acid such as phosphoric acid, chromic acid or tannic acid, those sour salt, such as the colloidal materials of Arabic gum or such as the surfactant of ethylene glycol.
As the viscosity dose, select and the irrelevant material of the increase of pH value, promptly substantially not or the change of little effect pH value, and for example can use ethylene glycol as surfactant.
As the water that is used to dilute etchant etc., will adopt the running water of normal temperature in the present embodiment.Although may cause the calcium composition that is included in the running water accumulates in the Wetting Solution transferring roller or gives on the rubber surface of ink roller, the situation that the function of roller may be suffered damage, in order to prevent this defective, can according to circumstances require provides known demineralizer for running water pipe.
As mentioned above, because the viscosity of Wetting Solution reaches the target k value that is suitable for printing, Wetting Solution can be supplied to offset press at normal temperatures and need not heating or cooling.For example, under the situation that environment temperature improves and the viscosity of Wetting Solution reduces thus, can consider in Wetting Solution, to add etchant and improve its viscosity.Yet, to add corresponding to this, the pH value of Wetting Solution can be reduced to an acid side, and estranged ability (desensitisation) is undue to be increased, and will produce the phenomenon that China ink can't adhere to the printing zone part.Consider this situation, in the present invention, add the viscosity dose that does not have influence for the raising of pH value mutually independently with the interpolation of etchant, thereby increase the viscosity of Wetting Solution thus, as shown in Figure 3.Among Fig. 3, because shown in the curve during as 3.5% dilution factor, Wetting Solution provides 1.3 k value for 30 ℃ in temperature, Wetting Solution can evenly diffuse throughout on the non-printing zone of forme or cylinder, in press any pollution can not take place on it.Yet, when changing in the change of pH value response atmospheric temperature, can be by in Wetting Solution, adding water or etchant remain in predetermined value with the pH value.
Offset press feeding dampening water method with above-mentioned feature will be carried out by using Wetting Solution supply arrangement shown in Figure 2.
As shown in Figure 2, thus the Wetting Solution supply arrangement be included under the normal temperature blending tank 14 of adjusting Wetting Solution 13, be used for measuring the pH value of blending tank 14 Wetting Solutions 13 pH measurement of concetration unit, be used for measuring the viscosity of blending tank 14 Wetting Solutions 13 the viscosity measuring unit, be used for Wetting Solution 13 to blending tank 14 and optionally add the Wetting Solution feed unit that water, etchant and viscosity dose at least obtain the adding device of target pH value and viscosity and be used for having to the offset press supply at normal temperatures the Wetting Solution 13 of target pH value and viscosity.
The main NaOH solution tank NaOH 15 of etchant and the inferior NaOH solution tank NaOH 16 of etchant are arranged in the upstream side of blending tank 14.In main NaOH solution tank NaOH 15, storing high concentration etchant 17, on the other hand, in inferior NaOH solution tank NaOH 16, storing low concentration etchant 18.High concentration etchant 17 in the main NaOH solution tank NaOH 15 through extend to from main NaOH solution tank NaOH 15 time NaOH solution tank NaOH 16 transport pipe or conduit 19 is supplied to time NaOH solution tank NaOH 16.For this conduit 19 is provided with pump 19, flowmeter 21 and magnetic valve 22.Running water pipe 23 is connected to time NaOH solution tank NaOH 16, and running water pipe 23 is provided with flowmeter 24 and magnetic valve 25 for this reason.Conduit 26 extends to blending tank 14 from inferior NaOH solution tank NaOH 16 and adds parts as etchant, thereby supplies with low concentration etchant 18, and for this conduit 26 flowmeter 27 and magnetic valve 28 is set.Also pH densimeter 29 is set as pH measurement of concetration unit, is used for measuring the pH value of Wetting Solution in the blending tank 14 for blending tank 14.
Main NaOH solution tank NaOH 15 for example has the capacity greater than 200 liters (litters), the high concentration etchant 17 that concentration is higher than traditional etchant of selling of merchant is stored in this main NaOH solution tank NaOH 15, and the work by pump 20 quantitatively the etchant 17 of (for example 10 liters) be supplied to inferior NaOH solution tank NaOH 16.On the other hand, in inferior NaOH solution tank NaOH 16, for example 30 liters quantitative running water is added in the main etching solution 17, thereby preparation example is as the inferior etching solution 18 of 25% concentration.In addition, main etching solution 17 will stir automatically by the supply pressure of running water.As mentioned above, in the present invention, because etchant is to be supplied to blending tank 14 after progressively diluting its concentration, so the mixed solution of etchant can effectively preparation in blending tank 14.
Etchant 18 in the inferior NaOH solution tank NaOH 16 sequentially is supplied to blending tank 14 by opening magnetic valve 28 through conduit 26, and the Wetting Solution in blending tank 14 is designated as target pH value by pH densimeter 29.After reaching target pH value, magnetic valve 28 cuts out and cuts off etchant stream.
Upstream side at blending tank 14 is provided with viscosity dose jar 30.Conduit 32 extends towards blending tank 14 downwards from viscosity dose jar 30 as viscosity dose supply part, and for this conduit 32 flowmeter 33 and magnetic valve 34 is set.Resistance value densimeter 35 is arranged in the blending tank 14, as the viscosity measurement component, is used for measuring the viscosity of blending tank 14 normal temperature Wetting Solutions.Owing to consider that the concentration of Wetting Solution 13 is relevant with viscosity, the concentration of measuring by resistance value densimeter 13 is used as viscosity in this embodiment.Viscosity dose 31 in the viscosity dose jar 30 is supplied to blending tank 14 by opening magnetic valve 34, and after detecting the target viscosity by resistance value densimeter 35, magnetic valve 34 cuts out and cut off the interpolation of viscosity dose.
Be used for being stored under the normal temperature blending tank 14 preparations Wetting Solution 13 the water distribution tank or only be the downstream that distribution tank 40 is arranged in blending tank 14.Blending tank 14 and water distribution tank 40 are communicated with through conduit 41, and conduit 41 is provided with magnetic valve 42.When magnetic valve 42 was opened, the Wetting Solution in the blending tank 14 flowed out with scheduled volume.The amount that flows into the Wetting Solution 13 in the distribution tank 40 detects by water level meter 43, detect reach predeterminated level after, magnetic valve 42 cuts out and cuts off subsequently the inflow of Wetting Solution 13.
In described embodiment, be provided with two cover blanket cylinder relative rolling types (blanket-to-blanket), four coloring agent printing machines, as shown in Figure 2, the Wetting Solution in the water distribution tank 13 is supplied to the Wetting Solution feeding device 2 of each offset press through predetermined feed unit etc.Obviously Wetting Solution 13 directly can be supplied to offset press.
These feed units comprise that connection is arranged on the unidirectional conduit 44 of the distribution tank 40 in blending tank 14 downstreams to the wetting source 5 of Wetting Solution transfer device 2, be used for detecting the water level detector 45 of water level of the Wetting Solution 13 in wetting source 5, and play response and indicate the signal of Wetting Solutions 13 water levels reduction and open the magnetic valve 46 of the effect of unidirectional conduit 44 from water level meter 45, supply with Wetting Solution 13 thus to each wetting source 5.
Main pipe 44a extends to each surge tank 47 from water distribution tank 40, thereby supplies with by the Wetting Solution in pump 48 pumpings that are arranged on distribution tank 40 1 sides.Main pipe 44a is provided with magnetic valve 49 for each surge tank 47, and when the water level meter 50 that is provided with for each surge tank 47 detects predetermined water level, thereby magnetic valve 49 cuts out cut-out Wetting Solution stream.Surge tank 47 is arranged on the position higher level place of printing machine one side than wetting source 5, and therefore, Wetting Solution can be supplied to wetting source 5 from surge tank 47 according to siphon principle.
In addition, for the bypass ducts 44b that is connected to main pipe 44a front end is provided with magnetic valve 46, response is from the signal of the water level meter 45 that is used for each wetting source 5, and these magnetic valves 46 open or close thus and supply with Wetting Solution 13 to wetting source 5.That is, the Wetting Solution 13 with the corresponding amount of amount of printing machine consumption is supplied to wetting source 5 from surge tank 47 respectively.In addition,, therefore do not exist in the risk that wetting cementing reveals during the supply, make that can need not that main pipe 44a and bypass ducts 44b are carried out any heat isolates because Wetting Solution 13 is supplied to bypass ducts 44b at normal temperature.
Then, the function or the operation of the Wetting Solution supply arrangement of said structure will be introduced below.
As shown in Figure 2, the etchant 17 in the main NaOH solution tank NaOH 15 together is supplied to time NaOH solution tank NaOH 16 with running water, and mixing prepares low concentration etchant 18 thus therein.The magnetic valve 22 controlled from the signal of flowmeter 21 and 24 by response of Zhi Bei low concentration etchant 18 and 25 on/off operation are adjusted at normal temperatures thus.
Low concentration etchant 18 is supplied to blending tank 14 at normal temperatures, and etchant 18 mixes with running water and viscosity dose 31 and prepares Wetting Solution 13 thus in blending tank 14.In this operation, by the operation of water level meter 39, pH densimeter 29, resistance value densimeter 35 and various magnetic valve 28,34 and 38, can adjust and prepare the Wetting Solution 13 that viscosity and pH value are suitable for printing operation, and not consider the change of environment temperature etc.Particularly; predetermined quantitative running water at first is supplied in the blending tank 14; from viscosity dose jar 30, add viscosity dose 31 (promptly according to the water temperature in the Normal Environmental Temperature subsequently to it; when high water temperature, add relatively large viscosity dose, when hanging down water temperature, add viscosity dose in a small amount).That is, add viscosity dose 31 reaches printing operation under the water temperature that is suitable at that time up to the viscosity that is detected by resistance densimeter 35 viscosity.In addition, etchant 18 splashes into the blending tank 14 from inferior NaOH solution tank NaOH 16, reaches the value that is suitable for printing operation up to the pH value, mixes in blending tank 14 with viscosity dose 31 with as the running water of dilute solution subsequently.That is, add etchant 18 and reach the pH value that is suitable for printing operation under this water temperature up to the pH value of surveying by pH densimeter 29.
The Wetting Solution 13 that adjustment has target viscosity and pH value is transported to distribution tank 40 from blending tank 14.In this operation, when distribution tank 40 was full of Wetting Solution, 13 of the Wetting Solutions in the blending tank 14 were retained in wherein.Thus, can prevent that Wetting Solution 13 is assigned to printing machine before stablizing viscosity and pH value, therefore, can distribute continual and steady Wetting Solution to printing machine.
Wetting Solution 13 in the distribution tank 40 is supplied to printing machine through surge tank 47 and main pipe 44a, and thereafter, the bypass ducts 44b through being connected to each main pipe 44a is supplied to the water boat 5 of each Wetting Solution feeding device 2 of printing machine.
As shown in Figure 1, when driving printing machine, dampener 6 is rotated in each wetting source 5, thereby Wetting Solution is drained out from wetting source 5, and Wetting Solution is transported to wetting forming rolls 7 by intermediate calender rolls 8, is transported to plate cylinder 1 from wetting forming rolls 7 subsequently.Thus, as mentioned above, Wetting Solution 13 adheres on the plate cylinder 1 through the rotation of intermediate calender rolls 8 and wetting forming rolls 7 with the form of film.
On the other hand, thereby roller 9 rotations in source drain out China ink from black source 12, and China ink is joined the surface that ink roller 11 mixes and be transported to by forming rolls 10 plate cylinder 1 by the centre.Thus, China ink adheres on the surface of plate cylinder 1 with the form of film by source roller 9, the rotation of joining ink roller 11 and forming rolls 10.
Blanket cylinder 4 contacts with plate cylinder 1, impression cylinder or another blanket cylinder (not shown) according to the China ink of transferring to blanket cylinder 4 from plate cylinder 1 with after the mode that printing sheets (being paper web) is transferred in blanket cylinder 4 and the gap between the impression cylinder therewith blanket cylinder 4 contact, thus printing sheets is printed.
According to printing operation, consumed the Wetting Solution in the wetting source 5, when water level meter 45 detects the water level decline of the Wetting Solution 13 in the boat 5, open for the magnetic valve 46 that bypass ducts 46 is provided with, compensate the Wetting Solution 13 in the wetting source 5 thus.In addition, when the water level in surge tank 47 descended, pump 48 responded from the signal of water level meter 50 and operates, thereby supplies with Wetting Solution 13 from distribution tank 40 respectively to each surge tank 47.
[second embodiment 2]
As shown in Figure 4, the Wetting Solution supply arrangement of the offset press of this second embodiment 2 be included under the normal temperature blending tank 14 of adjusting Wetting Solution 13, be used for measuring the viscosity of blending tank 14 Wetting Solutions 13 the viscosity measuring unit, be used for Wetting Solution 13 to blending tank 14 and optionally add at least water and surfactant with adding device that obtains the target viscosity and the Wetting Solution feed unit that is used for supplying with to offset press at normal temperatures Wetting Solution 13 with target viscosity.
According to aforesaid way, the viscosity of the Wetting Solution 13 in the blending tank 14 is measured by resistance value densimeter 35, and adds water or surfactant.Therefore, because the viscosity of Wetting Solution 13 reaches the target viscosity that is fit to printing operation, Wetting Solution can be supplied to printing machine at normal temperatures, and need not heating or cooling, carries out the printing operation that is fit to thus.
[the 3rd embodiment 3]
As shown in Figure 5, thus the Wetting Solution supply arrangement of the offset press of this 3rd embodiment 3 be included under the normal temperature blending tank 14 of adjusting Wetting Solution 13, be used for measuring the viscosity of blending tank 14 Wetting Solutions 13 the viscosity measuring unit, be used for Wetting Solution 13 to blending tank 14 and optionally add the Wetting Solution feed unit that water, surfactant 52 and viscosity dose 31 at least obtain the adding device of target viscositys and be used for supplying with to offset press at normal temperatures the Wetting Solution 13 with target viscosity.
The resistance value densimeter 35 that is used for measuring at normal temperatures the viscosity of Wetting Solution 13 as the viscosity measurement component is arranged in the blending tank 14.In this embodiment, owing to think that the concentration of Wetting Solution is relevant with its viscosity, utilize the concentration of measuring by resistance value densimeter 35 as viscosity.When the magnetic valve 55 of conduit 53 was opened, the surfactant 52 in the surfactant jar 51 flowed in the blending tank 14, and when the magnetic valve 34 of conduit 32 was opened, the viscosity dose 31 in the viscosity dose jar 30 flowed in the blending tank 14.When resistance value densimeter 35 detected the target viscosity, magnetic valve 55 and 34 cut out the interpolation of cutting off surfactant 52 and viscosity dose 31 thus.
According to aforesaid way, the viscosity of the Wetting Solution 13 in the blending tank 14 is measured by resistance value densimeter 35, and optionally adds water, surfactant and viscosity dose.Therefore, because the viscosity of Wetting Solution 13 reaches the target viscosity that is suitable for printing operation, Wetting Solution can be supplied to printing machine at normal temperatures, and need not heating or cooling, carries out the printing operation that is fit to thus.
As mentioned above, be used for according to offset press feeding dampening water method of the present invention, detect the viscosity of Wetting Solution under the normal temperature, optionally add water and surfactant at least to Wetting Solution, obtain the target viscosity thus, the Wetting Solution of target viscosity is supplied to offset press at normal temperatures.
According to this method, because by adding water to Wetting Solution 13 or surfactant makes the viscosity of Wetting Solution 13 reach the desired value that is suitable for printing operation, can supply with Wetting Solution at normal temperatures and need not heating or cooling.
In addition, in the feeding dampening water method that is used for offset press according to the present invention, detect the viscosity of Wetting Solution under the normal temperature, optionally add water, surfactant and viscosity dose at least to Wetting Solution, obtain the target viscosity thus, the Wetting Solution of target viscosity is supplied to offset press at normal temperatures.
According to this method, because the viscosity of Wetting Solution 13 reaches the desired value that is suitable for printing operation by optionally adding water, surfactant and viscosity dose to Wetting Solution 13, it can be supplied with at normal temperatures and need not to heat or cooling.
Again in addition, in the feeding dampening water method that is used for offset press according to the present invention, detect the pH value and the viscosity of Wetting Solution under the normal temperature, optionally add water, etchant 18 and viscosity dose 31 at least to Wetting Solution, obtain target pH value and viscosity thus, and supply with the Wetting Solution of target pH value and viscosity at normal temperatures to offset press.
According to this method, because the viscosity of Wetting Solution 13 is by optionally adding water and viscosity dose 31 reaches the desired value that is fit to printing operation to Wetting Solution 13, it can be supplied with at normal temperatures and need not heating or cooling.In addition, because the pH value that the change of environment temperature causes changes can solve by interpolation water or etchant 18.Therefore, need not to be provided with any heating unit or cooling unit, and also need not to carry out heat insulation processing and prevent dewfall, thereby saved the energy, saved the space, and can realize the improvement of printing machine surrounding environment.
In addition, in feeding dampening water method of the present invention, Wetting Solution can be supplied with through unidirectional feedway with the amount corresponding to consumption.
According to this mode, Wetting Solution is supplied to printing machine and does not circulate through non-return device, makes to eliminate circulating pump or filter for filtration are set.
On the other hand, thus the Wetting Solution supply arrangement that is used for offset press of the present invention be included under the normal temperature blending tank 14 of adjusting Wetting Solution, be used for measuring the viscosity of blending tank 14 Wetting Solutions 13 viscosity measurement component 35, be used for Wetting Solution 13 to blending tank 14 and optionally add water and surfactant and obtain the interpolation parts 36 of Wetting Solution of target viscosity and the feed unit that is used for supplying with to offset press at normal temperatures Wetting Solution with target viscosity.
According to this equipment, because the viscosity of Wetting Solution 13 can also utilize interpolation parts 36 optionally to add water by the viscosity that utilizes Wetting Solution 13 in the viscosity measurement component 35 measurement blending tanks 14 and surfactant reaches the desired value that is fit to printing operation, Wetting Solution 13 can be supplied with at normal temperatures and need not to heat or cool off.
In addition, thus the Wetting Solution supply arrangement that is used for offset press of the present invention be included under the normal temperature blending tank 14 of adjusting Wetting Solution, be used for measuring the viscosity of blending tank 14 Wetting Solutions 13 viscosity measurement component 35, be used for Wetting Solution 13 to blending tank 14 and optionally add water, surfactant and viscosity dose 31 and obtain the interpolation parts 32,36 of Wetting Solution of target viscositys and the feed unit that is used for supplying with to offset press at normal temperatures Wetting Solution with target viscosity.
According to this equipment, because the viscosity of Wetting Solution 13 can add parts 36 and optionally add water, surfactant and viscosity dose 31 and reach the desired value that is fit to printing operation by utilizing viscosity measurement component 35 to measure the viscosity of Wetting Solution 13 in the blending tanks 14 and utilize, Wetting Solution 13 can be supplied with at normal temperatures and need not heating or cooling.
Again in addition, the Wetting Solution supply arrangement that is used for offset press of the present invention is included in the blending tank 14 of adjusting Wetting Solution under the normal temperature, be used for measuring the pH measurement of concetration parts 29 of the pH value of blending tank 14 Wetting Solutions 13, be used for measuring the viscosity measurement component 35 of the viscosity of blending tank 14 Wetting Solutions 13, be used for optionally adding water to the Wetting Solution 13 of blending tank 14, thereby etchant 18 and viscosity dose 31 obtain the adding device 36 of the Wetting Solution of target pH value and viscosity, 26,32, and the feed unit that is used for supplying with to offset press at normal temperatures Wetting Solution with target pH value and viscosity.
According to this equipment, because the viscosity of Wetting Solution 13 can also utilize interpolation parts 32 or 36 optionally to add water by the viscosity that utilizes Wetting Solution 13 in the viscosity measurement component 35 measurement blending tanks 14 and viscosity dose 31 reaches the desired value that is fit to printing operation, Wetting Solution 13 can be supplied with at normal temperatures and need not to heat or cool off.In addition, because the pH value that the change of environment temperature causes changes can solve by change and Wetting Solution 13 interpolation water or the etchant 18 of utilization interpolation parts 36 or 26 in blending tank 14 that detects pH values with pH value measurement of concetration parts 29.Therefore, need not to be provided with any heating unit or cooling unit, and also need not to carry out heat insulation processing and prevent dewfall, make and saved the energy, saved the space, and can realize the improvement of printing machine surrounding environment.
In addition, in Wetting Solution supply arrangement of the present invention, be used to supply with Wetting Solution 13 to the supply part of offset press and can be provided with and connect the unidirectional conduit 44 of blending tank 14, be used for detecting the water level meter 45 of blending tank 14 Wetting Solutions 13 water levels and be used under the state that unidirectional conduit 44 is opened compensation Wetting Solution 13 to the valve 46 in wetting source 5 to wetting source 5.
According to this setting, under the control of valve 46, supply to extraly the wetting source 5 in the water level of Wetting Solution Wetting Solution 13 in utilizing water level meter 45 detection blending tanks 14 from unidirectional conduit 44, make Wetting Solution 13 not recycle, and eliminated thus circulating pump or filter for filtration are set.
Claims (8)
1. method of supplying with Wetting Solution for offset press, comprise step: the viscosity that detects Wetting Solution at normal temperatures, water and surfactant obtain the Wetting Solution of target k value thereby optionally add at least to Wetting Solution, and the Wetting Solution that will have the target viscosity at normal temperatures is supplied to offset press.
2. method of supplying with Wetting Solution for offset press, comprise step: the viscosity that detects Wetting Solution at normal temperatures, thereby optionally add the Wetting Solution that water at least, surfactant and viscosity dose obtain the target k value, and the Wetting Solution that will have the target viscosity at normal temperatures is supplied to offset press to Wetting Solution.
3. method of supplying with Wetting Solution for offset press, comprise step: the viscosity that detects Wetting Solution at normal temperatures, thereby optionally add the Wetting Solution that water at least, etchant and viscosity dose obtain target pH value and target viscosity, and the Wetting Solution that will have target pH value and target viscosity at normal temperatures is supplied to offset press to Wetting Solution.
According in the claim 1 to 3 any one describedly supply with the method for Wetting Solution for offset press, wherein Wetting Solution by one way system to be supplied to offset press extraly with the corresponding amount of its consumption.
5. equipment that is used for supplying with Wetting Solution to offset press, thus comprise the blending tank that is used for adjusting at normal temperatures Wetting Solution, be used for measuring the viscosity of blending tank Wetting Solution the viscosity measuring unit, be used for Wetting Solution to blending tank and optionally add the feed unit that water and surfactant at least obtain the adding device of target viscosity and is used for supplying with to offset press at normal temperatures the Wetting Solution with target viscosity.
6. equipment that is used for supplying with Wetting Solution to offset press, thus comprise the blending tank that is used for adjusting at normal temperatures Wetting Solution, be used for measuring the viscosity of blending tank Wetting Solution the viscosity measuring unit, be used for Wetting Solution to blending tank and optionally add the feed unit that water, surfactant and viscosity dose at least obtain the adding device of target viscosity and be used for supplying with to offset press at normal temperatures the Wetting Solution with target viscosity.
7. equipment that is used for supplying with Wetting Solution to offset press, thus comprise the blending tank, the pH measurement of concetration unit that is used for measuring blending tank Wetting Solution pH value that are used for adjusting at normal temperatures Wetting Solution, be used for measuring the viscosity of blending tank Wetting Solution the viscosity measuring unit, be used for Wetting Solution to blending tank and optionally add the feed unit that water, etchant and viscosity dose at least obtain the adding device of target pH value and target viscosity and be used for having to the offset press supply at normal temperatures the Wetting Solution of target pH value and target viscosity.
8. according to any described equipment that is used for supplying with Wetting Solution in the claim 5 to 7 to offset press, wherein be used for to the feed unit that offset press is supplied with Wetting Solution be provided with connect blending tank to the unidirectional conduit in wetting source, be used to detect the water level meter of wetting source Wetting Solution water level and be used for opening unidirectional conduit is supplied with Wetting Solution extraly to wetting source valve from the signal of water level meter by response.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002377104 | 2002-12-26 | ||
| JP377104/2002 | 2002-12-26 | ||
| JP149186/2003 | 2003-05-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1708402A true CN1708402A (en) | 2005-12-14 |
| CN1328044C CN1328044C (en) | 2007-07-25 |
Family
ID=35581813
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2003801021575A Expired - Fee Related CN1328044C (en) | 2002-12-26 | 2003-12-25 | Method and device for feeding dampening water in offset printing press |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1328044C (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103240954A (en) * | 2012-02-06 | 2013-08-14 | 帕洛阿尔托研究中心公司 | Dampening fluid recovery in a variable data lithography system |
| CN103909725A (en) * | 2014-04-18 | 2014-07-09 | 北京睿成宏信印刷技术有限公司 | Centralized fountain solution purifying system |
| CN103950311A (en) * | 2014-04-29 | 2014-07-30 | 江门市蓬江区荷塘镇诚信精细化工厂 | Alcohol substitute in alcohol-free fountain solution and preparation method thereof |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2745741B2 (en) * | 1976-10-15 | 1981-04-16 | Nikkei Shoji Co., Ltd., Tokyo | Method and device for regulating the fountain solution used in printing machines operating according to the lithographic process |
| JPS54114302A (en) * | 1978-02-24 | 1979-09-06 | Dainippon Printing Co Ltd | Wetting aqueous composite material for flat plate printing |
| US4527311A (en) * | 1983-03-28 | 1985-07-09 | Yoshihiro Aoki | Magnetic retaining device for a belt |
| JP2691403B2 (en) * | 1987-08-06 | 1997-12-17 | 富士写真フイルム株式会社 | Fountain solution composition for lithographic printing |
| JP2761596B2 (en) * | 1989-09-05 | 1998-06-04 | 富士写真フイルム株式会社 | A fountain solution composition for lithographic printing |
| JP3116571B2 (en) * | 1992-03-19 | 2000-12-11 | 東洋インキ製造株式会社 | Dampening solution for lithographic printing |
-
2003
- 2003-12-25 CN CNB2003801021575A patent/CN1328044C/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103240954A (en) * | 2012-02-06 | 2013-08-14 | 帕洛阿尔托研究中心公司 | Dampening fluid recovery in a variable data lithography system |
| CN103240954B (en) * | 2012-02-06 | 2016-12-28 | 帕洛阿尔托研究中心公司 | A kind of replacement liquid subsystem for variable data lithographic system |
| CN103909725A (en) * | 2014-04-18 | 2014-07-09 | 北京睿成宏信印刷技术有限公司 | Centralized fountain solution purifying system |
| CN103950311A (en) * | 2014-04-29 | 2014-07-30 | 江门市蓬江区荷塘镇诚信精细化工厂 | Alcohol substitute in alcohol-free fountain solution and preparation method thereof |
| CN103950311B (en) * | 2014-04-29 | 2016-04-06 | 江门市蓬江区荷塘镇诚信精细化工厂 | A kind of alcohol substitute of exempting from alcohol edition-0 moistening liquid and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1328044C (en) | 2007-07-25 |
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