CN1704182A - Local removing system for catching volatile organic pollutant - Google Patents
Local removing system for catching volatile organic pollutant Download PDFInfo
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- CN1704182A CN1704182A CN 200410046430 CN200410046430A CN1704182A CN 1704182 A CN1704182 A CN 1704182A CN 200410046430 CN200410046430 CN 200410046430 CN 200410046430 A CN200410046430 A CN 200410046430A CN 1704182 A CN1704182 A CN 1704182A
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Abstract
The invention relates to a local vent system of trapping volatile addition which comprises complex numbers of gas skirt, complex numbers of electric wire and complex numbers of flow regulator. The complex numbers of gas skirt is located around one side of an object; flow on the other side of the object carries the trapping volatile addition to generate the polluted gas so that the complex numbers of gas skirt can receive the polluted gas. The said complex numbers of electric wire is connected with complex numbers of gas skirt to carry away the polluted gas form complex numbers of gas skirt.
Description
Technical field
The invention relates to a kind of partial exhaust gas system, particularly relevant for a kind of partial exhaust gas system that captures volatile contaminant.
Background technology
In the semiconductor or the processing procedure of photovoltaic, inevitably pending object can be placed in the dust free room in processing procedure, wherein pending object can similarly be the wafer of semi-conductive silicon wafer or three or five families, or the glass substrate of LCD or plastic substrate.These substrates are inevasible in processing procedure can to produce pollutant.If these pollutants can attached work after carrying out processing procedure on substrate, can use the wet-clean process or the dry-type clean process gives cleaning.If these pollutants are volatile, just can in processing procedure, spread in the entire reaction chamber, general design is to wish along with the air-flow in the dust free room is taken away.
Yet the air-flow in dust free room or reative cell is smoothly these volatile pollutants to be taken away.Meeting gradually in reative cell or dust free room wall and board on form one deck pollutant.Therefore, the equipment board can need to make regular check on and maintain after running a period of time.Can shorten the time of equipment board operation like this.
A kind of settling mode is when the shutdown of equipment board is maintained, and uses the gas skirt escaping gas that these are specific to be detached.But the equipment board can't be detached these escaping gases in running.
Another kind of settling mode is the board placed around partial exhaust gas system in reative cell or dust free room, and wherein the partial exhaust gas system uses gas skirt and blast pipe.Gas skirt and exhaust pipeline section are indispensable equipment in the industrial ventilation partial exhaust gas system.Outside the good design decapacitation control pollution sources in full force and effect, also the harmful effect to user and board can be minimized.Traditional partial exhaust gas system often to increase the capture wind speed that capacity improves the gas skirt opening surface, wishes to catch by this more pollutant.But, but ignored the stability requirement of high-tech industry board for processing procedure air-flow environment.Uneven capture air-flow is very shown the reduction that more destroys processing procedure air-flow environment and cause the product yield except that reducing contaminant trapping efficient.
Be with, as known from the above, obviously there is shortcoming in essence in above-mentioned traditional partial exhaust gas system, and can waits to be improved in the use of high-tech industry equipment.
Edge is, this creator improves thoughts on above-mentioned shortcoming, is that the spy concentrates on studies, and cooperates the application of scientific principle, proposes a kind of reasonable in design and can effectively improve the present invention of above-mentioned shortcoming finally.
Summary of the invention
In above-mentioned background of invention, the weak point that traditional partial exhaust gas system is produced, the object of the present invention is to provide a kind of partial exhaust gas system that captures volatile contaminant, mainly be when the general gas skirt of solution is used in the high-tech industry board, often cause and capture the wind speed inequality, destroy and stablize processing procedure air-flow environment, influence product yield and the not high shortcoming of pollutant control efficiency.So design one partial exhaust gas system makes it stablize under the processing procedure air-flow environment not influencing, and does not still lose the usefulness of seizure pollutant.
The present invention utilizes to blow the vertical laminar flow environmental characteristics under the dust free room, cooperate gas skirt opening surface convergent area design, when normal operation, contaminated bottom blowing air current can directly evenly be captured by the gas skirt opening surface, and each gas skirt back segment exhaust pipeline section flow-control of arranging in pairs or groups, each gas skirt opening surface wind speed of balance reduces the influence to processing procedure air-flow environment, reduces the influence to the product yield.
Purpose of the present invention is also to provide a kind of partial exhaust gas system of removing above-mentioned shortcoming at product in processing procedure carries out, and can keep former partial exhaust gas system and capture the pollutant function.
Another object of the present invention is to gas skirt and can be used in process work bench in the running, gas skirt itself there is no any interference with the start of equipment mechanism.
Another purpose of the present invention is that gas skirt can effectively capture organic solvent gas, reduces the amount of loosing of overflowing in the environment, and arresting efficiency is more than 90%.
A further object of the present invention is that gas skirt can keep the uniformity of air-flow around the substrate, and stable process quality is provided.
According to above-described purpose, the invention provides a kind of partial exhaust gas system that is used to capture volatile contaminant, it is characterized in that, comprise:
A plurality of gas skirts, be positioned at an object a side around, wherein the relative opposite side of this object has bottom blowing air current that the volatile contaminant on this object is taken away producing contaminated gas, these a plurality of gas skirts are to capture this contaminated gas in order to receive;
A plurality of pipelines are to be connected to this a plurality of gas skirts, in order to this contaminated gas band that will trap from these a plurality of gas skirts; And
A plurality of flow regulators are positioned on these a plurality of pipelines, are in order to regulate the gas flow of these a plurality of pipelines.
Wherein above-mentioned a plurality of gas skirts have a drift angle, make shape after this a plurality of gas skirts combination near the face shaping of this object.
The drift angle place of wherein above-mentioned a plurality of gas skirts has a steam vent, is to be connected to this a plurality of pipelines.
The volume of wherein above-mentioned a plurality of gas skirts is in this steam vent part maximum, and the volume after other directions are extended reduces gradually.
Has locator between wherein above-mentioned a plurality of gas skirts.
A kind of partial exhaust gas system that is used to capture volatile contaminant of the present invention be to be used in the board that produces pollution sources, and this board is to be arranged in a reative cell, it is characterized in that, this partial exhaust gas system that is used to capture volatile contaminant comprises:
A plurality of gas skirts, be positioned at an object a side around, wherein the relative opposite side of this object has air-flow that the volatile contaminant on this object is taken away to produce contaminated gas, wherein above-mentioned gas skirt is made of a container, and the one side of this container is open, be in order to the contaminated gas of supplementary set, these a plurality of gas skirts have a drift angle, shape after making these a plurality of gas skirts make up is near the face shaping of this object, the drift angle place of these a plurality of gas skirts has a steam vent, and the volume of these a plurality of gas skirts is in this steam vent part maximum, and the volume after other directions are extended reduces gradually;
A plurality of pipelines are to be connected on the steam vent of these a plurality of gas skirts, are from these a plurality of gas skirts in order to this contaminated gas band that will trap; And
A plurality of flow regulators are positioned on these a plurality of pipelines, are in order to regulate the gas flow of these a plurality of pipelines.
Wherein above-mentioned object is a face glass.
Wherein above-mentioned a plurality of gas skirts are positioned at this rectangle drift angle place and have a steam vent, are to be connected to this a plurality of pipelines.
The volume of wherein above-mentioned a plurality of gas skirts is in this steam vent part maximum, and the volume after other directions are extended reduces gradually.
Wherein above-mentioned a plurality of pipelines are connected to an air extractor.
Description of drawings
For further specifying technology contents of the present invention, below in conjunction with embodiment and accompanying drawing describes in detail as after, wherein:
Fig. 1 shows the structural representation that is used to capture the partial exhaust gas system of volatile contaminant of the present invention;
Fig. 2 is the structural representation that the gas skirt of demonstration partial exhaust gas of the present invention system is applied to the glass substrate processing procedure of panel of LCD;
Fig. 3 is the schematic side view that the gas skirt of demonstration partial exhaust gas of the present invention system is applied to the glass substrate processing procedure of panel of LCD;
Fig. 4 is the schematic top plan view of the gas skirt of demonstration partial exhaust gas of the present invention system; And
Fig. 5 is the structural representation of the gas skirt of demonstration partial exhaust gas of the present invention system, and wherein Fig. 5 A is shown as the large scale gas skirt, Fig. 5 B is shown as the small size gas skirt.
The specific embodiment
Some embodiments of the present invention can be described in detail as follows.Yet except describing in detail, the present invention can also be widely implements at other embodiment, and scope of the present invention do not limited, its with after claim be as the criterion.
The present invention mainly is the partial exhaust gas system that is used to capture volatile contaminant about a kind of, mainly is to be used in the board that produces pollution sources, and board wherein is arranged in a reative cell.Partial exhaust gas of the present invention system comprises a plurality of gas skirts, and a plurality of pipelines are with a plurality of flow regulators.
Above-mentioned a plurality of gas skirts be arranged in an object a side around with aforesaid reative cell, the relative opposite side of object wherein has air-flow that the volatile contaminant on it is taken away to produce contaminated gas, makes a plurality of gas skirts be received and captures contaminated gas.Each above-mentioned gas skirt is made of a container, and wherein one side be open, be able to the contaminated gas of supplementary set, and each gas skirt has a drift angle, and the shape after making aforesaid a plurality of gas skirt make up is near the face shaping of this object.Having a steam vent respectively at the drift angle place of each above-mentioned gas skirt, be to be connected to aforesaid a plurality of pipeline, and the volume of each gas skirt is in steam vent part maximum, along with reducing gradually away from this steam vent volume.Has locator between each above-mentioned gas skirt.
Above-mentioned object can be a face glass.Therefore, be shaped as a rectangle after above-mentioned a plurality of gas skirts combinations, and a plurality of gas skirt has a steam vent respectively at rectangle drift angle place, can be connected to aforesaid a plurality of pipeline.In addition, above-mentioned object is to be supported by a base for supporting, and base for supporting is between aforesaid a plurality of gas skirts.
Above-mentioned a plurality of pipelines are connected to aforesaid a plurality of gas skirt, are from these a plurality of gas skirts in order to the contaminated gas band that will trap.Above-mentioned a plurality of pipelines are rigid pipe, and its bore is to be positioned at outside the aforesaid reative cell at least greater than five centimeters, and are connected to an air extractor.
Above-mentioned a plurality of flow regulators are positioned on aforesaid a plurality of pipeline, are in order to regulating its gas flow, and wherein a plurality of flow regulators can use air door.
For making the juror one progressive understanding and approval be arranged more to purpose of the present invention, feature, effect, conjunction with figs. describe in detail preferred embodiment of the present invention as after.As shown in Figure 1, the partial exhaust gas system 10 that is used to capture volatile contaminant of the present invention is by gas skirt 12, and pipeline 14 is formed with flow regulator 16, and wherein gas skirt 12 is connected with the pipeline 14 of below respectively via steam vent.On pipeline 14, be equiped with the flow regulator 16 of adjusting flow respectively.Pipeline 14 can join a main line 15 at last to and be connected to an air extractor.
Gas skirt 12 main functions are to collect or catch VOC (volatileorganic compound; VOC) gas.These gases that contain VOC can be got rid of via pipeline 14.Flow regulator 16 on pipeline 14 can independently be controlled the gas flow of indivedual pipelines 14 separately, also thereby influenced the inspiratory effects of gas skirt 12.Pipeline 14 adopts rigid pipes reducing the resistance of gas flow in the pipeline 14, and bore is widened feasible a large amount of gases and can evenly be flowed in pipeline 14.As can be seen, for the length of four pipelines of arrangement of cooperating board and inequality, therefore when flow regulator 16 does not act on when, each gas skirt 12 is also inequality for the ability of the absorption supplementary set of contaminated gas in diagram.Flow regulator 16 main purposes are exactly to regulate the gas flow of four independent pipelines 14, make each gas skirt 12 be identical for the absorption trapping ability of contaminated gas.
The inner space that gas skirt 12 is formed can be placed one and produce be polluted former object, in the mill face glass or silicon wafer also for example, and object wherein can be supported by a base for supporting.Object in the present embodiment is square substrate, but also can be applied to the circular silicon wafer or the wafer of three or five families.At this moment the space formed of gas skirt 12 is the circular appearance that meets wafer.The number of gas skirt 12 is four in the present embodiment, but is not limited with four, also can capture contaminated gas as long as can reach needed absorption less than four.In the present embodiment, all have between each gas skirt 12 at interval, this is because present embodiment is the glass substrate processing procedure that is applied to LCD, and its reative cell has base for supporting in order to support glass substrate and the locator position in order to the fixing glass substrate.When the present invention is applied to other manufacture of semiconductor, the processing procedure of opto-electronics or might be applied to processing procedure of the present invention, the face shaping design of gas skirt 12 can depend on the process apparatus that is applied to.
When the present invention used, it was certain certain proportion that elder generation's adjustment flow regulator 16 makes the flow in the pipeline 14.Except that the enough capacities of gas skirt 12 are provided, take into account the airflow homogeneity in the pipeline 14 simultaneously.
As shown in Figure 2, gas skirt 12 is assembled in the schematic diagram on the manufacturing board of display panels, the manufacturing board of display panels wherein can be the board of thin film deposition, etching machine, photoresistance coating machine platform, or the board of photolithography, for example Coater of TEL (ER).In the present embodiment, object 20 is glass substrates, and glass substrate is supported by base for supporting 24.Gas skirt 12 surrounds base for supporting 24, and is fixed by locator 26.Partial exhaust gas of the present invention system has only 12 of gas skirts in reative cell, and pipeline 14 is faces outside reative cell.General reative cell all is a dust free room, and the clean gas flow that has a bottom blowing type is removed the pollutant on the object 20.In above-mentioned processing procedure, the residual organic solvent that FEOL is arranged of possibility on the face glass, or this processing procedure can produce many organic gaseous contamination things, so pollution sources result from the monolithic glass panel.These pollution sources can vertically down blow under the laminar flow band via dust free room, and the present invention promptly utilizes this dust free room stream condition that the opening surface of gas skirt 12 is set below outside around the face glass 20, directly captures contaminated air-flow.
As shown in Figure 3, can clearerly recognize function mode of the present invention.Face glass 20 is supported by supporting seat 24.Between each gas skirt 12 locator 26 is arranged, be connected to pipeline 14 below.On face glass 20, the bottom blowing type clean gas flow 21 of reative cell blows to face glass 20, and produced pollution gas 22 can be absorbed capture by gas skirt 12 around face glass 20.Then, via pipeline 14 these dusty gas 22 are with in reative cell.Promote the gas supplementary set usefulness of gas skirt 12 if desired, each the air-flow of each aperture position of gas skirt 12 needs identical, and the gas flow rate of each gas skirt 12 is also identical.Control the identical mode of each the air-flow velocity of each aperture position of gas skirt 12 as hereinafter explanation, and control the identical mode of the gas flow rate of each gas skirt 12 by flow regulator 16 controls.
Fig. 4 is the vertical view of gas skirt 12, and wherein each gas skirt 12 has individual steam vent 13, in order to connecting line 14.Gas skirt 12 volume in steam vent 13 place's maximums, away from steam vent 13 part volumes reducing gradually.Main purpose is will reach single gas skirt 12 to capture the wind speed homogenising.Because, suppose that the volume of gas skirt 12 is constant in each position, necessarily slower away from steam vent 13 part gas flow speed, will cause uneven pumping airflow like this.So, be improved the capture wind speed away from the aperture area convergent of steam vent 13.
As shown in Figure 5, the structural representation (Fig. 5 A, Fig. 5 B) that shows single different gas skirts 12.The size of each gas skirt 12 can be inequality, for absorbing the contaminated gas part of capture individual opening arranged, and steam vent is arranged below opening part.A sunk place is arranged between each gas skirt 12, mainly is the design that cooperates locator to do.
The present invention can be applicable to gas skirt can be used in process work bench in the running, and gas skirt itself there is no any interference with the start of equipment mechanism, and gas skirt can effectively capture organic solvent gas, reduces the amount of loosing of overflowing in the environment.With reference to table one and table two, compare arresting efficiency with traditional local repair collecting system and promote more than 90%.
| Table 1 is implemented the THC concentration value (ppm) under the present invention | |||||||
| Project/item | ??1 | ??2 | ??3 | ??4 | ??5 | ??6 | On average |
| Substrate below (pollution sources) | ??101.7 | ??49.8 | ??87.2 | ??38.9 | ??53.2 | ??113.9 | ??74.1 |
| Environment (leakage rate) | ??2.9 | ??3.2 | ??4.1 | ??4.4 | ??3.9 | ??4.5 | ??3.9 |
| Table 2 is implemented the THC concentration value (ppm) before and after the present invention | |||||||
| Item top | ??1 | ??2 | ??3 | ??4 | ??5 | ??6 | On average |
| Before the invention (leakage rate) | ??15.5 | ??16.8 | ??26.5 | ??29.0 | ??29.7 | ??18.5 | ??22.7 |
| Invention back (leakage rate) | ??2.9 | ??3.2 | ??4.1 | ??4.4 | ??3.9 | ??4.5 | ??3.9 |
Again, gas skirt can be kept the substrate uniformity of air-flow on every side, and stable process quality is provided.
Partial exhaust gas of the present invention system comprises the gas skirt body and the exhaust pipeline section that is connected.Utilize dust free room vertically down to blow the laminar flow environmental characteristics, the gas skirt opening surface is arranged at below the pollution sources, directly capture contaminated air-flow.And capture the requirement of wind speed homogenising for reaching, do not influence the product yield, add the flow regulator of flow rate adjustable on tapering type gas skirt aperture area design and the exhaust pipeline section.
The above is preferred embodiment of the present invention only, is not in order to limit claim of the present invention; All other do not break away from the equivalence of being finished under the disclosed spirit and changes or modification, all should be included in the following claim.
Claims (10)
1. a partial exhaust gas system that is used to capture volatile contaminant is characterized in that, comprises:
A plurality of gas skirts, be positioned at an object a side around, wherein the relative opposite side of this object has bottom blowing air current that the volatile contaminant on this object is taken away producing contaminated gas, these a plurality of gas skirts are to capture this contaminated gas in order to receive;
A plurality of pipelines are to be connected to this a plurality of gas skirts, in order to this contaminated gas band that will trap from these a plurality of gas skirts; And
A plurality of flow regulators are positioned on these a plurality of pipelines, are in order to regulate the gas flow of these a plurality of pipelines.
2. the partial exhaust gas system that is used to capture volatile contaminant as claimed in claim 1 is characterized in that wherein above-mentioned a plurality of gas skirts have a drift angle, makes shape after this a plurality of gas skirts combination near the face shaping of this object.
3. the partial exhaust gas system that is used to capture volatile contaminant as claimed in claim 2 is characterized in that the drift angle place of wherein above-mentioned a plurality of gas skirts has a steam vent, is to be connected to this a plurality of pipelines.
4. the partial exhaust gas system that is used to capture volatile contaminant as claimed in claim 3 is characterized in that, the volume of wherein above-mentioned a plurality of gas skirts is in this steam vent part maximum, and the volume after other directions are extended reduces gradually.
5. the partial exhaust gas system that is used to capture volatile contaminant as claimed in claim 1 is characterized in that, has locator between wherein above-mentioned a plurality of gas skirts.
6. partial exhaust gas system that is used to capture volatile contaminant be to be used in the board that produces pollution sources, and this board is to be arranged in a reative cell, it is characterized in that, this partial exhaust gas system that is used to capture volatile contaminant comprises:
A plurality of gas skirts, be positioned at an object a side around, wherein the relative opposite side of this object has air-flow that the volatile contaminant on this object is taken away to produce contaminated gas, wherein above-mentioned gas skirt is made of a container, and the one side of this container is open, be in order to the contaminated gas of supplementary set, these a plurality of gas skirts have a drift angle, shape after making these a plurality of gas skirts make up is near the face shaping of this object, the drift angle place of these a plurality of gas skirts has a steam vent, and the volume of these a plurality of gas skirts is in this steam vent part maximum, and the volume after other directions are extended reduces gradually;
A plurality of pipelines are to be connected on the steam vent of these a plurality of gas skirts, are from these a plurality of gas skirts in order to this contaminated gas band that will trap; And
A plurality of flow regulators are positioned on these a plurality of pipelines, are in order to regulate the gas flow of these a plurality of pipelines.
7. the partial exhaust gas system that is used to capture volatile contaminant as claimed in claim 6 is characterized in that wherein above-mentioned object is a face glass.
8. the partial exhaust gas system that is used to capture volatile contaminant as claimed in claim 7 is characterized in that, wherein above-mentioned a plurality of gas skirts are positioned at this rectangle drift angle place and have a steam vent, are to be connected to this a plurality of pipelines.
9. the partial exhaust gas system that is used to capture volatile contaminant as claimed in claim 8 is characterized in that, the volume of wherein above-mentioned a plurality of gas skirts is in this steam vent part maximum, and the volume after other directions are extended reduces gradually.
10. the partial exhaust gas system that is used to capture volatile contaminant as claimed in claim 6 is characterized in that wherein above-mentioned a plurality of pipelines are connected to an air extractor.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100464303A CN100522397C (en) | 2004-05-31 | 2004-05-31 | Local removing system for catching volatile organic pollutant |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100464303A CN100522397C (en) | 2004-05-31 | 2004-05-31 | Local removing system for catching volatile organic pollutant |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1704182A true CN1704182A (en) | 2005-12-07 |
| CN100522397C CN100522397C (en) | 2009-08-05 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2004100464303A Expired - Fee Related CN100522397C (en) | 2004-05-31 | 2004-05-31 | Local removing system for catching volatile organic pollutant |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN100522397C (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107900062A (en) * | 2017-11-29 | 2018-04-13 | 天津昭阳科技有限公司 | A kind of Novel vent pipe |
-
2004
- 2004-05-31 CN CNB2004100464303A patent/CN100522397C/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107900062A (en) * | 2017-11-29 | 2018-04-13 | 天津昭阳科技有限公司 | A kind of Novel vent pipe |
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| Publication number | Publication date |
|---|---|
| CN100522397C (en) | 2009-08-05 |
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Granted publication date: 20090805 Termination date: 20160531 |