CN1693943A - Manufacturing method for assembling contact control panel on liquid crystal display - Google Patents
Manufacturing method for assembling contact control panel on liquid crystal display Download PDFInfo
- Publication number
- CN1693943A CN1693943A CN 200410042242 CN200410042242A CN1693943A CN 1693943 A CN1693943 A CN 1693943A CN 200410042242 CN200410042242 CN 200410042242 CN 200410042242 A CN200410042242 A CN 200410042242A CN 1693943 A CN1693943 A CN 1693943A
- Authority
- CN
- China
- Prior art keywords
- contact panel
- lcd
- panel
- film
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Landscapes
- Liquid Crystal (AREA)
Abstract
A manufacture method for a kind of liquid crystal display that has an integrated touch pad. It uses the light engraving technology for forming a control circuiton the liquid crystal display pad peripheral district. The technology includes: form an electric layer on the peripheral district; form an light anti- corrosion layer on the electric layer; expose the anti- corrosion layer which is under a membrane whose figure is equal to the control circuit. As a result, the figure moves to the anti- eclipse layer; take the anti- corrosion layer as a mold to etch the electric layer; remove the anti- corrosion layer; form a touch and control pad on the liquid crystal display panel. The display panel is used as the bottom base of the touch and control pad; use the control circuit to drive the touch and control pad. The control circuit of the touch and control pad of the invention is created on the liquid crystal display panel by the light engraving technology, thus the area of the control circuit is decreased.
Description
Technical field
The present invention relates to a kind of manufacture method of integrating the LCD of contact panel, particularly relate to the method for control circuit on panel of LCD of utilizing lithographic fabrication processes to make contact panel.
Background technology
Contact panel can be by the input operation of coordinate values with input data read one user.Contact panel can be attached on the flat-panel screens, as LCD usually.For example, have ATM (Automatic Teller Machine) (ATM in bank or roadside; Or the display device of touch all can be arranged at the automatic explanation device of scenic spot Automatic Teller Machines).When pointer or finger tip gently are pressed on the contact panel, can produce an electric potential signal in relative position.This signal can provide data and be handled by other device.
See also Fig. 1, the LCD with contact panel has comprised that 120 of display panels 110 and contact panels are thereon.Display panels 110 has an infrabasal plate 112 and a upper substrate 114, and wherein infrabasal plate 112 has thin film transistor (TFT) array and alignment film, and upper substrate 114 has color filter, common electrode and alignment film.Infrabasal plate 112 is called thin film transistor base plate again and upper substrate 114 is called the color filter substrate.Liquid crystal can be injected between infrabasal plate 112 and the upper substrate 114 by the formed space of son, gap, and sealing.One Polarizer 116 be positioned at the following of infrabasal plate 112 and another Polarizer 118 be positioned at upper substrate 114 above.Contact panel 120 generally uses double faced adhesive tape to be fitted in above the display panels 110.
Because contact panel 120 itself has certain volume and weight, can strengthen the volume and whole weight of whole touch-control liquid crystal display.And the mode of using double faced adhesive tape to fit also can reduce the light transmittance of LCD.
In addition, the design of the control circuit of general contact panel is around panel, and the central authorities of panel are the touch area.The production method of control circuit now is to use the mode of screen printing, because degree of accuracy and resolution are relatively poor, thereby needs bigger area.Moreover, general near field formula (NFI; Near Filedimage) or the contact panel of condenser type (capacitive type), the complexity that its control circuit is suitable can occupy sizable area when being applied to touch-control liquid crystal display panel.And in the application of the touch-control liquid crystal display of small-medium size, can become quite unrealistic.
Summary of the invention
In view of deficiency of the prior art in the above-mentioned background of invention, fundamental purpose of the present invention is to use lithographic fabrication processes to form the control circuit of contact panel.
Another object of the present invention is effectively to reduce the area of control circuit, and the therefore complicated near field formula or the control circuit of capacitance type touch-control panel can be used and be incorporated on the display panels.
Another purpose of the present invention is to may be used on the undersized touch liquid crystal display, and uses near field formula or capacitance type touch-control panel can improve the serviceable life and the touch-control quality of touch-control liquid crystal display.
A further object of the present invention is to reduce the weight and the volume of touch-control liquid crystal display.
Another object of the present invention is to reduce the former material cost of contact panel, and has improved the overall brightness of touch-control liquid crystal display.
According to above-described purpose, the invention provides a kind of LCD manufacture method of integrating contact panel.Main step is to form control circuit on the neighboring area of a panel of LCD with lithographic fabrication processes.Then, form a contact panel on above-mentioned panel of LCD, panel of LCD wherein is as the infrabasal plate of this contact panel, and drives this contact panel with above-mentioned control circuit.Above-mentioned LCD is active LCD.
Above-mentioned lithographic fabrication processes comprises that deposition one conductive film is on the neighboring area.Then, form a photoresist layer on aforesaid conductive film.Afterwards, design transfer with the aforesaid conductive film of etching to form this control circuit.And above-mentioned pattern transfer steps comprises with a photomask with this control circuit pattern aforesaid photoresist layer is exposed, and makes this design transfer to the photoresist layer.Then, be this conductive film of mask etching with the photoresist layer.Remove the photoresist layer afterwards.
Above-mentioned contact panel can be that glass is to glass, film is to glass, perhaps film is to film, the upper substrate material of panel of LCD wherein is a glass, when this contact panel is a glass to glass or film to glass, and the upper substrate material of panel of LCD is a film, when this contact panel is that film is to film.Above-mentioned contact panel can be near field formula or condenser type.
Description of drawings
Fig. 1 shows prior art, is contact panel directly is attached to structural representation on the LCD;
Fig. 2 shows a preferred embodiment of the present invention, contact panel is incorporated into the structural representation of LCD;
Fig. 3 shows a preferred embodiment of the present invention, with the upper substrate of the panel of LCD structural representation as the infrabasal plate of contact panel;
Fig. 4 is the vertical view of Fig. 3; And
Fig. 5 A-5C shows a preferred embodiment of the present invention, forms the structural representation of the control circuit of contact panel with the manufacturing process of optical lithography.
The simple symbol explanation
10 panel of LCD
12 infrabasal plates
14 upper substrates
The 14-1 color filter
16 Polarizers
18 Polarizers
20 contact panels
22 first conductive layers
24 second conductive layers
30 photoresist layers
60 light sources
110 panel of LCD
112 infrabasal plates
114 upper substrates
116 Polarizers
118 Polarizers
120 contact panels
Embodiment
Some embodiments of the present invention can be described in detail as follows.Yet except describing in detail, the present invention can also be widely implements at other embodiment, and scope of the present invention do not limited, its with after claim be as the criterion.
Moreover for clearer description being provided and being more readily understood the present invention, graphic interior each several part is not drawn according to its relative size, and some size is compared with other scale dependents and exaggerated; Incoherent detail section is not drawn fully yet, in the hope of graphic succinct.
The structural representation of the LCD of integration contact panel of the present invention as shown in Figure 2, comprises the panel 10 of LCD, and contact panel 20 is with light source 60.One Polarizer 16 is between display panels 10 and light source 60, and another Polarizer 18 is positioned on the contact panel 20.Panel of LCD 10 has comprised infrabasal plate 12 and upper substrate 14, wherein have the direction of thin film transistor (TFT) array in order to the control liquid crystal above the infrabasal plate 12, and top glass substrate 14 has color filter.Liquid crystal is between upper substrate 12 and infrabasal plate 14.In the present invention, the infrabasal plate of contact panel 20 is the upper substrates 14 that directly use panel of LCD 10.Contact panel 20 can be that glass is to glass, film is to glass, perhaps film is to film, when contact panel 20 is a glass to glass or film to glass, the upper substrate material 14 of panel of LCD 10 is a glass, and when contact panel 20 be film to film, upper substrate 14 materials of panel of LCD 10 are film.Contact panel 20 can be near field formula or condenser type.
See also Fig. 3, first conductive layer 22 of contact panel 20 is to be formed directly on the upper substrate 14 of panel of LCD 10, mainly is the lower electrode plate as contact panel, and below the upper substrate 14 of panel of LCD 10 chromatic colour filter 14-1.The generation type of first conductive layer 22 can be traditional sputtering method.Second conductive layer 24 of contact panel 20 is positions on around the upper substrate 14 of first conductive layer 22 and panel of LCD 10, mainly is the control circuit as contact panel, and its generation type can be traditional screen painting method.In the present invention, second conductive layer 24 is to use lithographic fabrication processes, can effectively significantly reduce the occupied area of control circuit, makes the area of display panels can do effective utilization, as shown in Figure 4.
The manufacture of second conductive layer 24 of contact panel as shown in Figure 5.In the present embodiment, the formation of first conductive layer 22 and second conductive layer 24 can be after the formation of color filter, also can before wrapping filter formation, coloured silk perhaps after whole liquid crystal display panel is finished, just begin to form in regular turn first conductive layer 22 and second conductive layer 24.First conductive layer 22 of contact panel 20 is formed on the upper substrate 14 of panel of LCD 10, shown in Fig. 5 A.The generation type of first conductive layer 22 can be sputtering method (sputtering), and its material is a transparency electrode.General transparency electrode can be used tin indium oxide (ITO) or indium zinc oxide (IZO).
Then, one second conductive layer 24 is formed on the neighboring area of first conductive layer 22 and panel of LCD 10.The material of second conductive layer 24 does not limit the use transparency electrode so long as the conductor of electricity gets final product.Generation type can be used chemistry or physical vaporous deposition, or uses the conduction patch directly to be attached on first conductive layer 22, and perhaps other generation type all can.Its characteristic requires resistance little and electric conductivity is good.
Afterwards, a photoresist layer 30 is formed on second conductive layer 24.The material of photoresist layer 30 is a photoactive substance, can form via the mode of rotary coating.In lithographic fabrication processes, photoresist can be divided into positive and negative film.When identical on the pattern that is produced through developing after the photoresist exposure and the photomask, such photoresist is called positive; Otherwise, if pattern that photoresist produced and the pattern on the photomask are called negative film when complementary.In the present invention, lithographic fabrication processes can be used the photoresist of positive or negative film, and in the present embodiment with the photoresist of positive as introduction.Photoresist is to present liquid state in coating.Program through overbaking after rotary coating can present solid-state.
Then, to 30 exposure of photoresist layer.Shown in Fig. 5 B, photoresist layer 30 is exposed with a photomask with control circuit pattern.After developing, photoresist layer 30 can present the pattern of this control circuit.In the present embodiment because photoresist layer 30 is to use positive, by irradiate light to photoresist layer 30 can be removed.
Then, be mask etching second conductive layer 24 with photoresist layer 30.Etched mode can be used wet etching or dry ecthing.Wet etching has preferably etching selectivity and dry ecthing has preferred etching outline.If use the mode of reactive ion etch can obtain preferred etching selectivity and etching outline simultaneously.In Fig. 5, because diagram is a sectional drawing, second conductive layer 24 after demonstration that can't be actual is etched.Therefore, use second conductive layer 24 of an etched part to represent the control circuit that forms.Afterwards, remove photoresist layer 30 to obtain second conductive layer 24, shown in Fig. 5 C.
Another mode that forms control circuit is to form one deck second conductive layer 24 on whole first conductive layer 22.Then, a photoresist layer 30 is formed on above the whole upper substrate 14.In optical lithography and etching manufacturing process, second conductive layer 24 of the image display area of centre is removed together.Such manufacturing process is specially adapted to second conductive layer 24 with chemistry or physical vaporous deposition formation.
Afterwards, the manufacturing process that continues the execution contact panel is finished up to whole contact panel.On contact panel 20, attach Polarizer 18 then.
The present invention uses lithographic fabrication processes to form the control circuit of contact panel.Because the degree of accuracy of lithographic fabrication processes is more taller than the degree of accuracy of screen printing, can effectively reduce the area of control circuit, produce more complicated control circuit simultaneously.Particularly comparatively complicated near field formula or the capacitance type touch-control panel of control circuit can be applied on the touch-control liquid crystal display of small-medium size.And, use near field formula or capacitance type touch-control panel can improve the serviceable life and the touch-control quality of touch-control liquid crystal display.Moreover, contact panel is incorporated into weight and the volume that LCD can reduce touch-control liquid crystal display, and the former material cost that reduces contact panel, improved the overall brightness of touch-control liquid crystal display simultaneously.
The above is the preferred embodiments of the present invention only, is not in order to limit claim of the present invention; All other do not break away from the equivalence of being finished under the disclosed spirit and change or modification, all should be included in protection scope of the present invention.
Claims (9)
1. LCD manufacture method of integrating contact panel comprises:
Form control circuit on the neighboring area of a panel of LCD with lithographic fabrication processes, this lithographic fabrication processes comprises:
On this neighboring area, form a conductive layer;
On this conductive layer, form a photoresist layer;
To this photoresist layer exposure, make this design transfer with a photomask with this control circuit pattern to this photoresist layer;
With this photoresist layer is this conductive layer of mask etching;
Remove this photoresist layer; And
Form a contact panel on this panel of LCD, wherein this panel of LCD is as the infrabasal plate of this contact panel, and drives this contact panel with this control circuit.
2. the LCD manufacture method of integration contact panel as claimed in claim 1, the upper substrate of wherein above-mentioned panel of LCD are the infrabasal plates as this contact panel.
3. the LCD manufacture method of integration contact panel as claimed in claim 1, wherein above-mentioned contact panel be from glass to glass, film is to glass, and selects in the group of film to film.
4. the LCD manufacture method of integration contact panel as claimed in claim 3, wherein above-mentioned contact panel are the near field formula.
5. the LCD manufacture method of integration contact panel as claimed in claim 3, wherein above-mentioned contact panel are condenser type.
6. the LCD manufacture method of integration contact panel as claimed in claim 3, the upper substrate material of wherein above-mentioned panel of LCD is a glass, when this contact panel is that glass is to glass.
7. the LCD manufacture method of integration contact panel as claimed in claim 3, the upper substrate material of wherein above-mentioned panel of LCD is a glass, when this contact panel is that film is to glass.
8. the LCD manufacture method of integration contact panel as claimed in claim 3, the upper substrate material of wherein above-mentioned panel of LCD is a film, when this contact panel is that film is to film.
9. the LCD manufacture method of integration contact panel as claimed in claim 1, wherein above-mentioned LCD are active LCD.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200410042242 CN1693943A (en) | 2004-05-09 | 2004-05-09 | Manufacturing method for assembling contact control panel on liquid crystal display |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200410042242 CN1693943A (en) | 2004-05-09 | 2004-05-09 | Manufacturing method for assembling contact control panel on liquid crystal display |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1693943A true CN1693943A (en) | 2005-11-09 |
Family
ID=35352989
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200410042242 Pending CN1693943A (en) | 2004-05-09 | 2004-05-09 | Manufacturing method for assembling contact control panel on liquid crystal display |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1693943A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101236311B (en) * | 2008-02-14 | 2011-07-27 | 友达光电股份有限公司 | LCD device sensing structure |
| US8269940B2 (en) | 2008-02-04 | 2012-09-18 | Au Optronics Corp. | Sensing structure |
-
2004
- 2004-05-09 CN CN 200410042242 patent/CN1693943A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8269940B2 (en) | 2008-02-04 | 2012-09-18 | Au Optronics Corp. | Sensing structure |
| CN101236311B (en) * | 2008-02-14 | 2011-07-27 | 友达光电股份有限公司 | LCD device sensing structure |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8106399B2 (en) | Electrophoretic display device and method of fabricating the same | |
| TWI247184B (en) | Method for manufacturing LCD device with integrated touch panel | |
| KR101519844B1 (en) | Upper Substrate For Touch Screen Panel, Method Of Manufacturing The Same And Display Device Having The Same | |
| US7675580B2 (en) | Liquid crystal display with built-in touch screen having particles for pressure concentration | |
| JP4816738B2 (en) | Information input / output device | |
| US8284171B2 (en) | Liquid crystal display device with input function | |
| JP6342132B2 (en) | Array substrate, display panel, and array substrate manufacturing method | |
| US7639321B2 (en) | Method of manufacturing a color filter substrate with trenches for a black matrix | |
| CN102411237A (en) | Liquid crystal display device and method for manufacturing the same | |
| CN1940646A (en) | Liquid crystal display device and method for fabricating of the same | |
| US10191592B2 (en) | Touch-control display panel and display device, and driving method of display panel | |
| US7872263B2 (en) | Substrate structure for a thin film transistor | |
| US8093594B2 (en) | Display substrate, display device having the same and method of manufacturing the same | |
| US20170131813A1 (en) | Touch display screen, manufacture method thereof, and display device | |
| CN1573485A (en) | In-plane switching mode liquid crystal display device and method of manufacturing the same | |
| US20050019679A1 (en) | [color filter substrate and fabricating method thereof] | |
| US7851835B2 (en) | Display substrate, method of manufacturing the same and display device having the same | |
| US7876415B2 (en) | Display substrate having a TFT liquid crystal display region surrounded by a seal region having a cell-gap compensating part with a dummy pattern formed from the same layer as a pixel electrode of the TFT | |
| CN1617031A (en) | Liquid crystal display device and method for fabricating the same | |
| CN1841144A (en) | Liquid crystal display and method of manufacturing the same | |
| CN1949041A (en) | Method of fabricating liquid crystal display device | |
| CN1637486A (en) | Method for fabricating a liquid crystal display device | |
| CN1693943A (en) | Manufacturing method for assembling contact control panel on liquid crystal display | |
| CN1834746A (en) | Method of mfg low substrate of LCD device | |
| US20240184159A1 (en) | Color filter substrate, manufacturing method thereof, and display panel |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |