CN1648103A - Method of preparing high dielectric constant AL203 base ceramics with power regulating laser - Google Patents

Method of preparing high dielectric constant AL203 base ceramics with power regulating laser Download PDF

Info

Publication number
CN1648103A
CN1648103A CN 200510000295 CN200510000295A CN1648103A CN 1648103 A CN1648103 A CN 1648103A CN 200510000295 CN200510000295 CN 200510000295 CN 200510000295 A CN200510000295 A CN 200510000295A CN 1648103 A CN1648103 A CN 1648103A
Authority
CN
China
Prior art keywords
laser
sintering
pottery
dielectric constant
ceramic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN 200510000295
Other languages
Chinese (zh)
Inventor
蒋毅坚
于振龙
王伟
季凌飞
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Beijing University of Technology
Original Assignee
Beijing University of Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beijing University of Technology filed Critical Beijing University of Technology
Priority to CN 200510000295 priority Critical patent/CN1648103A/en
Publication of CN1648103A publication Critical patent/CN1648103A/en
Pending legal-status Critical Current

Links

Landscapes

  • Compositions Of Oxide Ceramics (AREA)

Abstract

The present invention is the preparation process of high dielectric constant Al2O3 base ceramic with power regulating laser, and belongs to the field of ceramic material preparing technology. The present invention features using great laser as heat source for preparing the ceramic material, and the production process includes the following steps: setting Al2O3 ceramic blank on rotary work bench, raising laser power from 0 to 630-1030 w/sq cm in 30-60 s for sintering, sintering for 60-300 s, lowering the laser power to initial value in 60-300 s, turning off laser and cooling to form ceramic. Compared with common furnace sintering process, the said process has obviously raised dielectric constant of the Al2O3 base ceramic product, short preparation time, easy control of process, high technological repeatability, no pollution in sintering, and high purity of product.

Description

High-k Al 2O 3The regulating power laser preparation method of base pottery
Technical field:
The invention belongs to Al 2O 3The preparation field of base ceramic material.
Background technology:
At present, capacitance density and reliability requirement to capacitor element in the microelectronics technology are more and more higher, the SiO that commonly uses in the existing technology 2Material, its relative dielectric constant is about 6, the limit effect that lower dielectric constant can cause device to produce because specification further dwindles, grievous injury device reliability.Al 2O 3The relative dielectric constant of pottery is about 10, and cheap, is widely used in microelectronic.Preparation Al 2O 3The ceramic existing technology of base adopts the sintering furnace sintering technology more.
At present, existing technology adopts the sintering furnace sintering processing to prepare Al more 2O 3The base pottery, the Al of preparation 2O 3The relative dielectric constant of pottery is about 10, and sintering time is longer, needs a few hours at least; Sintering process is wayward; Contaminating impurity when easily causing high temperature sintering.
Summary of the invention:
The object of the present invention is to provide a kind of high-k Al 2O 3The regulating power laser preparation method of base pottery adopts high power laser as heating source, to regulate laser power and to be aided with the mode of rotary table, prepares fast the Al with high-k 2O 3The base pottery.
The present invention is achieved by the following technical solutions:
(1) with Al 2O 3The base ceramic body places on the rotary table, makes laser power density reach 630-1030w/cm in the time of 30-60s 2, begin simultaneously sintering;
(2) through behind the sintering of 60-300s, reducing continuously laser power density in the time of 60-300s is zero;
(3) laser closes light, and sample is cooled to porcelain.
The rotating speed of the rotary table in the whole process of preparation is 10 ° of-50 °/s.
Described Al 2O 3The base pottery is Al 2O 3Pottery or (Al 2O 3) 0.988(Fe 2O 3) 0.006(FeTiO 3) 0.006Pottery.
Compared with prior art, the invention has the beneficial effects as follows:
1. adopt the Al of this method preparation 2O 3The dielectric constant of base pottery significantly improves, especially with Al 2O 3Pottery and (Al 2O 3) 0.988(Fe 2O 3) 0.006(FeTiO 3) 0.006The change in dielectric constant of pottery is the most remarkable.The Al of conventional sintering 2O 3Pottery and (Al 2O 3) 0.988(Fe 2O 3) 0.006(FeTiO 3) 0.006The dielectric constant mean value of pottery is respectively 9.8 and 10.5.And the Al after laser sintered 2O 3The dielectric constant mean value of pottery is 14.2, (Al 2O 3) 0.988(Fe 2O 3) 0.006(FeTiO 3) 0.006The dielectric constant mean value of pottery is 34.3, and dielectric loss factor mean value is respectively 0.0039 and 0.1636.
2. because the beam quality of laser instrument and inhomogeneous, all the light cost is higher if laser beam carried out, and adopts rotary table can avoid the inhomogeneous problem of beam quality, effect is relatively good in experiment, find in the experiment that when turntable speed was 10 ° of-50 °/s, effect was better.
3. preparation time is short, and preparation efficiency improves greatly.
4. carry out under preparation technology's normal condition, process controllability is strong, and repeatability is high.
5. owing to do not need crucible, the pottery preparation is pollution-free, preparation sample purity height.
Embodiment
Laser provided by the invention prepares high-k Al 2O 3The method of base pottery is carried out at normal temperatures; Adopt the dielectric properties of HP4284ALCR fine measuring instrument specimen under 25 ℃ of conditions, test frequency is 1MHz, and the dielectric properties measurement result sees Table 1.
Table 1 classify prepares high-k Al by the present invention 2O 3The dielectric properties of the technological parameter of base pottery and response sample.Wherein embodiment 9, and embodiment 10 is Al 2O 3Pottery, all the other embodiment are (Al 2O 3) 0.988(Fe 2O 3) 0.006(FeTiO 3) 0.006Pottery.
The laser apparatus that the present invention uses is German Rofin-sina RS2500 CO 2Laser apparatus.
With Al 2O 3The base ceramic body places on the rotary table, makes laser power density reach 630-1030w/cm in the time of 30-60s 2, begin simultaneously sintering; Through behind the sintering of 60-300s, reducing continuously laser power density in the time of 60-300s is zero; Laser closes light, and sample is cooled to porcelain.The rotating speed of rotary table is 10 ° of-50 °/s in the sintering process.
Embodiment 1
Adopt German Rofin-sina RS2500 laser illumination (Al 2O 3) 0.988(Fe 2O 3) 0.006(FeTiO 3) 0.006Ceramic body; At first in 60s, laser power density is brought up to sintering power density values 850w/cm continuously from 0 2, the rotary table rotating speed is 50 °/s, through behind the sintering time of 90s, reduces then laser power to zero in 60s; Laser closes light.Sample is cooled to porcelain.
Embodiment 2
Adopt German Rofin-sina RS2500 laser illumination (Al 2O 3) 0.988(Fe 2O 3) 0.006(FeTiO 3) 0.006Ceramic body; At first in 60s, laser power density is brought up to sintering power density values 850w/cm continuously from zero 2, the rotary table rotating speed is 50 °/s, through behind the sintering time of 300s, reduces then laser power to zero in 300s; Laser closes light.Sample is cooled to porcelain.
Embodiment 3
Adopt German Rofin-sina RS2500 laser illumination (Al 2O 3) 0.988(Fe 2O 3) 0.006(FeTiO 3) 0.006Ceramic body; At first in 30s, laser power density is brought up to sintering power density values 630w/cm continuously from zero 2, the rotary table rotating speed is 25 °/s, through behind the sintering time of 150s, reduces then laser power to zero in 150s; Laser closes light.Sample is cooled to porcelain.
Embodiment 4
Adopt German Rofin-sina RS2500 laser illumination (Al 2O 3) 0.988(Fe 2O 3) 0.006(FeTiO 3) 0.006Ceramic body; At first in 40s, laser power density is brought up to sintering power density values 1030w/cm continuously from zero 2, the rotary table rotating speed is 25 °/s, through behind the sintering time of 210s, reduces then laser power to zero in 180s; Laser closes light.Sample is cooled to porcelain.
Embodiment 5
Adopt German Rofin-sina RS2500 laser illumination (Al 2O 3) 0.988(Fe 2O 3) 0.006(FeTiO 3) 0.006Ceramic body; At first in 50s, laser power density is brought up to sintering power density values 1030w/cm continuously from zero 2, the rotary table rotating speed is 50 °/s, through behind the sintering time of 300s, reduces then laser power to zero in 60s; Laser closes light.Sample is cooled to porcelain.
Embodiment 6
Adopt German Rofin-sina RS2500 laser illumination (Al 2O 3) 0.988(Fe 2O 3) 0.006(FeTiO 3) 0.006Ceramic body; At first in 60s, laser power density is brought up to sintering power density values 630w/cm continuously from zero 2, the rotary table rotating speed is 10 °/s, through behind the sintering time of 300s, reduces then laser power to zero in 300s; Laser closes light.Sample is cooled to porcelain.
Embodiment 7
Adopt German Rofin-sina RS2500 laser illumination (Al 2O 3) 0.988(Fe 2O 3) 0.006(FeTiO 3) 0.006Ceramic body; At first in 30s, laser power density is brought up to sintering power density values 750w/cm continuously from zero 2, the rotary table rotating speed is 10 °/s, through behind the sintering time of 180s, reduces then laser power to zero in 210s; Laser closes light.Sample is cooled to porcelain.
Embodiment 8
Adopt German Rofin-sina RS2500 laser illumination (Al 2O 3) 0.988(Fe 2O 3) 0.006(FeTiO 3) 0.006Ceramic body; At first in 45s, laser power density is brought up to sintering power density values 950w/cm continuously from zero 2, the rotary table rotating speed is 25 °/s, through behind the sintering time of 60s, reduces then laser power to zero in 250s; Laser closes light.Sample is cooled to porcelain.
Embodiment 9
Adopt German Rofin-sina RS2500 laser illumination Al 2O 3Ceramic body; At first in 40s, laser power density is brought up to sintering power density values 900w/cm continuously from zero 2, the rotary table rotating speed is 10 °/s, through behind the sintering time of 180s, reduces then laser power to zero in 300s; Laser closes light.Sample is cooled to porcelain.
Embodiment 10
Adopt German Rofin-sina RS2500 laser illumination Al 2O 3Ceramic body; At first in 50s, laser power density is brought up to sintering power density values 900w/cm continuously from zero 2, the rotary table rotating speed is 25 °/s, through behind the sintering time of 210s, reduces then laser power to zero in 240s; Laser closes light.Sample is cooled to porcelain.
Table 1 is regulated power laser and is prepared Al 2O 3The processing parameter and the sample dielectric properties of base pottery
Embodiment Sintering power density w/cm 2 Improve power time s Sintering time s Reduce power time s Turntable speed °/s Specific inductivity Dielectric loss factor
1 ??850 ??60 ??90 ??60 ??50 ??33.322 ??0.1630
2 ??850 ??60 ??300 ??300 ??50 ??34.211 ??0.1521
3 ??630 ??30 ??150 ??150 ??25 ??33.234 ??0.1431
4 ??1030 ??40 ??210 ??180 ??25 ??34.189 ??0.1580
5 ??1030 ??50 ??300 ??60 ??50 ??34.174 ??0.1621
6 ??630 ??60 ??300 ??300 ??10 ??33.752 ??0.1623
7 ??750 ??30 ??180 ??210 ??10 ??33.840 ??0.1589
8 ??950 ??45 ??60 ??250 ??25 ??33.568 ??0.1596
9 ??900 ??40 ??180 ??300 ??10 ??14.240 ??0.0038
10 ??1030 ??50 ??210 ??240 ??25 ??14.246 ??0.0039

Claims (3)

1. high-k Al 2O 3The regulating power laser preparation method of base pottery is characterized in that it may further comprise the steps:
(1) with Al 2O 3The base ceramic body places on the rotary table, makes laser power density rise to 630-1030w/cm in the time of 30-60s 2, begin simultaneously sintering;
(2) through behind the sintering of 60-300s, reducing laser power close in the time of 60-300s is zero;
(3) laser closes light, and sample is cooled to porcelain.
2. high-k Al according to claim 1 2O 3The regulating power laser preparation method of base pottery is characterized in that the rotating speed of the rotary table in the whole preparation process is 10 ° of-50 °/s.
3. high-k Al according to claim 1 2O 3The regulating power laser preparation method of base pottery is characterized in that described Al 2O 3The base pottery is Al 2O 3Pottery or (Al 2O 3) 0.988(Fe 2O 3) 0.006(FeTiO 3) 0.006Pottery.
CN 200510000295 2005-01-10 2005-01-10 Method of preparing high dielectric constant AL203 base ceramics with power regulating laser Pending CN1648103A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 200510000295 CN1648103A (en) 2005-01-10 2005-01-10 Method of preparing high dielectric constant AL203 base ceramics with power regulating laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 200510000295 CN1648103A (en) 2005-01-10 2005-01-10 Method of preparing high dielectric constant AL203 base ceramics with power regulating laser

Publications (1)

Publication Number Publication Date
CN1648103A true CN1648103A (en) 2005-08-03

Family

ID=34875073

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 200510000295 Pending CN1648103A (en) 2005-01-10 2005-01-10 Method of preparing high dielectric constant AL203 base ceramics with power regulating laser

Country Status (1)

Country Link
CN (1) CN1648103A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101845652A (en) * 2010-03-17 2010-09-29 中国船舶重工集团公司第十二研究所 Method for preparing micro-arc oxide film layer
CN103771835A (en) * 2012-10-24 2014-05-07 天津城市建设学院 Hot pressure casting moulding method of laser pumping cavity Al2O3 ceramic reflector

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101845652A (en) * 2010-03-17 2010-09-29 中国船舶重工集团公司第十二研究所 Method for preparing micro-arc oxide film layer
CN101845652B (en) * 2010-03-17 2012-01-11 中国船舶重工集团公司第十二研究所 Method for preparing micro-arc oxide film layer
CN103771835A (en) * 2012-10-24 2014-05-07 天津城市建设学院 Hot pressure casting moulding method of laser pumping cavity Al2O3 ceramic reflector

Similar Documents

Publication Publication Date Title
Yong-Taeg et al. Fabrication of transparent silica glass by powder sintering
CN1534001A (en) Method of preparing zirconium oxide ceramic by curtain coating method and product obtained from said method
CN105481368A (en) Aluminum nitride ceramic tape casting slurry, ceramic substrate, and preparation methods as well as application of aluminum nitride ceramic tape casting slurry and ceramic substrate
US9243318B2 (en) Sintered material, and process for producing same
KR20170139656A (en) Combined zirconia refractories and methods for making same
CN1648103A (en) Method of preparing high dielectric constant AL203 base ceramics with power regulating laser
CN111549339B (en) Method for enhancing bonding fastness of graphene and base material
TW201706230A (en) Sputtering target, oxide semiconducting film, and method for making the same
EP1219580A2 (en) Sintering method and apparatus using centrifugal force
CN107032795B (en) ZrB2Solidification preparation method of-SiC eutectic composite ceramic
CN1213465C (en) Method for making polycrystalline semiconductor layer and laser annealing device
JP2016190767A (en) Carbon nanotube assembly and production method for the same
CN115849885B (en) High-purity high-strength alumina ceramic substrate and preparation method thereof
CN1176047C (en) Continuously adjustable and controllable power laser preparation method by using high dielectric constant Ta2O5 base ceramics
CN1199910C (en) Method of instantaneous controlling laser power for preparing ceramics in base of Ta2O5 with high dielectric constant
KR102134123B1 (en) Manufacturing method of Ceramic Plate for an Electrostatic Chuck using 3d printing
CN1233591C (en) Laser preparing method for Ta2O5 base transparent ceramics
CN114752908A (en) Preparation method of metal/nonmetal composite film with vertical array structure
KR102057406B1 (en) Ceramic roller guide and lift pin assembly for large display glass process and manufacturing method thereof
CN109867304B (en) Vanadium dioxide metal insulation phase change regulation and control method and application
Xu et al. Growth and dielectric properties of Ta2O5 single crystal by the floating zone method
KR101151208B1 (en) Machinable ceramic composite material and manufacturing method of the same
CN107721395A (en) Transparent alumina ceramics preparation method
CN105862128B (en) A kind of preparation method of normal-temperature high-strength mechanical property aluminum oxide wafer for being suitable for screen material and its obtained product
JP3218329B2 (en) Hot working method of mullite based ceramic substrate using kaolin clay

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication