CN1640837A - Base plate glass composition for display device - Google Patents
Base plate glass composition for display device Download PDFInfo
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- CN1640837A CN1640837A CN 200410000513 CN200410000513A CN1640837A CN 1640837 A CN1640837 A CN 1640837A CN 200410000513 CN200410000513 CN 200410000513 CN 200410000513 A CN200410000513 A CN 200410000513A CN 1640837 A CN1640837 A CN 1640837A
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
- C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/095—Glass compositions containing silica with 40% to 90% silica, by weight containing rare earths
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Abstract
The base plate glass for display has the ingredients including: silicon dioxide 56.0-64.0 wt%, aluminum oxide 14.0-19.0 wt%, boron oxide 7.5-14.0 wt%, magnesium oxide 0-4.0 wt%, calcium oxide 3.0-10 wt%, strontium oxide 0-6.0 wt%, barium oxide 0-10 wt%, zinc oxide 0-1.0 wt%, zirconium oxide 0-1.0 wt%, arsenious oxide 0-2.0 wt%, antimony oxide 0-1.0 wt%, tin oxide 0-1.0 wt%, and cerium oxide 0-1.0 wt%, with silicon dioxide + aluminum oxide greater than 71.0 wt%, aluminum oxide/boron oxide in 1.0-2.1, magnesium oxide + calcium oxide 3.0-10 wt%, strontium oxide + barium oxide 0-13 wt%, and arsenious oxide + antimony oxide+ tin oxide + and cerium oxide 0.3-2.0 wt%. The present invention can meet all the requirements for base plate glass of planar display.
Description
Technical field
The present invention is the composition of the base plate glass used of relevant a kind of indicating meter, and promptly the Boroalumino silicate glasses prescription refers in particular to a kind of production flat-panel screens glass substrate that can be used for, especially for the composition of the glass of liquid-crystal display (LCD) glass substrate.
Background technology
As everyone knows, indicating meter is a most important output equipment in the machine element, and its effect is exactly to convert the electrical signal that main frame sends to optical signal after a series of processing, and literal, graphic presentation are come out the most at last.
Indicating meter divides by its principle of work, more commonly: tube display of negative ray (CRT) and liquid-crystal display (LCD), also have plasma display (PDP), vacuum fluorescent display (VFD) etc. in addition, yet, plasma display (PDP), vacuum fluorescent display (VFD) are the representatives of indicating meter of new generation, but, therefore do not popularize as yet because technology is not attained maturation.
Indicating meter is according to different cathode-ray tube display (CRT), plasma display (PDP), light emitting diode indicator (LED), electroluminescent display (ELD), liquid-crystal display (LCD), electrochromic display device (ECD) and the electrophoretic display device (EPD) types such as (EPID) of being divided into of manufactured materials and technology.
Wherein color CRT (CathodeRayTube, cathode tube) indicating meter is divided into shadow mask crt and voltage penetration CRT again.The shadow mask crt indicating meter is exactly our modal indicating meter, and utilizing has one to gain the name in order to the metal shadow mask plate that forms grid hole or grizzly bar between electron beam gun and the window of tube.Though the shadow mask crt indicating meter compares power consumption and volume is big, price is relatively cheap, work-ing life is longer, and display effect is also good.
Though the over-all properties of cathode-ray tube display is pretty good, it still has some inherent shortcomings, as bulky, current consumption is big, radiation is magnetized more by force, easily etc.Yet above-mentioned these shortcomings are that the principle of work by cathode-ray tube display causes, and can not fundamentally be changed, can only carry out follow-up repairing improves, or after problem takes place, solve separately again, in order to solve above-mentioned various defective, just develop the out-of-plane indicating meter.
So-called flat-panel screens is other indicating meter of general reference non-iconoscope (CRT) formula, but with regard to product technology difference, it includes plasma display panel (PDP), liquid-crystal display (LCD), organic electro-luminescent display (OLED), vacuum fluorescent display (VFD), effect emission display (FED) and miniscope broad varietys such as (MicroDisplay).
Liquid-crystal display has following advantage:
1, structure and small product size are little:
Traditional monitor is owing to use CRT, must be by the electron beam gun divergent bundle to screen, thereby the neck of picture tube can not do very shortly, when screen increases, also must increase the volume of whole indicating meter.The TFT liquid-crystal display reaches the demonstration purpose by the liquid crystal control electrode molecularity on the display screen, even screen strengthens, the increase that its volume also can not be directly proportional (only increases size and does not increase thickness, can allow the user more save the space), and the traditional monitor than identical display area is light on weight.The TFT liquid-crystal display only is on the unicircuit of electrode and driving owing to power consumption simultaneously, thereby current consumption is also more much smaller than traditional monitor.
2, the width of cloth is penetrated with Electromagnetic Interference little:
Traditional monitor can produce the width of cloth and penetrate owing to adopt the electron beam gun divergent bundle after getting on the screen, although currently available products improves a lot technically, the width of cloth is penetrated infringement drop to minimum, can not eradicate.In this, the TFT liquid-crystal display has inborn advantage, and it does not have the width of cloth to penetrate can to say at all.As for electromagnetic interference, only from a small amount of hertzian wave of driving circuit, as long as the shell strict seal can be got rid of hertzian wave to leak, and traditional monitor is in order to dispel the heat for the TFT liquid-crystal display, have to louvre on the outer shell auger, so Electromagnetic Interference is just inevitable.So having, liquid-crystal display is called cold indicating meter or environmental protection indicating meter.
3, flat square and resolving power height:
The TFT liquid-crystal display uses pure planar sheet glass at the very start, and the display effect of its flat square seems much better than traditional monitor.But on resolving power, the TFT liquid-crystal display can provide higher resolving power in theory, but the actual displayed effect is very different, because there is the problem of an optimum resolution in it.And traditional monitor can reach perfect display effect under the support of better display card.
4, set up and select the space big:
Now a lot of liquid-crystal displays are all built-in USB Hub interface, along with the appearance of plane formula audio amplifier etc., liquid-crystal display built-in speaker or microphone also can become main flow, and various setting up makes liquid-crystal display that bigger selection space be arranged.
In a word, liquid-crystal display (LCD) is than traditional CRT monitor, has that image is undistorted, a flicker free, the advantage that is beneficial to health and environmental protection such as radiationless, light, thin, makes it have the better development space than traditional monitor.
Liquid-crystal display is to be basic module with the liquid crystal material and since liquid crystal be between solid-state and liquid between, not only have the solid crystals optical characteristics, have the liquid flow dynamic characteristic again, so can be described as an intermediate phase.And to understand the photovoltaic effect that is produced of liquid crystal, and the viscosity of liquid crystal and elasticity are from hydromechanical viewpoint, and the liquid with alignment properties of can saying so according to the different direction of effect strength, should have different effects.
In addition, liquid crystal is gone back the rubber-like reaction except sticking reaction, and they all are for the strength that adds, and have presented the effect of directivity.Also therefore light is injected in the liquid crystal material, will inevitably advance according to the arrangement mode of liquid crystal molecule, has produced natural deflection and has now looked like.As for the electronic structure in the liquid crystal molecule, all possessing very strong electron conjugated motor capacity, so work as the effect that liquid crystal molecule is subjected to extra electric field, just polarized easily generation induction dipolar nature (induceddipolar), this also is the source of liquid crystal molecule between interaction strength.
Used liquid-crystal display in the general electronic products, utilize the photovoltaic effect of liquid crystal exactly, by the voltage control of outside, the refracting characteristic by liquid crystal molecule again, and the rotatory power of light obtained bright dark situation (perhaps being called visual optical contrast), and then reach the purpose of video picture.
Liquid-crystal display, English is commonly referred to as LCD (Liquid Crystal Display), be belong to flat-panel screens a kind of, it is the flat display apparatus that relies on the external light source illumination, mainly be made of two sheet glass substrates and liquid crystal etc., classifying according to type of drive can be divided into static drive (Static), simple matrix and drive three kinds of (Simple Matrix) and active matrix drive (Active Matrix).
Wherein, the simple matrix type can be divided into torsional mode nematic (Twisted Nematic again; TN), super torsional mode nematic (Super Twisted Nematic; STN) and other simple matrix drive liquid-crystal display.
And the active-matrix type roughly can be divided into thin-film transistors type (Thin Film Transistor; TFT) and two-terminal diode-type (Metal/Insulator/Metal; MIM) two kinds of modes.
Common LCD has STN Super TN type (STN) and film transistor type (TFT) on market at present, wherein the STN type belongs to the simple matrix addressing mode, and the TFT type belongs to the active matrix addressed mode, because display effect is better than STN type, and the main flow on the market particularly.The TFT type often is divided into amorphous silicon type (a-Si) and more advanced polysilicon type two kinds of configurations such as (poly-Si) again.
The glass substrate that LCD uses cooperates above-mentioned technology process, and by variously form, difference on manufacture and the characteristic.The STN type generally uses soda-lime glass, and the TFT type then uses silicate glass containing boron and aluminium without alkali.
United States Patent (USP) the 5th, 811, No. 361, the 5th, 851, No. 939, the 6th, 329, No. 310 grades mentioned the base plate glass used as TFT type LCD must possess following basic physical property:
1, in order to reduce base plate glass under the TFT process temperatures, the thermal shock that causes because of expanding with heat and contract with cold destroys, and the thermal expansivity of glass must be enough low, generally need be lower than 40 * 10
-7/ ℃.
2, should reduce base plate glass under the TFT process temperatures, the volumetric shrinkage and the size instability that cause because of hot densification again.Specific requirement is that the strain point temperature of glass should be higher than 650 ℃.
3, in order to adapt to the light-weighted requirement of large-size substrate glass, the density of glass must be enough low, generally need be lower than 2.6 (g/cm
3).
Therefore, in order to produce the base plate glass that meets above-mentioned primary demand, often make base plate glass now with molding modes such as melt overflow method and floating methods.Yet, because the demand of molding mode, more derive to the base plate glass characteristic further require as follows:
1, the liquidus temperature of base plate glass must be enough low, so as not in moulding process devitrification or crystallization, have influence on the exterior quality of glass.Liquidus temperature generally need be lower than 1200 ℃.
2, the air bubble content of base plate glass must reduce, in order to avoid in the TFT processing procedure, cause defective such as open circuit, or have influence on the exterior quality of glass.Need generally that the bubbles number of bubble diameter in 0.5-1.0mm is less than 20 in the per kilogram base plate glass.
Expansion along with polysilicon type (poly-Si) TFT-LCD grade generation processing procedure or product demand, and in order to adapt to the higher precision of poly-Si processing procedure, to the requirement of the basic physical property of base plate glass, except the above-mentioned part of having mentioned, further derive following requirement:
1, thermal expansivity continues to reduce, and generally need be lower than 34 * 10
-7/ ℃, destroy except reducing thermal shock, more wish approachingly with siliceous driven unit, so that when the driven unit circuit directly is produced on the substrate (chip-on-glass) in the future, reduce the circuit damage that glass and siliceous cause because of coefficient of thermal expansion mismatch.
2, in the poly-SiTFT processing procedure, the precision of photolithography promotes, and circuitry lines directly narrows down, therefore strain point temperature should improve again, preferably be higher than 665 ℃,, alleviate the focusing misalignment phenomenon in the exposure imaging process to reduce volumetric shrinkage and the size instability that causes because of hot densification again.
3, the 5th from generation to generation above in order to adapt to (requirement of the manufacturing of the glass substrate of 1100mm * 1250mm), carrying etc., glass substrate needs lightweight as far as possible, therefore, the density of glass need reduce, and generally need be lower than 2.4 (g/cm
3).
Because the liquid-crystal display demand is day by day ardent, yet the base plate glass that is used for indicating meter still has above-mentioned various physical property and need overcome, as: the thermal expansivity of glass need be lower than 40 * 10
-7/ ℃, the strain point temperature of glass should be higher than 650 ℃, the density of glass and must be lower than 2.6 (g/cm
3), liquidus temperature need be lower than in 1200 ℃, per kilogram base plate glass the bubbles number of bubble diameter in 0.5-1.0mm and be less than physical propertys such as 20 and need overcome.
Summary of the invention
Main purpose of the present invention provides the composition of the base plate glass that a kind of indicating meter uses, by the silicon oxide (SiO of specified proportion
2), aluminum oxide (Al
2O
3), boron oxide (B
2O
3), magnesium oxide (MgO), calcium oxide (CaO), strontium oxide (SrO), barium oxide (BaO), zinc oxide (ZnO), zirconium white (ZrO
2), arsenic oxide arsenoxide (As
2O
3), weisspiessglanz (Sb
2O
3), stannic oxide (SnO
2) and cerium oxide (CeO
2), can adapt to the various demands of planar display substrates glass, and meet the requirement of more harsh physical property, as: thermal expansivity is lower than 34 * 10
-7/ ℃, strain point temperature is higher than 665 ℃, the density of glass and is lower than 2.4 (g/cm
3) etc., reach the purpose of the various demands that meet planar display substrates glass.
The object of the present invention is achieved like this: the composition of the base plate glass that a kind of indicating meter is used is characterized in that: it comprises the silicon oxide of 56.0%-64.0% by weight percentage, the aluminum oxide of 14.0%-19.0%, the boron oxide of 7.5%-14.0%, the magnesium oxide of 0-4.0%, the calcium oxide of 3.0%-10%, the strontium oxide of 0-6.0%, the barium oxide of 0-10%, the zinc oxide of 0-1.0%, the zirconium white of 0-1.0%, the arsenic oxide arsenoxide of 0-2.0%, the weisspiessglanz of 0-1.0%, the stannic oxide of 0-1.0% and the cerium oxide of 0-1.0%; Wherein the summation of this silicon oxide and aluminum oxide surpasses 71.0%, the ratio of aluminum oxide and boron oxide is between 1.0 and 2.1%, the summation of magnesium oxide and/or calcium oxide is between 3.0%-10%, strontium oxide and/or barytic summation are between 0-13.0%, and the summation of arsenic oxide arsenoxide and weisspiessglanz, stannic oxide, cerium oxide is between 0.3%-2.0%.
It comprises the silicon oxide of 56.0%-60 by weight percentage, the aluminum oxide of 14.0%-18.0%, the boron oxide of 7.5%-14.0%, the arsenic oxide arsenoxide of the zinc oxide of the strontium oxide of the magnesium oxide of 0-2.0%, the calcium oxide of 3.0%-7.0%, 1.0%-6.0%, the barium oxide of 2.0%-10%, 0-1.0%, the zirconium white of 0-1.0%, 0-2.0%, the weisspiessglanz of 0-1.0%, the stannic oxide of 0-1.0% and the cerium oxide of 0-1.0%; Wherein the summation of this silicon oxide and aluminum oxide surpasses 71.0%, the ratio of this aluminum oxide and boron oxide is between 1.0 and 2.1%, the summation of this magnesium oxide and/or calcium oxide is between 3.0%-7.0%, strontium oxide and/or barytic summation are between 4.0%-13.0%, and the summation of arsenic oxide arsenoxide and weisspiessglanz, stannic oxide, cerium oxide is between 0.3%-2.0%.The thermal expansivity of this glass is lower than 40 * 10
-7/ ℃, strain point temperature is higher than 650 ℃, density and is lower than 2.6g/cm
3, liquidus temperature is lower than that the bubbles number of bubble diameter in 0.5-1.0mm is less than 20 in 1200 ℃, per kilogram base plate glass.This glass substrate is the glass substrate of TFT-LCD.
The composition that it comprises by weight percentage is respectively the silicon oxide of 60-64.0%, the aluminum oxide of 15.0%-19.0%, the boron oxide of 9.5%-13.0%, the magnesium oxide of 0-4.0%, the calcium oxide of 3.0%-10%, the strontium oxide of 0-3.0%, the barium oxide of 0-2.0%, the zinc oxide of 0-1.0%, the zirconium white of 0-1.0%, the arsenic oxide arsenoxide of 0-2.0%, the weisspiessglanz of 0-1.0%, the stannic oxide of 0-1.0% and the cerium oxide of 0-1.0%; Wherein the summation of this silicon oxide and aluminum oxide surpasses 76.0%, the ratio of aluminum oxide and boron oxide is between 1.3 and 1.8%, the summation of magnesium oxide and/or calcium oxide is between 5.0%-10%, strontium oxide and/or barytic summation are between 0-4.5%, and the summation of arsenic oxide arsenoxide and weisspiessglanz, stannic oxide, cerium oxide is between 0.3%-2.0%.
The thermal expansivity of this glass is lower than 34 * 10
-7/ ℃, strain point temperature is higher than 665 ℃, density and is lower than 2.4g/cm
3, liquidus temperature is lower than that the bubbles number of bubble diameter in 0.5-1.0mm is less than 20 in 1200 ℃, per kilogram base plate glass.
This glass substrate comprises the TFT-LCD glass substrate of TFT-LCD generation of polysilicon type processing procedure or product.
Ratio by specific composition can make the glass of being produced more meet the various demands of planar display substrates glass.
Below in conjunction with specific embodiment, to the detailed description of the invention.
Embodiment
The composition of the base plate glass that indicating meter of the present invention is used, the weight percent of its moiety is as follows:
(1) silicon oxide (SiO of 56.0%-64.0%
2);
(2) aluminum oxide (Al of 14.0%-19.0%
2O
3);
(3) boron oxide (B of 7.5%-14.0%
2O
3);
(4) magnesium oxide of 0-4.0% (MgO);
(5) calcium oxide of 3.0%-10% (CaO);
(6) strontium oxide of 0-6.0% (SrO);
(7) barium oxide of 0-10% (BaO);
(8) zinc oxide of 0-1.0% (ZnO);
(9) zirconium white (ZrO of 0-1.0%
2);
(10) arsenic oxide arsenoxide (As of 0-2.0%
2O
3);
(11) weisspiessglanz (Sb of 0-1.0%
2O
3);
(12) stannic oxide (SnO of 0-1.0%
2);
(13) cerium oxide (CeO of 0-1.0%
2);
Wherein the summation of silicon oxide and aluminum oxide surpasses 71.0%, the ratio of aluminum oxide and boron oxide is between 1.0 and 2.1%, the summation of magnesium oxide, calcium oxide is between 3.0%-10%, strontium oxide, barytic summation are between 0-13.0%, and the summation of arsenic oxide arsenoxide and weisspiessglanz, stannic oxide, cerium oxide is between 0.3%-2.0%.
Form by the disclosed glass of the invention described above, when only having the required basic physical property of TFT-LCD glass substrate, the weight percent of its composition is respectively the silicon oxide of 56.0%-60%, the aluminum oxide of 14.0%-18.0%, the boron oxide of 7.5%-14.0%, the magnesium oxide of 0-2.0%, the calcium oxide of 3.0%-7.0%, the strontium oxide of 1.0%-6.0%, the barium oxide of 2.0%-10%, the zinc oxide of 0-1.0%, the zirconium white of 0-1.0%, the arsenic oxide arsenoxide of 0-2.0%, the weisspiessglanz of 0-1.0%, the stannic oxide of 0-1.0% and the cerium oxide of 0-1.0%, and wherein the summation of silicon oxide and aluminum oxide surpasses 71.0%, and the ratio of aluminum oxide and boron oxide is between 1.0% and 2.1%, and the summation of magnesium oxide and calcium oxide is between 3.0%-7.0%, strontium oxide and barytic summation between 4.0%-13.0%, arsenic oxide arsenoxide and weisspiessglanz, stannic oxide, the summation of cerium oxide is between 0.3%-2.0%.
The glass of these compositions, its thermal expansivity is lower than 40 * 10
-7/ ℃ (30-400 ℃), strain point temperature is higher than 650 ℃, and density is lower than 2.6 (g/cm
3), liquidus temperature is lower than 1200 ℃, and the bubbles number of bubble diameter in 0.5-1.0mm is less than 20 in the per kilogram base plate glass, satisfies the required basic physical property of TFT-LCD glass substrate.
Below further specify above-mentioned these and form the reason of restriction.
Silicon oxide is the main body that glass network forms, and its preferable content is that 56.0%-60% is less than 56.0% as if silica content, and then produced thermal expansion coefficient of glass is too high, and glass is with easy devitrification; Yet, if silica content more than 60%, will cause the melting temperature (Tm) of glass too high, be difficult to general calciner manufacturing, and the also easy devitrification of made glass.
Aluminum oxide is the intensity in order to the raising glass structure, and preferable content is between 14.0%-18.0%.If alumina content is less than 14.0%, glass also is subjected to the erosion of extraneous aqueous vapor or chemical reagent easily with easy devitrification; Yet, if alumina content more than 18.0%, also will cause the melting temperature (Tm) of glass too high, and be unfavorable for general calciner manufacturing.
Therefore, for constituting the main body of glass network structure, its preferable summation should surpass 71.0% jointly for silicon oxide and aluminum oxide, if the summation of silicon oxide and aluminum oxide is less than 71.0%, then glass structure will be stabilized inadequately, and devitrification also is subjected to the erosion of extraneous aqueous vapor or chemical reagent easily easily.
Boron oxide is to use as fusing assistant, the viscosity of glass cream during mainly in order to the reduction fusion cast glass, and preferable content is 7.5%-14.0%.If boron oxide content is less than 7.5%, then its fusing assistant effect promptly can't be given full play to; Yet, if boron oxide content more than 14.0%, owing to the volatilization of boron oxide, is difficult for making the glass of homogeneous.
Because aluminum oxide and boron oxide all have very big influence to glass viscosity and melting temperature (Tm), so its proportional range should be restricted.The preferred proportion of aluminum oxide and boron oxide is between 1.0 and 2.1, if ratio is lower than 1.0%, the viscosity of glass cream is too low, and glass substrate is easy-formation not.If ratio is higher than 2.1, the viscosity of glass cream is too high, is unfavorable for general calciner manufacturing.
Magnesium oxide is the viscosity of glass cream when reducing fusion cast glass, with reduce wherein bubble or the content of impurity, and adjust glass ware forming, its preferable content is between between 0-2.0%, if content of magnesia is more than 2.0%, then glass can certainly not add magnesium oxide with easy devitrification.
The effect of calcium oxide is the fusion that promotes glass, and adjusts glass ware forming, and its preferable content is between between 3.0%-7.0%.If calcium oxide content is less than 3.0%, can't effectively reduce the viscosity of glass; And if calcium oxide content more than 7.0%, glass is easy devitrification, and thermal expansivity can significantly improve, and is unfavorable for the application of successive process.
Thus, the effect of magnesium oxide and calcium oxide is as fusing assistant and adjusts glass ware forming.The preferable total content of magnesium oxide and calcium oxide is between between 3.0%-7.0%, if total content is less than 3.0%, can't bring into play the effect that promotes the glass fusion; If total content more than 7.0%, will cause glass devitrification and moulding bad, and thermal expansivity can be too high.
The effect of strontium oxide is as fusing assistant and prevents the glass devitrification that its preferable content is between 1.0%-6.0%.If strontium oxide content is less than 1.0%, can't bring into play the effect of fusing assistant, and glass is with easy devitrification; If strontium oxide content is more than 6.0%, glass density can be too high, is unfavorable for the application of product.
Barytic effect is similar to strontium oxide, and its preferable content is 2.0%-10%, if barium oxide content is less than 2.0%, can't bring into play the effect of fusing assistant, and glass is with easy devitrification; Yet more than 10%, glass density can be too high, and strain point can significantly reduce as if barium oxide content.
Because strontium oxide and barytic effect are as fusing assistant and prevent the glass devitrification that its preferable total content is between between 4.0%-13.0%, if total content is less than 4.0%, can't bring into play the effect that promotes the glass fusion, and glass is with easy devitrification; And if total content more than 13.0%, will cause the glass density can be too high.
Zinc oxide also is that its preferable content is 0-1.0% in order to the fusion of promotion glass, and more than 1.0%, glass can certainly not add zinc oxide with easy devitrification as if zinc oxide content.
Zirconium white also is the viscosity in order to reduction glass, and to promote the fusion effect of glass, its preferable content is between 0-1.0%, and more than 1.0%, glass can certainly not add zirconium white with easy devitrification as if zirconia content.
Because finings or defrother when the effect of arsenic oxide arsenoxide, weisspiessglanz, stannic oxide and cerium oxide is the glass fusion, its preferable total content is 0.3%-2.0%.If total content is less than 0.3%, its finings or defrother effect promptly can't be given full play to; If total content more than 2.0%, will cause glass flavescence or blackout, influence transparence.
The preferable content of arsenic oxide arsenoxide is between 0-2.0%, if arsenic oxide arsenoxide content, then will cause the glass blackout more than 2.0%, can certainly not add arsenic oxide arsenoxide.
The preferable content of weisspiessglanz is between 0-1.0%, if weisspiessglanz content, also will cause the glass blackout more than 1.0%, can certainly not add weisspiessglanz.
The preferable content of stannic oxide is between 0-1.0%, if stannic oxide content more than 1.0%, will cause the glass devitrification, can certainly not add stannic oxide.
The preferable content of cerium oxide is between 0-1.0%, if cerium oxide content more than 1.0%, will make the glass flavescence, influences transparence, can certainly not add cerium oxide.
Form by the disclosed glass of the present invention, when having as polysilicon type (poly-Si) TFT-LCD grade generation processing procedure or the required TFT-LCD glass substrate of product characteristic, the weight percent of its composition is respectively the silicon oxide of 60-64.0%, the aluminum oxide of 15.0%-19.0%, the boron oxide of 9.5%-13.0%, the magnesium oxide of 0-4.0%, the calcium oxide of 3.0%-10%, the strontium oxide of 0-3.0%, the barium oxide of 0-2.0%, the zinc oxide of 0-1.0%, the zirconium white of 0-1.0%, the arsenic oxide arsenoxide of 0-2.0%, the weisspiessglanz of 0-1.0%, the stannic oxide of 0-1.0% and the cerium oxide of 0-1.0%;
Wherein the summation of silicon oxide and aluminum oxide surpasses 76.0%, the ratio of aluminum oxide and boron oxide is between 1.3% and 1.8%, the summation of magnesium oxide and/or calcium oxide is between 5.0%-10%, strontium oxide and/or barytic summation are between 0-4.5%, and the summation of arsenic oxide arsenoxide and weisspiessglanz, stannic oxide, cerium oxide is between 0.3%-2.0%.
The glass of these compositions, its thermal expansivity is lower than 34 * 10
-7/ ℃ (30-400 ℃), strain point temperature is higher than 665 ℃, and density is lower than 2.4 (g/cm
3), liquidus temperature is lower than 1200 ℃, and the bubbles number of bubble diameter in 0.5-1.0mm is less than 20 in the per kilogram base plate glass, satisfies as polysilicon type (poly-Si) TFT-LCD grade generation processing procedure or the required TFT-LCD glass substrate of product characteristic.
Below describe above-mentioned these in detail and form the reason of restriction.
Because silicon oxide is the main body that glass network forms, its preferable content is 60-64.0%.If silica content is less than 60%, produced thermal expansion coefficient of glass is too high, and glass is with easy devitrification;
If silica content more than 64.0%, then will cause the melting temperature (Tm) of glass too high, cause it and be difficult to general calciner manufacturing, and the also easy devitrification of made glass.
Aluminum oxide is that preferable content is between 15.0%-19.0% in order to the intensity of raising glass structure.If alumina content is less than 15.0%, glass also is subjected to the erosion of extraneous aqueous vapor or chemical reagent easily with easy devitrification; Yet, if alumina content more than 19.0%, also will cause the melting temperature (Tm) of glass too high, and be unfavorable for general calciner manufacturing.
Because silicon oxide and aluminum oxide are the main bodys that constitutes the glass network structure jointly, its preferable summation should surpass 76.0%, if the summation of silicon oxide and aluminum oxide is less than 76.0%, glass structure will be stabilized inadequately, devitrification also is subjected to the erosion of extraneous aqueous vapor or chemical reagent easily easily.
The effect of boron oxide is as fusing assistant, mainly is the viscosity of glass cream when reducing fusion cast glass, and its preferable content is 9.5%-13.0%, if boron oxide content is less than 9.5%, its fusing assistant effect promptly can't be given full play to; If boron oxide content more than 13.0%, owing to the volatilization of boron oxide, is difficult for making the glass of homogeneous.
And aluminum oxide and boron oxide all have very big influence to glass viscosity and melting temperature (Tm), so its proportional range should be restricted.The preferred proportion of aluminum oxide and boron oxide is between 1.3% and 1.8%, if ratio is lower than 1.3%, the viscosity of glass cream is too low, and glass substrate is easy-formation not; If ratio is higher than 1.8%, the viscosity of glass cream is too high, is unfavorable for general calciner manufacturing.
Magnesium oxide is the viscosity of glass cream when reducing fusion cast glass, with reduce wherein bubble or the content of impurity, and adjust glass ware forming.Its preferable content is between between 0-4.0%, but if content of magnesia more than 4.0%, glass is with easy devitrification.
The effect of calcium oxide also is the fusion that promotes glass, and adjusts glass ware forming.Its preferable content is between between 3.0%-10%, if calcium oxide content is less than 3.0%, can't effectively reduce the viscosity of glass; If calcium oxide content is more than 10%, glass is easy devitrification, and thermal expansivity can significantly improve, and is unfavorable for the application of successive process.
The effect of magnesium oxide and calcium oxide is as fusing assistant, and adjusts glass ware forming.The preferable total content of magnesium oxide and calcium oxide is between between 5.0%-10%, if total content is less than 5.0%, can't bring into play the effect that promotes the glass fusion; If total content more than 10%, will cause glass devitrification and moulding bad, and thermal expansivity can be too high.
The acting on as fusing assistant and prevent the glass devitrification of strontium oxide, its preferable content is between 0-3.0%, if strontium oxide content is more than 3.0%, glass density can be too high, is unfavorable for the application of product.
Barytic effect is similar to strontium oxide, and its preferable content is 0-2.0%, and more than 2.0%, glass density can be too high, and strain point can significantly reduce as if barium oxide content.
Strontium oxide and barytic effect are as fusing assistant and prevent the glass devitrification.Its preferable total content is between between 0-4.5%, if total content is more than 4.5%, will cause the glass density can be too high.
Zinc oxide also is that its preferable content is 0-1.0% in order to the fusion of promotion glass, and more than 1.0%, glass is with easy devitrification as if zinc oxide content.
Zirconium white also is the viscosity in order to reduction glass, and to promote the fusion effect of glass, its preferable content is between 0-1.0%, and more than 1.0%, glass is with easy devitrification as if zirconia content.
Finings or defrother when the effect of arsenic oxide arsenoxide, weisspiessglanz, stannic oxide and cerium oxide is the glass fusion, its preferable total content is 0.3%-2.0%, if total content is less than 0.3%, its finings or defrother effect promptly can't be given full play to; If total content more than 2.0%, will cause glass flavescence or blackout, influence transparence.
The preferable content of arsenic oxide arsenoxide is between 0-2.0%, if arsenic oxide arsenoxide content, will cause the glass blackout more than 2.0%.
The preferable content of weisspiessglanz is between 0-1.0%, if weisspiessglanz content, also will cause the glass blackout more than 1.0%.
The preferable content of stannic oxide is between 0-1.0%, if stannic oxide content more than 1.0%, will cause the glass devitrification.
The preferable content of cerium oxide is between 0-1.0%, if cerium oxide content more than 1.0%, will make the glass flavescence, influences transparence.
The present invention is earlier with above-mentioned constituent, behind the uniform mixing, mixing raw material is imported glass fusion groove, after treating that this mixing raw material fuses into glass cream, the temperature range that its temperature reduction-moulding is required gives moulding, produces the glass substrate of pre-determined thickness, again glass substrate is low cooled off, can be cut into the glass substrate finished product that liquid-crystal display is used.
Specific embodiment
Demonstrate the composition and the characteristic of the made glass sample of the present invention in following table 1 and the table 2 (embodiment 1-embodiment 10), this that is embodiments of the invention.
Table 1 is the disclosed glass compositing range of the present invention, corresponding to only having the required basic physical property of TFT-LCD glass substrate.
Table 2 is the disclosed glass compositing ranges of the present invention, corresponding to still having as polysilicon type (poly-Si) TFT-LCD grade generation processing procedure or the required TFT-LCD glass substrate of product characteristic.
Show composition and the characteristic that is different from the made glass sample of the present invention in table 3 and the table 4 (comparative example 11-comparative example 16), that is comparative example of the present invention.
Wherein table 3 is control groups of table 1, and table 4 is control groups of table 2.
The glass sample of table 1～table 4 wherein all is with following identical method manufacturing:
Each composition that uses is to take from raw material commonly used, according to pairing weight percent uniform mixing in addition, again with 1600-1650 ℃ temperature, and in platinum crucible, fused 6-8 hour, in the fusion processes, utilize the platinum stirring rod to stir 2 hours,, then glass cream is poured into cooling forming is tabular in the metal form to promote the homogeneity of each composition in the glass.At this moment, detect, obtain characteristic values such as thermal expansivity, strain point, density, liquidus temperature, bubbles number respectively, and the difference tabular is on the correspondence position of following table 1～table 4 at each glass sample.
Wherein, when detecting each characteristic value of each glass sample of the present invention, mainly be to detect according to following method:
(1) thermal expansivity (unit: 10
-7/ ℃) detection: be with reference to (the AmericanSocietyforTestingandMaterials of American Society for testing and materials, hereinafter to be referred as ASTM) ordered numbering E228-95 examination criteria, with mechanical push rods formula thermal dilatometer and aluminum oxide is reference standard, the elongation of heating and measurement glass sample, temperature range is no longer extended to glass from the room temperature amount, even because of the temperature till softening the contraction, temperature rise rate is 3 ℃ of per minutes.Thermal expansivity is calculated by 30-400 ℃ glass elongation.
(2) detection of strain point (unit: ℃): be with reference to ASTM C598-93, heating also measures the deformation rate of glass sample and the relation of temperature, with the pairing temperature of certain variations rate as strain point.
(3) density (unit: g/cm
3) detection: be with reference to ASTM C729-75, get the block glass that about 2 g of weights do not contain bubble, the situation of drifting along in specific gravity liquid with glass sample measures its density.
(4) detection of glass liquidus temperature (unit: ℃): be according to ASTM C829-81, will put into platinum dish, place gradient furnace after 24 hours, measure the crystallization situation of glass, judge its liquidus temperature and get with microscope less than the cullet of 850 μ m.
(5) bubble produces number (unit: individual/kilogram): after the plate glass sample is ground, polishes, examine under a microscope its air entrapment number, calculate the bubbles number of bubble diameter in 0.5-1.0mm, be scaled the number of bubbles of per kilogram glass again with glass sample weight.The bubble of table 1, table 2, table 3 and table 4 produces in the number correspondence position, and is all with " zero " tagger, then represents the sample of this composition, and its bubble produces number below 10/kilogram, belongs to good situation; All with " △ " tagger, represent the sample of this composition, its bubble produces number between 10-50/kilogram, belongs to medium situation; All with " * " tagger, represent the sample of this composition, its bubble produces number more than 50/kilogram, belongs to not good situation.
By respectively detecting data among the table 1 illustrated embodiment 1-5, but clear view goes out:
When only needing to have the required basic physical property of TFT-LCD glass substrate, according to the made glass of the disclosed glass compositing range of the present invention, its thermal expansivity all is lower than 40 * 10 in the boundary in the time of temperature 30-400 ℃
-7/ ℃, strain point temperature all is higher than 650 ℃, and density all is lower than 2.6 (g/cm
3), the glass liquidus temperature all is lower than 1200 ℃, and the bubbles number of bubble diameter in 0.5-1.0mm all is less than 20 in the per kilogram base plate glass, all satisfies the required basic physical property of TFT-LCD glass substrate.
By respectively detecting data among the table 2 illustrated embodiment 6-10, but also clear view goes out:
When needs have as polysilicon type (poly-Si) TFT-LCD grade generation processing procedure or the required TFT-LCD glass substrate of product characteristic, according to the made glass of disclosed another glass compositing range of the present invention, its thermal expansivity all is lower than 34 * 10 in the boundary in the time of temperature 30-400 ℃
-7/ ℃, strain point temperature all is higher than 665 ℃, and density all is lower than 2.4 (g/cm
3), the glass liquidus temperature all is lower than 1200 ℃, the bubbles number of bubble diameter in 0.5-1.0mm all is less than 20 in the per kilogram base plate glass, also all satisfies as polysilicon type (poly-Si) TFT-LCD grade generation processing procedure or the required TFT-LCD glass substrate of product characteristic.
In table 3 and table 4, then listed other and be different from the comparative example 11-16 that composition of the present invention applies.
The comparative example 11-13 of table 3 is control groups of table 1.
The comparative example 14-16 of table 4 is control groups of table 2.
By respectively detecting in the data shown in the table 3, can know demonstration:
The thermal expansivity of comparative example 11 is higher, the glass liquid phase temperature drift of comparative example 12, and it is too high that the glass blister of comparative example 13 produces number, all can not satisfy the required basic physical property of TFT-LCD glass substrate.
By respectively detecting in the data shown in the table 4, also can know demonstration:
The thermal expansivity of comparative example 14 is higher, the glass density of comparative example 15 is higher, it is too high that the glass blister of comparative example 16 produces number, also can not satisfy as polysilicon type (poly-Si) TFT-LCD grade generation processing procedure or the required TFT-LCD glass substrate of product characteristic.
Brought forward is described, the glass substrate innovation that the present invention is more traditional, except that can reaching the needed fundamental characteristics of general TFT-LCD glass substrate, more can reach the needed many characteristics of glass substrate of aforesaid polysilicon type (poly-Si) TFT-LCD, have novelty, creativeness and practicality.
Though the present invention discloses as above with preferred embodiment; but be not in order to limit protection scope of the present invention; anyly have the knack of this skill person; in not breaking away from spirit of the present invention and scope; change of being done and retouching; and, all should belong within protection scope of the present invention according to equalization variation and modification that the present invention did.
Table 1
| Constituent % weight | Embodiment | ||||
| Example 1 | Example 2 | Example 3 | Example 4 | Example 5 | |
| Silicon oxide (SiO 2) | ????58.3 | ????56.9 | ????58.7 | ????57.5 | ????59.1 |
| Aluminum oxide (Al 2O 3) | ????17.2 | ????16.2 | ????15.7 | ????18.1 | ????16.4 |
| Boron oxide (B 2O 3) | ????10.5 | ????9.8 | ????8.5 | ????11.2 | ????10.8 |
| Magnesium oxide (MgO) | ????0.4 | ????0.7 | ????1.1 | ????0.6 | ????0 |
| Calcium oxide (CaO) | ????4.5 | ????3.6 | ????4.1 | ????5.9 | ????6.1 |
| Strontium oxide (SrO) | ????2.7 | ????4.6 | ????3.2 | ????1.3 | ????2.4 |
| Barium oxide (BaO) | ????5.1 | ????6.6 | ????7.1 | ????4.2 | ????3.4 |
| Zinc oxide (ZnO) | ????0.3 | ????0 | ????0.6 | ????0.2 | ????0.4 |
| Zirconium white (ZrO 2) | ????0.5 | ????0.5 | ????0.4 | ????0 | ????0.2 |
| Arsenic oxide arsenoxide (As 2O 3) | ????0.4 | ????0.3 | ????0.3 | ????0.8 | ????0.6 |
| Weisspiessglanz (Sb 2O 3) | ????0.1 | ????0.3 | ????0 | ????0.2 | ????0.3 |
| Stannic oxide (SnO 2) | ????0 | ????0.2 | ????0 | ????0 | ????0.2 |
| Cerium oxide (CeO 2) | ????0 | ????0.3 | ????0.3 | ????0 | ????0.1 |
| Silicon oxide+aluminum oxide | ????75.5 | ????73.1 | ????74.4 | ????75.6 | ????75.5 |
| Aluminum oxide/boron oxide | ????1.64 | ????1.65 | ????1.85 | ????1.62 | ????1.52 |
| Magnesium oxide+calcium oxide | ????4.9 | ????4.3 | ????5.2 | ????6.5 | ????6.1 |
| Strontium oxide+barium oxide | ????7.8 | ????11.2 | ????10.3 | ????5.5 | ????5.8 |
| Arsenic oxide arsenoxide+weisspiessglanz+stannic oxide+cerium oxide | ????0.5 | ????1.1 | ????0.6 | ????1.0 | ????1.2 |
| Thermal expansivity is lower than 40 * 10 -7/℃ | ????37.9 | ????37.1 | ????38.5 | ????39.6 | ????39.2 |
| Strain point temperature ℃ | ????659 | ????653 | ????660 | ????664 | ????662 |
| Density (g/cm 3) | ????2.54 | ????2.57 | ????2.53 | ????2.53 | ????2.53 |
| Liquidus temperature ℃ | ????1120 | ????1100 | ????1100 | ????1180 | ????1160 |
| Number of bubbles in 0.5-1.0mm | ????○ | ????○ | ????○ | ????○ | ????○ |
Table 2
| Constituent % weight | Embodiment | ||||
| Example 6 | Example 7 | Example 8 | Example 9 | Example 10 | |
| Silicon oxide (SiO 2) | ????62.5 | ????60.8 | ????63.1 | ????62.9 | ????61.6 |
| Aluminum oxide (Al 2O 3) | ????17.1 | ????16.3 | ????15.4 | ????15.9 | ????18.1 |
| Boron oxide (B 2O 3) | ????9.8 | ????10.5 | ????10.2 | ????10.8 | ????10.3 |
| Magnesium oxide (MgO) | ????1.2 | ????0 | ????0.2 | ????2.2 | ????0.6 |
| Calcium oxide (CaO) | ????4.2 | ????9.1 | ????8.2 | ????6.5 | ????5.1 |
| Strontium oxide (SrO) | ????1.6 | ????1.3 | ????0.8 | ????0.3 | ????1.9 |
| Barium oxide (BaO) | ????1.1 | ????0.2 | ????0.4 | ????0.3 | ????0.5 |
| Zinc oxide (ZnO) | ????0.6 | ????0 | ????0.3 | ????0.1 | ????0.4 |
| Zirconium white (ZrO 2) | ????0.5 | ????0.5 | ????0 | ????0.2 | ????0.3 |
| Arsenic oxide arsenoxide (As 2O 3) | ????0.7 | ????0.5 | ????0.3 | ????0.6 | ????0.2 |
| Weisspiessglanz (Sb 2O 3) | ????0.3 | ????0.5 | ????0.7 | ????0.2 | ????0.8 |
| Stannic oxide (SnO 2) | ????0.2 | ????0 | ????0.4 | ????0 | ????0.1 |
| Cerium oxide (CeO 2) | ????0.2 | ????0.3 | ????0 | ????0 | ????0.1 |
| Silicon oxide+aluminum oxide | ????79.6 | ????77.1 | ????78.5 | ????78.8 | ????79.7 |
| Aluminum oxide/boron oxide | ????1.74 | ????1.55 | ????1.51 | ????1.47 | ????1.76 |
| Magnesium oxide+calcium oxide | ????5.4 | ????9.1 | ????8.4 | ????8.7 | ????5.7 |
| Strontium oxide+barium oxide | ????2.7 | ????1.5 | ????1.2 | ????0.6 | ????2.4 |
| Arsenic oxide arsenoxide+weisspiessglanz+stannic oxide+cerium oxide | ????1.4 | ????1.3 | ????1.4 | ????0.8 | ????1.2 |
| Thermal expansivity is lower than 40 * 10 -7/℃ | ????32.7 | ????33.8 | ????33.4 | ????33.8 | ????32.9 |
| Strain point temperature ℃ | ????675 | ????671 | ????673 | ????671 | ????676 |
| Density (g/cm 3) | ????2.38 | ????2.36 | ????2.35 | ????2.32 | ????2.38 |
| Liquidus temperature ℃ | ????1140 | ????1160 | ????1170 | ????1180 | ????1140 |
| Number of bubbles in 0.5-1.0mm | ????○ | ????○ | ????○ | ????○ | ????○ |
Table 3
| Constituent % weight | Comparative example | ||
| Example 11 | Example 12 | Example 13 | |
| Silicon oxide (SiO 2) | ????57.4 | ????59.2 | ????58.5 |
| Aluminum oxide (Al 2O 3) | ????17.1 | ????18.6 | ????16.5 |
| Boron oxide (B 2O 3) | ????10.6 | ????11.5 | ????9.5 |
| Magnesium oxide (MgO) | ????0.6 | ????1.4 | ????1.2 |
| Calcium oxide (CaO) | ????7.6 | ????5.3 | ????4.0 |
| Strontium oxide (SrO) | ????1.8 | ????0.6 | ????3.1 |
| Barium oxide (BaO) | ????3.8 | ????1.7 | ????6.6 |
| Zinc oxide (ZnO) | ????0 | ????0.3 | ????0.2 |
| Zirconium white (ZrO 2) | ????0.2 | ????0 | ????0.3 |
| Arsenic oxide arsenoxide (As 2O 3) | ????0.3 | ????0.6 | ????0.1 |
| Weisspiessglanz (Sb 2O 3) | ????0.6 | ????0.6 | ????0 |
| Stannic oxide (SnO 2) | ????0 | ????0 | ????0 |
| Cerium oxide (CeO 2) | ????0 | ????0.2 | ????0 |
| Silicon oxide+aluminum oxide | ????74.5 | ????77.8 | ????75.0 |
| Aluminum oxide/boron oxide | ????1.61 | ????1.62 | ????1.74 |
| Magnesium oxide+calcium oxide | ????8.2 | ????6.7 | ????5.2 |
| Strontium oxide+barium oxide | ????5.6 | ????2.3 | ????9.7 |
| Arsenic oxide arsenoxide+weisspiessglanz+stannic oxide+cerium oxide | ????0.9 | ????1.4 | ????0.1 |
| Thermal expansivity is lower than 40 * 10 -7/℃ | ????41.2 | ????39.6 | ????38.7 |
| Strain point temperature ℃ | ????655 | ????660 | ????660 |
| Density (g/cm 3) | ????2.54 | ????2.51 | ????2.58 |
| Liquidus temperature ℃ | ????1130 | ????1220 | ????1120 |
| Number of bubbles in 0.5-1.0mm | ????○ | ????○ | ????× |
Table 4
| Constituent % weight | Comparative example | ||
| Example 14 | Example 15 | Example 16 | |
| Silicon oxide (SiO 2) | ????61.2 | ????61.0 | ????61.9 |
| Aluminum oxide (Al 2O 3) | ????15.5 | ????15.7 | ????16.7 |
| Boron oxide (B 2O 3) | ????10.1 | ????9.8 | ????11.5 |
| Magnesium oxide (MgO) | ????0.5 | ????0.9 | ????0.5 |
| Calcium oxide (CaO) | ????10.5 | ????5.5 | ????6.2 |
| Strontium oxide (SrO) | ????0.6 | ????3.1 | ????1.3 |
| Barium oxide (BaO) | ????0.9 | ????2.9 | ????1.1 |
| Zinc oxide (ZnO) | ????0.3 | ????0 | ????0.4 |
| Zirconium white (ZrO 2) | ????0.2 | ????0.1 | ????0.4 |
| Arsenic oxide arsenoxide (As 2O 3) | ????0 | ????0.5 | ????0 |
| Weisspiessglanz (Sb 2O 3) | ????0 | ????0.5 | ????0 |
| Stannic oxide (SnO 2) | ????0 | ????0 | ????0 |
| Cerium oxide (CeO 2) | ????0.2 | ????0 | ????0 |
| Silicon oxide+aluminum oxide | ????76.1 | ????76.7 | ????78.6 |
| Aluminum oxide/boron oxide | ????1.53 | ????1.60 | ????1.45 |
| Magnesium oxide+calcium oxide | ????11.0 | ????6.4 | ????6.7 |
| Strontium oxide+barium oxide | ????1.5 | ????6.0 | ????2.4 |
| Arsenic oxide arsenoxide+weisspiessglanz+stannic oxide+cerium oxide | ????0.2 | ????1.0 | ????0 |
| Thermal expansivity is lower than 40 * 10 -7/℃ | ????36.1 | ????33.5 | ????33.4 |
| Strain point temperature ℃ | ????669 | ????670 | ????667 |
| Density (g/cm 3) | ????2.36 | ????2.49 | ????2.38 |
| Liquidus temperature ℃ | ????1180 | ????1160 | ????1180 |
| Number of bubbles in 0.5-1.0mm | ????△ | ????○ | ????× |
Claims (7)
1, the composition of the base plate glass used of a kind of indicating meter, it is characterized in that: it comprises the silicon oxide of 56.0%-64.0% by weight percentage, the aluminum oxide of 14.0%-19.0%, the boron oxide of 7.5%-14.0%, the magnesium oxide of 0-4.0%, the calcium oxide of 3.0%-10%, the strontium oxide of 0-6.0%, the barium oxide of 0-10%, the zinc oxide of 0-1.0%, the zirconium white of 0-1.0%, the arsenic oxide arsenoxide of 0-2.0%, the weisspiessglanz of 0-1.0%, the stannic oxide of 0-1.0% and the cerium oxide of 0-1.0%; Wherein the summation of this silicon oxide and aluminum oxide surpasses 71.0%, the ratio of aluminum oxide and boron oxide is between 1.0 and 2.1%, the summation of magnesium oxide and/or calcium oxide is between 3.0%-10%, strontium oxide and/or barytic summation are between 0-13.0%, and the summation of arsenic oxide arsenoxide and weisspiessglanz, stannic oxide, cerium oxide is between 0.3%-2.0%.
2, the composition of the base plate glass used of indicating meter according to claim 1, it is characterized in that: it comprises the silicon oxide of 56.0%-60% by weight percentage, the aluminum oxide of 14.0%-18.0%, the boron oxide of 7.5%-14.0%, the arsenic oxide arsenoxide of the zinc oxide of the strontium oxide of the magnesium oxide of 0-2.0%, the calcium oxide of 3.0%-7.0%, 1.0%-6.0%, the barium oxide of 2.0%-10%, 0-1.0%, the zirconium white of 0-1.0%, 0-2.0%, the weisspiessglanz of 0-1.0%, the stannic oxide of 0-1.0% and the cerium oxide of 0-1.0%; Wherein the summation of this silicon oxide and aluminum oxide surpasses 71.0%, the ratio of this aluminum oxide and boron oxide is % between 1.0 and 2.1, the summation of this magnesium oxide and/or calcium oxide is between 3.0%-7.0%, strontium oxide and/or barytic summation are between 4.0%-13.0%, and the summation of arsenic oxide arsenoxide and weisspiessglanz, stannic oxide, cerium oxide is between 0.3%-2.0%.
3, the composition of the base plate glass used of indicating meter according to claim 1 and 2, it is characterized in that: the thermal expansivity of this glass is lower than 40 * 10
-7/ ℃, strain point temperature is higher than 650 ℃, density and is lower than 2.6g/cm
3, liquidus temperature is lower than that the bubbles number of bubble diameter in 0.5-1.0mm is less than 20 in 1200 ℃, per kilogram base plate glass.
4, the composition of the base plate glass used of indicating meter according to claim 1 and 2, it is characterized in that: this glass substrate is the glass substrate of TFT-LCD.
5, the composition of the base plate glass used of indicating meter according to claim 1, it is characterized in that: the composition that it comprises by weight percentage is respectively the silicon oxide of 60-64.0%, the aluminum oxide of 15.0%-19.0%, the boron oxide of 9.5%-13.0%, the magnesium oxide of 0-4.0%, the calcium oxide of 3.0%-10%, the strontium oxide of 0-3.0%, the barium oxide of 0-2.0%, the zinc oxide of 0-1.0%, the zirconium white of 0-1.0%, the arsenic oxide arsenoxide of 0-2.0%, the weisspiessglanz of 0-1.0%, the stannic oxide of 0-1.0% and the cerium oxide of 0-1.0%; Wherein the summation of this silicon oxide and aluminum oxide surpasses 76.0%, the ratio of aluminum oxide and boron oxide is between 1.3 and 1.8%, the summation of magnesium oxide and/or calcium oxide is between 5.0%-10%, strontium oxide and/or barytic summation are between 0-4.5%, and the summation of arsenic oxide arsenoxide and weisspiessglanz, stannic oxide, cerium oxide is between 0.3%-2.0%.
6, the composition of the base plate glass used of indicating meter according to claim 5, it is characterized in that: the thermal expansivity of this glass is lower than 34 * 10
-7/ ℃, strain point temperature is higher than 665 ℃, density and is lower than 2.4g/cm
3, liquidus temperature is lower than that the bubbles number of bubble diameter in 0.5-1.0mm is less than 20 in 1200 ℃, per kilogram base plate glass.
7, the composition of the base plate glass used of indicating meter according to claim 5 is characterized in that: this glass substrate comprises the polysilicon type TFT-LCD time TFT-LCD glass substrate of processing procedure or product from generation to generation.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101913764A (en) * | 2010-07-23 | 2010-12-15 | 北京工业大学 | Alkali-free alumina silicate glass with high strain point |
| CN101575167B (en) * | 2009-06-05 | 2011-08-10 | 北京工业大学 | Zirconia aluminosilicate glass |
-
2004
- 2004-01-08 CN CN 200410000513 patent/CN1640837A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101575167B (en) * | 2009-06-05 | 2011-08-10 | 北京工业大学 | Zirconia aluminosilicate glass |
| CN101913764A (en) * | 2010-07-23 | 2010-12-15 | 北京工业大学 | Alkali-free alumina silicate glass with high strain point |
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