CN1613029A - Apparatus for electrifying particle, and apparatus for scattering particle - Google Patents
Apparatus for electrifying particle, and apparatus for scattering particle Download PDFInfo
- Publication number
- CN1613029A CN1613029A CNA028268334A CN02826833A CN1613029A CN 1613029 A CN1613029 A CN 1613029A CN A028268334 A CNA028268334 A CN A028268334A CN 02826833 A CN02826833 A CN 02826833A CN 1613029 A CN1613029 A CN 1613029A
- Authority
- CN
- China
- Prior art keywords
- pipe
- spacer particle
- particle
- spacer
- electrified voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13392—Gaskets; Spacers; Sealing of cells spacers dispersed on the cell substrate, e.g. spherical particles, microfibres
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
Abstract
Disclosed is an apparatus for electrifying spacers and an apparatus for scattering spacers using the same. For the purpose of maintaining a cell gap of LCD, the spacer is electrified to hav a first electrified voltage by a first electrifying pipe having a first curvature, and the spacer is electrified by a second electrifying pipe having a second curvature to have a second electrified voltage level high enough to prevent the spacers from being lumped. Thus, the spacer is not humped by increasing an electrified voltage thereof, thereby preventing a quality of an image form being deteriorated, the spacer from being lost.
Description
Technical field
The present invention relates to a kind ofly be used to make spacer particle (spacer) charged and scatter the equipment of spacer particle, more specifically, relate to a kind of charged equipment of spacer particle and a kind of equipment that utilizes aforementioned device that spacer particle is scattered of making, this equipment prevents the spacer particle conglomeration and scatters spacer particle equably.
Background technology
In general, come the LCD (LCD) of display image to adopt spacer particle to keep gap between the liquid crystal cells equably by the control liquid crystal.When uniformly dispersing spacer particle or cell gap were not inhomogeneous in liquid crystal, display quality will descend.
Specifically, after making TFT (thin film transistor (TFT)) substrate and filter substrate, on the TFT substrate, form potted line, come encapsulated liquid crystals as liquid crystal wall.Spacer particle is to use wet distribution method or dried distribution method to be dispersed in randomly on the TFT substrate with potted line.
Described wet distribution method comprises such as spacer particle being mixed with isopropyl alcohol, spray this potpourri and make the such step of isopropyl alcohol evaporation on the TFT substrate.After having evaporated isopropyl alcohol, spacer particle has just been stayed on the substrate.
Described dried distribution method comprises such as make spacer particle by friction charged and charged spacer particle is sprayed onto step such on the TFT substrate, thereby spacer particle is positioned on the TFT substrate.
Wet distribution method and dried distribution method have relative merits separately, but in these two kinds of methods, should not cause spacer particle conglomeration each other.When spacer particle does not obtain uniformly dispersing, the gap between the holding unit consistently.
When cell gap can not get evenly keeping or spacer particle when not obtaining uniformly dispersing, must repeat the distribution process once more, obtained uniformly dispersing up to spacer particle, thereby when increasing worker, because the spacer particle conglomeration can cause the loss of expensive spacer particle and the significant wastage of spacer particle.
Summary of the invention
The invention provides a kind of equipment of making particle charged of being used to, this equipment has prevented particle generation conglomeration.
The invention provides a kind of equipment that is used to scatter particle, this equipment can scatter particle equably.
According to an aspect of the present invention, provide a kind of equipment that is used to make the spacer particle that is driven by fluid to have predetermined electrified voltage, this device comprises: first pipe is used to make described spacer particle to have first electrified voltage and exports described spacer particle; With second pipe, be used to make described spacer particle to have second electrified voltage from the described first pipe output, described second pipe is connected with described first pipe, and has coil shape.
According on the other hand, a kind of equipment that is used to scatter spacer particle is provided, comprising: spacer feeder is used to supply with the spacer particle by fluid delivery; First pipe is used to make described spacer particle to have first electrified voltage and exports described spacer particle; With second pipe, be used to make described spacer particle to have second electrified voltage from the described first pipe output, described second pipe is connected with described first pipe, and has coil shape; And supporter, being used for supporting substrate, the described spacer particle of exporting from described second pipe scatters on this substrate.
According to equipment of the present invention,, make that spacer particle can conglomeration, thereby prevented decrease in image quality, and prevent the waste of spacer particle and the rising of LCD cost by improving the electrified voltage of spacer particle.
Description of drawings
Simultaneously consider that in conjunction with figure the above-mentioned advantage with other of the present invention will become apparent by consulting following detailed description, wherein:
Fig. 1 illustrates the sectional view of LCD plate, and this LCD plate has the particle that scatters by the equipment one exemplary embodiment according to the present invention, that be used to scatter particle;
Fig. 2 illustrates summary view one exemplary embodiment, that be used to make the charged equipment of particle according to the present invention;
Fig. 3 is the synoptic diagram that explanation occurs in the particle clustering phenomena on the TFT substrate;
Fig. 4 illustrates the sectional view of inner structure according to the present invention one exemplary embodiment, that be used to make the charged equipment of particle;
Fig. 5 illustrates the curve map that is made the change procedure of the electrified voltage that the charged equipment of particle obtains by shown in Figure 4 being used to;
Fig. 6 illustrates the curve map that makes the electrified voltage that the winding number of turn of the charged equipment of particle changes with being used among Fig. 4;
Fig. 7 illustrates the curve map that makes the electrified voltage that the coil diameter of the charged equipment of particle changes with being used among Fig. 4; With
Fig. 8 illustrates the summary view of equipment that is used to scatter particle of according to the present invention one exemplary embodiment.
Embodiment
Fig. 1 illustrates the sectional view of LCD plate, and this LCD plate has the particle that scatters by the equipment one exemplary embodiment according to the present invention, that be used to scatter particle.
Hereinafter, " spacer particle " is defined as such one type particle: have electropolar particle owing under the effect of friction or collision, losing or obtain electronics.It is several microns spherical form that spacer particle has diameter.Spacer particle is very expensive, because the extremely difficult production of spacer particle, this is because the diameter of spacer particle is several microns, and simultaneously, also requires almost not have between the spacer particle diameter poor.
Be used in the spacer particle in the LCD plate of LCD shown in Fig. 1.
With reference to Fig. 1, LCD plate 190 comprises TFT substrate 170, liquid crystal 150, filter substrate 140, driver module (not shown), spacer particle 300 and sealing 180.TFT173 comprises channel layer 173a, gate electrode 173d, source electrode 173f, drain electrode 173g and is used for isolated gate electrode 173b and insulation course 173b and the 173e of source electrode 173f (or drain electrode 173g).
Especially; TFT substrate 170 comprises first transparency carrier 177, is laid in the TFT173 on this first transparency carrier 177 and is arranged on protective seam (blocking layer) 172 between first transparency carrier 177 and the TFT173 with matrix form, and this protective seam 172 is used to prevent that the harmful ion such as sodion from moving to TFT173 from first transparency carrier 177.
On protective seam 172, be formed with pixel electrode 174, and this pixel electrode 174 is electrically connected with drain electrode 173g.Source electrode 173f receives supply voltage by the data line (not shown), and offers drain electrode 173g by the supply voltage that channel layer 173a will impose on source electrode 173f.The supply voltage that is added on the drain electrode 173g offers transparent conductive pixel electrode 174.The level that is added to the supply voltage on the pixel electrode 174 depends on the level that is added to the supply voltage on the source electrode 173f.
Channel layer 173a has the characteristic that not only can be used as conductive material but also can be used as electrically non-conductive material.In order to make this channel layer 173a as conductive material work, the gate electrode 173d that is arranged on the channel layer 173a should insulate with channel layer 173a, and gate electrode 173d should receive supply voltage.
Above first transparency carrier 177, be formed with first alignment 175.This first alignment 175 has first alignment slot 176 that is formed by the friction roller (not shown).
Second alignment 130 has second alignment slot 135 that is formed by friction roller.
Filter substrate 140 fits together with TFT substrate 177, is installed on the upper surface of TFT substrate 177.
Specifically, filter substrate 140 comprises second transparency carrier 100, is formed on RGB colour element 110 on this second transparency carrier, is arranged on the common electrode 120 on the rgb pixel 110 and second transparency carrier 100 and is arranged on second aligned layer 130 on the common electrode 120.Rgb pixel 110 faces the pixel electrode 174 of TFT substrate 170.
After being installed to filter substrate 140 on the TFT substrate 170, on TFT substrate 170, form potted line 180, to draw together out effective viewing area (not shown).Between TFT substrate 170 and filter substrate 140, scatter spacer particle 300, have predetermined distribution to cause it.Spacer particle 300 is being kept cell gap (this cell gap is the distance between filter substrate 140 and the TFT substrate 170), to be formed uniformly the thickness that is clipped in the liquid crystal 150 between filter substrate 140 and the TFT substrate 170.
Want the holding unit gap even, spacer particle is not very important with other spacer particle conglomeration.
In order to prevent spacer particle 300 and other spacer particle conglomeration, adopted a kind of spacer particle charging equipment 200 as shown in Figure 2 among the present invention.
Fig. 2 illustrates summary view one exemplary embodiment, that be used to make the charged equipment of particle according to the present invention; Fig. 3 is the synoptic diagram that explanation occurs in the particle clustering phenomena on the TFT substrate; Fig. 4 illustrates the sectional view of inner structure according to the present invention one exemplary embodiment, that be used to make the charged equipment of particle.
With reference to Fig. 2, spacer particle charging equipment 200 comprises first charging valve 210 and second charging valve 220.
Two ends corresponding to first charging valve 210 of the A-B shown in Fig. 2 are open.First charging valve 210 has first curvature and comprises the inlet that receives spacer particle and the outlet of output gap particle.Hereinafter, the entrance and exit with first charging valve 210 is called first spacer particle inlet and the outlet of first spacer particle.Cross the fluid of first charging valve 210 by high velocity stream, make spacer particle from the input of first spacer particle inlet and from first spacer particle outlet output.
From the spacer particle of first spacer particle outlet output by when passing first charging valve 210, lose or obtain electronics be able to charged, thereby have as shown in Figure 5 the first electrified voltage V
1
This first electrified voltage V
1Less than 0.5 volt.But, if will have the first about 0.5 volt electrified voltage V
1Spacer particle is dispersed on the TFT substrate 170, these spacer particles still can with other spacer particle conglomeration because this first electrified voltage V
1Too less than reference voltage V
R, this reference voltage V
RBe the voltage that is enough to prevent the spacer particle conglomeration.
After spacer particle had first electrified voltage, when being dispersed in these spacer particles on the TFT substrate 170, conglomeration will frequently take place in these spacer particles.The size of electrified voltage is very important factor.
In the LCD with little LCD plate, " spacer particle clustering phenomena " can not take place in these spacer particles that have less than 0.5 volt first electrified voltage.
But, in the LCD with large-scale or medium-sized LCD plate, " spacer particle clustering phenomena " still can take place, thereby can be because uneven cell gap causes very poor display quality.
In order to prevent the spacer particle conglomeration, must with the electrified voltage that increases spacer particle of effective viewing area of LCD with being in proportion.
When having spacer particle less than 0.5 volt electrified voltage when being dispersed in large-sized LCD and going up, as shown in Figure 3, spacer particle can with other spacer particle conglomeration.Located to show the spacer particle of these conglomerations at " A " of Fig. 3.
When these spacer particles during conglomeration, can't utilize user's manual method that spacer particle is removed on TFT substrate 170.Like this, just must process processing again to TFT substrate 170.
With reference to Fig. 2, by second charging valve 220, the spacer particle with about 0.5 volt electrified voltage can obtain second electrified voltage, and this second electrified voltage will be higher than reference tape piezoelectric voltage V
R
Therefore, when spacer particle 300 passed second charging valve 220, the electrified voltage of spacer particle 300 increased.
Fig. 5 illustrates the curve map that is made the change procedure of the electrified voltage that the charged equipment of particle obtains by shown in Figure 4 being used to.
As shown in Figure 5, the spacer particle 300 that passes second charging valve 220 has the reference tape of being higher than piezoelectric voltage V
RThe second electrified voltage V
2
For being with, spacer particle 300 is higher than reference tape piezoelectric voltage V
RThe second electrified voltage V
2, except the curvature that will consider second charging valve 220, also to consider its diameter, the winding number of turn and coil diameter.
Fig. 6 and 7 illustrates the curve map with the winding number of turn and the electrified voltage that coil diameter changes of second charging valve among Fig. 2.Among Fig. 6, electrified voltage is to use first and second charging valves 210 and 220 to obtain, and what wherein first and second charging valves adopted is the stainless-steel tube that internal diameter is about 6mm.
With reference to Fig. 6, when not changing the diameter of second charging valve 220 when the winding number of turn that increases second charging valve 220, the electrified voltage distribution of spacer particle 300 shows as the curve as quadratic curve.When the winding number of turn of second charging valve 220 greater than at least two the time, the second electrified voltage V of spacer particle 300
2Increase gradually, and when the winding number of turn of second charging valve 220 be about 20 the time, provide maximum electrified voltage.When the winding number of turn of second charging valve 220 greater than 20 the time, the second electrified voltage V of spacer particle 300
2Reduce, as shown in Figure 6.
Therefore, in the present invention, the winding number of turn of internal diameter for second charging valve 220 of about 6mm is limited within the scope of about 13 to 22 circles.Preferably, in order to obtain maximum electrified voltage, use having twined second charging valve 220 that surpasses 20 circles.
Can change these according to the internal diameter of second charging valve 220 and twine the number of turn.When the foundation new equipment changed the internal diameter of second charging valve 220, the winding number of turn of second charging valve 220 also should be reset, so that the electrified voltage of maximum is provided for the spacer particle 300 that passes second charging valve 220.
With reference to Fig. 7, when increasing the coil diameter of second charging valve 220, second electrified voltage of spacer particle 300 reduces gradually.If the diameter of second charging valve 220 arrives within the scope of 24mm for about 6mm and coil diameter are in about 20, spacer particle 300 can obtain being enough to prevent the electrified voltage of spacer particle 300 conglomerations.
When the diameter of second charging valve 220 during for about 6mm, very difficult with second charging valve 220 make coil diameter less than 20mm.In addition, when the diameter of second charging valve 220 for the coil diameter of the about 6mm and second charging valve 220 during greater than 24mm, the electrified voltage of spacer particle will be less than reference voltage V
R
If second charging valve 220 has the internal diameter of about 6mm, this second charging valve 220 must be twined to such an extent that have about 20 so to the coil diameter of 24mm, to obtain about 5 volts maximum electrified voltage.In addition, if with the internal diameter of second charging valve 220 become less than or greater than the internal diameter of 6mm, must reset it corresponding to its internal diameter so and twine the number of turn.
If second charging valve, 220 internal diameters are about 6mm, second charging valve 220 should have the winding number of turn of coil diameter and 20 circles of about 20mm so, to obtain second electrified voltage greater than 5 volts.
The electrified voltage of conventional spacer particle 300 is less than 0.5V, and the electrified voltage of spacer particle of the present invention 300 is 10 times of electrified voltage of conventional spacer particle 300.
As a result, when spacer particle passed first and second charging valves 210 and 220 in order, spacer particle 300 is had was enough to prevent the second electrified voltage V of spacer particle 300 conglomerations
2
Hereinafter, with reference to Fig. 8 the equipment 200 that is used to scatter spacer particle is introduced.
Fig. 8 illustrates the summary view of equipment that is used to scatter particle of according to the present invention one exemplary embodiment.
With reference to Fig. 8, spacer particle dissemination apparatus 700 comprise spacer particle present the material 500, first charging valve 210, second charging valve 220 and support 600.
Spacer particle is presented material 500 and is comprised container 530, agitating roller 510 and feed roller 520.Particularly, container 530 is holding a large amount of spacer particles 300.These spacer particles 300 that are contained in the container 530 stir by agitating roller 510.Collect by feed roller 520 through the spacer particle 300 that agitating roller 510 stirs.Then, carrying these spacer particles 300 and be discharged to the outside by nonvolatile gas.
The spacer particle of being collected by feed roller 520 300 passes first and second charging valves 210 and 220 successively.
When passing first charging valve 210, these spacer particles 300 have been with the first electrified voltage V
1, and when having passed second charging valve 220, these spacer particles 300 have been with the second electrified voltage V
2As exemplary embodiment, this second charging valve 220 has coil shape.
In order to increase second charging voltage of spacer particle 300, this second charging valve 220 is a coil shape, and its internal diameter is that about 6mm, coil diameter are in 20 within the scope of 24mm, and to twine the number of turn be about 13 to 24 circles.
Described spacer particle dissemination apparatus 700 also comprises spacer accelerator 400, and it is installed between first and second charging valves 210 and 220.400 pairs of spacer particles of supplying with second charging valve 220 of this spacer accelerator quicken.For this purpose, the nonvolatile gas of spacer accelerator 400 supplies such as nitrogen, so that spacer particle 300 can be crossed second charging valve 220 with very fast velocity flow.
The spacer particle 300 that passes second charging valve 220 is with and is higher than reference tape piezoelectric voltage V
RThe second electrified voltage V
2, as shown in Figure 5.
To have the second electrified voltage V
2Spacer particle 300 spread to equably on the TFT substrate 170 of LCD plate 190.
According to this spacer particle dissemination apparatus, by increasing the electrified voltage of spacer particle, conglomeration can not take place in spacer particle each other, thereby the image quality decrease that has prevented to be caused by the non-uniform cell gap, has prevented because increase the man-hour of the production spacer particle that the re-treatment spacer particle causes.And because spacer particle has obtained scattering equably, required spacer particle quantity is also reduced.
The present invention is introduced above with reference to one exemplary embodiment.But, obviously, to those skilled in the art, according to aforesaid explanation, various modifications and variations will be apparent.Therefore, the present invention has comprised all these optional modifications and variations, as long as they drop within the thought and scope of appending claims.
Claims (10)
1, a kind ofly be used to make spacer particle to have the equipment of predetermined electrified voltage, this equipment comprises:
First pipe is used to make described spacer particle to have first electrified voltage and exports described spacer particle; With
Second pipe is used to make the described spacer particle from the described first pipe output to have second electrified voltage, and described second pipe is connected with described first pipe, and has coil shape.
2, equipment according to claim 1, the curvature of wherein said second pipe is greater than the curvature of described first pipe.
3, equipment according to claim 1, the internal diameter of wherein said second pipe is about 6mm, and described second pipe is wound in the coil diameter for having about 20 to 24mm.
4, the have an appointment diameter of 6mm of equipment according to claim 1, wherein said second pipe, and described second pipe twined about 13 to 24 circles.
5, the have an appointment diameter of 6mm of equipment according to claim 1, wherein said second pipe, and have about 0.5 to about 5 volts electrified voltage from the described spacer particle of the described second pipe output.
6, a kind of equipment that is used to scatter spacer particle comprises:
Spacer feeder is used to supply with the spacer particle by fluid delivery;
First pipe is used to make described spacer particle to have first electrified voltage and exports described spacer particle; With
Second pipe is used to make the described spacer particle from the described first pipe output to have second electrified voltage, and described second pipe is connected with described first pipe, and has coil shape; With
Supporter is used for supporting substrate, and the described spacer particle of exporting from described second pipe is interspersed among on this substrate.
7, equipment according to claim 6, wherein said second pipe has the internal diameter that is about 6mm, and described second pipe is twined about 13 to about 24 circles, and will described second pipe be wound up as and has about 20 coil diameters that arrive about 24mm.
8, equipment according to claim 6, wherein the described spacer particle from the described second pipe output has about 0.5 to about 5 volts electrified voltage.
9, equipment according to claim 6 also comprises the feed tube that is connected with described first pipe, is used to the described first pipe supply nonvolatile gas, thereby improves the speed of described spacer particle.
10, equipment according to claim 6, wherein said spacer feeder comprises:
Container is used to hold described spacer particle;
First roller is used for the described spacer particle in the described container is stirred, and this roller is installed within the described container; With
Second roller is used for by its velocity of rotation being regulated the speed of controlling described spacer particle.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/KR2002/000037 WO2003058331A1 (en) | 2002-01-10 | 2002-01-10 | Apparatus for electrifying particle, apparatus for scattering particle |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1613029A true CN1613029A (en) | 2005-05-04 |
| CN100549787C CN100549787C (en) | 2009-10-14 |
Family
ID=19198504
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB028268334A Expired - Lifetime CN100549787C (en) | 2002-01-10 | 2002-01-10 | Be used to the equipment that makes particle charged, the equipment that is used to scatter particle |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7329320B2 (en) |
| CN (1) | CN100549787C (en) |
| AU (1) | AU2002219696A1 (en) |
| WO (1) | WO2003058331A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103176312A (en) * | 2011-12-22 | 2013-06-26 | 上海中航光电子有限公司 | Clearance material scattering method and device |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE633894A (en) * | 1962-06-22 | |||
| US3888207A (en) * | 1972-07-24 | 1975-06-10 | Erwin Stutz | Device for coating objects with pulverized or granular particles or flakes or fibres |
| US3958959A (en) * | 1972-11-02 | 1976-05-25 | Trw Inc. | Method of removing particles and fluids from a gas stream by charged droplets |
| SE446826B (en) * | 1981-04-24 | 1986-10-13 | Icab Ind Coating Ab | POWDER SPRAY WITH ELECTROSTATIC CHARGING FORM CONSISTING OF LONG-TERM CROCHET CHARGING CHANNELS WHICH ARE CROSSED TO IMAGE LOOP OR CARS ORGANIZED IN A MULTIPLE GROUPS |
| JPS59188630A (en) * | 1983-04-12 | 1984-10-26 | Mita Ind Co Ltd | Electrostatic copying machine |
| US4971829A (en) | 1987-06-08 | 1990-11-20 | Canon Kabushiki Kaisha | Spraying process for corona charges spacer material and attracting the same to plate having an electrical potential |
| JPH05192612A (en) * | 1992-01-22 | 1993-08-03 | Toyo Ink Mfg Co Ltd | Supply device for powder paint and frictional electrification device |
| JP3512251B2 (en) | 1994-10-18 | 2004-03-29 | ミドリ安全株式会社 | Electric dust collector |
| JP3288268B2 (en) * | 1997-07-17 | 2002-06-04 | 日本電気株式会社 | Spacer spraying device |
| WO1999022269A1 (en) * | 1997-10-27 | 1999-05-06 | Sekisui Chemical Co., Ltd. | Apparatus for spraying microparticles and spraying method using the apparatus, and method for manufacturing liquid crystal display |
-
2002
- 2002-01-10 CN CNB028268334A patent/CN100549787C/en not_active Expired - Lifetime
- 2002-01-10 US US10/498,555 patent/US7329320B2/en not_active Expired - Lifetime
- 2002-01-10 WO PCT/KR2002/000037 patent/WO2003058331A1/en not_active Application Discontinuation
- 2002-01-10 AU AU2002219696A patent/AU2002219696A1/en not_active Abandoned
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103176312A (en) * | 2011-12-22 | 2013-06-26 | 上海中航光电子有限公司 | Clearance material scattering method and device |
| CN103176312B (en) * | 2011-12-22 | 2015-11-25 | 上海中航光电子有限公司 | The distributing method of separation material and device |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2003058331A1 (en) | 2003-07-17 |
| US20050066891A1 (en) | 2005-03-31 |
| CN100549787C (en) | 2009-10-14 |
| AU2002219696A1 (en) | 2003-07-24 |
| US7329320B2 (en) | 2008-02-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN1210599C (en) | Device for distributing liquid crystal and method for controlling falling quantity of liquid crystal drop | |
| CN100340910C (en) | Liquid crystal distributor with function of determing liquid crystal allowance, and its measuring method | |
| US7659963B2 (en) | Liquid crystal dispensing apparatus with nozzle cleaning device | |
| CN1071028C (en) | Liquid crystal display device and a method of fabricating the same | |
| CN1504813A (en) | method for manufacturing liquid-crystal display device | |
| CN1605915A (en) | Liquid crystal display device and method for fabricating the same | |
| CN1796064A (en) | Device and method for cutting substrate | |
| CN1147688A (en) | Liquid coating method and producing method for electronic device by using said method | |
| CN1790162A (en) | Method of forming pattern having step difference and method of making thin film transistor and liquid crystal display using the same | |
| CN1065341C (en) | Polymer dispersed liquid crystal display device and method of manufacturing the same | |
| CN1693971A (en) | Manufacturing method and manufacturing system of liquid crystal display, liquid crystal display, and electronic apparatus | |
| CN100338518C (en) | Appts. and method for distributing liquid crystal material | |
| CN1748878A (en) | Device and method for treating base bored | |
| CN1627131A (en) | Method of manufacturing liquid crystal display device and one drop fill apparatus used for the same | |
| CN1324379C (en) | Liquid-crystal distributor with control drip capacity by control spring tension | |
| CN1613029A (en) | Apparatus for electrifying particle, and apparatus for scattering particle | |
| CN1224178A (en) | Liquid crystal orientation processing method and liquid crystal display device thereby | |
| CN1320392C (en) | Liquid crystal distributing equipment with nozzl protector | |
| CN1447171A (en) | Liquid crystal distributor | |
| CN1612000A (en) | Structure of liquid crystal display panel having a plurality of sealing lines | |
| CN1324378C (en) | Method of distributing liquid crystal by using multiple liquid crystal distributors | |
| CN1693958A (en) | Manufacturing method and manufacturing system of liquid crystal display, liquid crystal display, and electronic apparatus | |
| CN1439922A (en) | Liquid-crystal distributor with integral needle file | |
| CN1752746A (en) | Method and device for flaw detection of magnetic powder | |
| CN1737671A (en) | Spacer spraying system, spacer spraying method and liquid crystal display panel |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: SAMSUNG MONITOR CO., LTD. Free format text: FORMER OWNER: SAMSUNG ELECTRONICS CO., LTD. Effective date: 20121026 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20121026 Address after: Gyeonggi Do, South Korea Patentee after: Samsung Display Co.,Ltd. Address before: Gyeonggi Do, South Korea Patentee before: Samsung Electronics Co.,Ltd. |
|
| CX01 | Expiry of patent term |
Granted publication date: 20091014 |
|
| CX01 | Expiry of patent term |