CN1612329A

CN1612329A - Circuit-component carrying substrate

Info

Publication number: CN1612329A
Application number: CN 200410092307
Authority: CN
Inventors: 浅井元雄; 川村洋一郎; 森要二
Original assignee: Ibiden Co Ltd
Current assignee: Ibiden Co Ltd
Priority date: 1996-09-12
Filing date: 1996-09-12
Publication date: 2005-05-04
Anticipated expiration: 2016-09-12
Also published as: CN100433305C; CN1202276A; CN1267989C

Abstract

The base plate includes following parts and structures: first connection terminal group composed of multiple connection terminals formed densely on surface of bottom board possessing through holes; second connection terminal group composed of multiple connection terminals formed on cirumferential on back surface of bottom board; first junction terminal group and second connection terminal group are connected by through holes; composite wiring layer in multiplayer including via holes formed on surface of bottom board; first connection terminal group through composite wiring layer in multiplayer and via holes is connected to second connection terminal group; composite wiring layer in multiplayer includes wiring diagrams with different line widths and diagram cones, whose width is changed continuously, in use for connecting different wiring diagrams; line width in zone with higher wiring density is smaller than line width in zone with lower wiring density.

Description

Circuit-component carrying substrate

The application is that number of patent application is 96198213.6, the applying date is dividing an application of September 12, denomination of invention in 1996 application that is circuit-component carrying substrate.

Technical field

The invention relates to the circuit-component carrying printed circuit board (PCB) that forms the link subgroup on table back of the body two sides respectively.

Technical background

As carrying the nude film that flip-chip (Off リ Star Block チ Star Block) waits or the printed circuit board (PCB) of BGA plug-in units such as (the protruding grid arrays of Bump Grid Array), known in the past just like the wiring plate 21 that is used to carry electronic unit shown in 8 figure.

This wiring plate 21 has base plate 22, and its two sides, base plate 22 surperficial back side has the conductor layer that is mainly formed by subtractive process (サ Block トラ Network テイ Block method).The surperficial middle body of base plate 22 is provided with the zone of boarded parts.In the same area, a plurality of liners 23 of forming the 1st liner group form with high density state.Each liner 23 is corresponding with the protruding BP that is positioned at nude film C1 bottom.

On the other hand, on the periphery at base plate 22 back sides, be formed with a plurality of liners 24 of forming the 2nd liner group.Be formed with projection 25 on these liners 24 as the projected electrode that is connected with motherboard.On the periphery of base plate 22, be formed with a plurality of through holes 26 that penetrate base plate 22 again.The liner 23 of these through holes 26 and face side is connected by the conductor figure (パ -Application) 27 that is formed at the surface.Again, the liner 24 at the through hole 26 and the back side connects by the conductor Figure 28 that is formed on base plate 22 back sides equally.Its result, on this wiring plate 21, the 1st liner group 23 and the 2nd liner group 24 are electrically connected mutually.

But wiring plate 21 in the past as shown in Figure 8, was once causing the wiring of outer peripheral portion on its surface, cause center position again at its back side.Therefore, the wiring that connects between the

liner

23,24 becomes unnecessary length, its degradation in efficiency that connects up.When having used such wiring plate 21, just the problem that is difficult to realize signal transmitting high speedization between the electronic unit that carried and the motherboard is arranged again.

In order to be connected between the

liner

23,24 with the shortest wiring, can consider that through hole 26 is not to beat on the substrate periphery and beat in the substrate center part again.But, on the formation part of through hole 26, can produce the dead space of impossible wiring this moment.Therefore in order to ensure the zone that may connect up, just the whole problem that maximizes of inevitable substrate is arranged.

On the other hand, the wiring plate in the past 60 shown in 9 figure, the lead 62 that is connected in liner 61 is no matter how its position all has certain width.At this moment, just be necessary the wire spoke of lead 62 set and dwindle, will be directed at also that the cloth line resistance increases or, because of problems such as the reliability reductions that easily takes place to break.

In order to prevent these, the someone proposes to represent as 9 figure two-point drawing lines, and the 2nd also wide wiring diagram 62a forms lead 62 by the 1st wiring diagram 62b of specified width, which width with than the first wiring diagram 62b width.At this moment, lay the first wiring diagram 62b because of the high part of wiring density, low density part is laid the 2nd wiring diagram 62a, can guarantee the easiness that connects up, and can reduce the occurrence frequency of broken string.

But, at this moment, can form 2 acute angle-shaped right angles on its coupling part because the first wiring diagram 62b directly is connected on the 2nd wiring diagram 62a.Because of easy concentrated stress on these right angles, as shown in figure 10, appear at the new problem that crackle 64 easily takes place near the permanent resist 63 in right angle.

Summary of the invention

The present invention proposes for addressing the above problem, and its purpose is to provide a kind of circuit-component carrying substrate, and it can be avoided, and substrate is whole to maximize, and improves wiring efficient.And it can suppress the increase of cloth line resistance and break; And can prevent permanent resist generation crackle, to improve wiring efficient.

In order to achieve the above object, circuit-component carrying substrate of the present invention, it has:

The 1st link subgroup of forming by a plurality of splicing ears that on substrate surface, form by through hole; With

The 2nd link subgroup of being made up of a plurality of splicing ears that form on the periphery at the aforesaid substrate back side connects the 1st link subgroup and the 2nd link subgroup by through hole, it is characterized in that:

Form the MULTILAYER COMPOSITE wiring layer on above-mentioned backplate surface, this composite wiring layer comprises at least one conductor layer and at least one insulating barrier of alternately stack;

Above-mentioned each insulating barrier has for being electrically connected a plurality of via holes of each conductor layer, and above-mentioned conductor layer and through hole are electrically connected;

Above-mentioned the 1st link subgroup dense becomes the outermost layer at described composite multi-layer wiring layer, and is formed on the central portion of aforesaid substrate; Above-mentioned the 2nd link subgroup is discrete to be formed on the periphery at the back side of described substrate, and above-mentioned conductor layer is in order to be connected above-mentioned the 1st splicing ear group with above-mentioned the 2nd splicing ear group, extends to peripheral part from the central portion of aforesaid substrate.

The 1st link subgroup is intensive being formed on the base plate, and the 2nd link subgroup is disposed discretely.Not only by through hole, also connect between this by via hole.Therefore can not produce the dead space and shorten length of arrangement wire, improve wiring efficient.Can realize the circuit component mounting device that processing speed is fast for this reason.

The invention of other example is a kind of circuit-component carrying substrate, and it is provided with a plurality of splicing ears and lead on insulating barrier, and above-mentioned a plurality of splicing ears form with high density state, and these a plurality of splicing ears are connected with lead respectively, it is characterized in that:

Each lead is become by: the mutually different a plurality of wiring diagrams of live width wiring diagram, its width different with being connected those live widths that continually varying cone-shaped figure forms, and the live width of above-mentioned lead can form the high relatively zone of wiring density than low relatively regional little of wiring density, each lateral margin of above-mentioned cone-shaped figure is connected with each lateral margin of wiring diagram, this coupling part is done rounding and is handled

Each lateral margin of above-mentioned cone-shaped figure is with respect to the angles of center line inclination 10～45 degree of wiring diagram.

The live width of lead is formed, and is also little in the zone that the high relatively zone of its wiring density is lower relatively than wiring density, therefore can lay the little figure of live width in the high zone of wiring density, and the big figure of live width is laid in the zone that wiring density is low.Therefore, resistance value can be suppressed, broken string can be prevented again.Can also guarantee the insulating properties between the figure in the high zone of wiring density.

Again, can connect the mutually different wiring diagram of live width by cone-shaped figure, so crackle can not take place on the permanent resist, just can guarantee the insulation between lead, also can not increase the cloth line resistance.

Description of drawings

Fig. 1 is the broad cross-section map of the present invention's the 1st embodiment wiring plate;

Fig. 2 is the broad cross-section map of the wiring plate of other example;

Fig. 3 is the partial plan of the wiring plate of the present invention the 2nd embodiment;

Fig. 4 is the section oblique view that expression is used for the lead part of Fig. 3 wiring plate;

Fig. 5 (a) (b), (c) is the partial plan of the lead change of presentation graphs 3;

Fig. 6 is that expression is used for the part amplification view that the liner of the wiring plate of Fig. 3 is arranged;

Fig. 7 is the partial plan of the wiring plate of other example;

Fig. 8 represents the broad cross-section map of wiring plate in the past;

Fig. 9 is the partial plan that expression is equivalent to the wiring plate in the past of Fig. 3 wiring plate;

Figure 10 is the section oblique view that expression is used for the lead part of Fig. 9 wiring plate.

Embodiment

Below, describe the 1st embodiment that the present invention is specialized in detail according to Fig. 1 and Fig. 2.The wiring plate 1 of the circuit-component carrying substrate of this embodiment has the operable base plate 2 of surperficial S1 and S2 two sides, the back side.Base plate 2 has the

conductor layer

3,4 that is formed by subtractive process on the surperficial S1 and the S2 two sides, the back side of resinous base material 5.On base plate 2, be formed with, be a plurality of through holes 6 between two sides, the surperficial back side lead-through

conductors layer

3,4 of crossing over base plate 2.These through holes are being filled heat-resistant resin 7 for 6 li.

On the surperficial S1 and back side S2 of base plate 2, form MULTILAYER COMPOSITE wiring layer B1 respectively, B2, it is by the interlayer insulating film 8a that alternately superposes, 8b and

conductor layer

9a, 9b forms.

The MULTILAYER COMPOSITE wiring layer B1 that forms on surperficial S1 has the permanent resist of being made up of photoresist 10 at it near above the 1st interlayer insulating film 8a of surperficial S1.On the part that does not have permanent resist 10, be formed with inner conductor layer 9a.Then, the inner conductor layer 3 on the surperficial S1 of this inner conductor layer 9a and base plate 2 is electrically connected by the via hole (バィアホ-Le) 11 that is located on the 1st interlayer insulating film 8a.

Again, on above-mentioned the 2nd interlayer insulating film 8b that is located at the 1st interlayer insulating film 8a top, equally also part is formed with permanent resist 10.On the part that does not have permanent resist 10, be formed with outer conductors layer 9b.Then, this outer conductors layer 9b and inner conductor layer 9a are electrically connected by the via hole 11 that is located on the 2nd interlayer insulating film 8b.

The surface of the 2nd interlayer insulating film 8b of surface S1 side is the 1st middle body of wiring plate 1, has constituted the zone of carrying as the LSI nude film C1 of circuit block.In this zone, a plurality of

liner

12A, 12B that the liner group is promptly formed in the 1st link subgroup form with high density state.These

liners

12A, 12B are with to be formed on nude film C1 bottom protrusion BP corresponding.At this, be positioned at outermost part for the 1st liner group and be called " outer spacer 12B ".The part that is positioned at the 1st liner group middle body promptly also will be positioned at inboard part than said external liner 12B and be called " inner liner 12A ".

At this embodiment, outer spacer 12B is outermost 1 row, uses but can be used as outer spacer from outermost 1 to 5 row.At this moment, are inner liner 12A except these liners.

S2 goes up on the MULTILAYER COMPOSITE wiring layer B2 that forms overleaf, is formed with permanent resist 10 on its 1st interlayer insulating film 8a top near back side S2.On the part that does not form permanent resist 10, be formed with inner conductor layer 9a.Then, there is the inner conductor layer 4 on the back side S2 of conductor layer 9a and base plate 2 this inboard, is to be electrically connected by the via hole 11 that is located on the 1st interlayer insulating film 8a.

Again, be located on the 2nd interlayer insulating film 8b on the above-mentioned back side the 1st interlayer insulating film 8a, equally also part is formed with permanent resist 10.Do not forming permanent guarantor *

げ is contrary to protect and secretly tries to gain the young uncommon latitude of chaff and send Cho outer conductors layer 9b.Then, this outer conductors layer 9b and inner conductor layer 9a are to be electrically connected by the via hole 11 on the 2nd interlayer insulating film 8b that is located at back side S2 side.The outer peripheral portion of the 2nd interlayer insulating film 8b of rear side promptly on the 2nd of wiring plate 1 the outer peripheral portion, is disposing the 2nd link subgroup, is promptly disposing a plurality of liners 13 of forming the liner group discretely.On these liners 13, be formed with projection 14 as the projected electrode that is electrically connected with the motherboard that does not illustrate.

Outer spacer 12B in the 1st liner group by the outer conductors layer 9b that extends to the substrate periphery, is electrically connected by via hole 11.On the other hand, inner liner 12A is by forming metal film in the wall of being located at the hole on the interlayer insulating film 8b and bottom surface, and constitute by the middle via hole 11 of its metal film

bonding conductor layer

9b and 9a.

Be embedded with scolding tin SL on the via hole 11, form so-called scolding tin projection because of protruding in the surface.The projection of this scolding tin SL is connected in nude film C1.For this reason, in the liner group of inner liner 12A, lead-out wiring just can shorten length of arrangement wire laterally, again, can improve wiring density.

The via hole 11 of the 2nd interlayer insulating film 8b like this is electrically connected by through hole 6 by inner conductor layer 9a, via hole 11 and inner conductor layer 3.The inner conductor layer 4 that is connected in same through hole 6 in addition by via hole 11, inner conductor layer 9a, via hole 11 and outer conductors layer 9b, be electrically connected on the 2nd liner group's liner 13.Again, the

inner conductor layer

3,4,9a and the outer conductors layer 9b that connect the 1st substrate group and the 2nd liner group connect up along the order direction towards the substrate outer peripheral portion from the substrate center part, and extend to radiation direction.

As shown in Figures 1 and 2, on the joint face of the surface of MULTILAYER COMPOSITE wiring layer and motherboard plate, be formed with solder flux protective layer 19 again.The solder flux protective layer in the conductor layer on protection surface, also be for

Prevent that the scolding tin that melts from flowing out and cause that short circuit is established between figure.

, form composite bed B1 here, the interlayer insulating film 8a of B2,8b preferably has the photoresist of anti-dissolubility by (a) to acid or oxidant and the heat-resistant resin particle (b) acid or oxidant solubility crossed through cured is formed.Its reason is that then development treatment is easy if contain the heat-resistant resin particle that is cured and handled, and again, even produce the remnants that develop, also can remove during roughening treatment.Therefore, even the high via hole of depth-to-width ratio also is difficult to produce video picture remnants when it forms.If when only having used photoresist, just be difficult to form the following smaller-diameter path hole 11 of the about 80 μ m of diameter.

Again, preferably through the resin of sensitizationization and (a2) interpolation (b) is formed the heat-resistant resin particle of crossing through cured of acid or oxidant solubility on the compound resin formed of thermoplastic resin to heat-curing resin by (a1) acid or oxidant are had anti-dissolubility for above-mentioned interlayer insulating film 8a, 8b.And said acid or oxidant refer to, for example the phosphoric acid that uses in the surface coarsening operation, chromic acid, chromate, permanganate, hydrochloric acid, phosphoric acid, formic acid, sulfuric acid and hydrofluoric acid.

Above-mentioned have anti-dissolubility and to heat-curing resin through the resin (a1) of sensitizationization preferably, select any at least a kind resin from epoxy acrylic resin acid and photosensitive polyimide (photonasty PI) acid or oxidant.Its reason is that these resins have high-fire resistance and high strength.

Above-mentioned thermoplastic resin (a2) preferably from polyether sulfone (Port リエ-テ Le ス Le ホ Application) (PES), polysulfones (Port リス Le ホ Application) (PSF), at least a kind resin selecting phenoxy resin and the polyethylene (PE).Its reason is, at interlayer

insulating film

8a, 8b keeps the characteristic of above-mentioned thermosetting resin (a1), just can give high glass (ガラス) transition temperature Tg, high resiliency.

Above-mentioned heat-resistant resin particle (b) preferably is selected from least a in amino resin particle and epoxy resin (EP resin) particle.Its reason is that these particles can not worsen the interlayer insulating film characteristic.And because of the epoxy resin that solidifies with amine (アミ Application) curing agent has the structure of hydroxy ether (ヒ De ロエキシエ-テ Le), the particle of being made up of this resin especially has and is soluble in (a1) or advantageous feature (a2).Again,, can select, as melamine (メラミ Application) resin, urea resin, guanamine (グア Na ミ Application) resin etc. as amino resins.Wherein, select melamine resin preferably electrical characteristic, PCT (Pressure CookerTest) and HHBT (High Humidity Bias Test) characteristic be good.

The particle diameter of above-mentioned heat-resistant resin particle (b) is relatively good less than 10 μ m.Its reason be because, can attenuation interlayer film thickness, can form meticulous figure again.And, can select various shapes such as spherical shape, fragment shape, agglutination particle shape as the shape of heat-resistant resin particle.

The wiring plate 1 of said structure for example can be made by following steps.At first, for making interlayer insulating film 8a, the adhesive that 8b forms by addition process (アデイテイ Block) can be modulated as follows, and this adhesive comprises the soluble component of acid or oxidant and anti-soluble components.

Cresols lacquer with 25% epoxy radicals of phenolic aldehyde (Network レゾ-Le ノボラ Star Network) type epoxy resin the photosensitive oligomer (CNA25 that gives through acrylic (ア Network リ Le) change, molecular weight 4000), PES (molecular weight 17000), (four countries change into system to curing agent to imidazoles (イミグゾ-Le), trade name: 2B4MZ-CN), photo-sensitive monomer three acrylic acid, three formicesters (TMPTA), light trigger (light begins agent) (Ciba-Geigy system, trade name:, mix with N-methyl-pyrrolidones I-907) with the regulation ratio.The mixed proportion of each composition is as follows.

Oligomer 70 unit of weights

PES 30 unit of weights

Imidazoles 4 unit of weights

TMPTA 10 unit of weights

Light trigger 5 unit of weights

N-methyl-pyrrolidones 80 unit of weights

And, to this mixture, mix mean particle diameter 5.5 μ m epoxy resin powder (eastern レ system, trade name: トレパ-Le EP-B), 10 unit of weights of 20 unit of weights, mean particle diameter 0.5 μ m.

3. afterwards with evenly disperseing (ホモデイスパ-) mixer that said mixture is adjusted into viscosity 120cps, then stir, obtain adhesive with 3 running rollers.

4. then be coated with this adhesive to

conductor layer

3,4, through hole 6 in advance and to have a two sides of base plate 2 of heat-resistant resin 7 all.Afterwards, carry out vacuumize or carry out drying with 80 degrees centigrade Celsius in air with 25, also with good grounds ultraviolet curing, video picture are handled and are formed via hole and also carry out hot curing.Its result forms the 1st interlayer insulating film 8a.

5. then, because of handling with alligatoring agent such as chromic acid on the surface of the 1st interlayer insulating film 8a, formation has a plurality of fixing alligatoring faces with recess.

6. afterwards according to conventional method, carry out the formation that catalyst core is paid (catalyst nuclear is paid), permanent resist 10, reactivity is handled and electrolytic copper free electroplating, forms inner conductor layer 9a and via hole 11 thereupon.Via hole 11 is to cover the wall in the hole be located at interlayer dielectic and bottom surface and form with electroplating film, and is electrically connected lower conductor layer 9a, 9b.The wall in hole was carried out roughening treatment (not diagram), was attached with electroplating film, was difficult to peel off.

7. smear identical adhesive in addition, make it to solidify, form the 2nd interlayer insulating film 8b thus.

8. then, the surface with the 2nd interlayer insulating film 8b that obtains is handled in the alligatoring agent forms alligatoring face thus.After this, carry out that catalyst core is paid, the formation of permanent resist 10, reactivity handles and electrolytic copper free electroplating, form outer conductors layer 9b,

liner

12A, 12B, 13 and via hole 11 at established part.Photoresist is coated on two sides at substrate, its exposure, carries out video picture and handles, and makes

liner

12A, 12B, and 13 exposures, and form solder flux protective layer 19.

9. form soldering-tin layer SL at

liner

12A, 12B, 13.

Begin liner

12A, 12B, 13 implement nickel alloy electroplates (not diagram), by print process print solder glue, make it flow backwards to form the film that scolding tin projection or stack form scolding tin figure (パ -Application),, print scolding tin and form soldering-tin layer (scolding tin flange) its heating.

Through above operation, just finish desirable wiring plate 1.Device nude film C1 on the wiring plate 1 that obtains just can obtain electro part carrying device M1 as shown in Figure 1 afterwards.

Yet, press the wiring plate 1 of present embodiment, be positioned at the inner liner 12A of the 1st liner group middle body, any one all needn't be connected to outer conductors layer 9b, via hole 11 is held a concurrent post inner liner 12A, directly and inner conductor layer 9a be electrically connected.That is to say that each inner liner 12A is electrically connected with inner conductor layer 9a by via hole 11.

Therefore, above the 2nd interlayer insulating film 8b that is formed with the 1st liner group, there is no need lead-in wire to the outer conductors layer 9a of substrate outer peripheral portion.Thereupon, even dispose extraneous liner 12B on the outside of inner liner 12A, during wiring, these can not become obstruction yet.Also have as above-mentioned, because of the outer conductors layer 9b that does not exist liner 12A internally to draw, the result just can connect up to the outer conductors layer 9b that outer inner liner 12B draws densely.That is to say, compare, can improve the wiring density of whole plate with structure in the past.

Again,, form the interlayer insulating film 8a of MULTILAYER COMPOSITE wiring layer B1, B2, during 8b, used by the photoresist that acid or oxidant is had anti-dissolubility with to acid or oxidant to have the adhesive that the heat-resistant resin particle of solubility is formed at present embodiment.Therefore, when using ultraviolet exposure, on the formation position of via hole, be difficult to produce video picture remnants.

Though this reason is also indeterminate, but can think, a side who has the heat-resistant resin particle, compared with the situation of only dissolving photoresist, the meltage of resin integral body will lack, again, even produce video picture remnants, during by roughening treatment dissolving thermal endurance particle, its thermal endurance particle and photoresist can dissolve together.

Then, can be more in the past than the via hole that formed minor diameter easily and positively.Certainly, conductor layer 9a, the 9b that is formed by addition process is compared with will getting well that in the past subtractive process forms.Therefore, compared with structure in the past, can improve wiring density.

At present embodiment, the

inner conductor layer

3,4,9b and the outer conductors layer 9b that connect between the liner 12,13 connect according to via hole 11, and connect up to substrate outer peripheral portion order direction and radiation direction along the substrate middle body.Therefore, once causing the wiring of periphery with it, the existing structure that causes Fig. 8 of center position again is different.Have only do not return like this part of drawing wiring, the length of arrangement wire that connects between the liner 12,13 just can shorten, and also can improve wiring efficient really.Thus, can realize the electro part carrying device M1 that processing speed is fast.

Also have,, be not only the

conductor layer

3,4 of base plate 2, and also be formed with wiring on conductor layer 9a, the 9b of composite bed B1, B2 in the feature of the wiring plate 1 of present embodiment.For this reason, even at base plate 2 through hole 6 is set, it can not bring baneful influence to wiring especially yet, can also effectively utilize the space on the base plate.This means the maximization that to avoid electro part carrying device M1 really.

At the wiring plate 1 of present embodiment, surperficial S1 and back side S2 are provided with the composite bed B1 of thickness much at one, B2.For this reason, the stress that is added in base plate 2 both sides much at one, they are just cancelled out each other easily.Can form the wiring plate 1 of difficult warpage for this reason.

Also have,,, therefore for example can realize densification and miniaturization than situation about only forming on the surface because of MULTILAYER COMPOSITE wiring layer B1, B2 are formed on the two sides at present embodiment.

And for example, present embodiment can also change as follows.

Fig. 2 is illustrated on other wiring plate 18, carries the circuit component mounting device M2 that nude film C1 forms.This wiring plate 18 has only surperficial S1 to be provided with the MULTILAYER COMPOSITE wiring layer B3 of 3-tier architecture.On the other hand, form the 2nd liner group's liner 13, be connected with the conductor layer 4 of the last formation of S2 overleaf.Then, back side S2 conductor layer 4, integral body is covered with by solder flux protective layer 19.Even such structure also can reach action effect same as the previously described embodiments.

The stack number of plies of MULTILAYER COMPOSITE wiring layer B1-B3 that is to say, the number of interlayer insulating

film

8a, 8b is not necessarily limited to 2 or 3 layers, and the number of plies beyond it also can.Again, the stack number of plies on the surperficial S1 and the stack number of plies on the S2 of the inside are incomplete same also passable.

As base plate, the multi-layer sheet of use 4 and even 8 laminates etc. also can.And, be under the preferential situation with cost degradation, select the base plate 2 of individual layer favourable, when expectation realizes higher densityization and miniaturization, select multi-layer sheet favourable.

On the liner 13 of forming the 2nd link subgroup, replace the projection 14 of embodiment, it is also passable that pin is set.Again, certain structure that projection 14 is not set or sells is also passable.And, the component mounting zone, with the embodiment difference, also can be a plurality of.

The liner 13 of forming the 2nd link subgroup also can without whole setting of the MULTILAYER COMPOSITE wiring layer B2 of back side S2.If this structure can be carried more liner 13.

Conductor layer 9a, the 9b that constitutes MULTILAYER COMPOSITE wiring layer B1-B3 is that the metal plating film beyond the electrolytic copper free electroplating film is also passable.Again, replace resembling the metal film that chemical film forming method such as electroplating film forms, for example, the metal film of selecting physical film deposition method such as cathode vacuum spraying plating to form also can.

Be equipped on the circuit block on the wiring plate 1, except the nude film 2 of embodiment, also can be, for example BGA (Bump Grid Array), QFN (Qu a tro Flat Non-Lead Array), the semiconductor package of PGA (Pin Grid Array) etc. that has short pin is also passable.

Inner liner 12A needn't necessarily be directly connected on the via hole 11, for example, the outer conductors layer 9b of the weak point by not extending to the substrate periphery, it is also passable to be connected in via hole 11.

The combination (a1+a2+b) of resin, thermoplastic resin and the heat-resistant resin of heat reactive resin is handled in sensitization, except that the combination of embodiment, also can followingly enumerate.That is a1+a2+b=,

Epoxy acrylate+PES+ amino resins,

Epoxy acrylate+PSF+EP,

Epoxy acrylate+phenoxy resin+EP,

Epoxy acrylate+PE+EP,

Epoxy acrylate+PSF+ amino resins,

Epoxy acrylate+phenoxy resin+amino resins,

Epoxy acrylate+PE+ amino resins,

Epoxy acrylate+PES+ amino resins and EP,

Epoxy acrylate+PSF+ amino resins and EP,

Epoxy acrylate+phenoxy resin+amino resins and EP,

Epoxy acrylate+PE+ amino resins and EP,

Photonasty PI+PES+EP,

Photonasty PI+PES+ amino resins,

Photonasty PI+PSF+EP,

Photonasty PI+ phenoxy resin+EP,

Photonasty PI+PE+EP,

Photonasty PI+PSF+ amino resins,

Photonasty PI+ phenoxy resin+amino resins,

Photonasty PI+PE+ amino resins,

Photonasty PI+PES+ amino resins and EP,

Photonasty PI+PSF+ amino resins and EP,

Photonasty PI+ phenoxy resin+amino resins and EP,

Photonasty PI+PE+ amino resins and EP,

Epoxy acrylate and photonasty PI+PES+ amino resins,

Epoxy acrylate and photonasty PI+PSF+EP,

Epoxy acrylate and photonasty PI+ phenoxy resin+EP,

Epoxy acrylate and photonasty PI+PE+EP,

Epoxy acrylate and photonasty PI+PSF+ amino resins,

Epoxy acrylate and photonasty PI+ phenoxy resin+amino resins,

Epoxy acrylate and photonasty PI+PE+ amino resins,

Epoxy acrylate and photonasty PI+PES+ amino resins and EP,

Epoxy acrylate and photonasty PI+PSF+ amino resins and EP,

Epoxy acrylate and photonasty PI+ phenoxy resin+amino resins and EP,

Epoxy acrylate and photonasty PI+PE+ amino resins and EP,

Certainly also allow other combination of not enumerating out here.

Below, describe the 2nd embodiment that the present invention is specialized in detail according to Fig. 3 to Fig. 7

Fig. 3 is 1/4th the schematic diagram that has almost disconnected the wiring plate 51 that is used for electro part carrying.Wiring plate 51 as heartwood (コア material), has glass epoxy substrate 54.And, except glass epoxy substrate 54, use also to be fine as polyimide substrate or bismaleimides triazine BT (PVC スマレイミ De トリアジ Application) resin substrate.Be formed with the adhesion layer 55 (insulating barrier) that forms by the distinctive adhesive of addition process on the two sides of substrate 54.The surface of this adhesion layer 55, the recess that alligatoring becomes to make it to have a plurality of fixedly usefulness.Here as adhesive, use by cured acid or oxidant in pairs to have the photoresist of anti-dissolubility and the heat-resistant resin particle through cured of acid or oxidant solubility is formed.Because the adhesive of this structure, when high-precision formation precise image, be very suitable.The detailed composition of adhesive is identical with the above embodiments.

On the surface of the above-mentioned adhesion layer 55 of alligatoring, be formed with the permanent solder mask of forming by photoresist.On the part that does not form permanent resist 56, have, by film formed substrate 53 conductor layers such as grade of electrolytic copper free electroplating.The back side of wiring plate 51 promptly, also forms conductor layer (figure slightly) on the face of motherboard plate.

On the one hand, on the surface of the wiring plate 51 of lift-launch slice, thin piece, almost dividing in the central has the component mounting zone.On the surface of wiring plate 51, on the periphery of component mounting zone A1, be formed with the liner 53 of a plurality of leads 52 and a plurality of toroidals again.A plurality of liners 53 on the periphery of component mounting zone A1, are formed 4 liners and are arranged L1-L4, and, carried thick and fast alternately.Be connected with 1 lead 52 on each liner 53.The major part of lead 52 is extended radially towards the substrate outer peripheral portion.One end of these leads 52 by the through hole (figure slightly) that is formed on the substrate outer peripheral portion discretely, is connected with a plurality of liners that are provided in substrate 51 back sides discretely (figure slightly) separately.Again, the part in the above-mentioned lead 52 is extremely short, is connected with via hole between adjacent seam.

At present embodiment, the 2nd connect up Figure 59 and connect Figure 60 of the almost trapezoidal tapers shape of two wiring diagrams that the 1st wiring Figure 58, the width that each lead 52 all has a Rack is wideer than the 1st wiring diagram.Wiring Figure 58 is configured in the similar middle position of the high relatively substrate of wiring density, and is connected with above-mentioned each liner 53.On the other hand, the 2nd wiring Figure 59 is laid in the low relatively substrate outer peripheral portion of wiring density.Therefore, the width of every lead 52 changes according to the variation of line density.By taper lines 60, connect the 1st wiring Figure 58 and the 2nd wiring Figure 59 along their common centre line C L.The both sides of the edge T1 of taper Figure 60 is for the both sides of the edge of centre line C L and each wiring Figure 59, is the angle θ of regulation and tilt (with reference to figure 5).That is to say that the width of taper Figure 60 is set to increase to the width of the 2nd wiring Figure 59 along the width of the 1st wiring Figure 58.

Here, shown in Fig. 5 (a), angle θ gets 10 °-45 °, moreover gets 15 °-40 °, particularly preferably gets 20 °-35 °.And,, also be very easily with CAD (computer-aided design) self routing if above-mentioned angle θ is set at 10 °-45 °.On the other hand, shown in Fig. 5 (c), if angle θ is discontented with 10 °, then taper Figure 60 is elongated, and wiring just may difficulty.Shown in Fig. 5 (b),, just can not prevent really that probably permanent resist 86 from crackle taking place if angle surpasses 45 ° again.

Also have, as shown in Figure 4, taper Figure 60 is connected in the 1st and the 2nd wiring Figure 58,59 edge C 1, C2, has made rounding and has handled to have disappeared the turning.

Each several part size W1-W9 on the wiring plate 51 of present embodiment is set in the following scope.Spacing between the liner of representing with W1 on Fig. 6 53 is 11mil-17mil, and the spacing between the liner of representing with W2 53 is 5.5mil-8.5mil.Spacing between the liner of representing with W3 53 is 8mil-12mil.The maximum inner diameter of via hole 57 is 4mil-6mil between the seam of representing with W4.And the diameter of liner 53 also equals this value.The minimum interior diameter of via hole 7 is 3mil-4mil between the seam of representing with W5.The 1st width of representing with W6 that connects up Figure 58 is 1.3mil-2mil.Again, the width of the 2nd Figure 59 that represents with W8 among Fig. 3 is 2.8mil-5.8mil, and the 2nd space of representing with W9 of connecting up between Figure 59 is 1.8mil-3.8mil.And 1mil is 1/1000th inches, is equivalent to about 25.4 μ.

Press present embodiment, be formed on little the 1st wiring Figure 58 and the 2nd big wiring Figure 59 of live width that is formed on the substrate outer peripheral portion of live width of substrate center part, connect by taper Figure 60.Then, on the high relatively similar substrate center part of wiring density, the width W 6 of lead 52 is set narrowly.Therefore, can fully guarantee the space W 7 between the 1st wiring Figure 58, make it to guarantee that than being easier to good insulation performance at interval.So just solved problem in the high area routing difficulty of wiring density.More particularly, even approaching mutually between the similar liner 53, also can between them, pass through multiple conducting wires 52.

Again, at present embodiment, as shown in Figure 3, in the low substrate periphery of wiring density, the width W 8 of lead 52 is expanded.Thus, compare with the structure in the past (with reference to 9 figure) of only using the lead 62 that narrow and homogeneous width is arranged, the cloth line resistance can diminish, and the circuit malfunction is difficult to take place.Again, at present embodiment, the 1st wiring Figure 58 that live width is different and the 2nd wiring Figure 59 connect by live width continually varying taper Figure 60.Therefore, compare, on the specific part of permanent resist 56, be difficult to concentrated stress with the example in the past that the 1st wiring diagram 62b directly is connected the 2nd wiring diagram 62a (with reference to 9 figure).Therefore, can prevent example in the past as shown in Figure 10 really, crackle takes place in permanent resist 63.Therefore, the wiring plate 51 that the electro part carrying of present embodiment is used, it has good reliability.

In addition, for example this 2nd embodiment can also change as follows.

Wiring plate 65 shown in Figure 7 connects the 1st and the 2nd wiring Figure 58,59 by taper Figure 66.In this example, coupling part 66 has and two wiring Figure 58,59 centre line C L 1, the 1st edge 66a of CL2 extends parallel and the 2nd edge 66b that two center lines are tilted.Even this structure also can reach the action effect same with embodiment.And at this moment, the cross section that stress is concentrated easily reduces, and therefore the advantage that also will be difficult to take place crackle than the 2nd embodiment that is shown in Fig. 3 is arranged.

The wiring Figure 58 that forms every

lead

52,59, not necessarily described two kinds of the 2nd embodiment are also passable, and according to the wiring density on the substrate surface, can increase wiring width is more than 2 layers.

Produce the possibility of utilizing that also goes up

As mentioned above, according to the present invention, can realize densification and the miniaturization of wiring plate, Play the wires design easily such excellent results that becomes.

Claims

1. circuit-component carrying substrate, it has:

Above-mentioned insulating barrier is formed by the resin that acid or oxidant is had anti-dissolubility with to the particle that acid or oxidant have a solubility, and forms roughened layer on the surface of each insulating barrier by acid or oxidant, forms above-mentioned conductor layer on this roughened layer;

2. circuit-component carrying substrate as claimed in claim 1 is characterized in that:

Above-mentioned the 1st link subgroup is formed on the outermost layer of MULTILAYER COMPOSITE wiring layer, simultaneously, the terminal group that continues of the middle body of these link subgroups, the conductor layer by via hole and above-mentioned MULTILAYER COMPOSITE wiring layer is electrically connected.

3. circuit-component carrying substrate as claimed in claim 1 is characterized in that:

The surface of above-mentioned base plate and the back side form the MULTILAYER COMPOSITE wiring layer, and its composite wiring layer comprises at least one conductor layer and at least one insulating barrier of alternately stack;

Above-mentioned each insulating barrier has a plurality of via holes that are electrically connected each conductor layer, and described conductor layer and through hole are electrically connected;

Above-mentioned the 1st link subgroup and the 2nd link subgroup, be formed on the outermost layer of this MULTILAYER COMPOSITE wiring layer separately, simultaneously, be positioned at described the 1st link subgroup middle body splicing ear and constitute each splicing ear of the 2nd link subgroup, the conductor layer by via hole and above-mentioned MULTILAYER COMPOSITE wiring layer is electrically connected.

4. circuit-component carrying substrate as claimed in claim 1 is characterized in that:

Above-mentioned composite wiring layer comprises at least one conductor layer and at least one insulating barrier of alternately stack;

Above-mentioned each insulating barrier has a plurality of via holes that are electrically connected each conductor layer, and, be connected by the above-mentioned conductor layer of via hole, connect up along order direction and radiation direction towards the substrate outer peripheral portion simultaneously.

5. circuit-component carrying substrate as claimed in claim 1 is characterized in that:

Above-mentioned insulating barrier is formed by photoresist.

6. circuit-component carrying substrate as claimed in claim 1 is characterized in that:

Above-mentioned insulating barrier is formed by the heat-resistant resin particle that acid or oxidant is had the photoresist of anti-dissolubility and being cured of acid or oxidant solubility handled.

7. circuit-component carrying substrate as claimed in claim 1 is characterized in that:

Above-mentioned insulating barrier is to be made up of through the compound resin of the resin of sensitization and thermoplastic resin and to the heat-resistant resin particle that acid or oxidant have a solubility, the heat reactive resin that acid or oxidant is had an anti-dissolubility.

8. circuit-component carrying substrate as claimed in claim 7 is characterized in that:

Above-mentioned heat reactive resin is at least a resin that is selected from the group of being made up of epoxy acrylate and photosensitive polyimide through the resin of sensitization, and above-mentioned thermoplastic resin is at least a resin that is selected from the group of being made up of polyether sulfone, polysulfones, phenoxy resin and polyethylene.

9. circuit-component carrying substrate as claimed in claim 6 is characterized in that:

Above-mentioned heat-resistant resin particle is to be selected from least a in the group of being made up of amino resin particle and epoxy resin particle.

10. circuit-component carrying substrate as claimed in claim 1 is characterized in that:

Above-mentioned insulating barrier comprises epoxy acrylate, polyether sulfone, epoxy resin particle and photo-sensitive monomer.

11. circuit-component carrying substrate as claimed in claim 10 is characterized in that:

As above-mentioned amino resins, select melamine resin, urea resin, reach the guanamine resin.

12. circuit-component carrying substrate as claimed in claim 6 is characterized in that:

Described acid or oxidant comprise chromic acid, chromate, permanganate, hydrochloric acid, phosphoric acid, formic acid, sulfuric acid and hydrofluoric acid.

13. a circuit-component carrying substrate, it is provided with a plurality of splicing ears and lead on insulating barrier, and above-mentioned a plurality of splicing ears form with high density state, and these a plurality of splicing ears are connected with lead respectively, it is characterized in that:

Above-mentioned insulating barrier is formed by the resin that acid or oxidant is had anti-dissolubility with to the particle that acid or oxidant have a solubility, and forms roughened layer on the surface of each insulating barrier by acid or oxidant;

Each lead is formed by electrodeposit on the roughened layer of above-mentioned insulating barrier, and become by: the mutually different a plurality of wiring diagrams of live width wiring diagram, its width different that continually varying cone-shaped figure forms with being connected those live widths, and the live width of above-mentioned lead can form the high relatively zone of wiring density than low relatively regional little of wiring density, each lateral margin of above-mentioned cone-shaped figure is connected with each lateral margin of wiring diagram, this coupling part is done rounding and is handled

14. circuit-component carrying substrate as claimed in claim 13 is characterized in that:

The live width of above-mentioned lead forms and becomes big according to the substrate peripheral part.

15. circuit-component carrying substrate as claimed in claim 13 is characterized in that:

The wiring diagram that above-mentioned live width is different is made up of the 1st wiring diagram and the 2nd wiring diagram also wideer than this 1st wiring diagram live width; And the taper figure that connects the 1st wiring diagram and the 2nd wiring diagram has side, and in addition, above-mentioned the 1st wiring diagram and the 2nd wiring diagram have common center line; The above-mentioned relatively center line of the side of above-mentioned taper figure tilts with 10 ° of-45 ° of degree.

16. circuit-component carrying substrate as claimed in claim 13 is characterized in that:

Above-mentioned insulating barrier is by acid or oxidant being become the heat-resistant resin of slightly solubility and the heat-resistant resin particle through cured of acid or oxidant solubility being formed.

17. a circuit-component carrying substrate, it has:

Above-mentioned insulating barrier is formed by the photoresist that acid or oxidant is had anti-dissolubility with to the heat-resistant resin particle of crossing through cured that acid or oxidant have a solubility;

Above-mentioned each insulating barrier has a plurality of via holes that are used to be electrically connected each conductor layer, and above-mentioned conductor layer is electrically connected with through hole;

18. circuit-component carrying substrate as claimed in claim 17 is characterized in that: