CN1584711A - Orientation membrane platform, its process and apparatus - Google Patents
Orientation membrane platform, its process and apparatus Download PDFInfo
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- CN1584711A CN1584711A CN 200410048903 CN200410048903A CN1584711A CN 1584711 A CN1584711 A CN 1584711A CN 200410048903 CN200410048903 CN 200410048903 CN 200410048903 A CN200410048903 A CN 200410048903A CN 1584711 A CN1584711 A CN 1584711A
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- alignment film
- pedestal
- alignment
- supporting part
- platform
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Abstract
An orientation film platform has a bearing part on base, a orientation film on bearing part and dirt collection structure at outer edge of bearing part. The orientation film preparation process is also disclosed by the present invention.
Description
Technical field
Relevant a kind of alignment film platform of the present invention and alignment film processing procedure, particularly relevant a kind of alignment film platform with supporting part.
Background technology
By the state of Control of Voltage liquid crystal, can make the light of backlight assembly penetrate liquid crystal layer with required polarization direction, use in the picture of LCD screen and present different color and lusters and pattern.And when perfusion during liquid crystal, each liquid crystal can be by the alignment effect of alignment film, and makes each liquid crystal molecule present the arrangement mode of rule, and cooperates the distribution of circuit to demonstrate required picture with operating voltage.So the state quality of alignment film is one of picture display quality quality whether key factor that determines a LCD screen.
When desiring to make an alignment film to have liquid crystal carried out the function of orientation, need alignment film is arranged on the substrate, utilize the rubbing action of an orientation bar again, make alignment film be subjected to the stretching force of fixed-direction, and make liquid crystal molecule when being poured into the alignment film surface, present the state of proper alignment.
One alignment film (not shown) is set at the surface of an alignment film substrate 11, as shown in Figure 1, this alignment film substrate 11 is placed on the alignment film platform 13, and roll across alignment film substrate 11 lip-deep alignment films by orientation bar 15, alignment film is extended according to fixed-direction, and produce the ability that makes liquid crystal alignment.
So be the influence that alleviates the problems referred to above, can be as shown in Figure 2, by a cushion 19 with thickness c1 is set between alignment film substrate 11 and alignment film platform 13, (, and prevent that alignment structure 153 is because of the serviceable life that touches alignment film platform 13 and reduce orientation bar 15, the yield that reduces the alignment film processing procedure with bed hedgehopping alignment film substrate 11 even (a1+c1)＞b1).
Yet, but promptly need change in use for some time, and easily cause the increase of cost because of cushion 19.And if when changing cushion 19, do not remove totally because of soft flocks 17 (or other pollutants) accidentally, and soft flocks 17 is present between cushion 19 and the alignment film platform 13, when causing the smooth situation of cushion 19 air spots, then may when carrying out the alignment film processing procedure, have influence on the state that orientation bar 15 rolls, influence yield then.Go up the generation that promptly enables to reduce soft flocks 17 (or other pollutants) for another example, but the surface of alignment film substrate 11 because orientation bar 15 still can rub is polluted alignment film so still can't properly settle soft flocks 17 (or other pollutants), and is reduced the situation of yield.
As mentioned above, need develop and a kind of alignment film platform and a kind of alignment film processing procedure, with yield that increases the alignment film processing procedure and the serviceable life that prolongs the orientation bar.
Summary of the invention
A purpose of the present invention is for providing an alignment film platform to be applied in the alignment film processing procedure, to overcome the shortcoming of prior art institute tool.
Another object of the present invention, reduces the use of cushion, and then reduces cost by the change of alignment film platform and integrally structure for an alignment film platform and an alignment film processing procedure are provided.
Another purpose of the present invention by the probability of the dirty structure decrease pollution of the collection of different aspects or different size size alignment film, increases the yield of alignment film processing procedure for an alignment film platform and an alignment film processing procedure are provided.
The invention provides a kind of alignment film platform and alignment film processing procedure, the alignment film platform has a pedestal and a supporting part; Supporting part is arranged on the pedestal, and the area of supporting part is less than the area of pedestal.Alignment film can be positioned on the supporting part, to carry out the alignment film processing procedure.And the alignment film platform also includes a dirty structure of collection that is arranged at pedestal, to connect an air-extractor.
Above-mentioned purpose, design feature and effect for further specifying the present invention are described in detail the present invention below with reference to accompanying drawing.
Description of drawings
Fig. 1 is the synoptic diagram of existing alignment film platform;
Fig. 2 is the alignment film platform synoptic diagram that existing collocation has a cushion;
Fig. 3 is the synoptic diagram of the first embodiment of the present invention;
Fig. 4 is the synoptic diagram of the second embodiment of the present invention; And
Fig. 5 is the process flow diagram of alignment film processing procedure of the present invention.
Embodiment
The alignment film processing procedure that the invention provides an alignment film platform and use the alignment film platform will be in following detailed description.The embodiment of the invention is based on the described problem of solution prior art, but the claim of institute of the present invention tool does not exceed with the description of following accompanying drawing and embodiment, and should be as the criterion with the claim and the spirit of being applied for.
The first embodiment of the present invention as shown in Figure 3, the alignment film process apparatus has alignment structure 253 and alignment film platform.The alignment film 211 that is arranged on the alignment film substrate 21 is positioned on the alignment film platform 23, to carry out the processing procedure of alignment film; Alignment film platform 23 has a pedestal 231 and a supporting part 233, and in this embodiment, supporting part 233 is formed in one with pedestal 231, and the area of supporting part 233 is less than the area of pedestal 231.
In this embodiment, orientation bar 25 has the alignment structure 253 that coats the body of rod 251; When acting on alignment film 211 with alignment structure 253, that is when alignment film substrate 21 carried out abrasive action, because the area of supporting part 233 is less than alignment film substrate 21, and by the relation between the thickness c2 of the effect thickness b2 (that is effect thickness of alignment structure 253) of the thickness a2 of control alignment film substrate 21, orientation bar 25 and supporting part 233, that is orientation bar 25 satisfies the condition of (a2+c2)＞b2 when touching alignment film substrate 21, makes effect thickness b2 less than the top of alignment film substrate 21 distance to pedestal 231 surfaces 2311; So, just can part utilize under the condition of alignment structure 253 filling, reduce the chance that alignment structure 253 touches pedestal 231 surfaces 2311, and then reduce alignment structure 253 and increase soft flocks because of the surface 2311 with pedestal 231 rubs.
Again because of supporting part 233 and pedestal 231 are formed in one, thus do not need as existing technology, to it should be noted that the user mode of cushion 19, or increase cost on the processing procedure because of changing cushion 19.
In addition, also can the dirty structure 29 of collection be set in pedestal 231, with cleaning or absorption soft flocks, dust fall or other pollutants, so by cleaning or absorption soft flocks and dust fall, the soft flocks and the dust fall that prevent to drop on alignment film platform 23 drop on alignment film substrate 21, even make processing procedure have stable better yield then.
In this embodiment, collect dirty structure 29 and be one and be recessed into, and be the aspect of perforation, through pedestal 231 in the sewage sump of pedestal 231; It can reach the effect of cleaning soft flocks by the whole bag of tricks, wherein a kind of mode is by connecting cleaning equipment, as an air-extractor 31 with the effect of clearing up, with absorption affinity by air-extractor 31, absorption enter air-extractor 31 absorption affinity can and soft flocks of locating or dust fall, and reach the effect of cleaning.And in this embodiment, air-extractor 31 is a Hoover.
In first embodiment, collecting dirty structure 29 is formed on the pedestal 231, yet, collect dirty structure 29 part that forms and be not limited in pedestal 231, the global design of its visual alignment film platform 23 changes the formation position of the dirty structure 29 of collection or the number of quantity, even other modes of arranging in pairs or groups are more to improve the clean-up performance of alignment film platform 23.The second embodiment of the present invention as shown in Figure 4, the position that can drop according to soft flocks or dust fall and design the dirty structure 29 of a plurality of collection of different size size, it is shaped as circle, making has the drop size of the dirty structure 29 of collection at place of soft flocks or dust fall bigger the easiliest, to have the dirty structure of stronger absorption affinity and collection in a big way; Also can set up the dirty structure 29 of the less collection of size in addition in case less soft flocks or the dust fall of size descends slowly and lightly to other places, and more properly keep the cleaning of alignment film platform 23.In addition, also can cooperate the global design of alignment film platform 23, and design on demand has the dirty structure 291 of difformity collection of different size size, wherein, it is square to collect being shaped as of dirty structure 291.
Alignment film processing procedure of the present invention can as step 33, provide an orientation bar as shown in Figure 5.Step 35 is placed an alignment film substrate on alignment film platform of the present invention for another example.Subsequently, then shown in step 39, start a cleaning action, with cleaning soft flocks or dust fall; And start the mode of cleaning action, and then can shown in step 391, start the air-extractor that is connected in the dirty structure of collection, with from collecting dirty structure absorption soft flocks or dust fall, and then reach the effect of cleaning.Afterwards, step 41 for another example acts on alignment film with the alignment structure of orientation bar, and to finish the alignment film processing procedure.
Alignment film platform of the present invention can reduce the use of cushion in the prior art, spend cost on processing procedure and reduce because of cushion, and can be by the effect of the dirty structure of the collection of different aspects or different size, effectively reduce the probability that soft flocks or dust fall pollute alignment film, even and then the stable yield of promoting alignment film.And, then can effectively promote the yield of alignment film by alignment film processing procedure of the present invention.
Though the present invention describes with reference to current specific embodiment, but those of ordinary skill in the art will be appreciated that, above embodiment is used for illustrating the present invention, under the situation that does not break away from spirit of the present invention, also can make the variation or the replacement of various equivalences, therefore, as long as in connotation scope of the present invention in the scope to the variation of the foregoing description, claims that modification all will drop on the application.
Claims (8)
1. alignment film platform is characterized in that comprising:
One pedestal has a supporting part on it, and the area of this supporting part is less than the area of this pedestal; And
The dirty structure of one collection is positioned at this supporting part outer rim on this pedestal.
2, alignment film platform as claimed in claim 1 is characterized in that this collects dirty structure is one to be recessed into the sewage sump in this pedestal.
3, alignment film platform as claimed in claim 2 is characterized in that this sewage sump is the aspect of perforation, through this pedestal.
4, as claim 2 or 3 described alignment film platforms, it is characterized in that this sewage sump has the pattern that varies in size, and spreadable being disposed on this pedestal.
5, as claim 2 or 3 described alignment film platforms, it is characterized in that this collects dirty structure and also comprises an air-extractor, the end of this air-extractor and this sewage sump is connected.
6, a kind of alignment film processing procedure is characterized in that may further comprise the steps: an orientation bar is provided; On an alignment film platform, place an alignment film substrate; Start a cleaning action, with cleaning soft flocks or dust fall, it starts the mode of cleaning action, for being connected in the air-extractor of the dirty structure of collection, with from collecting dirty structure absorption soft flocks or dust fall, and then reaches the effect of cleaning; And act on alignment film with the alignment structure of orientation bar, make to finish alignment film.
7, a kind of alignment film process apparatus is characterized in that comprising:
One alignment structure is in order to act on an alignment film; And
One alignment film platform, it has:
One pedestal has a supporting part on it, and the area of this supporting part is less than the area of this pedestal; And
The dirty structure of one collection is positioned at this supporting part outer rim on this pedestal;
Wherein, when carrying out the processing procedure of this alignment film, this alignment film is to be positioned on this supporting part.
8, alignment film process apparatus as claimed in claim 7, it is characterized in that this alignment structure by one the friction cloth form.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100489033A CN100354724C (en) | 2004-06-09 | 2004-06-09 | Orientation membrane platform, its process and apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100489033A CN100354724C (en) | 2004-06-09 | 2004-06-09 | Orientation membrane platform, its process and apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1584711A true CN1584711A (en) | 2005-02-23 |
| CN100354724C CN100354724C (en) | 2007-12-12 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2004100489033A Expired - Fee Related CN100354724C (en) | 2004-06-09 | 2004-06-09 | Orientation membrane platform, its process and apparatus |
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| Country | Link |
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| CN (1) | CN100354724C (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101414072B (en) * | 2007-10-19 | 2012-11-21 | 奇美电子股份有限公司 | Platform for manufacturing liquid crystal display device and method for examining exogenous impurity on platform |
| CN103424935A (en) * | 2013-09-02 | 2013-12-04 | 深圳市华星光电技术有限公司 | Rubbing device and rubbing method |
| US9268174B2 (en) | 2013-09-02 | 2016-02-23 | Shenzhen China Star Optoelectronics Technology Co., Ltd | Rubbing device and rubbing method |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2579492B2 (en) * | 1987-08-24 | 1997-02-05 | セイコーエプソン株式会社 | Manufacturing method of liquid crystal display device |
| JPH0434416A (en) * | 1990-05-30 | 1992-02-05 | Fujitsu Ltd | Production of liquid crystal display panel |
| JP3618913B2 (en) * | 1995-07-20 | 2005-02-09 | 株式会社東芝 | Manufacturing method of liquid crystal display device |
| JPH10142607A (en) * | 1996-11-15 | 1998-05-29 | Matsushita Electric Ind Co Ltd | Manufacturing device of liquid crystal display device |
-
2004
- 2004-06-09 CN CNB2004100489033A patent/CN100354724C/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101414072B (en) * | 2007-10-19 | 2012-11-21 | 奇美电子股份有限公司 | Platform for manufacturing liquid crystal display device and method for examining exogenous impurity on platform |
| CN103424935A (en) * | 2013-09-02 | 2013-12-04 | 深圳市华星光电技术有限公司 | Rubbing device and rubbing method |
| WO2015027657A1 (en) * | 2013-09-02 | 2015-03-05 | 深圳市华星光电技术有限公司 | Alignment rubbing apparatus and alignment rubbing method |
| US9268174B2 (en) | 2013-09-02 | 2016-02-23 | Shenzhen China Star Optoelectronics Technology Co., Ltd | Rubbing device and rubbing method |
| CN103424935B (en) * | 2013-09-02 | 2016-02-24 | 深圳市华星光电技术有限公司 | Orientation rubbing device and orientation rubbing method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN100354724C (en) | 2007-12-12 |
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Granted publication date: 20071212 Termination date: 20200609 |