CN1560321A - Precision atomizing depositing coating film apparatus - Google Patents
Precision atomizing depositing coating film apparatus Download PDFInfo
- Publication number
- CN1560321A CN1560321A CNA2004100236398A CN200410023639A CN1560321A CN 1560321 A CN1560321 A CN 1560321A CN A2004100236398 A CNA2004100236398 A CN A2004100236398A CN 200410023639 A CN200410023639 A CN 200410023639A CN 1560321 A CN1560321 A CN 1560321A
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- China
- Prior art keywords
- plated film
- film instrument
- spray deposition
- atomizing
- accurate spray
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Abstract
The invention is an accurate spray-deposition coating instrument, composed of a meter control system in a machine box, and its characteristic: a spray house is supported on the machine box through brackets, the top of the spray house is provided with a feeding house, the bottom of the spray house is provided with a deposition window, there is a link rod arranged on the machine box, and the link rod is connected with a sample table. It implements accurate control of densely coating, weight, uniformity, range and other conditions of the coating layers on material surfaces.
Description
(1) technical field: the present invention relates to a kind of plated film instrument, especially a kind of atomising method that adopts is realized the accurate spray deposition plated film instrument that coating applies and controls.
(2) background technology: a key issue in the fuel cell manufacture is to reduce cost.In the production of fuel cell, the catalyzer platinum is one of relatively expensive raw material.Therefore, reduce catalyst consumption, the catalyst levels on reduction unit's reaction area of both maximum journey plating is one of key that reduces cost.Simultaneously, how uniformly applications catalyst makes it reach high as far as possible specific surface area, is the key that obtains high-performance membrane electrode.This accurate spray deposition plated film instrument can make the reflection area of catalyzer reach maximum by adopting the atomizing deposition technique that suspends by the catalyst levels on the computer control unit surface.At present, only there is large-scale company of several families to adopt automatic production line in the world to realize accurate control catalyst usage quantity.Exist instrument cost of investment height, scale reaches shortcomings such as the primary catalyst usage quantity is big greatly.Be not suitable for applying.
(3) summary of the invention: the objective of the invention is to overcome the deficiency of above-mentioned prior art and provide a kind of simple, economy, accurately and small-sized efficiently accurate spray deposition plated film instrument.
Purpose of the present invention can reach by following measure:, accurate spray deposition plated film instrument, blind controller system by the connection computer in the cabinet 14 is formed, it is characterized in that on cabinet 14, supporting atomizing storehouse 4 by carriage 5, top in atomizing storehouse 4 is provided with feeding warehouse 2, be provided with deposition window 16 in the bottom in atomizing storehouse 4, on cabinet 14, be provided with union lever 15, connect the sample table that to slide 6 by union lever 15.Each angle in atomizing storehouse 4 is equipped with miniature atomizing drive fan 3.Sample table 6 is formed by sample tray 10 with by sealing-ring 7 and weight meter 8 that rising screw rod 9 supports.Feeding warehouse 2 is provided with feeding warehouse top cover 1.Cabinet 14 is provided with switch 12, panel board 13 and supporting-point roller 11.Deposition window 16 is tetragon or Polygons or circle.
Compared with the prior art the present invention has following positively effect: accurate spray deposition plated film instrument, and a kind of small-sized, quick, economy, accurate material surface coating instrument.This instrument has been realized the close plating to the coating of material surface, weight, the precision control of conditions such as homogeneity and scope.The waste of the disadvantage of the more existing manual coatings of avoiding or main equipment coating.Technology adopts the sedimentary principle in coated material atomizing back that will apply, to reach desired purpose.Since adopt the difference weighting method to determine the close plating of coating, smart plating, and performances such as inspiration homogeneity are higher than common manual operations far away.This equipment is the key equipment that catalyzer applies in the present fuel cell Development and Production.The top coat that also is applicable to simultaneously other field is used.Accurate spray deposition plated film instrument designs cleverly by it, and the complex large-sized or simple and crude manual work of slightly making is saved.Become single complete system.The essence plating and the efficient of technology have been increased greatly.Reduced cost simultaneously, the pollution that the manual operations of reduction brings and to the harm of human body.
(4) description of drawings: Fig. 1 is accurate spray deposition plated film instrument result schematic diagram
Fig. 2 is Polygons deposition window 16
Fig. 3 is circular deposition window 16
(5) embodiment: describe the present invention in detail and provide an embodiment below in conjunction with accompanying drawing: the principle of work of accurate spray deposition plated film instrument is to utilize pneumatic system that be coated with/plate material is atomized to reach the equally distributed state in space in the atomizing storehouse, utilize the nature deposition method to make the material surface uniform coating again, at first sample is positioned on the sample tray 10 of sample table 6, then sample table is pushed the bottom of deposition window 16, and regulate rising screw rod 9 and make sealing-ring 7 touch mutually and seal fully with deposition window 16, sealing-ring 7 is adjustable movable sealing circles.Can shape per sample change, its effect is that atomizing storehouse 4 is isolated from the outside, automatic weight meter 8 on the sample table 6 is started working, computer recording sample initial weight, deposition window 16 is open, total system all is computer automation control, can equate with the areal extent of the required coating of sample by the size of 12 windows 16 of control deposition automatically of the switch on the cabinet 14, deposition beginning, computer tracking deposition weight are till require weight, and the deposition window 16 of atomizing 4 bottoms, storehouse is closed, removable sample table 6 moves down sample sample atomizing storehouse 4 is separated, the sample peace is shifted out, and whole process can be by computer controlled automatic, manually Artificial Control.
Claims (6)
1, accurate spray deposition plated film instrument, blind controller system by the connection computer in the cabinet (14) is formed, it is characterized in that going up by carriage (5) support atomizing storehouse (4) at cabinet (14), top in atomizing storehouse (4) is provided with feeding warehouse (2), be provided with deposition window (16) in the bottom in atomizing storehouse (4), on cabinet (14), be provided with union lever (15), connect the sample table that to slide (6) by union lever (15).
2, according to the described accurate spray deposition plated film instrument of claim 1, each angle in the storehouse (4) that it is characterized in that atomizing is equipped with miniature atomizing drive fan (3).
3,, it is characterized in that sample table (6) forms by sample tray (10) with by sealing-ring (7) and weight meter (8) that rising screw rod (9) supports according to claim 1 or 2 described accurate spray deposition plated film instrument.
4, according to the described accurate spray deposition plated film instrument of claim 3, it is characterized in that on feeding warehouse (2), being provided with feeding warehouse top cover (1).
5,, it is characterized in that depositing window (16) and be tetragon or Polygons or circle according to the described accurate spray deposition plated film instrument of claim 4.
6,, it is characterized in that cabinet (14) is provided with switch (12), panel board (13) and supporting-point roller (11) according to the described accurate spray deposition plated film instrument of claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2004100236398A CN1560321A (en) | 2004-02-25 | 2004-02-25 | Precision atomizing depositing coating film apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2004100236398A CN1560321A (en) | 2004-02-25 | 2004-02-25 | Precision atomizing depositing coating film apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1560321A true CN1560321A (en) | 2005-01-05 |
Family
ID=34441094
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2004100236398A Pending CN1560321A (en) | 2004-02-25 | 2004-02-25 | Precision atomizing depositing coating film apparatus |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1560321A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106345649A (en) * | 2016-11-22 | 2017-01-25 | 中国科学技术大学 | Method and device for applying micro-nano particles |
-
2004
- 2004-02-25 CN CNA2004100236398A patent/CN1560321A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106345649A (en) * | 2016-11-22 | 2017-01-25 | 中国科学技术大学 | Method and device for applying micro-nano particles |
| CN106345649B (en) * | 2016-11-22 | 2020-01-03 | 中国科学技术大学 | Method and equipment for coating micro-nano particles |
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| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
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Addressee: Zhao Zhigang Document name: Notice of first review |
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| C57 | Notification of unclear or unknown address | ||
| DD01 | Delivery of document by public notice |
Addressee: Zhao Zhigang Document name: Deemed as a notice of withdrawal (Trial) |
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| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |