CN1418812A - Process for prepn. of nano silicon dioxide powder - Google Patents

Process for prepn. of nano silicon dioxide powder Download PDF

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Publication number
CN1418812A
CN1418812A CN 02157961 CN02157961A CN1418812A CN 1418812 A CN1418812 A CN 1418812A CN 02157961 CN02157961 CN 02157961 CN 02157961 A CN02157961 A CN 02157961A CN 1418812 A CN1418812 A CN 1418812A
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China
Prior art keywords
nano sio2
temp
good
microwave drying
prepn
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Pending
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CN 02157961
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Chinese (zh)
Inventor
崔春芳
童忠良
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Individual
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Individual
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Priority to CN 02157961 priority Critical patent/CN1418812A/en
Publication of CN1418812A publication Critical patent/CN1418812A/en
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Abstract

The process for preparing nano SiO2 powder is characterized by that it adopts chemical precipitation microwave drying process, uses sodium silicate and hydrochlroic acid as raw material, adds proper quantity of stabilizing agent (non-ionic surfactant) and dispersing agent to obtain the nano SiO2 powder body with excellent property under the condition of proper pH value and temp. Its optimum technological condidition is: temp. is 20-40 deg.C, pH is 6, reaction liquor mass concentration is P1 20/L, P2 1.20 g/L and reaction time is 15 min. The result shows that the grain size of the prepared nano SiO2 is 30-50 mn, its specific area is large, dispersion preparty is good and quality is good,

Description

Nano SiO2Novel process for preparing powder
The invention relates to nano SiO2A powder preparation technology specifically relates to a chemical precipitation method, in the presence of additives (non-surfactant, dispersant) and the like, properly controlling precipitation conditions, reducing agglomeration and using microwave drying to prepare 30-50 nm high specific area precipitated SiO2The preparation technology, preparation process and method of the particles are characterized by comprising a new process of adopting a chemical precipitation microwave drying method.
Nano SiO2The powder is a novel light nano-pore material, has the characteristics of low density, high specific surface area, high porosity and the like, and has wide application prospect in the industries of rubber, pesticide, papermaking, printing ink, plastic processing and the like. Therefore, the method has attracted the attention of a great number of technologists in recent years. Currently, the method for preparing nano silica particles is Sicl4Gas phase hydrolysis (gas phase white carbon black), a reaction of a polar organic solvent with an alkali metal silicate reverse micelle solution, a silicon alkoxide sol-gel reaction, and the like. The raw material cost of the methods is higher than that of the methodsLow surface area (550 m)2/g)。
The invention aims to provide a method for producing nano SiO with simple equipment, short process flow, less investment and low cost2A new process for preparing powder.
The chemical precipitation method takes sodium silicate and hydrochloric acid as raw materials, and the sodium silicate and the hydrochloric acid are heated at low temperature to react to generate H4SiO4White precipitate, adding dispersant and non-surfactant, dewatering ortho-silicic acid to obtain hydrogen peroxide2SiO2Calcining at high temperature to produce SiO2The reaction formula is as follows:
SiO obtained by this method2The powder is uniformly distributed, the dispersibility is good, the purity is high, the specific surface machine is greatly higher than other process methods, the calcination temperature is low, the reaction is easy to control, the side reaction is less, and the industrial production can be achieved.
The optimal technical process conditions of the invention are as follows: synthesized by a chemical precipitation method. To obtain SiO with excellent performance2The powder has the following optimal process conditions: the temperature is 20-40 ℃, the pH is 6, and the mass concentration P of the reaction liquid120g/L,P21.20g/L, reaction time 15 min.
The invention will be further illustrated by the following novel preparation process: putting a sodium silicate solution with a modulus of 3.3-3.5 in prepared super bath water, slowly heating to a temperature of no more than 30 ℃, uniformly stirring, and dropwise adding an HCl solution for reaction to generate H4SiO4White precipitate, adding small amount of dispersant and non-surfactant while stirring, and centrifuging to remove cl-Ion drying in a microwave oven for 30 minAnd (4) performing heat treatment for 1 hour in a muffle furnace at a proper temperature (430-480 ℃) to obtain a final product.

Claims (2)

1. Nano SiO2The new process for preparing powder is characterized by adopting a chemical precipitation microwave drying method.
2. The chemical precipitation microwave drying method of claim 1, which comprises mixing raw materials, heating at low temperature for precipitation, dehydrating, microwave drying, and calcining at high temperature to obtain powder.
CN 02157961 2002-12-23 2002-12-23 Process for prepn. of nano silicon dioxide powder Pending CN1418812A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 02157961 CN1418812A (en) 2002-12-23 2002-12-23 Process for prepn. of nano silicon dioxide powder

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 02157961 CN1418812A (en) 2002-12-23 2002-12-23 Process for prepn. of nano silicon dioxide powder

Publications (1)

Publication Number Publication Date
CN1418812A true CN1418812A (en) 2003-05-21

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Family Applications (1)

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CN 02157961 Pending CN1418812A (en) 2002-12-23 2002-12-23 Process for prepn. of nano silicon dioxide powder

Country Status (1)

Country Link
CN (1) CN1418812A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102765727A (en) * 2012-07-09 2012-11-07 陕西科技大学 Method for preparing SiO2 microsphere
CN103265036A (en) * 2013-05-30 2013-08-28 东华大学 Method for preparing nanometer silicon dioxide material at normal temperature
CN106317965A (en) * 2016-07-26 2017-01-11 安徽敬业纳米科技有限公司 Preparation method of hydrophobic nano-silica for transparent plastic
CN106317966A (en) * 2016-07-26 2017-01-11 安徽敬业纳米科技有限公司 Preparation method of hydrophilic nano-silica for waterborne ink

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102765727A (en) * 2012-07-09 2012-11-07 陕西科技大学 Method for preparing SiO2 microsphere
CN103265036A (en) * 2013-05-30 2013-08-28 东华大学 Method for preparing nanometer silicon dioxide material at normal temperature
CN106317965A (en) * 2016-07-26 2017-01-11 安徽敬业纳米科技有限公司 Preparation method of hydrophobic nano-silica for transparent plastic
CN106317966A (en) * 2016-07-26 2017-01-11 安徽敬业纳米科技有限公司 Preparation method of hydrophilic nano-silica for waterborne ink

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