CN1412542A - Cleaning device for contact concentration meter - Google Patents
Cleaning device for contact concentration meter Download PDFInfo
- Publication number
- CN1412542A CN1412542A CN 02143972 CN02143972A CN1412542A CN 1412542 A CN1412542 A CN 1412542A CN 02143972 CN02143972 CN 02143972 CN 02143972 A CN02143972 A CN 02143972A CN 1412542 A CN1412542 A CN 1412542A
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- China
- Prior art keywords
- slurries
- cleaning
- concentration
- surface measurements
- concentration meter
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06B—TREATING TEXTILE MATERIALS USING LIQUIDS, GASES OR VAPOURS
- D06B23/00—Component parts, details, or accessories of apparatus or machines, specially adapted for the treating of textile materials, not restricted to a particular kind of apparatus, provided for in groups D06B1/00 - D06B21/00
- D06B23/30—Means for cleaning apparatus or machines, or parts thereof
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- Engineering & Computer Science (AREA)
- Textile Engineering (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Treatment Of Fiber Materials (AREA)
Abstract
A cleaning device (1) cleans the measuring surface (29) of a contact concentration meter (30) for measuring the concentration of a size (4) on a slasher (2). The cleaning device (1) jets a cleaning fluid (34) through a cleaning nozzle (32) disposed opposite to the measuring surface (29) to remove a high-concentration size layer deposited on the measuring surface (29) or wipes the measuring surface (29) with a cleaning member (52) by linearly moving the cleaning member (52) along the measuring surface (29).
Description
Technical field
The present invention relates to a kind of cleaning device that is used to clean the surface measurements of the concentration meter that is used for warp sizing machine.
Background technology
The concentration meter that is used for measuring concentration of slurry has the surface measurements that is immersed in slurries.The prism of dress in contact optical concentration meter has, it has the measuring prism surface that contacts with slurries.
When measuring concentration of slurry, the measuring prism surface is contacted with slurries, and light beam is incident upon on the measuring prism surface with the optics densimeter.Optical concentration meter basis is measured the refractive index of slurries in the reflection characteristic at the prism surface place relative with the slurries side, and detects the density of slurries according to refractive index.Because the concentration of slurries is directly proportional with the density of slurries, so the former can be decided by the latter.
Near the component of the slurries that flow the surface measurements of optical concentration meter can be attached on the surface measurements, and forms the higher slurry layer of actual concentrations of the mobile slurries of concentration ratio.The concentration that is formed on the slurry layer on the surface measurements increases along with the increase gradually of slurry layer thickness.Therefore, attached to the high concentration slurry layer on the surface measurements of densimeter in the negative effect of the measurement performance of this densimeter along with the time increases, and densimeter becomes and can not accurately measure the concentration of slurries.Because the high concentration slurry layer can break away from surface measurements when its thickness surpasses a threshold value,, therefore be difficult to correctly control the concentration of slurries so that the measurement performance of densimeter becomes is very unstable.
Summary of the invention
Therefore, one object of the present invention is to prevent to be used for causing hindering on the surface measurements of the concentration meter of sizing airborne measurements concentration of slurry concentration of slurry is accurately measured owing to slurry constituents is attached to.
The cleaning nozzle that the present invention is oppositely arranged by the surface measurements with the concentration meter that is used for measuring concentration of slurry is injected on the surface measurements cleaning fluid so that remove attached to the slurries on this surface measurements from surface measurements, and cleaning member is moved so that wipe from surface measurements attached to the slurries on this surface measurements along surface measurements.
According to a first aspect of the invention, the cleaning device that is used to clean the surface measurements of the concentration meter that maintenance contacts with slurries on warp sizing machine comprises with respect to the opposed cleaning nozzle of the surface measurements of concentration meter, wherein cleaning fluid is injected on the surface measurements of this concentration meter to clean this surface measurements by this cleaning nozzle.
Therefore, can come from surface measurements, to remove deposition by slurry constituents by the jet of cleaning fluid and be formed on high concentration slurry layer on the surface measurements.Because surface measurements keeps directly contacting with slurries, so this densimeter can accurately be measured concentration of slurry.
According to a second aspect of the invention, the cleaning device that is used to tilt the surface measurements of concentration meter comprises a kind of cleaning member that can move along the surface measurements of this concentration meter be arranged to, and the surface measurements of wherein said this concentration meter of cleaning member wiping is to clean this surface measurements.
Therefore, can come from surface measurements, to wipe the high concentration slurry layer that is deposited on this surface measurements with this cleaning member, and this densimeter can accurately be measured concentration of slurry.
This concentration meter is a kind of optical concentration meter, and cleaning fluid can be water, slurries or steam.Only could be used as effective concentration at the concentration of slurry that this cleaning device does not have duration of work to measure by this concentration meter.
If the sedimental component of slurries is deposited on the surface measurements that the optical concentration meter is a concentration meter and form the high concentration slurry layer on surface measurements, then this optical concentration instrumentation measures the concentration of the high concentration slurry layer different with the slurries actual concentration.Owing to the high concentration slurry layer of having removed by this cleaning device on the surface measurements that is formed on the optical concentration meter, so can accurately measure the actual concentrations of slurries.
Because cleaning fluid is the component of slurries, thus by cleaning fluid being ejected into the quality that can significantly not change slurries in these slurries, foreign matter can not introduced in these slurries, and the possibility that does not exist warp thread to be made dirty by foreign matter.
Cleaning fluid can be any one in water, slurries and the steam, and they are components of slurries, or the combination of some of them.Preferably, the temperature of cleaning fluid is higher.
Owing to have less proportion, so the concentration change of slurries can be limited on the inevitable degree of minimum in steam being sprayed into slurries the time as the steam of cleaning fluid.Because steam is dissolved in the slurries, thus on the surface of slurries, can not form bubble, and warp thread can be not attached thereto and by irregular starching owing to bubble.Because steam produces heat of condensation when dissolving in slurries, so these slurries are heated and the impregnability of slurries is improved.
Because only the measurement result that is provided by this concentration meter during clean operation is ended just is considered to effectively, thus the measurement result of not wishing to be used for to represent the actual concentrations of slurries eliminated, and can accurately measure the concentration of slurries.In general, because the high concentration slurry layer of removing from surface measurements is dispersed near the surface measurements, so the slurries around surface measurements become inhomogeneous during clean operation, and the concentration of slurry around the surface measurements can not be represented the concentration of whole slurries.Owing to only just be considered to effectively, therefore can avoid occurring the erroneous measurements of concentration of slurry by the measurement result that this concentration meter provided.
Description of drawings
From following instructions and in conjunction with the accompanying drawings, can understand above and other objects of the present invention, feature and advantage more, wherein:
Fig. 1 is the schematic side elevation of warp sizing machine;
Fig. 2 provides system for the slurries that comprised and is used to clean the cleaning device of the densimeter that is used for measuring concentration of slurry in described warp sizing machine sketch;
Fig. 3 is the schematic amplification sectional view of the cleaning device that is used to clean concentration meter in first embodiment according to the present invention;
Fig. 4 provides the block scheme of system and control system for slurries;
Fig. 5 is the schematic side elevation when the concentration meter shown in Fig. 3 is being placed in the starching container;
Fig. 6 is the schematic side elevation of the cleaning device that is used to clean concentration meter in second embodiment according to the present invention.
Preferred embodiment
With reference to Fig. 1, this figure demonstrates the warp sizing machine 2 of having used cleaning device 1 of the present invention, and this warp sizing machine 2 is provided with slurry container 5, slurries circulation vessel 6, a pair of sizing roller 7 and a pair of pressure roller 8 that slurries 4 are housed.Warp 3 is advanced to sizing roller 7 to that by deflector roll 9.Sizing roller 7 is immersed in warp 3 in the slurries 4 that are contained in the slurry container 5.Be subjected to that extruding by the warp 3 of starching like this to pressure roller 8.Therefore the warp thread that forms warp 3 has soaked into slurries 4.
Then, advanced by the warp 3 of starching and enter drying unit 10.This warp 3 is divided into two groups of warp thread.These two groups of warp thread carry out drying by two preparation drying units, each drying unit comprises two drying drums 11 and deflector roll 12, these two groups of warp thread link together in warp 3 once more, make this warp 3 dryings by the final drying unit that comprises two drying drums 11 and deflector roll 13 then.The warp 3 that will be dried like this by lease rod 16 is divided into warp and following warp, and warp 3 is directed on the winding off spindle 15 by deflector roll 14, and is wrapped on this winding off spindle 15.
Fig. 2 demonstrates the cleaning device of the present invention 1 that combines with the slurries supply system that is used to supply with loop slurry 4.Slurries 4 are contained in supply pipe 18 and the slurries supply container 17 that slurries circulation vessel 6 links to each other by being provided with solenoid valve 19.Solenoid valve 19 is opened from slurries supply container 17 slurries 19 are offered slurries circulation vessel 6.Solenoid valve 19 is controlled with a kind of mode switching control by slurries controller 20.Slurries controller 20 is according to coming control electromagnetic valve 19 by the floatation type liquid level meter 21 measured liquid levels of slurries 4 in slurries circulation vessel 6.Slurries controller 20 drops to the lower limit liquid level at the liquid level of slurries 4 in slurries circulation vessel 6 and opens solenoid valve 19 when following so that slurries circulation vessel 6 is advanced in slurries 4 supplies, and rises at the liquid level of slurries 4 in slurries circulation vessel 6 and to close solenoid valve 19 to stop slurries 4 supplies are advanced in the slurries circulation vessel 6 when surpassing upper limit liquid level.Can use and be used for sending ultrasound wave and measuring the ultrasonic level meter that this ultrasound wave returns institute's time spent therefrom replacing floatation type liquid level meter 21 to the surface of slurries 4.
To be contained in slurries 4 in the slurries circulation vessel 6 by the circulating line 22 that one end thereof is connected with the diapire of starching container 5 and another end is connected with the diapire of slurries circulation vessel 6 supplies continuously and advances starching container 5.Circulating line 22 is provided with and is used for slurries 4 pumpings are advanced the ebullator 23 and the concentration meter 30 of starching container 5.The slurries 4 that are contained in the starching container 5 overflow overflow weir 24 and return into slurries circulation vessel 6.During starching container 5 and slurries circulation vessel 6 are passed in slurries 4 circulations, the concentration of suitably regulating slurries 4.
The cleaning device 1 that the present invention is used to clean concentration meter 30 is provided with the cleaning nozzle 32 that the surface measurements 29 with this concentration meter 30 relatively is provided with.This concentration meter 30 remains on the densimeter anchor clamps 33 regularly, and its measuring head 31 is placed in densimeter anchor clamps 33 inside, thereby surface measurements 29 contacts with slurries 4.Cleaning nozzle 32 is arranged in the densimeter anchor clamps 33 relative with surface measurements 29 and keeps being injected on the surface measurements 29 with the cleaning fluid that will run through slurry stream 4 in densimeter anchor clamps 33 in the above.The top of nozzle 32 and surface measurements 29 are spaced a distance so that slurries 4 can flow through densimeter anchor clamps 33.Densimeter anchor clamps 33 are arranged in the circulating line 22 on the upstream side of ebullator 23.
Is that cleaning fluid 34 offer cleaning nozzle 32 by the steam supply pipe road 36 that is provided with solenoid valve 25 and flow controller 27 with high temperature and high pressure steam 34a from vapour source 35.By cleaning nozzle 32 steam 34a is injected on the surface measurements 29 to clean this surface measurements 29.Vapour source 35, steam supply pipe road 36, solenoid valve 25 and flow controller 27 constitute a cleaning steam supply system 49.Cleaning fluid 34 is components of slurries 4.This cleaning fluid 34 can be high-temperature steam, high-temperature water, high temperature slurries 4 or their combination.Owing to be the component of slurries 4, so these cleaning fluids can significantly not change the quality of slurries 4 in being blended in slurries 4 time.The arm that is provided with flow controller 26 was gone out in 36 minutes from the steam supply pipe road, and was respectively equipped with flow controller 28 and 38 arms 37 divide away from the arm that is provided with flow controller 26.Be provided with the arm 37 of flow controller 28 and be connected, and be provided with the arm 37 of flow controller 38 and be connected with heated nozzle 40 in being located at slurries circulation vessel 6 with heated nozzle 39 in being located at starching container 5.Vapour source 35, steam supply pipe road 36, arm 37, flow controller 28 and 38 and steam jet 39 and 40 constitute a slurries heating system 41.Vapour source 35 offers slurries heating system 41 and cleaning steam supply system 49 with high temperature and high pressure steam.
Fig. 3 demonstrates the major part of the cleaning device 1 that is used to clean concentration meter 30.This concentration meter 30 is a kind of optical concentration meters.This concentration meter 30 is clamped on the densimeter anchor clamps 33, and its axis vertically extends with the flow direction of slurries 4 in densimeter anchor clamps 33.Surface measurements 29 contacts with the slurries 4 that flow.The surface measurements 29 of this concentration meter 30 is the end faces that are shaped as the prism 42 of rectangle frustum.The light beam 44 that is sent by the light source 43 that is included in the concentration meter 30 is advanced and is passed its refractive index and enter prism 42 greater than the bottom surface of the prism 42 of slurries 4, by side and end face be the surface measurements 29 of prism 42 with the total reflection mode reflection, and drop on the optical sensor 45.In some cases, light beam 44 is advanced and is passed prism 42 and enter slurries 4.
When measuring the concentration of slurries 4, concentration meter (optical concentration meter) 30 is incident upon light beam 44 on the surface measurements 29, and make light beam pass this slurries 4, thereby concentration meter 30 is measured the critical angle of incidence of light beam 44 and is measured the refractive index of slurries 4 according to critical angle of incidence and known prismatic refraction rate, and the refractive index of the slurries 4 that will measure is so then exported to concentration and determined device 46.As mentioned above, the concentration of slurries 4 and its density are proportional.Concentration determines that device 46 determines density according to given refractive index, and calculates concentration by the density of using slurries 4.
Fig. 4 is slurries supply system and the block scheme that is used for the slurries controller 20 of control electromagnetic valve 19,25 and 26.In 2 operating periods of warp sizing machine, liquid level meter 21 is measured the liquid level of slurries 4 in slurries circulation vessel 6.In case the liquid level that detects slurries 4 by this liquid level meter 21 drops under the lower limit liquid level, then slurries controller 20 is opened slurries 4 supply that solenoid valve 19 will be contained in the slurries supply container 17 and is advanced slurries circulation vessel 6.Rise above upper limit liquid level in case detect the liquid level of slurries 4 in slurries circulation vessel 6 by this liquid level meter 21, then this liquid level meter 21 will send to slurries controller 20 at the signal of that effect.Then, slurries controller 20 cuts out solenoid valve 19 to stop that slurries circulation vessel 6 is advanced in slurries 4 supplies.
In case receive the cleaning command signal, then slurries controller 20 is opened solenoid valve 25 and is kept this solenoid valve 25 to open cleaning time so long.Then, the steam 34a that is provided by vapour source 35 flows through steam supply pipe 36, solenoid valve 25 and flow controller 27 arrival cleaning nozzles 32.In cleaning time, steam is injected in the surface measurements 29 of measuring head 31 with cleaning surface measurements 29 by cleaning nozzle 32.Carry out clean operation to be attached to the gap periods ground that the speed on the surface measurements 29 determines by the component of considering slurries 4.
As mentioned above, because surface measurements 29 is wetting by slurries 4,, and on this surface measurements 29, form the high concentration slurry layer attached to the component on the surface measurements 29 so the component of slurries 4 is attached on the surface measurements 29.The high pressure steam that the nozzle 32 of utilization by cleaning device 1 is injected on the surface measurements 29 blows described high concentration slurry layer off from surface measurements 29.Because the pressure of steam 34a is higher, thus steam 34 by cleaning nozzle 32 with high velocity jet and therefore can just can remove described high concentration slurry layer by just spraying a spot of steam 34a.
Owing to from the surface measurements 29 of concentration meter 30, remove the high concentration slurry layer and surface measurements 29 directly contacts with slurries 4 by clean operation, so this concentration meter 30 can accurately be measured the concentration of slurries 4.The measurement abort signal that slurries controller 20 is ended the indicated concentration measurement is issued concentration and is determined device 46, and concentration is determined the data that device 46 deletions are obtained at cleaning device 1 duration of work.Slurries controller 20 is used for controlling the temperature controlling operation that is contained in the slurries in the starching container 5 and is used for controlling the supply of slurries 4 and the control operation of the cleaning of surface measurements 29.Be arranged on the temperature of the temperature sensor 48 measurement slurries 4 in the starching container 5.Temperature sensor 48 sends limited signal to slurries controller 20 when measuring temperature and equal ceiling temperature, and sends limited signal down to slurries controller 20 when measuring temperature and equal lower limit temperature.
When the temperature of the slurries of being measured by temperature sensor 48 4 is not more than lower limit temperature, slurries controller opens solenoid valve 26 will be will be supplied to steam jet 39 and 40 by the steam 34a that vapour source 35 provides by supply line 37, flow controller 28 and 38.By steam jet 39 and 40 steam 34a is sprayed in the starching container 5 and slurries circulation vessel 6 so that the slurries 4 that are contained in starching container 5 and the slurries circulation vessel 6 are heated.When the temperature by the measured slurries 4 of temperature sensor 48 was not less than ceiling temperature, slurries controller 20 cut out solenoid valve 26 to stop by steam jet 39 and 40 uperize 34a.
The temperature control operation remains on the temperature that is suitable for starching slurries 4.Because steam 34a is a cleaning fluid 34 is that the temperature of the component of slurries 4 and steam 34a is higher, so steam 34a has heated slurries 4 and improved the permeability that slurries 4 enter the warp thread of warp 3.Because cleaning fluid 34 is components of slurries 4, can not change the quality of slurries 4 and can not introduce in the slurries 4 attached to the foreign matter on the warp thread so spray cleaning fluid 34 in the slurries 4.Possible cleaning fluid except steam 34a comprises water and described slurries.Preferably, those cleaning fluids are at high temperature heated and are used separately, perhaps are used in combination some in those cleaning fluids.
Fig. 5 demonstrates and is located at the cleaning nozzle 32 that is used for cleaning the concentration meter (optical concentration meter) 30 that is located in the starching container 5 in the starching container 5.This concentration meter 30 is clipped on the wall of starching container 5, and its measuring head 31 is inclined upwardly towards the inside of starching container 5.The surface measurements 29 of measuring head 31 contacts with slurries 4 in being contained in starching container 5.Cleaning device has the cleaning nozzle 32 on the diapire that is clipped in starching container 5.The free end portion of this cleaning nozzle 32 is so crooked, thereby surface measurements 29 is pointed on the top of this cleaning nozzle 32.This concentration meter (optical concentration meter) 30 and cleaning nozzle 32 can be arranged in the slurries circulation vessel 6.
Can carry out with being used for the operation of slurries heating system 41 of uperize 34a at the clean operation of the cleaning device shown in Fig. 2 and 5.Slurries controller 20 sprays high temperature and high pressure steam 34a when the temperature that the temperature sensor 48 by slurries heating system 41 detects slurries 4 drops to lower limit temperature in the slurries 4 with heating slurries 4.Simultaneously, spray high-temperature steam 34a by cleaning nozzle 32.When this clean operation carries out with the slurries heating operation like this, can control clean operation by slurries heating system 41, and owing to can control to cleaning nozzle 32 and heated nozzle 39 and 40 supply steam 34, so can reduce the cost of this cleaning device by single solenoid valve.
Clean operation can carry out with the slurries supply operation that is used for slurries 4 supply is advanced slurries circulation vessel 6.Slurries controller 20 starts when detecting the liquid level of slurries 4 in slurries circulation vessel 6 by liquid level meter 21 and drop to the lower limit liquid level and is used for slurries 4 supplies are advanced the slurries supply operation of slurries circulation vessel 6.When supplying operation start, each slurries begin to carry out spraying the clean operation of high temperature and high pressure steam 34a by cleaning nozzle 32.Can suitably regulate the cycle (time interval between the continuous clean operation) of clean operation by the distance between the liquid level up and down of suitably regulating slurries 4 surfaces.Clean operation is that the consumption according to slurries carries out, thereby clean operation can carry out to remove attached to the high concentration slurry layer on the surface measurements 29 before the measurement of concetration result who influences slurries 4 in the high concentration slurry layer with predetermined basically interval.
Fig. 6 demonstrates the cleaning device 1 that is used for cleaning the concentration meter (optical concentration meter) 30 that is located in the slurries circulation vessel 6 in second embodiment according to the present invention.This cleaning device 1 comprises the hydraulic cylinder actuator 50 on the side wall inner surfaces that is provided with actuator rod 51 and is installed in slurries circulation vessel 6 and is installed in cleaning member 52 sponge block for example on the free end portion of actuator rod 51.Cleaning member 52 under the effect of the actuator rod 51 of hydraulic cylinder actuator 50 vertical movement with the surface measurements 29 of wiping measuring head 31.
Do not have operating period at cleaning device 1, cleaning member 52 is clamped in the holding fix place that is positioned at surface measurements 29 tops and separates with surface measurements 29.Therefore therefore, cleaning member 52 can not hinder the contact between slurries 4 and the surface measurements 29 and can accurately measure the concentration of slurries 4.Hydraulic cylinder actuator 50 makes cleaning member 52 vertically move back and forth several times to remove attached to the high concentration slurry layer on the surface measurements 29 along surface measurements 29.After finishing clean operation, cleaning member 52 turns back to holding fix.
Therefore the surface measurements 29 that is cleaned like this can directly contact with slurries 4, and this concentration meter (optical concentration meter) 30 can accurately be measured the concentration of slurries.Can use rubber wiper, thin spring steel plate, fabric or brush to replace sponge block as cleaning member 52.
This concentration meter 30 needn't be measured the concentration of slurries continuously; This concentration meter 30 can be measured the concentration of slurries with preset time gap periods ground, and can determine that to concentration device sends the signal of the measurement concentration of expression slurries when measuring concentration at every turn.Replacement can be carried out clean operation immediately with the predetermined cycle (time interval) before concentration of slurry is measured.
Though the present invention has been carried out specifying to a certain degree in preferred embodiments, obviously can make many changes and variation therein.Therefore it being understood that under the situation that does not break away from the spirit and scope of the present invention that the present invention can implement in the mode outside the specifically described mode here.
Claims (6)
1. a cleaning device (1), be used for going up at warp sizing machine (20) surface measurements (29) of the concentration meter (30) that cleaning and slurries (4) keep in touch, described cleaning device (1) comprises the cleaning nozzle (32) that the surface measurements (29) with concentration meter (30) relatively is provided with;
Wherein the surface measurements (29) that cleaning fluid (34) is injected in this concentration meter (30) is gone up with cleaning surface measurements (29) by cleaning nozzle (32).
2. a cleaning device (1), be used for going up at warp sizing machine (20) surface measurements (29) of the concentration meter (30) that cleaning and slurries (4) keep in touch, described cleaning device (1) comprises that a kind of be held can be along the cleaning member (52) of surface measurements (29) motion of concentration meter (30);
The surface measurements (29) of wherein said cleaning member (52) wiping concentration meter (30) is to clean this surface measurements (29).
3. cleaning device as claimed in claim 1 or 2 (1), wherein said concentration meter (30) are a kind of optical concentration meters.
4. cleaning device as claimed in claim 1 (1), wherein said cleaning fluid (34) is the component flow of slurries (4).
5. cleaning device as claimed in claim 4 (1), wherein said cleaning fluid (34) are steam (34a), and steam (34a) is injected on the surface measurements (29).
6. cleaning device as claimed in claim 1 or 2 (1), wherein only cleaning device (1) not duration of work could be used as effective concentration by the concentration of the measured slurries of concentration meter (30).
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP309545/2001 | 2001-10-05 | ||
| JP2001309545A JP4338008B2 (en) | 2001-10-05 | 2001-10-05 | Glue densitometer cleaning device |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200410078481 Division CN1632529A (en) | 2001-10-05 | 2002-09-29 | Device for cleaning concentration meter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1412542A true CN1412542A (en) | 2003-04-23 |
| CN1188689C CN1188689C (en) | 2005-02-09 |
Family
ID=19128672
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB021439729A Expired - Fee Related CN1188689C (en) | 2001-10-05 | 2002-09-29 | Cleaning device for contact concentration meter |
| CN 200410078481 Pending CN1632529A (en) | 2001-10-05 | 2002-09-29 | Device for cleaning concentration meter |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200410078481 Pending CN1632529A (en) | 2001-10-05 | 2002-09-29 | Device for cleaning concentration meter |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP1302584B1 (en) |
| JP (1) | JP4338008B2 (en) |
| CN (2) | CN1188689C (en) |
| DE (1) | DE60225646T2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105068012A (en) * | 2015-08-16 | 2015-11-18 | 昆山泰莱宏成传感技术有限公司 | Lead acid battery residual electric quantity sensor |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20210131949A1 (en) * | 2019-11-06 | 2021-05-06 | Entegris, Inc. | Optical sensor window cleaner |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH509835A (en) * | 1967-09-08 | 1971-07-15 | Sucker Geb | Loading or sizing fibre material such as warp sheets |
| CH670513A5 (en) * | 1986-09-01 | 1989-06-15 | Benno Perren | |
| FI93582C (en) * | 1991-09-18 | 1995-04-25 | Janesko Oy | Device for cleaning an optical window in a process |
| US5185531A (en) * | 1991-09-26 | 1993-02-09 | Wedgewood Technology, Inc. | Window cleaner for inline optical sensors |
| JPH06160277A (en) * | 1992-09-16 | 1994-06-07 | Nippondenso Co Ltd | Liquidity detector |
| DE4233311A1 (en) * | 1992-10-03 | 1994-04-07 | Inst Textil & Faserforschung | Fabric desizing control - compares concentration of sizing in washing fluid with amount of sizing applied to control washing action |
-
2001
- 2001-10-05 JP JP2001309545A patent/JP4338008B2/en not_active Expired - Fee Related
-
2002
- 2002-09-29 CN CNB021439729A patent/CN1188689C/en not_active Expired - Fee Related
- 2002-09-29 CN CN 200410078481 patent/CN1632529A/en active Pending
- 2002-10-02 DE DE2002625646 patent/DE60225646T2/en not_active Expired - Lifetime
- 2002-10-02 EP EP20020022099 patent/EP1302584B1/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105068012A (en) * | 2015-08-16 | 2015-11-18 | 昆山泰莱宏成传感技术有限公司 | Lead acid battery residual electric quantity sensor |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1302584B1 (en) | 2008-03-19 |
| JP2003113575A (en) | 2003-04-18 |
| DE60225646D1 (en) | 2008-04-30 |
| JP4338008B2 (en) | 2009-09-30 |
| EP1302584A3 (en) | 2005-07-20 |
| DE60225646T2 (en) | 2008-07-17 |
| EP1302584A2 (en) | 2003-04-16 |
| CN1188689C (en) | 2005-02-09 |
| CN1632529A (en) | 2005-06-29 |
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