CN1381736A - Process for preparing planar light waveguide and ultra-short laser pulse - Google Patents
Process for preparing planar light waveguide and ultra-short laser pulse Download PDFInfo
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Abstract
A method for preparing planar light waveguide by using ultra-short laser pulses includes such steps as using low-aperture (N.A. is less than 0.3) microscope to focus the ultra-short laser pulses in a dielectric sample, generating non-linear optical effects by the mutual action between laser pulse and dielectric material to form filament-shaped transmission which can change the refractivity, and moving the sample for making the filament move transversely in the sample to form a refractivity change layer which is just the planar light waveguide. Its advantages are high speed and high accuracy.
Description
Technical field:
The invention belongs to the preparing technical field of photonic device, is a kind of ultrashort laser pulse accurate method for preparing planar optical waveguide and relevant waveguide photonic device thereof in the transparent dielectric substance body of optical maser wavelength of utilizing.
Background technology:
Current development in Hi-Tech needs the more and more higher technology of preparing of precision.In these technologies of preparing, the preparation of fine optoelectronic device has occupied important status.In recent years in optoelectronics industry, but information optics and optical communication industry etc. are used integrated device gradually, and slab guide is the basis of related devices such as coupling mechanism, is one of most important element.
Along with the development of ultra-short pulse laser, in the nineties, femtosecond pulse titanium sapphire laser device develop into most widely used so far LASER Light Source.Femtosecond laser has the ultrafast superpower characteristic different with common laser, can cause the variation of the various physicochemical property of material when interacting with material.For dielectric substance, ultrafast ultra-intense laser pulse such as femtosecond laser by nonlinear optical processs such as two-photon or multi-photon absorptions, can cause that photon-induced refractive index changes in material bodies.The present invention select for use the microcobjective of low numerical aperture focus on femto-second laser pulse in order to make planar optical waveguide and and the technology of related device such as coupling mechanism, belong to initiative, it has realized the quick preparation of planar optical waveguide and related device thereof for the first time.
Summary of the invention:
The purpose of this invention is to provide a kind of utilization and hang down the method that the microscope of numerical aperture (N.A.≤0.3) carries out planar optical waveguide and related device preparation thereof.
The present invention utilizes the method for preparing planar light waveguide and ultra-short laser pulse as follows:
According to the required width of preparation planar optical waveguide, the low numerical aperture microscope of selecting suitable N.A.≤0.3 for use focuses to ultrashort laser pulse in the transparent dielectric substance sample body of optical maser wavelength, laser pulse and dielectric substance interact and produce nonlinear optical effects such as self-trapping, form the transmission of long filament shape, the long filament light beam causes the transmission region refraction index changing, pass through mobile example, allow the variations in refractive index long filament in sample, laterally move, thereby form the refraction index changing of stratiform, realize the preparation of planar optical waveguide.
Described ultra-intense laser pulse can adopt titanium sapphire femto-second laser etc. and pulse amplification system to take place, the repetition frequency of its output laser pulse can for 1Hz to tens MHz variable adjustment, pulsewidth from tens femtoseconds to variable ranges such as tens psecs.
Described sample can be transparent dielectric materials such as inorganic optical glass, inorganic salts crystal, fused quartz and organic photopolymer.
Described sample can utilize the numerical control translation stage to control its moving direction and speed, allows samples vertical move in laser beam, laterally moves in sample thereby make laser beam propagate the variations in refractive index long filament that produces in the sample internal trap.
For when sample moves accurately with wave guide process on the relevant position, can adopt shutter control laser pulse in sample, write the beginning and stop, promptly when sample moves to the relevant position, shutter is opened and is emitted laser pulse and carry out processing and preparing, shutter close when preparation finishes.This shutter can be by computing machine control in real time synchronously.
Generally preferably under the situation, do not need spatial filtering at the femtosecond laser output mode.When output mode is relatively poor, for preparation high-quality light waveguide, can carry out spatial filtering with the aperture spatial filter, carry out the space with inverted microscope again and expand bundle, obtaining the better space basic mode, and inject focusing system.
For the optical waveguide of other special shapes, as arc, X type, Y type and T type etc., as long as the direction of travel of control laser in sample can obtain.The preparation of photo-coupler is also similar: designing between the coupling length of coupling regime and the waveguide coupling distance etc. earlier has related parameter, can obtain relative to moving of light beam by precision control sample.The preparation of the optical device relevant with waveguide as waveguide type Mach-Zehnder interferometer, array waveguide grating (AWG), photomodulator, photoswitch, optical filter and wavelength division multiplexer etc., in like manner only needs to revise sample mobile platform controlled variable and gets final product.
Realize that related device preparation methods' such as above-mentioned planar optical waveguide and coupling mechanism processing unit (plant) is made up of following components, procedure of processing is built by these ingredients:
(1) light source: adopt short pulse laser system such as titanium sapphire femtosecond laser, the repetition frequency of its output laser pulse can for 1Hz to tens MHz variable adjustment, output wavelength is variable, pulsewidth from tens femtoseconds to variable ranges such as tens psecs.
(2) light beam filtering system: generally speaking, the laser output mode is better, does not need spatial filtering.When output mode is relatively poor, the light beam of femtosecond laser light source output is carried out spatial filtering with aperture, carry out the space with inverted microscope again and expand bundle, obtaining the better space basic mode, and inject focusing system.
(3) focusing system: adopt the low NA objective of flat field apochromatism that laser beam is focused on.Focus must be in the sample body suitable distance, be beneficial to produce self-trapping laser beam.According to the required width of preparation slab guide, select the microscope of corresponding low numerical aperture for use.Generally speaking, can adopt common low numerical aperture lens focus.
(4) sample mobile platform: the workbench that is used for accurate preparation at present is varied, considers scope and modulation accuracy that sample need move, can adopt the three-dimensional mobile platform of respective model.Have at present spatially that the degree of accuracy of shift position can reach sub-micron to nanometer scale even littler model, can carry out minute adjustment the position of sample inner waveguide.When not high, can adopt numerical control translation stages such as common one dimension, two dimension, three-dimensional to the sample requirement on machining accuracy.
(5) process computer control system in real time: for when digital control platform moves accurately with wave guide process on the relevant position, can adopt computing machine synchronously in real time control shutter and digital control platform.Utilize shutter, when digital control platform moved to the relevant position, shutter was opened and is emitted laser pulse and carry out processing and preparing.Used shutter can be by computer control, synchronous working with three-dimension numerical controlled platform.This shutter can accurately be realized the short time exposure, as reaching the exposure below 1/8000 second.Low to repetition rate like this pulse laser, the optional individual pulse of getting.
(6) waveguide mode and index distribution modulator approach
Find that after deliberation the index distribution of waveguide region and relevant waveguide output intensity distribution pattern and laser pulse write relating to parameters.By parameters such as precision control write energy, writing speed and pulsewidths, can obtain satisfactory fiber waveguide device, can be by energy attenuator and energy meter control energy.
(7) simultaneous monitoring system
Can add ccd video camera in the back or the side of sample, the synchronous waveguide shaping picture that collects from CCD by computing machine, thereby synchronization monitoring preparation process.
(8) detection system
At first, can utilize the optical microscope of functions such as phase contrast is micro-, differential interference is micro-, and cooperate the high-resolution ccd video camera, observe the optical waveguide image of less variations in refractive index, judge the waveguide crudy roughly.
Secondly, waveguide index and the analysis of light intensity output mode there is several different methods, poor as the refractive index of estimating the core of planar optical waveguide and body medium on every side according to the numerical aperture of planar optical waveguide output.The refractive index distribution curve of planar optical waveguide and output intensity mode profile can obtain by the near field intensity distribution image analysis calculation, obtain the near field intensity distribution figure of laser beam from the optical waveguide output port, get the light distribution point on the pattern, can derive index distribution and output intensity distribution curve by following formula:
In addition, the coupling efficiency of related devices such as planar optical waveguide coupling mechanism, crosstalk and insert parameter measurements such as loss, can laser be imported, obtain light intensity, obtain with theoretical value and reckoning again at the waveguide output port from one of them waveguide input port.
In sum, utilize method of the present invention,, can realize that quick high accuracy prepares optical waveguide and related device thereof as long as regulate pulsed laser energy, pulsewidth and parameters such as sample translational speed, scope.Compare with existing other preparation methods, method of the present invention possesses following advantage:
(1) preparation method is simple, implements easily.Only need laser beam datum is input on the sample relevant position, accurately control sample and move and get final product.
(2) prepare the optical waveguide of different shape easily.Difform optical waveguide only need change the sample moving direction and get final product.
(3) applied widely.For the photonic device that constitutes by planar optical waveguide, as preparation of devices such as Mach-Zehnder interferometer, array waveguide grating (AWG), photomodulator, photoswitch, optical filter and wavelength division multiplexers, only need the processing of corresponding light waveguide in these devices of control to get final product.
(4) be convenient to the processing of integrated device.Laser is directly focused in the sample body, can multilayer prepare in the sample body, or various devices are directly linked into an integrated entity, structure is exquisite compact, reduces various losses.
(5) crudy is good, and is touchless.Utilize the effect of ultrashort laser pulse and sample utmost point short time, avoid the influence of undesirable elements such as heat accumulation effect.Non-contact type processing can be avoided the damage to sample, adapts to various transparent sample processing, and the waveguide of preparation is smooth, the transfer efficiency height.
(6) preparation speed is fast, and equipment price is not high yet.
Description of drawings:
Fig. 1 is a waveguide device preparation facilities synoptic diagram of the present invention;
Fig. 2 is waveguide of the present invention or coupling mechanism coupling output detection index path;
Fig. 3 is the outboard profile of the waveguide adopting the inventive method and make;
Fig. 4 is the corresponding vertically figure of waveguide shown in Figure 3;
Fig. 5 is waveguide region index distribution shown in Figure 3 and output mode distribution plan
Fig. 6 leads the direct coupling mechanism outboard profile of forming for what employing the inventive method made by double wave;
Fig. 7 is the corresponding vertically figure of coupling mechanism shown in Figure 6.
Among the figure, the 1-ultrashort pulse laser, 2-exports laser beam, 3-aperture spatial filter, the 4-energy attenuator, the 5-energy meter, the 6-shutter, 7-hangs down the numerical aperture focusing microscope, the 8-sample, the three-dimension numerical controlled translation stage of 9-, 10-CCD detector, the 11-electric wire, 12-computing machine, 13-testing laser device, 14-output testing laser light beam, the 15-polarizer, 16-lens, 17-waveguide device sample, 18-D translation platform, 19-analyzer.
Embodiment one: the preparation of planar optical waveguide
As shown in Figure 1, ultrashort pulse laser 1 adopts the titanium sapphire femto-second laser, its output laser beam 2 wavelength are about 800nm (nanometer), pulsewidth is about 120fs (femtosecond), output laser beam 2 obtains the space basic mode through 3 filtering of small holes spatial filter, through energy attenuator 4 and energy meter 5 regulate obtain suitable energy after, through shutter 6, focus on the sample 8 on the numerical control translation stage 9 with low numerical aperture focusing microscope 7 again.The about 1.56 μ J of used single pulse energy, it is many that the long filament that causes refraction index changing to produce in sample 8 bodies owing to laser beam is approximately 100 μ m.When with the vertical self-trapping laser beam mobile example of the speed of 8.6 μ m/s, xsect is the feasible one-tenth of Planar Optical Waveguide Structures of 2 μ m * 100 μ m, and planar optical waveguide length can be determined by the movement of sample distance.By side and ccd detector 10 longitudinally, can obtain respectively the outboard profile of the planar optical waveguide that makes as shown in Figure 3 and Figure 4 and vertical figure.Computing machine 12 is used for synchronously in real time control shutter 6 and three-dimension numerical controlled translation stage 9 so that when three-dimension numerical controlled translation stage 9 moves accurately with wave guide process in sample 8 on the suitable position.
Adopt and to detect light path as shown in Figure 2, utilize the near field optic method to record, the core of planar optical waveguide and the difference Δ n ≈ 0.0045 of the refractive index of body medium on every side.Refractive index and mode profile are as shown in Figure 5.Embodiment two: the preparation of the direct coupling mechanism of double wave leaded light
The same substantially with the single waveguide in preparation plane, as shown in Figure 1, ultrashort pulse laser 1 adopts the titanium sapphire femto-second laser, its output laser beam 2 wavelength are about 800nm (nanometer), pulsewidth is about 120fs (femtosecond), and output laser beam 2 obtains the space basic mode through 3 filtering of small holes spatial filter, through energy attenuator 4 and energy meter 5 regulate obtain suitable energy after, through shutter 6, focus on the sample 8 on the three-dimension numerical controlled translation stage 9 with low numerical aperture focusing microscope 7 again.The about 1.56 μ J of used single pulse energy, it is many that the long filament that causes refraction index changing to produce in sample 8 bodies owing to laser beam is approximately 100 μ m.When with the vertical self-trapping laser beam mobile example of the speed of 8.6 μ m/s, xsect is the feasible one-tenth of Planar Optical Waveguide Structures of 2 μ m * 100 μ m, and planar optical waveguide length can be determined by the movement of sample distance.Sample is retracted reference position, and 7.5 μ m sentence same speed and energy prepares another slab guide being separated by up and down with article one waveguide.Fig. 6 and Fig. 7 are respectively the outboard profile of the double wave leaded light coupling mechanism that makes and vertically scheme.As a same reason, can write a waveguide again and become three waveguide couplers.
Adopt as shown in Figure 2 detection light path with example 1, can record, the core of planar optical waveguide and the difference Δ n ≈ 0.0045 of the refractive index of body medium on every side with the near field optic method.
The preparation method of other waveguide device and above-mentioned example are similar, experimental results show that the coupling situation of the device of photo-coupler is consistent with theory.
Claims (9)
1. utilize the method for preparing planar light waveguide and ultra-short laser pulse, it is characterized in that according to the required width of preparation slab guide, select the microscope of the corresponding low numerical aperture of N.A.≤0.3 for use, ultrashort laser pulse is focused in the transparent dielectric substance sample body of optical maser wavelength, laser pulse and material interact and produce nonlinear optical effects such as self-trapping, form the transmission of long filament shape, the long filament light beam causes the transmission region refraction index changing, pass through mobile example, allow the variations in refractive index long filament in sample, laterally move, thereby form the refraction index changing of stratiform, realize the preparation of planar optical waveguide.
2. the method for claim 1 is characterized in that ultrashort laser pulse employing titanium sapphire femto-second laser and pulse amplification system take place.
3. the method for claim 1 is characterized in that described sample is selected from the transparent dielectric material of inorganic optical glass, inorganic salts crystal, fused quartz and organic photopolymer.
4. as claim 1 or 2 or 3 described methods, it is characterized in that described laser pulse carries out spatial filtering with aperture earlier, carry out the space with inverted microscope and expand bundle, focus on again.
5. as claim 1 or 2 or 3 described methods, it is characterized in that described movement of sample is to utilize digital control platform to control movement of sample direction and speed.
6. as claim 1 or 2 or 3 described methods, it is characterized in that adopting shutter to control laser pulse writing in sample and begin and stop.
7. method as claimed in claim 4 is characterized in that described movement of sample is to utilize digital control platform to control movement of sample direction and speed.
8. method as claimed in claim 4 is characterized in that adopting shutter to control laser pulse writing in sample and begins and stop.
9. method as claimed in claim 5 is characterized in that adopting shutter to control laser pulse writing in sample and begins and stop.
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Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102785031A (en) * | 2012-08-15 | 2012-11-21 | 武汉隽龙科技有限公司 | Method and device for cutting transparent material by using ultra-short pulse laser |
| CN102981373A (en) * | 2012-11-26 | 2013-03-20 | 中国科学院上海光学精密机械研究所 | Y-shaped waveguide laser direct writing device |
| CN104345386A (en) * | 2013-08-02 | 2015-02-11 | 宜兴新崛起光集成芯片科技有限公司 | Laser inter-engraving technology of glass-substrate optical waveguide chip |
| CN105572801A (en) * | 2016-02-16 | 2016-05-11 | 中国科学院西安光学精密机械研究所 | Femtosecond laser induced ion exchange-based waveguide production apparatus and production method thereof |
| CN107924027A (en) * | 2015-06-12 | 2018-04-17 | 加利福尼亚太平洋生物科学股份有限公司 | Integrated target spot waveguide device and system for optical coupling |
| CN108318970A (en) * | 2018-01-23 | 2018-07-24 | 广西大学 | One kind is in Er, Pr:The method that II type optical waveguides are prepared on GYSGG materials |
| US11256042B2 (en) | 2018-04-03 | 2022-02-22 | Corning Research & Development Corporation | Waveguide substrates and waveguide substrate assemblies having waveguide routing schemes and methods for fabricating the same |
| US11372169B2 (en) | 2018-04-03 | 2022-06-28 | Corning Research & Development Corporation | Waveguide substrates and waveguide substrate connector assemblies having waveguides and alignment features and methods of fabricating the same |
| US11609395B2 (en) | 2021-01-11 | 2023-03-21 | Corning Research & Development Corporation | Waveguide substrates and assemblies including the same |
| CN115971641A (en) * | 2022-12-21 | 2023-04-18 | 中国科学院上海光学精密机械研究所 | Non-contact type repair equipment and method for micro-nano-scale optical chip |
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2002
- 2002-06-11 CN CN 02121176 patent/CN1381736A/en active Pending
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102785031A (en) * | 2012-08-15 | 2012-11-21 | 武汉隽龙科技有限公司 | Method and device for cutting transparent material by using ultra-short pulse laser |
| CN102981373A (en) * | 2012-11-26 | 2013-03-20 | 中国科学院上海光学精密机械研究所 | Y-shaped waveguide laser direct writing device |
| CN104345386A (en) * | 2013-08-02 | 2015-02-11 | 宜兴新崛起光集成芯片科技有限公司 | Laser inter-engraving technology of glass-substrate optical waveguide chip |
| CN107924027A (en) * | 2015-06-12 | 2018-04-17 | 加利福尼亚太平洋生物科学股份有限公司 | Integrated target spot waveguide device and system for optical coupling |
| CN105572801A (en) * | 2016-02-16 | 2016-05-11 | 中国科学院西安光学精密机械研究所 | Femtosecond laser induced ion exchange-based waveguide production apparatus and production method thereof |
| CN105572801B (en) * | 2016-02-16 | 2018-07-03 | 中国科学院西安光学精密机械研究所 | The waveguide preparation facilities and preparation method exchanged based on femtosecond laser inducing ion |
| CN108318970A (en) * | 2018-01-23 | 2018-07-24 | 广西大学 | One kind is in Er, Pr:The method that II type optical waveguides are prepared on GYSGG materials |
| US11256042B2 (en) | 2018-04-03 | 2022-02-22 | Corning Research & Development Corporation | Waveguide substrates and waveguide substrate assemblies having waveguide routing schemes and methods for fabricating the same |
| US11372169B2 (en) | 2018-04-03 | 2022-06-28 | Corning Research & Development Corporation | Waveguide substrates and waveguide substrate connector assemblies having waveguides and alignment features and methods of fabricating the same |
| US11609395B2 (en) | 2021-01-11 | 2023-03-21 | Corning Research & Development Corporation | Waveguide substrates and assemblies including the same |
| CN115971641A (en) * | 2022-12-21 | 2023-04-18 | 中国科学院上海光学精密机械研究所 | Non-contact type repair equipment and method for micro-nano-scale optical chip |
| CN115971641B (en) * | 2022-12-21 | 2024-04-12 | 中国科学院上海光学精密机械研究所 | Non-contact repair equipment and method for micro-nano level optical chip |
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