CN1354278A - Temperature-controlled stirring equipment for chemical plating bath - Google Patents
Temperature-controlled stirring equipment for chemical plating bath Download PDFInfo
- Publication number
- CN1354278A CN1354278A CN 00133236 CN00133236A CN1354278A CN 1354278 A CN1354278 A CN 1354278A CN 00133236 CN00133236 CN 00133236 CN 00133236 A CN00133236 A CN 00133236A CN 1354278 A CN1354278 A CN 1354278A
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- temperature
- plating bath
- temperature control
- chemical plating
- stirring rod
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Abstract
The temperature-controlled stirring equipment for chemical plating bath is formed from stirring bar, heating component and temperature control component. Said stirring bar is hollow, and is placed in the plating bath. Its heating component is formed from air pump, heater and air-feeidng tube, said air-feeding tube is communicaed with hollow stirring bar. Its temperature control component is formed from temperature control probe and temperature control cabinet. Said temperature control probe is placed in the bottom of plating bath, its air pump and heater can be controlled by temperature control cabinet. Said invention can automatically control temperature. Its operation is convenient and efficiency is high.
Description
The present invention relates to the temperature-controlled stirring equipment of the whipping appts of plating bath, particularly chemical plating bath.
Electroless plating surfacing treatment process is at present comparatively advanced technology, because its cost is low, pollution-free, less energy-consumption, high quality, wide attention and the concern that is subjected to all circles of suitability.The key of electroless plating is temperature control, the stirring of plating bath, continuous ionic adjustment, the plating bath continuous filtration of plating bath, coating bath, plating bath.By general will stir, temperature control system is installed in respectively in the coating bath, will produce following unfavorable factor: 1,,, and influenced effective use volume of coating bath in coating bath so just must occupy the space of coating bath because temperature-controlled stirring equipment must be worked the while; 2, because heating tube is placed the shortcoming that three aspects are arranged in the coating bath: a. steam is heated, and is difficult to control automatically, and temperature fluctuation is big, influences quality; B. heat with electrothermal tube, though can make things convenient for control to temperature, heating tube generally is a metal, and itself can adsorb the metal ion in the deposition plating bath, have a strong impact on the operation and the quality of the work of plating dress, as use silica tube since itself be frangible shortcoming and impossible, most critical is the local superheating of heating tube to plating bath, can destroy the stability of plating bath, and influence the result of use of plating bath, because electrothermal tube generally will be with the power supply of 380V, so poor stability; C. since heating tube generally be distributed in the coating bath wall, so to the operation also bring unfavorable.
The purpose of this invention is to provide a kind of with temperature control and the temperature-controlled stirring equipment that stirs the chemical plating bath that carries out simultaneously.
The object of the present invention is achieved like this: the temperature-controlled stirring equipment of chemical plating bath, form by stirring rod, heater block and temperature control parts, stirring rod is arranged in the coating bath, stirring rod hollow, heater block is made up of air pump, well heater and induction pipe, and induction pipe communicates with the stirring rod of hollow, and the temperature control parts are made up of temperature probe and temperature-controlling cabinet, temperature probe is arranged on the coating bath bottom, and air pump and well heater are by temperature-controlling cabinet control work.
Advantage of the present invention is to have simplified equipment, has saved the useful space of coating bath, and temperature has been carried out automatic adjustment, and is easy to operate, ensures the quality of products the efficient height.
Below in conjunction with drawings and Examples the present invention is described in further detail:
Fig. 1 is a principle schematic of the present invention.
The temperature-controlled stirring equipment of chemical plating bath as shown in Figure 1, form by stirring rod 1, heater block and temperature control parts, stirring rod 1 is fixed in the coating bath 2, stirring rod 1 hollow, heater block is made up of air pump 3, well heater 4 and induction pipe 5, and induction pipe 5 communicates with the stirring rod 1 of hollow, the temperature control parts are made up of temperature probe 6 and temperature-controlling cabinet 7, temperature probe 6 is arranged on coating bath 2 bottoms, and air pump 3 and well heater 4 are provided with air filter 8 by temperature-controlling cabinet 7 control work between air pump 3 and the well heater 4.
During work, air, is heated through the plating bath of stirring rod 1 in coating bath 2 by induction pipe 5 through the filtration of air filter 8 and the heating of well heater 4 by air pump 3, because stirring rod 1 is arranged on the bottom of coating bath 2, warm air rises and simultaneously plating bath stirred.
Claims (2)
1, the temperature-controlled stirring equipment of chemical plating bath, form by stirring rod (1), heater block and temperature control parts, stirring rod (1) is arranged in the coating bath (2), it is characterized in that: stirring rod (1) hollow, heater block is made up of air pump (3), well heater (4) and induction pipe (5), induction pipe (5) communicates with the stirring rod (1) of hollow, the temperature control parts are made up of temperature probe (6) and temperature-controlling cabinet (7), temperature probe (6) is arranged on coating bath (2) bottom, and air pump (3) and well heater (4) are by temperature-controlling cabinet (7) control work.
2, the temperature-controlled stirring equipment of chemical plating bath according to claim 1 is characterized in that: be provided with air filter (8) between described air pump (3) and the well heater (4).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 00133236 CN1354278A (en) | 2000-11-16 | 2000-11-16 | Temperature-controlled stirring equipment for chemical plating bath |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 00133236 CN1354278A (en) | 2000-11-16 | 2000-11-16 | Temperature-controlled stirring equipment for chemical plating bath |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1354278A true CN1354278A (en) | 2002-06-19 |
Family
ID=4595578
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 00133236 Pending CN1354278A (en) | 2000-11-16 | 2000-11-16 | Temperature-controlled stirring equipment for chemical plating bath |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1354278A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101922002A (en) * | 2010-04-12 | 2010-12-22 | 南京航空航天大学 | Chemical composite plating bath |
| CN102590048A (en) * | 2011-12-12 | 2012-07-18 | 山东大学 | Uniform stirring soil particle suspension device for particle analysis experiment by densimeter method |
| CN105344277A (en) * | 2015-10-27 | 2016-02-24 | 王明明 | Industrial stirring and drying device |
| CN111139105A (en) * | 2019-12-30 | 2020-05-12 | 中国化学工程第十三建设有限公司 | Water gas generator |
-
2000
- 2000-11-16 CN CN 00133236 patent/CN1354278A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101922002A (en) * | 2010-04-12 | 2010-12-22 | 南京航空航天大学 | Chemical composite plating bath |
| CN102590048A (en) * | 2011-12-12 | 2012-07-18 | 山东大学 | Uniform stirring soil particle suspension device for particle analysis experiment by densimeter method |
| CN105344277A (en) * | 2015-10-27 | 2016-02-24 | 王明明 | Industrial stirring and drying device |
| CN111139105A (en) * | 2019-12-30 | 2020-05-12 | 中国化学工程第十三建设有限公司 | Water gas generator |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |