CN1351705A

CN1351705A - Multiple layer confocal interference microscopy using wavenumber domain reflectometry and background amplitude reduction and compensation

Info

Publication number: CN1351705A
Application number: CN00807026A
Authority: CN
Inventors: 亨利·A·西尔
Original assignee: Zetetic Institute
Current assignee: Zetetic Institute
Priority date: 1999-03-18
Filing date: 2000-03-16
Publication date: 2002-05-29
Also published as: WO2000055572A1; EP1161654A4; EP1161654A1; KR20010083041A; JP2002539494A; KR20020034988A

Abstract

An in-focus image of a region within and/or on an object (112) is discriminated from an out-of-focus image so as to reduce errors in image information of the object by producing a probe beam (P22B) and a reference beam (R22B) from a broadband point source (90), producing antisymmetric spatial properties in the reference beam (R32B), converting the probe beam to a beam focused to a line in the region, producing an in-focus return probe beam, and producing antisymmetric spatial properties in the in-focus return probe beam (P32B). Then the in-focus return probe beam is spatially filtered (P42A) and passed through a dispersal element to focus it (P42C) to a line in a detector plane of a detector system. The reference beam is spatially filtered (R42A) and passed through a dispersal element to focus it (R42C) to a line in-the-detector-plane. A beam from an out-of-focus image point is spatially filtered (P62A) and passed through the dispersal element (P62C). The in-the-detector-plane spatially filtered reference beam (R42C) is interfered with the in-the-detector-plane spatially filtered beam from the out-of-focus image point (P62C) and the in-the-detector-plane spatially filtered in-focus return probe beam (P42C). An amplitude of the spatially filtered in-focus return probe beam is detected as an interference term between the in-the-detector-plane spatially filtered reference beam, and the in-the-detector-plane spatially filtered (R42C) in-focus return probe beam by means of the detector system (114). An amplitude of an interference term between an amplitude of the in-the-detector-plane spatially filtered out-of-focus image beam (P62C) and an amplitude of the in-the-detector-plane spatially filtered reference beam (R42C) is thereby substantially reduced, and reduces errors in data produced by the detector system (114) to represent the image information of the object.

Description

The multiple layer confocal interference microscopy that uses wavenumber domain reflectometry and background amplitude to reduce and compensate

Related application

The present invention is that the number of documents of being applied for by H.A.Hill is 5391-A-09, the patent application serial numbers that on June 2nd, 1998 submitted is 09,089,105, be entitled as the part continuation application of the total unsettled U.S. Patent application of " by using wavenumber domain reflectometry and background amplitude to reduce and the multilayer of the confocal interference microscopy of compensation; many marks road disc access ", and the latter is that the patent application serial numbers of submitting on January 28th, 1997 is 08/789,885 (mandates on June 2nd, 1998, the patent No. is 5,760,901 (the part continuation application of the total unsettled U.S. Patent application that is entitled as " be used to have background amplitude reduces and the method and apparatus of the confocal interference microscopy of compensation ", they are incorporated herein by reference.

It is 60,125 that this application requires the unsettled U.S. Provisional Application sequence number of submitting on March 18th, 1999 by previous Henry A.Hill application, 057, be entitled as the interests of the U.S. Patent application of " by using wavenumber domain reflectometry and background amplitude to reduce and multilayer, many marks road disc access of the confocal interference microscopy of compensation ".

The field of the invention

The present invention relates to optics and become rubber, comprise and utilize these figure images to come biological sample, wafer, integrated circuit, CD and other samples are carried out optical storage of data and extraction, and carry out tissue biopsy with acoustics.

Background of the present invention

The present invention relates to produce quickly and accurately the technology at burnt image in an object or its cross section, wherein be eliminated from the light signal of out of focus prospect and/or background light source the major part that influences to statistical error and systematic error.

Confocal microscope and confocal interference microscope for example have many application in fields such as life science, biological sample research, industrial inspection and semiconductor meterings.This is to become visual ability because these instruments have unique three-dimensional.

To run into the most difficult multidimensional when perhaps the background that causes when the out of focus image obviously is better than at burnt picture intelligence and become image.When the thick sample of research, particularly when confocal system worked in reflective-mode rather than transmission mode, this situation usually can occur.

There are two kinds of general methods can determine the bulk properties of three-dimensional microscope example.These two kinds of methods are based on simple microscope and confocal microscope.In general, for the confocal microscope method, it is shorter that common microscopy obtains the required time of the data of three-dimensional image, but it is longer to handle the required time of these data.

In common one-tenth pattern system, when certain part that is become visual object departs from its best focus position vertically, the contrast of image will descend but its brightness remains unchanged, so departing from the image, non-focusing part will produce interference to the observation of the focusing block of object.

If the point spread function of known system, and obtained the image of each independent section of object, then can use known computerized algorithm and remove the signal that out of focus light is contributed effectively these images, produce the figure image that only is contained in burnt data.These algorithms are called " computing machine deconvolution ", and several different types are arranged, and in order to obtain desirable statistical precision, generally need expensive computer equipment, very long computing time and lot of data.

Wide field method (WFM) utilizes a common microscope one after the other to obtain the image of one group of adjacent focal plane in the whole volume of interest.Each image is all used the charge-coupled device (CCD) figure image sensor record of a refrigeration, wherein comprises simultaneously in the data at burnt picture plane and out of focus picture plane.See also about WFM: the paper of D.A.Agard (A Jiade) and J.W.Sedat (Sai Date) " three-dimensional Analysis of BiologicalSpecimens Utilizing Image Processing Techniques (utilizing the three dimensional analysis of figure image processing technique) " biological sample, Proc SPIE, 264,110-117,1980; The paper of D.A.Agard, R.A.Steinberg (Staenberg) and R.M.Stroud (history is bent the labor moral) " Quantitative Analysis of Eletrophoretograms:AMathematical Approach to Super-Resolution (quantitative test of electrophoretogram: a kind of mathematical method of super-resolution) ", Anal Biochem 111,257-268,1981; The paper of D.A.Agard, Y.Hiraoka (Xi Laaoka), P.Shaw (Xiao) and J.W.Sedat " Fluorescence Microscopy in Three Dimensions (three-dimensional fluorescence microscope) ", Methods Cell Biol 30,353-377,1998; The paper of D.A.Agard " Optical Sectioning Microscopy:Cellular Architecture inThree Dimensions (optical chromatography microscope: three-dimensional honeycomb system) ", Annu.Rev.Biophys.Bioeng.13,191-219,1984; The paper of Y.Hiraoka, J.W.Sedat and D.A.Agard " The Use of a Charge-Coupled Device forQuantitative Optical Microscopy of Biological Structure (utilizing the biological structure quantitative optical microscope of charge-coupled image sensor) ", Sci, 238,36-41,1987; And the paper of W.Denk (Deng Ke), J.H.Strickler (history Qu Lieke reins in) and W.W.Webb (weber) " Two-Photon Laser Scanning FluorescenceMicroscopy (two-photon laser scanning fluorescent microscope) ", Sci.248,73-76,1990.See also the paper " Charge-coupled Devices in Astronomy (charge-coupled image sensor in the uranology) " of J.Kristian (Christine) and M.Blouke (Bo Luke) about the CCD figure image sensor of refrigeration, Sci.Am.247,67-74,1982.

Laser calculating computed tomography technology realizes with simple microscope.S.Kawata (slips tower), O.Nakamura (Na Kamula), T.Noda (move and reach), H.Ooki (Ao Ji), K.Ogino (Ao Qinuo), Y.Kuroiwa (Ke Laoyiwa) and S.Minami people's such as (Mi Nami) paper " Laser Computed Tomography microscope (laser calculating computed tomography microscope) " (Appl.Opt.29,3805-3809,1990) system of being discussed in calculates the principle that chromatographic technique is closely related based on a kind of with X ray, but it is not to adopt two-dimentional layering to rebuild, and has adopted the said three-dimensional body reconstruction.Some perspective view images of a thick three-dimensional sample are modified as the common transmission electron microscope that has the oblique illumination system by one and obtain, and the three-dimensional structure of sample interior is then by computer reconstruction.Wherein obtaining the required time of data is shorter than the three-dimensional image required time of data of handling.An experiment in people's such as S.Kawata the above-mentioned paper shows, needs the time of a few minutes to obtain whole perspective views and they are sent in microcomputer for the reconstruction of 80 * 80 * 36 volume image elements (voxel).Thereafter, for the digitized map image that obtains to rebuild needs 30 minutes approximately, though they have used the vector processor of a speed as 2,000 ten thousand floating-point operations of per second (20MFLOPS).

In common point or pin hole confocal microscope, be focused in the very little space that is referred to as spot (spot) from the light of a pointolite.Microscope focuses on the light by this spot reflection, scattering or transmission on the point-shaped detectors.In reflection-type point confocal microscope, incident light is by that part reflection or back scattering of being arranged in spot of sample.Sample be positioned at that the outer part of spot reflects or backward scattered light all can not focus on the detecting device, put the sub-fraction that detecting device receives only these reflections or rear orientation light so these light with disperse, make.In transmission-type point confocal microscope, except the spot at sample partly was scattered or absorbs, incident light will be by transmission.Usually, pointolite and some detecting device can be used in common light source and common detecting device front respectively and place the mask of a band pin hole and be similar to.

Similarly, in common ground slit confocal microscopy mirror system, be focused in the very long and narrow space from the light of a line source, this space also is called spot.The slit confocal microscope focuses on the light from this spot reflection, scattering or transmission on the thread detector.Mask and the common detecting device of a row that line source and thread detector can be used in a common band of light source front placement slit respectively are similar to.Perhaps, line source also can be become image or be verified object to be similar to a focussed laser beam scanning.

Because have only the sub-fraction of object to be become image by confocal microscope, so in order to obtain complete two dimension or the three-dimensional shadow image that enough figure pictorial data produce object, become visual object to move, perhaps light source and detecting device must move.In the past, in order to obtain each line in succession of two-dimensional image data, the slit confocal microscope made object along the direction linear movement perpendicular to slit.On the other hand, have only the some confocal system of a pin hole to move in order to obtain the two-dimensional image data by two-dimensional approach; It must move by three dimensional constitution and in order to obtain one group of three-dimensional image data.Typically, earlier the original graph pictorial data is stored, and then they are handled to obtain to be verified or to be become the two-dimensional section (two-dimensionalsection) or the three-dimensional image of visual object.Because the susceptibility of out of focus image is lowered with respect to simple microscope, so for a certain amount of data, statistical precision is improved, and to compare with handling the data that obtain by common microscopy methods, required processing operation is greatly simplified.

In the system of a kind of being referred to as " serial scan optical microscope (TSOM) ", on a Nip section (Nipkow) disk etching a spirality figure of illumination and detector pinhole, when this disk rotation, whole static object will be by two-dimensional scan, see also the paper " Tandem-Scanning Reflected-Light Microscope (serial scan reflected light microscope) " of M.Pe ' tran (cup is special blue) and Hadravsky (breathing out the Draves base), J.Opt.Soc.A.58 (5) 661-664 (1968); And the paper of G.Q.Xiao (Xiao), T.R.Corle (Cauer) and G.S.Kino (Jino) " Real-Time ConfocalScanning Optical Microscope (confocal scanning optical microscope in real time) ", Appl.Phys.Lett.53,716-718 (1988).From the angle of optical processing, TSOM is a single-point confocal microscope basically, wherein has a device of a two-dimensional section of point by point scanning effectively.

From following two work, can find two kinds of papers " three-dimensional Analysis by a Microlens-ArrayConfocal Arrangement (carrying out three dimensional analysis) " that can reduce the example that obtains the technology of the required scanning amount of two-dimensional image with confocal system: H.J.Tiziani (the neat Buddhist nun of ladder) and H.-M.Uhde (Wu De) with the confocal layout of microlens array, Appl.Opt.33 (4), 567-572 (1994); And P.J.Kerstens (Ke Ersidengsi), J.R.Mandeville (Mandeville) and F.Y.Wu (Wu's) patent " Tandem LinearScanning Confocal Imaging Systems With Focal Volumes atDifferent Heights (the linear scanning confocal of series connection with the volume of focus at differing heights place becomes pattern system) ", U.S. Patent No. 5,248,876, be published in September, 1993.The out of focus image distinguishing ability of the confocal layout of lenticule in above-mentioned Tiziani and the Uhde paper is identical with the situation of use spininess hole light source and multielement detecting device in a confocal system.This system can detect a plurality of points simultaneously, but its cost is to reduce the ability of differentiating the out of focus image.Lenticular density is bigger, and system differentiates that the ability of out of focus image is poorer.Thereby for the complexity and the cost that obtain the required computing machine deconvolution of three-dimensional image will be healed greatly.In addition, the system of Tiziani and the above-mentioned paper of Uhde is severely limited on axial range.This scope can not surpass lenticular focal length, and this focal length is proportional to lenticular diameter under certain numerical aperture.Therefore, along with the increase of lenticule density, the axial range of being allowed will correspondingly reduce.

In the system of people's such as above-mentioned Kerstens patent,, need in confocal layout, to introduce a plurality of pin holes and a plurality of pin hole detecting device that is complementary in order to detect a plurality of points simultaneously.Yet pointed as the preceding paragraph, the cost of this benefit is the distinguishing ability that reduces the out of focus image, and the result will make required complexity of subsequent calculations machine deconvolution and cost increase.The density of pin hole is higher, and system differentiates that the ability of out of focus image will be poorer.The highest distinguishing ability can only just can reach when only using a pin hole.

Paper " Confocal Laser Microscope For SubmicronStructure Measurement (being used for the confocal laser microscope that submicrometer structure is measured) " at T.Zapf (Chai Pufu) and R.W.Wijnaendts-van-Resandt (Wei Naenci, all, thunder cent), Microelectronic Engineering 5,573-580 (1986); And J.T.Lindow (woods is many), S.D.Bennett (Bennett) and I.R.Smith (Smith's) paper " ScannedLaser Imaging for Integrated Circuit Metrology (laser scanning that is used for the integrated circuit measurement becomes image) ", Proc.SPIE, 565, among the 81-87 (1985), suggestion is used confocal microscope and is checked electronic circuit.The axial distinguishing ability that confocal system had makes them can be used in field of semiconductor manufacture.For example, this system can improve the detection with highly relevant characteristic, for example, and the thickness of delamination, foaming and structure and coating etc.But, also can cause some problems with confocal one-tenth pattern system detected electrons circuit.For example, single needle hole system needs the oversize time object to be carried out the scanning of both direction.Be used to make laser beam too complicated to the photosystem that object scans; And the rotating disc method that TSOM adopted in the past has aligning and maintenance issues.

The number of required different depth section (thereby amount of the figure pictorial data of required collection) depends on essential altitude range and desirable height resolution and the Performance of Optical System of measuring.For the typical electronic electric circuit inspection, generally need the figure image of 10 to 100 different depth sections.In addition, in order to distinguish different materials, may also need the data under several color bands.In confocal one-tenth pattern system, all need once independently two-dimensional scan for the height of each hope.If wishing has a plurality of color bands, then each is highly also needed repeatedly two-dimensional scan.By mobile focus point height, can obtain similar data from some adjacent planes, thereby obtain one group of three-dimensional intensity data.

Like this, do not have a kind of confocal microscopy mirror system of conventional art can be designed to realize fast and/or reliable three-dimensional chromatography one-tenth image, detecting or becoming all the more so in the visual field.

Though confocal method be comparison directly and work preferably, the confocal fluorescent work the when structure that for example is colored has high concentration, common microscopy methods still has some real advantage.The most important thing is that wherein the latter can use the dyestuff that is excited by ultraviolet (UV) range of radiation, they usually seem than more stable and more efficient by the dyestuff of excited by visible light.Though can perhaps use " two-photon " technology by infrared (IR) optical excitation UV dyestuff with the light source of UV laser instrument as confocal microscope, also there be practical difficulty in the cost of these Technology Need costlinesses.About using the UV laser instrument to see also two M.Montag (Meng Tage) as light source, J.Kululies (Ke Luoliesi), R.Jorgens (Yue Gengsi), H.Gundlach (Gong Delahe), M.F.Trendelduberg (special Lay grace human relations fort), and the paper of H.Spring (Shi Polin) " Working with the Confocal Scanning UV-LaserMicroscope:Specific DNA Localization at High Sensitivity andMultiple-Parameter Fluorescence (use of cofocus scanning UV laser microscope: the location of the specific DNA under high sensitivity and the multiparameter fluorescence) ", J.Microsc (Oxford) 163 (Pt.2), 201-210,1991; The paper of K.Kuba (Ku Ba), S-Y.Hua (China) and M.Nohmi (promise rice) " Spatial and Dynamic Changes inIntracellular Ca ²⁺Measured by Confocal Laser-ScanningMicroscopy in Bullfrog Sympathetic Ganglion Cells (Ca in the cell that in the bullfrog sympathetoblast, records with confocal laser scanning microscopy ²⁺The space of ion and dynamic change), " Neurosci, Res, 10,245-249,1991; C.Bliton (Bo Liedeng), J, the paper of Lechleiter (Lai Shilaite) and D.E.Clapham (Ke Laifamu) " OpticalModifications Enabling Simultaneous Confocal Imaging With DyesExcited by Ultraviolet-and Visible-Wave-length light (can use by the dyestuff of ultraviolet and visible wavelength optical excitation and realize the simultaneously confocal visual optical touch that becomes) ", J, Microsc.169 (Pt.1), 15-26,1993.About the infrared ray excited paper that sees also people such as aforementioned W.Denk of two-photon technology.

In addition, employed refrigeration CCD detecting device is an image data concurrently in the common microscopic system, rather than the image data like that serially of the photomultiplier (PMT) in the visual confocal microscopy mirror system.Therefore, if can make CCD sense data and do not reduce its performance more quickly, although the computing machine deconvolution calculates the required time and means data-switching is being become can the actual three-dimensional image of seeing also may have an extra time delay before this so, the three-dimensional data record speed of simple microscope system also still can be apparently higher than the confocal microscopy mirror system.

When making between the CCD that is being used for writing down concurrently two-dimensional data array and slit or the pin hole confocal microscope when determining, the signal to noise ratio (S/N ratio) that is related to statistical precision also must will be considered.The trap capacity of two-dimensional CCD pixel is the magnitude of 200,000 electronics.Compare such as the statistical precision that PMT or this class light (electronics) emission detector of photovoltaic effect device can reach with other, this magnitude has limited the statistical precision that single exposure CCD can reach.The result, contribute much larger than applicable cases for those out of focus backgrounds at burnt picture intelligence, if the consideration of every other aspect is all identical, then the consideration about signal to noise ratio (S/N ratio) will cause such conclusion: the one dimension parallel data record in the slit confocal microscope will be better than the 2-D data record in the standard microscope; Perhaps, the pointwise data recording in the confocal microscope of single needle hole will be better than the one dimension parallel data record in the slit confocal microscope.

Though will influence the selection of system about consideration with the statistical precision of signal-to-noise ratio metric, for example the slit confocal microscope is better than standard microscope, or single needle hole confocal microscope is better than the slit confocal microscope, but still may be comparable to from the residual signal of out of focus image in the selected system or greater than at burnt signal.For example when with optical wavelength detection of biological sample deep because of the scattering of optical radiation much larger than absorption, above-mentioned situation will appear.Will need long computing machine deconvolution in this case, that is to say that this time will be longer than to obtain the required time of data.No matter be noted that for single needle hole confocal microscope or slit confocal microscope, seek much smaller than residue out of focus figure picture intelligence at burnt figure picture intelligence the time, all above-mentioned situation can appear.

Though accurately digitizing is recently easy from the signal of PMT to make signal from the CCD detecting device, but PMT is energy then is actually the big array of many discrete detectors by the accurate single device CCD of calibration characteristic, but also exist and the pixel of its operating characteristic of calibration mark between sensitivity and the bias difference out-phase additional noise of closing.Wherein see also the paper " Fundamental andPractical Limits in Confocal Light Microscopy (basic restriction and physical constraints in the confocal light microscopy) " of J.B.Pawley (Pauli) about ccd signal digitizing problem, Scanning 13,184-198,1991); See also people's such as aforementioned Y.Hiraoka paper about the additional noise problem; The paper of J.E.Wampler (Wang Pule) and K.Kutz (Ku Ci) " Quantitative Fluorescence MicroscopyUsing Photomultiplier Tubes and Imaging Detectors (adopting photomultiplier and the quantitative fluorescence microscopy that becomes image sensor) ", Methods CellBiol.29,239-267,1989; Z.Jericevic (Ri Lisaiweiqi), B.Wiese (Wei Si), J.Bryan (Bo Laien) and L.C.Smith (Smith's) paper " Validationof an Imaging System:Steps to Evaluate and Validate a MicroscopeImaging System for Quantitative Studies (a kind of realization that becomes pattern system: estimate the step that becomes pattern system with the microscope of realizing being used for quantitative examination) ", MethosCell Biol 30,47-83,1989.

Should be noted that, because refrigeration CCD detecting device is best suited for utilizing some holes on the rotating disc to finish the photodetector of the confocal microscope of scan function in those, so the difference that should not be considered as between the two class photodetectors of above-mentioned two kinds of methods that are used for three-dimensional microscopy is completely.

Another kind is referred to as " optical coherence domain reflectometry measurement art " technology (OCDR) and has been used to obtain information about the three-dimensional nature of a system.This method is described in following paper to some extent: (1) R.C.Young quist (Youngquist), S.Carr (Ka Er) and D.E.N.Davies (Davis) " Optical Coherence-DomainReflectometry:A New Optical Evaluation Technique (optical coherence domain reflectometry measurement art: a kind of new optical evaluation technology) ", Opt.Lett.12 (3), 158-160 (1987); (2) " New Measurement System for FaultLocation in Optical Waveguide Devices Based on anInterforometric Technique (a kind of new measuring system that is used for the dislocation of measuring light waveguide device) " of K.Takada (Taka reaches), I.Yokohama (Yue Kehama), K, Chida (Qi Da) and J.Noda (move and reach) based on interferometry, Appl.Opt.26 (9), 1603-1606 (1987); (3) " the Guided-Wave Reflectometry with Micrometer Resolution (guided wave reflectometry) " of B.L.Danielson (Denier is inferior) and C.D.Whittenberg (prestige gulps down Burger) with micron resolution, Appl.Opt.26 (14), 2836-2842 (1987).The difference of OCDR method and coherent optics otdr measurement art (OTDR) technology is that the former uses the broadband continuous wave light source of a short-phase dry length to substitute the latter's light-pulse generator.The light beam that light source sends enters an interferometer, and an arm of this interferometer contains a moving reflector, and the light of mirror reflects forms reference beam thus, and another arm of interferometer has then comprised optical system to be measured.Survey with common heterodyne approach from the interference signal in the relevant mixed reflection light of two arms, produce the information that hope obtains about this photosystem.

The heterodyne detection of backscatter signal is finished with " white light interference art " in the OCDR technology, and wherein light beam is broken down in two arms of interferometer, respectively by adjustable mirror and back scattering ground point reflection, again by combination coherently.This method has been utilized such fact: only just can interference fringe occur in the light beam in recombination during less than the coherent length of light beam when the optical path difference between two arms.OCDR system described in above-mentioned list of references (1) and (3) has utilized this principle, and document (3) shows the resulting interferogram about system under test (SUT) inner fiber slit of intensity by scanning adjustable mirror and measurement recombination signal.Document (1) has also been described a kind of modified method, wherein allow catoptron in the reference arm with controlled frequency and amplitude vibration, to cause the Doppler shift in the reference signal, the signal of recombination then is imported into a filtering circuit simultaneously, to survey beat signal.

The another kind of variant of this technology has been described in the document (2), wherein the reference arm reflector position is fixed, and two optical path difference between the arm signal that can surpass coherent length, combination then be imported into second Michelson interferometer, two catoptrons are wherein arranged, one stationkeeping, another then is movably.Scan this removable catoptron, make that the optical path difference between second interferometer, two arms will compensate the phase delay between aforementioned backscatter signal and the reference signal when it is positioned at some corresponding to the discrete positions place in each scattering place.Be actually a piezoelectric energy-conversion modulator that utilizes in the optical fiber signal from the retroreflection place is added that the oscillation phase of a definite frequency changes, thereby be directed to above-mentioned compensation place.Output signal from second Michelson interferometer is fed to a lock-in amplifier, and the latter surveys piezoelectric transducer modulation and simultaneously by the scanning reflection mirror caused Doppler shift that moves.This technology has been used to measure the scrambling in the glass waveguide, and resolution is up to 15 μ m.See also the paper " Characterization ofSilica-Based Wave guides with a Interferometric OpticalTime-Domain Reflectometry System Using a 1.3 μ m-WavelengthSuperluminescent Diode (the silica-based waveguides characteristic by means of the interferometric optical otdr measurement art system that adopts 1.3 mum wavelength superluminescent diodes is demarcated) " of K.Takaca, N.Takato, J.Noda and Y.Noguchi, Opt.Lett.14 (13), 706-708 (1989).

The another kind of variant of OCDR is a twin-beam partial coherence interferometer (PCI), it has been used to measure the thickness of each bottom in the eyes, see also the paper " Measurement of the Thickness of Fundus Layersby Partial Coherence Topography (measuring the eyeground layer thickness) " of W.Drexler (the moral Simon Rex is reined in), C.K.Hitzenberger (uncommon Chen Baige), H.Sattmann (Saudi is graceful) and A.F.Fercher (Fischer) with the partial coherence tomography, Opt.Eng.34 (3), 701-710 (1995).In the used PCI of people such as Drexler, the Michelson interferometer of an outside has high spatial coherence to one but the light beam of coherent length very short (15 μ m) resolves into two parts: reference beam (1) and measuring beam (2).In the exit of this interferometer, these two compositions are synthesized a coaxial twin-beam again.These two light beams with the optical path difference that doubles interferometer brachium difference be used for throwing light on eyes and be reflected at the interface at several intraoculars, wherein, these interfaces are the interphases between the different refractivity medium.Therefore each light beam composition (1 and 2) is all further resolved into an a little composition by the reflection at these interfaces.Each that is reflected sub-composition superposes on a photodetector.If the optical range between two interfaces of intraocular equals the twice of interferometer brachium difference, then there are two compositions will experience identical total optical path length, the result interferes.When observing interference figure, the value of pairing interferometer brachium difference will equal an intraocular optical length.If neighbouring do not have a strong reflection, then the absolute position at these interfaces can the precision with 5 μ m be determined under the state of nature of eye., PCI is restricted because of the motion of object in the 3-D scanning required time.

The another kind of variant of OCDR is called optical coherence tomography (OCT), it is used for on-the-spot nethike embrane by report and becomes image, see also E.A.Swanson (Shi Wangxun), J.A.Izatt (according to pricking F), M.R.Hee (wishing), D.Huang (Huang), C.P.Lin (woods), J.S.Schuman (Schumann), C.A.Puliafito (Pu Lia Fischer-Tropsch), paper " In Vivo Retinal Imaging by Optical Coherence Tomography (utilizing the state of nature nethike embrane of optical coherence tomography to become image) " with J.G.Fujimoto (Fuji does not hold in the palm), Opt.Lett.18 (21), 1864-1866 (1993) and E.A.Swanson, D.Huang, J.G.Fujimoto, C.A.Puliafito, C.P.Lin, with the United States Patent (USP) of J.S.Schuman " Method andApparatus for Optical Imaging with Means for Controlling theLongitudinal Range of the Sample (utilizing the optics of the device of control sample longitudinal extent to become visual method and apparatus); " U.S. Patent number No.5,321, on June 14th, 501,1994 issued.Above-mentioned caused patent has been described and has been used for a sample is carried out a kind of method and apparatus that optics becomes image, wherein, longitudinal scanning in sample or location are by changing the relative optical path length of a guiding sample and a reference mirror of guiding, and perhaps the optical characteristics of the output by change equipment light source realizes.One dimension or two-dimensional transversal scanning to sample are to realize like this.In a lateral direction controlled relative motion between sampling and the detecting module, and/or selected lateral attitude of the guiding of the optical radiation in the detecting module.Spatial resolution＜20 μ m (dynamic range 100dB) during the high sensitivity reported.But, this OTC is restricted in the motion of 3-D scanning in the required time because of object.

When the needs non-contact measurement method, the optical interference contourgraph is widely used for the three-D profile on Measuring Object surface.Typically, these contourgraphs adopt phase-shifting interference measuring (PSI) technology, and speed is fast, precision is high and good reproducibility, but it to require measured surface be smooth with respect to light source balance wavelength.Because the recursive nature of interfering uses single wavelength measurement can not try to achieve uniquely greater than the quarter-wave surface discontinuity of (typically being about 150nm).Multi-wavelength is measured can enlarge this scope, but the requirement to wavelength accuracy and environmental stability will be strict, see U.S. Patent No. 4,340, authorize N.Balasubramanian (Ba Lasuba Raman Nirn) 306:1982 July 20, and title is " Optical System forSurface Topography Measurement (optical system that is used for surface shape measuring) ".

Overcome common PSI contourgraph restricted aspect coarse or the noncontinuous surface based on the contourgraph of scanning white light interferometer (SWLI) measuring.Many documents are understood this technology in detail, for example see L.Deck (De Ke) and P.de Groot (Degroot) in Appl.Opt.33 (31), the list of references 2-7 in the paper of delivering on the 7334-7338 (1994).These contourgraphs axially move on one side an arm of an aplanatism interferometer that is thrown light on by wideband light source typically, write down the position of a certain contrast fixed reference feature (being that point is cheated at peak value contrast or peak) on one side.A common issue with of this technology is, for the contrast of calculating every bit in real time needs a large amount of calculating.Because discrete sampling interval, it is accurate inadequately often only to calculate contrast, and this makes it is not that must to increase sampling density be exactly must the employing interpolation technique, and acquisition process in a word will further slow down.Coherent detection microscope (CPM) is an example of this class contourgraph, see also the U.S. Patent No. 4 of authorizing M.Davidson (Dai Weixun) on April 4th, 1989,818,110, title is " Method and Apparatus of Using aTwo Beam Interference Microscope for Inspection of IntegratedCircuits and the Like (utilizing two-beam interference microscope to detect the method and apparatus of integrated circuit etc.) "; The paper of M.Davidson, K.Kaufman (Kaufman), I.Mazor (Ma Zuo) and F.Cohen (Koln) " An Application of InterferenceMicroscope to Integrated Circuit Inspection and Metralogy (interference microscope is applied to integrated circuit verification and measurement) ", Proc SPIE, 775,233-247 (1987); And on May 12nd, 1992 U.S. Patent No. 5 of authorizing M.Davidson, K.Kaufman and I.Mazor, 112,129, title " Method of ImageEnhancement for the Coherence Probe Microscope with Applicationsto Integrated Circuit Metrology (the figure image enhancement method of coherent detection microscope applications when integrated circuit is measured) ".Contourgraph in general, and distinguishingly say CPM, they all can not be to three-dimensional body work; Have common interference microscope the background that has of typical case; To vibration sensing; And Computer Analysis that need be a large amount of.

Also overcome many restrictions of conventional PSI contourgraph based on the contourgraph of triangulation but also had height and shortcoming that horizontal space resolution reduces and have and form the outer overall background of image.This The Application of Technology sees also paper " Parallel Three-Dimensional Sensing by ColorcodedTriangulation (parallel three-dimensional detection of the triangulation by the coloud coding) " Appl.Opt. of G.Hausler (Hao Sile) and D.Ritter (Rui Te), 32 (35), 7164-7169 (1993).This method that G.Hausler and D.Ritter use is based on following principle: the color frequency spectrum of a white light passes through from the illumination of a certain direction and by imaging to object.From a direction of observation that is different from this illumination direction, this object is observed by a colored TV.The color of each pixel (form and aspect) the measuring that be it apart from the distance of a reference plane.This distance can be by three looks (red-green-indigo plant) delivery channel of a charge coupled device (CCD) camera estimated and this estimation can in TV, be implemented in real time.Yet the resolution in a height and the horizontal space dimension is eased down under the resolution that realizes with PSI and SWLI significantly, an overall background is arranged, and this triangulation contourgraph has the noisiness of non-interfere measurement technique.And this triangulation contourgraph is restricted to the surface profile moulding.

One of problem that white light interferometric art (WLI) is run into is the phase place uncertain problem.Being subjected to the contour measuring method that people note at phase place uncertain problem a kind of is that J.Schwider (history dimension Dare) and L.Zhou (week) are " DispersiveInterferometric Profilemeter (chromatic dispersion interference contourgraph) " (Opt.Lett.19 (13) at one piece of title, 995-997,1994) contourgraph (DIP) method is interfered in the chromatic dispersion that is proposed in the paper.A kind of similar approach about WLI yet is " AbsoluteDistance Measurement with Synchronously Sampled White-LightChannelled Spectrum Inter-ferometry (utilizing the synchronized sampling white light to link up the absolute distance measurement of spectrum interferometry) " (Pure Appl.Opt.4 by U.Schuell (history nile), E.Zimmermann (Qi Moman) and R.Dandliker (but Derek) at title, 643-651,1995) made report in the paper.

Generally speaking, the phase place uncertain problem can be avoided by using DIP fully.In DIP equipment, parallel beam from white light source vertically incides on the true wedge plate of Feisuo (Fizeau) interferometer that is positioned at achromatic micro objective the place ahead.The Feisuo interferometer is formed by the inside surface and the body surface of this reference plate.Light is reflected back on the slit of a grating spectrograph then, and grating spectrograph will make when the invisible interference fringe atlas of fashion generation chromatic dispersion, and spectrum is projected on the linear array detecting device.Dispersion spectrum at the Feisuo interferometer air-gap that will present each point on the surface selected on this detecting device by spectrograph slit.Can utilize rich in leaf transformation and filtering method assess candy strip, obtain phase information with intensity distributions from the wedge shape interferogram.

Though used DIP can avoid the phase place uncertain problem, DIP also is not suitable for the application that those need detect three-dimensional body.This is because certainly exist the bigger background that is produced by the out of focus image in DIP.The background problems that this background problems is faced when attempting to utilize the standard interference microscope to produce three-dimensional image is suitable.

Authorizing A.E.Dixon (Dixon), the U.S. Patent number No.5 of being entitled as of S.Damaskinos (moral Maas Ke Nuosi) and J.W.Bowron people such as (Bo Luoen) " Apparatus and Method forSpatially-and Spectrally-resolved Measurements (equipment and the method that are used for space and spectrally resolved measurement) ", a kind of equipment and technology that is used to carry out from the spectrally resolved measurement of the light of a sample reflection, emission or scattering disclosed in 192,980.In one group of embodiment of people's such as Dixon this equipment and method, the characteristic of one sample is passed through from the light intensity of this sample reflection, emission or scattering and by characterization, wherein this equipment and method comprise incoherent, non-confocal type, and a diffused component is arranged before detecting device.This group embodiment of people such as Dixon has the intrinsic defocused image overall background of microscope of standard, and this group embodiment is the non-confocal type.

People's such as Dixon equipment and method also comprise an incoherent confocal embodiment, and it allows to have the measurement that background reduces.Yet this carries out ionization meter to confocal embodiment and non-confocal embodiment and limits to some extent, uses the consequence of incoherent technology seriously to limit the information of the relevant sample that can obtain from light reflection or scattering.Ionization meter provides square information of a relevant amplitude value by this sample light reflection or scattering, and the result is the information of having lost the amplitude-phase of light relevant this reflection or scattering.People's such as Dixon equipment also comprises an embodiment with method: become to be combined with a Fourier transform spectrometer in the pattern system at a non-confocal.People's such as Dixon Fourier transform spectrometer embodiment have non-confocal become pattern system intrinsic out of focus image than the defective of overall background.

Authorize the U.S. Patent number No.5 that is entitled as " Single Aperture ConfocalImaging Suetem (the burnt one-tenth of single hole pin hole pattern system) " of G.Xiao in July, 1996, the equipment that carries out multi-wavelength measurement simultaneously with an incoherent confocal one-tenth pattern system is disclosed in 537,247.This equipment of Xiao comprises for from the incident light of light source with only utilize a confocal optical wavelength filter that is scanned into pattern system and is used for selectively the back light of difference wavelength being guided to respectively a sequential detector of a pin hole from the back light of object.The equipment of this Xiao has an advantage: measure simultaneously with the certain characteristics of a confocal background that becomes pattern system and produce with respect to the out of focus image that reduces with different wavelength.Yet, limit to some extent carrying out ionization meter, use the consequence of incoherent technology seriously to limit the information of the relevant sample that can obtain from light reflection or scattering.Ionization meter provides square information of a relevant amplitude value by this sample light reflection or scattering, and the result is the information of having lost the amplitude-phase of light relevant this reflection or scattering.

At G.Q.Xiao, T.R.Corle (section reins in) and G.S.Kino (Kai Nuo) are shown is entitled as " confocal scanning optical microscope in real time " Appl.Phys.Lett., 53 (8), point out in the paper of 716-718 (1988) when in confocal microscope, using white light, the aberration of eyepiece guarantee that the image from the differing heights in the sample all presents and all on focus still with different colors.People such as Xiao have proved this point by the image that produces a silicon integrated circuit with four different wavelength.H.J.Tiziani (base of a fruit is the Buddhist nun) and H.-M.Uhde (person of outstanding talent reaches) are being entitled as " Three-Dimensional Image Sensing by Chromatic ConfocalMicroscopy (by the three-dimensional image sensing of colored confocal microscope) " Appl.Opt., 33 (10), one white light, incoherent, confocal microscope have been described in the paper of 1838-1843 (1994), wherein obtain elevation information in order not scan this object ground practically, aberration is deliberately introduced microscope ocular.In fact the camera that has black and tunica albuginea has made up the look strong and tone of each impact point with the chromatic filter of three selections.Although used confocal microscope and therefore reduced out of focus image background in the paper of people such as Xiao and Tiziani and Uhde, they still are restricted carries out ionization meter.Limit to some extent carrying out ionization meter, use the consequence of incoherent technology seriously to limit the information of the relevant sample that can obtain from light reflection or scattering, as described in the paper of people such as Dixon and Xiao.

In be entitled as " Mirau CorrelationMicroscope (associated microscope) " that G.S.Kino and S.C.Chim showed, Appl.Opt., 26 (26), " Three-Dimensional Image Realization in InterferenceMicroscopy (adopting interference microscopy to realize three-dimensional image) " Appl.Opt. that 3775-3783 (1990) and S.S.C.Chim (admiring) and G.S.Kino (section's promise) are shown based on the Mirau interferometer structure, 31 (14), in the paper of 2550-2553 (1992) a kind of interference microscope has been described.The equipment of this Kino and Chim adopted have that one of the incoherent light source of room and time is interfered, non-confocal microscope and use from the object beam reflected and reflect correlativity signal between the light beam of mirror reflection certainly as the output signal that detects.But the equipment energy measurement of this Kino and Chim is from the amplitude and the phase place of this object beam reflected.Yet the interference apparatus of this Kino and Chim has a serious background problems defective: out of focus image background level is the typical background level in relevant, the non-confocal microscopic system of standard.

Authorize the U.S. Patent number No.5 that is entitled as " Stationary Optical Spectroscopic Imaging in Turbid Objects bySpecial Light Focusing and Signal Detection of Light with VariousOptical Wavelengths (becoming image with the static light optical spectra of input in opaque article of the light that has various optical wavelengths) " of A.Knuttel (Kang Nataiou) by special light focusing on October 15th, 1996,565, a kind of interference apparatus is disclosed in 986 to obtain the spectrographic images of an object, spatial resolution in the horizontal direction and the visual field on the depth direction.The described equipment of Knuttel has that a non-confocal becomes pattern system and the dispersed light that is usually included in the arm of an interferometer is learned an element and a colored eyepiece.The feasible information that may write down the light amplitude of relevant scattering of this dispersing optics element with different optical wavelengths, the use of interferometer makes the size and the phase place of the amplitude may write down light relevant reflection or scattering, and the use of colored eyepiece is feasible may write down the information of the visual field on the relevant depth direction.Yet the interference apparatus of Knuttel has a serious background problems, and the level of background is the typical background level of finding in relevant, the non-confocal microscopic system of standard.

One of fundamental purpose of one embodiment of the described equipment of Knuttel is two zones that can become a visual object by the neither peer that uses a colored eyepiece that comprises in the part of a section plate on depth dimension simultaneously.As a result, the image that comprises the stack of the depth location that separates from two in this object by the signal of the detector recording of this embodiment.Therefore, except the high background that existence out of focus image as noted above generates, must carry out a compound backwards calculation with image by computing machine at burnt image extraction one given depth from this stack.Required this kind backwards calculation of obtaining with the reference example of Knuttel of stack image has serious problems: the result of backwards calculation is relatively accurately along with the then quick deterioration of the increase of the degree of depth in the sample near near object surfaces.When this object of this detecting device only has a bit Jiao, can not meet with this problem usually in the backwards calculation.

(Optic Acta 29 (12) at the paper " A Confocal Interference Microscope (a kind of confocal interference microscope) " of D.K.Hamilton (Hamilton) and C.J.R.Sheppard (Xue Paide), 1573-1577,1982) in, describe a kind of interfere type form of confocal microscope, wherein reduced the above-mentioned background problem that is run in the interference microscope.The basis of this system is a confocal microscope, and object is wherein scanned with respect to a focused laser spot, and back the coinciding to projected image of the position of this laser spot and a some detecting device.The interference form of the confocal apparent plan mirror of this reflection-type is a kind of Michelson interferometer of remodeling, and one of them light beam is focused on the object.A key property of this system be can reduce the confocal interference microscopic system intrinsic out of focus image background.Confocal interference microscope in above-mentioned Hamilton and the Sheppard paper is once only measured the reflected signal of a point in the three-dimensional body, and the system that makes is sensitive to sample in the motion of obtaining in the scan period of required three-dimensional data.

Effectively utilizing the important major component in the high-performance computer is storer.Because the googol of these equipment according to memory requirement, need compactness, low cost, very high power capacity, storer at a high speed handle by parallel computation the high data volume of being born.Such call data storage can be provided by a three-dimensional storage.

In a two-dimensional memory, the theoretical maximum storage density is (with l/ λ ²Be directly proportional) be 3.5 * 10 ⁸Position/cm ², λ=532nm, and maximum storage density is 6.5 * 10 in three-dimensional storage ¹²Position/cm ³The representative of these maximal values when when each memory point is used one single binary format to the upper limit of memory capacity.These upper limits can be enhanced by using a recording medium, record amplitude not at the same level or amplitude and phase information on this recording medium.Carrying out holographic recording in the phase recording media is an example of backplane module.

In the different mode of record, in each memory point, the pattern of unit binary format, amplitude in basic N form or amplitude and phase place in (basic N) * (basic M) form, size at the one pixel of a memory point that can be used, and therefore storage density is subjected to the restriction of signal to noise ratio (S/N ratio) that can be obtained, and this signal to noise ratio (S/N ratio) is directly proportional with the volume of this volume image element usually.Particularly, for amplitude or amplitude and phase recording pattern, the quantity that can be stored in the single section information in the one pixel also is subjected to the restriction of obtainable signal to noise ratio (S/N ratio).

Neededly be, system should be able to be in conjunction with the following characteristic: pictorial data to the susceptibility of out of focus image be reduced to less than conventional art confocal and confocal interference microscopic system intrinsic susceptibility, pictorial data to the susceptibility of out of focus image reduce will cause reducing of systematic error and statistical error; Reduction with the out of focus that reduces image susceptibility associated to the requirement of computing machine deconvolution; May reach the confocal interference microscopic system intrinsic high s/n ratio; The ability of the data that parallel record is axial and horizontal and, but the complex amplitude of energy measurement scattering and/or folded light beam or acoustic beam.

General introduction of the present invention

Therefore, the method and apparatus that the purpose of this invention is to provide the location records information of the different depth that is used in a CD.

An object of the present invention is to provide the method and apparatus of the location records information of a plurality of degree of depth that are used in a CD.

Another object of the present invention provides position while method for recording information and the equipment that is used for a plurality of degree of depth in a CD.

Another object of the present invention provide be used in a CD or on the method and apparatus of location records information in a plurality of marks road.

Another object of the present invention provide be used in a CD or on the position method for recording information and the equipment simultaneously in a plurality of marks road.

Another object of the present invention provide be used in a CD or on the position in a plurality of marks road and a plurality of positions on these mark roads method for recording information and equipment simultaneously.

The position that another object of the present invention provides a plurality of degree of depth of being used in a CD and a plurality of marks road is method for recording information and equipment simultaneously.

Another object of the present invention provides the method and apparatus that is used for information is written to the position of a plurality of degree of depth in a CD.

Another object of the present invention provides the method and apparatus that is written to the position of a plurality of degree of depth in a CD when being used for information of same.

Another object of the present invention provide be used for information is written in a CD or on the method and apparatus of position in a plurality of marks road.

Another object of the present invention provide be written to when being used in a CD information of same or on the method and apparatus of position in a plurality of marks road.

Another object of the present invention provides the method and apparatus of the position in a plurality of degree of depth of being written to when being used for information of same in a CD and a plurality of marks road.

Another object of the present invention provides the method and apparatus that is used for information is written to the position of a plurality of degree of depth in having a more highdensity CD.

Another object of the present invention provides the method and apparatus that is written to the position of a plurality of degree of depth in having a more highdensity CD when being used for information of same.

Another object of the present invention provide be used for information is written in having a more highdensity CD or on the method and apparatus of position in a plurality of marks road.

Another object of the present invention provides the method and apparatus of the position in a plurality of degree of depth of being written to when being used for information of same in having a more highdensity CD and a plurality of marks road.

Another object of the present invention provides fast, one dimension, two dimension, and three-dimensional chromatographical X-ray complex amplitude imaging reliably.

Another object of the present invention provides a kind of improved chromatographical X-ray complex amplitude imaging technique of avoiding above-mentioned prior art defective.

Another object of the present invention provides a kind of chromatographical X-ray complex amplitude imaging technique that reduces or eliminates easily from the statistical error effect of the light of out of focus figure image point.

Another object of the present invention provides a kind of chromatographical X-ray complex amplitude imaging technique, and wherein the systematic error effect of out of focus light image is reduced or eliminated widely.

Another object of the present invention provides a kind of chromatographical X-ray complex amplitude imaging technique, and it allows the imaging simultaneously basically at an object of a plurality of figure image points.

Another object of the present invention provide a kind of be used for one, two and the imaging of three-dimensional chromatographical X-ray complex amplitude to obtain the technology that makes things convenient for the signal to noise ratio (S/N ratio) of the attainable image of an interference system.

Another object of the present invention provides a kind of chromatographical X-ray complex amplitude imaging system and technology, and it has avoided finding the solution the difficulty in computation of nonlinear difference equation.

Another object of the present invention provide a kind of line segment that is used for an object or bidimensional part the imaging of chromatographical X-ray complex amplitude and no matter its motion make things convenient for technology.

Embodiment described below and modification thereof drop among five groups of embodiment.

These embodiment of first group of embodiment and some in the modification thereof generate basically and the visual one dimension image of quadrature mutually of one dimension by some corresponding in these embodiment of second group of embodiment and the modification thereof generations.Information in the one dimension image side by side is acquired, and has background minimizing and compensation.These embodiment of first group of embodiment and the other in the modification thereof generate basically with by the two-dimensional image of some corresponding in these embodiment of second group of embodiment and the modification thereof generations two-dimensional image of quadrature mutually.Information in the two-dimensional image side by side is acquired, and has background minimizing and compensation.

These embodiment of the 3rd group of embodiment and some in the modification thereof generate basically and the visual one dimension image of quadrature mutually of one dimension by some corresponding in these embodiment of the 4th group of embodiment and the modification thereof generations.Information in the one dimension image side by side is acquired, and does not have background to reduce and compensation.These embodiment of the 3rd group of embodiment and the other in the modification thereof generate basically with by the two-dimensional image of some corresponding in these embodiment of the 4th group of embodiment and the modification thereof generations two-dimensional image of quadrature mutually.Information in the two-dimensional image side by side is acquired, and does not have background to reduce and compensation.

These embodiment of the 5th group of embodiment and modification thereof generate the multidimensional image as a sequence single-point image, and these single-point images are acquired, and have background minimizing and compensation.

Say concisely, and according to an embodiment, the present invention provides a kind of be used for by focusing on from the optical radiation of space, broadband incoherent point source on the source pin hole and has identified a complex amplitude at burnt image from the complex amplitude of an out of focus image from first group of embodiment.Collimated and guide to first phase shifter from the light of this source pin hole radiation.The phase place of the first of the light that this is collimated is moved to produce the light of the first amount phase shift by this phase shifter.The phase place of the second portion of the light that this is collimated is moved to produce the light of the second amount phase shift by this phase shifter.The light of this first and second amounts phase shift is focused first luminous point.

Collimated and guide to a beam splitter from the light of light of the first amount phase shift of this luminous point radiation.The first of the light that this is collimated is reflected by this beam splitter with first amount that forms a detecting light beam and the second portion of this collimated light by this beam splitter and measures to form first of a reference beam.Collimated and guide to a beam splitter from the light of light of the second amount phase shift of this luminous point radiation.The first of the light that this is collimated is reflected by this beam splitter with second amount that forms a detecting light beam and the second portion of this collimated light by this beam splitter and measures to form first of a reference beam.

The light of first and second amounts of this detecting light beam is directed to second phase shifter.This detecting light beam first the amount light by phase shift with form this detecting light beam the 3rd the amount and this detecting light beam second the amount light by phase shift to form the 4th amount of this detecting light beam.It is identical by first and second phase shifters third and fourth of this detecting light beam being measured the clean phase shift that is produced.Third and fourth amount of this detecting light beam is focused to form a line chart in an object materials by first finder lens and resembles, thereby throws light on this object materials.This line chart resembles approx along the optical axis of first finder lens and is aligned and this line chart resembles along the length of this optical axis and determined by the combination of some factors of the optical bandwidth of the depth of focus of this first finder lens that for example can be conditioned and aberration and this light source.

The first and second amount light of this reference beam are directed to the 3rd phase shifter.This reference beam first the amount light by phase shift with form this reference beam the 3rd the amount and this reference beam second the amount light by phase shift to form the 4th amount of this reference beam.It is identical with the 3rd phase shifter third and fourth of this reference beam being measured the clean phase shift that is produced by first.Third and fourth amount of this reference beam is focused a luminous point on the reference mirror by one with reference to lens.

The reflection of third and fourth amount of this detecting light beam along the direction of this finder lens from illuminated object radiation and/or the detecting light beam that scattered beam forms a scattering are also collimated and guide to second phase shifter by this finder lens.The phase place of the first of the light that this is collimated is moved the detecting light beam amount with first scattering that produces phase shift light, and the phase place of the second portion of this collimated light is moved the detecting light beam amount with second scattering that produces phase shift light.The light of the detecting light beam amount of this first and second scattering is directed to this beam splitter.The part of the part of the detecting light beam amount of first scattering and the detecting light beam amount of second scattering is reflected with third and fourth amount of the detecting light beam that forms this scattering respectively by this beam splitter.The light of the collimation of third and fourth amount of the detecting light beam of this scattering is focused on the spatial filter pin hole by a space filter lens.

Form the reference beam of a reflection and collimated and guide to the 3rd phase shifter with reference to lens along this with reference to reflection ray of this luminous point radiation of direction on this reference mirror of lens by this.The phase place that the phase place of the first of the light that this is collimated is moved with the second portion of the reference beam amount of first reflection that produces phase shift light and this collimated light is moved to produce the second reference beam amount that reflects of phase shift light.The light of the reference beam amount of these first and second reflections is directed to this beam splitter.The part of the reference beam amounts of these first and second reflections by this beam splitter by third and fourth amount of transmission with the reference beam that forms this reflection respectively.The light of the collimation of third and fourth amount of the reference beam of this reflection is focused on this spatial filter pin hole by this space filter lens.

The part of the 3rd amount of the detecting light beam of this scattering and the part of the 4th amount are by third and fourth amount of this spatial filter pin hole with the spatial filtering of the detecting light beam that forms scattering respectively.Third and fourth amount of the spatial filtering of the detecting light beam of this scattering is collimated and be directed to a chromatic dispersion element, preferably a reflecting diffraction grating by a chromatic dispersion element lens.

The part of the 3rd amount of the reference beam of this reflection and the part of the 4th amount are by three amount and four amount of this spatial filter pin hole with the reference beam of the reflection that forms spatial filtering respectively.The 3rd amount of the reference beam of the reflection of this spatial filtering and the 4th amount by these dispersion element lens collimated be directed to this dispersion element.

Form third and fourth amount wavenumber filtering, spatial filtering of the detecting light beam of scattering respectively by a detector lens from the part of third and fourth amount of each spatial filtering of the detecting light beam of the scattering of this dispersion element radiation.Third and fourth amount wavenumber filtering of the detecting light beam of this scattering, spatial filtering is focused to form a line chart on a plane of a linear array that comprises detector pinhole by this detector lens and resembles.From the part of third and fourth amount of each spatial filtering of the reference beam of the reflection of this dispersion element radiation by third and fourth amount wavenumber filtering, spatial filtering of this detector lens with the reference beam that forms reflection respectively.Third and fourth amount wavenumber filtering of the reference beam of this reflection, spatial filtering resembles by third and fourth line chart of measuring wavenumber filtering, spatial filtering that this detector lens is focused to form the reference beam that reflects on the plane of the linear array that comprises this pin hole.

By the intensity of the lap of third and fourth amount wavenumber filtering, spatial filtering of the reference beam of third and fourth amount of the spatial filtering of the detecting light beam of the scattering of these detector pinhole transmissions and reflection first array as the intensity level of measuring, this many pixels detecting device comprises the linear array of a pixel by the detectors measure of pixel more than.The phase place of third and fourth amount wavenumber filtering of the reference beam of reflection, spatial filtering is moved third and fourth amount of π radian with first phase shift, wavenumber filtering, the spatial filtering of the reference beam that forms reflection by the 4th phase shifter.By this many pixels detectors measure by the intensity of the lap of third and fourth amount of first phase shift, wavenumber filtering, the spatial filtering of the reference beam of third and fourth amount of the spatial filtering of the detecting light beam of the scattering of these detector pinhole transmissions and reflection second array as the intensity level of measuring.

The phase place of third and fourth amount wavenumber filtering of the reference beam of reflection, spatial filtering is moved third and fourth amount of additional-pi/2 radian with second phase shift, wavenumber filtering, the spatial filtering of the reference beam that forms reflection respectively by the 4th phase shifter.By this many pixels detectors measure by the intensity of the lap of third and fourth amount of second phase shift, wavenumber filtering, the spatial filtering of the reference beam of third and fourth amount of the spatial filtering of the detecting light beam of the scattering of these detector pinhole transmissions and reflection tri-array as the intensity level of measuring.

The phase place of third and fourth amount wavenumber filtering of the reference beam of reflection, spatial filtering is moved third and fourth amount of additional π radian with the 3rd phase shift, wavenumber filtering, the spatial filtering of the reference beam that forms reflection respectively by the 4th phase shifter.By this many pixels detectors measure by the intensity of the lap of third and fourth amount of the 3rd phase shift, wavenumber filtering, the spatial filtering of the reference beam of third and fourth amount of the spatial filtering of the detecting light beam of the scattering of these detector pinhole transmissions and reflection the 4th array as the intensity level of measuring.

In next step, the first, second, third and the 4th array of the intensity level of measurement is sent to a computing machine and handles.Deduct from the corresponding element of first array of the intensity level measured by this computing machine measurement intensity level second array element with on the plane that is implemented in these detector pinhole in the measurement of first array of the component value of a complex amplitude of the detecting light beam of this scattering of Jiao, be cancelled basically from the influence of the light of out of focus image.Deduct from the corresponding element of the tri-array of the intensity level measured by this computing machine measurement intensity level the 4th array element with on the plane that is implemented in these detector pinhole in the measurement of second array of the component value of a complex amplitude of the detecting light beam of this scattering of Jiao, be cancelled basically from the influence of the light of out of focus image.

The element of first and second arrays of the component value of the amplitude of the detecting light beam of this scattering is the value of quadrature component and like this, provides on the plane of (give within a complexconstant) these detector pinhole the accurate measurement at the complex amplitude of the detecting light beam of this scattering of Jiao in a complex constant.Influence from the light of out of focus image is deleted basically.Use the known computerized algorithm of those of skill in the art in this computing machine and present technique field, do not need object materials is scanned, can obtain an accurate one-dimensional representation of a line segment of this object materials.The direction of this line segment is on the direction of the optical axis of this finder lens.This line segment can be cut one or more surface of this object materials or be positioned at a plane of this object materials.Use the known computerized algorithm of those of skill in the art in this computing machine and present technique field, the accurate two and three dimensions that obtains this object materials from two peacekeeping cubical arraies by the first, second, third and the 4th array of the intensity level of this object materials of scanning measurement of obtaining a peacekeeping two dimension is represented respectively.The two and three dimensions of this object materials represents to comprise one or more surface of this object materials.The scanning of this object materials is systematically moved this object materials respectively by this computer-controlled shifter and is realized by using in a peacekeeping two dimension.If the out of focus image correcting of wishing has exceeded the compensation that present device can be accomplished in first and second arrays of the component value of the amplitude of the detecting light beam of scattering, this computerized algorithm can comprise known computing machine deconvolution of those skilled in the art and integral equation inversion technique.

According to second embodiment, the invention provides a kind of being used for by will be from a broadband, spatial spread, the optical radiation imaging of the incoherent line source in space is to the linear array of a source pin hole, come from the complex amplitude of an out of focus image, to identify a method and apparatus at the visual complex amplitude of Jiao, it comprises this equipment and the electronic processing device of previous described embodiment, wherein the source pin hole of first embodiment is substituted by the linear array of this source pin hole, the spatial filter pin hole of first embodiment is substituted by a linear array of spatial filter pin hole, and the linear array of the detector pinhole of first embodiment and many pixels detecting device are respectively by a two-dimensional array of detector pinhole with comprise that the detecting device of pixel more than of the two-dimensional array of a pixel is substituted.The linear array of the linear array of this source pin hole and this spatial filter pin hole is perpendicular to this plane of being determined by dispersion element.The two-dimensional array of these detector pinhole and detecting device pixel by many pixels detecting device should be in the focal plane the image of linear array of this source pin hole be oriented.

The element of the array of the measurement of first and second component values of the amplitude of the detecting light beam of scattering wavenumber filtering, spatial filtering is the value of quadrature component and like this, in a complex constant, be given on the plane of two-dimensional linear array of this detector pinhole at one of the complex amplitude of the detecting light beam of this scattering of Jiao and accurately measure, deleted basically from the influence of the light of out of focus image.Use the known computerized algorithm of those skilled in the art, do not need scanning basically, can obtain the accurate two-dimensional representation of a two-dimensional section of this object materials.This two-dimensional section is selecteed by each auto-orientation of the optical axis of the linear array of this source pin hole and this finder lens.This two-dimensional section can be cut one or more surface of this object materials or be positioned at a surface of this object materials.Use the known computerized algorithm of those skilled in the art, the cubical array of the first, second, third and the 4th intensity level that obtains from the scanning by this object one dimension basically can obtain the accurate three dimensional representation of this object.The three dimensional representation of this object materials can comprise the expression on one or more surface of this object materials.If the out of focus image correcting of wishing has exceeded the compensation that present device can be accomplished in first and second arrays of the component value of the amplitude of the detecting light beam of scattering, this computerized algorithm can comprise known computing machine deconvolution of those skilled in the art and integral equation inversion technique.

A modification according to second embodiment, the invention provides a kind of being used for by will be from an optical radiation imaging broadband, spatial spread, the incoherent line source in space to a source slit, come from an out of focus image, to identify a method and apparatus at burnt image, it comprises equipment and the electronic processing device of previous described second embodiment, wherein the linear array of the source pin hole of second embodiment is substituted by this source slit, and the linear array of the spatial filter pin hole of second embodiment is substituted by a spatial filter slit.The direction of this source slit and this spatial filter slit is perpendicular to the plane of being determined by this dispersion element.

The element of the array of the measurement of first and second component values of the amplitude of the detecting light beam of scattering wavenumber filtering, spatial filtering is the value of quadrature component and like this, in a complex constant, be given on the plane of two-dimensional array of this detector pinhole at one of the complex amplitude of the detecting light beam of Jiao's scattering this wavenumber filtering, spatial filtering and accurately measure, deleted basically from the influence of the light of out of focus image.Use the known computerized algorithm of those skilled in the art, do not need scanning, can obtain the accurate two-dimensional representation of a two-dimensional section of this object materials.This two-dimensional section is selecteed by each auto-orientation of the optical axis of this source slit and this finder lens.Use the known computerized algorithm of those skilled in the art, the cubical array of the first, second, third and the 4th intensity level that obtains from the scanning by this object materials one dimension can obtain the accurate three dimensional representation of this object materials.The scanning of this object materials realizes by using by this computer-controlled shifter systematically mobile this object materials in one dimension.If desirable out of focus image correcting has exceeded the compensation that present device can be accomplished, then this computerized algorithm can comprise known computing machine deconvolution of those skilled in the art and integral equation inversion technique.

The alternate embodiment of first and second preferred embodiments of the present invention comprised use additional optical devices and the electronic processing device substantially the same to improve and/or the ability of optimization signal to noise ratio (S/N ratio) with the electronic processing device that adopts in the major equipment of first and second preferred embodiments of the present invention.These additional optical devices comprise the path of the modification that is used for reference beam and detecting light beam, thereby can with respect to or the detector pinhole of the selection of first embodiment or second embodiment on the amplitude of detecting light beam of scattering wavenumber filtering, spatial filtering of imaging, regulate be used for or the detector pinhole of selecting of first embodiment or second embodiment on the amplitude of reference beam of reflection wavenumber filtering, spatial filtering that focuses on.

According to the 3rd embodiment of the present invention, provide have improve and optimize signal to noise ratio (S/N ratio) device be used for a kind of method and apparatus of differentiating out from the complex amplitude of out of focus image at the complex amplitude of burnt image, this equipment comprises equipment and optical devices of aforementioned first embodiment, and the latter is used for respect to being become image to regulate the amplitude of reflected reference beam wavenumber filtering, spatial filtering on the detector pinhole that is focused on selection at the amplitude of scatter sounding light beam wavenumber filtering, spatial filtering on the detector pinhole of selecting.Light from space, broadband incoherent point source is focused on the light source pin hole.Collimated and one first phase shifter of guiding from the light of light source pin hole ejaculation.The phase place of a first of collimated ray is moved and produces one first amount of phase shift light, and the phase place of a second portion of collimated ray is moved and produces one second amount of phase shift light.

First and second amounts of phase shift light incide on one first beam splitter.A first of phase shift light first amount sees through first beam splitter, forms one first amount of detecting light beam, and a second portion of phase shift light first amount is formed one first amount of reference beam by first beam splitter reflection.A first of phase shift light second amount sees through first beam splitter, forms one second amount of detecting light beam, and a second portion of phase shift light second amount is formed one second amount of reference beam by first beam splitter reflection.First and second amounts of detecting light beam are focused on one the first detecting light beam spot.First and second amounts of reference beam are focused on one the first reference beam spot.

Collimated and one second beam splitter of guiding of light of detecting light beam first amount that penetrates from the first detecting light beam spot.The part of this collimated ray sees through second beam splitter, forms one the 3rd amount of detecting light beam.Collimated and guiding second beam splitter of light of detecting light beam second amount that penetrates from the first detecting light beam spot.The part of this collimated ray sees through second beam splitter, forms one the 4th amount of detecting light beam.The light of detecting light beam third and fourth amount is directed to one second phase shifter.The light of detecting light beam the 3rd amount sees through second phase shifter, and its phase place is moved, and forms one the 5th amount of detecting light beam.The light of detecting light beam the 4th amount sees through second phase shifter, and its phase place is moved, and forms one the 6th amount of detecting light beam, and the clean phase-shift phase that first and second phase shifters are given birth to detecting light beam the 5th and the 6th volume production is identical.

Collimated and one the 3rd phase shifter of guiding of light of reference beam first amount that penetrates from the first reference beam spot measures as the 3rd of reference light beam and to penetrate.Collimated and guiding the 3rd phase shifter of light of reference beam second amount that penetrates from the first reference beam spot measures as the 4th of reference light beam and to penetrate, and the first clean phase-shift phase of giving birth to for reference beam third and fourth volume production with the 3rd phase shifter is identical.The part of reference beam the 3rd amount is formed one the 5th amount of reference beam by one the 3rd beam splitter reflection.The part of reference beam the 4th amount is formed one the 6th amount of reference beam by the 3rd beam splitter reflection.The collimation reference beam the 5th and the 6th the amount by one with reference to lens focus on one second reference beam spot on the reference mirror.

The line chart that the detecting light beam the 5th of collimation and the 6th amount are focused in the object materials by a finder lens resembles, and comes the illuminated objects material thus.This line chart resemble approx along the optical axis of this finder lens be aligned and this line chart resemble along the length of this optical axis by for example this finder lens depth of focus and the combination of the factor of the optical bandwidth of aberration and this light source be determined.。

Reflection and/or the scattered beam along the 5th and the 6th amount of the detecting light beam of finder lens direction that penetrate from illuminated object form a scatter sounding light beam.The scatter sounding light beam is detected collimated and guiding second phase shifter.The phase place of a first of this collimated ray is moved, and produces one first scatter sounding amount of beam of phase shift light, and the phase place of a second portion of collimated ray is moved, and produces one second scatter sounding amount of beam of phase shift light.The light of the first and second scatter sounding amount of beam is directed to second beam splitter.The part of the first and second scatter sounding amount of beam is formed the 3rd amount and the 4th amount of scatter sounding light beam respectively by second beam splitter reflection.The collimated ray of scatter sounding light beam third and fourth amount is focused on the spatial filter pin hole by a space filter lens.

The edge that the second reference beam spot from the reference mirror penetrates forms a reflected reference beam with reference to the reflection ray of lens direction, and it is collimated and be directed on the 3rd beam splitter with reference to lens by this then.The part of reflected reference beam sees through the 3rd beam splitter, incides on one the 4th phase shifter.The phase place of a first of transmitted light beam is moved, and produces one first reflected reference beam amount of phase shift light.The phase place of a second portion of transmitted light beam is moved, and produces one second reflected reference beam amount of phase shift light.The light of the first and second reflected reference beam amounts is directed to second beam splitter.The part of the first and second reflected reference beam amounts sees through second beam splitter, forms third and fourth amount of reflected reference beam respectively.The collimated ray of reflected reference beam third and fourth amount is focused on the spatial filter pin hole by space filter lens.

Each the 3rd amount of the detecting light beam of this scattering and the part of the 4th amount are measured with third and fourth of the spatial filtering of the detecting light beam that forms scattering respectively by this spatial filter pin hole.Third and fourth amount of the spatial filtering of the detecting light beam of this scattering is collimated and be directed to a chromatic dispersion element, preferably a reflecting diffraction grating by a chromatic dispersion element lens.

Each the 3rd amount of the reference beam of this reflection and the part of the 4th amount are measured with the 3rd amount and the 4th of the spatial filtering of the reference beam that forms reflection respectively by this spatial filter pin hole.The 3rd amount of the spatial filtering of the reference beam of this reflection and the 4th amount by these dispersion element lens collimated be directed to this dispersion element.

The part of third and fourth amount of each spatial filtering of the detecting light beam of the scattering of penetrating from this dispersion element forms third and fourth amount wavenumber filtering, spatial filtering of the detecting light beam of scattering respectively by a detector lens.Third and fourth amount wavenumber filtering of the detecting light beam of this scattering, spatial filtering is focused to form a line chart on a plane of a linear array that comprises detector pinhole by this detector lens and resembles.The part of third and fourth amount of each spatial filtering of the reference beam of the reflection of penetrating from this dispersion element is by third and fourth amount wavenumber filtering, spatial filtering of this detector lens with the reference beam that forms reflection respectively.Third and fourth amount wavenumber filtering of the reference beam of this reflection, spatial filtering is focused to form a line chart on the plane of the linear array that comprises this detector pinhole by this detector lens and resembles.

By the intensity of the lap of third and fourth amount wavenumber filtering, spatial filtering of the reference beam of the third and fourth amount wavenumber filtering of the detecting light beam of the scattering of these detector pinhole transmissions, spatial filtering and reflection first array as the intensity level of measuring, this many pixels detecting device comprises the linear array of a pixel by the detectors measure of pixel more than.The phase place of third and fourth amount wavenumber filtering of the reference beam of reflection, spatial filtering is moved third and fourth amount of π radian with first phase shift, wavenumber filtering, the spatial filtering of the reference beam that forms reflection by the 5th phase shifter.By this many pixels detectors measure by the intensity of the lap of third and fourth amount of first phase shift, wavenumber filtering, the spatial filtering of the third and fourth amount wavenumber filtering of the detecting light beam of the scattering of these detector pinhole transmissions, spatial filtering and reference beam second array as the intensity level of measuring.

The phase place of third and fourth amount wavenumber filtering of the reference beam of reflection, spatial filtering is moved third and fourth amount of additional-pi/2 radian with second phase shift, wavenumber filtering, the spatial filtering of the reference beam that forms reflection respectively by the 5th phase shifter.By this many pixels detectors measure by the intensity of the lap of third and fourth amount of second phase shift, wavenumber filtering, the spatial filtering of the reference beam of the third and fourth amount wavenumber filtering of the detecting light beam of the scattering of these detector pinhole transmissions, spatial filtering and reflection tri-array as the intensity level of measuring.

The phase place of third and fourth amount wavenumber filtering of the reference beam of reflection, spatial filtering is moved third and fourth amount of additional π radian with the 3rd phase shift, wavenumber filtering, the spatial filtering of the reference beam that forms reflection respectively by the 5th phase shifter.By this many pixels detectors measure by the intensity of the lap of third and fourth amount of the 3rd phase shift, wavenumber filtering, the spatial filtering of the reference beam of the third and fourth amount wavenumber filtering of the detecting light beam of the scattering of these detector pinhole transmissions, spatial filtering and reflection the 4th array as the intensity level of measuring.

The element of first and second arrays of the component value of the amplitude of the detecting light beam of scattering this wavenumber filtering, spatial filtering is the value of quadrature component and like this, provides on the plane of these detector pinhole the accurate measurement at the complex amplitude of the detecting light beam of this scattering of Jiao in a complex constant.Influence from the light of out of focus image is cancelled basically.Use the known computerized algorithm of those of skill in the art in this computing machine and present technique field, do not need object materials is scanned, can obtain an accurate one-dimensional representation of a line segment of this object materials.The direction of this line segment is on the direction of the optical axis of this finder lens.Use the known computerized algorithm of those of skill in the art in this computing machine and present technique field, the accurate two and three dimensions that obtains this object materials from two peacekeeping cubical arraies by the first, second, third and the 4th array of the intensity level of this object materials of scanning measurement of obtaining a peacekeeping two dimension is represented respectively.The scanning of this object materials is systematically moved this object materials respectively by this computer-controlled shifter and is realized by using in a peacekeeping two dimension.If the out of focus image correcting of wishing has exceeded the compensation that present device can be accomplished in first and second arrays of the component value of the amplitude of the detecting light beam of scattering, this computerized algorithm can comprise known computing machine deconvolution of those skilled in the art and integral equation inversion technique.

In the 3rd embodiment, can be adjusted or improve and/or optimize about the signal to noise ratio (S/N ratio) of measuring desired complex amplitude.This optimization is to realize by the ratio between third and fourth amplitude of measuring wavenumber filtering, spatial filtering of the reflected reference beam on the reflection/transmission character that changes first, second, third the beam splitter amplitude of regulating third and fourth amount wavenumber filtering, spatial filtering that focuses on the scatter sounding light beam on the detector pinhole of selecting and the detector pinhole that focuses on this selection.

According to the 4th embodiment of the present invention, providing one, have can be by from a broadband, spatial spread, the optical radiation of the noncoherent light source in space becomes image to regulate and/or optimize the device of signal to noise ratio (S/N ratio) to the linear array of a light source pin hole, be used for a kind of method and apparatus of differentiating out from the complex amplitude of out of focus figure image at the complex amplitude of Jiao image, this equipment comprises equipment and the electronic processing device of above-mentioned the 3rd embodiment, just wherein the light source pin hole of the 3rd embodiment is replaced by the linear array of a light source pin hole, the spatial filter pin hole of the 3rd embodiment is replaced by the linear array of a spatial filter pin hole, and the linear array of the detector pinhole of the 3rd embodiment and many pixels detecting device are replaced by a two-dimensional array of detecting device pin hole with by the detecting device of pixel more than that the two-dimensional array of a pixel is formed.The direction of the linear array of the linear array of this light source pin hole and this spatial filter pin hole is perpendicular to the plane of being determined by this dispersion element.The image of linear array that the two-dimensional linear array of these detector pinhole and these detecting device pixels is used in the light source pin hole in the focal plane of this many pixels detecting device is orientated.

The element of the array of the measurement of first and second component values of the amplitude of the detecting light beam of scattering this wavenumber filtering, spatial filtering is the value of quadrature component and like this, provides on the plane of two-dimensional linear array of these detector pinhole the accurate measurement at the complex amplitude of the detecting light beam of this scattering of Jiao in a complex constant.Influence from the light of out of focus image is cancelled basically.Use the known computerized algorithm of those of skill in the art in this computing machine and present technique field, do not need object materials is scanned, can obtain an accurate two-dimensional representation of a two-dimensional section of this object materials.This two-dimensional section is selecteed by the orientation of the optical axis of the linear array of these light source pin holes and this finder lens.Use the known computerized algorithm of those of skill in the art in this computing machine and present technique field, obtain the accurate three dimensional representation of this object from cubical array by the first, second, third and the 4th intensity level that obtains of this object materials of scanning one dimension.If the out of focus image correcting of wishing has exceeded the compensation that present device can be accomplished in first and second arrays of the component value of the amplitude of the detecting light beam of scattering, this computerized algorithm can comprise known computing machine deconvolution of those skilled in the art and integral equation inversion technique.

In the 4th embodiment, can be adjusted or improve and/or optimize about the signal to noise ratio (S/N ratio) of measuring desired complex amplitude.This adjustment or improvement and/or optimization are to realize by the ratio between third and fourth amplitude of measuring wavenumber filtering, spatial filtering of the reflected reference beam on the reflection/transmission character that changes first, second, third the beam splitter amplitude of regulating third and fourth amount wavenumber filtering, spatial filtering that focuses on the scatter sounding light beam on the detector pinhole of selecting and the detector pinhole that focuses on this selection.

A modification according to the 4th embodiment, the invention provides a kind of being used for by will be from an optical radiation imaging broadband, spatial spread, the incoherent line source in space to a source slit, come from an out of focus image, to identify a method and apparatus at burnt image, it comprises equipment and the electronic processing device of previous described the 4th embodiment, wherein the linear array of the source pin hole of the embodiment of department is substituted by this source slit, and the linear array of the spatial filter pin hole of the 4th embodiment is substituted by a spatial filter slit.The direction of this source slit and this spatial filter slit is perpendicular to the plane of being determined by this dispersion element.

The element of the array of the measurement of first and second component values of the amplitude of the detecting light beam of scattering wavenumber filtering, spatial filtering is the value of quadrature component and like this, in a complex constant, be given on the plane of two-dimensional array of this detector pinhole at one of the complex amplitude of the detecting light beam of Jiao's scattering this wavenumber filtering, spatial filtering and accurately measure, be cancelled basically from the influence of the light of out of focus image.Use the known computerized algorithm of those skilled in the art, do not need scanning, can obtain the accurate two-dimensional representation of a two-dimensional section of this object materials.This two-dimensional section is selecteed by each auto-orientation of the optical axis of this source slit and this finder lens.Use the known computerized algorithm of those skilled in the art, the cubical array of the first, second, third and the 4th intensity level that obtains from the scanning by this object materials one dimension can obtain the accurate three dimensional representation of this object materials.The scanning of this object materials realizes by using by this computer-controlled shifter systematically mobile this object materials in one dimension.If desirable out of focus image correcting has exceeded the compensation that present device can be accomplished, then this computerized algorithm can comprise known computing machine deconvolution of those skilled in the art and integral equation inversion technique.

According to the above first, second, third and the 4th embodiment and modification thereof, equipment of the present invention adopts a finder lens, and the focusing range that this finder lens can have as an expansion of the function of wavelength keeps high transverse spatial resolution for frequency component simultaneously.By adopt focal length be designed to depend on lens of wavelength, focusing range can be expanded exceed by be used for a single wavelength the scope of numerical aperture definition of finder lens.Well known to a person skilled in the art technology by use, this wavelength dependency can be designed in these lens.These technology comprise the design of the lens multiplet of being made up of the refractive material of different chromatic dispersions.These lens design can also comprise zone plate.If the use zone plate, this finder lens unit preferably is designed to the order by these zone plates, in the major part of a beam component of a setted wavelength on focus.These zone plates can be generated by holographic technique.Be to obtain advantage, must comprise the characteristic of the characteristic of mating this finder lens, a wavelength bandwidth that promptly has the wavelength coverage that is matched with this finder lens from the light beam of light source at the focal range of expansion.

This first, second, third and the 4th embodiment and modification thereof comprise first group of embodiment.This second group of embodiment comprises the 5th, the 6th, the 7th and the 8th embodiment and modification thereof.Five, the 6th, the 7th and the 8th embodiment and modification thereof correspond respectively to the structure of some modification of the first, second, third and the 4th embodiment and modification thereof, wherein, have one axially or the finder lens of first finder lens of first group of embodiment of longitudinal chromatic aberration with lateral chromatic aberration replace.This has these embodiments and the modification thereof of the finder lens of lateral chromatic aberration for second group of embodiment, generating a line chart in object materials resembles, its approximately perpendicular to the optical axis of finder lens separately be aligned, and in fact the figure image point of this line chart elephant is obtained simultaneously.

Perpendicular to the length of the line chart elephant of the optical axis of finder lens separately by for example separately the focal length of finder lens and separately the combination of the factor of the optical bandwidth of the amplitude of the lateral chromatic aberration of finder lens (this two factor can be conditioned) and light source determined.

The 3rd group of embodiment comprises the 9th, the tenth, the 11 and 12 embodiment and modification thereof.Nine, the tenth, the 11 and 12 embodiment and modification thereof correspond respectively to the structure of some other the modification of the first, second, third and the 4th embodiment and modification thereof.Wherein be not combined with the multicomponent phase shifter.The removal of this multicomponent phase shifter has reduced the minimizing of background of out of focus image and the degree of compensation for the 3rd group of embodiment.The finder lens that is used for the 3rd group of embodiment has axial chromatic aberration, generates a line chart and resemble in an object materials.This line chart resembles approx and is acquired simultaneously basically along the optical axis alignment of the finder lens with axial chromatic aberration and the figure image point of this line chart elephant.

The 4th group of embodiment comprises the 13rd, 14,15 and 16 embodiment and modification thereof.13rd, the 14th, the 15th and 16 embodiment and modification thereof correspond respectively to the structure of some other the modification of the 5th, the 6th, the 7th and the 8th embodiment and modification thereof.Wherein be not combined with the multicomponent phase shifter.The removal of this multicomponent phase shifter has reduced the minimizing of background of out of focus image and the degree of compensation for the 4th group of embodiment.The finder lens that is used for the 4th group of embodiment has axial chromatic aberration, generates a line chart and resemble in an object materials.This line chart resembles the optical axis alignment that is orthogonal to the finder lens with axial chromatic aberration approx and the figure image point of this line chart elephant is acquired basically simultaneously.

The 5th group of embodiment comprises the 17th, 18,19 and 20 embodiment and modification thereof.17th, the 18th, the 19th and 20 embodiment and modification thereof correspond respectively to the structure of the first, second, third and the 4th embodiment and modification thereof second group some other modification.The finder lens that wherein has axial chromatic aberration is not had the finder lens of axial chromatic aberration to substitute basically.The visual nominal ground that is generated in an object materials by the 5th group embodiment is a bit visual.Identical with minimizing and degree of compensation for these embodiment of the 5th group of embodiment and modification thereof from the background of out of focus image for these embodiment of first group of embodiment and modification thereof from the minimizing of the background of out of focus image and degree of compensation.These embodiment of the 5th group of embodiment and the figure image point of modification thereof sequentially are acquired in time.

According to these embodiment and the modification thereof of the 5th group of embodiment, for many optical frequencies component of light source, scalable and/or optimization signal to noise ratio (S/N ratio).This realizes by following means: with reference to and/or the path of reflected reference beam in, preferably and/or the emission of in the path of this detection and/or scatter sounding light beam, placing a wavelength filter and constituting this wavelength filter to have a certain wavelengths correlativity and regulate and/or the ratio of the detecting light beam of the reference beam of reflection wavenumber filtering, spatial filtering of the detector pinhole of optimization transmission by being used for different wave length separately and scattering wavenumber filtering, spatial filtering.When the detecting light beam by detection in this object materials and scattering has strong attenuation, this feature is useful especially.

Each embodiment and modification thereof for these five groups of embodiment, have one to be used for that information is written to one and to comprise the method and apparatus that the embodiment of correspondence of object materials of a recording medium or each embodiment that modification is used for write information and modification thereof comprise a corresponding embodiment or modification, except the variation of following structure: this light source and reference mirror subsystem are changed mutually and this detecting device and detector pinhole are replaced by a catoptron, wherein this catoptron will be led back to himself basically from the light of light source projects on this catoptron, the time that has a reflectivity of introducing by the catoptron of configuration together with a phase shift program go up and the space on the degree of correlation and the time goes up and the space on dependent phase shift in object materials, to generate the image of expectation.For these embodiment and the modification thereof of these five groups of embodiment, this phase shift procedure is carried out and is introduced a sequence phase shift to obtain the similar function of program of the first, second, third and the 4th intensity level of measuring in the reference beam of reflection wavenumber filtering, spatial filtering.

For described herein write embodiment and modification thereof certain some, a unit binary format is used with the given position canned data in object materials.Described herein write embodiment and modification thereof certain some in, by each the data storage position in an amplitude or amplitude and phase recording medium with the basic N form that is used for amplitude or be used for amplitude and (basic N) * (basic M) form of phase information carries out record, obtain than these embodiment and modification thereof certain some in more highdensity information stores.

Those skilled in the art can understand under the prerequisite that does not exceed scope and spirit of the present invention, realize with also available phase-sensitive detection of program and the heterodyne Detection Technique that obtains the first, second, third and the 4th intensity level of measuring for the embodiment of application and the sequence phase shift of introducing in the reference beam of reflection wavenumber filtering, spatial filtering of modification thereof.For example, by 0, π ,-phase shift procedure that four discrete phase-shift value of pi/2 and π radian are formed can be substituted by the sinusoidal phase transformation in the amplitude ss of frequencies omega.First and second component values of the complex amplitude of the detecting light beam of scattering this wavenumber filtering, spatial filtering are by detected first and second harmonic waves that are respectively ω of phase-sensitive detection.This amplitude ss is selected so that high sensitivity to both detections of first and second harmonic waves is arranged.In second example, the frequency of reference beam for example is shifted by an acousto-optic modulator with respect to the frequency of detecting light beam, and first and second component values of the complex amplitude of the detecting light beam of scattering this wavenumber filtering, spatial filtering are acquired by the heterodyne detection.

Those skilled in the art can understand be used for information be written to the embodiment of CD and modification thereof can a binary format in the memory bit write information.Those skilled in the art also can understand be used for that information is written to these embodiment of CD and modification thereof can be in a memory point (memeory site) with the basic N form that is used for amplitude or be used for amplitude and the form writing information of (basic N) * (basic M) form of phase place or treat the conversion of (basic N) * (basic M) form of stored information, for example conversion of Fourier transform or Hilbert transform as employing.

Those skilled in the art can understand information and can be stored in the medium and canned data is retrieved by measuring a variation by the polarization state of the detecting light beam of object materials transmission or scattering by magneto-optic effect.

Those skilled in the art can understand also can be when keeping static in object materials in the scanning of these embodiment of these five groups of embodiment and modification thereof and the expectation that writes the object materials in embodiment and the modification thereof that is associated, the image of the pin hole of light source separately in the scanning object material, the linear array of light source pin hole or light source slit and being implemented.

Should be appreciated that, " enabling technology (enabling technology) " of the present invention is applicable to any electromagnetic radiation and for example used electron beam in the electron microscope, even is applicable to and can obtains the collimation lens that is fit to, the sound wave that becomes image lens and phase shifter.What wherein survey for those is the application of light beam vibration amplitude rather than beam intensity, and the function that can produce amplitude square must be arranged in the electronic processing of detector back.

Should be appreciated that the lateral chromatic aberration of depth of focus and/or axial chromatic aberration or finder lens that the length of the line chart elephant in the object materials can be by Change Example such as finder lens has optical bandwidth change is changed of necessary light source.

Under the situation of the second or the 4th preferred embodiment or their modification separately, line source need be on the direction of line source the space incoherent to obtain the systematic error of minimizing, although systematic error is lower generally when using the incoherent line source in a space.

Be on the depth direction of CD one line segment of imaging simultaneously basically with respect to certain some the advantage of first and the 3rd group of embodiment that reads a multilayer, many marks road CD, have the statistical error of remarkable minimizing and have with a sequence measuring that carries out with prior art single needle hole confocal interference microscopy or holography in the background that obtains from the out of focus image compare remarkable minimizing or identical background from the out of focus image.Simultaneously imaging one line segment can be used the sensitivity of the motion of the CD that generates with the vibration that reduces widely the irregularity degree of the rotation by CD on depth direction, CD and/or CD on the depth direction of CD.One line segment of imaging simultaneously also can be used for discerning a reference surface with the information of obtaining simultaneously from multilayer on the depth direction of CD, and this reference layer is used as the purpose of registration.

Be on the depth direction of wafer one line segment of imaging simultaneously basically with respect to the advantage of some embodiment of first and the 3rd group of embodiment of the chromatographical X-ray complex amplitude image of a wafer that uses in the manufacturing that is provided at integrated circuit, have the statistical error of remarkable minimizing and have with a sequence measuring that carries out with prior art single needle hole confocal interference microscopy or holography in the background that obtains from the out of focus image compare remarkable minimizing or identical background from the out of focus image.One line segment of imaging simultaneously can be used to reduce widely the sensitivity of moving, scan or vibrate the motion of the wafer that generates by for example wafer on depth direction on the depth direction of wafer.Also can be used for discerning a surface of this wafer and/or the surface in this wafer at one line segment of imaging simultaneously on the depth direction of wafer with the information of obtaining simultaneously from a plurality of degree of depth.

With respect to the chromatography X ray complex amplitude image that the biological sample under the natural conditions is provided, some a advantage of certain of first and the 3rd group of embodiment of one image that can be used in a non-invasive biopsy samples of biological sample is on the depth direction at biological sample one line segment of imaging simultaneously basically, have the statistical error of remarkable minimizing and have with a sequence measuring that carries out with prior art single needle hole confocal interference microscopy or holography in the background that obtains from the out of focus image compare remarkable minimizing or identical background from the out of focus image.Simultaneously imaging one line segment can be used to reduce the sensitivity to the motion of the biological sample that is generated by biological example movement of sample, scanning or vibration on depth direction widely on the depth direction of biological sample.Also can be used for discerning a surface of this biological sample and/or the surface in this biological sample at one line segment of imaging simultaneously on the depth direction of biological sample with the information of obtaining simultaneously from a plurality of degree of depth.

Be a two-dimensional section of this CD of imaging simultaneously basically with respect to another some other advantage of first and the 3rd group of embodiment that reads a multilayer, many marks road CD, have the statistical error of remarkable minimizing and have with a sequence measuring that carries out with prior art single needle hole confocal interference microscopy or holography in the background that obtains from the out of focus image compare remarkable minimizing or identical background from the out of focus image.The orthogonal axes that of this two-dimensional section of this CD is parallel to this two-dimensional section of the depth direction of this CD and this CD can or be parallel to this CD radially or be parallel to the tangent line in a mark road in this CD.The imaging simultaneously of the two-dimensional section of this CD can be used the sensitivity of the motion of the CD that generates with the vibration that reduces widely the irregularity degree of the rotation by CD that makes progress in depth direction and footpath, CD and/or CD.In the time of two-dimensional section in this CD imaging also can be used with discern in this CD or on a reference surface, it is reference layer, with one with reference to the mark road or be used and be used for carrying out the identification of mark road with the information of obtaining simultaneously in multilayer and many marks road, this reference layer and be used as the purpose of registration with reference to the mark road.

With respect to some the advantage of second and the 4th group of embodiment that reads a multilayer, many marks road CD be in imaging simultaneously basically and this CD or on the tangent line segment of one deck, have the statistical error of remarkable minimizing and have with a sequence measuring that carries out with prior art single needle hole confocal interference microscopy or holography in the background that obtains from the out of focus image compare remarkable minimizing or identical background from the out of focus image.With in this CD or on the tangent line segment of one deck the time imaging can be used sensitivity with the motion that reduces the CD that the vibration by the rotation of CD and/or CD is generated widely.With in this CD or on the tangent line segment of one deck the time imaging also can be used with the information of obtaining simultaneously from many marks road and discern one this CD with reference to the mark road, this is used as the purpose of registration with reference to the mark road.

Be a surperficial lip-deep line segment tangent or in wafer of imaging simultaneously basically and this wafer with respect to the advantage of some embodiment of first and the 3rd group of embodiment of the chromatographical X-ray complex amplitude image of a wafer that uses in the manufacturing that is provided at integrated circuit, have the statistical error of remarkable minimizing and have with a sequence measuring that carries out with prior art single needle hole confocal interference microscopy or holography in the background that obtains from the out of focus image compare remarkable minimizing or identical background from the out of focus image.Can be used to reduce sensitivity widely with imaging in a surface one lip-deep line segment tangent or in wafer of this wafer the motion of the wafer that generates by the moving of wafer, scanning or vibration.With in this wafer or on an a surface tangent two-dimensional section time imaging also can be used with the information of obtaining simultaneously from a plurality of positions discern this wafer or on a reference position, this reference position is used as the purpose of registration.

An advantage with respect to some embodiment of first and the 3rd group of embodiment of the chromatographical X-ray complex amplitude image of a wafer that uses in the manufacturing that is provided at integrated circuit is a two-dimensional section of this wafer of imaging simultaneously basically, have the statistical error of remarkable minimizing and have with a sequence measuring that carries out with prior art single needle hole confocal interference microscopy or holography in the background that obtains from the out of focus image compare remarkable minimizing or identical background from the out of focus image.A depth direction that is parallel to this wafer of this two-dimensional section of this wafer.Imaging can be used to reduce widely the sensitivity in the motion of the degree of depth and horizontal direction of the wafer that generated by the moving of wafer, scanning or vibration in the time of the two-dimensional section of this wafer.Imaging also can be used a surface or an inner surface of discerning this wafer with the information of obtaining simultaneously in other a plurality of positions in the time of the two-dimensional section of this wafer, and this surface or inner surface are used as the purpose of registration possibly.

With respect to the chromatography X ray complex amplitude image that the biological sample under the natural conditions is provided, another advantage of the other of first and the 3rd group of embodiment of one image that can be used in a non-invasive biopsy samples of biological sample is basically a two-dimensional section of this biological sample of imaging simultaneously, have the statistical error of remarkable minimizing and have with a sequence measuring that carries out with prior art single needle hole confocal interference microscopy or holography in the background that obtains from the out of focus image compare remarkable minimizing or identical background from the out of focus image.A depth direction that is parallel to this biological sample of this two-dimensional section of this biological sample.Imaging can be used to reduce widely the sensitivity in the motion of the degree of depth and horizontal direction of the biological sample that generated by the moving of biological sample, scanning or vibration in the time of the two-dimensional section of this biological sample.Imaging also can be used a surface or an inner surface of discerning this biological sample with the information of obtaining simultaneously in other a plurality of positions in the time of two-dimensional section in this biological sample, and this surface or inner surface are used as the purpose of registration possibly.

With respect to some the advantage of second and the 4th group of embodiment that reads a multilayer, many marks road CD be in imaging simultaneously basically and this CD or on the tangent line segment of one deck, have the statistical error of remarkable minimizing and have with a sequence measuring that carries out with prior art single needle hole confocal interference microscopy or holography in the background that obtains from the out of focus image compare remarkable minimizing or identical background from the out of focus image.With in this CD or on the tangent line segment of one deck the time imaging can be used sensitivity with the motion that reduces the CD that the vibration by the rotation of CD and/or CD is generated widely.With in this CD or on the tangent two-dimensional section of one deck the time imaging also can be used with the information of obtaining simultaneously from many marks road and discern one this CD with reference to the mark road, this is used as the purpose of registration with reference to the mark road.

With respect to the chromatography X ray complex amplitude image that the biological sample under the natural conditions is provided, an advantage of some of second and the 4th group of embodiment of one image that in a non-invasive biopsy samples of biological sample, can be used be basically in imaging simultaneously and this biological sample or on a surperficial tangent line segment, have the statistical error of remarkable minimizing and have with a sequence measuring that carries out with prior art single needle hole confocal interference microscopy or holography in the background that obtains from the out of focus image compare remarkable minimizing or identical background from the out of focus image.With in this biological sample or on an a surface tangent line segment time imaging can be used to reduce sensitivity widely the motion of the biological sample that generates by the moving of biological sample, scanning or vibration.With in this biological sample or on an a surface tangent line segment time imaging also can be used with the information of obtaining simultaneously from a plurality of positions and discern a reference position this biological sample, this reference position is used as the purpose of registration.

Be a two-dimensional section of this CD of imaging simultaneously basically with respect to another some other advantage of second and the 4th group of embodiment that reads a multilayer, many marks road CD, have the statistical error of remarkable minimizing and have with a sequence measuring that carries out with prior art single needle hole and slit confocal interference microscopy or holography in the background that obtains from the out of focus image compare remarkable minimizing or identical background from the out of focus image.One of this two-dimensional section of this CD be parallel to this CD radially and the orthogonal axes of this two-dimensional section of this CD can or be parallel in this CD or on the tangent line in a mark road.The imaging simultaneously of the two-dimensional section of this CD can be used with reduce widely CD that the vibration by the rotation of CD and/or CD is generated diametrically the sensitivity of motion.In this CD or on two-dimensional section the time imaging also can be used the information of obtaining simultaneously with the multiposition that is used on many marks road and this many marks road and discern one and be used for the error that reads that a given mark road was discerned and was used in the mark road with reference to the mark road, this is used as the purpose of registration with reference to the mark road.

Be to generate an one dimension line segment, a two-dimensional section or a three-dimensional portion image of a multilayer, many marks road CD with respect to the advantage of the 5th group of embodiment that reads a multilayer, many marks road CD, have the background of comparing remarkable minimizing with the background that obtains in the sequence measuring that carries out with prior art single needle hole confocal interference microscopy or holography from the out of focus image from the out of focus image.

Be to generate an one dimension line segment, a two-dimensional section or a three-dimensional portion image of a wafer with respect to the advantage of the 5th group of embodiment of the chromatographical X-ray complex amplitude image of a wafer that uses in the manufacturing that is provided at integrated circuit, have the background of comparing remarkable minimizing with the background that obtains in the sequence measuring that carries out with prior art single needle hole confocal interference microscopy or holography from the out of focus image from the out of focus image.

With respect to the chromatography X ray complex amplitude image that the biological sample under the natural conditions is provided, the advantage of the 5th group of embodiment of one image that can be used in a non-invasive biopsy samples of biological sample is to generate an one dimension line segment, a two-dimensional section or a three-dimensional portion image of this sample, has the background from the out of focus image of comparing remarkable minimizing with the background from the out of focus image that obtains in the sequence measuring that carries out with prior art single needle hole confocal interference microscopy or holography.

The advantage of preceding four groups of embodiment of the present invention is basically one line segment of imaging simultaneously, has the background from the out of focus image of comparing remarkable minimizing with the background from the out of focus image that obtains in the sequence measuring that carries out with prior art single needle hole confocal interference microscopy or holography.This basically simultaneously the imaging feature be to be called " optics wavenumber domain emission measurement art " technology (OWDR) by introducing to become possible.The minimizing of this background is by adopting the ultimate principle of pin hole confocal microscopy to become possible to an interferometry (interferometry) system.This basically simultaneously the imaging feature make and may during measuring process, generate one dimension, two and three dimensions image, have the sensitivity that reduces greatly to object of which movement.Cause serious restriction in the technology of the current employing under the situation of the measurement of the problem of this motion under the natural conditions of biosystem.In PSI and SCLI not, because the motion that vibration causes can meet with serious restriction in conjunction with technology disclosed herein.Reading multilayer, many marks road CD or writing in multilayer, the many marks road CD, the problem of the motion that this is not tracked also can cause serious restriction.

Additional benefit of the present invention is basically one two-dimensional section of imaging simultaneously, has the background from the out of focus image of comparing remarkable minimizing with the background from the out of focus image that obtains in the sequence measuring that carries out with prior art single needle hole confocal interference microscopy or holography.This basically simultaneously the imaging feature be to become possible by the technology of introducing OWDR.The minimizing of this background is by adopting the ultimate principle of slit confocal microscopy to become possible to an interferometer measuration system.This basically simultaneously the imaging feature make and may during measuring process, generate the two and three dimensions image, have the sensitivity to object of which movement of reduction greatly.As mentioned above, cause serious restriction in the technology of the current employing under the situation of the measurement of the problem of this motion under the natural conditions of biosystem.Owing to vibrate among the PSI and SCLI of the motion that causes, can meet with serious restriction.The problem of not tracked motion reading multilayer, many marks road CD or writing in multilayer, the many marks road CD, owing to also can cause serious restriction.

Be used for being written to the embodiment of a multilayer, many marks road CD and modification thereof, be on the depth direction of CD one line segment of imaging simultaneously basically corresponding to some embodiment and some the advantage of modification thereof of first and the 3rd group of embodiment, have the statistical error of remarkable minimizing and have with a sequence image that carries out with prior art single needle hole confocal interference microscopy or holographic imaging in the background that generates from the out of focus image compare remarkable minimizing or identical background from the out of focus image.Simultaneously imaging one line segment can be used the sensitivity of the motion of the CD that generates with the vibration that reduces widely the irregularity degree of the rotation by CD on depth direction, CD and/or CD on the depth direction of CD.One line segment of imaging simultaneously also can be used for generating the reference surface in this CD on the depth direction of CD, and side by side at the multilayer writing information, this reference layer is used as the purpose of registration.

Be used for being written to the embodiment of a multilayer, many marks road CD and modification thereof, be in CD one two-dimensional section of imaging simultaneously basically corresponding to other embodiment and some another advantage of modification thereof of first and the 3rd group of embodiment, have the statistical error of remarkable minimizing and have with a sequence image that carries out with prior art single needle hole and slit confocal interference microscopy or holography in the background that generates from the out of focus image compare remarkable minimizing or identical background from the out of focus image.The orthogonal axes that of this two-dimensional section of this CD is arranged essentially parallel to this two-dimensional section of the depth direction of this CD and this CD can or be basically parallel to this CD radially, be parallel to the tangent line in a mark road in this CD or be parallel between the two any direction.The imaging simultaneously of the two-dimensional section of this CD can be used the sensitivity of the motion of the CD that generates with the vibration that reduces widely the irregularity degree of the rotation by CD on depth direction and orthogonal directions, CD and/or CD.In the time of two-dimensional section in this CD imaging also can be used with generate in this CD or on a reference surface, be reference layer and with reference to the mark road, this reference layer and be used as the purpose of registration with reference to the mark road.

Be used for being written to the embodiment of a multilayer, many marks road CD and modification thereof, corresponding to second and the 4th group of embodiment some embodiment and some a advantage of modification is in imaging simultaneously basically and this CD or on the tangent line segment of one deck, have the statistical error of remarkable minimizing and have with a sequence image that carries out with prior art single needle hole confocal interference microscopy or holography in the background that generates from the out of focus image compare remarkable minimizing or identical background from the out of focus image.With in this CD or on the tangent line segment of one deck the time imaging can be used sensitivity with the motion that reduces the CD that the vibration by the rotation of CD and/or CD is generated widely.

Be used for being written to the embodiment of a multilayer, many marks road CD and modification thereof, corresponding to second and the 4th group of embodiment other embodiment and some another advantage of modification be a two-dimensional section of the CD of imaging simultaneously basically, have the statistical error of remarkable minimizing and have with a sequence image that carries out with prior art single needle hole and slit confocal interference microscopy or holography in the background that generates from the out of focus image compare remarkable minimizing or identical background from the out of focus image.One of this two-dimensional section of this CD be arranged essentially parallel to this CD radially and the orthogonal axes of this two-dimensional section of this CD can be basically parallel in this CD or on the tangent line in a mark road.The imaging simultaneously of the two-dimensional section of this CD can be used the sensitivity with the motion that reduces the CD that diametrically the vibration by the rotation of CD and/or CD is generated widely.In this CD or on two-dimensional section the time imaging also can be used to generate one and be used for mark road identification with reference to the mark road, a plurality of positions writing information on a plurality of marks road and this a plurality of marks road simultaneously, this is used as the purpose of registration with reference to the mark road.

Be used to be written to a multilayer, many marks road CD embodiment and modification thereof, be on a multilayer, many marks road CD, to generate an one dimension line segment, a two-dimensional section or a three-dimensional portion image corresponding to the embodiment of the 5th group of embodiment and an advantage of modification thereof, have the background of comparing remarkable minimizing with the background that obtains in the sequence measuring that carries out with prior art single needle hole confocal interference microscopy or holography from the out of focus image from the out of focus image.

An advantage of the present invention is to substitute as close at PCI the value of the scattering amplitude under the situation of OCT and obtains the multiple scattering amplitude of this object.With respect to the required Computer Analysis amount of one dimension, two dimension or three-dimensional image of the object materials that obtains a given type, this is a particular importance.

Another advantage is that the required Computer Processing of multiple scattering amplitude that obtains in one dimension, two dimension and three-dimensional imaging is reduced widely than required Computer Processing in the confocal system of the prior art of current employing.

Another advantage is if desired the out of focus image that has been greatly reduced in equipment of the present invention to be revised, than the scanning single needle hole of prior art and scanning slit is confocal and scanning single needle hole and scanning slit confocal interference microscopy in required Computer Processing, realize that with equipment of the present invention the required Computer Processing of correction of a given level is reduced significantly.

Another advantage is for the single light source pin hole, in embodiment separately of the present invention and modification thereof, background radiation for the contribution of the statistical noise in the multiple scattering amplitude of on the given lateral separation of a given measuring intervals of TIME in this object materials, measuring can be lowered in the confocal interference microscopy of prior art scanning single needle hole in the same time interval obtainable under, reaching basically a factor that is directly proportional with the root mean square of the quantity of independently measuring position on the axial image distance, wherein independently is for the multiple scattering amplitude of measurement.With respect to the slit confocal interference microscopy, provided a confers similar advantages, wherein Dui Ying minimizing factor is directly proportional with the root mean square of the quantity of independently measuring position on the two-dimensional section of an imaging of this object materials basically.

Another advantage is that background radiation can be reduced to from the situation of the main derivation of size institute of this multiple scattering amplitude self for the contribution of the statistical noise in the multiple scattering amplitude of the measurement of given measuring intervals of TIME on the axial distance of a given imaging.Is relatively bigger situation for the value of background radiation than the size of this multiple scattering amplitude, and this is the advantage of a particular importance.This is irrealizable in the scanning single needle hole of prior art or slit confocal microscopy.

Another advantage is some embodiment and the modification thereof for preceding four groups of embodiment, only requires basically in the scanning on the one dimension to generate a two-dimensional image and only to require the scanning on two dimension basically to generate a three-dimensional image.

Another advantage is some other embodiment and the modification thereof for preceding four groups of embodiment, requires basically the only scanning on one dimension to generate a three-dimensional image.

In a word, equipment of the present invention can be operated with (1) and reduce systematic error; (2) reduce statistical error; (3) the dynamic range requirement of minimizing detecting device, processing electron device; (4) density of the data of storing in the raising CD; (5) reduce generation or the required Computer Processing amount of an one dimension, two dimension or three-dimensional image; (6) reduce for the required Computer Processing amount of systematic error effect of revising the out of focus image; And/or (7) can carry out work when by a turbid medium imaging.Usually, one or more of these features can be implemented simultaneously.

The simple declaration of accompanying drawing

In each accompanying drawing, the similar similar element of code name representative.

Fig. 1 a-1n illustrates present preferred first embodiment from the present invention of first group of embodiment together in schematic form, Fig. 1 a illustrate

subsystem

80 and 81,81 and 82,81 and 83,82 and 81a, 83 and 81a and 81a and 84 between each light path, from computing machine 118 to shifter 116 and subsystem 83 electronic signal paths of phase shifter 44, and the detecting device from subsystem 84 114 is to the electronic signal paths of computing machine 118;

Fig. 1 b illustrates subsystem 80, and wherein the plane of Fig. 1 b is perpendicular to the plane of Fig. 1 a;

Fig. 1 c illustrates subsystem 81, and wherein the plane of Fig. 1 c is perpendicular to the plane of Fig. 1 a;

Fig. 1 d explanation enters the subsystem 82 of the situation of subsystem 82 for detecting light beam, and wherein the plane of Fig. 1 d is perpendicular to the plane of Fig. 1 a;

Fig. 1 e explanation enters the subsystem 83 of the situation of subsystem 83 for reference beam, and wherein the plane of Fig. 1 e is perpendicular to the plane of Fig. 1 a;

Fig. 1 f illustrates the subsystem 82 that leaves the situation of subsystem 82 for detecting light beam, and wherein the plane of Fig. 1 f is perpendicular to the plane of Fig. 1 a;

Fig. 1 g illustrates the subsystem 83 that leaves the situation of subsystem 83 for reference beam, and wherein the plane of Fig. 1 g is perpendicular to the plane of Fig. 1 a;

Fig. 1 h explanation enters the subsystem 81a of the situation of subsystem 81a for detecting light beam, and wherein the plane of Fig. 1 h is perpendicular to the plane of Fig. 1 a;

Fig. 1 i explanation enters the subsystem 81a of the situation of subsystem 81a for reference beam, and wherein the plane of Fig. 1 i is perpendicular to the plane of Fig. 1 a;

Fig. 1 j explanation enters the subsystem 84 of the situation of subsystem 84 for detecting light beam, and wherein the plane of Fig. 1 j is perpendicular to the plane of Fig. 1 a;

Fig. 1 k explanation enters the subsystem 84 of the situation of subsystem 84 for reference beam, and wherein the plane of Fig. 1 k is perpendicular to the plane of Fig. 1 a;

Fig. 1 l has illustrated that for by scattering of light in the subsystem 82 and/or be reflected in the subsystem 84 subsystem 82 of the situation that produces the out of focus light beam, wherein the plane of Fig. 1 l is perpendicular to the plane of Fig. 1 a;

Fig. 1 m has illustrated that for by scattering of light in the subsystem 82 and/or be reflected among the subsystem 81a subsystem 81a of the situation that produces the out of focus light beam, wherein the plane of Fig. 1 m is perpendicular to the plane of Fig. 1 a;

Fig. 1 n has illustrated the subsystem 84 that enters subsystem 84 situations for the background light beam, and wherein the plane of Fig. 1 n is perpendicular to the plane of Fig. 1 a;

Fig. 1 aa-ai is together with among Fig. 1 a-1n some, with the formal specification of summary of the present invention current preferred the 5th embodiment of second group of embodiment, Fig. 1 aa shows between beam splitter 100 and the subsystem 82aa respectively, between beam splitter 100 and the subsystem 83aa, subsystem 82aa and 85, and subsystem 83aa and 95 between light path and

electronic signal

132 and 133 paths to shifter 116 and the phase shifter 44 in the subsystem 83aa;

Fig. 1 ab has illustrated for detecting light beam and has entered the plane of subsystem 82aa and Fig. 1 ab perpendicular to the subsystem 82aa under the situation on the plane of Fig. 1 aa;

Fig. 1 ac has illustrated for detecting light beam and has entered the plane of subsystem 85 and Fig. 1 ac perpendicular to the subsystem under the situation on the plane of Fig. 1 aa 85;

Fig. 1 ad has illustrated for reference beam and has entered the plane of subsystem 83aa and Fig. 1 ad perpendicular to the subsystem 83aa under the situation on the plane of Fig. 1 aa;

Fig. 1 ae has illustrated for reference beam and has entered the plane of subsystem 95 and Fig. 1 ae perpendicular to the subsystem under the situation on the plane of Fig. 1 aa 95;

Fig. 1 af has illustrated that the detecting light beam for scattering leaves the plane of subsystem 85 and Fig. 1 af perpendicular to the subsystem under the situation on the plane of Fig. 1 aa 85;

Fig. 1 ag has illustrated that the detecting light beam for scattering leaves the plane of subsystem 82aa and Fig. 1 ag perpendicular to the subsystem 82aa under the situation on the plane of Fig. 1 aa;

Fig. 1 ah has illustrated that the reference beam for reflection leaves the plane of subsystem 95 and Fig. 1 ah perpendicular to the subsystem under the situation on the plane of Fig. 1 aa 95;

Fig. 1 ai has illustrated that the reference beam for reflection leaves the plane of subsystem 83aa and Fig. 1 ai perpendicular to the subsystem 83aa under the situation on the plane of Fig. 1 aa;

Fig. 2 a-2f is together with the second present preferred embodiment of formal specification the present invention of summary, wherein Fig. 2 a illustrate

subsystem

80a and 81,81 and 82,81 and 83,82 and 81b, 83 and 81b, 81b and 84a between light path, from computing machine 118 to shifter 116 and subsystem 83 the electronic signal paths of phase shifter 44, and the detecting device 114a from subsystem 84a is to the electronic signal paths of computing machine 118;

Fig. 2 b explanation subsystem 80a, wherein the plane of Fig. 2 b is positioned at the plane of Fig. 2 a perpendicular to the linear array of the direction of the plane of Fig. 2 a and line source and pin hole 8a;

The situation that Fig. 2 c explanation detecting light beam enters subsystem 81b, wherein the plane of Fig. 2 c is positioned at the plane of Fig. 2 a perpendicular to the linear array of the plane of Fig. 2 a and pin hole 18b;

The situation that Fig. 2 d description references light beam enters subsystem 81b, wherein the plane of Fig. 2 d is positioned at the plane of Fig. 2 a perpendicular to the linear array of the plane of Fig. 2 a and pin hole 18b;

The situation that Fig. 2 e explanation detecting light beam enters subsystem 84a, wherein the plane of Fig. 2 e is perpendicular to the plane of Fig. 2 a;

The situation that Fig. 2 f description references light beam enters subsystem 84a, wherein the plane of Fig. 2 f is perpendicular to the plane of Fig. 2 a;

Fig. 2 aa is together with among Fig. 2 a-2f some, with the formal specification of summary of the present invention current preferred the 6th embodiment of second group of embodiment, Fig. 2 aa shows between beam splitter 100 and the subsystem 82aa respectively, between beam splitter 100 and the subsystem 83aa, subsystem 82aa and 85, and subsystem 83aa and 95 between light path and

electronic signal

Fig. 3 a-3l is together with the 3rd present preferred embodiment of formal specification the present invention of summary, wherein Fig. 3 a illustrate

subsystem

80 and 81,80 and 81c, 81 and 82,81c and 83a, 82 and 81a, 83a and 81a and 81a and 84 between light path; From computing machine 118 to shifter 116 and subsystem 83a the electronic signal paths of phase shifter 44; And the detecting device from subsystem 84 114 is to the electronic signal paths of computing machine 118;

Fig. 3 b has illustrated subsystem 80, and wherein the plane of Fig. 3 b is perpendicular to the plane of Fig. 3 a;

Fig. 3 c has illustrated subsystem 81a, and wherein the plane of Fig. 3 c is perpendicular to the plane of Fig. 3 a;

The situation that Fig. 3 d explanation detecting light beam enters subsystem 82, wherein the plane of Fig. 3 d is perpendicular to the plane of Fig. 3 a;

Fig. 3 e has illustrated subsystem 81c, and wherein the plane parallel of Fig. 3 e is in the plane of Fig. 3 a;

The situation that Fig. 3 f description references light beam enters subsystem 83a, wherein the plane parallel of Fig. 3 f in the plane of Fig. 3 a and phase shifter 34 and 34a be rotated by 90 degrees around

axle

3a and 3c respectively, only be illustrative purpose;

Fig. 3 g explanation detecting light beam leaves the situation of subsystem 82, and wherein the plane of Fig. 3 g is perpendicular to the plane of Fig. 3 a;

Fig. 3 h description references light beam leaves the situation of subsystem 83a, and wherein the plane of Fig. 3 h is rotated by 90 degrees around

axle

3a and 3c respectively perpendicular to the plane of Fig. 3 a and phase shifter 34 and 34a, only is illustrative purpose;

The situation that Fig. 3 i explanation detecting light beam enters subsystem 81a, wherein the plane of Fig. 3 i is perpendicular to the plane of Fig. 3 a;

The situation that Fig. 3 j description references light beam enters subsystem 81a, wherein the plane of Fig. 3 j is perpendicular to the plane of Fig. 3 a;

The situation that Fig. 3 k explanation detecting light beam enters subsystem 84, wherein the plane of Fig. 3 k is perpendicular to the plane of Fig. 3 a;

The situation that Fig. 3 l description references light beam enters subsystem 84, wherein the plane of Fig. 3 l is perpendicular to the plane of Fig. 3 a;

Fig. 3 aa and 3ab together with the formal specification of summary from the 7th present preferred embodiment of the present invention of second group of embodiment, wherein Fig. 3 aa show between beam splitter 100 and the subsystem 82aa, between beam splitter 100 and the subsystem 83ab, subsystem 82aa and 85, and subsystem 83ab and 95 between light path and

electronic signal

132 and 133 paths to shifter 116 and the phase shifter 44 in the subsystem 83ab;

The reference beam of Fig. 3 ab explanation reflection leaves the situation of subsystem 83ab, wherein Fig. 3 ab plane parallel in the plane of Fig. 3 aa and phase shifter 34 and 34a be rotated by 90 degrees around axle 3b and 3f respectively, only be illustrative purpose;

Fig. 4 a-4f illustrates the 4th preferred embodiment that the present invention is present together in schematic form, wherein Fig. 4 a illustrate

subsystem

80a and 81,80a and 81c, 81 and 82,81c and 83a, 82 and 81b, 83a and 81b and 81b and 84a between light path, from computing machine 118 to shifter 116 and subsystem 83a the electronic signal paths of phase shifter 44, and the detecting device 114a from subsystem 84a is to the electronic signal paths of computing machine 118;

Fig. 4 b has illustrated subsystem 80a, and wherein the plane of Fig. 4 b is perpendicular to the plane of Fig. 4 a;

Fig. 4 c has illustrated that the detecting light beam of scattering enters the situation of subsystem 81b, and wherein the plane of Fig. 4 c is perpendicular to the plane of Fig. 4 a;

Fig. 4 d has illustrated the situation that the reference beam of reflection enters subsystem 81b, and wherein the plane of Fig. 4 d is perpendicular to the plane of Fig. 4 a;

Fig. 4 e has illustrated that the detecting light beam of scattering enters the situation of subsystem 84a, and wherein the plane of Fig. 4 e is perpendicular to the plane of Fig. 4 a;

Fig. 4 f has illustrated the situation that the reference beam of reflection enters subsystem 84a, and wherein the plane of Fig. 4 f is perpendicular to the plane of Fig. 4 a;

Fig. 4 aa is together with among Fig. 4 a-4f some, with the formal specification of summary from the 8th present preferred embodiment of the present invention of second group of embodiment, wherein Fig. 4 aa show between beam splitter 100 and the subsystem 82aa, between beam splitter 100 and the subsystem 83ab, subsystem 82aa and 85, and subsystem 83ab and 95 between light path and

electronic signal

Fig. 5 illustrates one and has four geometric layouts that become the reflection confocal microscope of image area;

Fig. 6 is the synoptic diagram according to the amplitude of the out of focus image in the pin hole plane of the spatial filtering of the modification of four preferred embodiments of the present invention and these preferred embodiments of the present invention thereof;

Fig. 7 is the synoptic diagram according to the reference beam amplitude of the reflection of one in the spatial filtering pin hole plane of the modification of four preferred embodiments of the present invention and these preferred embodiments of the present invention thereof;

Fig. 8 a-8c relates to the slabstone typography and the application thereof of making integrated circuit, and wherein Fig. 8 a is to use the summary synoptic diagram of a slabstone typography exposure system of this confocal interference microscopy system, and Fig. 8 b and 8c are the process flow diagrams of describing the step of making integrated circuit; And

Fig. 9 is to use the summary synoptic diagram of a mask (mask) checking system of this confocal interference microscopy system.

Detailed description of the present invention

The present invention can be reflected an element of volume by the three-dimensional body material space and/or the complex amplitude of the light of scattering is separated with the complex amplitude of the bias light that is produced by the overlapping out of focus image that is positioned at the structure on measured body element the place ahead, rear and the limit.Illustrated chromatographic technique can and be come by " background " and " prospect " complex amplitude Signal Separation that various mechanism produced the hope complex amplitude signal in the image plane.These backgrounds with prospect complex amplitude signal can be: do not become a line segment of image or the out of focus image of the part of two-dimensional section in (1) object materials, (2) wish the scattered signal of amplitude signal, (3) be derived from the scattering of signal of the light source of a non-line segment that becomes image or two-dimensional section, and/or (4) heat radiation.Scattering place and infrared source may the position in the place ahead, rear and/or the space wherein of a line segment of the tested object of object or two-dimensional section.

Technology of the present invention realizes with two kinds of different a kind of ranks in the discriminating rank of out of focus image.In first rank (rank 1), the impulse response function of the one-tenth image subsystem of equipment of the present invention is by import the phase change patterns of one dimension respectively on the pupil of each subsystem of present device and operated in a plane.In second rank (rank 2), the impulse response function of the one-tenth of equipment of the present invention image subdivision is operated in two plane orthogonal by import the phase change patterns of two dimension respectively on the pupil of each subsystem.The realization of rank 2 is implemented in the out of focus image from more effective aspect differentiating out at burnt image than rank 1.Any one preferred embodiment described herein can be realized the discriminating of rank 1 and rank 2.

The technology that enables of the present invention, no matter, all be common for being configured to rank 1 or each preferred embodiment of the present device of rank 2 discriminatings, but each preferred embodiment explanation technology that enables of the present invention of only rank 1 being differentiated here.Rank 1 differentiates that being based on one of an orthogonal plane specifically is orientated, and has wherein realized the impulse response function of imaging subsystem.Wherein the selection of the orientation of operated this orthogonal plane of impulse response function of imaging subsystem is influential to the minimizing degree of the influence of statistical error to the background light beam of realizing in equipment of the present invention.

With reference to the detailed content of each accompanying drawing, Fig. 1 a-1n illustrates the first present preferred embodiment of the present invention in schematic form.Shown in Fig. 1 a-1n, the preferred embodiment of the present invention is an interferometer, comprising a beam splitter 100, object materials 112, shifter 116, reference mirror 120, chromatic

dispersion detector element

130a and 130b and a detecting device 114.Be called Michelson interferometer in this structure in the art, what illustrate here is a simple example.Other forms of this interferometer known in the art for example have the polarization Michelson interferometer, paper " DifferentialInterferometer Arrangements for Distance and AngleMeasurements:Principles; Advantages; and Applications (the differential interferometer layout that is used for distance and measurement of angle: principle; advantage and application) " (VDIBerichte NR/749 at C.Zanoni (Zha Nuoni), 93-106,1989) have illustratedly in, can use its in the equipment of Fig. 1 a-1n and can obviously not depart from the spirit and the category of first preferred embodiment of the invention.

The orientation on the wherein operated plane of impulse response function of an imaging subsystem in first preferred embodiment is perpendicular to the plane of Fig. 1 a and be parallel to the optical axis of this imaging subsystem.

Fig. 1 b illustrates an embodiment of the subsystem 80 shown in Fig. 1 a in schematic form.The plane of Fig. 1 b is perpendicular to the plane of Fig. 1 a.For first preferred embodiment, light source 10 a preferably pointolite or its surface radiation everywhere is the noncoherent light source in space, preferably laser instrument or similarly coherent source, or partial coherence radiating light source, and preferably one surpass the irradiation laser device, be preferably polarization.Light source 10 sends the input beam 2 that the optical axis 3 with subsystem 80 aligns.Shown in Fig. 1 b, input beam 2 enters condenser lens 6 and is focused on the pin hole 8 in the image plane 7.Disperse out from pin hole 8 by a plurality of light beam 12-1 ,-2 ,-3 ,-4 light beams of being formed 12, enter the lens 16 of its optical axis alignment in the optical axis 3 of subsystem 80.Light beam 12 becomes collimated light beam 12A when lens 16 penetrate, the latter is made up of light beam 12A-1 ,-2 ,-3 ,-4, and collimated light beam 12A enters phase shifter 14.Phase shifter 14 comprises some rectangle phase shifter 14-1 ,-2 ,-3 ,-4, and their optical axises separately all are parallel to the optical axis 3 of subsystem 80.The number that is noted that these phase shifters can be any suitable several 2m, and wherein m is an integer.Institute's example is the situation of m=2 among Fig. 1 b, and the situation of 4 phase shifters has been enough to clearly illustrate the relation between each parts of present device.Parallel beam 12A-1 ,-2 ,-3 ,-4 sees through phase shifter 14-1 ,-2 ,-3 ,-4 respectively, becomes light beam 12B-1 ,-2 ,-3 ,-4 during outgoing respectively, total formation light beam 12B.Phase shifter 14-2 and 14-4, the π of the manying radian that the phase-shift phase that is imported is imported than phase shifter 14-1 and 14-3 respectively, and phase shifter 14-1 is identical with the phase-shift phase that 14-3 is imported.

In Fig. 1 a, light beam 12B enters subsystem 81 from subsystem 80 ejaculations.Light beam 12B enters lens 26 in Fig. 1 C, and lens 26 have an optical axis of aiming at the optical axis 3 of subsystem 81, becomes during outgoing by light beam 12C-1 ,-2 ,-3 ,-4 light beam 12C that formed.The plane of Fig. 1 c is perpendicular to the plane of Fig. 1 a.Lens 26 make light beam 12C be focused into figure image point 18 in burnt image plane 17.Light beam 12C becomes by light beam 22-1 ,-2 ,-3 ,-4 light beams of being formed 22 when figure image point 18 penetrates.Light beam 22 enters the lens 36 of its optical axis alignment in the optical axis 3 of subsystem 81.Light beam 22 becomes the light beam 22A by light beam 22A-1 ,-2 ,-3 ,-4 collimations of being formed when lens 26 penetrate and leave subsystem 81.

As shown in Figure 1a, light beam 22A partly sees through beam splitter 100, becomes by light beam P22B-1 ,-2 ,-3 ,-4 light beam P22B that formed, and enters the subsystem 82 shown in Fig. 1 d.

In Fig. 1 d, light beam P22B incides one by on phase shifter 24-1 ,-2 ,-3 ,-4 phase shifters of being formed 24.The plane of Fig. 1 d is perpendicular to the plane of Fig. 1 a.Phase shifter 24 and 14 contains 2m unit with phase shifter 14 similar numbers, and shown in Fig. 1 d is the situation of m=2.Light beam P22B-1 ,-2 ,-3 ,-4 sees through phase shifter 24-1 ,-2 ,-3 ,-4 respectively, becomes light beam P22C-1 ,-2 ,-3 ,-4 after the outgoing respectively, and they have formed light beam P22C.Phase shifter 24-1 is identical with the phase-shift phase that 24-3 is imported, and be the radian than the big π of phase shift that phase shifter 24-2 and 24-4 imported, and phase shifter 24-2 is identical with the phase-shift phase that 24-4 is imported.

By each phase-shift phase sum that phase shifter 14-1 and 24-1,14-2 and 24-2,14-3 and 24-3,14-4 and 24-4 are produced all is the π radian.So do not exist net phase to phase shift between any two light beams among the light beam P22C-1 ,-2 ,-3 ,-4.Light beam P22C sees through lens 46, becomes by light beam P22D-1 ,-2 ,-3 ,-4 light beam P22D that formed, and the latter is focused into a line chart that is centered close to the figure image point 28 in burnt image plane 27 in the object materials 112 and resembles.The axle of this line chart elephant is arranged essentially parallel to the optical axis 3 of imaging subsystem 82.The length of this line chart elephant is determined by the combination of the factor of the optical bandwidth of the depth of focus of for example finder lens 46 and aberration and light source 10.This line segment can be cut one or more surface of this object materials or be positioned at a surface of this object materials.The optical axis of lens 46 is in alignment with the optical axis 3 of subsystem 82.

In Fig. 1 a, light beam 22A is partly reflected by beam splitter 100, becomes by light beam R22B-1 ,-2 ,-3 ,-4 light beam R22B that formed.Light beam R22B enters the subsystem 83 that is shown in Fig. 1 e.The plane of Fig. 1 e is perpendicular to the plane of Fig. 1 a.Shown in Fig. 1 e.Light beam R22B is incident on one by on phase shifter 34-1 ,-2 ,-3 ,-4 phase shifters of being formed 34.Phase shifter 34 and 14 contains the unit of similar number 2m, and the situation of m=2 has been shown among Fig. 1 e.Light beam R22B sees through phase shifter 34, sees through phase shifter 44 then again, becomes after the outgoing by light beam R22C-1 ,-2 ,-3 ,-4 light beam R22C that formed.The phase-shift phase that is imported by phase shifter 44 is subjected to control from the signal 132 of computing machine 118.Phase shifter 34-1 is identical with the phase-shift phase that 34-3 is imported, the π of the manying radian that is imported than phase shifter 34-2 or 34-4, and phase shifter 34-2 is identical with the amount of phase shift that 34-4 is imported.So do not have net phase to phase shift between any two light beams in light beam R22C-1 ,-2 ,-3 ,-4.Light beam R22C becomes by light beam R22D-1 ,-2 ,-3 ,-4 light beam R22D that formed after seeing through lens 56.Light beam R22D is focused into the figure image point 38 in burnt image plane 37 on the reference mirror 120 by lens 56.The optical axis of lens 56 is in alignment with the optical axis 3a's of subsystem 83.

In Fig. 1 f, the object materials during the part of light beam P22D (seeing Fig. 1 d) is resembled by the line chart at figure image point 28 places reflects and/or scattering, becomes a plurality of light beam P32-1 ,-2 ,-3 ,-4 of the detecting light beam P32 that has formed scattering.The plane of Fig. 1 f is perpendicular to the plane of Fig. 1 a.The detecting light beam P32 of scattering disperses from the figure image point 28 burnt image plane 27, enters lens 46.Shown in Fig. 1 f, the detecting light beam P32 of scattering becomes by light beam P32A-1 ,-2 ,-3 ,-4 collimated light beam P32A that formed when lens 46 penetrate.Light beam P32A-1 ,-2 ,-3 ,-4 sees through phase shifter 24-4 ,-3 ,-2 ,-1 respectively, becomes light beam P32B-1 ,-2 ,-3 ,-4 during outgoing respectively.Light beam P32B-1 ,-2 ,-3 ,-4 has formed the detecting light beam P32B of scattering, penetrates from subsystem 82.Identical by phase shifter 24-1, as to be imported than phase shifter 24-2 or the 24-4 π of manying radian with the phase-shift phase that 24-3 is imported, and phase shifter 24-2 is identical with the phase-shift phase that 24-4 is imported.

In Fig. 1 g, light beam R22D (seeing Fig. 1 e) is reflected by reference mirror 120, becomes the reference beam R32 by light beam R32-1 ,-2 ,-3 ,-4 reflections of being formed.Figure image point 38 in the comfortable burnt image plane 37 of the reference beam R32 of reflection is dispersed, and enters lens 56.Shown in Fig. 1 g, the reference beam R32 of reflection when lens 56 penetrate, become by light beam R32A-1 ,-2 ,-3 ,-the reference beam R32A of the reflection of 4 collimations of being formed.Light beam R32A-1 ,-2 ,-3 ,-4 at first sees through phase shifter 44, sees through phase shifter 34-4 ,-3 ,-2 ,-1 more respectively, becomes the reference beam R32B of reflection after the outgoing respectively, and the reference beam R32B of reflection is made up of light beam R32B-1 ,-2 ,-3 ,-4.The phase-shift phase that is imported by phase shifter 44 is subjected to control from the signal 132 of computing machine 118.The phase-shift phase that is imported by phase shifter 34-1 and 34-3 is identical, and than the π of the manying radian that is imported by phase shifter 34-2 or 34-4, and phase shifter 34-2 is identical with the phase-shift phase that 34-4 is imported.Light beam R32B-1 ,-2 ,-3 ,-4 has formed the light beam R32B that penetrates from subsystem 83.

The detecting light beam P32B of scattering shown in Fig. 1 a is partly reflected by beam splitter 100, becomes the detecting light beam P32C by light beam P32C-1 ,-2 ,-3 ,-4 scatterings of being formed.The detecting light beam P32C of scattering enters the subsystem 81a shown in Fig. 1 h, and the plane of Fig. 1 h is perpendicular to the plane of Fig. 1 a.In Fig. 1 h, the detecting light beam P32C of scattering enters lens 26a with optical axis of aiming at the optical axis 3a of subsystem 81a and outgoing 66 and becomes detecting light beam P32D by light beam P32D-1 ,-2 ,-3 ,-4 scatterings of being formed.Lens 26a is focused into the detecting light beam P32D of scattering on the pin hole 18a among the image plane 17a.The part of the detecting light beam P32D of scattering becomes by light beam P42-1 ,-2 ,-3 ,-4 detecting light beam P42 spatial filtering of forming, scattering from pin hole 18a outgoing.The detecting light beam of scattering enters the lens 36a with optical axis of aiming at the optical axis 3a of subsystem 81a.Detecting light beam P42 spatial filtering, scattering penetrates and leaves subsystem 81a from lens 36a and becomes detecting light beam P42A collimation, spatial filtering, scattering, and this detecting light beam P42A is made up of light beam P42A-1 ,-2 ,-3 ,-4.

Fig. 1 a illustrates light beam R32B and is partly seen through by beam splitter 100, becomes the reference beam R32C by light beam R32C-1 ,-2 ,-3 ,-4 reflections of being formed.The reference beam R32C of reflection enters the subsystem 81a shown in Fig. 1 i.The plane of Fig. 1 I is perpendicular to the plane of Fig. 1 a.In Fig. 1 i, the reference beam R32 of reflection sees through lens 26a and becomes reference beam R32D by light beam R32D-1 ,-2 ,-3 ,-4 reflections of being formed.Light beam R32D is focused on the pin hole 18a among the image plane 17a by lens 26a.The part of the reference beam R32D of reflection becomes by reference beam R42 light beam R42-1 ,-2 ,-3 ,-4 spatial filterings of forming, reflection from pin hole 18a outgoing.Reference beam R42 spatial filtering, reflection sees through lens 36a and leaves subsystem 81a and becomes reference beam R42A collimation, spatial filtering, reflection, and this detecting light beam R42A is made up of light beam R42A-1 ,-2 ,-3 ,-4.

Detecting light beam P42A spatial filtering, scattering is incident upon on the dispersion element 130a shown in Fig. 1 a, and this dispersion element 130a is a reflecting diffraction grating preferably.The part of detecting light beam P42A spatial filtering, scattering is become the detecting light beam P42B of scattering by the first chromatic dispersion detector element 130a diffraction in the plane of Fig. 1 a.The detecting light beam P42B of scattering is incident upon on the second chromatic dispersion detector element 130b, and this chromatic dispersion detector element 130b is a transmission diffraction grating preferably.The part of the detecting light beam P42B of scattering is become the detecting light beam P42C of scattering wavenumber filtering, spatial filtering by the second chromatic dispersion detector element 130b diffraction in the plane of Fig. 1 a.Although light beam P42B and P42C are made up of a frequency spectrum of optical frequency component and therefore angled in the plane of Fig. 1 a (in angle) by chromatic dispersion, only the path of the frequency component of light beam P42B and P42C is illustrated among Fig. 1 a.Shown path is typical.The explanation of the frequency component of light beam P42B and P42C is only made and can introduce Fig. 1 a and subsequent drawings not exceeding the spirit and scope of the present invention and complicacy that will be inundue demonstration is with respect to the key property of the subsystem 84 of the detecting light beam P42C of scattering wavenumber filtering, spatial filtering.

The detecting light beam P42C of scattering wavenumber filtering, spatial filtering enters subsystem 84, as shown in Fig. 1 j.The plane of Fig. 1 j is perpendicular to the plane of Fig. 1 a.Shown in Fig. 1 j, the detecting light beam P42C of scattering wavenumber filtering, spatial filtering becomes by light beam P42D-1 ,-2 ,-3 ,-4 light beam P42D wavenumber filtering of forming, spatial filtering by lens 66 and the ejaculation with optical axis of aiming at the optical axis 3d of subsystem 84.Be illustrated the light beam P42D scioptics 66 wavenumber filtering, spatial filtering that only have an optical frequency component and be focused figure image point 48 in the image plane 47.The position of the figure image point 48 in the image plane 47 and therefore figure image point 48 will depend on the optical frequency of light beam P42D wavenumber filtering, spatial filtering according to chromatic

dispersion detector element

130a and 130b in a position that is arranged on the linear array of a detector pinhole of image plane 47.The part of the light beam of the linear array by this detector pinhole is detected by the detecting device 114 of pixel more than, the detecting device that this many pixels detecting device 114 preferably is made up of the linear array of the pixel of for example linear array CCD.

Be incident upon on the chromatic dispersion detector element 130a at reference beam R42A spatial filtering shown in Fig. 1 a, reflection.The part of reference beam R42A spatial filtering, reflection is become the reference beam R42B of reflection by chromatic dispersion detector element 130a diffraction in the plane of Fig. 1 a.The reference beam R42B of reflection is incident upon on the second chromatic dispersion detector element 130b.The part of the reference beam R42B of reflection is become the reference beam R42C of reflection wavenumber filtering, spatial filtering by the second chromatic dispersion detector element 130b diffraction in the plane of Fig. 1 a.Although light beam R42B and R42C are made up of a frequency spectrum of optical frequency component and therefore angled in the plane of Fig. 1 a (in angle) by chromatic dispersion, only the path of the frequency component of light beam R42B and R42C is illustrated among Fig. 1 a.Shown path is typical.The explanation of the frequency component of light beam R42B and R42C is only made and can introduce Fig. 1 a and subsequent drawings not exceeding the spirit and scope of the present invention and complicacy that will be inundue demonstration is with respect to the key property of the part 84 of the detecting light beam R42C of scattering wavenumber filtering, spatial filtering.

The reference beam R42C of reflection wavenumber filtering, spatial filtering enters subsystem 84, as shown in Fig. 1 k.The plane of Fig. 1 k is perpendicular to the plane of Fig. 1 a.Shown in Fig. 1 k, the reference beam R42C scioptics 66 of reflection wavenumber filtering, spatial filtering also penetrate the reference beam R42D that becomes by light beam R42D-1 ,-2 ,-3 ,-4 reflections wavenumber filtering of forming, spatial filtering.The reference beam R42D scioptics 66 that are illustrated reflection wavenumber filtering, spatial filtering that only has an optical frequency component in Fig. 1 k are focused the figure image point 48 in the image plane 47.The position of the figure image point 48 in the image plane 47 and therefore figure image point 48 be arranged in the optical frequency that the reference beam R42D of reflection wavenumber filtering, spatial filtering will be depended in position on the linear array of a detector pinhole of image plane 47 one.The part of the light beam of the linear array by this detector pinhole is detected by the detecting device 114 of pixel more than.

In Fig. 1 l, the part of light beam P22 (seeing Fig. 1 d) is become by light beam B52-1 ,-2 ,-3 ,-4 light beam B52 that formed by reflection of the object materials at " out of focus " figure image point 58 places in the out of focus image plane 57 and/or scattering.The plane of Fig. 1 l is perpendicular to the plane of Fig. 1 a.Background light beam B52 disperses and enters lens 46 from out of focus figure image point 58.Shown in Fig. 1 l, background light beam B52 becomes the light beam B52A of collimation basically that is made up of light beam B52A-1 ,-2 ,-3 ,-4 during from lens 46 outgoing.Light beam B52A-1 ,-2 ,-3 ,-4 sees through phase shifter 24-4 ,-3 ,-2 ,-1 respectively, becomes light beam B52B-1 ,-2 ,-3 ,-4 during outgoing respectively.Light beam B52B-1 ,-2 ,-3 ,-4 has formed background light beam B52B.The phase-shift phase that is imported by phase shifter 24-1 and 24-3 is identical.The π of the manying radian that is imported than phase shifter 24-2 or 24-4.The phase-shift phase that is imported by phase shifter 24-2 and 24-4 is identical.

As shown in Figure 1a, background light beam B52B is partly reflected by beam splitter 100, becomes by light beam B52C-1 ,-2 ,-3 ,-4 light beam B52C that formed.Light beam B52C becomes by light beam B52D-1 ,-2 ,-3 ,-4 light beam B52D that formed when entering subsystem 81a shown in Fig. 1 m and scioptics 26a ejaculation.The plane of Fig. 1 m is perpendicular to the plane of Fig. 1 a.Background light beam B52D is focused on to be arranged in by lens 26a and has departed from figure image point 68 places of the out of focus image plane 67 of burnt image plane 47 and like this for each frequency component of background light beam B52D, only the sub-fraction of out of focus background light beam B52D by transmission by pin hole 18a.The sub-fraction of this out of focus background light beam B52D is passed through pin hole 18a as the background light beam B62 by light beam B62-1 ,-2 ,-3 ,-4 spatial filterings of forming by transmission.The part of the background light beam B62 of spatial filtering is incident upon lens 36a and goes up and penetrate the background light beam B62A that becomes the spatial filtering of being made up of light beam B62A-1 ,-2 ,-3 ,-4 that collimates basically.The background light beam B62A of spatial filtering penetrates the background light beam B62A that subsystem 81a becomes spatial filtering.

Background light beam B62A at spatial filtering shown in Fig. 1 a is incident upon on the chromatic dispersion detector element 130a.The part of the background light beam B62A of spatial filtering is become background light beam B62B by the first chromatic dispersion detector element 130a diffraction in the plane of Fig. 1 a.Background light beam B62B is incident upon on the second chromatic dispersion detector element 130b.The part of background light beam B62B is become background light beam B62C wavenumber filtering, spatial filtering by the second chromatic dispersion detector element 130b diffraction in the plane of Fig. 1 a.Although light beam B62B and B62C are made up of a frequency spectrum of optical frequency component and therefore angled in the plane of Fig. 1 a (in angle) be illustrated among Fig. 1 a for the path of the optical frequency component of light beam B62B and B62C by chromatic dispersion.Background light beam B62C wavenumber filtering, spatial filtering enters subsystem 84, as shown in Fig. 1 n.Shown in Fig. 1 n, background light beam B62C scioptics 66 wavenumber filtering, spatial filtering and ejaculation become background light beam B62D wavenumber filtering, spatial filtering.In Fig. 1 n, be illustrated the figure image point 48 that the background light beam B62D scioptics 66 wavenumber filtering, spatial filtering that only have an optical frequency component are focused in the image plane 47.The optical frequency of background light beam B62D wavenumber filtering, spatial filtering will be depended in the position of the figure image point 48 in the image plane 47.The part of the light beam of the linear array by this detector pinhole is detected by the detecting device 114 of pixel more than.

4 intensity measurements of a sequence that the work of present device shown in Fig. 1 a-1n is obtained based on each pixel by detecting device 114.The intensity level I of 4 linear arraies of this sequence ₁, I ₂, I ₃And I ₄Be that detecting device 114 imports the different phase-shift phases of a sequence (total phase-shift phase of reference beam comprises the phase-shift phase that is produced when both direction sees through phase shifter 44) x at phase shifter 44 ₀, x ₀+ π, x ₀+ pi/2 and x ₀Record respectively under the situation of+3 pi/2 radians, wherein x ₀It is a certain fixing phase-shift value.(certainly, phase shifter 34 and 44 effect can be combined in the single phase shifter that is subjected to computing machine 118 controls).The intensity level I of 4 linear arraies ₁, I ₂, I ₃, I ₄Be transmitted to computing machine 118 as signal 131 with numeral or analog form, carry out follow-up processing.Containing common change-over circuit at detecting device 114 or in computing machine 118 is mould/number shifter, is used for the intensity level I of 4 linear arraies ₁, I ₂, I ₃, I ₄Convert digital form to.The phase-shift phase of phase shifter 44 is subjected to signal 132 control, and this signal is a computing machine 118 according to the back with the equation (12a) that provides and (12b) or equation (36) produces and transmission.Phase shifter 44 can be electro-optical type or the latter will illustrate is used for broadband light wavelength operation types.Then, computing machine 118 calculates intensity difference I ₁-I ₂And I ₃-I ₄, only be interference cross term between the complex amplitude of reference beam R42D of the complex amplitude of detecting light beam P42D of scattering wavenumber filtering, spatial filtering and reflection wavenumber filtering, spatial filtering with the contained content of greater efficiency in these two differences.

The reason of isolating the interference cross term between the complex amplitude (Fig. 1 k) of reference beam R42D of the complex amplitude (Fig. 1 j) of the detecting light beam P42D of scattering wavenumber filtering, spatial filtering and reflection wavenumber filtering, spatial filtering with higher efficient is from two system performances.First system performance is, in a multiple scale factor, the space distribution of complex amplitude in image plane 47 of the detecting light beam P42D of scattering wavenumber filtering, spatial filtering and the reference beam R42D of reflection wavenumber filtering, spatial filtering all is essentially identical for the situation of phase shifter 44 any phase-shift phase that imports.Second system performance is, the phase-shift phase that is imported when phase shifter 44 increases or reduces π, 3 π ... during radian, the interference cross term between the complex amplitude of the complex amplitude of the detecting light beam P42D of scattering wavenumber filtering, spatial filtering and the reference beam R42D of reflection wavenumber filtering, spatial filtering will change sign.Because the phase-shift phase that is imported when phase shifter 44 increases or reduces π, 3 π ... during radian, the interference cross term between the complex amplitude of the complex amplitude of the detecting light beam P42D of the scattering wavenumber filtering in image plane 47, spatial filtering and the reference beam R42D of reflection wavenumber filtering, spatial filtering will change sign.At intensity difference I ₁-I ₂And I ₃-I ₄In this interferes cross term can not cancel each other.Yet, all are not the items of interfering cross term, be the intensity of the reference beam R42D of the detecting light beam P42D of scattering wavenumber filtering, spatial filtering of background light beam B62D wavenumber filtering, spatial filtering (Fig. 1 n) and reflection wavenumber filtering, spatial filtering, will be at intensity difference I ₁-I ₂And I ₃-I ₄The middle counteracting.The system performance of above-mentioned reference is the denominator of confocal interference microscope, therefore will be called below " confocal interference system performance ".

For the background light beam B62D wavenumber filtering in image plane 47, spatial filtering (seeing Fig. 1 n), then owing to the confocal interference system performance, intensity difference I ₁-I ₂And I ₃-I ₄In will only can contain interference cross term between the complex amplitude of reference beam R42D of the complex amplitude of background light beam B62D of wavenumber filtering, spatial filtering and reflection wavenumber filtering, spatial filtering.But, the interference between the complex amplitude of the complex amplitude of the background light beam B62D wavenumber filtering in image plane 47, spatial filtering and the reference beam R42D of reflection wavenumber filtering, spatial filtering intersects item size with respect to reduced widely by the corresponding interference cross term in the confocal interference microscope on the pixel comparison basis in the past.

For the generalized case that detecting light beam P42D and background light beam B62D wavenumber filtering, spatial filtering in scattering wavenumber filtering, spatial filtering occur simultaneously, intensity difference I ₁-I ₂And I ₃-I ₄In will have two to interfere cross terms, i.e. interference cross term between the complex amplitude of the reference beam R42D of the interference cross term between the complex amplitude of the complex amplitude of the detecting light beam P42D of scattering wavenumber filtering, spatial filtering and the reference beam R42D of reflection wavenumber filtering, spatial filtering and the complex amplitude of background light beam B62D wavenumber filtering, spatial filtering and reflection wavenumber filtering, spatial filtering.Notice that because the confocal interference system performance, the interference cross term between the complex amplitude of the complex amplitude of background light beam B62D wavenumber filtering, spatial filtering and the detecting light beam P42D of scattering wavenumber filtering, spatial filtering is at intensity difference I ₁-I ₂And I ₃-I ₄In be cancelled.

Interference cross term between the complex amplitude of the complex amplitude of background light beam B62D wavenumber filtering, spatial filtering and the reference beam R42D of reflection wavenumber filtering, spatial filtering has been represented the background from the out of focus image.Compare with conventional art interference confocal microscopic system, it generally is to have reduced in image plane 47 that interference between the complex amplitude of the complex amplitude of the background light beam B62D wavenumber filtering in the present device, spatial filtering and the reference beam R42D of reflection wavenumber filtering, spatial filtering intersects item size, does not reduce basically and the interference between the complex amplitude of the complex amplitude of the detecting light beam P42D of scattering wavenumber filtering, spatial filtering and the reference beam R42D of reflection wavenumber filtering, spatial filtering intersects item size.Interference cross term between the complex amplitude of the complex amplitude of the background light beam B62D wavenumber filtering in image plane 47, spatial filtering and the reference beam R42D of reflection wavenumber filtering, spatial filtering reduce partly be because the amplitude of a light beam along with the increase to the distance of image plane reduces.This character is the basis that the conventional art confocal interference microscope reduces background.Yet, in equipment of the present invention, this last interference cross term size reduce than conventional art confocal interference microscopy reduce strengthen to some extent.

Said in the preceding paragraph " reducing to strengthen to some extent " realizes by phase shifter 14,24 and 34 is provided.Phase shifter 14,24 and 34 has changed the spatial property at the complex amplitude of the reference beam R42D of the detecting light beam P42D in scattering wavenumber filtering, spatial filtering at burnt image plane 47 places, reflection wavenumber filtering, spatial filtering and background light beam B62D wavenumber filtering, spatial filtering.Though the spatial property of the complex amplitude of the detecting light beam P42D of scattering wavenumber filtering, spatial filtering, the reference beam R42D of reflection wavenumber filtering, spatial filtering has all been changed by phase shifter 14,24 and 34, the space distribution after the change of their complex amplitudes in image plane 47 separately is identical basically.This characteristic is formerly discussed intensity difference I ₁-I ₂And I ₃-I ₄Once pointed out during to the susceptibility of the interference cross term between the complex amplitude of the reference beam R42D of the complex amplitude of the detecting light beam P42D of scattering wavenumber filtering, spatial filtering and reflection wavenumber filtering, spatial filtering.

Yet, after the complex amplitude of the complex amplitude of background light beam B62D wavenumber filtering, spatial filtering and the reference beam R42D of reflection wavenumber filtering, spatial filtering changes separately to be distributed on burnt image plane 47 be visibly different.The complex amplitude of the reference beam R42D of reflection wavenumber filtering, spatial filtering is an antisymmetric function for the center of the reference beam R42D of the reflection wavenumber filtering in the image plane 47, spatial filtering.Otherwise, the part that the complex amplitude of the reference beam R42D of that among background light beam B62D wavenumber filtering, spatial filtering and reflection wavenumber filtering, spatial filtering interferes is the complex amplitude of a light beam associated among the light beam B52D-1 ,-2 ,-3 or-4 shown in main and Fig. 1 m, has only little relative variation in the figure pattern space scope of the reference beam R42D of this complex amplitude reflection wavenumber filtering in image plane 47, spatial filtering.So the principal ingredient of the space distribution of the interference cross term between the complex amplitude of the complex amplitude of background light beam B62D wavenumber filtering, spatial filtering and the reference beam R42D of reflection wavenumber filtering, spatial filtering is an antisymmetry distribution about the center of the reference beam R42D of the reflection wavenumber filtering in image plane 47, spatial filtering.

The contribution of the intensity level that the interference cross term between the complex amplitude of the complex amplitude of background light beam B62D wavenumber filtering, spatial filtering and the reference beam R42D of reflection wavenumber filtering, spatial filtering is write down the single pixel by detecting device 114 is the integration of the figure pattern space scope internal interference cross term that forms of the reference beam R42D of reflection wavenumber filtering, spatial filtering in image plane 47.Antisymmetric function integration in the antisymmetry axle with this function is the spatial dimension at center equals zero.So, the reducing degree and will reduce intensity of the net contribution of the intensity level that the interference cross term between the complex amplitude of the complex amplitude of background light beam B62D wavenumber filtering, spatial filtering and the reference beam R42D of reflection wavenumber filtering, spatial filtering is write down the single pixel by detecting device 114 considerably beyond what the conventional art confocal microscopy can reach.

Be important to note that interference cross term between the complex amplitude of reference beam R42D of the complex amplitude of background light beam B62D wavenumber filtering, spatial filtering in image plane 47 and reflection wavenumber filtering, spatial filtering causes the reduction of systematic error and statistical error.Because the minimizing of the interference cross term in image plane 47 between the complex amplitude of the reference beam R42D of the complex amplitude of background light beam B62D wavenumber filtering, spatial filtering and reflection wavenumber filtering, spatial filtering causes the minimizing of the photoelectronic quantity that generates in each pixel of the detecting device 114 of prior art, statistical error reduces.Because the statistical uncertainty of integral charge and therefore output signal is relevant with the photoelectronic number of points root mean square that generates in each pixel of detecting device, the statistical error in the output signal is lowered basically for the equipment among Fig. 1 a-1n.

Like this, owing to following two reasons, the statistical error that the statistical error of every figure image point of the line segment of an imaging of obtaining with present device obtains in the identical time interval less than the confocal interference microscopy that adopts prior art basically.First reason is in the confocal interference microscopy of prior art, the line segment of imaging must be scanned in the time interval, this time interval has reduced the quantity that multiply by the figure image point in the line segment of this imaging in the time of each figure image point cost, to obtain the array corresponding to an intensity difference of the array of the intensity difference that obtains simultaneously in equipment of the present invention in the identical time interval.This statistical precision that causes obtaining in the interference confocal microscopy with prior art is compared, for equipment of the present invention, by a factor that is directly proportional with the root mean square of the quantity of independently figure image point in the line segment of this imaging, the statistical precision of the image of being made up of some figure image points of the line segment of this imaging is enhanced.The basis of second reason is that the interference between the complex amplitude of reference beam R42D of the complex amplitude of background light beam B62D wavenumber filtering, spatial filtering in image plane 47 and reflection wavenumber filtering, spatial filtering intersects item size and intersects item size with respect to the interference of the correspondence that obtains reduced practically in the interference confocal microscopy of prior art, as previously described described in the paragraph.This two reason has formed the basis of conclusion: when the statistical precision of a line image of considering the object materials of obtaining in the identical time interval, for equipment of the present invention, the statistical error of being introduced by the amplitude of out of focus image has been reduced widely than introduce corresponding statistical error by the amplitude of out of focus image in the interference confocal microscopy of prior art.

Next converse by using a computer according to equation (32a) and integral equation (32b) with known computing machine deconvolution of those skilled in the art and integral equation inversion technique, can carry out correction for the systematic error that influences the out of focus image that promptly exceeds the compensation that realizes by the equipment of first embodiment.

Signal to noise ratio (S/N ratio) can be adjusted to the function of wavelength of light source optics frequency component so that for example generate and the first order of wavelength signal to noise ratio (S/N ratio) independently.Usually, before entering object materials 112, will be changed with wavelength by the amplitude of normalization for the detecting light beam P42D of scattering wave length filtering, spatial filtering of the optical frequency component of the amplitude of the detecting light beam P22D of correspondence because the Wavelength-independent of the transmission of the detecting light beam P32 of detecting light beam P22D in object materials 112 and scattering and since the numerical aperture that enters the degree of depth when increase finder lens 46 in the object materials 112 when figure image point 28 change.And the ratio of the amplitude of the amplitude of the detecting light beam P42D of scattering wave length filtering, spatial filtering and background light beam B62D wave length filtering, spatial filtering enters the degree of depth in the object materials 112 when increasing and reduce at figure image point 28 usually.The variation of signal to noise ratio (S/N ratio) will be followed before entering object materials 112 usually by the oscillation amplitude change of normalization for the detecting light beam P42D of scattering wave length filtering, spatial filtering of the optical frequency component of the amplitude of the detecting light beam P22D of correspondence.These factors can be by in reference mirror subsystem 83 and/or in detecting light beam subsystem 82 to influence on signal-to-noise ratio (SNR), be preferably in the reference mirror subsystem 83 and place a wavelength filter and partly compensated, and the transmission that constitutes this wavelength filter to regulate and/or the ratio of the reference beam R42D of the detecting light beam P42D of scattering wave length filtering, spatial filtering of the separately detector pinhole of optimization transmission by being used for different wave length and reflection wave length filtering, spatial filtering according to equation (39) to have special wavelength dependence.

In the detailed description of this first embodiment, once pointed out do not have clean phase-shift phase between any two light beams in light beam P22C-1 ,-2 ,-3 ,-4.This characteristic makes pointed following purpose in the detailed description might reach this first embodiment: the pin hole 8 that is produced in object materials 112 in burnt image plane 27, with two the conjugation images in burnt image plane 37 on the reference mirror 120, basically not can because of exist respectively phase shifter 14 and 24 and phase shifter 14 and 34 change to some extent, but with object materials 112 in figure image point 28 and the image in

figure image plane

17a and 47 of figure image point 38 phase conjugates on the reference mirror 120 in produced obvious variation because of the existence of these phase shifters.

If by considering which type of consequence has removed phase shifter 14 in first embodiment will cause, also can obtain about phase shifter 14,24, and the understanding in depth of mutual relationship between 34.At this moment, the reference beam R42D of reflection wave length filtering, spatial filtering will become symmetric function by antisymmetric function in image plane 47, and will not have substantially to change at the spatial property of image plane 47 background light beam B62D medium wavelength filtering, spatial filtering.So, the space distribution of the interference cross term between the complex amplitude of the complex amplitude of background light beam B62D wave length filtering, spatial filtering and the reference beam R42D of reflection wave length filtering, spatial filtering will be substantially one with respect to symmetrical distribution at the center of the reference beam R42D of image plane 47 reflections medium wavelength filtering, spatial filtering.But be not equal to zero usually, so reducing degree and will can not surpass the degree that reduces that the conventional art confocal microscopy can reach basically by the intensity level that a given pixel write down of the detecting device 114 at figure image point 48 places because a symmetry is contained the integration of number in being centered close to a spatial dimension at function axis of symmetry place.

Though top explanation is only at a specific figure image point 28 of a particular portion office in the object materials 112, but computing machine 118 can make it other parts of object materials 112 are moved to figure image point 28 places with control signal 133 by giving shifter 116, thereby allows " scanning " of system's realization to hope line segment, planar cross-sectional or volumetric region in the object materials 112.One or more surface of this object materials can be cut or comprise to hope line segment, planar cross-sectional or volumetric region in this object materials 112.

Level 1 in first preferred embodiment of the present invention differentiates it is that impulse response function by the imaging subsystem of operation equipment of the present invention in a plane of the planar quadrature of determining with chromatic

dispersion detector element

130a and 130b is realized.Also can realize the discriminating of a level 1 type in a modification of first preferred embodiment, wherein the equipment of this modification and electronic processing device and first preferred embodiment is basic identical, have around they separately optical axis turn over the phase shifter 14,24 and 34 of pi/2 radian.Identical in the reduction of the systematic influence of out of focus image and first preferred embodiment in the modification of first preferred embodiment.The statistics that is caused by the out of focus image in the modification of first preferred embodiment influences also to be lowered to and be lower than the statistics influence that realizes in the prior art confocal interference microscopy, but effective not as what realize with the equipment of first preferred embodiment usually.

Referring now to Fig. 2 a-2f,, Fig. 2 a shows the second embodiment of the present invention from first group of embodiment and modification thereof in schematic form, and wherein light source subsystem 80a, subsystem 81b and detector subsystem 84a preferably are configured for the slit confocal microscopy.In Fig. 2 a-2f, represent with similar code name with the element that the illustrated element of earlier in respect of figures 1a-1n is similar.Change shown in Fig. 2 b among the subsystem 80a occurs in the zone of light source 10a, should preferably contain the noncoherent line source in space, a broadband in the zone now, preferably filament or diode laser matrix; Change in the zone of the pin hole 8 also occur in first embodiment, now should the zone light source pin hole linear array 8a that the image with lens 6 formed line source 10a aligns preferably.The change of subsystem 81b shown in Fig. 2 c and the 2d is with the pin hole 81b among the subsystem 81a of alternative first embodiment of a linear array of the spatial filter pin hole 18b among the subsystem 81b.The change of subsystem 84a shown in Fig. 2 e and the 2f is the zone of detecting device 114a, and wherein preferably a two-dimensional array of detector pinhole and the detecting device 114 of first embodiment with pixel of linear array now are detecting device 114a who preferably includes the pixel of a two-dimensional array to the linear array of the pin hole in the image plane 47 of first embodiment.

In Fig. 2 b, light source pin hole linear array 8a and light source 10a arrange along the direction perpendicular to Fig. 2 b plane.The plane of Fig. 2 b is perpendicular to the plane of Fig. 2 a.In Fig. 2 c and 2d, the array of spatial filter pin hole 18b is aligned the plane perpendicular to Fig. 2 c and 2d, and the plane of Fig. 2 c and 2d is perpendicular to the plane of Fig. 2 a.In Fig. 2 e and 2f, the two-dimensional array of the two-dimensional array of detector pinhole and detecting device pixel is aligned the plane perpendicular to Fig. 2 e and 2f.

The remainder of second embodiment shown in Fig. 2 a-2f preferably counterpart with first preferred embodiment of above-mentioned Fig. 1 a-1n is identical.

Level 1 discriminating in the second embodiment of the present invention is to realize by the impulse response function of the imaging subsystem of operation equipment of the present invention in a plane that is orthogonal to the plane of being determined by chromatic dispersion detector element 130a and 130b.Also can realize the discriminating of a level 1 type in first modification of second preferred embodiment, wherein the equipment of this modification and electronic processing device and second preferred embodiment is basic identical, have around they separately optical axis turn over the phase shifter 14,24 and 34 of pi/2 radian.Identical in the reduction of the systematic influence of out of focus image and second preferred embodiment in first modification of second embodiment.The statistics that is caused by the out of focus image in first modification of second preferred embodiment influences also to be lowered to and be lower than the statistics influence that realizes in the prior art confocal interference microscopy, but effective not as what realize with the equipment of second preferred embodiment usually.

Second modification of second embodiment is described, wherein the equipment of this modification and electronic processing device and second preferred embodiment is basic identical, except the linear array of the light source pin hole 8a of second preferred embodiment and spatial filter pin hole 18a is substituted by a light source slit and a spatial filter slit.Identical in the reduction of the systematic influence of out of focus image and second preferred embodiment in second modification of second embodiment.The statistics that is caused by the out of focus image in second modification of second preferred embodiment influences also to be lowered to and be lower than the statistics influence that realizes in the prior art confocal interference microscopy, but effective not as what realize with the equipment of second preferred embodiment usually.

Substitute slit separately and as in second preferred embodiment and first modification thereof, use a linear array of linear array of light source pin hole and space pin hole to produce to a restricted scanning of object materials requirement with the two-dimensional representation in the cross section that generates this object materials.The direction of this restricted scanning is the direction along the image of the linear array of the light source pin hole in this object materials.This restricted scanning occurs, because the interval between the pin hole on the direction of the image of the linear array of the light source pin hole in this object materials.In addition, when the interval between the pin hole on the direction of the image of the linear array of the light source pin hole in this object materials meets the condition of equation (54), keep high sensitivity to the detecting light beam of scattering wavenumber filtering, spatial filtering.

The number of steps of this restricted scanning be by the space ratio between the image of the light source pin hole of two adjacency in this object materials and separately the angular resolution of imaging system determine.In the practice, the number of steps in this restricted scanning will be less than the pinhole number in the linear array of light source pin hole and spatial filter pin hole significantly.Use second preferred embodiment of the linear array that has light source pin hole and spatial filter pin hole and the equipment of modification thereof like this, the two-dimensional representation in a cross section of object materials can be acquired and not scan basically.

Referring now to Fig. 3 a-3l,, wherein show the third embodiment of the present invention from first group of embodiment, wherein the light path of the reference beam of first preferred embodiment and detecting light beam is changed, to improve and the optimization signal to noise ratio (S/N ratio).The equipment of the 3rd embodiment and electronic processing device basically with first preferred embodiment in identical, just increased here and be used for, made the quotient of amplitudes of detecting light beam of the reference beam of reflection and scattering to be conditioned the interferometer of the first embodiment additional optical devices of configuration again; In the 3rd preferred embodiment and first preferred embodiment, the optical element with similar code name is carried out similar operation, and electronic processing device is carried out illustrated similar electronic operation.The quotient of amplitudes of the reference beam of reflection wavenumber filtering, spatial filtering and the detecting light beam of scattering is to regulate by the transmission/reflection coefficients that changes beam splitter 100,100a and 100b among Fig. 3 a-3l.

Shown in Fig. 3 a-3l, the 3rd preferred embodiment of the present invention be one by beam splitter 100,100a and 100b, object materials 112, shifter 116, a reference mirror 120, chromatic

dispersion detector element

130a and 130b and the interferometer that detecting device 114 is formed.This configuration is considered to a kind of form of Michelson interferometer in the present technique field, what illustrate here is a simple example.Can in the equipment of Fig. 3 a-3l, adopt the other forms of interferometer known to the present technique field, for example illustrated polarization Michelson interferometer in the paper " DifferentialInterferometer Arrangements for Distance and AngleMeasurements:Principles; Advantages; and Applications " of aforementioned Zanoni is done the spirit and the category that can obviously not depart from third preferred embodiment of the invention like this.

The orientation on the operated plane of impulse response function of the wherein imaging subsystem in the 3rd embodiment is perpendicular to the plane of Fig. 3 a.

Fig. 3 b illustrates the embodiment of subsystem 80 shown in Fig. 3 a in schematic form.The plane of Fig. 3 b is perpendicular to the plane of Fig. 3 a.For the 3rd preferred embodiment, light source 10 is a pointolite or its surface radiation everywhere is the noncoherent light source in space preferably, preferably laser instrument or similarly coherent source or partial coherence radiating light source, and preferably one surpass the irradiation laser device are preferably a polarization.Light source 10 sends the input beam 2 in alignment with the optical axis 3 of subsystem 80.Shown in Fig. 3 b, light beam 2 enters condenser lens 6 and is focused on the pin hole 8 in the image plane 7.Disperse from pin hole 8 by light beam 12-1 ,-2 ,-3 ,-4 light beams of being formed 12, enter the lens 16 of its optical axis alignment in the optical axis 3 of subsystem 80.Light beam 12 becomes by light beam 12A-1 ,-2 ,-3 ,-4 collimated light beam 12A that formed during from lens 16 outgoing, enters phase shifter 14.Phase shifter 14 is made up of some rectangle phase shifter 14-1,14-2,14-2,14-4, and their optical axises separately all are parallel to the optical axis 3 of subsystem 80.The number that is noted that these rectangle phase shifters can be any suitable several 2m, and wherein m is an integer.Example shown in Fig. 3 b is corresponding to the situation of m=2, and 4 phase shifters have been enough to clearly illustrate that the relation between each parts of present device.Parallel beam 12A-1 ,-2 ,-3 ,-4 sees through phase shifter 14-1,14-2,14-3,14-4 respectively, becomes light beam 12B-1 ,-2 ,-3 ,-4 during from phase shifter 14 outgoing respectively, and these back 4 light beams have been formed light beam 12B.The π of the manying radian that the phase-shift phase that phase shifter 14-2 and 14-4 are imported is all imported than phase shifter 14-1 or 14-3, phase shifter 14-1 is identical with the phase-shift phase that 14-3 is imported.

In Fig. 3 a, light beam 12B penetrates from subsystem 80, partly sees through beam splitter 100a, becomes by light beam P12B-1 ,-2 ,-3 ,-4 light beam P12B that formed.Light beam P12B enters subsystem 81.In Fig. 3 c, light beam P12B enters lens 26, becomes during outgoing by light beam P12C-1 ,-2 ,-3 ,-4 light beam P12C that formed.The plane of Fig. 3 c is perpendicular to the plane of Fig. 3 a.Lens 26 are focused into figure image point 18 in the image plane 17 to light beam P12C.Light beam P12C becomes by light beam P22-1 ,-2 ,-3 ,-4 light beam P22 that formed when figure image point 18 penetrates.Light beam P22 enters the lens 36 of the optical axis 3 of its optical axis alignment subsystem 81.Light beam P22 becomes by light beam P22A-1 ,-2 ,-3 ,-4 collimated light beam P22A that formed when lens 36 penetrate, and leaves subsystem 81 then.

Shown in Fig. 3 a, light beam P22A is become by light beam P22B-1 ,-2 ,-3 ,-4 light beam P22B that formed by partly transmission of beam splitter 100, enters the subsystem 82 shown in Fig. 3 d then.The plane of Fig. 3 d is perpendicular to the plane of Fig. 3 a.

In Fig. 3 d, light beam P22B incides one and contains on unit 24-1 ,-2 ,-3 ,-4 the phase shifter 24.The contained unit number 2m of phase shifter 24 is identical with phase shifter 14, and shown in Fig. 3 d is the situation of m=2.Light beam P22B-1 ,-2 ,-3 ,-4 sees through phase shifter 24-1 ,-2 ,-3 ,-4 respectively, becomes light beam P22C-1 ,-2 ,-3 ,-4 during outgoing respectively, and they have formed light beam P22C.The phase-shift phase that is imported by phase shifter 24-1 and 24-3 is identical, the π of manying radians that is imported than phase shifter 24-2 or 24-4 all, and phase shifter 24-2 is identical with the phase-shift phase that 42-4 is imported.So as previously described, do not have net phase to phase shift between any two light beams in light beam P22C-1 ,-2 ,-3 ,-4.Light beam P22C sees through lens 46, becomes by light beam P22D-1 ,-2 ,-3 ,-4 light beam P22D that formed, and the latter is focused a line segment of the figure image point 28 on the image plane 27 that forms in the central object material 112.The axle of this line chart elephant is arranged essentially parallel to the optical axis 3 of imaging subsystem 82.The length of this line chart elephant determines that by the combination of the factor of the optical bandwidth of the aberration of for example finder lens 46 and depth of focus and light source 10 aberration of finder lens 46 and depth of focus can be conditioned.This line segment can be cut one or more plane of object materials or be positioned at a plane of this object materials.The optical axis of lens 46 is in alignment with the optical axis 3 of subsystem 82.

In Fig. 3 a, light beam 12B is partly reflected by beam splitter 100a, becomes by light beam R12B-1 ,-2 ,-3 ,-4 light beam R12B that formed.Light beam R12B enters the subsystem 81c shown in Fig. 3 e, and the plane parallel of Fig. 3 e is in the plane of Fig. 3 a.

In Fig. 3 e, light beam R12B enters lens 26c, becomes during outgoing by light beam R12C-1 ,-2 ,-3 ,-4 light beam R12C that formed.Light beam R12B-1 ,-2 ,-3 ,-4 in perpendicular to a plane on the plane of Fig. 3 e by space ground separately and in the visual field shown in Fig. 3 e, present overlapping and spatially coextend.The optical axis of lens 26c is in alignment with the optical axis 3b's of subsystem 81c.Lens 26c and plane mirror 120c are focused into figure image point 18c on the image plane 17b to light beam R12C together.Light beam R12C disperses from figure image point 18b, becomes by light beam R22-1 ,-2 ,-3 ,-4 light beam R22 that formed.Light beam R22-1 ,-2 ,-3 ,-4 in perpendicular to a plane on the plane of Fig. 3 e by space ground separately and in the visual field shown in Fig. 3 e, present overlapping and spatially coextend.Light beam R22 enters the lens 36c of an optical axis alignment in the optical axis 3c of subsystem 81c.Light beam R22 becomes by light beam R22A-1 ,-2 ,-3 ,-4 collimated light beam R22A that formed during from lens 36c outgoing, leaves subsystem 81c then.Light beam R22A-1 ,-2 ,-3 ,-4 in perpendicular to a plane on the plane of Fig. 3 e by space ground separately and in the visual field shown in Fig. 3 e, present overlapping and spatially coextend.

Shown in Fig. 3 a, the light beam R22A that has left subsystem 81c enters subsystem 83a.Subsystem 83a shown in Fig. 3 f is made up of lens 56a, reference mirror 120, beam splitter 100b and phase shifter 34,34a and 44.The plane parallel of Fig. 3 f is in the plane of Fig. 3 a.Turning over the pi/2 radian around optical axis 3a and 3c respectively by phase shifter 34-1 ,-2 ,-3 ,-4 phase shifters of forming 34 with by the phase shifter 34a that element of phase shifter 34a-1 ,-2 ,-3 ,-4 forms shown in Fig. 3 f, for make to light beam R22A, R22B, R22C and R22D by subsystem 83a description and follow the tracks of the spirit and scope that more simply and not exceed the third embodiment of the present invention.Therefore, the light beam R22B that forms at the light beam R22A that is made up of light beam R22A-1 ,-2 ,-3 ,-4 shown in Fig. 3 f with by light beam R22B-1 ,-2 ,-3 ,-4 is turned over the pi/2 radian and is turned over the pi/2 radian at light beam R22C that is made up of light beam R22C-1 ,-2 ,-3 ,-4 shown in Fig. 3 f and the light beam R22D that is made up of light beam R22D-1 ,-2 ,-3 ,-4 around optical axis 3a around optical axis 3c.In subsystem 83a, light beam R22A incides on the phase shifter 34a.Contained identical of the contained unit number 2m of phase shifter 34a and phase shifter 14.Light beam R22A becomes light beam R22B after seeing through phase shifter 34a, is become light beam R22C by partial reflection then.Identical with the phase-shift phase that 34a-3 is imported by phase shifter 34a-1, than the π of the manying radian of phase shifter 34a-2 or 34a-4 importing, phase shifter 34a-2 is identical with the phase-shift phase that 34a-4 is imported.Therefore there is not net phase to phase shift between any two light beams in light beam R22C-1 ,-2 ,-3 ,-4.Light beam R22C sees through lens 56a, becomes light beam R22D.Light beam R22D is focused into figure image point 38 in the image plane 37 on the reference mirror 120 by lens 56a.The optical axis of lens 56a is the optical axis 3a that aims at sub-subsystem 83a.

In Fig. 3 g, the part of light beam P22D (seeing Fig. 3 d) is become the detecting light beam P32 by a plurality of light beam P32-1 ,-2 ,-3 ,-4 scatterings of being formed by reflection of the object materials at figure image point 28 places and/or scattering.The plane of Fig. 3 g is perpendicular to the plane of Fig. 3 a.The detecting light beam P32 of scattering disperses from the figure image point 28 in burnt image plane 27, enters lens 46.Shown in Fig. 3 g, the detecting light beam P32 of scattering when lens 46 penetrate, become by light beam P32A-1 ,-2 ,-3 ,-the detecting light beam P32A of the scattering of 4 collimations of being formed.Light beam P32A-1 ,-2 ,-3 ,-4 sees through phase shifter 24-4 ,-3 ,-2 ,-1 respectively, becomes light beam P32B-1 ,-2 ,-3 ,-4 during outgoing respectively.Light beam P32B-1 ,-2 ,-3 ,-4 has formed the detecting light beam P32B of scattering, penetrates from subsystem 82.The phase-shift phase that is imported by phase shifter 24-1 and 24-3 is identical, and than the π of the manying radian that is imported by phase shifter 24-2 or 24-4, phase shifter 24-2 is identical with the phase-shift phase that 24-4 is imported.

In Fig. 3 h, light beam R22D (seeing Fig. 3 f) is reflected by reference mirror 120, becomes the reference beam R32 by light beam R32-1 ,-2 ,-3 ,-4 reflections of being formed.Subsystem 83a shown in Fig. 3 h is made up of lens 56a, reference mirror 120, beam splitter 100b and phase shifter 34,34a and 44.Phase shifter 34 is made up of element of phase shifter 34-1 ,-2 ,-3 ,-4 and phase shifter 34a is made up of element of phase shifter 34a-1 ,-2 ,-3 ,-4, this two phase shifter is illustrated in Fig. 3 h respectively and turns over the pi/2 radian around optical axis 3a and 3c, for make to light beam R32, R32A, R32B by subsystem 83a description and follow the tracks of the spirit and scope that more simply and not exceed the third embodiment of the present invention.Therefore light beam R32A, the light beam R32B that forms by light beam R32B-1 ,-2 ,-3 ,-4 and be illustrated around optical axis 3a in Fig. 3 h by the light beam R32C that light beam R32C-1 ,-2 ,-3 ,-4 forms and turn over the pi/2 radian.The plane parallel of Fig. 3 h is in the plane of Fig. 3 a.The figure image point 38 of reference beam R32 from image plane 37 of reflection dispersed, and enters lens 56a.Shown in Fig. 3 h, the reference beam R32 of reflection becomes by light beam R32A-1 ,-2 ,-3 ,-4 collimated light beam R32A that formed during from lens 56a outgoing.Light beam R32A-1 ,-2 ,-3 ,-4 at first sees through phase shifter 44, then sees through phase shifter 34-4 ,-3 ,-2 ,-1 more respectively, becomes R32B-1 ,-2 ,-3 ,-4 during outgoing respectively.The phase-shift phase that is imported by phase shifter 44 is subjected to control from the signal 132 of computing machine 118.The phase-shift phase that is imported by phase shifter 34-1 and 34-3 is identical, and than the π of the manying radian that is imported by phase shifter 34-2 and 34-4, the phase-shift phase that is imported by phase shifter 34-2 and 34-4 is identical.The reference beam R32B of reflection penetrates from subsystem 83a.

Fig. 3 a illustrates, and the part of the detecting light beam P32B of scattering is reflected by beam splitter 100, becomes the detecting light beam P32C by light beam P32C-1 ,-2 ,-3 ,-4 scatterings of being formed.The detecting light beam P32C of scattering enters the subsystem 81a shown in Fig. 3 i.In Fig. 3 i, the detecting light beam P32C of scattering enters lens 26a, becomes during outgoing by light beam P32D-1 ,-2 ,-3 ,-4 light beam P32D that formed.The plane of Fig. 3 i is perpendicular to the plane of Fig. 3 a.The optical axis of lens 36a is in alignment with the optical axis 3a's of subsystem 81a.Lens 26a focuses on the detecting light beam P32D of scattering on the spatial filter pin hole 18a among the image plane 17a.The part of the detecting light beam P32D of scattering becomes detecting light beam P42 by the scattering of light beam P42-1 ,-2 ,-3 ,-4 spatial filterings of forming from spatial filter pin hole 18a outgoing.The detecting light beam P42 of the scattering of spatial filtering enters the lens 36a that optical axis aligns with the optical axis 3a of subsystem 81a.The detecting light beam P42 of the scattering of spatial filtering is from lens 36a outgoing and leave the detecting light beam P42A of scattering that subsystem 81a becomes the spatial filtering of collimation, and detecting light beam P42A is made up of light beam P42A-1 ,-2 ,-3 ,-4.

Fig. 3 a illustrates, and the reference beam R32B of reflection is by partly transmission of beam splitter 100, becomes the reference beam R32C by light beam R32C-1 ,-2 ,-3 ,-4 the reflection of forming.Then the reference beam R32C of reflection enters the subsystem 81a shown in Fig. 3 j.The plane of Fig. 3 j is perpendicular to the plane of Fig. 3 a.In Fig. 3 j, the reference beam R32C of reflection enters lens 66, becomes the reference beam R32D by light beam R32D-1 ,-2 ,-3 ,-4 reflections of being formed during ejaculation.Light beam R32D is focused on the spatial filter pin hole 18a among the image plane 17a by lens 26a.The part of the reference beam R32D of reflection penetrates from spatial filter pin hole 18a and becomes by reference beam R42 light beam R42-1 ,-2 ,-3 ,-4 spatial filterings of forming, reflection.Reference beam R42 spatial filtering, reflection enters lens 36a.Reference beam R42 spatial filtering, reflection is from lens 36a outgoing and leave subsystem 81a and become by the reference beam R42A spatial filtering of light beam R42A-1 ,-2 ,-3 ,-4 collimations of forming, that reflect.

Detecting light beam P42A spatial filtering, scattering is incident upon on the dispersion element 130a shown in Fig. 3 a, and this dispersion element 130a is a reflecting diffraction grating preferably.The part of detecting light beam P42A spatial filtering, scattering is become the detecting light beam P42B of scattering by chromatic dispersion detector element 130a diffraction in the plane of Fig. 3 a.The detecting light beam P42B of scattering is incident upon on the second chromatic dispersion detector element 130b, and this chromatic dispersion detector element 130b is a transmission diffraction grating preferably.The part of the detecting light beam P42B of scattering is become the detecting light beam P42C of scattering wavenumber filtering, spatial filtering by the second chromatic dispersion detector element 130b diffraction in the plane of Fig. 3 a.Although light beam P42B and P42C are made up of a frequency spectrum of optical frequency component and therefore angled in the plane of Fig. 3 a (in angle) by chromatic dispersion, only the path of the frequency component of light beam P42B and P42C is illustrated among Fig. 3 a.Shown path is typical.The explanation of the frequency component of light beam P42B and P42C is only made and can introduce Fig. 3 a and subsequent drawings not exceeding the spirit and scope of the present invention and complicacy that will be inundue demonstration is with respect to the key property of the subsystem 84 of the detecting light beam P42C of scattering wavenumber filtering, spatial filtering.

Light beam P42C wavenumber filtering, spatial filtering enters subsystem 84, as shown in Fig. 3 k.The plane of Fig. 3 k is perpendicular to the plane of Fig. 3 a.Shown in Fig. 3 k, wavenumber filtering, the lens 66 and penetrate of spatial filtering light beam P42C by having an optical axis of aiming at the optical axis 3d of subsystem 84 become by light beam P42D-1 ,-2 ,-3 ,-4 light beam P42D wavenumber filtering of forming, spatial filtering.Be illustrated the light beam P42D scioptics 66 wavenumber filtering, spatial filtering that only have an optical frequency component and be focused figure image point 48 in the image plane 47.The position of the figure image point 48 in the image plane 47 and therefore figure image point 48 be arranged in position on the linear array of a detector pinhole of image plane 47 one and will depend on optical frequency according to light beam P42D wavenumber filtering, spatial filtering of chromatic dispersion detector element 130a and 130b.The part of the light beam of the linear array by this detector pinhole is detected by a detecting device 114, the detecting device that this detecting device 114 preferably is made up of the linear array of the pixel of for example linear array CCD.

Be incident upon on the chromatic dispersion detector element 130a at reference beam R42A spatial filtering shown in Fig. 3 a, reflection.The part of reference beam R42A spatial filtering, reflection is become the reference beam R42B of reflection by chromatic dispersion detector element 130a diffraction in the plane of Fig. 3 a.The reference beam R42B of reflection is incident upon on the second chromatic dispersion detector element 130b.The part of the reference beam R42B of reflection is become the reference beam R42C of reflection wavenumber filtering, spatial filtering by the second chromatic dispersion detector element 130b diffraction in the plane of Fig. 3 a.Although light beam R42B and R42C are made up of a frequency spectrum of optical frequency component and therefore angled in the plane of Fig. 3 a (in angle) by chromatic dispersion, only the path of the frequency component of light beam R42B and R42C is illustrated among Fig. 3 a.Shown path is typical.The explanation of the frequency component of light beam R42B and R42C is only made and can introduce Fig. 3 a and subsequent drawings not exceeding the spirit and scope of the present invention and complicacy that will be inundue demonstration is with respect to the key property of the part 84 of the detecting light beam R42C of scattering wavenumber filtering, spatial filtering.

The reference beam R42C of reflection wavenumber filtering, spatial filtering enters subsystem 84, as shown in Fig. 3 l.The plane of Fig. 3 l is perpendicular to the plane of Fig. 3 a.In Fig. 3 l, the reference beam R42C scioptics 66 of reflection wavenumber filtering, spatial filtering also penetrate the reference beam R42D that becomes by light beam R42D-1 ,-2 ,-3 ,-4 reflections wavenumber filtering of forming, spatial filtering.The reference beam R42D scioptics 66 that are illustrated reflection wavenumber filtering, spatial filtering that only has an optical frequency component in Fig. 3 l are focused the figure image point 48 in the image plane 47.The position of the figure image point 48 in the image plane 47 and therefore figure image point 48 be arranged in the optical frequency that the reference beam R42D of reflection wavenumber filtering, spatial filtering will be depended in position on the linear array of a detector pinhole of image plane 47 one.The part of the light beam of the linear array by this detector pinhole is detected by detecting device 114.

All the other situations of the 3rd embodiment shown in Fig. 3 a-3l preferably with to illustrated identical of Fig. 1 a-1n, no longer repeat specification here.

Level 1 in the 3rd preferred embodiment of the present invention differentiates it is that impulse response function by the imaging subsystem of operation equipment of the present invention in a plane of the planar quadrature of determining with chromatic

dispersion detector element

130a and 130b is realized.Also can realize the discriminating of a level 1 type in a modification of the 3rd preferred embodiment, wherein the equipment of this modification and electronic processing device and the 3rd preferred embodiment is basic identical, have around they separately optical axis turn over the phase shifter 14,24 and 34 of pi/2 radian.The remainder of the modification of the 3rd embodiment is identical with described in the modification of first preferred embodiment of the present invention preferably.

Referring now to Fig. 4 a-4f,, Fig. 4 a-4f shows the fourth embodiment of the present invention from first group of embodiment in schematic form, and wherein light source subsystem 80a, subsystem 81b and detector subsystem 84a preferably are configured for suitable slit confocal microscopy.In Fig. 4 a-4f, represent with similar code name with the element that the illustrated element of earlier in respect of figures 3a-3l is similar.Change shown in Fig. 4 b among the subsystem 80a occurs in the zone of light source 10a, should preferably contain the noncoherent line source in space, a broadband in the zone now, preferably filament or diode laser matrix; Change in the zone of the pin hole 8 also occur in the 3rd embodiment, this zone preferably includes the light source pin hole linear array 8a that an image with lens 6 formed line source 10a aligns now.The change of subsystem 81b shown in Fig. 4 c and the 4d is with the pin hole 81b among the subsystem 81a of alternative the 3rd embodiment of a linear array of the spatial filter pin hole 18b among the subsystem 81b.The change of subsystem 84a shown in Fig. 4 e and the 4f is the zone of detecting device 114a, and wherein preferably a two-dimensional array of detector pinhole and the detecting device 114 of the 3rd embodiment with pixel of linear array now are detecting device 114a who preferably includes the pixel of a two-dimensional array to the linear array of the pin hole in the image plane 47 of the 3rd embodiment.

In Fig. 4 b, light source pin hole linear array 8a and light source 10a are along the direction alignment perpendicular to Fig. 4 b plane.The plane of Fig. 4 b is perpendicular to the plane of Fig. 4 a.In Fig. 4 c and 4d, the linear array of spatial filter pin hole 18b is aligned the plane perpendicular to Fig. 4 c and 4d, and the plane of Fig. 4 c and 4d is perpendicular to the plane of Fig. 4 a.In Fig. 4 e and 4f, the two-dimensional array of the two-dimensional array of detector pinhole and detecting device pixel is aligned the plane perpendicular to Fig. 4 e and 4f.

The remainder of the 4th embodiment shown in Fig. 4 a-4f preferably counterpart with the 3rd preferred embodiment of above-mentioned Fig. 3 a-3l is identical.

Level 1 discriminating in the fourth embodiment of the present invention is to realize by the impulse response function of the imaging subsystem of operation equipment of the present invention in a plane that is orthogonal to the plane of being determined by chromatic dispersion detector element 130a and 130b.Also can realize the discriminating of a level 1 type in first modification of the 4th preferred embodiment, wherein the equipment of this modification and electronic processing device and the 4th preferred embodiment is basic identical, have around they separately optical axis turn over the phase shifter 14,24 and 34 of pi/2 radian.The remainder of the modification of the 4th embodiment is identical with the description of the corresponding aspects of first modification of second preferred embodiment of the present invention preferably.

Second modification of the 4th embodiment is described, wherein the equipment of this modification and electronic processing device and the 4th preferred embodiment is basic identical, except the linear array of the light source pin hole 8a of the 4th preferred embodiment and spatial filter pin hole 18a is substituted by a light source slit and a spatial filter slit.The remainder of second modification of the 4th embodiment is identical with the description of the corresponding aspects of the 4th preferred embodiment of the present invention preferably.

The reduction of the systematic influence of the out of focus image of second modification of the 4th preferred embodiment basically with slit confocal interference microscopy of the prior art realized identical.Yet, the influence of the statistics that caused by the out of focus image in second modification of the 4th preferred embodiment also is lowered to and is lower than the statistics influence that realizes in the prior art confocal interference microscopy, but effective not as what realize with the equipment of first modification of the 4th preferred embodiment and the 4th preferred embodiment usually.

Substitute slit separately and as in first modification of the 4th preferred embodiment and the 4th preferred embodiment, use a linear array of linear array of light source pin hole and space pin hole to produce to a restricted scanning of object materials requirement with the two-dimensional representation in the cross section that generates this object materials.The direction of this restricted scanning is the direction along the image of the linear array of the light source pin hole in this object materials.This restricted scanning occurs, because the interval between the pin hole on the direction of the image of the linear array of the light source pin hole in this object materials.In addition, when the interval between the pin hole on the direction of the image of the linear array of the light source pin hole in this object materials meets the condition of equation (54), keep high sensitivity to the detecting light beam of scattering wavenumber filtering, spatial filtering.

The number of steps of this restricted scanning be by the space ratio between the image of the light source pin hole of two adjacency in this object materials and separately the angular resolution of imaging system determine.In the practice, the number of steps in this restricted scanning will be less than the pinhole number in the linear array of light source pin hole and spatial filter pin hole significantly.Use the 4th preferred embodiment of the linear array that has light source pin hole and spatial filter pin hole and the equipment of first modification thereof like this, the two-dimensional representation in a cross section of object materials can be acquired and not scan basically.

In the description of the embodiment of the 5th group of embodiment and modification thereof, notice by each embodiment and modification thereof, obtain by an object materials scattering and/or reflection, the amplitude of the complex amplitude of the detecting light beam of a scattering and phase place.The statistical error of the remarkable minimizing in the determining of the complex amplitude of the detecting light beam of a scattering of each embodiment and modification thereof and the systematic error of minimizing are can be stored with recording medium for a given CD and the relevant character of maximal density of data retrieved, and this recording medium is this object materials.

The form that is used for the data of memory point (site) storage is generally scale-of-two, and one can obtain to use.Signal to noise ratio (S/N ratio) with increase that the characteristic of quoting by the systematic error of the statistical error of the minimizing of these embodiment that are used for the 5th group of embodiment described here and modification thereof and minimizing stands, the maximal density of the data that can store in one of a CD given recording medium can be increased.Data in memory point storage can represent that basic N is used for amplitude quilt and its N amplitude window relatively of complex amplitude with one (basic N) * (basic M) form, and basic M is used for phase place quilt and its M phase window relatively of complex amplitude.

For these embodiment and the modification thereof of the 5th group of embodiment, the amplitude of complex amplitude is handled to determine which of N window this amplitude be arranged in by a series of N window comparator electronic processors.Similarly, the phase place of this complex amplitude is handled to determine which of M window be this phase place be arranged in by a series of M window comparator electronic processors.N that can be used and the value of M will be determined by the factor in processing time of signal to noise ratio (S/N ratio) that for example obtains and requirement.The raising of the maximal density by using the 5th group of data of storing among the embodiment in an optical memory is directly proportional with product N * M.

The element of element similar functions that has first embodiment of many execution and the 5th group of embodiment from the of the present invention current preferred embodiment of second group of embodiment with similar reference number.In the confocal microscopy system shown in Fig. 1 a, subsystem 82 is by subsystem 82aa, and

dispersion element

130c and 130d reach subsystem 85 and substitute; And subsystem 83 is by subsystem 83aa, and catoptron 120a reaches subsystem 95 and substitutes, shown in Fig. 1 aa, so that the fifth embodiment of the present invention to be provided.The 5th embodiment comprises a Michelson interferometer of being made up of a beam splitter 100, object materials 112, shifter 116, reference mirror 120, chromatic dispersion detecting

light beam element

130c and 130d, chromatic

dispersion detector element

130a and 130b and detecting device 114.

Shown in Fig. 1 aa, light beam 22a is become the light beam P22B that is made up of light beam P22B-1 ,-2 ,-3 ,-4 and enters subsystem 82aa by transmission partly by beam splitter 100, and it is illustrated in Fig. 1 d.

In Fig. 1 aa, light beam P22B incides one by on phase shifter 24-1 ,-2 ,-3 ,-4 phase shifters of being formed 24.The plane of Fig. 1 ab is perpendicular to the plane of Fig. 1 aa.Phase shifter 24 and 14 contains 2m unit with phase shifter 14 similar numbers, and shown in Fig. 1 ab is the situation of m=2.Light beam P22B-1 ,-2 ,-3 ,-4 sees through phase shifter 24-1 ,-2 ,-3 ,-4 respectively, becomes light beam P22C-1 ,-2 ,-3 ,-4 after the outgoing respectively, and they have formed light beam P22C.Phase shifter 24-1 is identical with the phase-shift phase that 24-3 is imported, and be than the big radian of phase shift that phase shifter 24-2 and 24-4 imported, and phase shifter 24-2 is identical with the phase-shift phase that 24-4 is imported.

By each phase-shift phase sum that phase shifter 14-1 and 24-1,14-2 and 24-2,14-3 and 24-3,14-4 and 24-4 are produced all is the π radian.So do not exist net phase to phase shift between any two light beams among the light beam P22C-1 ,-2 ,-3 ,-4.Light beam P22C sees through lens 26, becomes by light beam P22D-1 ,-2 ,-3 ,-4 light beam P22D that formed, and the latter is focused into the first middle detecting light beam spot of the figure image point 18 that is located in the burnt image plane 17.Light beam P22D penetrates from figure image point 18 and becomes the light beam P32 that is made up of light beam P32-1 ,-2 ,-3 ,-4.Light beam P32 enters the lens 36 with optical axis of aiming at the optical axis 3 of subsystem 82aa.Light beam P32 penetrates and leaves subsystem 82aa from lens 36 and becomes light beam P32A by light beam P32A-1 ,-2 ,-3 ,-4 collimations of forming.

In Fig. 1 aa, detecting light beam P32A is incident upon on the 3rd dispersion element, the chromatic dispersion detecting light beam element 130c, and this dispersion element 130c is a reflecting diffraction grating preferably.The part of detecting light beam P32A is become the detecting light beam P32B that is made up of light beam P32B-1 ,-2 ,-3 ,-4 by the 3rd chromatic dispersion detector element 130c diffraction in the plane of Fig. 1 aa.Detecting light beam P32B is incident upon on the 4th dispersion element, the chromatic dispersion detecting light beam element 130d, and this dispersion element 130d is a transmission diffraction grating preferably.The part of detecting light beam P32B is become the detecting light beam P32C that is made up of light beam P32C-1 ,-2 ,-3 ,-4 by the 4th dispersion element 130d diffraction in the plane of Fig. 1 aa.Although light beam P32B and P32C are made up of a frequency spectrum of optical frequency component and therefore angled in the plane of Fig. 1 aa (in angle) by chromatic dispersion, only the path of the frequency component of light beam P32B and P32C is illustrated among Fig. 1 aa.Shown path is typical.The explanation of the frequency component of light beam P32B and P32C is only made and can introduce Fig. 1 aa and subsequent drawings not exceeding the spirit and scope of the present invention and complicacy that will be inundue demonstration is with respect to the key property of subsystem 85 shown in Fig. 1 ac of detecting light beam P32C.

In Fig. 1 ac, detecting light beam P32C enters subsystem 85 and scioptics 46 to form the detecting light beam P32D that is made up of light beam P32D-1 ,-2 ,-3 ,-4.Thereby detecting light beam P32D is focused on to form a line chart this object materials 112 that resembles and throw light in burnt image plane 27 in object materials 112 by lens 46.Line chart in burnt image plane 27 resembles and comprises figure image point 28.The axle of this line chart elephant is substantially perpendicular to the optical axis 3a of imaging subsystem 85.The length of this line chart elephant is determined that by the combination of the factor of the optical bandwidth of the dispersive power of focal length, chromatic dispersion detecting light beam element 130c and the 130d of for example lens 46 and light source 10 dispersive power of the focal length of lens 46 and chromatic dispersion detecting

light beam element

130c and 130d can be conditioned.This line segment can be cut one or more surface of object materials or be positioned at a surface of this object materials.The optical axis alignment of lens 46 is in the optical axis 3a of subsystem 85.

In Fig. 1 aa, light beam 22A is partly reflected by beam splitter 100, becomes by light beam R22B-1 ,-2 ,-3 ,-4 light beam R22B that formed.Light beam R22B enters the subsystem 83aa that is shown in Fig. 1 ad.The plane of Fig. 1 ad is perpendicular to the plane of Fig. 1 aa.Shown in Fig. 1 ad.Light beam R22B is incident on one by on phase shifter 34-1 ,-2 ,-3 ,-4 phase shifters of being formed 34.Phase shifter 34 and 14 contains the unit of similar number 2m, and the situation of m=2 has been shown among Fig. 1 ad.Light beam R22B sees through phase shifter 34, sees through phase shifter 44 then again, becomes after the outgoing by light beam R22C-1 ,-2 ,-3 ,-4 light beam R22C that formed.The phase-shift phase that is imported by phase shifter 44 is subjected to control from the signal 132 of computing machine 118.

Phase shifter 34-1 is identical with the phase-shift phase that 34-3 is imported, the π of the manying radian that is imported than phase shifter 34-2 or 34-4, and phase shifter 34-2 is identical with the amount of phase shift that 34-4 is imported.So do not have net phase to phase shift between any two light beams in light beam R22C-1 ,-2 ,-3 ,-4.Light beam R22C becomes by light beam R22D-1 ,-2 ,-3 ,-4 light beam R22D that formed after seeing through lens 56.Light beam R22D is focused into the figure image point 38 in burnt image plane 37 on the reference mirror 120 by lens 56.The optical axis of lens 56 is in alignment with the optical axis 3b's of subsystem 83.Reference beam R22D penetrates from the middle reference beam spot at figure image point 38 and becomes the reference beam R32 that is made up of light beam R32D-1 ,-2 ,-3 ,-4.Reference beam R32 enters the lens 66 that have with an optical axis of the optical axis alignment of subsystem 83aa.Reference beam R32 penetrates and leaves subsystem 83aa from lens 66 and becomes reference beam R32A by light beam R32A-1 ,-2 ,-3 ,-4 collimations of forming.

In Fig. 1 aa, reference beam R32A is reflected and is directed to subsystem 95 by catoptron 120a and becomes the reference beam R32B that is made up of light beam R32B-1 ,-2 ,-3 ,-4.In Fig. 1 ae, reference beam R32B scioptics 76 become the light beam R32C that is made up of light beam R32C-1 ,-2 ,-3 ,-4.Reference beam R32C focuses on the figure image point 48 in burnt image plane 47 on the reference mirror 120 by lens 76.The optical axis of lens 76 is aimed at the optical axis 3c of subsystem 95.

In Fig. 1 af, the part of light beam P32D (seeing Fig. 1 ac) is reflected and/or scattering by the object materials that the line chart in burnt image plane 27 resembles in the zone, becomes a plurality of light beam P32-1 ,-2 ,-3 ,-4 of the detecting light beam P42 that has formed scattering.The detecting light beam P42 of scattering resembles from the line chart burnt image plane 27 and disperses, and enters lens 46.Shown in Fig. 1 af, the detecting light beam P42 of scattering penetrates and leaves subsystem 85 from lens 46 and becomes by light beam P42A-1 ,-2 ,-3 ,-4 collimated light beam P42A that formed.

In Fig. 1 aa, detecting light beam P42A is incident upon on the 4th dispersion element 130d.The part of detecting light beam P42A is become detecting light beam P42B by light beam P42B-1 ,-2 ,-3 ,-4 scatterings of forming by chromatic dispersion detecting light beam element 130d diffraction in the plane of Fig. 1 aa.The detecting light beam P42B of scattering is incident upon on the 3rd dispersion element 130c.The part of the detecting light beam P42B of scattering is become the detecting light beam P42C by light beam P42C-1 ,-2 ,-3 ,-4 scatterings of forming in the plane of Fig. 1 aa.Although light beam P42B and P42C are made up of a frequency spectrum of optical frequency component and therefore angled in the plane of Fig. 1 aa (in angle) by chromatic dispersion, only the path of the frequency component of light beam P42B and P42C is illustrated among Fig. 1 aa.The optical frequency in the component path of light beam P42B and P42C is identical with the optical frequency in detecting light beam P32B shown in Fig. 1 aa and P32C component path.

In Fig. 1 ag, detecting light beam P42C enters subsystem 82aa (seeing Fig. 1 aa).In Fig. 1 ag, the detecting light beam P42 C of scattering enters lens 36 and penetrates the detecting light beam P42D that formation is made up of light beam P42D-1 ,-2 ,-3 ,-4.Detecting light beam P42D focuses on the middle scatter sounding beam spot that the figure image point 18 in burnt image plane 17 goes out by lens 36.Although only the path of the frequency component of the detecting light beam P42D of scattering is illustrated among Fig. 1 ag, the figure image point of all optical frequency components of detecting light beam P42D that is used for scattering is identical with a figure image point that briefly shows at Fig. 1 ag: the optical system of being made up of lens 36, chromatic dispersion detecting

light beam element

130c and 130d, lens 46 and object materials 112 is the confocal imaging system with figure image point 18, for the entire spectrum of the optical frequency component of light beam P32, this figure image point 18 is the conjugation figure image points of himself.

Continue 1ag with the aid of pictures, the detecting light beam P42D of scattering penetrates from figure image point 18 to be become by light beam P52-1 ,-2 ,-3 ,-4 light beam P52 that formed.The detecting light beam P52 of scattering enters lens 26 and collimated to form by light beam P52A-1 ,-2 ,-3 ,-4 light beam P52A that formed.Light beam P52A-1 ,-2 ,-3 ,-4 also penetrates by phase shifter 24-4 ,-3 ,-2 ,-1 respectively becomes light beam P52B-1 ,-2 ,-3 ,-4.Light beam P32B-1 ,-2 ,-3 ,-4 comprises the detecting light beam P52B of the scattering of leaving subsystem 82aa.Phase shifter 24-1 is identical with the phase-shift phase that 24-3 is imported, the π of the manying radian that is imported than phase shifter 24-2 or 24-4, and phase shifter 24-2 is identical with the amount of phase shift that 24-4 is imported.

In Fig. 1 ah, reference beam R32D (seeing Fig. 1 ae) is by the reference beam R42 of reference mirror 120 reflections becoming light beam R42-1 ,-2 ,-3 ,-4 reflections of being formed.The reference beam R4 of reflection penetrates and enters lens 76 from the figure image point burnt image plane 47 48.Shown in Fig. 1 ah, the reference beam R42 of reflection from lens 76 penetrate become by light beam R42A-1 ,-2 ,-3 ,-the reference beam R42 of the reflection of 4 collimations of being formed.

In Fig. 1 aa, reference beam R42A is by catoptron 120a reflection and be directed to subsystem 83aa and become reference beam R42B by light beam R42B-1 ,-2 ,-3 ,-4 reflections of forming.In Fig. 1 ai, the reference beam R42B scioptics 66 of reflection become the reference beam R42C by light beam R42C-1 ,-2 ,-3 ,-4 reflections of forming.The reference beam R42C of reflection is focused on the middle reflected reference beam image spot at figure image point 38 places in burnt image plane 37 by lens 66.Reference beam R42C penetrates from the middle reflected reference beam image spot at figure image point 38 and becomes the reference beam R52 that is made up of light beam R52-1 ,-2 ,-3 ,-4.Reference beam R52 enters lens 56 and becomes the reference beam R52A that is made up of light beam R52A-1 ,-2 ,-3 ,-4 from lens 56 ejaculations.Shown in Fig. 1 ai, the reference beam R52 of reflection penetrates the reference beam R52A that becomes by the reflection of light beam R52A-1 ,-2 ,-3 ,-4 collimations of forming from lens 56.Light beam R52A-1 ,-2 ,-3 ,-4 is at first by phase shifter 44 and become reference beam R32 B by light beam R32B-1 ,-2 ,-3 ,-4 reflections of forming by phase shifter 34-4 ,-3 ,-2 ,-1 with ejaculation respectively then.The phase-shift phase that is imported by phase shifter 44 is subjected to control from the signal 132 of computing machine 118.Phase shifter 34-1 is identical with the phase-shift phase that 34-3 is imported, and than the π of the manying radian that is imported by phase shifter 34-2 or 34-4, is identical by moving the phase-shift phase that is imported at 34-2 and 34-4.The light beam R32B-1 ,-2 ,-3 ,-4 that forms light beam R32B leaves subsystem 83aa.

All the other of the 5th embodiment describe with to first embodiment the description of counterpart identical.

Interference cross term between the complex amplitude of the complex amplitude of the detecting light beam P62D of interference cross term between the complex amplitude of the complex amplitude of the detecting light beam P42D of the scattering wavenumber filtering of first embodiment, spatial filtering and the reference beam R42D of reflection wavenumber filtering, spatial filtering and scattering wavenumber filtering, spatial filtering of the 5th embodiment and the reference beam R62D of reflection wavenumber filtering, spatial filtering comprises the information of the line segment of two basic quadratures in the relevant object materials 112, and the figure image point of these line segments is separately obtained simultaneously.For first embodiment, the line segment in the object materials 112 is arranged essentially parallel to the optical axis 3 of subsystem 82 and for the 5th embodiment, the line segment in the object materials 112 is substantially perpendicular to the optical axis 3a of subsystem 85.

Level 1 in the thing preferred embodiment of the present invention differentiates it is that impulse response function by the imaging subsystem of operation equipment of the present invention in a plane of the planar quadrature of determining with chromatic dispersion detecting

light beam element

130c and 130d and chromatic

dispersion detector element

130a and 130b is realized.Also can realize the discriminating of a level 1 type in a modification of the 5th preferred embodiment, wherein the equipment of this modification and electronic processing device and the 5th preferred embodiment is basic identical, have around they separately optical axis turn over the phase shifter 14,24 and 34 of pi/2 radian.Identical in the reduction of the systematic influence of out of focus image and the 5th preferred embodiment in the modification of the 5th preferred embodiment.The statistics that is caused by the out of focus image in the modification of the 5th preferred embodiment influences also to be lowered to and be lower than the statistics influence that realizes in the prior art confocal interference microscopy, but effective not as what realize with the equipment of the 5th preferred embodiment usually.

Have many execution and element, the slit confocal microscopy that the 6th embodiment is constructed for being similar to from of the present invention current the 6th preferred embodiment of second group of embodiment from the element identical function among second embodiment of first group of embodiment with same reference numbers.In the confocal microscopy system shown in Fig. 2 a, subsystem 82 is by subsystem 82aa, and

dispersion element

130c and 130d reach subsystem 85 and substitute; And subsystem 83 is by subsystem 83aa, and catoptron 120a reaches subsystem 95 and substitutes, shown in Fig. 2 aa, so that the sixth embodiment of the present invention to be provided.The 6th embodiment comprises a Michelson interferometer of being made up of a beam splitter 100, object materials 112, shifter 116, reference mirror 120, chromatic dispersion detecting

light beam element

130c and 130d, chromatic

dispersion detector element

130a and 130b and detecting device 114.

All the other of the 6th embodiment describe with to the second and the 5th embodiment the description of counterpart identical.

Interference cross term between the complex amplitude of the complex amplitude of the detecting light beam P62D of interference cross term between the complex amplitude of the complex amplitude of the detecting light beam P42D of the scattering wavenumber filtering of second embodiment, spatial filtering and the reference beam R42D of reflection wavenumber filtering, spatial filtering and scattering wavenumber filtering, spatial filtering of the 6th embodiment and the reference beam R62D of reflection wavenumber filtering, spatial filtering comprises the information of the line segment of two basic quadratures in the relevant object materials 112, and the figure image point of these two-dimensional sections is separately obtained simultaneously.For second embodiment, the normal of the two-dimensional section in the object materials 112 is substantially perpendicular to the optical axis 3 of subsystem 82 and for the 6th embodiment, the normal of the two-dimensional section in the object materials 112 is arranged essentially parallel to the optical axis 3a of subsystem 85.

Have many execution and element from of the present invention current the 7th preferred embodiment of second group of embodiment from the element identical function among the 3rd embodiment of first group of embodiment with same reference numbers.In the confocal microscopy system shown in Fig. 3 a, subsystem 82 is by subsystem 82aa, and

dispersion element

130c and 130d reach subsystem 85 and substitute; And subsystem 83a is by subsystem 83ab, and catoptron 120a reaches subsystem 95 and substitutes so that the seventh embodiment of the present invention to be provided.The 7th embodiment comprises a Michelson interferometer of being made up of a beam splitter 100, object materials 112, shifter 116, reference mirror 120, chromatic dispersion detecting

light beam element

130c and 130d, chromatic

dispersion detector element

130a and 130b and detecting device 114.

All the other of the 7th embodiment describe with to the 3rd and the 6th embodiment the description of counterpart identical.

Interference cross term between the complex amplitude of the complex amplitude of the detecting light beam P62D of interference cross term between the complex amplitude of the complex amplitude of the detecting light beam P42D of the scattering wavenumber filtering of the 3rd embodiment, spatial filtering and the reference beam R42D of reflection wavenumber filtering, spatial filtering and scattering wavenumber filtering, spatial filtering of the 7th embodiment and the reference beam R62D of reflection wavenumber filtering, spatial filtering comprises the information of the line segment of two basic quadratures in the relevant object materials 112, and the figure image point of these line segments is separately obtained simultaneously.For the 3rd embodiment, the line segment in the object materials 112 is arranged essentially parallel to the optical axis 3 of subsystem 82 and for the 7th embodiment, the line segment in the object materials 112 is substantially normal to the optical axis 3a of subsystem 85.

Have many execution and element from of the present invention current the 8th preferred embodiment of second group of embodiment from the element identical function among the 4th embodiment of first group of embodiment with same reference numbers.In the confocal microscopy system shown in Fig. 4 a, subsystem 82 is by subsystem 82aa, and

dispersion element

130c and 130d reach subsystem 85 and substitute; And subsystem 83a is by subsystem 83ab, and catoptron 120a reaches subsystem 95 and substitutes so that the eighth embodiment of the present invention to be provided.The 8th embodiment comprises a Michelson interferometer of being made up of a beam splitter 100, object materials 112, shifter 116, reference mirror 120, chromatic dispersion detecting

light beam element

130c and 130d, chromatic

dispersion detector element

130a and 130b and detecting device 114.

All the other of the 8th embodiment describe with to the 4th and the 7th embodiment the description of counterpart identical.

Interference cross term between the complex amplitude of the complex amplitude of the detecting light beam P62D of interference cross term between the complex amplitude of the complex amplitude of the detecting light beam P42D of the scattering wavenumber filtering of the 4th embodiment, spatial filtering and the reference beam R42D of reflection wavenumber filtering, spatial filtering and scattering wavenumber filtering, spatial filtering of the 8th embodiment and the reference beam R62D of reflection wavenumber filtering, spatial filtering comprises the information of the two-dimensional section of two basic quadratures in the relevant object materials 112, and the figure image point of these two-dimensional sections is separately obtained simultaneously.For the 4th embodiment, the normal of the two-dimensional section in the object materials 112 is substantially normal to the optical axis 3 of subsystem 82 and for the 8th embodiment, the normal of the two-dimensional section in the object materials 112 is arranged essentially parallel to the optical axis 3a of subsystem 85.

Of the present invention current preferred the 9th, the tenth, the 11 and the 12 embodiment and modification thereof from the 3rd group of embodiment include and the first, second, third and the 4th embodiment and modification components identical and subsystem, except dispensing phase shifter 14,24,34 and 34a.It is identical with the description to the counterpart of the embodiment of first group of embodiment and modification thereof that these embodiment among the 3rd group of embodiment and all the other of modification thereof are described, except the level of the statistical precision that is used for the image in the given interval with respect to acquisition.

The level that is used for the statistical precision of the image in the given interval from the acquisition of these embodiment of first group of embodiment and modification thereof recently will be got well from the level that the acquisition of these embodiment of the 3rd group of embodiment and modification thereof is used for the statistical precision of the image in the given interval.Yet with respect to the statistical error of the visual correspondence of introducing of the out of focus in the confocal interference microscopy of the prior art, for these embodiment and the modification thereof of the 3rd group of embodiment, the statistical error of being introduced by the amplitude of out of focus image will be reduced widely.

On by pixel basis relatively, the interference between the complex amplitude of the reference beam of the complex amplitude wavenumber filtering in these embodiment of the 3rd group of embodiment and the detector plane of modification thereof, spatial filtering background light beam and reflection wavenumber filtering, spatial filtering intersects corresponding interference that item size and acquisition be used for the confocal interference microscopy of prior art, and to intersect item size basic identical.Yet, in a given interval, the statistical error of every figure image point of an imaging line segment of the object materials that obtains with the equipment of these embodiment of the 3rd group of embodiment and modification thereof is identical with the statistical error that obtains in the identical time interval for the only single figure image point in the confocal interference microscopy of prior art.For the two-dimensional section of imaging object material, adopt identical statement.Difference is when the statistical precision of an image of a line segment of considering the object materials that obtains in the identical time interval or two-dimensional section, statistical error with respect to the visual correspondence of introducing of the out of focus in the confocal interference microscopy of the prior art, for these embodiment and the modification thereof of the 3rd group of embodiment, the basis of the conclusion that the statistical error of being introduced by the amplitude of out of focus image will be reduced widely.

Of the present invention current preferred the 13rd, the 14th, the 15th and the 16th embodiment and modification thereof from the 4th group of embodiment include and the 5th, the 6th, the 7th and the 8th embodiment and modification components identical and subsystem, except dispensing phase shifter 14,24,34 and 34a.It is identical with the description to the counterpart of the embodiment of second group of embodiment and modification thereof that these embodiment among the 4th group of embodiment and all the other of modification thereof are described, except with respect to the level from the minimizing of the background of out of focus image and compensation.

From the acquisition of these embodiment of second group of embodiment and modification thereof from the level of the minimizing of the background of out of focus image and compensation will get well recently from the acquisition of these embodiment of the 4th group of embodiment and modification thereof from the minimizing of the background of out of focus image and the level of compensation.Yet with respect to the statistical error of the visual correspondence of introducing of the out of focus in the confocal interference microscopy of the prior art, for these embodiment and the modification thereof of the 4th group of embodiment, the statistical error of being introduced by the amplitude of out of focus image will be reduced widely.

On by pixel basis relatively, the interference between the complex amplitude of the reference beam of the complex amplitude wavenumber filtering in the detecting device image plane of these embodiment of the 4th group of embodiment and modification thereof, spatial filtering background light beam and reflection wavenumber filtering, spatial filtering intersects corresponding interference that item size and acquisition be used for the confocal interference microscopy of prior art, and to intersect item size basic identical.Yet, in a given interval, the statistical error of every figure image point of an imaging line segment of the object materials that obtains with the equipment of these embodiment of the 4th group of embodiment and modification thereof is identical with the statistical error that obtains in the identical time interval for the only single figure image point in the confocal interference microscopy of prior art.For the two-dimensional section of imaging object material, adopt identical statement.Difference is when the statistical precision of an image of a line segment of considering the object materials that obtains in the identical time interval or two-dimensional section, statistical error with respect to the visual correspondence of introducing of the out of focus in the confocal interference microscopy of the prior art, for these embodiment and the modification thereof of the 4th group of embodiment, the basis of the conclusion that the statistical error of being introduced by the amplitude of out of focus image will be reduced widely.

Of the present invention current preferred the 17th, the 18th, the 19th and the 20th embodiment and modification thereof from the 5th group of embodiment include and the first, second, third and the 4th embodiment and modification components identical and subsystem, except the non-achromatism finder lens of these embodiment that replace first group of embodiment with little aberration finder lens and modification thereof.It is identical with the description to the counterpart of the embodiment of first group of embodiment and modification thereof that these embodiment among the 5th group of embodiment and all the other of modification thereof are described, except the level with respect to the statistical precision that obtains in a given interval.

The same with level from the acquisition of these embodiment of the 5th group of embodiment and modification thereof from the minimizing of the background of out of focus image and compensation from the acquisition of these embodiment of first group of embodiment and modification thereof from the level of the minimizing of the background of out of focus image and compensation.Yet, the statistical error of the correspondence of introducing with respect to the image of the out of focus in the equipment of these embodiment of five groups of embodiment and modification thereof, these embodiment and modification thereof for first group of embodiment, the statistical error of being introduced by the amplitude of out of focus image will be better, the 5th group of embodiment by the time sequence obtain the figure image point.

From the level from the minimizing of the background of out of focus image and compensation of the acquisition of these embodiment of the 5th group of embodiment and modification thereof be better than significantly with confocal interference microscopy of the prior art obtain from the minimizing of the background of out of focus image and the level of compensation.On by pixel basis relatively, the interference between the complex amplitude of the reference beam of the complex amplitude wavenumber filtering in the detecting device image plane of these embodiment of the 5th group of embodiment and modification thereof, spatial filtering background light beam and reflection wavenumber filtering, spatial filtering intersects item size and intersects item size with respect to the interference of the correspondence of the confocal interference microscopy that obtains to be used for prior art and reduced widely.Like this, in given time interval, the statistical precision that is used for image that obtains with the equipment of these embodiment of the 5th group of embodiment and modification thereof and the level of systematic error are better than the statistical precision that obtains of confocal interference microscopy of prior art and the level of systematic error significantly in the identical time interval.

Those skilled in the art that should see, under the situation that does not depart from spirit of the present invention and category, in order to change present device to reducing from the program of the signal of out of focus image and the character of spatial resolution, can to phase shifter 14,24,24a, 34 and 34a use the secondary lobe technology of removing.They also should see, under the situation that does not depart from the present invention's spirit and category, phase shifter 14,24,24a, 34 and the function of 34a also can reach with other phase shifter combination, perhaps be configured to element with one group of concentric circles unit or other geometric scheme unit.

Phase shifter

14,24,24a, 34,34a and 44 can be the electric light type or other dispersing optics component types.Be discussed below about the list of references of dispersing optics component type in the paragraph of broadband operation and provide.Perhaps, the phase shift that is imported by phase shifter 44 described herein also can produce by catoptron is moved, and reference mirror 120 is moved along the direction of the optical axis 3a of

subsystem

83 and 83a.

If by

phase shifter

14,24,24a, 34,34a and 44 phase-shift phase that is imported and Wavelength-independents, then present device can be improved to the performance of wideband light

source.By phase shifter

14,24,24a, 34,34a and 44 suitably is designed to for example following two disclosed types of patent, then might satisfy the requirement of broad-band phase shifter, these two patents are: authorize H.A.Hill (Xi Er) in July, 1980, the U.S. Patent No. 4 of J.W.Figoski (Fei Gesiji) and P.T.Ballard (Ba Lade), 213,706: " Background CompensatingInterferometer the interferometer of background compensation (band) " and authorize H.A.Hill in Dec, 1981, the U.S. Patent No. 4 of J.W.Figoski and P.T.Ballard, 304,464, the latter's title also is " Background Compensating Interferometer ".

For each embodiment and the modification thereof of the 5th group of embodiment, by the embodiment and the modification thereof that are used for information is written to the object materials that comprises a recording medium of correspondence.Respectively be used for the embodiment of write information and embodiment and the process variant and the equipment of the correspondence that modification comprises the 5th group of embodiment thereof.Except following the variation that constitutes: light source and reference mirror subsystem are exchanged and detecting device and detector pinhole are write catoptron by one and be replaced, and this is write catoptron and will be incident upon this and write the light from light source on the catoptron and draw basically and get back on himself.This is write the reflectivity of catoptron and writes phase shift that catoptron introduces by this is to combine this function of writing the position on the catoptron of configuration with a phase shift procedure to produce the image of expectation in object materials.This phase shift procedure carry out be similar in the reference beam of reflection wavenumber filtering, spatial filtering, introduce a series of phase shifts with these embodiment that obtain to be used for the 5th group of embodiment and modification thereof first, second, third with the similar function of program of the 4th intensity level of measuring.

For the embodiment that writes described here, this recording process comprises that the recording mediums of a plurality of different mechanism and this CD comprise that the example of the combination recording process of multiple different material and different material comprises the electrooptical effect of for example faraday's rotation and Kerr effect and magneto-optic effect and photochemistry hole burn (hole burning).

When the variation of the polarization state when using magneto-optic effect for recording process so that by detecting a detecting light beam scattering or transmission came the information of retrieve stored, these embodiment of the 5th group of embodiment were configured the complex amplitude with the detecting light beam of the polarization of the detecting light beam that detects scattering and scattering.These embodiment of five groups of embodiment are configured so that for example polarization beam apparatus and the complex amplitude of different polarization states of measuring the detecting light beam of this scattering that is separated by this analyser detect the polarization of the detecting light beam of scattering by an analyser by the detecting light beam of scattering is transmitted.

When an embodiment of writing described here uses one amplitude-recording medium, nonlinear amplitude-recording medium and/or phase recording medium, the statistical error of the minimizing that is associated with image in the recording medium and the volume of minimizing systematic error, the characteristic of writing embodiment described here, density in the data of memory point storage is directly proportional with N * M, and wherein N and M have the identical implication of the description of reading embodiment with the 5th group of embodiment.

Write the space distribution of writing the phase shift that catoptron produces of embodiment and modification thereof by these and the space distribution of reflectivity is controlled in a given memory point canned data content.By writing catoptron reflectivity of windowing that produces and the phase shift of the windowing matrix control by electric light amplitude modulaor that is positioned at this catoptron front and phase shifter, the state of this electric light amplitude modulaor and phase shifter is by computer control.The similar electronic processes of using in the windowing of window the amplitude by being similar to the multiple scattering amplitude of measuring in the 5th group of embodiment and the phase place of reflectivity and phase shift of electronic processes realizes.

By these embodiment of first and the 3rd group of embodiment and modification thereof measure a finder lens axially on the detecting light beam of scattering wavenumber filtering, spatial filtering and the Fourier transform that is proportional to the multiple scattering amplitude of the figure image point in an object materials of the interference term between the reference beam of reflection wavenumber filtering, spatial filtering.Similarly, by corresponding to these embodiment of first and the 3rd group of embodiment and modification thereof write embodiment and modification thereof be stored in the information of a memory point with by the interference term direct ratio between the reference beam of the light beam corresponding wavenumber filtering, spatial filtering of writing mirror reflects and reflection wavenumber filtering, spatial filtering.By the interference term between the reference beam of light beam wavenumber filtering, spatial filtering of the correspondence of writing mirror reflects and reflection wavenumber filtering, spatial filtering be directly proportional in the Fourier transform of writing the complex index of reflection separately on the catoptron.

Those skilled in the art that should see, when the complex index of reflection of writing catoptron selected so that by the wavenumber filtering of the correspondence of writing mirror reflects, the light beam of spatial filtering and wavenumber filtering, when the interference term between the reference beam of the reflection of spatial filtering is directly proportional with the inversefouriertransform of the information of waiting to be stored in a memory point, by these embodiment of first and the 3rd group of embodiment and modification thereof measure a finder lens axially on wavenumber filtering, the detecting light beam of the scattering of spatial filtering and wavenumber filtering, the interference term of the measurement between the reference beam of the reflection of spatial filtering is proportional to the initial information of storage.Do not need like this, in this embodiment to measure by these embodiment of first and the 3rd group of embodiment and modification thereof a finder lens axially on multiple scattering amplitude carry out Fourier transform and recover stored initial information.

The advantage of some embodiment of first and the 3rd group of embodiment be by on the depth direction of wafer basically simultaneously imaging one line segment be implemented in the chromatographical X-ray complex amplitude image of a wafer that uses in the manufacturing of integrated circuit, have the statistical error of remarkable minimizing and have with a sequence measuring that carries out with prior art single needle hole confocal interference microscopy or holography in the background that obtains from the out of focus image compare remarkable minimizing or identical background from the out of focus image.Imaging can be used to reduce widely the sensitivity of moving, scan or vibrate the motion of the wafer that generates by for example wafer on depth direction in the line segment on the depth direction of wafer.Also can be used for discerning a surface of this wafer and/or the surface in this wafer at one line segment of imaging simultaneously on the depth direction of wafer with the information of obtaining simultaneously from a plurality of degree of depth.

The advantage of some embodiment of first and the 3rd group of embodiment be by on the depth direction of wafer basically simultaneously imaging one two-dimensional section be implemented in the chromatographical X-ray complex amplitude image of a wafer that uses in the manufacturing of integrated circuit, have the statistical error of remarkable minimizing and have with a sequence measuring that carries out with prior art single needle hole and slit confocal interference microscopy or holography in the background that obtains from the out of focus image compare remarkable minimizing or identical background from the out of focus image.A depth direction that is parallel to this wafer of the two-dimensional section of this wafer.The depth direction of wafer and transversely in the two-dimensional section imaging can be used to reduce sensitivity widely the motion of the wafer that generates by the moving of for example wafer, scanning and/or vibration on depth direction.Imaging also can be used for being used in the information that other positions obtain simultaneously and discern a surface of this wafer and/or the surface in this wafer in the two-dimensional section in wafer, and this surface and/or inner surface may be used as the purpose of registration.

Some a advantage of certain of first and the 3rd group of embodiment be by on the depth direction of biological sample basically one line segment of imaging simultaneously realize a chromatography X ray complex amplitude image of the biological sample under the natural conditions, an image that in a non-invasive biopsy samples of biological sample, can be used for example, have the statistical error of remarkable minimizing and have with a sequence measuring that carries out with prior art single needle hole confocal interference microscopy or holography in the background that obtains from the out of focus image compare remarkable minimizing or identical background from the out of focus image.Simultaneously imaging one line segment can be used to reduce the sensitivity to the motion of the biological sample that is generated by biological example movement of sample, scanning or vibration on depth direction widely on the depth direction of biological sample.Also can be used for discerning a surface of this biological sample and/or the surface in this biological sample at one line segment of imaging simultaneously on the depth direction of biological sample with the information of obtaining simultaneously from a plurality of degree of depth.

Some a advantage of certain of first and the 3rd group of embodiment is to realize by a two-dimensional section of the last biological sample of imaging simultaneously basically a chromatography X ray complex amplitude image of the biological sample under the natural conditions, an image that in a non-invasive biopsy samples of biological sample, can be used for example, have the statistical error of remarkable minimizing and have with a sequence measuring that carries out with prior art single needle hole and slit confocal interference microscopy or holography in the background that obtains from the out of focus image compare remarkable minimizing or identical background from the out of focus image.A depth direction that is parallel to this biological sample of the two-dimensional section of biological sample.Simultaneously imaging one two-dimensional section can be used to reduce widely in depth direction and the sensitivity by the motion of the biological sample of the moving of biological sample, scanning and/or vibration generation transversely on the depth direction of biological sample.Simultaneously imaging one two-dimensional section also can be used for discerning a surface of this biological sample and/or the surface in this biological sample to be used in the information that other positions obtain simultaneously in biological sample, and this surface and/or inner surface may be used as the purpose of registration.

The advantage of some embodiment of second and the 4th group of embodiment is to be implemented in by an imaging simultaneously basically and a surperficial lip-deep line segment tangent or in wafer of this wafer the chromatographical X-ray complex amplitude image of a wafer that uses in the manufacturing of integrated circuit, have the statistical error of remarkable minimizing and have with a sequence measuring that carries out with prior art single needle hole confocal interference microscopy or holography in the background that obtains from the out of focus image compare remarkable minimizing or identical background from the out of focus image.Can be used to reduce sensitivity widely with imaging in a surface one lip-deep line segment tangent or in wafer of this wafer the motion of the wafer that generates by the moving of wafer, scanning and/or vibration.With in this wafer or on an a surface tangent two-dimensional section time imaging also can be used with the information of obtaining simultaneously from a plurality of positions discern this wafer or on a reference position, this reference position is used as the purpose of registration.

An advantage of some of second and the 4th group of embodiment be by in imaging simultaneously basically and this biological sample or on the tangent line segment in a surface realize a chromatography X ray complex amplitude image of the biological sample under the confession natural conditions, an image that in a non-invasive biopsy samples of biological sample, can be used for example, have the statistical error of remarkable minimizing and have with a sequence measuring that carries out with prior art single needle hole confocal interference microscopy or holography in the background that obtains from the out of focus image compare remarkable minimizing or identical background from the out of focus image.With in this biological sample or on an a surface tangent line segment time imaging can be used to reduce sensitivity widely the motion of the biological sample that generates by the moving of biological sample, scanning and/or vibration.With in this biological sample or on an a surface tangent two-dimensional section time imaging also can be used with the information of obtaining simultaneously from a plurality of positions and discern a reference position this biological sample, this reference position is used as the purpose of registration.

The advantage of the 5th group of embodiment is that the chromatographical X-ray complex amplitude image of the wafer that uses is an one dimension, a two dimension or a three-dimensional image that generates a wafer in the manufacturing of integrated circuit, have the background from the out of focus image of comparing remarkable minimizing with the background from the out of focus image that obtains in the sequence measuring that carries out with prior art single needle hole confocal interference microscopy or holography.

The advantage of the 5th group of embodiment is a chromatography X ray complex amplitude image of a biological sample under field conditions (factors), for example an image that can be used in a non-invasive biopsy samples of biological sample is one dimension, two dimension or the three-dimensional image that generates this sample, has the background from the out of focus image of comparing remarkable minimizing with the background from the out of focus image that obtains in the sequence measuring that carries out with prior art single needle hole confocal interference microscopy or holography.

Steeper (stepper) that above-mentioned confocal interference microscopy system uses at the litho (lithography) of the large scale integrated circuit that is used for Production Example such as computer chip or the identification of the alignment mark on the scanner and useful especially at an independent utility metering system of the plating performance that is used for measuring steeper or scanner.In the inspection of the mark that above-mentioned confocal interference microscopy system uses in the steeper of the different phase of making large scale integrated circuit or scanner and the inspection of chip is useful especially.Litho is the gordian technique driver that is used for semi-conductor industry.

Reduce to and the covering below the 100nm live width to improve be one of five challenges the most difficult, for example see Semiconductor Industry Roadmap, 82 pages (1997).Since a litho instrument can Sheng Chan $50-100M/ product, the economic worth of improving the performance of (maintenance) litho instrument is important.Per 1% of litho field of tool improves (loss) and causes can bringing the economic return (loss) in about year and bring litho instrument dealer one substantial emulative advantage or empty profit for integrated circuit manufacturer.

By printing a second graph printing on the level of a chip on a figure and the continuous horizontal at this chip, and the difference of measuring position, orientation and the distribution of this two figure then on an independent utility metering system is measured covering.

This independent utility metering system comprises that one is used to watch the microscopic system of these figures, for example above-mentioned confocal interference microscopy system, and it is connected to laser tolerance meter control (gauge-controlled) platform of the relative position that is used to measure these figures; With a wafer processing process.

The function of one litho instrument is that the radiation with space configuration (patterned) guides to a wafer that is coated with photoresist.This process comprises determines that this wafer will receive the position of this radiation (aligning) and this radiation is imposed on photoresist in this position.

For correctly locating this wafer, this wafer comprises alignment mark thereon, and these alignment marks can be measured by for example above-mentioned confocal interference microscopy system of sensor special.The position of this wafer in this instrument determined in the position of the measurement of these alignment marks.The explanation of the configuration of the expectation of this information and wafer surface guides the aligning of this wafer with respect to the radiation of this space configuration.According to such information, support this wafer that is coated with photoresist one movably platform move this wafer so that the tram of this wafer is given in this radioactive exposure.

Between exposure period, the throw light on chopper wheel of a configuration of a radiation source, this this radiation of chopper wheel scattering is to generate the radiation of this space diagram.This chopper wheel also is referred to as a mask, and these terms are used below interchangeably.Under the lithographic situation of reduction, a reduction lenses is collected the radiation of scattering and is formed the image that one of this chopper wheel figure dwindles.Replacedly, under the situation of approximate printing, the distance (the common order of magnitude) that the radiation propagation of this scattering contact with one 1: 1 image that generates this chopper wheel figure with wafer before is little at micron.The initial photochemical treatment in this photoresist of this radiation converts this radiating pattern in this photoresist a latent image.

When manufacturing a mask, it must be good.Any defective in the figure is with the function of deterioration with the semiconductor circuit of this mask printing.Before a mask being sent to semiconductor manufacturing streamline, it by an automatic mask inspection system, is retrieved any defective in this figure.Mask inspection has two kinds of strategies, is known as mould-database and mould-modulo n check.First method comprises an automatic flying-spot microscope, and it directly compares this mask graph and the computer data that is used to generate this mask.This requires very large data handling capacity, is similar to the required data handling capacity of this mask Write itself.Any deviation that the mask graph that is verified and being used to generates between the data set of this mask is flagged as an error.Above-mentioned confocal interference microscopy system is particularly suitable for automatic mask inspection, because it has the advantage that background reduces and obtain simultaneously basically one dimension line image and two-dimensional section image.

In a word, this litho system also is referred to as exposure system, generally includes an illuminator and a wafer orientation system.This illuminator comprises that a radiation is former, is used to provide for example ultraviolet ray, visible light, X line, electronics or ionizing radiation; With a chopper wheel or mask, be used for sending this figure to this radiation, thereby generate the radiation of this space configuration.In addition, for the lithographic situation of reduction, this illuminator can comprise a lens subassembly, is used for radiation imageable with this space configuration to this wafer.The radiant exposure of this imaging is coated in the photoresist on the wafer.This illuminator also comprises a mask platform, is used to support this mask; With a location system, be used to regulate this mask platform with respect to the position of guiding by the radiation of this mask.This wafer orientation system comprises a wafer station, is used to support this wafer; With a location system, be used to regulate the position of this wafer station with respect to the radiation of this imaging.The manufacturing of integrated circuit can comprise a plurality of step of exposure.For relevant lithographic general list of references, Microlithography:Science and Technology (the miniature litho: (Marcel Dekker science and technology) of for example seeing JRSheats and BWSmith and being shown, Inc., New York, 1998), its content is incorporated herein by reference.

Using parch altogether to relate to an example of microscopy system (not shown) one litho scanner 800 shown in Fig. 8 a.This confocal interference microscopy system is used for accurately being positioned at the position of the alignment mark on the interior wafer (not shown) of an exposure system.Here, platform 822 is used for locating and supports this wafer with respect to an exposure position.Scanner 800 comprises a frame 802, and it loads other supporting mechanism and the various element that loads in these mechanisms.One exposure pedestal 804 has been installed on its top, and a lens case 806 is installed on the top of exposure pedestal 804, and a chopper wheel or mask platform 816 are installed on the top of lens case 806 and are used for supporting a chopper wheel or mask.Be used for locating a location system of this mask roughly with 817 indications with respect to this exposure position.Positioning system 817 can comprise for example piezoelectric sender element and corresponding control electron device.Although, do not comprised that in this embodiment one or more interferometer measuration system is used with the position of the position of accurately measuring this mask platform and other displaceable elements (position of these elements must be monitored exactly) (sees the Microlithography:Science andTechnology (miniature litho: science and technology)) of supra Sheats and Smith in the process of making litho mechanism.

What be suspended on exposure pedestal 804 belows is a support pedestal 813, is used for loaded with wafers platform 822.Platform 822 comprises a plane mirror 828, is used to reflect a measuring beam that guides to this by interferometer measuration system 826.Be used for roughly being represented with 819 with respect to a location system of interferometer measuration system 826 positioning tables 822.Positioning system 819 can comprise piezoelectric sender element and corresponding control electron device.This measuring beam reflected back is installed in this interferometer measuration system on the exposure pedestal 804.

During operation, a radiation laser beam 810 for example from a ultraviolet (UV) light beam of a UV laser instrument (not shown), is being advanced downwards by a beam shaping optical module 812 and after reflecting from catoptron 814.Then, the mask (not shown) of this radiation laser beam by loading by mask platform 816.The lens subassembly 808 that this mask (not shown) loads in a lens case 806 by imaging on the wafer (not shown) on the wafer station 822.Pedestal 804 and a vibration insulating system and the ambient vibration isolation of various elements of supporting by it by describing by spring 820.

As is known in the art, litho is the key component of manufacturing in the method for production of semiconductor device.For example, United States Patent (USP) 5,483,343 have described to be used for the step of such method for production.These steps are described with reference to Fig. 8 b and 8c below.Fig. 8 b manufactures for example process flow diagram of the order of the semiconductor device of semi-conductor chip (for example IC or LSI), liquid crystal panel or CCD.Step 851 is the design processes that are used to design the circuit of semiconductor device.Step 852 is the processes that are used for manufacturing according to this circuitous pattern design a mask.Step 853 is to be used for by using the material of silicon for example to manufacture the process of a wafer.

Step 854 is become a pretreated wafer processing procedure, wherein by using the mask and the wafer of preparation like this, forms circuit by litho on this wafer.For at the circuit that forms on this wafer corresponding to these figures on this mask, need the interferometry location of the litho instrument of this wafer relatively with enough spatial resolutions.Confocal interference microscopy method and system described herein can be used for checking the surface of this wafer and the lithographic validity of using with inspection and supervision at the inside several layers that generates on this wafer by processing of wafers especially in this processing of wafers.Step 855 is installation steps, and it is called as aftertreatment, and wherein this wafer of being handled by step 854 is formed in the semi-conductor chip.This step comprises assembling (cutting and welding) and seals (chip sealing).Step 856 is checking procedures, wherein carries out the operability inspection, continuation inspection of the semiconductor device that generated by step 855 etc.Carry out these processing, finish semiconductor device and shipment (step 857).

Fig. 8 c is the detail flowchart of this processing of wafers.Step 861 is the oxidation processes that are used for the surface of oxidation one wafer.Step 862 is the CVD processing that are used for forming a dielectric film on this wafer surface.Step 863 is the electrode formation processing that are used for forming on this wafer by vacuum moulding machine electrode.Step 864 is the ion injection processing that are used for ion is injected this wafer.Step 865 is the photoresist processing that are used for photoresist (photochromics) is imposed on this wafer.Step 866 is one to be used for exposing (for example litho) by above-mentioned exposure sources, the processing of the circuitous pattern of this mask of printing on this wafer.Again, as mentioned above, use confocal interference microscopy system and method described herein to improve precision, resolution and the retentivity of these litho steps.

Step 867 is to be used to develop a development treatment of the wafer of exposure fully.Step 868 is etch processes that are used to remove the part except the photoresist image that develops.Step 869 is to be used for separating after carrying out etch processes a photoresist separating treatment that is retained in the photoresist on this wafer.By repeating these processing, on this wafer, form and overlapping circuitous pattern.

One important application of confocal interference microscopy system and method described herein is to check mask and the chopper wheel that uses in the formerly described litho method.As an example, the mask inspection system 900 of a summary shown in Figure 9.One light source 910 generates a light beam of light source 912 and a confocal interference microscopy assembly 914 guides to this radiation laser beam by a movably substrate 916 of platform 918 supports.For determining this relative position, an interferometer measuration system 920 causes the catoptron 924 that is installed on the light beam focus pack 914 with a reference beam 922 and a measuring beam 926 is caused a catoptron 928 that is installed on the platform 918.By the variation of the variation in the position of this interferometer measuration system measurement corresponding to the relative position of writing light beam 912 in the substrate 916.Interferometer measuration system 920 sends a measuring-signal 932 to controller 930, the relative position of indication check light beam 912 in substrate 916.Controller 930 sends one and outputs signal to the also pedestal 936 of positioning table 918 of a support.

Controller 930 can use signal 934 to make check light beam on the zone of these substrates of confocal interference microscopy assembly 914 scanning.As a result, other elements of controller 930 these systems of guiding are checked the dust substrate.This mask inspection directly compares this mask graph with the computer data that is used this mask of generation.

It is useful especially in the control that is used for the spatial relationship between the system of image that material at for example CD generates an information-bearing zone that above-mentioned confocal interference shows dimension art system.In determining a CD and/or in the process of canned data, prevent that this system from contacting particular importance with the outer surface physics of this CD.

This system that is used to generate the image in information-bearing zone and control the spatial relationship between this system comprises that one supports the supporting structure of this CD, one is used for this outer surface profile of imaging and determines that an above-mentioned confocal interference microscopy system and of the spatial relationship between this outer surface and this system is used for the microscopic system in this information-bearing zone of imaging.This system also comprises one according to should definite spatial relationship controlling the position of this microscopic system with respect to this outer surface, with the processor that prevents that this microscopic system from contacting with the physics of this outer surface.

If 916 are used to indicate this CD, numeral 914 is used to indicate the microscopic system that is used for this information-bearing zone of imaging and is used for the confocal interference microscope system of the profile of this outer surface of imaging, and the view of Fig. 9 can illustrate said system.Notice that two related microscopic systems can be two kinds of different microscopic systems or identical microscopic system.Numeral 930 expressions one generate signal 934 to control the processor of the shift unit (not shown) in a substrate 936 and the location class 918.This shift unit is in response to signal 934, controls the distance between the last outer surface of this microscopic system 914 and CD 916 in real time.

The microscopic system of this system 914 can comprise pin hole confocal microscopy system for example, above-mentioned confocal interference microscopy system or near field (near-field) microscopy system.

Theoretical

Background is differentiated

Equipment described in aforementioned each preferred embodiment all is the example of pin hole confocal interference microscopic system or slit confocal interference microscopic system.The background discrimination of confocal microscope system is one of its most important attribute, and this ability results from the powerful optics laminate property of confocal microscopy.By the restriction depth of field diverse character is arranged in this and the common microscopy, its difference is, out of focus information is only by obfuscation in simple microscope, and the out of focus information that detects in confocal system is greatly reduced really: on the light of certain the place institute scattering that has axially departed from the focal plane is below detecting device is out of focus, therefore can not be effectively by being arranged on a mask on the detector plane, see also works " ConfocalMicroscopy (confocal microscopy) " (the Academic Press that C.J.R.Sheppard (Ku Pade) and C.J.Cogswll (examining Gus's Weir) are compiled at T.Wilson (Weir is inferior), London, 1990) article in " Three-dimensional Imaging In Confocal Microscopy (three-dimensional in the confocal microscopy becomes image) " (pp143-169).The fizeau interferometer that uses in DIP for example has the sensitivity to the out of focus image that can compare with the microscopy of routine.

The uncommon characteristic of the confocal interference microscopy system of the embodiment of first and second groups of embodiment and modification thereof is to obtain the information of a lattice array that is used for an image basically simultaneously, respectively has the sensitivity with respect to the out of focus image of realizing in the prior art confocal interference microscopy that reduces.

The reference beam of reflection and the detecting light beam of scattering all take place at burnt figure image point 48 places obviously to change because of the influence that is subjected to pupil function makes it, but do not change basically in the out of focus light beam part at burnt figure image point 48 places.For embodiment that quotes and modification thereof, this specific character of the present invention is used for realizing the sensitivity to the out of focus image of realizing in the confocal interference microscopy with respect to prior art that reduces.

The equipment of describing in the embodiment of first, second, third and the 4th group of embodiment and the modification thereof also comprises the form of a chromatic dispersion interferometry.This optical time domain reflectometry OTDR comprises a short intense pulsed light is injected a for example fiber and measure backscattered light signals with time correlation of an object.This optimal frequency domain reflectometry OFDR comprises that the frequency of this monochromatic radiation is time to time change in known manner, and the backscattered light signals of measurement and frequency dependence with the monochromatic radiation object that throws light on.In embodiment that quotes and modification thereof, should the backscattered light signals measured function as wave number k relevant with wave number.Analogize from the definition of OTDR and OFDR, the form of the chromatic dispersion interferometry of Shi Yonging can be classified as the form of optics wavenumber domain reflectometry OWDR in the present invention.

As result in conjunction with OWDR, for addressable all pixel locations in a given exposure, obtain simultaneously basically these embodiment of first and the 3rd group of embodiment and modification thereof to the sensitivity at the amplitude of burnt image.These embodiment and modification thereof for second and the 4th group of embodiment, as result in conjunction with OWDR, for all lateral attitudes in the line segment of the addressable optical axis that is substantially normal to object materials imaging subsystem in a given exposure, obtain simultaneously basically the sensitivity at the amplitude of burnt image.The confocal interference microscopy system of standard must be in this object materials axially carry out one scan separately in dimension or the transverse dimensions to obtain to equivalent sensitivity at the amplitude of burnt image.

The uncommon characteristic of the confocal interference microscopy system of the embodiment of first and second groups of embodiment and modification thereof is to obtain the information of a lattice array that is used for an image basically simultaneously, respectively has the sensitivity with respect to the out of focus image of realizing in the prior art confocal interference microscopy that reduces.The confocal interference microscopy system is known as a kind of in order to obtain the one dimension of an object in the prior art, the purpose of two and three dimensions image, improve the means of optics intercepting by the influence that reduces the out of focus image, (see M. Born and E. Wo Erfu and change microscopical pupil function, " Principles of Optics (optical principle) ", the 8.6th, 3 joints, 423-427 (Pergamon Press, New York, 1959) be a kind of for some application-specific improve contrast means and as the OWDR of a kind of form of in DIP, using be known as a kind of means that reduce phase ambiguity in the prior art.But, the inventor believes, confocal interference microscopy, change pupil function and OWDR are combined in systematic error and the statistical error to reduce to be caused by bias light in the same system, then here proposes first.

The uncommon characteristic of the confocal interference microscopy system of the embodiment of third and fourth group of embodiment and modification thereof is to obtain the information of a lattice array that is used for an image basically simultaneously, respectively has the sensitivity with respect to the out of focus image of realizing in the prior art confocal interference microscopy that reduces.The confocal interference microscopy system be known as in the prior art a kind of influence that reduces the out of focus image means and as the OWDR of a kind of form of in DIP, using be known as a kind of means that reduce phase ambiguity in the prior art.But, the inventor believes, confocal interference microscopy and OWDR are combined in systematic error and the statistical error to reduce to be caused by bias light in the same system, then here proposes first.

The uncommon characteristic of the embodiment of the 5th group of embodiment and the confocal interference microscopy system of modification thereof is with relating to the information of obtaining a lattice array that is used for an image, respectively has identical with respect to the uncommon characteristic of the embodiment of May Day of the sensitivity of the out of focus image of realizing in the prior art confocal interference microscopy that reduces and second group of embodiment and modification thereof.Therefore, the inventor believes, confocal interference microscopy and change pupil function are combined in systematic error and the statistical error to reduce to be caused by bias light in the same system, then here proposes first.

Impulse response function at burnt image:

Axial OWDR

The selected conduct of describing in Fig. 1 a-1n of first embodiment is used for being illustrated in the system on the basis of the distinguished feature that first forward part quotes, although should the basis can be applied to all four embodiment and modification thereof from first group of embodiment equally well.The parch altogether that pin hole 8 among Fig. 1 b and Fig. 1 h, 1i and 1m spatial filter pin hole 18a representative is used for all optical frequency components of light beam relate to the conjugation pin hole of system and each of the detecting device 114 of Fig. 1 j, 1k and 1n only to an optical frequency component sensitivity of a light beam, as chromatic dispersion detector element 130a shown in Fig. 1 a and the result of 130b.May be free shown in the following theoretical paragraph intensity reconstruct of detecting device 114 records be applicable to that the equivalent of the confocal signal of prior art of each addressable axial location is as the function of the optical frequency in one group of four exposure.This corresponds essentially to and wherein requires to compare as the confocal microscopy system of the standard of the function of axial location to obtain the confocal signal of prior art along the axial physical scan of Fig. 1 c and the object materials 112 shown in the 1e, obtains prior art as the equivalence of a function of axial location simultaneously at the confocal signal of Jiao with equipment of the present invention.

Non-fluorescent confocal flying-spot microscope has two kinds of useful patterns: reflective-mode and transmission mode.See also C.J.R.Sheppard at " Advances in Optical and ElectronMicroscopy, 10 (optics and electron microscopy progress, 10) article " " ScanningOptical Microscopy (scanning optical microscopy) " and C.J.R.Sheppard and .A.Choudhury (Chu Heli) are at Optica Acta, 24 (10), the paper of delivering on the 1051-1073 (1977).In fact, utilize confocal microscope can easily realize the optics layering, thereby form three-dimensional image by object is scanned vertically.See also C.J.R Sheppard and C.J.Cogswell at J.Microscopy, 159 (pt2), the paper of delivering on the 179-194 (1990); C.J.R.Sheppard and T.Wilson be at Opt.Lett.3, the paper of delivering on the 115-117 (1978); And C.J.R.Sheppard, D.K.Hamilton and I.J.Cox are published in Proc.R.Soc.Lond., A387, the paper on the 171-186 (1983).

Consider that has three confocal microscopes (Fig. 5) that become image area.For the combination that contains light source 10, object 112 and detecting device 114 of the detecting light beam that is used for detecting light beam and scattering by the subsystem shown in Fig. 1 a-1n, the lens 1 of Fig. 5 be equivalent to lens 16, the subsystem 81 shown in Fig. 1 c of the subsystem 80 shown in Fig. 1 b lens 26 and 36, and Fig. 1 c shown in the combination of lens 46 of subsystem 82; The lens 2 of Fig. 5 are equivalent to the combination of lens 46 with the lens 26a of the subsystem 81a shown in Fig. 1 h of the subsystem 82 shown in Fig. 1 f; The lens 3 of Fig. 5 are equivalent to the combination of the lens 66 of the lens 36a of the subsystem 81a shown in Fig. 1 h and the subsystem 84 shown in Fig. 1 j.For the combination that contains light source 10, object 112 and detecting device 114 of the reference beam that is used for reference beam and reflection by the subsystem shown in Fig. 1 a-1n, the lens 1 of Fig. 5 be equivalent to lens 16, the subsystem 81 shown in Fig. 1 c of the subsystem 80 shown in Fig. 1 b lens 26 and 36, and Fig. 1 e shown in the combination of lens 56 of subsystem 83; The lens 2 of Fig. 5 are equivalent to the combination of lens 56 with the lens 26a of the subsystem 81a shown in Fig. 1 i of the subsystem 83 shown in Fig. 1 g; The lens 3 of Fig. 5 are equivalent to the combination of the lens 66 of the lens 36a of the subsystem 81a shown in Fig. 1 i and the subsystem 84 shown in Fig. 1 k.

We give following 4 definition space optical coordinates (v of system _i, w _i, u _i): the pattern space 47A of image plane 7A space, image plane 7A space, object 112 spaces or reference mirror 120 spaces, image plane 17aA space and detecting device 114, the i value of these 4 space correspondences is followed successively by i=1, and 2,0,3.At this moment have:

v_{i} = k {\tilde{x}}_{i} \sin α_{i},

w_{i} = k {\tilde{y}}_{i} \sin α_{i},

u_{i} = 4 k {\tilde{z}}_{i} si n^{2} (α_{i} / 2),

Wherein, sin α _iBe the numerical aperture of regional i, wave number k=2 π/λ, λ are radiation wavelength in a vacuum,

It is the optical path length in the i space.The definition of optical path length is:

{\tilde{x}}_{i} = {&Integral;}_{0}^{x_{i}} n (x_{i}^{'}, y_{i}^{'}, z_{i}^{'}) d x_{i}^{'}

{\tilde{y}}_{i} = {&Integral;}_{0}^{y_{i}} n (x_{i}^{'}, y_{i}^{'}, z_{i}^{'}) c y_{i}^{'}, - - - - (2)

{\tilde{z}}_{i} = {&Integral;}_{0}^{z_{i}} n (x_{i}^{'}, y_{i}^{'}, z_{i}^{'}) d z_{i}^{'}

Path of integration wherein is along corresponding light, n (x ' _i, y ' _i, z ' _i) be (x ' _i, y ' _i, z ' _i) refractive index located.

Verified, the one-tenth image performance in the confocal microscope is similar to relevant microscope (see before and state the paper of Sheppard and Choudhury), and image wherein can be described with the coherent transfer function, and the coherent transfer function is the Fourier transform of impulse response function.Therefore, the effective three-dimensional impulse response function he (V of Fig. 5 system ₃, V ₀, V ₂, V ₁) can be expressed as

h _e(v ₃，v ₂，v ₀，v ₁)＝h ₃(v ₃-v ₂)h ₂(v ₂-v ₀)h ₁(v ₀-v ₁)，(3)

Wherein

h_{1} (v) = &Integral; &Integral; P_{1} (ξ_{1}, η_{1}) \exp {ju [\frac{1}{4 si n^{2} (α_{1} / 2)} - \frac{({ξ_{1}}^{2} + {η_{1}}^{2})}{2}]} - - - - (4 a)

×exp[-j(ξ ₁v+η ₁w)+jkW ₁]dξ ₁dη ₁；

h_{2} (v) = &Integral; &Integral; P_{2} (ξ_{2}, η_{2}) \exp {- ju [\frac{1}{4 si n^{2} (α_{2} / 2)} - \frac{({ξ_{2}}^{2} + {η_{2}}^{2})}{2}]} - - - - (4 b)

×exp[-j(ξ ₂v+η ₂w)+jkW ₂]dξ ₂dη ₂；

h_{3} (v) = &Integral; &Integral; P_{3} (ξ_{3}, η_{3}) \exp {- ju [\frac{1}{4 si n^{2} (α_{3} / 2)} - \frac{({ξ_{3}}^{2} + {η_{3}}^{2})}{2}]}

* exp[-j (ξ ₃V+ η ₃W)+jkW ₃] d ξ ₃D η ₃(4c) h _i, p _iAnd w _iBe respectively impulse response function, pupil function and the ripple difference function (seeing M.Gu (Gu) and C.J.R.Sheppard in Appl.Opt.31 (14), the list of references 10-12 in the paper of delivering on the 2541-2549 (1992)) of i lens of equal value among Fig. 5; I is respectively 1,2,3 and 4, and j is (1) ^1/2Amplitude when impulse response function is in response to a point source object in the image plane.The effect of phase shifter 44 can be included into corresponding pupil function p _iIn.

Suppose that three-dimensional body can be by the scatter distributions t (V of the scattering of representing unit volume ₀) characterize (see C.J.R.Sheppard and X.Q.Mao (hair) at J.Opt.Soc.Am.A, 6 (9), the paper of delivering on the 1260-1269 (1989)), t (V ₀) with the relation of refractive index n be:

t(v ₀)＝jk ²|1-n ²(v ₀)| (5)

See E.Wolf (Wo Erfu) at Opt.Commun., 1, the paper of delivering on the 153-156 (1969).General n and t are plural numbers, the quadrature in phase of j in the equation (5) explanation scattering wave and direct wave in lossless medium.Suppose that the effect of repeatedly scattering can ignore.We also ignore the radiation of not scattering, owing to there is not direct projection (not scattering) radiation meeting that image is had contribution, this supposition is set up for reflective-mode.Because superposition principle is set up, thus visual amplitude can regard as each primitive tomography that constitutes object contribution and.In addition must be to distribution of amplitudes A (V on whole incoherent light source face ₁) integration.For the incident radiation and the reflect/scatter radiation of object, also must comprise the attenuation function a (V that shows the decay of radiation in object ₀).

The impulse response function that comprises the lens of chromatic

dispersion detector element

130a and 130b can be write conduct:

h_{1} (v_{0} - v_{1}) = {\exp [jk ({\tilde{z}}_{0} - {\tilde{z}}_{1})]} h_{1}^{'} (v_{0} - v_{1}), - - - - (6 a)

h_{2} (v_{2} - v_{0}) = {\exp [- jk ({\tilde{z}}_{2} - {\tilde{z}}_{0})]} h_{2}^{'} (v_{2} - v_{0}), - - - - (6 b)

h_{3} (v_{3} - v_{2}) = {\exp [- jk ({\tilde{z}}_{3} - {\tilde{z}}_{2})]} h_{3}^{'} (v_{3} - v_{2}), - - - - (6 c)

Wherein

{h_{1}^{'} (v_{0} - v_{1}) = &Integral; &Integral; P}_{1} (ξ_{1}, η_{1}) \exp {- j u_{0} [\frac{1}{2} ({ξ_{1}}^{2} + {η_{1}}^{2})]}

×((exp{-j[ξ ₁(v ₀-v ₁)+η ₁(w ₀-w ₁)]+jkW ₁}))dξ ₁dη ₁，(7a)

{h_{2}^{'} (v_{2} - v_{0}) = &Integral; &Integral; P}_{2} (ξ_{2}, η_{2}) \exp {j (u_{2} - u_{0}) [\frac{1}{2} ({ξ_{2}}^{2} + {η_{2}}^{2})]} - - - - (7 b)

×((exp{-j[ξ ₂(v ₂-v ₀)+η ₂(w ₂-w ₀)]+jkW ₂}))dξ ₂dη ₂，

{h_{3}^{'} (v_{3} - v_{2}) = &Integral; &Integral; P}_{3} (ξ_{3}, η_{3}) G_{3} (k, v_{3}) \exp {- j u_{2} [\frac{1}{2} ({ξ_{3}}^{2} + {η_{3}}^{2})]} - - - - (7 c)

×((exp{-j[ξ ₃(v ₃-v ₂)+η ₃(w ₃-w ₂)]+jkW ₃}))dξ ₂dη ₂，

And G ₃(k, v ₃) be to be used for the chromatic dispersion detector element 130a of Fig. 1 a and the dispersed light pupil function of 130b.The sign change of the formula (7b) relevant with u item in the formula (7a) and the u of formula (7c) is because at v ₀The reflection that the space takes place.

So scatter sounding light beam U in the image plane 17a of spatial filter pin hole 18a _SAmplitude provide by following formula

U _S(v ₂)＝(R ₁T ₁) ^1/2∫∫A(v ₁)[∫∫∫h ₁(v ₀-v ₁)

* a (v ₀) t (v ₀) a (v ₀) h ₂(v ₂-v ₀) dv ₀] dv ₁(8) R wherein ₁And T ₁Be respectively the reflection and the transmission coefficient of beam splitter 100.Equation (6a) and (6b) substitution equation (8), obtain following U _S(V ₂) expression formula:

U_{S} (v_{2}) = {(R_{1} T_{1})}^{1 / 2} &Integral; &Integral; A (v_{1}) {&Integral; \exp (j 2 k {\tilde{z}}_{0}) [&Integral; &Integral; h_{1}^{'} (v_{0} - v_{1})

×a(v ₀)t(v ₀)a(v ₀)h′ ₂(v ₂-v ₀)dv ₀dw ₀]dz ₀}dv ₁dw ₁. (9)

Amplitude U _S(V ₂) expression is used for the multiple scattering amplitude at the spatial filter pin hole 18a of Fig. 1 h of equipment of the present invention.From the impulse response function h that provides by formula (3) _e(v ₃, v ₂, v ₀, v ₁) characteristic can draw, by for the

lens

36a and 66 among Fig. 1 h and Fig. 1 j, and chromatic dispersion detector element 130a among Fig. 1 a and the combination of 130b, use impulse response function h _e(v ₃-v ₂) to U _S(V ₂) convolution and obtain multiple scattering amplitude U in the image plane 47 of the detecting device shown in Fig. 1 j 114 _S(V ₃).The optical coordinate of image plane 47 is by V ₃Provide.Represent with equation:

U_{S} (v_{3}) = {(R_{1} T_{1})}^{1 / 2} &Integral; &Integral; A (v_{1}) ((&Integral; \exp (j 2 k {\tilde{z}}_{0}) {&Integral; &Integral; h_{1}^{'} (v_{0} - v_{1})

×a(v ₀)t(v ₀)a(v ₀)[∫∫h′ ₃(v ₃-v ₂)t ₂(v ₂)h′ ₂(v ₂-v ₀)dv ₂dw ₂] (10)

* dv ₀Dw ₀Dz ₀)) dv ₁Dw ₁T wherein ₂(v ₂) be the transmission function that is used for spatial filter pin hole 18a.By setting That is, Can obtain the corresponding U of transmission mode confocal microscope structure from equation (10) _S(V ₃) expression formula.

The characteristic of the amplitude of the interference signal of the observation that obtains by the scattering of checking by the xsect on a plane of an object is not introduced undue complicacy and can show key character as the OWDR that uses easily in equipment of the present invention.Consider this, we at first think the xsect of confocal interference microscope for the plane of any three-dimensional scattering object, also be useful on a transverse plane reverberator of reference mirror, the response of some radiating light sources, and the refractive index in the

zone

1,2,3 and 4 equals 1.

If the axial location of the xsect of this scatterer of this reference mirror is respectively Z ₀, R and Z ₀, S, and the amplitude of the reference beam of the reflection in the image plane 47 at 114 places of the detecting device in Fig. 1 k is U _RBy the variation of suitable variable, U _RCan obtain from equation (10).The output current I of detecting device 114 in cross section that is used for the transverse plane of given scatterer material is following form:

I [\begin{matrix} z_{0, S} - z_{0, R}, (v_{3} / k f_{3} \sin α_{3}) = \\ + (v_{0} / k f_{0} \sin α_{0}) + (Δ v_{3} / k f_{3} \sin α_{3}), w_{3, x} \end{matrix}] =

+ | U _R(z _{0, R}, v ₃, w ₃)+U _S(z _{0, S}, v ₃, w ₃) | ²(11a) its can be expanded into

I [\begin{matrix} z \end{matrix}] [\begin{matrix} _{0, S} - z_{0, R}, (v_{3} / k f_{3} \sin α_{3}) = \\ + (v_{0} / k f_{0} \sin α_{0}) + (Δ v_{3} / k f_{3} \sin α_{3}), w_{3, x} \end{matrix}] =

+|U _R(z _0，R，v ₃，w ₃)| ²+|U _S(z _0，S，v ₃，w ₃)| ² (11b)

+2|U _R(z _0，R，v ₃，w ₃)||U _S(z _0，S，v ₃，w ₃)|

×cos[2k(z _0，S-z _0，R)+(φ _S-φ _R)+x]，

Δ v_{3} = 2 π \frac{{\tilde{m}}_{4} f_{3} \sin α_{3}}{[1 - {(2 π {\tilde{m}}_{3} / k)}^{2}]^{1 / 2}} - - - - (12)

f ₃Be the focal length of detector area 3, m ₃Be v specific to the spatial frequency of the order of diffraction of the use of chromatic

dispersion detector element

130a and 130b ₃Component, (φ _S-φ _R) be at z _{0, S}=z _{0, R}U _SAnd U _RBetween differ, and x is the phase shift of being introduced by the phase shifter in the reference leg of the interferometer in the subsystem 83 shown in Fig. 1 e and the 1g 44.

From close examination equation (11b) as seen, in constant scale factor and phase factor, can be by I (z at four different x value places _{0, S}, z _{0, R}, v ₃, w ₃, measurement acquisition x) and scattering amplitude Us (z _{0, S}, v ₃, w ₃) in the equation (11b) that is directly proportional this.The group of four values of one preferential x is x=x ₀, x ₀+ π, x ₀+ (pi/2), x ₀+ (3 pi/2).For i=1, four values of the correspondence of 2,3 and 4 output current I are combined to realize according to following scheme

Δ I_{1} [\begin{matrix} z_{0, R}, z_{0, S}, (v_{3} / k f_{3} \sin α_{3}) = \\ + (v_{0} / k f_{0} \sin α_{0}) + (Δ v_{3} / k f_{3} \sin α_{3}), w_{3} \end{matrix}] &equiv; I_{1} - I_{2}

＝I(z _0，R，z _0，S，v ₃，w ₃，x ₀)-I(z _0，R，z _0，S，v ₃，w ₃，x ₀+π)

＝4|U _R(z _0，R，v ₃，w ₃)||U _S(z _0，S，v ₃，w ₃)|

×cos[2k(z _0，S-z _0，R)+(φ _S-φ _R)+x ₀]，

Δ I_{2} [\begin{matrix} z_{0, R}, z_{0, S}, (v_{3} / k f_{3} \sin α_{3}) = \\ + (v_{0} / k f_{0} \sin α_{0}) + (Δ v_{3} / k f_{3} \sin α_{3}), w_{3} \end{matrix}] &equiv; I_{3} - I_{4} - - - - (13 a)

＝I _P(z _0，R，z _0，S，v ₃，w ₃，x ₀+π/2)

-I _P(z _0，R，z _0，S，v ₃，w ₃，x ₀+3π/2)

＝-4|U _R(z _0，R，v ₃，w ₃)||U _S(z _0，S，v ₃，w ₃)|

* sin[2k (z _{0, S}-z _{0, R})+(φ _S-φ _R)+x ₀] (13b) the compound expression for Δ I be defined as

ΔI [\begin{matrix} z_{0, R}, z_{0, S}, (v_{3} / k f_{3} \sin α_{3}) = \\ + (v_{0} / k f_{0} \sin α_{0}) + (Δ v_{3} / k f_{3} \sin α_{3}), w_{3} \end{matrix}] &equiv;

+ΔI ₁(z _0，R，z _0，S，v ₃，w ₃)+jΔI ₂(z _0，R，z _0，R，v ₃，w ₃)

(14) or with equation (13a) with (13b) be replaced by

ΔI [\begin{matrix} z_{0, R}, z_{0, S}, (v_{3} / k f_{3} \sin α_{3}) = \\ + (v_{0} / k f_{0} \sin α_{0}) + (Δ v_{3} / k f_{3} \sin α_{3}), w_{3} \end{matrix}] =

+4|U _R(z _0，R，v ₃，w ₃)||U _S(z _0，S，v ₃，w ₃)|

×exp{-j[2k(z _0，S-z _0，R)+(φ _S-φ _R)]}.

(15) for the scatterer material of limited axial width, by at z _{0, S}On carry out Δ I (z _{0, R}, z _{0, S}, v ₃, w ₃) integration and obtain corresponding signal delta I (z _{0, R}, v ₃, w ₃).Use equation (15), for the scatterer material of limited axial width, Δ I (z _{0, R}, v ₃, w ₃) can be represented as

ΔI [\begin{matrix} z_{0, R}, (v_{3} / k f_{3} \sin α_{3}) = \\ + (v_{0} / k f_{0} \sin α_{0}) + (Δ v_{3} / k f_{3} \sin α_{3}), w_{3} \end{matrix}] =

+ &Integral; ((4 | U_{R} | | U_{S} | \exp {- j [2 k (z_{0, S} - z_{0, R}) + (φ_{S} - φ_{R})]})) d {\tilde{z}}_{0, S}, - - - - (16)

By measuring Δ I (z _{0, R}, v ₃, w ₃) be v ₃A function, the signal delta I (z that obtains _{0, R}, v ₃, w ₃) be measured as the function of wave number k.

From close examination equation (16) as seen, in constant scale factor, observed amount Δ I is the amplitude U of scattering _SReference amplitude U with reflection _RThe Fourier transform of product.The confocal interference microscopy of prior art obtains the equivalent information of relevant object materials.With equipment of the present invention from order in time obtain a group four independently measured value obtain relevant at z ₀This object materials in an axial point array on the direction by Δ I (z _{0, R}, v ₃, w ₃) expression information, do not need to carry out the scanning of object materials.For the confocal interference microscopy of prior art, by scanning this object materials, must be at z ₀Each axial point in the axial point array on the direction is carried out four independently measurements of equivalence.Like this, with equipment of the present invention in time less than the confocal interference microscopy of prior art, obtain relevant this object materials by Δ I (z _{0, R}, v ₃, w ₃) expression information.Partly cause during obtaining the electric current of measurement the raising of statistical precision and the sensitivity of the motion of object materials is reduced is this feature of the present invention.

The characteristic of the scattering amplitude of Fourier transform

In the intensity I of title for measuring shown in the part of " for impulse response function " at burnt image _ICan be combined to provide the Δ I as equation (16) expression, it is the amplitude U of scattering _SReference amplitude U with reflection _RThe Fourier transform of product.Like this, by calculate Δ I (z with respect to wave number k _{0, R}, v ₃, w ₃) inversefouriertransform F ^-1(Δ I) can obtain the information of relevant scatterer self, promptly

F^{- 1} (ΔI) = &Integral; ΔI [\begin{matrix} z_{0, R} (v_{3} / k^{'} f_{3} \sin α_{3}) = \\ (v_{0} / k^{'} f_{0} \sin α_{0}) + (Δ v_{3} / k^{'} f_{3} \sin α_{3}), w_{3} \end{matrix}]

×[exp(jk′z)]dk′.

(17) will substitute into moral equation (17) for the expression formula of the Δ I that provides by equation (16), obtain the following amplitude U that is used for scattering _SReference amplitude U with reflection _RThe equation of product.

| U_{R} | | U_{S} | e^{- j (φ_{S} - φ_{R})} = (\frac{1}{4}) F^{- 1} (ΔI) - - - - (18)

Be used for from F based on equation (18) ^-1(Δ I) calculates | Us|exp (j φ _S) preferable procedure be [F ^-1(Δ I)]/4 with [| U _R| exp (j φ _R)] ^-1Multiply each other, wherein determine the amplitude of reflection by the measured value of an independent groups | U _R| exp (j φ _R).In this preferably calculates, relatively to φ _S, φ _{S, 0}All non-object materials contributions (contributions), only know φ _RBe important.A kind of being used to determined | U _R| exp[j (φ _R-φ _{S, 0})] method comprise three kinds of dissimilar measurements.First kind of measurement replaced object materials 112 with the plane reflection surface with known reflection characteristic and carried out to realize the measurement of corresponding complexor Δ I.Measure this corresponding complexor Δ I that obtains, obtain for personal first kind | U _R|| U _{S, 0}| exp[j (φ _R-φ _{S, 0})] measurement, wherein | U _{S, 0}| it is right to describe | U _S| all non-object materials contributions.Second kind of measurement is to measure the I that does not have object materials _iOne of.From this I that does not have object materials that obtains _i, obtain | U _R| ²A measured value.The third measurement is to measure the I that does not have reference mirror and object materials to be replaced by a plane reflection surface with known reflection characteristic _iOne of, never reference mirror and object materials are by surperficial this I that replaces of a plane reflection with known reflection characteristic _I, obtain | U _{S, 0}| ²A measured value.Three equatioies | U _R|| U _{S, 0}| exp[j (φ _R-φ _{S, 0})], | U _R| ², | U _{S, 0}| ²These measured values comprise and determining from F ^-1(Δ I) calculates | U _S| exp (j φ _S) in used | U _R| exp[j (φ _R-φ _{S, 0})] ^-1Required information.Confirmable by described program | U _R| exp[j (φ _R-φ _{S, 0})] precision will partly depend on the intrinsic background that exists in the equipment of the present invention, by equipment itself but not the level of the background that object materials produces.Notice that described method also is used for helping characterization | U _{S, 0}| ²And the impulse response function of object materials arm that therefore is used for the interferometer of equipment of the present invention is important.

Exceed the numerical aperture of equipment of the present invention of situation by the resolution of being determined by a to(for) setted wavelength for the axial resolution of equipment of the present invention, this axial resolution is easy to estimated.In order to estimate the axial resolution of the condition that does not lax or blur for picture, provide the hypothesis of following simplification with unsubstantiality details.Suppose at interval k _-And k ₊On | U _R|| U _S| and (φ _S-φ _R) frequency spectrum that changed an inappreciable amount and also supposed light source is the trigonometric function in this interval, Δ (k, k ₊, k _-), the integration on k ' can be estimated equation (17) by closed form, has the result

F^{- 1} (ΔI) = 4 Δk &Integral; [[| U_{R} | | U_{S} | \exp {\overset{- j 2 \overset{&OverBar;}{k} [(z_{0, S} - z_{0, R}) - z]}{- j (φ_{S} - φ_{R})}}

\times ((\frac{\sin {Δk [(z_{0, S} - {\overset{&OverBar;}{z}}_{0, R}) - z]}}{{Δk [(z_{0, S} - z_{0, R}) - z]}} {))}^{2}]] d z_{0, S} - - - - (19)

\overset{&OverBar;}{k} = [(k_{+} + k_{-}) / 2], - - - - (21 a)

Δk＝[(k ₊-k _-)/4]. (21b)

We see acquisition from equation (19) | U _S|, have following axial space resolution

Δ = \frac{2.8}{Δk} = \frac{4 (2.8)}{(k_{+} - k_{-})}, - - - - (22 a)

Or write conduct according to wavelength

Δz = \frac{2.8}{π} (\frac{2 λ_{+} λ_{-}}{λ_{+} - λ_{-}}), - - - - (22 b)

Wherein

λ ₊＝2π/k _-，λ _-＝2π/k ₊ (23)

The white light fringe figure

For scatterer is the example of a single reflecting surface, and when axial resolution surpassed by the numerical aperture of equipment of the present invention of resolution determined by a to(for) setted wavelength, Δ I was a typical white light fringe figure.Therefore for this situation, availablely be similar to the relative position that an axial resolution ratio that is provided by equation (22a) or equation (22b) is easily discerned this reference and object reflecting surface.This can by or locate peak in this striated pattern, locate peak or some other contrast fixed reference features in the envelope of this white light fringe figure with peak swing, directly realize (referring to L.Deck and P.de Groot, the 2-7 among the ibid) from this white light fringe figure.

Be used for impulse response function at burnt image:

Horizontal OWDR

The selected conduct of the 5th embodiment of second group of embodiment is used for being illustrated in the system of the distinctive feature that title quotes for the article of " Background Compensation (background compensation) ", although should the basis can be applied to all embodiment and the modification thereof of second group of embodiment equally well.Impulse response function of deriving in the impulse response function of burnt image can easily comfortable first forward part for first embodiment for the confocal interference microscopy system of the use OWDR of the 5th embodiment obtains: the pupil function Pi of first embodiment is substituted by the pupil function of the correspondence of the 5th embodiment, and the pupil function of the correspondence of the 5th embodiment comprises the effect (seeing Fig. 1 aa, 2aa, 3aa and 4aa) of

dispersion element

130a, 130b, 130c and 130d.

From close examination equation (16) as seen, in a constant scale factor, observed amount Δ I is the amplitude U of scattering _SReference amplitude U with reflection _RThe Fourier transform of product.The confocal interference microscopy of prior art obtains the equivalent information of relevant object materials.With equipment of the present invention from order in time obtain a group four independently measured value obtain relevant the transverse plane cross section this object materials of a level point array by Δ I (z _{0, S}, z _{0, R}, v ₃, w ₃) expression information, do not need to carry out the scanning of object materials.For the confocal interference microscopy of prior art, by scanning this object materials, must in the transverse plane cross section the level point array in each level point carry out four of equivalence and independently measure.Like this, with equipment of the present invention in time less than the confocal interference microscopy of prior art, obtain relevant this object materials by Δ I (z _{0, S}, z _{0, R}, v ₃, w ₃) expression information.Partly cause during obtaining the electric current of measurement the raising of statistical precision and the sensitivity of the motion of object materials is reduced is this feature of the present invention.

The amplitude of out of focus image

Out of focus light beam vibration amplitude U in the spatial filter pin hole of detecting device in burnt image plane 17a _BCan represent that their definition is with fresnel integral C (z) and S (z):

C (z) = {&Integral;}_{0}^{z} \cos (\frac{π}{2} t^{2}) dt, - - - - (24)

S (z) = {&Integral;}_{0}^{z} \sin (\frac{π}{2} t^{2}) dt - - - - (25)

See also Abramowitz (A Bola Abramovich) and Stegun (the history ladder more), " Handbook of Mathematical Functions (mathematical function handbook) ", (Nat.Burof Standards (State Bureau of Standardization)), (Appl Math (applied mathematics) Ser 55), Sect.7.3,300-302,1964.For being positioned at V ₁The pointolite 8 of=(0,0,0), U _BExpression way be:

U_{B} (v_{2}) = - (\frac{j}{λ}) (\frac{A_{B}}{f}) (\frac{π {f_{2}}^{2}}{{kz}_{B}}) \exp [jk ({\tilde{z}}_{B})]

×exp[jk(x ₂ ²+y ₂ ²)/(2z _B)]

\times &Integral; &Integral; P_{2} ({\tilde{ξ}}_{2}, {\tilde{η}}_{2}) \exp [- j \frac{π}{2} ({\tilde{ξ}}_{2}^{2} + {\tilde{η}}_{2}^{2})] d {\tilde{ξ}}_{2} d {\tilde{η}}_{2} - - - - (26)

F wherein ₂Be the focal length in the zone 2 among Fig. 5, (x ₂, y ₂, z ₂) be the out of focus coordinate in the image plane 57, (A _B/ f ₂) be the amplitude of lens 2 emergent pupil place out of focus light beams.

{\tilde{ξ}}_{2} = {(\frac{{kz}_{B}}{π {f_{2}}^{2}})}^{1 / 2} (ξ_{2} + \frac{x_{2}}{z_{B}} f_{2}) - - - - (27 a)

{\tilde{η}}_{2} = {(\frac{{kz}_{B}}{π {f_{2}}^{2}})}^{1 / 2} (η_{2} + \frac{x_{2}}{z_{B}} f_{2}) - - - - (27 b)

And ζ ₂And η ₂It is the emergent pupil coordinate (comfortable Born and wolf, the diffraction theory of describing among the paper 8.8.1 of ibid is derived) of lens 2.Differentiate for rank 2, m=2, and do not have phase shifter 14,24 and 34 phase shifting component cut toe (apodization) at ζ ₂And η ₂Result after the upper integral is

U_{B} (v_{2}) = - (\frac{j}{λ}) (\frac{A_{B}}{f}) (\frac{π {f_{2}}^{2}}{{kz}_{B}}) \exp [jk ({\tilde{z}}_{B})]

×exp[jk(x ₂ ²+y ₂ ²)/(2z _B)]

×{[C(ξ ₅′)-2C(ξ ₄′)+2C(ξ ₃′)-2C(ξ ₂′)+C(ξ ₁′)]

-j[S(ξ ₅′)-2S(ξ ₄′)+2S(ξ ₃′)-2S(ξ ₂′)+S(ξ ₁′)]}

×{[C(η ₅′)-2C(η ₄′)+2C(η ₃′)-2C(η ₂′)+C(η ₁′)]

-j[S (η ₅')-2S (η ₄')+2S (η ₃')-2S (η ₂')+S (η ₁')] (28) wherein,

ξ_{p}^{'} {= (\frac{{kz}_{B}}{{πf}_{2}^{2}})}^{1 / 2} [(p - 3) a + \frac{x_{2}}{z_{B}} f_{2}]; p = 1, . . ., 5, - - - - (29 a)

η_{p}^{'} = {(\frac{{kz}_{B}}{{πf}_{2}^{2}})}^{1 / 2} [(p - 3) a + \frac{y_{2}}{z_{B}} f_{2}]; p = 1, . . ., 5, - - - - (29 b)

And a is at ζ ₂And η ₂The width of the phase shifting component on the direction.For for example on the v2 direction, m=2, and the rank of cutting toe (apodization) 1 of not having a phase shifting component of phase shifter 14,24 and 34 differentiates that the result of operation is

U_{B} (v_{2}) = - (\frac{j}{λ}) (\frac{A_{B}}{f}) (\frac{π {f_{2}}^{2}}{{kz}_{B}}) \exp [jk ({\tilde{z}}_{B})]

×exp[jk(x ₂ ²+y ₂ ²)/(2z _B)]

×{[C(ξ ₅′)-2C(ξ ₄′)+2C(ξ ₃′)-2C(ξ ₂′)+C(ξ ₁′)]

-j[S (ξ ₅')-2S (ξ ₄')+2S (ξ ₃')-2S (ξ ₂')+S (ξ ₁')]. (30) shown in Figure 6 to be used for each light beam B52D-1 ,-2 ,-3 that rank 1 differentiates ,-4 | U _B(v ₂) | ²Example as for y ₂=0 and z ₂=50 λ (f ₂/ d ₀) ²(x ₂d ₀/ λ f ₂) a function.

Obvious why than the interference confocal microscopy of prior art from close examination Fig. 6, equipment of the present invention shows that the interference confocal microscopy of prior art is to U to the sensitivity from the reduction of the background of out of focus image _BResponsive, equipment of the present invention is to the U of conduct in image plane 17a simultaneously _RResult's the U of antisymmetry spatial character _BWith respect to x ₂And y ₂Derivative be responsive.May use the characteristic of Fresnel integral (to see Abramowitz and Stegun, (the U that ibid.) confirms at spatial filter pin hole 18a _RU _B ^*+ U _R ^*U _B) the integration of optical frequency component, will be (U to the correspondence on the detector pinhole of a correspondence _RU _B ^*+ U _R ^*U _B) the good approximation equivalence of integration, for the situation and the situation of the present invention described here of prior art confocal interference microscopy, in table 1, list performance in this way.In table 1

U ^*Complex conjugate and this integration of expression U are to be on the interval at center with such position: at this position U _RBe used for the x that rank 1 is differentiated ₂In and be used for the x that rank 2 is differentiated ₂And y ₂Be antisymmetric among both.

Phase shifting component by phase shifter 14,24 and 34 cut toe, in present device, obtain to exceed provide in the table 1 to from the discriminating of the improvement of the background of out of focus image to reduce U _BWith respect to x ₂And y ₂The amplitude of derivative.Consider apodizing function T ₂(ξ ₂, η ₂)

T_{2} (ξ_{2}, η_{2}) = | \sin (π \frac{ξ_{2}}{a}) | | \sin (π \frac{η_{2}}{a}) | - - - - (31)

For rank 2 differentiate and m=2 at ξ ₂And η ₂On the result that carries out behind the integration be

U_{B} (v_{2}) = - (\frac{1}{2 k}) (\frac{A_{B}}{{f_{2}}^{2}}) (\frac{π {f_{2}}^{2}}{{kz}_{B}}) \exp [jk ({\tilde{z}}_{B})]

\times {&lang;}_{\times {[C (ξ_{5}^{'}) - C (ξ_{1}^{'})] - j [S (ξ_{5}^{'}) - S (ξ_{1}^{'})]}}^{\exp [jk (\frac{{f_{2}}^{2}}{2 k z_{B}}) {(\frac{{kx}_{2}}{f_{2}} - \frac{π}{a})}^{2}]}

\times {&lang;}_{\times {[C (η_{5}^{'}) - C (η_{1}^{'})] - j [S (η_{5}^{'}) - S (η_{1}^{'})]}}^{\exp [jk (\frac{{f_{2}}^{2}}{2 k z_{B}}) {(\frac{{ky}_{2}}{f_{2}} - \frac{π}{a})}^{2}]} - - - - (32)

ξ_{p}^{'} = {(\frac{{kz}_{B}}{{πf}_{2}^{2}})}^{1 / 2} [(p - 3) a + (\frac{{f_{2}}^{2}}{{kz}_{B}}) (\frac{{kx}_{2}}{f_{2}} - \frac{π}{a})], p = 1, 5;

ξ_{p}^{''} = {(\frac{{kz}_{B}}{{πf}_{2}^{2}})}^{1 / 2} [(p - 3) a + (\frac{{f_{2}}^{2}}{{kz}_{B}}) (\frac{{kx}_{2}}{f_{2}} + \frac{π}{a})], p = 1, 5; - - - - (33 b)

η_{p}^{'} = {(\frac{{kz}_{B}}{{πf}_{2}^{2}})}^{1 / 2} [(p - 3) a + (\frac{{f_{2}}^{2}}{{kz}_{B}}) (\frac{{ky}_{2}}{f_{2}} - \frac{π}{a})], p = 1, 5; - - - - (33 c)

η_{p}^{''} = {(\frac{{kz}_{B}}{{πf}_{2}^{2}})}^{1 / 2} [(p - 3) a + (\frac{{f_{2}}^{2}}{{kz}_{B}}) (\frac{{ky}_{2}}{f_{2}} + \frac{π}{a})], p = 1, 5 . - - - - (33 d)

May use (the U of characteristic (seeing Abramowitz and Stegun, the op cit.) confirmation of Fresnel integral at spatial filter pin hole 58 _RU _B ^*+ U _R ^*U _B) the integration of optical frequency component, will be (U to the correspondence on the detector pinhole of a correspondence _RU _B ^*+ U _R ^*U _B) the good approximation equivalence of integration, differentiate and have for having the rank of cutting toe 2 that provides by equation (31) at ξ ₂Having on the direction | sin (π ξ ₂/ a) | a ξ ₂The relevant toe of cutting reaches at η ₂Do not cut the present invention disclosed herein of the rank 1 of toe on the direction, in table 1, list performance in this way.

In conjunction with the feature of a highly significant of these characteristics of equipment of the present invention is each independent volume element for the light source of out of focus image, can be implemented in the minimizing of reinforcement of interference term of the detection of the reference beam of reflection wavenumber filtering, spatial filtering in the image plane 67 and background light beam wavenumber filtering, spatial filtering.Therefore, interference term this reduce to cause simultaneously the statistical error that caused by out of focus image background and systematic error through reducing of strengthening.

In the context of the axial cross section power of the prior art interference confocal microscopy that is effectively reduced than the axial cross section power (sectioning power) of prior art confocal microscopy, equipment of the present invention also can be understood the potential value from the different possibility of the sensitivity of the reduction of the background of out of focus image.Than because from the error signal in the prior art confocal microscopy of the background of the detection of the intensity of out of focus image because the reference amplitude of reflection and from the error signal in prior art interference confocal microscopy of the interference cross term of the detection between the background amplitude of out of focus image at z _BIn have z _BThe correlativity of weak one-level.

Statistical error

Consider the response of present device to a plane xsect of any three-dimensional scattering object 112.For a given transverse plane cross section of scatterer 112, the output current I of a pixel of detecting device is:

I (z_{0, S} - z_{0, R}, x) = {&Integral; &Integral;}_{p} {| U_{R} |}^{2} d x_{3} {dy}_{3} + {&Integral; &Integral;}_{p} {| U_{B} |}^{2} d x_{3} {dy}_{3}

+ {&Integral; &Integral;}_{p} {| U_{S} |}^{2} {dx}_{3} {dy}_{3}

+ \cos x {&Integral; &Integral;}_{p} [\begin{matrix} U_{R} {U_{S}}^{*} \\ + {U_{R}}^{*} U_{S} \end{matrix}] d x_{3} {dy}_{3} + j \sin x {&Integral; &Integral;}_{p} [\begin{matrix} U_{R} {U_{S}}^{*} \\ - {U_{R}}^{*} U_{S} \end{matrix}] dx_{3} {dy}_{3}

+ \cos x {&Integral; &Integral;}_{p} [\begin{matrix} U_{R} {U_{B}}^{*} \\ + {U_{R}}^{*} U_{B} \end{matrix}] d x_{3} {dy}_{3} + j \sin x {&Integral; &Integral;}_{p} [\begin{matrix} U_{R} {U_{B}}^{*} \\ - {U_{R}}^{*} U_{B} \end{matrix}] dx_{3} {dy}_{3} - - - - (34)

+ {&Integral; &Integral;}_{p} (U_{S} {U_{B}}^{*} + {U_{S}}^{*} U_{B}) {dx}_{3} {dy}_{3}

Wherein

Be the integration in the area of this detector pinhole, x is the phase-shift phase that phase shifter 44 is imported.By equation (12a) and (12b) respectively the definition intensity difference Δ I ₁=I ₁-I ₂With Δ I ₂=I ₃-I ₄Corresponding equation be:

Δ I_{1} = 2 {&Integral; &Integral;}_{p} (U_{R} {U_{B}}^{*} + {U_{R}}^{*} U_{B}) {dx}_{3} {dy}_{3}

+ 2 {&Integral; &Integral;}_{p} (U_{R} {U_{S}}^{*} + {U_{R}}^{*} U_{S}) {dx}_{3} {dy}_{3}, - - - - (35 a)

Δ I_{2} = j 2 {&Integral; &Integral;}_{p} (U_{R} {U_{B}}^{*} - {U_{R}}^{*} U_{B}) {dx}_{3} {dy}_{3} - - - - (35 b)

+ j 2 {&Integral; &Integral;}_{p} (U_{R} {U_{S}}^{*} - {U_{R}}^{*} U_{S}) {dx}_{3} {dy}_{3},

Wherein Ii is defined by following formula:

I _i≡ I (x=x _i), x ₁=0, x ₂=π, x ₃=pi/2, x ₄=3 pi/2s (36)

With

Statistical error can distinguish

Be expressed as:

\frac{σ^{2} [{&Integral; &Integral;}_{p} (U_{R} {U_{S}}^{*} + {U_{R}}^{*} U_{S}) {dx}_{3} {dy}_{3}]}{{&Integral; &Integral;}_{p} {| U_{R} |}^{2} {dx}_{3} {dy}_{3}} =

+ \frac{1}{2} + \frac{1}{2} \frac{{&Integral; &Integral;}_{p} {| U_{B} |}^{2} {dx}_{3} {dy}_{3}}{{&Integral; &Integral;}_{p} {| U_{R} |}^{2} {dx}_{3} {dy}_{3}} + \frac{1}{2} \frac{{&Integral;&Integral;}_{p} {| U_{S} |}^{2} {dx}_{3} {dy}_{3}}{{&Integral; &Integral;}_{p} {| U_{R} |}^{2} {dx}_{3} {dy}_{3}} - - - - (37 a)

+ \frac{1}{2} \frac{σ^{2} [{&Integral; &Integral;}_{p} (U_{R} {U_{B}}^{*} + {U_{R}}^{*} U_{B}) {dx}_{3} {dy}_{3}]}{{&Integral; &Integral;}_{p} {| U_{R} |}^{2} {dx}_{3} {dy}_{3}}

+ \frac{1}{2} \frac{σ^{2} [{&Integral; &Integral;}_{p} (U_{S} {U_{B}}^{*} + {U_{S}}^{*} U_{B}) {dx}_{3} {dy}_{3}]}{{&Integral; &Integral;}_{p} {| U_{R} |}^{2} {dx}_{3} {dy}_{3}},

\frac{σ^{2} [j {&Integral; &Integral;}_{p} (U_{R} {U_{S}}^{*} - {U_{R}}^{*} U_{S}) {dx}_{3} {dy}_{3}]}{{&Integral; &Integral;}_{p} {| U_{R} |}^{2} {dx}_{3} {dy}_{3}} = - - - - (37 b)

+ \frac{1}{2} + \frac{1}{2} \frac{{&Integral; &Integral;}_{p} {| U_{B} |}^{2} {dx}_{3} {dy}_{3}}{{&Integral; &Integral;}_{p} {| U_{R} |}^{2} {dx}_{3} {dy}_{3}} + \frac{1}{2} \frac{{&Integral;&Integral;}_{p} {| U_{S} |}^{2} {dx}_{3} {dy}_{3}}{{&Integral; &Integral;}_{p} {| U_{R} |}^{2} {dx}_{3} {dy}_{3}}

+ \frac{1}{2} \frac{σ^{2} [j {&Integral; &Integral;}_{p} (U_{R} {U_{B}}^{*} - {U_{R}}^{*} U_{B}) {dx}_{3} {dy}_{3}]}{{&Integral; &Integral;}_{p} {| U_{R} |}^{2} {dx}_{3} {dy}_{3}} + \frac{1}{2} \frac{σ^{3} [{&Integral; &Integral;}_{p} (U_{S} {U_{B}}^{*} + {U_{S}}^{*} U_{B}) {dx}_{3} {dy}_{3}]}{{&Integral; &Integral;}_{p} {| U_{R} |}^{2} {dx}_{3} {dy}_{3}},

Suppose at derivation equation (37a) with (37b)

Just the statistical noise in the supposition system is by the decision of the Poisson statistics rule of the photoelectron number that is detected.And

With All corresponding a large amount of photoelectron.For

With Situation, equation (37a) and (37b) in the right side with U _SRelevant those can be ignored, so be reduced to following equation:

\frac{σ^{2} [{&Integral; &Integral;}_{p} (U_{R} {U_{S}}^{*} + {U_{R}}^{*} U_{S}) {dx}_{3} {dy}_{3}]}{{&Integral; &Integral;}_{p} {| U_{R} |}^{2} {dx}_{3} {dy}_{3}} = \frac{1}{2} + \frac{1}{2} \frac{{&Integral; &Integral;}_{p} {{| U_{B} |}^{2} dx}_{3} {dy}_{3}}{{&Integral; &Integral;}_{p} {| U_{R} |}^{2} {dx}_{3} {dy}_{3}}

+ \frac{1}{2} \frac{σ^{2} [{&Integral; &Integral;}_{p} (U_{R} {U_{B}}^{*} {+ U}_{R}^{*} U_{B}) {dx}_{3} {dy}_{3}]}{{&Integral; &Integral;}_{p} {| U_{R} |}^{2} {dx}_{3} {dy}_{3}}, - - - - (38 a)

\frac{σ^{2} [j {&Integral; &Integral;}_{p} (U_{R} {U_{S}}^{*} {- U}_{R}^{*} U_{S}) {dx}_{3} {dy}_{3}]}{{&Integral; &Integral;}_{p} {| U_{R} |}^{2} {dx}_{3} {dy}_{3}} = \frac{1}{2} + \frac{1}{2} \frac{{&Integral; &Integral;}_{p} {{| U_{B} |}^{2} dx}_{3} {dy}_{3}}{{&Integral; &Integral;}_{p} {| U_{R} |}^{2} {dx}_{3} {dy}_{3}}

+ \frac{1}{2} \frac{σ^{2} [j {&Integral; &Integral;}_{p} (U_{R} {U_{B}}^{*} {- U}_{R}^{*} U_{B}) {dx}_{3} {dy}_{3}]}{{&Integral; &Integral;}_{p} {| U_{R} |}^{2} {dx}_{3} {dy}_{3}} - - - - (38 b)

It is worthy of note, from Change to The time resulting about The additional gain of signal to noise ratio (S/N ratio) be a factor that approximates (3/2).Yet the cost of this gain is the huge increase of the dynamic range of light source power and desired signal electronic processing circuit.Therefore, | U _R| optimal selection typically should be to satisfy the condition of stating: When the condition that satisfies shown in the relational expression (39), equation (38a) and (38b) given statistical error will be subjected to the restriction of following inequality:

Close examination equation (37a) and (37b) or (38a) and (38b) can know significantly and see has been implemented equipment of the present invention because its visual background of out of focus that has reduced and at given working value U _SAnd U _RThis expropriation of land has the statistical error that is lower than conventional art confocal interference microscopic system down.Typically, use the resulting signal to noise ratio (S/N ratio) of enforcement equipment of the present invention will not adopt a big factor (3/2) of confocal interference microscope of the present invention than use ^1/2

To equation (37a) and (37b), (38a) and (38b), and explanation (40a) and (40b) is: utilize the present invention disclosed herein might obtain the component of plural scattering amplitude from one group of 4 ionization meter, make that for each position independently in the object statistical error of each component of the multiple scattering amplitude of release is all typically in the factor (3/2) by the determined limited statistical error of statistical property of plural scattering amplitude self ^1/2In the scope, and with compare toward the technology confocal interference microscope, can require the statistical error that reaches given with lower light source works watt level and lower signal processing circuit dynamic range." independently position " this speech is used for representing that by the group that is associated that 4 measured intensity are formed be independently groups of some statistics.

Might be in first and second embodiment shown in Fig. 1 a-1n and Fig. 2 a-2f transmissivity by reducing phase shifter 24 with the scatter sounding light beam and the out of focus image beam at while decay pattern image plane 47 places, satisfy the given condition of relational expression (39).In order to obtain given signal to noise ratio (S/N ratio), this attenuation processing might increase the intensity of light source 10 along with the increase of phase shifter 24 attenuation degrees.For the present invention third and fourth embodiment shown in Fig. 3 a-3l and the 4a-4f, can satisfy the condition that relational expression (39) provides by the relative transmission/reflectivity properties of regulating beam splitter 100,100a and 100b.Generally speaking, when satisfying the condition that relational expression (39) provides with the 3rd or the 4th embodiment, compare based on the attenuation processing that reduces phase shifter 24 transmissivities with above-mentioned,

light source

10 or 10a can work in lower power.

This signal to noise ratio (S/N ratio) can be adjusted to a function of the wavelength of light source optics frequency component so that for example generate will with the wavelength single order irrelevant a signal to noise ratio (S/N ratio).This feature is illustrated in the detailed description part of first embodiment.As described in the description of quoting, because the factor that is illustrated, the amplitude of detecting light beam P42D of scattering wave length filtering, spatial filtering of corresponding optical frequency component that is normalized to the amplitude of detecting light beam P22D usually changed with wavelength before entering object materials.And the amplitude of the detecting light beam P42D of scattering wave length filtering, spatial filtering usually enters the increase of the degree of depth in the object materials 112 along with figure image point 28 to the ratio of the amplitude of background light beam B62D wave length filtering, spatial filtering and reduces.These factors can partly be compensated in the following manner to the influence of signal to noise ratio (S/N ratio) ratio: at reference mirror subsystem 83 and/or at detecting light beam subsystem 82, be preferably in the reference mirror subsystem 83 and place a wavelength filter, and the transmission that constitutes this wavelength filter is to have the certain wavelengths correlativity and regulate and/or to optimize the wave length filtering of transmission by the detector pinhole separately of different wave length, the detecting light beam P42D of the scattering of spatial filtering and long filtering, the ratio of the reference beam R42D of the reflection of spatial filtering is to satisfy the condition of equation (39) expression.

The systematic error that causes by the out of focus image

As long as record | U _R|, in conjunction with measured value Δ I ₁, Δ I ₂With | U _R| exp[j (φ _R-φ _{S, 0})] equation (35a) and (35b) can be used for to U _SReal part and imaginary part measure.Amount | U _R| exp[j (φ _R-φ _{S, 0})] as determining for the method described in the paper of " Properties of Fourier Transformed ScatteringAmplitude (characteristic of the scattering amplitude of Fourier transform) " by title.Wherein remain possible systematic error item:

{&Integral; &Integral;}_{p} (U_{R} {U_{B}}^{*} + {U_{R}}^{*} U_{B}) {dx}_{3} {dy}_{3} - - - - (41 a)

{&Integral; &Integral;}_{p} (U_{R} {U_{B}}^{*} - {U_{R}}^{*} U_{B}) {dx}_{3} {dy}_{3} - - - - (41 b)

When | U _B|＞＞| U _S| the time, these systematic error items may be tangible.Therefore, hope can by formula (41a) and (41b) represented interference term compensate to an acceptable level.

Usually, among the present invention disclosed herein, be compensation

With The Computer Processing amount much less more required that item is required than conventional art confocal interference microscopy.This is because U _BSpatial property depend on the scattering nature of three-dimensional body 112 to be measured, thereby depend on U by an integral equation _SThese integral equations, i.e. equation (35a) and (35b) is not Rider nurse (Fredholm) integral equation suddenly of second class.When for example having implemented to have reduced in the equipment of the present invention

With During item, for trying to achieve U _SAnd the Computer Processing that each integral equation is inverted that needs to carry out will reduce.Generally, the minimizing speed of required Computer Processing faster than

With

Reduce speed.

It is different to implement equipment of the present invention for those, and compensation does not interfere with each other item Interferometry, be nonlinear integral equation corresponding to equation (35a) and integral equation (35b): they are U _SThe quadratic integral equation.Generally speaking for finding the solution required computer hardware of nonlinear integral equation and software than finding the solution the much complicated of linear integral equations.Therefore, implement equipment of the present invention operand from

Item is transformed into With This fact of item has been represented the key character of the present invention with respect to conventional art pin hole confocal microscopy.

Be also pointed out that differently, in implementing equipment of the present invention, result from background signal with conventional art pin hole confocal microscopy

Systematic error to reduce be completely.

Wideband operation

Key character of the present invention levies one, when light source 10 be one finder lens 46 axially on still can realize during the required wideband light source of a plurality of figure image points of imaging simultaneously to out of focus image background effect through reducing of strengthening.For the discussion of this feature, suppose aberration function Wi=1 for simplicity's sake and do not have the toe of cutting of pupil function Pi promptly do not have the toe of cutting of phase shifter 14,24,34,34a and 44.Those skilled in the art are appreciated that when adopting and cut toe and decompose to change, and what for example obtain is used for Us (v ₃) arithmetic expression will be more complicated, the however general key character that keeps for for example its symmetry or antisymmetry spatial character.The integration of the equation of differentiating under the condition of the hypothesis that illustrates in simplifying earlier paragraphs and for rank 1 (9) produces

U_{S} (v_{2}) = (\frac{1}{2}) (\frac{a^{'}}{d_{0}}) {(R_{1} T_{1})}^{1 / 2} &Integral; A (v_{1}) d v_{1}

×∫∫sinc[(a′/2d ₀))(v ₀-v ₁)]

\times {\frac{\sin [m (v_{0} - v_{1})]}{m \sin [(1 / 2) (v_{0} - v_{1})}} a (v_{0}) t (v_{0}) a (v_{0})

\times \sin c [(a^{'} / 2 d_{0}) (v_{2} - v_{0})] {\frac{\sin [m (v_{2} - v_{0})]}{m \sin (v_{2} - v_{0})]}}

\times \sin [(1 / 2) (v_{2} - v_{0})] \exp (j 2 k {\tilde{z}}_{S}) d v_{0} d z_{0} - - - - - (42)

Z wherein ₀By z _SReplace a ' and d ₀Be respectively the width of the element among phase shifter 14,24,34 and the 34a and the distance and sincx ≡ (the sinx)/x of center to center.Because w _IIt is relevant with minimizing from the background of out of focus image to be correlated with in rank 1 is differentiated not, so is suppressed, at v ₂Us (v on the direction ₂) spatial character be configured so that obtain background light beam wavenumber filtering, spatial filtering and the minimizing through strengthening in the potential source of therefore on a broadband operation, limiting.

Reference beam U for reflection _R(v ₂) the corresponding expression formula of amplitude be

U_{R} (v_{2}) = (\frac{1}{2}) (\frac{a^{'}}{d_{0}}) {(T_{1} R_{1})}^{1 / 2} &Integral; A (v_{1}) d v_{1}

×∫sinc[(a′/2d ₀)(v ₀-v ₁)]

\times {\frac{\sin [m (v_{0} - v_{1})]}{m \sin [(1 / 2) (v_{0} - v_{1})]}} \sin c [(a^{'} / 2 d_{0}) (v_{2} - v_{0})]

\times {\frac{\sin [m (v_{2} - v_{0})]}{m \sin (v_{2} - v_{0})}} \sin [(1 / 2) (v_{2} - v_{0})] \exp (j 2 k {\tilde{z}}_{R}) d v_{0} - - - - (43)

Z wherein ₀By z _RReplace.

Consider a '=d ₀Situation, for this special circumstances equation (42) and (43) respectively reduction arrive

U_{S} (v_{2}) = (\frac{1}{2}) {(R_{1} T_{1})}^{1 / 2} &Integral; A (v_{1}) d v_{1} &Integral; &Integral; 2 \sin c [m (v_{0} - v_{1})]

×a(v ₀)t(v ₀)a(v ₀)

\times \sin c [(1 / 2) (v_{2} - v_{0})] {\frac{\sin [m (v_{2} - v_{0})]}{m \sin (v_{2} - v_{0})}}

\times \sin [(1 / 2) (v_{2} - v_{0})] \exp (j 2 k {\tilde{z}}_{S}) d v_{0} d z_{0}, - - - - (44)

U_{R} (v_{2}) = (\frac{1}{2}) {(R_{1} T_{1})}^{1 / 2} &Integral; A (v_{1}) d v_{1} &Integral; 2 \sin c [m (v_{0} - v_{1})]

\times \sin c [(1 / 2) (v_{2} - v_{0})] {\frac{\sin [m (v_{2} - v_{0})]}{m \sin (v_{2} - v_{0})}}

\times \sin [(1 / 2) (v_{2} - v_{0})] \exp (j 2 k {\tilde{z}}_{R}) d v_{0}, - - - - (45)

In the equation (45) at v ₀On integration can be performed and have the result

U_{R} (v_{2}) = (\frac{1}{2}) {(T_{1} R_{1})}^{1 / 2} &Integral; A (v_{1}) (1 / m) \sin c [(1 / 2) (v_{2} - v_{1})]

\times {\frac{\sin [m (v_{2} - v_{1})]}{m \sin (v_{2} - v_{1})}}

\times \sin [(1 / 2) (v_{2} - v_{1})] \exp (j 2 k {\tilde{z}}_{R}) d v_{1} . - - - - (46)

For two elements Phase Shifting System (m=1) U shown in Figure 7 _R(v ₂) an example be (x ₂Kd ₀/ f) a function, y ₂=0, z ₂=0 and v ₁=0.

By factor sin[(1/2) (v ₂-v ₁)] in equation (46), clearly present U _R(v ₂) around v ₁The antisymmetry space distribution.U _R(v ₂) space distribution usually will show similar behavior because equation (44) has the arithmetic structure identical with equation (45).This antisymmetry space distribution is utilized (exploited) in the preferential minimizing from the amplitude of the background of out of focus image.

Can obviously find out from the property of system that for example equation (46) is disclosed, as long as corresponding (v ₂-v ₁) (wherein [σ (q)] satisfies condition ²Represent the variance of argument q):

Then for still keeping at burnt image by the given U of equation (44) _S(V ₃) high sensitivity.

As (v ₃-v ₁) value give regularly, to the contribution of signal at (x ₃-x ₁Hyp relation is arranged: (v between)/f and the k ₃-v ₁) be to be proportional to k (x ₃-x ₁)/f's.Therefore, might be by k being limited the k value and (x that makes permission ₃-x ₁)/f value satisfies relational expression (47), makes the detecting device that obtains pictorial data will produce improved signal to noise ratio (S/N ratio) (at the ratio of burnt signal intensity with defocus signal intensity) simultaneously.Can obtain the following relationship formula from relational expression (47):

{(k d_{0})}^{2} {σ [(x_{2} - x_{1}) / f]}^{2} + {({kd}_{0})}^{2} [(x_{2} - x_{1}) / f]^{2} {(\frac{σ_{k}}{k})}^{2}

Select a kind of like this mode of operation, two items on relational expression in this pattern (48) left-hand side have identical contribution to the left side, at this moment have: With

Marriage relation formula (50) can obtain one about (σ with following equation _k/ k) relational expression:

(v ₂-v ₁)=[kd ₀(x ₃-x ₀)/f]=r π, r=1,3 ..., (51) are r π representative (v wherein ₃-v ₁) a son group of value, in the factor down

{\frac{\sin [m (v_{2} - v_{1})]}{m \sin (v_{2} - v_{1})}} . - - - - (52)

In these values will reach peak value.The result is:

Can obviously find out from relational expression (53), implement equipment work of the present invention and in than the λ wavestrip of broad the time, be still effectively.For example, when m=1 and r=1, (σ k/k)≤0.35; (σ k/k)≤0.18 when m=2 and r=1.

Can a restriction be arranged the actual r value scope that adopts.This restriction is from the consideration to signal to noise ratio (S/N ratio).Formula (52) given to observation signal in the contributive factor, each peak value all corresponding an improved signal intensity.Yet,, also be the maximal value r of r along with the number at the peak that is comprised increases _MaxIncrease, must reduce according to the bandwidth of relational expression (53) k.

When adopting the discriminating of rank 2 in the of the present invention second or the 4th embodiment and modification thereof, the spacing between each pin hole also has a restriction.This restriction also can be tried to achieve with the analysis that is similar in the wideband operation paragraph.From the property of system that for example equation (46) is disclosed, can obviously find out, as long as have (δ v wherein ₁Be the spacing between adjacent two pin holes in the corresponding pin hole light source linear array), just can keep Us (v at burnt image ₂) high sensitivity.

Notice the apparent x that contains in right side of restrictive condition shown in relational expression (49) and (50) ₁Or y ₁, having implemented equipment of the present invention as can be seen is effectively for a class light source, and to x ₁Or y ₁Span do not have the restriction of intrinsic.

Observe by turbid medium

Another key character of the present invention disclosed herein is that the enhancing to out of focus image background effect when observing by turbid medium reduces to be still effectively.Impulse response function h when observing by turbid medium _{A, M}For:

h _A，M＝h _A*h _M (55)

H wherein _ABe the impulse response function of equipment when observing by non-turbid medium, h _MBe the impulse response function of turbid medium, * represents h _AWith h _MConvolution.h _A* h _MFourier transform F (h _A* h _M) be:

F (h _{A, M})=F (h _A) F (h _M) (56) impulse response function h _MCan represent well by a Gaussian distribution:

h_{M} (v_{l} - v_{m}) = \frac{1}{\sqrt{2 π} σ} \exp [- \frac{{(v_{e} - v_{m})}^{2} + {(w_{l} - w_{m})}^{2}}{{2 σ}^{2}}] - - - - (57)

σ wherein ²Be h _MVariance.

h _MFourier transform F (h _M) provide by following formula:

F (h_{M}) = \exp (- \frac{q \cdot {qσ}^{2}}{2}) - - - - (58)

Wherein q is the angle spatial frequency vector with the v phase conjugate.h _ALowest frequency peak be positioned at frequency

Q=2 π (d ₀/ λ) (59) locate.Can obviously find out from equation (56) and (58), when Or The time, h _AMCan be at q=(d ₀/ λ) locate the value that keeps bigger.Utilize formula (59) and (61) can obtain operable d ₀Value is subjected to following condition restriction:

So, might become pattern system to design to such an extent that can be lower than implementing chromatography of the present invention by h _MThe spatial frequency range of the cutoff frequency of decision is with keeping than higher sensitivity.

Can recognize according to the present invention, for reference beam amplitude with any spatial property, the amplitude and the interference term between the reference beam amplitude of bias light (being the detecting light beam that out of focus is returned) can play a decisive role to the generation of undesirable systematic error, and are important to the generation of undesirable statistical error.In the various embodiments described above of the present invention, owing to produced antisymmetric spatial property by phase shift in reference beam, the interference term between bias light and the reference beam amplitude is reduced.Because this interference term is reduced, it will can not produce unacceptable big systematic error and statistical error in by the data that each pixel produced of many pixels detecting device.

Can also recognize that the amplitude of reflected reference beam wavenumber filtering, spatial filtering is relevant with the interference term between scatter sounding light beam wavenumber filtering, spatial filtering (" promptly " wishes signal) with the reflected reference beam of wavenumber filtering, spatial filtering.Reference beam with the reflected reference beam amplitude of wavenumber filtering, spatial filtering square form be detected.Scatter sounding light beam wavenumber filtering, spatial filtering is detected as the coherent term between reflected reference beam wavenumber filtering, spatial filtering and scatter sounding light beam wavenumber filtering, spatial filtering, also is that the form of the product of scatter sounding light beam vibration amplitude wavenumber filtering, spatial filtering and reflected reference beam amplitude wavenumber filtering, spatial filtering is detected.The reflected reference beam wavenumber filtering that detects, spatial filtering is relevant with the scatter sounding light beam wavenumber filtering that detects, spatial filtering, because all have reflected reference beam amplitude wavenumber filtering, spatial filtering in the two.This correlativity makes determines that from such interference term object materials character will be more accurate on statistics.As a result, the data that can be produced in response to the interference term between reflected reference beam wavenumber filtering, spatial filtering and scatter sounding light beam wavenumber filtering, spatial filtering the time from many pixels detecting device obtain the precise characteristics in burnt object materials.This be because for the statistical precision of a given pixel of this many pixels detecting device be subjected to this pixel in response to scatter sounding light beam vibration amplitude wavenumber filtering, spatial filtering square the time photoelectron limited in number that produced, rather than the photoelectron limited in number that produced when being subjected in response to the amplitude of reflected reference beam wavenumber filtering, spatial filtering or background light beam wavenumber filtering, spatial filtering square.

Those skilled in the art that also can see, also can adopt other and/or additional optical element and detecting device among any embodiment in each embodiment disclosed in this invention.For example, also can adopt polarization beam apparatus or change the character of the radiation that is used for surveying object materials again in conjunction with additional phase shifting component.Another example can be to increase by a detecting device to monitor the intensity of light source.Can make these or other tangible modification under spirit of the present invention and situation category not departing from.

Also should see, for example can in Fig. 1 a-1n, leave out phase shifter 34, at this moment, the image that results from the pointolite 8 at figure image point 38 places in burnt image plane 37 will be different from foregoing image, though identical with foregoing image basically in the image of the pointolite 8 of the generation of figure image point 48 places in burnt image plane 47 by reflected reference beam.Yet the counteracting of above-mentioned out of focus image still can realize.Similarly, phase shifter 34 be can in Fig. 2 a-2f, leave out, in Fig. 3 a-3l and Fig. 4 a-4f, phase shifter 34 and 34a left out.

Also should see, as long as can make the space distribution of the amplitude of reflected reference beam on free hand drawing pixel detector plane is antisymmetric basically, the space configuration of each phase shifter element of phase shifter 14,24,34,34a can be with aforesaid different and/or have except that the secondary lobe function.But, in order to obtain the hope tomographic image of object materials 112, must handle with the method that slightly is different from the aforementioned various embodiments of the present invention by the pictorial data that many pixels detecting device produces.

Also should see, the interferometer in aforementioned each embodiment and the modification thereof can be do not exceed the spirit and scope of the present invention the confocal interference microscopy system that in transmission mode, works.For example when the variation of the polarization state that detects a detecting light beam, this transmission mode can be a preferable mode of operation that is used for some read and write pattern of the present invention.

Should see that also the interferometer among aforementioned each embodiment can be a polarization-type, its purpose for example is to go to survey object materials 112 or in order to increase the information flux by the light of interferometer on single or the many pixels detecting device with polarized light.But, can on single or many pixels detecting device, mix, need in aforementioned device, increase for example such additional optics of polarization beam apparatus in order to make reflected reference beam and scatter sounding light beam.

Claims

1, a kind of handle in an object and/or on an information-bearing district burnt image come out from the out of focus image distinguishing with reduce to determine by in this object and/or on the information represented of information-bearing district the method for error, it may further comprise the steps:

(a) array from a single color point radiating light source produces a detecting light beam and a reference beam;

(b) by this detecting light beam is caused in this information-bearing district and/or on an array at burnt figure image point produce one and return detecting light beam Jiao;

(c) be created in the antisymmetry spatial property that Jiao returns detecting light beam;

(d) produce one at burnt reference beam;

(e) be created in burnt antisymmetry spatial property with reference to detecting light beam;

(f) make this burnt reference beam with interfere from the light beam of a plurality of out of focus figure image points;

(g) make at burnt reference beam and return detecting light beam and interfere Jiao;

(h) by should reduce system and statistical error this information in the data that produce by this detecting device as interference data by means of the detector elements of a detecting device at the complex amplitude that Jiao surveys Returning beam to represent to determine, wherein this interference data comprise one at this at burnt reference beam with should return another interference term that interference term between the detecting light beam and the out of focus image beam that joins at this and out of focus image spot correlation and the amplitude between the counterpart at burnt reference beam significantly reduce Jiao.

2, according to the process of claim 1 wherein step (h) comprise detect this at burnt reference beam as should and determining that this used this amplitude in Jiao returns the complex amplitude of detecting light beam at a nonlinear function of the amplitude of burnt reference beam from the amplitude of those reference items.

3,, comprise providing a CD as this object according to the method for claim 1.

4,, comprise that the former bit organization that human body or animal target are provided is as this object according to the method for claim 1.

5, according to the method for claim 1, the biopsy that comprises the excision that human body or animal target are provided is as this object.

6, according to the method for claim 1, comprise provide in this object and/or on a reference surface and to be positioned on this reference surface in burnt reference diagram image point execution in step (b) to (h), and determine to be arranged in this information-bearing district and/or in the position of burnt reference diagram image point with respect to this reference surface.

7, according to the method for claim 1, comprise be provided between this object and this detecting light beam relative to machinery move with permission in other part execution in step (b) of this object of burnt figure image point to (h).

8, a kind of handle in an object and/or on an information-bearing district burnt image come out from the out of focus image distinguishing with reduce to determine by in this object and/or on the information represented of information-bearing district the method for error, it may further comprise the steps:

(b) by this detecting light beam is caused in this information-bearing district and/or on an array at burnt figure image point produce one and return detecting light beam Jiao, should return detecting light beam Jiao and comprise and a plurality ofly return beamlet Jiao, each return beamlet and this array Jiao at least one join at the visual spot correlation of Jiao;

(c) produce each returns beamlet Jiao antisymmetry spatial property;

(d) produce one at burnt reference beam, should burnt reference beam comprise a plurality of Jiao with reference to beamlet, each returns beamlet Jiao and is associated with one respectively with reference to beamlet Jiao;

(e) produce each at the antisymmetry spatial property of Jiao with reference to beamlet;

(f) make this burnt reference beam with interfere from a light beam of a plurality of out of focus figure image points;

(h) by reduce system and statistical error this information to represent to determine in the data that produced by this detector array as interference data by means of these complex amplitudes that return beamlet Jiao of the detector elements of a detector array, wherein this interference data is included in and corresponding returns the interference term surveyed between the beamlet and the out of focus image beam that joins at this and out of focus image spot correlation and corresponding other interference terms that significantly reduce with reference to the amplitude between the beamlet Jiao Jiao with reference to beamlet with Jiao.

9, method according to Claim 8, wherein step (h) comprise detect this at burnt reference beam as should and determining that this used this amplitude in Jiao returns the complex amplitude of detecting light beam at a nonlinear function of the amplitude of burnt reference beam from the amplitude of those reference items.

10, a kind of handle in an object and/or on an information-bearing district burnt image come out from the out of focus image distinguishing with reduce to determine by in this object and/or on the information represented of information-bearing district the method for error, it may further comprise the steps:

(a) produce a detecting light beam and a reference beam from a broadband point radiating light source;

(b) produce one at burnt reference beam;

(c) produce this antisymmetry spatial property at burnt reference beam;

(d) detecting light beam by a chromatic dispersion element this detecting light beam is converted to a light beam that focuses to the line in this information-bearing district;

(e) produce one and return detecting light beam Jiao;

(f) be created in the antisymmetry spatial property that Jiao returns detecting light beam;

(g) spatial filtering returns detecting light beam Jiao;

(h) spatial filtering Jiao return detecting light beam by a chromatic dispersion element this detecting light beam is converted to a light beam of the line in the detector plane that focuses to a detecting device;

(i) spatial filtering is at burnt reference beam;

(j) spatial filtering burnt reference beam by a chromatic dispersion element this reference beam is converted to a light beam of this line that focuses in this detector plane;

(k) spatial filtering is from a light beam of a plurality of out of focus figure image points;

(l) light beam from a plurality of out of focus figure image points of spatial filtering is passed through a chromatic dispersion element;

(m) make interfering of this spatial filtering at burnt reference beam and light beam from the spatial filtering of those out of focus figure image point;

(n) make the returning detecting light beam Jiao and interfere at burnt reference beam and spatial filtering of spatial filtering; And

(o) reduce system and statistical error this information to represent to determine in the data that produced by a detecting device as interference data by the complex amplitude that returns detecting light beam Jiao by means of this spatial filtering of detector elements of a detecting device, wherein this interference data is included in another interference term that returns the interference term between the detecting light beam and significantly reduce at the amplitude between burnt reference beam of the light beam of spatial filtering of a plurality of out of focus figure image points from this and spatial filtering Jiao at burnt reference beam and spatial filtering of spatial filtering.

11, according to the method for claim 10, wherein step (o) comprise detect this at burnt reference beam as should and determining that this used this amplitude in Jiao returns the complex amplitude of detecting light beam at a nonlinear function of the amplitude of burnt reference beam from the amplitude of those reference items.

12,, comprise providing a CD as this object according to the method for claim 10.

13,, comprise that the former bit organization that human body or animal target are provided is as this object according to the method for claim 10.

14, according to the method for claim 10, the biopsy that comprises the excision that human body or animal target are provided is as this object.

15, according to the method for claim 10, wherein step (a) comprises from a broadband point radiating light source array and produces this detecting light beam and this reference beam.

16, according to the method for claim 10, comprise provide in this object and/or on a reference surface and to be positioned on this reference surface in burnt reference diagram image point execution in step (b) to (o), and determine to be arranged in this information-bearing district and/or in the position of burnt reference diagram image point with respect to this reference surface.

17,, comprise being provided at moving with permission other part execution in step (b) of this object at this line place in this information-bearing district to (o) between this object and this detecting light beam relative to machinery according to the method for claim 10.

18, according to the method for claim 10, wherein step (d) comprises that with this detecting light beam by at least one grating, wherein this line is arranged essentially parallel to a first type surface of this object.

19, according to the method for claim 10, wherein this line of step (d) is substantially perpendicular to the first type surface of this object.

20, according to the method for claim 19, comprise the data that produced by this detecting device carried out Fourier transform changing the data of this interferometry, with determine in this object and/or on the information-bearing district in the predetermined depth canned data.

21, a kind of handle in an object and/or on an information-bearing district burnt image come out from the out of focus image distinguishing with reduce to determine by in this object and/or on the information represented of information-bearing district the method for error, it may further comprise the steps:

(b) produce one at burnt reference beam;

(c) produce this antisymmetry spatial property at burnt reference beam;

(d) detecting light beam is converted to a light beam that focuses to the line in this information-bearing district;

(e) produce one and return detecting light beam Jiao;

(g) spatial filtering returns detecting light beam Jiao;

(h) spatial filtering returned the light beam that detecting light beam converts the line in the detector plane that focuses to a detecting device to Jiao;

(i) spatial filtering is at burnt reference beam;

(j) spatial filtering converted to a light beam of this line that focuses in this detector plane at burnt reference beam;

(l) make the interfering of spatial filtering of this conversion at burnt reference beam and light beam from the spatial filtering of these a plurality of out of focus figure image points;

(m) make the returning detecting light beam Jiao and interfere at the spatial filtering of burnt reference beam and this conversion of the spatial filtering of this conversion; And

(n) by detect returning detecting light beam Jiao and reducing error this information to represent to determine in the data that produced by this detecting device as interference data of this spatial filtering by means of a detecting device, wherein this interference data is included in another interference term that returns the interference term between the detecting light beam and significantly reduce at the amplitude between burnt reference beam of the spatial filtering of the light beam of spatial filtering of a plurality of out of focus figure image points from this and this conversion Jiao at the spatial filtering of burnt reference beam and conversion of the spatial filtering of this conversion.

22, according to the method for claim 21, wherein step (n) comprise the spatial filtering that detects this conversion burnt reference beam as the spatial filtering of this conversion at a nonlinear function of the amplitude of burnt reference beam and determining that from the amplitude of those reference items this uses this amplitude in Jiao returns the complex amplitude of detecting light beam.

23,, comprise providing a CD as this object according to the method for claim 21.

24,, comprise that the former bit organization that human body or animal target are provided is as this object according to the method for claim 21.

25, according to the method for claim 21, the biopsy that comprises the excision that human body or animal target are provided is as this object.

26, according to the method for claim 21, wherein step (a) comprises from a broadband point radiating light source array and produces this detecting light beam and this reference beam.

27, according to the method for claim 21, comprise provide in this object and/or on a reference surface and to be positioned on this reference surface in burnt reference diagram image point execution in step (b) to (n), and determine the position of this line of the step (d) in this information-bearing district with respect to this reference surface.

28,, comprise being provided at moving with permission other part execution in step (b) of this object at this line place in this information-bearing district to (n) between this object and this detecting light beam relative to machinery according to the method for claim 21.

29, according to the method for claim 21, wherein step (d) comprises that with this detecting light beam by at least one grating, wherein this line is arranged essentially parallel to a first type surface of this object.

30, according to the method for claim 21, comprise the interferometry data that is produced by this detecting device carried out Fourier transform changing this data, with determine in this object and/or on the information-bearing district in the predetermined depth canned data.

31, according to the method for claim 21, wherein this line in the information-bearing district is substantially perpendicular to the first type surface of this object.

32, the system that uses in a kind of integrated circuit on manufacturing a wafer, this system comprises:

(a) be used to support of this wafer;

(b) be used for the illuminator of radiant image on this wafer with space configuration;

(c) be used for regulating an amount meter positioning control system of this position with respect to this radiation by imaging;

(d) be used to measure the interferometer measuration system of this wafer with respect to the position of the radiation of this imaging; And

(e) according to the method work of claim 1 to be identified in an identification marking subsystem of the alignment mark in this information-bearing district.

33, a kind of metrology system of in the covering precision of measuring the litho steeper on a wafer, manufacture an integrated circuit or scanner, using of being used for, this metrology system comprises:

(a) an amount meter control desk is used for measuring at first figure of the first information supporting region on first level of this integrated circuit and the relative position of the second graph in the second information-bearing district on second level at this integrated circuit;

(b) wafer processing process comprises this, is used to support this wafer; And

(c) microscopic system is used to watch these figures, this microscopic system according to the method work of claim 1 with the relative position of first figure and second graph relatively.

34, a kind ofly be used for measuring the metrology system for the treatment of the defective in the mask that manufacturing of integrated circuit used, this metrology system comprises:

(a) an amount meter control desk is used to support this mask;

(b) microscopic system is used for this mask of imaging and generates first numeral of the graphic feature of this mask, and this microscopic system carries out work according to claim 1;

(c) accumulator system is used to store accurate second numeral of the graphic feature of this mask; And

(d) processor is coupled to this accumulator system and this microscopic system, and first and second numerals that are used for this mask image relatively are to determine the defective of this mask.

35, according to the metrology system of claim 34, wherein this second numeral is represented the graphic feature of a desirable mask.

36, according to the metrology system of claim 34, wherein this second numeral comprises by operating the data that this microscopic system does not have a reference mask of defective to be obtained with imaging substantially.

37, a kind of system that is used to produce the image in an information-bearing district has the sensitivity to the motion of the object that comprises this information-bearing district of minimizing, and this system comprises:

(a) supporting structure of this object of support;

(b) microscopic system is used for this information-bearing district of imaging, and this microscopic system is according to the method work of claim 1,

Wherein one of this information-bearing district that is produced by this microscopic system predetermined one dimension or two-dimensional section is irrelevant with respect to the motion of this microscopic system with this object basically.

38,, wherein obtain a predetermined one dimension in this information-bearing district or all figure image points of two-dimensional section basically simultaneously according to the system of claim 37.

39, a kind of system, the image on an information-bearing surface that is used to produce the object with an outer surface is to control the spatial relationship between this system and this outer surface, and this system comprises:

(a) support a supporting structure of this object;

(b) microscopic system is used for the profile of this outer surface of imaging and the spatial relationship between definite this outer surface and this system, and this microscopic system is according to the method work of claim 1; And

(c) processor is controlled the position of this microscopic system with respect to this outer surface according to this spatial relationship of determining, contacts with the physics of this outer surface to prevent this microscopic system.

40, according to the system of claim 39, wherein this processor is controlled the position of this microscopic system on real-time basis.

41, according to the system of claim 40, wherein this processor work with keep this microscopic system at least with this outer surface at a distance of a predetermined distance.

42, the system that uses in a kind of integrated circuit on manufacturing a wafer, this system comprises:

(a) be used to support of this wafer;

(d) be used to measure this wafer with respect to by the interferometer measuration system of the position of the radiation of imaging; And

(e) according to the method work of claim 10 to discern an identification marking subsystem of the alignment mark in this information-bearing district.

43, a kind of metrology system of in the covering precision of measuring the litho steeper on a wafer, manufacture an integrated circuit or scanner, using of being used for, this metrology system comprises:

(b) wafer processing process comprises this, is used to support this wafer; And

(c) microscopic system is used to watch these figures, this microscopic system according to the method work of claim 10 with the relative position of first figure and second graph relatively.

44, a kind of metrology system of in defective in the mask that manufacturing of integrated circuit used is treated in measurement, using of being used for, this metrology system comprises:

(a) an amount meter control desk is used to support this mask;

(b) microscopic system is used for this mask of imaging and generates first numeral of the graphic feature of this mask, and this microscopic system carries out work according to claim 10;

45, according to the microscopic system of claim 44, wherein this second numeral comprises the data of the graphic feature of representing a desirable mask.

46, according to the microscopic system of claim 44, wherein this second numeral comprises by operating the data that this microscopic system does not have a reference mask of defective to be obtained with imaging substantially.

47, a kind of system that is used to produce the image in an information-bearing district has the sensitivity to the motion of the object that comprises this information-bearing district of minimizing, and this system comprises:

(a) supporting structure of this object of support;

(b) microscopic system is used for this information-bearing district of imaging, and this microscopic system is according to the method work of claim 10,

48,, wherein obtain a predetermined one dimension in this information-bearing district or all figure image points of two-dimensional section basically simultaneously according to the system of claim 47.

49, a kind of system, the image on an information-bearing surface that is used to produce the object with an outer surface is to control the spatial relationship between this system and this outer surface, and this system comprises:

(a) support a supporting structure of this object;

(b) microscopic system is used for the profile of this outer surface of imaging and the spatial relationship between definite this outer surface and this system, and this microscopic system is according to the method work of claim 10; And

50, according to the system of claim 49, wherein this processor is controlled the position of this microscopic system on real-time basis.

51, according to the system of claim 50, wherein this processor work with keep this microscopic system at least with this outer surface at a distance of a predetermined distance.

52, the system that uses in a kind of integrated circuit on manufacturing a wafer, this system comprises:

(a) be used to support of this wafer;

(e) according to the method work of claim 21 to discern an identification marking subsystem of the alignment mark in this information-bearing district.

53, a kind of metrology system of in the covering precision of measuring the litho steeper on a wafer, manufacture an integrated circuit or scanner, using of being used for, this metrology system comprises:

(b) wafer processing process comprises this, is used to support this wafer; And

(c) microscopic system is used to watch these figures, this microscopic system according to the method work of claim 21 with the relative position of first figure and second graph relatively.

54, a kind of metrology system of in defective in the mask that manufacturing of integrated circuit used is treated in measurement, using of being used for, this metrology system comprises:

(a) an amount meter control desk is used to support this mask;

(b) microscopic system is used for this mask of imaging and generates first numeral of the graphic feature of this mask, and this microscopic system carries out work according to claim 21;

55, according to the microscopic system of claim 54, wherein this second numeral comprises the data of the graphic feature of representing a desirable mask.

56, according to the microscopic system of claim 54, wherein this second numeral comprises by operating the data that this microscopic system does not have a reference mask of defective to be obtained with imaging substantially.

57, a kind of system that is used to produce the image in an information-bearing district has the sensitivity to the motion of the object that comprises this information-bearing district of minimizing, and this system comprises:

(a) supporting structure of this object of support;

(b) microscopic system is used for this information-bearing district of imaging, and this microscopic system is according to the method work of claim 21,

58,, wherein obtain a predetermined one dimension in this information-bearing district or all figure image points of two-dimensional section basically simultaneously according to the system of claim 57.

59, a kind of system, the image of an information sides that is used to produce the object with an outer surface is to control the spatial relationship between this system and this outer surface, and this system comprises:

(a) support a supporting structure of this object;

(b) microscopic system is used for the profile of this outer surface of imaging and the spatial relationship between definite this outer surface and this system, and this microscopic system is according to the method work of claim 21; And

60, according to the system of claim 59, wherein this processor is controlled the position of this microscopic system on real-time basis.

61, according to the system of claim 60, wherein this processor work with keep this microscopic system at least with this outer surface at a distance of a predetermined distance.