CN1326187C - CRT unit - Google Patents

Abstract

A second grid is supplied with a low potential acceleration voltage. A fourth grid and a sixth grid are supplied with a first focus voltage. A third grid and a seventh grid are supplied with a dynamic focus voltage (Vf2+Vd). A prefocus lens having a horizontal and vertical focusing function is formed between the second grid and the third grid. An asymmetrical lens section having a horizontal diverging function and a vertical focusing function is formed between the third grid and the fourth grid. The prefocus lens and the asymmetrical lens section are electrostatically coupled.

Description

Cathode ray tube device

The application be the applicant on January 9th, 2002 submit to, application number for " 02101827.8 ", denomination of invention divides an application for the application for a patent for invention of " cathode ray tube device ".

Technical field

The present invention relates to cathode ray tube device, the cathode ray tube device of the electron gum member that carries out the dynamic astigmatism compensation particularly is housed.

Background technology

General color cathode-ray tube apparatus has the deflecting coil of the magnetic deflection field of the I-shaped electron gun member of emission three-beam electron-beam and the three-beam electron-beam deflection that generation makes this electron gum member emission.This deflecting coil forms the non-uniform magnetic-field that is made of pillow type horizontal deflection magnetic field 10 shown in Fig. 9 A and barrel shape vertical deflection magnetic field.

Be subjected to the influence that deflection aberration is the astigmatism that comprises of magnetic deflection field by the electron beam in such non-uniform magnetic-field 6,, because deflection aberration, be subjected to vertical direction and cross and focus on such power 11V promptly towards the electron beam 6 of phosphor screen peripheral part.Therefore shown in Fig. 9 B, promptly the bundle spot of phosphor screen peripheral part produces distortion, makes to have the core 13 of expansion simultaneously in the horizontal direction by the halation 12 that has expansion in vertical direction.Cathode ray tube maximizes, and perhaps deflection angle is big more, and then the deflection aberration that is subjected to of electron beam is big more.Such bundle mura distortions significantly worsens the definition of phosphor screen peripheral part.

, there is the Japan Patent spy to open clear 61-99249 communique, spy and opens clear 61-250934 communique and specially open the electron gum member that flat 2-72546 communique discloses because the means that the definition that such deflection aberration causes worsens as solving.These electron gum members all are to have the 1st grid to the 5 grids and constitute shown in Figure 10 A basically, along the electron beam direction of advance, form electron beam generating part and divide GE, quadrupole lens QL and last main lens EL.Three nonaxisymmetrical electron beam through-holes respectively are set (for example shown in Figure 10 B and Figure 10 C by opposite face at adjacent separately electrode, the electron beam through-hole of growing crosswise is set on an electrode, the electron beam through-hole of lengthwise is set on another electrode), form quadrupole lens QL.

The lens strength that this electron gum member makes quadrupole lens QL and last main lens EL is along with the variation of magnetic deflection field changes synchronously.Alleviate the influence of the deflection aberration that the electron beam to the edge run-out of phosphor screen week is subjected to like this, with the distortion of corrective beam spot.

But in such electron gum member, when the phosphor screen week edge run-out, the influence of deflection aberration is very big with electron beam.Therefore, promptly allow to eliminate the halation of bundle spot, still can not proofread and correct fully but laterally flatten phenomenon.

In addition, as the other means that solve the definition deterioration that causes owing to such deflection aberration, the scheme of the electron gum member of the sort of dual quadrupole lens structure that proposition Japanese patent laid-open 3-93135 communique discloses.This electron gum member is shown in Figure 11 A and Figure 11 B, and two quadrupole lenss with opposed polarity of negative electrode one side formation at main lens make these two quadrupole lenss and magnetic deflection field generation effect synchronously.

Shown in Figure 11 A and Figure 11 B, in such electron gum member, when making electron beam focus on the phosphor screen core to be zero deflection (solid line among the figure) and when deflection being arranged when making electron beam (dotted line among the figure), make horizontal direction and vertical direction incidence angle approximately equal to phosphor screen 3 to the deflection of phosphor screen peripheral part.Like this shown in Figure 11 C, to proofread and correct horizontal flattening phenomenon at the phosphor screen peripheral part.

But, if introduce above-mentioned dual quadrupole lens structure, then along with the leading portion quadrupole lens that is positioned at negative electrode one side produces the generation effect because of magnetic deflection field, electron beam is focused in vertical direction, disperse in the horizontal direction simultaneously, thereby, be incident to the electron beam enlarged-diameter in the horizontal direction of main lens.

As a result, the part of electron beam by departing from the zone of main lens central shaft, will be subjected to the very big influence of main lens spherical aberration in the horizontal direction, and promptly the bundle spot at the phosphor screen peripheral part becomes the shape of horizontal direction with the halation part of expansion.

In order to eliminate the influence of the main lens spherical aberration in the horizontal direction that produces owing to such leading portion quadrupole lens, must produce at quadrupole lens and do the time spent, according to the aperture of lens of main lens, suppress the angle of divergence of electron beam, reach the degree that is not subjected to aberrations of lens influence.

Promptly when electron beam is focused on the phosphor screen peripheral part, set the electron beam horizontal direction angle of divergence that is incident to main lens, make it become the angle of divergence that is not subjected to the limit that main lens aberration component influences.In this case, originally the leading portion quadrupole lens with electron beam from the phosphor screen core during to peripheral part deflection, work towards the direction of the electron beam divergence angular divergence that makes horizontal direction.It is little when therefore, the electron beam horizontal direction angle of divergence ratio during zero deflection has deflection.Corresponding therewith, quadrupole lens is big during than deflection for the horizontal direction multiplying power of electron beam during zero deflection, its horizontal direction enlarged-diameter of the bundle spot of phosphor screen core.

In addition, when electron beam is focused on the phosphor screen core, set the electron beam horizontal direction angle of divergence that is incident to main lens, make it become the angle of divergence that is not subjected to the limit that main lens aberration component influences.In this case, the beam divergence angle of horizontal direction becomes greatly gradually during deflection, is subjected to the influence of main lens aberration component gradually, therefore, becomes in the horizontal direction shape with halation at the bundle spot of phosphor screen peripheral part.

Like this, if the angle of divergence of horizontal direction is subjected to the effect of leading portion quadrupole lens, then in arbitrary part of phosphor screen peripheral part and core, the horizontal direction diameter of bundle spot will enlarge.

In addition, there is the problem that dynamic focus voltage is risen in the formation of so dual quadrupole lens at main lens negative electrode one side configuration opposed polarity.This be because, if produce the quadrupole lens of two opposed polarities simultaneously, then its effect is moved back to negative electrode one rear flank from main lens with respect to the virtual object point position of main lens just as the lens that produce similar cylinder between these two quadrupole lenss.

In addition, in the formation of the different dual quadrupole lens of the so mutual polarity of configuration, the effect of two quadrupole lens generations is the feasible lensings of cancelling each other.Must strengthen the lens sensitivity of each quadrupole lens for this reason.For example shown in Figure 12 A and Figure 12 B,, can strengthen lens sensitivity by between the electrode that stretches out dividing plate along the setting of electron beam direction of advance, forming quadrupole lens.But such electrode structure owing to every reasons such as installation accuracies, is easy to generate error, can not produce stable effect.

Like this, the problem that produces is in the cathode ray tube device of structure in the past, can not proofread and correct the bundle mura distortions at the phosphor screen peripheral part fully, is difficult to obtain the good focusing characteristic in whole phosphor screen zone.

Summary of the invention

The present invention proposes in view of the above problems, and its technical problem that will solve provides the cathode ray tube device that can form excellent in shape bundle spot in whole phosphor screen zone.

The cathode ray tube device of the 1st aspect of the present invention, comprise electron gum member and deflecting coil, the electron beam that described electron gum member has the electron beam generating part branch that produces electron beam and this electron beam generating part branch is produced focuses on the main electron lens unit on the target, described deflecting coil produces and makes this electron gum member electrons emitted bundle reach the magnetic deflection field of vertical direction deflection in the horizontal direction, it is characterized in that, described electron gum member has a plurality of electrodes of the negative electrode that comprises the 1st lower level voltage of supply current potential that constitutes described electron beam generating part branch, supply is higher than at least one focusing electrode of the 2nd level focus voltage of described the 1st level, supply is at least one dynamic focus electrode of the dynamic focus voltage that obtains near the synchronous alternating current component that changes of stack on the reference voltage of described the 2nd level and described magnetic deflection field, supply is higher than at least one anode electrode of the 3rd level anode voltage of described the 2nd level, and the insulating supporting body of these a plurality of electrodes is fixed in supporting, divide adjacent configuration to supply with the 1st dynamic focus electrode of dynamic focus voltage with described electron beam generating part, the 1st focusing electrode with the 1st dynamic focus electrode disposed adjacent supply focus voltage, the peripheral part thickness ratio other parts of the electron beam through-hole that the electron beam that described electron beam generating part branch is produced of described the 1st dynamic focus electrode passes through are thin, described the 1st dynamic focus electrode from each electron beam through-hole between the embedded part that is fixed on described insulating supporting body, the pole strength intensifier that is formed by negative area or bossing is set.

Description of drawings

The cathode ray tube device that Figure 1 shows that the present invention's one example briefly constitutes horizontal cross.

The electron gum member that Figure 2 shows that the 1st example that cathode ray tube device shown in Figure 1 can be suitable for is briefly constructed vertical sectional view.

Figure 3 shows that the concise and to the point constructing stereo figure of the 2nd grid in the electron gum member shown in Figure 2.

Figure 4 shows that the concise and to the point constructing stereo figure of the 3rd grid in the electron gum member shown in Figure 2.

Figure 5 shows that the 4th grid in the electron gum member shown in Figure 2 and the concise and to the point constructing stereo figure of the electrode configuration of the 3rd grid opposite face.

Fig. 6 A in the explanation electron gum member shown in Figure 2 to the optical model of the horizontal direction lensing of electron beam effect, Fig. 6 B in the explanation electron gum member shown in Figure 2 to the optical model of the vertical direction lensing of electron beam effect.

Figure 7 shows that the concise and to the point vertical sectional view of other example of electron gum member that cathode ray tube device shown in Figure 1 can adopt.

Figure 8 shows that other concise and to the point constructing stereo figure of the 3rd grid in the electron gum member shown in Figure 2.

Fig. 9 A is depicted as pillow type horizontal deflection magnetic field that deflecting coil the produces situation to the electron beam effect, the bundle spot figure to the electron beam of phosphor screen peripheral part deflection shown in Fig. 9 B.

Figure 10 A is depicted as the concise and to the point pie graph of electron gum member in the past, and Figure 10 B and Figure 10 C are depicted as the shape that forms the electron beam through-hole that quadrupole lens uses in the past the electron gum member.

Figure 11 A is the optical model of horizontal direction lensing in the electron gum member of explanation dual quadrupole lens structure in the past, Figure 11 B is the optical model of explanation vertical direction lensing, and Figure 11 C be the comparison diagram of bundle spot of the electron gum member generation of the bundle spot that produces of electron gum member in the past and this example.

Figure 12 A and Figure 12 B are depicted as the structure of the lens sensitivity that strengthens quadrupole lens and give an example.

Figure 13 A and Figure 13 B are depicted as and proofread and correct one of electrode structure that limit bundle aberration uses example.

Figure 14 shows that the concise and to the point structure vertical cross section of the electron gum member of the 1st example variation from negative electrode to the 5 grids.

Figure 15 shows that the concise and to the point constructing stereo figure of the 3rd grid in the electron gum member shown in Figure 14.

Figure 16 shows that the concise and to the point structure vertical sectional view of the electron gum member of the 2nd example that cathode ray tube device shown in Figure 1 can be suitable for from negative electrode to the 5 grids.

Figure 17 shows that the concise and to the point constructing stereo figure of the 3rd grid in the electron gum member shown in Figure 16.

Figure 18 shows that the 4th grid in the electron gum member shown in Figure 16 and the concise and to the point constructing stereo figure of the electrode configuration of the 3rd grid opposite face.

Figure 19 shows that the concise and to the point structure vertical sectional view of other electron gum member of the 2nd example from negative electrode to the 5 grids.

Figure 20 shows that the concise and to the point constructing stereo figure of the 3rd grid in the electron gum member shown in Figure 19.

The concise and to the point structure vertical sectional view that is other electron gum member of the 2nd example from negative electrode to the 5 grids shown in Figure 21.

Shown in Figure 22 is the concise and to the point constructing stereo figure of the 3rd grid in the electron gum member shown in Figure 21.

Shown in Figure 23 is the concise and to the point constructing stereo figure of the 3rd grid in other electron gum member of the 2nd example.

The concise and to the point constructing stereo figure that is the electron gum member of the 2nd example variation from the 2nd grid to the 4 grids shown in Figure 24.

The concise and to the point constructing stereo figure that is the electron gum member of the 2nd example variation from the 2nd grid to the 4 grids shown in Figure 25.

Embodiment

The cathode ray tube device of the present invention's one example is described with reference to the accompanying drawings.

As shown in Figure 1, cathode ray tube device of the present invention for example color cathode-ray tube apparatus have vacuum envelope 9.This vacuum envelope 9 has glass screen 1 and this glass shields 1 sealing-in all-in-one-piece glass awl 2.Glass screen 1 have be configured in its inner surface by sending indigo plant, green, the strip of red light or the phosphor screen (target) 2 that point-like three fluorescence layer constitutes.Shadow mask 4 and phosphor screen 2 relative installations, side has a large amount of apertures within it.

I-shaped electron gun member 7 is arranged on neck 5 inside of the small-bore part that is equivalent to glass awl 2.This I-shaped electron gun member 7 is launched by being three-beam electron- beam 6B, 6G and the 6R that word order disposes by an opposite side bundle 6B of middle bundle 6G on the same plane and both sides thereof and the H in the horizontal direction that 6R constitutes along tube axial direction Z.In this I-shaped electron gun member 7, the limit bundle that the low-pressure side grid of formation main electron lens unit and high-pressure side grid form respectively is by the hole, and its center is off-centre (decenter) mutually.Like this, at the core of phosphor screen 3, three-beam electron-beam carries out auto-convergence.

Deflecting coil 8 is installed in from neck 5 to glass vacuum envelope 9 outsides between the heavy caliber part of awl 2.This deflecting coil 8 produces the non-homogeneous magnetic deflection field of the three-beam electron-beam 6B, the 6G that make electron gum member 7 emissions and 6R H and vertical direction V deflection in the horizontal direction.This non-homogeneous magnetic deflection field is formed by pillow type horizontal deflection magnetic field and barrel shape vertical deflection magnetic field.

Three-beam electron- beam 6B, 6G and the 6R of electron gum member 7 emissions, one side is carried out auto-convergence towards phosphor screen 3, one side focuses on fluorescence coating corresponding on the phosphor screen 3, this three-beam electron- beam 6B, 6G and 6R be because non-homogeneous magnetic deflection field effect and deflection, and H and vertical direction V scan in the horizontal direction to phosphor screen 3.By like this, color display.

The electron gum member 7 that this cathode ray tube device is suitable for, as shown in Figure 2, have negative electrode K, the 1st grid G the 1, the 2nd grid G the 2, the 3rd grid G 3 (the 1st dynamic focus electrode), the 4th grid G 4 (the 1st focusing electrode), the 5th grid G the 5, the 6th grid G 6 (the 2nd focusing electrode), the 7th grid G 7 (the 2nd dynamic focus electrode), the 8th grid G 8 (target), the 9th grid G 9 (anode electrode) and convergence cup-shape electrode C.Three negative electrode K are the in-line alignment arrangements in the horizontal direction.By this arranged in order, it is fixing to utilize insulating supporting body to support along the electron beam direction of advance from negative electrode K for the 1st to the 9th grid.

In addition, assemble cup-shape electrode C and utilize with 9 welding of the 9th grid G and fix, on this convergences cup-shape electrode C, set up four contact heads, be used for from the inner surface of glass awl 2 and the internal conductive film formation electric path of the inner surface covering formation of neck 5.

To three negative electrode K (R, G, B), add about voltage of about 100 to 200V, the 1st grid G 1 ground connection (or adding negative potential V1).The 2nd grid G 2 is connected in pipe with the 5th grid G 5, adds the accelerating voltage V2 of electronegative potential simultaneously from the cathode ray tube outside.This accelerating voltage V2 is about 500 to 800V.

The 3rd grid G 3 is connected in pipe with the 7th grid G 7, simultaneously from the outside dynamic focus voltage (Vf2+Vd) of supplying with of cathode ray tube.This dynamic focus voltage (Vf2+Vd) be with about about 6 to 8KV middle current potential the 2nd focus voltage Vf2 (about voltage of about 25% of anode voltage Eb described later) as reference voltage, the alternating current component Vd that changes synchronously of stack and magnetic deflection field and the voltage that forms again.

The 4th grid G 4 and the 6th grid G 6 are connected in pipe, simultaneously from the supply of cathode ray tube outside certain the 1st focus voltage Vf1 of current potential.The 1st focus voltage Vf1 and the 2nd focus voltage Vf2 approximately equal are about (about about 25% the voltage that is equivalent to anode voltage Eb described later) about 6 to 8KV.

The 9th grid G 9 and assemble cup-shape electrode C and be electrically connected, from the outside anode voltage Eb that supplies with of cathode ray tube, this anode voltage is 25 to 35KV.

Near electron gum member 7, as shown in Figure 2, have resistor R 1, an end of this resistor R 1 is connected with the 9th grid G 9, and the other end is by managing outer variable resistance VR near (also can not pass through the direct ground connection of variable resistance).Resistor R 1 has the feeder ear R1-1 that the grid service voltage of electron gum member 7 is used at its mid portion roughly.

The 8th grid G 8 is connected with feeder ear R1-1 on the resistor R 1.With the anode voltage Eb voltage of electric resistance partial pressure in addition, for example about voltage of about 65% of anode voltage Eb is supplied with the 8th grid G 8 by feeder ear R1-1.

(the 1st example)

The 1st grid G 1 is lamellar electrode, the 1st grid G 1 is corresponding with three negative electrode K that horizontal direction is the word order configuration, three electron beam through-holes that have the small-bore on its plate face (circular port of diameter about 0.30 to 0.40mm for example perhaps also can be the lengthwise or the rectangular opening of growing crosswise).

The 2nd grid G 2 is a plate electrode as shown in Figure 3.The 2nd grid G 2 is corresponding with three negative electrode K, has bigger three electron beam through-holes (for example circular port of diameter about 0.35 to the 0.45mm) G2-H in aperture that forms than the 1st grid G 1 on its plate face.The ratio of the electron beam through-hole of the 1st grid G 1 footpath G1 and the electron beam through-hole footpath G2 of the 2nd grid G 2 generally is set at 70%≤G1/G2≤100%, according to circumstances can select 75% neighbouring or 90% near.In addition, the 2nd grid G 2 with the opposite face of the 3rd grid G 3, correspondingly with each electron beam through-hole G2-H be formed on the strip slot G2-S that horizontal direction has major axis.This groove G2-S is such formation, and its short-axis direction diameter is the aperture approximately equal of vertical direction diameter and electron beam through-hole G2-H or big a little.In addition, in this example, the 2nd grid G 2 is to have circular electron beam through-hole G2-H and have strip slot G2-S at the opposite face with the 3rd grid G 3, but not necessarily is limited to this structure.Promptly the 2nd grid G 2 also can be omitted groove G2-S, only has electron beam through-hole G2-H and constitutes.

G3 as shown in Figure 4, the 3rd grid is lamellar electrode.For example thickness of slab t is 0.2 to 1mm.The 3rd grid G 3 is corresponding with three negative electrode K, has three the bigger again electron beam through-hole G3-H of aperture that form than the 2nd grid G 2 on its plate face.For example electron beam through-hole G3-H is a circular port, and its diameter A is about 0.5 to 1.5mm.

The 4th grid G 4 is to utilize at tube axial direction Z to dock and form than the openend of two long cup-shape electrodes.As shown in Figure 5, the cup-shape electrode G4 relative with the 3rd grid G 3 is corresponding with three negative electrode K at its end face, has three electron beam through-holes (for example the vertical direction aperture is about 0.5 to 1.5mm, and the horizontal direction aperture is about 2.0 to 4.1mm the hole of growing crosswise) G4-H.

These electron beam through-holes G4-H be the short-axis direction aperture be the electron beam through-hole G3-H of vertical direction aperture and the 3rd grid G 3 aperture A approximately equal (or littler), horizontal direction than it to the aperture greater than electron beam can via hole G3-H the shape of growing crosswise of aperture A.In addition, the end face of the cup-shape electrode relative with the 5th grid G 5, corresponding with three negative electrode K, have wide-aperture three electron beam through-holes (for example circular port of diameter about 3.0 to 4.1mm).

The 5th grid G 5 is to utilize at tube axial direction Z to dock and form than the openend of two long cup-shape electrodes.The end face of the cup-shape electrode relative with the 4th grid G 4, corresponding with three negative electrode K, have wide-aperture three electron beam through-holes (for example circular port of diameter about 3.0 to 4.1mm).In addition, the end face of the cup-shape electrode relative with the 6th grid G 6, corresponding with three negative electrode K, have wide-aperture three electron beam through-holes (for example circular port of diameter about 3.0 to 4.1mm).

The 6th grid G 6 is to utilize at tube axial direction Z long three cup-shape electrodes and a utmost point shape electrode to constitute.Two cup-shape electrodes of the 5th grid G 5 one sides dock openend separately, and two cup-shape electrodes of other the 7th grid G 7 one sides dock end face separately, and the cup-shape electrode openend of the 7th grid G 7 one sides docks with lamellar electrode then.

The end face of three cup-shape electrodes, corresponding with three negative electrode K, have wide-aperture three electron beam through-holes (for example circular port of diameter 3.0 to 4.1mm).The plate electrode relative with the 7th grid G 7, corresponding with three negative electrode K, at three electron beam through-holes of elongate shape (for example vertical slot hole about horizontal direction aperture/vertical direction aperture=4.0mm/4.5mm) that have the vertical direction elongation on its plate face.

The 7th grid G 7 is to utilize short two cup-shape electrodes and two plate electrodes of length of tube axial direction Z to constitute, two cup-shape electrodes of the 6th grid G 6 one sides dock openend separately, the end face of the cup-shape electrode of other the 8th grid G 8 one sides docks with lamellar electrode, and this lamellar electrode docks with the thick plate-like electrode.

The end face of the cup-shape electrode relative with the 6th grid G 6, corresponding with three negative electrode K, have three electron beam through-holes of growing crosswise (horizontal direction aperture/vertical direction aperture=4 for example of horizontal direction H elongation.52mm/3.0mm about the hole of growing crosswise).The end face of the cup-shape electrode of the 8th grid G 8 one sides, corresponding with three negative electrode K, have wide-aperture three electron beam through-holes (for example circular port about diameter 4.3mm).

Lamellar electrode is on its plate face, and is corresponding with three negative electrode K, has three electron beam through-holes in the large aperture of growing crosswise (for example hole of growing crosswise about horizontal direction aperture/vertical direction aperture=4.34mm/3.0mm) of horizontal direction H elongation.The thick plate-like electrode relative with the 8th grid G 8 is on its plate face, and be corresponding with three negative electrode K, has wide-aperture three electron beam through-holes (for example circular port about diameter 4.34mm).

The 8th grid G 8 is that the thick plate-like electrode about utilizing electrode length along the electron beam direction of advance for 2.0mm constitutes, this plate electrode is on its plate face, corresponding with three negative electrode K, have three wide-aperture electron beam through-holes (for example circular port about diameter 4.40mm).

The 9th grid G 9 is to utilize two plate electrodes and two cup-shape electrodes to constitute.The thick plate-like electrode relative with the 8th grid G 8 docks with lamellar electrode, and lamellar in addition electrode docks with the end face of cup-shape electrode, the openend butt joint that two cup-shape electrodes will be separately.

The thick plate-like electrode relative with the 8th grid G 8, its electrode length along the electron beam direction of advance is about 0.6mm to 1.5mm, corresponding with three negative electrode K on its plate face, have wide-aperture three electron beam through-holes (for example circular port about diameter 4.46mm).Lamellar electrode is on its plate face, and is corresponding with three negative electrode K, has three electron beam through-holes in the large aperture of growing crosswise (for example hole of growing crosswise about horizontal direction aperture/vertical direction aperture=4.46mm/3.2mm) of horizontal direction H elongation.The end face of two cup-shape electrodes, corresponding with three negative electrode K, have wide-aperture three electron beam through-holes (for example circular port of diameter about 4.46 to 4.52mm).

The end face of assembling cup-shape electrode C docks with the end face of the cup-shape electrode of the 9th grid G 9.The end face of assembling cup-shape electrode C has wide-aperture three electron beam through-holes (for example circular port of diameter about 4.46 to 4.52).

In such electron gum member, from each electrode of the 1st grid G 1 to the 6th grid G 6, wherein the distance between borehole between the center of the electron beam through-hole that passes through of the center of the electron beam through-hole that passes through of bundle and limit bundle for example is 4.92mm.The 7th grid G 7 and electrodes the 8th grid G 8 opposite faces, its distance between borehole for example is 4.72mm, the distance between borehole of the 8th grid G8 for example is 4.80mm.The 9th grid G 9 and electrodes the 8th grid G 8 opposite faces, its distance between borehole for example is 4.88mm.

In addition, the electrode gap of the electrode gap of the 6th grid G 6 and the 7th grid G 7, the 7th grid G 7 and the 8th grid G 8, and the electrode gap of the 8th grid G 8 and the 9th grid G 9 are set at respectively about about 0.6mm.

In the electron gum member 7 of above-mentioned formation, the electron beam generating part branch is made of negative electrode K, the 1st grid G 1 and the 2nd grid G 2.This electron beam generating part divides towards fluorescence emission electron beam, and prefocus lens (the 1st electron lens unit) Prel is made of the 2nd grid G 2 and the 3rd grid G 3.This prefocus lens Prel divides the electron beam that produces to carry out prefocus electron beam generating part.

The 1st quadrupole lens (the 1st non-axial symmetrical lens) QL1 forms between the 3rd grid G 3 and the 4th grid G 4.The 1st quadrupole lens QL1, when electron beam being focused on the phosphor screen core and be zero deflection, the potential difference between the 3rd grid G 3 and the 4th grid G 4 is approximately zero, and perhaps the voltage of the 3rd grid G 3 is set at the voltage that is lower than the 4th grid G 4.Therefore, produce lensing hardly, perhaps lensing is set at and has focussing force in the horizontal direction, has disperse function in vertical direction.

Along with making electron beam, the 3rd grid G 3 is added the dynamic focus voltage (Vf2+Vd) that increases with electron-beam deflection amount towards the deflection of phosphor screen peripheral part.Therefore, the lensing of the 1st quadrupole lens QL1 increases with electron-beam deflection amount and changes, and makes and plays disperse function in the horizontal direction relatively, plays focussing force relatively in vertical direction.

Secondary lens are formed by the 4th grid G the 4, the 5th grid G 5 and the 6th grid G 6.These pair lens carry out prefocus again with prefocusing electron beam.These pair lens are the 5th grid G 5 of the voltage that relatively low current potential is supplied with in configuration between the 4th grid G 4 of supplying with focus voltage and the 6th grid G 6 and the unipotential type electron lens of formation.

The main electron lens unit is formed by the 6th grid G the 6, the 7th grid G the 7, the 8th grid G 8 and the 9th grid G 9.This main electron lens unit will utilize the prefocusing electron beam of secondary lens to focus on the phosphor screen at last.This main electron lens unit has the 2nd quadrupole lens (the 2nd non-axial symmetrical lens) QL2 that forms and main lens part (the 2nd electron lens unit) ML that is formed by the 7th grid G 7 to the 9th grid G 9 between the 6th grid G 6 and the 7th grid G 7.

The 2nd quadrupole lens (the 2nd non-axial symmetrical lens) QL2, when zero deflection, the potential difference between the 6th grid G 6 and the 7th grid G 7 is approximately zero, and perhaps the voltage of the 7th grid G 7 is set at the voltage that is lower than the 6th grid G 6.Therefore, produce lensing hardly, perhaps lensing is set at and has disperse function in the horizontal direction, has focussing force in vertical direction.At this moment, the 7th grid G 7 is added the dynamic focus voltage (Vf2+Vd) that increases with electron-beam deflection amount.Therefore, the lensing of the 2nd quadrupole lens QL2 increases with electron-beam deflection amount and changes, and makes its lens strength play focussing force in the horizontal direction relatively, plays disperse function relatively in vertical direction.

It all is to have roughly the same focussing force that main lens part ML reaches vertical direction relatively in the horizontal direction.This main lens part ML changes along with the increase of electron-beam deflection amount, and its lens strength is died down.

Shown in Fig. 6 A and Fig. 6 B, in the electron gum member of above-mentioned formation, with electron beam generating part branch (negative electrode K-the 2nd grid G 2) disposed adjacent pre-polymerization lens (the 2nd grid G 2-the 3rd grid G 3) Prel, again with this prefocus lens Prel disposed adjacent the 1st quadrupole lens (the 3rd grid G 3-the 4th grid G 4) QL1.These prefocus lenss Prel and the 1st quadrupole lens QL1 because the thickness of slab of the 3rd grid G 3 is extremely thin, therefore constitute Electrostatic Coupling.

In addition, in Fig. 6 A and Fig. 6 B, the optical model the when optical model when solid line is represented electron beam focused on the phosphor screen core and be zero deflection, dotted line are represented electron beam focused on the phosphor screen peripheral part and promptly deflection is arranged.Prel is a prefocus lens, and QL1 is the 1st quadrupole lens, and QL2 is the 2nd quadrupole lens, and ML is the main lens part, and DYL is the deflection aberration component that magnetic deflection field comprises.

Promptly constitute the 3rd grid G 3 of prefocus lens Prel and the 1st quadrupole lens QL1 simultaneously, having along the electrode length of this electron beam direction of advance (tube axial direction Z) is electrode thickness of slab t and during from the aperture A of the electron beam through-hole G3-H of the 3rd grid G 3 of the 2nd grid G 2 one sides, if establishing the 3rd grid G 3 of formation the 1st quadrupole lens QL1 and the interelectrode distance between the 4th grid G 4 is L, then its formation satisfies the following formula relation.

(A-t)≥(L/2)

Promptly in such formation, the center (L/2) of the 1st quadrupole lens QL1 that forms between the 3rd grid G 3 and the 4th grid G 4 is present in because in the electric field region (A-t) of the electron beam through-hole infiltration of passing through the 3rd grid G 3 that the prefocus Prel that bigger potential difference forms between the 2nd grid G 2 and the 3rd grid G 3 is produced.

According to such formation, when dynamic focus voltage is added on the 3rd grid G 3, can suppress the excessive rising of dynamic focus voltage.

Promptly utilize the 1st electron lens (prefocus lens) that the 2nd grid G 2 and the 3rd grid G 3 form, that when adding dynamic focus voltage, produce focussing force respectively partly (Prel), and between the 1st non-axial symmetrical lens (QL1) that forms between the 3rd grid G 3 and the 4th grid G 4, produce the Electrostatic Coupling effect in horizontal/.Therefore, the effect of the 1st non-axial symmetrical lens (QL1) is that a part as the 1st electron lens unit (Prel) reaches the effect that makes its change in polarity degree.Thereby, do the time spent at dual quadrupole lens in the past, owing to producing the phenomenon that causes virtual object point position to be moved back to negative electrode one rear flank again in the space that does not have whatever, the 1st quadrupole lens also can produce, do not cause the rising of dynamic focus voltage yet.

In addition, by dividing adjacent configuration with the prefocus lens Prel and the electron beam generating part of the 1st quadrupole lens QL1 Electrostatic Coupling, the opening bore that constitutes the electrode group (cup-shape electrode of the 3rd grid one side of the 3rd grid G 3 and the 4th grid G 4) of the 1st quadrupole lens QL1 can be contracted to till the degree that electron beam do not collide the sensitivity that can improve the 1st quadrupole lens QL1.

Therefore do not need the dividing plate that stretches out in the setting of electron beam direction of advance the structure of picture dual quadrupole lens in the past, can avoid the problem of the error generation on the precision.

Have again, make the electron beam through-hole of the 3rd grid G 3 approximate identical in the aperture of short-axis direction with the electron beam through-hole of the cup-shape electrode that is configured in the 3rd grid G 3 one sides of the 4th grid G 4.Therefore, when the lensing of the 1st quadrupole lens QL1 and deflection magnetic-synchro change, the resultant lens effect of prefocus lens Prel and the 1st quadrupole lens QL1, in vertical direction is to play focussing force along with the increase of electron-beam deflection amount, be irrelevant in the horizontal direction with the electron beam deflecting, compare with the lensing of vertical direction, only have indeclinable in fact lensing.

This be because, shown in Fig. 6 A and Fig. 6 B, shown in dotted line when deflection in the horizontal direction, increase along with electron-beam deflection amount, the focussing force of prefocus lens Prel strengthens, be created in the 1st quadrupole lens QL1 that horizontal direction has disperse function simultaneously, to offset the focussing force of this enhancing.

In addition, shown in dotted line during when deflection in vertical direction, along with the increase of electron-beam deflection amount, the focussing force of prefocus lens Prel strengthens, and is created in the 1st quadrupole lens QL1 that vertical direction has focussing force simultaneously.Therefore, the focussing force intensity of the prefocus lens Prel that forms when the vertical direction zero deflection is because the focussing force of the 1st quadrupole lens QL1 and further strengthening during deflection.

As mentioned above, according to this 1st example, when adding dynamic focus voltage, owing in fact the horizontal direction angle of divergence is not changed, and only focus in vertical direction, so the angle of divergence enlarges before can suppressing to be incident to main lens part ML.So electron beam is not subjected to the influence of the lens aberration of main lens part ML generation, can in whole phosphor screen zone, form the bundle spot of excellent in shape.

The invention is not restricted to above-mentioned the 1st example.

(variation 1)

For example in the 1st example, be electrode of configuration in the main electron lens unit, but also can be more than two by the resistor service voltage.The aberration of area of beam, at this moment incidental limit distortion triangular in shape can compensate by phosphor screen one side that the thin plate electrode with triangle electron beam through-hole shown in Figure 13 A and Figure 13 B is configured in the slab electrode in the last accelerating electrode as everyone knows.

(variation 2)

In the example, the 3rd grid G 3 is to have circular electron beam shown in Figure 4 to constitute by hole G3-H, but is not limited to this structure on above-mentioned.Promptly also can be as shown in Figure 8, the 3rd grid G 3 has circular electron beam by have the lengthwise strip groove G3-S of major axis around the G3-H of hole in vertical direction.Like this, can further improve the lens sensitivity of the 1st quadrupole lens QL1 that between the 3rd grid G 3 and the 4th grid G 4, forms.

(variation 3)

In above-mentioned the 1st example, the 8th grid G 8 of the Ran's resistor service voltage in the grid of formation main electron lens unit is to have circular electron beam to constitute by the hole, but is not limited to this example.

Promptly also can be as shown in Figure 7, utilize to supply with dynamic focus voltage (Vf+Vd) the 7th grid (the 2nd dynamic focus electrode) G7, supply with the 9th grid (anode electrode) G9 of anode voltage Eb and one the 8th grid (target) G8 that disposes forms between them, with dynamic focus electrode G7 and opposite face target G8, target G8 and opposite face dynamic focus electrode G7 and anode electrode G9 and anode electrode G9 and opposite face target G8 as the public electron beam through-hole of three-beam electron-beam.Adopt such structure also can access and the same action effect of above-mentioned the 1st example.

(variation 4)

The electron gum member that above-mentioned the 1st example adopts be with diameter be that (the long difference of size is ± model machine that 0.7mm) neck sealing-in is used to 22.5mm, set the electrode opening bore less, but be not limited to this, be electron gum member about electrode opening bore in the neck of 29.1mm equidimension is 5.5 to 6.2mm at diameter for example for adopting sealing-in, perhaps, also can adopt the present invention for other electron gum member.

(variation 5)

In above-mentioned the 1st example, the 1st dynamic focus electrode (the 3rd grid) constitutes with plate electrode, but is not limited to this.For example shown in Fig. 14, the 1st dynamic focus electrode G3 also can be with thickness of slab constituting than thin cup-shape electrode G3a and plate electrode G3b.In addition, the 1st dynamic focus electrode G3 also can be with the thickness of slab thin combination of a plurality of cup-shape electrodes or constituting of a plurality of plate electrodes.

For example, the 1st dynamic focus electrode G3 divides the cup-shape electrode G3a of a side and the plate electrode G3b that is configured in the 1st focusing electrode G4 one side to constitute by being configured in electron beam generating part as shown in figure 15, and cup-shape electrode G3a has the electron beam through-hole G3a-H of sub-circular.Plate electrode G3b has the electron beam through-hole G3b-H that the elongate shape of major axis is arranged in vertical direction.

Owing to adopt such formation, therefore can improve the lens sensitivity of the 1st quadrupole lens QL1 that between the 3rd grid G 3 and the 4th grid G 4, forms.Certainly, being configured in the electron beam through-hole G3b-H of the plate electrode G3b of the 1st focusing electrode G4 one side, being not limited to elongate shape, also can be the electron beam through-hole of wide-aperture sub-circular.

Like this, constitute the 3rd grid G 3 with a plurality of combination of electrodes, the pre-lance focus lens PreL that forms between the 2nd grid G 2 and the 3rd grid G 3 also has from the electron beam through-hole G3a-H of the cup-shape electrode G3a electron lens zone to the infiltration of the 4th grid G 4 one sides.This electron lens zone utilizes the electric field formation of only permeating electron beam through-hole footpath A from electron beam through-hole G3a-H.The 1st quadrupole lens QL1 that forms between the 3rd grid G 3 and the 4th grid G 4 is formed on the electron lens zone of prefocus lens PreL to the infiltration of the 4th grid G 4 one sides.Be prefocus lens PreL and the 1st quadrupole lens QL1 Electrostatic Coupling, therefore, can access and the same effect of above-mentioned the 1st example.

As mentioned above,, can be provided at whole phosphor screen zone and can obtain the well focussed characteristic, can form the cathode ray tube device of excellent in shape bundle spot according to the 1st example and each variation.

(the 2nd example)

In this 2nd example, explanation can be applicable to the structure of the electron gum member of above-mentioned cathode ray tube device.In addition, electron gum member such as essential structure and the added voltage of each grid are identical with above-mentioned the 1st example, and the Therefore, omited describes in detail.

The formation of the 2nd example is to strengthen the 3rd thin grid of thickness of slab that adopts in the 1st example.

Promptly in electron gum member, when practical function, may produce following problem with above-mentioned dynamic focus electrode that adds dynamic focus voltage.When promptly adding dynamic focus voltage, because the variation of the Coulomb force that produces between dynamic focus electrode and its approaching electrode may produce abnormal sound.The reason of this abnormal sound is owing to dynamic focus electrode is adjacent the mechanical oscillation that coulomb (coulomb) power of electrode produces, and the confining force of the maintenance electrode that the insulating supporting body of each electrode produces and the mechanical strength of electrode itself etc. are fixed in supporting will influence this abnormal sound.In addition, as the dynamic focus electrode of this vibration source and narrow more, be that the interval of heated filament is narrow more perhaps with the thermal source of negative electrode as the interval between the stem stem of feeder ear, then the influence that abnormal sound is produced is big more.

In order to improve this situation, must adopt as far as possible dynamic focus electrode away from stem stem or heated filament configuration, reinforced insulation supporting mass supporting force dynamic focus electrode and adjacent electrode thereof, and measure such as intensifier electrode mechanical strength.

On the other hand, as above-mentioned the 1st example, near the thickness of slab the electron beam through-hole that dynamic focus electrode forms is preferably thinner.Promptly, can strengthen the Electrostatic Coupling between the electron lens that before and after dynamic focus electrode, forms by the thickness of slab of attenuate dynamic focus electrode.Therefore, bundle mura distortions can be effectively improved, the rising of dynamic focus voltage can be effectively suppressed in addition at the phosphor screen peripheral part.But,, then be easy to generate the problem of aforementioned abnormal sound as if the thickness of slab of attenuate dynamic focus electrode.

Like this, if the thickness of slab attenuate of dynamic focus electrode then effectively improves the bundle mura distortions at the phosphor screen peripheral part, and effectively suppress the rising of dynamic focus voltage, but conversely, be easy to generate the problem of abnormal sound.In addition,, then be difficult for producing the problem of abnormal sound, but the problem that produces conversely is to rise in generation distortion of phosphor screen periphery beam splitting spot and dynamic focus voltage if the thickness of slab of dynamic focus electrode thickens.

Therefore, in the 2nd example, as shown in figure 16, conduct the 1st dynamic focus electrode that strengthens near stem stem and heated filament configuration is the mechanical strength of the 3rd grid G 3.Be negative electrode K and the 1st grid G 1 to the 5th grid G 5, as shown in figure 16, remain on the insulating supporting body 21.In addition, in the 2nd example, the part of the 5th grid G 5, the 6th grid G 6 to the 9th grid G 9 and the explanation omission of assembling cup-shape electrode C.

The 1st grid G 1 and the 2nd grid G 2 have and the same structure of above-mentioned the 1st example.

The 4th grid G 4 is utilized the openend butt joint formation of two long cup-shape electrodes at tube axial direction Z, as shown in figure 18, the cup-shape electrode G4-A relative with the 3rd grid G 3, corresponding at its end face with three negative electrode K, have three grow crosswise electron beam through-holes (for example vertical direction aperture be about 0.5 to 1.5mm, horizontal direction aperture be about 2.0 to 4.1mm the grow crosswise hole) G4-H of horizontal direction aperture greater than the vertical direction aperture.

These electron beam through-holes G4-H is the approximate photograph album (perhaps little than it) of the electron beam through-hole G3-H of its vertical direction aperture and the 3rd grid G 3, the horizontal direction aperture shape of growing crosswise greater than the electron beam through-hole of the 3rd grid G 3.In addition, the cup-shape electrode G4-B relative with the 5th grid G 5, corresponding at its end face with three negative electrode K, have wide-aperture three circular electron beams by hole (for example circular port of diameter 3.0 to 4.1mm left side stones).

The 3rd grid G 3 has Figure 16 and shape shown in Figure 17.Promptly to be concentric circles outstanding to constituting the 2nd grid G 2 one sides that electron beam produces part for the peripheral part of the electron beam through-hole G3-H of the 3rd grid G 3.Electron beam through-hole G3-H is being equivalent to from the circular portion approximate center formation of the lower part of the 4th grid G 4 one sides.

The thickness of slab T0 of electron beam through-hole G3-H periphery for example will approach from electron beam through-hole G3-H to the part thickness of slab T1 between the embedded part G3-L that is fixed on insulating supporting body 21 than a little away from the other parts of electron beam through-hole G3-H.Conversely in other words, the 3rd grid G 3 of formation is thicker than near the thickness of slab T0 the electron beam through-hole G3-H.For example, the 3rd grid G 3 is strengthening part from electron beam through-hole G3-H to having pole strength between the embedded part G3-L, promptly forms the side-prominent concentric circles thickness of slab part G3-T to the 3rd canopy utmost point G2 one along the marginal portion of electron beam through-hole G3-H.The 3rd grid G 3 therefore can enhance mechanical strength owing to having such structure.

Thereby, even when the 3rd grid G 3 added dynamic focus voltage (Vf2+Vd), also mechanical oscillation enough to suppress the 3rd grid G 3 and to cause owing to the Coulomb force between the electrode before and after its.Like this, by suppressing the vibration of vibration source, can prevent to produce abnormal sound from electron gum member.

In addition, by near the thickness of slab T0 of attenuate the 3rd grid G 3 electron beam through-hole G3-H, can strengthen the Electrostatic Coupling of the 1st non-axial symmetrical lens QL1 that between the 1st electron lens PreL that forms between the 2nd grid G 2 and the 3rd grid G 3 and the 3rd grid G 3 and the 4th grid G 4, forms.Thereby as mentioned above, the lensing of the 1st electron lens PreL and the 1st non-axial symmetrical lens QL1 can be constituted just as a lensing.In addition, can suppress because internal field's distortion that the barrier between the 1st electron lens PreL and the 1st non-axial symmetrical lens QL1 is the 3rd grid G 3 to be caused.

As mentioned above, according to this 2nd example, the thickness of slab of other parts of this electrode of thickness ratio of each the electron beam through-hole peripheral part that is equivalent to the 1st dynamic focus electrode to be approached.By the 1st dynamic focus electrode is added dynamic focus voltage, divide between the 1st dynamic focus electrode adjacent at electron beam generating part with it, be formed on that horizontal direction and vertical direction have focussing force respectively with 1 electron lens unit.In addition, between the 1st dynamic focus electrode and the 1st focusing electrode, form the 1st non-axial symmetrical lens unit simultaneously.By the thickness of slab of attenuate the 1st dynamic focus electrode, strengthen two the adjacent electron lenses that utilize the 1st dynamic focus electrode to form, i.e. the Electrostatic Coupling of the 1st electron lens unit and the 1st non-axial symmetrical lens unit at the electron beam through-hole peripheral part.Like this, bundle spot elliptical distortion can be effectively improved, the rising of dynamic focus voltage can be effectively suppressed simultaneously at the phosphor screen peripheral part.

Meanwhile, according to this cathode ray tube device, increase each electron beam through-hole peripheral part thickness of slab in addition that the 1st dynamic focus electrode forms.Therefore, even the 1st dynamic focus electrode adds the parabolic voltage (alternating current component) of dynamic focus voltage, also can suppress mechanical oscillation with the 1st dynamic focusing people utmost point that causes near the variation of the Coulomb force of the approaching electrode of the 1st dynamic focus electrode.In addition, by each electron beam through-hole peripheral part of the 1st dynamic focus electrode or be fixed on the embedded part of insulating supporting body and electron beam through-hole between be provided with by the lower part or play the pole strength enhancing part that part forms, can suppress the mechanical oscillation of the 1st dynamic focus electrode.Can effectively suppress abnormal sound like this takes place.

The invention is not restricted to above-mentioned the 2nd example.

(variation 1)

For example the 3rd grid (the 1st dynamically poly-attitude electrode) G3 also can be Figure 19 and structure shown in Figure 20.Promptly the position along the electron beam through-hole G3-H of tube axial direction Z of the 3rd grid G 3 is in fact consistent with the position of embedded part G3-L.

The thickness of slab T0 ratio of electron beam through-hole G3-H periphery is a little away from the other parts of electron beam through-hole G3-H, for example thin to the part thickness of slab T2 between the embedded part G3-L by G3-H from electron beam.Conversely in other words, the 3rd grid G 3 of formation is thicker than near the thickness of slab T0 the electron beam through-hole G3-H.

Promptly the 3rd grid G 3 is strengthening part from electron beam through-hole G3-H to having pole strength between the embedded part G3-L, i.e. the concentric circles thickness of slab part G3-T that forms along the marginal portion of electron beam through-hole G3-H.In addition, the 3rd grid G 3 has formation at the peripheral part of thickness of slab part G3-T and strengthens part to the 4th grid (the 1st focusing electrode) G4 one side-prominent concentric circles part (seeing it is the concentric circles lower part from the 2nd grid G 2 one sides) G3-P as pole strength.Electron beam through-hole G3-H forms in the circular portion approximate center of the lower part that is equivalent to people's the 4th grid G 4 one sides.The 3rd grid G 3 is owing to have the structure of sample, thickness of slab that therefore can attenuate electron beam through-hole G3-H periphery, enhance mechanical strength simultaneously.

In addition, the summit of playing part G3-P disposes near the 4th grid (the 1st focusing electrode) G4, like this, the Coulomb force of effect between the 3rd grid utmost point G3 and the 4th grid G 4, mainly be in the summit of playing part G3-P of the 3rd grid G 3 and the interaction between the 4th grid G 4, in contrast, the centre of lower fulcrum (skewer is gone into the embedded part G3-L of insulating supporting body 2 1) can but dispose away from the 4th grid G 4 to the 3rd grid G 3 as the vibrative electron beam through-hole G3-H of stress point in vertical direction.In variation, can be suppressed at the mechanical oscillation that when the 3rd grid G 3 added dynamic focus voltage because Coulomb force produces especially.

Thereby, identical with above-mentioned the 2nd example, can effectively change the bundle spot elliptical distortion that produces at the phosphor screen peripheral part, can effectively suppress the rising of dynamic focus voltage simultaneously, can also effectively suppress abnormal sound and take place.

(variation 2)

In addition, for example the 3rd grid (the 1st dynamic focus electrode) G3 also can be Figure 21 and structure shown in Figure 22.It is outstanding to be that the peripheral part of the electron beam through-hole G3-H of payment for an article or book written 3 grid G 3 is concentric circles to the 4th grid G 4 one sides.Electron beam is being equivalent to from the circular portion approximate center formation of the lower part of the 2nd grid G 2 one sides by G3-H.

The thickness of slab T0 of electron beam through-hole G3-H periphery for example will approach from electron beam through-hole G3-H to the part thickness of slab T3 between the embedded part G3-L than a little away from the other parts of electron beam through-hole G3-H.Conversely in other words, the 3rd grid G 3 of formation is thicker by near the thickness of slab T0 the G3-H than electron beam.For example, the 3rd grid G 3 is strengthening part from electron beam through-hole G3-H to having pole strength between the embedded part G3-L, promptly forms along the marginal portion of electron beam through-hole G3-H to the side-prominent concentric circles thickness of slab part G3-T of the 4th grid G 4 one.The 3rd grid G 3 is owing to have such structure, thickness of slab that therefore can attenuate electron beam through-hole G3-H periphery, enhance mechanical strength simultaneously.

In addition, according to such formation, the electron beam through-hole G3-H that can make the 3rd grid G 3 is near the 4th grid G 4.Therefore, can more strengthen the lensing of the 1st non-axial symmetrical lens QL1 that between the 3rd grid G 3 and the 4th grid G 4, forms.Meanwhile, can increase interval between the embedded part G4-L of the embedded part G3-L of the 3rd grid G 3 and the 4th grid G 4.Therefore, can improve voltage endurance.

Thereby, identical with above-mentioned the 2nd example, can effectively change the bundle spot elliptical distortion that produces at the phosphor screen peripheral part, can effectively suppress the rising of dynamic focus voltage simultaneously, can also effectively suppress abnormal sound and take place.

(variation 3)

In above-mentioned the 2nd example, constitute in the grid of main electron lens unit, the grid of giving voltage by resistor i.e. the 8th grid G 8 has circular electron beam and constitutes by the hole, but be not limited to this, promptly identical with above-mentioned the 1st example, adopt structure shown in Figure 7, also can access same action effect.

(variation 4)

In above-mentioned the 2nd example, the electron beam through-hole G3-H that the 3rd grid G 3 forms is a simple circular hole shape shown in Figure 17, but can be with the structure of circular hole opening portion G3-A as shown in figure 23 also with the slot part G3-B combination of the lengthwise that forms in the 4th grid G 4 one sides.Adopt such structure, can more strengthen the lensing of the 1st non-axial symmetrical lens (QL1) that between the 3rd grid G 3 and the 4th grid G 4, forms.

(variation 5)

In above-mentioned the 2nd example, the electron beam through-hole G3-H of the 1st dynamic focus electrode (the 3rd grid G 3) forms the sub-circular shape, but is not limited to this.For example, as shown in figure 24, the electron beam through-hole G3-H of the 3rd grid G 3 also can be the shape of growing crosswise.In addition, as shown in figure 25, the electron beam through-hole G3-H of the 3rd grid G 3 also can be an elongate shape.Have, the electron beam through-hole G3-H of the 3rd grid G 3 also can be other shape again.Even constitute the 3rd grid G 3 like this, also can access and the same effect of above-mentioned the 2nd example.

As mentioned above,, can be provided at whole phosphor screen zone and can form good form bundle spot, can suppress to produce the cathode ray tube device of abnormal sound simultaneously from electron gum member according to the 2nd example and each variation.

Claims (7)

1, a kind of cathode ray tube device comprises electron gum member and deflecting coil,

The electron beam that described electron gum member has the electron beam generating part branch that produces electron beam and this electron beam generating part branch is produced focuses on the main electron lens unit on the target,

Described deflecting coil produces the magnetic deflection field that makes this electron gum member electrons emitted bundle reach vertical direction deflection in the horizontal direction,

It is characterized in that,

Described electron gum member has a plurality of electrodes of the negative electrode that comprises the 1st lower level voltage of supply current potential that consists of described electron beam generating part branch; Supply is higher than at least one focusing electrode of the 2nd level focus voltage of described the 1st level; At least one dynamic focus electrode of the dynamic focus voltage that the AC compounent that supply changes synchronously in reference voltage stack and described magnetic deflection field near described the 2nd level obtains; Supply is higher than at least one anode electrode of the 3rd level anode voltage of described the 2nd level; And the insulating supporting body of these a plurality of electrodes is fixed in supporting

The 1st dynamic focus electrode of dividing adjacent configuration to supply with dynamic focus voltage with described electron beam generating part is supplied with the 1st focusing electrode of focus voltage with the 1st dynamic focus electrode disposed adjacent,

The peripheral part thickness ratio other parts of the electron beam through-hole that the electron beam that described electron beam generating part branch is produced of described the 1st dynamic focus electrode passes through are thin,

Described the 1st dynamic focus electrode from each electron beam through-hole between the embedded part that is fixed on described insulating supporting body, the pole strength intensifier that is formed by negative area or bossing is set.

2, cathode ray tube device as claimed in claim 1 is characterized in that,

Described the 1st dynamic focus electrode have the peripheral part of each electron beam through-hole form to the side-prominent concentric circles bossing of described the 1st focusing electrode one,

Be equivalent to form described electron beam through-hole from the approximate center of the ledge of described the 1st focusing electrode one side.

3, cathode ray tube device as claimed in claim 1 is characterized in that,

Described the 1st dynamic focus electrode has the electron beam through-hole of sub-circular,

Described the 1st focusing electrode is in described the 1st dynamic focus electrode one side, has the horizontal direction aperture greater than the vertical direction aperture, and the vertical direction aperture is compared identical or littler and the electron beam through-hole of growing crosswise that constitute with the electron beam through-hole of described the 1st dynamic focus electrode

Between described the 1st dynamic focus electrode and described the 1st focusing electrode, form non-axial symmetrical lens with the magnetic deflection field synchronous effect.

4, cathode ray tube device as claimed in claim 1 is characterized in that,

When making electron beam to the deflection of phosphor screen peripheral part, the 1st electron lens unit that between described electron beam generating part branch and described the 1st dynamic focus electrode, forms, reach vertical direction in the horizontal direction and have focussing force respectively, the 1st non-axial symmetrical lens unit that between described the 1st dynamic focus electrode and described the 1st focusing electrode, forms, has disperse function in the horizontal direction relatively, simultaneously has focussing force relatively in vertical direction

Electrostatic Coupling between described the 1st electron lens unit and described the 1st non-axial symmetrical lens unit.

5, cathode ray tube device as claimed in claim 4 is characterized in that,

The resultant lens effect of described the 1st electron lens unit and described the 1st non-axial symmetrical lens unit, have the focussing force that strengthens with electron-beam deflection amount in vertical direction, have, in fact indeclinable lensing irrelevant in the horizontal direction with electron-beam deflection amount.

6, cathode ray tube device as claimed in claim 4 is characterized in that,

Described main electron lens unit has the 2nd focusing electrode of supplying with described focus voltage, supplies with the 2nd dynamic focus electrode of described dynamic focus voltage, and described anode electrode,

When making the electron beam deflecting, the 2nd non-axial symmetrical lens unit that between described the 2nd focusing electrode and described the 2nd dynamic focus electrode, forms, relatively has focussing force in the horizontal direction, simultaneously relatively has disperse function in vertical direction, the structure of the 2nd electron lens unit that between described the 2nd dynamic focus electrode and described anode electrode, forms, reaching vertical direction in the horizontal direction relatively all is to have roughly the same focussing force, change along with the increase of electron-beam deflection amount, its lens strength is died down.

7, cathode ray tube device as claimed in claim 6 is characterized in that,

Between described the 1st non-axial symmetrical lens unit and described the 2nd non-axial symmetrical lens unit, have and comprise described focus voltage and described dynamic focus voltage is the unipotential type electron lens unit of different voltages.

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