CN1319824C - Container for clean room - Google Patents
Container for clean room Download PDFInfo
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- CN1319824C CN1319824C CNB2003801027232A CN200380102723A CN1319824C CN 1319824 C CN1319824 C CN 1319824C CN B2003801027232 A CNB2003801027232 A CN B2003801027232A CN 200380102723 A CN200380102723 A CN 200380102723A CN 1319824 C CN1319824 C CN 1319824C
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- container
- clean room
- monomer
- resin
- copolymerization
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67366—Closed carriers characterised by materials, roughness, coatings or the like
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
- C08L51/04—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to rubbers
Abstract
A container for clean room, comprising a thermoplastic resin comprising a matrix resin of a copolymer from an aromatic vinyl monomer and another monomer copolymerizable therewith and, dispersed therein, particles of a diene rubber obtained by polymerization of monomers composed mainly of a diene monomer, wherein the thermoplastic resin has an ash content of 0.2 wt.% or less. This container for clean room is preferably one for accommodating a plate material selected from among semiconductor substrates, display substrates and recording medium substrates. Thus, there is provided a container for clean room constituted of ABS or like resins wherein the ash content is so low as to be less apt to become a metal contamination source.
Description
Technical field
The present invention relates to the clean room container.More particularly, the present invention relates to make and the ash content of this thermoplastic base resin is a clean room container below 0.2% weight by thermoplastic base resin, wherein said thermoplastic base resin is to be that the diene series rubber particle dispersion that major component is polymerized forms in matrix resin with the diene monomers, described matrix resin contain aromatic vinyl monomer with can with the copolymer of other monomer of its copolymerization.
Background technology
In order to prevent to pollute, the glass substrate in the silicon chip in the quartz conductor Fabrication procedure, the liquid crystal panel Fabrication procedure, the salver in the hard disk manufacturing operation etc. will be operated in clean room.In these Fabrication procedurees, use the various containers that are used for efficiently carrying these substrates.For example, sometimes as load multi-piece substrate simultaneously, container when being transported to subsequent processing by specific operation in clean room uses, be loaded in sometimes and promptly carry out various processing in the container.
Resin as container material has various according to the purpose difference.For example polypropylene is more cheap, but can not use in the purposes of the dimensional accuracy when requiring the transparency, moulding, rigidity etc.Polycarbonate transparent, the Dent resistance excellence, but be difficult to not only keep the transparency but also carry out permanent anti-static and handle, and resin cost height.In addition, acrylonitrile/styrol copolymer (AS resin), methyl methacrylate/styrol copolymer (MS resin) are transparent, but poor impact resistance, and easily because of cliding friction produces wearing and tearing, are difficult to use in fearing to have the clean room of particle contamination.In addition, the resistance to effect of heat of polybutylene terephthalate (PBT), polyetheretherketone (PEEK) is good, but opaque, the resin cost is also high.
The balance excellence of aspects such as the flatness on dimensional accuracy when moulding of acrylonitrile/butadiene/styrene copolymer (below can be described as ABS) and resin similar, moulding product surface, rigidity, Dent resistance with it, and be the lower-cost common resins of resin.As follows, can also make it have the permanent antistatic and the transparency.
For example, the antistatic container that loads the solid-state chip of given shape is disclosed in the Japanese kokai publication hei 9-92714 communique.Having mentioned use ABS among the embodiment of this communique is the permanent anti-static resin, at the example (embodiment 1,3 and 4) of 230 ℃ of-240 ℃ of containers that injection moulding is made.The container of putting down in writing among the embodiment has good antistatic behaviour, and the product of the manufacturer that the has transparency excellent (embodiment 3).
A kind of thermoplastic resin composition is disclosed in the Japanese kokai publication sho 62-119256 communique, said composition is in the presence of rubber polymer, to contain (methyl) acrylate monomer and can carry out graft polymerization with the copolymer mixture of other ethene base system monomer of its copolymerization, the admixtured polyether esteramides obtains in resulting polymers.The permanent antistatic of this resin combination, Dent resistance and the transparency are excellent, can prevent that the purposes of the obstacle that static causes from for example using in the IC tote box at needs.
A kind of ABS resin composite is disclosed in the Japanese kokai publication hei 9-59462 communique, the residual styrene monomer amount of this ABS resin composite and residual 4 vinyl cyclohexene all below a certain amount of, the number average bead diameter of rubber grain and distributing within the specific limits.Use this resin combination, can make impact strength and pulling strengrth excellence, possess the odorless moulding product of good gloss.Shell or vehicle moulding article that ABS resin can be used as household appliances have been put down in writing in this communique.
As disclosed in Japanese kokai publication hei 9-92714 communique, the Japanese kokai publication sho 62-119256 communique, the existing antistatic container that contains the loading solid-state chip of ABS resin.But ABS or resin similar with it are as the clean room employed resin of container, and this almost is not used in practice.One of very big reason is exactly following illustrated source of pollution problem.
For the container that in clean room, uses, the most in panic fear pollution of the cargo-carring article of institute, therefore, container itself can not become source of pollution, and this point is extremely important.Pay particular attention to the pollution of metallic ion in the middle of the pollution, for example in the thermal diffusion operation of quartz conductor Fabrication procedure, this metallic ion spreads in circuit as impurity, and the danger that fraction defective is increased is arranged.Simultaneously, also must prevent the pollution that metallic ion organic matter in addition causes.
But it two is the step that the alkene rubber grain carries out graft modification that the exemplary process of making ABS resin is included in what in the emulsion emulsion polymerization is obtained.For the polymerization reaction in the emulsion is carried out smoothly, need to use a large amount of emulsifying agents, emulsifying agent is the inhibiter that is formed by slaine under a lot of situations.Need to make the gained grafted rubber particles to solidify in addition, separate from emulsion, be to saltout this moment mostly, in this case, further contains a large amount of salt in the coagulum again.The just feasible commercially available all residual slaine composition that a great deal of is arranged of a lot of ABS resin at present of result.As a result, for fear of becoming source of pollution, present clean room does not almost adopt ABS or resin similar with it with the material of container.
Disclose the few ABS resin of residual organic matter in the Japanese kokai publication hei 9-59462 communique, but, be not in order to solve the source of pollution problem in the clean room just at the shell of household appliances, the peculiar smell problem of vehicle moulding product.
The present invention establishes for solving above-mentioned problem, and purpose is to provide the clean room container, and this container contains ABS or thermoplastic base resin similar with it, and the ash content of this thermoplastic base resin is few, because of metallic ion causes that contamination of heavy is low.
Summary of the invention
Above-mentioned problem is that clean room below 0.2% weight is realized with container by the ash content that contains thermoplastic base resin and this thermoplastic base resin is provided, wherein said thermoplastic base resin is that to be dispersed with the diene series rubber that is polymerized by diene monomers in matrix resin granuloplastic, and described matrix resin contains aromatic vinyl monomer and the copolymer that can form with other monomer of its copolymerization.
At this moment, but other monomer of above-mentioned copolymerization is preferably the monomer that more than one are selected from vinyl cyanide monomer and unsaturated carboxylic acid alkyl ester monomer.In addition, but preferred above-mentioned thermoplastic base resin form by other monomer polymerization of 5-50% weight diene series rubber, 10-90% weight aromatic vinyl monomer and the above-mentioned copolymerization of 10-90% weight.
The preferred embodiment that obtains above-mentioned thermoplastic base resin is: will make aromatic vinyl monomer and the graft copolymerization resin particle that can form with other monomer copolymerization of its copolymerization carry out melting mixing with making aromatic vinyl monomer and the resin that can form with other monomer copolymerization of its copolymerization in addition in the emulsion that is dispersed with the diene series rubber particle that is polymerized by diene monomers.At this moment, more preferably with acid the graft copolymerization resin particle is solidified at least, washing is used for melting mixing afterwards.
Another preferred embodiment that obtains above-mentioned thermoplastic base resin is: will be dissolved in by the diene series rubber that diene monomer is polymerized aromatic vinyl monomer and can with the monomer of its copolymerization in, make above-mentioned aromatic vinyl monomer then and can obtain with the monomer polymerization of its copolymerization.
Preferred above-mentioned diene monomers is a 1,3-butadiene, and the 4 vinyl cyclohexene content of above-mentioned thermoplastic base resin is below the 100ppm.Also preferred above-mentioned thermoplastic base resin contains antistatic additive that is formed by polyether ester amides or the antistatic additive that is formed by conductive carbon.Will by the moulding product cut the sample got 150 ℃ keep 10 minutes after, it is below the 600ppm that the organic gas amount that produces in preferred 10 minutes is converted into the styrene value.The mist degree of preferred above-mentioned thermoplastic base resin when making the injection moulded products of 3mm thickness is below 20%.In addition, barrel temperature is set in during preferred injection moulding and carries out injection moulding below 220 ℃.
Embodiment preferred of the present invention is to load the above-mentioned clean room container of the tabular body that is selected from semiconductor substrate, display base plate and recording medium substrate.
Below the present invention is described in detail.
Clean room of the present invention is made by thermoplastic base resin with container, described thermoplastic base resin is that dispersion is granuloplastic by the diene series rubber that diene monomers is polymerized in matrix resin, and wherein said matrix resin contains aromatic vinyl monomer and the copolymer that can form with other monomer of its copolymerization.
The thermoplastic base resin that uses among the present invention by aromatic vinyl monomer with can form matrix resin with the copolymer of other monomer of its copolymerization.Be not the poly-mer that only forms by aromatic vinyl monomer, but with the copolymer that other monomer copolymerization forms, therefore be easy to make as required the resin of excellences such as Dent resistance, the transparency, resistance to effect of heat, chemical-resistant.This copolymer is generally random copolymers.
Here employed aromatic vinyl monomer has styrene, AMS, p-methylstyrene etc.Can use in these monomers one or more.Especially preferably use styrene.As long as but other monomer of copolymerization can with the aromatic vinyl monomer copolymerization, it is not particularly limited, its example has: acrylonitrile, methacrylonitrile etc. are the vinyl cyanide monomer of representative with (methyl) acrylonitrile; Methyl acrylate, ethyl acrylate, methyl methacrylate, EMA etc. are the unsaturated carboxylic acid alkyl ester monomer of representative with (methyl) acrylate monomer; Unsaturated carboxylic acid or unsaturated dicarboxylic acid anhydride monomers such as acrylic acid, methyl acrylic acid, maleic acid, maleic anhydride, citraconic anhydride; Maleimides such as maleimide, methyl maleimide, ethyl maleimide, N-phenylmaleimide, O-chloro-N-phenylmaleimide are monomer etc.But the monomer of these copolymerization also can use one or more.
Wherein, but other monomer of above-mentioned copolymerization is preferably the monomer that more than one are selected from vinyl cyanide monomer and unsaturated carboxylic acid alkyl ester monomer.By with the vinyl cyanide monomer copolymerization, resistance to effect of heat, chemical-resistant, rigidity and dimensional stability are improved.In addition, by with the unsaturated carboxylic acid alkyl ester monomer copolymerization, the transparency, hardness and rigidity are improved.Preferably with the two copolymerization.
The thermoplastic base resin that uses among the present invention is to be dispersed with the diene series rubber particle that is formed by the diene monomers polymerization to form in above-mentioned matrix resin.At this moment, the diene monomers components in proportions in the rubber grain is preferably more than 50% weight, more preferably more than 80% weight.The example of employed diene monomers has 1,3-butadiene, isoprene etc., can use more than a kind or 2 kinds.Wherein preferred in-use performance excellence, the 1,3-butadiene that cost is low.Concrete poly-mer has: poly-butadiene rubber, styrene/butadiene rubbers (SBR), acrylonitrile/butadiene rubber (NBR), polyisoprene rubber etc., particularly poly-butadiene rubber can provide excellent resins such as low temperature Dent resistance, and cost is low, thereby preferred.Mean grain size to above-mentioned rubber grain is not particularly limited, preferred 0.05-10 μ m, preferred 0.08-5 μ m.
Proportion of composing for the thermoplastic base resin that uses among the present invention is not particularly limited, but is preferably formed by other monomer polymerization of 5-50% weight diene series rubber, 10-90% weight aromatic vinyl monomer and the above-mentioned copolymerization of 10-90% weight.This proportion of composing represents finally to make each components in proportions in the thermoplastic base resin of moulding product, for example in advance but diene series rubber is carried out graft modification with the aromatic vinyl monomer of scheduled volume and other monomer of copolymerization, and then with by the aromatic vinyl monomer of polymerization separately and the copolymer melting mixing that can form with other monomer of its copolymerization the time, this proportion of composing represents to mix the proportion of composing in the back total amount.
The preferred 5-50% weight of the content of diene series rubber.During less than 5% weight, Dent resistance may be not enough, more preferably more than 10% weight.On the contrary, surpass 50% weight, then rigidity or forming characteristics may reduce, more preferably below 30% weight, further below preferred 20% weight.In addition, be 10-90% weight preferably from the content of the composition of aromatic vinyl monomer.During less than 10% weight, rigidity or forming characteristics may reduce, more preferably more than 20% weight.When surpassing 90% weight, Dent resistance may reduce, more preferably below 80% weight.When particularly requiring the transparency, below preferred 50% weight, more preferably below 30% weight.
Preferably but the content from the composition of other monomer of copolymerization is 10-90% weight.More preferably more than 20% weight, below 80% weight.When particularly requiring the transparency, but other monomer of copolymerization preferably contains the composition from the unsaturated carboxylic acid alkyl ester monomer, and its content is 40-80% weight more preferably.Like this, can reduce the refringence of matrix resin and rubber grain, make the resin whole clearing.
Preparation method to the thermoplastic base resin that uses among the present invention is not particularly limited, can be by emulsion polymerization, suspension polymerization, polymerisation in bulk, solution polymerization or the polymerization preparation that they are combined.Wherein, for two being alkene rubber, consider, preferably comprise the step that makes aromatic vinyl monomer and can carry out graft copolymerization with other monomer of its copolymerization from the aspects such as boundary strength of dispersiveness, rubber grain and the matrix resin of rubber grain.To two being alkene rubber when carrying out graft modification, can in containing the emulsion of rubber (latex), carry out graft modification, also can in the solution that has dissolved rubber, carry out graft modification.
One of preferred manufacturing procedure is: will two be in the emulsion of alkene rubber grain what be dispersed with that the diene monomers polymerization forms, and make aromatic vinyl monomer and graft copolymerization resin particle that can form with other monomer copolymerization of its copolymerization and the method that makes aromatic vinyl monomer with the resin melting mixing that can form with other monomer copolymerization of its copolymerization in addition.When in emulsion, carrying out graft copolymerization, control composition, particle diameter, gel content of rubber etc. easily, be easy to obtain the high performance resin of the transparency, Dent resistance and forming characteristics excellence.In addition, the graft copolymerization resin particle that will synthesize in emulsion can reduce the amount from the slaine composition of emulsion with carrying out the copolymer dilution that body (or solution) polymerization obtains separately.
Among the above-mentioned preparation method, use various additives such as emulsifying agent, polymerization initiator, salting-out agents in the emulsion polymerization step, these all are slaines under a lot of situations, occur sneaking into the problem of end article easily.Need to use a large amount of emulsifying agents in the emulsion polymerization, wherein use the alkali metal salt of higher fatty acid or the alkali metal salt of sulfonic acid etc. mostly.In addition, the polymerization initiator in the emulsion polymerization can use peroxide etc., but also can adopt the redox series initiators that has used organic hydroperoxide sometimes, uses molysite etc. in this case mostly.And, make when the graft copolymerization resin particle of gained solidifies after the emulsion polymerization, to add the alkali metal salt or the alkali salt of high concentration mostly and saltout.
Therefore, for the metal ion content that reduces in the end article is an ash content, preferably use acid to solidify in the coagulation step after the above-mentioned emulsion polymerization.Operable acid has hydrochloric acid, sulfuric acid.At this moment, can complementaryly be used in combination salt, but preferably not use salt, only solidify with acid.Like this, can avoid sneaking into of slaine in the coagulation step.For the wash conditions after strengthening solidifying, preferably increase the washing water yield, or increase washing times.Particularly will make daily water with respect to the apparent volume of the graft copolymerization resin particle that will wash is more than the equal volume, be preferably more than 2 times, the volume more than 3 times more preferably, preferably will wash in addition-anh step repeats more than 2 times, and further preferred repeated washing is more than 3 times.Consider that from the economy angle common ABS resin Fabrication procedure generally can not repeat repeatedly to wash-dehydration.
Like this, use acid at least, the graft copolymerization resin particle after the emulsion polymerization solidified, fully washing, then by with the copolymer melting mixing of body (or solution) polymerization separately, can reduce ash content effectively.Method for melting mixing is not particularly limited, and can use known kneading devices such as extruding machine, banbury mixers, opening rubber mixing machine, kneader to mix.At this moment, can mix other compositions such as antistatic additive simultaneously.
Another preferred manufacturing procedure is: with the diene monomers polymerization form two be alkene rubber be dissolved in aromatic vinyl monomer and can with other monomer of its copolymerization in, make then above-mentioned aromatic vinyl monomer with can with the method for other monomer polymerization of its copolymerization.At this moment, the method for carrying out polymerization with the state that does not contain other solvent is a bulk polymerization, and the method for carrying out polymerization under other solvent state that for example ethylbenzene exists is a solution polymerization process, and two kinds all can be adopted.
According to this method, need not promptly can prepare thermoplastic base resin used in the present invention through the emulsion polymerization step, can reduce the residual of the slaine that comes self-emulsifier, salting-out agents.This preparation method is not easy to control particle diameter, the composition of rubber grain, therefore compares with the preparation method with emulsion polymerization step, and the transparency, Dent resistance etc. are not enough mostly, are not the preparation method who is extensively implemented at present.But,, be preferred manufacturing procedure therefore for purposes of the present invention owing to can reduce the amount of kish salt.
The ash content of thermoplastic base resin used in the present invention is below 0.2% weight.This ash content surpasses 0.2% weight, then becomes the metal ion pollution source in clean room easily, thereby not preferred.For example, in quartz conductor Fabrication procedure, if the container of silicon chip carriage etc. and silicon chip direct contact, then there is pair silicon chip directly to produce the situation of metallic pollution, the situation of stripping metallic ion in handling water etc. is also arranged.In addition, even the chest of parcel carriage such not with the container of silicon chip direct contact, the worn-down dust is attached on silicon chip or the carriage, may produce harmful effect too.Particularly in quartz conductor Fabrication procedure, in material dispersion operation of being undertaken by heating etc., this metallic ion is diffused in the circuit as impurity, may cause the rising of fraction defective.Below preferred 0.18% weight of the ash content of this thermoplastic base resin, more preferably below 0.15% weight.
For the thermoplastic base resin that uses among the present invention, as previously mentioned, preferably wherein employed diene monomers is a 1,3-butadiene.At this moment, the content of 4 vinyl cyclohexene is preferably below the 100ppm in this thermoplastic base resin.Accessory substance when 4 vinyl cyclohexene mainly is the diene monomers polymerization is the cyclic dimer of 1,3-butadiene.Because have peculiar smell, thereby do not wish that it produces, when particularly such enclosure space carried out operation in resembling clean room, its peculiar smell became problem especially easily.In addition, in the enclosure space resemble the clean room, volatile organic matter is detained easily, therefore also becomes source of pollution, and is not preferred.More preferably 4 vinyl cyclohexene content is below the 80ppm, below the further preferred 60ppm.
When having the emulsion polymerization step,, heat emulsion after the preferred emulsion polymerization, the accessory substance 4 vinyl cyclohexene is volatilized with unreacted diene monomers remove in order to reduce the content of 1,3-butadiene.Method of heating preferably adopt steam distillation, with more than 60 ℃, more preferably the temperature more than 70 ℃ carry out more than 10 minutes, the more preferably steam distillation more than 30 minutes operation.In addition after the emulsion polymerization, preferred wash conditions after strengthening solidifying.At this moment preferred wash conditions as previously mentioned.
In polymerisation in bulk or the solution polymerization, preferably by strengthening the content that the devolatilization step reduces 4 vinyl cyclohexene.Specifically, preferably after polymerization finishes, more than 180 ℃, be decompressed under the preferred temperature more than 200 ℃ below 100 holders following, preferred 50 hold in the palm, 4 vinyl cyclohexene is removed with unreacted monomer etc.If use solvent, then preferably remove 4 vinyl cyclohexene, during polymerization because this can remove 4 vinyl cyclohexene effectively with solvent.
The thermoplastic base resin that uses among the present invention can contain various additives.Thermoplastic base resin in this specification sheets also comprises and contains the additive-treated oil composite.In the various additives, from the electrostatic breakdown that can prevent solid-state chip, can prevent that particulate from adhering to the aspect, preferably contain antistatic additive.
Such antistatic additive for example has: cationic surfactants such as alkylamine salt; The anionic surfactants such as phosphate ester salt of the phosphate ester salt of the salt of the sulfuric acid of the sulfuric acid of the sulfate of higher alcohol, the ethylene oxide adduct of higher alcohol, the ethylene oxide adduct of alkyl phenol, paraffin sulfonate, alkybenzene sulfonate, alkyl sulfosuccinate, naphthalene sulfonic acid-formaldehyde condensation product, the ethylene oxide adduct of higher alcohol, the ethylene oxide adduct of alkyl phenol; The non-ionic surface active agents such as ethylene oxide adduct of the ethylene oxide adduct of the ethylene oxide adduct of the monoglyceryl ester of the Isosorbide Dinitrate of higher fatty acid, the monoglyceryl ester of higher fatty acid, higher fatty acid, the ethylene oxide adduct of higher alcohol, higher fatty acid, alkyl phenol ethylene oxide adduct, acid amides ethylene oxide adduct, alkyl amine; PAG; The PAG based copolymer; Polyether ester amides; Conductive carbon etc.Can use wherein one or more.
Wherein preferably use polyether ester amides.Polyether ester amides does not form salt, therefore needn't worry the stripping of salt.In addition, good because mol wt is higher with the compatibility of thermoplastic base resin used in the present invention, therefore can seepage, can bring into play antistatic effect for a long time.The object lesson of polyether ester amides has the cmpd that polyamide (A) and PTMEG (B) polycondensation obtain etc., wherein, polyamide (A) is derived from polyamide-based cmpd (A1) and dicarboxylic acids (A2), two ends have carboxyl, and PTMEG (B) contains the ethylene oxide adduct of polyoxyalkylenes glycol and/or bisphenols; Above-mentioned polyamide-based cmpd (A1) is that amino carboxylic acid, carbon number more than 6 is the lactams more than 6 and is the cmpd of the nylon salt more than 6 by the carbon number that diamines and dicarboxylic acids obtain at least a carbon number that is selected from.
When requiring the transparency, the ratio of refraction of the thermoplastic base resin that uses among preferred, polyethers esteramides and the present invention is consistent.The ratio of refraction of poly-butadiene is 1.52, and when requiring the transparency, the ratio of refraction of matrix resin is consistent with this ratio of refraction, so the at room temperature preferred 1.48-1.56 of the ratio of refraction of polyether ester amides, more preferably 1.50-1.54, and 1.51-1.53 be the best.
If do not require the purposes of the transparency, then preferably use conductive carbon as antistatic additive.As described later, when using organic compound as antistatic additive, though possible thermolysis during moulding is just very micro-.And decompose hardly under the temperature of conductive carbon when the thermoplastic base resin melt molding such as powdered graphite, carbon black, carbon fiber, CNT.Therefore, resemble clean room like this, in the purposes of the pollution of fearing to have volatile organic matter to cause, preferably use conductive carbon particles as antistatic additive with container.
Usage ratio for above-mentioned antistatic additive is not particularly limited, and considers from its rerum natura balance aspect, contains 1-30% weight in the preferred thermoplastic base resin of the present invention.
In the scope that does not hinder effect of the present invention, the thermoplastic base resin that the present invention uses can add known additive, for example antioxidant, ultraviolet absorbent, lubricant, colorant, extending agent etc. as required.But, consider the performance of clean room of the present invention with the desired difficult generation pollutant substance of container, preferred above-mentioned additive-treated oil uses and keeps minimum.
Be not particularly limited for above-mentioned additive-treated oil mixed methods such as antistatic additive, can use extruding machine, banbury mixers, opening rubber mixing machine, kneader etc. to mix.As previously mentioned, during with the resin melting mixing of graft copolymerization resin particle and copolymerization separately, preferably mix above-mentioned additive at this moment simultaneously.Preferred in addition devolatilization processing of in melting mixing, implementing to be used to remove volatile ingredients.Like this, can effectively reduce volatile ingredients in the resin.The method for optimizing that devolatilization is handled can exemplify the method that reduces pressure under molten condition.
Specifically, the preferred extruding machine with decompression exhaust mouth that uses carries out melting mixing.Extruding machine can be single multiple screw extruder, also can be Bitruder.Exhausr port is not a place, also many places can be set.This moment, preferred melting mixing temperature was 160-220 ℃.In addition, handle, can further reduce the content of volatile ingredients in the resin by repeating repeatedly such devolatilization.If for example use extruding machine to carry out melting mixing, then, this operation is repeated preferably with melting mixing and be made for granular material melting mixing once more with decompression exhaust mouth.
Melt flow rate (220 ℃, 10kg load) for the thermoplastic base resin that uses among the present invention is not particularly limited, and is generally 1-100g/10 minute.Consider from forming characteristics, be preferably 5g/10 minute, consider, be preferably below 50g/10 minute from the angle of intensity.
Among the present invention, when being used for the purposes of the inner perspectivity of requirement, preferred thermoplastic resin is a transparency material.When for example being used to wrap up the chest of silicon chip carriage etc. is this situation.In this case, preferably the mist degree of this thermoplastic base resin when making the injection moulded products of 3mm thickness is below 20%.By making this mist degree is below 20%, can be easily inner by the outside perspective of container, and beautiful appearance.In addition, for example bar-code label that is attached on the carriage etc. can be read by the outside, production control can be carried out by reading device.In addition, represent, be preferably more than 70%, more preferably more than 80% with full light transmittance.
Use the thermoplastic base resin that obtains like this, can moulding clean room container of the present invention.Be not particularly limited for forming method, can adopt various melt molding methods such as injection moulding, extrusion molding, blowing.In addition, can also implement the secondary processing of Heat forming etc., carry out moulding the flap of first extrusion molding etc.Wherein, clean room container more complicated, therefore precision prescribed preferably carries out moulding by injection moulding mostly.
Condition of molding during for injection moulding is not particularly limited, and preferably barrel temperature is set to carry out moulding below 220 ℃.When usually ABS resin being carried out injection moulding, carry out injection moulding with the resin temperature more than 230 ℃ mostly, but the present invention is by being made as below 220 ℃, hope can be suppressed at minimum with the decomposition of resin.Resin melting time during injection moulding is so not long usually, if general applications is preferably considered forming characteristics, shaping speed, at enough high temperature compacted unders, but the present invention is owing to be to use in clean room, the organic amount that the thermolysis in the time of importantly will as far as possible reducing because of fusion produces.Therefore, preferably forming temperature is reduced to the minimum temperature of plastic temperature.Plastic temperature is different because of the composition of resin, melt flow rate etc., consider that these set.For example, if increase from the component ratio of unsaturated carboxylic acid alkyl ester monomer in the resin, then easily at low temperature compacted under more.Barrel design temperature during injection moulding is more preferably below 210 ℃, and is further preferred below 200 ℃.Be generally more than 160 ℃.
Molten resin temperature during injection moulding is also influential for the additive-treated oil thermal decomposition behavior that mixes in the resin.For example, as mentioned above, preferred clean room of the present invention is with containing antistatic additive in the employed thermoplastic base resin of container, wherein the preferred, polyethers esteramides.During melt molding, this antistatic additive also can thermolysis, though just very micro-decomposition.At this moment, when high-temperature molding, the low-molecular-weight amine that produces because of thermolysis, the amount of acid amides (comprising lactams) increase.Amine, acid amides stripping are in water, pollute solid-state chip via conditioning fluid easily, and in quartz conductor Fabrication procedurees such as heat diffusion treatment, such nitrogen-containing compound may produce alkaline matters such as ammonia, amine, therefore as source of pollution, more difficult than the common organic compound that only contains carbon, hydrogen, oxygen.Therefore, when particularly using so nitrogenous antistatic additive, preferred moulding at low temperatures as far as possible.
The clean room of the present invention of preferred moulding like this is few as far as possible with the organic matter amount of contained decomposition in the container.Specifically, will by the moulding product cut the sample got 150 ℃ keep 10 minutes after, it is below the 600ppm that the organic gas amount that produces in preferred 10 minutes is converted into the styrene value.More preferably below the 400ppm, below the further preferred 300ppm.As previously mentioned, reducing volatile ingredients during the preparation resin is actv. for the amount that reduces decomposing organic matter, and the moulding at low temperatures of trying one's best simultaneously also is actv. to this.
Clean room container of the present invention is the container that uses in clean room, gets final product so long as load the container of raw material, semifinished or finished goods, but this is not particularly limited.Preferred example has the container that loads the tabular body that is selected from semiconductor substrate, display base plate and recording medium substrate.
The example of semiconductor substrate has: be used to make integrated circuit substrate, be used to substrate of making solar cell etc.Its material is representative with silicon, and this is not particularly limited.Its form can be the such circle of silicon chip, also can be such square of solar battery sheet.In addition, can also be that silicon chip is cut off the platelet-shaped that obtains.
Wherein, representational embodiment is the silicon chip container.In recent years, the large scaleization of silicon chip is developed, and is corresponding, and silicon chip is also increasing with the size of container.Therefore, people require large-sized container also to use can keep form, not damage, the resin of rigidity and Dent resistance excellence.In this respect, clean room container of the present invention is fit to.Along with the increase of size, it is strict that moulding product single-piece dimension precision requirement level also becomes, the clean room container of the present invention that therefore preferably can dimensional accuracy carries out moulding well.Therefore, clean room of the present invention is preferred for silicon chip more than 6 inches with container, more preferably is used for the silicon chip more than 8 inches, further is preferred for the above silicon chip of 300mm.
At this moment, when directly arrange for silicon chip wherein be called as the container of carriage the time, silicon chip directly contacts with carriage, occurs the problem of metallic pollution especially easily, is easy to generate cross pollution via conditioning fluid etc.Therefore, for such carriage, preferably use clean room container of the present invention.In addition, when for above-mentioned carriage is loaded in its inside, when being called as the container of case, metallic pollution is for fear also preferably used clean room container of the present invention.In this case, preferred especially use can be had an X-rayed the in-to-in transparent resin.In addition, assemble easily volatile ingredients in the case, also preferably because of volatile ingredientss such as odour component cause of reduced contamination.Like this, for the integrated container that can bring into play the effect of carriage and case simultaneously, also preferred use clean room container of the present invention.
The example of display base plate has: be used to make Liquid Crystal Display (LCD) substrate, be used to make plasma scope substrate, be used to substrate of making field emission (EL) telltale etc.The representative materials of these substrates is a glass, also can be other material, for example transparent resin etc.There is pixel-driving circuit in these display base plates, fears metallic pollution, therefore preferred employing clean room container of the present invention.In addition, it is super-huge that display base plate mostly is, therefore the same with above-mentioned large-sized silicon wafers, preferably uses clean room container of the present invention.
The example of recording medium substrate has hard disk substrate, optic disc base board.The material of representational hard disk substrate uses metal, glass etc., but is not limited to these.Representational CD substrate material is to be the transparent plastic material of representative with the polycarbonate, but is not limited to these.The recording film of these recording mediums is formed according to its record form different and different, and in recent years, because storage density rapidly improves, pollution slightly all can produce a very large impact its performance, preferably uses clean room container of the present invention.
The accompanying drawing summary
Fig. 1 is the integrally-built decomposition diagram of container for moulding in the expression embodiment of the invention.Among the figure, 1 expression container, 2 expression upper boxes, 3 expression lower boxes.
The best mode that carries out an invention
Further describe the present invention by the following examples.
Synthesis example 1
In the polymer reactor after the nitrogen displacement, pack into 50 parts of (solid constituent) polybutadiene latexs (weight average particle diameter 0.30 μ m, gel content 85%), 150 parts of water, 0.1 part of disodium EDTA, 0.001 part of ferric sulfate, 0.3 part of formaldehyde sodium sulfoxylate, after being heated to 60 ℃, with 3 hours continuous compounds that contain 3 parts of acrylonitrile, 12 parts of styrene, 35 parts of methyl methacrylates and 0.2 part of cumene hydroperoxide that add, 60 ℃ of polymerizations 2 hours, obtain graft copolymer latex again.Afterwards, with respect to this latex of 100 weight portions (solid constituent), use 3.0 weight portion magnesium sulphate to saltout as salting-out agents, the water that adds 1.5 times of volumes of graft copolymerization resin particle then stirs, the dehydration washing, dry afterwards, obtain graft copolymerization resin particle (1).
Synthesis example 2
In the synthesis example 1, after polymerization, carry out steam distillation and will solidify with washing step change, all the other all similarly carry out with synthesis example 1, obtain the graft copolymer resin particle.That is to say, be blown into aqueous vapor in the graft copolymer latex that after polymerization, obtains, carry out 1 hour steam distillation.This moment, the latex temperature was 80 ℃.After the steam distillation, use 1.0 weight portion sulfuric acid to solidify as peptizer, the water that adds 2.5 times of volumes of graft copolymerization resin particle again stirs, dehydration, this washing operation is repeated 3 times, some, similarly obtain graft copolymerization resin particle (2) with synthesis example 1 except that above.
Synthesis example 3
Pack in the polymer reactor after the nitrogen displacement 130 parts of pure water and 0.3 part of potassium persulfate under agitation are warming up to 65 ℃.Spend 4 hours then respectively and add the mixed monomer solution that contains 10 parts of acrylonitrile, 30 parts of styrene, 60 parts of methyl methacrylates and 0.35 part of uncle's dodecyl mercaptans continuously, and 30 parts of emulsifier aqueous solutions that contain 2 parts of disproportionation resin acid potassium.Polymerization system is warming up to 70 ℃ afterwards, carries out 2 hours slaking, obtain styrenic latex.Afterwards, with respect to this latex of 100 weight portions (solid constituent), use 2.5 weight portion magnesium sulphate to saltout as salting-out agents, the water that adds 1.5 times of volumes of styrenic then stirs, the dehydration washing, dry afterwards, obtain styrenic (3).
Synthesis example 4
Use is the continuous polymerization unit of 20 liters complete hybrid reactive tank list groove (1 base) formation by capacity, use plunger pump, supplied with by 30 parts by weight of styrene, 70 parts by weight of methylmethacrylate, 10 weight portion ethylbenzenes, 0.05 weight portion uncle dodecyl mercaptans, 0.015 weight portion as the polymer raw that peroxidating (2 ethyl hexanoic acid) tert-butyl ester of polymerization initiator constitutes to this reactive tank continuously with 13kg/ hour, regulate polymerization temperature and carry out polymerization.The polymerization temperature of this moment is 150 ℃, and the stirring number of times of reactive tank is adjusted to 150rpm.After the polymerization, will supply with devolatilization composition device, obtain styrenic (4) via extruding machine by the polymer fluid of reactive tank continuous drawing.
Synthesis example 5
Capacity be 15 liters the tower reactive tank of piston flow (with the Mitsui east die mould of 185 pages on " novel polymer preparation technology " (census of manufacturing meeting, Saiki Kang Zhi/tail see letter three work), Fig. 7 .5 (b) record be the reactive tank of identical type, be divided into 10 grades C1/C0=0.955) on the 10 liters of complete mixing channel double flutes (2 base) that are connected in series, form continuous polymerization unit, use this device preparation thermoplastic base resin.The tower reactive tank of piston flow constitutes particle and forms step, constitutes the particle size adjustment step as the complete mixing channel of first groove of the 2nd reactive tank, the polymerization procedure after the 3rd reactive tank constitutes.
In the tower reactive tank of above-mentioned piston flow, regulate by 65 parts by weight of styrene, 22 parts by weight of acrylonitrile, 25 weight portion ethylbenzenes, 13 parts by weight of styrene/butaprene (the Japanese ゼ オ Application system NS310S of Co., Ltd.), 0.2 weight portion uncle dodecyl mercaptans, 0.05 weight portion 1,1-two (t-butylperoxy) 3,3, the raw material that the 5-trimethyl-cyclohexane constitutes, this raw material is supplied with three grades of stirring-type polymerization tank row reactors continuously with 10kg/h, carry out the polymerization of monomer.Setting the tower reactive tank of the 1st piston flow is 88 ℃, and the 2nd reactive tank is 125 ℃, and the 3rd reactive tank is 140 ℃.Polymer fluid is supplied with the devolatilization composition device that is made of temperature booster (210-250 ℃) and decompression chamber (40 holder) by the 3rd reactive tank, obtain being dispersed with the thermoplastic base resin (5) of rubber grain then via extruding machine.The weight average particle diameter of gained rubber discrete phase is 0.5 μ m.
Embodiment 1-5, comparative example 1-4
The resin of gained among the synthesis example 1-5, following antistatic additive are mixed according to the blending ratio shown in the table 1, use the 40mm Bitruder (Corporation Japan Steel Works's system " TEX-44 ") of band exhausr port to carry out melting mixing, cut-out, obtain particle at 200 ℃.That is to say that this particle is to have implemented the particle that a devolatilization is handled.Here employed antistatic additive is that Sanyo Chemical Industries, Ltd. makes " peresutattoNC6321 " (polyether ester amides, ratio of refraction 1.516) and neopelex.In accordance with the following methods, the gained particle is measured melt flow rate, ash content and 4 vinyl cyclohexene content.Measurement result is as shown in table 1.
Use the gained particle, the IS-90B injection machine that uses toshiba machine to make, test piece is made in injection moulding under 200 ℃ of barrel design temperatures, carries out the evaluation of full light transmittance, mist degree, Dent resistance and antistatic behaviour respectively according to following method.Evaluation result is as shown in table 1.
Use the gained particle, the J450E-C5 injection machine that uses Corporation Japan Steel Works to make is at 200 ℃ of resin temperatures, 50 ℃ of mold temperatures, injection speed 45mm/ second, injection pressure 1600kg/cm
2Condition under injection moulding, make container shown in Figure 1.Embodiment 1-5 and comparative example 1-4 have obtained the good moulding product of outward appearance.But, embodiment 4 and 5 has gonorrhoea, is difficult to perspective inside.In addition, carry out the smell sensory evaluation according to following method.Evaluation result is as shown in table 2.
(1) melt flow rate
Measure melt flow rate (g/10 minute) according to ASTM D-1238.Measuring temperature is 220 ℃, and load is 10kg.
(2) ash content
The accurate about 10g sample particle of weighing, pack into and measure in the platinum crucible of dry weight, carry out ashing on the electric furnace in being arranged at draught cupboard, then platinum crucible is moved in the electric furnace that temperature is set at 800 ℃, placed 4 hours, take out platinum crucible afterwards, the cooling back claims its weight in dryer, calculates ash content (%) by this weight difference.
(3) 4 vinyl cyclohexene content
Sample particle is dissolved in the Dimethyl fomamide, uses the 5890II type gas chromatograph of the Hewlett-Packard's manufacturing that has flame ionic detector (FID), the 4 vinyl cyclohexene content in the analytic sample solution.Carry out when quantitative, use the calibration curve of making of the dimethyl formamide solution of the 4 vinyl cyclohexene of concentration known.
(4) full light transmittance
The test piece of used thickness 3mm, the reflection and transmission rate instrument HR-100 that makes by dye technology research institute of Murakami K. K. measures.
(5) mist degree
Use and the identical test piece of test piece of measuring full light transmittance, the reflection and transmission rate instrument HR-100 that makes by dye technology research institute of Murakami K. K. measures.
(6) Dent resistance
Measure notched izod impact strength (MPa) according to ASTM D-256.
(7) antistatic behaviour
The test piece of used thickness 3mm carries out one month state adjustment under 23 ℃, the condition of humidity 50%RH, the high megohm meter SN8210 that makes with East Asia electronics industry Co., Ltd. measures the sheet resistance value (Ω) of washing before and after handling.
(8) smell sensory evaluation
Container normal temperature under open state that injection moulding obtains was placed 24 hours, with upper box and the chimeric sealing of lower box, placed at normal temperatures 1 hour then.Open upper box by 5 macrosmatic evaluation personnel afterwards, hear the degree of its smell, carry out the smell sensory evaluation.By following benchmark scoring.
5 minutes: smell was strong significantly
4 minutes: feel smell consumingly
3 minutes: feel smell
2 minutes: feel smell a little
1 minute: do not feel smell
Table 1
| Embodiment | Comparative example | ||||||||
| 1 | 2 | 3 | 4 | 5 | 1 | 2 | 3 | 4 | |
| ＜mixture ratio (weight portion) 〉 | |||||||||
| Graft copolymerization resin particle (1) | 30 | 30 | |||||||
| Graft copolymerization resin particle (2) | 30 | 30 | 30 | ||||||
| Styrenic (3) | 70 | 70 | |||||||
| Styrenic (4) | 70 | 70 | 70 | 100 | 100 | ||||
| Rubber grain dispersion resin (5) | 100 | 100 | |||||||
| Polyether ester amides | 5 | 5 | 5 | 8 | |||||
| Neopelex | 2 | ||||||||
| ＜evaluation result 〉 | |||||||||
| MFR (g/10 minute) | 25 | 20 | 24 | 12 | 14 | 22 | 28 | 30 | 21 |
| Ash content (%) | 0.12 | 0.12 | 0.12 | 0.01 | 0.01 | 0.25 | 0.25 | 0.001 | 0.001 |
| 4 vinyl cyclohexene content (ppm) | 50 | 50 | 50 | 0 | 0 | 300 | 300 | 0 | 0 |
| Full light transmittance (%) | 86 | 90 | 86 | 50 | 50 | 88 | 83 | 82 | 91 |
| Mist degree (%) | 4 | 2.5 | 4.5 | 35 | 40 | 3 | 5 | 5.2 | 1 |
| Dent resistance (Mpa) | 12 | 18 | 15 | 30 | 35 | 16 | 10 | 2 | 1 |
| Sheet resistance value is (before the washing: Ω) | 3×10 13 | 6×10 16 | 4×10 12 | 7×10 16 | 5×10 13 | 4×10 16 | 2×10 13 | 5×10 12 | 8×10 16 |
| Sheet resistance value (washing back: Ω) | 3×10 13 | 6×10 16 | 7×10 15 | 7×10 16 | 4×10 13 | 4×10 16 | 2×10 13 | 5×10 12 | 8×10 16 |
Table 2
| Embodiment | Comparative example | ||||||||
| 1 | 2 | 3 | 4 | 5 | 1 | 2 | 3 | 4 | |
| Evaluation personnel I | 3 minutes | 3 minutes | 3 minutes | 2 minutes | 1 minute | 4 minutes | 5 minutes | 1 minute | 2 minutes |
| Evaluation personnel II | 2 minutes | 2 minutes | 2 minutes | 1 minute | 2 minutes | 4 minutes | 5 minutes | 2 minutes | 1 minute |
| Evaluation personnel III | 2 minutes | 2 minutes | 3 minutes | 1 minute | 2 minutes | 5 minutes | 5 minutes | 2 minutes | 1 minute |
| Evaluation personnel IV | 2 minutes | 3 minutes | 2 minutes | 1 minute | 1 minute | 4 minutes | 5 minutes | 1 minute | 1 minute |
| Evaluation personnel V | 3 minutes | 3 minutes | 3 minutes | 1 minute | 1 minute | 5 minutes | 5 minutes | 1 minute | 1 minute |
| Estimate aviation value | 2.4 divide | 2.6 divide | 2.6 divide | 1.2 divide | 1.4 divide | 4.4 divide | 5.0 divide | 1.4 divide | 1.2 divide |
By above result as can be known: during preparation graft copolymerization resin particle, on the basis of using acid to solidify, strengthen washing operation again, in the styrenic that resin particle that will obtain like this and solution polymerization obtain mixes, prepares the embodiment 1-3 of thermoplastic resin particle, demonstrate low ash content.In addition, in the embodiment 4 and 5 that does not have emulsion polymerization step, the synthetic thermoplastic base resin that is dispersed with rubber grain, also demonstrate low ash content.And using slaine to saltout, have in the comparative example 1 and 2 of the emulsion polymerization step of only implementing common washing operation, ash amount increases.
In addition, the styrenic that the resin particle and the solution polymerization that implement the steam distillation operation when preparation graft copolymerization resin particle, will obtain like this obtains mixes, prepares among the embodiment 1-3 of thermoplastic resin particle, 4 vinyl cyclohexene content is low, and the result is good in the smell sensory evaluation.In addition, the thermoplastic base resin that has emulsion polymerization step ground not synthesize to be dispersed with rubber grain, implement predetermined condition the embodiment 4 and 5 of decompression heating devolatilization operation in, 4 vinyl cyclohexene content further reduces, the result is better in the smell sensory evaluation.
In using the embodiment 1 and 5 of polyether ester amides as antistatic additive, all obtained good antistatic effect before and after the washing, but in the embodiment 2 and 4 that does not use antistatic additive, the sheet resistance value before and after the washing is all high, antistatic behaviour is not enough.In using the embodiment 3 of neopelex as antistatic additive, the sheet resistance value before the washing is low, but the sheet resistance value after the washing increases, and is not enough aspect the continuation of antistatic effect.In addition, in the comparative example 3 and 4 that does not contain the diene series rubber particle, poor impact resistance.
Embodiment 6-9 (influence of forming temperature)
Use with embodiment 1 in identical thermoplastic resin particle, as shown in table 3 with the J450E-C5 injection machine that Corporation Japan Steel Works makes, change barrel design temperature is at 50 ℃ of mold temperatures, injection speed 45mm/ second, injection pressure 1600kg/cm
2Condition under injection moulding, make container shown in Figure 1.According to method shown below the forming characteristics and the decomposing organic matter amount of this container are estimated.The results are summarized in table 3.
Embodiment 10 and 11 (influence of devolatilization number of times)
The 40mm Bitruder (Corporation Japan Steel Works's system " TEX-44 ") that the thermoplastic resin particle that obtains among the embodiment 1 is packed into once more and is with exhausr port, carry out melting mixing at 200 ℃, cut off, make and carry out the particle (embodiment 10) that 2 devolatilizations are handled altogether.In addition, repeat this devolatilization once more and handle operation, make and carry out the particle (embodiment 11) that 4 devolatilizations are handled altogether.Use these particles, under the condition identical, carry out injection moulding, make container shown in Figure 1 with the foregoing description 8.According to method shown below the forming characteristics and the decomposing organic matter amount of this container are estimated.The results are summarized in table 3.
(9) forming characteristics
Observe the fillibility of resin, the resin complete filling container shapes be zero, resin not the complete filling container shapes be *.
(10) decomposing organic matter amount
Goods after moulding are got the 10mg sample, keep 10 minutes at 150 ℃, measure the organic gas amount that produces in 10 minutes.Determinator uses the G-1800A type gas chromatograph of Hewlett-Packard.The organic gas amount is scaled styrene and calculates.
Table 3
| Embodiment 6 | Embodiment 7 | Embodiment 8 | Embodiment 9 | Embodiment 10 | Embodiment 11 | ||
| Particle devolatilization number of times (inferior) | 1 | 1 | 1 | 1 | 2 | 4 | |
| Condition of molding | The barrel design temperature (℃) | 240 | 220 | 200 | 180 | 200 | 200 |
| Mold temperature (℃) | 50 | 50 | 50 | 50 | 50 | 50 | |
| Injection speed (mm/ second) | 45 | 45 | 45 | 45 | 45 | 45 | |
| Injection pressure (kg/cm 2) | 1600 | 1600 | 1600 | 1600 | 1600 | 1600 | |
| Estimate | Forming characteristics | ○ | ○ | ○ | × | ○ | ○ |
| Organic gas amount (ppm) | 700 | 500 | 400 | 350 | 300 | 150 | |
By above result as can be known: along with the reduction of forming temperature, degassing total amount reduces.Organic compound decomposition amount when this demonstrates injection moulding increases along with the rising of injection temperature.The thermoplastic base resin that is used for moulding specifically when the molten resin temperature during injection moulding is 180 ℃, can be seen forming characteristics and reduce, but then can obtain good moulding product at 200 ℃.In addition we know: by repeat the devolatilization operation after forming composite, the organic volatile that can significantly reduce in the moulding product becomes component.
Industrial applicability
The balance of the aspects such as the flatness on the dimensional accuracy of container for clean room of the present invention when moulding, products formed surface, rigidity, resistance to impact is excellent, the resin cost is lower, and content of ashes is few, the possibility that becomes the metal ion pollution source is low, so as the container that in clean room, uses, have excellent performance. Therefore for particularly useful as the container of semiconductor substrate, display base plate and recording medium substrate etc.
Claims (12)
1. clean room container, this container is made by thermoplastic base resin and the ash content of this thermoplastic base resin is below 0.2% weight, wherein said thermoplastic base resin is that the diene series rubber particle dispersion that diene monomers is polymerized forms in matrix resin, and described matrix resin contains by aromatic vinyl monomer and the copolymer that can form with other monomer of its copolymerization.
2. the clean room container of claim 1, but other monomer of wherein said copolymerization is selected from the monomer of vinyl cyanide monomer and unsaturated carboxylic acid alkyl ester monomer for more than one.
3. the clean room container of claim 1, but wherein said thermoplastic base resin is formed by other monomer polymerization of 5-50% weight diene series rubber, 10-90% weight aromatic vinyl monomer and the described copolymerization of 10-90% weight.
4. the clean room container of claim 1, wherein said diene monomers is a 1,3-butadiene, and the content of the 4 vinyl cyclohexene of described thermoplastic base resin is below the 100ppm.
5. the clean room container of claim 1, wherein said thermoplastic base resin contains the antistatic additive that is formed by polyether ester amides.
6. the clean room container of claim 1, wherein said thermoplastic base resin contains the antistatic additive that is formed by conductive carbon.
7. the clean room container of claim 1 will be cut the sample of getting from the moulding product of this container and keep 10 minutes at 150 ℃, and it is below the 600ppm that the organic gas amount that produces in 10 minutes is converted into the styrene value.
8. the clean room container of claim 1, wherein said thermoplastic base resin are that mist degree is a resin below 20% when making thick 3mm injection moulded products.
9. the clean room container of claim 1, this container can load the tabular body that is selected from semiconductor substrate, display base plate and recording medium substrate.
Among the claim 1-9 each clean room with the manufacture method of container, it is characterized in that: use thermoplastic base resin to make described clean room container, wherein said thermoplastic base resin is that graft copolymerization resin particle and the resin melting mixing that makes aromatic vinyl monomer in addition and can form with other monomer copolymerization of its copolymerization are obtained, wherein said graft copolymerization resin particle is in the emulsion that is dispersed with the diene series rubber particle that is polymerized by diene monomers, makes aromatic vinyl monomer and can form with other monomer copolymerization of its copolymerization.
11. the clean room of claim 10 manufacture method of container, this method uses acid that described graft copolymerization resin particle is solidified at least, and washing is used for melting mixing afterwards.
12. each the clean room manufacture method of container among the claim 1-9, it is characterized in that: use thermoplastic base resin to make described clean room container, wherein said thermoplastic base resin be the diene series rubber that will be polymerized by diene monomers be dissolved in aromatic vinyl monomer and can with the monomer of its copolymerization in, make described aromatic vinyl monomer then and can obtain with other monomer polymerization of its copolymerization.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002323002 | 2002-11-06 | ||
| JP323002/2002 | 2002-11-06 |
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| CN1711199A CN1711199A (en) | 2005-12-21 |
| CN1319824C true CN1319824C (en) | 2007-06-06 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2003801027232A Expired - Fee Related CN1319824C (en) | 2002-11-06 | 2003-10-20 | Container for clean room |
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| JP (1) | JPWO2004041678A1 (en) |
| CN (1) | CN1319824C (en) |
| AU (1) | AU2003273048A1 (en) |
| TW (1) | TWI293934B (en) |
| WO (1) | WO2004041678A1 (en) |
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| JP5681419B2 (en) * | 2010-09-14 | 2015-03-11 | 日本ポリプロ株式会社 | Case for transporting electrical and electronic equipment parts |
| JP5993560B2 (en) * | 2010-10-06 | 2016-09-14 | ゴールド工業株式会社 | Resin molded product and method for producing resin molded product |
| CN105264012B (en) * | 2013-05-28 | 2021-02-19 | 日本A&L株式会社 | Rubber-reinforced thermoplastic resin composition and resin molded article |
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| JPH0768300B2 (en) * | 1988-05-24 | 1995-07-26 | 三菱化学株式会社 | Method for manufacturing impact resistant resin |
| JP2816864B2 (en) * | 1989-07-07 | 1998-10-27 | 大塚化学株式会社 | Transfer wafer basket and storage case |
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| JP3112519B2 (en) * | 1991-09-24 | 2000-11-27 | 旭化成工業株式会社 | Resin composition for IC heat resistant tray with improved conductivity |
| JP3120314B2 (en) * | 1993-03-05 | 2000-12-25 | 日本エイアンドエル株式会社 | Thermoplastic resin composition |
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| JP3277729B2 (en) * | 1994-11-04 | 2002-04-22 | ジェイエスアール株式会社 | Flame retardant resin composition |
| JP3654757B2 (en) * | 1997-11-10 | 2005-06-02 | 旭化成ケミカルズ株式会社 | Novel rubber-modified styrenic resin composition and molded product thereof |
| JP4722237B2 (en) * | 1998-02-27 | 2011-07-13 | ユーエムジー・エービーエス株式会社 | Thermoplastic resin composition and profile extrusion product using the same |
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2003
- 2003-10-20 CN CNB2003801027232A patent/CN1319824C/en not_active Expired - Fee Related
- 2003-10-20 AU AU2003273048A patent/AU2003273048A1/en not_active Abandoned
- 2003-10-20 WO PCT/JP2003/013359 patent/WO2004041678A1/en active Application Filing
- 2003-10-20 JP JP2004549572A patent/JPWO2004041678A1/en active Pending
- 2003-11-04 TW TW92130714A patent/TWI293934B/en not_active IP Right Cessation
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| JPS56166213A (en) * | 1980-05-26 | 1981-12-21 | Sumitomo Chem Co Ltd | Aftertreatment of liquid conjugate diene polymerization product |
| JPS58147414A (en) * | 1982-02-26 | 1983-09-02 | Mitsubishi Monsanto Chem Co | Preparation of resin having impact resistance |
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| Publication number | Publication date |
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| TWI293934B (en) | 2008-03-01 |
| TW200415093A (en) | 2004-08-16 |
| JPWO2004041678A1 (en) | 2006-03-09 |
| CN1711199A (en) | 2005-12-21 |
| AU2003273048A8 (en) | 2004-06-07 |
| AU2003273048A1 (en) | 2004-06-07 |
| WO2004041678A1 (en) | 2004-05-21 |
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