CN1314986C - 微机电结构及其制造方法 - Google Patents
微机电结构及其制造方法 Download PDFInfo
- Publication number
- CN1314986C CN1314986C CNB2003101028769A CN200310102876A CN1314986C CN 1314986 C CN1314986 C CN 1314986C CN B2003101028769 A CNB2003101028769 A CN B2003101028769A CN 200310102876 A CN200310102876 A CN 200310102876A CN 1314986 C CN1314986 C CN 1314986C
- Authority
- CN
- China
- Prior art keywords
- electrode
- material layers
- display unit
- type display
- light interference
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims description 84
- 239000000463 material Substances 0.000 claims abstract description 193
- 238000005530 etching Methods 0.000 claims abstract description 40
- 238000004519 manufacturing process Methods 0.000 claims abstract description 37
- 239000004020 conductor Substances 0.000 claims abstract description 34
- 230000003628 erosive effect Effects 0.000 claims abstract description 5
- 241000272165 Charadriidae Species 0.000 claims description 30
- 239000012780 transparent material Substances 0.000 claims description 19
- 239000003989 dielectric material Substances 0.000 claims description 16
- 229920000642 polymer Polymers 0.000 claims description 16
- 239000002210 silicon-based material Substances 0.000 claims description 15
- 229910003437 indium oxide Inorganic materials 0.000 claims description 14
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 14
- 239000000428 dust Substances 0.000 claims description 12
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 claims description 12
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 11
- 239000007769 metal material Substances 0.000 claims description 9
- 229910044991 metal oxide Inorganic materials 0.000 claims description 9
- 150000004706 metal oxides Chemical class 0.000 claims description 9
- 239000012188 paraffin wax Substances 0.000 claims description 8
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 7
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 7
- 229920005591 polysilicon Polymers 0.000 claims description 7
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- 229920002521 macromolecule Polymers 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 239000010703 silicon Substances 0.000 claims description 6
- 230000015572 biosynthetic process Effects 0.000 claims 2
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 5
- 229910052760 oxygen Inorganic materials 0.000 abstract description 5
- 239000001301 oxygen Substances 0.000 abstract description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 185
- 230000001681 protective effect Effects 0.000 description 18
- 239000000725 suspension Substances 0.000 description 15
- 206010070834 Sensitisation Diseases 0.000 description 9
- 230000008313 sensitization Effects 0.000 description 9
- -1 IZO) Chemical compound 0.000 description 7
- 238000000059 patterning Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 238000001228 spectrum Methods 0.000 description 4
- 229920000178 Acrylic resin Polymers 0.000 description 3
- 239000004952 Polyamide Substances 0.000 description 3
- 208000027418 Wounds and injury Diseases 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 230000006378 damage Effects 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 208000014674 injury Diseases 0.000 description 3
- 229910052755 nonmetal Inorganic materials 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 229920002647 polyamide Polymers 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 229920006149 polyester-amide block copolymer Polymers 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- RHZWSUVWRRXEJF-UHFFFAOYSA-N indium tin Chemical compound [In].[Sn] RHZWSUVWRRXEJF-UHFFFAOYSA-N 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
Images
Abstract
Description
Claims (28)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB2003101028769A CN1314986C (zh) | 2003-10-22 | 2003-10-22 | 微机电结构及其制造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB2003101028769A CN1314986C (zh) | 2003-10-22 | 2003-10-22 | 微机电结构及其制造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1609650A CN1609650A (zh) | 2005-04-27 |
CN1314986C true CN1314986C (zh) | 2007-05-09 |
Family
ID=34756470
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2003101028769A Expired - Fee Related CN1314986C (zh) | 2003-10-22 | 2003-10-22 | 微机电结构及其制造方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN1314986C (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8576474B2 (en) * | 2004-08-14 | 2013-11-05 | Fusao Ishii | MEMS devices with an etch stop layer |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5393710A (en) * | 1992-11-10 | 1995-02-28 | Electronics And Telecommunications Research Institute | Method for manufacturing a micro light valve |
US5658698A (en) * | 1994-01-31 | 1997-08-19 | Canon Kabushiki Kaisha | Microstructure, process for manufacturing thereof and devices incorporating the same |
US20020024711A1 (en) * | 1994-05-05 | 2002-02-28 | Iridigm Display Corporation, A Delaware Corporation | Interferometric modulation of radiation |
-
2003
- 2003-10-22 CN CNB2003101028769A patent/CN1314986C/zh not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5393710A (en) * | 1992-11-10 | 1995-02-28 | Electronics And Telecommunications Research Institute | Method for manufacturing a micro light valve |
US5658698A (en) * | 1994-01-31 | 1997-08-19 | Canon Kabushiki Kaisha | Microstructure, process for manufacturing thereof and devices incorporating the same |
US20020024711A1 (en) * | 1994-05-05 | 2002-02-28 | Iridigm Display Corporation, A Delaware Corporation | Interferometric modulation of radiation |
Also Published As
Publication number | Publication date |
---|---|
CN1609650A (zh) | 2005-04-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW593126B (en) | A structure of a micro electro mechanical system and manufacturing the same | |
US6952303B2 (en) | Interferometric modulation pixels and manufacturing method thereof | |
KR101443303B1 (ko) | 공기 간극 제어를 제공하는 mems 장치의 제조 방법 | |
US8724832B2 (en) | Piezoelectric microphone fabricated on glass | |
EP0742904B1 (en) | Method of making a micromechanical silicon-on-glass tuning fork gyroscope | |
US20050046922A1 (en) | Interferometric modulation pixels and manufacturing method thereof | |
CN1856881A (zh) | 具有小间距的微镜阵列器件 | |
US7358102B2 (en) | Method for fabricating microelectromechanical optical display devices | |
KR20090042824A (ko) | 미소 기전 시스템 기기의 제조 동안 표면 전하를 감소시키는 방법 | |
KR20060066675A (ko) | 미소 기전 시스템의 제조를 위한 박막 선구체 스택 및 그제조 방법 | |
US7570415B2 (en) | MEMS device and interconnects for same | |
CN1787694A (zh) | 硅晶微麦克风的制作方法 | |
CN1314986C (zh) | 微机电结构及其制造方法 | |
CN1175700A (zh) | 用于制造薄膜受激镜面阵列的方法 | |
CN1296271C (zh) | 微机电光学显示元件的制造方法 | |
CN100346223C (zh) | 反射式干涉调节显示元件及其制造方法 | |
CN1246732C (zh) | 光干涉式显示单元结构及制造方法 | |
CN100349034C (zh) | 干涉调节显示组件与其制造方法 | |
CN1252530C (zh) | 光干涉式显示单元的制造方法 | |
CN100338497C (zh) | 光干涉式反射单元以及其修理方法 | |
CN1567080A (zh) | 结构释放结构及其制造方法 | |
CN1591095A (zh) | 光干涉式显示面板以及其制造方法 | |
JP2015500504A (ja) | ディスプレイデバイスならびに光を曲げるフィーチャおよびディスプレイ要素を形成するための両面処理 | |
CN1755418A (zh) | 干涉式调制器及其制作方法 | |
JP2002267958A (ja) | 光変調装置とその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: QUALCOMM MEMS SCIENCE & TECHNOLOGY CO.,LTD. Free format text: FORMER OWNER: YUANTAI SCIENCE, TECHNOLOGY + INDUSTRY CO. LTD. Effective date: 20060428 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20060428 Address after: American California Applicant after: Qualcomm MEMS Technology Corp. Address before: No. 3, No. 1, Li Gong Road, Hsinchu Science Industrial Park, Taiwan Applicant before: Yuantai Science and Technology Industry Co., Ltd. |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20161026 Address after: American California Patentee after: NUJIRA LTD. Address before: American California Patentee before: Qualcomm MEMS Technology Corp. |
|
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20070509 Termination date: 20181022 |