CN1314089C - Method for preparing field effect transistor - Google Patents
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- CN1314089C CN1314089C CNB2004101013912A CN200410101391A CN1314089C CN 1314089 C CN1314089 C CN 1314089C CN B2004101013912 A CNB2004101013912 A CN B2004101013912A CN 200410101391 A CN200410101391 A CN 200410101391A CN 1314089 C CN1314089 C CN 1314089C
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Abstract
The present invention provides a method for preparing a quasi-SOI field effect transistor, which belongs to the technical field of ultra large scale integrated circuit (ULSI). In the first step, the method uses a conventional technological method for realizing shallow grooved-isolation, depositing and etching grid materials and hard film masking materials covered on the grid materials, a grid region is formed, and grid side walls are prepared subsequently to protect the grid region; in the second step, the silicon of a source and a drain regions is etched to a certain depth h1, oxidation resisting materials are subsequently deposited and etched to form the side walls, the silicon materials of the source and the drain regions are then etched to a second depth h2 so as to form a deeper silicon groove, and finally, heat oxidation exposed silicon forms ' L'-shaped silicon oxide layers in grooves of the source and the drain regions; in the third step, the source and the drain regions are prepared, namely that the side walls formed by the oxidation resisting materials are firstly removed, source and drain materials are deposited, the source and the drain regions are formed by using a flattened method, and thereby, a quasi-SOI structure is realized. The present invention has the advantages of simple flow and low technological cost, and simultaneously, technological integration is easily realized.
Description
Technical field
The invention belongs to very large scale integration technology (ULSI) field, especially a kind of preparation method of accurate SOI field-effect transistor.
Background technology
Along with the development of microelectric technique, the characteristic size of device enters deep-submicron (＜0.1um) scope.At this moment, the field effect transistor of traditional CMOS body silicon technology preparation owing to be subjected to the serious short channel effect and the influence of other ghost effect, is very restricted in application facet.Adopt especially full-exhaustion SOI device of SOI (silicon on insulator) technology, can well suppress short channel effect, obtain less threshold voltage fluctuation and approaching desirable sub-threshold slope; Simultaneously, with element manufacturing at SiO
2On, can reduce parasitic junction capacitance, thereby improve the speed of device.But the SOI device is subjected to the restriction of heat dissipation problem: because the thermal conductivity of oxygen buried layer is smaller, the heat that produces during device work can not in time distribute; The accumulation of heat will cause the temperature of device to raise, the degeneration of mobility, thus cause such as problems such as drive current decline, working point instabilities, the output result who influences circuit is bad even cause logic error, Here it is so-called self-heating effect.Adopt accurate SOI device (as figure one), its source-drain area overwhelming majority surrounds with the oxide layer medium, and links to each other by silicon between channel region and the substrate.The parasitic capacitance that such device has the SOI device on the one hand is little, and short channel effect suppresses advantage such as good; Simultaneously, because the thermal conductivity of silicon wants ratio silicon oxide much better, the heat that produces in the device work just can be good at exhaling, thus solved fully SOI from heat problem.We can say that accurate SOI technology has been concentrated the advantage of body silicon and SOI device, and abandoned their most of not enough, is very potential device therefore.
In order to realize accurate SOI device, people have proposed such as selective epitaxy (selective epitaxy), have annotated oxygen method or technologies such as (oxygenimplanting).These technologies need specific equipment usually, and preparation flow is more complicated also, and preparation cost is also bigger, and not too compatible with traditional CMOS technology, have limited the application of accurate SOI in integrated circuit greatly.
Summary of the invention
The invention provides a kind of method that on body silicon silicon chip, prepares accurate SOI device, this method and conventional CMOS process compatible, flow process is simple, and technology is with low cost, and technology is integrated simultaneously also realizes easily.
The preparation method of the accurate SOI field-effect transistor of the present invention, its step comprises:
(1) adopt conventional process, realize shallow-trench isolation, deposit and etching grid material and the hard mask material that covers above form the grid region, then prepare grid side wall protection grid region;
(2) silicon of etching source-drain area is to certain depth h1, then the oxidation resistant material of deposit and etching forms side wall, thickness is L2, further silicon materials to the second degree of depth h2 of etching source-drain area then, form darker silicon groove, the silicon that last thermal oxidation exposes obtains surrounding disjunct two " L " type silicon oxide layers in source region and drain region, and the thickness of " L " type silicon oxide layer is L3;
(3) remove the side wall that oxidation-resistant material forms earlier, material is leaked in the deposit source again, forms source-drain area.The thickness of silicon oxide layer L3 is 1-3 times of side wall thicknesses L2.
The junction depth of h1 decision Chang Xiaoying pipe can be selected 1 nanometer to 100 nanometer; H2 depends on the thickness of source-drain area, can select 10 nanometers to 1 micron.
After material was leaked in the deposit source, for stopping layer, chemico-mechanical polishing was used for forming source-drain area with the hard mask on top, grid region.
Technique effect of the present invention: the invention provides the accurate SOI preparation of devices of a kind of preparation method, very approaching with the method for the making CMOS large-scale circuit of routine, all be to adopt the method in definition grid region (gate first) earlier; Be with the conventional method difference, added the technology of dent source leakage, in dent source leakage, form oxide layer, realize accurate soi structure.
When the key of accurate SOI device preparation was to form the oxide layer of surrounding source-drain area, channel region was protected and can be not oxidized.In order to have solved this problem, in technological process, we promptly define grid region and the channel region under it earlier with source-drain area and separately definition of channel region, form source-drain area again.Promptly forming polysilicon gate (using hard mask protection on the grid) and oxide layer side wall (thickness L
1) after, dry etching surface of silicon oxide layer, the etch silicon substrate is to certain depth h again
1This degree of depth will determine the area that channel region contacts with source-drain area.Follow low pressure deposit Si
3N
4It is L that layer and etching form thickness
2Side wall, this side wall will be used for protecting the channel region of exposure, as mask, the silicon of etching source-drain area is to another degree of depth h with silicon nitride layer
2, this degree of depth is the degree of depth of major decision dent source leakage, and to form a layer thickness at the silicon rooved face be L in thermal oxidation then
3Oxide layer, cook out the silicon nitride side wall at last, material is leaked in the deposit source, forms source-drain area.Like this, the overwhelming majority of source-drain area will be surrounded by " L " type oxide layer, and the area that contacts with channel region will depend primarily on the size of h1, thereby realize accurate soi structure.Flow process is simple, technology is with low cost, this method and conventional CMOS process compatible, the integrated easy realization of technology.
Description of drawings
Below in conjunction with accompanying drawing, the present invention is made detailed description.
Fig. 1 is the profile of accurate soi structure; Among the figure:
3-drain region, 1-polysilicon gate 2-source region 4-body silicon substrate 5-oxide layer side wall 6-buries oxide layer
The expansion area is leaked in 7-gate oxide 8-source
Fig. 2 is a process flow diagram of realizing accurate soi structure.
Fig. 2-aSTI isolates; Fig. 2-b grid region definition; Fig. 2-c forms oxide layer side wall; Fig. 2-d substrate is etching for the first time;
Fig. 2-e silicon nitride side wall forms; Fig. 2-f source-drain area is etching for the second time; Fig. 2-g forms oxygen buried layer; Deposition of materials is leaked in Fig. 2-h source; Fig. 2-i source-drain area forms.
Among the figure, 01-body silicon substrate 02-STI isolating oxide layer 03-grid oxide layer 04-polysilicon gate 05-hard mask layer 06-monox lateral wall 07-silicon nitride side wall 08-buries oxide layer 09-source-drain area 10-light doping section
Embodiment
The present invention defines grid region and the channel region under it earlier, forms source-drain area again.Concrete method is: the first step, adopt conventional process, and realize shallow-trench isolation, deposit and etching grid material and the hard mask material that covers above form the grid region, then prepare grid side wall protection grid region, and side wall thicknesses is L1.Second step was to form oxide layer, the silicon of at first wanting the etching source-drain area is to certain depth h1, then the oxidation resistant material of deposit and etching forms side wall, width is L2, silicon materials to the second degree of depth h2 of further etching source-drain area forms darker silicon groove then, and the silicon that last thermal oxidation exposes obtains " L " type silica that thickness is L3, in order to guarantee that channel region directly links to each other with substrate, require " L " type oxide layer under source, the drain region not link to each other; The 3rd step was the preparation source-drain area, removed the side wall that oxidation-resistant material forms earlier, and material is leaked in the deposit source again, uses the method for planarization to form source-drain area, and material heavy doping is leaked in the source, thereby realized accurate soi structure.Be conventional subsequent techniques such as metallization subsequently, comprise the silicided source drain region, isolate, carve fairlead, metal line, passivation, encapsulation or the like; In order to realize accurate soi structure, degree of depth h1 can select 1 nanometer to 100 nanometer usually, and this is with the junction depth of major decision Chang Xiaoying pipe; H2 can select 10 nanometers to 1 micron, depends on the thickness of source-drain area; The L2 range of choice can be 5 to 100 nanometers, and oxidated layer thickness L3 can be 5 to 400 nanometers; The thickness L3 of oxygen buried layer growth has following restriction: (1) is connected with substrate in order to guarantee channel region, the restriction self-heating effect, and the oxide layer in source region and drain region can not link to each other; (2) for the source is leaked under expansion area and the channel region oxygen buried layer is arranged, the thickness of L3 need near or greater than the twice of silicon nitride side wall thicknesses L2.Above-mentioned oxidation-resistant material can be a silicon nitride etc., and it can be polysilicon, germanium silicon, germanium or the like that material is leaked in the source.
Utilize the method for above-mentioned dent source leakage oxidation to prepare accurate soi structure, the detailed process step is as follows:
1) cleans the body silicon chip;
2) lithographic definition active area;
3) shallow-trench isolation STI is as Fig. 2-a;
4) cleaning silicon chip, thermal oxidation forms grid oxygen;
5) the threshold value adjustment is injected;
6) low-pressure chemical vapor phase deposition (LPCVD) polycrystalline silicon material;
7) ion injects, to polysilicon heavy doping;
8) rapid thermal annealing activator impurity ion;
9) the silicon oxide deposition layer is as hard mask;
10) photoetching and the hard mask of etching, polysilicon gate successively, thereby definition Si-gate are as Fig. 2-b;
11) N type impurity injects, and forms light doping section;
12) LPCVD SiO
2, dry etching SiO
2Form side wall, as Fig. 2-c;
13) with SiO
2Side wall is that the silicon of protective layer dry etching source-drain area is to certain depth h
1, as Fig. 2-d;
14) LPCVD Si
3N
4, dry etching Si
3N
4Layer forms side wall, and thickness L2 is as Fig. 2-e;
15) with Si
3N
4Side wall is as protective layer, the silicon materials under the dry etching source-drain area, and the formation degree of depth is h
2Shallow slot, as Fig. 2-f;
16) thermal oxidation forms oxide layer around the silicon groove, thickness L3 is as Fig. 2-g;
17) wet etching Si
3N
4, expose light doping section;
18) natural oxidizing layer is floated in HF acid;
19) LPCVD polycrystalline silicon material;
20) with the hard mask on top, grid region for stopping layer, chemico-mechanical polishing (CMP) polysilicon is as Fig. 2-h;
21) cross polysilicon source leakage at quarter, the height of the lifting that leak in the reduction source;
22) float polysilicon on the side wall, as Fig. 2-i;
23) the source-drain area ion injects;
24) rapid thermal annealing, activator impurity;
25) source-drain area forms silicide;
26) deposited oxide layer, lithography fair lead;
27) depositing metal, the photoetching lead-in wire;
28) alloying;
29) deposit passivation layer, perforate forms electrode.
Claims (4)
1, a kind of preparation method of field-effect transistor, its step comprises:
(1) realize shallow-trench isolation, deposit and etching grid material and the hard mask material that covers above form the grid region, then prepare grid side wall protection grid region, and the thickness of side wall is L1;
(2) silicon of etching source-drain area is to certain depth h1, then the oxidation resistant material of deposit and etching forms side wall, thickness is L2, further silicon materials to the second degree of depth h2 of etching source-drain area then, form darker silicon groove, the silicon that last thermal oxidation exposes obtains surrounding disjunct two " L " type silicon oxide layers in source region and drain region, and the thickness of " L " type silicon oxide layer is L3;
(3) remove the side wall that oxidation-resistant material forms earlier, material is leaked in the deposit source again, forms source-drain area.
2, the preparation method of field-effect transistor as claimed in claim 1 is characterized in that: the thickness L3 of silicon oxide layer is 1-3 a times of side wall thicknesses L2.
3, the preparation method of field-effect transistor as claimed in claim 1 is characterized in that: the junction depth of h1 decision field effect transistor, and its depth bounds is 1 nanometer to 100 nanometer; H2 depends on the thickness of source-drain area, and its depth bounds is chosen in 10 nanometers to 1 micron.
4, the preparation method of field-effect transistor as claimed in claim 1 is characterized in that: after material was leaked in the deposit source, for stopping layer, chemico-mechanical polishing was used for source-drain area is separated with the hard mask on top, grid region.
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| CNB2004101013912A CN1314089C (en) | 2004-12-21 | 2004-12-21 | Method for preparing field effect transistor |
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| CNB2004101013912A CN1314089C (en) | 2004-12-21 | 2004-12-21 | Method for preparing field effect transistor |
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| CN1314089C true CN1314089C (en) | 2007-05-02 |
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Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100394583C (en) * | 2005-08-25 | 2008-06-11 | 中芯国际集成电路制造(上海)有限公司 | Integrated producing method for strain CMOS |
| CN101226881B (en) * | 2007-01-16 | 2010-09-15 | 北京大学 | Method for manufacturing dent source leakage field effect transistor |
| CN101582426B (en) * | 2009-06-02 | 2011-06-15 | 北京大学 | Capless DRAM unit and preparation method thereof |
| CN103151269B (en) * | 2013-03-28 | 2015-08-12 | 北京大学 | Prepare the method for source and drain accurate SOI multi-gate structure device |
| CN106298526B (en) * | 2015-06-01 | 2019-05-28 | 中芯国际集成电路制造(上海)有限公司 | The production method of silicon field-effect transistor device on quasi-insulator |
| CN108462471A (en) * | 2018-02-12 | 2018-08-28 | 中国科学院上海微系统与信息技术研究所 | A kind of voltage-controlled oscillator circuit based on SOI technology |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5869359A (en) * | 1997-08-20 | 1999-02-09 | Prabhakar; Venkatraman | Process for forming silicon on insulator devices having elevated source and drain regions |
| CN1431719A (en) * | 2003-02-14 | 2003-07-23 | 中国科学院上海微系统与信息技术研究所 | Silicon field-effect transistors on quasi insulators and implement method |
| US6808994B1 (en) * | 2003-06-17 | 2004-10-26 | Micron Technology, Inc. | Transistor structures and processes for forming same |
| CN1540768A (en) * | 2003-10-31 | 2004-10-27 | 北京大学 | Source/drain sink type ultrathin SOIMOS transistor and method for preparing IC |
-
2004
- 2004-12-21 CN CNB2004101013912A patent/CN1314089C/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5869359A (en) * | 1997-08-20 | 1999-02-09 | Prabhakar; Venkatraman | Process for forming silicon on insulator devices having elevated source and drain regions |
| CN1431719A (en) * | 2003-02-14 | 2003-07-23 | 中国科学院上海微系统与信息技术研究所 | Silicon field-effect transistors on quasi insulators and implement method |
| US6808994B1 (en) * | 2003-06-17 | 2004-10-26 | Micron Technology, Inc. | Transistor structures and processes for forming same |
| CN1540768A (en) * | 2003-10-31 | 2004-10-27 | 北京大学 | Source/drain sink type ultrathin SOIMOS transistor and method for preparing IC |
Non-Patent Citations (1)
| Title |
|---|
| Analysis and optimization of SDOI structure to maximize theintrinsic performance of extremely scaled MOSFETs. Zhikuan Zhuang,Shengdong Zhang,Chuguang Feng,etal,IEEE Transactions on Electron Devices,Vol.51 No.7 2004 * |
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Effective date of registration: 20101129 Address after: 100871 No. 5 the Summer Palace, Beijing, Haidian District Co-patentee after: Semiconductor Manufacturing International (Shanghai) Corporation Patentee after: Peking University Address before: 100871 No. 5 the Summer Palace, Beijing, Haidian District Patentee before: Peking University |