CN1309331A - Method for mfg. photosensitive lithographic plate - Google Patents
Method for mfg. photosensitive lithographic plate Download PDFInfo
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- CN1309331A CN1309331A CN 01102657 CN01102657A CN1309331A CN 1309331 A CN1309331 A CN 1309331A CN 01102657 CN01102657 CN 01102657 CN 01102657 A CN01102657 A CN 01102657A CN 1309331 A CN1309331 A CN 1309331A
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- photosensitive lithographic
- lithographic plate
- manufacture method
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- temperature
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Abstract
The present invention provides a method of manufacturing a photosensitive planographic printing plate without powder by preventing the peeling of a mat and the formation of powder by keeping the sphere diameter of mist and the surface temperature of a photosensitive planographic printing plate in an appropriate relation. When an aqueous fluid is sprayed as mist on each photosensitive layer of a photosensitive planographic printing plate 10, the sphere diameter of mist L in spraying is adjusted to 16-40, and the temperature of the printing plate is regulated. By the control of both the sphere diameter of the mist and the temperature of the printing plate, the peeling of a mat (m) from the photosensitive layer is prevented.
Description
The present invention relates to the manufacture method of photosensitive lithographic plate, particularly relate to the manufacture method that on the photographic layer of photosensitive lithographic plate, forms the photosensitive lithographic plate of rough layer.
Form on photosensitive lithographic plate in the exposure process of image, the photosensitive lithographic plate and the master of taking pictures are not adjacent to with having the space, if do not overlap, just produce image blurring.Therefore, in general, use vacuum frame, between the glass plate and rubber sheet of vacuum frame, make photosensitive lithographic plate and the master coincidence of taking pictures, will vacuumize between glass plate and the rubber sheet, the photosensitive lithographic plate and the master of taking pictures are adjacent to.
So, in order to improve the being adjacent to property of the photosensitive lithographic plate 30 as shown in Figure 6 and the master 32 of taking pictures, the small drop of spraying on the photographic layer of photosensitive lithographic plate 30, constitute rough layer Ml with the dietary fibres ml of countless roughly billiard ball shapes, thereby easily from photosensitive lithographic plate 30 with take pictures and deflate between the master 32.
As the roughening method of the being adjacent to property that improves such rough layer and photographic layer, can enumerate special public clear 61-48994 communique.This technology is to make the surface temperature of photosensitive lithographic plate in transit rise to 65 ℃ in the temperature conditioning chamber, in moistening device with photographic layer moistening after, adopt the electrostatic coating method, utilize electric field to make the surface of water miscible fine droplets electrostatic adhesion at photographic layer.
, along with linear velocity accelerates, make the surface temperature of the photosensitive lithographic plate in the temperature conditioning chamber be in the tendency of rising.Surface temperature at photosensitive lithographic plate is a high temperature, the footpath of dietary fibres (attached to the footpath of the dietary fibres of photographic layer) hour, rough layer peels off easily.In the electrostatic coating method, big more from the drop footpath that fog-spray nozzle sprays, big more in the amount of contraction on photosensitive lithographic plate surface, therefore this tendency is also serious more, has the problem of peeling off easily.
In technology in the past, about the shape or the height of the rough layer that adheres to, stipulated best scope, but do not disclosed the sphere diameter of the drop that sprays and how the surface temperature of photosensitive lithographic plate influences peeling off of rough layer.
On the other hand,, just become powder, pollute the surface of printed glass, and when carrying out vacuum suction in that the photosensitive lithographic plate and the master of taking pictures are overlapped, powder often stops up vacuum pump if rough layer peels off.
The present invention considers the above-mentioned fact, and its problem is, makes the sphere diameter of drop and the surface temperature of photosensitive lithographic plate keep suitable relation, prevents peeling off of rough layer with this, does not produce powder thereby reach.
For achieving the above object, the present invention takes following technical scheme: the manufacture method of photosensitive lithographic plate, be injected into fine liquid drops at water-based liquid with resin, make it statically attached on the photographic layer of photosensitive lithographic plate and form in the photosensitive lithographic plate manufacture method of rough layer, the temperature of the described photosensitive lithographic plate when described drop sprays is regulated in 7 ℃～37 ℃ scope, during injection the sphere diameter of drop more than 16 μ～below 40 μ.
The manufacture method of photosensitive lithographic plate, the water-based liquid of dissolving or dispersion resin is injected into fine liquid drops, fly over certain distance, statically attached on the photographic layer of photosensitive lithographic plate and when forming rough layer, the temperature of the described photosensitive lithographic plate when described drop sprays is regulated in 7 ℃～37 ℃ scope, during injection the sphere diameter of drop more than 16 μ～below 40 μ.
In the invention of claim 1 record, when water-based liquid is injected into fine droplets, the sphere diameter of the drop when spraying is reached more than 16 μ, below 40 μ, make it statically on the photographic layer attached to photosensitive lithographic plate, carry out adjustment again, the scope of the adjustment to 7 of the photosensitive lithographic plate when drop sprays ℃～37 ℃.
Like this, the sphere diameter of the drop that sprays by management and temperature two aspects of photosensitive lithographic plate, rough layer just can not peel off from photographic layer.Thus, do not pollute the surface of printed glass, and, when carrying out vacuum suction, there is not powder to stop up vacuum pump in that the photosensitive lithographic plate and the master of taking pictures are overlapped.
Below in conjunction with Fig. 1, the manufacture method of the photosensitive lithographic plate of relevant the manner is described.
The photosensitive lithographic plate 10 that has been coated with sensitization liquid is introduced in the temperature conditioning chamber 12.In this temperature conditioning chamber 12,, in the time of in arriving Taic coating device 14 described later, the surface temperature of photosensitive lithographic plate 10 is adjusted to 7 ℃～37 ℃ scope to photosensitive lithographic plate 10 winding-up cold wind.After this, utilize transfer roller 16 to be sent to moistening device 18.
Like this, by to reaching the drop L that adheres to average ball diameter 16 μ～40 μ on 7 ℃～37 ℃ the photographic layer of photosensitive lithographic plate 10 of lower temperature of temperature range, can form that the such dramatic temperature of occasion that does not have the image height temperature is shunk, incrust rough layer.Therefore, do not take place to peel off and the powder that produces by rough layer, the surface of not polluting printed glass, and overlap and when carrying out vacuum suction, also do not have powder to stop up vacuum pump at photosensitive lithographic plate and the master of taking pictures.
In addition, strip the photographic layer that has adhered to rough layer together, the problem that the film of fine image portion comes off does not take place yet, and then, several photosensitive lithographic plates when stacked, be not clipped in the slippage of extrusion coating paper therebetween, are worsening yet as the transporting property of the bunchy of photosensitive lithographic plate.
Moreover, in the occasion of positive and negative film, why change sudden distance, be because the atmosphere temperature around utilizing in sudden is adjusted the water evaporation quantity among the drop L, the sphere diameter of the drop when adhering to is changed.
Therefore, in the occasion of positive, sudden distance removes redundant moisture to 750mm, thereby concentration uprises, and as shown in Figure 2, forms the rough layer ma of so-called upright state.On the other hand, in the occasion of negative film, sudden distance is short to 600mm, can not remove redundant moisture, thereby concentration is low, as shown in Figure 3, adheres to collapsed state, forms the rough layer mb of the so-called state of droping to the ground.
Like this, according to positive or negative film, changing the shape of rough layer, is the printing ink adhesion condition when considering printing, also is the requirement that adapts to market.
On the other hand, formed the photosensitive lithographic plate 10 of rough layer m, carried out moistening with moistening device 20 uperizes that are configured in downstream side once more.And after moistening, be sent to hothouse 22, and in the heating and the internal ambience of low humidity, carry out drying, perhaps spraying blowing warm air carries out drying, is discharged to the outside with transfer roller 24 as goods.
Below, the concrete experimental example of the manufacture method of the photosensitive lithographic plate that uses relevant the manner is described.
Become the base material of aluminium sheet of the support of photosensitive lithographic plate 10, thickness is 0.24mm, and graining is carried out on the two sides, and water is fully clean.Naphthoquinones-1.2-diazido-5-sulphonic acid ester 1 parts by weight of the polyhydroxy phenol that dissolving is obtained by the polycondensation of acetone and pyrogallol in 20 parts by weight acetate (2-methoxyl second) ester and 20 parts by weight methyl ethyl ketones and line style phenol formaldehyde resin 2 parts by weight and modulate sensitization liquid, sequentially sensitization liquid is coated on the one side of this base material on one side, Yi Bian carry out drying.
Then, after making steam and the photographic layer of photosensitive lithographic plate 10 contacting about 2.5 seconds, use rotary atomizing electrostatic finishing application water-based liquid.This water-based liquid is with methyl methacrylate-ethyl acrylate-PAA (weight ratio 60: 20: 12) copolymer polymerization, and the solid formation branch concentration of water-based liquid is 10%.
Utilize the centrifugal force and the electrostatic interaction that add the cup-shaped fog-spray nozzle of cone high voltage :-80kV of cone revolution for the cup-shaped fog-spray nozzle of 17000r/min, make the water-based liquid of such concentration emit atomizing, utilize the high effect of electric field that forms between cup-shaped fog-spray nozzle and the photosensitive lithographic plate, making atomizing and charged fine droplets average ball diameter is 16 μ～40 μ, fly to the surface of photographic layer, carry out electrostatic adhesion.
After about 3 seconds,, carry out drying with 5 seconds hothouses by 60 ℃ of temperature, humidity 10% condition.Thus, the rough layer that combines securely of the solid formation branch that forms drop and photographic layer.
Utilize electron micrograph to judge the test portion of as above, making, result such as Fig. 5, Fig. 6 and shown in Figure 7, wherein, 1 among Fig. 5 is the situation of separating; Among Fig. 62 is the situations that do not have separation; The situation that base plate separates does not take place in the representative of zero among Fig. 7, and △ represents the incidence of base plate separation less than 10%, * represent the incidence of base plate separation more than 10%.
In judgement, select minimum 50 coarse positions at random, estimate its tack, according to the sum of checking out the roughness figure place of peeling off, represent the incidence of peeling off with percentage.As judging, when the drop sphere diameter of rough layer is 16 μ～40 μ,, just can form the rough layer that nothing is peeled off if the surface temperature of photosensitive lithographic plate is 7 ℃～37 ℃ from this experimental result.
Below, the manufacture process of PS version (Presensitized Plate) is described.
The PS version is to use 400 purposes upright altogether
Already 20% (weight) waterborne suspension of (パ ミ ス ト Application) system and rotation nylon bruss (nylon-6,10), to in 99.5% (weight) aluminium, contain 0.01% (weight) Cu, 0.03% (weight) Ti, 0.3% (weight) Fe, after graining was carried out on the surface of the milled sheet of the thick 0.30mm of the JIS-A1050 aluminium of 0.1% (weight) Si, water carried out cleaning fully.
Be immersed in 15% (weight) sodium hydrate aqueous solution (containing 4.5% (weight) aluminium), make the meltage of aluminium become 5g/m
2After ground carries out etching, wash with flowing water.Use 1% (weight) nitric acid to neutralize again, then in 0.7% (weight) aqueous solution of nitric acid [containing 0.5% (weight) aluminium], square wave alternating voltage (the current ratio r=0.90 of voltage 9.3V when voltage 10V, negative electrode when using anode, the current waveform of the embodiment record in the special public clear 58-5796 communique), with 160C/dm
2Anode the time electric weight carry out the electrolysis uneven surfaceization.After the washing, be immersed in 10% (weight) sodium hydrate aqueous solution of 35 ℃, make the meltage of aluminium become 1g/m
2After ground carries out etching, wash.Then, be immersed in 50 ℃ the aqueous sulfuric acid of 30% (weight), remove rough layer after, wash.
In in 20% (weight) aqueous sulfuric acid of 35 ℃, [containing 0.8% (weight) aluminium] again, use DC current, carry out porous anodized film and form processing.That is, with current density 13A/dm
2Carry out electrolysis,, make anode oxide film become 2.7g/m by regulating electrolysis time
2In order to make the negative-type photosensitive lithographic plate that uses diazo resin and bond, after this support washing, dip treating is 30 seconds in the aqueous solution of 3% (weight) sodium silicate of 70 ℃, washes then, drying.
The aluminum support of as above, making and obtaining, the reflection density of measuring with the Macbeath reflection of the concentration is 0.30, the center line average roughness Ra that stipulates in JIS B00601 is 0.58 μ m.
Then, use roll coater, be coated with 1.0% (weight) aqueous solution of methyl methacrylate/ethyl acrylate/2-acrylamide-2-methyl propane sulfonic acid sodium multipolymer (mean molecular weight about 60,000) (mol ratio 50/30/20) on above-mentioned support, making dried coating weight is 0.05g/m
2
Re-use scraping strip coating machine, be coated with following sensitization liquid, 110 ℃ of dryings 45 seconds.Drying coated amount is 2.0g/m
2
The prescription of sensitization liquid-1 is as follows:
Diazo resin-1 0.50g
Bond-1 5.00g
The brightest HS-2 of light (ス チ ラ ィ ト HS-2)
(Datong District's industry (strain) system) 0.10g
Victoria ethereal blue-BOH
(ビクトリァピュァブル-BOH) 0.15g
Tricresyl phosphate 0.50g
Pyridinedicarboxylic acid 0.20g
FC-430 (3M corporate system surfactant) 0.05g solvent
1-methoxyl-2-propyl alcohol 25.00g
Methyl lactate 12.00g
Methyl alcohol 30.00g
Methyl ethyl ketone 30.00g
Water 3.00g
Above-mentioned diazo resin-the 1st makes to obtain as following.At first, under 25 ℃ of conditions, in 96% sulfuric acid of 70ml, add 29.4g4-diazonium diphenylamine sulfate (purity 99.5%) at leisure, stirred 20 minutes.With about 10 minutes time, to wherein adding 3.26g paraformaldehyde (purity 92%) at leisure, under 30 ℃ of conditions, this potpourri was stirred 4 hours, carry out condensation reaction.In addition, the condensation mol ratio of above-mentioned diazo-compounds and formaldehyde is 1: 1.Stir this resultant of reaction on one side,, handle with the cold dense aqueous solution of dissolving 130g sodium chloride Yi Bian inject 2 liters of frozen water.Utilize suction strainer to reclaim this sediment, the dry solid of dissolving part filters in 1 premium on currency, with ice-cooled, and handles with the aqueous solution of dissolving the 23g Potassium Hexafluorophosphate.At last, filter this sediment and reclaim, carry out air-dryly, obtain diazo resin-1.
Bond-the 1st, methacrylic acid (2-hydroxyl second) ester/vinyl cyanide/methyl methacrylate/methacrylic acid copolymer (weight ratio 50/20/26/4, mean molecular weight 75000, acid content 0.4meq/g) water-insoluble, the tunicle of alkali-soluble form the property macromolecule.
The brightest HS-2 of light (ス チ ラ ィ ト HS-2) (Datong District's industry (strain) system) is the macromolecular compound higher than bond photonasty, is the multipolymer of styrene/maleic acid-4-methyl-2-pentyl ester=50/50 (mol ratio), mean molecular weight about 100000.
The effect of powder
The present invention by making drop sphere diameter and the surface temperature of photosensitive lithographic plate keep suitable relation, can prevent peeling off of rough layer, so that do not produce powder.
Description of drawings:
Fig. 1 is the synoptic diagram of expression the inventive method.
Fig. 2 is illustrated in the rough layer that forms on the photosensitive lithographic plate.
Fig. 3 is illustrated in the rough layer that forms on the photosensitive lithographic plate.
Fig. 4 is the synoptic diagram of the sudden situation of expression drop.
Fig. 5 is the synoptic diagram that the expression rough layer peels off.
Fig. 6 is the synoptic diagram that the expression rough layer peels off.
Fig. 7 is that rough layer peels off the generation counting rate meter.
Fig. 8 is the synoptic diagram of the expression photosensitive lithographic plate and the master relation of taking pictures.
The explanation of symbol
The mutually rough layer of m
The L drop
10 photosensitive lithographic plates
Claims (9)
1. the manufacture method of photosensitive lithographic plate, be injected into fine liquid drops at water-based liquid with resin, make it statically attached on the photographic layer of photosensitive lithographic plate and form in the photosensitive lithographic plate manufacture method of rough layer, it is characterized in that, the temperature of the described photosensitive lithographic plate when described drop sprays is regulated in 7 ℃～37 ℃ scope, during injection the sphere diameter of drop more than 16 μ～below 40 μ.
2. the manufacture method of photosensitive lithographic plate according to claim 1, it is characterized in that: described resin is an acrylic acid series copolymer.
3. the manufacture method of photosensitive lithographic plate according to claim 1, it is characterized in that: described resin is methyl methacrylate-ethyl acrylate-sodium acrylate copolymer.
4. according to the manufacture method of claim 1 or 2 or 3 described photosensitive lithographic plates, it is characterized in that: the solid formation branch concentration of described water-based liquid is 10%.
5. the manufacture method of photosensitive lithographic plate, it is characterized in that, the water-based liquid of dissolving or dispersion resin is injected into fine liquid drops, fly over certain distance, statically attached on the photographic layer of photosensitive lithographic plate and when forming rough layer, the temperature of the described photosensitive lithographic plate when described drop sprays is regulated in 7 ℃～37 ℃ scope, during injection the sphere diameter of drop more than 16 μ～below 40 μ.
6. the manufacture method of photosensitive lithographic plate according to claim 5, it is characterized in that: the sudden distance of described drop is 750mm.
7. the manufacture method of photosensitive lithographic plate according to claim 6, it is characterized in that: described photosensitive lithographic plate is the positive type.
8. the manufacture method of photosensitive lithographic plate according to claim 5, it is characterized in that: the sudden distance of described drop is 600mm.
9. the manufacture method of photosensitive lithographic plate according to claim 8, it is characterized in that: described photosensitive lithographic plate is a negative-type.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP040128/2000 | 2000-02-17 | ||
| JP2000040128A JP2001228601A (en) | 2000-02-17 | 2000-02-17 | Method for producing photosensitive planographic printing plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1309331A true CN1309331A (en) | 2001-08-22 |
| CN1193267C CN1193267C (en) | 2005-03-16 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB01102657XA Expired - Fee Related CN1193267C (en) | 2000-02-17 | 2001-02-07 | Method for mfg. photosensitive lithographic plate |
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| Country | Link |
|---|---|
| JP (1) | JP2001228601A (en) |
| CN (1) | CN1193267C (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105361923A (en) * | 2010-08-27 | 2016-03-02 | Ekos公司 | Method and apparatus for treatment of intracranial hemorrhages |
| CN107107633A (en) * | 2014-11-20 | 2017-08-29 | 东丽株式会社 | The manufacture method of printed article |
| CN110702500A (en) * | 2019-11-15 | 2020-01-17 | 西安工程大学 | Micro-droplet debonding test fixture |
| US10656025B2 (en) | 2015-06-10 | 2020-05-19 | Ekos Corporation | Ultrasound catheter |
| US10926074B2 (en) | 2001-12-03 | 2021-02-23 | Ekos Corporation | Catheter with multiple ultrasound radiating members |
| US11672553B2 (en) | 2007-06-22 | 2023-06-13 | Ekos Corporation | Method and apparatus for treatment of intracranial hemorrhages |
| US11925367B2 (en) | 2007-01-08 | 2024-03-12 | Ekos Corporation | Power parameters for ultrasonic catheter |
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| CN105709987A (en) * | 2016-04-16 | 2016-06-29 | 长葛市汇达感光材料有限公司 | Photosensitive material coater with preheating device |
| CN105709970A (en) * | 2016-04-20 | 2016-06-29 | 长葛市汇达感光材料有限公司 | Coating device with stabilizing room for photosensitive material plates |
| CN105709998A (en) * | 2016-04-21 | 2016-06-29 | 长葛市汇达感光材料有限公司 | Light-sensitive material coating machine with polishing device |
-
2000
- 2000-02-17 JP JP2000040128A patent/JP2001228601A/en active Pending
-
2001
- 2001-02-07 CN CNB01102657XA patent/CN1193267C/en not_active Expired - Fee Related
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10926074B2 (en) | 2001-12-03 | 2021-02-23 | Ekos Corporation | Catheter with multiple ultrasound radiating members |
| US11925367B2 (en) | 2007-01-08 | 2024-03-12 | Ekos Corporation | Power parameters for ultrasonic catheter |
| US11672553B2 (en) | 2007-06-22 | 2023-06-13 | Ekos Corporation | Method and apparatus for treatment of intracranial hemorrhages |
| CN105361923A (en) * | 2010-08-27 | 2016-03-02 | Ekos公司 | Method and apparatus for treatment of intracranial hemorrhages |
| CN105361923B (en) * | 2010-08-27 | 2018-02-02 | Ekos公司 | For treating the method and apparatus intracranialed hemorrhage |
| US10888657B2 (en) | 2010-08-27 | 2021-01-12 | Ekos Corporation | Method and apparatus for treatment of intracranial hemorrhages |
| CN107107633A (en) * | 2014-11-20 | 2017-08-29 | 东丽株式会社 | The manufacture method of printed article |
| CN107107633B (en) * | 2014-11-20 | 2020-03-27 | 东丽株式会社 | Method for manufacturing printed matter |
| US10656025B2 (en) | 2015-06-10 | 2020-05-19 | Ekos Corporation | Ultrasound catheter |
| US11740138B2 (en) | 2015-06-10 | 2023-08-29 | Ekos Corporation | Ultrasound catheter |
| CN110702500A (en) * | 2019-11-15 | 2020-01-17 | 西安工程大学 | Micro-droplet debonding test fixture |
| CN110702500B (en) * | 2019-11-15 | 2023-04-18 | 西安工程大学 | Micro-droplet debonding test fixture |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2001228601A (en) | 2001-08-24 |
| CN1193267C (en) | 2005-03-16 |
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