CN1306099A - Process for preparing surface plasma resonance response chip by wet chemical method - Google Patents

Process for preparing surface plasma resonance response chip by wet chemical method Download PDF

Info

Publication number
CN1306099A
CN1306099A CN 00133099 CN00133099A CN1306099A CN 1306099 A CN1306099 A CN 1306099A CN 00133099 CN00133099 CN 00133099 CN 00133099 A CN00133099 A CN 00133099A CN 1306099 A CN1306099 A CN 1306099A
Authority
CN
China
Prior art keywords
slide
spr
response chip
clean
immerse
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN 00133099
Other languages
Chinese (zh)
Other versions
CN1166812C (en
Inventor
金永东
董绍俊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Changchun Institute of Applied Chemistry of CAS
Original Assignee
Changchun Institute of Applied Chemistry of CAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Changchun Institute of Applied Chemistry of CAS filed Critical Changchun Institute of Applied Chemistry of CAS
Priority to CNB001330993A priority Critical patent/CN1166812C/en
Publication of CN1306099A publication Critical patent/CN1306099A/en
Application granted granted Critical
Publication of CN1166812C publication Critical patent/CN1166812C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Chemically Coating (AREA)

Abstract

A wet and chemical process for preparing surface plasma resonance (SPR) response substrate is disclosed. The self-assembled single-layer film of nm gold particles on aminopropyl trimethoxysilane modified glass chip is used as catalysis template. The chlorauri acid/oxyammonia is used as chemical gold-plating liquid. The uniform plating can be controlled in nm class by controlling reaction time and shaking the plating liquid. Its advantages are high responsibility and repeatability.

Description

The wet chemical preparation method of surface plasma resonance response chip
The invention belongs to the wet chemical preparation method of surface plasma resonance response chip.
(surface plasmon resonance, SPR) spectrum is a kind of strong research tool of on-the-spot real-time characterization solid/liquid interfaces to surface plasma body resonant vibration.Because SPR specific refractory power and variation in thickness to its boundary material in the hundreds of nanometer range is very responsive, in the more than ten years in the past, the SPR technology is used widely as a kind of interface analysis means.It not only can be used to measure the optical characteristics of SPR on the metallic film, and can study formation and the physical property that the surface is adsorbed film and molecule, for example effects such as the absorption of LB film, gas molecule and protein adsorption, simultaneously can also provide interactional dynamic information between liquid phase molecule and the surperficial fixed molecule, as part one acceptor interaction, Study on biocompatibility, drug screening, DNA hybridization or the like.Especially the release of the early 1990s BIAcore SPR commodity instrument, make the SPR technology as a kind of need not mark, directly, in real time, the biomolecular interaction analysis means of original position, and be used widely in field of biology.Aspect chemical, the SPR technology also has been used to LB film, self-organized film, interaction of biomacromolecules and electrochemistry SPR research.The key of SPR technology is that the thickness that needs preparation to be deposited on the thin slide is the golden film (or other precious metal) of 45-60 nanometer, in order to the excitating surface plasmon.Up to the present, nearly all SPR response chip all is to obtain by vacuum evaporation (or ion sputtering) dry method.This not only needs expensive vacuum evaporation system, and during operational cost, simultaneously the pattern and the thickness wayward (Pamela A.Mosier-Bossand Steven H.Lieberman, Applied Spectroscopy.1999,53,867.) of film.In addition, in order to improve the adhesive power between gold or other precious metal and the slide, often need first evaporation one deck chromium (or other metal) before the gold evaporation film.Because the electrochemistry of chromium is polluted, this has brought unfavorable factor for again electrochemistry SPR research.
The wet chemical preparation method that the purpose of this invention is to provide a kind of surface plasma resonance response chip.This method is at first based on the self-assembly of golden nanometer particle on TSL 8330 (APTMS) modification slide, be catalytic templating with this nanoparticle unitary film then, by the even growth of electroless plating technology at nanoscale scope inner control gold film, reach required pattern and thickness, thereby obtain good spr signal response.This legal system is equipped with the SPR response chip fully based on solution, and not only cost is low, simple to operate, and good, the favorable reproducibility of the substrate that makes response, is easy to popularize use in general wet-chemical laboratory.
We have used particle diameter to be about the golden nanometer particle of 2.5 nanometers as the nucleation site among the present invention, on the slide that APTMS modifies, form a fine and close individual layer film of nanoparticles by self-assembly, control the golden film surface coverage that electroless plating subsequently increases with this, and, make golden film in conjunction with more firm so as to improving bond strength amino in gold and the TSL 8330 molecule.Subsequently, control the concentration and the plated film time of chemical gold plating liquid, can under room temperature, control the thickness of gold-plated film in the nanoscale scope.In addition,, can prevent golden film island growth effectively, thereby golden film is evenly being increased along slide normal direction last layer one deck by agitation of solutions, final obtain definition intact, surfaceness is greatly about the even golden film of 2-3nm.
The present invention will approach slide glass earlier through the chromic acid lotion soaked overnight, and be 3: 1 dense H 70 ℃ volume ratio 2SO 4/ 30%H 2O 2After soaking 10-30min in the mixing solutions, clean with deionized water and spectroscopically pure methanol rinse, immerse then and carry out the processing of slide silanization in the 4-8ml methanol solution that contains the 0.4-0.8ml TSL 8330 after 12-18 hour, take out the slide of silanization, clean with methanol rinse, and immerse immediately with Trisodium Citrate reduction preparation, average particulate diameter is about in the gold sol of 2.0-3.0nm, assembled 12-18 hour.Take out slide, promptly immerse after washing is clean in the gold plating liquid that 4-8ml contains the hydrochloro-auric acid that oxyammonia that concentration is 0.1-1mM and concentration is 0.05-0.15%, evenly shake, the room temperature controlling reaction time can obtain the spr signal response chip of golden film thickness at 45-60nm at 10 ± 1min.The atomic force microscope pattern characterizes and shows that the surface definition of golden film is intact, and surfaceness is about 2-3 nanometer.
The SPR response chip of the present invention's preparation is fully based on solution, and is easy and simple to handle, favorable reproducibility, and the dried preparation when desirable cost lattice costliness, operational cost, carrying out SPR research for the wet-chemical laboratory provides to make things convenient for a shortcut.Because the golden film of this method preparation combines firmly with slide, and does not have the pollution of chromium,, help to promote the development of electrochemistry SPR for the electrochemistry SPR research of rising provides convenience.In addition, this method is owing to have the ability that evenly increases at nanoscale scope inner control gold film, and method is not subjected to the restriction of substrate shape, size etc., therefore has certain universality, can be used as class methods, be used to make electrochemistry, self-assembly and SPR response chip.
Embodiment provided by the invention is as follows: embodiment 1: get once chromic acid lotion, 3: 1 dense H 2SO 4/ 30%H 2O 2The slide that mixing solutions embathed, further handle through the APTMS silanization, after gold sol soaks self-assembly, immersing 6ml immediately contains in the gold plating liquid that oxyammonia that concentration is 0.4mM and concentration are 0.1% hydrochloro-auric acid, under the situation of evenly shaking, in room temperature controlling reaction time 9 minutes, promptly obtain the intact spr signal response chip of definition that golden film thickness is equivalent to 45nm.
Embodiment 2: get once chromic acid lotion, 3: 1 dense H 2SO 4/ 30%H 2O 2The slide that mixing solutions embathed, further handle through the APTMS silanization, after gold sol soaks self-assembly, immersing 6ml immediately contains in the gold plating liquid that oxyammonia that concentration is 0.4mM and concentration are 0.1% hydrochloro-auric acid, under the situation of evenly shaking, in room temperature controlling reaction time 11 minutes, can obtain the intact spr signal response chip of definition that golden film thickness is equivalent to 60nm.
Embodiment 3: get the spr signal response chip that a slice adopts the inventive method preparation, it as working electrode, is immersed 0.1MH 2SO 4In the aqueous solution, in-0.2-+1.4V potential range, carry out the cyclic voltammetric electrochemistry experiment, can obtain classical cyclic voltammetric rational curve pollution-free, that definition is intact with the 0.1V/s sweep velocity, and continuous electric bit scan 30min, curve shape is stable, shows that golden film has electrochemical stability.Embodiment 4: get the spr signal response chip that a slice adopts the inventive method preparation, be used for the small molecules system, as the self-assembly SPR sign of 2mM p-Mercaptoaniline ethanolic soln.Before and after the assembling, 0.15 ° angle has taken place and has changed in the SPR angle, and the peak height of SPR curve and peak width have no significant change, and coincide with notional result.The spr signal response chip that shows this method preparation can be further used for self-assembly SPR research fully.

Claims (1)

1, a kind of wet chemical preparation method of surface plasma resonance response chip is characterized in that thin slide glass through the chromic acid lotion soaked overnight, and is 3: 1 dense H 70 ℃ volume ratio 2SO 4/ 30%H 2O 2After soaking 10-30min in the mixing solutions, clean with deionized water and spectroscopically pure methanol rinse, immerse then and carry out the processing of slide silanization in the 4-8ml methanol solution that contains the 0.4-0.8ml TSL 8330 after 12-18 hour, take out the slide of silanization, clean with methanol rinse, and immerse with Trisodium Citrate reduction preparation immediately, average particulate diameter is about in the gold sol of 2.0-3.0nm, assembled 12-18 hour, take out slide, promptly immerse after washing is clean in the gold plating liquid that 4-8ml contains the hydrochloro-auric acid that oxyammonia that concentration is 0.1-1mM and concentration is 0.05-0.15%, evenly shake, the room temperature controlling reaction time obtains the spr signal response chip of golden film thickness at 45-60nm at 10 ± 1min.
CNB001330993A 2000-11-14 2000-11-14 Process for preparing surface plasma resonance response chip by wet chemical method Expired - Fee Related CN1166812C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNB001330993A CN1166812C (en) 2000-11-14 2000-11-14 Process for preparing surface plasma resonance response chip by wet chemical method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNB001330993A CN1166812C (en) 2000-11-14 2000-11-14 Process for preparing surface plasma resonance response chip by wet chemical method

Publications (2)

Publication Number Publication Date
CN1306099A true CN1306099A (en) 2001-08-01
CN1166812C CN1166812C (en) 2004-09-15

Family

ID=4595537

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB001330993A Expired - Fee Related CN1166812C (en) 2000-11-14 2000-11-14 Process for preparing surface plasma resonance response chip by wet chemical method

Country Status (1)

Country Link
CN (1) CN1166812C (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1239286A2 (en) * 2001-03-02 2002-09-11 Hitachi, Ltd. Biochemical sensors, methods for their manufacture and biochemical methods and systems for testing substances of interest
CN1317424C (en) * 2003-11-25 2007-05-23 中国科学院化学研究所 Preparation process for coating gold by the aid of microwave
CN103451633A (en) * 2012-06-04 2013-12-18 新加坡银嘉科技有限公司 Method of forming and immobilizing metal nanoparticles on substrates and the use thereof
CN108906041A (en) * 2018-07-24 2018-11-30 上海理工大学 A kind of preparation method for the single layer golden film can be used for photocatalytic degradation 4- nitrophenol

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1239286A2 (en) * 2001-03-02 2002-09-11 Hitachi, Ltd. Biochemical sensors, methods for their manufacture and biochemical methods and systems for testing substances of interest
EP1239286A3 (en) * 2001-03-02 2002-10-02 Hitachi, Ltd. Biochemical sensors, methods for their manufacture and biochemical methods and systems for testing substances of interest
CN1317424C (en) * 2003-11-25 2007-05-23 中国科学院化学研究所 Preparation process for coating gold by the aid of microwave
CN103451633A (en) * 2012-06-04 2013-12-18 新加坡银嘉科技有限公司 Method of forming and immobilizing metal nanoparticles on substrates and the use thereof
CN103451633B (en) * 2012-06-04 2016-08-24 新加坡银嘉科技有限公司 A kind of preparation and the method for immobilized metal nanoparticle and application thereof on matrix
CN108906041A (en) * 2018-07-24 2018-11-30 上海理工大学 A kind of preparation method for the single layer golden film can be used for photocatalytic degradation 4- nitrophenol
CN108906041B (en) * 2018-07-24 2021-07-13 上海理工大学 Preparation method of single-layer gold film for photocatalytic degradation of 4-nitrophenol

Also Published As

Publication number Publication date
CN1166812C (en) 2004-09-15

Similar Documents

Publication Publication Date Title
Zhang et al. Periodic porous alloyed Au–Ag nanosphere arrays and their highly sensitive SERS performance with good reproducibility and high density of hotspots
US5609907A (en) Self-assembled metal colloid monolayers
US7776425B2 (en) Nanoparticle coated nanostructured surfaces for detection, catalysis and device applications
Hrapovic et al. New strategy for preparing thin gold films on modified glass surfaces by electroless deposition
CN101832933B (en) Method for enhancing Raman spectrum by using shell isolated nano particles
EP1248672A1 (en) Hydroxylamine seeding of colloidal metal nanoparticles
CN108872192B (en) SERS unit and SERS system
CN102285629A (en) Preparation method for surface-enhanced Raman spectrum active substrate
Hu et al. Novel plating solution for electroless deposition of gold film onto glass surface
WO1998010289A9 (en) Self-assembled metal colloid monolayers
CN107084968A (en) A kind of method that utilization molecular template Contrast agent lifts SERS substrate detection sensitivities
CN102590179A (en) Silver nano lattice surface enhanced raman active substrate and preparation method thereof
CN104259475A (en) Preparation method of nano-silver/graphene derivative surface enhanced Raman substrate
CN101919080A (en) Substrate manufacturing method for sensor applications using optical characteristics and the substrate therefrom
CN107043929B (en) A method of the coat of metal is generated in atomic force microscope probe surface zone of control
CN1166812C (en) Process for preparing surface plasma resonance response chip by wet chemical method
Ye et al. Surfactant-free and controllable synthesis of hierarchical platinum nanostructures and their comparative studies in electrocatalysis, surface-enhanced Raman scattering and surface wettability
CN108613959B (en) SERS chip and preparation method thereof
Bhuvana et al. A SERS‐Active Nanocrystalline Pd Substrate and its Nanopatterning Leading to Biochip Fabrication
Shakila et al. Preparation of gold nanoislands on various functionalized polymer-modified glass and ITO for electrochemical characterization of monolayer assembly of alkanethiols
CN104625043A (en) Gold-rhodium hollow nanocomposite and preparing method thereof
Huang et al. Microwave-assisted deposition of uniform thin gold film on glass surface
CN1317424C (en) Preparation process for coating gold by the aid of microwave
CN108645833A (en) A kind of preparation of SERS chips and regeneration method
Huang et al. Fabrication of a nano-scale gap by selective chemical deposition

Legal Events

Date Code Title Description
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C06 Publication
PB01 Publication
C14 Grant of patent or utility model
GR01 Patent grant
REG Reference to a national code

Ref country code: HK

Ref legal event code: GR

Ref document number: 1073136

Country of ref document: HK

C19 Lapse of patent right due to non-payment of the annual fee
CF01 Termination of patent right due to non-payment of annual fee