CN1305789C - Mould for forming optical elements and the optical elements - Google Patents
Mould for forming optical elements and the optical elements Download PDFInfo
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- CN1305789C CN1305789C CNB2004100033694A CN200410003369A CN1305789C CN 1305789 C CN1305789 C CN 1305789C CN B2004100033694 A CNB2004100033694 A CN B2004100033694A CN 200410003369 A CN200410003369 A CN 200410003369A CN 1305789 C CN1305789 C CN 1305789C
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- base material
- optical element
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- 230000003287 optical effect Effects 0.000 title claims description 79
- 239000000463 material Substances 0.000 claims abstract description 102
- 239000013078 crystal Substances 0.000 claims abstract description 66
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 30
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 28
- 239000000956 alloy Substances 0.000 claims abstract description 28
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims abstract description 23
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims abstract description 22
- 229910010271 silicon carbide Inorganic materials 0.000 claims abstract description 20
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 11
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052741 iridium Inorganic materials 0.000 claims abstract description 8
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 8
- 239000010937 tungsten Substances 0.000 claims abstract description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 7
- 150000001875 compounds Chemical class 0.000 claims abstract description 7
- 229910052762 osmium Inorganic materials 0.000 claims abstract description 5
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052702 rhenium Inorganic materials 0.000 claims abstract description 5
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims abstract description 5
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 4
- 229910052707 ruthenium Inorganic materials 0.000 claims abstract description 4
- 229910052751 metal Inorganic materials 0.000 claims description 103
- 239000002184 metal Substances 0.000 claims description 103
- 238000007493 shaping process Methods 0.000 claims description 89
- 238000000034 method Methods 0.000 claims description 52
- 239000011651 chromium Substances 0.000 claims description 48
- 150000004767 nitrides Chemical class 0.000 claims description 46
- 229910052804 chromium Inorganic materials 0.000 claims description 34
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 32
- 230000015572 biosynthetic process Effects 0.000 claims description 32
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 28
- 239000007769 metal material Substances 0.000 claims description 25
- 239000010936 titanium Substances 0.000 claims description 23
- 229910052719 titanium Inorganic materials 0.000 claims description 21
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 19
- 229910052757 nitrogen Inorganic materials 0.000 claims description 13
- 229910052750 molybdenum Inorganic materials 0.000 claims description 9
- 239000011733 molybdenum Substances 0.000 claims description 9
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 8
- 229910052782 aluminium Inorganic materials 0.000 claims description 8
- 239000004411 aluminium Substances 0.000 claims description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 8
- 238000007598 dipping method Methods 0.000 claims description 8
- 239000010410 layer Substances 0.000 abstract description 188
- 238000000465 moulding Methods 0.000 abstract description 12
- 239000002344 surface layer Substances 0.000 abstract description 5
- 239000000126 substance Substances 0.000 abstract description 3
- 239000011521 glass Substances 0.000 abstract 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 abstract 1
- 230000000052 comparative effect Effects 0.000 description 27
- CXOWYMLTGOFURZ-UHFFFAOYSA-N azanylidynechromium Chemical compound [Cr]#N CXOWYMLTGOFURZ-UHFFFAOYSA-N 0.000 description 18
- 239000010970 precious metal Substances 0.000 description 17
- 229910000566 Platinum-iridium alloy Inorganic materials 0.000 description 16
- 230000003647 oxidation Effects 0.000 description 16
- 238000007254 oxidation reaction Methods 0.000 description 16
- HWLDNSXPUQTBOD-UHFFFAOYSA-N platinum-iridium alloy Chemical compound [Ir].[Pt] HWLDNSXPUQTBOD-UHFFFAOYSA-N 0.000 description 16
- 238000003466 welding Methods 0.000 description 16
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 8
- 239000012530 fluid Substances 0.000 description 8
- 238000005507 spraying Methods 0.000 description 8
- 238000004544 sputter deposition Methods 0.000 description 8
- 238000007747 plating Methods 0.000 description 7
- 238000005245 sintering Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- 229910000691 Re alloy Inorganic materials 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 229910010037 TiAlN Inorganic materials 0.000 description 4
- YEWLVPDHCCERJH-UHFFFAOYSA-N [Re].[Ir] Chemical compound [Re].[Ir] YEWLVPDHCCERJH-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 238000002425 crystallisation Methods 0.000 description 4
- 230000008025 crystallization Effects 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000007921 spray Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 239000004567 concrete Substances 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- SJKRCWUQJZIWQB-UHFFFAOYSA-N azane;chromium Chemical compound N.[Cr] SJKRCWUQJZIWQB-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000008676 import Effects 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 239000011378 shotcrete Substances 0.000 description 2
- 238000005382 thermal cycling Methods 0.000 description 2
- 229910017083 AlN Inorganic materials 0.000 description 1
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- 229910000929 Ru alloy Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- UFGZSIPAQKLCGR-UHFFFAOYSA-N chromium carbide Chemical compound [Cr]#C[Cr]C#[Cr] UFGZSIPAQKLCGR-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000009684 ion beam mixing Methods 0.000 description 1
- CJTCBBYSPFAVFL-UHFFFAOYSA-N iridium ruthenium Chemical compound [Ru].[Ir] CJTCBBYSPFAVFL-UHFFFAOYSA-N 0.000 description 1
- UNASZPQZIFZUSI-UHFFFAOYSA-N methylidyneniobium Chemical compound [Nb]#C UNASZPQZIFZUSI-UHFFFAOYSA-N 0.000 description 1
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 1
- -1 molybdenum nitrides Chemical class 0.000 description 1
- 150000002829 nitrogen Chemical class 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- DBJYYRBULROVQT-UHFFFAOYSA-N platinum rhenium Chemical compound [Re].[Pt] DBJYYRBULROVQT-UHFFFAOYSA-N 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 229910003468 tantalcarbide Inorganic materials 0.000 description 1
- 229910003470 tongbaite Inorganic materials 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
- C03B11/086—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/10—Die base materials
- C03B2215/11—Metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/10—Die base materials
- C03B2215/12—Ceramics or cermets, e.g. cemented WC, Al2O3 or TiC
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
- C03B2215/16—Metals or alloys, e.g. Ni-P, Ni-B, amorphous metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
- C03B2215/16—Metals or alloys, e.g. Ni-P, Ni-B, amorphous metals
- C03B2215/17—Metals or alloys, e.g. Ni-P, Ni-B, amorphous metals comprising one or more of the noble meals, i.e. Ag, Au, platinum group metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/30—Intermediate layers, e.g. graded zone of base/top material
- C03B2215/31—Two or more distinct intermediate layers or zones
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/30—Intermediate layers, e.g. graded zone of base/top material
- C03B2215/32—Intermediate layers, e.g. graded zone of base/top material of metallic or silicon material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/30—Intermediate layers, e.g. graded zone of base/top material
- C03B2215/34—Intermediate layers, e.g. graded zone of base/top material of ceramic or cermet material, e.g. diamond-like carbon
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
Abstract
The die is comprised of a die base material consisting of a sintered hard alloy or silicon carbide, a surface layer formed on the surface of the die base material and brought into contact with a glass material in press molding, and an intermediate layer formed between the die base material and the surface layer. The surface layer is formed from at least one element selected from among platinum, palladium, iridium, osmium, ruthenium, and rhenium or an alloy or compound containing these elements. The intermediate layer has a surface base material layer which consists of at least a substance selected from among tungsten, carbon, tungsten carbide, and silicon carbide, is in an amorphous state or in a crystalline state with a crystal grain diameter smaller than that of the substance constituting the die base material, and is brought into contact with the surface of the die base material.
Description
Technical field
The present invention relates to carry out the mould that the optical element shaping usefulness of optical elements such as lens, prism is made in drawing with frit, and the optical element that forms therefrom.
Background technology
In recent years, as this method, the punching formation that uses shaping dies is arranged with frit manufacturing optical element.Use this manufacture method,, have and to make advantages of optical components in simple and inexpensive ground owing to do not need attrition process.In the past, this mould that is used for the optical element shaping usefulness of drawing is being carried out all research, so that its forming face that contacts with frit in forming process can keep the roughness on surface, thereby it can be used for the shaping of optical element for a long time always.
That is, the mould of this optical element shaping usefulness has mold base material, layer of precious metal and middle layer.Mold base material is made as superhard alloy and sintering metal that the adhesives sintering forms with metallic substance such as chromium, titaniums; Layer of precious metal directly contacts with frit in the process of making optical element; The middle layer is at mold base material and layer of precious metal intermediate formation (for example, seeing also the special public clear 62-28093 communique of patent documentation).
Layer of precious metal forms with precious metal materials such as platinum, iridium, is used for preventing the welding of frit.In addition, the middle layer is to select more than one material to form from following various materials: titanium nitride, chromium carbide, titanium carbide, niobium carbide, tantalum carbide, silicon carbide, aluminum oxide, zirconium, titanium, chromium.
Forming the above-described purpose that contains the middle layer of metallic substance such as titanium, chromium, is that the metal ingredient that prevents from the mold base material to be contained is separated out to the forming face direction.In addition, form the purpose in this middle layer, improve the bonding force of mold base material and layer of precious metal in addition, prevent that layer of precious metal from peeling off, and the thermal cycling stresses when relaxing drawing, the increase of shaping surface roughness suppressed.
, in the mould of above-mentioned optical element shaping usefulness in the past, the middle layer is with the compound formation that contains metallic substance such as titanium, chromium.Like this, carrying out repeatedly in the process of drawing, metallic substance can promptly be separated out on the surface of layer of precious metal on forming face, and the such problem of frit welding can take place.In addition, the oxygen of trace can be invaded the inside in middle layer from layer of precious metal, also has the oxygen of above-mentioned trace can make the middle layer oxidation, reduces the problem of bonding force.
Also have, the heat during owing to drawing can make the metallic substance oxidation of separating out also can produce uneven grain growing on the forming face of layer of precious metal, so the problem that also exists the surfaceness of forming face to increase gradually on forming face.From above these facts as can be known, owing to carry out drawing repeatedly, the surface accuracy that the optical element of formed thereby will take place descends, and since the adhesion of frit and can not the demoulding etc. unfavorable condition.
In addition, after processes such as the inventor studied intensively, the heat when having understood owing to drawing made the forming face of layer of precious metal produce the major cause of inhomogeneous crystalline growth.
That is, discoveries such as the inventor, the increase of the forming face roughness that in the process of shaping optical element, is produced, relevant with film forming crystalline state on the forming face of middle layer and layer of precious metal.In addition, also find precious metal materials such as the platinum of formation upper layer, iridium, the influence of the crystal orientation of the middle layer that be subjected under it, forming and each crystal grain of mold base material.Find also, in the middle layer, use under the situation of metallic substance such as titanium, chromium that the crystal orientation separately of the crystal grain in middle layer will be subjected to the influence of crystal orientation of each crystal grain of the mold base material under it.
Therefore, from foregoing as can be known, use diameter to form the middle layer than the also big crystal grain of crystal grain diameter of the material that constitutes mold base material, and form with precious metal material under the situation in middle layer, each crystalline crystal orientation of layer of precious metal, be subjected to middle layer itself each crystal grain crystal orientation and across the influence of the crystal orientation of each crystal grain of the mold base material in middle layer.In addition, find also that in the process of drawing, the crystal grain of each mold base material makes the speed of grain growing and oxidation owing to being heated, the degree of carrying out has nothing in common with each other.
The inventor etc. are from above two point discoveries, the crystalline growth of each mother metal crystal grain and oxidation rate, carry out degree, give the layer of precious metal influence that each crystallization has nothing in common with each other respectively, because each crystalline crystalline growth and oxidation rate of layer of precious metal, carry out degree and have nothing in common with each other, will produce uneven crystalline growth etc., and cause the roughness of forming face to increase.
Summary of the invention
The present invention puts forward in view of above-mentioned situation, its objective is, provide a kind of when being shaped optical element repeatedly with drawing, prevent the increase of forming face surfaceness, can process the mould of the optical element shaping usefulness of the very high optical element of surface accuracy, and the optical element that forms with this mould.
For achieving the above object, the present invention proposes following various means.
A first aspect of the present invention is a kind of mould of optical element shaping usefulness, it is to be the frit drawing mould of the optical element shaping usefulness of used for optical elements such as lens, prism, it is characterized in that it has following each several part: the mold base material made from agglomerating superhard alloy or silicon carbide; On the surface of above-mentioned mold base material, form the upper layer that in the process of drawing, contacts with above-mentioned frit; And, the middle layer that between above-mentioned mold base material and upper layer, forms.Above-mentioned upper layer is that at least a element of selecting from following column element forms: platinum, palladium, iridium, osmium, ruthenium, rhenium, or by the alloy that contains these elements, compound formation.Above-mentioned middle layer has the mother metal upper layer, and it is by non-grains attitude, or by the crystal grain diameter grain formation crystalline state littler than the crystal grain diameter that constitutes above-mentioned mold base material, at least a material in tungsten, carbon, wolfram varbide, the silicon carbide constitutes.Above-mentioned mother metal upper layer contacts with the surface of above-mentioned mold base material.
Mould according to optical element shaping usefulness of the present invention, why the mother metal upper layer forms non-grains attitude, perhaps forming by the crystal grain diameter grain formation crystalline state littler than the crystal grain diameter that constitutes above-mentioned mold base material, is because will not allow the different crystal orientation of each crystal grain of mold base material that upper layer is exerted an influence in the process of drawing.
This point discovery in people's the research according to the present invention as described hereinbefore puts forward; promptly; when the middle layer is when forming under the crystalline state that the crystal grain also bigger than the crystal grain of the material that constitutes mold base material by crystal grain constitutes; the crystal orientation in upper layer and middle layer can be subjected to the influence of the crystal orientation of each crystal grain in the mold base material; thereby when becoming the mould of heating optical element shaping usefulness in the process of drawing, the forming face roughness cause of increased of the upper layer that discovery contacts with frit.
Therefore, under situation according to formation of the present invention, even owing to the mold heated to optical element shaping usefulness makes the crystallization in the mold base material growth and oxidation take place, can not allow the crystal grain of mold base material and the influence of grain boundary involve upper layer yet, thereby can prevent the increase of the forming face roughness that contacts with frit.
The mould of the optical element shaping usefulness that a second aspect of the present invention put forward is in the mould of the optical element shaping usefulness that first aspect is put down in writing, and also has such feature, that is, the diameter of the crystal grain of above-mentioned crystalline state is below 2 μ m.
According to the mould of the optical element shaping usefulness of this invention, the diameter of the crystal grain of mother metal upper layer why will be below 2 μ m, are because the superhard alloy that forms with sintering, and the perhaps crystal grain diameter of the mold base material made of silicon carbide is at least greater than 2 μ m.
The mould of the optical element shaping usefulness that a third aspect of the present invention put forward, be first or the mould of the optical element shaping usefulness put down in writing of second aspect in, also has such feature, promptly, above-mentioned middle layer also has between above-mentioned mother metal upper layer and above-mentioned upper layer, the metal level that is made of at least a metallic substance in chromium, titanium, aluminium, the molybdenum.
Mould according to the optical element shaping usefulness of this invention, owing between mother metal upper layer and upper layer, formed the metal level that constitutes by at least a metallic substance in chromium, titanium, aluminium, the molybdenum, sufficient bonding force can be obtained, the stress that when drawing, produces can also be relaxed simultaneously owing to thermal cycling.Therefore, even carry out drawing repeatedly, also can prevent peeling off of upper layer reliably.
The mould of the optical element shaping usefulness that a fourth aspect of the present invention put forward, be in the mould of the optical element shaping usefulness that the third aspect is put down in writing, also has such feature, promptly, above-mentioned middle layer also has between above-mentioned metal level and above-mentioned upper layer, the nitride layer that is made of the nitride that contains at least a metallic substance in chromium, titanium, aluminium, the molybdenum.
Mould according to the optical element shaping usefulness of this invention, because with such formed nitride layers of nitride such as chromium nitride, titanium nitride, aluminium nitride, TiAlN, molybdenum nitrides, have good resistance toheat and oxidation resistent susceptibility, so, even carry out drawing repeatedly, also can prevent the inside of block from the forming face intrusion middle layer of upper layer.Like this, oxygen does not just arrive by formed metal levels such as chromium and titaniums, thereby can prevent that oxidation owing to metal level from causing the decline of bonding force.Therefore, can in long-time, prevent peeling off of upper layer.
In addition, because this nitride layer is very stable compound, so metallic substance such as the titanium of metal level, chromium can not separated out on the forming face of upper layer.Therefore, can prevent from the roughness of forming face to be increased, can also prevent that the frit welding is on forming face in the stamping process simultaneously owing to the oxidation of the metallic substance of separating out.
The mould of the optical element shaping usefulness that a fifth aspect of the present invention put forward, be in the mould of the optical element shaping usefulness that fourth aspect is put down in writing, also have such feature, that is, above-mentioned nitride layer has the nitrogen concentration of element dipping bed that the concentration of nitrogen element reduces gradually towards above-mentioned metal level.
Mould according to the optical element shaping usefulness of this invention, because the nitride layer that constitutes with nitrogen compound, not obvious with border with the metal level of the metallic substance formation of nonnitrogenous element, so, even the temperature of drawing rises, nitride layer can not strip down from metal level yet.Therefore, upper layer can not come out, and can prevent reliably that the forming face roughness of upper layer from increasing.
A sixth aspect of the present invention has proposed a kind of optical element, it is characterized in that, its uses the mould of the optical element shaping usefulness of being put down in writing in first aspect present invention, is shaped and is made by frit.
As mentioned above, according to a first aspect of the present invention, owing to formed by non-crystal grain, or it is formed by the crystal grain diameter crystal grain littler than the crystal grain diameter that constitutes mold base material, the mother metal upper layer that at least a material in tungsten, carbon, wolfram varbide, the silicon carbide constitutes, allow it contact, can prevent that the roughness of the forming face of the upper layer that contacts with frit from increasing, thereby can make the high optical element of surface accuracy with mold base material.
In addition, according to a second aspect of the present invention, because the crystal grain diameter that makes the mother metal upper layer below 2 μ m, is subjected to the influence of the different crystal orientations of each crystal grain of mold base material so can prevent upper layer reliably.
In addition, according to a third aspect of the present invention, because between mother metal upper layer and upper layer, also has the metal level that constitutes by at least a metallic substance in chromium, titanium, aluminium, the molybdenum, so carrying out repeatedly in the process of drawing, the welding of the frit that causes owing to peeling off of upper layer can be prevented reliably, thereby the high optical element of surface accuracy can be made.
In addition, according to a fourth aspect of the present invention, because between metal level and upper layer, formed the nitride layer that forms by titanium or chromium, in the process of drawing, except preventing the frit welding on the forming face, can also prevent to reduce bonding force, thereby can in long-time, make the high optical element of surface accuracy owing to the oxidation of the metallic substance that forms metal level.
In addition, according to a fifth aspect of the present invention,, increase so can prevent the roughness of the forming face of upper layer reliably, thereby can in the longer time, make the high optical element of surface accuracy because the boundary of nitride layer and metal level is not obvious.
Also have,,, thereby can obtain the very high optical element of optical accuracy because the surface accuracy of optical element is very high according to a sixth aspect of the present invention.
Description of drawings
Fig. 1 is the synoptic diagram of formation of mould of the optical element shaping usefulness of first, second embodiment of the present invention;
Fig. 2 is in the mould of the optical element shaping usefulness of the first embodiment of the present invention, the sectional drawing after the major portion of Fig. 1 is amplified;
Fig. 3 is in the mould of the optical element shaping usefulness of the second embodiment of the present invention, the sectional drawing after the major portion of Fig. 1 is amplified;
Embodiment
Fig. 1, the 2 expression first embodiment of the present invention.The mould of optical element shaping usefulness in this embodiment is a mould of making convex lens (optical element) usefulness by drawing.As shown in Figure 1, the mould 1 of this optical element shaping usefulness has following each several part: a pair of mold base material 2,2; On the surperficial 2a of each mold base material 2, form, have the upper layer 3 of the forming face 3a that in the process of drawing, contacts with frit M; And the middle layer 4 that between these two mold base materials 2 and upper layer 3, forms.
As shown in Figure 2, middle layer 4 is made of mother metal upper layer 5, metal level 6 and nitride layer 7.Mother metal upper layer 5 contacts with the surperficial 2a of mold base material 2, by non-crystal state, perhaps is made of materials such as the tungsten of the grain formation crystalline state of 1～2 μ m, wolfram varbides.Metal level 6 contacts and forms with the surperficial 5a of mother metal upper layer 5, is made of metallic substance such as chromium, titaniums.Nitride layer 7 contacts and forms with the surperficial 6a of metal level 6, is made of the nitride that contains elements such as chromium, titanium.
In addition, mother metal upper layer 5 can form with following the whole bag of tricks: with PVD, the CVD method of radio frequency spraying plating, ionic fluid spraying plating, evaporation and so on, inject the ion implantation of the material that forms mother metal upper layer 5; Be radiated on the mold base material after the ion of argon gas and so on quickened with electric means, film forming ion is assisted into embrane method on the material that forms mother metal upper layer 5; While injecting the film forming ion beam mixing method of ion.In addition, in order to suppress crystalline growth effectively, be preferably in and the temperature of the material of mother metal upper layer 5 and mold base material 2 be controlled in the following process of the crystalline growth temperature of material of mother metal upper layer 5 formation mother metal upper layer 5.By means of these methods, just can be controlled under the non-crystal state, perhaps under the crystalline state that the crystal grain by 1～2 μ m constitutes, form mother metal upper layer 5.
To the material of mold base material 2, mother metal upper layer 5, metal level 6, nitride layer 7 and upper layer 3, and forming method thereof carry out various changes, produced the mould of 9 kinds of optical element shaping usefulness.The concrete formation of these moulds is as shown in table 1.
Table 1
| Shaping dies | Mold base material | The upper layer of mother metal | Metal level | Nitride layer | | |
| 1 | Superhard alloy | WC | Cr | CrN | Pt-Ir | |
| 2 | Superhard alloy | WC | Cr | CrN | Ir-Re | |
| 3 | Superhard alloy | WC | | CrN | Pt | |
| 4 | Superhard alloy | WC | Ti | CrN | Pt-Ir | |
| 5 | Superhard alloy | WC | Ti | CrN | Ir-Re | |
| 6 | Superhard alloy | WC | Ti | CrN | Pt | |
| 7 | SiC | SiC | Cr | CrN | Pt-Ir | |
| 8 | SiC | SiC | Cr | CrN | Ir-Re | |
| 9 | SiC | SiC | Cr | CrN | Pt | |
| Comparative example 1 | SiC | Do not have | Ti | TiN | Pt-Ir | |
| Comparative example 2 | Superhard alloy | Do not have | Cr | Do not have | Pt-Ir | |
| Comparative example 3 | Superhard alloy | Do not have | Do not have | Do not have | Pt-Ir |
The manufacture method of the shaping dies 1～3 in the table 1 is as follows.
At first, making with wolfram varbide (WC) with sintering process is the mold base material 2 of the superhard alloy formation of main component, and forms the mother metal upper layer of being made by wolfram varbide (WC) 5 with the ionic fluid sputtering process on the surperficial 2a of this mold base material 2.Then, use the ionic fluid sputtering process, make metal level 6 film forming that form by chromium (Cr), help allow flow of nitrogen gas spray chromed reaction spraying plating, form the nitride layer 7 that constitutes by chromium nitride (CrN) while relend.At last, form by platinum-iridium alloy (Pt-Ir) with sputtering process, or iridium-rhenium alloys (Ir-Re), or the upper layer 3 of platinum (Pt) formation.
In addition, the manufacture method of the shaping dies in the table 1 4～6 is as follows.
At first, making with wolfram varbide (WC) with sintering process is the mold base material 2 of the superhard alloy formation of main component, and forms the mother metal upper layer of being made by wolfram varbide (WC) 5 with the ionic fluid sputtering process on the surperficial 2a of this mold base material 2.Then, use the radio frequency sputtering process, make metal level 6 film forming that form by titanium (Ti), help allow flow of nitrogen gas spray chromed reaction spraying plating, form the nitride layer 7 that constitutes by titanium nitride (TiN) while relend.At last, form by platinum-iridium alloy (Pt-Ir) with sputtering process, or iridium-rhenium alloys (Ir-Re), or the upper layer 3 of platinum (Pt) formation.
In addition, the manufacture method of the shaping dies in the table 1 7～9 is as follows.
At first, making with silicon carbide (SiC) with sintering process is the mold base material 2 of main component, and makes mother metal upper layer 5 film forming of being made by silicon carbide (SiC) with the CVD method on the surperficial 2a of this mold base material 2.Then, grind the surperficial 5a of mother metal upper layer 5, make it become minute surface.Then, make metal level 6 film forming that form by chromium (Cr), help allow flow of nitrogen gas spray chromed reaction spraying plating, form the nitride layer 7 that constitutes by chromium nitride (CrN) while relend with the radio frequency sputtering process.At last, form by platinum-iridium alloy (Pt-Ir) with the radio frequency sputtering process, or iridium-rhenium alloys (Ir-Re), or the upper layer 3 of platinum (Pt) formation.
As shown in table 1, also made and above-mentioned shaping dies 1～9 mould 1 of the optical element shaping of of three comparative examples of of relatively.Wherein have, omitted the comparative example 1 of mother metal upper layer 5; Omitted the comparative example 2 of mother metal upper layer 5 and nitride layer 7; And the comparative example 3 that from shaping dies 4, has omitted mother metal upper layer 5, metal level 6 and nitride layer 7.The manufacturing processed of these three comparative examples 1～3 is identical with shaping dies 1 or 4.
In addition, the composition of the nitride layer 7 in shaping dies 1～3, shaping dies 7～9, that record is CrN in table 1, but in fact, also can be to have mixed Cr or Cr in CrN
2N.In addition, the composition of the nitride layer 7 in shaping dies 4～6 and comparative example 1, that record is TiN in table 1, but in fact, also can be to have mixed Ti or Ti in TiN
2N.Also have, the composition of the nitride layer 7 in shaping dies 4～6 and comparative example 1 is not to only limit to TiN, for example, can be TiAlN (TiAlN) yet.
Table 2
| Shaping dies | The shaping number of times | |
| 1～9 | More than 3000 times | No |
| Comparative example 1 | About 140 times | Owing to increasing, the die surface roughness make drip molding send out crow |
| Comparative example 2 | About 70 times | Owing to chromium is separated out beading, finished product is damaged |
| Comparative example 3 | About 50 times | Owing to film is peeled off and made beading, because the die surface roughness increases, drip molding is sent out crow |
According to the result of table 2, embodiments of the invention, the mould 1～9 that promptly is shaped even carried out the drawing more than 3000 times, does not have the forming face 3a of table of discovery surface layer 3 and drip molding that unfavorable condition is arranged yet.In contrast, concerning comparative example 1, be shaped repeatedly about 140 times, the surface of drip molding has just produced the such unfavorable condition of a crow.
For comparative example 1, during surfaceness on measuring this constantly forming face 3a of upper layer 3, do not find that roughness has numerically increased.; when forming the crystal grain of this forming face 3a with electron microscope observation; can see the decorative pattern same, on the part of each grain surface, exist trickle concavo-convexly, and can see tangible grain boundary with crystal grain, the grain boundary of mold base material 2.This be because, expose the crystal grain crystallization direction difference separately on the surperficial 2a of mold base material 2, the influence of the crystallization direction of the mold base material 2 that the grain orientation of formed on this basis metal level 6 and upper layer 3 is suffered has formed different films on unit crystal grain.That is, can think that because metal level 6 and upper layer 3 be along with the heat of being accepted is different, on the unit crystal grain identical with the crystal grain of mold base material 2, the degree of its crystalline growth and oxidation is different, so the roughness of forming face 3a has increased when being shaped.
In addition, when examining drip molding surperficial, can see the decorative pattern same with the forming face 3a of upper layer 3.According to above situation, can think that the surface shape variation that forming face 3a is trickle all copies on the surface of drip molding, thereby can produce a situation of sending out crow.
On the other hand, when the forming face 3a of the upper layer 3 that examines shaping dies 1～9, find decorative pattern and mold base material 2 different of its crystal grain, grain boundary, so metal level 6, nitride layer 7 and upper layer 3 are not subjected to the crystal grain of mold base material 2 and the influence of crystalline boundary as can be known.Can think, this be because the diameter of the crystal grain of mother metal upper layer 5 below 2 μ m, less than the cause of the diameter of the crystal grain of mold base material 2.
Therefore, to occasion at shaping dies 1～9, by mould 1 heating to optical element shaping usefulness, even crystalline growth and oxidation have taken place in mold base material 2, but, because the crystal grain of mold base material 2 and the influence of crystalline boundary can not pass to upper layer 3, so can prevent the roughness increase of the forming face 3a that contact with frit.
In addition, in comparative example 2, in about 70 times moment of drawing repeatedly, frit M has just produced the unfavorable condition of welding on the forming face 3a of upper layer 3.Further, when continuing to carry out drawing repeatedly, drip molding just breaks, and can not continue to be shaped.Observe in detail this forming face 3a, just can see, colour-change on the part of forming face 3a.According to ultimate analysis as can be known, this variable color is chromium and chromic oxide certainly partly, is that the chromium in the metal level 6 is separated out on forming face 3a, and its part is oxidized.Therefore, can think that in the process of drawing, frit M welding is on these chromium and chromic oxide.
On the other hand, for shaping dies 1～9 and comparative example 1,, also can't see above-mentioned variable color part even observe the forming face 3a of upper layer 3 in detail.This is because nitride such as chromium nitride, titanium nitride, TiAlN have very stable character as compound, have hindered the cause that the metallic substance that forms metal level 6 is separated out on the forming face 3a of upper layer 3.Therefore, in the process of drawing, can prevent that frit M welding is on forming face 3a.
In addition, because these nitride have good resistance toheat and oxidation resistent susceptibility, so, even carry out drawing repeatedly, also still can stop the forming face 3a intrusion metal level 6 of oxygen from upper layer 3.Therefore, even carry out drawing repeatedly, also can prevent to form the metallic substance of metal level 6 owing to oxidation reduces bonding force.
In addition, in comparative example 3, in about 50 times moment of drawing repeatedly, just welding is on the forming face 3a of upper layer 3 for frit M, and the so-called unfavorable condition of sending out crow has taken place the part of drip molding.When examining this forming face 3a, can confirm that because bonding force reduces, upper layer 3 has stripped down from mold base material 2.In addition, distinguish also that a crow of the welding of frit M and drip molding is to take place on the released part of upper layer 3.From this fact, can think, be because the reason that the surfaceness that the oxidation of the welding of the frit M that the exposure of mold base material 2 causes and the mold base material 2 that comes out causes increases makes molding send out crow.
On the other hand, for shaping dies 1～9 and comparative example 1,, also can't see peeling off of upper layer 3 even observe the forming face 3a of upper layer 3 in detail.This shows that the chromium and the titanium that form metal level 6 have powerful bonding force, and metal level 6 has prevented peeling off of upper layer 3.
As mentioned above, adopt the mould 1 of this optical element shaping usefulness, because it is that handle is with non-crystal, be that the made mother metal upper layer 5 of any material contacts with mold base material 2 and forms in the tungsten, carbon, wolfram varbide, silicon carbide of the grain formation crystalline state of 1～2 μ m perhaps by particle diameter, so in the process of drawing, the increase of the forming face 3a roughness of the upper layer 3 that contacts with frit M can be prevented effectively, thereby the high convex lens of surface accuracy can be formed.
In addition, owing between mother metal upper layer 5 and nitride layer 7, upper layer 3, formed the metal level 6 that constitutes by titanium or chromium, so, carrying out repeatedly in the process of drawing, can prevent effectively because of upper layer 3 peel off frit M welding on forming face 3a, thereby can form the high convex lens of surface accuracy.
Also have, owing between metal level 6 and upper layer 3, formed the nitride layer of making by titanium and chromium 7, so, in the process of drawing, can prevent to peel off raw material M welding on forming face 3a, and, can also prevent from bonding force to be reduced, thereby can in long time, form the high convex lens of surface accuracy owing to the oxidation of the metallic substance that forms metal level 6.
In addition, because the surface accuracy of the convex lens of mould 1 formed thereby of this optical element shaping usefulness of use is very high, thereby can obtain the very high convex lens of optical accuracy.
Below, Fig. 3 represents the second embodiment of the present invention, the formation of this embodiment, and the mould 1 with the optical element shaping usefulness shown in Fig. 1, Fig. 2 is identical basically, just the formation difference of nitride layer 7.Here, only the nitride layer among Fig. 37 is described, and, for being marked with identical label, and omit its explanation with Fig. 1, part that 2 integrant is identical.
That is, the nitride layer 7 of present embodiment has the nitrogen concentration dipping bed 8 that the concentration of nitrogen reduces gradually towards metal level 6.Three kinds of moulds 1 have been made with optical element shaping usefulness of this nitrogen concentration dipping bed 8.The concrete formation of these moulds is shown in table 3.
Table 3
| Shaping dies | Mold base material | The upper layer of mother metal | Metal level | Nitrogenize concentration dipping bed | Nitride layer | Upper layer |
| 10 | Superhard alloy | WC | Cr | Have | CrN | Pt-Ir |
| 11 | Superhard alloy | WC | Cr | Have | CrN | Ir-Re |
| 12 | Superhard alloy | WC | Cr | Have | CrN | Pt |
| Comparative example | Superhard alloy | WC | Cr | Do not have | CrN | Pt-Ir |
The formation method of the shaping dies 10～12 in the table 3 is as described below.
At first, form the mold base material of making as the superhard alloy of main component with wolfram varbide (WC) 2, on the surperficial 2a of this mold base material 2, form the mother metal upper layer 5 that constitutes with wolfram varbide (WC) with the ionic fluid gunite again with sintering process.Then, be injected into embrane method with ionic fluid and form the metal level 6 that constitutes by chromium (Cr), then, in the film process that carries out chromium, increase the import volume of nitrogen gradually, begin to be increased to 8sccm always, form the nitrogen concentration dipping bed 8 that nitrogen concentration increases gradually from 0sccm.Then, be under the state of 8sccm at the import volume that keeps nitrogen, by means of the reactive spray method of spraying chromium, form remaining nitride layer 7 that constitutes by chromium nitride (CrN).At last, form with platinum-iridium alloy (Pt-Ir), perhaps iridium-rhenium alloys (Ir-Re), the perhaps upper layer 3 of platinum (Pt) formation with the ionic fluid gunite.
In addition, as with the comparative example of these shaping dies 10～12, made and the 1 same comparative example 4 that constitutes of the shaping dies described in first embodiment.These shaping dies 10～12 and comparative example 4, except being with or without nitrogen concentration dipping bed 8, the material of remaining mold base material 2, mother metal upper layer 5, metal level 6, nitride layer 7 and upper layer 3 is all identical.
To the mould 1 of above-mentioned four kinds of optical element shaping usefulness, carried out actual drawing repeatedly with frit M, and produced the experiment of the shaping number of times till the bad situation on forming face 3a that has carried out respectively at upper layer 3 and the convex lens drip molding made.The temperature of the mould 1 of optical element shaping usefulness during shaping was 580 ℃ 3000 times in the past in drawing, was 600 ℃ when drawing thereafter.Result of experiment is shown in table 4.
Table 4
| Shaping dies | 580 ℃ of shaping number of times | Bad phenomenon | 600 ℃ of shaping number of times | Bad phenomenon |
| 10～12 | 3000 times | Do not have | More than 2000 times | Do not have |
| Comparative example 4 | 3000 times | Do not have | About 1500 times | Peel off because of film and to cause beading |
According to the result of table 4, even carry out 3000 drawings down at 580 ℃, unfavorable condition does not take place on shaping dies 10～12 and comparative example 4 yet.But, change into and under 600 ℃, further carry out drawing, consequently, in shaping dies 10～12, even carry out drawing more than 2000 times again, condition of poor does not take place yet.And in contrast, in comparative example 4, approximately carried out after 1500 drawings, the welding of frit M has just appearred.
Observe the forming face 3a of these comparative example 4 upper layers 3 in detail, the part of table of discovery surface layer 3 and nitride layer 7 has stripped down from metal level 6, has exposed the chromium in the metal level 6 on the part of peeling off.Can think that frit M is that welding is on the chromium of this metal level 6.
As mentioned above, adopt the mould 1 of this optical element shaping usefulness, owing to formed nitrogen concentration dipping bed 8, making has not had tangible boundary between metal level 6 and the nitride layer 7, even allow the temperature of drawing rise, nitride layer 7 can not strip down from metal level 6 yet, increases so can prevent the roughness of the forming face 3a of upper layer 3 effectively.Therefore, can in the longer time period, form the high convex lens of surface accuracy.
In addition, because the surface accuracy height of the convex lens of mould 1 formed thereby of this optical element shaping usefulness of use, thereby the high convex lens of surface accuracy can be obtained.
In addition, in the above-described embodiments, the crystal grain diameter of mother metal upper layer 5 is 1～2 μ m, but, be not to be only limited to this scope, at least, can be littler than the crystal grain diameter of mold base material 2.Just, the crystal grain diameter of mother metal upper layer 5 should be smaller for well, it is desirable to especially less than 1 μ m.
In addition, in the above-described embodiments, be on the surperficial 2a of mold base material 2, to form mother metal upper layer 5, but, be not to be only limited to like this to do, as long as form at least on the basis of metal level 6 and formed non-grains attitude, perhaps formed the crystalline state of the crystal grain diameter crystal grain littler than the crystal grain diameter of mold base material 2, that's all.Therefore, for example, as long as after forming mold base material 2, inject the ion of argon and so on from the surperficial 2a of mold base material 2, near the surperficial 2a of mold base material 2, form non-grains attitude, perhaps form crystal grain diameter and be the crystalline state that the little crystal grain of crystal grain diameter of 1-2 μ m constitutes, on the surperficial 2a of this mold base material 2, form metal level 6, that's all.
In addition, constitute the combination of the material of the mold base material 2 of mould 1 of optical element shaping usefulness and other each layers, also be not limited to the combination of shaping dies 1～12.That is, mold base material 2 is so long as be that the material selected in the material of main component is just passable from superhard alloys such as wolfram varbides with silicon carbide, and mother metal upper layer 5 is so long as the material of more than one that select from tungsten, carbon, wolfram varbide, silicon carbide is just passable.That is, for example, can change the composition of the mother metal upper layer 5 in the shaping dies 1～6 with tungsten (W) into from wolfram varbide (WC) and replacing.In addition, it is also passable to change the composition of the mother metal upper layer 5 in the shaping dies 7～9 into carbon (C) by silicon carbide (SiC).Under the situation of mentioned component,, also can form with ion implantation except forming the mother metal upper layer 5 with PVD method, CVD method.
In addition, metal level 6 so long as from following various metallic substance, select at least a just can: chromium, titanium, aluminium, molybdenum; Nitride layer 7 so long as the nitride that contains a kind of element of from following column element, selecting at least just can: chromium, titanium, aluminium, molybdenum.But, it is desirable to, the contained metallic substance of the nitride in the metallic substance of metal level 6 and the nitride layer 7 is with a kind of metallic substance.
Also have, upper layer 3 can be at least a material of selecting from platinum, palladium, iridium, osmium, ruthenium, rhenium, or from the alloy that contains these elements, compound, select any.That is, upper layer 3 can be, for example, formed by platinum-palldium alloy (Pt-Pd), platinum-rhenium alloys (Pt-Re), iridium-ruthenium alloy alloys such as (Ir-Ru), perhaps only formed by iridium (Ir), osmium (Os), shackles (Ru), rhenium metallic substance such as (Re).
In addition, the middle layer 4 of the mould 1 of optical element shaping usefulness is made of mother metal upper layer 5, metal level 6 and nitride layer 7, but, be not to be only limited to this formation yet, also can only constitute by mother metal upper layer 5 and metal level 6.Even such formation also can obtain to prevent the effect of the frit M welding that causes because of peeling off of upper layer 3 reliably in stamping process.
Also have, the formation in this middle layer 4 also can further be removed metal level 6 from above-mentioned formation, that is, also can only be made of mother metal upper layer 5.Even if this formation also can obtain to prevent in stamping process reliably because of contacting with frit M, and the effect that the roughness of the forming face 3a of upper layer 3 is increased.
In addition, the mould 1 of optical element shaping usefulness can be used to the convex lens that are shaped, but, being not limited only to this, it also can be used for planar lens, concavees lens, prism, perhaps has the shaping of optical element of the element and so on of optical surface.
More than, describe embodiments of the invention in detail with reference to accompanying drawing, but concrete formation being not limited in these embodiment, the present invention also comprises all variations that design in the scope that does not break away from main points of the present invention.
Claims (6)
1. mould that is used for frit is carried out the optical element shaping usefulness of drawing is characterized in that it has following various piece:
The mold base material made from agglomerating superhard alloy or silicon carbide; On the surface of above-mentioned mold base material, form the upper layer that in the process of drawing, contacts with above-mentioned frit; And, the middle layer that between above-mentioned mold base material and upper layer, forms,
Above-mentioned upper layer is that at least a element of selecting from following column element forms: platinum, palladium, iridium, osmium, ruthenium, rhenium, or by the alloy that contains these elements, compound formation;
Above-mentioned middle layer has the mother metal upper layer, it is by non-grains attitude, or by the crystal grain diameter of the material grain formation crystalline state littler than the crystal grain diameter that constitutes above-mentioned mold base material, at least a material in tungsten, carbon, wolfram varbide, the silicon carbide constitutes;
Above-mentioned mother metal upper layer contacts with the surface of above-mentioned mold base material.
2. the mould of optical element shaping usefulness as claimed in claim 1 is characterized in that, the diameter of the crystal grain of above-mentioned crystalline state is below 2 μ m.
3. the mould of optical element shaping usefulness as claimed in claim 1 or 2 is characterized in that, above-mentioned middle layer also has between above-mentioned mother metal upper layer and above-mentioned upper layer, the metal level that is made of at least a metallic substance in chromium, titanium, aluminium, the molybdenum.
4. the mould of optical element shaping usefulness as claimed in claim 3 is characterized in that, above-mentioned middle layer also has between above-mentioned metal level and above-mentioned upper layer, the nitride layer that is made of the nitride that contains at least a element in chromium, titanium, aluminium, the molybdenum.
5. the mould of optical element shaping usefulness as claimed in claim 4 is characterized in that, above-mentioned nitride layer has the nitrogen concentration of element dipping bed that the concentration of nitrogen element reduces gradually towards above-mentioned metal level.
6. an optical element is characterized in that, the die forming of the optical element shaping usefulness that it is to use in the claim 1 to be put down in writing is made with frit.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003016153 | 2003-01-24 | ||
| JP016153/2003 | 2003-01-24 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1524813A CN1524813A (en) | 2004-09-01 |
| CN1305789C true CN1305789C (en) | 2007-03-21 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2004100033694A Expired - Lifetime CN1305789C (en) | 2003-01-24 | 2004-01-21 | Mould for forming optical elements and the optical elements |
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|---|---|
| JP (1) | JP4763064B2 (en) |
| CN (1) | CN1305789C (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1721346B (en) * | 2004-07-16 | 2011-03-23 | 鸿富锦精密工业（深圳）有限公司 | Manufacturing method of core for molding glass |
| CN1769226B (en) * | 2004-11-06 | 2010-04-28 | 鸿富锦精密工业（深圳）有限公司 | Wearing layer-possessing mould core and its preparation method |
| CN1331786C (en) * | 2004-11-10 | 2007-08-15 | 亚洲光学股份有限公司 | Mold core for molding glass |
| JP5930725B2 (en) * | 2012-01-17 | 2016-06-08 | キヤノン株式会社 | Amorphous alloy, mold for molding, and molding method of optical element |
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|---|---|---|---|---|
| US4781744A (en) * | 1985-10-11 | 1988-11-01 | Asahi Glass Company Ltd. | Molding method |
| JPH06263460A (en) * | 1993-03-10 | 1994-09-20 | Canon Inc | Optical element forming die and its production |
| JPH07149528A (en) * | 1993-11-30 | 1995-06-13 | Matsushita Electric Ind Co Ltd | Mold for forming microlens array, its production and production of microlens |
| JPH09227139A (en) * | 1996-02-28 | 1997-09-02 | Nippon Tungsten Co Ltd | Mold for molding glass optical element |
| CN1292770A (en) * | 1999-01-05 | 2001-04-25 | 松下电器产业株式会社 | Die for forming optical device, method for manufacturing the same, and optical device |
| CN1356276A (en) * | 2000-11-30 | 2002-07-03 | 日本碍子株式会社 | Mould for shaping glass product and its manufacture |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09286624A (en) * | 1996-04-22 | 1997-11-04 | Nikon Corp | Die for forming optical element |
| JP2002293632A (en) * | 2001-03-28 | 2002-10-09 | Ibiden Co Ltd | Molding die |
| JP2002338267A (en) * | 2001-05-16 | 2002-11-27 | Olympus Optical Co Ltd | Optical element forming die |
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2004
- 2004-01-21 CN CNB2004100033694A patent/CN1305789C/en not_active Expired - Lifetime
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2009
- 2009-02-09 JP JP2009027923A patent/JP4763064B2/en not_active Expired - Lifetime
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4781744A (en) * | 1985-10-11 | 1988-11-01 | Asahi Glass Company Ltd. | Molding method |
| JPH06263460A (en) * | 1993-03-10 | 1994-09-20 | Canon Inc | Optical element forming die and its production |
| JPH07149528A (en) * | 1993-11-30 | 1995-06-13 | Matsushita Electric Ind Co Ltd | Mold for forming microlens array, its production and production of microlens |
| JPH09227139A (en) * | 1996-02-28 | 1997-09-02 | Nippon Tungsten Co Ltd | Mold for molding glass optical element |
| CN1292770A (en) * | 1999-01-05 | 2001-04-25 | 松下电器产业株式会社 | Die for forming optical device, method for manufacturing the same, and optical device |
| CN1356276A (en) * | 2000-11-30 | 2002-07-03 | 日本碍子株式会社 | Mould for shaping glass product and its manufacture |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009102225A (en) | 2009-05-14 |
| CN1524813A (en) | 2004-09-01 |
| JP4763064B2 (en) | 2011-08-31 |
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