CN1293789C - Plasma device and plasma generating method - Google Patents

Plasma device and plasma generating method Download PDF

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Publication number
CN1293789C
CN1293789C CNB028039041A CN02803904A CN1293789C CN 1293789 C CN1293789 C CN 1293789C CN B028039041 A CNB028039041 A CN B028039041A CN 02803904 A CN02803904 A CN 02803904A CN 1293789 C CN1293789 C CN 1293789C
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China
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electromagnetic field
conductor
waveguide
resonant cavity
high frequency
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CN1537406A (en
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安藤真
高桥応明
石井信雄
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge

Abstract

A plasma device, comprising a slot antenna (30) for feeding a high frequency electromagnetic field (F) fed through a feeding part into a processing container (11), the feeding part further comprising a cavity (35) forming an oscillator and converting the fed high frequency electromagnetic field (F) to a rotating electromagnetic field and feeding the rotating electromagnetic field to the slot antenna (30).

Description

Plasma device and plasma generating method
Technical field
The present invention relates to by using slot antenna in container handling, to supply with plasma device and the plasma generating method that electromagnetic field generates plasma.
Background technology
In the manufacturing of semiconductor device and flat-panel monitor,, use plasma device mostly for the formation of carrying out oxide-film or the processing such as crystalline growth, etching or ashing of semiconductor layer.In these plasma devices, the slot antenna of use supply high frequency electromagnetic field in container handling is arranged, produce the high frequency plasma body device of high-density plasma by its electromagnetic field.Even the pressure ratio that this high frequency plasma body device has plasma gas is lower, also can stablize the characteristics that generate plasma.
When using such plasma device to carry out various processings, the Two dimensional Distribution (hereinafter referred to as " plane distribution ") that need make the plasma on the treated side such as semiconductor chip evenly.
Have the method for the plasma of uniform planar distribution as using slot antenna to generate, be considered to, will be transformed into rotary electromagnetic field from the electromagnetic field of high frequency of high frequency electric source feed, slot antenna is supplied with in the rotation electromagnetic field of high frequency that will form circularly polarized wave.
Figure 21 is the figure of a configuration example of the existing high frequency plasma body device of expression.In this Figure 21, the vertical section structure of the part formation of relevant existing high frequency plasma body device is shown.
Existing plasma device comprises: the cylindrical process vessel that the end is arranged 111 of upper opening; Block the dielectric plate 113 that this handles the upper opening of container 111; Be disposed at the radially antenna 130 of emission electromagnetic field of high frequency on this dielectric plate 113, in container handling 111.
Chip bench 122 is fixed on this bottom of handling container 111, and configuration is as the substrate 121 of handled object on the placed side of this chip bench 122.And, in the bottom of container handling 111, be provided for the exhaust outlet 116 of vacuum exhaust, on the sidewall of container handling 111, the nozzle 117 that is provided for supplying with plasma-state gas and handles gas.
Dielectric plate 113 is made of quartz glass etc., waits seal member (not shown) between dielectric plate 113 and container handling 111 by making O shape circle, thereby does not make container handling 111 interior plasmas leak into the outside.
In addition, radially antenna 130 is a kind of of slot antenna, is made of two round conductor plates 131,132 that are parallel to each other that form radial waveguide path 133 and the conductor loops 134 that connects the peripheral part of these conductor plates 131,132.The central part of the conductor plate 132 on radial waveguide path 133 forms the electromagnetic field of high frequency is imported introducing port 135 in the antenna 130 radially.In the conductor plate 131 below radial waveguide path 133, form a plurality of slits 136 in a circumferential direction, the electromagnetic field F that will transmit in radial waveguide path 133 launches in container handling 111 by dielectric plate 113, and forms the radially antenna surface of antenna 130.And radially the encapsulant 112 of the outer periderm ring-type of antenna 130 and dielectric plate 113 covers, and its structure makes electromagnetic field not leak into the outside.
In existing plasma device, by taking following formation, come to supply with rotary electromagnetic fields to antenna 130 radially.
That is, in order to supply with rotary electromagnetic field, existing plasma device comprises: the radio-frequency generator 145 that produces the electromagnetic field of high frequency; Guiding is from the rectangular waveguide 143 of the electromagnetic field of high frequency of radio-frequency generator 145 outputs; Be used to connect the rectangle-cylinder converter 147 of rectangular waveguide and cylinder waveguide; And the circularly polarized wave converter 146 that the electromagnetic field of high frequency of linearly polarized wave is transformed into rotary electromagnetic field.
Here, as circularly polarized wave converter 146, for example, shown in Figure 22 C, use 1 group or the cylindrical protrusion 146A that organizes the conductor system of the inwall that is opposite to the cylinder waveguide are set on direction of principal axis more.These cylindrical protrusion 146A is configured in on the electric field principal direction shape of the electromagnetic field of the TE11 mould of rectangle-cylinder converter 147 inputs direction at 45, under many groups situation, interval by λ/4 (λ be transmission electromagnetic wavelength in pipe) on direction of principal axis is provided with, and it is the rotary electromagnetic field that the center is rotated with the axis of cylinder waveguide that the electromagnetic field of high frequency of this TE11 mould is transformed into its electric field principal direction.
Below, with reference to Figure 22 A-Figure 22 G supply rotating electromagnetic field structure in the existing plasma device with such formation is described.Have, Figure 22 A-Figure 22 G is the schematic diagram that is illustrated in the electromagnetic field situation that the inside of rectangular waveguide 143, rectangle-cylinder converter 147, circularly polarized wave converter 146 transmits again.Here, Figure 22 A is illustrated in the rectangular waveguide shown in Figure 21 143 the electric field situation on the A-A ' of the electromagnetic field that transmits, Figure 22 B, Figure 22 E, Figure 22 F represent the electric field situation on the outlet B-B ' of rectangle-cylinder converter 147, and Figure 22 C, Figure 22 D, Figure 22 G are illustrated in the electric field direction of rotation of the electromagnetic field that transmits in the circularly polarized wave converter 146.
The electromagnetic field of high frequency (Figure 22 A) of being transmitted in rectangular waveguide 143 with the TE10 mould by radio-frequency generator 145 is transformed into TE11 mould (Figure 22 B) by rectangle-cylinder converter 147, and is imported in the cylinder waveguide of circularly polarized wave converter 146.Then, in circularly polarized wave converter 146 transmit and on one side be transformed into rotary electromagnetic field (Figure 22 C) on one side, supply to radially in the antenna 130 by the introducing port 135 that is formed on conductor plate 132 central parts.
But, supply to a part of rotary electromagnetic field of antenna 130 radially and be positioned at conductor loops 134 reflections of 133 ends, radial waveguide path, the rotary electromagnetic field one edge equidirectional rotation oppositely transmission (Figure 22 D) circularly polarized wave converter 146 on one side of its reflection.Then, this reflection of electromagnetic is carried out the reflection (Figure 22 E, Figure 22 F) of stiff end in rectangle-cylinder converter 147, become the rotary electromagnetic field that the negative side rotates up with that, in circularly polarized wave converter 146, transmit (Figure 22 G), and supply with radially antenna 130.
Its result, phase place is supplied to radially antenna 130 with the mutual different rotary electromagnetic field of direction of rotation under the state that mixes, and the polarized wave of the electromagnetic field of high frequency of this moment becomes ellipse shown in Figure 23.So the uniformity of the plane distribution of the plasma that generates in the container handling descends, in the plasma treatment of periphery, produce irregular especially.
Like this, when the rotary electromagnetic field of circularly polarized wave converter 146 conversion is only supplied with radially antenna 130,, be difficult to obtain the uniform plane of plasma distribution because of from the radially influence of the reflection of electromagnetic of antenna 130.
Summary of the invention
The present invention carries out for solving such problem, and its purpose is to improve the uniform plane of plasma distribution.
In order to realize such purpose, plasma device of the present invention is characterised in that to have:
Slot antenna is formed in the waveguide of the electromagnetic field of high frequency of supplying with by current feed department; And
Container handling generates plasma by the electromagnetic field of high frequency of supplying with by this slot antenna,
Described current feed department has resonant cavity, and described resonant cavity constitutes resonator, simultaneously, the electromagnetic field of high frequency of feed is transformed into rotary electromagnetic field and supplies with described waveguide.In the present invention, while the rotation electromagnetic field of high frequency that rotary electromagnetic field carries out resonance and will become circularly polarized wave in resonant cavity supplies to waveguide.
This plasma device also can have annular element, and described annular element is arranged on around the peristome of the resonant cavity in the waveguide, has and the identical internal diameter of described resonant cavity internal diameter.By thickness and the width of regulating this annular element, in the electromagnetic field of high frequency of resonant cavity interior resonance, just can regulate the ratio that supplies to the electromagnetic field of high frequency in the waveguide.
First configuration example as plasma device of the present invention is characterized in that, described resonant cavity is formed by round conductor parts and cylinder conductor part, and wherein, described round conductor parts are connected with the external conductor of the coaxial waveguide of feed electromagnetic field of high frequency; Described cylinder conductor part, an end round conductor parts therewith are connected, and the other end is at described waveguide inner opening; This resonant cavity has simultaneously, feed pin, and the center from described round conductor parts of being set at is along on its radial direction position spaced, and the one end is connected with the inner conductor of described coaxial waveguide; And the disturbance pin, being set at the center that inserts and puts this feed pin and described round conductor parts and forming on the position of predetermined angular, an end is connected with described round conductor parts.In such formation, the electromagnetic field of high frequency by coaxial waveguide institute feed is because the interaction of feed pin and disturbance pin is transformed into rotating magnetic field, at resonant cavity interior resonance on one side be fed into waveguide on one side.
Here, the other end of feed pin both can be open-circuit condition, also can be connected on the antenna surface that is formed with the slit that constitutes slot antenna.The other end in feed pin is connected under the situation of antenna surface, on the other end of its feed pin, the conductive component of the circular cone shape that expands to the antenna surface side can be set also.By use the conductive component of such shape is arranged, the electromagnetic field of high frequency of resonant cavity interior resonance easily can be imported in the waveguide.
The other end of disturbance pin both can be open-circuit condition, also can be connected to antenna surface.In addition, also can be connected to the cylinder conductor part.
In addition, the other end of feed pin also can be connected to the cylinder conductor part.In this case, the other end of disturbance pin can be connected to and form the antenna surface that constitutes the slit of slot antenna, also can be connected to the cylinder conductor part.
Second configuration example as plasma device of the present invention, it is characterized in that described resonant cavity is formed by round conductor parts, cylinder conductor part and conductive component, wherein, described round conductor parts are connected with the external conductor of the coaxial waveguide of feed electromagnetic field of high frequency; Described cylinder conductor part, an end round conductor parts therewith are connected, and the other end is at described waveguide inner opening; Conductive component, arranged opposite is in the interior of this cylinder conductor part; Have feed pin simultaneously, the center from described round conductor parts of being set at is along on its radial direction position spaced, and the one end is connected with the inner conductor of described coaxial waveguide.In such formation, by the conductive component of arranged opposite, form resonant cavity in the interior of described cylinder conductor part so that have with perpendicular to this cylinder conductor part the axle the mutual opposed notch of section.Its result will become rotary electromagnetic field in the resonant cavity inner conversion by the electromagnetic field of high frequency of coaxial waveguide feed, be fed in the waveguide while carry out resonance.
Here, arranged opposite the conductive component of the interior of described cylinder conductor part from then on an end of cylinder conductor part extend to the other end.
In addition, for conductive component, the axial length of cylinder conductor part also can roughly be the electromagnetic field of high frequency wavelength 1/4.In this case, the length of the parallel portion of conductive component and feed pin is roughly 1/4 of above-mentioned electromagnetic field of high frequency wavelength, can obtain good rotary electromagnetic field in resonant cavity.
In addition, for conductive component, can be ramped shaped also with the end formed of waveguide side.By such shaping, slow down zone that has conductive component in the resonant cavity and the impedance variation that does not have the zone of conductive component, can suppress the reflection of two electromagnetic field of high frequencies in the zone boundary.
When conductive component end formed is ramped shaped, for the body except its end, the axial length of cylinder conductor part also can be roughly the electromagnetic field of high frequency wavelength 1/4.Thus, can in resonant cavity, obtain good rotary electromagnetic field.
In addition, both the other end of feed pin can be connected to the antenna surface that has formed the slit that constitutes described slot antenna, also can be in that the direction of principal axis along the cylinder conductor part roughly separate the position of 1/4 wavelength of electromagnetic field of high frequency from the round conductor parts, the other end of feed pin is connected to conductor part.
Have again,, the cylindrical protrusion of opposed one or more groups conductor system mutually can be set on direction of principal axis also as the conductive component of the interior that is arranged on the cylinder conductor part.
The 3rd configuration example as plasma device of the present invention, it is characterized in that, described resonant cavity is by the elliptic conductor parts that are connected with the external conductor of the coaxial waveguide of feed electromagnetic field of high frequency, and the end cylinder conductor part that the elliptic conductor parts are connected therewith, the other end carries out opening in described waveguide, section is elliptical shape forms; Simultaneously this resonant cavity also has feed pin, and this feed pin is set at and separates from the center of described elliptic conductor portion along its radial direction and form on the position of angle of regulation with its major axis and minor axis, is connected with the inner conductor of described coaxial waveguide.In such formation, will become rotary electromagnetic field in resonant cavity inner conversion by the electromagnetic field of high frequency of coaxial waveguide feed with oval-shaped profile, be fed in the waveguide while carry out resonance.
Here, both the other end of feed pin can be connected to the antenna surface that has formed the slit that constitutes slot antenna, also can connect conductive component in 1/4 the position that the direction of principal axis along the cylinder conductor part from the round conductor parts roughly separates the electromagnetic field of high frequency wavelength.
The 4th configuration example as plasma device of the present invention, it is characterized in that, described resonant cavity is by the round conductor parts that are connected with the external conductor of the 1st, the 2nd coaxial waveguide of feed electromagnetic field of high frequency, and an end round conductor parts are connected therewith, the other end forms at the cylinder conductor part of described waveguide inner opening; This resonant cavity also has simultaneously: the 1st feed pin, and the center from described round conductor parts of being set at is connected with the inner conductor of described the 1st coaxial waveguide along on its radial direction position spaced; And the 2nd feed pin, be set at the center that inserts and puts this 1st feed pin and described round conductor parts and be formed on the position of predetermined angular, be connected with the inner conductor of described the 2nd coaxial waveguide.In such formation, generate rotary electromagnetic field by electromagnetic field of high frequency feed to the 1, the 2nd feed pin that phase place is different, on one side on one side this rotary electromagnetic field is fed in the waveguide at the resonant cavity interior resonance.
Here, both the other end separately of the 1st, the 2nd feed pin can be connected to the antenna surface that has formed the slit that constitutes slot antenna, also can connect conductive component in 1/4 the position that the direction of principal axis along the cylinder conductor part from the round conductor parts roughly separates the electromagnetic field of high frequency wavelength.
The 5th configuration example as plasma device of the present invention, it is characterized in that, described resonant cavity is by the round conductor parts that are connected with the external conductor of at least one coaxial waveguide of feed electromagnetic field of high frequency, and an end round conductor parts are connected therewith, the other end forms at the cylinder conductor part of described waveguide inner opening; This resonant cavity has microstrip antenna (patchantenna), will be transmitted in the described resonant cavity as described rotary electromagnetic field from the described electromagnetic field of high frequency of at least one coaxial waveguide feed; This microstrip antenna comprises: described round conductor parts; And conductor plate, the round conductor parts have the interval arranged opposite of regulation therewith, are connected with the inner conductor of at least one coaxial waveguide.In such formation, will in resonant cavity, launch as rotary electromagnetic field by microstrip antenna by the electromagnetic field of high frequency of coaxial waveguide feed, be fed in the waveguide while carry out resonance.
And, the 6th configuration example as plasma device of the present invention, it is characterized in that, described resonant cavity is by a side or the end face of the rectangular waveguide of feed electromagnetic field of high frequency, and an end side or the end face of rectangular waveguide are connected therewith, the other end forms at the cylinder conductor part of described waveguide inner opening; On a side or end face of described rectangular waveguide, be formed with described electromagnetic field of high frequency is transmitted into a plurality of slits in the described resonant cavity as described rotary electromagnetic field.In such formation, by the electromagnetic field of high frequency of rectangular waveguide feed by being formed on its rectangular waveguide a side or a plurality of slits on the end face, launch in resonant cavity as rotary electromagnetic field, be fed in the waveguide while carry out resonance.
Here, a plurality of slits also can be two slits that intersect on mutual mid point.To be called the intersection slit by the slit that these two slits constitute.In addition, a plurality of slits also can be two slits that are spaced from each other configuration, prolong on the direction of mutual approximate vertical.To be called Ha word slit by the slit that these two slits constitute.
In addition, plasma generating method of the present invention, it is characterized in that, the electromagnetic field of high frequency feed is given the resonant cavity that constitutes resonator, this electromagnetic field of high frequency is transformed into rotary electromagnetic field, simultaneously, on one side supply with waveguide in the electromagnetic field of high frequency that described resonant cavity interior resonance will be transformed into rotary electromagnetic field on one side.By being formed on the slot antenna in the described waveguide, the electromagnetic field of high frequency that described waveguide is supplied with supplies in the container handling, generates plasma.In the method, while, can will supply with the rotary electromagnetic field of the electromagnetic field of high frequency of slot antenna as circularly polarized wave formation by making rotary electromagnetic field resonance supply with waveguide.
First configuration example of plasma generating method of the present invention by in the resonant cavity that constitutes resonator feed pin and disturbance pin being set, will be transformed into rotary electromagnetic field by the electromagnetic field of high frequency of coaxial waveguide feed, and carry out resonance in resonant cavity.
In addition, second configuration example of plasma generating method of the present invention, have in the resonant cavity of mutual opposed otch at section perpendicular to the direction of transfer of electromagnetic field of high frequency, by coaxial waveguide feed electromagnetic field of high frequency, this electromagnetic field of high frequency is transformed into rotary electromagnetic field, and at the resonant cavity interior resonance.
In addition, the 3rd configuration example of plasma generating method of the present invention is in the resonant cavity of elliptical shape at the section perpendicular to the direction of transfer of electromagnetic field of high frequency, by coaxial waveguide feed electromagnetic field of high frequency, this electromagnetic field of high frequency is transformed into rotary electromagnetic field, and at the resonant cavity interior resonance.
In addition, the 4th configuration example of plasma generating method of the present invention will phase place differs 90 ° electromagnetic field of high frequency feed mutually by the feedback of the 1st, the 2nd coaxial waveguide in constituting the resonant cavity of resonator, thus, generate rotary electromagnetic field, and make it at the resonant cavity interior resonance.
In addition, the 5th configuration example of plasma generating method of the present invention is given microstrip antenna by coaxial waveguide with the electromagnetic field of high frequency feed, generates rotary electromagnetic field in resonant cavity.
Also have, the 6th configuration example of plasma generating method of the present invention by being launched in resonant cavity from a plurality of slits that a side or the end face of its rectangular waveguide forms by the electromagnetic field of high frequency of rectangular waveguide feed, generates the electromagnetic field of high frequency.
Description of drawings
Figure 1A-Fig. 1 C is the key diagram of the plasma device of first embodiment of the invention.
Fig. 2 A, Fig. 2 B are the current feed department key diagrams of the plasma device of first embodiment of the invention.
Fig. 3 is the distribution map of the electric field in the current feed department of plasma device of first embodiment of the invention.
Fig. 4 is the current feed department key diagram of the plasma device of second embodiment of the invention.
Fig. 5 A-Fig. 5 C is the action effect key diagram of current feed department of the plasma device of second embodiment of the invention.
Fig. 6 A, Fig. 6 B are the variation key diagrams of current feed department of the plasma device of second embodiment of the invention.
Fig. 7 A, Fig. 7 B are the variation key diagrams of current feed department of the plasma device of second embodiment of the invention.
Fig. 8 A, Fig. 8 B are the key diagrams of current feed department of the plasma device of third embodiment of the invention.
Fig. 9 A, Fig. 9 B are the variation key diagrams of current feed department of the plasma device of third embodiment of the invention.
Figure 10 is the variation key diagram of current feed department of the plasma device of third embodiment of the invention.
Figure 11 is the key diagram of current feed department of the plasma device of fourth embodiment of the invention.
Figure 12 is the key diagram of current feed department of the plasma device of fifth embodiment of the invention.
Figure 13 A, Figure 13 B are the key diagrams of current feed department of the plasma device of sixth embodiment of the invention.
Figure 14 A, Figure 14 B are the key diagrams of current feed department of the plasma device of seventh embodiment of the invention.
Figure 15 is the key diagram of current feed department of the plasma device of eighth embodiment of the invention.
Figure 16 A, Figure 16 B are the key diagrams of employed intersection slit design example in the plasma device of eighth embodiment of the invention.
Figure 17 A, Figure 17 B are the variation key diagrams of current feed department of the plasma device of eighth embodiment of the invention.
Figure 18 is the figure of another example in employed slit in the plasma device of explanation eighth embodiment of the invention.
Figure 19 A, Figure 19 B are the plane graphs of expression seam shape.
Figure 20 A, Figure 20 B are the key diagrams of the structure example of spendable radially antenna among the present invention.
Figure 21 is the key diagram of existing plasma device.
Figure 22 A-Figure 22 G is the key diagram of the electromagnetic field mode in the existing plasma device.
Figure 23 is the schematic diagram of the plane distribution of the plasma in the existing plasma device of expression.
Preferred forms of the present invention
Below, with reference to accompanying drawing embodiments of the invention are described.
Figure 1A-Fig. 1 C to Fig. 3 is the key diagram of the plasma device of first embodiment of the invention.
Shown in Figure 1A, this plasma device has: the cylindrical process vessel that the end is arranged 11 of upper opening; The dielectric plate 13 that seal on the top of container handling 11; Be configured on this dielectric plate 13 the radially antenna 30 of emission in container handling 11 (or leakage) frequency electromagnetic waves; And cover the radially shielding material 12 of the periphery of antenna 30 and dielectric plate 13.Have, shield members 14 such as the O shape circle between container handling 11 and dielectric plate 13 are not so that the vacuum in the maintenance container handling 11 leaks into the outside with plasma simultaneously again.
Manage the inside of container 11 herein, mounting is configured to and can comes lifting by lifting shaft 23 as the chip bench 22 of the substrate 21 of handled object.The high frequency electric source 26 that this chip bench 22 is used by adaptation 25 and bias voltage is electrically connected.Have again, in order to keep the air-tightness of container handling 11, will be arranged on the telescoping tube 24 that chip bench 22 bottom surfaces are connected with the insulation board 15 that is arranged at container handling 11 bottom surfaces lifting shaft 23 around.
Manage in the container 11 nozzle 17 that also is provided for the exhaust outlet 16 of vacuum exhaust and is used to supply with plasma gas and handles gas herein.
On the other hand, radially antenna 30 is made of two round conductor plates 31,32 that are parallel to each other that form radial waveguide path 33 and the conductor loops 34 that connects the peripheral part of these conductor plates 31,32.
Here, the profile at Ib-Ib ' the line place of the plasma device shown in Figure 1A is shown in Figure 1B.For example, in 1B, on the conductor plate 31 below radial waveguide path 33, form a plurality of slits 36 in a circumferential direction, form the radially antenna surface of antenna 30.
In addition, the central part of the conductor plate 32 on radial waveguide path 33 is provided with current feed department described later.
Shown in Figure 1A, transmit in rectangular waveguide 43 by match circuit 44 electromagnetic field of high frequency that produces in the radio-frequency generator 45, in rectangle-coaxial converter 42, change the TEM mould into, give the radially current feed department of antenna 30 by coaxial waveguide 41 feeds by the TE10 moding.
In the present embodiment, this current feed department comprises: resonant cavity 35, by the round conductor parts 51A that is connected with the external conductor 41A that the electromagnetic field of high frequency is carried out the coaxial waveguide 41 of feed, with by an end therewith round conductor parts 51A be connected, the other end forms at the cylinder conductor part 51B of antenna 30 inner openings radially; Feed pin 52 is arranged in this resonant cavity 35, and an end is connected with the inner conductor 41B of coaxial waveguide 41, and the other end is an open-circuit condition; And disturbance pin 53, one ends are connected with round conductor parts 51A, and the other end is an open-circuit condition.Feed pin 52 will become rotary electromagnetic field by the transformation of electromagnetic field that coaxial waveguide 41 is supplied with disturbance pin 53.Have, Fig. 1 C is the profile at Ic-Ic ' the line place of Figure 1A again.
This resonant cavity 35 constitutes resonator with the conductor plate 31 of antenna 30 radially, and radial waveguide path 33 is supplied with in a part of electromagnetic field of high frequency of resonant cavity 35 interior resonances.
Be arranged at around the peristome of the resonant cavity 35 of conductor plate 32 central authorities of antenna 30 radially, configuration has the annular element 54 with internal diameter (being the internal diameter of the resonant cavity 35) same inner diameter of cylinder conductor part 51B.By thickness and the width of adjusting this annular element 54, in resonant cavity 35, carry out just can regulating the ratio that supplies to the electromagnetic field of high frequency in the radial waveguide path 33 in the electromagnetic field of high frequency of resonance.
Have, in the electromagnetic field of supplying with resonant cavity 35, the energy of electromagnetic field that remains in the resonant cavity 35 that will carry out resonance is called " Q value " divided by the value that supplies to the energy of electromagnetic field in radial waveguide path 33 from resonant cavity 35 again.
Below with reference to Fig. 2 A, Fig. 2 B in detail, the structure of such current feed department is described in detail.
Fig. 2 A is the schematic diagram of the current feed department when representing to observe from the side, and Fig. 2 B is the schematic diagram of the configuration of expression feed pin 52 and disturbance pin 53.
In the present embodiment, if carry out the feed of the electromagnetic field of high frequency of 2.45GHz by radio-frequency generator 45, the central shaft (hereinafter referred to as " central shaft ") that then can establish from columnar resonant cavity 35 is about 7.3～7.5cm to distance (hereinafter referred to as " radius of the resonant cavity ") a of the inner surface of cylinder conductor part 51, round conductor parts 51A and radially the distance of the round conductor plate 31 of antenna 30 (hereinafter referred to as " degree of depth of resonant cavity ") d be about 3.6cm.Have, the diameter of radially antenna 30 of this moment is about 48cm again, is 1.5～1.6cm as the height h of 31,32 distances of conductor plate.
The width c that forms the annular element 54 of resonant cavity 35 with cylinder conductor part 51B is about 3.1cm.This is about as much as 1/4 of electromagnetic wavelength.
In addition, can establish the length l of the feed pin 52 that is connected with the inner conductor 41B of coaxial waveguide 41 1Be 1.75～2.6cm, the length l of disturbance pin 53 2Be 1.75～2.1cm.At this moment, also can design feed pin 52 more longer than disturbance pin 53.
Have, if increase the length of pin 52,53, or increase the degree of depth of resonant cavity 35, then the Q value of resonant cavity 35 becomes big, just can reduce to supply to the ratio of the electromagnetic field in the radial waveguide path 33.In the purposes as plasma device, the target of Q value is approximately 30.
On the other hand, shown in Fig. 2 B, feed pin 52 and disturbance pin 53 all are configured in apart from the central shaft b of round conductor parts 51A 1=b 2The position of=about 3.6cm inserts and puts its center, the angle of the odd-multiple that shape is at 45, for example φ=135 °.Thus, in resonant cavity 35, be transformed into the rotary electromagnetic field of TM mould by the electromagnetic field of high frequency of coaxial waveguide 41 feeds.
The size of the current feed department that illustrates here is mainly to consider reflection coefficient (VS) and the design result that obtains, and self-evident, this is not limited to this.For example, when the axial ratio of mainly considering rotary electromagnetic field (axial ratio), in Fig. 2 A, Fig. 2 B, at the about 7.3cm of a=, the about 3.5cm of d=, the about 2.6cm of c=, the about 1.0cm of t=, l 1=l 2=about 1.5cm, b 1=about 4.3cm, b 2On the position of=about 4.4cm, can establish φ=115 °.
With reference to Fig. 3, can illustrate that following explanation generates the structure of rotary electromagnetic field by feed pin 52 and disturbance pin 53.
If there is not disturbance pin 53, then the electric field E (dotted line) as shown in Figure 3 of feed pin 52 generations is such, can not obtain rotary electromagnetic field.
In contrast, under the situation that is provided with disturbance pin 53, in above-mentioned electric field E, the component E1 of disturbance pin 53 directions is because of the influence of the capacitive component between feed pin 52 and the disturbance pin 53, its phase lag.Length by adjusting feed pin 52, disturbance pin 53 is so that this phase lag is 90 °, thereby can obtain the rotary electromagnetic field of TM11 mould.
Therefore, in such plasma device, above-mentioned resonant cavity 35 is given by coaxial waveguide 41 feeds in the electromagnetic field of high frequency that radio-frequency generator 45 produces, be transformed to rotary electromagnetic field by feed pin 52 and disturbance pin 53, simultaneously on one side in above-mentioned resonant cavity 35, carry out resonance, on one side its part is supplied in the radial waveguide path 33 of antenna 30 radially.Transmit in radial waveguide path 33 electromagnetic field of high frequencies that supply in the antenna radially 30, the electromagnetic field F that transmits in this radial waveguide path 33 to handling in the container 11, makes the plasma gas ionization that is directed in the container handling 11 by nozzle 17 generate plasma S from these slits 36 emissions (or leakage).
At this moment, rotary electromagnetic field carries out resonance in resonant cavity 35, so the rotary electromagnetic field in the resonant cavity 35 is fed in the radial waveguide path 33.Therefore, by rotary electromagnetic field being transformed to circularly polarized wave by feed pin 52 and disturbance pin 53, to the good circularly polarized wave electromagnetic field of high frequency of container handling 11 emissions (or leakage), the uniformity of plane distribution of the plasma S of generation is improved by antenna 30 radially.
In the present embodiment, feed pin 52 1 ends are connected to the inner conductor 41B of coaxial waveguide 41, and the other end (front end) forms open-circuit condition and carry out electromagnetic field excitation with voltage mode, thus on the front end of feed pin 52 the voltage amplitude maximum.Therefore, carrying out under the situation of feed with the such high power of several kW～tens kW, the design of current feed department preferably makes, at the front end of feed pin 52, and the cylinder conductor part 51B of the front end of disturbance pin 53, resonant cavity 35 or radially do not cause discharge between the conductor plate 31 of antenna 30.In order to suppress discharge, can increase distance from the front end of feed pin 52 to front end, cylinder conductor part 51B or the conductor plate 31 of disturbance pin 53, for example,, also can make both length differences for feed pin 52 and disturbance pin 53.
Below, with reference to Fig. 4 the second embodiment of the present invention is described.Have again, use identical label for the parts identical, and omit its explanation with first embodiment.
In above-mentioned first embodiment, the front end that is arranged on the feed pin 52 in the resonant cavity 35 is an open-circuit condition, and in the plasma device of second embodiment, the front end of feed pin 52A is a short-circuit condition.That is, as shown in Figure 4, the end of feed pin 52A is connected to the inner conductor 41B of coaxial waveguide 41, forms the other end of front end and is connected with the conductor plate 31 of the antenna surface of antenna 30 radially, becomes short-circuit condition.
As the round conductor parts 51A of resonant cavity 35 and radially the depth d of the resonant cavity 35 of the distance of the conductor plate 31 of antenna 30 be made as about λ/2.Because front end is connected to the length l of the feed pin 52A of conductor plate 31 1Equate with the depth d of resonant cavity 35, so also be about λ/2.Here, λ is the wavelength of electromagnetic field of high frequency, is under the situation of electromagnetic field of high frequency of 2.45GHz in frequency of utilization, d=l 1=about 6cm.
Illustrate according to the exiting principle in the resonant cavity 35 of this spline structure below with reference to Fig. 5 A-Fig. 5 C.Fig. 5 A is the schematic diagram of the current feed department when representing to observe from the side, and Fig. 5 B is the schematic diagram of the CURRENT DISTRIBUTION on the expression feed pin 52A, and Fig. 5 C is the schematic diagram that the voltage on the expression feed pin 52A distributes.
If the front end of feed pin 52A is connected to the radially conductor plate 31 formation short-circuit conditions of antenna 30, then shown in Fig. 5 B, the current amplitude maximum of feed pin 52A front end, 90 ° of the phase differences of electric current and voltage are so the voltage amplitude of feed pin 52A front end is 0 (zero).Again because the length l of feed pin 52A 1For about λ/2, so the voltage on the feed pin 52A distributes shown in Fig. 5 C, the position of voltage amplitude maximum is just in the central peripheral of the depth d of resonant cavity 35, comes the interior electromagnetic field of actuating cavity 35 with its AC field.
On the other hand, disturbance pin 53 can have that to make the phase lag of the component E1 of disturbance pin 53 directions among the electric field E by feed pin 52 excitation be 90 ° of such length, its length l 2Can be for about for example λ/4.Be under the situation of electromagnetic field of high frequency of 2.45GHz in frequency of utilization, l 2=about 3cm.By forming such length, just the electromagnetic field of high frequency that is energized in the resonant cavity 35 can be transformed into the rotary electromagnetic field of good TM11 mould.
By forming such structure, can obtain following effect.For example, when frequency of utilization is the electromagnetic field of high frequency of 2.45GHz, if establish the length l of disturbance pin 53 2Be λ/4, then with respect to depth d=about 6cm of resonant cavity 35, the length l of disturbance pin 53 2=about 3cm can guarantee being spaced apart about 3cm of conductor plate 31 from the front end of disturbance pin 53 to antenna surface.Thus, just can relax the discharge that both interval produces in short-term.
In addition, as shown in Figure 6A,, also conductive component 37 can be set connecting on the front end of the feed pin 52A of the conductor plate 31 of antenna 30 radially.This conductive component 37 with the joint face of conductor plate 31 as the bottom surface, be formed on the circular cone shape of conductor plate 31 sides expansion.By using the conductor part 37 that forms such shape, the electromagnetic field of high frequency of resonant cavity 35 interior resonances easily can be imported in the radial waveguide path 33.Have, conductive component 37 does not need to be symmetrical in the extended line of feed pin 52A again.That is, more little with the distance of the opposed conductor plate 32 in its side, also can be big more with respect to the laterally inclined angle of the conductive component 37 of the extended line of feed pin 52A.Such as in Fig. 6 A, the inclination angle of left lateral sides that also can make conductive component 37 is greater than the inclination angle of side, right side.
In addition, as shown in Figure 6A, 52A is same with feed pin, and the other end that also an end can be connected to the disturbance pin 53A of round conductor parts 51A is connected to the radially conductor plate 31 of antenna 30.Thus, can prevent between disturbance pin 53A and conductor plate 31, to produce discharge.
In addition, also the front end of feed pin 52A can be connected to cylinder conductor part 51B.Specifically, shown in Fig. 7 A, Fig. 7 B, feed pin 52A prolongs to the direction of principal axis of cylinder conductor part 51B from the tie point with the inner conductor 41B of coaxial waveguide 41, bends to the right angle and vertically is connected to the internal face of cylinder conductor part 51B.Like this, also can suppress discharge from feed pin 52A.In this case, the front end of disturbance pin both can be open-circuit condition, also can be connected to the radially conductor plate 31 of antenna 30, also can be connected to cylinder conductor part 51B like that shown in Fig. 7 A, Fig. 7 B.Here, be made as about λ/4, just can in resonant cavity 35, generate good rotary electromagnetic field by length with the parallel portion of feed pin 52A and disturbance pin.
In addition, with the front end open-circuit condition of feed pin or be connected under the state of the conductor plate 31 of antenna 30 radially, also disturbance pin 53A can be connected on the cylinder conductor part 51B.
Below with reference to Fig. 8 A, Fig. 8 B the third embodiment of the present invention is described.Have again, use identical label for the parts identical, and omit its explanation with first embodiment.
Above-mentioned first embodiment is provided with disturbance pin 53 in the resonant cavity 35 that constitutes current feed department, and the plasma device of this 3rd embodiment, resonant cavity 35 is by the round conductor parts 51A that is connected with the external conductor 41A of the coaxial waveguide 41 of feed electromagnetic field of high frequency, one end therewith round conductor parts 51A be connected and the other end at the cylinder conductor part 51B of waveguide 33 inner openings, and arranged opposite is in the conductive component 61A of the interior of this cylinder conductor part 51B, 61B forms, and the center from round conductor parts 51A of will being arranged on the feed pin 52 that the inner conductor 41B of coaxial waveguide 41 is connected simultaneously is along on its radial direction position spaced.
Shown in Fig. 8 B, the end of conductive component 61A, 61B is connected to the round conductor parts 51A of an end face that forms resonant cavity 35, and prolongs on the direction of principal axis of cylinder conductor part 51B.Shown in Fig. 8 A, the section shape of the VIIIa-VIIIa ' line direction of conductive component 61A, 61B is by forming with the string that is connected this circular arc with the identical shaped circular arc of the circular arc of the interior of cylinder conductor part 51B.
Its result in the 3rd embodiment, by with conductive component 61A, the 61B arranged opposite interior at cylinder conductor part 51B, has notch perpendicular to the section of the central shaft of resonant cavity 35.That is, the length on the direction of the connection notch of the section of resonant cavity 35 (hereinafter referred to as " cut-out direction ") is shorter than length on the direction vertical with cut-out direction.Therefore, the capacity of the cut-out direction of resonant cavity 35 relatively increases.
Have again, in order to form resonant cavity 35, in the present embodiment, in cylinder conductor part 51B, be provided with conductive component 61A, the 61B of above-mentioned such section shape with such section shape, and be electrically connected, but also can be they are integrally formed by casting.
On the other hand, the profiled cut portion of these resonant cavitys 35 and feed pin 52, shown in Fig. 8 A, Fig. 8 B, straight line by feed pin 52 and central shaft (center of round conductor parts 51A) and cut-out direction are in the position relation that forms the 45 degree of having an appointment.
Like this, by resonant cavity 35 and feed pin 52 are set, in the electric field E that feed pin 52 produces, cut-out direction component E1 is because of the influence phase lag of the relative capacity that increases.Thereby, by make with phase difference perpendicular to the component E2 of cut-out direction be 90 ° of positions of setting the size and the feed pin 52 of notch, just can obtain the rotary electromagnetic field of TE11 mould.
In having the plasma device of above-mentioned current feed department, coaxial waveguide 41 feeds are passed through in above-mentioned resonant cavity 35 in the electromagnetic field of high frequency that radio-frequency generator 45 produces.The electromagnetic field of high frequency of feed resonant cavity 35 opposed mutually by the section on the vertical center axis, that have pair of notches portion is transformed into rotary electromagnetic field, simultaneously, on one side in above-mentioned resonant cavity 35, carry out resonance, on one side its part is supplied in the radial waveguide path 33 of antenna 30 radially.Transmit in radial waveguide path 33 electromagnetic field of high frequencies that supply in the antenna radially 30, the electromagnetic field F that transmits in this radial waveguide path 33 launches (or leakage) to handling in the container 11 from these slits 36, make by nozzle 17 and import to plasma gas ionization in the container handling 11, generate plasma S.
At this moment, the rotary electromagnetic field that carries out resonance in the resonant cavity 35 is supplied to radial waveguide path 33.Thereby, by in resonant cavity 35, the electromagnetic field of high frequency being transformed into circularly polarized wave, just can be from antenna 30 radially with good circularly polarized wave electromagnetic field of high frequency emission (or leakage) to handling in the container 11 uniformity of the plane distribution of the plasma S that raising is generated.
In the 3rd embodiment, making the phase difference of cut-out direction component E1 among the electric field E that is produced by feed pin 52 and perpendicular durection component E2 is 90 °, length l for the parallel portion of the conductive component 61A, the 61B that obtain good rotary electromagnetic field, can make to be arranged in the resonant cavity 35 and feed pin 52 3For about λ/4.Thereby Fig. 9 A shows, in that feed pin 52A is connected under the situation of the conductor plate 31 of antenna 30 radially, the length (the axial length of cylinder conductor part 51B) of conductive component 61C, 61D can be made as l 3About=λ/4.In addition, and extend under the situation of the other end, the length of the part parallel with conductive component 61A, the 61B of feed pin 52A can be made as l at an end that makes conductive component 61A, 61B from cylinder conductor part 51B 3About=λ/4.At this moment, shown in Fig. 9 B, can be l also at distance round conductor parts 51A 3The position of=λ/4,52A bends to the right angle with feed pin, and its front end vertically is connected to conductive component 61A.Thus, just can suppress the discharge that produces under the feed pin front end open-circuit condition situation.
In addition, as shown in figure 10, also conductive component 61E, 61F can be relied on the end beveling shape of waveguide 33 sides.At this moment, from the section shape perpendicular to the observed resonant cavity 35 of direction of the central shaft of resonant cavity 35 be exactly with the coupling part in radial waveguide path 33 have pyramidal shape.Thus, can make the impedance variation in the zone that the regional of conductive component is arranged in the resonant cavity 35 and do not have conductive component mild, suppress the reflection of the borderline electromagnetic field of high frequency in two zones.Even under situation, by being made as l except that the length of the body part its end with the end beveling shape of conductive component 61E, 61F 3About=λ/4, just can obtain good rotary electromagnetic field.
Have again, in the 3rd embodiment, although understand conductive component 61A～61F that setting axially prolongs from the one end on the internal face of cylinder conductor part 51B, on the section of resonant cavity 35, has notch, promptly shorten the situation of the distance of cut-out direction, but, also the cylindrical protrusion of making at opposed mutually one or more groups conductor on the internal face of cylinder conductor part 51B can be provided with on the direction of principal axis as conductive component.
Below with reference to Figure 11 the 4th embodiment is described.
The plasma device of the 4th embodiment will form ellipse perpendicular to the section of the central shaft of the resonant cavity 35 that has formed current feed department.
Specifically, above-mentioned resonant cavity 35 is formed by elliptic conductor parts and tubular conductor part 51B ', and wherein, the elliptic conductor parts are connected with the external conductor 41A of the coaxial waveguide 41 of feed electromagnetic field of high frequency; And tubular conductor part 51B ', end elliptic conductor parts therewith connects, and the other end is at waveguide 33 inner openings, and section is an elliptical shape.At this moment, also can will have with around the annular element 54 of the identical inner surface configuration of tubular conductor part 51B ' is arranged on the peristome that is arranged at the resonant cavity 35 of the central authorities of the conductor plate 32 of antenna 30 radially.
In this 4th embodiment, feed pin 52 separates in its diametric(al) from the center of elliptic conductor parts, and be configured in its long axis of ellipse and minor axis angle position at 45 respectively on.
Its result, in the electric field E that is produced by feed pin 52, ellipse short shaft durection component E1 is because of the influence phase lag of the relative capacity that increases.Thereby, set the section shape of resonant cavity 35 and the position of feed pin 52 by making phase difference with long axis direction component E2 be 90 °, just can obtain the rotary electromagnetic field of TE11 mould.
In having the plasma device of this current feed department, be transformed to rotary electromagnetic field by the electromagnetic field of high frequency of coaxial waveguide 41 feeds in the above-mentioned resonant cavity 35 by the resonant cavity 35 of section with feed pin 52 and above-mentioned elliptical shape, simultaneously, on one side in above-mentioned resonant cavity 35, carry out resonance, on one side its part is supplied in the radial waveguide path 33 of antenna 30 radially.
Therefore, same with the first, the 3rd above-mentioned embodiment, by in resonant cavity 35, the electromagnetic field of high frequency being transformed into circularly polarized wave, in container handling 11, launch (or leakage) good circularly polarized wave electromagnetic field of high frequency from antenna 30 radially, the uniformity of the plane distribution of the plasma S that is generated is improved.
Have, the degree of depth by adjusting resonant cavity 35 and the thickness of annular element 54 etc. carry out in resonant cavity 35 in the electromagnetic field of high frequency of resonance again, with regard to scalable supply to the electromagnetic field of high frequency in the radial waveguide path 33 ratio, be the Q value.
Below with reference to Figure 12 the 5th embodiment is described.
The plasma device of the 5th embodiment carries out 2 feeds by two coaxial waveguides to the resonant cavity 35 that is formed by round conductor parts 51A and cylinder conductor part 51B.
In the present embodiment, as shown in figure 12, at central shaft the 1st, the 2nd feed pin 52A, 52B are set along the position that its radial direction is separated from round conductor parts 51A, 1st, the 2nd feed pin 52A, 52B connect the inner conductor and the round conductor parts 51A of the 1st, the 2nd coaxial waveguide, and the position of these two feed pin 52A, 52B forms the right angle with respect to central shaft.
Then, by electromagnetic field of high frequency, in resonant cavity 35, generate the rotary electromagnetic field of TE11 mould from 90 ° of the 1st, the 2nd coaxial waveguide current feed phase phase mutual deviations.
Have again,, also can use the phse conversion circuit, but also synchronous electromagnetic field of high frequency can be supplied with two coaxial waveguides that the wavelength that transmits electromagnetic field only have 1/4 different length in order to have 90 ° phase difference.
In having the plasma device of this current feed department, by carrying out 2 above-mentioned feeds, to be transformed into rotary electromagnetic field from the electromagnetic field of high frequency of two coaxial waveguide feeds, simultaneously, on one side in above-mentioned resonant cavity 35, carry out resonance, on one side its part is supplied in the radial waveguide path 33 of antenna 30 radially.
Thereby, same with above-mentioned first～the 3rd embodiment, by in resonant cavity 35, the electromagnetic field of high frequency being transformed into circularly polarized wave, in container handling 11, launch (or leakage) good circularly polarized wave electromagnetic field of high frequency from antenna 30 radially, just can improve the uniformity of plane distribution of the plasma S of generation.
At this moment, by the degree of depth of adjustment resonant cavity 35 and the thickness of annular element 54 etc., carry out in resonant cavity 35 in the electromagnetic field of high frequency of resonance, scalable supplies to the ratio of the electromagnetic field of high frequency in the radial waveguide path 33, promptly can regulate the Q value, and this and above-mentioned other embodiment are same.
Come key diagram the 6th embodiment below with reference to Figure 13 A, Figure 13 B.
The plasma device of this 6th embodiment is in the resonant cavity 35 that is formed by round conductor parts 51A and cylinder conductor part 51B, generates rotary electromagnetic field by the microstrip antenna feed.
As shown in FIG. 13A, the microstrip antenna 71 that uses in this microstrip antenna feed by the round conductor parts 51A of ground connection, be configured in below these round conductor parts 51A dielectric plate 72 and by this dielectric plate 72 and constitute with the conductor plate 73 of round conductor parts 51A arranged opposite.External conductor 41A, the 47A (external conductor 47A is not shown) that connect two coaxial waveguides 41,47 on round conductor parts 51A are connected with inner conductor 41B, the 47B (inner conductor 47B is not shown) of two coaxial waveguides 41,47 on conductor plate 73.In addition, for the center of conductor plate 73 is fixed with earthing potential, also the center of conductor plate 73 can be connected to round conductor parts 51A with conductor pin.Round conductor parts 51A, conductor plate 73 and conductor wait with copper or aluminium and make, and dielectric plate 72 usefulness potteries wait to be made.
Figure 13 B is the plane graph when XIIIb-XIIIb ' line direction is observed conductor plate 73.Shown in Figure 13 B, the flat shape of conductor plate 73 presents the length of side and is approximately λ G1/ 2 square.λ G1The wavelength of the electromagnetic field of high frequency that finger is propagated between round conductor parts 51A and conductor plate 73.
The initial point O of coordinate system is made as the center of conductor plate 73, by parallel x axle, the y axle set with each limit of conductor plate 73, inner conductor 41B, the 47B of two coaxial waveguides 41,47 connect initial point O the x axle, 2 points on the y axle of distance about equally on the conductor plate 73.Be called distributing point P, Q with these 2.
For the microstrip antenna 71 of such formation,, can in resonant cavity 35, generate the rotary electromagnetic field of TE11 mould by equating from two coaxial waveguides, 41,47 feed amplitudes and the electromagnetic field of high frequency of 90 ° of phase phasic differences.Its principle is as follows.
The axial length of the x of conductor plate 73 is λ G1/ 2, so the electric current that supplies to distributing point P by a coaxial waveguide 41 carries out resonance on the x direction of principal axis, be parallel to the linearly polarized wave of x axle from the both sides emission of the y axle that is parallel to conductor plate 73.In addition, again because the axial length of y of conductor plate 73 also is λ G1/ 2, so the electric current that supplies to distributing point Q by another coaxial waveguide 47 carries out resonance on the y direction of principal axis, be parallel to the linearly polarized wave of y axle from the both sides emission of the x axle that is parallel to conductor plate 73.The current feed phase of two coaxial waveguides 41,47 differs 90 ° mutually, and therefore the phase place of two linearly polarized waves being launched also differs 90 ° mutually.And, because both amplitudes equate, quadrature spatially, so become circularly polarized wave, generation rotary electromagnetic field resonant cavity 35 in.
The rotary electromagnetic field that generates like this carries out resonance on one side in resonant cavity 35, Yi Bian its part is fed in the radial waveguide path 33 of antenna 30 radially.
Thereby, same with above-mentioned other embodiment, in container handling 11, launch (or leakage) good circularly polarized wave electromagnetic field of high frequency from antenna 30 radially, can improve the uniformity of plane distribution of the plasma S of generation.
At this moment, by the degree of depth of adjustment resonant cavity 35 and the thickness of annular element 54, just can in resonant cavity 35, carry out in the electromagnetic field of high frequency of resonance, regulate the ratio that supplies to the electromagnetic field of high frequency in the radial waveguide path 33, promptly can regulate the Q value, this is identical with above-mentioned other embodiment.
Having, is 90 ° in order to make the current feed phase difference to microstrip antenna 71 again, also can use the phse conversion circuit, still, also synchronous electromagnetic field of high frequency can be supplied with two coaxial waveguides that the wavelength that transmits electromagnetic field only have 1/4 different length.
In addition, the flat shape of the conductor plate 73 that microstrip antenna 71 has also can be circular 90 ° of rotation symmetric shapes (with conductor plate 73 overlapping shapes during 90 ° of rotations around the heart therein) except the square shown in Figure 13 B.Wherein, under the situation of circle, diameter can be established and be approximately 1.17 * λ G1/ 2.Furtherly, the flat shape of conductor plate 73 also can be the different shape of length of the two vertical directions of observing from its center such as rectangle.In this case, the difference that does not make the current feed phase of two distributing point P, Q is 90 °, can adjust according to the length of above-mentioned two directions.
Below with reference to Figure 14 A, Figure 14 B the 7th embodiment is described.Have again, the parts identical with the 6th embodiment are used identical label, and omit its explanation.
The 6th embodiment uses the microstrip antenna 71 of 2 feeds of two coaxial waveguides 41,47, and the 7th embodiment uses some fed microstrip antennas 75 of a coaxial waveguide 41.
Shown in Figure 14 A, this microstrip antenna 75 by the round conductor parts 51A of ground connection, be disposed at the dielectric plate 72 below these round conductor parts 51A and constitute by dielectric plate 72 and with the conductor plate 76 of round conductor parts 51A arranged opposite.The external conductor 41A that on round conductor parts 51A, connects coaxial waveguide 41, the inner conductor 41B of connection coaxial waveguide 41 on conductor plate 73.
Figure 14 B is the plane graph when XIVb-XIVb ' line direction is observed conductor plate 76.As shown in Figure 14B, the flat shape of conductor plate 76 is rendered as the shape of a part of neighboring area of circle 76A being carried out otch.In more detail, be that circumference is become rectangular-shaped shape with near the two regional otch that the y axle intersects.The otch area can be about 3% of round 76A area.Here, can make conductor plate 76 is 1.17 * λ in the axial length of x G1/ 2, be 1.17 * λ in the axial length of y G1/ 2-2d.
The inner conductor 41B of coaxial waveguide 41 be connected to with the straight line of x axle, y axle angular cross at 45 on a bit.This point is called distributing point V.
The electric current of supplying with the distributing point V of conductor plate 76 by coaxial waveguide 41 flows through on x direction of principal axis and y direction of principal axis respectively individually.At this moment, the axial length of y is only than 1.17 * λ G1/ 2 short 2d are so the dielectric constant that electromagnetic field reflects increases the phase lag of the electric current that flows through on the y direction of principal axis.The value by setting 2d and the length of notch is so that this phase lag is 90 °, thereby from microstrip antenna 75 emission circularly polarized waves, just generates the rotary electromagnetic field of TE11 mould in resonant cavity 35.
The rotary electromagnetic field that generates like this carries out resonance on one side in resonant cavity 35, Yi Bian its part is fed in the radial waveguide path 33 of antenna 30 radially.
Thereby, same with above-mentioned the 6th embodiment, in container handling 11, launch (or leakage) good circularly polarized wave electromagnetic field of high frequency from antenna 30 radially, just can improve the uniformity of plane distribution of the plasma S of generation.
Have, the flat shape of conductor plate 76 is not limited to the shape shown in Figure 14 B again, also can be the different shape of length of two vertical directions from the center of conductor version 76 at least.Thereby, for example can be oval, also can be long edge lengths is approximately λ G1/ 2, the length of minor face is approximately less than λ G1/ 2 rectangle.
Below, with reference to Figure 15 the 8th embodiment is described.
The plasma device of this 8th embodiment, in the resonant cavity 35 that is formed by round conductor parts 51A and cylinder conductor part 51B, the cutler feed of the rectangular waveguide 81 by having used the TE10 mould generates rotary electromagnetic field.
The E face of the rectangular waveguide 81 that uses in this cutler feed is formed with intersection slit 82 on (perpendicular to the side of pipe internal electric field).This intersects slit 82 and is intersected on mutual center and constitute in two different slits mutually by length.Each center in these two slits, promptly intersect the center in slit 82 and roughly be positioned on the central shaft of E face.
Adjusting the length in each slit to constitute intersecting two slits in slit 82, making frequency characteristic for 2.45GHz that difference about 55 °～70 ° relatively be arranged, and adjusting the angle in each slit, the amplitude of the radiation electric field that each slit produces is equated.
The terminal 83 of rectangular waveguide 81 is by metal enclosed, think to make and intersect the amplitude maximum of the emission electromagnetic field that slit 82 produces, roughly separate λ with intersecting the terminal 83 that slit 82 is configured in its centre-to-centre spacing rectangular waveguide 81 G2On/2 the position.λ G2It is the wavelength of the electromagnetic field of high frequency of transmission in rectangular waveguide 81.
The design example in intersection slit 82 is shown in Figure 16 A, Figure 16 B.Have, Figure 16 A, Figure 16 B are the plane graphs of observing the E face of rectangular waveguide 81 from XVI-XVI ' line direction again.
In the intersection slit 82A shown in Figure 16 A, two slits that constitute this intersection slit intersect mutually, are roughly the right angle, in addition, roughly tilt 45 ° for the central shaft of the E face of rectangular waveguide 81.The length in each slit is respectively 5.57cm, 6.06cm.
In the intersection slit 82B shown in Figure 16 B, constitute this intersect the slit two slits with roughly 107 ° intersect mutually, and roughly tilt 36.5 ° for the central shaft of the E face of rectangular waveguide 81.The length in each slit is respectively 5.32cm, 7.26cm.
On the E face that such intersection slit 82A, 82B are formed on rectangular waveguide 81, can obtain the circularly polarized wave of the TE11 mould very little with respect to the axial ratio of 2.45GHz frequency.
As shown in figure 15, in the 8th embodiment, formed and intersected the round conductor parts 51A of E face and an end face that forms resonant cavity 35 of waveguide 81 in slit 82 and be fitted and connected, intersected slit 82 to dispose with the central shaft of resonant cavity 35 is consistent with its center.In addition, in round conductor parts 51A at least with intersect slit 82 opposed regional openings, the electromagnetic field of high frequency of transmitting is transmitted in the resonant cavity 35.
Have, the central shaft of the center resonant cavity 35 in intersection slit 82 also can be consistent again.In addition, also the end of cylinder conductor part 51B can be blocked with the E face of rectangular waveguide 81, be constituted round conductor parts 51A with the part of the E face of this rectangular waveguide 81.
In such plasma device, transmit rectangular waveguide 81 from the electromagnetic field of high frequency that radio-frequency generator 45 produces, launch in resonant cavity 35 by the intersection slit 82 that is formed on the E face.The electromagnetic field of high frequency that is transmitted in the resonant cavity 35 becomes the circularly polarized wave of TE11 mould, and generates rotary electromagnetic field.This rotary electromagnetic field carries out resonance on one side in resonant cavity 35, Yi Bian its part is fed in the radial waveguide path 33 of antenna 30 radially.
Therefore, same with above-mentioned other embodiment, in container handling 11, launch (or leakage) good circularly polarized wave electromagnetic field of high frequency from antenna 30 radially, just can improve the uniformity of plane distribution of the plasma S of generation.
Shown in Figure 17 A, also can on the end face of the rectangular waveguide 84 of TE10 mould, be provided with and intersect slit 85 and carry out cutler feed.The structure that is formed on the intersection slit 85 on the end face of this rectangular waveguide 84 be formed on the E face to intersect the structure in slit 82 roughly the same.That is, intersection slit 85 is made of two slits that mutual center intersects, and makes the frequency characteristic for 2.45GHz relatively have the difference about 55 °～70 ° to come these two slits are adjusted, and its length is different mutually.Wherein, the center in intersection slit 85 is configured in the approximate center of the end face of rectangular waveguide 84.
The design example in intersection slit 85 is shown in Figure 17 B.Have, Figure 17 B is a plane graph of observing the end face of rectangular waveguide 84 from XVIIb-XVIIb ' line direction again.In the intersection slit 85A shown in Figure 17 B, constitute these two slits that intersect the slit and intersect mutually, be roughly the right angle, in addition, approximately tilt 45 ° for the electric field line of hypothesis in the central part generation of rectangular waveguide 84.The length in each slit is respectively 5.57cm, 6.06cm.By such intersection slit 85A is formed, just can obtain circularly polarized wave for the very little TE11 mould of the axial ratio of 2.45GHz frequency on the end face of rectangular waveguide 84.
Thereby, by coming the feed electromagnetic field of high frequency, just can in resonant cavity 35, generate rotary electromagnetic field by the intersection slit 85 on the end face that is formed on rectangular waveguide 84.Thus, with to carry out the situation of feed identical by the slit 82 that intersects on the E face that is formed on rectangular waveguide 81, can improve the uniformity of the plane distribution of the plasma S that in container handling 11, is generated.
In the 8th embodiment, show according to intersecting the example of cutler feed in slit 82,85, but as shown in figure 18, feed is carried out in the so-called Ha word slit that also can use two slit 87A, 87B with mutually perpendicular direction to be configured on the position spaced.
In addition, the slit flat shape in intersection slit 82,85 or formation Ha word slit can be the rectangle shown in Figure 19 A, also can be the shape that the two ends with two parallel lines shown in Figure 19 B connect with curves such as circular arcs.The length L in slit is the length on the long limit of rectangle in Figure 19 A, is the length that two relative curves are spaced apart maximum position in Figure 19 B.
Have again, shown in Figure 15, Figure 17 A, Figure 17 B, in rectangular waveguide 81,84, intersecting between the part and radio-frequency generator 45 of slit 82,85 formation, also can configurations match circuit 44.Thus, will turn back to load-side once more and not turn back to radio-frequency generator 45 from the reflection electric energy of plasma load, this just can be expeditiously to the plasma supply of electrical energy.
The radially antenna 30 that uses in the above embodiments of the invention, wherein, the conductor plate 31 that constitutes the slit face is a tabular, but the radially antenna 30A shown in Figure 20 A, Figure 20 B is such, and the conductor plate 31A that constitutes the slit face also can be the taper seat shape.Incide by on the plasma dignity that is flat dielectric plate 13 defineds from tilted direction from the electromagnetic field of the slit surface launching that is the taper seat shape (or leakage).Therefore, the absorption efficiency of the electromagnetic field of plasma is improved, so just can weaken the standing wave that exists between antenna surface and the plasma dignity, can improve the uniformity of plasma distribution.
Have, constituting radially, the conductor plate 31A of the antenna surface of antenna 30 also can be a taper seat shape convex form in addition again.Its convex form can be convex, also can be protruding downwards.In addition, the round conductor parts 51A of an end face of formation resonant cavity 35 also can form the radially convex form of the conductor plate 31A of antenna 30A.
As mentioned above, according to the foregoing description, the resonant cavity that constitutes resonator is set in current feed department, be transformed into rotary electromagnetic field for the electromagnetic field of high frequency of this resonant cavity feed, simultaneously, this rotary electromagnetic field is carried out resonance on one side in described resonant cavity, its part is supplied with slot antenna on one side, so by in this resonant cavity, rotary electromagnetic field being become circularly polarized wave, just can supply with the rotary electromagnetic field that becomes circularly polarized wave, just can improve the uniformity of the plane distribution of the plasma that generates therefrom to described slot antenna.
Utilizability on the industry
The present invention can be applicable in the processing of use plasma of etching, CVD, ashing etc.

Claims (29)

1. plasma device is characterized in that having:
Slot antenna is formed in the waveguide of the electromagnetic field of high frequency of supplying with by current feed department; And
Container handling generates plasma by the electromagnetic field of high frequency of supplying with by this slot antenna,
Described current feed department has resonant cavity, and described resonant cavity constitutes resonator, simultaneously, the electromagnetic field of high frequency of feed is transformed into rotary electromagnetic field and supplies with described waveguide.
2. plasma device according to claim 1 is characterized in that having,
Annular element, be arranged on the described resonant cavity in the described waveguide peristome around, have and the identical internal diameter of described resonant cavity internal diameter.
3. plasma device as claimed in claim 1 is characterized in that,
Described resonant cavity is formed by round conductor parts and cylinder conductor part, wherein,
Described round conductor parts are connected with the external conductor of the coaxial waveguide of feed electromagnetic field of high frequency;
The round conductor parts connection therewith of described cylinder conductor part, an end, the other end are at described waveguide inner opening; Simultaneously,
Described resonant cavity has:
Feed pin, the center from described round conductor parts of being arranged on is along on its radial direction position spaced, and the one end is connected with the inner conductor of described coaxial waveguide; And
The disturbance pin, be arranged on the center that inserts and puts described round conductor and therewith feed pin form on the position of angle of regulation, an end is connected with described round conductor parts.
4. as plasma device as described in the claim 3, it is characterized in that,
The other end of described feed pin is an open-circuit condition.
5. as plasma device as described in the claim 3, it is characterized in that,
The other end of described feed pin is connected on the conductor plate that forms apertured antenna surface, and this conductor plate that forms apertured antenna surface constitutes described slot antenna.
6. as plasma device as described in the claim 5, it is characterized in that,
On the other end of described feed pin, be provided with the conductive component of the circular cone shape of expanding in the conductor plate side of described antenna surface.
7. as plasma device as described in the claim 5, it is characterized in that,
The other end of described disturbance pin connects the conductor plate of described antenna surface.
8. as plasma device as described in the claim 5, it is characterized in that,
The other end of described disturbance pin connects described cylinder conductor part.
9. as plasma device as described in the claim 3, it is characterized in that,
The other end of described feed pin connects described cylinder conductor part.
10. as plasma device as described in the claim 9, it is characterized in that,
The other end of described disturbance pin is connected to the conductor plate or the described cylinder conductor part of the formed antenna surface in slit that constitutes described slot antenna.
11. plasma device is characterized in that according to claim 1,
Described resonant cavity is formed by round conductor parts, cylinder conductor part and conductive component, wherein,
Described round conductor parts are connected with the external conductor of the coaxial waveguide of feed electromagnetic field of high frequency;
The round conductor parts connection therewith of described cylinder conductor part, an end, the other end are at described waveguide inner opening;
Described conductive component, arranged opposite is in the interior of this cylinder conductor part; Simultaneously, described resonant cavity has,
Feed pin, the center from described round conductor parts of being arranged on is along on its radial direction position spaced, and an end is connected with the inner conductor of described coaxial waveguide.
12. as plasma device as described in the claim 11, it is characterized in that,
Described conductive component, the axial length of described cylinder conductor part roughly be described electromagnetic field of high frequency wavelength 1/4.
13. as plasma device as described in the claim 11, it is characterized in that,
Described conductive component, the end of described waveguide side is made into ramped shaped.
14. as plasma device as described in the claim 13, it is characterized in that,
The length of body on the direction of principal axis of described cylinder conductor part except that the described end of described conductive component roughly be described electromagnetic field of high frequency wavelength 1/4.
15. as plasma device as described in the claim 11, it is characterized in that,
The other end of described feed pin is connected on the conductor plate of the formed antenna surface in slit that constitutes described slot antenna.
16. as plasma device as described in the claim 11, it is characterized in that,
The other end of described feed pin roughly separates at the direction of principal axis from described round conductor parts along described cylinder conductor part on the position of 1/4 wavelength of described electromagnetic field of high frequency, connects described conductor part.
17. plasma device is characterized in that according to claim 1,
Described resonant cavity is formed by elliptic conductor parts and tubular conductor part, wherein,
Described elliptic conductor parts are connected with the external conductor of the coaxial waveguide of feed electromagnetic field of high frequency;
The elliptic conductor parts are connected therewith, the other end is elliptical shape at described waveguide inner opening, section for described tubular conductor part, an end; Simultaneously, described resonant cavity has,
Feed pin, be arranged on separate from the center of described elliptic conductor portion along its radial direction and with the position of its major axis and minor axis shape angle at 45 on, be connected with the inner conductor of described coaxial waveguide.
18. plasma device is characterized in that according to claim 1,
Described resonant cavity is formed by round conductor parts and cylinder conductor part, wherein,
Described round conductor parts are connected with the external conductor of the 1st, the 2nd coaxial waveguide of feed electromagnetic field of high frequency;
The round conductor parts connection therewith of described cylinder conductor part, an end, the other end are at described waveguide inner opening; Simultaneously, described resonant cavity has,
The 1st feed pin, the center from described round conductor parts of being arranged on is connected with the inner conductor of described the 1st coaxial waveguide along on its radial direction position spaced; And
The 2nd feed pin, be arranged on the center that inserts and puts described round conductor and therewith the 1st feed pin form on the position at right angle, be connected with the inner conductor of described the 2nd coaxial waveguide.
19. plasma device is characterized in that according to claim 1,
Described resonant cavity is formed by round conductor parts and cylinder conductor part, and wherein, described round conductor parts are connected with the external conductor of at least one coaxial waveguide of feed electromagnetic field of high frequency;
The round conductor parts are connected therewith, the other end is at described waveguide inner opening for described cylinder conductor part, an end; Simultaneously, described resonant cavity has,
Microstrip antenna will be transmitted in the described resonant cavity as described rotary electromagnetic field from the described electromagnetic field of high frequency of described at least one coaxial waveguide feed;
Described microstrip antenna comprises:
Described round conductor parts; And
Conductor plate, the round conductor parts have the interval of regulation and arranged opposite, are connected with the inner conductor of described at least one coaxial waveguide therewith.
20. plasma device is characterized in that according to claim 1,
Described resonant cavity is by a side or the end face of the rectangular waveguide of feed electromagnetic field of high frequency, and the formation of cylinder conductor part, wherein,
Described cylinder conductor part, an end be a side of rectangular waveguide or end face connects, the other end is at described waveguide inner opening therewith,
On a side or end face of described rectangular waveguide, be formed with described electromagnetic field of high frequency is transmitted into a plurality of slits in the described resonant cavity as described rotary electromagnetic field.
21. as plasma device as described in the claim 20, it is characterized in that,
Described a plurality of slit is two slits that intersect on mutual mid point.
22. as plasma device as described in the claim 20, it is characterized in that,
Described a plurality of slit is to be spaced from each other two slits configuration, that prolong on the direction of mutual approximate vertical.
23. a plasma generating method is characterized in that,
The electromagnetic field of high frequency feed give is constituted the resonant cavity of resonator, this electromagnetic field of high frequency is transformed into rotary electromagnetic field, simultaneously, in electromagnetic field of high frequency that described resonant cavity interior resonance on one side will be transformed into rotary electromagnetic field supply with waveguide on one side.
By being formed on the slot antenna in the described waveguide, container handling is supplied with in the electromagnetic field of high frequency that described waveguide is supplied with, generate plasma.
24., it is characterized in that as plasma generating method as described in the claim 23:
By the round conductor parts that are connected with the external conductor of coaxial waveguide and an end therewith the round conductor parts connect and the other end forms described resonant cavity at the cylinder conductor part of described waveguide inner opening;
The feed pin that is connected with the inner conductor of described coaxial waveguide in this resonant cavity is arranged on center from described round conductor parts along on its radial direction position spaced; Simultaneously,
Also on the position of the angle of feed pin formation regulation the disturbance pin that is connected with described round conductor parts is set therewith at the center that inserts and puts described round conductor;
By described coaxial waveguide to described resonant cavity feed electromagnetic field of high frequency;
By described feed pin and described disturbance pin this electromagnetic field of high frequency is transformed into rotary electromagnetic field, simultaneously, on one side resonance will be transformed into rotary electromagnetic field on one side in described resonant cavity electromagnetic field of high frequency supply with described waveguide;
In container handling, supply with and generate plasma by being formed on slot antenna in this waveguide.
25., it is characterized in that as plasma generating method as described in the claim 23:
By the round conductor parts that are connected with the external conductor of coaxial waveguide, an end therewith the round conductor parts connect and the other end at the cylinder conductor part of described waveguide inner opening and arranged opposite conductive component in the interior of this cylinder conductor part, the section that is formed on the axle of vertical this cylinder conductor part has the described resonant cavity of mutual opposed pair of notches portion;
The feed pin that is connected with the inner conductor of described coaxial waveguide in this resonant cavity center from described round conductor parts is separated along its radial direction, and be arranged on from the center line position spaced of the described notch of described resonant cavity section;
By described coaxial waveguide to described resonant cavity feed electromagnetic field of high frequency;
By described resonant cavity this electromagnetic field of high frequency is transformed into rotary electromagnetic field with described feed pin and described notch, simultaneously, in described resonant cavity carry out electromagnetic field of high frequency that resonance on one side will be transformed into rotary electromagnetic field and supply with described waveguide on one side;
In container handling, supply with and generate plasma by being formed on slot antenna in this waveguide.
26., it is characterized in that as plasma generating method as described in the claim 23:
By the elliptic conductor parts that are connected with the external conductor of coaxial waveguide and an end therewith the elliptic conductor parts connect and the other end is that the tubular conductor part of elliptical shape forms described resonant cavity at described waveguide inner opening, section;
The feed pin that is connected with the inner conductor of described coaxial waveguide in this resonant cavity center from described elliptic conductor parts is separated, and be arranged on the position with the major axis of described elliptic conductor parts and minor axis angle at 45;
By described coaxial waveguide to described resonant cavity feed electromagnetic field of high frequency;
The resonant cavity of the section by having described feed pin and elliptical shape is transformed into rotary electromagnetic field with this electromagnetic field of high frequency, simultaneously, in described resonant cavity carry out electromagnetic field of high frequency that resonance on one side will be transformed into rotary electromagnetic field and supply with described waveguide on one side;
In container handling, supply with and generate plasma by being formed on slot antenna in this waveguide.
27., it is characterized in that as plasma generating method as described in the claim 23:
Round conductor parts that are connected by the external conductor with the 1st, the 2nd coaxial waveguide and an end round conductor parts therewith connect and the other end forms described resonant cavity at the cylinder conductor part of described waveguide inner opening;
The 1st feed pin that is connected with the inner conductor of described the 1st coaxial waveguide in this resonant cavity is arranged on center from described round conductor parts along on its radial direction position spaced, simultaneously, the 2nd feed pin that will be connected with the inner conductor of described the 2nd coaxial waveguide is arranged on the center that inserts and puts described round conductor parts and forms on the position at right angle with described the 1st feed pin;
Differ 90 ° electromagnetic field of high frequency mutually to described resonant cavity current feed phase by described the 1st, the 2nd coaxial waveguide;
To be transformed into rotary electromagnetic field from the electromagnetic field of high frequency of these coaxial waveguide feeds, simultaneously, in described resonant cavity carry out electromagnetic field of high frequency that resonance on one side will be transformed into rotary electromagnetic field and supply with described waveguide on one side;
In container handling, supply with and generate plasma by being formed on slot antenna in this waveguide.
28., it is characterized in that as plasma generating method as described in the claim 23:
By the round conductor parts that are connected with the external conductor of at least one coaxial waveguide and an end therewith the round conductor parts connect and the other end forms described resonant cavity at the cylinder conductor part of described waveguide inner opening;
Interval arranged opposite with the conductor plate that is connected with the inner conductor of described at least one coaxial waveguide in this resonant cavity and described round conductor parts have regulation constitutes the microstrip antenna that comprises described conductor plate and described round conductor parts;
To described microstrip antenna feed electromagnetic field of high frequency, in described resonant cavity, generate rotary electromagnetic field by described at least one coaxial waveguide;
In described resonant cavity, supply with described waveguide while carrying out the electromagnetic field of high frequency that resonance will be transformed into rotary electromagnetic field;
In container handling, supply with and generate plasma by being formed on slot antenna in this waveguide.
29., it is characterized in that as plasma generating method as described in the claim 23:
A side of rectangular waveguide or end face connect and the other end forms described resonant cavity at the cylinder conductor part of described waveguide inner opening therewith by a side of the rectangular waveguide of feed electromagnetic field of high frequency or end face and an end;
Generate rotary electromagnetic field to the emission of described resonant cavity from the electromagnetic field of high frequency of described rectangular waveguide feed by a plurality of slits that are formed on a described side or the end face;
In described resonant cavity, supply with described waveguide while carrying out the electromagnetic field of high frequency that resonance will be transformed into rotary electromagnetic field;
In container handling, supply with and generate plasma by being formed on slot antenna in this waveguide.
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