CN1270408A - Multi-beam electronic gun for projection tube - Google Patents

Multi-beam electronic gun for projection tube Download PDF

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Publication number
CN1270408A
CN1270408A CN 99105542 CN99105542A CN1270408A CN 1270408 A CN1270408 A CN 1270408A CN 99105542 CN99105542 CN 99105542 CN 99105542 A CN99105542 A CN 99105542A CN 1270408 A CN1270408 A CN 1270408A
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CN
China
Prior art keywords
lens
electrode
diaphragm
electron gun
constitute
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN 99105542
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Chinese (zh)
Inventor
朱锦林
林岱恩
肖顺禄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ZHENMEI AUDIO AND VIDEO TECHNOLOGIES Co Ltd BEIJING
Original Assignee
ZHENMEI AUDIO AND VIDEO TECHNOLOGIES Co Ltd BEIJING
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ZHENMEI AUDIO AND VIDEO TECHNOLOGIES Co Ltd BEIJING filed Critical ZHENMEI AUDIO AND VIDEO TECHNOLOGIES Co Ltd BEIJING
Priority to CN 99105542 priority Critical patent/CN1270408A/en
Publication of CN1270408A publication Critical patent/CN1270408A/en
Pending legal-status Critical Current

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Abstract

A multi-beam electronic gun for projection tube features that a multi-beam modulation electrode is arranged behind the single common cathode to form a group of multi-beam cathode lenses, a correcting electrode is arranged after the accelerating electrode to form a combined lens of prefocusing lens and refraction plasm, and multiple electronic beams share a main lens consisting of the first anode, focusing electrode and anode, so retaining smaller pitch between object points and smaller deflection aberration and obtaining high brightness and resolution.

Description

Multi-beam electronic gun for projection tube
The invention belongs to the electric vacuum display device field, specially refer to the multi beam electron gun that uses in the projection tube.
The picture tube that is used for the high definition projection TV set, hereinafter referred to as projection tube, the chromoscope more used than general general television set has higher brightness and resolution, in same device, relation between high brightness and the high-resolution is conflicting, in another patent of invention " projection tube high brightness; high-resolution double-beam electron gun " that we declare, illustrate, in order to overcome this contradiction, make projection tube possess high brightness and high-resolution simultaneously, will adopt custom-designed electron gun new departure that changes over two-beam or multibeam electron notes that single beam electrons is annotated, in prior art, introduced a kind of " the multi electron beam electron gun that is used for chromoscope ", be U.S. Pat .5,350,978, " Multi-Beam Group Gun ", proposed the two-beam or the high beam electrons rifle of the yi word pattern arrangement of suitable chromoscope application, this rifle line is less, is generally less than 500 microamperes, only suitable picture tube usefulness, projection tube needs bigger line value.This rifle can only adopt multi beam scan mode arranged side by side, on electron-optical system, do not consider astigmatism compensation yet, for brightness and the resolution that improves projection tube simultaneously, obtain the picture of high-quality, we have developed and have been suitable for the multi beam electron gun that projection tube uses, multi beam gives focus lens and main lens jointly, has considered the compensation to aberration simultaneously.
Purpose of the present invention in order to overcome in projection TV, to improve the image brightness of projection tube and improves existing contradiction between the resolution, and simultaneously the projection tube electron-optical system is carried out aberration compensation and improve image quality, and a kind of multi beam electron gun of design.
The present invention relies on following technical proposals to realize, a kind of multi-beam electronic gun for projection tube, arrange routinely successively by cathode assembly, Wehnelt electrode, intensifying ring, focusing electrode, anode, it is characterized in that, after shared single negative electrode K, multi beam Wehnelt electrode G1 is set symmetrically, constitutes one group of multi beam cathode lens; Correcting electrode G2 ' is set behind intensifying ring G2, constitute the refracting prisms of one group of multiple beam, the spacing that multibeam electron is annotated is reduced, set gradually the shared prefocus lens that intensifying ring G2 and first anode G3 are constituted again, set up the diaphragm of two eccentric inner holes at this, constitute the coma offset lens, between focusing electrode and anode, constitute a shared main lens, at this rectangle endoporus diaphragm L2 is set, it and in addition two rectangle endoporus diaphragm L1 of the both sides that are placed in, the dynamic quadrupole field offset lens of the common formation of L3, regulate each electrode potential, make electron beam in rifle, intersect at regulation a bit, according to the accent current potential, this point can be adjusted near the deflection center, constitute the Hi-BPF electron gun structure, also can be adjusted near the saddle point of UPF field potential distribution, constitute the Hi-UPF electron gun structure.
In the said coma offset lens, diaphragm endoporus and outer rim decentraction, two center of circle spacings are d, the d value is determined in the electron gun simulative optimization, is found the numerical value of corresponding coma minimum to be required d value.
In the said dynamic Quadrupole Lens, diaphragm L1, the rectangle endoporus of L3 is vertical the setting, the rectangle endoporus of diaphragm L2 is for being horizontally disposed with, the dynamic Quadrupole Lens of the common formation of three, when the grating edge of screen also obtains minimum spot size simultaneously, reach whole image all for visual clearly, in the compensation mechanism that diskette constitutes, diskette can use four pole pieces, also can use the sextupole sheet or mix use, when surveying when regulating or changing, with screen obtain minimum spot size and reach given interfascicular apart from the time, think that promptly the diskette compensation has been in optimum state.
The multi beam electron gun that this programme constitutes, can adopt multi beam scanning mode arranged side by side, also can adopt the work of multi beam colleague sequential scanning state, this multi beam projection tube electron gun can use multibeam electron to annotate as a projection tube simultaneously and use, and also can use simultaneously as many single beam tubes respectively or use in turn, in this multi beam electron gun owing to considered astigmatism compensation simultaneously, four jiaos and peripheral image definition height on the screen, visual non-jitter, flicker free.And the load that each luminous point of synchronization is born on the phosphor screen alleviates, and fluorescent material " hot essence is gone out " phenomenon is reduced.
This multi beam electron gun has solved the contradiction that exists between brightness and resolution in the common projection tube, with common single beam tube cast brightness spot-size resolution beam electronic current negative electrode load fluorescent screen common single beam tube A of glazing point load life-span relatively 0D 0K 0I 0JK 0P 0T 0Two-beam tube A 0D n/ 2 nK 0I 0JK 0/ 2 P 0/ 2 nT 0More than
Near nA 0D 0K 0NI 0JK 0P 0T 0N is the bundle number of multi beam.
Further specify embodiment below in conjunction with accompanying drawing:
Description of drawings:
Fig. 1 has electron-optical system schematic diagram in the multi beam electron gun of aberration compensation;
Fig. 2 is the multi beam electron gun structural representation that aberration compensation is arranged.
Fig. 3 a is a multi beam Wehnelt electrode shape; Fig. 3 b is the intensifying ring shape; Fig. 3 c is that correcting electrode shape, Fig. 3 d, Fig. 3 e are coma offset lens diaphragm; Fig. 3 f, Fig. 3 g are dynamic Quadrupole Lens compensating plate.
Fig. 4 a-Fig. 4 b is soft magnetism four, sextupole magnetic sheet shape.
CL-cathode lens among the figure, the SL-refracting prisms, the preposition prefocus lens of PL-, CML-coma offset lens, the ML main lens, the dynamic Quadrupole Lens of QL, the foundation cathode assembly K of projection tube electron gun wherein, label is 1, centrally assembling G1 Wehnelt electrode 2, G2 intensifying ring 3, G2 ' correcting electrode 3 along axle, G3-1, G3-2, G3-3, G3-4 is four parts of focusing electrode, label is 4.1,4.2,4.3,4.4 G4 is an anode 5, Fig. 4 a, among Fig. 4 b four, the sextupole diskette is denoted as 6,6 ', make multi beam experiment rifle, obtained high brightness and high-resolution.

Claims (4)

1, a kind of multi-beam electronic gun for projection tube is arranged successively routinely by cathode assembly, Wehnelt electrode, intensifying ring, focusing electrode, anode, it is characterized in that, after shared single negative electrode, multi beam Wehnelt electrode G1 is set symmetrically, constitutes one group of multi beam cathode lens; Correcting electrode G2 ' is set behind intensifying ring G2, constitute the refracting prisms of one group of multiple beam, the spacing that multibeam electron is annotated is reduced, set gradually the shared prefocus lens that intensifying ring G2 and first anode G3 are constituted again, set up the diaphragm of two eccentric inner holes at this, constitute the coma offset lens, between focusing electrode and anode, constitute a shared main lens, at this rectangle endoporus diaphragm L2 is set, it and in addition two rectangle endoporus diaphragm L1 of the both sides that are placed in, the dynamic quadrupole field offset lens of the common formation of L3, regulate each electrode potential, make electron beam in rifle, intersect at regulation a bit, according to the accent current potential, this point can be adjusted near the deflection center, constitute the Hi-BPF electron gun structure, also can be adjusted near the saddle point of UPF field potential distribution, constitute the Hi-UPF electron gun structure.
2, multi beam electron gun according to claim 1, it is characterized in that in the said coma offset lens, diaphragm endoporus and outer rim decentraction, two center of circle spacings are d, the d value is determined in the electron gun simulative optimization, is found the numerical value of corresponding coma minimum to be required d value.
3, multi beam electron gun according to claim 1 is characterized in that in the said dynamic Quadrupole Lens, and the rectangle endoporus of diaphragm L1, L3 is vertical the setting, and the rectangle endoporus of diaphragm L2 is for being horizontally disposed with.
4, multi beam electron gun according to claim 1 is characterized in that, in the compensation mechanism that diskette constitutes, diskette can use four pole pieces, also can use the sextupole sheet and mix use.
CN 99105542 1999-04-14 1999-04-14 Multi-beam electronic gun for projection tube Pending CN1270408A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 99105542 CN1270408A (en) 1999-04-14 1999-04-14 Multi-beam electronic gun for projection tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 99105542 CN1270408A (en) 1999-04-14 1999-04-14 Multi-beam electronic gun for projection tube

Publications (1)

Publication Number Publication Date
CN1270408A true CN1270408A (en) 2000-10-18

Family

ID=5272018

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 99105542 Pending CN1270408A (en) 1999-04-14 1999-04-14 Multi-beam electronic gun for projection tube

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CN (1) CN1270408A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112652510A (en) * 2020-12-16 2021-04-13 中国科学院西安光学精密机械研究所 Large-field-of-view and low-aberration electronic optical imaging system and imaging method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112652510A (en) * 2020-12-16 2021-04-13 中国科学院西安光学精密机械研究所 Large-field-of-view and low-aberration electronic optical imaging system and imaging method

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