CN1243044C - Soakage reversibly variable temperature-responsive copolymer film preparation method - Google Patents
Soakage reversibly variable temperature-responsive copolymer film preparation method Download PDFInfo
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Abstract
The present invention relates to a preparation method for a temperature responsive polymer film which makes the surface of a material have soakage reversible transformation by surface triggering atom transfer free radical polymerization on a smooth surface or a rough surface in a micrometer or nano structure. An active group which can be used for atom transfer free radical polymerization is introduced to the surface of a base; surface grafting polymerization is carried out by a functional monomer comprising double bonds, and a polymer film comprising poly isopropyl acrylamide is prepared. The present invention can further carry out micrometer or nano roughening on the surface of the base by a physical or chemical method. The surface soakage of the polymer film changes along with the change of environment temperature; the surface of a material is hydrophilic when the phase transformation temperature of the polymer is below about 32 DEG C, and is hydrophobic when the phase transformation temperature of the polymer is above 32 DEG C. The roughness of the surface of the base has an amplifying effect on the change of the soakage; the prepared polymer film has favorable soakage reversible transformation performance, and a material has long-term stability.
Description
Technical field
The present invention relates to a kind of preparation method of temperature-responsive polymeric film, particularly relate to a kind of level and smooth or have on the uneven surface of micron, nanostructure and cause atom transition free radical polymerization reaction by the surface, make material surface have the preparation method of the temperature-responsive polymeric film of wetting property reversible transition (hydrophilic is hydrophobic, and super hydrophilic is super-hydrophobic).
Technical background
The wetting property of material surface is active research forward position very in the world.By changing the roughness and the chemical structure thereof of material surface, realize hydrophilic, the Superhydrophilic or hydrophobic, the super-hydrophobicity of material surface, still all have important scientific meaning aspect the practical application aspect the theory research.The Jiang Lei researcher of Institute of Chemistry, Academia Sinica etc. utilizes the design philosophy of the collaborative boundary material of binary, by changing the micron-nanometer structure and the chemical structure thereof of material surface, super amphiphilic interface rerum natura (having Superhydrophilic and super lipophilicity simultaneously) material and ultra-amphosphobic interface rerum natura (having super-hydrophobicity and super oleophobic property simultaneously) material have been prepared.Report respectively at Angew.Chem.Int.Ed. magazine in 2001,2002,2003:, made super-hydrophobic carbon nanotube by the orientation of carbon nanotube; By template, polyacrylonitrile and polyvinyl alcohol nano have been made with super-hydrophobicity.Turkey professors Erbil etc. are in February, 2003 Science magazine report: by controlling the porous polypropylene that suitable solvent and temperature have made super-hydrophobicity.U.S. professors Genzer etc. are in December, 2000 Science magazine report: can obtain polymer super-hydrophobic surface by mechanical self assembled monolayer method.U.S. Anton professor has reported the super-hydrophobicity on fluorinated coating surface at Adv.Mater. magazine in 1998.Japan professor Fujishima waits in July, 1997 Nature magazine report: under the light field effect, realized the super amphiphilic of titanium dioxide surface.Though hydrophilic, super hydrophilic, hydrophobic, the super-hydrophobicity of material surface have caused people's extensive concern, realized the transformation of water-wetted surface to ultra-hydrophilic surface, hydrophobic surface to super hydrophobic surface, but and the Superhydrophilic of the material surface of being unrealized and the reversible regulation and control of the temperature between the super-hydrophobicity.Professors Langer of Massachusetts Institute Technology etc. are in January, 2003 Science magazine report: material surface wetting ability and hydrophobicity can be passed through the reversible regulation and control of electric field action, but can not realize the super hydrophilic reversible transition that arrives super-hydrophobic.Germany professor Minko waits at J.Am.Chem.Soc. magazine report in 2003, hydrophobic polymer and hydrophilic polymer is grafted to the needle-like matrix surface has prepared from the responsiveness surface, and its wetting property changes with the change of surrounding medium hydrophilic and hydrophobic.But this kind method has its limitation: be limited to hydrophobic, hydrophilic two base polymers and be grafted to the needle-like matrix surface, and need hydrophilic, hydrophobic property solvent-induced.U.S. professors Liang etc. were at J.Appl.Polym.Sci. in 1999, Macromolecule magazine report in 1998: carry out traditional free radical surface grafting polymerization on the flat glass matrix, or by uv photopolymerization, preparation temperature responsiveness PNIPAM.Below the polymer phase transition temperature, material surface is hydrophilic; More than the polymer phase transition temperature, material surface is hydrophobic.But the molecular structure of this kind method preparation is wayward, and can not realize the Superhydrophilic of material surface and the reversible regulation and control between the super-hydrophobicity.
Summary of the invention
The objective of the invention is to set up a kind of preparation method with temperature-responsive macromolecule membrane of wetting property reversible transition (hydrophilic is hydrophobic, and super hydrophilic is super-hydrophobic).
The micron-nanometer structure (roughness) of material surface and surface chemical structure thereof are to influence infiltrating two key factors of material.The present invention organically combines this two factor, make material surface have the micron-nanometer structure by physical method or chemical process and have bigger roughness, on this surface, make and have the temperature-responsive polymer by the atom transfer radical surface initiated polymerization.This invention provides a kind of preparation method with temperature-responsive polymeric film of wetting property reversible transition, and its inventive point is that the micron-nanometer structured techniques of material surface and atom transfer radical surface initiated polymerization temperature-responsive polymer technology organically combine.
The objective of the invention is to be achieved through the following technical solutions: the present invention adopts physical method or chemical process to make material surface have the micron-nanometer structure, the preparation uneven surface, on this surface, make have the wetting property reversible transition temperature-responsive polymeric film of (hydrophilic is hydrophobic, and super hydrophilic is super-hydrophobic) by the atom transfer radical surface initiated polymerization.
Principle of the present invention is as follows:
Preparation method's step with temperature-responsive polymeric film of wetting property reversible transition of the present invention comprises:
(1). the graft reaction of matrix surface initiator:
The graft reaction of matrix surface initiator is the initiator that matrix surface is had can be used for atom transfer radical polymerization.Matrix is dipped in the organic solvent that contains silane reagent or sulfhydryl reagent reacts, matrix surface is modified made it functionalization, make matrix surface have functional groups such as hydroxyl, amino, carboxyl, with organic solvent flushing, drying; And then the matrix that will handle is dipped in the organic solvent that contains the initiator that can be used for atom transfer radical polymerization, the ice-water bath reaction, make the functional group on the matrix surface carry out the surface grafting reaction with the initiator that can be used for atom transfer radical polymerization, matrix surface had can be used for the initiator of atom transfer radical polymerization, then with organic solvent flushing, drying;
(2). adopt the surface to cause the functional polymer film that atom transfer radical polymerization is equipped with the wetting property reversible transition:
The surface that obtains in the step (1) is had the matrix that can be used for atom transfer radical polymerization initiator, and to place Yi Shui/methyl alcohol be the double bond monomer solution of mixed solvent; The cuprous halide of employing catalytic amount and diethylenetriamine are as catalyzer, wherein, the weight ratio of cuprous halide and diethylenetriamine is 1: 0.1～50, at room temperature carry out atom transfer radical polymerization, then with organic solvent flushing, drying, thereby make have the wetting property reversible transition temperature-responsive polymeric film of (hydrophilic is hydrophobic, and super hydrophilic is super-hydrophobic).
The present invention can further carry out micron, nanoscale roughening to matrix surface; Described roughening method comprises physical method or chemical process, described physical method such as laser ablation, Cement Composite Treated by Plasma etc., described chemical process such as strong oxidizer or the chemosynthesis of strong reductant burn into etc.
Described matrix is organic materialss such as inorganic materials such as glass, silicon chip, pottery or metallic gold, or terylene, polymeric amide, polyester or acrylic fibers.
Described step (1) is matrix to be dipped in the organic solvent of the silane reagent that contains 1wt%～30wt% or sulfhydryl reagent react.
Described step (1) is that the matrix that will handle is dipped in and contains in the organic solvent of the initiator that can be used for atom transfer radical polymerization that concentration is 0.01wt%～10wt%.
Described step (2) has the matrix that can be used for atom transfer radical polymerization initiator with the surface that obtains in the step (1), and to place Yi Shui/methyl alcohol be the double bond monomer solution of mixed solvent, wherein the concentration of monomer solution is 0.1wt%-30wt%, and the volume ratio of water and methyl alcohol is 1: 0.5～10.
Described silane reagent is the alkoxyl silicone alkanamine; Described alkoxyl silicone alkanamine is trimethoxy silicon propylamine, trimethoxy silicon butylamine, trimethoxy silicon amylamine, triethoxysilicane propylamine, triethoxysilicane butylamine or triethoxysilicane amylamine etc.
Described sulfhydryl reagent is sulfydryl alkanamine, sulfydryl alkanol, sulfydryl alkanoic acid or their mixture etc.
Described initiator is the halogen initiator.
Described monomer is a N-isopropylacrylamide, N, the N-DMAA, N, N-diethyl acrylamide, N-vinyl isobutyramide or their any mixture, perhaps N-isopropylacrylamide and vinylformic acid, acrylate, vinylbenzene, the mixture of one or more in the vinyl cyanide, perhaps N, N-DMAA and vinylformic acid, acrylate, vinylbenzene, the mixture of one or more in the vinyl cyanide, perhaps N, N-diethyl acrylamide and vinylformic acid, acrylate, vinylbenzene, the mixture of one or more in the vinyl cyanide, perhaps N-vinyl isobutyramide and vinylformic acid, acrylate, vinylbenzene, the mixture of one or more in the vinyl cyanide etc.
Described organic solvent is benzene, toluene, hexane, trichloromethane, methylene dichloride, tetrahydrofuran (THF), dimethyl formamide, 1,4-dioxane, ethyl acetate, ether, pyridine, acetone, methyl alcohol or ethanol etc.
Method of the present invention has following characteristics:
(1) prepared polymeric film is to make by atom transition free radical polymerization reaction.
(2) prepared polymeric film is a PNIPAM, poly-(N, the N-DMAA), poly-(N, N-diethyl acrylamide), poly-(N-vinyl isobutyramide) or their multipolymer, perhaps N-isopropylacrylamide and vinylformic acid, acrylate, vinylbenzene, the multipolymer of one or more in the vinyl cyanide, perhaps N, N-DMAA and vinylformic acid, acrylate, vinylbenzene, the multipolymer of one or more in the vinyl cyanide, perhaps N, N-diethyl acrylamide and vinylformic acid, acrylate, vinylbenzene, the multipolymer of one or more in the vinyl cyanide, perhaps N-vinyl isobutyramide and vinylformic acid, acrylate, vinylbenzene, the multipolymer of one or more in the vinyl cyanide etc.
(3) prepared polymeric film has micron, the scraggly uneven surface of nano level.
(4) prepared polymeric film has the temperature-responsive of wetting property reversible transition.Polymkeric substance arrives subzero 100 ℃ of surface hydrophilics less than 32 ℃; Polymkeric substance is greater than 32 ℃ to 200 ℃ surface hydrophobicities.
(5) the scraggly coarse structure of micron, nano level on prepared polymeric film surface is controlled, and the concave-convex micro-structure of film surface directly influences the intensity of variation of surface wettability.Can realize: polymkeric substance is less than 32 ℃ to subzero 100 ℃, and the surface is super hydrophilic, and the contact angle of matrix and water is 0 °; Polymkeric substance is greater than 32 ℃ to 200 ℃, surface super hydrophobic, and promptly the contact angle of matrix and water is more than or equal to 150 °.
(6) prepared polymeric film has good wetting property reversible transition characteristic, and material behavior has permanent stability.
(7) preparation method of the temperature-responsive polymeric film with wetting property reversible transition (hydrophilic is hydrophobic, and super hydrophilic is super-hydrophobic) of the present invention is simple, and suitability is wide.
Description of drawings
Fig. 1: the electron scanning micrograph of the silicon substrate of the embodiment of the invention 1,2;
(A) electron scanning micrograph of the planar silicon matrix of the embodiment of the invention 1;
(B) electron scanning micrograph of the uneven surface of the laser ablation silicon substrate of the embodiment of the invention 2;
(C) the magnified sweep electron micrograph of figure B in the embodiment of the invention 2;
(D) protrude the electron scanning micrograph of position nanostructure in the embodiment of the invention 2 among the figure C.
Fig. 2: the microscopic appearance photo on water droplet polymeric film surface on the planar silicon matrix in the embodiment of the invention 1; Temperature is respectively 25 ℃ and 40 ℃.
Fig. 3: the electron scanning micrograph of the polymeric film of the embodiment of the invention 2 on coarse silicon substrate;
(A) large-scale electron scanning micrograph;
(B) the magnified sweep electron micrograph of figure A;
(C) electron scanning micrograph of protrusion position polymer film nano structure among the figure B.
Fig. 4: the apparent figure of wetting property of polymeric film on the different roughness matrix of the embodiment of the invention 1～5;
(A) the coarse polymer surfaces of different etching spacing with water contact angle (▲, 25 ℃; ■, 40 ℃), ∞ is smooth matrix.
(B) water droplet is the microscopic appearance photo on polymeric film surface on 6 microns matrixes in the etching spacing; 25 ℃, film surface super hydrophilic (with water contact angle be 0 °); 40 ℃, film surface super-hydrophobic (with water contact angle be 151 °).
(C) film under the differing temps and water contact angle variation (▲, the etching spacing is 6 microns matrixes; ■, smooth matrix).
(D) the etching spacing is that the polymeric film surface is descended that circulation records and water contact angle at 25 ℃ and 50 ℃ on 6 microns matrixes.
Embodiment
Below in conjunction with specific embodiment, the present invention is further elaborated, rather than will limits the invention with this.
Embodiment 1:
1) soaks silicon chip with chromic acid lotion, remove surperficial organic impurity; Use deionized water rinsing then; 0.1N NaOH solution soaking 2 minutes; 0.1N HNO
3Solution soaking 10 minutes.
2) silicon chip of above-mentioned processing immerses the 100mL toluene solution of 15wt% trimethoxy silicon propylamine, reflux 6 hours.Use toluene, dichloromethane rinse then, nitrogen dries up.
3) silicon chip of above-mentioned processing immerses the 100mL chloroform soln of 2wt% pyridine, adds 5mL 2-bromine 2-methyl-prop acylbromide, and reaction is 1 hour in ice-water bath, continues reaction 12 hours in room temperature subsequently.After the reaction, use acetone rinsing, nitrogen dries up.
4) silicon chip of above-mentioned processing immerses in the 200mL solution of water/methyl alcohol (volume ratio 1: 5) of the 20wt% sec.-propyl third rare acid amides (NIPAAM) contain 0.03g CuBr and 0.5mL diethylenetriamine (PMDETA), room temperature reaction 2 hours.Washed with methanol, nitrogen dries up.
The electron scanning micrograph of planar silicon matrix is shown in 1A.The polymeric film (thickness is 45 nanometers) of preparation is hydrophilic below phase transition temperature (about 32 ℃), and phase transition temperature is above hydrophobic.When temperature is 25 ℃, 40 ℃, water droplet at its surperficial microscopic appearance photo as shown in Figure 2, contact angle is respectively 64 ° and 92 °.Relation between wetting property of polymeric film (and water contact angle) and the temperature is shown in Fig. 4 A, 4B.Prepared polymeric film has good wetting property reversible transition characteristic, and material behavior has permanent stability.
Embodiment 2:
1) chromic acid lotion soaks silicon chip, removes surperficial organic impurity; Wash with deionization then; Nitrogen dries up.
2) with laser laterally, the vertical silicon chip of the above-mentioned processing of etching, the laser ablation width is that 6 microns, the degree of depth are 5 microns, the laser beam parallel interval is 8 microns (they being the etching flute pitch); Use 0.1N NaOH solution soaking 2 minutes then; 0.1N HNO
3Solution soaking 10 minutes.
3) silicon chip of above-mentioned processing immerses the 100mL toluene solution of 15wt% trimethoxy silicon propylamine, reflux 6 hours.Use toluene, dichloromethane rinse then, nitrogen dries up.
4) silicon chip of above-mentioned processing immerses the 100mL dichloromethane solution of 2wt% pyridine, adds 5mL 2-bromine 2-methyl-prop acylbromide, and reaction is 1 hour in ice-water bath, continues reaction 12 hours in room temperature subsequently.After the reaction, use acetone rinsing, nitrogen dries up.
5) silicon chip of above-mentioned processing immerses the 20wt%N that contains 0.3g CuBr and 0.1mL PMDETA, in the 200mL solution of the water/methyl alcohol of N-diethyl acrylamide (volume ratio 1: 5), and room temperature reaction 2 hours.Washed with methanol, nitrogen dries up.
The coarse matrix of this laser ablation and polymeric film surface have micron, nanometer coarse structure.
The electron scanning micrograph of coarse silicon substrate is shown in Figure 1B-D.Figure 1B is the electron scanning micrograph of laser ablation matrix on a large scale; The electron scanning micrograph that Fig. 1 C amplifies for Figure 1B, matrix surface have micron, nanometer coarse structure; Fig. 1 D is the electron scanning micrograph of the protrusion position nanostructure of laser ablation matrix.
The electron scanning micrograph of Zhi Bei polymeric film is shown in Fig. 3 A～C as stated above.Fig. 3 A is large-scale electron scanning micrograph; The electron scanning micrograph that Fig. 3 B amplifies for Fig. 3 A, matrix surface have micron, nanometer coarse structure; Fig. 3 C is polymeric film protrudes the position nanostructure at matrix a electron scanning micrograph.
This polymeric film is hydrophilic below phase transition temperature (about 32 ℃), and phase transition temperature is above hydrophobic.When temperature is 25 ℃, 40 ℃, be respectively 0 ° and 138 ° with water contact angle, shown in Fig. 4 A.Prepared polymeric film has good wetting property reversible transition characteristic, and material behavior has permanent stability.
Embodiment 3:
1) chromic acid lotion soaks silicon chip, removes surperficial organic impurity; Wash with deionization then; Nitrogen dries up.
2) with laser laterally, the vertical silicon chip of the above-mentioned processing of etching, the laser ablation width is that 6 microns, the degree of depth are 5 microns, the laser beam parallel interval is 18 microns (they being the etching flute pitch); Use 0.1N NaOH solution soaking 2 minutes then; 0.1N HNO
3Solution soaking 10 minutes.
3) silicon chip of above-mentioned processing immerses the 100mL toluene solution of 10wt% trimethoxy silicon butylamine, reflux 6 hours.Use toluene, dichloromethane rinse then, nitrogen dries up.
4) silicon chip of above-mentioned processing immerses the 100mL ethyl acetate solution of 2wt% pyridine, adds 5mL 2-bromine 2-methyl-prop acyl chlorides, and reaction is 1 hour in ice-water bath, continues reaction 12 hours in room temperature subsequently.After the reaction, use acetone rinsing, nitrogen dries up.
5) silicon chip of above-mentioned processing immerses and contains 0.01g CuBr, 0.1mL PMDETA, 20wt%NIPAAM, 5wt%N, in the 200mL solution of the water/methyl alcohol of N-DMAA (volume ratio 1: 2), and room temperature reaction 2 hours.Washed with methanol, nitrogen dries up.
The coarse matrix of this laser ablation and copolymer film surface have micron, nanometer coarse structure.This copolymer film is hydrophilic below phase transition temperature (about 32 ℃), and phase transition temperature is above hydrophobic.When temperature is 25 ℃, 40 ℃, be respectively 10 ° and 129 ° with water contact angle, shown in Fig. 4 A.Prepared copolymer film has good wetting property reversible transition characteristic, and material behavior has permanent stability.
Embodiment 4:
1) chromic acid lotion soaks silicon chip, removes surperficial organic impurity; Wash with deionization then; Nitrogen dries up.
2) with laser laterally, the vertical silicon chip of the above-mentioned processing of etching, the laser ablation width is that 6 microns, the degree of depth are 5 microns, the laser beam parallel interval is 31 microns (they being the etching flute pitch); Use 0.1N NaOH solution soaking 2 minutes then; 0.1N HNO
3Solution soaking 10 minutes.
3) silicon chip of above-mentioned processing immerses the 100mL toluene solution of 5wt% trimethoxy silicon propylamine, reflux 6 hours.Use toluene, dichloromethane rinse then, nitrogen dries up.
4) silicon chip of above-mentioned processing immerses the 100mL dichloromethane solution of 2wt% pyridine, adds 20mL 2-bromine 2-methyl-prop acylbromide, and reaction is 1 hour in ice-water bath, continues reaction 12 hours in room temperature subsequently.After the reaction, use acetone rinsing, nitrogen dries up.
5) silicon chip of above-mentioned processing immerses the 20wt%N that contains 0.03g CuBr and 1mL PMDETA, in the 200mL solution of the water/methyl alcohol of N-diethyl acrylamide (volume ratio 1: 1), and room temperature reaction 2 hours.Washed with methanol, nitrogen dries up.
The coarse matrix of this laser ablation and polymeric film surface have micron, nanometer coarse structure.This polymeric film is hydrophilic below phase transition temperature (about 32 ℃), and phase transition temperature is above hydrophobic.When temperature is 25 ℃, 40 ℃, be respectively 34 ° and 113 ° with water contact angle, as shown in Figure 3A.Prepared polymeric film has good wetting property reversible transition characteristic, and material behavior has permanent stability.
Embodiment 5:
1) chromic acid lotion soaks silicon chip, removes surperficial organic impurity; Wash with deionization then; Nitrogen dries up.
2) with laser laterally, the vertical silicon chip of the above-mentioned processing of etching, the laser ablation width is that 6 microns, the degree of depth are 5 microns, the laser beam parallel interval is 6 microns (they being the etching flute pitch); Use 0.1N NaOH solution soaking 2 minutes then; 0.1N HNO
3Solution soaking 10 minutes.
3) silicon chip of above-mentioned processing immerses the 100mL toluene solution of 5wt% trimethoxy silicon propylamine, reflux 6 hours.Use toluene, dichloromethane rinse then, nitrogen dries up.
4) silicon chip of above-mentioned processing immerses the 100mL tetrahydrofuran solution of 5wt% pyridine, adds 10mL 2-bromine 2-methyl-prop acylbromide, and reaction is 1 hour in ice-water bath, continues reaction 12 hours in room temperature subsequently.After the reaction, use acetone rinsing, nitrogen dries up.
5) silicon chip of above-mentioned processing immerses in the 200mL solution of water/methyl alcohol (volume ratio 1: 1) of the 20wt%NIPAAM contain 0.03g CuBr and 0.1mL PMDETA, room temperature reaction 2 hours.Washed with methanol, nitrogen dries up.
The coarse matrix of this laser ablation and polymeric film surface have micron, nanometer coarse structure.This polymeric film is hydrophilic below phase transition temperature (about 32 ℃), and phase transition temperature is above hydrophobic.Temperature is below 29 ℃ the time, and film surface is super hydrophilic, with water contact angle be 0 °; Temperature is more than 40 ℃ the time, and film surface is super-hydrophobic, with 151 ° of water contact angles, shown in Fig. 4 B.Water droplet at the microscopic appearance photo on 25 ℃, 40 ℃ following polymeric film surfaces shown in Fig. 4 C.Prepared polymeric film has good wetting property reversible transition characteristic, and material behavior has permanent stability.The polymeric film surface 25 ℃ and 50 ℃ down circulation record with water contact angle shown in Fig. 4 D, its super hydrophilic reversible transition to super-hydrophobic has long-lasting.
Embodiment 6:
1) chromic acid lotion soaks sheet glass, removes surperficial organic impurity; Wash with deionization then; Nitrogen dries up.
2) with laser laterally, the vertical sheet glass of the above-mentioned processing of etching, the laser ablation width is that 6 microns, the degree of depth are 5 microns, the laser beam parallel interval is 6 microns (they being the etching flute pitch); Use 0.1N NaOH solution soaking 2 minutes then; 0.1N HNO
3Solution soaking 10 minutes.
3) sheet glass of above-mentioned processing immerses the 100mL toluene solution of 10wt% trimethoxy silicon propylamine, reflux 6 hours.Use toluene, dichloromethane rinse then, nitrogen dries up.
4) sheet glass of above-mentioned processing immerses the 100mL toluene solution of 2wt% pyridine, adds 10mL2-bromine 2-methyl-prop acylbromide, and reaction is 1 hour in ice-water bath, continues reaction 12 hours in room temperature subsequently.After the reaction, use acetone rinsing, nitrogen dries up.
5) sheet glass of above-mentioned processing immerses and contains 0.3g CuBr, 10mL PMDETA, and 20wt%NIPAAM, 10wt% vinylbenzene, in 200mL water/methyl alcohol (volume ratio 1: 1), room temperature reaction 2 hours.Washed with methanol, nitrogen dries up.
The coarse matrix of this laser ablation and polymeric film surface have micron, nanometer coarse structure.This polymeric film is hydrophilic below phase transition temperature (33 ℃), and phase transition temperature is above hydrophobic.Temperature is below 29 ℃ the time, and film surface is super hydrophilic, with water contact angle be 5 °; Temperature is more than 40 ℃ the time, and film surface is super-hydrophobic, with 160 ° of water contact angles.Prepared polymeric film has good wetting property reversible transition characteristic, and material behavior has permanent stability.
Embodiment 7:
1) chromic acid lotion soaks sheet glass, removes surperficial organic impurity; Wash with deionization then; Nitrogen dries up.
2) with laser laterally, the vertical sheet glass of the above-mentioned processing of etching, the laser ablation width is that 6 microns, the degree of depth are 5 microns, the laser beam parallel interval is 6 microns (they being the etching flute pitch); Use the glass basis surface sputtering one deck 20nm thick gold thin film of ion sputtering instrument after etching then.
3) the 100mL ethanolic soln of the sheet glass of above-mentioned processing immersion 20wt% sulfydryl propylamine was placed 20 hours.Use alcohol flushing then, nitrogen dries up.
4) sheet glass of above-mentioned processing immerses the 100mL benzole soln of 10wt% pyridine, adds 10mL2-bromine 2-methyl-prop acylbromide, and reaction is 1 hour in ice-water bath, continues reaction 12 hours in room temperature subsequently.After the reaction, use acetone rinsing, nitrogen dries up.
5) sheet glass of above-mentioned processing immerses in the 200mL solution of water/methyl alcohol (volume ratio 1: 2) of the 20wt%NIPAAM contain 0.01g CuBr and 0.1mL PMDETA, room temperature reaction 2 hours.Washed with methanol, nitrogen dries up.
The coarse matrix of this laser ablation and polymeric film surface have micron, nanometer coarse structure.This polymeric film is hydrophilic below phase transition temperature (about 32 ℃), and phase transition temperature is above hydrophobic.Temperature is below 29 ℃ the time, and film surface is super hydrophilic, with water contact angle be 0 °; Temperature is more than 40 ℃ the time, and film surface is super-hydrophobic, with 150 ° of water contact angles.Prepared polymeric film has good wetting property reversible transition characteristic, and material behavior has permanent stability.
Embodiment 8:
1) chromic acid lotion soaks sheet glass, removes surperficial organic impurity; Wash with deionization then; Nitrogen dries up.
2) clean sheet glass is immersed in the hydrofluoric acid, carried out chemical corrosion 15 minutes, the deionization flushing; Nitrogen dries up.
3) sheet glass of above-mentioned processing immerses the 100mL toluene solution of 15wt% triethoxysilicane butylamine, reflux 6 hours.Use toluene, dichloromethane rinse then, nitrogen dries up.
4) sheet glass of above-mentioned processing immerses the 100mL dimethyl formamide solution of 2wt% pyridine, adds 10mL 2-bromine 2-methyl-prop acylbromide, and reaction is 1 hour in ice-water bath, continues reaction 12 hours in room temperature subsequently.After the reaction, use acetone rinsing, nitrogen dries up.
5) sheet glass of above-mentioned processing immerses and contains in the 200mL solution of 0.03g CuBr, 0.1mL PMDETA, 20wt%NIPAAM, the cinnamic water/methyl alcohol of 5wt% (volume ratio 1: 2) room temperature reaction 2 hours.Washed with methanol, nitrogen dries up.
The matrix that the employing chemical process was handled and the polymeric film surface of growth have micron, nanometer coarse structure.This polymeric film is hydrophilic below phase transition temperature (32 ℃), and phase transition temperature is above hydrophobic.Temperature is below 29 ℃ the time, and film surface is super hydrophilic, with water contact angle be 0 °; Temperature is more than 34 ℃ the time, and film surface is super-hydrophobic, with 155 ° of water contact angles.Prepared polymeric film has good wetting property reversible transition characteristic, and material behavior has permanent stability.
Embodiment 9:
1) with Cement Composite Treated by Plasma terylene (or polymeric amide, polyester, acrylic fibers etc.) organic matrix 30 minutes.
2) organic matrix of above-mentioned processing immerses the 500mL toluene solution of 15wt% trimethoxy silicon propylamine, reflux 6 hours.Use toluene, dichloromethane rinse then, nitrogen dries up.
3) organic matrix of above-mentioned processing immerses the 500mL dimethyl formamide solution of 5wt% pyridine, adds 50mL 2-bromine 2-methyl-prop acylbromide, and reaction is 1 hour in ice-water bath, continues reaction 12 hours in room temperature subsequently.After the reaction, use alcohol flushing, nitrogen dries up.
4) organic matrix of above-mentioned processing immerses in the 1000mL solution of water/methyl alcohol (volume ratio 1: 7) of the 20wt%NIPAAM contain 0.03g CuBr and 0.1mL PMDETA, room temperature reaction 2 hours.Washed with methanol, nitrogen dries up.
The polymeric film surface of matrix that using plasma was handled and growth has micron, nanometer coarse structure.This polymeric film is hydrophilic below phase transition temperature (about 32 ℃), and phase transition temperature is above hydrophobic.Temperature is below 29 ℃ the time, and film surface is super hydrophilic, with water contact angle be 0 °; Temperature is more than 38 ℃ the time, and film surface is super-hydrophobic, with 160 ° of water contact angles.Prepared polymeric film has good wetting property reversible transition characteristic, and material behavior has permanent stability.
Claims (10)
1. preparation method with temperature-responsive polymeric film of wetting property reversible transition, described method steps comprises:
(1). the graft reaction of matrix surface initiator:
Matrix is dipped in the organic solvent that contains silane reagent or sulfhydryl reagent reacts, matrix surface is modified made it functionalization, with organic solvent flushing, drying; And then the matrix that will handle is dipped in the organic solvent that contains the initiator that can be used for atom transfer radical polymerization, the ice-water bath reaction, make the functional group on the matrix surface carry out the surface grafting reaction with the initiator that can be used for atom transfer radical polymerization, matrix surface had can be used for the initiator of atom transfer radical polymerization, then with organic solvent flushing, drying;
(2). adopt the surface to cause the functional polymer film that atom transfer radical polymerization is equipped with the wetting property reversible transition:
The surface that obtains in the step (1) is had the matrix that can be used for atom transfer radical polymerization initiator, and to place Yi Shui/methyl alcohol be the double bond monomer solution of mixed solvent; The cuprous halide of employing catalytic amount and diethylenetriamine are as catalyzer, wherein, the weight ratio of cuprous halide and diethylenetriamine is 1: 0.1～50, at room temperature carry out atom transfer radical polymerization, then with organic solvent flushing, drying, thereby make temperature-responsive polymeric film with wetting property reversible transition.
2. the method for claim 1, it is characterized in that: described step (1) matrix is dipped in the organic solvent that contains silane reagent or sulfhydryl reagent reacted, and matrix surface modified make it further to carry out matrix surface micron, nanoscale roughening before the functionalization.
3. the method for claim 1, it is characterized in that: described matrix is glass, silicon chip, pottery or metallic gold inorganic materials, or terylene, polymeric amide, polyester or acrylic fibers organic materials.
4. the method for claim 1 is characterized in that: described step (1) is matrix to be dipped in the organic solvent of the silane reagent that contains 1wt%～30wt% or sulfhydryl reagent react;
Described step (1) is that the matrix that will handle is dipped in and contains in the organic solvent of the initiator that can be used for atom transfer radical polymerization that concentration is 0.01wt%～10wt%.
5. the method for claim 1, it is characterized in that: described step (2) has the matrix that can be used for atom transfer radical polymerization initiator with the surface that obtains in the step (1), and to place Yi Shui/methyl alcohol be the double bond monomer solution of mixed solvent, wherein the concentration of monomer solution is 0.1wt%-30wt%, and the volume ratio of water and methyl alcohol is 1: 0.5～10.
6. as claim 1,2 or 4 described methods, it is characterized in that: described silane reagent is trimethoxy silicon propylamine, trimethoxy silicon butylamine, trimethoxy silicon amylamine, triethoxysilicane propylamine, triethoxysilicane butylamine or triethoxysilicane amylamine.
7. as claim 1,2 or 4 described methods, it is characterized in that: described sulfhydryl reagent is sulfydryl alkanamine, sulfydryl alkanol, sulfydryl alkanoic acid or their mixture.
8. as claim 1,4 or 5 described methods, it is characterized in that: described initiator is the halogen initiator.
9. as claim 1 or 5 described methods, it is characterized in that: described monomer is a N-isopropylacrylamide, N, the N-DMAA, N, N-diethyl acrylamide, N-vinyl isobutyramide or their any mixture, perhaps N-isopropylacrylamide and vinylformic acid, acrylate, vinylbenzene, the mixture of one or more in the vinyl cyanide, perhaps N, N-DMAA and vinylformic acid, acrylate, vinylbenzene, the mixture of one or more in the vinyl cyanide, perhaps N, N-diethyl acrylamide and vinylformic acid, acrylate, vinylbenzene, the mixture of one or more in the vinyl cyanide, perhaps N-vinyl isobutyramide and vinylformic acid, acrylate, vinylbenzene, the mixture of one or more in the vinyl cyanide.
10. as claim 1,2 or 4 described methods, it is characterized in that: described organic solvent is benzene, toluene, hexane, trichloromethane, methylene dichloride, tetrahydrofuran (THF), dimethyl formamide, 1,4-dioxane, ethyl acetate, ether, pyridine, acetone, methyl alcohol or ethanol.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103945924A (en) * | 2011-09-28 | 2014-07-23 | 阿卜杜拉国王科技大学 | Grafted membranes and substrates having surfaces with switchable superoleophilicity and superoleophobicity and applications thereof |
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