CN1241063C - X-ray mask and quartz ring ultraviolet solidifying apparatus and method for using - Google Patents
X-ray mask and quartz ring ultraviolet solidifying apparatus and method for using Download PDFInfo
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- CN1241063C CN1241063C CN 03147402 CN03147402A CN1241063C CN 1241063 C CN1241063 C CN 1241063C CN 03147402 CN03147402 CN 03147402 CN 03147402 A CN03147402 A CN 03147402A CN 1241063 C CN1241063 C CN 1241063C
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- ray mask
- quartz ring
- workbench
- ultra
- violet curing
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- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
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Abstract
The present invention relates to an ultraviolet curing device of an X-ray mask and a quartz ring, which comprises an X-ray mask workbench, a vacuum clamp, a quartz ring workbench, an ultraviolet light source, a parallel lens and a microscope, wherein the X-ray mask workbench comprises an X-azimuth displacement hand wheel, a Y-azimuth displacement hand wheel and a hand wheel which can rotate around a Z axis, and the three hand wheels are arranged on the workbench; the vacuum clamp is arranged under the X-ray mask workbench and can absorb the X-ray mask via vacuum through a pipe, and the X-ray mask workbench is mainly used for supporting X-ray masks to be cured by ultraviolet rays; the quartz ring workbench is arranged under the X-ray mask workbench so as to avoid the deformation of the X-ray masks; the ultraviolet light source is arranged under the quartz ring workbench; the parallel lens is arranged between the quartz ring workbench and the ultraviolet light source; the microscope used for observing align conditions is arranged above the X-ray mask workbench. The X-ray mask workbench, the quartz ring workbench, the ultraviolet light source, the parallel lens and the microscope are all arranged on a framework.
Description
Technical field
The present invention relates to micro processing field, particularly a kind of X ray mask and quartz ring ultra-violet curing device and using method of being used for.
Background technology
The making that the X-ray lithography technology is applied to millimetre-wave circuit has many advantages than other means of photolithography, can satisfy the process technology that millimetre-wave circuit is made 0.05～0.25 micron each size of needs such as it; A pointolite X-ray lithography engine efficiency surpasses 7 electron-beam direct writing machines, and the T type gate figure that the X-ray lithography technology is come out is very easy to peel off, or the like.The difficult point of X-ray lithography technology is the making of X ray mask, in the manufacturing process of X ray mask, X ray mask lining base must be carried out bonding with quartz ring, its bonding process can be described below: anchor clamps → anchor clamps on X ray mask and the Pyrex ring are applied external pressure → intensification → anodic oxidation bonding Pyrex ring → cooling → removal external pressure → removal anchor clamps, this process is very complicated, the factor that influences bonding quality is very many, and can influence the bearing accuracy of X ray mask to a certain extent.
Summary of the invention
The objective of the invention is in order to overcome above-mentioned difficulties, a kind of X ray mask and quartz ring ultra-violet curing device and using method of being used for is provided, the bonding process that replaces above-mentioned complexity, has simple in structure and easy to operate advantage, can effectively avoid the silicon nitride deformation that causes in the conventional X ray mask bonding technology process, and the bonding time is very short, and the bonding alignment precision can reach 1 micron, can satisfy the requirement of X ray mask bonding.
A kind of X ray mask and quartz ring ultra-violet curing device of being used for of the present invention is characterized in that, comprising:
One X ray mask stage, this worktable comprise directions X displacement handwheel mounted thereto, Y direction displacement handwheel and around Z axle rotation hand wheel; One vacuum fixture is positioned at the below of X ray mask stage, and this vacuum fixture comes vacuum suction X ray mask by pipeline, and the X ray mask stage is mainly used to place the X ray mask for the treatment of ultra-violet curing;
One quartz ring workbench, this worktable comprises directions X coarse adjustment displacement handwheel mounted thereto, directions X fine tuning displacement handwheel, Y direction coarse adjustment displacement handwheel, Y direction fine tuning displacement handwheel, Z direction coarse adjustment displacement handwheel and Z direction fine tuning displacement handwheel, this quartz ring workbench is mainly used to place the quartz ring for the treatment of ultra-violet curing, this quartz ring workbench is positioned at the below of X ray mask stage, to prevent the deformation of X ray mask;
One ultraviolet source is used to provide ultra-violet curing needed ultraviolet source, and this ultraviolet source is positioned at the below of quartz ring workbench;
One parallel lens is used for expanding bundle, and this parallel lens is between quartz ring workbench and ultraviolet source;
One is used to observe the microscope of alignment condition, is used to observe the X ray mask for the treatment of ultra-violet curing and the alignment condition of quartz ring, so that X ray mask and quartz ring are regulated in displacement, this microscope is positioned at the top of X ray mask stage;
Said X ray mask stage, quartz ring workbench, ultraviolet source, parallel lens and microscope are installed on the framework.
Ultraviolet light that wherein said ultraviolet source sends through after the parallel lens from quartz ring workbench parallel beneath incident transmitted X-rays mask.
Wherein said quartz ring workbench displacement degree of regulation is less than 1 micron.
Wherein vacuum fixture comes the non-graphics field, edge of vacuum suction X ray mask by pipeline.
A kind of using method that is used for X ray mask and quartz ring ultra-violet curing device of the present invention is characterized in that, comprises the following steps:
(1) vacuum fixture comes the X ray mask that vacuum suction will the ultra-violet curing bonding by pipeline and is fixed on the X ray mask stage;
(2) quartz ring that will the ultra-violet curing bonding is fixed on the quartz ring workbench;
(3) toward quartz ring edge that will the ultra-violet curing bonding a bit or on three drops ultra-violet curing solidify glue;
(4) regulate Z direction coarse adjustment displacement handwheel quartz ring workbench is risen in the Z direction, make quartz ring and X ray mask keep certain interval;
(5) regulate the directions X displacement handwheel of X ray mask stage, Y direction displacement handwheel and around Z axle rotation hand wheel, and regulate the directions X coarse adjustment displacement handwheel and the Y direction coarse adjustment displacement handwheel of quartz ring workbench, make quartz ring and X ray mask prealignment;
(6) by microscopical observation, regulate the directions X fine tuning displacement handwheel and the Y direction fine tuning displacement handwheel of quartz ring workbench repeatedly, quartz ring is accurately aimed at the X ray mask;
(7) regulate Z direction fine tuning displacement handwheel and make quartz ring workbench, quartz ring is closely contacted with the X ray mask in the trickle rising of Z direction;
(8) open ultraviolet source, ultraviolet light sees through parallel lens from parallel beneath incident, quartz ring and X ray mask ultra-violet curing bonding, finish the X ray mask and the ultra-violet curing bonding process of quartz ring.
X ray mask absorption that wherein will the ultra-violet curing bonding also is fixed on the X ray mask stage, and wherein the figure of X ray mask up.
The present invention has simple in structure and easy to operate advantage, can effectively avoid the silicon nitride deformation that causes in the conventional X ray mask bonding technology process, and the bonding time is very short, and the bonding alignment precision can reach 1 micron, can satisfy the requirement of X ray mask bonding.
Description of drawings
Fig. 1 is the structural representation of apparatus of the present invention.
Embodiment
At first see also shown in Figure 1ly, a kind of X ray mask of the present invention and quartz ring ultra-violet curing device comprise:
One X ray mask stage 14, this worktable 14 comprise directions X displacement handwheel 15 mounted thereto, Y direction displacement handwheel 16 and around Z axle rotation hand wheel 17; One vacuum fixture 12 is positioned at the below of X ray mask stage 14, this vacuum fixture 12 comes vacuum suction X ray mask 11 by pipeline 13, X ray mask stage 14 is mainly used to place the X ray mask 11 for the treatment of ultra-violet curing, and wherein vacuum fixture 12 comes the non-graphics field, edge of vacuum suction X ray mask 11 by pipeline 13;
One quartz ring workbench 3, this worktable 3 comprises directions X coarse adjustment displacement handwheel 4 mounted thereto, directions X fine tuning displacement handwheel 5, Y direction coarse adjustment displacement handwheel 6, Y direction fine tuning displacement handwheel 7, Z direction coarse adjustment displacement handwheel 8 and Z direction fine tuning displacement handwheel 9, this quartz ring workbench 3 is mainly used to place the quartz ring for the treatment of ultra-violet curing, this quartz ring workbench 3 is positioned at the below of X ray mask stage 14, to prevent the deformation of X ray mask, described quartz ring workbench 3 displacement degrees of regulation are less than 1 micron;
One ultraviolet source 1, be used to provide ultra-violet curing needed ultraviolet source, this ultraviolet source 1 is positioned at the below of quartz ring workbench 3, and ultraviolet light process parallel lens 2 backs that wherein said ultraviolet source 1 sends are from quartz ring workbench 3 parallel beneath incident transmitted X-rays masks;
One parallel lens 2 is used for expanding bundle, and this parallel lens 2 is between quartz ring workbench 3 and ultraviolet source 1;
One is used to observe the microscope 18 of alignment condition, is used to observe the X ray mask for the treatment of ultra-violet curing and the alignment condition of quartz ring, so that X ray mask and quartz ring are regulated in displacement, this microscope 18 is positioned at the top of X ray mask stage 14;
Said X ray mask stage 14, quartz ring workbench 3, ultraviolet source 1, parallel lens 2 and microscope 18 are installed in (said framework is not shown in the figures) on the framework.
The using method of a kind of X ray mask of the present invention and quartz ring ultra-violet curing device comprises the following steps:
(1) vacuum fixture 12 comes the X ray mask 11 that vacuum suction will the ultra-violet curing bonding by pipeline 13 and is fixed on the X ray mask stage 14, and wherein the figure of X ray mask up;
(2) quartz ring that will the ultra-violet curing bonding is fixed on the quartz ring workbench 3, and wherein the X ray mask is aimed at quartz ring, and X ray mask quartz ring is aimed at closely contact of back;
(3) toward quartz ring edge that will the ultra-violet curing bonding a bit or on three drops ultra-violet curing solidify glue;
(4) regulate Z direction coarse adjustment displacement handwheel 8 quartz ring workbench 3 is risen in the Z direction, make quartz ring and X ray mask keep certain interval;
(5) the directions X displacement handwheel 15 of adjusting X ray mask stage 14, Y direction displacement handwheel 16 and around Z axle rotation hand wheel 17, and regulate the directions X coarse adjustment displacement handwheel 4 and the Y direction coarse adjustment displacement handwheel 6 of quartz ring workbench 3, make quartz ring and X ray mask prealignment;
(6) by the observation of microscope 18, regulate the directions X fine tuning displacement handwheel 5 and the Y direction fine tuning displacement handwheel 7 of quartz ring workbench 3 repeatedly, quartz ring is accurately aimed at the X ray mask;
(7) regulate Z direction fine tuning displacement handwheel 9 and make quartz ring workbench 3, quartz ring is closely contacted with the X ray mask in the trickle rising of Z direction;
(8) open ultraviolet source 1, ultraviolet light sees through parallel lens 2 from parallel beneath incident, quartz ring and X ray mask ultra-violet curing bonding, finish the X ray mask and the ultra-violet curing bonding process of quartz ring.
In the process of X ray mask and quartz ring bonding, the X ray mask absorption of ultra-violet curing bonding and be fixed on the X ray mask stage 14, wherein the figure of X ray mask is up.The X ray mask can be briefly described as follows with the order of quartz ring ultra-violet curing bonding: at first the X ray mask is aimed at quartz ring, and X ray mask quartz ring closely contacts then, opens ultraviolet source 1 at last, and ultraviolet glue is carried out ultra-violet curing.
Claims (6)
1, a kind of X ray mask and quartz ring ultra-violet curing device is characterized in that, comprising:
One X ray mask stage, this worktable comprise directions X displacement handwheel mounted thereto, Y direction displacement handwheel and around Z axle rotation hand wheel; One vacuum fixture is positioned at the below of X ray mask stage, and this vacuum fixture comes vacuum suction X ray mask by pipeline, and the X ray mask stage is mainly used to place the X ray mask for the treatment of ultra-violet curing;
One quartz ring workbench, this worktable comprises directions X coarse adjustment displacement handwheel mounted thereto, directions X fine tuning displacement handwheel, Y direction coarse adjustment displacement handwheel, Y direction fine tuning displacement handwheel, Z direction coarse adjustment displacement handwheel and Z direction fine tuning displacement handwheel, this quartz ring workbench is mainly used to place the quartz ring for the treatment of ultra-violet curing, this quartz ring workbench is positioned at the below of X ray mask stage, to prevent the deformation of X ray mask;
One ultraviolet source is used to provide ultra-violet curing needed ultraviolet source, and this ultraviolet source is positioned at the below of quartz ring workbench;
One parallel lens is used for expanding bundle, and this parallel lens is between quartz ring workbench and ultraviolet source;
One is used to observe the microscope of alignment condition, is used to observe the X ray mask for the treatment of ultra-violet curing and the alignment condition of quartz ring, so that X ray mask and quartz ring are regulated in displacement, this microscope is positioned at the top of X ray mask stage;
Said X ray mask stage, quartz ring workbench, ultraviolet source, parallel lens and microscope are installed on the framework.
2, according to right 1 described a kind of X ray mask and quartz ring ultra-violet curing device, it is characterized in that, ultraviolet light that wherein said ultraviolet source sends through after the parallel lens from quartz ring workbench parallel beneath incident transmitted X-rays mask.
3, according to right 1 described a kind of X ray mask and quartz ring ultra-violet curing device, it is characterized in that wherein said quartz ring workbench displacement degree of regulation is less than 1 micron.
According to right 1 described a kind of X ray mask and quartz ring ultra-violet curing device, it is characterized in that 4, wherein vacuum fixture comes the non-graphics field, edge of vacuum suction X ray mask by pipeline.
5, the using method of a kind of X ray mask and quartz ring ultra-violet curing device is characterized in that, comprises the following steps:
(1) vacuum fixture comes the X ray mask that vacuum suction will the ultra-violet curing bonding by pipeline and is fixed on the X ray mask stage;
(2) quartz ring that will the ultra-violet curing bonding is fixed on the quartz ring workbench;
(3) toward quartz ring edge that will the ultra-violet curing bonding a bit or on three drops ultra-violet curing solidify glue;
(4) regulate Z direction coarse adjustment displacement handwheel quartz ring workbench is risen in the Z direction, make quartz ring and X ray mask keep certain interval;
(5) regulate the directions X displacement handwheel of X ray mask stage, Y direction displacement handwheel and around Z axle rotation hand wheel, and regulate the directions X coarse adjustment displacement handwheel and the Y direction coarse adjustment displacement handwheel of quartz ring workbench, make quartz ring and X ray mask prealignment;
(6) by microscopical observation, regulate the directions X fine tuning displacement handwheel and the Y direction fine tuning displacement handwheel of quartz ring workbench repeatedly, quartz ring is accurately aimed at the X ray mask;
(7) regulate Z direction fine tuning displacement handwheel and make quartz ring workbench, quartz ring is closely contacted with the X ray mask in the trickle rising of Z direction;
(8) open ultraviolet source, ultraviolet light sees through parallel lens from parallel beneath incident, quartz ring and X ray mask ultra-violet curing bonding, finish the X ray mask and the ultra-violet curing bonding process of quartz ring.
6, according to the using method of right 5 described a kind of X ray masks and quartz ring ultra-violet curing device, it is characterized in that, X ray mask absorption that wherein will the ultra-violet curing bonding also is fixed on the X ray mask stage, and wherein the figure of X ray mask up.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 03147402 CN1241063C (en) | 2003-07-07 | 2003-07-07 | X-ray mask and quartz ring ultraviolet solidifying apparatus and method for using |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 03147402 CN1241063C (en) | 2003-07-07 | 2003-07-07 | X-ray mask and quartz ring ultraviolet solidifying apparatus and method for using |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1567088A CN1567088A (en) | 2005-01-19 |
| CN1241063C true CN1241063C (en) | 2006-02-08 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 03147402 Expired - Fee Related CN1241063C (en) | 2003-07-07 | 2003-07-07 | X-ray mask and quartz ring ultraviolet solidifying apparatus and method for using |
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| Country | Link |
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| CN (1) | CN1241063C (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102016101842A1 (en) * | 2016-02-03 | 2017-08-03 | Helmut Fischer GmbH Institut für Elektronik und Messtechnik | Vacuum clamping device for clamping workpieces, measuring devices and methods for testing workpieces, in particular wafers |
| CN107843966B (en) * | 2016-09-18 | 2021-05-04 | 中芯国际集成电路制造(上海)有限公司 | Method and system for assembling microlens array assembly |
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- 2003-07-07 CN CN 03147402 patent/CN1241063C/en not_active Expired - Fee Related
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| Publication number | Publication date |
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| CN1567088A (en) | 2005-01-19 |
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