CN1227354A - Liquid photoresist - Google Patents
Liquid photoresist Download PDFInfo
- Publication number
- CN1227354A CN1227354A CN 98111154 CN98111154A CN1227354A CN 1227354 A CN1227354 A CN 1227354A CN 98111154 CN98111154 CN 98111154 CN 98111154 A CN98111154 A CN 98111154A CN 1227354 A CN1227354 A CN 1227354A
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- China
- Prior art keywords
- liquid photoresist
- resin
- unsaturated
- acrylate
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
The liquid photoresist is prepared by compounding UV-curable soda lye-soluble resin 40-80 wt%, acrylic ester or other photoset resin 15-30 wt%, multifunctional acrylic ester photocross-linking agent 5-20 wt%, optical initiator 1-3 wt%, and other material. These optically set materials produce photo-setting reaction after being irradiated by UV. Through soda lye development to eliminate unsensitized parts, the image is formed. The present invention may be used in producing printed circuit board and has excellent effect.
Description
The present invention relates to a kind of photoresist is liquid alkali developing type photoresist, relates in particular to the photoresist of a kind of photocurable, Photoimageable, usefulness liquid alkali developing, acid corrosion-resistant, anti-various acid electroplating liquid.
Be applied in the manufacture craft of P.e.c., double-sided PCB, multilayer circuit board of high precision, need liquid photoresist (and being the liquid alkali developing type) to make a plate and etching, and want its high resolving power, be used to make the complex circuit board of fine linewidth; The metal image making and the etching relief image that are applied in high precision also need this product.Present this series products is researcher crowd at home, but yet there are no coml uses, the preproduction that is provided at present is the same with external disclosed reference formulation, in fact be infeasible, for example its shop characteristic is poor, can't reach the live width of 0.1mm, also can't guarantee the smooth of P.e.c. (Copper Foil) lines.
The photoresist that the purpose of this invention is to provide a kind of photocurable, Photoimageable, usefulness liquid alkali developing, acid corrosion-resistant, anti-various acid electroplating liquid.The present invention also aims to provide a kind of shop characteristic good, can make the photoresist of high quality printing circuit board.Purpose of the present invention also has statement in instructions.
The object of the present invention is achieved like this: a kind of new liquid photoresist is characterized in that using the acrylate photocrosslinking agent (5-20%) and the light trigger materials such as (1-3%) of light-cured resins (15-30%) such as some buck soluble resin 40-80% (weight ratio) that can solidify after UV-irradiation, acrylate, polyfunctionality to make.Photocuring reaction takes place in these photo-curing materials after being subjected to UV-irradiation.By liquid alkali developing, remove not sensitization part, form image.
The image of photocuring part has water-fast, acid resistance, can resist the erosion of acid etching solution and acid electroplating liquid.。
The constituent of photoresist of the present invention is further defined to:
1, buck soluble resin of the present invention is the unsaturated acryl resin that contains carboxyl function group on a kind of end group or the side chain, also can be mixed unsaturated acroleic acid resin.Because the introducing of carboxyl, this resin has good buck solubility property.Because contain undersaturated acrylic acid groups, this resin has good photosensitive property simultaneously simultaneously.Its addition is 40-80%.40-47% is more excellent.
2, light-cured resin of the present invention is the unsaturated acrylate that has epoxide group; The acrylic acid polycarbamate; Unsaturated acrylic polyester etc.Its addition is 15-30% (percentage by weight, down together).
3, photocrosslinking agent of the present invention is a kind of acrylate of polyfunctionality.For example: tricarboxylic methylpropane triacrylate, 1,6 hexanediol diacrylate, tri (propylene glycol) diacrylate, pentaerythritol triacrylate etc.Its addition is 5-20%.
4, the present invention also can comprise a kind of water soluble propene's acid monomers and derivant.For example propenoic acid beta-hydroxy ethyl ester, N-methylol acryloyl bisacrylamide etc., its addition is 0.5-5%.
5, light trigger of the present invention is some benzophenone, styrax derivant, acetophenone derivs.Particularly a kind of acetophenone derivs that contains the morphine base that can in pigments system, keep light action.Its addition is 1-3%.
6, pigment of the present invention is a kind of pigment that does not influence the uv photopolymerization reaction, for example, and the pigment of phthalocyanine series.
7, the present invention uses the levelling agent and the defoamer of some special effectiveness.
The present invention has following effect:
Constituent of the present invention is the photoresist of photocurable, Photoimageable, usefulness liquid alkali developing, acid corrosion-resistant, anti-various acid electroplating liquid.Its shop characteristic is good, can reach the live width of 0.1mm, can guarantee the smooth of P.e.c. (Copper Foil) lines.On probation showing through printed-wiring board (PWB) manufacturer: can reach the high resolving power of 0.1mm live width, the printed-wiring board (PWB) quality is good, can replace the best brand of product that prescription is maintained secrecy.
The invention will be further described by the following examples:
Application examples following (as long as various constituents are fully mixed), the content of every embodiment is weight percentage:
Table 1
Title weight percent content (% scope) example 1 example 2 examples 3
End group or side chain contain the unsaturated acryl resin 40-80 40 45 47 of carboxyl
The mixed side chain of end group contains the unsaturated acryl resin 40-80 of carboxyl
Epoxy acrylic resin 15-30 30 25 22
Acrylic acid polycarbamate 15-30
Unsaturated acrylic polyester 15-30
Composition, acrylic resin 15-30
Trimethylolpropane triacrylate 5-20 20 18 15
1,6 hexanediol diacrylate 5-20
Tri (propylene glycol) diacrylate 5-20 2
Pentaerythritol triacrylate 5-20 6
Propenoic acid beta-hydroxy ethyl ester 0.5-5
N hydroxymethyl acrylamide 0.5-5 1.5 1.5 1.5
Benzophenone 0.5-1.5 111
Hydroxy acetophenone 0.2-0.8
Contain morphine quinoline benzoylformaldoxime derivant 0.5-1.0
Pigment 0.5-1.5 0.5 0.5 0.5
Add filler (trickle barium sulphate) 3-5 555
The defoamer 0.1-0.5 0.2 0.2 0.2 that contains organic silicon group
The levelling agent 0.5-0.9 0.9 0.9 0.9 that contains silicone
The defoamer 0.5-0.9 0.9 0.9 0.9 that contains silicone
Table 2
Title example 4 examples 5 examples 6 examples 7 examples 8 examples 9
Mixed chain contains the unsaturated acryl resin 47 50 55 60 70 75 of carboxyl
Epoxy acrylic resin 30 25 22 543
The acrylic acid polycarbamate
Unsaturated acrylic polyester
Composition, acrylic resin 15 12 10
Trimethylolpropane triacrylate 20 18 15
1,6 hexanediol diacrylate
Tri (propylene glycol) diacrylate
Pentaerythritol triacrylate 865
Propenoic acid beta-hydroxy ethyl ester 111
N hydroxymethyl acrylamide 1.5 1.5 1.5
Benzophenone 111
Hydroxy acetophenone
Contain morphine quinoline benzoylformaldoxime derivant 0.5 0.5 0.5
Pigment 0.3 0.5 0.5
Add filler (trickle barium sulphate) 33555
The defoamer 0.2 0.2 0.2 that contains organic silicon group
The levelling agent 0.2 0.9 0.9 that contains silicone
The defoamer that contains silicone
Table 3
Title example 10 examples 11 examples 12 examples 13 examples 14 examples 15 examples 16 examples 17
Contain the unsaturated acryl resin 42 47 50 55 60 65 70 75 of carboxyl
Epoxy acrylic resin
Acrylic acid polycarbamate 5
Unsaturated acrylic polyester 30 27 25 23 20 543
The composition, acrylic resin
Trimethylolpropane triacrylate 17 18 15
1,6 hexanediol diacrylate
Tri (propylene glycol) diacrylate 2
Pentaerythritol triacrylate 20 18 16 12 6
Propenoic acid beta-hydroxy ethyl ester
N hydroxymethyl acrylamide 11111 1.5 1.5 1.5
Benzophenone
Hydroxy acetophenone
Contain morphine quinoline benzoylformaldoxime derivant 0.5 0.5 0.5 0.5 1111
Pigment 1111 0.5 0.5 0.5 0.5
Add filler (trickle barium sulphate) 5555555
The defoamer 0.2 0.2 0.2 that contains organic silicon group
The levelling agent 0.5 0.5 0.9 0.9 0.5 0.9 0.8 0.6 that contains silicone
The defoamer 0.2 0.9 0.9 0.9 that contains silicone
Containing the levelling agent of silicone, the defoamer that contains silicone has the selection of multiple routine, seldom gives unnecessary details herein.
Application process of the present invention:
1. coating: serigraphy (using 300 order silk screens) or roller coating composition of the present invention; 2. preceding baking: 85-90 ℃ 30 minutes; 3. exposure: ultraviolet light (wavelength 310-390nm); Light intensity: 80mW/cm
2.30 second; 4. develop: 30 ℃ at 0.5-1.0% Na
2CO
330 seconds in the aqueous solution; 5. electroplate or corrosion: acid, neutral corrosive liquid or electroplate liquid; 6. striping: 3-5%NaOH strong alkali aqueous solution water temperature: 50 ℃
Claims (9)
1. liquid photoresist is characterized in that the acrylate photocrosslinking agent (5-20%) and the light trigger materials such as (1-3%) that make up light-cured resins (15-30%) such as some buck soluble resin 40-80% (weight ratio) that can solidify, acrylate, polyfunctionality after UV-irradiation make.
2. by the described a kind of liquid photoresist of claim 1, it is characterized in that the buck soluble resin is the unsaturated acryl resin that contains carboxyl function group on a kind of end group or the side chain, also can be mixed unsaturated acroleic acid resin, addition 40-47% is more excellent.
3. by the described a kind of liquid photoresist of claim 1, it is characterized in that described light-cured resin is the unsaturated acrylate that has epoxide group, acrylic acid polycarbamate, unsaturated acrylic polyester etc.
4. by the described a kind of liquid photoresist of claim 1, it is characterized in that described photocrosslinking agent is acrylate, tricarboxylic methylpropane triacrylate, 1,6 hexanediol diacrylate, tri (propylene glycol) diacrylate, pentaerythritol triacrylate of a kind of polyfunctionality etc.
5. by claim 1,2 described a kind of liquid photoresists, it is characterized in that also comprising a kind of water soluble propene's acid monomers and derivant: propenoic acid beta-hydroxy ethyl ester, N-methylol acryloyl bisacrylamide etc., its addition is 0.5-5%.
6. by the described a kind of liquid photoresist of claim 1, it is characterized in that described light trigger is some benzophenone, styrax derivant, acetophenone derivs.
7. by the described a kind of liquid photoresist of claim 6, it is characterized in that described light trigger for can keep the acetophenone derivs that contains the morphine base of light action in pigments system, its addition is 1-3%.
8. by the described a kind of liquid photoresist of claim 1, it is characterized in that adding the pigment of 0.5-1.5%.
9. by the described a kind of liquid photoresist of claim 1, it is characterized in that containing the defoamer and the levelling agent of silicone.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 98111154 CN1227354A (en) | 1998-02-24 | 1998-02-24 | Liquid photoresist |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 98111154 CN1227354A (en) | 1998-02-24 | 1998-02-24 | Liquid photoresist |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1227354A true CN1227354A (en) | 1999-09-01 |
Family
ID=5221154
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 98111154 Pending CN1227354A (en) | 1998-02-24 | 1998-02-24 | Liquid photoresist |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1227354A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1749856B (en) * | 2004-09-16 | 2011-10-19 | 爱克发印艺公司 | Curable jettable liquid for flexography |
-
1998
- 1998-02-24 CN CN 98111154 patent/CN1227354A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1749856B (en) * | 2004-09-16 | 2011-10-19 | 爱克发印艺公司 | Curable jettable liquid for flexography |
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