CN122228362A - 双层陶瓷涂层系统 - Google Patents

双层陶瓷涂层系统

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Publication number
CN122228362A
CN122228362A CN202480073294.2A CN202480073294A CN122228362A CN 122228362 A CN122228362 A CN 122228362A CN 202480073294 A CN202480073294 A CN 202480073294A CN 122228362 A CN122228362 A CN 122228362A
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oxide
layer
ceramic
ytterbium
stabilizer
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A·弗洛雷斯伦特里亚
G·维茨
A·维德亚
A·夏尔马
D·佐伊斯
N·希奇曼
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Siemens Energy Global GmbH and Co KG
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Siemens Energy Global GmbH and Co KG
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Publication of CN122228362A publication Critical patent/CN122228362A/zh
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Abstract

本发明涉及一种层体系（1），其至少包含（以重量%计）：金属基底（4），任选地，在基底（4）上的金属粘合层（7）和用氧化镱作为稳定剂的部分稳定的四方氧化锆的陶瓷底层（10）和在陶瓷底层（10）上的完全稳定的立方氧化锆的陶瓷顶层（13），其中稳定剂的比例为17.5%至25.5%。

Description

双层陶瓷涂层系统
技术领域
本发明涉及一种双层陶瓷涂层体系。
背景技术
陶瓷通常表现出高温稳定性，因此通常用作高温部件上的陶瓷涂层，例如在涡轮机中，特别是在燃气涡轮机中。
在这种类型的应用中重要的是使用陶瓷作为基底上的涂层，所述基底通常是金属基底。
衬底上的金属粘结层，例如基于NiCoCrAlY的那些，以及陶瓷粘结层或TGO是已知的。
还经常使用由两个陶瓷层组成的双层涂层系统。
具有20YSZ的完全稳定的陶瓷氧化锆层是现有技术，但在与陶瓷底层的粘结方面需要改进。
因此，目的是改善双层陶瓷层系统的隔热性能和使用寿命。
发明内容
因此，本发明的任务是解决上述问题。
该问题通过根据权利要求1的层系统来解决。
基于具有稳定剂的氧化锆的陶瓷层是已知的，其中完全稳定的氧化锆由于其更好的热稳定性在此通常被使用。
然而，该想法的目的是使用完全稳定的氧化锆，其具有改善的，特别是热稳定性，以及对陶瓷底层的良好粘附性。
附图说明
该图示意性地示出了本发明的示例。
附图和描述仅是本发明的示例。
具体实施方式
在层系统1中，将陶瓷层10施加到金属基底上，优选使用镍基或钴基超级合金作为基底4，存在金属粘结层7，其形成氧化铝（TGO，未示出）。
金属粘结层7优选地也是铝化物、铝化铂或NiCoCrAlY-X合金作为基础，可选地其中X=Ta、Re、Fe和/或Si。
陶瓷顶层13可以通过EB-PVD、等离子喷涂（APS，...）、HVOF...来施加，并且优选具有柱状结构或分段结构（DVC）。
优选地，陶瓷顶层13的孔隙率低于10%。
陶瓷顶层13优选具有100 μm至1000 μm的层厚度。
还存在陶瓷底层10，但是其层厚度比陶瓷顶层13的层厚度薄至少20%，陶瓷底层10与陶瓷顶层13一起形成陶瓷层系统。
陶瓷底层10可以通过EB-PVD、等离子体喷涂（APS，...）、HVOF...施加。
优选地，陶瓷底层10的孔隙率低于10%或不高于顶层13的孔隙率。
以下所有量均以重量%给出。
陶瓷底层10包括具有氧化镱作为稳定剂的四方氧化锆。
使用以下量：
11.5%至13.5%的氧化镱。
特别优选地，使用12.5%的氧化镱。
同样优选地，仅使用氧化镱作为稳定剂。可能存在一些少量的氧化物杂质。
将具有氧化锆（FSZ）的立方结构的陶瓷顶层13施加到陶瓷底层10上。
立方氧化锆优选具有氧化钇稳定的氧化锆（YSZ）：氧化钇的比例为18.0%至22.0%，特别是20.0%。
优选地，仅使用氧化钇作为稳定剂。可能存在一些少量的氧化物杂质。
还可以使用具有氧化钇、氧化镱和氧化钆稳定剂的立方氧化锆：
与其他两种稳定剂相比，氧化钇占最大比例。
优选地，仅使用这些稳定剂。
在每种情况下优选使用以下比例：
9.0%-11.0%的氧化钇，
4.5%-6.5%的氧化镱和
4.0%-6.0%的氧化钆。
在每种情况下特别优选的是
9.5%-10.0%的氧化钇，
5.2%-6.0%的氧化镱和
4.8%-5.6%氧化钆。
优选地，仅使用这些稳定剂氧化钇、氧化镱和氧化钆。可能存在一些少量的氧化物杂质。
完全稳定的氧化锆（FSZ）优选也用14.0%至16.0%的氧化镱（Yb2O3）稳定，特别是用14.5%至15.5%的氧化镱（Yb2O3）稳定，并且用4.0%至6.0%的氧化钇（Y2O3）和任选地氧化铪和/或氧化铝稳定。
陶瓷材料优选包含4.5%至5.5%的氧化钇（Y2O3）。
陶瓷材料优选任选地包含：0.2%至4.0%的氧化铪（HfO2），特别是0.5%至2.5%的氧化铪（HfO2）。
底层10的实施例：
12.4%的Yb2O3-ZrO2
结合上述实施例的顶层13的实施例：
20.1%的Y2O3-ZrO2
或者
15.0%的Y2O3 / 4.9%的Y2O3-ZrO2
或者
10.0%的Y2O3 / 5.5%的Yb2O3 / 5.3%的Gd2O3-ZrO2
其实现了良好的性能。

Claims (8)

1.层系统（1）
其至少包含（以重量%计）
金属基底（4），
任选地，在所述基底（4）上的金属粘结层（7），和
陶瓷底层（10），所述陶瓷底层是以氧化镱作为稳定剂的部分稳定的四方氧化锆，优选11.5%-13.5%的氧化镱，特别优选12.5%的氧化镱，和
陶瓷顶层（13），所述陶瓷顶层是在所述陶瓷底层（10）上的完全稳定的立方氧化锆，
其中所述陶瓷顶层（13）的稳定剂的比例为17.5%至26.0%。
2.根据权利要求1所述的层系统，其中仅使用氧化镱作为陶瓷底层（10）的稳定剂。
3.根据权利要求1或2中的一项或两项所述的层系统，其中所述陶瓷顶层（13）包含（以重量%计）氧化钇稳定的氧化锆，其中氧化钇的比例为18.0重量%至22.0重量%，特别是20.0重量%，特别地，仅使用氧化钇。
4.根据权利要求1或2中的一项或两项所述的层系统，其中所述陶瓷顶层（13）包含（以重量%计）氧化锆，其中存在氧化钇、氧化镱和氧化钆的稳定剂，其中优选给出以下比例：9.0%-11.0%的氧化钇，4.5%-6.5%的氧化镱和4.0%-6.0%氧化钆，在每种情况下存在优选9.75%-10.0%的氧化钇，优选5.2%至6.0%的氧化镱，和优选4.8%-5.6%的氧化钆，特别地，仅使用这三种稳定剂氧化钇、氧化镱和氧化钆。
5.根据权利要求1或2中的一项或两项所述的层系统，其中，所述陶瓷顶层（13）包括氧化锆，其中存在氧化钇和氧化镱的稳定剂（以重量%计），其中优选给出以下比例：14.0%至16.0%的氧化镱（Yb2O3），特别是14.5%至15.5%的氧化镱以及4.0%至6.0%的氧化钇和任选的氧化铪和/或氧化铝。
6.根据权利要求5所述的层系统，其中所述陶瓷顶层（13）包含氧化锆（以重量%计），其中存在氧化钇和氧化镱的稳定剂，其中给出以下比例：15%氧化镱，4.5%至5.5%的氧化钇，任选地0.2%至4.0%的氧化铪，特别是0.5%至2.5%的氧化铪。
7.根据权利要求1、2、3、4、5或6中的一项或多项所述的层系统，包括：在所述陶瓷底层（10）和所述金属基底（4）之间的金属粘附促进剂层（7），特别是直接在所述基底（4）上，其中所述粘合促进剂层（7）包含NiCoCrAlY-X类型的合金，X任选地选自Ta、Re和/或Si，特别是NiCoCrAlY或NiCoCrAlY-Ta。
8.根据权利要求1、2、3、4、5、6或7中的一项或多项所述的层系统，其中所述陶瓷层（13）下方的所述陶瓷底层（10）薄至少20%。
CN202480073294.2A 2023-11-20 2024-09-05 双层陶瓷涂层系统 Pending CN122228362A (zh)

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