CN1203726C - Silicon-based sensor system - Google Patents
Silicon-based sensor system Download PDFInfo
- Publication number
- CN1203726C CN1203726C CNB008153809A CN00815380A CN1203726C CN 1203726 C CN1203726 C CN 1203726C CN B008153809 A CNB008153809 A CN B008153809A CN 00815380 A CN00815380 A CN 00815380A CN 1203726 C CN1203726 C CN 1203726C
- Authority
- CN
- China
- Prior art keywords
- transducer
- sensing system
- carrier body
- contact element
- active parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 31
- 239000010703 silicon Substances 0.000 title claims abstract description 31
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title abstract description 24
- 229910000679 solder Inorganic materials 0.000 claims description 22
- 239000003990 capacitor Substances 0.000 claims description 12
- 238000007789 sealing Methods 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 9
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 241000500881 Lepisma Species 0.000 claims description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 5
- 229920001940 conductive polymer Polymers 0.000 claims description 5
- 238000005516 engineering process Methods 0.000 abstract description 22
- 239000000758 substrate Substances 0.000 abstract description 9
- 238000013461 design Methods 0.000 abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 238000000034 method Methods 0.000 abstract description 2
- 239000007787 solid Substances 0.000 abstract description 2
- 238000010923 batch production Methods 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 description 5
- 230000004224 protection Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 229920005591 polysilicon Polymers 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000007600 charging Methods 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000010295 mobile communication Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R19/00—Electrostatic transducers
- H04R19/005—Electrostatic transducers using semiconductor materials
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R19/00—Electrostatic transducers
- H04R19/04—Microphones
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R25/00—Deaf-aid sets, i.e. electro-acoustic or electro-mechanical hearing aids; Electric tinnitus maskers providing an auditory perception
- H04R25/60—Mounting or interconnection of hearing aid parts, e.g. inside tips, housings or to ossicles
- H04R25/609—Mounting or interconnection of hearing aid parts, e.g. inside tips, housings or to ossicles of circuitry
Abstract
Description
Claims (30)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DKPA199901254 | 1999-09-06 | ||
DKPA1999/01254 | 1999-09-06 | ||
US39162899A | 1999-09-07 | 1999-09-07 | |
US09/391,628 | 1999-09-07 | ||
US09/570,434 | 2000-05-12 | ||
US09/570,434 US6522762B1 (en) | 1999-09-07 | 2000-05-12 | Silicon-based sensor system |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1387741A CN1387741A (en) | 2002-12-25 |
CN1203726C true CN1203726C (en) | 2005-05-25 |
Family
ID=27221189
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB008153809A Expired - Lifetime CN1203726C (en) | 1999-09-06 | 2000-09-06 | Silicon-based sensor system |
Country Status (10)
Country | Link |
---|---|
EP (1) | EP1214864B1 (en) |
JP (2) | JP4459498B2 (en) |
CN (1) | CN1203726C (en) |
AT (1) | ATE242587T1 (en) |
AU (1) | AU6984100A (en) |
CA (1) | CA2383740C (en) |
DE (1) | DE60003199T2 (en) |
DK (1) | DK1214864T3 (en) |
PL (1) | PL209935B1 (en) |
WO (1) | WO2001019134A2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106716636A (en) * | 2014-09-17 | 2017-05-24 | 英特尔公司 | Die with integrated microphone device using through-silicon vias (TSVs) |
CN108807657A (en) * | 2017-04-26 | 2018-11-13 | 矽品精密工业股份有限公司 | Package structure and method for fabricating the same |
Families Citing this family (48)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6859542B2 (en) | 2001-05-31 | 2005-02-22 | Sonion Lyngby A/S | Method of providing a hydrophobic layer and a condenser microphone having such a layer |
US6696645B2 (en) * | 2002-05-08 | 2004-02-24 | The Regents Of The University Of Michigan | On-wafer packaging for RF-MEMS |
US7142682B2 (en) | 2002-12-20 | 2006-11-28 | Sonion Mems A/S | Silicon-based transducer for use in hearing instruments and listening devices |
US7466835B2 (en) | 2003-03-18 | 2008-12-16 | Sonion A/S | Miniature microphone with balanced termination |
JP2004356708A (en) * | 2003-05-27 | 2004-12-16 | Hosiden Corp | Sound detection mechanism and manufacturing method thereof |
CN100515119C (en) * | 2003-08-12 | 2009-07-15 | 中国科学院声学研究所 | Chip for silicon micro capacitor microphone and its preparation method |
CN100499877C (en) * | 2003-12-17 | 2009-06-10 | 中国科学院声学研究所 | Chip having high sensitivity for silicon micro-capacitor microphone and preparation method thereof |
DE102004011203B4 (en) * | 2004-03-04 | 2010-09-16 | Robert Bosch Gmbh | Method for mounting semiconductor chips and corresponding semiconductor chip arrangement |
JP4553611B2 (en) | 2004-03-15 | 2010-09-29 | 三洋電機株式会社 | Circuit equipment |
JP4539450B2 (en) * | 2004-11-04 | 2010-09-08 | オムロン株式会社 | Capacitive vibration sensor and manufacturing method thereof |
DE102005008511B4 (en) | 2005-02-24 | 2019-09-12 | Tdk Corporation | MEMS microphone |
DE102005008512B4 (en) | 2005-02-24 | 2016-06-23 | Epcos Ag | Electrical module with a MEMS microphone |
DE102005053765B4 (en) | 2005-11-10 | 2016-04-14 | Epcos Ag | MEMS package and method of manufacture |
DE102005053767B4 (en) | 2005-11-10 | 2014-10-30 | Epcos Ag | MEMS microphone, method of manufacture and method of installation |
DE102005056759A1 (en) * | 2005-11-29 | 2007-05-31 | Robert Bosch Gmbh | Micromechanical structure for use as e.g. microphone, has counter units forming respective sides of structure, where counter units have respective electrodes, and closed diaphragm is arranged between counter units |
CN101005718B (en) * | 2006-01-16 | 2011-04-20 | 财团法人工业技术研究院 | Micro acoustic sensor and its producing method |
JP4771290B2 (en) * | 2006-07-19 | 2011-09-14 | ヤマハ株式会社 | Manufacturing method of pressure sensor |
WO2008077517A1 (en) * | 2006-12-22 | 2008-07-03 | Sonion Mems A/S | Microphone assembly with underfill agent having a low coefficient of thermal expansion |
JP4893380B2 (en) * | 2007-03-09 | 2012-03-07 | ヤマハ株式会社 | Condenser microphone device |
US7557417B2 (en) | 2007-02-21 | 2009-07-07 | Infineon Technologies Ag | Module comprising a semiconductor chip comprising a movable element |
DE102007008518A1 (en) * | 2007-02-21 | 2008-08-28 | Infineon Technologies Ag | Semiconductor module for micro-electro-mechanical system, has semiconductor chip having movable unit and active main surface that is turned towards carrier, where another chip is attached at former chip, and cavity is formed between chips |
US8767983B2 (en) | 2007-06-01 | 2014-07-01 | Infineon Technologies Ag | Module including a micro-electro-mechanical microphone |
JP2009081624A (en) * | 2007-09-26 | 2009-04-16 | Rohm Co Ltd | Semiconductor sensor device |
TWI336770B (en) * | 2007-11-05 | 2011-02-01 | Ind Tech Res Inst | Sensor |
TWI365525B (en) * | 2007-12-24 | 2012-06-01 | Ind Tech Res Inst | An ultra thin package for a sensor chip of a micro electro mechanical system |
EP2094028B8 (en) * | 2008-02-22 | 2017-03-29 | TDK Corporation | Miniature microphone assembly with solder sealing ring |
DE112009002542A5 (en) * | 2008-10-14 | 2011-09-08 | Knowles Electronics, Llc | Microphone with a plurality of transducer elements |
KR20120014591A (en) * | 2009-05-18 | 2012-02-17 | 노우레스 일렉트로닉스, 엘엘시 | Microphone having reduced vibration sensitivity |
KR101609270B1 (en) | 2009-08-12 | 2016-04-06 | 삼성전자주식회사 | Piezoelectric micro speaker and method of manufacturing the same |
DE102009047592B4 (en) * | 2009-12-07 | 2019-06-19 | Robert Bosch Gmbh | Process for producing a silicon intermediate carrier |
IT1397976B1 (en) * | 2009-12-23 | 2013-02-04 | St Microelectronics Rousset | MICROELETTROMECHANICAL TRANSDUCER AND RELATIVE ASSEMBLY PROCEDURE. |
JP2013093637A (en) * | 2010-02-24 | 2013-05-16 | Panasonic Corp | Semiconductor device and manufacturing method of the same |
TWI491009B (en) | 2010-10-08 | 2015-07-01 | Chip level emi shielding structure and manufacture method thereof | |
CN102456669B (en) * | 2010-10-25 | 2015-07-22 | 环旭电子股份有限公司 | Chip-grade electromagnetic interference shielding structure and manufacturing method thereof |
WO2012088688A1 (en) * | 2010-12-30 | 2012-07-05 | Goertek Inc. | A mems microphone and method for packaging the same |
JP5721452B2 (en) * | 2011-01-27 | 2015-05-20 | ローム株式会社 | Capacitive MEMS sensor |
JP5799619B2 (en) | 2011-06-24 | 2015-10-28 | 船井電機株式会社 | Microphone unit |
DE102011086722A1 (en) * | 2011-11-21 | 2013-05-23 | Robert Bosch Gmbh | Micromechanical functional device, in particular speaker device, and corresponding manufacturing method |
US20130147040A1 (en) * | 2011-12-09 | 2013-06-13 | Robert Bosch Gmbh | Mems chip scale package |
DE102012203373A1 (en) * | 2012-03-05 | 2013-09-05 | Robert Bosch Gmbh | Micromechanical sound transducer arrangement and a corresponding manufacturing method |
US20140090485A1 (en) * | 2012-10-02 | 2014-04-03 | Robert Bosch Gmbh | MEMS Pressure Sensor Assembly |
US10136226B2 (en) | 2012-12-18 | 2018-11-20 | Tdk Corporation | Top-port MEMS microphone and method of manufacturing the same |
US20140312439A1 (en) * | 2013-04-19 | 2014-10-23 | Infineon Technologies Ag | Microphone Module and Method of Manufacturing Thereof |
ITTO20130350A1 (en) | 2013-04-30 | 2014-10-31 | St Microelectronics Srl | SLICE ASSEMBLY OF A MEMS SENSOR DEVICE AND RELATIVE MEMS SENSOR DEVICE |
US9264832B2 (en) * | 2013-10-30 | 2016-02-16 | Solid State System Co., Ltd. | Microelectromechanical system (MEMS) microphone with protection film and MEMS microphonechips at wafer level |
GB2540034B (en) * | 2014-06-10 | 2017-09-13 | Cirrus Logic Int Semiconductor Ltd | Packaging for MEMS transducers |
CN104780490A (en) * | 2015-04-20 | 2015-07-15 | 歌尔声学股份有限公司 | MEMS microphone packaging structure and manufacturing method thereof |
CN111711903B (en) * | 2020-06-24 | 2021-10-01 | 歌尔微电子有限公司 | Miniature microphone dust keeper and MEMS microphone |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4533795A (en) * | 1983-07-07 | 1985-08-06 | American Telephone And Telegraph | Integrated electroacoustic transducer |
US5490220A (en) * | 1992-03-18 | 1996-02-06 | Knowles Electronics, Inc. | Solid state condenser and microphone devices |
US5889872A (en) * | 1996-07-02 | 1999-03-30 | Motorola, Inc. | Capacitive microphone and method therefor |
US5856914A (en) * | 1996-07-29 | 1999-01-05 | National Semiconductor Corporation | Micro-electronic assembly including a flip-chip mounted micro-device and method |
US5870482A (en) * | 1997-02-25 | 1999-02-09 | Knowles Electronics, Inc. | Miniature silicon condenser microphone |
-
2000
- 2000-09-06 WO PCT/DK2000/000491 patent/WO2001019134A2/en active IP Right Grant
- 2000-09-06 EP EP00958265A patent/EP1214864B1/en not_active Expired - Lifetime
- 2000-09-06 PL PL354095A patent/PL209935B1/en unknown
- 2000-09-06 DE DE60003199T patent/DE60003199T2/en not_active Expired - Lifetime
- 2000-09-06 CA CA002383740A patent/CA2383740C/en not_active Expired - Fee Related
- 2000-09-06 JP JP2001522196A patent/JP4459498B2/en not_active Expired - Fee Related
- 2000-09-06 DK DK00958265T patent/DK1214864T3/en active
- 2000-09-06 CN CNB008153809A patent/CN1203726C/en not_active Expired - Lifetime
- 2000-09-06 AU AU69841/00A patent/AU6984100A/en not_active Abandoned
- 2000-09-06 AT AT00958265T patent/ATE242587T1/en active
-
2006
- 2006-10-04 JP JP2006273173A patent/JP4303742B2/en not_active Expired - Fee Related
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106716636A (en) * | 2014-09-17 | 2017-05-24 | 英特尔公司 | Die with integrated microphone device using through-silicon vias (TSVs) |
CN106716636B (en) * | 2014-09-17 | 2021-05-28 | 英特尔公司 | Die with integrated microphone device using through-silicon vias (TSVs) |
CN108807657A (en) * | 2017-04-26 | 2018-11-13 | 矽品精密工业股份有限公司 | Package structure and method for fabricating the same |
CN108807657B (en) * | 2017-04-26 | 2022-01-04 | 矽品精密工业股份有限公司 | Package structure and method for fabricating the same |
Also Published As
Publication number | Publication date |
---|---|
PL209935B1 (en) | 2011-11-30 |
DE60003199T2 (en) | 2004-07-01 |
WO2001019134A3 (en) | 2001-09-07 |
JP2003508998A (en) | 2003-03-04 |
DK1214864T3 (en) | 2003-08-25 |
WO2001019134A2 (en) | 2001-03-15 |
CA2383740A1 (en) | 2001-03-15 |
EP1214864A2 (en) | 2002-06-19 |
JP2007028671A (en) | 2007-02-01 |
EP1214864B1 (en) | 2003-06-04 |
PL354095A1 (en) | 2003-12-29 |
ATE242587T1 (en) | 2003-06-15 |
DE60003199D1 (en) | 2003-07-10 |
CN1387741A (en) | 2002-12-25 |
CA2383740C (en) | 2005-04-05 |
JP4459498B2 (en) | 2010-04-28 |
JP4303742B2 (en) | 2009-07-29 |
AU6984100A (en) | 2001-04-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: SHENGYANG MENSI CO., LTD. Free format text: FORMER OWNER: MICROTRONICS A/S Effective date: 20030424 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20030424 Address after: Danish kongens Lyngby Applicant after: Sonion Clemens Limited by Share Ltd. Address before: Roskilde Applicant before: MICROTRONIC A/S |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: EPCOS PRIVATE LIMITED Free format text: FORMER OWNER: PARS MEMS CO., LTD. Effective date: 20121113 |
|
C41 | Transfer of patent application or patent right or utility model | ||
C56 | Change in the name or address of the patentee |
Owner name: PARS MEMS CO., LTD. Free format text: FORMER NAME: SONION LYNGBY A/S |
|
CP03 | Change of name, title or address |
Address after: Roskilde Patentee after: MEMS Co.,Ltd. Address before: Denmark Frilandsmuseet Patentee before: Shengyang Lingbi Co.,Ltd. |
|
TR01 | Transfer of patent right |
Effective date of registration: 20121113 Address after: Singapore Singapore Patentee after: Epp Kos Private Ltd. Address before: Roskilde Patentee before: MEMS Co.,Ltd. |
|
TR01 | Transfer of patent right |
Effective date of registration: 20170523 Address after: Tokyo, Japan Patentee after: TDK Corp. Address before: Singapore Singapore Patentee before: Epp Kos Private Ltd. |
|
TR01 | Transfer of patent right | ||
CX01 | Expiry of patent term |
Granted publication date: 20050525 |
|
CX01 | Expiry of patent term |