CN1201190C - Reflector with lug on its inclined surface and its making process - Google Patents
Reflector with lug on its inclined surface and its making process Download PDFInfo
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- CN1201190C CN1201190C CN 01139338 CN01139338A CN1201190C CN 1201190 C CN1201190 C CN 1201190C CN 01139338 CN01139338 CN 01139338 CN 01139338 A CN01139338 A CN 01139338A CN 1201190 C CN1201190 C CN 1201190C
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Abstract
The present invention relates to a method for manufacturing a reflector of which the inclined surface is provided with lugs, which at least comprises the following steps of providing a base material, covering a photosensitive material layer on the base material, limiting the photosensitive material layer to form m groups of patterns (m is a positive integer which is not less than one) which are respectively composed of a plurality of lugs with different bottom surfaces, connecting the lugs to form a structure that the inclined surface is provided with the lugs, wherein the m groups of formed lugs are regularly formed on the base material in a matrix mode or irregularly formed on the base material. The present invention also comprises the steps of exposure and development for limiting a photoresist layer, and the step of baking can be used for dissolving the lugs so as to connect the lugs. The lug structure on the inclined plane of the present invention has the advantages of simple manufacturing processes and favorable ray scattering effect, so that an applied reflecting type liquid crystal screen has high reflecting brightness and large visual angles.
Description
Technical field
The present invention relates to a kind of mirror surface (reflector) and manufacture method thereof that on the dip plane, has projection, particularly relate to and a kind ofly be applied to LCD Panel (LCD), and utilize formed mirror surface and the manufacture method thereof that on the dip plane, has projection of single photo mask.
Background technology
For reflection type liquid crystal display screen (reflective Liquid Crystal Display),, must be noted that also whether the visual angle is broad except must be noted that the brightness of LCD Panel (LCD) reflection.Therefore, how designing the LCD Panel of sening as an envoy to high reflecting brightness and mirror surface (reflector) with great visual angle, is present important research direction.
Please refer to Figure 1A, it illustrates the opticpath synoptic diagram of the mirror surface of a horizontal positioned and surface smoothing.Wherein, the vertical normal of dotted line representative and mirror surface 100.In Figure 1A, the mirror surface 100 of LCD Panel is level and smooth fully and horizontal positioned, and when incident light 102 entered mirror surface 100 with 20 incident angles of spending, most light can penetrate mirror surfaces 100 with the reflected light 104 of-20 degree.Therefore, can measure maximum reflectivity R for-20 when spending in angle
1, and the distribution curve of reflectivity is very narrow, mostly concentrates near-20 degree.Please be simultaneously with reference to Figure 1B, it illustrates the reflectivity of Figure 1A and the graph of a relation that takes measurement of an angle.
Yet desirable LCD Panel should present maximum reflectivity when angle about 0 is spent, and also can present partial reflectance in other angles.That is to say, be about 0 degree if the curve among Figure 1B is moved to the left maximum reflectivity, and the distribution of reflectivity is broader, then can reach with high reflecting brightness and effect with great visual angle.
A kind of reflectance curve that makes is that mirror surface is tilted (slant) to the traditional method that 0 degree moves, and this tilting mirrors can change the travel path of light, and reflected light is penetrated with the reflection angle of about 0 degree.Please refer to Fig. 2 A, it illustrates the opticpath synoptic diagram of the mirror surface of a surface tilt.Wherein, the upper surface 200 ' vertical normal of dotted line representative and mirror surface 200, and the upper surface 200 of mirror surface 200 ' have with respect to the horizontal plane 10 spend the elevations angle.Shown in Fig. 2 A, limit the pitch angle that mirror surface 200 has 10 degree, and the normal of 10 degree that tilt makes incident light 202 to spend the 200 ' time of upper surface of arriving at mirror surface perpendicular to surface level 20, can penetrate LCD Panel by 0 reflected light of spending 204.Please be simultaneously with reference to Fig. 2 B, it illustrates the reflectivity of Fig. 2 A and the graph of a relation that takes measurement of an angle.In Fig. 2 B, angle is 0 can measure maximum reflectivity R when spending
1, still, the distribution curve of reflectivity is still very narrow, mostly concentrates near 0 degree.
Another kind of traditional method is to make mirror surface form the projection of inclination, and the slick and sly surface by projection is able in wider angle internal reflection light.Please refer to Fig. 2 C, it illustrates the opticpath synoptic diagram of the mirror surface of another surface tilt.Fig. 2 C and Fig. 2 A different be in, 10 mirror surfaces 300 of spending (the 10 degree elevations angle with respect to the horizontal plane) are inclined upwardly, its surface is more slick and sly, makes mirror surface 300 produce more different normal angle, so that the reflection angle of light is broader than the mirror surface 300 of Fig. 2 A.Yet roughly, the reflection angle that mirror surface 300 is produced changes not quite still about 10 degree, so the reflectivity of Fig. 2 C and the graph of a relation that takes measurement of an angle are still as shown in Fig. 2 B.
For the LCD Panel that makes application not only has high reflecting brightness, and have simultaneously with great visual angle, desirable reflectance curve should be as shown in Figure 3.Please refer to Fig. 3, it illustrates desirable reflectivity and the graph of a relation that takes measurement of an angle.A kind of improvement of traditional method is shown in Fig. 2 A, making mirror surface not only is a dip plane, also forms a plurality of projections on this dip plane, utilizes the normal angle difference of every bit on the lug surface, make light different angles reflect LCD Panel, thus the scattering angle of augmentation light.In Fig. 3, maximum reflectivity R
2Appearing at angle is near 0 degree.Compare with Fig. 2 B, because most light all concentrates on 0 degree among Fig. 2 B, so maximum reflectivity R
1Can be greater than maximum reflectivity R
2, but the reflectivity distribution curve among Fig. 3 becomes broader.Therefore, the projection cube structure on this dip plane (bumps-on slant structure) can make LCD Panel reach with high reflecting brightness and effect with great visual angle.
Please refer to Fig. 4 A～Fig. 4 E, it illustrates the manufacture method of the projection cube structure on a kind of traditional dip plane.Wherein, be coated with a photosensitive material on the base material 402, for example photoresist 404, utilize first photomask 406 with single opening to carry out design transfer.Suppose to be dissolved in after photoresist 404 is for chance light the positive photoresist (positive photoresist) of developer solution.Shown in Fig. 4 A, ultraviolet is with exposure intensity L
1And time shutter t
1Irradiation photoresist 404 forms exposure area A.Then, shown in Fig. 4 B, photomask 406 is moved right (shift), with exposure intensity L
2And time shutter t
2Irradiation photoresist 404 forms exposure area B.Then, shown in Fig. 4 C, again photomask 406 is moved right, with exposure intensity L
3And time shutter t
3Irradiation photoresist 404 forms exposure area C.Wherein, utilize the time shutter to equate but exposure intensity is L
1＞L
2＞L
3, or utilize exposure intensity to equate but the time shutter is t
1＞t
2＞t
3, make that the exposure area size that forms is A＞B＞C.
Then, shown in Fig. 4 D, develop (development).Because be dissolved in the developer solution after exposure area A＞B＞C and the development, thereby the photoresist on the base material 402 404 ' be stepped.Then, shown in Fig. 4 E, to photoresist 404 ' heating with dissolving step (meltingprocess), when photoresist 404 ' when being heated to glass transformation temperature (glass transitiontemperature), can dissolving and flow (reflow) again, tilt and photoresist 404 " (Fig. 4 E) that the surface is slick and sly thereby form.Then, the photoresist 404 that utilizes second photomask (not shown) tilting again " on form a plurality of projections 408, shown in Fig. 4 F, to finish the projection cube structure on the dip plane.At last, cover a metallic film (not shown) thereon, but promptly form the mirror surface of reflection ray.
Above-mentioned traditional fabrication process (though Fig. 4 A～4F) can reach ideally-reflecting rate curve shown in Figure 3, but still have many shortcomings, for example: (1) needs mobile again and again photomask and controls the position of photomask, expose respectively with photoresist to zones of different, must adjust exposure intensity or time again and again, not only very consuming time, manufacturing cost is improved relatively; (2) need mobile photomask and exposure could form a dip plane at least three times, if will increase the projection concentration class on the mirror surface, the concavo-convex degree that promptly increases on the mirror surface makes light scatter more good, and manufacturing process is more numerous and diverse consuming time, is unsuitable for very much producing in batches; (3) this traditional fabrication process needs two photomasks at least, first photomask made the dip plane, second photomask forms a plurality of projections on the dip plane, just can produce the projection cube structure (bumps-on-slant structure) on the dip plane, and be very inconvenient.
Summary of the invention
The object of the present invention is to provide a kind of mirror surface and manufacture method thereof that on the dip plane, has projection, not only simplify manufacturing process, and the light scatter effect is more good, and the reflection type liquid crystal display screen is reached with high reflecting brightness and purpose with great visual angle.
The object of the present invention is achieved like this, and a kind of manufacture method that has the catoptron of projection on the dip plane may further comprise the steps at least: a base material (substrate) is provided; On this base material, form a photosensitive material layer; Limit this photosensitive material layer to form a plurality of projections with different floorages; And engage this each projection, to form a dip plane (bump-on-slant structure) with projection.
The present invention also provides a kind of manufacture method that has projection cube structure on the dip plane, may further comprise the steps at least: a base material is provided; Form a plurality of projections on this base material, wherein, this each projection is made up of photosensitive material; And engage this each projection, to form the projection cube structure on the dip plane.
The present invention also provides a kind of manufacture method that has projection cube structure on the dip plane, may further comprise the steps at least: a base material (substrate) is provided; On this base material, cover a photosensitive material layer; Limit this photosensitive material layer with formation m picture group case (m is 〉=1 positive integer), and each picture group case is made up of a plurality of projections with different floorages; And engage this each projection, to form a dip plane with projection.
The present invention also provides a kind of mirror surface that has projection on the dip plane, comprising: a base material; One photosensitive material layer is formed on this base material, and wherein this photosensitive material layer comprises that the m group has the projection cube structure at a pitch angle, and each group is formed (m is 〉=1 positive integer) by a plurality of continuous projection.
The present invention also provides a kind of manufacture method of mirror surface, comprises the following steps: to provide a base material (substrate); On this base material, form a photosensitive material layer (photosensity materiallayer); Limit this photosensitive material layer has different floorages with formation a plurality of projections; Engage this each projection, to form the projection cube structure (bumps-on-slant structure) on the dip plane; And on this base material, forming a metallic reflector, this metallic reflector also covers projection cube structure on this dip plane.
In sum, a kind of manufacture method that has the mirror surface of projection on the dip plane proposed by the invention may further comprise the steps at least: a base material (substrate) is provided; On base material, cover a photosensitive material layer; Limit the photosensitive material layer with formation m picture group case (m is 〉=1 positive integer), and each picture group case is made up of a plurality of projections with different floorages; And engage this each projection, to form the projection cube structure (bump-on-slant structure) on the dip plane.Wherein, m group projection cube structure is with being formed on the base material of matrix-style rule, or random (random) is formed on the base material.And the step that limits the photoresist layer also comprises exposure and develops, and can utilize baking (baking) step to make this each dissolving of projection (melting), to engage this each projection.
The invention has the advantages that, it has the mirror structure and the manufacture method thereof of projection on the dip plane, not only the projection concentration class increases, make the light scatter effect very good, and then the reflection type liquid crystal screen that makes application is with high reflecting brightness and with great visual angle advantage, and only utilizes a photomask and single exposure to develop, and manufacturing process is more simplified, manufacturing cost and time all reduce, therefore very suitable batch process.
Description of drawings
Figure 1A is the opticpath synoptic diagram of the mirror surface of a horizontal positioned and surface smoothing;
Figure 1B is the reflectivity of Figure 1A and the graph of a relation that takes measurement of an angle;
Fig. 2 A is the opticpath synoptic diagram of the mirror surface of a surface tilt;
Fig. 2 B is the reflectivity of Fig. 2 A and the graph of a relation that takes measurement of an angle;
Fig. 2 C is the opticpath synoptic diagram of the mirror surface of another surface tilt;
Fig. 3 is desirable reflectivity and the graph of a relation that takes measurement of an angle;
Fig. 4 A～Fig. 4 F is the manufacture method of the projection cube structure on a kind of traditional dip plane;
Fig. 5 is the part top view of the photomask of the embodiment of the invention one;
Fig. 6 A～Fig. 6 C is the manufacture method of the projection cube structure on the dip plane of the embodiment of the invention one;
Fig. 7 is the three-dimensional cutaway view of the projection cube structure on the dip plane of the embodiment of the invention one;
Fig. 8 is the part top view of the photomask of the embodiment of the invention two;
Fig. 9 is the three-dimensional cutaway view with the projection cube structure on the dip plane of the photomask formation of Fig. 8.
Embodiment
Technical characterstic of the present invention is, utilize single photomask with special graph, make the photosensitive material (photosensitivity material) on the base material, for example be photoresist (photo-resist), after the single exposure development, form a plurality of projections with different floorages.Engage this each projection by dissolving step (melting process) again, to form the structure that has projection on the dip plane.Wherein, dissolving step can utilize roasting mode (baking) to carry out, and this each projection can flow (reflow) again and form the approximate slick and sly continuous projection (bump) in a plurality of surfaces, and should be by size, highly arrange by each projection that connects, for example arrogant to little, from high to hanging down connection, have projection cube structure and form on the dip plane.
Use have projection on the dip plane of the present invention structure (bump-on-slant structure) when reflection type liquid crystal display screen (reflectvie liquid crystal display), one metallic film is covered on the base material, and the covering projection cube structure, to form a metallic reflector with reflection ray.This metallic reflector has surface same concavo-convex with projection cube structure and that tilt, be able to when making the light that enters LCD Panel arrive at the metallic reflection laminar surface by a plurality of different angles reflections, and the reflection type liquid crystal screen is reached with high reflecting brightness and purpose with great visual angle.
Below promptly at the present invention, the structure and the manufacture method thereof that have projection on the dip plane illustrate, however not thereby the restriction the present invention.
Embodiment one
In this embodiment, utilize a photomask, have projection cube structure (bump-on-slant structure) on the dip plane of the present invention to form with many not wide strip patterns.
Please refer to Fig. 5, it illustrates the part top view according to the photomask of the embodiment of the invention one.Wherein, oblique line partly is light tight district.Comprise the m block graphics on the photomask 500, each block graphics is by n rectangular (501)
1, (501)
2, (501)
3..., (501)
nComfort oneself narrow arrangement and form, and the m block graphics is to be arranged in regularly on the photomask 500.Wherein, m is 〉=1 positive integer, and n is 〉=2 positive integer.N rectangular (501)
1, (501)
2, (501)
3..., (501)
nHas width W respectively
1, W
2, W
3..., W
n, and W
1＞W
2＞W
3＞... W
n, and the gap between rectangular is d in regular turn
1, d
2, d
3..., d
nThen arrange another block graphics after each block graphics, so repeat down to arrange until finishing the m group.
Then, utilize the photomask 500 of Fig. 5 to carry out design transfer.In following manufacturing process, for convenience of description, suppose n=4.
Please refer to Fig. 6 A～Fig. 6 C, it illustrates the manufacture method according to the projection cube structure on the dip plane of the embodiment of the invention one.As shown in Figure 6A, be coated with photosensitive material on the base material 602, for example photoresist 604, and photoresist 604 is the positive photoresist (positive photoresist) that can be dissolved in developer solution behind the chance light, and expose (exposure) with ultraviolet (UV), (develop) then develops.Because light tight district (501) on the photomask 500
1, (501)
2, (501)
3, (501)
4The photoresist 604 of below does not pass through the irradiation of ultraviolet, can not be dissolved in developer solution after therefore developing.And ultraviolet can pass the gap between the light tight district on the photomask 500 and photoresist is shone, make the corresponding photoresist 604 in below be dissolved in developer solution, form a plurality of strip photoresists 605,606,607,608 with different live widths corresponding at last, shown in Fig. 6 B with photomask 500 patterns.
Since behind exposure imaging, the photoresist that floorage is different (photoresist that promptly has different live widths), and they highly also can be significantly different.Photoresist floorage big more (photoresist that live width is big more), it is high highly more behind exposure imaging, otherwise then low more.For example, behind the exposure imaging, the height of original live width 14 μ m photoresists can be greater than the height of live width 7 μ m photoresists.Therefore, the photoresist 604 among Fig. 6 A shown in Fig. 6 B, forms the strip photoresist 605,606,607,608 of different sizes through behind the exposure imaging, has width W respectively
1, W
2, W
3, W
4With height h
1, h
2, h
3, h
4, and the gap between the column photoresist 605,606,607,608 is d in regular turn
1, d
2, d
3, d
4Wherein, W
1＞W
2＞W
3＞W
4, h
1＞h
2＞h
3＞h
4
Then, to photoresist 605,606,607,608 heating, melt (melt) step.Because mainly being dissolved in the solvent by resin (resin) and emulsion with photolytic activity (Photoactivity), photoresist forms, therefore the photoresist after developing is through heating schedule, can drop to minimum along with evaporation further with solvent residual in the photoresist.Solvent in the photoresist reduces, and can strengthen the tack of photoresist to substrate surface.When temperature is increased to glass transformation temperature (glaSS transition temperature), the then softening similar glass state that dissolves at high temperature that becomes of photoresist.Therefore, after the heating, can flow (reflow) and slynessization in photoresist 605,606,607,608 surfaces among Fig. 6 B again.By control gap d
1, d
2, d
3, d
4Size, the photoresist after the thawing is connected, the photoresist 605 shown in Fig. 6 C ', 606 ', 607 ', 608 '.Because among Fig. 6 B, the height of photoresist 605,606,607,608 is from high to low, therefore melt latter linked photoresist 605 ', 606 ', 607 ', 608 ' can form a tiltangle.Wherein, the heating photoresist make it to melt the temperature range of joint preferable between 200～230 ℃, what heat time heating time was preferable is not about 1 hour, but not thereby limit the present invention, during practical application, heating-up temperature and time are decided by the photo anti-corrosion agent material characteristic of selecting for use.
Please refer to Fig. 7, it illustrates the sectional axonometric drawing that has projection cube structure on the dip plane according to the embodiment of the invention one.Suppose that the pattern on the photomask 500 comprises two block graphicses (m=2).According to the formed photoresist of manufacturing process (n=4) of Fig. 6 A～Fig. 6 C, then produce the structure (bump-on-slant structure) that has projection on the dip plane as shown in Figure 7.
Then, on base material 602, plate the layer of metal film, and photoresist 605 in the coverage diagram 7 ', 606 ', 607 ', 608 ' surface (not being shown among Fig. 6 C), the surface that makes metallic film is as the photoresist concavo-convex fluctuating in surface, and forms mirror surface.When using this mirror surface when LCD Panel (LCD), the projection cube structure on its dip plane can reflect light from a plurality of angles, and makes LCD reach with great visual angle effect.
From the above, projection cube structure on dip plane representative: by a plurality of projections (formed many group (m) projection cube structures of m * n), and each group projection cube structure is formed by n projection, and n projection is descending, connect from high to low and form a pitch angle.
It should be noted that in the above-described embodiments, though formed by n projection and done explanation with each group projection cube structure, the present invention is not as limit.Also can comprise the projection of different numbers between each group respectively, for example first group has 5 projections, and second group has 6 projections, and the 3rd group has 4 projection .. or the like.As long as the width size and the gap length in light tight district on the control photomask, make photoresist behind exposure, development, the joint can produce projection cube structure on the dip plane, be technical protection scope of the present invention.
From the above, utilize photomask 500 and Fig. 6 A～described manufacturing process of Fig. 6 C, can form the projection cube structure on the dip plane of the present invention.Compare with the traditional fabrication process, manufacturing process of the present invention, only need utilize a photomask and single exposure to develop, can form the structure that has projection on the dip plane, and the reflection type liquid crystal screen of application is reached with high reflecting brightness and purpose with great visual angle.
Embodiment two
In embodiment two,, carry out manufacturing process of the present invention with a photomask with many group leaders strip pattern.Wherein, include m block graphics (m for 〉=1 positive integer) on the photomask, each block graphics is by the light tight district of many strips, comforts oneself narrow arrangement and forms.After the manufacturing process, its projection concentration class of the photoresist of embodiment two more increases than embodiment one, and promptly the concavo-convex degree on the dip plane improves, and the light scatter effect is more good.
In this embodiment, for convenience of description, suppose that each block graphics includes the light tight district of n bar strip (n is 〉=2 positive integer).
Please refer to Fig. 8, it illustrates the part top view according to the photomask of the embodiment of the invention two.Wherein, the optical mask pattern among Fig. 8 is with m=4, and n=3 is that example is done explanation, and oblique line partly is light tight district.Comprise 4 block graphicses (being m=4) on the photomask 800, each block graphics is by the light tight district (being n=3) of 3 strips, and comfort oneself narrow arrangement and form, and random being arranged on the photomask 800 of 4 block graphicses.
Then, carry out the design transfer of photomask 800, its manufacturing process is shown in Fig. 6 A～Fig. 6 C.The photomask 500 of Fig. 6 A is replaced as photomask 800, expose then (exposure), develop (develop) and dissolve (melt).In this embodiment, control the gap between the light tight district of strip in each picture group case, also need control the distance between each picture group case, d as shown in Figure 8 except need
1', d
2', d
3', d
4', each the group projection cube structure that dissolves back formation can be connected with another adjacent group projection cube structure.
Please refer to Fig. 9, it illustrates the sectional axonometric drawing with the projection cube structure on the dip plane of the photomask formation of Fig. 8.Utilize photomask 800 formed photoresists, as shown in Figure 9, can be produced as number, make the concave-convex effect on photoresist surface more remarkable than the more projection of Fig. 7.Then, covering metal film (not being shown among Fig. 6 C), the surface that makes metallic film is as ups and downs photoresist surface, with reflection ray.When as the mirror surface of LCD Panel (LCD), the projection cube structure on this dip plane can reflect light from more perspective, and makes LCD reach with great visual angle effect.
In addition, the pattern on the photomask is except random arrangement shown in Figure 8, also can make the m block graphics as proper alignment as the matrix, as the figure of long limit m ' group broadside n ' group (m=m ' * n '), and forms projection cube structure of the present invention.The m and the n that form pattern on photomask are big more, and it is just many more to make the formed projection number of back per unit area, and promptly the concentration class of projection is high more, and the effect of light scatter is more good.
In sum, the present invention utilizes the photomask and the simple manufacturing process of single special shape, through single exposure, development and thawing step, promptly form the structure that has a plurality of projections (bump) on the dip plane, make the effect of light scatter more good, and the reflection type liquid crystal screen of application is reached with high reflecting brightness and purpose with great visual angle.As for the pattern on the photomask, can m picture group case randomly be dispersed on the photomask, each group is made up of to the light tight district of narrow arrangement a plurality of comforting oneself; It also can be the arrangement as m picture group case such as the matrix.And the light tight district number of each group can be equal to the light tight district number of another group, also can be unequal, all can make the projection cube structure (bump-on-slant structure) on the generation dip plane, optical mask pattern transfer back.
Though disclosed the present invention in conjunction with above preferred embodiment; yet it is not in order to qualification the present invention, any those skilled in the art, without departing from the spirit and scope of the present invention; can be used for a variety of modifications and variations, so protection scope of the present invention should be with being as the criterion that claim was defined.
Claims (20)
1. manufacture method that has the catoptron of projection on the dip plane may further comprise the steps at least:
One base material is provided;
On this base material, form a photosensitive material layer;
Use a photomask and single exposure, limit this photosensitive material layer to form a plurality of projections;
Engage this each projection, to form a dip plane with projection; And
The metallizing reflection horizon.
2. manufacture method as claimed in claim 1 wherein utilizes baking procedure to make this each dissolving of projection, to engage this each projection.
3. manufacture method as claimed in claim 1, wherein this each projection also has different height.
4. manufacture method as claimed in claim 1, wherein this photomask has many not wide strip patterns.
5. manufacture method as claimed in claim 1, wherein this each projection has more different floorages.
6. manufacture method that has projection cube structure on the dip plane may further comprise the steps at least:
One base material is provided;
On this base material, cover a photosensitive material layer;
Use a mask and single exposure, limit this photosensitive material layer forming set of diagrams case at least, and each picture group case is made up of a plurality of projections with different floorages; And
Engage this each projection, to form the dip plane that at least one has projection.
7. manufacture method as claimed in claim 6, wherein this each projection also has different height.
8. manufacture method as claimed in claim 7, wherein, this each projection greatly to minispread, makes this each projection behind the joint form at least one group of projection cube structure according to floorage on the dip plane, and each group projection cube structure is to be formed by connecting to little projection to low, arrogant from height by a plurality of.
9. manufacture method as claimed in claim 6, wherein, this at least one picture group case is a regular pattern.
10. manufacture method as claimed in claim 6, wherein, this at least one picture group case is a random patterns.
11. manufacture method as claimed in claim 6, wherein, each picture group case is formed by at least two projections with different floorages.
12. manufacture method as claimed in claim 11, wherein, each projection of this behind the joint forms at least one group of projection cube structure on the dip plane, and each group projection cube structure is formed by connecting by at least two projections.
13. manufacture method as claimed in claim 6, wherein, the step that limits this photosensitive material layer also comprises exposure and development.
14. a mirror surface that has projection on the dip plane comprises:
One base material;
One photosensitive material layer is formed on this base material, and wherein this photosensitive material layer comprises at least one group of projection cube structure with a pitch angle, and each group is made up of a plurality of continuous projection.
15. mirror surface as claimed in claim 14, wherein, this each continuous projection is arranged by size.
16. mirror surface as claimed in claim 14, wherein, each group is made up of at least two continuous projections.
17. mirror surface as claimed in claim 14, wherein, this at least one group of projection cube structure is regular.
18. mirror surface as claimed in claim 14, wherein, this at least one group of projection cube structure is random.
19. manufacture method as claimed in claim 1, wherein, the step that limits this photosensitive material more comprises exposure and development.
20. manufacture method as claimed in claim 1, wherein, this mirror surface is applicable to a reflection type liquid crystal display screen.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 01139338 CN1201190C (en) | 2001-11-26 | 2001-11-26 | Reflector with lug on its inclined surface and its making process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 01139338 CN1201190C (en) | 2001-11-26 | 2001-11-26 | Reflector with lug on its inclined surface and its making process |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1421711A CN1421711A (en) | 2003-06-04 |
| CN1201190C true CN1201190C (en) | 2005-05-11 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 01139338 Expired - Fee Related CN1201190C (en) | 2001-11-26 | 2001-11-26 | Reflector with lug on its inclined surface and its making process |
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|---|---|---|---|---|
| KR100817101B1 (en) * | 2007-04-04 | 2008-03-26 | 한국과학기술원 | Polymer or resist pattern, and mold, metal film pattern, metal pattern using thereof, and methods of forming the sames |
| CN106094325A (en) * | 2016-08-18 | 2016-11-09 | 京东方科技集团股份有限公司 | A kind of array base palte, reflective liquid crystal display floater and display device |
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2001
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