CN118969584A - An ultra-high vacuum sputtering ion gun capable of differential pumping - Google Patents
An ultra-high vacuum sputtering ion gun capable of differential pumping Download PDFInfo
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- CN118969584A CN118969584A CN202411050315.7A CN202411050315A CN118969584A CN 118969584 A CN118969584 A CN 118969584A CN 202411050315 A CN202411050315 A CN 202411050315A CN 118969584 A CN118969584 A CN 118969584A
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- Prior art keywords
- ionizer
- gas
- ion gun
- anode grid
- grid
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- 238000005086 pumping Methods 0.000 title claims abstract description 27
- 238000004544 sputter deposition Methods 0.000 title claims abstract description 9
- 230000002093 peripheral effect Effects 0.000 claims abstract description 9
- 239000007789 gas Substances 0.000 claims description 73
- 150000002500 ions Chemical class 0.000 claims description 54
- 238000000605 extraction Methods 0.000 claims description 33
- 239000000919 ceramic Substances 0.000 claims description 14
- 238000002955 isolation Methods 0.000 claims description 10
- 239000011261 inert gas Substances 0.000 claims description 5
- 230000001590 oxidative effect Effects 0.000 claims description 5
- 238000010884 ion-beam technique Methods 0.000 description 12
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- -1 oxygen ions Chemical class 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000009423 ventilation Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/335—Cleaning
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
The invention discloses a differentially-pumpable ultrahigh vacuum sputtering ion gun, which comprises an ionizer, an air inlet capillary, an electric feed-through and a micro-leakage valve; the electric feed-through is used for providing electric energy for the ionizer; the two ends of the air inlet capillary tube are respectively connected with the ionizer and the micro-leakage valve, and the air inlet capillary tube is used for guiding the air introduced by the micro-leakage valve into the ionizer. The gas forms molecular beams in the capillary tube, has better collimation, and can obviously reduce the increase of the background gas pressure in the ionizer caused by gas scattering. The ion gun also comprises a differential pumping tee pipe which is connected with the ionizer and used for differential pumping of the peripheral area of the ionizer. Because the gas is directly led into the anode grid in the form of collimated molecular beams, differential pumping around the ionizer does not reduce the gas pressure inside the anode grid, thereby ensuring that the ion current generated after ionization is not reduced.
Description
Technical Field
The invention relates to an ultrahigh vacuum surface cleaning technology, belongs to the technical field of ultrahigh vacuum technology and scientific instruments, and particularly relates to a differentially pumped ultrahigh vacuum sputtering ion gun.
Background
Sputter ion guns are a common device used for ultra-high vacuum surface cleaning. The main working gases are inert gases such as Ar and Ne, and the ventilation pressure is generally 5X 10 -6 to 5X 10 -5 mbar. The kinetic energy of the ions is about 0 to 5keV, the maximum ion current is about 20 microamps, and generally, the higher the air inlet pressure is, the larger the ion current is. Currently, such devices are commercially available from several international vendors, such as IQE 11/35 from SPECS, IS40C1 from Prevac, IG35-DP from OCI, IG2 from RDB, and PSP3000 from PSP. The ion guns are relatively similar in structure and all have a cathode filament, an anode grid, an extraction electrode and a focusing electrode. The gas in the anode grid is bombarded by electron beam to obtain ionized ions, which are extracted by the extraction electrode and focused by the focusing electrode to form collimated ion beam. The beam spot size is typically within 10 mm. The SPECS and Prevac company products, through good extraction electrode and anode grid size parameter design, make the ion beam extracted by the extraction electrode have good collimation, so the design of the focusing electrode is removed, but such design also results in non-adjustable beam spot size. At the same time, good focusing also helps to further increase the beam current density of the ion beam.
A common problem in such ion guns is that the gas enters the ionization grid by means of external diffusion, and since the gas at different parts of the ion gun has a flow resistance, a large amount of gas is required to be introduced into the ionization grid in order to achieve the ionized gas pressure inside the ionization grid, and a large amount of residual gas is introduced into the main chamber. This affects on the one hand the vacuum recovery of the main chamber and on the other hand the lifetime of the cathode filament, which is particularly affected when oxidizing or corrosive gases such as oxygen, ammonia and the like are used. If a differential pumping is performed to reduce the gas pressure near the filament, then a simultaneous reduction in the gas pressure into the ionization region is caused. Resulting in a reduction in the beam current density of the resulting ion beam.
Disclosure of Invention
The invention aims to solve the problems in the prior art, and provides a differentially pumped ultrahigh vacuum sputtering ion gun which can ensure that the ionization region has the highest gas density, the beam current density of an ion beam is not reduced, and the service life of a cathode filament is prolonged.
The technical scheme of the invention is as follows:
An ion gun capable of differentially pumping ultra-high vacuum sputtering comprises an ionizer (1), an air inlet capillary (2), an electric feed-through (3) and a micro-leakage valve (4); wherein the electrical feedthrough (3) is used for providing electrical energy to the ionizer (1); the two ends of the air inlet capillary tube (2) are respectively connected with the ionizer (1) and the micro-leakage valve (4) and are used for guiding the gas introduced by the micro-leakage valve (4) into the ionizer (1).
The ionizer (1) is for ionizing an incoming gas to produce ions. The electric feed-through (3) realizes the electric connection between the inside and the outside of vacuum for each electrode of the sputtering ion gun, and the high voltage resistance of the electric feed-through can reach 5kV. The micro-leakage valve (4) can introduce the atmospheric pressure or gas with the pressure being several times that of the atmospheric pressure into vacuum in a micro-leakage mode, and the gas is sent into the ionizer (1) through the air inlet capillary tube (2).
Optionally or preferably, the ion gun further comprises a differential pumping tee pipe (5), and the differential pumping tee pipe (5) is connected with the ionizer (1) and used for differentially pumping the peripheral area of the ionizer (1) so as to reduce the gas pressure of the peripheral area of the ionizer (1). The differential pumping tee pipe (5) can be connected with a molecular pump through a corrugated pipe to differentially pump the peripheral area of the ionizer (1). Differential pumping (DIFFERENTIAL PUMPING) is a technique for vacuum systems whose primary purpose is to create a pressure gradient between different vacuum regions in order to effectively control and pump out gas molecules.
Optionally or preferably, the ionizer (1) comprises an anode grid (11) and a cathode filament (12), wherein the anode grid (11) is in a cylindrical net structure, and the cathode filament (12) is fixed around the position, close to the bottom, of the anode grid (11); a pressure difference of 50-200V exists between the cathode filament (12) and the anode grid (11). The anode grid (11) can be applied with high voltage up to 5kV, and the voltage of the anode grid (11) determines the kinetic energy of the ions. The cathode filament (12) can be made of tungsten wire or tantalum wire, 3A current can be applied, the cathode filament (12) generates heat by itself when passing through the current, the temperature can reach 2000 ℃, the filament generates heat to emit electrons at the temperature, and the electrons can be attracted by the anode grid (11) due to the pressure difference of 50-200V between the cathode filament (12) and the anode grid (11), and ionize the gas inside the anode grid (11) to form ions.
Optionally or preferably, the device further comprises an extraction electrode (6), wherein the extraction electrode (6) is of a sheet-shaped structure, a cylindrical protruding part (61) is downwards extended from the bottom surface of the extraction electrode (6), the extraction electrode (6) is covered and buckled above the anode grid (11), and the protruding part (61) circumferentially covers at least one part of the anode grid (11); the center of the extraction electrode (6) is provided with a first through hole (62) for ions to pass through. The extraction electrode (6) is used for extracting generated ions from the anode grid (11).
Optionally or preferably, the ionizer (1) further comprises a ring sleeve (13) and a grid base (14), wherein the grid base (14) is used for fixedly installing an anode grid (11), and a second through hole is formed in the center of the grid base (14) for allowing gas to pass through; the ring sleeve (13) is arranged below the extraction electrode (6) and sleeved on the periphery of the anode grid (11), and the ring sleeve (13) is provided with vent holes. The ring sleeve (13) can also play a role in supporting the extraction electrode (6), and the ring sleeve (13) is provided with vent holes so as to be more convenient for the gas to be extracted by the differential extraction three-way pipe (5).
Optionally or preferably, the air inlet capillary tube further comprises an insulating isolation ceramic tube (8), wherein the upper end of the insulating isolation ceramic tube (8) is connected with the grid base (14), and the lower end of the insulating isolation ceramic tube is connected with the air inlet capillary tube (2) so that gas in the air inlet capillary tube (2) can enter the second through hole along the insulating isolation ceramic tube (8). The insulating isolation ceramic tube electrically isolates the anode grid from the ground. Because the anode grid is subjected to a high voltage of 5kV during operation.
Optionally or preferably, the ion gun of any of the above, further comprising a focusing electrode (7), the focusing electrode (7) being mounted above the ionizer (1) to focus ions generated by the ionizer (1). The extracted ions can form focused or collimated ion beams through a focusing electrode (7) to be led out, and the ion beams can be used for cleaning the surfaces in an ultra-high vacuum environment.
Alternatively or preferably, the ion gun of any preceding claim, wherein the source of gas is air, an inert gas, an oxidising gas or a corrosive gas. Such as Ar, ne, N 2, an oxidizing gas such as oxygen, a corrosive gas such as ammonia, etc.
Compared with the prior art, the invention has the following beneficial effects:
1. The ion gun of the invention utilizes the air inlet capillary to directly guide the air into the anode grid of the ionizer, so that the ionization area in the anode grid has the highest air density. Because the gas forms molecular beams in the air inlet capillary tube, the molecular beams have better collimation, and the increase of the background gas pressure caused by gas scattering can be obviously reduced. The gas is directly led into the anode grid in the form of collimated molecular beams, so that the gas pressure in the anode grid is not reduced when the gas is differentially pumped around the ionizer, and the ion current is not reduced.
2. The ion gun is provided with the differential pumping three-way valve, and the differential pumping can reduce the background air pressure scattered around the ionizer, thereby being beneficial to reducing the residual air entering the main vacuum cavity (namely the anode grid mesh) of the ionizer (1), and reducing the air pressure of the cathode filament in the ionizer (1) so as to prolong the service life of the filament.
3. The design of the air inlet capillary tube combined differential pumping three-way valve ensures that the ion gun can ionize not only inert gas but also oxidizing gas and corrosive gas to obtain reactive gas ions, and has wider application range.
4. The cathode filament in the ionizer is arranged around the anode grid in a circle and is positioned at the position of the bottom of the anode grid, and a pressure difference of 50-200V exists between the cathode filament and the anode grid, so that the cathode filament is suspended at a high pressure lower than 50-200V of the anode grid, and heat emission electrons generated by the cathode filament are attracted by the anode grid due to the pressure difference after the cathode filament is electrified, so that the gas in the anode grid is ionized to form ions.
5. The bottom surface of the extraction electrode downwards extends to form a cylindrical protruding part, and the protruding part surrounds and covers at least one part of the anode grid mesh, so that on one hand, gas molecular beams supplied by the air inlet capillary tube in the anode grid mesh can be effectively prevented from being scattered, the gas density of a cathode filament area can be increased, and on the other hand, heat emission electrons can be focused to enable the heat emission electrons to be mainly ionized at the bottom of the anode grid mesh, and the utilization efficiency of the emission electrons can be increased.
The differentially pumped ultrahigh vacuum sputtering ion gun can obtain higher ion beam current than other commercial ion guns under the condition of low background vacuum. Under the conditions that the background vacuum is 5 multiplied by 10 -6 mbar and the electron emission current is 10mA and the ion kinetic energy is 2keV, the ion current which is larger than 10 mu A and comprises oxygen ions and nitrogen ions can be obtained by taking air as a gas source. In addition, the ion gun is widely applicable to gases, such as inert gases, oxidizing gases and corrosive gases.
Drawings
FIG. 1 is a schematic view showing the overall appearance of a differentially pumped ultra high vacuum sputter ion gun according to example 1;
FIG. 2 is a schematic illustration of the ionizer and inlet capillary locations in a differentially pumped tee of example 1;
FIG. 3 is a schematic diagram of an ionizer in example 1;
FIG. 4 is a schematic view of the anode grid and cathode filament structure in example 1;
FIG. 5 is a schematic diagram of the extraction electrode structure in example 1;
FIG. 6 is a schematic view of the structure of the loop in example 1;
FIG. 7 is a schematic view of the structure of the protective cover in embodiment 1;
Fig. 8 is a schematic sectional view of the ionizer, extraction electrode, and focus electrode held by a support plate in example 1.
In the figure: the ionization device comprises a 1-ionizer, a 11-anode grid, a 12-cathode filament, a 13-ring sleeve, a 131-vent hole, a 14-grid base, a 141-base support, a 2-inlet capillary, a 3-electric feed-through, a 4-micro drain valve, a 5-differential pumping three-way pipe, a 6-extraction electrode, a 61-protruding part, a 62-first through hole, a 7-focusing electrode, an 8-insulating isolation ceramic tube, an 81-base, a 9-supporting plate, a 91-supporting rod and a 10-protecting cover.
Detailed Description
For a better understanding of the present application, reference will now be made in detail to the present embodiments, examples of which are illustrated in the accompanying drawings, wherein the present application is illustrated in the accompanying drawings. All other embodiments, which can be made by those skilled in the art based on the embodiments of the present application without making any inventive effort, shall fall within the scope of the present application. The instruments and components used in the examples are commercially available unless otherwise specified.
Example 1
Referring to fig. 1 and 2, an embodiment of a differentially pumped ultrahigh vacuum sputter ion gun comprises an ionizer 1, an intake capillary 2, an electrical feedthrough 3, a micro-leakage valve 4, a differential pumping tee 5, an extraction electrode 6 and a focusing electrode 7. The micro-leakage valve 4 is connected with the air supply end. Two ends of the air inlet capillary tube 2 are respectively connected with the ionizer 1 and the micro-leakage valve 4. The electric feed-through 3 supplies electric energy to the ionizer, and the ionizer 1 ionizes the gas introduced into the gas inlet capillary 2 by means of electron beam bombardment ionization, and forms a collimated ion beam through the steps of extraction electrode 6 extraction and focusing by the focusing electrode 7.
The differential pumping tee 5 is connected with the ionizer 1, wraps the ionizer 1, and can be connected with a molecular pump through a corrugated pipe for differential pumping of the peripheral area of the ionizer 1 so as to reduce the gas pressure of the peripheral area of the ionizer 1.
The electric feed-through 3 is an ultrahigh vacuum high-voltage electric feed-through, and is respectively connected with a cathode filament 12 of the ionizer and a focusing electrode 7 through lines to supply electric energy for the cathode filament, and the high voltage resistance of the electric feed-through 3 can reach 5kV.
The micro-leakage valve 4 is an ultrahigh vacuum gas micro-leakage valve, and introduces the gas with the atmospheric pressure or several times of the atmospheric pressure into the ion gun vacuum in a micro-leakage mode.
Referring to fig. 3 in combination with fig. 4, the ionizer 1 includes an anode grid 11, a cathode filament 12, a collar 13, and a grid base 14. The anode grid 11 is in a cylindrical net structure and is fixedly arranged on the grid base 14. The cathode filament 12 is fixed around the anode grid 11 near the bottom, two ends of the cathode filament 12 are respectively connected to the electric feed-through 3 through leads, and a pressure difference of 50-200V exists between the cathode filament 12 and the anode grid 11. The grid base 14 has a two-stage truncated cone structure, a second through hole (not shown) is formed in the center for allowing gas to pass through, and the grid base 14 is connected and supported by an annular base support 141. The grid base 14 and the base support 141 are made of conductive materials, and the base support 141 is connected with the electric feed-through 3 through leads.
Referring to fig. 5, the extraction electrode 6 has a circular sheet structure, a first through hole 62 is formed in the center for allowing ions to pass through, and a cylindrical protrusion 61 extends downward from the bottom surface. The extraction electrode 6 is covered over the anode grid 11 and the raised portion 61 surrounds at least a portion of the anode grid 11. Referring to fig. 6, the ring 13 has a cylindrical structure, and a plurality of ventilation holes 131 are formed in the wall of the cylinder. The ring sleeve 13 is arranged below the extraction electrode 6 and sleeved on the periphery of the anode grid 11, the protruding part 61 of the extraction electrode 6 is arranged between the ring sleeve 13 and the anode grid 11 after the installation, and the lower end of the protruding part 61 generally extends to the upper part of the cathode filament 12 and does not cover the cathode filament 12.
Referring to fig. 8, the lower end of the grid base 14 is connected with an insulating ceramic tube 8, and the lower end of the insulating ceramic tube 8 is connected with the air intake capillary 2 through a base 81 with a through hole, so that the air in the air intake capillary 2 can enter the second through hole of the grid base 14 along the insulating ceramic tube 8, and then the anode grid 11 is ionized.
Referring back to fig. 3, to facilitate the installation and fixation of the parts, a support plate 9 and a support rod 91 are further provided. The supporting plate 9 is of a circular plate-shaped structure for three layers, and is penetrated and fixed by the supporting rod 10. The ionizer 1, the extraction electrode 6 and the focusing electrode 6 are fixed from bottom to top by three layers of support plates 9 and a plurality of support rods 91. Referring to fig. 7, in order to protect each part of the structure, a cylindrical protection cover 10 with a through hole 101 on the wall of the cylindrical support plate is sleeved outside the three-layer support plate 9.
When in operation, the micro-leakage valve 4 introduces the atmosphere or gas which is several times of the atmosphere into the vacuum in a micro-leakage way, and the gas enters the ionizer 1 through the air inlet capillary 2, specifically the gas reaches the anode grid 11 along the air inlet capillary 2, the through holes of the base 81, the insulating and isolating ceramic tube 8 and the second through holes of the grid base 14. Since the gas forms a molecular beam in the gas inlet capillary 2, which has a good collimation, the increase in background gas pressure due to gas scattering can be significantly reduced. And because the gas is directly led into the anode grid 11 in the form of collimated molecular beams, the differential pumping tee 5 does not reduce the gas pressure in the anode grid 11 during differential pumping. In addition, the periphery of the anode grid 11 is surrounded by a ring sleeve 13, the extraction electrode 6 which is supported and connected at the upper end of the ring sleeve 13 is provided with a cylindrical protruding part 61 which extends downwards, and the protruding part 61 can further restrict the scattering of the gas molecular beam introduced by the air inlet capillary 2, so that the gas density in the area of the anode grid 11 can be increased, and the background gas pressure in the area of the external cathode filament 12 can be reduced.
The electrical feedthrough 3 applies a high voltage of up to 5kV to the anode grid 11 and the electrical feedthrough 3 applies a current of 3A to the cathode filament 12 and floats at a high voltage of 50-200V below the anode grid. The cathode filament 12 generates heat by itself, the temperature can reach 2000 ℃, the cathode filament 12 generates heat to emit electrons at the temperature, and the electrons are attracted by the anode grid 11 due to the pressure difference of 50-200V between the cathode filament 12 and the anode grid 11, and the gas molecular beam introduced by the air inlet capillary 2 in the anode grid 11 is ionized to form ions. The convex portion 61 of the extraction electrode 6 can restrict the heat-emitted electrons from performing electron beam bombardment at the lower portion of the anode grid 11 to improve the utilization efficiency of the electron beam. The differential pumping tee pipe 5 performs differential pumping on the region of the ionizer 1, reduces the gas pressure of the peripheral region of the ionizer 1, can reduce the residual gas entering the anode grid 11, can also reduce the gas pressure of the cathode filament 12, and improves the service life of the filament.
Ions generated by ionization of the gas are extracted by the extraction electrode 6, and then focused or collimated ion beams are formed by the focusing electrode 7 and led out. The ion gun can obtain high-energy ion beams with the voltage of 5keV, and can be used for cleaning the surface in an ultra-high vacuum environment.
Using air as the gas source, ion currents of greater than 10 μA, including oxygen ions and nitrogen ions, can be obtained at a background vacuum of 5×10 -6 mbar, an electron emission current of 10mA, and an ion kinetic energy of 2 keV. Under low background vacuum conditions, higher ion beam currents than other commercial ion guns are obtained, and ionization of oxygen is also achieved.
Specific examples are set forth herein to illustrate the invention in detail, and the description of the above examples is only for the purpose of aiding in understanding the core concept of the invention. It should be noted that any obvious modifications, equivalents, or other improvements to those skilled in the art without departing from the inventive concept are intended to be included in the scope of the present invention.
Claims (8)
1. The differentially pumped ultrahigh vacuum sputtering ion gun is characterized by comprising an ionizer (1), an air inlet capillary tube (2), an electric feed-through (3) and a micro-leakage valve (4); wherein the electrical feedthrough (3) is used for providing electrical energy to the ionizer (1); the two ends of the air inlet capillary tube (2) are respectively connected with the ionizer (1) and the micro-leakage valve (4) and are used for guiding the gas introduced by the micro-leakage valve (4) into the ionizer (1).
2. The ion gun of claim 1, further comprising a differential pumping tee (5), the differential pumping tee (5) being connected to the ionizer (1) for differentially pumping the peripheral region of the ionizer (1) to reduce the gas pressure in the peripheral region of the ionizer (1).
3. The ion gun according to claim 1, wherein the ionizer (1) comprises an anode grid (11) and a cathode filament (12), the anode grid (11) is in a cylindrical mesh structure, and the cathode filament (12) is fixed around the anode grid (11) near the bottom; a pressure difference of 50-200V exists between the cathode filament (12) and the anode grid (11).
4. An ion gun according to claim 3, further comprising an extraction electrode (6), wherein the extraction electrode (6) is of a sheet-like structure and a cylindrical protruding part (61) extends downwards from the bottom surface, the extraction electrode (6) is covered and buckled above the anode grid (11) and the protruding part (61) surrounds and covers at least a part of the anode grid (11); the center of the extraction electrode (6) is provided with a first through hole (62) for ions to pass through.
5. The ion gun according to claim 4, wherein the ionizer (1) further comprises a ring sleeve (13) and a grid base (14), the grid base (14) is used for fixedly mounting an anode grid (11), and a second through hole is formed in the center of the grid base (14) for allowing gas to pass through; the ring sleeve (13) is arranged below the extraction electrode (6) and sleeved on the periphery of the anode grid (11), and the ring sleeve (13) is provided with vent holes.
6. The ion gun according to claim 5, further comprising an insulating isolation ceramic tube (8), wherein an upper end of the insulating isolation ceramic tube (8) is connected to the grid base (14), and a lower end of the insulating isolation ceramic tube is connected to the air inlet capillary tube (2) such that gas in the air inlet capillary tube (2) can enter the second through hole along the insulating isolation ceramic tube (8).
7. The ion gun of any of claims 1-6, further comprising a focusing electrode (7), the focusing electrode (7) being mounted above the ionizer (1) to focus ions generated by the ionizer (1).
8. The ion gun of any of claims 1-6, wherein the gas source used is air, an inert gas, an oxidizing gas, or a corrosive gas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202411050315.7A CN118969584A (en) | 2024-08-01 | 2024-08-01 | An ultra-high vacuum sputtering ion gun capable of differential pumping |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202411050315.7A CN118969584A (en) | 2024-08-01 | 2024-08-01 | An ultra-high vacuum sputtering ion gun capable of differential pumping |
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| CN118969584A true CN118969584A (en) | 2024-11-15 |
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| CN202411050315.7A Pending CN118969584A (en) | 2024-08-01 | 2024-08-01 | An ultra-high vacuum sputtering ion gun capable of differential pumping |
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| Country | Link |
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| CN (1) | CN118969584A (en) |
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- 2024-08-01 CN CN202411050315.7A patent/CN118969584A/en active Pending
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