CN118450310A - Audio chip assembly based on composite piezoelectric film and preparation method - Google Patents
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- 239000002131 composite material Substances 0.000 title claims abstract description 29
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- 238000000151 deposition Methods 0.000 claims description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- 239000011241 protective layer Substances 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
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- 238000004519 manufacturing process Methods 0.000 claims description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 238000004806 packaging method and process Methods 0.000 claims description 3
- 229910000679 solder Inorganic materials 0.000 claims description 2
- 230000000295 complement effect Effects 0.000 abstract description 3
- 238000000034 method Methods 0.000 description 20
- 230000000052 comparative effect Effects 0.000 description 8
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- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R31/00—Apparatus or processes specially adapted for the manufacture of transducers or diaphragms therefor
- H04R31/003—Apparatus or processes specially adapted for the manufacture of transducers or diaphragms therefor for diaphragms or their outer suspension
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R2231/00—Details of apparatus or processes specially adapted for the manufacture of transducers or diaphragms therefor covered by H04R31/00, not provided for in its subgroups
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Abstract
Description
技术领域Technical Field
本申请涉及半导体制造技术领域,具体涉及基于复合压电薄膜的音频芯片组件及制备方法。The present application relates to the field of semiconductor manufacturing technology, and in particular to an audio chip assembly based on a composite piezoelectric film and a preparation method thereof.
背景技术Background technique
声学换能器是一种能量转换器件,可以将声音信号通过不同的方式转换为电信号。压电声学换能器是利用压电效应将声信号转换为电信号的能量转换器件,例如压电式MEMS麦克风、扬声器就是典型的压电声学换能器。近年来,由于压电式MEMS音频芯片具有体积小、性能稳定、信噪比高、灵敏度好和响应速度快等优点,在智能穿戴设备和智能手机上得到广泛应用。An acoustic transducer is an energy conversion device that can convert sound signals into electrical signals in different ways. A piezoelectric acoustic transducer is an energy conversion device that uses the piezoelectric effect to convert sound signals into electrical signals. For example, piezoelectric MEMS microphones and speakers are typical piezoelectric acoustic transducers. In recent years, piezoelectric MEMS audio chips have been widely used in smart wearable devices and smart phones due to their small size, stable performance, high signal-to-noise ratio, good sensitivity, and fast response speed.
历经长期发展,目前在音频芯片的性能指标上,更注重于智能化、数字化以及小型化。如今MEMS音频芯片技术与航空航天、生物医学、消费电子、信息通信以及军工等领域结合得愈发紧密,对音频芯片的性能也有了更高的要求。After a long period of development, the performance indicators of audio chips are now more focused on intelligence, digitization and miniaturization. Today, MEMS audio chip technology is increasingly integrated with aerospace, biomedicine, consumer electronics, information communications and military industries, and higher requirements are placed on the performance of audio chips.
发明内容Summary of the invention
本申请提供一种基于复合压电薄膜的音频芯片组件,可以解决现有技术中音频芯片组件的性能有待进一步提升的技术问题。The present application provides an audio chip component based on a composite piezoelectric film, which can solve the technical problem in the prior art that the performance of the audio chip component needs to be further improved.
第一方面,本申请提供了一种基于复合压电薄膜的音频芯片组件,包括衬底以及依次沉积于所述衬底上的下电极、第一压电层、中电极、第二压电层和上电极,所述第一压电层具有低介电常数和低压电系数,所述第二压电层具有高介电常数和高压电系数。In a first aspect, the present application provides an audio chip component based on a composite piezoelectric film, comprising a substrate and a lower electrode, a first piezoelectric layer, a middle electrode, a second piezoelectric layer and an upper electrode sequentially deposited on the substrate, wherein the first piezoelectric layer has a low dielectric constant and a low piezoelectric coefficient, and the second piezoelectric layer has a high dielectric constant and a high piezoelectric coefficient.
结合第一方面,在一种实施方式中,所述下电极和所述上电极的材料为Mo、Al或Cu。In combination with the first aspect, in one implementation, the material of the lower electrode and the upper electrode is Mo, Al or Cu.
结合第一方面,在一种实施方式中,所述第一压电层和所述第二压电层的材料为AlN、ScAlN、PZT或ZnO。In combination with the first aspect, in one implementation, the material of the first piezoelectric layer and the second piezoelectric layer is AlN, ScAlN, PZT or ZnO.
结合第一方面,在一种实施方式中,所述第一压电层和所述第二压电层的结构为AlN\ScAlN、AlN\PZT、ScAlN\PZT、AlN\ScAlN\PZT或AlN\ScAlN\AlN。In combination with the first aspect, in one implementation, the structures of the first piezoelectric layer and the second piezoelectric layer are AlN\ScAlN, AlN\PZT, ScAlN\PZT, AlN\ScAlN\PZT or AlN\ScAlN\AlN.
第二方面,本申请提供了一种压电麦克风,包含壳体以及设于所述壳体内的如上所述的基于复合压电薄膜的音频芯片组件。In a second aspect, the present application provides a piezoelectric microphone, comprising a housing and an audio chip assembly based on the composite piezoelectric film as described above, which is disposed in the housing.
结合第二方面,在一种实施方式中,所述壳体包括外壳和基板,所述外壳和所述基板之间通过导电胶或锡膏连接。In combination with the second aspect, in one implementation, the housing includes an outer shell and a substrate, and the outer shell and the substrate are connected via conductive glue or solder paste.
结合第二方面,在一种实施方式中,所述基板为PCB板。In combination with the second aspect, in one implementation, the substrate is a PCB board.
第三方面,本申请提供了一种如上所述的压电麦克风的制备方法,包括以下步骤:In a third aspect, the present application provides a method for preparing the piezoelectric microphone as described above, comprising the following steps:
选用硅片作为衬底;Silicon wafer is selected as substrate;
在衬底上表面沉积二氧化硅保护层;Depositing a silicon dioxide protective layer on the upper surface of the substrate;
在衬底上依次沉积下电极、第一压电层、中电极、第二压电层和上电极;Depositing a lower electrode, a first piezoelectric layer, a middle electrode, a second piezoelectric layer and an upper electrode in sequence on a substrate;
通过刻蚀方式进行预刻蚀,依次刻穿上电极、第二压电层、中电极、第一压电层、下电极和保护层;Pre-etching is performed by etching to sequentially etch the upper electrode, the second piezoelectric layer, the middle electrode, the first piezoelectric layer, the lower electrode and the protective layer;
刻蚀衬底的背部形成背腔结构,得到悬臂梁结构的音频芯片组件;The back of the substrate is etched to form a back cavity structure, thereby obtaining an audio chip component with a cantilever beam structure;
将音频芯片组件和ASIC芯片进行封装,制得压电麦克风器件。The audio chip assembly and the ASIC chip are packaged to obtain a piezoelectric microphone device.
第四方面,本申请提供了一种扬声器,包含如上所述的基于复合压电薄膜的音频芯片组件。In a fourth aspect, the present application provides a speaker comprising an audio chip assembly based on the composite piezoelectric film as described above.
第五方面,本申请提供了一种如上所述的扬声器的制备方法,包括以下步骤:In a fifth aspect, the present application provides a method for preparing the loudspeaker as described above, comprising the following steps:
选用SOI(Silicon-On-Insulator绝缘衬底上的硅)晶片作为衬底;SOI (Silicon-On-Insulator) wafer is used as the substrate;
在衬底的上表面沉积下电极;depositing a lower electrode on the upper surface of the substrate;
再在下电极上依次沉积第一压电层、中电极、第二压电层和上电极;Then, a first piezoelectric layer, a middle electrode, a second piezoelectric layer and an upper electrode are sequentially deposited on the lower electrode;
通过刻蚀方式进行预刻蚀,将上电极图案化,引出下电极;Pre-etching is performed by etching to pattern the upper electrode and lead out the lower electrode;
刻蚀衬底的背部形成背腔结构,制得音频芯片组件;Etching the back of the substrate to form a back cavity structure to obtain an audio chip component;
将音频芯片组件进行封装,制得扬声器器件。The audio chip components are packaged to obtain a speaker device.
本申请实施例提供的技术方案带来的有益效果至少包括:The beneficial effects brought by the technical solution provided by the embodiment of the present application include at least:
本申请提供的基于复合压电薄膜的音频芯片组件,将具有低介电常数(低介电损耗)、低压电系数(较差压电性能)的压电层,具有高介电常数(高介电损耗)、高压电系数(良好压电性能)的压电层根据实际情况排列组合为双晶片或多晶片结构,各压电层优势互补,使压电薄膜整体具有良好的压电性能和介电性能,从而使得包含该音频芯片组件的声学换能器具有更佳的声学性能。The audio chip assembly based on the composite piezoelectric film provided in the present application arranges and combines a piezoelectric layer with a low dielectric constant (low dielectric loss) and a low piezoelectric coefficient (poor piezoelectric performance) and a piezoelectric layer with a high dielectric constant (high dielectric loss) and a high piezoelectric coefficient (good piezoelectric performance) into a dual-chip or multi-chip structure according to actual conditions. The advantages of each piezoelectric layer are complementary, so that the piezoelectric film as a whole has good piezoelectric and dielectric properties, thereby making the acoustic transducer containing the audio chip assembly have better acoustic performance.
附图说明BRIEF DESCRIPTION OF THE DRAWINGS
图1为本申请实施例提供的一种复合压电薄膜的纵向剖面图;FIG1 is a longitudinal cross-sectional view of a composite piezoelectric film provided in an embodiment of the present application;
图2为本申请实施例1提供的在沉底上依次沉积二氧化硅衬底、下电极、复合压电薄膜、上电极后的器件纵向剖面图;FIG2 is a longitudinal cross-sectional view of a device after a silicon dioxide substrate, a lower electrode, a composite piezoelectric film, and an upper electrode are sequentially deposited on a bottom provided in Example 1 of the present application;
图3为本申请实施例1提供的刻蚀振膜后的器件纵向剖面图;FIG3 is a longitudinal cross-sectional view of the device after the diaphragm is etched provided in Example 1 of the present application;
图4为本申请实施例1提供的背腔刻蚀后的器件纵向剖面图;FIG4 is a longitudinal cross-sectional view of a device after back cavity etching provided in Example 1 of the present application;
图5为对比例1制得的压电麦克风振膜的纵向剖面图;FIG5 is a longitudinal cross-sectional view of the piezoelectric microphone diaphragm prepared in Comparative Example 1;
图6为本申请实施例封装完成后的压电麦克风的纵向剖面图;FIG6 is a longitudinal cross-sectional view of the piezoelectric microphone after packaging according to an embodiment of the present application;
图7为本申请实施例1以及对比例1制得的麦克风输出电压对比图;FIG7 is a comparison diagram of microphone output voltages obtained in Example 1 of the present application and Comparative Example 1;
图8为本申请实施例2依次沉积下电极、复合压电层、上电极并刻蚀后的器件纵向剖面图;FIG8 is a longitudinal cross-sectional view of the device after sequentially depositing a lower electrode, a composite piezoelectric layer, and an upper electrode and etching according to Example 2 of the present application;
图9为本申请实施例2背腔刻蚀后的器件纵向剖面图;FIG9 is a longitudinal cross-sectional view of the device after back cavity etching in Example 2 of the present application;
图10为对比例2制得的器件纵向剖面图;FIG10 is a longitudinal cross-sectional view of the device prepared in Comparative Example 2;
图11为本申请实施例2以及对比例2制得的扬声器在10mm处的输出声压级对比图。FIG. 11 is a comparison chart of the output sound pressure levels of the loudspeakers prepared in Example 2 of the present application and Comparative Example 2 at a distance of 10 mm.
图中,1、衬底;2、保护层;3、下电极;4、第一压电层;5、第二压电层;6、背腔;11、声孔;15、SOI晶片;21、外壳;31、导线;41、MEMS芯片;51、基板;61、ASIC芯片。In the figure, 1, substrate; 2, protective layer; 3, lower electrode; 4, first piezoelectric layer; 5, second piezoelectric layer; 6, back cavity; 11, acoustic hole; 15, SOI wafer; 21, housing; 31, wire; 41, MEMS chip; 51, substrate; 61, ASIC chip.
具体实施方式Detailed ways
为了使本技术领域的人员更好地理解本申请方案,下面将结合本申请实施例中的附图,对本申请实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本申请一部分实施例,而不是全部的实施例。基于本申请中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本申请保护的范围。In order to enable those skilled in the art to better understand the solution of the present application, the technical solution in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.
本申请的说明书和权利要求书及上述附图中的术语“包括”和“具有”以及它们任何变形,意图在于覆盖不排他的包含。例如包含了一系列步骤或单元的过程、方法、系统、产品或设备没有限定于已列出的步骤或单元,而是可选地还包括没有列出的步骤或单元,或可选地还包括对于这些过程、方法、产品或设备固有的其他步骤或单元。术语“第一”、“第二”和“第三”等描述,是用于区分不同的对象等,其不代表先后顺序,也不限定“第一”、“第二”和“第三”是不同的类型。The terms "including" and "having" and any variations thereof in the specification and claims of this application and the above-mentioned drawings are intended to cover non-exclusive inclusions. For example, a process, method, system, product or device that includes a series of steps or units is not limited to the listed steps or units, but optionally includes steps or units that are not listed, or optionally includes other steps or units inherent to these processes, methods, products or devices. The terms "first", "second" and "third" are used to distinguish different objects, etc., and do not represent a sequence, nor do they limit the "first", "second" and "third" to different types.
在本申请实施例的描述中,“示例性的”、“例如”或者“举例来说”等用于表示作例子、例证或说明。本申请实施例中被描述为“示例性的”、“例如”或者“举例来说”的任何实施例或设计方案不应被解释为比其它实施例或设计方案更优选或更具优势。确切而言,使用“示例性的”、“例如”或者“举例来说”等词旨在以具体方式呈现相关概念。In the description of the embodiments of the present application, "exemplary", "for example" or "for example" are used to indicate examples, illustrations or descriptions. Any embodiment or design described as "exemplary", "for example" or "for example" in the embodiments of the present application should not be interpreted as being more preferred or more advantageous than other embodiments or designs. Specifically, the use of words such as "exemplary", "for example" or "for example" is intended to present related concepts in a specific way.
在本申请实施例的描述中,除非另有说明,“/”表示或的意思,例如,A/B可以表示A或B;文本中的“和/或”仅仅是一种描述关联对象的关联关系,表示可以存在三种关系,例如,A和/或B,可以表示:单独存在A,同时存在A和B,单独存在B这三种情况,另外,在本申请实施例的描述中,“多个”是指两个或多于两个。In the description of the embodiments of the present application, unless otherwise specified, “/” means or. For example, A/B can mean A or B. The “and/or” in the text is merely a description of the association relationship of associated objects, indicating that three relationships may exist. For example, A and/or B can mean: A exists alone, A and B exist at the same time, and B exists alone. In addition, in the description of the embodiments of the present application, “multiple” refers to two or more than two.
在本申请实施例描述的一些流程中,包含了按照特定顺序出现的多个操作或步骤,但是应该理解,这些操作或步骤可以不按照其在本申请实施例中出现的顺序来执行或并行执行,操作的序号仅用于区分开各个不同的操作,序号本身不代表任何的执行顺序。另外,这些流程可以包括更多或更少的操作,并且这些操作或步骤可以按顺序执行或并行执行,并且这些操作或步骤可以进行组合。In some processes described in the embodiments of the present application, multiple operations or steps that appear in a specific order are included, but it should be understood that these operations or steps may not be executed in the order in which they appear in the embodiments of the present application or in parallel, and the sequence number of the operation is only used to distinguish the different operations, and the sequence number itself does not represent any execution order. In addition, these processes may include more or fewer operations, and these operations or steps may be executed in sequence or in parallel, and these operations or steps may be combined.
为使本申请的目的、技术方案和优点更加清楚,下面将结合附图对本申请实施方式作进一步地详细描述。In order to make the objectives, technical solutions and advantages of the present application more clear, the implementation methods of the present application will be further described in detail below with reference to the accompanying drawings.
本申请提供了一种基于复合压电薄膜的音频芯片组件,包括衬底1以及逐层依次沉积于所述衬底1上的下电极3、第一压电层4、中电极、第二压电层5和上电极,所述第一压电层4具有低介电常数和低压电系数,所述第二压电层5具有高介电常数和高压电系数。The present application provides an audio chip component based on a composite piezoelectric film, comprising a substrate 1 and a lower electrode 3, a first piezoelectric layer 4, a middle electrode, a second piezoelectric layer 5 and an upper electrode deposited layer by layer on the substrate 1, wherein the first piezoelectric layer 4 has a low dielectric constant and a low piezoelectric coefficient, and the second piezoelectric layer 5 has a high dielectric constant and a high piezoelectric coefficient.
本申请提供的基于复合压电薄膜的音频芯片组件,将具有低介电常数(低介电损耗)、低压电系数(较差的压电性能)的压电层,具有高介电常数(高介电损耗)、高压电系数(良好的压电性能)的压电层根据实际情况排列组合为双晶片或多晶片结构,各压电层优势互补,使压电薄膜整体具有良好的压电性能和介电性能,从而使得包含该音频芯片组件的声学换能器具有更佳的声学性能。The audio chip assembly based on the composite piezoelectric film provided in the present application arranges and combines a piezoelectric layer with a low dielectric constant (low dielectric loss) and a low piezoelectric coefficient (poor piezoelectric performance) and a piezoelectric layer with a high dielectric constant (high dielectric loss) and a high piezoelectric coefficient (good piezoelectric performance) into a dual-chip or multi-chip structure according to actual conditions. The advantages of each piezoelectric layer are complementary, so that the piezoelectric film as a whole has good piezoelectric and dielectric properties, thereby making the acoustic transducer containing the audio chip assembly have better acoustic performance.
在一实施例中,所述下电极3和所述上电极的电极材料为Mo、Al、Cu或其他导电材料中的任一种。In one embodiment, the electrode material of the lower electrode 3 and the upper electrode is any one of Mo, Al, Cu or other conductive materials.
在一实施例中,所述第一压电层4和所述第二压电层5的材料为AlN、ScAlN、PZT、ZnO或其他压电材料中的任一种。In one embodiment, the material of the first piezoelectric layer 4 and the second piezoelectric layer 5 is any one of AlN, ScAlN, PZT, ZnO or other piezoelectric materials.
在一实施例中,所述第一压电层4和所述第二压电层5的复合结构为AlN\ScAlN、AlN\PZT、ScAlN\PZT、AlN\ScAlN\PZT、AlN\ScAlN\AlN或由其他具有高压电系数和高介电常数的压电层、具有低介电系数以及低介电常数的压电层排列组合的多层复合结构中的任一种。In one embodiment, the composite structure of the first piezoelectric layer 4 and the second piezoelectric layer 5 is any one of AlN\ScAlN, AlN\PZT, ScAlN\PZT, AlN\ScAlN\PZT, AlN\ScAlN\AlN or a multilayer composite structure composed of other piezoelectric layers with high piezoelectric coefficient and high dielectric constant, and piezoelectric layers with low dielectric coefficient and low dielectric constant.
基于同一发明构思,本申请还提供了一种包含如上所述的基于复合压电薄膜的音频芯片组件的声学换能器。Based on the same inventive concept, the present application also provides an acoustic transducer comprising an audio chip assembly based on the composite piezoelectric film as described above.
在一较具体实施例中,所述声学换能器为压电麦克风,所述音频芯片组件为压电麦克风的MEMS芯片41的悬臂梁。较具体地,所述压电麦克风包括壳体以及MEMS芯片41,所述壳体具有容置腔,所述外壳21上开设有与所述容置腔相通的声孔11,所述MEMS芯片41容置于所述容置腔内。In a more specific embodiment, the acoustic transducer is a piezoelectric microphone, and the audio chip component is a cantilever beam of a MEMS chip 41 of the piezoelectric microphone. More specifically, the piezoelectric microphone includes a housing and a MEMS chip 41, the housing has a receiving cavity, the housing 21 is provided with a sound hole 11 communicating with the receiving cavity, and the MEMS chip 41 is received in the receiving cavity.
在一较具体实施例中,所述壳体包括外壳21和基板51,所述外壳21和所述基板51围合成一容置腔。In a more specific embodiment, the housing includes an outer shell 21 and a substrate 51 , and the outer shell 21 and the substrate 51 enclose a containing cavity.
在一较具体实施例中,所述MEMS芯片41包括固定柱和悬臂梁,所述固定柱固定支撑于所述基板51上,所述固定柱用于支撑所述悬臂梁于所述基板51上,所述悬臂梁数量为多个,所述固定柱的数量和所述悬臂梁的数量对应,相邻两悬臂梁之间具有间隙。所述固定基座和所述悬臂梁为连续曲面图形或多边形,较具体地,多个悬臂梁成对设置,每对中的两个悬臂梁相向设置。较具体地,所述悬臂梁与固定柱接触固定的一端为固定端,远离固定柱的一端形成自由端。In a more specific embodiment, the MEMS chip 41 includes a fixed column and a cantilever beam, the fixed column is fixedly supported on the substrate 51, the fixed column is used to support the cantilever beam on the substrate 51, the number of the cantilever beams is multiple, the number of the fixed columns corresponds to the number of the cantilever beams, and there is a gap between two adjacent cantilever beams. The fixed base and the cantilever beam are continuous curved surface figures or polygons. More specifically, multiple cantilever beams are arranged in pairs, and the two cantilever beams in each pair are arranged facing each other. More specifically, the end of the cantilever beam that contacts and fixes with the fixed column is a fixed end, and the end away from the fixed column forms a free end.
在一实施例中,所述悬臂梁为双晶结构,自下而上的多层结构为:衬底1、下电极3、第一压电层4、中电极、第二压电层5和上电极。所述第一压电层4具有低介电常数和低压电系数,所述第二压电层5具有高介常数和高压电系数。In one embodiment, the cantilever beam is a bimorph structure, and the multilayer structure from bottom to top is: substrate 1, lower electrode 3, first piezoelectric layer 4, middle electrode, second piezoelectric layer 5 and upper electrode. The first piezoelectric layer 4 has a low dielectric constant and a low piezoelectric coefficient, and the second piezoelectric layer 5 has a high dielectric constant and a high piezoelectric coefficient.
在一实施例中,所述固定柱为硅或蓝宝石等。In one embodiment, the fixing column is made of silicon or sapphire.
在一实施例中,所述基板51为PCB板。In one embodiment, the substrate 51 is a PCB board.
在一实施例中,所述压电麦克风还包括ASIC芯片61,所述ASIC芯片61与所述MEMS芯片41通过导线31电连接。In one embodiment, the piezoelectric microphone further includes an ASIC chip 61 , and the ASIC chip 61 is electrically connected to the MEMS chip 41 via a wire 31 .
本申请提供的复合压电薄膜的纵向剖面图如图1所示,图中省略了第一压电层4和第二压电层5之间的中电极。The longitudinal cross-sectional view of the composite piezoelectric film provided in the present application is shown in FIG1 , in which the middle electrode between the first piezoelectric layer 4 and the second piezoelectric layer 5 is omitted.
基于同一发明构思,本申请还提供了一种制备如上所述的压电麦克风的制备方法,包括如下步骤:Based on the same inventive concept, the present application also provides a method for preparing the piezoelectric microphone as described above, comprising the following steps:
步骤S1、选用硅片作为悬臂梁的衬底1;Step S1, selecting a silicon wafer as the substrate 1 of the cantilever beam;
步骤S2、在所述硅片的上表面沉积二氧化硅保护层2,并使用化学机械抛光工艺将表面研磨平整;Step S2, depositing a silicon dioxide protective layer 2 on the upper surface of the silicon wafer, and grinding the surface flat using a chemical mechanical polishing process;
步骤S3、在衬底1上表面依次沉积下电极3、第一压电层4、中电极、第二压电层5和上电极,并使用化学机械抛光工艺将表面研磨平整,如图2所示;Step S3, depositing the lower electrode 3, the first piezoelectric layer 4, the middle electrode, the second piezoelectric layer 5 and the upper electrode on the upper surface of the substrate 1 in sequence, and grinding the surface flat using a chemical mechanical polishing process, as shown in FIG2 ;
步骤S4、通过刻蚀的方式进行预刻蚀,依次刻穿所述上电极层、压电层、所述中电极、压电层、所述下电极3层和保护层2,如图3所示;Step S4, pre-etching by etching, sequentially etching through the upper electrode layer, the piezoelectric layer, the middle electrode, the piezoelectric layer, the lower electrode 3 layers and the protective layer 2, as shown in FIG3 ;
步骤S5、刻蚀衬底1的背部形成背腔6结构,得到悬臂梁振膜,如图4所示;将悬臂梁的固定端固定于固定柱上,将固定柱固定于基板51上,形成MEMS芯片41;Step S5, etching the back of the substrate 1 to form a back cavity 6 structure, and obtaining a cantilever beam diaphragm, as shown in FIG4 ; fixing the fixed end of the cantilever beam on the fixed column, and fixing the fixed column on the substrate 51 to form a MEMS chip 41;
步骤S6、将MEMS芯片41和ASIC芯片61进行电连接后封装,制得压电麦克风器件,如图6所示。Step S6: The MEMS chip 41 and the ASIC chip 61 are electrically connected and then packaged to obtain a piezoelectric microphone device, as shown in FIG. 6 .
在一较具体实施例中,所述声学换能器为扬声器,上述基于复合压电薄膜的音频芯片组件实现为扬声器的振膜,所述振膜由下至上包括衬底1、下电极3、第一压电层4、中电极、第二压电层5和上电极;较具体地,所述衬底1为SOI衬底1;较具体地,所述第一压电层4具有低介电常数和低压电系数,所述第二压电层5具有高介电常数和高压电系数。In a more specific embodiment, the acoustic transducer is a speaker, and the above-mentioned audio chip component based on composite piezoelectric film is implemented as a diaphragm of the speaker, and the diaphragm includes a substrate 1, a lower electrode 3, a first piezoelectric layer 4, a middle electrode, a second piezoelectric layer 5 and an upper electrode from bottom to top; more specifically, the substrate 1 is an SOI substrate 1; more specifically, the first piezoelectric layer 4 has a low dielectric constant and a low piezoelectric coefficient, and the second piezoelectric layer 5 has a high dielectric constant and a high piezoelectric coefficient.
基于同一发明构思,本申请还提供了一种制备如上所述的扬声器的制备方法,包括如下步骤:Based on the same inventive concept, the present application also provides a method for preparing the loudspeaker as described above, comprising the following steps:
步骤S1、选用SOI晶片15作为衬底1;Step S1, selecting an SOI wafer 15 as a substrate 1;
步骤S2、在衬底1上表面沉积下电极3,并使用化学机械抛光工艺将表面研磨平整;Step S2, depositing the lower electrode 3 on the upper surface of the substrate 1, and grinding the surface flat using a chemical mechanical polishing process;
步骤S3、在下电极3上表面依次沉积第一压电层4、中电极、第二压电层5和上电极,并使用化学机械抛光工艺将表面研磨平整,如图8所示;Step S3, depositing the first piezoelectric layer 4, the middle electrode, the second piezoelectric layer 5 and the upper electrode on the upper surface of the lower electrode 3 in sequence, and grinding the surface flat using a chemical mechanical polishing process, as shown in FIG8 ;
步骤S4、通过刻蚀的方式进行预刻蚀,将上电极图案化,引出下电极3;Step S4, pre-etching by etching to pattern the upper electrode and lead out the lower electrode 3;
步骤S5、刻蚀衬底1的背部形成背腔6结构,制得振膜,如图9所示;Step S5, etching the back of the substrate 1 to form a back cavity 6 structure, and manufacturing a diaphragm, as shown in FIG9 ;
步骤S6、封装振膜,制得扬声器器件。Step S6: encapsulate the diaphragm to obtain a speaker device.
实施例1Example 1
为基于上述方法制备的压电麦克风器件;A piezoelectric microphone device prepared based on the above method;
实施例2Example 2
为基于上述方法制备的扬声器器件;A loudspeaker device prepared based on the above method;
对比例1Comparative Example 1
与实施例1制得的压电麦克风器件结构类似,区别之处在于,振膜为一层压电层而非两层压电层的复合压电薄膜设计,器件纵向剖面图如图5所示。The structure of the piezoelectric microphone device is similar to that of Example 1, except that the diaphragm is a composite piezoelectric film design with one piezoelectric layer instead of two piezoelectric layers. The longitudinal cross-section of the device is shown in FIG5 .
图7示出了实施例1与对比例1的输出电压测量对比,可以看出实施例1具有更大的输出电压。这是因为实施例1的压电层为具有低介电常数(低介电损耗)、低压电系数(较差的压电性能)的压电层和具有高介电常数(高介电损耗)、高压电系数(良好的压电性能)的压电层组合为两层的复合压电薄膜,整体具有良好的压电和介电性能,能够提高压电麦克风的输出电压。FIG7 shows a comparison of the output voltage measurements of Example 1 and Comparative Example 1, and it can be seen that Example 1 has a larger output voltage. This is because the piezoelectric layer of Example 1 is a composite piezoelectric film composed of a piezoelectric layer with a low dielectric constant (low dielectric loss) and a low piezoelectric coefficient (poor piezoelectric performance) and a piezoelectric layer with a high dielectric constant (high dielectric loss) and a high piezoelectric coefficient (good piezoelectric performance). The film has good piezoelectric and dielectric properties as a whole, and can improve the output voltage of the piezoelectric microphone.
对比例2Comparative Example 2
与实施例2制得的扬声器器件的结构类似,区别之处在于,振膜为一层压电层而非两层压电层的复合压电薄膜设计,器件纵向剖面图如图10所示。The structure of the loudspeaker device is similar to that of Example 2, except that the diaphragm is a composite piezoelectric film design with one piezoelectric layer instead of two piezoelectric layers. The longitudinal cross-section of the device is shown in FIG10 .
图11示出了实施例2与对比例2制得的扬声器输出声压级测量对比,可以看出实施例2制得的扬声器器件具有更大的输出声压级,这是因为实施例2的压电层为具有低介电常数(低介电损耗)、低压电系数(较差的压电性能)的压电层和具有高介电常数(高介电损耗)、高压电系数(良好的压电性能)的压电层组合为两层的复合压电薄膜,整体具有良好的压电和介电性能,能够提高扬声器的输出声压级。Figure 11 shows a comparison of the output sound pressure level measurements of the loudspeakers prepared in Example 2 and Comparative Example 2. It can be seen that the loudspeaker device prepared in Example 2 has a larger output sound pressure level. This is because the piezoelectric layer of Example 2 is a composite piezoelectric film composed of a piezoelectric layer with a low dielectric constant (low dielectric loss) and a low piezoelectric coefficient (poor piezoelectric performance) and a piezoelectric layer with a high dielectric constant (high dielectric loss) and a high piezoelectric coefficient (good piezoelectric performance). The film has good piezoelectric and dielectric properties as a whole and can improve the output sound pressure level of the speaker.
在本申请的描述中,需要说明的是,术语“上”、“下”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本申请和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本申请的限制。除非另有明确的规定和限定,术语“安装”、“相连”、“连接”应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或一体地连接;可以是机械连接,也可以是电连接;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通。对于本领域的普通技术人员而言,根据具体情况理解上述术语在本申请中的具体含义。In the description of the present application, it should be noted that the terms "upper", "lower", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present application. Unless otherwise expressly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be an indirect connection through an intermediate medium, or it can be a connection between the two elements. For those of ordinary skill in the art, the specific meanings of the above terms in the present application will be understood according to the specific circumstances.
需要说明的是,在本申请中,诸如“第一”和“第二”等之类的关系术语仅仅用来将一个实体或者操作与另一个实体或操作区分开来,而不一定要求或者暗示这些实体或操作之间存在任何这种实际的关系或者顺序。而且,术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含,从而使得包括一系列要素的过程、方法、物品或者设备不仅包括那些要素,而且还包括没有明确列出的其他要素,或者是还包括为这种过程、方法、物品或者设备所固有的要素。在没有更多限制的情况下,由语句“包括一个……”限定的要素,并不排除在包括所述要素的过程、方法、物品或者设备中还存在另外的相同要素。It should be noted that, in this application, relational terms such as "first" and "second" are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "comprise a ..." do not exclude the presence of other identical elements in the process, method, article or device including the elements.
以上所述仅是本申请的具体实施方式,使本领域技术人员能够理解或实现本申请。对这些实施例的多种修改对本领域的技术人员来说将是显而易见的,本文中所定义的一般原理可以在不脱离本申请的精神或范围的情况下,在其它实施例中实现。因此,本申请将不会被限制于本文所示的这些实施例,而是要符合与本文所申请的原理和新颖特点相一致的最宽的范围。The above description is only a specific implementation of the present application, so that those skilled in the art can understand or implement the present application. Various modifications to these embodiments will be apparent to those skilled in the art, and the general principles defined herein can be implemented in other embodiments without departing from the spirit or scope of the present application. Therefore, the present application will not be limited to the embodiments shown herein, but will conform to the widest scope consistent with the principles and novel features applied for herein.
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