CN118310423A - Focusing position compensation method of displacement sensor and flat piece position measurement system - Google Patents
Focusing position compensation method of displacement sensor and flat piece position measurement systemInfo
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Abstract
The invention provides a focusing position compensation method of a displacement sensor and a flat piece position measurement system, and relates to the field of semiconductor processing, wherein the method comprises the following steps: acquiring reflected light acquired by a spectral confocal displacement sensor in a liquid-free environment, wherein a sealing element is sleeved on the spectral confocal displacement sensor, so that the outermost lens of the spectral confocal displacement sensor is packaged in the sealing element to isolate liquid; corresponding parameters of spectrum peak centers of spectrum signals according to the reflected lightCalculating a focusing position to be corrected according to a parameter-displacement model corresponding to the spectrum peak center of the spectrum confocal displacement sensor; Calculating focus position deviation caused by biplane uniform light transmission medium; Using focus position deviationFor focus positionCompensating to obtain corrected actual focusing position. And the data acquired by the displacement sensor probe and the output result are compensated, so that the surface position of the flat piece measured by the new structure is finally realized, and the measurement accuracy is improved.
Description
Technical Field
The invention relates to the field of semiconductor processing, in particular to a focusing position compensation method of a displacement sensor and a flat piece position measurement system.
Background
Wafer back grinding (or wafer thinning) is one of the key steps of the semiconductor manufacturing process, and aims to thin the wafer thickness and remove residual materials so as to improve the heat conduction performance and improve the heat dissipation; the packaging cost is reduced, the processing precision is improved, and the miniaturization requirement is favorably met, which is very important for producing ultrathin wafers with multi-layer and high-density packaging in compact electronic equipment. In the process of thinning the wafer, a feedback mechanism can be provided by real-time thickness measurement, so that parameters in the processing process can be changed conveniently, and the aims of thinning the thickness and the like can be better realized.
The spectral confocal displacement sensor is widely used for material characterization such as surface morphology analysis, film thickness measurement, surface roughness analysis, micro-nano scale structure measurement and the like, such as crystal structure analysis, film thickness measurement and the like of semiconductor materials. When the spectral confocal displacement sensor is used for measuring the position, the corresponding relation between the corresponding parameters of different spectral peak centers and the focusing positions of the parameters is required to be established in advance in a limited range, so that the coding of the corresponding parameters of the spectral peak centers and the focusing positions of the parameters is realized, the reflection spectrum of the focused light on the wafer surface is read in real time on the basis, the corresponding parameters of the spectral peak centers are determined, and the position of the wafer surface at the moment is determined according to the function of the corresponding parameters of the spectral peak centers and the focusing positions of the parameters.
Because in the actual thinning working condition, the online measurement environment is severe, the grinding wheel and the wafer surface are required to be washed by liquid in the thinning process, heat dissipation is carried out, surface debris is removed, the traditional spectral confocal displacement sensor has measurement deviation under the condition, meanwhile, liquid splashing can be caused in the washing process, a stable measurement environment cannot be formed in the process, and the measurement accuracy is affected.
Disclosure of Invention
In view of the above, the present invention provides a focal position compensation method of a spectral confocal displacement sensor, including:
The method comprises the steps of obtaining reflected light collected by a spectral confocal displacement sensor, wherein a sealing element is sleeved on the spectral confocal displacement sensor, so that the outermost lens of the spectral confocal displacement sensor is packaged in the sealing element to isolate liquid, and the sealing element is arranged as a biplane uniform light-transmitting medium on a light path of the spectral confocal displacement sensor;
corresponding parameters of spectrum peak centers of spectrum signals according to the reflected light Calculating a focusing position to be corrected according to a parameter-displacement model corresponding to the spectrum peak center of the spectrum confocal displacement sensor；
Calculating focus position deviation caused by the biplane uniform light transmission medium；
Using the focus position deviationFor the focus positionCompensating to obtain corrected actual focusing position。
Optionally, the interval between the biplane uniform light transmission medium and the outermost layer lens is 0;
calculating focus position deviation caused by the biplane uniform light transmission medium Comprising:
corresponding parameters of spectrum peak centers of spectrum signals according to the reflected light Calculating the refractive index of the biplane uniform light transmission medium to the reflected light；
According to the refractive indexRefractive index of environmentThickness of the biplane uniform light transmission mediumCalculating focus position deviation。
Alternatively, the focus position deviation is calculated as follows：
。
Optionally, the distance between the biplane uniform light transmission medium and the outermost layer lens is greater than 0;
calculating focus position deviation caused by the biplane uniform light transmission medium Comprising:
corresponding parameters of spectrum peak centers of spectrum signals according to the reflected light Calculating the refractive index of the biplane uniform light transmission medium to the reflected light；
According to the refractive indexRefractive index of environmentThickness of the biplane uniform light transmission mediumAperture of the outermost lensSaid focal positionThe distance between the biplane uniform light transmission medium and the outermost layer lensIncidence angle of the reflected lightCalculating focus position deviation。
Alternatively, the focus position deviation is calculated as follows：
，
Wherein the method comprises the steps of。
Alternatively, the refractive index is calculated as follows：
，
Wherein the method comprises the steps of、、、、、Is the refractive index coefficient.
Optionally, the spectral peak center corresponding parameter is a wavelength value or a pixel value in the spectral signal corresponding to a maximum value of the light intensity.
The invention also provides a method for measuring the surface position of the flat piece in the liquid environment, which comprises the following steps:
Acquiring reflected light of the surface of a flat piece acquired by a spectral confocal displacement sensor in a liquid environment, wherein a sealing piece is sleeved on the spectral confocal displacement sensor, so that the outermost lens of the spectral confocal displacement sensor is packaged in the sealing piece to isolate liquid, and the sealing piece is arranged as a biplane uniform light-transmitting medium on a light path of the spectral confocal displacement sensor;
obtaining the surface position of the flat piece by using the focusing position compensation method of any one of the spectrum confocal displacement sensors ；
By refractive index of liquidTo the surface position of flat pieceAnd (5) performing correction.
The invention also provides a focus position compensation device of the spectral confocal displacement sensor, comprising: a processor and a memory coupled to the processor; the memory stores instructions executable by the processor to cause the processor to perform the focal position compensation method of the spectral confocal displacement sensor.
The invention also provides a flat piece surface position measurement system, which comprises:
The spectral confocal displacement sensor is used for collecting reflected light on the surface of the flat piece in a liquid environment, and a sealing piece is sleeved on the spectral confocal displacement sensor, so that the outermost lens of the spectral confocal displacement sensor is packaged in the sealing piece to isolate liquid, and the sealing piece is arranged as a biplane uniform light-transmitting medium on a light path of the spectral confocal displacement sensor;
and the measuring equipment is used for executing the measuring method of the surface position of the flat piece in the liquid environment.
Optionally, the sealing element is fixed by a clamping structure, and the clamping structure is used for adjusting the interval between the biplane uniform transparent medium and the outermost layer lens.
According to the flat piece surface position measurement system provided by the invention, the structure of the optical confocal displacement sensor is optimized, and the sealing piece is configured to enable the flat piece surface position measurement system to measure in a liquid environment; meanwhile, the data collected by the in-situ sensor probe and the output result are compensated by using compensation equipment according to focus position deviation caused by spectrum calculation biplane uniform light transmission medium in the face of measurement deviation generated by the sensor after structure optimization, and finally, the surface position of a flat piece measured by a new structure is realized, so that the accuracy of measurement is improved, and the system can be suitable for measuring the surface position of a material in any liquid environment.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings that are needed in the description of the embodiments or the prior art will be briefly described, and it is obvious that the drawings in the description below are some embodiments of the present invention, and other drawings can be obtained according to the drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic diagram of a spectral confocal displacement sensor according to an embodiment of the invention;
FIG. 2 is a flow chart of a focus position compensation method of a spectral confocal displacement sensor according to an embodiment of the invention;
FIG. 3 is a schematic diagram of an optical structure of a spectral confocal displacement sensor according to an embodiment of the invention;
FIG. 4 is a schematic diagram of laboratory calibration in an embodiment of the present invention.
Detailed Description
The following description of the embodiments of the present invention will be made apparent and fully in view of the accompanying drawings, in which some, but not all embodiments of the invention are shown. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
In addition, the technical features of the different embodiments of the present invention described below may be combined with each other as long as they do not collide with each other.
The embodiment of the invention provides a flat piece surface position measurement system which comprises a spectral confocal displacement sensor and measurement equipment. The spectral confocal displacement sensor is used for collecting reflected light of the surface of a flat piece, which can be a wafer in particular, in a liquid environment. As shown in fig. 1, the spectral confocal displacement sensor of the present embodiment is sleeved with a sealing member 8, so that the outermost lens 2 of the spectral confocal displacement sensor is encapsulated in the sealing member 8 to isolate the liquid. The sealing member 8 is arranged as a biplane uniform transparent medium on the optical path of the spectral confocal displacement sensor, the biplane uniform transparent medium can be optical glass, and the material used for the biplane uniform transparent medium is preferably the same as the material of the lens 2.
The medium between the lens 2 and the biplane uniform transparent medium is air, and particularly when the lens is applied in a liquid environment, light emitted by the light source exits from the lens 2, and enters the liquid environment 9 through the air and the biplane uniform transparent medium to be gathered on the surface of the flat piece 5. The two surfaces of the biplane uniform light-transmitting medium are aspheric surfaces, spherical differences of the two surfaces are mutually counteracted, and the structure avoids the influence of axial spherical difference change caused by the liquid environment 9 on measurement.
The clamping structure 7 is used to secure the seal 8, and in a preferred embodiment the clamping structure 7 is configured to adjust the spacing between the biplane uniform light transmissive medium and the lens 2 to control the focal length to meet different measurement scenarios or object conditions.
The measuring device specifically comprises a spectrum analyzer and an arithmetic device, wherein the spectrum analyzer is used for analyzing the spectrum of the reflected light of the surface of the flat piece, and the arithmetic device executes a measuring method according to the spectrum.
As shown in fig. 2, an embodiment of the present invention provides a method for compensating a focal position of a spectral confocal displacement sensor, where the method may be performed by the above-mentioned measuring device or by an electronic device such as a computer or a server, and the method specifically includes:
S1, obtaining reflected light collected by a spectral confocal displacement sensor. Specifically, the new spectral confocal displacement sensor emits light to the direction of the flat piece which is not washed by water, reflected light of which the light is focused on the upper surface or the lower surface of the flat piece is obtained, and then a computer collects measurement parameters of the sensor at the current moment, namely spectral data of the reflected light.
S2, according to the corresponding parameters of the spectrum peak center of the spectrum signal of the reflected lightCalculating the focus position to be corrected by a parameter-displacement model corresponding to the spectrum peak center of the spectrum confocal displacement sensor. The spectral peak center corresponding parameter-displacement model is a model constructed by utilizing reflected light and position of the surface of the flat piece collected under the sealing piece without sleeving the spectral confocal displacement sensor, namely the spectral peak center corresponding parameter-displacement model is a function of the spectral peak center corresponding parameter and the distance, and the spectral peak center corresponding parameterThe corresponding distance between the spectral confocal displacement sensor and the focusing position, such as the theoretical wafer upper surface position or the wafer lower surface position, can be calculated by substituting the model.
The content of the spectrum signals generated by different types of spectrum analyzers is different, for example, the spectrum generated by a pixel spectrometer is a spectrum of pixel and light intensity (the ordinate is light intensity, the abscissa is pixel), and the spectrum generated by a wavelength spectrometer is a spectrum of wavelength and light intensity (the ordinate is light intensity, the abscissa is wavelength). Accordingly, the spectral peak center corresponding parameter may be a pixel value corresponding to the maximum light intensity in the spectral signal, or may be a wavelength value corresponding to the maximum light intensity in the spectral signal.
The spectral peak center corresponding parameter-displacement model of the spectral confocal displacement sensor is generally known and is generally constructed in a laboratory calibration simulation mode or in a theoretical calculation mode.
S3, calculating focus position deviation caused by the biplane uniform light transmission medium. Since light is refracted when passing through the biplane uniform light transmission medium, and the calculated position of the model is the focusing position without the sealing element, the error caused by the biplane uniform light transmission medium in the spectral confocal sensor with a new structure needs to be calculated.
S4, utilizing the focus position deviationFor focus positionCompensating to obtain corrected actual focusing position. For example, the optimized spectral confocal displacement sensor is used for measuring the position of the upper surface of the wafer, and the actual focusing positionThen the corrected actual wafer upper surface position is calculated using the following formula：
According to the embodiment, the spectral confocal displacement sensor measuring tool is used for structurally optimizing the spectral confocal displacement sensor measuring tool, so that the spectral confocal displacement sensor measuring tool can be used for measuring in a liquid environment, a compensation algorithm is used for compensating data and output results acquired by the in-situ displacement sensor probe, the upper surface position of a flat piece measured by a new structure is finally realized, and the measuring accuracy is improved.
Focus position deviation caused by biplane uniform light transmission medium in step S4Geometric calculations can be performed according to the structure of the spectral confocal displacement sensor in fig. 3, specifically including the following operations:
firstly, the corresponding parameter-displacement model of the spectrum peak center of the spectrum confocal displacement sensor without the sealing element 8 is obtained . In particular, the present solution is an improvement over existing sensor structures, whose spectral peak center correspondence parameter-displacement models are known, but whose model is designed for the condition that the measurement medium is air.
The light (monochromatic light with a certain wavelength) of the spectral confocal displacement sensor is emitted from the last surface of the lens 2, the aperture of the lens 2 is D, the distance between the biplane uniform light-transmitting medium and the last surface lens is l, and the thickness of the biplane uniform light-transmitting medium is D. The focal position of the original optical system (without the seal 8) is at a, and the focal position of the new optical system (with the seal 8 added) is at B.
As can be seen from the structure shown in fig. 3:
,
Wherein the method comprises the steps of Is an unknown number of times,Is a fixed value that is known to be a,Is the position calculated by the original model.
Further analysisThe angle of incidence i, i.e. the angle of emergence at the design wavelength of the original optical system (without the presence of the seal 8)(In the air)
,
The refraction index of the biplane uniform light-transmitting medium material isThe refractive index of the surrounding medium is n (the refractive index of air can be used for calculation when modeling). Because the emergent angle is very small, paraxial treatment can be performed. From the law of refraction
,
,
,
,
,
Thereby obtainingIs calculated by the following steps:
,
Further, the refractive index of the biplane uniform light transmission medium Is a function of wavelength, has different refractive indices for different wavelengths, is nonlinear, depends on the material of the selected biplane uniform light transmitting medium, and can be given according to a schottky formula or SELLMEIER formula or the like.
For example, a bi-planar homogeneous light transmissive medium employs TIH53 glass, at 0.5876um wavelength:
,
,
,
,
,
,
,
,
wherein, 、、、、、Is the refractive index coefficient.
To calculate deviation more accuratelyCan be calculated in the formulaSubstitution as a functionThereby a more accurate calculation is obtained:
,
in addition, a special structure can be adopted to ensure that the lens 2 is overlapped with the biplane uniform transparent medium, and the distance l between the lens and the biplane uniform transparent medium is 0
,
Further, the incident angle i is the exit angle at the design wavelength of the original optical system (without the seal 8)Can be based on the spectral peak center corresponding parameterAnd calculating an emergence angle by using a pre-constructed emergence angle model, wherein the emergence angle model is a model constructed by using reflected light and emergence angle of the surface of the flat piece, which is acquired by the spectral confocal displacement sensor without the sealing piece sleeved on the surface of the flat piece in a liquid-free environment.
Taking wavelength as an example, the emergence angle model is a function of wavelength and emergence angle, and is recorded asThe model may be constructed by means of laboratory calibration simulations.
,
,
,
,
,
,
,
,
In one embodiment the measuring apparatus performs a method of measuring the surface position of a flat piece, comprising:
the reflected light of the surface of the flat piece collected by the spectral confocal displacement sensor in the liquid environment is obtained, and the structure of the spectral confocal displacement sensor is shown by referring to fig. 1. The liquid is any thinning rinse liquid suitable for use in the thinning process, and may be a transparent or translucent liquid, such as water, for convenience of description, and the liquid in the following examples is exemplified by water.
Obtaining the surface position of the flat piece according to the focusing position compensation method of the spectrum confocal displacement sensor；
By refractive index of liquidTo the surface position of flat pieceAnd (5) performing correction.
Specifically, the sealing part of the spectral confocal displacement sensor with the added structure is immersed into a liquid film formed after a flat part such as a wafer is washed, the refractive index of a medium at the emergent end of the sealing part is increased, and as the added structure does not change the focal power of the original system all the time, namely the effective focal length of the system is unchanged all the time, emergent light is refracted into the liquid by air and then focused on the upper surface of the wafer, which is equivalent to the original system, one more refractive surface is added, so that the upper surface of the wafer with the biplane uniform light-transmitting medium immersed in the liquid environment is:
,
taking water as an example, the positions of the upper surface of a wafer immersed in the water by the biplane uniform light-transmitting medium are as follows:
,
wherein, Indicating the position of the upper surface of the wafer in a state where the seal part of the spectral confocal displacement sensor is not immersed in water, i.e. the position of the upper surface of the wafer in air,= 。
According to the embodiment, the newly designed spectral confocal displacement sensor is immersed into the liquid environment formed by flushing the flat piece, compensation correction is carried out again on the corrected actual flat piece surface position, so that the flat piece surface position in the liquid environment is obtained, the measurement problem of the original spectral confocal displacement sensor in complex working conditions such as unstable liquid environment is solved, the measurement accuracy is improved, and the method is applicable to measurement of the flat piece surface position in any liquid environment.
As shown in fig. 4, the position of the upper surface of the flat part in the liquid environment can be measured by using an experimental calibration method, specifically, taking a water film formed on a wafer as an example, placing the wafer 3 in a glassware 4 capable of containing water, placing the glassware 4 on a high-precision displacement table, then fixing the probe 1 (the lens 2, the clamping structure 7 and the integral part of the sealing member 8) of a spectral confocal displacement sensor with a new structure above the glassware 4 by a fixer of an adjustable bracket 6, performing spectrum acquisition by a computer, controlling a spectrometer, a light source, a driver and a coupler of a light source system by the computer, controlling the high-precision displacement table by the computer to move, adding water to the submergible probe 1 before the measurement starts, adjusting the position of the probe 1 to a minimum wavelength or a pixel focusing position (an initial working distance), controlling the high-precision displacement table by the controller to step at a certain interval, such as 0.05mm, and totally stepping 1.5mm (30 step points), performing n times of data acquisition by the stepper, extracting peak wavelength or pixel corresponding to the wavelength or pixel focusing position by an algorithm, and obtaining the final calibration data by using the measured peak wavelength or pixel as a corresponding wavelength or a wavelength group, and then fitting the actual calibration data to the measured pixel or the actual calibration model.
It will be appreciated by those skilled in the art that embodiments of the present invention may be provided as a method, system, or computer program product. Accordingly, the present invention may take the form of an entirely hardware embodiment, an entirely software embodiment or an embodiment combining software and hardware aspects. Furthermore, the present invention may take the form of a computer program product embodied on one or more computer-usable storage media (including, but not limited to, disk storage, CD-ROM, optical storage, and the like) having computer-usable program code embodied therein.
The present invention is described with reference to flowchart illustrations and/or block diagrams of methods, apparatus (systems) and computer program products according to embodiments of the invention. It will be understood that each flow and/or block of the flowchart illustrations and/or block diagrams, and combinations of flows and/or blocks in the flowchart illustrations and/or block diagrams, can be implemented by computer program instructions. These computer program instructions may be provided to a processor of a general purpose computer, special purpose computer, embedded processor, or other programmable data processing apparatus to produce a machine, such that the instructions, which execute via the processor of the computer or other programmable data processing apparatus, create means for implementing the functions specified in the flowchart flow or flows and/or block diagram block or blocks.
These computer program instructions may also be stored in a computer-readable memory that can direct a computer or other programmable data processing apparatus to function in a particular manner, such that the instructions stored in the computer-readable memory produce an article of manufacture including instruction means which implement the function specified in the flowchart flow or flows and/or block diagram block or blocks.
These computer program instructions may also be loaded onto a computer or other programmable data processing apparatus to cause a series of operational steps to be performed on the computer or other programmable apparatus to produce a computer implemented process such that the instructions which execute on the computer or other programmable apparatus provide steps for implementing the functions specified in the flowchart flow or flows and/or block diagram block or blocks.
It is apparent that the above examples are given by way of illustration only and are not limiting of the embodiments. Other variations or modifications of the above teachings will be apparent to those of ordinary skill in the art. It is not necessary here nor is it exhaustive of all embodiments. While still being apparent from variations or modifications that may be made by those skilled in the art are within the scope of the invention.
Claims (11)
1. A method of compensating for focal position of a spectral confocal displacement sensor, comprising:
The method comprises the steps of obtaining reflected light collected by a spectral confocal displacement sensor, wherein a sealing element is sleeved on the spectral confocal displacement sensor, so that the outermost lens of the spectral confocal displacement sensor is packaged in the sealing element to isolate liquid, and the sealing element is arranged as a biplane uniform light-transmitting medium on a light path of the spectral confocal displacement sensor;
corresponding parameters of spectrum peak centers of spectrum signals according to the reflected light Calculating a focusing position to be corrected according to a parameter-displacement model corresponding to the spectrum peak center of the spectrum confocal displacement sensor；
Calculating focus position deviation caused by the biplane uniform light transmission medium；
Using the focus position deviationFor the focus positionCompensating to obtain corrected actual focusing position。
2. The method of claim 1, wherein the biplane uniform light transmissive medium is spaced from the outermost lens by a distance of 0;
calculating focus position deviation caused by the biplane uniform light transmission medium Comprising:
corresponding parameters of spectrum peak centers of spectrum signals according to the reflected light Calculating the refractive index of the biplane uniform light transmission medium to the reflected light；
According to the refractive indexRefractive index of environmentThickness of the biplane uniform light transmission mediumCalculating focus position deviation。
3. The method according to claim 2, wherein the focus position deviation is calculated as follows：
。
4. The method of claim 1, wherein the biplane uniform light transmissive medium is spaced from the outermost lens by a distance greater than 0;
calculating focus position deviation caused by the biplane uniform light transmission medium Comprising:
corresponding parameters of spectrum peak centers of spectrum signals according to the reflected light Calculating the refractive index of the biplane uniform light transmission medium to the reflected light；
According to the refractive indexRefractive index of environmentThickness of the biplane uniform light transmission mediumAperture of the outermost lensSaid focal positionThe distance between the biplane uniform light transmission medium and the outermost layer lensIncidence angle of the reflected lightCalculating focus position deviation。
5. The method of claim 4, wherein the focus position deviation is calculated as follows：
，
Wherein the method comprises the steps of。
6. A method according to claim 3 or 5, characterized in that the refractive index is calculated as follows：
，
Wherein the method comprises the steps of、、、、、Is the refractive index coefficient.
7. The method according to claim 1, wherein the spectral peak center corresponding parameter is a wavelength value or a pixel value in the spectral signal corresponding to a maximum of the light intensity.
8. A method for measuring the surface position of a flat part in a liquid environment, comprising:
Acquiring reflected light of the surface of a flat piece acquired by a spectral confocal displacement sensor in a liquid environment, wherein a sealing piece is sleeved on the spectral confocal displacement sensor, so that the outermost lens of the spectral confocal displacement sensor is packaged in the sealing piece to isolate liquid, and the sealing piece is arranged as a biplane uniform light-transmitting medium on a light path of the spectral confocal displacement sensor;
obtaining a flat surface position by the method of any one of claims 1-7 ；
By refractive index of liquidTo the surface position of flat pieceAnd (5) performing correction.
9. A focal position compensation apparatus for a spectral confocal displacement sensor, comprising: a processor and a memory coupled to the processor; wherein the memory stores instructions executable by the processor to cause the processor to perform the focal position compensation method of the spectral confocal displacement sensor of any one of claims 1-7.
10. A flat piece surface position measurement system, comprising:
The spectral confocal displacement sensor is used for collecting reflected light on the surface of the flat piece in a liquid environment, and a sealing piece is sleeved on the spectral confocal displacement sensor, so that the outermost lens of the spectral confocal displacement sensor is packaged in the sealing piece to isolate liquid, and the sealing piece is arranged as a biplane uniform light-transmitting medium on a light path of the spectral confocal displacement sensor;
Measuring device for performing the method for measuring the surface position of a flat piece in a liquid environment according to claim 8.
11. The system of claim 10, wherein the seal is secured by a clamping structure for adjusting a spacing between the bi-planar uniform light transmissive medium and the outermost lens.
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