CN118295047A - Super surface and imaging device - Google Patents
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- 238000003384 imaging method Methods 0.000 title claims abstract description 112
- 239000000758 substrate Substances 0.000 claims abstract description 44
- 239000000463 material Substances 0.000 claims description 51
- 229910052732 germanium Inorganic materials 0.000 claims description 18
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 18
- 239000005083 Zinc sulfide Substances 0.000 claims description 11
- 229910052984 zinc sulfide Inorganic materials 0.000 claims description 11
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 claims description 11
- 239000007787 solid Substances 0.000 claims description 10
- XASAPYQVQBKMIN-UHFFFAOYSA-K ytterbium(iii) fluoride Chemical compound F[Yb](F)F XASAPYQVQBKMIN-UHFFFAOYSA-K 0.000 claims description 9
- 239000000945 filler Substances 0.000 claims description 8
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0803—Arrangements for time-dependent attenuation of radiation signals
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0806—Focusing or collimating elements, e.g. lenses or concave mirrors
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/48—Thermography; Techniques using wholly visual means
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
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Abstract
The embodiment of the application discloses a super-surface and an imaging device. The super surface provided by the application is beneficial to improving the transmittance of the light beam and improving the range and the degree of freedom of the phase modulation of the light beam. The imaging device provided by the application has a simpler structure, can effectively correct aberration, and has higher efficient light beam convergence capability and better imaging performance. Wherein the hypersurface comprises: the device comprises a substrate, N first medium columns, N second medium columns and a covering layer, wherein the N first medium columns are arranged on the upper surface of the substrate, the N second medium columns are respectively located on the N first medium columns, the covering layer covers the N first medium columns and the N second medium columns, the refractive index of each first medium column is larger than or equal to that of the substrate, the refractive index of the first medium column in contact with the refractive index of the second medium column in the first medium columns is larger than that of the second medium column, and the refractive index of the covering layer is larger than or equal to 1 and smaller than or equal to that of each second medium column.
Description
Technical Field
The application relates to the field of optical imaging, in particular to a super-surface and an imaging device.
Background
Thermal infrared imaging is a technique that obtains the intensity of thermal radiation from a target object and converts the information into an image that is visible to the human eye. The thermal infrared imaging technology is widely applied and is a technology which is very important in the global scope for a long time, and the imaging technology has the advantages of high concealment and anti-interference capability and all-weather operation, so the imaging technology is widely applied to military fields such as night investigation, infrared guidance, missile early warning and the like, civil fields such as security monitoring, vehicle-mounted night vision, industrial detection, epidemic prevention detection and the like, and has huge market value.
The thermal infrared imaging device mainly comprises an optical lens and an infrared detector, wherein a super surface (Metasurface) can be arranged in the structure of the optical lens, and the problems of large volume, high price and low integration level of the traditional optical lens are solved. However, current supersurfaces have limited ability to modulate the phase of the light beam and the transmittance of the light beam by the supersurfaces is not ideal.
Disclosure of Invention
The embodiment of the application provides a super-surface and an imaging device. The super surface provided by the application is beneficial to improving the transmittance of the light beam and improving the range and the degree of freedom of the phase modulation of the light beam. The imaging device provided by the application has a simpler structure, can effectively correct aberration, and has higher efficient light beam convergence capability and better imaging performance.
In a first aspect, embodiments of the present application provide a subsurface comprising: the substrate, N first dielectric pillars, N second dielectric pillars and the covering layer, wherein N is an integer greater than 1. The N first dielectric columns are arranged on the upper surface of the substrate, the N second dielectric columns are respectively positioned on the N first dielectric columns, and the N first dielectric columns and the N second dielectric columns are covered by the covering layer. The refractive index of each first dielectric pillar is greater than or equal to the refractive index of the substrate. The refractive index of the first dielectric pillar is larger than that of the second dielectric pillar in the first dielectric pillar and the second dielectric pillar which are contacted with each other. The refractive index of the cover layer is greater than or equal to 1 and less than or equal to the refractive index of each second dielectric pillar.
In this embodiment, two layers of dielectric pillars are disposed on the substrate of the supersurface, wherein each first dielectric pillar is provided with a corresponding second dielectric pillar. The refractive index of the first dielectric column is larger than or equal to that of the substrate, and the refractive index of the first dielectric column is larger than that of the corresponding second dielectric column, so that interface reflection is reduced, and the transmittance of a light beam is improved. And, because of having set up two-layer dielectric post, promoted the scope and the degree of freedom that carry out phase modulation to the light beam.
In some possible embodiments, the cross-sections of the first and second dielectric pillars that are in contact with each other are aligned, wherein the cross-sections are parallel to the upper surface of the substrate. That is, the shapes and the sizes of the cross sections of the first medium column and the second medium column which are in contact with each other are the same, and the relative position rotation does not exist between the first medium column and the second medium column which are in contact with each other, so that the overall structural design is more regular, and the processing is convenient.
In some possible embodiments, the cross sections of the first dielectric pillar and the second dielectric pillar which are in contact with each other meet four fold symmetry, so that the super surface is insensitive to polarization, and the adaptable application scene is enriched. It should be noted that, a rectangular coordinate system is established with the geometric center of the cross section of the first dielectric column or the second dielectric column as the origin, wherein the X axis is marked as the 0 ° direction, the Y axis is marked as the 90 ° direction, and the cross section satisfying four fold symmetry means that the cross section is symmetrical with respect to the 0 ° direction, the 90 ° direction, -45 ° direction and the +45° direction respectively.
In some possible embodiments, the first medium column may be a solid column or a hollow column, and the second medium column may also be a solid column or a hollow column, which enriches the implementation manner of the present solution.
In some possible embodiments, the height of the first dielectric pillar is greater than the height of the second dielectric pillar in the first dielectric pillar and the second dielectric pillar which are in contact with each other, so that the performance of the super surface is improved.
In some possible embodiments, the lower surface of the substrate is coated with an anti-reflection film to reduce interfacial reflection between the lower side of the substrate and air and to improve the transmittance of the incident light beam. Wherein, the material of the antireflection film can be at least one of germanium, zinc sulfide and ytterbium fluoride.
In some possible embodiments, the substrate comprises a germanium material, the material of each first dielectric pillar comprises a germanium material, and the material of each second dielectric pillar comprises at least one of germanium, zinc sulfide, and ytterbium fluoride, enhancing the realisation of the present solution.
In a second aspect, an embodiment of the present application provides an imaging apparatus including: the first super surface is the super surface introduced by any embodiment of the first aspect, and the first dielectric pillar and the second dielectric pillar in the first super surface are far away from the lens relative to the substrate. The lens is used for converging the incident light beam. The first subsurface is used for modulating the light beam from the lens, wherein the light beam modulated by the first subsurface is imaged on the image plane of the lens.
In this embodiment, the imaging device formed by the above-described super surface and lens can effectively correct aberrations. In addition, the range and the degree of freedom of the phase modulation of the light beam by the super surface are higher, so that the imaging device has higher efficient light beam convergence capability and better imaging performance. In addition, the super surface is used for replacing part of lenses in the traditional imaging device, so that the volume of the imaging device is effectively reduced on the basis of realizing the same function, and the structure of the imaging device is simplified.
In some possible embodiments, the imaging device further comprises a second supersurface, which is a supersurface as described in any one of the embodiments of the first aspect above. The lens is positioned between the first and second supersurfaces, and the first and second dielectric pillars in the second supersurface are adjacent to the lens relative to the substrate. The distance between the second supersurface and the lens is equal to the effective focal length of the lens. The second super-surface is used for modulating the incident light beam, wherein the light beam modulated by the second super-surface is incident on the lens.
In this embodiment, since the imaging device employs two super surfaces in combination with the lens, aberration correction can be performed better with the two super surfaces, and focusing and imaging performance are improved.
In some possible embodiments, the ratio of the caliber of the first supersurface to the caliber of the second supersurface is within a preset ratio range, and the ratio of the caliber of the first supersurface to the caliber of the lens is within the preset ratio range, the preset ratio range comprising 1. Preferably, the caliber of the first super surface is equal to the caliber of the second super surface, and the caliber of the first super surface is equal to the caliber of the lens, so that as many light beams modulated by the second super surface can be modulated by the first super surface through the lens, and the efficiency of modulating the light beams is improved.
In some possible embodiments, the second supersurface has a filler material between the second supersurface and the lens, the distance between the second supersurface and the lens being equal to the effective focal length of the lens in the filler material. The filling material can be a material with a higher constant refractive index, so that the overall size length of the imaging device can be effectively shortened.
In some possible embodiments, the second super surface and the lens are filled with a material with a variable refractive index or a variable form, which helps to correct spherical aberration and partial off-axis aberration, and the refractive index or form (such as expansion and stretching) of the filling material can be regulated by some external stimulus, so as to realize zooming.
In some possible embodiments, the imaging device further comprises a phase plate, the lens being located between the first supersurface and the phase plate, the distance between the phase plate and the lens being equal to the effective focal length of the lens. The phase plate is used for modulating an incident light beam, wherein the light beam modulated by the phase plate is incident on the lens. In this embodiment, aberration correction can be performed better with the super surface and the phase plate, and focusing and imaging performance are improved.
In some possible embodiments, the ratio of the caliber of the first supersurface to the caliber of the phase plate is within a preset ratio range, and the ratio of the caliber of the first supersurface to the caliber of the lens is within the preset ratio range, and the preset ratio range comprises 1. Preferably, the caliber of the first super surface is equal to the caliber of the phase plate, and the caliber of the first super surface is equal to the caliber of the lens, so that as many light beams modulated by the phase plate as possible can be modulated by the first super surface through the lens, and the efficiency of modulating the light beams is improved.
In some possible embodiments, the phase plate and the lens have a filler material therebetween, and the distance between the phase plate and the lens is equal to the effective focal length of the lens in the filler material. The filling material can be a material with a higher constant refractive index, so that the overall size length of the imaging device can be effectively shortened.
In some possible embodiments, the phase plate and the lens are filled with a material with a variable refractive index or a variable form, which helps to correct spherical aberration and partial off-axis aberration, and the refractive index or form (such as expansion and stretching) of the filling material can be regulated by some external excitation, so as to realize zooming.
In some possible embodiments, the lower surface of the substrate in the first supersurface conforms to the surface of the lens or the first supersurface has the surface of the lens as the substrate. The integration level of the imaging device can be improved through the embodiment, so that the imaging device is smaller in size.
In some possible embodiments, there is an air space between the first supersurface and the lens, or a material with a variable refractive index or a variable morphology is filled between the first supersurface and the lens, which improves the scalability of the solution.
In some possible embodiments, the surface of the lens is coated with an anti-reflection film to improve the efficiency and imaging contrast of the imaging device. Wherein, the material of the antireflection film can be at least one of germanium, zinc sulfide and ytterbium fluoride.
In some possible embodiments, the lens is a plano-convex lens or a refractive lens group, enriching the implementation of the present solution.
In the embodiment of the application, two layers of dielectric columns are arranged on the substrate of the super surface, wherein each first dielectric column is provided with a corresponding second dielectric column. The refractive index of the first dielectric column is larger than or equal to that of the substrate, and the refractive index of the first dielectric column is larger than that of the corresponding second dielectric column, so that interface reflection is reduced, and the transmittance of a light beam is improved. And, because of having set up two-layer dielectric post, promoted the scope and the degree of freedom that carry out phase modulation to the light beam. Further, the imaging device formed by the above-mentioned super surface and lens can effectively correct aberrations. In addition, the range and the degree of freedom of the phase modulation of the light beam by the super surface are higher, so that the imaging device has higher efficient light beam convergence capability and better imaging performance. In addition, the super surface is used for replacing part of lenses in the traditional imaging device, so that the volume of the imaging device is effectively reduced on the basis of realizing the same function, and the structure of the imaging device is simplified.
Drawings
FIG. 1 (a) is a schematic view of a spherical aberration;
FIG. 1 (b) is a schematic illustration of off-axis aberrations;
FIG. 2 is a schematic view of a super-surface structure according to an embodiment of the present application;
FIG. 3 is a schematic diagram of several structures of a first dielectric pillar and a second dielectric pillar according to an embodiment of the present application;
FIG. 4 is a schematic diagram of a first configuration of an imaging device according to an embodiment of the present application;
FIG. 5 is a schematic diagram of a second configuration of an imaging device according to an embodiment of the application;
FIG. 6 (a) is a schematic diagram of a simulation of a focused spot;
FIG. 6 (b) is a schematic diagram of an imaging effect;
FIG. 7 is a schematic diagram of a third configuration of an imaging device according to an embodiment of the present application;
FIG. 8 is a schematic diagram of a fourth embodiment of an imaging device;
FIG. 9 is a schematic diagram of a simulation of the in-loop energy and modulation transfer function of a focused spot;
FIG. 10 (a) is a schematic graph of transmittance of the first and second supersurfaces in the 8 μm-12 μm band;
FIG. 10 (b) is a schematic view of another imaging effect;
Fig. 11 is a schematic diagram of a fifth configuration of an imaging device according to an embodiment of the application.
Detailed Description
The embodiment of the application provides a super-surface and an imaging device. The super surface provided by the application is beneficial to improving the transmittance of the light beam and improving the range and the degree of freedom of the phase modulation of the light beam. The imaging device provided by the application has a simpler structure, can effectively correct aberration, and has higher efficient light beam convergence capability and better imaging performance.
It should be noted that the terms "first," "second," and the like in the description and claims of the application and in the foregoing figures, if any, are used for distinguishing between similar objects and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used may be interchanged where appropriate such that the embodiments described herein may be implemented in other sequences than those illustrated or otherwise described herein. Furthermore, the terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.
In the following, some terms of art will be described first.
(1) Super surface (Metasurface): the super surface is a two-dimensional metamaterial constructed by a sub-wavelength optical antenna array according to a specific spatial arrangement mode, and can regulate and control optical characteristics such as phase, polarization state, amplitude, orbital angular momentum and the like of incident light waves in a sub-wavelength scale range. The planar nature of the supersurface greatly reduces the difficulty of processing and fabrication, has the characteristics of miniaturization, multifunction, high integration, and compatibility with current complementary metal oxide semiconductor (Complementary Metal Oxide Semiconductor, CMOS) processes. The super lens (Metalens) is a super surface with a focusing function, is light and ultrathin, and can provide a brand new idea for solving the problems of large volume, high price and low integration level of the traditional infrared imaging lens.
(2) Aberration: the image difference of the lens is divided into chromatic aberration and monochromatic aberration. Chromatic aberration of the lens is mainly affected by the dispersive properties of the acceptor material. The focal length of the lens is related to the wavelength of incident light, and after parallel light with different wavelengths passes through the lens, the parallel light is focused at different positions on a horizontal optical axis, so that a focus blur is caused, and the phenomenon is called chromatic aberration. Achromats are typically composed of a plurality of lenses, typically including positive and negative lenses with different chromatic dispersion characteristics, to achieve chromatic aberration cancellation. Monochromatic aberrations mainly include spherical aberration, coma, distortion, curvature of field, etc., wherein spherical aberration is the difference between the actual light and paraxial or paraxial light due to spatial variation of an optical lens. FIG. 1 (a) is a schematic view of spherical aberration. As shown in fig. 1 (a), the difference in the position of the intersection point between the light rays converged at different positions of the lens and the optical axis is referred to as an axial spherical aberration, and the difference in the vertical direction on the image plane is a vertical spherical aberration. Coma, distortion, curvature of field, etc., belong to off-axis aberrations, and due to oblique incidence of light, deviation between marginal light and paraxial light is caused. Fig. 1 (b) is a schematic diagram of off-axis aberration. As shown in fig. 1 (b), the off-axis aberration causes parallel light to be emitted from a point outside the optical axis and pass through the lens, forming an asymmetric diffuse spot on the image plane instead of the focal point.
The present application provides a super-surface and an imaging device described in detail below.
FIG. 2 is a schematic diagram of a super-surface structure according to an embodiment of the present application. As shown in fig. 2, the super surface includes: a substrate 101, N first dielectric pillars 102, N second dielectric pillars 103, and a capping layer 104. Wherein N is an integer greater than 1. N first dielectric pillars 102 are disposed on the upper surface of the substrate 101, for example, the N first dielectric pillars 102 may be distributed on the substrate 101 in an array. The N second dielectric pillars 103 are distributed on the N first dielectric pillars 102, that is, each first dielectric pillar 102 is provided with a corresponding second dielectric pillar 103. The cover layer 104 wraps the N first dielectric pillars 102 and the N second dielectric pillars 103, so that the N first dielectric pillars 102 and the N second dielectric pillars 103 are isolated from the external environment, and can play a role in dust protection.
Specifically, the refractive index of each first dielectric pillar 102 is greater than or equal to the refractive index of the substrate 101. It should be appreciated that if the first dielectric pillars 102 are of the same material as the substrate 101, the refractive index of the first dielectric pillars 102 is equal to the refractive index of the substrate 101. The refractive index of each first dielectric pillar 102 is greater than the refractive index of the second dielectric pillar 103 located thereon. The refractive index of the cover layer 104 is greater than or equal to 1 and less than or equal to the refractive index of each second dielectric pillar 103. The cover layer 104 may be an air layer, or may be filled with a material that is optically transparent in the long-wave infrared band or has a high transmittance. It should be appreciated that if the cover layer 104 is an air layer, the refractive index of the cover layer 104 is equal to 1.
It should be noted that, because the super surface provided by the application is provided with two layers of dielectric columns, the super surface provided by the application improves the range and the degree of freedom of the phase modulation of the light beam relative to the super surface with only one layer of dielectric column. For example, a super surface provided with one layer of dielectric pillars has P adjustable phases to an incident beam, and a super surface provided with two layers of dielectric pillars has Q adjustable phases to an incident beam, Q > P. And, because the refractive index of the first dielectric pillar is greater than the refractive index of the second dielectric pillar located on it, help reducing the interface reflection and promoting the transmissivity of the light beam.
In some possible embodiments, the substrate 101 is a germanium material including crystalline germanium and amorphous germanium. Each first dielectric pillar 102 may also be formed of germanium material. The material used for each second dielectric pillar 103 includes at least one of germanium, zinc sulfide, and ytterbium fluoride. For example, the second dielectric pillars 103 may be made of a plurality of different materials in the height direction, respectively. In some scenarios, if the second dielectric pillar 103 is made of multiple layers of materials, one layer of material may be the same as the material of the first dielectric pillar 102, and the refractive index of each of the other layers of material is smaller than the refractive index of the first dielectric pillar 102, so that in the scenario, the average refractive index of the second dielectric pillar 103 is smaller than the refractive index of the first dielectric pillar 102. It should be appreciated that the supersurface provided by the application can be processed by adopting semiconductor photoetching and etching processes, thereby meeting the requirements of low cost and batch preparation.
In some possible embodiments, the height of the first dielectric pillar 102 is denoted as H1, and the height of the second dielectric pillar above the first dielectric pillar 102 is denoted as H2, H1 > H2. As one example, H1 and H2 may be set with reference to the wavelength of the incident light beam, e.g., H1 is equal to or near the wavelength of the incident light beam and H2 is less than the wavelength of the incident light beam.
In some possible embodiments, the lower surface of the substrate 101 is coated with an anti-reflection film to reduce the interfacial reflection between the lower side of the substrate 101 and the air and to improve the transmittance of the incident light beam. Wherein, the material of the antireflection film can be at least one of germanium, zinc sulfide and ytterbium fluoride.
In some possible embodiments, the cross-section of the first dielectric pillar 102 is aligned with the cross-section of the second dielectric pillar 103 located thereon, wherein the cross-section is parallel to the upper surface of the substrate 101. That is, the shapes and sizes of the cross sections of the first dielectric cylinder 102 and the second dielectric cylinder 103 that are in contact with each other are the same, and there is no relative positional rotation between the first dielectric cylinder 102 and the second dielectric cylinder 103 that are in contact with each other. On the basis, the cross sections of the first medium column 102 and the second medium column 103 which are in contact with each other meet four-fold symmetry, so that the super surface is insensitive to polarization, and the adaptable application scene is enriched. It should be noted that, a rectangular coordinate system is established with the geometric center of the cross section of the first dielectric pillar 102 or the second dielectric pillar 103 as the origin, wherein the X-axis is denoted as the 0 ° direction, the Y-axis is denoted as the 90 ° direction, and the cross section satisfying four fold symmetry means that the cross section is symmetrical with respect to the 0 ° direction, the 90 ° direction, -45 ° direction, and the +45° direction, respectively. In addition, the first dielectric pillar 102 may be a solid pillar or a hollow pillar, and the second dielectric pillar 103 may be a solid pillar or a hollow pillar, which is not limited herein. Several possible configurations of the first dielectric pillar and the second dielectric pillar are provided below.
Fig. 3 is a schematic diagram of several structures of a first dielectric pillar and a second dielectric pillar according to an embodiment of the present application. As shown in fig. 3, taking the shape of the cross section as an example, an example a shows a square solid dielectric column, an example b shows a square hollow dielectric column, an example c shows a cross-shaped solid dielectric column, an example d shows a cross-shaped hollow dielectric column, an example e shows a round solid dielectric column, an example f shows a round hollow dielectric column, an example g shows a ring-shaped dielectric column (the center circle is hollow), and an example h shows a medium column of a ring in the center (the center circle is solid). It should be understood that the present application is not limited to the cross-sectional shape of the substrate 101, and may be, for example, square as shown in fig. 3, or may be circular or other shapes.
In one possible embodiment, first, the super-surface phase distribution is optimized by using a ray tracing methodThe following formula needs to be satisfied:
Where ω represents the angular frequency of the incident free space light, a i (ω) represents the phase polynomial coefficient associated with the angular frequency, ρ represents the radial coordinates of the hypersurface plane, and R represents the radius of the whole piece of hypersurface. The polynomial coefficients A i (omega) of different wavelengths are optimized by utilizing a ray tracing method, so that the average square root facula radius of the incident long-wave infrared broadband light under a large field angle is minimum after passing through the whole super surface, and the super surface phase distribution for aberration correction is finally determined. Secondly, selecting a proper super surface unit structure to fulfill the phase distribution For example, 8 dielectric pillar structures may be provided using fig. 3.
As an example, the period of the dielectric pillars in the supersurface is about 2.2 μm, i.e., the spacing between every two adjacent dielectric pillars distributed over the substrate is about 2.2 μm. The first dielectric pillar has a height of about 10 μm and is composed of germanium material. The second dielectric column has a height of about 2 μm and comprises germanium, zinc sulfide and ytterbium fluoride, which are sequentially zinc sulfide, ytterbium fluoride, zinc sulfide, germanium and zinc sulfide from top to bottom. By adopting a finite time domain difference method, scanning is carried out on the dielectric column on the super surface, and the transmittance response and the phase response of the dielectric column are obtained. The transmittance of most dielectric pillars in the super surface in the wave band of 8-12 μm is higher than 0.7, and the phase of each designed wavelength can meet the coverage of 0-2 pi, which indicates that the design based on the multi-layer dielectric pillars can improve the transmittance efficiency of the long-wave infrared super surface. Further, according to the ray trace optimization method, the phase distribution of the super surface is determinedPolynomial coefficients a i (ω) at each wavelength and finding the appropriate dielectric pillar structure in the library of subsurface unit structures according to a table look-up.
Fig. 4 is a schematic diagram of a first structure of an imaging device according to an embodiment of the application. As shown in fig. 4, the imaging device includes a first supersurface 10 and a lens 20, with the first and second columns of media in the first supersurface 10 being remote from the lens 20 relative to the substrate. The lens 20 is used to focus an incident light beam, wherein the type of lens 20 includes, but is not limited to, plano-convex lenses, refractive lens groups, and the like. The first supersurface 10 is used for modulating a light beam from the lens 20, wherein the modulation of the light beam includes, but is not limited to, phase modulation, polarization modulation, amplitude modulation, and the like. Further, the light beam modulated by the first super surface 10 is imaged on the image plane of the lens 20. It will be appreciated that the first super-surface 10 is capable of correcting chromatic aberration, spherical aberration and partial off-axis aberrations of the lens 20 such that the light beam is efficiently focused on the image plane. It should be noted that, the specific features of the first super surface 10 may be described in detail with reference to the above embodiments, and will not be described herein.
Optionally, the front and/or rear surfaces of the lens 20 may be coated with an anti-reflection film to improve the efficiency and imaging contrast of the imaging device. Wherein, the material of the antireflection film can be at least one of germanium, zinc sulfide and ytterbium fluoride.
In one possible embodiment, the underlying surface of the first supersurface 10 is in contact with the surface of the lens 20. For example, the lens 20 is a plano-convex lens, and the lower surface of the base of the first supersurface 10 may be conformed to the rear plane of the plano-convex lens. In one possible embodiment, the first supersurface 10 is backed by the surface of the lens 20. For example, the lens 20 is a plano-convex lens, and the first supersurface 10 is prepared with the rear plane of the plano-convex lens as the substrate.
Fig. 5 is a schematic diagram of a second structure of an imaging device according to an embodiment of the application. In another possible embodiment, as shown in fig. 5, a space may be provided between the first supersurface 10 and the lens 20, unlike the imaging device shown in fig. 4. As an example, the space between the first supersurface 10 and the lens 20 may be filled with air or other long wave infrared high transmission material. As another example, the first supersurface 10 and the lens 20 may also be filled with a material of variable refractive index or morphology to help correct spherical and partially off-axis aberrations, possibly by some external stimulus, to manipulate the refractive index or morphology (e.g. expansion, stretching) of the filling material to achieve zoom.
It should be noted that, the ratio of the caliber of the first super surface 10 to the caliber of the lens 20 is within a preset ratio range, for example, the preset ratio range may be 0.5-2. Preferably, the ratio of the aperture of the first super-surface 10 to the aperture of the lens 20 is 1, i.e. the aperture of the first super-surface 10 is equal to the aperture of the lens 20, so that as many light beams as possible passing through the lens 20 can be modulated by the first super-surface 10, improving the efficiency of modulating the light beams by the first super-surface 10. It should be understood that the above-mentioned "caliber" refers to the maximum distance of the contour of the object in a certain direction, and the caliber of the first super surface 10 may be the caliber of its base, taking the first super surface 10 as an example. For example, if the cross-section of the substrate is circular, the caliber is the diameter of the circle. For another example, the cross section of the base is rectangular, and its apertures are the long and short sides of the rectangle in two directions perpendicular to each other.
Fig. 6 (a) is a schematic diagram of a simulation of a focused spot. Taking the imaging device shown in fig. 4 or fig. 5 as an example, for example, the apertures of the first super surface 10 and the lens 20 are 10mm, the F number of the imaging device is 1, and the field angle of the imaging device is 20 °, where the F number refers to the ratio of the effective focal length to the effective aperture of the imaging device. Fig. 6 (a) shows the simulation results of focused spots with incident beam wavelengths of 8 μm,10 μm and 12 μm at a field angle of ±10°, respectively, and it can be seen that the tracking spot size is smaller than the corresponding einzel spot at a small field angle, and the spot is slightly degraded under a large field condition, indicating that the first super-surface energy corrects part of the off-axis aberration. Fig. 6 (b) is a schematic view of an imaging effect. As shown in fig. 6 (b), the wide spectral image is clearer in the entire field, and the image contrast of the fringe field slightly deteriorates.
As can be seen from the above-described imaging devices shown in fig. 4 and 5, aberration can be effectively corrected by using the imaging device formed by the super surface and the lens. In addition, the range and the degree of freedom of the phase modulation of the light beam by the super surface are higher, so that the imaging device has higher efficient light beam convergence capability and better imaging performance. In addition, the super surface is used for replacing part of lenses in the traditional imaging device, so that the volume of the imaging device is effectively reduced on the basis of realizing the same function, and the structure of the imaging device is simplified. As an example, ultra-surface can be prepared in batches by using a mature semiconductor process such as ultraviolet lithography process and dry etching process, and a spherical lens (e.g. plano-convex lens) can be used as the lens, so that an aspherical lens which is complex in preparation process, difficult to process in batches and high in cost is not needed, the cost of the imaging device is obviously reduced, meanwhile, the imaging device has better performance in the 8um-12um wave band, and polarization is irrelevant. As another example, the super surface can be directly prepared on one side surface of the lens without a plurality of lenses, and the whole structure is compact and light in weight.
In order to better correct the aberration, the present application also provides an imaging device with another structure, which is described in detail below.
Fig. 7 is a schematic diagram of a third structure of an imaging device according to an embodiment of the application. As shown in fig. 7, the imaging device of fig. 4 further includes a second supersurface 30. The lens 20 is positioned between the first and second supersurfaces 10 and 30, and the first and second columns of medium in the second supersurface 30 are adjacent to the lens 20 relative to the substrate. And, the distance between the second supersurface 30 and the lens 20 is equal to the effective focal length of the lens 20. Wherein the effective focal length of the lens 20 depends on the refractive index of the filling medium between the second supersurface 30 and the lens 20, e.g. air is filled between the second supersurface 30 and the lens 20, the second supersurface 30 is located at the front focal plane of the lens 20. It will be appreciated that in practical applications, a certain error range may also be acceptable, for example, the distance between the second supersurface 30 and the lens 20 is close to the effective focal length of the lens 20.
Specifically, the second supersurface 30 modulates the incident light beam, wherein modulation of the light beam includes, but is not limited to, phase modulation, polarization modulation, amplitude modulation, and the like. The light beam modulated by the second super surface 30 is incident on the lens 20, the lens 20 is used to converge the incident light beam, and the first super surface 10 modulates the light beam passing through the lens 20. It should be appreciated that the specific features of the second supersurface 30 may be described in detail with reference to the above embodiments, and will not be described in detail herein.
It should be noted that the positional relationship among the first super surface 10, the lens 20, and the second super surface 30 in the imaging apparatus shown in fig. 7 is purposefully designed mainly for better correcting aberrations. For example, the second subsurface 30 may correct for primary and chromatic aberrations, and the first subsurface 10 may correct for higher order and spherical aberrations. Therefore, compared with the imaging device shown in fig. 4, the imaging device shown in fig. 7 has clearer imaging picture, high contrast, more uniform light intensity distribution, and still can realize clear imaging under a larger field angle.
It should be further noted that, the phase distributions of the first and second super surfaces 10 and 30 may be optimally obtained by using a ray tracing method, so that the square root spot radius of the incident beam passing through the imaging device at the full field angle is minimized. Then, the optimized super-surface phase is taken as an ideal phase, and the most suitable dielectric column distribution mode is found to construct the phase distribution.
In some possible embodiments, a filler material is present between the second supersurface 30 and the lens 20, and the distance between the second supersurface 30 and the lens 20 is equal to the effective focal length of the lens 20 in the filler material. The filling material can be a material with a higher constant refractive index, so that the overall size length of the imaging device can be effectively shortened.
In some possible embodiments, the second supersurface 30 and the lens 20 may be filled with a material of variable refractive index or morphology to help correct spherical and partial off-axis aberrations, and possibly by some external stimulus, to manipulate the refractive index or morphology (e.g. expansion, stretching) of the filled material to achieve zoom.
It should be noted that, the ratio of the caliber of the first super surface 10 to the caliber of the second super surface 30 is within a preset ratio range, for example, the preset ratio range may be 0.5-2. Preferably, the ratio of the caliber of the first super surface 10 to the caliber of the second super surface 30 is 1, and the ratio of the caliber of the first super surface 10 to the caliber of the lens 20 is 1, i.e. the caliber of the first super surface 10 is equal to the caliber of the second super surface 30, and the caliber of the first super surface 10 is equal to the caliber of the lens 20, so that as many light beams modulated by the second super surface 30 as possible can be modulated by the first super surface 10 through the lens 20, thereby improving the efficiency of modulating the light beams.
Fig. 8 is a schematic diagram of a fourth configuration of an imaging device according to an embodiment of the application. As shown in fig. 8, the imaging device of fig. 5 further includes a second supersurface 30. The imaging device shown in fig. 8 differs from the imaging device shown in fig. 7 in that there is a space between the first super surface 10 and the lens 20, and the description of this difference may be specifically referred to in the embodiment shown in fig. 4 and fig. 5, and other identical features will not be repeated here.
Fig. 9 is a schematic diagram of a simulation of the in-loop energy and modulation transfer function of a focused spot. Taking the imaging device shown in fig. 7 or 8 as an example, for example, the apertures of the first and second supersurfaces 10, 20 and 30 are all 10mm, the F-number of the imaging device is 1, and the angle of view of the imaging device is 20 °. Fig. 9 shows the in-turn energy (ENCIRCLED EFFCIENCY) and modulation transfer function ((Modulation Transfer Function, MTF) simulation results of focused spots having incident beam wavelengths of 8 μm,10 μm and 12 μm, respectively, at a field angle of ±10°, it can be seen that the second and first supersurfaces 30 and 10 have average focusing efficiencies of 79.9% and 77.4% at 8 μm-12 μm wavelength bands, respectively, under broadband light irradiation conditions of 0 ° and 10 ° oblique incidence, respectively.
FIG. 10 (a) is a graph showing the transmittance of the first and second supersurfaces in the 8 μm-12 μm band. As shown in FIG. 10 (a), the transmittance distribution of the two supersurfaces is flat in the 8 μm-12 μm band, the transmittance is not less than 80%, and the average transmittance is 83.9% and 91.9%, respectively. The realization of efficient supersurfaces benefits from a multi-layer dielectric pillar design. In addition, the transmittance of the super surface can be improved through further optimization structural design, so that the average transmittance is improved, and the focusing efficiency is further improved.
Fig. 10 (b) is a schematic view of another imaging effect. As shown in fig. 10 (b), compared with the imaging device shown in fig. 4, the imaging device shown in fig. 7 has a clearer image, a higher contrast ratio, and a more uniform light intensity distribution, and can still realize clear imaging at a larger angle of view.
Fig. 11 is a schematic diagram of a fifth configuration of an imaging device according to an embodiment of the application. As shown in fig. 11, the imaging device of fig. 4 further includes a phase plate 40, unlike the imaging device of fig. 7. That is, the imaging device shown in fig. 11 replaces the second super surface 30 in the imaging device shown in fig. 7 with the phase plate 40, and the function of the phase plate 40 is similar to that of the second super surface 30. Other features of the imaging apparatus shown in fig. 11 are similar to those of the imaging apparatus shown in fig. 7, and reference is specifically made to the description of the imaging apparatus shown in fig. 7, which is not repeated here. Similarly, in some possible embodiments, the second supersurface 30 in the imaging device illustrated in fig. 8 described above may also be replaced by a phase plate 40, and the illustration of the figures is not provided herein.
In other possible implementations, the first supersurface 10 in the above embodiments may be replaced by a phase plate 40 to perform a type of function, and the illustration and detailed description of the drawings are not provided herein.
As is clear from the combination of the imaging devices shown in fig. 7, 8 and 11, in addition to the advantages of the imaging devices shown in fig. 4 and 5, the imaging device can perform aberration correction better by using two super surfaces and lenses, and the focusing and imaging performance are improved.
It should be noted that the above embodiments are only for illustrating the technical solution of the present application, and are not limiting. Although the application has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present application.
Claims (20)
1. A subsurface, comprising: the device comprises a substrate, N first medium columns, N second medium columns and a covering layer, wherein N is an integer larger than 1, the N first medium columns are arranged on the upper surface of the substrate, the N second medium columns are respectively arranged on the N first medium columns, the covering layer covers the N first medium columns and the N second medium columns, the refractive index of each first medium column is larger than or equal to that of the substrate, the refractive index of the first medium column and the refractive index of the first medium column in contact with each other are larger than that of the second medium column, and the refractive index of the covering layer is larger than or equal to 1 and smaller than or equal to that of each second medium column.
2. The metasurface of claim 1, wherein cross-sections of first and second media pillars in contact with each other are aligned, the cross-sections being parallel to an upper surface of the substrate.
3. The metasurface of claim 2, wherein the cross-section of the first media pillar and the second media pillar in contact with each other satisfies four fold symmetry.
4. A hypersurface according to any one of claims 1 to 3 wherein at least one of the first dielectric pillars is a hollow pillar and at least one of the second dielectric pillars is a hollow pillar;
Or alternatively
At least one of the first dielectric pillars is a solid pillar and at least one of the second dielectric pillars is a solid pillar.
5. The metasurface of any of claims 1-4, wherein a height of a first dielectric pillar in the first dielectric pillar and a height of a second dielectric pillar in contact with each other is greater than the height of the second dielectric pillar.
6. The supersurface of any one of claims 1 to 5 wherein the lower surface of said substrate is coated with an anti-reflection film.
7. The subsurface of any one of claims 1 to 6, wherein the substrate comprises a germanium material, each of the first dielectric pillars comprises a germanium material, and each of the second dielectric pillars comprises at least one of germanium, zinc sulfide, and ytterbium fluoride.
8. An image forming apparatus, comprising: a first supersurface and a lens, said first supersurface being a supersurface according to any one of claims 1 to 7, said first supersurface having first and second columns of media remote from said lens relative to a substrate;
The lens is used for converging incident light beams;
the first super surface is used for modulating the light beam from the lens, wherein the light beam modulated by the first super surface is imaged on the image plane of the lens.
9. The imaging device of claim 8, further comprising a second supersurface, the second supersurface being a supersurface according to any one of claims 1 to 7, the lens being located between the first and second supersurfaces, the first and second columns of medium in the second supersurface being in proximity to the lens relative to a substrate, the distance between the second supersurface and the lens being equal to the effective focal length of the lens;
The second super surface is used for modulating an incident light beam, wherein the light beam modulated by the second super surface is incident on the lens.
10. The imaging device of claim 8 or 9, wherein a ratio of the caliber of the first supersurface to the caliber of the second supersurface is within a preset ratio range, the ratio of the caliber of the first supersurface to the caliber of the lens being within the preset ratio range, the preset ratio range comprising 1.
11. The imaging device of claim 9 or 10, wherein a filler material is present between the second supersurface and the lens, the distance between the second supersurface and the lens being equal to the effective focal length of the lens in the filler material.
12. Imaging device according to claim 9 or 10, wherein a material of variable refractive index or variable morphology is filled between the second supersurface and the lens.
13. The imaging device of claim 8, further comprising a phase plate, the lens positioned between the first supersurface and the phase plate, a distance between the phase plate and the lens being equal to an effective focal length of the lens;
The phase plate is used for modulating an incident light beam, wherein the light beam modulated by the phase plate is incident on the lens.
14. The imaging device of claim 13, wherein a ratio of the caliber of the first supersurface to the caliber of the phase plate is within a preset ratio range, the ratio of the caliber of the first supersurface to the caliber of the lens is within the preset ratio range, and the preset ratio range comprises 1.
15. Imaging device according to claim 13 or 14, characterized in that a filling material is present between the phase plate and the lens, the distance between the phase plate and the lens being equal to the effective focal length of the lens in the filling material.
16. Imaging device according to claim 13 or 14, characterized in that between the phase plate and the lens a material with a variable refractive index or a variable morphology is filled.
17. The imaging device of any of claims 8 to 16, wherein a lower surface of the substrate in the first supersurface conforms to a surface of the lens or the substrate of the first supersurface is a surface of the lens.
18. The imaging device of any of claims 8 to 16, wherein the first supersurface is either air spaced from the lens or is filled with a material of variable refractive index or morphology.
19. The imaging device of any one of claims 8 to 18, wherein a surface of the lens is coated with an antireflection film.
20. The imaging device of any one of claims 8 to 19, wherein the lens is a plano-convex lens or a refractive lens group.
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| CN202310012786.8A CN118295047A (en) | 2023-01-05 | 2023-01-05 | Super surface and imaging device |
| PCT/CN2024/070499 WO2024146583A1 (en) | 2023-01-05 | 2024-01-04 | Metasurface and imaging apparatus |
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| CN202310012786.8A CN118295047A (en) | 2023-01-05 | 2023-01-05 | Super surface and imaging device |
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| US9507064B2 (en) * | 2014-07-27 | 2016-11-29 | The Board Of Trustees Of The Leland Stanford Junior University | Dielectric metasurface optical elements |
| CN112630868B (en) * | 2019-10-08 | 2024-07-02 | 三星电子株式会社 | Superlens and optical device comprising same |
| CN112505808B (en) * | 2020-12-09 | 2021-10-08 | 华中科技大学 | Long-wave infrared broadband achromatic super-surface lens |
| CN114025062B (en) * | 2021-10-25 | 2022-07-05 | 华中科技大学 | Large-caliber infrared super-lens camera |
| CN114296155B (en) * | 2021-12-02 | 2023-02-07 | 华中科技大学 | Wide-spectrum optical zoom system based on double-layer medium super-surface |
| CN114442439B (en) * | 2022-01-20 | 2024-09-24 | 东北师范大学 | Integrated ultraviolet all-medium superlens group for photoetching machine |
| CN114397718B (en) * | 2022-02-23 | 2023-09-29 | 深圳迈塔兰斯科技有限公司 | Athermalized superlens and design method thereof |
| CN114660683A (en) * | 2022-04-28 | 2022-06-24 | 深圳迈塔兰斯科技有限公司 | Super surface structure |
| CN115047653A (en) * | 2022-06-14 | 2022-09-13 | 深圳迈塔兰斯科技有限公司 | Adjustable super surface system |
| CN217467327U (en) * | 2022-06-24 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Optical system, imaging device including the same, and electronic apparatus including the same |
| CN218213421U (en) * | 2022-07-06 | 2023-01-03 | 深圳迈塔兰斯科技有限公司 | Laser radar transmitting system and wafer level packaged device |
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