CN118243711B - XRF soil heavy metal element analysis system - Google Patents
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Abstract
The invention discloses an XRF soil heavy metal element analysis system, which relates to the technical field of XRF and solves the problem that when related heavy metal elements with larger attribute differences exist, corresponding secondary reflection lines are deviated.
Description
Technical Field
The invention relates to the technical field of XRF, in particular to an XRF soil heavy metal element analysis system.
Background
Exciting atoms in a substance to be detected by utilizing primary X-ray photons or other microscopic ions to generate fluorescence (secondary X-rays) so as to perform substance component analysis and chemical state research; according to the difference of excitation, dispersion and detection methods, the method is divided into an X-ray spectrometry (wavelength dispersion) and an X-ray spectrometry (energy dispersion);
The application with publication number of CN115112699A provides a quantitative analysis method for XRF soil heavy metal elements, and belongs to the field of X-ray fluorescence spectrum analysis. Denoising an obtained X fluorescence spectrum sample by utilizing wavelet transformation, and performing background subtraction based on an asymmetric weighted punishment least square method (arPLS); extracting characteristic peaks of heavy metal elements and characteristic peak information of elements with related matrix effects and spectral line interference, and performing Compton normalization processing to obtain component information; constructing characteristic component information selection models of different heavy metal elements through CARS algorithm; and finally, respectively establishing a soil heavy metal quantitative inversion model based on characteristic components by adopting a Particle Swarm Optimization (PSO) optimized SVR, taking the characteristic components selected by the CARS algorithm as input, taking the actual content of the heavy metal element to be analyzed as output, and realizing the accurate quantitative analysis of the heavy metal element in the soil.
When the XRF is adopted to analyze the soil heavy metal elements, the relevant heavy metal elements contained in the corresponding soil are identified based on the reflection conditions of the corresponding soil, but when certain areas exist in the relevant heavy metal elements with larger attribute differences, the corresponding secondary reflection lines are deviated, the accuracy of the data is caused, and the analysis effect of the soil heavy metal elements is poor.
Disclosure of Invention
Aiming at the defects of the prior art, the invention provides an XRF soil heavy metal element analysis system, which solves the problem that when related heavy metal elements with larger attribute differences exist, the corresponding secondary reflection lines are deviated.
In order to achieve the above purpose, the invention is realized by the following technical scheme: an XRF soil heavy metal element analysis system, comprising:
the data inspection end, based on the reflected light data generated in the detection process, determines the transmitting angle data of the transmitter and the receiving angle data received by the transmitter, so as to determine the corresponding reflective crystal of the corresponding reflected line, and determine the wavelength ranges of different areas of the reflective crystal, comprising:
setting a checking direction and a checking route, wherein the checking direction and the checking route are respectively drawn in advance by an operator, and controlling a transmitter to test soil test products in sequence;
Determining an intersection point of the X-ray emitted by the emitter and the test article based on a specific emitting direction of the X-ray emitted by the emitter, determining an angle value A1 between the X-ray emitted by the emitter and the test article, and constructing a group of primary reflection lines which are mirror images of the X-ray emitted based on the angle value A1, wherein an included angle between the primary reflection lines and the test article is A1, and the initial point intersection point of the primary reflection lines;
Locking the source direction of the secondary reflection line based on the secondary reflection line received by the receiver and the receiving angle, reversely extending the secondary reflection line in the source direction, determining the intersection point of the primary reflection line and the reversely extended secondary reflection line, determining the crystal of the intersection point, and determining the wavelength range of the corresponding region;
The sample calibration end is used for dividing and calibrating different areas based on different wavelength ranges of the different areas after the test product is completely inspected, calibrating related areas belonging to the same type of wavelength ranges as the same type of areas, and transmitting a calibrated sample partition map into the superposition area locking end;
The overlapping region locking end is used for determining whether multiple calibrations exist in the same region or not based on the sample partition map after the calibration processing, calibrating the same region as an abnormal region, executing a processing center if the multiple calibrations exist, analyzing and processing the abnormal region again, and directly displaying the sample partition map if the multiple calibrations do not exist;
The processing center is used for analyzing and processing the determined abnormal region, preferentially determining whether the secondary X-ray generated by the abnormal region has a regular waveform, and then determining the waveform direction of the corresponding secondary X-ray to determine the belonging range of the corresponding secondary X-ray, wherein the specific execution end comprises:
the regular wave analysis unit determines secondary X-ray data corresponding to the abnormal area received by the receiver based on the reflected light ray data, determines a relevant waveform of the secondary X-ray, analyzes the relevant waveform, and judges whether a regular waveform exists in the relevant waveform, and the regular wave analysis unit comprises the following steps:
determining a plurality of associated convex points appearing on the related waveform, wherein the front and rear line segments of the associated convex points have opposite trend, and the initial point of the related waveform is a first group of associated convex points;
sequentially calibrating the determined plurality of association convex points in the related waveform, determining a line segment between the first group of association convex points and the third group of association convex points as a reference line segment according to the specific extending direction of the waveform, and identifying whether a coincident line segment exists in the follow-up sequence of the reference line segment:
If the standard line segment exists, the standard line segment is marked as a regular waveform, and a complete regular waveform diagram is generated according to the regular waveform;
If not, taking the line segments from the third group of association convex points to the fifth group of association convex points as reference line segments;
And according to the same way, whether a coincident line segment which is completely coincident with a reference line segment exists in the follow-up process is identified, if yes, a corresponding regular waveform diagram is determined, if not, a fifth group of associated convex points are used for sequentially extending and processing backwards until the corresponding regular waveform diagram is determined, the determined regular waveform diagram is transmitted to a wavelength determining unit, and if no regular waveform exists, the related waveform is directly transmitted to a wavelength assignment analysis unit;
The wavelength determining unit is used for identifying the wavelength of the regular waveform diagram based on the determined regular waveform diagram, randomly determining a group of point positions corresponding to the regular waveform diagram, determining a first group of point positions which are completely overlapped with the point positions, recording the length value between the two point positions, calibrating the length value as the wavelength of the regular waveform diagram, determining the belonging partition of the abnormal region according to the wavelength range determined in the original judging process, and recalibrating.
The wavelength assignment analysis unit is used for determining the wave point distance generated between the related waveform segments based on the internal waveform trend of the related waveform, assigning values based on the numerical variation of the wave point distances, determining the wavelength of the related waveform based on the assignment sequence generated by the related waveform, and redetermining the belonging subarea; comprising the following steps:
Reconfirming the association convex points determined in the related waveforms, calibrating the association convex points with even position ordering as convex points to be processed, sequentially determining the horizontal intervals J i of the wave points between the adjacent convex points to be processed from front to back, wherein i represents line segments between different convex points to be processed, and ordering a plurality of groups J i according to the sequence of the horizontal intervals J i to generate an interval ordering sequence;
Assigning values according to J i values at different positions in the interval sorting sequence, assigning 1 when the next bit J i appearing continuously is larger than the previous bit J i, assigning 0 when the next bit J i appearing continuously is smaller than the previous bit J i, assigning 2 when the J i corresponding to the different positions of the two are equal, and determining an assignment sequence of the interval sorting sequence according to an assignment rule;
based on the determined assignment sequence, the duty ratio of the value 0 to the value 1 is identified, if the duty ratio of the value 0 is the largest, a group of values with the largest horizontal distance J i are determined from the related waveforms and used as the wavelength of the related waveforms, the belonging subareas of the abnormal area are determined according to the wavelength range determined in the original judging process, and the subareas are recalibrated;
if the value 1 is the largest, a group of values with the smallest horizontal distance J i are determined from the related waveforms in a manner opposite to the determination of the value 0 and used as the wavelengths of the related waveforms, and the belonging subareas of the abnormal area are determined according to the wavelength range determined in the original determination process and are recalibrated;
if the duty ratio of the value 0to the value 1 is the same, an error signal is directly generated and displayed in an external display end, and an operator intervenes to process and identify the wavelength of the related waveform.
The invention provides an XRF soil heavy metal element analysis system. Compared with the prior art, the method has the following beneficial effects:
According to the invention, by arranging different crystal layers, reflected X-rays with different wavelengths are classified, different heavy metal areas in soil are divided and calibrated, and the classification treatment mode is more convenient and has higher treatment efficiency, so that a better soil heavy metal classification effect can be achieved;
Subsequently, aiming at the abnormal areas with repeated calibration, the secondary X-rays generated by the abnormal areas are preferentially analyzed to determine whether the corresponding ray waveforms have regular waveforms or not, the corresponding wavelengths are determined based on the relevant changes of the regular waveforms, the partition to which the secondary X-rays belong is determined, if the regular waveforms do not appear, the change condition of the waveforms is analyzed to determine the corresponding waveforms generated by the relevant heavy metals with the largest proportion of the abnormal areas, and therefore the corresponding wavelengths are determined, the final partition to which the secondary X-rays belong is determined, the overall element analysis effect of the heavy metals is guaranteed, the accuracy is guaranteed, and therefore better processing effects are achieved.
Drawings
FIG. 1 is a schematic diagram of a principal frame of the present invention;
FIG. 2 is a schematic diagram of a soil sample testing of the present invention;
Reference numerals: 1. a transmitter; 2. a test article; 3. a reflective crystal layer; 4. a receiver;
101. A data checking end; 102. a sample calibration end; 103. a locking end of the overlapping region; 104. a processing center; 1041. a regular wave analysis unit; 1042. a wavelength assignment analysis unit; 1043. a wavelength determination unit.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Example 1
Referring to fig. 1 and 2, the present application provides an XRF soil heavy metal element analysis system, which includes a data inspection end 101, a sample calibration end 102, a coincidence zone locking end 103, and a processing center 104, wherein the data inspection end 101, the sample calibration end 102, the coincidence zone locking end 103, and the processing center 104 are electrically connected in sequence from an output node to an input node;
The processing center 104 includes a regular wave analysis unit 1041, a wavelength assignment analysis unit 1042, and a wavelength determination unit 1043, where the regular wave analysis unit 1041 and the wavelength assignment analysis unit 1042 are electrically connected to an input node of the wavelength determination unit 1043, and the regular wave analysis unit 1041 is electrically connected to an input node of the wavelength assignment analysis unit 1042;
referring to fig. 2, when detecting heavy metals in soil, the emitter 1 emits corresponding detected X-rays preferentially, electrons in the soil test article 2 change after the X-rays are emitted into the soil test article 2, the corresponding change process can generate reflected X-rays with different wavelengths, the reflected X-rays are received by the receiver 4 after being reflected by the reflective crystal layer 3, the reflective crystal layer 3 comprises a plurality of groups of different crystals, the different crystals can reflect the X-rays with different wavelengths, and the reflective crystal layer comprises 80 groups of wavelengths of related reflection lines generated by heavy metals;
The data inspection end 101 determines, based on reflected light data generated in the detection process, emission angle data of the emitter 1 and receiving angle data received by the emitter, so as to determine the reflective crystal corresponding to the reflected light, determine the wavelength range of the reflective crystal, and partition different areas in the soil test article 2, where the specific manner of partitioning includes:
setting a checking direction and a checking route, wherein the checking direction and the checking route are respectively drawn in advance by an operator, and controlling the transmitter 1 to sequentially test the soil test article 2;
determining an intersection point of the X-ray emitted by the emitter 1 and the test article 2 based on a specific emitting direction of the X-ray, determining an angle value A1 between the X-ray emitted by the emitter and the test article 2, and constructing a group of primary reflection lines which are mirror images of the X-ray emitted based on the angle value A1, wherein an included angle between the primary reflection lines and the test article 2 is also A1, and the initial point intersection point of the primary reflection lines;
Based on the secondary reflection line received by the receiver 4, locking the source direction of the secondary reflection line based on the receiving angle, reversely extending the secondary reflection line in the source direction, determining the intersection point of the primary reflection line and the reversely extending secondary reflection line, determining the affiliated crystal (representing the reflection occurring on the surface of the corresponding crystal) of the intersection point, determining the affiliated wavelength range of the corresponding area, specifically, the different crystals in the reflective crystal layer 3 correspond to the different wavelength ranges, and the crystals of different materials are combined into the corresponding crystal layer to determine the relevant wavelength of the corresponding X-ray because the penetrating power of the X-ray of different wavelengths is different, wherein the specific number or specific attribute of the reflective crystal layer 3 is set in advance by an operator according to the relevant experience of individuals.
After the test article 2 is completely inspected, the sample calibration end 102 divides and calibrates different areas based on different wavelength ranges of the different areas, calibrates related areas belonging to the same type of wavelength ranges into the same type of areas, and transmits a calibrated sample partition map to the superposition area locking end 103, wherein the different areas are all irregular areas, and sequentially divides and calibrates the corresponding areas based on wavelength feedback results of corresponding points;
The overlapping area locking end 103 determines whether multiple calibrations exist in the same area based on the sample partition map after the calibration processing, and calibrates the same area into an abnormal area, if so, the processing center 104 performs analysis processing on the abnormal area again, if not, the sample partition map is directly displayed for an external related person to check, specifically, the multiple calibrations represent that the wavelength generated by the corresponding related area is changed, so that the wavelength range to which the corresponding related area belongs is also changed, errors occur in element analysis results, and the situation occurs that the corresponding area contains heavy metals with relatively large differences of related attributes, so that the corresponding wavelength generated by the corresponding area is affected by the correlation, and thus the situation that multiple calibrations occur, wherein the related attributes can be density, for example: when the related heavy metal with high density or low density is stimulated by X rays, electrons in the nuclei move outwards, and the external electrons move inwards to the nuclei to generate secondary X rays, so that mutual interference is caused based on inconsistent wavelengths of the corresponding secondary X rays, and corresponding deviation is caused in regional calibration;
In order to achieve a more accurate analysis effect of heavy metal elements, the specific belonging range of the corresponding abnormal region is determined by executing the related processing center 104 (the processing is performed here to lock the belonging range of the corresponding abnormal region according to the maximum content of heavy metal in the corresponding region);
the processing center 104 analyzes and processes the determined abnormal area, preferentially determines whether the secondary X-ray generated by the abnormal area has a regular waveform, and then determines the waveform direction of the corresponding secondary X-ray to determine the range of the corresponding secondary X-ray, wherein the specific execution ends are as follows:
The regular wave analysis unit 1041 determines, based on the reflected light data, secondary X-ray (i.e., secondary reflection line) data received by the corresponding receiver 4 in the abnormal region, determines a correlation waveform of the secondary X-ray thereof, analyzes the correlation waveform, and determines whether a regular waveform exists in the correlation waveform (if a regular waveform exists, the original unaffected waveform can be restored based on the regular waveform, so that the wavelength thereof can be determined, and the actual belonging range of the abnormal region can be locked based on the wavelength thereof for performing the precise calibration), which specifically includes:
determining a plurality of association convex points appearing on the related waveform, wherein the front and rear line segments of the association convex points have opposite trend (namely, when one end line segment ascends to the vertex, the downward descending condition appears, then the corresponding vertex is a group of association convex points, when the corresponding vertex descends to the lowest point, the ascending condition appears, then the lowest point is a group of association convex points, the association convex points can be understood as inflection points of the corresponding line segment, and the initial point of the related waveform is a first group of association convex points;
Sequentially calibrating the determined multiple association convex points in the related waveform, determining the line segments between the first group of association convex points and the third group of association convex points as reference line segments according to the specific extending direction (namely the specific trend) of the waveform, identifying whether the corresponding reference line segments exist subsequently, calibrating the reference line segments as regular waveforms according to the regular waveforms, generating a complete regular waveform graph of the reference line segments, if not, using the line segments between the third group of association convex points and the fifth group of association convex points as the reference line segments, identifying whether the corresponding regular waveform graphs completely coincide with the reference line segments subsequently in the same manner, if not, sequentially extending the corresponding regular waveform graphs by the fifth group of association convex points until the corresponding regular waveform graphs are determined, stopping the transmission of the determined regular waveform graphs to the wavelength determining unit 1043, and directly transmitting the related waveforms to the wavelength assignment analyzing unit 1042 if the regular waveforms do not exist;
specifically, after the corresponding secondary X-ray is generated and interfered by the corresponding interference term, the original regular waveform is changed, if the corresponding regular waveform which is not interfered is still present in the secondary X-ray, the waveform reduction can be performed based on the regular waveform to determine the regular waveform diagram of the corresponding area, for example, when the quadratic equation corresponding to one group of segments is y=kx 2 +b and the other waveform segments appearing subsequently also have one group of quadratic equations which are y=kx 2 +b, the corresponding regular waveform diagram is determined by representing the corresponding line segment and identifying whether the corresponding line segment appears completely in the horizontal translation process by adopting a line segment horizontal translation mode.
The wavelength assignment analysis unit 1042 determines the inter-wavelength point distances generated between the related waveform segments based on the trend of the internal waveform of the related waveform, performs assignment based on the numerical variation of the inter-wavelength point distances, and determines the wavelength of the related waveform based on the assignment sequence generated by the related waveform, where the specific manner of determining the wavelength includes:
Identifying the related bumps determined in the related waveforms again, calibrating the related bumps with even position sequences as bumps to be processed (namely, positions of the related bumps are ordered as 2, 4, 6, … …, and the like, wherein the initial points of the related bumps are a first group of related bumps, the related bumps belong to the same type of bumps between a second group of related bumps and a fourth group of related bumps, the wavelength of the corresponding points can be determined, namely, the wave point spacing of the related bumps can be determined, the wave point spacing of the second group of related bumps can be determined between the fourth group of related bumps and the sixth group of related bumps, and the like, sequentially identifying a plurality of groups of wave point spacing appearing subsequently, sequentially determining the wave point horizontal spacing J i between adjacent bumps to be processed from front to back, wherein i represents line segments between different bumps to be processed (if the related bumps do not belong to one horizontal line, the horizontal spacing between the point and the corresponding base plane is determined by establishing a base plane mode, so as to determine the corresponding J i), and sequentially identifying a plurality of groups of J i according to the sequential relation of the horizontal spacing J i, so as to generate a spacing sequence;
The assignment is performed according to the values of J i at different positions in the pitch sequence, when the next bit J i appearing continuously is greater than the previous bit J i, the assignment is 1, when the next bit J i appearing continuously is less than the previous bit J i, the assignment is 0, and if the J i corresponding to the different positions are equal, the assignment is 2, and according to the assignment rule, the assignment sequence of the pitch sequence is determined, for example: the resulting pitch ordering sequence is: 8. 7, 6, 6.5, 4, 3, 2, then according to the present assignment, the resulting corresponding assignment is 8-7 to 0,7-6 to 0,6-6.5 to 1,6.5-4 to 0,4-3 to 0,3-3 to 2,3-2 to 0, then the sequence of assignments is 0010020;
Based on the determined assignment sequence, identifying the duty ratio of the numerical value 0 and the numerical value 1, if the duty ratio of the numerical value 0 is the largest (the duty ratio is the largest in assignment 0010020, and the duty ratio is five seventy percent), the wavelength representing the relevant waveform gradually becomes smaller, the waveform of the wavelength is influenced by the relevant waveform with small wavelength, a group of numerical values with the largest horizontal distance J i is determined from the relevant waveform and is used as the wavelength of the relevant waveform, and the belonging subarea of the abnormal area is determined according to the wavelength range determined in the original determination process and is recalibrated;
If the value 1 is the largest, the wavelength representing the relevant waveform is gradually increased in a manner opposite to the determination manner of the value 0, the waveform affecting the wavelength is the relevant waveform with large wavelength, a group of values with the smallest horizontal distance J i is determined from the relevant waveform as the wavelength of the relevant waveform, the belonging subarea of the abnormal area is determined according to the wavelength range determined in the original determination process, and recalibration is performed;
if the duty ratio of the value 0to the value 1 is the same, an error signal is directly generated and displayed in an external display end, and an operator intervenes to process and identify the wavelength of the related waveform.
Specifically, the corresponding influence process can be locked by analyzing the specific change process of the corresponding related waveforms, when the influence is small and large, the wavelength of the corresponding influence process is definitely shortened gradually, when the influence is small and the wavelength of the corresponding influence is definitely lengthened gradually, the waveform influence has a corresponding rule, so that the corresponding waveform generated by the related heavy metal with the largest proportion of the abnormal area can be determined, the corresponding wavelength is determined, the final affiliated subarea is determined, the overall element analysis effect of the heavy metal is ensured, the accuracy is ensured, and the better treatment effect is achieved.
The wavelength determining unit 1043 identifies the wavelength of the regular waveform chart based on the determined regular waveform chart, randomly determines a group of points corresponding to the regular waveform chart, determines a first group of points which are completely overlapped with the point, records a length value between the two points, calibrates the length value as the wavelength of the regular waveform chart, determines the belonging partition of the abnormal area according to the wavelength range determined in the original determination process, and recalibrates the partition.
Some of the data in the above formulas are numerical calculated by removing their dimensionality, and the contents not described in detail in the present specification are all well known in the prior art.
The above embodiments are only for illustrating the technical method of the present invention and not for limiting the same, and it should be understood by those skilled in the art that the technical method of the present invention may be modified or substituted without departing from the spirit and scope of the technical method of the present invention.
Claims (3)
1. An XRF soil heavy metal element analysis system, comprising:
The data checking terminal is used for determining the transmitting angle data of the transmitter and receiving the receiving angle data received by the transmitter based on the reflected light data generated in the detection process, so as to determine the reflecting crystal of the corresponding reflected line and determine the wavelength ranges of different areas of the reflecting crystal;
The sample calibration end is used for dividing and calibrating different areas based on different wavelength ranges of the different areas after the test product is completely inspected, calibrating related areas belonging to the same type of wavelength ranges as the same type of areas, and transmitting a calibrated sample partition map into the superposition area locking end;
The overlapping region locking end is used for determining whether multiple calibrations exist in the same region or not based on the sample partition map after the calibration processing, calibrating the same region as an abnormal region, executing a processing center if the multiple calibrations exist, analyzing and processing the abnormal region again, and directly displaying the sample partition map if the multiple calibrations do not exist;
The processing center is used for analyzing and processing the determined abnormal region, preferentially determining whether the secondary X-ray generated by the abnormal region has a regular waveform, and then determining the waveform direction of the corresponding secondary X-ray to determine the belonging range of the corresponding secondary X-ray, wherein the specific execution end comprises:
the regular wave analysis unit determines secondary X-ray data corresponding to the abnormal area received by the receiver based on the reflected light ray data, determines a relevant waveform of the secondary X-ray, analyzes the relevant waveform, and judges whether a regular waveform exists in the relevant waveform, and the regular wave analysis unit comprises the following steps:
determining a plurality of associated convex points appearing on the related waveform, wherein the front and rear line segments of the associated convex points have opposite trend, and the initial point of the related waveform is a first group of associated convex points;
sequentially calibrating the determined plurality of association convex points in the related waveform, determining a line segment between the first group of association convex points and the third group of association convex points as a reference line segment according to the specific extending direction of the waveform, and identifying whether a coincident line segment exists in the follow-up sequence of the reference line segment:
If the standard line segment exists, the standard line segment is marked as a regular waveform, and a complete regular waveform diagram is generated according to the regular waveform;
If not, taking the line segments from the third group of association convex points to the fifth group of association convex points as reference line segments;
And according to the same way, whether a coincident line segment which is completely coincident with a reference line segment exists in the follow-up process is identified, if yes, a corresponding regular waveform diagram is determined, if not, a fifth group of associated convex points are used for sequentially extending and processing backwards until the corresponding regular waveform diagram is determined, the determined regular waveform diagram is transmitted to a wavelength determining unit, and if no regular waveform exists, the related waveform is directly transmitted to a wavelength assignment analysis unit;
The wavelength assignment analysis unit determines the wave point distance generated between the relevant wave segments based on the internal wave trend of the relevant wave, assigns values based on the numerical variation of a plurality of wave point distances, determines the wavelength of the relevant wave based on the assignment sequence generated by the relevant wave, and redetermines the belonging subarea, and comprises the following steps:
Reconfirming the association convex points determined in the related waveforms, calibrating the association convex points with even position ordering as convex points to be processed, sequentially determining the horizontal intervals J i of the wave points between the adjacent convex points to be processed from front to back, wherein i represents line segments between different convex points to be processed, and ordering a plurality of groups J i according to the sequence of the horizontal intervals J i to generate an interval ordering sequence;
Assigning values according to J i values at different positions in the interval sorting sequence, assigning 1 when the next bit J i appearing continuously is larger than the previous bit J i, assigning 0 when the next bit J i appearing continuously is smaller than the previous bit J i, assigning 2 when the J i corresponding to the different positions of the two are equal, and determining an assignment sequence of the interval sorting sequence according to an assignment rule;
based on the determined assignment sequence, the duty ratio of the value 0 to the value 1 is identified, if the duty ratio of the value 0 is the largest, a group of values with the largest horizontal distance J i are determined from the related waveforms and used as the wavelength of the related waveforms, the belonging subareas of the abnormal area are determined according to the wavelength range determined in the original judging process, and the subareas are recalibrated;
if the value 1 is the largest, a group of values with the smallest horizontal distance J i are determined from the related waveforms in a manner opposite to the determination of the value 0 and used as the wavelengths of the related waveforms, and the belonging subareas of the abnormal area are determined according to the wavelength range determined in the original determination process and are recalibrated;
if the duty ratio of the value 0to the value 1 is the same, an error signal is directly generated and displayed in an external display end, and an operator intervenes to process and identify the wavelength of the related waveform.
2. The XRF soil heavy metal analysis system of claim 1, wherein the data inspection end determines wavelength ranges of different regions thereof in a specific manner comprising:
setting a checking direction and a checking route, wherein the checking direction and the checking route are respectively drawn in advance by an operator, and controlling a transmitter to test soil test products in sequence;
Determining an intersection point of the X-ray emitted by the emitter and the test article based on a specific emitting direction of the X-ray emitted by the emitter, determining an angle value A1 between the X-ray emitted by the emitter and the test article, and constructing a group of primary reflection lines which are mirror images of the X-ray emitted based on the angle value A1, wherein an included angle between the primary reflection lines and the test article is A1, and the initial point intersection point of the primary reflection lines;
Based on the secondary reflection line received by the receiver, locking the source direction of the secondary reflection line based on the receiving angle, reversely extending the secondary reflection line in the source direction, determining the intersection point of the primary reflection line and the reversely extending secondary reflection line, determining the crystal of the intersection point, and determining the wavelength range of the corresponding region.
3. The XRF soil heavy metal element analysis system according to claim 1, wherein the wavelength determining unit identifies the wavelength of the regular waveform diagram based on the determined regular waveform diagram, randomly determines a group of points corresponding to the regular waveform diagram, determines a first group of points which are completely coincident with the point, records a length value between the two points, marks the length value as the wavelength of the regular waveform diagram, determines the belonging partition of the abnormal region according to the wavelength range determined in the original determination process, and recalibrates the partition.
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