CN118102781A - Display panel - Google Patents

Abstract

The application provides a display panel. The display panel comprises a driving substrate, a first electrode layer, a pixel definition layer, a conductive isolation structure and a hole function layer. The pixel definition layer has a single-layer structure; or a multi-layer structure of two layers and more than two layers; the pixel definition layer is provided with a notch, the hole function layer is separated at the notch position of the pixel definition layer, so that the hole function layer is separated into a first hole function layer and a second hole function layer, the first hole function layer is closer to the conductive isolation structure than the second hole function layer, the first hole function layer is not in direct contact with the anode electrode, and the second hole function layer is in direct contact with the anode electrode. The display panel cuts off the hole function layer through the pixel definition layers with different structures of the cut, so that the first hole function layer is not in direct contact with the anode electrode, the situation that the function layer contacts with the conductive part of the conductive isolation structure during evaporation is avoided, the occurrence of short circuit phenomenon is reduced, and the evaporation angle of the hole function layer is not required to be controlled by the conductive isolation structure.

Description

Display panel

Technical Field

The invention relates to the technical field of display, in particular to a display panel.

Background

When the conventional display panel adopts a conductive isolation structure, the cathode electrode needs to be interconnected through a conductive part contacting the conductive isolation structure, in this case, in order to avoid the phenomenon that the hole transport layer is directly and electrically connected with the cathode electrode through the conductive part to cause short circuit when the hole transport layer contacts the conductive part of the conductive isolation structure during evaporation, the evaporation angles of the hole transport layer, the light emitting layer and the cathode electrode need to be controlled; wherein the hole transport layer cannot contact the conductive portion of the conductive isolation structure.

In the prior art, the different evaporation angles of the hole transport layer, the light emitting layer and the cathode electrode are required, and high requirements are set for the stability and uniformity of the conductive isolation structure; the conductive isolation structure needs to meet the precision requirement of three layers of evaporation angles, so that the control difficulty of the evaporation angles of the hole transport layer is high, and the process difficulty is increased; at the same time, the evaporation angle of the hole transport layer needs to be small, and the material utilization rate is low for expensive organic materials.

Disclosure of Invention

The application provides a display panel, which mainly solves the technical problems that the prior display panel needs to control a cavity functional layer through a conductive isolation structure, so that the process difficulty is increased, the evaporation angle of the cavity functional layer is small, and the material utilization rate is low for expensive organic materials.

In order to solve the technical problem, the application provides a display panel, which comprises:

A driving substrate;

The first electrode layer is arranged on one side surface of the driving substrate and comprises a plurality of anode electrodes arranged at intervals;

a pixel defining layer disposed on one side of the driving substrate, the pixel defining layer having a plurality of openings exposing the anode electrode;

The conductive isolation structure is arranged on the pixel definition layer and surrounds one side of the opening, which is far away from the driving substrate;

The cavity functional layer is arranged in the opening and partially extends to one side surface of the pixel definition layer away from the driving substrate;

the pixel definition layer is of a single-layer structure; or alternatively, the first and second heat exchangers may be,

The pixel definition layer is a multi-layer structure with two layers and more than two layers;

The pixel definition layer is provided with a notch, the hole function layer is separated at the notch position of the pixel definition layer, so that the hole function layer is separated into a first hole function layer and a second hole function layer, the first hole function layer is closer to the conductive isolation structure than the second hole function layer, the first hole function layer is not in direct contact with the anode electrode, and the second hole function layer is in direct contact with the anode electrode.

When the pixel definition layer is of a two-layer structure, the pixel definition layer comprises a first definition layer and a second definition layer which are sequentially stacked; the notch is arranged on the same layer as the second defining layer and corresponds to the edge of one side surface of the first defining layer away from the driving substrate;

When the pixel definition layer is of a three-layer structure, the pixel definition layer comprises a first definition layer, a second definition layer and a third definition layer which are sequentially stacked; the notch is arranged on the same layer as the second defining layer, corresponds to the edge of one side surface of the first defining layer far away from the driving substrate, and corresponds to the edge of one side surface of the third defining layer close to the driving substrate;

When the pixel definition layer is of a two-layer structure or a three-layer structure, the hole function layer is separated at the position of the second definition layer into the first hole function layer and the second hole function layer.

When the pixel definition layer is of a two-layer structure or a three-layer structure, the cross section of the second definition layer is rectangular or inverted trapezoid.

When the pixel definition layer is of a two-layer structure, the material of the first definition layer is different from the material of the second definition layer;

when the pixel definition layer is of a three-layer structure, the materials of the first definition layer, the second definition layer and the third definition layer are different; or alternatively, the first and second heat exchangers may be,

The material of the first defining layer is the same as that of the third defining layer, and the material of the second defining layer is different from that of the first defining layer and the third defining layer.

When the pixel definition layer is of a two-layer structure, the length of one side surface of the second definition layer, which is close to the driving substrate, is smaller than that of one side surface of the first definition layer, which is far away from the driving substrate;

When the pixel definition layer is of a three-layer structure, the length of one side surface of the second definition layer, which is far away from the driving substrate, is smaller than that of one side surface of the third definition layer, which is close to the driving substrate, and the length of one side surface of the second definition layer, which is close to the driving substrate, is smaller than that of one side surface of the first definition layer, which is far away from the driving substrate.

When the pixel definition layer is of a two-layer structure, the evaporation angle of the hole function layer is smaller than an angle formed between an edge connecting line between the bottom edge of the first definition layer and the top edge of the second definition layer and a straight line perpendicular to the display panel;

the evaporation angle of the hole functional layer is larger than fifty degrees;

when the pixel definition layer is of a three-layer structure, the evaporation angle of the hole function layer is smaller than an angle formed between an edge connecting line between the bottom edge of the first definition layer and the top edge of the third definition layer and a straight line perpendicular to the display panel;

Wherein an angle formed between an edge line of the first defining layer bottom and an edge line of the third defining layer top and a straight line perpendicular to the display panel is greater than fifty degrees.

When the pixel definition layer is of a three-layer structure or a multi-layer structure with more than three layers, the evaporation angle of the hole function layer is smaller than an angle formed between a connecting line of the edge of the bottom of the first definition layer and the edge of the bottom of the third definition layer and a straight line perpendicular to the display panel;

Wherein an angle formed between an edge of the first and third defining layer bottoms and a line perpendicular to the display panel is greater than fifty degrees.

The notch is positioned on one side of the pixel definition layer away from the driving substrate, and the hole function layer is separated into the first hole function layer and the second hole function layer at the position of the notch.

The orthographic projection of the notch on the driving substrate is positioned at the edge of the orthographic projection of the conductive isolation structure on the driving substrate and is not covered by the orthographic projection of the conductive isolation structure.

Wherein, the display panel still includes:

the light-emitting layer is arranged on one side of the first electrode layer, which is far away from the driving substrate;

The second electrode layer is arranged on one side of the light-emitting layer, which is far away from the driving substrate, and is in contact with and conducted with the conductive isolation structure part;

Wherein the hole function layer comprises a hole transport layer and a hole injection layer;

When the pixel defining layer has a multi-layer structure of two or more layers, the thickness of the second defining layer is smaller than the sum of the thicknesses of the light emitting layer and the hole transporting layer, and the thickness of the second defining layer is larger than the thickness of the hole transporting layer.

The application provides a display panel. The display panel includes a driving substrate; the first electrode layer is arranged on one side surface of the driving substrate and comprises a plurality of anode electrodes which are arranged at intervals; the pixel definition layer is arranged on one side of the driving substrate and provided with a plurality of openings, and the openings expose the anode electrode; the conductive isolation structure is arranged on the pixel definition layer and surrounds one side of the opening, which is far away from the driving substrate; the cavity functional layer is arranged in the opening and extends to one side surface of the pixel defining layer away from the driving substrate; the pixel definition layer has a single-layer structure; or the pixel definition layer is a multi-layer structure with two or more layers; the pixel definition layer is provided with a notch, the hole function layer is separated at the notch position of the pixel definition layer, so that the hole function layer is separated into a first hole function layer and a second hole function layer, the first hole function layer is closer to the conductive isolation structure than the second hole function layer, the first hole function layer is not in direct contact with the anode electrode, and the second hole function layer is in direct contact with the anode electrode. The display panel cuts off the hole function layer through the pixel definition layers with different cut structures, so that the first hole function layer is not in direct contact with the anode electrode, the situation that the function layer contacts with the conductive part of the conductive isolation structure during evaporation is avoided, the probability of occurrence of a short circuit phenomenon is reduced, the evaporation angle of the hole function layer is not required to be controlled by the conductive isolation structure, the utilization rate of materials is improved, the difficulty of a process is reduced, and the stability of preparation is improved.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for the description of the embodiments will be briefly described below, and it is apparent that the drawings in the following description are only some embodiments of the present application, and other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.

Fig. 1 is a schematic diagram of a specific structure of a display panel according to an embodiment of the application;

FIG. 2 is a simplified diagram of a portion of a display panel with a pixel definition layer having a two-layer structure according to an embodiment of the present application;

FIG. 3 is a simplified illustration of the shapes of the first and second bounding layers of FIG. 2;

FIG. 4 is a schematic illustration of vapor deposition shading at the opening of FIG. 2;

FIG. 5 is a simplified illustration of the shapes of the first, second, and third layers of FIG. 1;

FIG. 6 is a schematic diagram of the vapor deposition shadow formed at the opening of FIG. 1;

FIG. 7 is a simplified diagram of a portion of a display panel with a cutout on a side of a pixel defining layer away from a driving substrate according to an embodiment of the present application;

fig. 8 is a schematic top view of a pixel defining layer provided with a cutout on a side away from a driving substrate according to an embodiment of the present application.

Reference numerals illustrate:

10-driving a substrate; 20-a first electrode layer; 21-an anode electrode; 30-a pixel definition layer; 30 a-opening; 31-a first defined layer; 32-a second defined layer; 33-a third defined layer; 40-conductive isolation structures; 41-conductive parts; 42-top; 50-a hole functional layer; 50 a-a first hole-functional layer; 50 b-a second hole-functional layer; 60-a light emitting layer; 70-a second electrode layer; 80-an organic barrier layer; 90-evaporating shadows; 100-a display panel; x-cuts; y-subpixels; z-evaporation angle.

Detailed Description

The following description of the embodiments of the present application will be made clearly and fully with reference to the accompanying drawings, in which it is evident that the embodiments described are only some, but not all embodiments of the application. All other embodiments, which can be made by those skilled in the art based on the embodiments of the application without making any inventive effort, are intended to be within the scope of the application.

In the following description, for purposes of explanation and not limitation, specific details are set forth such as the particular system architecture, interfaces, techniques, etc., in order to provide a thorough understanding of the present application.

The terms "first," "second," "third," and the like in this disclosure are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first", "a second", and "a third" may explicitly or implicitly include at least one such feature. In the description of the present application, the meaning of "plurality" means at least two, for example, two, three, etc., unless specifically defined otherwise. All directional indications (such as up, down, left, right, front, back … …) in the embodiments of the present application are merely used to explain the relative positional relationship, movement, etc. between the components in a particular gesture (as shown in the drawings), and if the particular gesture changes, the directional indication changes accordingly. Furthermore, the terms "comprise" and "have," as well as any variations thereof, are intended to cover a non-exclusive inclusion. For example, a process, method, system, article, or apparatus that comprises a list of steps or elements is not limited to only those listed steps or elements but may include other steps or elements not listed or inherent to such process, method, article, or apparatus.

Reference herein to "an embodiment" means that a particular feature, structure, or characteristic described in connection with the embodiment may be included in at least one embodiment of the application. The appearances of such phrases in various places in the specification are not necessarily all referring to the same embodiment, nor are separate or alternative embodiments mutually exclusive of other embodiments. Those of skill in the art will explicitly and implicitly appreciate that the embodiments described herein may be combined with other embodiments.

When the conventional display panel adopts a conductive isolation structure, the cathode electrode needs to be interconnected through a conductive part contacting the conductive isolation structure. In this case, in order to avoid the phenomenon that the hole functional layer contacts the conductive portion of the conductive isolation structure during vapor deposition, and causes a short circuit by directly and electrically connecting the hole functional layer with the cathode electrode through the conductive portion, lateral current may also occur between pixels, and the pixel of the partition wall is stolen to be bright, so that the vapor deposition angles of the hole functional layer, the light emitting layer and the cathode electrode need to be controlled; wherein the hole function layer cannot be in contact with the conductive portion of the conductive isolation structure.

In the prior art, different evaporation angles of a hole functional layer, a light-emitting layer and a cathode electrode are required, and high requirements are provided for stability and uniformity of a conductive isolation structure; the conductive isolation structure needs to meet the precision requirement of the three vapor deposition angles of the hole functional layer, the light-emitting layer and the cathode electrode, so that the control difficulty of the vapor deposition angle of the hole functional layer is high, and the process difficulty is increased; meanwhile, the evaporation angle of the hole functional layer needs to be small, and the material utilization rate is low for expensive organic materials. In order to solve these problems, a new Pixel Definition Layer (PDL) structure is designed, in which a notch, such as an undercut, is formed in the pixel definition layer by an etching process, and then a partition is formed in the hole function layer above the pixel definition layer at the undercut position, and the hole function layer is divided into a first hole function layer and a second hole function layer, so that the conductive isolation structure does not need to separately control the hole function layer, and the hole function layer in contact with the first electrode layer is not in direct contact with the conductive portion of the conductive isolation structure.

The application provides a display panel. The display panel includes a driving substrate; the first electrode layer is arranged on one side surface of the driving substrate and comprises a plurality of anode electrodes which are arranged at intervals; the pixel definition layer is arranged on one side of the driving substrate and provided with a plurality of openings, and the openings expose the anode electrode; the conductive isolation structure is arranged on the pixel definition layer and surrounds one side of the opening, which is far away from the driving substrate; the cavity functional layer is arranged in the opening and extends to one side surface of the pixel defining layer away from the driving substrate; the pixel definition layer has a single-layer structure; or the pixel definition layer is a multi-layer structure with two or more layers; the hole function layer is partitioned at a position of the pixel definition layer such that the hole function layer is partitioned into a first hole function layer and a second hole function layer in a direction parallel to a light-emitting surface of the display panel, the first hole function layer and the anode electrode are not in direct contact, and the second hole function layer and the anode electrode are in direct contact. According to the display panel, the hole function layers are separated through the pixel definition layers with different structures, the first hole function layer is not in direct contact with the anode electrode, and the second hole function layer is in direct contact with the anode electrode, so that the hole function layer is prevented from being in contact with the conductive part of the conductive isolation structure during evaporation, the contact of the hole function layer and the cathode electrode is further avoided, the probability of occurrence of a short circuit phenomenon is reduced, the evaporation angle of the hole function layer is not required to be controlled by the conductive isolation structure, the utilization rate of materials is improved, the difficulty of a process is reduced, and the stability of preparation is improved.

The present application will be described in detail with reference to the accompanying drawings and examples.

Referring to fig. 1, fig. 1 is a schematic diagram of a specific structure of a display panel according to an embodiment of the application. The application provides a display panel 100, wherein the display panel 100 comprises a driving substrate 10, a first electrode layer 20, a pixel defining layer 30, a conductive isolation structure 40 and a hole function layer 50. The driving substrate 10 is used for driving the light emitting layer 60 to emit light. The first electrode layer 20 is disposed on one side surface of the driving substrate 10, and includes a plurality of anode electrodes 21 disposed at intervals. The pixel defining layer 30 is disposed on one side of the driving substrate 10. The pixel defining layer 30 has a plurality of openings 30a, and the openings 30a expose the anode electrode 21. The conductive isolation structure 40 is disposed on the pixel defining layer 30 and surrounds a side of the opening 30a away from the driving substrate 10, and the conductive isolation structure 40 includes a conductive portion 41 and a top portion 42. The hole function layer 50 is disposed in the opening 30a, and extends partially to a side surface of the pixel defining layer 30 away from the driving substrate 10. The hole function layer 50 serves to increase the rate of transport of holes in the device so that the rate of hole transport balances the rate of electron transport.

The pixel defining layer 30 has a multi-layer structure of two or more layers; that is, the pixel defining layer 30 may have a two-layer structure, a three-layer structure, or a multi-layer structure of three or more layers. The pixel defining layer 30 has a cutout X, and the hole-function layer 50 is partitioned at the position of the cutout X of the pixel defining layer 30 such that the hole-function layer 50 is partitioned into a first hole-function layer 50a and a second hole-function layer 50b in a direction approximately parallel to the light-emitting surface of the display panel 100, the first hole-function layer 50a being closer to the conductive isolation structure 40 than the second hole-function layer 50b, the first hole-function layer 50a and the anode electrode 21 not being in direct contact, and the second hole-function layer 50b being in direct contact with the anode electrode 21. In a specific embodiment, the hole function layer 50 is blocked at the position of the notch X of the pixel definition layer 30, which means that an undercut is formed by an etching process at the position of the pixel definition layer 30 near the conductive isolation structure 40, and the hole function layer 50 causes a fault to be formed at the step structure of the undercut at the time of evaporation, thereby being separated into the first hole function layer 50a and the second hole function layer 50b.

It is understood that the first hole function layer 50a and the anode electrode 21 are not in direct contact means physically not in contact, but are electrically in contact. Further the above description can also be understood as structurally that the first hole function layer 50a is in direct contact with the conductive portion 41 of the conductive isolation structure 40, and the second hole function layer 50b is not in direct contact with the conductive portion 41 of the conductive isolation structure 40.

Referring further to fig. 1, the display panel 100 further includes a light emitting layer 60 and a second electrode layer 70. The light emitting layer 60 is disposed on a side of the first electrode layer 20 away from the driving substrate 10, i.e., the light emitting layer 60 is disposed in the opening 30 a. Specifically, the conductive isolation structure 40 separates the light emitting layers 60, avoiding the problem of crosstalk between pixels. The second electrode layer 70 is disposed on a side of the light emitting layer 60 away from the driving substrate 10, and is disposed in contact with and electrically connected to the conductive isolation structure 40. The second electrode layer 70 is a cathode electrode. The hole-functional layer 50 includes a hole-injecting layer (not shown) and a hole-transporting layer (not shown) that are sequentially stacked, or the hole-functional layer 50 may include only the hole-injecting layer. The hole injection layer is energy level matched with the first electrode layer 20 such that holes from the anode electrode 21 smoothly enter and are then transported to the light emitting layer 60 through the hole transport layer to enhance the injection and transport ability of electrons.

The second electrode layer 70 needs to be interconnected by contacting the conductive portion 41 of the conductive isolation structure 40 when the conductive isolation structure 40 is employed in the related art, but if the hole function layer 50 directly contacts the conductive portion 41 of the conductive isolation structure 40, a short circuit with the second electrode layer 70 may be caused. In the present application, the hole-function layer 50 is partitioned into the first hole-function layer 50a and the second hole-function layer 50b at the position of the pixel defining layer 30, so that the first hole-function layer 50a and the anode electrode 21 are not in direct contact, which means that the second hole-function layer 50b is not in direct contact with the conductive portion 41 of the conductive isolation structure 40 structurally.

The first hole functional layer 50a and the second hole functional layer 50b are separated, so that the first hole functional layer 50a is not in direct contact with the anode electrode 21 in the preparation process, namely, the second hole functional layer 50b is not worried about being in contact with the conductive part 41 of the conductive isolation structure 40, and the contact between the second hole functional layer 50b and the cathode electrode is further avoided, thereby reducing the occurrence probability of a short circuit phenomenon; meanwhile, compared with the prior art, the display panel 100 of the application does not need to control the evaporation angle of the hole function layer 50 by using the conductive isolation structure 40, thereby improving the utilization rate of materials, reducing the difficulty of the process and increasing the preparation stability of the display panel 100. The pixel definition layer 30 is mainly exemplified as a three-layer structure in fig. 1 of the present application.

Referring to fig. 2 to 4, fig. 2 is a schematic view of a portion of a display panel having a pixel defining layer with a two-layer structure according to an embodiment of the application, fig. 3 is a schematic view of a first defining layer and a second defining layer in fig. 2, and fig. 4 is a schematic view of forming vapor deposition shadows at an opening in fig. 2. The pixel defining layer 30 in this embodiment has a two-layer structure. When the pixel structure is a two-layer structure, the pixel defining layer 30 includes a first defining layer 31 and a second defining layer 32 stacked in order. With this structure, the hole function layer 50 is partitioned at the notch X position of the second definition layer 32 into the first hole function layer 50a and the second hole function layer 50b such that the first hole function layer 50a and the anode electrode 21 are not in direct contact, and the second hole function layer 50b is in direct contact with the anode electrode 21. The slit X of the second defining layer 32 is arranged in the same layer as the second defining layer 32 and corresponds to an edge of a side surface of the first defining layer 31 remote from the driving substrate 10. Wherein the first hole function layer 50a and the anode electrode 21 are not in direct contact, reducing the probability of occurrence of a short circuit phenomenon. In a specific embodiment, the material of the first defining layer 31 is different from the material of the second defining layer 32. Wherein the material of the first defining layer 31 is at least one of SiOx, siOxNx, siNx. The second defining layer 32 is made of at least one material SiOx, siOxNx, siNx. It should be understood that the material of the first defining layer 31 is different from the material of the second defining layer 32, which means that in the same embodiment, it is required to ensure that the material of the first defining layer 31 is different from the material of the second defining layer 32. In the actual manufacturing process, the material of the first defining layer 31 and the material of the second defining layer 32 are different. In the embodiment where the pixel defining layer 30 is two layers, the first defining layer 31 and the second defining layer 32 may be made of organic materials. For example, the first defining layer 31 is made of PI-based organic material or sub-gram-based organic material. The second defining layer 32 may be at least one of polyimide-based materials.

The length of the side surface of the second defining layer 32 near the driving substrate 10 is smaller than the length of the side surface of the first defining layer 31 far from the driving substrate 10, and the evaporation angle Z of the hole function layer 50 is required to be smaller than the angle formed between the edge of the bottom of the first defining layer 31 and the edge line of the top of the second defining layer 32 and the line perpendicular to the display panel 100. The arrangement is such that the hole function layer 50 is separated at the position of the second defining layer 32, so that the hole function layer 50 is separated into the first hole function layer 50a and the second hole function layer 50b in the direction parallel to the light-emitting surface of the display panel 100, otherwise, a vapor deposition shadow 90 (shadow) is formed at the opening 30a of the pixel defining layer 30, which results in a reduction of the area of the light-emitting surface of the display panel 100, and thus affects the display effect of the display panel 100. Specifically, the evaporation angle Z of the hole function layer 50 is greater than fifty degrees. For example, the vapor deposition angle Z of the hole function layer 50 may be 55 degrees, 60 degrees, 65 degrees, 70 degrees, 75 degrees, 80 degrees, or the like. In particular, the shape of the second delimiting layer 32 may be rectangular or inverted trapezoidal. It should be noted that the length of the side surface of the second defining layer 32 close to the driving substrate 10 in this embodiment is smaller than the length of the side surface of the first defining layer 31 away from the driving substrate 10, whether rectangular or inverted trapezoidal.

Wherein the thickness of the second defining layer 32 is smaller than the sum of the thicknesses of the light emitting layer 60 and the hole transport layer (refer to fig. 1), and the thickness of the second defining layer 32 is larger than the thickness of the hole transport layer. Specifically, the thickness of the second defined layer 32 is greater than 30 angstroms and less than 2600 angstroms. For example, the thickness of the second defining layer 32 in this embodiment may be 40, 100, 400, 800, 1200, 1600, 2000, 2400, etc. In a specific embodiment, if the light emitting layer 60 of the display panel 100 is a single layer, the thickness of the second defining layer 32 in the display panel 100 is smaller than the sum of the thicknesses of the hole transporting layers 60 (refer to fig. 1), and the thickness of the second defining layer 32 is larger than the thickness of the hole transporting layers; if the light emitting layer 60 is a plurality of layers, the thickness of the second defining layer 32 in the display panel 100 is less than the sum of the thicknesses of the light emitting layer 60 and the plurality of hole transporting layers, and the thickness of the second defining layer 32 is greater than the thickness of the plurality of hole transporting layers.

Referring to fig. 1, fig. 5, and fig. 6, fig. 1 is a schematic view of a portion of a display panel having a three-layer structure of a pixel defining layer according to an embodiment of the present application, fig. 5 is a schematic view of shapes of a first defining layer, a second defining layer, and a third defining layer in fig. 1, and fig. 6 is a schematic view of forming vapor deposition shadows at openings in fig. 1. The structure of the display panel 100 in this embodiment is substantially the same as that in the above-described embodiment, except that the pixel defining layer 30 in this embodiment has a three-layer structure. The pixel defining layer 30 includes a first defining layer 31, a second defining layer 32, and a third defining layer 33, which are sequentially stacked. Wherein the hole function layer 50 is partitioned at the notch X position of the second definition layer 32 into a first hole function layer 50a and a second hole function layer 50b such that the first hole function layer 50a and the anode electrode 21 are not in direct contact and the second hole function layer 50b is in direct contact with the anode electrode 21. The notch X of the second defining layer 32 is arranged in the same layer as the second defining layer 32, and corresponds to an edge of a side surface of the first defining layer 31 away from the driving substrate 10, and corresponds to an edge of a side surface of the third defining layer 33 close to the driving substrate 10. Wherein the first hole function layer 50a and the anode electrode 21 are not in direct contact, reducing the probability of occurrence of a short circuit phenomenon. In a specific embodiment, the materials of the first defining layer 31, the second defining layer 32 and the third defining layer 33 are different; or, the material of the first defining layer 31 is the same as that of the third defining layer 33, and the material of the second defining layer 32 is different from that of the first defining layer 31 and the third defining layer 33. It should be understood that in the actual manufacturing process, the material of the second defining layer 32 is only different from the material of the first defining layer 31 and the third defining layer 33. Specifically, the material of the first defining layer 31, the second defining layer 32, and the third defining layer 33 is at least one of SiOx, siOxNx, siNx. In the embodiment where the pixel defining layer 30 is three-layered, the materials of the first defining layer 31, the second defining layer 32 and the third defining layer 33 may be organic materials. For example, the first defining layer 31 is made of PI-based organic material or sub-gram-based organic material. The second and third defining layers 32 and 33 may be at least one of polyimide-based materials. It should be understood that the material of the second defining layer 32 is different from the material of the first defining layer 31 and the third defining layer 33, which means that in the same embodiment, it is required to ensure that the material of the second defining layer 32 is different from the material of the first defining layer 31 and the third defining layer 33.

The length of the side surface of the second defining layer 32 far from the driving substrate 10 is smaller than the length of the side surface of the third defining layer 33 near to the driving substrate 10, the length of the side surface of the second defining layer 32 near to the driving substrate 10 is smaller than the length of the side surface of the first defining layer 31 far from the driving substrate 10, and the evaporation angle Z of the hole function layer 50 is required to be smaller than the angle formed between the edge line of the bottom of the first defining layer 31 and the top of the third defining layer 33 and the straight line perpendicular to the display panel 100; the arrangement is such that the hole function layer 50 is separated at the position of the second defining layer 32, so that the hole function layer 50 is separated into the first hole function layer 50a and the second hole function layer 50b in the direction parallel to the light-emitting surface of the display panel 100, otherwise, a vapor deposition shadow 90 (shadow) is formed at the opening 30a of the pixel defining layer 30, which results in a reduction of the area of the light-emitting surface of the display panel 100, and thus affects the display effect of the display panel 100. Wherein an angle formed between an edge line of the bottom of the first defining layer 31 and an edge line of the top of the third defining layer 33 and a line perpendicular to the display panel 100 is greater than fifty degrees; the angle of the line between the top of the third defining layer 33 and the bottom of the first defining layer 31, the angle of the line between the bottom of the third defining layer 33 and the bottom of the first defining layer 31, the angle of the line between the top of the second defining layer 32 and the bottom of the first defining layer 31, and the angle of the line between the bottom of the second defining layer 32 and the bottom of the first defining layer 31 are all greater than fifty degrees. For example, the degree may be 55 degrees, 60 degrees, 65 degrees, 70 degrees, 75 degrees, 80 degrees, or the like. The shape of the second defining layer 32 may be rectangular or inverted trapezoidal as in the above embodiment. Specifically, the thickness range of the second defining layer 32 is the same as that of the embodiment in which the pixel defining layer 30 is a two-layer structure, and will not be described herein.

In a specific embodiment, the pixel defining layer 30 may have a three-layer structure or a multi-layer structure with more than three layers, wherein the structure of the display panel 100 is substantially the same as that of the above embodiment, except that the number of layers of the pixel defining layer 30 is different. Specifically, the remaining structure is substantially the same as that specified in the above embodiment, and will not be described here again. When the pixel defining layer 30 has a three-layer structure or a multi-layer structure with more than three layers, the evaporation angle Z of the hole function layer 50 is smaller than an angle formed between an edge of the bottom of the first defining layer 31 and an edge line of the bottom of the third defining layer 33 and a line perpendicular to the display panel 100, and the line angle between the top of the third defining layer 33 and the bottom of the first defining layer 31, the line angle between the bottom of the third defining layer 33 and the bottom of the first defining layer 31, the line angle between the top of the second defining layer 32 and the bottom of the first defining layer 31, and the line angle between the bottom of the second defining layer 32 and the bottom of the first defining layer 31 are all greater than fifty degrees; wherein an angle formed between an edge of the bottom of the first defining layer 31 and an edge line of the bottom of the third defining layer 33 and a line perpendicular to the display panel 100 is greater than fifty degrees. The arrangement is such that the hole-function layer 50 is separated into the first hole-function layer 50a and the second hole-function layer 50b at the position of the pixel defining layer 30, so that the first hole-function layer 50a and the anode electrode 21 are not in direct contact, which means that the second hole-function layer 50b is not in direct contact with the conductive portion 41 of the conductive isolation structure 40 structurally, and the probability of occurrence of a short circuit phenomenon is reduced. The first hole function layer 50a and the second hole function layer 50b are separated, so that there is no fear that the second hole function layer 50b will contact the conductive portion 41 of the conductive isolation structure 40, and further contact between the second hole function layer 50b and the cathode electrode is avoided, thereby reducing the probability of occurrence of a short circuit phenomenon; meanwhile, compared with the prior art, the display panel 100 of the application does not need to control the evaporation angle of the hole function layer 50 by using the conductive isolation structure 40, thereby improving the utilization rate of materials, reducing the difficulty of the process and increasing the preparation stability of the display panel 100.

Referring to fig. 7 and 8, fig. 7 is a schematic view illustrating a structure of a display panel portion of a pixel defining layer provided with a cutout at a side far from a driving substrate according to an embodiment of the application, and fig. 8 is a schematic top view illustrating a structure of a pixel defining layer provided with a cutout at a side far from a driving substrate according to an embodiment of the application. The structure of the display panel 100 in this embodiment is substantially the same as that in any of the above embodiments, except that the slit X of the pixel defining layer 30 in this embodiment is different from the slit X of the above embodiment in position. The pixel defining layer 30 provided in this embodiment may have a single-layer structure, or may have a multi-layer structure of two or more layers. In the case where only one pixel defining layer 30 is provided, the hole function layer 50 may be blocked by providing the slit X on the side away from the drive substrate 10. The present embodiment mainly uses three pixel definition layers 30 (including a first definition layer 31, a second definition layer 32, and a third definition layer 33 stacked in this order) as an example for detailed description. Wherein the hole function layer 50 is partitioned at the position of the slit X into a first hole function layer 50a and a second hole function layer 50b such that the first hole function layer 50a and the anode electrode 21 are not in direct contact and the second hole function layer 50b is in direct contact with the anode electrode 21. Specifically, the orthographic projection of the slit X of the pixel defining layer 30 on the driving substrate 10 is located at the edge of the orthographic projection of the conductive isolation structure 40 on the driving substrate 10, and is not covered by the orthographic projection of the conductive isolation structure 40.

Wherein the first hole function layer 50a and the anode electrode 21 are not in direct contact, reducing the probability of occurrence of a short circuit phenomenon. It will be appreciated that the etching process of the slit X and the opening 30a in this embodiment is not the same in carrying out the preparation, so that two exposure processes are required. Referring to fig. 8, in a top view, a slit X is provided around the sub-pixel Y to partition the hole function layer 50 into two parts in each direction of the sub-pixel Y, reducing the risk of occurrence of a short circuit.

In a specific embodiment, the materials of the first defining layer 31, the second defining layer 32 and the third defining layer 33 are different; or, the material of the first defining layer 31 is the same as that of the third defining layer 33, and the material of the second defining layer 32 is different from that of the first defining layer 31 and the third defining layer 33. It should be understood that in the actual manufacturing process, the material of the second defining layer 32 is only different from the material of the first defining layer 31 and the third defining layer 33. Specifically, the material of the first defining layer 31, the second defining layer 32, and the third defining layer 33 is at least one of SiOx, siOxNx, siNx. It should be understood that the material of the second defining layer 32 is different from the material of the first defining layer 31 and the third defining layer 33, which means that in the same embodiment, it is required to ensure that the material of the second defining layer 32 is different from the material of the first defining layer 31 and the third defining layer 33. In the embodiment where the pixel defining layer 30 is three-layered, the materials of the first defining layer 31, the second defining layer 32 and the third defining layer 33 may be organic materials. For example, the first defining layer 31 is made of PI-based organic material or sub-gram-based organic material. The second and third defining layers 32 and 33 may be at least one of polyimide-based materials.

Wherein the thickness of the second defining layer 32 is smaller than the sum of the thicknesses of the light emitting layer 60 and the hole transport layer (refer to fig. 1), and the thickness of the second defining layer 32 is larger than the thickness of the hole transport layer. Specifically, the thickness of the second defined layer 32 is greater than 30 angstroms and less than 2600 angstroms. For example, the thickness of the second defining layer 32 in this embodiment may be 40, 100, 400, 800, 1200, 1600, 2000, 2400, etc.

In other embodiments, when the slit X is located on the side of the pixel defining layer 30 away from the driving substrate 10, the pixel defining layer 30 may also have a single layer or a double layer structure, so that the number of layers of the pixel defining layer 30 may be reduced, and the process may be simplified.

Compared with the above embodiment, the embodiment provided in this embodiment in which the cutouts X are provided in the pixel defining layer 30 does not need to control the evaporation angle Z of the hole function layer 50 any more, so that the hole function layer 50 can be more conveniently separated at the positions of the cutouts X, the difficulty of the process is reduced, and the stability of the manufacturing process of the display panel 100 is further increased.

It will be evident to those skilled in the art that the application is not limited to the details of the foregoing illustrative embodiments, and that the present application may be embodied in other specific forms without departing from the spirit or essential characteristics thereof. The present embodiments are, therefore, to be considered in all respects as illustrative and not restrictive, the scope of the application being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.

The foregoing description is only of embodiments of the present application, and is not intended to limit the scope of the application, and all equivalent structures or equivalent processes using the descriptions and the drawings of the present application or directly or indirectly applied to other related technical fields are included in the scope of the present application.

Claims (10)

1. A display panel, comprising:

A driving substrate;

The first electrode layer is arranged on one side surface of the driving substrate and comprises a plurality of anode electrodes arranged at intervals;

a pixel defining layer disposed on one side of the driving substrate, the pixel defining layer having a plurality of openings exposing the anode electrode;

The conductive isolation structure is arranged on the pixel definition layer and surrounds one side of the opening, which is far away from the driving substrate;

The cavity functional layer is arranged in the opening and partially extends to one side surface of the pixel definition layer away from the driving substrate;

it is characterized in that the method comprises the steps of,

The pixel definition layer is of a single-layer structure; or alternatively, the first and second heat exchangers may be,

The pixel definition layer is a multi-layer structure with two layers and more than two layers;

The pixel definition layer is provided with a notch, the hole function layer is separated at the notch position of the pixel definition layer, so that the hole function layer is separated into a first hole function layer and a second hole function layer, the first hole function layer is closer to the conductive isolation structure than the second hole function layer, the first hole function layer is not in direct contact with the anode electrode, and the second hole function layer is in direct contact with the anode electrode.

2. The display panel of claim 1, wherein the display panel comprises,

When the pixel definition layer is of a two-layer structure, the pixel definition layer comprises a first definition layer and a second definition layer which are sequentially stacked; the notch is arranged on the same layer as the second defining layer and corresponds to the edge of one side surface of the first defining layer away from the driving substrate;

When the pixel definition layer is of a three-layer structure, the pixel definition layer comprises a first definition layer, a second definition layer and a third definition layer which are sequentially stacked; the notch is arranged on the same layer as the second defining layer, corresponds to the edge of one side surface of the first defining layer far away from the driving substrate, and corresponds to the edge of one side surface of the third defining layer close to the driving substrate;

When the pixel definition layer is of a two-layer structure or a three-layer structure, the hole function layer is separated at the position of the second definition layer into the first hole function layer and the second hole function layer.

3. The display panel of claim 2, wherein the display panel comprises,

When the pixel definition layer is of a two-layer structure or a three-layer structure, the cross section of the second definition layer is rectangular or inverted trapezoid.

4. The display panel of claim 2, wherein the display panel comprises,

When the pixel definition layer is of a two-layer structure, the material of the first definition layer is different from the material of the second definition layer;

when the pixel definition layer is of a three-layer structure, the materials of the first definition layer, the second definition layer and the third definition layer are different; or alternatively, the first and second heat exchangers may be,

The material of the first defining layer is the same as that of the third defining layer, and the material of the second defining layer is different from that of the first defining layer and the third defining layer.

5. The display panel of claim 2, wherein the display panel comprises,

When the pixel definition layer is of a two-layer structure, the length of one side surface of the second definition layer, which is close to the driving substrate, is smaller than that of one side surface of the first definition layer, which is far away from the driving substrate;

When the pixel definition layer is of a three-layer structure, the length of one side surface of the second definition layer, which is far away from the driving substrate, is smaller than that of one side surface of the third definition layer, which is close to the driving substrate, and the length of one side surface of the second definition layer, which is close to the driving substrate, is smaller than that of one side surface of the first definition layer, which is far away from the driving substrate.

6. The display panel of claim 5, wherein the display panel comprises,

When the pixel definition layer is of a two-layer structure, the evaporation angle of the hole function layer is smaller than an angle formed between an edge connecting line between the bottom edge of the first definition layer and the top edge of the second definition layer and a straight line perpendicular to the display panel;

the evaporation angle of the hole functional layer is larger than fifty degrees;

when the pixel definition layer is of a three-layer structure, the evaporation angle of the hole function layer is smaller than an angle formed between an edge connecting line between the bottom edge of the first definition layer and the top edge of the third definition layer and a straight line perpendicular to the display panel;

Wherein an angle formed between an edge line of the first defining layer bottom and an edge line of the third defining layer top and a straight line perpendicular to the display panel is greater than fifty degrees.

7. The display panel according to claim 2, wherein when the pixel defining layer has a three-layer structure or a multi-layer structure having three or more layers, an evaporation angle of the hole function layer is smaller than an angle formed between a line connecting an edge of the bottom of the first defining layer and an edge of the bottom of the third defining layer and a line perpendicular to the display panel;

Wherein an angle formed between an edge of the first and third defining layer bottoms and a line perpendicular to the display panel is greater than fifty degrees.

8. The display panel according to claim 1, wherein the cutout is located at a side of the pixel defining layer away from the driving substrate, and the hole function layer is partitioned into the first hole function layer and the second hole function layer at a position of the cutout.

9. The display panel of claim 8, wherein the orthographic projection of the cutout onto the drive substrate is at an edge of the orthographic projection of the conductive isolation structure onto the drive substrate and is uncovered by the orthographic projection of the conductive isolation structure.

10. The display panel according to claim 2 or 8, wherein,

The display panel further includes:

the light-emitting layer is arranged on one side of the first electrode layer, which is far away from the driving substrate;

The second electrode layer is arranged on one side of the light-emitting layer, which is far away from the driving substrate, and is in contact with and conducted with the conductive isolation structure part;

Wherein the hole function layer comprises a hole transport layer and a hole injection layer;

When the pixel defining layer has a multi-layer structure of two or more layers, the thickness of the second defining layer is smaller than the sum of the thicknesses of the light emitting layer and the hole transporting layer, and the thickness of the second defining layer is larger than the thickness of the hole transporting layer.