CN118063196A - Porous alumina ceramic coating for electrostatic chuck, preparation method and application - Google Patents
Porous alumina ceramic coating for electrostatic chuck, preparation method and application Download PDFInfo
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- CN118063196A CN118063196A CN202410477878.8A CN202410477878A CN118063196A CN 118063196 A CN118063196 A CN 118063196A CN 202410477878 A CN202410477878 A CN 202410477878A CN 118063196 A CN118063196 A CN 118063196A
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- electrostatic chuck
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- alumina ceramic
- porous alumina
- helium
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 title claims abstract description 90
- 238000005524 ceramic coating Methods 0.000 title claims abstract description 47
- 238000002360 preparation method Methods 0.000 title claims abstract description 12
- 239000001307 helium Substances 0.000 claims abstract description 43
- 229910052734 helium Inorganic materials 0.000 claims abstract description 43
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims abstract description 42
- 239000002904 solvent Substances 0.000 claims abstract description 17
- 239000011268 mixed slurry Substances 0.000 claims abstract description 16
- 238000007750 plasma spraying Methods 0.000 claims abstract description 16
- 239000000843 powder Substances 0.000 claims abstract description 16
- 239000002270 dispersing agent Substances 0.000 claims abstract description 12
- 239000007787 solid Substances 0.000 claims abstract description 12
- 238000007873 sieving Methods 0.000 claims abstract description 9
- 239000011148 porous material Substances 0.000 claims abstract description 8
- 238000000034 method Methods 0.000 claims abstract description 7
- 238000002156 mixing Methods 0.000 claims abstract description 6
- 239000002994 raw material Substances 0.000 claims abstract description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical group CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 36
- 229910052782 aluminium Inorganic materials 0.000 claims description 21
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 20
- 239000000758 substrate Substances 0.000 claims description 20
- 238000000576 coating method Methods 0.000 claims description 19
- 239000011248 coating agent Substances 0.000 claims description 18
- 239000000203 mixture Substances 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 12
- 238000000889 atomisation Methods 0.000 claims description 12
- 229920000058 polyacrylate Polymers 0.000 claims description 12
- 238000005507 spraying Methods 0.000 claims description 10
- 229910052721 tungsten Inorganic materials 0.000 claims description 10
- 239000010937 tungsten Substances 0.000 claims description 10
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 9
- 238000000498 ball milling Methods 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 5
- 239000002245 particle Substances 0.000 claims description 5
- 239000000919 ceramic Substances 0.000 claims description 2
- 238000005303 weighing Methods 0.000 claims description 2
- IDGUHHHQCWSQLU-UHFFFAOYSA-N ethanol;hydrate Chemical compound O.CCO IDGUHHHQCWSQLU-UHFFFAOYSA-N 0.000 claims 1
- 239000000725 suspension Substances 0.000 abstract description 21
- 238000009826 distribution Methods 0.000 abstract description 10
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 238000012545 processing Methods 0.000 abstract description 5
- 239000004065 semiconductor Substances 0.000 abstract description 4
- 238000009827 uniform distribution Methods 0.000 abstract description 4
- 239000007788 liquid Substances 0.000 description 10
- 235000012431 wafers Nutrition 0.000 description 10
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 5
- 238000001816 cooling Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005457 optimization Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 238000009835 boiling Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000007751 thermal spraying Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The application relates to the technical field of ceramic coatings in semiconductor manufacturing processes, in particular to a porous alumina ceramic coating for an electrostatic chuck, a preparation method and application thereof. The application discloses a method for preparing mixed slurry by uniformly mixing 30-60wt% of alumina powder, 1.3-2.3wt% of dispersing agent and 38.7-67.7wt% of solvent which are weighed as raw materials; sequentially dispersing and sieving the mixed slurry to obtain an alumina suspension with a solid content of 40-60wt%; and injecting the alumina suspension into an atomizing nozzle to perform plasma spraying on the surface of the electrostatic chuck, thereby obtaining the porous alumina ceramic coating. The alumina ceramic coating has uniform pore distribution, and improves the uniform distribution of helium in the electrostatic chuck, so that the temperature uniformity and quality of wafer processing are improved, and the use efficiency of the electrostatic chuck is improved.
Description
Technical Field
The application relates to the technical field of ceramic coatings in semiconductor manufacturing processes, in particular to a porous alumina ceramic coating for an electrostatic chuck, a preparation method and application thereof.
Background
In the field of semiconductor fabrication, electrostatic chucks (Electrostatic Chuck, ESC) are key devices for holding wafers. Ensuring a high degree of temperature uniformity is one of the key factors in improving wafer processing efficiency and quality when designing and using electrostatic chucks.
The coulombic electrostatic chuck is mainly composed of a conductive substrate (e.g., aluminum), a covered dielectric layer (typically aluminum oxide), and an electrode layer. The quality and uniformity of the dielectric layer plays a critical role in the overall performance of the chuck and wafer processing accuracy.
Thermal spray type electrostatic chucks have developed cost advantages over the development of coulombic type electrostatic chucks. The electrostatic chuck adopts a thermal spraying technology, an alumina dielectric layer and a tungsten electrode layer are sequentially sprayed on an aluminum substrate, and then an alumina dielectric layer is covered.
In the existing thermal spraying type electrostatic chuck, most of optimization is focused on the distribution of helium holes, the design of grooves and the construction of liquid channels in order to improve thermal management and temperature distribution. These optimizations aim to achieve a uniform distribution of wafer surface temperature by controlling the flow of helium and providing an efficient cooling channel. However, these conventional methods, although improving thermal management to some extent, still have room for improvement.
Disclosure of Invention
The invention aims to provide a porous alumina ceramic coating for an electrostatic chuck, a preparation method and application thereof, wherein specific raw material components are mixed in proportion to prepare alumina suspension with high solid content of 40-60wt%, the alumina suspension is injected into a flash atomizing nozzle and is sprayed on the surface of the electrostatic chuck by adopting plasma, and simultaneously, a first helium hole positioned at an outer ring and a second helium hole positioned at the outer ring are uniformly distributed in the electrostatic chuck, so that the problems in the prior art are solved.
In order to solve the technical problems, the invention adopts the following scheme:
A preparation method of a porous alumina ceramic coating for an electrostatic chuck,
Weighing 30-60wt% of alumina powder, 1.3-2.3wt% of dispersing agent and 38.7-67.7wt% of solvent, and uniformly mixing to obtain mixed slurry;
And (3) dispersing and sieving the mixed slurry in sequence, injecting the mixed slurry into an atomizing nozzle, and carrying out plasma spraying on the surface of the electrostatic chuck to obtain the porous alumina ceramic coating.
Preferably, the alumina powder has a particle size of 1-2 μm and a purity of >99.999%;
the dispersing agent is a mixture of ISOBAM-104 and ammonium polyacrylate;
the solvent is ethanol or a mixture of ethanol and water.
Preferably, the solid content of ISOBAM-104 is 0.3-1wt%, and the solid content of ammonium polyacrylate is 0.3-2wt%; when the solvent is a mixture of ethanol and water, the volume ratio of the ethanol to the water is 1:1.
Preferably, a ball mill is used for dispersing the mixed slurry, and the ball-to-material ratio is 1:3-1: and 5, ball milling time is 4-6 hours, and the rotating speed of the ball mill is 300-400 rpm.
Preferably, the atomizing nozzle is a flash atomizing nozzle.
The flash atomizing nozzle works as follows:
high pressure liquid input: the liquid is first pressurized before entering the nozzle.
Quick pressure release: as the pressurized liquid passes through the nozzle, it experiences a rapid pressure drop.
Flash boiling phenomenon: as the pressure drops sharply, a portion of the liquid will instantaneously evaporate (flash) causing a sharp expansion of the liquid volume.
Atomization effect: expansion caused by flash boiling breaks the liquid into fine droplets, thus realizing efficient atomization.
Control and optimization: by adjusting the pressure, temperature and nozzle design, the atomization effect can be optimized to adapt to different application requirements.
In plasma spraying (e.g., suspension plasma spraying), flash atomization can help more effectively convert high solids suspensions into fine particles, thereby improving the quality of the coating. The flash nozzle is selected based on its ability to provide finer droplets and a more uniform atomizing effect, particularly for high viscosity and high solids alumina suspensions. Flash atomization technology realizes fine atomization of liquid through high pressure and rapid pressure release, so that uniformity and adhesive force of a coating are optimized.
Preferably, the plasma spraying parameters are as follows: the power is 30-70 kW; the spraying distance is 100-150 mm; the atomization pressure is 0.8MPa.
The porous alumina ceramic coating for the electrostatic chuck comprises the following raw materials of 30-60wt% of alumina powder, 0.3-1wt% ISOBAM-104 and 0.3-2wt% of ammonium polyacrylate mixture, ethanol or a mixture of ethanol and water; the volume ratio of ethanol to water is 1:1.
Preferably, the porous alumina ceramic coating is prepared by the preparation method.
The application of the porous alumina ceramic coating for the electrostatic chuck is used for plasma spraying of the surface of the porous ceramic electrostatic chuck, and the porous alumina ceramic coating is prepared by adopting the preparation method of the porous alumina ceramic coating.
Preferably, the electrostatic chuck comprises an aluminum substrate, the surface of the aluminum substrate is sequentially provided with a plasma-sprayed aluminum oxide coating, a tungsten electrode layer and a plasma-sprayed porous aluminum oxide ceramic coating from bottom to top, first helium holes and second helium holes which are uniformly distributed are formed in the aluminum substrate, helium channels are formed below the first helium holes and the second helium holes, the first helium holes are formed in the outer ring of the aluminum substrate and penetrate through the top of the aluminum substrate, the aluminum oxide coating and the tungsten electrode layer, and the second helium holes are formed in the inner ring of the aluminum substrate and sequentially penetrate through the top of the aluminum substrate, the aluminum oxide coating and the tungsten electrode layer.
The beneficial effects of the invention are as follows: the preparation method of the alumina ceramic coating uses specific content of alumina, two dispersing agents with different components and a solvent as raw material components, adopts a flash atomization nozzle to inject alumina suspension and perform plasma spraying, is simple and convenient, is suitable for spraying the alumina suspension with high solid content, has high production efficiency and is suitable for large-scale production.
The alumina ceramic coating is applied to the surface of the electrostatic chuck, so that the electrostatic chuck has uniform pore distribution, and the uniform distribution of helium in the electrostatic chuck is improved, thereby improving the temperature uniformity and quality of wafer processing and improving the use efficiency of the electrostatic chuck.
Drawings
FIG. 1 is a schematic diagram of a second helium gas hole distribution in an electrostatic chuck;
FIG. 2 is a cross-sectional view of the distribution structure of the porous alumina ceramic coating of the present invention in an electrostatic chuck;
Fig. 3 is a secondary electron image of the scanning electron microscope of fig. 1, bar=300 μm;
FIG. 4 is a top view of the porous alumina ceramic coating of the present invention in an electrostatic chuck;
Fig. 5 is a graph of the results of the temperature test and fitting of example 1 and comparative example 1, fig. a is a graph of the temperature distribution of sample a (example 1), and fig. B is a graph of the temperature distribution of sample B (comparative example 1).
Reference numerals: a 1-porous alumina ceramic coating, a 2-tungsten electrode layer; a 3-alumina coating; 4-first helium hole, 5-second helium hole, 6-aluminum base body, 7-helium channel, 8-liquid cooling channel and 9-groove.
Detailed Description
In order to more clearly demonstrate the objects, technical solutions and advantages of the present application, the present application will be further described with reference to the following examples.
Example 1
The embodiment 1 of the invention provides a porous alumina ceramic coating for an electrostatic chuck, which is prepared by the following steps:
Step 1: uniformly mixing 60wt% of alumina powder, 1.3wt% of dispersing agent and 38.7wt% of solvent to obtain mixed slurry;
The particle size of the alumina powder is 1 mu m, and the purity is more than 99.999%; the dispersing agent is a mixture of ISOBAM-104 and ammonium polyacrylate, wherein ISOBAM-104 weight percent is 1%, and the ammonium polyacrylate weight percent is 0.3%; the solvent is a mixture of ethanol and water, wherein the volume ratio of the ethanol to the water is 1:1.
Step 2: the mixed slurry was dispersed using a ball mill to uniformly disperse alumina powder in a solvent to form an alumina suspension having a solid content of 60wt%, wherein the ball-to-material ratio was 1:5, the ball milling time was 4 hours, and the rotational speed of the ball mill was 300rpm.
Step 3: and sieving the alumina suspension after ball milling.
Step 4: transferring the alumina suspension after sieving treatment into a pressure stirring barrel of a suspension spraying system, and then injecting into a flash atomizing nozzle for plasma spraying.
Wherein the power of plasma spraying is 70kW, the spraying distance is 120mm, and the atomization pressure is 0.8MPa.
Example 2
The embodiment 2 of the invention provides a porous alumina ceramic coating for an electrostatic chuck, which is prepared by the following steps:
Step 1: uniformly mixing 50wt% of alumina powder, 1.5wt% of dispersing agent and 48.5wt% of solvent to obtain mixed slurry;
The particle size of the alumina powder is 1 mu m, and the purity is more than 99.999%; the dispersing agent is a mixture of ISOBAM-104 and ammonium polyacrylate, wherein ISOBAM-104 weight percent is 0.5 percent, and the ammonium polyacrylate weight percent is 1 percent; the solvent is a mixture of ethanol and water, wherein the volume ratio of the ethanol to the water is 1:1.
Step 2: the mixed slurry was dispersed using a ball mill to uniformly disperse alumina powder in a solvent to form an alumina suspension having a solid content of 50wt%, wherein the ball-to-material ratio was 1:3, the ball milling time was 6 hours, and the rotational speed of the ball mill was 400rpm.
Step 3: and sieving the alumina suspension after ball milling.
Step 4: transferring the alumina suspension after sieving treatment into a pressure stirring barrel of a suspension spraying system, and then injecting into a flash atomizing nozzle for plasma spraying.
Wherein the power of plasma spraying is 50kW, the spraying distance is 120mm, and the atomization pressure is 0.8MPa.
Example 3
The embodiment 3 of the invention provides a porous alumina ceramic coating for an electrostatic chuck, which is prepared by the following steps:
step 1: uniformly mixing 30wt% of alumina powder, 2.3 wt% of dispersing agent and 67.7wt% of solvent to obtain mixed slurry;
The particle size of the alumina powder is 1 mu m, and the purity is more than 99.999%; the dispersing agent is a mixture of ISOBAM-104 and ammonium polyacrylate, wherein ISOBAM-104 weight percent is 0.3 percent, and the ammonium polyacrylate weight percent is 2 percent; the solvent is ethanol.
Step 2: the mixed slurry was dispersed using a ball mill to uniformly disperse alumina powder in a solvent to form an alumina suspension having a solid content of 30wt%, wherein the ball-to-material ratio was 1:4, ball milling time is 5h, and the rotating speed of the ball mill is 350rpm.
Step 3: and sieving the alumina suspension after ball milling.
Step 4: transferring the alumina suspension after sieving treatment into a pressure stirring barrel of a suspension spraying system, and then injecting into a flash atomizing nozzle for plasma spraying.
Wherein the power of plasma spraying is 30kW, the spraying distance is 120mm, and the atomization pressure is 0.8Mpa.
1. Performance detection method
2. The samples obtained in the examples were subjected to performance tests, and the test results are shown in Table 1.
Table 1 results of performance measurements on samples provided in the examples
Example 4
The embodiment 4 of the invention is an application of a porous alumina ceramic coating for an electrostatic chuck, wherein a layer of porous alumina ceramic coating is sprayed on the uppermost part of the electrostatic chuck, and the porous alumina ceramic coating is one of the embodiments 1-3. The electrostatic chuck structure is shown in fig. 1, and the scanning electron microscope secondary electron image of the porous alumina ceramic coating is shown in fig. 3.
The electrostatic chuck comprises an aluminum substrate, wherein the surface of the aluminum substrate is sequentially provided with a plasma sprayed aluminum oxide coating, a tungsten electrode layer and a plasma sprayed porous aluminum oxide coating from bottom to top, a first helium hole and a second helium hole which are uniformly distributed are formed in the aluminum substrate, helium channels are arranged below the first helium hole and the second helium hole, and liquid cooling channels are arranged below the helium channels.
Typical configurations of the electrostatic chuck are shown in fig. 2, with two types of helium holes: one type of helium hole is the same as that of a traditional coulomb type electrostatic chuck, namely, the first helium hole of the outermost ring penetrates through the porous alumina coating of the uppermost layer, the alumina coating above the first helium hole is provided with a groove with a closed-loop structure, the grooves are communicated with each first helium hole (as shown in fig. 4), when a wafer is covered above, the groove is blocked by the wafer, helium cannot rise and float, and therefore helium can flow in the groove.
The other type of the first helium holes are positioned on the inner ring and uniformly distributed on the aluminum substrate, the second helium holes only penetrate through the tungsten electrode layer and are cut off below the porous alumina coating, the helium holes are communicated with the porous alumina coating, the first helium holes on the outer ring penetrate through the porous alumina coating and the top ends of the second helium holes on the inner ring and are cut off below the porous alumina coating, the whole coverage and uniform distribution of helium are realized, and the temperature uniformity of the surface of the sucker is ensured.
Comparative example 1
Based on the structure of the electrostatic chuck of example 4, a standard alumina coating was used for spray coating.
By placing 13 temperature measurement points on a simulated wafer of 300mm diameter, the performance in terms of temperature uniformity of two electrostatic chucks using different coatings was compared. Sample a used a porous alumina ceramic coating and prepared with the same process parameters as in example 1, and sample B used a standard alumina ceramic coating, i.e., comparative example 1.
The temperature test and fitting results are shown in fig. 5, and the temperature distribution of sample a (example 1) is relatively uniform, and the measured temperature values are mainly concentrated in the range of 79.5 ℃ to 80.7 ℃. This reflects the effectiveness of the porous alumina ceramic coating in terms of temperature uniformity, with a narrow temperature fluctuation range. In contrast, sample B (comparative example 1) had a wide range of temperature distribution fluctuations, with temperature values between 78.4 ℃ and 81.5 ℃, indicating that conventional alumina ceramic coatings were relatively weak in maintaining wafer temperature uniformity.
In combination, the porous alumina ceramic coating provides better temperature uniformity with a relatively small fluctuation range. The improvement of temperature uniformity has a positive effect on improving quality and consistency in wafer processing, especially in the field of high-precision semiconductor manufacturing.
The foregoing description of the preferred embodiment of the invention is not intended to limit the invention in any way, but rather to cover all modifications, equivalents, improvements and alternatives falling within the spirit and principles of the invention.
Claims (9)
1. The preparation method of the porous alumina ceramic coating for the electrostatic chuck is characterized by weighing 30-60wt% of alumina powder, 1.3-2.3wt% of dispersing agent and 38.7-67.7wt% of solvent, and uniformly mixing to obtain mixed slurry;
And (3) dispersing and sieving the mixed slurry in sequence, injecting the mixed slurry into an atomizing nozzle, and carrying out plasma spraying on the surface of the electrostatic chuck to obtain the porous alumina ceramic coating.
2. The method for preparing a porous alumina ceramic coating for an electrostatic chuck according to claim 1, wherein the alumina powder has a particle size of 1-2 μm and a purity of >99.999%;
the dispersing agent is a mixture of ISOBAM-104 and ammonium polyacrylate;
the solvent is ethanol or a mixture of ethanol and water.
3. The method for preparing a porous alumina ceramic coating for an electrostatic chuck according to claim 2, wherein the solid content of ISOBAM-104 is 0.3-1 wt%, and the solid content of ammonium polyacrylate is 0.3-2 wt%; when the solvent is a mixture of ethanol and water, the volume ratio of the ethanol to the water is 1:1.
4. The method for preparing the porous alumina ceramic coating for the electrostatic chuck according to claim 2, wherein the mixed slurry is dispersed by using a ball mill, the ball-material ratio is 1:3-1:5, the ball milling time is 4-6 hours, and the rotation speed of the ball mill is 300-400 rpm.
5. The method of claim 2, wherein the atomizing nozzle is a flash atomizing nozzle.
6. The method for preparing a porous alumina ceramic coating for an electrostatic chuck according to claim 2, wherein the plasma spraying parameters are: the power is 30-70 kW; the spraying distance is 100-150 mm; the atomization pressure is 0.8MPa.
7. A porous alumina ceramic coating for an electrostatic chuck, which is characterized in that the porous alumina ceramic coating for an electrostatic chuck is prepared by the preparation method of any one of claims 1-6, and the raw materials comprise 30-60wt% of alumina powder, 0.3-1wt% ISOBAM-104 and 0.3-2wt% of ammonium polyacrylate mixture, ethanol or ethanol-water mixture; the volume ratio of ethanol to water is 1:1.
8. The application of the porous alumina ceramic coating for the electrostatic chuck is characterized in that the porous alumina ceramic coating for the plasma spraying of the surface of the porous ceramic electrostatic chuck is prepared by adopting the preparation method of the porous alumina ceramic coating for the electrostatic chuck according to any one of claims 1-6.
9. The use of a porous alumina ceramic coating for an electrostatic chuck of claim 8, wherein the electrostatic chuck comprises an aluminum substrate, the surface of the aluminum substrate is sequentially plasma sprayed alumina coating, tungsten electrode layer and plasma sprayed porous alumina ceramic coating from bottom to top, first helium pores and second helium pores are uniformly distributed in the aluminum substrate, helium channels are arranged below the first helium pores and the second helium pores, the first helium pores are positioned on the outer ring of the aluminum substrate and penetrate the top of the aluminum substrate, the alumina coating and the tungsten electrode layer, and the second helium pores are positioned on the inner ring of the aluminum substrate and sequentially penetrate the top of the aluminum substrate, the alumina coating and the tungsten electrode layer.
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|---|---|---|---|
| CN202410477878.8A CN118063196A (en) | 2024-04-19 | 2024-04-19 | Porous alumina ceramic coating for electrostatic chuck, preparation method and application |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202410477878.8A CN118063196A (en) | 2024-04-19 | 2024-04-19 | Porous alumina ceramic coating for electrostatic chuck, preparation method and application |
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