CN118028918A - A copper foil composite additive and a method for preparing a highly oriented electrolytic copper foil - Google Patents
A copper foil composite additive and a method for preparing a highly oriented electrolytic copper foil Download PDFInfo
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 111
- 239000000654 additive Substances 0.000 title claims abstract description 108
- 230000000996 additive effect Effects 0.000 title claims abstract description 104
- 239000011889 copper foil Substances 0.000 title claims abstract description 59
- 239000002131 composite material Substances 0.000 title claims abstract description 15
- 238000000034 method Methods 0.000 title claims abstract description 11
- 229910052802 copper Inorganic materials 0.000 claims abstract description 47
- 239000010949 copper Substances 0.000 claims abstract description 47
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims abstract description 36
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims abstract description 27
- 229910001431 copper ion Inorganic materials 0.000 claims abstract description 27
- 239000003792 electrolyte Substances 0.000 claims description 69
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 54
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 24
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims description 20
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 17
- 108010010803 Gelatin Proteins 0.000 claims description 13
- 229920000159 gelatin Polymers 0.000 claims description 13
- 239000008273 gelatin Substances 0.000 claims description 13
- 235000019322 gelatine Nutrition 0.000 claims description 13
- 235000011852 gelatine desserts Nutrition 0.000 claims description 13
- 229910052697 platinum Inorganic materials 0.000 claims description 12
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 10
- 102000008186 Collagen Human genes 0.000 claims description 10
- 108010035532 Collagen Proteins 0.000 claims description 10
- 235000019270 ammonium chloride Nutrition 0.000 claims description 10
- 229920001436 collagen Polymers 0.000 claims description 10
- 229910000365 copper sulfate Inorganic materials 0.000 claims description 10
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 claims description 10
- 239000011888 foil Substances 0.000 claims description 10
- 229940051841 polyoxyethylene ether Drugs 0.000 claims description 10
- 229920000056 polyoxyethylene ether Polymers 0.000 claims description 10
- 229920002401 polyacrylamide Polymers 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 229920001285 xanthan gum Polymers 0.000 claims description 7
- 229940082509 xanthan gum Drugs 0.000 claims description 7
- 235000010493 xanthan gum Nutrition 0.000 claims description 7
- 239000000230 xanthan gum Substances 0.000 claims description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- 239000003795 chemical substances by application Substances 0.000 claims description 4
- 238000007664 blowing Methods 0.000 claims description 3
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 238000002360 preparation method Methods 0.000 claims description 3
- 239000000080 wetting agent Substances 0.000 claims description 3
- VTJUKNSKBAOEHE-UHFFFAOYSA-N calixarene Chemical compound COC(=O)COC1=C(CC=2C(=C(CC=3C(=C(C4)C=C(C=3)C(C)(C)C)OCC(=O)OC)C=C(C=2)C(C)(C)C)OCC(=O)OC)C=C(C(C)(C)C)C=C1CC1=C(OCC(=O)OC)C4=CC(C(C)(C)C)=C1 VTJUKNSKBAOEHE-UHFFFAOYSA-N 0.000 abstract description 13
- 239000013078 crystal Substances 0.000 abstract description 6
- 238000001556 precipitation Methods 0.000 abstract description 6
- 125000000542 sulfonic acid group Chemical group 0.000 abstract description 6
- 229910052717 sulfur Inorganic materials 0.000 abstract description 6
- 239000011593 sulfur Substances 0.000 abstract description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 3
- 239000000203 mixture Substances 0.000 description 13
- -1 sulfonic acid anion Chemical class 0.000 description 8
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 4
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 3
- 229910052744 lithium Inorganic materials 0.000 description 3
- 150000003463 sulfur Chemical class 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000007773 negative electrode material Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000005489 elastic deformation Effects 0.000 description 1
- 229940093476 ethylene glycol Drugs 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 239000006259 organic additive Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- KCXFHTAICRTXLI-UHFFFAOYSA-N propane-1-sulfonic acid Chemical compound CCCS(O)(=O)=O KCXFHTAICRTXLI-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- FRTIVUOKBXDGPD-UHFFFAOYSA-M sodium;3-sulfanylpropane-1-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)CCCS FRTIVUOKBXDGPD-UHFFFAOYSA-M 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000004354 sulfur functional group Chemical group 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/04—Wires; Strips; Foils
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrolytic Production Of Metals (AREA)
Abstract
Description
技术领域Technical Field
本发明涉及铜箔生产技术领域,更具体地说,涉及一种铜箔复合添加剂及其制备晶面高度取向电解铜箔的方法。The invention relates to the technical field of copper foil production, and more specifically to a copper foil composite additive and a method for preparing a crystal plane highly oriented electrolytic copper foil.
背景技术Background technique
近年来,随着锂电池的要求越来越高,对锂电铜箔的性能提出了更高的要求。比如针对高能量密度的需求,铜箔一方面要求薄化,达到单位质量铜箔具有更大的可涂负极材料面积;另一方面是铜箔在固定的涂敷面积上涂敷更多的活性物质,涂敷了更多负极活性物质的铜箔在后续电池制程中的辊压步骤就需要承受更大的压力,因此需要抗拉强度高的铜箔。In recent years, as the requirements for lithium batteries have become increasingly higher, higher requirements have been placed on the performance of lithium battery copper foil. For example, in response to the demand for high energy density, copper foil is required to be thinner on the one hand, so that the unit mass of copper foil has a larger area that can be coated with negative electrode materials; on the other hand, copper foil is required to coat more active materials on a fixed coating area. Copper foil coated with more negative electrode active materials needs to withstand greater pressure in the subsequent rolling step of the battery manufacturing process, so copper foil with high tensile strength is required.
铜箔添加剂目前常用的是含硫有机添加剂,如聚二硫二丙烷磺酸钠,3-巯基-1-丙烷磺酸钠和硫脲等,通过控制铜箔晶粒的晶核形成及生长速率,达到铜箔颗粒大小的部分以及铜箔表面的平整度的调控从而控制铜箔的抗拉强度和延伸率。但这些传统的添加剂原材料制备添加剂后,铜箔的抗拉强度一般在320-370MPa,抗拉强度有待提高。Currently, sulfur-containing organic additives are commonly used as copper foil additives, such as sodium polydisulfide propane sulfonate, sodium 3-mercapto-1-propane sulfonate and thiourea, etc., which control the nucleation and growth rate of copper foil grains, thereby controlling the size of copper foil particles and the flatness of the copper foil surface, thereby controlling the tensile strength and elongation of copper foil. However, after these traditional additive raw materials are used to prepare additives, the tensile strength of copper foil is generally 320-370MPa, and the tensile strength needs to be improved.
根据文献记载,铜箔晶粒中(111)面占比越高,铜箔抗拉强度越高,因此开发一种添加剂,使其能有效促使铜箔(111)面的高度取向生长,从而实现高抗拉强度铜箔的生产。According to literature records, the higher the proportion of (111) planes in copper foil grains, the higher the tensile strength of the copper foil. Therefore, an additive is developed that can effectively promote the highly oriented growth of the (111) planes of the copper foil, thereby achieving the production of high tensile strength copper foil.
发明内容Summary of the invention
针对现有技术中存在的问题,本发明的目的在于提供一种复合添加剂,然后混合添加到主电解液中,从而通过影响铜离子沉积反应速率改变镀层的微观结构和形貌,从而制备出高抗拉的电解铜箔。In view of the problems existing in the prior art, the purpose of the present invention is to provide a composite additive, which is then mixed and added to the main electrolyte, thereby changing the microstructure and morphology of the coating by affecting the copper ion deposition reaction rate, thereby preparing a high tensile strength electrolytic copper foil.
为解决上述问题,本发明采用如下的技术方案。一种电解铜箔复合添加剂,复合添加剂包括:In order to solve the above problems, the present invention adopts the following technical solutions: A composite additive for electrolytic copper foil, the composite additive comprising:
添加剂A,该添加剂A为磺化硫杂杯[4]芳烃、磺化硫杂杯[6]芳烃和磺化硫杂杯[8]芳烃中的至少一种,作为光亮剂;Additive A, wherein the additive A is at least one of sulfonated thiacalix[4]arene, sulfonated thiacalix[6]arene and sulfonated thiacalix[8]arene, as a brightener;
添加剂B,作为湿润剂;Additive B, as a wetting agent;
添加剂C,作为整平剂。Additive C acts as a leveling agent.
优选地,所述添加剂B为乙二醇、聚氧乙烯醚、聚丙烯酰胺、黄原胶中的至少一种。Preferably, the additive B is at least one of ethylene glycol, polyoxyethylene ether, polyacrylamide and xanthan gum.
优选地,所述添加剂C为明胶或胶原蛋白。Preferably, the additive C is gelatin or collagen.
优选地,所述添加剂B中,乙二醇的分子量为6000-9000Mw。Preferably, in the additive B, the molecular weight of ethylene glycol is 6000-9000 Mw.
优选地,所述添加剂C中,明胶或胶原蛋白的分子量为2000-5000Mw。Preferably, in the additive C, the molecular weight of gelatin or collagen is 2000-5000Mw.
一种高抗拉电解铜箔的制备方法,包括以下步骤:A method for preparing a high-tensile electrolytic copper foil comprises the following steps:
S1,电解液的制备,将金属铜加入含硫酸的溶铜罐中,鼓入空气,溶解得到硫酸铜电解液;S1, preparation of electrolyte, adding metallic copper into a copper dissolving tank containing sulfuric acid, blowing air into it, and dissolving to obtain copper sulfate electrolyte;
S2,在步骤S1中加入氯化铵,得到主电解液;S2, adding ammonium chloride in step S1 to obtain a main electrolyte;
S3,在步骤S2中加入复合添加剂;S3, adding the composite additive in step S2;
S4,在步骤S3得到的电解液输送至生箔机得到铜箔。S4, the electrolyte obtained in step S3 is transported to a foil machine to obtain copper foil.
优选地,生铂机生铂过程中换热器温度设定为50-55℃,输送流量为46-58m3/h,电流密度为40-46A/dm2 Preferably, the temperature of the heat exchanger is set at 50-55°C, the flow rate is 46-58m 3 /h, and the current density is 40-46A/dm 2 during the platinum production process.
优选地,在完成步骤S后,所述添加剂A在电解液中的浓度为100-160ppm;所述添加剂B在电解液中的浓度为20-40ppm;所述添加剂C在电解液中的浓度为5-45ppm;铜离子浓度为70-130g/L,氢离子浓度为80-130g/L,氯离子浓度为15-35ppm。Preferably, after completing step S, the concentration of the additive A in the electrolyte is 100-160 ppm; the concentration of the additive B in the electrolyte is 20-40 ppm; the concentration of the additive C in the electrolyte is 5-45 ppm; the copper ion concentration is 70-130 g/L, the hydrogen ion concentration is 80-130 g/L, and the chloride ion concentration is 15-35 ppm.
优选地,所述添加剂A、添加剂B、添加剂C分别先在50-55℃下搅拌溶解,然后依次加入到主电解液中。Preferably, the additive A, additive B and additive C are first stirred and dissolved at 50-55° C., and then added to the main electrolyte in sequence.
优选地,所述金属铜为金属铜线,铜含量≥99.5%,且铁含量不超过0.5%,铜箔厚度为6um。Preferably, the metallic copper is a metallic copper wire, the copper content of which is ≥99.5%, and the iron content of which is no more than 0.5%, and the thickness of the copper foil is 6 um.
与现有技术相比,本发明有益效果:Compared with the prior art, the present invention has the following beneficial effects:
以水溶性杯芳烃为代表的磺化硫杂杯芳烃,因其对金属强的包合配位能力和良好的键合选择性能成为sps含硫化学物的替代品。磺化硫杂杯芳烃可以利用羟基和硫官能团吸附在阴极面上,另一端的磺酸阴离子吸附铜离子。由于磺化硫杂杯芳烃的刚性结构,吸附在阴极上的杯芳烃形成以磺酸基向上的定向排列。硫杂芳香烃可利用磺酸基和羟基吸附水合铜离子中水分子,得到裸露的铜离子。进入通过上缘进入环腔的铜离子,会与杯芳烃的硫桥键发生络合,且杯芳烃下缘的环腔较小,使铜不能在阴极上析出。铜离子只能从杯芳烃边缘向阴极靠近,导致铜晶粒的定向生长,同时铜离子析出的过电位增加,根据能量最低原则,有利于铜的(111)晶面析出,进而提高铜箔的抗拉强度。Sulfonated sulfur calixarene, represented by water-soluble calixarene, has become a substitute for SPS sulfur-containing chemicals due to its strong inclusion coordination ability and good bonding selectivity for metals. Sulfonated sulfur calixarene can be adsorbed on the cathode surface using hydroxyl and sulfur functional groups, and the sulfonic acid anion at the other end adsorbs copper ions. Due to the rigid structure of sulfonated sulfur calixarene, the calixarene adsorbed on the cathode forms a directional arrangement with the sulfonic acid group facing upward. Sulfur calixarene can use sulfonic acid groups and hydroxyl groups to adsorb water molecules in hydrated copper ions to obtain naked copper ions. Copper ions entering the ring cavity through the upper edge will be complexed with the sulfur bridge bond of the calixarene, and the ring cavity at the lower edge of the calixarene is small, so that copper cannot be precipitated on the cathode. Copper ions can only approach the cathode from the edge of the calixarene, resulting in directional growth of copper grains. At the same time, the overpotential for copper ion precipitation increases. According to the principle of minimum energy, it is beneficial to the precipitation of copper (111) crystal plane, thereby improving the tensile strength of copper foil.
附图说明BRIEF DESCRIPTION OF THE DRAWINGS
图1为本发明磺化硫杂杯[4]芳烃吸附在钛辊上和吸附金属离子图FIG. 1 is a diagram showing the adsorption of sulfonated thiacalix[4]arene on a titanium roller and the adsorption of metal ions.
图2为本发明的实施例1与对比1的对比特征图。FIG. 2 is a comparative characteristic diagram of Example 1 and Comparative Example 1 of the present invention.
图中标号说明:Description of the numbers in the figure:
具体实施方式Detailed ways
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.
本申请实施例第一方面提供一种电解铜箔复合添加剂,复合添加剂包括:添加剂A,该添加剂A为磺化硫杂杯[4]芳烃、磺化硫杂杯[6]芳烃和磺化硫杂杯[8]芳烃中的至少一种,作为光亮剂;添加剂B,作为湿润剂;添加剂C,作为整平剂。可以理解的,添加剂A可以为单独的磺化硫杂杯[4]芳烃、单独的磺化硫杂杯[6]芳烃、单独的磺化硫杂杯[8]芳烃;也可以为磺化硫杂杯[4]芳烃与磺化硫杂杯[6]芳烃的混合剂、磺化硫杂杯[4]芳烃与磺化硫杂杯[8]芳烃的混合剂、磺化硫杂杯[6]芳烃与磺化硫杂杯[8]芳烃的混合剂;还可以为磺化硫杂杯[4]芳烃与磺化硫杂杯[6]芳烃的与磺化硫杂杯[8]芳烃的混合剂。In a first aspect, an embodiment of the present application provides a composite additive for electrolytic copper foil, the composite additive comprising: additive A, which is at least one of sulfonated thiacalix[4]arene, sulfonated thiacalix[6]arene and sulfonated thiacalix[8]arene, as a brightener; additive B, as a wetting agent; and additive C, as a leveling agent. It is understandable that additive A can be a single sulfonated thiacalix[4]arene, a single sulfonated thiacalix[6]arene, a single sulfonated thiacalix[8]arene; it can also be a mixture of sulfonated thiacalix[4]arene and sulfonated thiacalix[6]arene, a mixture of sulfonated thiacalix[4]arene and sulfonated thiacalix[8]arene, a mixture of sulfonated thiacalix[6]arene and sulfonated thiacalix[8]arene; it can also be a mixture of sulfonated thiacalix[4]arene, sulfonated thiacalix[6]arene and sulfonated thiacalix[8]arene.
在一些实施例中,所述添加剂B为乙二醇、聚氧乙烯醚、聚丙烯酰胺、黄原胶中的至少一种。可以理解的,添加剂B可以为乙二醇、聚氧乙烯醚、聚丙烯酰胺、黄原胶中的其中一种,也可以为乙二醇与聚氧乙烯醚混合、乙二醇与聚丙烯酰胺、乙二醇与黄原胶、聚氧乙烯醚与聚丙烯酰胺等两种或三种的混合;还可以为乙二醇、聚氧乙烯醚、聚丙烯酰胺、黄原胶四中全部混合。In some embodiments, the additive B is at least one of ethylene glycol, polyoxyethylene ether, polyacrylamide, and xanthan gum. It is understandable that the additive B can be one of ethylene glycol, polyoxyethylene ether, polyacrylamide, and xanthan gum, or a mixture of ethylene glycol and polyoxyethylene ether, ethylene glycol and polyacrylamide, ethylene glycol and xanthan gum, polyoxyethylene ether and polyacrylamide, or a mixture of two or three thereof; or a mixture of all four of ethylene glycol, polyoxyethylene ether, polyacrylamide, and xanthan gum.
在一些实施例中,所述添加剂C为明胶或胶原蛋白。可以理解的,由于胶原蛋白是明胶的升级版,所以添加剂C为单独的明胶,也可以为单独的胶原蛋白,两者不能混合使用。In some embodiments, the additive C is gelatin or collagen. It is understandable that, since collagen is an upgraded version of gelatin, the additive C is a single gelatin or a single collagen, and the two cannot be mixed for use.
在一些实施例中,所述添加剂B中,乙二醇的分子量为6000-9000Mw。例如:6000Mw、6500Mw、7000Mw、7500Mw、8000Mw、8500Mw、9000Mw等。In some embodiments, in the additive B, the molecular weight of ethylene glycol is 6000-9000Mw, for example: 6000Mw, 6500Mw, 7000Mw, 7500Mw, 8000Mw, 8500Mw, 9000Mw, etc.
在一些实施例中,所述添加剂C中,明胶或胶原蛋白的分子量为2000-5000Mw。例如:2000Mw、2500Mw、3000Mw、3500Mw、4000Mw、4500Mw、5000Mw等。In some embodiments, in the additive C, the molecular weight of gelatin or collagen is 2000-5000Mw, for example: 2000Mw, 2500Mw, 3000Mw, 3500Mw, 4000Mw, 4500Mw, 5000Mw, etc.
本申请实施例第二方面提供了一种高抗拉电解铜箔的制备方法,包括以下步骤:A second aspect of the embodiment of the present application provides a method for preparing a high tensile strength electrolytic copper foil, comprising the following steps:
S1,电解液的制备,将金属铜加入含硫酸的溶铜罐中,鼓入空气,溶解得到硫酸铜电解液;S1, preparation of electrolyte, adding metallic copper into a copper dissolving tank containing sulfuric acid, blowing air into it, and dissolving to obtain copper sulfate electrolyte;
S2,在步骤S1中加入氯化铵,得到主电解液;S2, adding ammonium chloride in step S1 to obtain a main electrolyte;
S3,在步骤S2中加入复合添加剂;S3, adding the composite additive in step S2;
S4,在步骤S3得到的电解液输送至生箔机得到铜箔。S4, the electrolyte obtained in step S3 is transported to a foil machine to obtain copper foil.
在一些实施例中,生铂机生铂过程中换热器温度设定为50-55℃,例如:50℃、51℃、52℃、53℃、54℃、55℃等;输送流量为46-58m3/h,例如:46m3/h、47m3/h、48m3/h、49m3/h、50m3/h、51m3/h、52m3/h、53m3/h、54m3/h、55m3/h、56m3/h、57m3/h、58m3/h等;电流密度为40-46A/dm2,例如:40A/dm2、41A/dm2、42A/dm2、43A/dm2、44A/dm2、45A/dm2、46A/dm2、47A/dm2等。In some embodiments, during the platinum production process of the platinum production machine, the temperature of the heat exchanger is set to 50-55°C, for example, 50°C, 51°C, 52°C, 53°C, 54°C, 55°C, etc.; the delivery flow rate is 46-58m 3 /h, for example, 46m 3 /h, 47m 3 /h, 48m 3 /h, 49m 3 /h, 50m 3 /h, 51m 3 /h, 52m 3 /h, 53m 3 /h, 54m 3 /h, 55m 3 /h, 56m 3 /h, 57m 3 /h, 58m 3 /h, etc.; the current density is 40-46A/dm 2 , for example, 40A/dm 2 , 41A/dm 2 , 42A/dm 2 , 43A/dm 2 , 44A/dm 2 , 45A/dm 2 , 46A/ dm2 , 47A/ dm2 , etc.
在一些实施例中,在完成步骤S后,所述添加剂A在电解液中的浓度为100-160ppm;例如;100ppm、110ppm、120ppm、130ppm、140ppm、150ppm、160ppm等。所述添加剂B在电解液中的浓度为20-40ppm;例如:20ppm、25、ppm、30ppm、35ppm、40ppm等。所述添加剂C在电解液中的浓度为5-45ppm;例如:5ppm、10ppm、15ppm、20ppm、25ppm、30ppm、35ppm、40ppm、45ppm等。铜离子浓度为70-130g/L,例如:70g/L、80g/L、90g/L、100g/L、110g/L、120g/L、130g/L等。氢离子浓度为80-130g/L,例如:80g/L、90g/L、100g/L、110g/L、120g/L、130g/L等。氯离子浓度为15-35ppm,例如:15ppm、20ppm、25ppm、30ppm、35ppm等。In some embodiments, after completing step S, the concentration of the additive A in the electrolyte is 100-160ppm; for example; 100ppm, 110ppm, 120ppm, 130ppm, 140ppm, 150ppm, 160ppm, etc. The concentration of the additive B in the electrolyte is 20-40ppm; for example: 20ppm, 25ppm, 30ppm, 35ppm, 40ppm, etc. The concentration of the additive C in the electrolyte is 5-45ppm; for example: 5ppm, 10ppm, 15ppm, 20ppm, 25ppm, 30ppm, 35ppm, 40ppm, 45ppm, etc. The copper ion concentration is 70-130g/L, for example: 70g/L, 80g/L, 90g/L, 100g/L, 110g/L, 120g/L, 130g/L, etc. The hydrogen ion concentration is 80-130 g/L, for example: 80 g/L, 90 g/L, 100 g/L, 110 g/L, 120 g/L, 130 g/L, etc. The chloride ion concentration is 15-35 ppm, for example: 15 ppm, 20 ppm, 25 ppm, 30 ppm, 35 ppm, etc.
在一些实施例中,所述添加剂A、添加剂B、添加剂C分别先在50-55℃下搅拌溶解,然后依次加入到主电解液中。可以理解的,为了保证稳定性,在添加剂A、B、C加入主电解液之前,需要控制其温度与主电解液温度相同。In some embodiments, the additives A, B, and C are stirred and dissolved at 50-55° C., and then added to the main electrolyte in sequence. It is understandable that in order to ensure stability, before the additives A, B, and C are added to the main electrolyte, their temperatures need to be controlled to be the same as the temperature of the main electrolyte.
在一些实施例中,所述金属铜为金属铜线,铜含量≥99.5%,例如:99.5%、99.6%、99.7%、99.8%、100%。铁含量不超过0.5%,例如:0.5%、0.4%、0.3%、0.2%、0.1%、0%。铜箔厚度为6um。可以理解的,金属铜还可以采用铜块、铜杆、铜片等。In some embodiments, the metal copper is a metal copper wire, and the copper content is ≥99.5%, for example: 99.5%, 99.6%, 99.7%, 99.8%, 100%. The iron content does not exceed 0.5%, for example: 0.5%, 0.4%, 0.3%, 0.2%, 0.1%, 0%. The thickness of the copper foil is 6um. It is understandable that the metal copper can also be a copper block, a copper rod, a copper sheet, etc.
实施例1:Embodiment 1:
将金属铜加入含硫酸的溶铜罐中,鼓入空气,溶解得到硫酸铜电解液,再加入氯化铵,得到主电解液;然后将添加剂A磺化硫杂杯[4]芳烃、添加剂B乙二醇,添加剂C明胶分别在50℃下搅拌溶解,并依次添加到主电解液中,且添加剂A、添加剂B、添加剂C在电解液中的浓度分别为100ppm、20ppm、5ppm;铜离子、氢离子、氯离子在电解液浓度分别为70g/L、80g/L、15ppm;最后将电解液输送至生箔机,生铂机的换热器温度设定为50℃,输送流量为46m3/h,电流密度为40A/dm2,得到厚度为6um的铜箔。Metal copper is added into a copper dissolving tank containing sulfuric acid, air is blown in, and copper sulfate electrolyte is obtained by dissolving the metal copper. Ammonium chloride is then added to obtain a main electrolyte. Additive A (sulfonated thiacalix[4]arene), additive B (ethylene glycol), and additive C (gelatin) are stirred and dissolved at 50°C, and added into the main electrolyte in sequence. The concentrations of additive A, additive B, and additive C in the electrolyte are 100ppm, 20ppm, and 5ppm, respectively. The concentrations of copper ions, hydrogen ions, and chloride ions in the electrolyte are 70g/L, 80g/L, and 15ppm, respectively. Finally, the electrolyte is transported to a foil making machine. The heat exchanger temperature of the platinum making machine is set to 50°C, the transport flow rate is 46m3 /h, and the current density is 40A/ dm2 , so as to obtain a copper foil with a thickness of 6um.
实施例2:Embodiment 2:
将金属铜加入含硫酸的溶铜罐中,鼓入空气,溶解得到硫酸铜电解液,再加入氯化铵,得到主电解液;然后将添加剂A磺化硫杂杯[6]芳烃、添加剂B乙二醇,添加剂C明胶分别在51℃下搅拌溶解,并依次添加到主电解液中,且添加剂A、添加剂B、添加剂C在电解液中的浓度分别为110ppm、20ppm、10ppm;铜离子、氢离子、氯离子在电解液浓度分别为80g/L、90g/L、20ppm;最后将电解液输送至生箔机,生铂机的换热器温度设定为51℃,输送流量为48m3/h,电流密度为42A/dm2,得到厚度为6um的铜箔。Metal copper is added into a copper dissolving tank containing sulfuric acid, air is blown in, and copper sulfate electrolyte is obtained by dissolving. Ammonium chloride is then added to obtain a main electrolyte. Additive A sulfonated thiacalix[6]arene, additive B ethylene glycol, and additive C gelatin are stirred and dissolved at 51°C, and added to the main electrolyte in sequence. The concentrations of additive A, additive B, and additive C in the electrolyte are 110ppm, 20ppm, and 10ppm, respectively. The concentrations of copper ions, hydrogen ions, and chloride ions in the electrolyte are 80g/L, 90g/L, and 20ppm, respectively. Finally, the electrolyte is transported to a foil making machine. The heat exchanger temperature of the platinum making machine is set to 51°C, the transport flow rate is 48m3 /h, and the current density is 42A/ dm2 , so as to obtain a copper foil with a thickness of 6um.
实施例3:Embodiment 3:
将金属铜加入含硫酸的溶铜罐中,鼓入空气,溶解得到硫酸铜电解液,再加入氯化铵,得到主电解液;然后将添加剂A磺化硫杂杯[8]芳烃、添加剂B乙二醇,添加剂C明胶分别在52℃下搅拌溶解,并依次添加到主电解液中,且添加剂A、添加剂B、添加剂C在电解液中的浓度分别为120ppm、30ppm、15ppm;铜离子、氢离子、氯离子在电解液浓度分别为90g/L、100g/L、25ppm;最后将电解液输送至生箔机,生铂机的换热器温度设定为52℃,输送流量为50m3/h,电流密度为43A/dm2,得到厚度为6um的铜箔。Metal copper is added into a copper dissolving tank containing sulfuric acid, air is blown in, and copper sulfate electrolyte is obtained by dissolving the metal copper. Ammonium chloride is then added to obtain a main electrolyte. Additive A (sulfonated thiacalix[8]arene), additive B (ethylene glycol), and additive C (gelatin) are stirred and dissolved at 52°C, and added into the main electrolyte in sequence. The concentrations of additive A, additive B, and additive C in the electrolyte are 120ppm, 30ppm, and 15ppm, respectively. The concentrations of copper ions, hydrogen ions, and chloride ions in the electrolyte are 90g/L, 100g/L, and 25ppm, respectively. Finally, the electrolyte is transported to a foil making machine. The heat exchanger temperature of the platinum making machine is set to 52°C, the transport flow rate is 50m3 /h, and the current density is 43A/ dm2 , so as to obtain a copper foil with a thickness of 6um.
实施例4:Embodiment 4:
将金属铜加入含硫酸的溶铜罐中,鼓入空气,溶解得到硫酸铜电解液,再加入氯化铵,得到主电解液;然后将添加剂A磺化硫杂杯[4]芳烃和磺化硫杂杯[6]芳烃的混合剂、添加剂B乙二醇与聚氧乙烯醚的混合剂,添加剂C明胶分别在53℃下搅拌溶解,并依次添加到主电解液中,且添加剂A、添加剂B、添加剂C在电解液中的浓度分别为130ppm、35ppm、25ppm;铜离子、氢离子、氯离子在电解液浓度分别为100g/L、110g/L、30ppm;最后将电解液输送至生箔机,生铂机的换热器温度设定为53℃,输送流量为52m3/h,电流密度为44A/dm2,得到厚度为6um的铜箔。Metal copper is added into a copper dissolving tank containing sulfuric acid, air is blown in, and copper sulfate electrolyte is obtained by dissolving the metal copper. Ammonium chloride is then added to obtain a main electrolyte. Additive A, a mixture of sulfonated thiacalix[4]arene and sulfonated thiacalix[6]arene, additive B, a mixture of ethylene glycol and polyoxyethylene ether, and additive C, gelatin are stirred and dissolved at 53°C, and added into the main electrolyte in sequence. The concentrations of additive A, additive B, and additive C in the electrolyte are 130ppm, 35ppm, and 25ppm, respectively. The concentrations of copper ions, hydrogen ions, and chloride ions in the electrolyte are 100g/L, 110g/L, and 30ppm, respectively. Finally, the electrolyte is transported to a foil making machine. The heat exchanger temperature of the platinum making machine is set to 53°C, the transport flow rate is 52m3 /h, and the current density is 44A/ dm2 , so as to obtain a copper foil with a thickness of 6um.
实施例5:Embodiment 5:
将金属铜加入含硫酸的溶铜罐中,鼓入空气,溶解得到硫酸铜电解液,再加入氯化铵,得到主电解液;然后将添加剂A磺化硫杂杯[4]芳烃和磺化硫杂杯[8]芳烃的混合剂、添加剂B乙二醇和聚氧乙烯醚和聚丙烯酰胺的混合剂,添加剂C胶原蛋白分别在54℃下搅拌溶解,并依次添加到主电解液中,且添加剂A、添加剂B、添加剂C在电解液中的浓度分别为140ppm、35ppm、35ppm;铜离子、氢离子、氯离子在电解液浓度分别为120g/L、120g/L、30ppm;最后将电解液输送至生箔机,生铂机的换热器温度设定为54℃,输送流量为55m3/h,电流密度为45A/dm2,得到厚度为6um的铜箔。Metal copper is added into a copper dissolving tank containing sulfuric acid, air is blown in, and copper sulfate electrolyte is obtained by dissolving. Ammonium chloride is then added to obtain a main electrolyte. Then, additive A, a mixture of sulfonated thiacalix [4]arene and sulfonated thiacalix [8]arene, additive B, a mixture of ethylene glycol, polyoxyethylene ether and polyacrylamide, and additive C, collagen are stirred and dissolved at 54° C., and added to the main electrolyte in sequence. The concentrations of additive A, additive B and additive C in the electrolyte are 140 ppm, 35 ppm and 35 ppm, respectively. The concentrations of copper ions, hydrogen ions and chloride ions in the electrolyte are 120 g/L, 120 g/L and 30 ppm, respectively. Finally, the electrolyte is transported to a foil making machine. The heat exchanger temperature of the platinum making machine is set to 54° C., the transport flow rate is 55 m 3 /h, and the current density is 45 A/dm 2. A copper foil with a thickness of 6 um is obtained.
实施例6:Embodiment 6:
将金属铜加入含硫酸的溶铜罐中,鼓入空气,溶解得到硫酸铜电解液,再加入氯化铵,得到主电解液;然后将添加A剂磺化硫杂杯[4]芳烃和磺化硫杂杯[6]芳烃和磺化硫杂杯[8]芳烃的混合剂、添加剂B乙二醇和聚氧乙烯醚和聚丙烯酰胺和黄原胶的混合剂,添加剂C胶原蛋白分别在55℃下搅拌溶解,并依次添加到主电解液中,且添加剂A、添加剂B、添加剂C在电解液中的浓度分别为160ppm、40ppm、45ppm;铜离子、氢离子、氯离子在电解液浓度分别为130g/L、130g/L、35ppm;最后将电解液输送至生箔机,生铂机的换热器温度设定为55℃,输送流量为58m3/h,电流密度为46A/dm2,得到厚度为6um的铜箔。Metal copper is added into a copper dissolving tank containing sulfuric acid, air is blown in, and copper sulfate electrolyte is obtained by dissolving the metal copper into the copper dissolving tank, and ammonium chloride is added to obtain a main electrolyte. Then, an agent A, a mixture of sulfonated thiacalix [4]arene, sulfonated thiacalix [6]arene and sulfonated thiacalix [8]arene, an additive B, a mixture of ethylene glycol and polyoxyethylene ether, polyacrylamide and xanthan gum, and an additive C, collagen are stirred and dissolved at 55° C., and added into the main electrolyte in sequence, and the concentrations of the additive A, additive B and additive C in the electrolyte are 160 ppm, 40 ppm and 45 ppm respectively. The concentrations of copper ions, hydrogen ions and chloride ions in the electrolyte are 130 g/L, 130 g/L and 35 ppm respectively. Finally, the electrolyte is transported to a foil making machine, the heat exchanger temperature of the platinum making machine is set to 55° C., the transport flow rate is 58 m 3 /h, and the current density is 46 A/dm 2 , to obtain a copper foil with a thickness of 6 um.
参考图1,由于磺化硫杂杯芳烃的刚性结构,吸附在阴极上的杯芳烃形成以磺酸基向上的定向排列。硫杂芳香烃可利用磺酸基和羟基吸附水合铜离子中水分子,得到裸露的铜离子。进入通过上缘进入环腔的铜离子,会与杯芳烃的硫桥键发生络合,且杯芳烃下缘的环腔较小,使铜不能在阴极上析出。铜离子只能从杯芳烃边缘向阴极靠近,导致铜晶粒的定向生长,同时铜离子析出的过电位增加,根据能量最低原则,有利于铜的(111)晶面析出。Referring to Figure 1, due to the rigid structure of sulfonated thiacalixarene, the thiacalixarene adsorbed on the cathode forms a directional arrangement with the sulfonic acid group facing upward. The thiacalixarene can use the sulfonic acid group and the hydroxyl group to adsorb the water molecules in the hydrated copper ions to obtain naked copper ions. The copper ions that enter the ring cavity through the upper edge will be complexed with the sulfur bridge bond of the thiacalixarene, and the ring cavity at the lower edge of the thiacalixarene is small, so that copper cannot be precipitated on the cathode. The copper ions can only approach the cathode from the edge of the thiacalixarene, resulting in the directional growth of copper grains. At the same time, the overpotential of copper ion precipitation increases. According to the minimum energy principle, it is beneficial to the precipitation of copper on the (111) crystal plane.
对比例1:Comparative Example 1:
将金属铜加入含硫酸的溶铜罐中,鼓入空气,溶解得到硫酸铜电解液,再加入氯化铵,得到主电解液;然后将SPS作为光亮剂、添加剂B乙二醇,添加剂C明胶分别在50℃下搅拌溶解,并依次添加到主电解液中,且SPS光亮剂、添加剂B、添加剂C在电解液中的浓度分别为100ppm、20ppm、5ppm;铜离子、氢离子、氯离子在电解液浓度分别为70g/L、80g/L、15ppm;最后将电解液输送至生箔机,生铂机的换热器温度设定为50℃,输送流量为46m3/h,电流密度为40A/dm2,得到厚度为6um的铜箔。Metal copper is added into a copper dissolving tank containing sulfuric acid, air is blown in, and copper sulfate electrolyte is obtained by dissolving. Ammonium chloride is then added to obtain a main electrolyte. SPS as a brightener, ethylene glycol as an additive B, and gelatin as an additive C are stirred and dissolved at 50°C, and added to the main electrolyte in sequence. The concentrations of SPS brightener, additive B, and additive C in the electrolyte are 100ppm, 20ppm, and 5ppm, respectively. The concentrations of copper ions, hydrogen ions, and chloride ions in the electrolyte are 70g/L, 80g/L, and 15ppm, respectively. Finally, the electrolyte is transported to a foil making machine, the heat exchanger temperature of the platinum making machine is set to 50°C, the transport flow rate is 46m3 /h, and the current density is 40A/ dm2 , so as to obtain a copper foil with a thickness of 6um.
参考图2,对比例1为图2的1号走势曲线;实施例1为图2的2号走势曲线。1、2号样品的特征峰高比I(111)/I(220)依次为:1.748、1.618,表明用磺化硫杂杯[4]芳烃促进了铜箔内部铜晶粒的二次取向生长,提高了铜晶粒的晶化程度。铜晶粒中(111)晶面越多,铜箔的抗拉强度越高。Referring to Figure 2, Comparative Example 1 is the trend curve No. 1 of Figure 2; Example 1 is the trend curve No. 2 of Figure 2. The characteristic peak height ratios I(111)/I(220) of samples No. 1 and No. 2 are 1.748 and 1.618, respectively, indicating that the use of sulfonated thiacalix[4]arene promotes the secondary orientation growth of copper grains inside the copper foil and improves the crystallization degree of copper grains. The more (111) crystal planes in the copper grains, the higher the tensile strength of the copper foil.
本发明使用的电解铜箔复合添加剂制备的锂电铜箔,具有抗拉强度高,厚度均匀的优点,经测定,常温下3%弹性形变下,抗拉伸强度≥680Mpa,在300℃,氮气保护下烘烤后16h,铜箔抗拉强度≥450Mpa。The lithium battery copper foil prepared by the electrolytic copper foil composite additive used in the present invention has the advantages of high tensile strength and uniform thickness. It has been measured that the tensile strength is ≥680Mpa under 3% elastic deformation at room temperature, and the tensile strength of the copper foil is ≥450Mpa after baking at 300°C under nitrogen protection for 16 hours.
以上所述,仅为本发明较佳的具体实施方式;但本发明的保护范围并不局限于此。任何熟悉本技术领域的技术人员在本发明揭露的技术范围内,根据本发明的技术方案及其改进构思加以等同替换或改变,都应涵盖在本发明的保护范围内。The above is only a preferred specific implementation of the present invention; however, the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes according to the technical solution and its improved conception within the technical scope disclosed by the present invention, which should be covered by the protection scope of the present invention.
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