CN117883290A - Low-oxygen polymerization-inhibition adhesive for dentistry - Google Patents
Low-oxygen polymerization-inhibition adhesive for dentistry Download PDFInfo
- Publication number
- CN117883290A CN117883290A CN202410062644.7A CN202410062644A CN117883290A CN 117883290 A CN117883290 A CN 117883290A CN 202410062644 A CN202410062644 A CN 202410062644A CN 117883290 A CN117883290 A CN 117883290A
- Authority
- CN
- China
- Prior art keywords
- adhesive
- dental
- filler
- polymerization
- low
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 239000001301 oxygen Substances 0.000 title claims abstract description 46
- 229910052760 oxygen Inorganic materials 0.000 title claims abstract description 46
- 239000000853 adhesive Substances 0.000 title claims abstract description 45
- 230000001070 adhesive effect Effects 0.000 title claims abstract description 45
- -1 tertiary amine compound Chemical class 0.000 claims abstract description 45
- 238000006116 polymerization reaction Methods 0.000 claims abstract description 44
- 239000003479 dental cement Substances 0.000 claims abstract description 37
- 239000011347 resin Substances 0.000 claims abstract description 30
- 229920005989 resin Polymers 0.000 claims abstract description 30
- 239000000945 filler Substances 0.000 claims abstract description 24
- 230000005764 inhibitory process Effects 0.000 claims abstract description 23
- 239000003999 initiator Substances 0.000 claims abstract description 22
- 239000000178 monomer Substances 0.000 claims abstract description 22
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 20
- 239000011159 matrix material Substances 0.000 claims abstract description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 30
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 15
- 239000003112 inhibitor Substances 0.000 claims description 15
- 239000002904 solvent Substances 0.000 claims description 15
- 239000011256 inorganic filler Substances 0.000 claims description 14
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 14
- 239000004925 Acrylic resin Substances 0.000 claims description 13
- 229920000178 Acrylic resin Polymers 0.000 claims description 13
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 13
- 239000000203 mixture Substances 0.000 claims description 10
- 239000012766 organic filler Substances 0.000 claims description 10
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 claims description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 9
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 claims description 9
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 9
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 9
- 229930006711 bornane-2,3-dione Natural products 0.000 claims description 8
- VNQXSTWCDUXYEZ-UHFFFAOYSA-N 1,7,7-trimethylbicyclo[2.2.1]heptane-2,3-dione Chemical compound C1CC2(C)C(=O)C(=O)C1C2(C)C VNQXSTWCDUXYEZ-UHFFFAOYSA-N 0.000 claims description 7
- RXYPXQSKLGGKOL-UHFFFAOYSA-N 1,4-dimethylpiperazine Chemical compound CN1CCN(C)CC1 RXYPXQSKLGGKOL-UHFFFAOYSA-N 0.000 claims description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 claims description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims description 6
- GGSUCNLOZRCGPQ-UHFFFAOYSA-N diethylaniline Chemical compound CCN(CC)C1=CC=CC=C1 GGSUCNLOZRCGPQ-UHFFFAOYSA-N 0.000 claims description 6
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 claims description 6
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 claims description 5
- 230000002401 inhibitory effect Effects 0.000 claims description 5
- 239000002245 particle Substances 0.000 claims description 5
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 4
- 230000002378 acidificating effect Effects 0.000 claims description 4
- 230000002209 hydrophobic effect Effects 0.000 claims description 4
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 claims description 3
- FJLUATLTXUNBOT-UHFFFAOYSA-N 1-Hexadecylamine Chemical compound CCCCCCCCCCCCCCCCN FJLUATLTXUNBOT-UHFFFAOYSA-N 0.000 claims description 3
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 claims description 3
- JUVSRZCUMWZBFK-UHFFFAOYSA-N 2-[n-(2-hydroxyethyl)-4-methylanilino]ethanol Chemical compound CC1=CC=C(N(CCO)CCO)C=C1 JUVSRZCUMWZBFK-UHFFFAOYSA-N 0.000 claims description 3
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 3
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 claims description 3
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 claims description 3
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 claims description 3
- REYJJPSVUYRZGE-UHFFFAOYSA-N Octadecylamine Chemical compound CCCCCCCCCCCCCCCCCCN REYJJPSVUYRZGE-UHFFFAOYSA-N 0.000 claims description 3
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 claims description 3
- 244000028419 Styrax benzoin Species 0.000 claims description 3
- 235000000126 Styrax benzoin Nutrition 0.000 claims description 3
- 235000008411 Sumatra benzointree Nutrition 0.000 claims description 3
- 241000779819 Syncarpia glomulifera Species 0.000 claims description 3
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 claims description 3
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 claims description 3
- 229960002130 benzoin Drugs 0.000 claims description 3
- 229940043232 butyl acetate Drugs 0.000 claims description 3
- 229960001701 chloroform Drugs 0.000 claims description 3
- 239000008367 deionised water Substances 0.000 claims description 3
- 229910021641 deionized water Inorganic materials 0.000 claims description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 claims description 3
- 239000012955 diaryliodonium Substances 0.000 claims description 3
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 claims description 3
- NHFDKKSSQWCEES-UHFFFAOYSA-N dihydrogen phosphate;tris(2-hydroxyethyl)azanium Chemical compound OP(O)(O)=O.OCCN(CCO)CCO NHFDKKSSQWCEES-UHFFFAOYSA-N 0.000 claims description 3
- 238000007865 diluting Methods 0.000 claims description 3
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 claims description 3
- JRBPAEWTRLWTQC-UHFFFAOYSA-N dodecylamine Chemical compound CCCCCCCCCCCCN JRBPAEWTRLWTQC-UHFFFAOYSA-N 0.000 claims description 3
- 150000002148 esters Chemical class 0.000 claims description 3
- 229940093499 ethyl acetate Drugs 0.000 claims description 3
- 235000019382 gum benzoic Nutrition 0.000 claims description 3
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 claims description 3
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 claims description 3
- 229940011051 isopropyl acetate Drugs 0.000 claims description 3
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 claims description 3
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 claims description 3
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 claims description 3
- 229940032007 methylethyl ketone Drugs 0.000 claims description 3
- GYVGXEWAOAAJEU-UHFFFAOYSA-N n,n,4-trimethylaniline Chemical compound CN(C)C1=CC=C(C)C=C1 GYVGXEWAOAAJEU-UHFFFAOYSA-N 0.000 claims description 3
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 claims description 3
- HKUFIYBZNQSHQS-UHFFFAOYSA-N n-octadecyloctadecan-1-amine Chemical compound CCCCCCCCCCCCCCCCCCNCCCCCCCCCCCCCCCCCC HKUFIYBZNQSHQS-UHFFFAOYSA-N 0.000 claims description 3
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 claims description 3
- 239000001739 pinus spp. Substances 0.000 claims description 3
- 229940090181 propyl acetate Drugs 0.000 claims description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 3
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 claims description 3
- 229940036248 turpentine Drugs 0.000 claims description 3
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N benzo-alpha-pyrone Natural products C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 claims description 2
- 235000001671 coumarin Nutrition 0.000 claims description 2
- 150000004775 coumarins Chemical class 0.000 claims description 2
- 125000005409 triarylsulfonium group Chemical group 0.000 claims description 2
- 125000005520 diaryliodonium group Chemical group 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 12
- 239000000463 material Substances 0.000 abstract description 8
- 238000000034 method Methods 0.000 abstract description 7
- 210000003298 dental enamel Anatomy 0.000 abstract description 6
- 210000004268 dentin Anatomy 0.000 abstract description 6
- 230000008569 process Effects 0.000 abstract description 6
- 239000010410 layer Substances 0.000 description 19
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 18
- 150000003254 radicals Chemical class 0.000 description 11
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 9
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 8
- UKMBKKFLJMFCSA-UHFFFAOYSA-N [3-hydroxy-2-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)OC(=O)C(C)=C UKMBKKFLJMFCSA-UHFFFAOYSA-N 0.000 description 8
- 235000010354 butylated hydroxytoluene Nutrition 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- 238000001723 curing Methods 0.000 description 7
- 229910021485 fumed silica Inorganic materials 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 5
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- CFKBCVIYTWDYRP-UHFFFAOYSA-N 10-phosphonooxydecyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCCCCCCCOP(O)(O)=O CFKBCVIYTWDYRP-UHFFFAOYSA-N 0.000 description 4
- 229930185605 Bisphenol Natural products 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 230000008439 repair process Effects 0.000 description 4
- AMFGWXWBFGVCKG-UHFFFAOYSA-N Panavia opaque Chemical compound C1=CC(OCC(O)COC(=O)C(=C)C)=CC=C1C(C)(C)C1=CC=C(OCC(O)COC(=O)C(C)=C)C=C1 AMFGWXWBFGVCKG-UHFFFAOYSA-N 0.000 description 3
- 239000012752 auxiliary agent Substances 0.000 description 3
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- 230000000977 initiatory effect Effects 0.000 description 3
- 125000000864 peroxy group Chemical group O(O*)* 0.000 description 3
- 238000005303 weighing Methods 0.000 description 3
- HWSSEYVMGDIFMH-UHFFFAOYSA-N 2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOC(=O)C(C)=C HWSSEYVMGDIFMH-UHFFFAOYSA-N 0.000 description 2
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 2
- GNSFRPWPOGYVLO-UHFFFAOYSA-N 3-hydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCO GNSFRPWPOGYVLO-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
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- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
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- 230000009286 beneficial effect Effects 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000000805 composite resin Substances 0.000 description 2
- 230000002708 enhancing effect Effects 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- 239000000852 hydrogen donor Substances 0.000 description 2
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- HHQAGBQXOWLTLL-UHFFFAOYSA-N (2-hydroxy-3-phenoxypropyl) prop-2-enoate Chemical compound C=CC(=O)OCC(O)COC1=CC=CC=C1 HHQAGBQXOWLTLL-UHFFFAOYSA-N 0.000 description 1
- LDVVTQMJQSCDMK-UHFFFAOYSA-N 1,3-dihydroxypropan-2-yl formate Chemical compound OCC(CO)OC=O LDVVTQMJQSCDMK-UHFFFAOYSA-N 0.000 description 1
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- WDFFWUVELIFAOP-UHFFFAOYSA-N 2,6-difluoro-4-nitroaniline Chemical compound NC1=C(F)C=C([N+]([O-])=O)C=C1F WDFFWUVELIFAOP-UHFFFAOYSA-N 0.000 description 1
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- UEKHZPDUBLCUHN-UHFFFAOYSA-N 2-[[3,5,5-trimethyl-6-[2-(2-methylprop-2-enoyloxy)ethoxycarbonylamino]hexyl]carbamoyloxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOC(=O)NCCC(C)CC(C)(C)CNC(=O)OCCOC(=O)C(C)=C UEKHZPDUBLCUHN-UHFFFAOYSA-N 0.000 description 1
- NXBXJOWBDCQIHF-UHFFFAOYSA-N 2-[hydroxy-[2-(2-methylprop-2-enoyloxy)ethoxy]phosphoryl]oxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOP(O)(=O)OCCOC(=O)C(C)=C NXBXJOWBDCQIHF-UHFFFAOYSA-N 0.000 description 1
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- IEVADDDOVGMCSI-UHFFFAOYSA-N 2-hydroxybutyl 2-methylprop-2-enoate Chemical compound CCC(O)COC(=O)C(C)=C IEVADDDOVGMCSI-UHFFFAOYSA-N 0.000 description 1
- NJRHMGPRPPEGQL-UHFFFAOYSA-N 2-hydroxybutyl prop-2-enoate Chemical compound CCC(O)COC(=O)C=C NJRHMGPRPPEGQL-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- CEXQWAAGPPNOQF-UHFFFAOYSA-N 2-phenoxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOC1=CC=CC=C1 CEXQWAAGPPNOQF-UHFFFAOYSA-N 0.000 description 1
- RZVINYQDSSQUKO-UHFFFAOYSA-N 2-phenoxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC1=CC=CC=C1 RZVINYQDSSQUKO-UHFFFAOYSA-N 0.000 description 1
- SEILKFZTLVMHRR-UHFFFAOYSA-N 2-phosphonooxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOP(O)(O)=O SEILKFZTLVMHRR-UHFFFAOYSA-N 0.000 description 1
- YKXAYLPDMSGWEV-UHFFFAOYSA-N 4-hydroxybutyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCO YKXAYLPDMSGWEV-UHFFFAOYSA-N 0.000 description 1
- NDWUBGAGUCISDV-UHFFFAOYSA-N 4-hydroxybutyl prop-2-enoate Chemical compound OCCCCOC(=O)C=C NDWUBGAGUCISDV-UHFFFAOYSA-N 0.000 description 1
- XFOFBPRPOAWWPA-UHFFFAOYSA-N 6-hydroxyhexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCCCO XFOFBPRPOAWWPA-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- ASFHYIAIHXYBEN-UHFFFAOYSA-N [2-(2-methylprop-2-enoyloxy)-3-phosphonooxypropyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(COP(O)(O)=O)OC(=O)C(C)=C ASFHYIAIHXYBEN-UHFFFAOYSA-N 0.000 description 1
- MRCMTIRVXOVDMR-UHFFFAOYSA-N [3-oxo-3-(5-prop-2-enoyloxypentoxy)propyl]phosphonic acid Chemical compound OP(O)(=O)CCC(=O)OCCCCCOC(=O)C=C MRCMTIRVXOVDMR-UHFFFAOYSA-N 0.000 description 1
- KAOQCJIKVJCWDU-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl]methyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1CCC(CO)CC1 KAOQCJIKVJCWDU-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical group [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000005312 bioglass Substances 0.000 description 1
- QUZSUMLPWDHKCJ-UHFFFAOYSA-N bisphenol A dimethacrylate Chemical compound C1=CC(OC(=O)C(=C)C)=CC=C1C(C)(C)C1=CC=C(OC(=O)C(C)=C)C=C1 QUZSUMLPWDHKCJ-UHFFFAOYSA-N 0.000 description 1
- 125000002362 bornane-2,3-dione group Chemical group 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000011350 dental composite resin Substances 0.000 description 1
- 239000004851 dental resin Substances 0.000 description 1
- XHPJVJINAJVSFG-UHFFFAOYSA-N dodecane-1,1-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.CCCCCCCCCCCC(O)O XHPJVJINAJVSFG-UHFFFAOYSA-N 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- LNCPIMCVTKXXOY-UHFFFAOYSA-N hexyl 2-methylprop-2-enoate Chemical compound CCCCCCOC(=O)C(C)=C LNCPIMCVTKXXOY-UHFFFAOYSA-N 0.000 description 1
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- TUJKJAMUKRIRHC-UHFFFAOYSA-N hydroxyl Chemical compound [OH] TUJKJAMUKRIRHC-UHFFFAOYSA-N 0.000 description 1
- 229910052588 hydroxylapatite Inorganic materials 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- ZZSKMNCIAKKVRB-UHFFFAOYSA-N morpholin-4-yl-(2-nitrophenyl)methanone Chemical compound [O-][N+](=O)C1=CC=CC=C1C(=O)N1CCOCC1 ZZSKMNCIAKKVRB-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- XYJRXVWERLGGKC-UHFFFAOYSA-D pentacalcium;hydroxide;triphosphate Chemical compound [OH-].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O XYJRXVWERLGGKC-UHFFFAOYSA-D 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 229940051841 polyoxyethylene ether Drugs 0.000 description 1
- 229920000056 polyoxyethylene ether Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000011698 potassium fluoride Substances 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 238000007348 radical reaction Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- FVRNDBHWWSPNOM-UHFFFAOYSA-L strontium fluoride Chemical compound [F-].[F-].[Sr+2] FVRNDBHWWSPNOM-UHFFFAOYSA-L 0.000 description 1
- 229910001637 strontium fluoride Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- AZADLAPXFZPRFJ-UHFFFAOYSA-N sulfanylmethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCS AZADLAPXFZPRFJ-UHFFFAOYSA-N 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 235000010215 titanium dioxide Nutrition 0.000 description 1
- 229910001868 water Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Dental Preparations (AREA)
Abstract
The invention relates to the technical field of dental restoration materials, in particular to a low-oxygen polymerization-inhibition dental adhesive. The low-oxygen polymerization-inhibition dental adhesive comprises the following components in percentage by weight: 20-90 wt% of matrix resin; 0-15 wt% of filler; 1 to 5 weight percent of tertiary amine compound; the matrix resin comprises a polymerizable resin monomer, a photopolymerization initiator and a photopolymerization promoter; the polymerizable resin monomer is a polymerizable acrylate monomer; the total content of the photopolymerization initiator and the photopolymerization promoter is less than 10wt%. The low-oxygen polymerization inhibition dental adhesive provided by the invention has high adhesive strength, good adhesive durability and low-oxygen polymerization inhibition effect, is suitable for pretreatment of dental restoration adhesive surfaces of enamel, dentin and various materials, and completes various direct restoration operations and indirect restoration operations in the oral restoration process.
Description
Technical Field
The invention relates to the technical field of dental restoration materials, in particular to a low-oxygen polymerization-inhibition dental adhesive.
Background
The polymer is a high molecular compound formed by connecting a large number of monomer molecules through chemical bonds, and when the polymer is subjected to polymerization reaction in the presence of oxygen, the oxygen can react with active intermediates in the polymer, so that an oxygen polymerization inhibition effect is initiated. The oxygen inhibition effect refers to a phenomenon in which the polymerization rate of a polymer is slowed or stopped by the influence of oxygen under certain conditions. Particularly in free radical polymerization, the oxygen inhibition effect is prevalent. The polymerization inhibition of oxygen molecules is mainly reflected in the following two aspects: (1) Quenching the excited state photoinitiator to prevent the generation of active free radicals; (2) Combines with the active free radical to form the peroxy free radical without addition activity.
Currently, most common adhesives contain photoinitiators, and most initiating systems are free radical reactions. Meanwhile, most of the photo-curing process is performed in an air environment, so that oxygen molecules have a non-negligible polymerization inhibition effect on radical polymerization. The photo-or chemical-cured dental composite resin, after polymerization, forms a soft, viscous surface layer, commonly referred to as an oxygen barrier layer. The thickness of the oxygen inhibition layer is increased to reduce the bonding strength between the lamination of the composite resin, and meanwhile, the excessively thick oxygen inhibition layer of the adhesive can cause the phenomenon of slipping during the filling of the composite resin, which is unfavorable for the direct repairing operation of the resin. The above drawbacks are to be overcome by those skilled in the art.
Disclosure of Invention
The present invention has been made to overcome the above-mentioned drawbacks of the prior art, and an object of the present invention is to provide a low oxygen polymerization inhibiting dental adhesive having the advantages of high adhesive strength and high adhesive durability.
In order to solve the technical problems, the invention adopts the following technical scheme:
The low-oxygen polymerization-inhibition dental adhesive comprises the following components in percentage by weight:
20-90 wt% of matrix resin;
0-15 wt% of filler;
1 to 5 weight percent of tertiary amine compound;
The matrix resin comprises a polymerizable resin monomer, a photopolymerization initiator and a photopolymerization promoter; the polymerizable resin monomer is a polymerizable acrylate monomer; the total content of the photopolymerization initiator and the photopolymerization promoter is less than 10wt%.
Further, the polymerizable acrylate monomer is any one or more of hydrophilic acrylic resin, hydrophobic acrylic resin and acidic acrylic resin.
Further, the photopolymerization initiator is any one or more of alpha-diketones, ketals, thioxanthones, (di) acyl phosphine oxides, benzoin alkyl ethers, benzildimethyl ketals, coumarins, diaryliodonium hexafluorophosphates, triarylsulfonium hexafluorophosphates, triarylselenonium hexafluorophosphates, camphorquinone, and 2,4, 6-trimethylbenzoyl-diphenyl phosphine oxide (TPO);
The photopolymerization promoter is any one or more of mixture of 4-dimethylaminoethyl benzoate, N-dimethylaminoethyl ester and dimethylaminoethyl methacrylate.
Further, the matrix resin further comprises a polymerization inhibitor; the content of the polymerization inhibitor is less than 2wt%.
Preferably, the polymerization inhibitor is any one or a mixture of 2, 6-di-tert-butyl-p-cresol and p-hydroxyanisole.
Further, the filler is an inorganic filler or an organic filler or a mixture of an inorganic filler and an organic filler.
Preferably, the filler has an average particle diameter of 0.001 m to 1. Mu.m.
Further, the tertiary amine compound is any one of triethanolamine, triethylamine, triethanolamine phosphate, N-methyldiethanolamine, dodecylamine, hexadecylamine, octadecylamine, dioctadecylamine, N, N dimethylaniline, N, N diethylaniline, N, N dimethyl-p-toluidine, N, N dihydroxyethyl-p-toluidine, N-methyl-N hydroxyethyl-p-toluidine, N, N, N ', N ' -tetramethyl ethylenediamine, N, N dimethylethanolamine, N, N ' -dimethylpiperazine, N, N, N ', N ' -tetramethyl urea.
Further, the adhesive also comprises a solvent for diluting the adhesive and improving the system stability of the adhesive; the content of the solvent is 5-60 wt%.
Preferably, the solvent is any one or more of ethanol, isopropanol, acetone, methanol, n-butanol, cyclohexane, methylcyclohexane, dichloromethane, trichloroethylene, trichloromethane, methyl acetate, ethyl acetate, propyl acetate, isopropyl acetate, diethylene glycol monobutyl ether, butyl acetate, methyl ethyl ketone, cyclohexanone, turpentine, tetrahydrofuran and deionized water.
Compared with the prior art, the invention has the following beneficial effects:
according to the low-oxygen polymerization inhibition adhesive for dentistry, tertiary amine compounds are added into a system, and the tertiary amine compounds serve as active hydrogen donors, so that the tertiary amine compounds can rapidly react with peroxy free radicals, consume peroxy free radicals without addition activity and release alkoxy free radicals and hydroxyl free radicals; the released alkoxy free radical and hydroxyl free radical can also initiate the polymerization reaction of the polymerizable acrylate monomer in the dental adhesive, thereby improving the polymerization rate, promoting the curing of the dental adhesive and effectively reducing the thickness of the oxygen inhibition layer. The low-oxygen polymerization-inhibition dental adhesive has high adhesive strength, good adhesive durability and thinner oxygen polymerization-inhibition layer thickness, is favorable for avoiding the problem of slipping in the resin filling process, is suitable for pretreatment of adhesive surfaces of dental restorations of enamel, dentin and various materials, and completes various direct repair operations and indirect repair operations in the oral restoration process.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the technical solutions in the embodiments of the present invention will be clearly and completely described below, and it is apparent that the described embodiments are some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
The invention relates to a low-oxygen polymerization inhibition dental adhesive, which comprises the following components: matrix resin, filler, tertiary amine compound and solvent. The dental adhesive has high adhesive strength, high adhesive durability and low oxygen polymerization inhibition effect, and can be used for pretreatment of dental restoration adhesive surfaces of enamel, dentin and various materials, and various direct restoration operations and indirect restoration operations in the oral restoration process are completed.
The content of the matrix resin accounts for 20-90 wt% of the whole system; by way of example, the content of the matrix resin may be, but is not limited to, 20wt%, 30wt%, 35wt%, 40wt%, 45wt%, 50wt%, 55wt%, 60wt%, 65wt%, 70wt%, 80wt%, 90wt%. The matrix resin comprises polymerizable resin monomer, photopolymerization initiator, photopolymerization promoter and polymerization inhibitor.
The polymerizable resin monomer is a polymerizable acrylate monomer; the polymerizable acrylate monomer can be polymerized under the action of a photopolymerization initiator and a photopolymerization promoter. The polymerizable acrylate monomer is any one or more of hydrophilic acrylic resin, hydrophobic acrylic resin and acidic acrylic resin. Hydrophilic acrylic resins include, but are not limited to, the following resins: hydroxyethyl methacrylate (HEMA), hydroxypropyl methacrylate (HPMA), glycerol Dimethacrylate (GDMA), monoglyceride methacrylate (GMMA), 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 2-hydroxybutyl acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 4-hydroxybutyl acrylate or propylene glycol mono-methacrylate.
Hydrophobic acrylic resins include, but are not limited to, the following resins: dimethacrylate polyurethane (UDMA), di-urethane di (meth) acrylate (DUDMA), bisphenol A-dimethacrylate polyoxyethylene Ether (EBPADMA), bisphenol A-dimethacrylate glycidyl (Bis-GMA), triethylene glycol dimethacrylate (TEGDMA), methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, hexyl methacrylate, cyclohexyl methacrylate, ethoxydiglycol methacrylate, methoxytriethylene glycol methacrylate, phenoxyethyl methacrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, 2-hydroxybutyl methacrylate, 2-hydroxy-3-phenoxypropyl methacrylate, 4-hydroxybutyl methacrylate, 1, 4-cyclohexanedimethanol monomethacrylate, methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, hexyl acrylate, cyclohexyl acrylate, ethoxydiglycol acrylate, methoxytriethylene glycol acrylate, phenoxyethyl acrylate, 1, 4-butanediol di (meth) acrylate dodecanediol, di (meth) acrylate, 1, 6-hexanediol methacrylate, trimethylolpropane (meth) acrylate, trimethylolpropane (TMA), trimethylolpropane (meth) acrylate (TMA), trimethylolpropane (TMA), pentaerythritol di (meth) acrylate or pentaerythritol tri (meth) acrylate.
Acidic acrylic resins include, but are not limited to, the following resins: 10-methacryloyloxydecyl phosphate (10-MDP), alkyl acrylic acid phosphate, glycerol dimethacrylate phosphate (Bis-GDMAP), 2-hydroxyethyl methacrylate phosphate, di (methacryloyloxyethyl) phosphate, ethylene glycol methacrylate phosphate, methacryloyloxyethyl trimellitic anhydride, 4- [2- [ (meth) acryloyloxy ] ethoxycarbonyl ] phthalic acid, acrylic acid-itaconic acid copolymer, mercaptomethyl methacrylate, 5- (meth) acryloyloxypentyl-3-phosphonopropionate or ethylene glycol di (3-mercaptopropionate) and trimethylolpropane tri (3-mercaptopropionate).
The total content of photopolymerization initiator and photopolymerization accelerator is less than 10wt%; preferably, the total content of the photopolymerization initiator and the photopolymerization accelerator accounts for 2-6wt% of the whole system. As an example, the total content of the photopolymerization initiator and the photopolymerization accelerator may be, but is not limited to 0.5wt1wt1.5wt2wt2.5wt3wt3.5wt4wt4.5wt5wt5.5wt6wt6.5wt7wt7.5wt8wt8.5wt9wt9.5wt10wt.
The photopolymerization initiator initiates the polymerizable acrylate monomer to perform polymerization reaction by absorbing light energy; the photopolymerization initiator can control the setting time and hardening degree of the dental adhesive, thereby ensuring good fluidity and adaptability of the dental adhesive during the bonding process. The photopolymerization initiator is any one or more of alpha-diketone, ketal, thioxanthone, (bi) acyl phosphine oxide, benzoin alkyl ether, benzil dimethyl ketal, coumarin, diaryl iodonium hexafluorophosphate, triarylsulfonium hexafluorophosphate, triarylselenonium hexafluorophosphate, camphorquinone and 2,4, 6-trimethyl benzoyl-diphenyl phosphine oxide (TPO); preferably, the photopolymerization initiator is camphorquinone. The photopolymerization accelerator is used for assisting the photopolymerization initiator and enhancing the light energy absorption capacity of the photopolymerization initiator, so that the polymerization rate and the polymerization efficiency of the polymerizable acrylate monomer are improved. The photopolymerization promoter is any one or more of 4-dimethylaminoethyl benzoate, N-dimethylaminoethyl ester and dimethylaminoethyl methacrylate.
The content of polymerization inhibitor is less than 2wt%; by way of example, the content of the polymerization inhibitor may be, but is not limited to, 0wt%, 0.2wt%, 0.4wt%, 0.6wt%, 0.8wt%, 1wt%, 1.2wt%, 1.4wt%, 1.6wt%, 1.8wt%, 2wt%. The polymerization inhibitor is any one or a mixture of 2, 6-di-tert-butyl-p-cresol and p-hydroxyanisole. The polymerization inhibitor is used to control the polymerization rate of the polymerizable acrylate monomer, preventing the photopolymerization initiator from initiating the polymerization too quickly, so that when the dental adhesive is cured using light, it is ensured that a doctor has enough time to adapt and shape the dental adhesive.
The content of the filler accounts for 0 to 15 weight percent of the whole system; preferably, the filler content is 1wt% to 8wt% of the whole system. By way of example, the filler content may be, but is not limited to, 0wt%, 1wt%, 2wt%, 3wt%, 4wt%, 5wt%, 6wt%, 7wt%, 8wt%, 9wt%, 10wt%, 11wt%, 12wt%, 13wt%, 14wt%, 15wt%. The filler in the dental adhesive is used for improving the operability of the material and enhancing the mechanical strength and the adhesiveness of the dental adhesive after being cured.
Specifically, the filler may be any one of an inorganic filler, an organic filler, and a mixture of an inorganic filler and an organic filler. The average particle diameter of the filler is 0.001-1 mu m; preferably, the filler has an average particle diameter of 0.001 m to 0.1. Mu.m. As an example, the average particle size of the filler may be, but is not limited to 0.001m0.003m0.005m0.007m0.009m0.01m0.03m0.05m0.07m0.09m0.1m0.2m0.4m0.6m0.8m1m.
The inorganic filler has higher hardness, strength and durability, can provide good optical performance and color stability, and is not easy to be influenced by external environment to change color or fade. The inorganic filler may be a silica-based filler, a glass-based filler or other commonly used dental inorganic fillers. Wherein the silica filler is selected from amorphous silica micropowder, spherical silica micropowder, kaolin and other minerals with silica as base materials; commercial ultrafine particulate silica, having a primary particle diameter of 0.001 m to 0.1 m, such as OX50, A200, A380, R974, R972, R711, R709, H30, H20, T30, T40, similar sized particulate silica, fumed silica, and the like. The glass filler is selected from barium glass, lanthanum glass, strontium glass, sodium glass, lithium borosilicate glass, zinc glass, fluoroaluminosilicate glass, borosilicate glass and bioglass. Other common dental inorganic fillers are selected from zirconia, hydroxyapatite, alumina, titania, sodium fluoride, potassium fluoride, strontium fluoride, trifluoride, iron oxide, and the like. The organic filler has better processability and fluidity and is used for filling small defects or weak adhesion tooth parts. The mixture of the inorganic filler and the organic filler is prepared by compounding the inorganic filler and the organic filler according to a certain proportion, and has the characteristics of the inorganic filler and the organic filler. Preferably, the filler is a silanized fumed silica; the silanized fumed silica can enhance the mechanical properties and durability of the dental adhesive and improve compatibility.
The content of the tertiary amine compound accounts for 1 to 5 weight percent of the whole system; as an example, the content of the tertiary amine compound may be, but is not limited to 1wt1.2wt1.4wt1.6wt1.8wt2wt2.2wt2.4wt2.6wt2.8wt3wt3.2wt3.4wt3.6wt3.8wt4wt4.2wt4.4wt4.6wt4.8wt5wt.
The tertiary amine compound can effectively reduce the oxygen polymerization inhibition layer and avoid the slipping problem in the resin filling process. The main principle is as follows: the tertiary amine compound can be used as an active hydrogen donor, and can quickly react with peroxy free radicals generated in the polymerization process to regenerate the active free radicals. Specifically, tertiary amine compounds react with peroxy radicals, and the peroxy radicals take hydrogen to generate alkyl hydroperoxide; alkyl hydroperoxides can still further generate alkoxy radicals and hydroxyl radicals. The specific reaction is as follows:
ROO+R'CH2NR2ROOH+R'CHNR2ROOH
ROOHRO+OH
The reaction of the tertiary amine compound and the peroxy radical can consume the peroxy radical, and the released alkoxy radical and hydroxyl radical can initiate the polymerization reaction of the polymerizable acrylate monomer in the dental adhesive, so that the polymerization rate is improved and the curing of the dental adhesive is promoted. Therefore, the tertiary amine compound can be used as a co-initiator in the dental adhesive to promote the curing of the dental adhesive, and effectively reduce the thickness of the oxygen inhibition layer.
The tertiary amine compound is any one of triethanolamine, triethylamine, triethanolamine phosphate, N-methyldiethanolamine, dodecylamine, hexadecylamine, octadecylamine, dioctadecylamine, N, N dimethylaniline, N, N diethylaniline, N, N dimethyl p-toluidine, N, N dihydroxyethyl p-toluidine, N-methyl-N hydroxyethyl p-toluidine, N, N, N ', N ' -tetramethyl ethylenediamine, N, N dimethylethanolamine, N, N ' -dimethylpiperazine, N, N, N ', N ' -tetramethyl urea.
The content of the solvent accounts for 5 to 60 weight percent of the whole system; preferably, the solvent content is 5wt% to 15wt% of the whole system. As an example, the solvent content may be, but is not limited to, 5wt6wt7wt8wt9wt10wt11wt12wt13wt14wt15wt20wt25wt30wt35wt40wt45wt50wt55wt60wt. solvents for diluting the adhesive, improving the stability of the dental adhesive system and improving the permeability of the dental adhesive during use. The solvent is any one or more of ethanol, isopropanol, acetone, methanol, n-butanol, cyclohexane, methylcyclohexane, dichloromethane, trichloroethylene, trichloromethane, methyl acetate, ethyl acetate, propyl acetate, isopropyl acetate, diethylene glycol monobutyl ether, butyl acetate, methyl ethyl ketone, cyclohexanone, turpentine, tetrahydrofuran and deionized water.
For better illustrating the objects, technical solutions and advantageous effects of the present invention, the present invention will be further described with reference to examples. It should be noted that the following implementation of the method is a further explanation of the present invention and should not be taken as limiting the present invention.
Example 1
The embodiment provides a low-oxygen polymerization inhibition adhesive for dentistry, which comprises the following raw materials in parts by weight: 10 parts of trimethylolpropane trimethacrylate, 5 parts of glycerol dimethacrylate, 16 parts of bisphenol A-glycidyl dimethacrylate, 25 parts of hydroxyethyl methacrylate, 10 parts of 10-methacryloyloxydecyl phosphate, 0.1 part of camphorquinone, 0.3 part of 4-dimethylaminoethyl benzoate, 0.05 part of 2, 6-di-tert-butyl-p-cresol, 0.05 part of p-hydroxyanisole, 3.5 parts of fumed silica, 30 parts of absolute ethyl alcohol and 2 parts of triethanolamine;
Weighing the raw materials according to the parts by weight; the components such as resin, auxiliary agent, filler, solvent and the like are respectively stirred, and the components are uniformly mixed to obtain the low-oxygen polymerization-inhibition dental adhesive.
Example 2
The embodiment provides a low-oxygen polymerization inhibition adhesive for dentistry, which comprises the following raw materials in parts by weight: 10 parts of trimethylolpropane trimethacrylate, 5 parts of glycerol dimethacrylate, 16 parts of bisphenol A-glycidyl dimethacrylate, 25 parts of hydroxyethyl methacrylate, 10 parts of 10-methacryloyloxydecyl phosphate, 0.1 part of camphorquinone, 0.3 part of 4-dimethylaminoethyl benzoate, 0.05 part of 2, 6-di-tert-butyl-p-cresol, 0.05 part of p-hydroxyanisole, 3.5 parts of fumed silica, 30 parts of absolute ethyl alcohol and 2 parts of triethylamine;
Weighing the raw materials according to the parts by weight; the components such as resin, auxiliary agent, filler, solvent and the like are respectively stirred, and the components are uniformly mixed to obtain the low-oxygen polymerization-inhibition dental adhesive.
Comparative example
The comparative example provides an adhesive, which comprises the following raw materials in parts by weight: 10 parts of trimethylolpropane trimethacrylate, 5 parts of glycerol dimethacrylate, 16 parts of bisphenol A-glycidyl dimethacrylate, 25 parts of hydroxyethyl methacrylate, 10 parts of 10-methacryloyloxydecyl phosphate, 0.1 part of camphorquinone, 0.3 part of 4-dimethylaminobenzoic acid ethyl ester, 0.05 part of 2, 6-di-tert-butyl-p-cresol, 0.05 part of p-hydroxyanisole, 3.5 parts of fumed silica and 30 parts of absolute ethyl alcohol;
weighing the raw materials according to the parts by weight; and respectively stirring the components such as the resin, the auxiliary agent, the filler, the solvent and the like, and uniformly mixing the components to obtain the adhesive.
In summary, the compositions and amounts of the low oxygen polymerization-inhibiting dental adhesives prepared in examples 1 to 2 and the adhesives prepared in comparative examples are shown in Table 1 below;
Table 1: component meter
Comparative example | Example 1 | Example 2 | |
10-MDP | 10 | 10 | 10 |
HEMA | 25 | 25 | 25 |
GDMA | 5 | 5 | 5 |
Bis-GMA | 16 | 16 | 16 |
TMPTMA | 10 | 10 | 10 |
CQ | 0.5 | 0.5 | 0.5 |
EDB | 1 | 1 | 1 |
BHT | 0.05 | 0.05 | 0.05 |
MEHQ | 0.05 | 0.05 | 0.05 |
R974 | 2.4 | 2.4 | 2.4 |
Absolute ethyl alcohol | 30 | 30 | 30 |
P1 | 2 | ||
P2 | 2 |
Note that chinese names corresponding to shorthand symbols used in table 1 are as follows:
< polymerizable acrylic resin >
10-MDP: 10-Methacryloyloxy decyl phosphate
HEMA: hydroxyethyl methacrylate
Bis-GMA: bisphenol A-glycidyl dimethacrylate
TMPTMA: trimethylolpropane tri (meth) acrylate
GDMA: glycerol dimethacrylate
< Inorganic filler >
R974: fumed silica
< Curing initiation System >
CQ: camphorquinone (photopolymerization initiator)
EDB: 4-Dimethylaminobenzoic acid ethyl ester (photopolymerization promoter)
< Tertiary amine >
P1: triethanolamine salt
P2: triethylamine
< Others >
BHT:2, 6-Di-tert-butyl-p-cresol (polymerization inhibitor)
MEHQ: para hydroxy anisole (polymerization inhibitor)
Product performance test
1. The bonding strength and the bonding durability are important indexes for evaluating the mechanical property of the bonding system, and the higher bonding strength and bonding durability can provide a basis for good bonding effect. The adhesive for dental use obtained in examples 1 to 2 and the adhesive obtained in comparative example were tested for adhesive strength (enamel adhesive strength and dentin adhesive strength), adhesive durability (enamel adhesive strength and dentin adhesive strength) and uncured layer thickness (i.e., oxygen-inhibited layer) using YY 1042-2011, YY T0519-2009 and YY 0622-2008 dental resin-based pit sealer, respectively, as reference standards. The test results are shown in table 2 below.
TABLE 2 test results of bond Strength, bond durability and uncured layer thickness Table
As can be seen from Table 2, the thicknesses of the uncured layers of the low oxygen polymerization-inhibiting dental adhesives prepared in examples 1 and 2 were all smaller than those of the uncured layers of the adhesives prepared in comparative examples under the same conditions; meanwhile, the bonding strength and bonding durability meet the standard requirements without obvious reduction. Therefore, the above test shows that the addition of the tertiary amine compound can reduce the thickness of the uncured layer, effectively improve the curing effect of the dental adhesive, and further obtain an ideal repairing effect in clinical adhesive repairing filling.
2. The dental adhesive having low oxygen inhibition obtained in example 1 was taken and the uncured layer thicknesses of the three were compared with two commercially available similar products (commercially available product 1 and commercially available product 2). The test results are shown in table 3 below.
TABLE 3 test results of bond Strength, bond durability and uncured layer thickness Table
As is clear from Table 3, the thickness of the uncured layer of the low oxygen polymerization inhibitor of the dental adhesive prepared in example 1 after curing was smaller than that of the uncured layer of the commercial products 1 and 2; meanwhile, the adhesive strength and the adhesive durability of the low oxygen polymerization inhibitor prepared in example 1 in the self-curing mode were substantially the same as those of the commercial products 1 and 2. Therefore, the above test shows that the dental adhesive provided by the present invention has an advantage that the uncured layer is thinner than the commercially available products.
The dental adhesive provided by the invention has high bonding strength, good bonding durability and thinner oxygen inhibition layer thickness, is beneficial to avoiding the slipping problem in the resin filling process, is suitable for the pretreatment of the bonding surface of dental restorations of enamel, dentin and various materials, and completes various direct repair operations and indirect repair operations in the oral restoration process.
The above examples are preferred embodiments of the present invention, but the embodiments of the present invention are not limited to the above examples, and any other changes, modifications, substitutions, combinations, and simplifications that do not depart from the spirit and principle of the present invention should be made in the equivalent manner, and the embodiments are included in the protection scope of the present invention.
Claims (10)
1. The low-oxygen polymerization-inhibition dental adhesive is characterized by comprising the following components in percentage by weight:
20-90 wt% of matrix resin;
0-15 wt% of filler;
1 to 5 weight percent of tertiary amine compound;
The matrix resin comprises a polymerizable resin monomer, a photopolymerization initiator and a photopolymerization promoter; the polymerizable resin monomer is a polymerizable acrylate monomer; the total content of the photopolymerization initiator and the photopolymerization promoter is less than 10wt%.
2. The adhesive of claim 1, wherein the polymerizable acrylate monomer is any one or more of a hydrophilic acrylic resin, a hydrophobic acrylic resin, and an acidic acrylic resin.
3. The adhesive of claim 1, wherein the photopolymerization initiator is any one or more of -diketones, ketals, thioxanthones, (bis) acyl phosphine oxides, benzoin alkyl ethers, benzildimethyl ketals, coumarins, diaryliodonium hexafluorophosphate, triarylsulfonium hexafluorophosphate, triarylselenonium hexafluorophosphate, camphorquinone, and 2,4, 6-trimethylbenzoyl-diphenyl phosphine oxide (TPO);
The photopolymerization promoter is any one or more of mixture of 4-dimethylaminoethyl benzoate, N-dimethylaminoethyl ester and dimethylaminoethyl methacrylate.
4. The low oxygen polymerization inhibiting dental adhesive of claim 1, wherein the matrix resin further comprises a polymerization inhibitor; the content of the polymerization inhibitor is less than 2wt%.
5. The adhesive for dental use having low oxygen inhibition according to claim 4, wherein the polymerization inhibitor is any one of 2, 6-di-t-butyl-p-cresol, p-hydroxyanisole or a mixture of both.
6. The low oxygen inhibition dental adhesive according to claim 1, wherein the filler is an inorganic filler or an organic filler or a mixture of an inorganic filler and an organic filler.
7. The adhesive for dental use having low oxygen inhibition according to claim 6, wherein the filler has an average particle diameter of 0.001 m to 1 m.
8. The adhesive for dental use having low oxygen inhibition according to claim 1, wherein the tertiary amine compound is triethanolamine, triethylamine, triethanolamine phosphate, N-methyldiethanolamine, dodecylamine, hexadecylamine, octadecylamine, dioctadecylamine, N, any one of N dimethylaniline, N, N diethylaniline, N, N dimethyl-p-toluidine, N, N dihydroxyethyl-p-toluidine, N-methyl-N hydroxyethyl-p-toluidine, N, N, N ', N ' -tetramethyl ethylenediamine, N, N dimethylethanolamine, N, N ' -dimethylpiperazine, N, N, N ', N ' -tetramethyl urea.
9. The low oxygen polymerization inhibiting dental adhesive of claim 1, further comprising a solvent for diluting said adhesive and improving the system stability of said adhesive; the content of the solvent is 5-60 wt%.
10. The adhesive of claim 9, wherein the solvent is any one or more of ethanol, isopropanol, acetone, methanol, n-butanol, cyclohexane, methylcyclohexane, dichloromethane, trichloroethylene, trichloromethane, methyl acetate, ethyl acetate, propyl acetate, isopropyl acetate, diethylene glycol monobutyl ether, butyl acetate, methyl ethyl ketone, cyclohexanone, turpentine, tetrahydrofuran, and deionized water.
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