CN117840575A - Lens protection device for laser ablation in vacuum environment - Google Patents
Lens protection device for laser ablation in vacuum environment Download PDFInfo
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- CN117840575A CN117840575A CN202311330708.9A CN202311330708A CN117840575A CN 117840575 A CN117840575 A CN 117840575A CN 202311330708 A CN202311330708 A CN 202311330708A CN 117840575 A CN117840575 A CN 117840575A
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- diaphragm
- lens
- vacuum environment
- laser ablation
- shielding cover
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- 238000000608 laser ablation Methods 0.000 title claims abstract description 26
- 238000006073 displacement reaction Methods 0.000 claims abstract description 14
- 239000000463 material Substances 0.000 claims abstract description 14
- 238000000034 method Methods 0.000 claims abstract description 13
- 230000003287 optical effect Effects 0.000 claims description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 239000007769 metal material Substances 0.000 claims description 3
- 230000001012 protector Effects 0.000 claims 7
- 238000010438 heat treatment Methods 0.000 abstract description 3
- 230000003044 adaptive effect Effects 0.000 abstract description 2
- 230000002035 prolonged effect Effects 0.000 abstract 1
- 210000002381 plasma Anatomy 0.000 description 36
- 230000005684 electric field Effects 0.000 description 20
- 230000000694 effects Effects 0.000 description 9
- 238000002679 ablation Methods 0.000 description 8
- -1 aluminum ions Chemical class 0.000 description 8
- 150000002500 ions Chemical class 0.000 description 7
- 230000005672 electromagnetic field Effects 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 239000010936 titanium Substances 0.000 description 5
- 229910052719 titanium Inorganic materials 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 3
- 238000009434 installation Methods 0.000 description 3
- 230000007935 neutral effect Effects 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 239000003574 free electron Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910001094 6061 aluminium alloy Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000013467 fragmentation Methods 0.000 description 1
- 238000006062 fragmentation reaction Methods 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
Landscapes
- Laser Beam Processing (AREA)
Abstract
The application discloses a lens protection device for vacuum environment laser ablation, which comprises a shielding cover, wherein one end of the shielding cover is tightly attached to a diaphragm, the diaphragm is close to an electrode part, and the electrode part is connected with a power supply; the shielding cover, the diaphragm and the electrode part are respectively fixed on the displacement table through the supporting part; the problem of lens protection in the vacuum environment pulse laser ablation process is solved, the lens can be effectively protected from being influenced by heating of plasma, and the service life of the lens is prolonged; meanwhile, the pollution of laser ablation products to the vacuum chamber can be reduced; and the lens is not required to be replaced frequently, the adaptive material lens with higher use cost is not required, and the use cost can be effectively reduced.
Description
Technical Field
The application relates to a lens protection device for vacuum environment laser ablation, which belongs to the field of lens protection devices.
Background
When pulsed laser light is applied to the surface of the material, electrons in the material absorb the energy of the laser light and thermalize, and emit phonon cooling, thermal ablation begins when the phonon system reaches a local thermodynamic equilibrium with the initially heated electronic system. With the continuous rise of the temperature of the material, the surface of the material is melted, gasified and the like. The gasified substance continuously absorbs the energy of the laser to generate ionization, and plasma mixed by ions, neutral atoms and electrons is generated. The plasma moves in the opposite direction to the laser incidence with concomitant removal of material, which is the process of pulsed laser ablation.
The plasma absorbs the laser light, and suppresses the coupling between the laser light and the substance. Current research has demonstrated that vacuum environments facilitate the dissipation of plasma, reduce the absorption of laser light by the plasma, increase the laser energy acting on the material, and increase the efficiency of laser ablation.
When the movement of the plasma is in the opposite direction of the incidence of the laser, the movement distance of the plasma in the incidence direction of the laser is greatly increased in a vacuum environment, and the temperature of the plasma can reach tens of thousands of DEG C at the highest, at the moment, the focusing lens can be quickly heated to deform, so that the parameters of the lens are changed, and the coating film on the focusing lens can be quickly destroyed under the action of high temperature. In past experiments, thermal stress damage and coating damage will occur to the focusing lens without the use of a protective device.
The current methods for solving the problem are mainly three, namely, the focus of the lens can be increased to reduce the plasma moving on the lens, but the focus of the lens can be increased to enlarge the focusing light spot, which is not acceptable in many use cases; secondly, the ablation target is inclined by a certain angle, the method can restrict the plasma to move along the target direction in the initial stage, however, as the depth of the ablation hole increases, the plasma is restricted by the small hole so as to return to the laser incidence direction; thirdly, a quartz lens with a small thermal expansion coefficient can be used to avoid the problems of focal length drift and lens fragmentation caused by plasma heating as much as possible, but the method cannot avoid pollution of plasma to the lens surface and greatly increases the cost. Therefore, the above three effects on extending the useful life of the lens are not obvious, and there is a need for a device capable of protecting the lens in long-term, continuous ablation experiments and engineering applications to ensure long-term use of the lens without interference.
Disclosure of Invention
The laser-induced plasma consists of free electrons, positive ions and part of neutral particles, the number of the free electrons is almost the same as that of the positive ions, the whole body of the laser-induced plasma is electrically neutral, and the laser-induced plasma shows remarkable collective behavior, when an electromagnetic field exists around the laser-induced plasma, the movement of the plasma is mainly dominated by the electromagnetic field, so that the electromagnetic field is used for controlling the movement of the plasma, and the lens can be effectively protected from being damaged by the plasma. Previous studies have shown that electromagnetic fields can affect the laser ablation process, and if the electromagnetic fields are not shielded, the electromagnetic fields will interfere with the scientific research process, and in addition, because the generation and shielding of the magnetic fields are far more complex than the generation and shielding of the electric fields, the application adopts the basic principle of the electric fields to design the lens protection device.
The purpose of the application is to design a device with high cost performance to solve the problem of lens protection in the vacuum environment pulse laser ablation process.
According to one aspect of the application, there is provided a lens protection device for laser ablation in a vacuum environment, comprising a shielding cover, wherein one end of the shielding cover is tightly attached to a diaphragm, the diaphragm is close to an electrode part, and the electrode part is connected with a power supply;
the power supply applies a voltage of 36V (human body safety voltage) to the electrode plate, and can be appropriately adjusted according to the material characteristics and the actual conditions.
The shielding cover, the diaphragm and the electrode part are respectively fixed on the displacement table through the supporting part;
the displacement table should have at least two-dimensional position adjusting function to adjust the placement position of the whole device;
and the positions of the shield cover center, the diaphragm center and the electrode part center are adjusted by the displacement table so that the laser optical axis passes through.
The shielding cover is grounded, so that an electric field generated by the shielding electrode plate is shielded, and the motion of the plasma in the initial stage is not influenced.
And the shielding cover, the diaphragm, the electrode part and the displacement table are all positioned in a vacuum environment.
Optionally, the support part comprises a support and a strut fixed on the support;
the shielding cover, the diaphragm and the electrode part are respectively fixed on the supporting rod.
Optionally, the electrode part comprises a symmetrical left electrode plate and a symmetrical right electrode plate;
the two electrode plates should be installed between diaphragm and focusing lens, the middle position of left and right electrode plates should be opposite to the light-passing hole of diaphragm.
Optionally, the left electrode plate and the right electrode plate are connected with the power supply through wires and aviation plugs.
Optionally, the diaphragm comprises a locking device to avoid self-contraction due to thermal effects.
Preferably, the diaphragm is no less than 100mm from the target surface, at which distance the plasma has undergone sufficient expansion motion, most of the plasma will be blocked by the diaphragm.
Optionally, the aperture D' of the diaphragm should satisfy:
wherein D' is the aperture of the diaphragm, D is the diameter of the focused light spot, D is the light emitting diameter of the laser, f is the focal length of the lens, and h is the distance from the diaphragm to the target;
the safety coefficient of 1.1 times is increased in the formula, and edge diffraction caused by installation errors is avoided;
the method for calculating the diameter d of the focusing light spot comprises the following steps:
d＝1.22λf/D
wherein: λ represents the wavelength of the laser light.
Optionally, the electrode plate is made of pure copper material.
Optionally, the thickness of the left electrode plate and the right electrode plate is 1mm, the length is 100mm, the width is 50mm, and the distance between the two electrode plates is 25mm.
Optionally, the wires are welded to the middle parts of the outer sides of the two electrode plates respectively.
Optionally, the shielding cover is made of metal material and is arranged in a cylindrical structure.
The beneficial effects that this application can produce include:
the lens protection device for vacuum environment laser ablation can effectively protect lenses from being influenced by heating of plasmas, and prolongs the service life of the lenses; meanwhile, the pollution of laser ablation products to the vacuum chamber can be reduced; and the lens is not required to be replaced frequently, the adaptive material lens with higher use cost is not required, and the use cost can be effectively reduced.
Drawings
FIG. 1 is a schematic diagram of a lens protection device according to one embodiment of the present application;
FIG. 2 is a schematic perspective view of a lens protection device according to an embodiment of the present application;
FIG. 3 is a schematic view of an installation of a lens protection device in accordance with one embodiment of the present application in conjunction with a laser ablation system;
FIG. 4 is a simulated electric field and equipotential line distribution diagram in one embodiment of the present application;
FIG. 5 is a graph of simulated electron trajectories between electrode plates after entering an electric field at an initial velocity of 10km/s in one embodiment of the present application;
FIG. 6 is a graph of simulated trajectories of aluminum ions with one positive charge moving between electrode plates after entering an electric field at an initial velocity of 10km/s in one embodiment of the present application;
FIG. 7 is a graph of simulated trajectories of titanium ions with one positive charge after entering an electric field at an initial velocity of 10km/s between electrode plates in one embodiment of the present application;
fig. 8 is a comparison of the effect produced by one embodiment of the present application with the effect produced without the protective device.
List of parts and reference numerals:
1. a displacement table; 2. a shield; 3. a diaphragm; 4. a left electrode plate; 5. a right electrode plate; 6. a wire; 7. a plug; 8. a power supply; 9. a support rod; 10. a support; 11. a laser; 12. a focusing lens; 13. a target material; 14. a reflective lens.
Detailed Description
The present application is described in detail below with reference to examples, but the present application is not limited to these examples.
As shown in fig. 1 to 3, according to an embodiment of the present application, the inside of a dotted line in fig. 2 and 3 indicates a vacuum environment, and the present application provides a lens protection device for laser ablation in a vacuum environment, including a shielding case 2, where the shielding case 2 is made of a metal material and is configured as a cylindrical structure, and the shielding case 2 is grounded, so as to shield an electric field generated by an electrode plate, and ensure that a motion in an initial stage of plasma is not affected.
One end of the shielding cover 2 is tightly attached to the diaphragm 3, the diaphragm 3 is close to the electrode part, the diaphragm 3 can play a role in physical blocking, and the electrode part is connected with the power supply 8.
The shielding cover 2, the diaphragm 3 and the electrode part are respectively fixed on the displacement table 1 through supporting parts;
the support part comprises a support seat 10 and a supporting rod 9 fixed on the support seat;
the shield 2, the diaphragm 3, and the electrode portions are fixed to the struts 9, respectively.
The displacement table 1 should have at least two-dimensional position adjusting function to adjust the placement position of the whole device;
the position of the displacement table 1 is adjusted so that the center of the shield 2, the center of the diaphragm 3, and the center of the electrode part pass through the laser optical axis.
The electrode part comprises a symmetrical left electrode plate 4 and a symmetrical right electrode plate 5, the left electrode plate 4 and the right electrode plate 5 are connected with a power supply 8 through a lead wire 6 and an aviation plug 7, the lead wires 6 are welded to the middle parts of the outer sides of the two electrode plates respectively, and the electrode plates are made of pure copper materials.
The two electrode plates are arranged between the diaphragm 3 and the focusing lens 12, the middle positions of the left electrode plate 5 and the right electrode plate 5 are opposite to the light passing holes of the diaphragm 3, and the diaphragm 3 comprises a locking device to avoid self-contraction caused by thermal effect.
And the shielding cover 2, the diaphragm 3, the electrode part and the displacement table 1 are all positioned in a vacuum environment.
The specific implementation steps are as follows:
step one, the left electrode plate 4, the right electrode plate 5, the diaphragm 3 and the shielding cover 2 are installed in a vacuum cabin, the positions of the diaphragm 3, the electrode plates and the shielding cover 2 are finely adjusted by using the displacement table 1, so that the centers of the diaphragm 3, the electrode plates and the shielding cover 2 are aligned with an optical axis, the diaphragm 3 is 100mm away from the surface of a target 13, and at the distance, most of plasmas are blocked by the diaphragm 3 after the plasmas have undergone sufficient expansion movement;
step two, the aperture of the diaphragm 3 is slightly larger than the diameter of laser, and the diaphragm 3 is locked;
the aperture D' of the diaphragm 3 should satisfy:
wherein D' is the aperture of the diaphragm 3, D is the diameter of the focused light spot, D is the light emitting diameter of the laser 11, f is the focal length of the focusing lens 12, and h is the distance from the diaphragm 3 to the target 13;
the safety coefficient of 1.1 times is increased in the formula, and edge diffraction caused by installation errors is avoided;
the method for calculating the diameter d of the focusing light spot comprises the following steps:
d＝1.22λf/D
wherein: λ represents the wavelength of the laser light.
Thirdly, grounding the shielding case 2, and connecting the two electrode plates with the positive electrode and the negative electrode of the power supply 8 respectively;
step four, estimating the required power supply 8 voltage according to the relative atomic mass of the material, assuming that the atomic mass of the main element in the material is m, enteringThe initial velocity of the magnetic field is v 0 (typically 10) 4 m/s magnitude), the distance between the two electrode plates is d, the number of carried charges is q (the maximum value can be calculated by taking 1), and the length of the electrode plates is L, the voltage of the power supply 8 can be estimated by the following formula:
as shown in fig. 2, the laser light emitted by the laser 11 passes through the focusing lens 12 after being reflected by the reflecting mirror 14, the protection device is arranged between the focusing lens 12 and the target 13, after the target 13 is ablated by the laser light, the plasma firstly passes through the shielding cover 2, and the movement direction of the plasma is not affected because no electric field exists in the shielding cover 2, and part of the plasma moving at a large angle collides with the shielding cover 2; when the plasmas move to the position of the diaphragm 3, all plasmas outside the light passing hole are intercepted; when the plasma passes through the electric field, positively charged ions and negatively charged electrons move to the electrode plate and deviate from the incidence direction of laser, so that the aim of protecting the lens is fulfilled.
In order to confirm whether the electric field generated by the device affects the laser ablation process, the embodiment uses simulation software to simulate the electric field distribution of the whole device; and to analyze whether these particles would have an effect on the lens, the movement of electrons, aluminum ions and titanium ions under an electric field was simulated.
In this embodiment, a 36V dc regulated power supply 8 is selected, the lengths of the left electrode plate 4 and the right electrode plate 5 are 100mm, the interval between the two electrode plates is 30mm, the aperture of the diaphragm 3 is 5mm, the shielding case 2 is cylindrical, the diameter is 30mm, and the length is 100mm.
As shown in fig. 4, which shows the simulated electric field and equipotential line distribution diagram in the present embodiment, the voltage of the power supply 8 is set to 36V;
as shown in fig. 5, a trajectory diagram of the simulated electrons moving between the electrode plates after entering the electric field at an initial velocity of 10km/s in the present embodiment;
as shown in FIG. 6, a graph of a trajectory of aluminum ions with one positive charge moving between electrode plates after entering an electric field at an initial velocity of 10km/s was simulated in the present example;
as shown in FIG. 7, a graph of the trajectory of the titanium ions with one positive charge moving between the electrode plates after entering the electric field at an initial velocity of 10km/s is shown in the simulation of the present example;
as can be seen from the simulation results of fig. 4 to 7, the shielding cover 2 effectively shields the electric field generated in the ablation area, so as to ensure that the device does not influence the ablation process; the electric charge carried by electrons in the plasma can be effectively absorbed by the electrode plate; the aluminum ions and the titanium ions can be completely absorbed by the electrode plate under the action of an electric field, and theoretically, the device can produce an absorption effect on any ions with atomic number smaller than that of titanium.
As shown in fig. 8, a comparative image of the effect produced in the present embodiment and the effect produced under the unprotected condition is shown.
YAG laser 11 with Q-switched Nd, laser pulse width of 8ns, wavelength of 1064nm, repetition frequency of 10Hz, single pulse energy of 600mJ, focal length of focusing lens 12 of 300mm and target 13 of 6061 aluminum alloy are used in the experiment. The lens shown on the left side of fig. 7 is contaminated after about 10000 ablations, and the lens shown on the right side of fig. 7 is contaminated after about 150000 ablations. It can be seen that the use of the protection device can effectively reduce the pollution of the lens and prolong the service life of the lens.
As long as the movement distance of electrons and ions along the optical axis direction is smaller than the length of the electrode plate, the plasma can be ensured not to move to the lens position, and the particles are all captured by the electrode plate, so that the plasma can not pollute the vacuum chamber. The movement distance of electrons and ions in the optical axis direction is roughly calculated by the following,
wherein x is the movement distance of the particles along the optical axis direction; v 0 Is the initial velocity of the particles as they enter the electric field; d is the distance between the two electrode plates; m is the mass of the particle; q is the electricity carried by the particlesA charge number; u is the potential difference between the two electrode plates.
The foregoing is only a few examples of the present application and is not intended to limit the present application, but the present application is disclosed in the preferred examples, and the present application is not limited to the above-described examples, and any person skilled in the art will make some changes or modifications with the technical content disclosed in the foregoing description and equivalent embodiments without departing from the scope of the technical solutions of the present application.
Claims (10)
1. The lens protection device for vacuum environment laser ablation is characterized by comprising a shielding cover, wherein one end of the shielding cover is tightly attached to a diaphragm, the diaphragm is close to an electrode part, and the electrode part is connected with a power supply;
the shielding cover, the diaphragm and the electrode part are respectively fixed on the displacement table through the supporting part;
the positions of the shield cover center, the diaphragm center and the electrode part center are adjusted through the displacement table so that the laser optical axis passes through the shield cover center and the diaphragm center;
the shielding cover is grounded, and the shielding cover, the diaphragm, the electrode part and the displacement table are all positioned in a vacuum environment.
2. A lens protector for laser ablation in a vacuum environment according to claim 1, wherein the support comprises a support and a post fixed thereto;
the shielding cover, the diaphragm and the electrode part are respectively fixed on the supporting rod.
3. The lens protector for laser ablation in vacuum environment according to claim 1, wherein the electrode section comprises symmetrical left and right electrode plates.
4. A lens protector for laser ablation in a vacuum environment according to claim 3, wherein the left electrode plate and the right electrode plate are connected to the power supply through wires and aviation plugs.
5. A lens protection device for laser ablation in a vacuum environment according to claim 1, wherein the diaphragm comprises a locking device;
preferably, the distance between the diaphragm and the target surface is not less than 100mm.
6. A lens protection device for laser ablation in a vacuum environment according to claim 1, wherein the aperture D' of the diaphragm should satisfy:
wherein D' is the aperture of the diaphragm, D is the diameter of the focused light spot, D is the light emitting diameter of the laser, f is the focal length of the lens, and h is the distance from the diaphragm to the target;
the method for calculating the diameter d of the focusing light spot comprises the following steps:
d＝1.22λf/D
wherein: λ represents the wavelength of the laser light.
7. A lens protector for laser ablation in a vacuum environment according to claim 3, wherein the electrode plate is made of pure copper material.
8. A lens protector for laser ablation in a vacuum environment according to claim 3, wherein the thickness of the left electrode plate and the right electrode plate is 1mm, the length is 100mm, the width is 50mm, and the interval between the two electrode plates is 25mm.
9. A lens protector for laser ablation in a vacuum environment according to claim 3, wherein the wires are welded to the outer middle portions of the two electrode plates, respectively.
10. The lens protector for laser ablation in vacuum environment according to claim 1, wherein the shield case is made of metal material and is provided in a cylindrical structure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311330708.9A CN117840575A (en) | 2023-10-13 | 2023-10-13 | Lens protection device for laser ablation in vacuum environment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311330708.9A CN117840575A (en) | 2023-10-13 | 2023-10-13 | Lens protection device for laser ablation in vacuum environment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117840575A true CN117840575A (en) | 2024-04-09 |
Family
ID=90540805
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202311330708.9A Pending CN117840575A (en) | 2023-10-13 | 2023-10-13 | Lens protection device for laser ablation in vacuum environment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN117840575A (en) |
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2023
- 2023-10-13 CN CN202311330708.9A patent/CN117840575A/en active Pending
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