CN117826543A - Image processing method, system and related equipment for exposure imaging - Google Patents

Image processing method, system and related equipment for exposure imaging Download PDF

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Publication number
CN117826543A
CN117826543A CN202410143321.0A CN202410143321A CN117826543A CN 117826543 A CN117826543 A CN 117826543A CN 202410143321 A CN202410143321 A CN 202410143321A CN 117826543 A CN117826543 A CN 117826543A
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China
Prior art keywords
target
points
acute angle
exposure
image
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CN202410143321.0A
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Chinese (zh)
Inventor
陈钢
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Shenzhen Anteland Technology Co Ltd
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Shenzhen Anteland Technology Co Ltd
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Priority to CN202410143321.0A priority Critical patent/CN117826543A/en
Publication of CN117826543A publication Critical patent/CN117826543A/en
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Abstract

The embodiment of the invention provides an image processing method, an image processing system and related equipment for exposure imaging, which are used for realizing the automatic improvement of an acute angle pattern in the exposure imaging process and prolonging the service life of a product of exposure platemaking. The method of the embodiment of the invention comprises the following steps: acquiring an original lattice image, wherein the original lattice image at least comprises an acute angle graph with an angle smaller than a first threshold value; detecting the linear distance between two intersection points of two side lines of the target acute angle graph in a preset reference direction, and determining the linear distance as two target intersection points of a second threshold value; and determining a triangular region formed by the intersection points of the two targets and the target acute angle graph as a target region, and eliminating pixel rows with the distance between exposure points smaller than the second threshold value in the same pixel row in the target region to generate a corrected image, wherein the corrected image is used for exposure imaging.

Description

Image processing method, system and related equipment for exposure imaging
Technical Field
The present invention relates to the field of data processing technologies, and in particular, to an image processing method, system and related device for exposure imaging.
Background
Exposure imaging refers to exposing the exposed spots (mapped from the original image) on the photoresist-covered coating by a light source (e.g., a laser) to produce the desired image on the photoresist coating after development. Common application scenarios include screen printing, PCB platemaking, etc.
The applicant has found that the geometrical parameters of the image that can actually be made to plate are limited due to the limitations of the photoresist process parameters (e.g. photoresist thickness, photoresist resolution) employed by the laser direct write exposure apparatus. For example, if the interval between exposure points is too small and exceeds the positioning precision in the moving process of the light source, the exposure precision of the intersection point area is uncontrollable, so that a special-shaped pattern appears in the photoresist curing area after the exposure of the intersection point area, the photoresist curing is unstable, and the quality and the service life of the manufactured layout are seriously affected.
Disclosure of Invention
The embodiment of the invention provides an image processing method, an image processing system and related equipment for exposure imaging, which are used for realizing the automatic improvement of an acute angle pattern in the exposure imaging process and prolonging the service life of a layout of exposure platemaking.
An embodiment of the present invention provides an image processing method for exposure imaging, which may include:
acquiring an original lattice image, wherein the original lattice image at least comprises an acute angle graph with an angle smaller than a first threshold value;
detecting the linear distance between two intersection points of two side lines of the target acute angle graph in a preset reference direction, and determining the linear distance as two target intersection points of a second threshold value;
determining a triangular region formed by the intersection points of the two targets and the target acute angle graph as a target region, eliminating pixel rows with the distance between exposure points smaller than the second threshold value in the same pixel row in the target region, and generating a corrected image; the corrected image is used for exposure imaging.
Optionally, as a possible implementation manner, in the embodiment of the present invention, eliminating, in the target area, a pixel row in which a distance between exposure points in the same pixel row is smaller than the second threshold value may include:
and modifying all pixel points in the target area into exposure points.
Optionally, as a possible implementation manner, in the embodiment of the present invention, eliminating, in the target area, a pixel row in which a distance between exposure points in the same pixel row is smaller than the second threshold value may include:
the edges of the two side lines of the target acute angle pattern and the pixel points extending inwards are set as non-exposure points.
Optionally, as a possible implementation manner, the embodiment of the present invention may further include: and setting the pixel points in the line segment where the two target intersection points are located as exposure points.
Optionally, as a possible implementation manner, the image processing method for exposure imaging in the embodiment of the present invention may further include:
and acquiring a photoresist process parameter, and inquiring a first threshold value of the photoresist process parameter association mapping.
Optionally, as a possible implementation manner, in the embodiment of the present invention, when a minimum acute angle between an angular bisector of the target acute angle graph and a direction in which the pixel row is located is smaller than 45 degrees, the preset reference direction is perpendicular to the direction of the pixel row; when the minimum acute angle between the angular bisector of the target acute angle graph and the direction of the pixel row is not smaller than 45 degrees, the preset reference direction is parallel to the direction of the pixel row.
A second aspect of an embodiment of the present invention provides an image processing system for exposure imaging, which may include:
the acquisition module is used for acquiring an original dot matrix image, wherein the original dot matrix image at least comprises an acute angle graph with an angle smaller than a first threshold value;
the detection module is used for detecting the linear distance between two intersection points of two edge lines of the target acute angle graph in the preset reference direction and determining two target intersection points with the linear distance being a second threshold value;
and the correction module is used for determining a triangular area formed by the intersection points of the two targets and the target acute angle graph as a target area, eliminating pixel rows with the distance between exposure points smaller than the second threshold value in the same pixel row in the target area, and generating a correction image, wherein the correction image is used for exposure imaging.
Optionally, as a possible implementation manner, in an embodiment of the present invention, the correction module may include:
and the first correction unit is used for correcting all pixel points in the target area into exposure points.
Optionally, as a possible implementation manner, in an embodiment of the present invention, the correction module may include:
and the second correction unit is used for setting the edges of the two side lines of the target acute angle graph and the inwards extending pixel points as non-exposure points.
Optionally, as a possible implementation manner, the image processing system for exposure imaging in the embodiment of the present invention may further include:
the inquiring module is used for acquiring the photoresist process parameters and inquiring the first threshold value of the photoresist process parameter association mapping.
Optionally, as a possible implementation manner, in the embodiment of the present invention, when a minimum acute angle between an angular bisector of the target acute angle graph and a direction in which the pixel row is located is smaller than 45 degrees, the preset reference direction is perpendicular to the direction of the pixel row; when the minimum acute angle between the angular bisector of the target acute angle graph and the direction of the pixel row is not smaller than 45 degrees, the preset reference direction is parallel to the direction of the pixel row.
A third aspect of the embodiments of the present invention provides a computer apparatus comprising a processor for implementing the steps as in any one of the possible implementations of the first aspect and the first aspect when executing a computer program stored in a memory.
A fourth aspect of the embodiments of the present invention provides a computer readable storage medium having stored thereon a computer program which when executed by a processor performs steps as in any one of the possible implementations of the first aspect and the first aspect.
From the above technical solutions, the embodiment of the present invention has the following advantages:
in the embodiment of the invention, when an acute angle graph with an angle smaller than a first threshold exists in an original dot matrix image, two target intersection points with a straight line distance of two edge lines of the target acute angle graph being a second threshold in a preset reference direction are detected, then a triangular area formed by the intersection points of the two target intersection points and the target acute angle graph is filled with exposure points or non-exposure points, all pixel points in the triangular area are filled with exposure points or non-exposure points, the situation that the distance between the exposure points in the same pixel row is too small (smaller than the second threshold) is avoided, the exposure precision in the area is controllable, the abnormal shape and distortion of a photosensitive resist curing area after exposure are avoided, and the service life and the usability of the manufactured layout are improved.
Drawings
FIG. 1 is a schematic diagram showing an embodiment of an image processing method for exposure imaging in an embodiment of the present invention;
FIG. 2 is a schematic diagram of another embodiment of an image processing method for exposure imaging according to an embodiment of the present invention;
FIG. 3 is a schematic diagram showing an embodiment of an image processing method for exposure imaging according to an embodiment of the present invention;
FIG. 4 is a schematic diagram of an embodiment of an image processing system for exposure imaging according to an embodiment of the present invention;
FIG. 5 is a diagram of a computer device according to an embodiment of the present invention.
Detailed Description
In order that those skilled in the art will better understand the present invention, a technical solution in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in which it is apparent that the described embodiments are only some embodiments of the present invention, not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the present invention without making any inventive effort, shall fall within the scope of the present invention.
The terms first, second, third, fourth and the like in the description and in the claims and in the above drawings are used for distinguishing between similar objects and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used may be interchanged where appropriate such that the embodiments described herein may be implemented in other sequences than those illustrated or otherwise described herein. Furthermore, the terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.
In the description of the present application, unless otherwise indicated, the meaning of "a plurality" is two or more. Unless specifically stated or limited otherwise, the terms "mounted," "connected," and "coupled" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements.
In order to improve the quality of exposure platemaking, the applicant proposes to pre-adjust an acute angle pattern with an angle smaller than a first threshold value in an original dot matrix image, increase the proportion of exposure points in an intersection point area of the acute angle pattern, and sequentially solve the problem that photoresist solidification is unstable in the intersection point area.
For ease of understanding, a specific flow in the embodiment of the present invention will be described below with reference to fig. 1, and an embodiment of an image processing method for exposure imaging in the embodiment of the present invention may include:
s101: and obtaining an original lattice image, wherein the original lattice image at least comprises an acute angle graph with an angle smaller than a first threshold value.
To optimize the sharp angle pattern, a preliminary scan test may be performed after the original dot matrix image is taken, to determine the original dot matrix image containing a sharp angle pattern having an angle less than a first threshold.
The first threshold may be a preset fixed value, or may be a first threshold that is mapped according to the photoresist process parameter query association, so as to dynamically match the photoresist process parameter with the graphic adjustment range.
S102: and determining that the straight line distance between two intersection points of two edge lines of the target acute angle graph in the preset reference direction is the two target intersection points of the second threshold value.
After determining that the original dot matrix image contains the target acute angle graph, the system can detect the straight line distance between two intersection points of a line segment parallel to the preset reference direction and two side lines of the target acute angle graph, and determine two target intersection points with the straight line distance being a second threshold value. The specific second threshold value can be reasonably set according to the type of the photoresist and the positioning precision of the light source, for example, the positioning precision of the light source is 100nm, and then the second threshold value is not less than 100nm.
Specifically, the preset reference direction can be determined according to an angular bisector of the target acute angle graph, and if the angular bisector is perpendicular to the direction in which the pixel row is located, the preset reference direction is parallel to the direction of the pixel row; if the direction of the angular bisector and the direction of the pixel row are parallel to the direction of the pixel row, the preset reference direction is perpendicular to the direction of the pixel row; in addition to the above two cases, the preset reference direction may be parallel to the direction in which the pixel row is located, or may be perpendicular to the direction of the pixel row. Preferably, in order to avoid that too small an acute angle appears again (affecting the quality of plate making) during the pattern filling process, when the minimum acute angle between the angular bisector of the target acute angle pattern and the direction in which the pixel rows are located is smaller than 45 degrees, the preset reference direction is perpendicular to the direction of the pixel rows (as shown by the line segment in AB in fig. 2, for example); when the minimum acute angle between the angular bisector of the target acute angle pattern and the direction of the pixel row is not less than 45 degrees, the preset reference direction is parallel to the direction of the pixel row (exemplarily, as shown by a line segment where AB in fig. 3 is located).
In the embodiment of the application, the black pixel points are only used for indicating the exposure points in the dot matrix image, the white pixel points are used for indicating the non-exposure points as examples, and in practical application, the exposure points can be reasonably set according to the positive and negative shapes of the photoresist, and the application is not limited.
S103: and determining a triangular region formed by the intersection points of the two target intersection points and the target acute angle graph as a target region, eliminating pixel rows with the distance between exposure points smaller than a second threshold value in the same pixel row in the target region, and generating a corrected image.
After determining the two target intersection points, the system may determine a triangular region formed by the intersection points of the two target intersection points and the target acute angle pattern as a target region, and eliminate pixel rows in which the pitch of the exposure points is smaller than the second threshold value in the same pixel row in the target region to generate the corrected image. The corrected image is used for exposure imaging, and is specifically used for associating the position of an exposure point indicating the required exposure, and the specific exposure imaging process can refer to the related technology and is not described herein.
Specifically, as a possible implementation manner, in this embodiment of the present application, eliminating a pixel row in which a pitch of an exposure point in the same pixel row is smaller than a second threshold may include: all pixel points in the target area are modified to be exposure points, for example, an influence area enclosed by the triangles ABC shown in fig. 2 and 3 is modified to be exposure points.
As a possible implementation manner, in this embodiment of the present application, eliminating a pixel row in which a pitch of exposure points in the same pixel row is smaller than a second threshold may include: the edges of the two side lines of the target acute angle pattern and the pixel points extending inwards are set as non-exposure points. For example, as shown in fig. 4, the target area is set as a non-exposure point along both BC and AC side lines and the inwardly extending pixel point. Based on the embodiment shown in fig. 4, optionally, as a possible embodiment, in the embodiment of the present invention, in order to maintain the integrity of the graph and improve the service life of the edge graph of the plate-making image, the pixel points in the line segment where the two target intersection points are located may be set as exposure points.
As can be seen from the disclosure, in the embodiment of the present application, when an acute angle pattern whose angle is smaller than a first threshold exists in an original dot matrix image, two target intersection points where the straight line distance between two edges of the target acute angle pattern is a second threshold are detected in a preset reference direction, then, a triangle area formed by the intersection points of the two target intersection points and the target acute angle pattern is filled with all the pixel points in the triangle area by adopting exposure points or non-exposure points, so that the situation that the distance between the exposure points in the same pixel row is too small (smaller than the second threshold) is avoided, the exposure accuracy in the area is controllable, the abnormal shape and distortion of the exposed photosensitive glue curing area are avoided, and the service life and usability of the manufactured layout are improved.
The embodiment of the application also provides an image processing system for exposure imaging, which can comprise:
the acquisition module is used for acquiring an original dot matrix image, wherein the original dot matrix image at least comprises an acute angle graph with an angle smaller than a first threshold value;
the detection module is used for detecting the linear distance between two intersection points of two side lines of the target acute angle graph in the preset reference direction and determining two target intersection points with the linear distance being a second threshold value;
and the correction module is used for determining a triangular area formed by the intersection points of the two targets and the target acute angle graph as a target area, and increasing the minimum distance between the exposure points in the target area to generate a correction image, wherein the correction image is used for exposure imaging.
Optionally, as a possible implementation manner, the correction module in the embodiment of the present application may include:
and the first correction unit is used for correcting all pixel points in the target area into exposure points.
Optionally, as a possible implementation manner, the correction module in the embodiment of the present application may include:
and the second correction unit is used for setting the pixel points extending inwards from the edges of the two side lines of the target acute angle graph as exposure points.
Optionally, as a possible implementation manner, the image processing system for exposure imaging in the embodiment of the present application may further include:
the inquiring module is used for acquiring the photoresist process parameters and inquiring the first threshold value of the photoresist process parameter association mapping.
Optionally, as a possible implementation manner, in this embodiment of the present application, when a minimum acute angle between an angular bisector of the target acute angle graph and a direction in which the pixel row is located is smaller than 45 degrees, the preset reference direction is perpendicular to the direction of the pixel row; when the minimum acute angle between the angular bisector of the target acute angle graph and the direction of the pixel row is not smaller than 45 degrees, the preset reference direction is parallel to the direction of the pixel row.
It will be clearly understood by those skilled in the art that, for convenience and brevity of description, specific working procedures of the above-described systems, modules and units may refer to corresponding procedures in the foregoing method embodiments, and are not repeated herein.
The image processing system for exposure imaging in the embodiment of the present invention is described above from the point of view of the modularized functional entity, and referring to fig. 5, the computer apparatus in the embodiment of the present invention is described below from the point of view of hardware processing:
the computer device 1 may include a memory 11, a processor 12, and an input-output bus 13. The steps in the method embodiment shown in fig. 1 described above, such as steps 101 to 103 shown in fig. 1, are implemented when the processor 12 executes a computer program. In the alternative, the processor may implement the functions of the modules or units in the above-described embodiments of the apparatus when executing the computer program.
The memory 11 includes at least one type of readable storage medium including flash memory, a hard disk, a multimedia card, a card type memory (e.g., SD or DX memory, etc.), a magnetic memory, a magnetic disk, an optical disk, etc. The memory 11 may in some embodiments be an internal storage unit of the computer device 1, such as a hard disk of the computer device 1. The memory 11 may also be an external storage device of the computer apparatus 1 in other embodiments, such as a plug-in hard disk, a Smart Media Card (SMC), a Secure Digital (SD) Card, a Flash memory Card (Flash Card) or the like, which are provided on the computer apparatus 1. Further, the memory 11 may also include both an internal storage unit and an external storage device of the computer apparatus 1. The memory 11 may be used not only for storing application software installed in the computer apparatus 1 and various types of data, such as code of a computer program, but also for temporarily storing data that has been output or is to be output.
The processor 12 may in some embodiments be a central processing unit (Central Processing Unit, CPU), controller, microcontroller, microprocessor or other data processing chip for running program code or processing data stored in the memory 11, e.g. executing computer programs or the like.
The input/output bus 13 may be a peripheral component interconnect standard (peripheral component interconnect, PCI) bus, or an extended industry standard architecture (extended industry standard architecture, EISA) bus, among others. The bus may be classified as an address bus, a data bus, a control bus, etc.
Further, the computer apparatus may also comprise a wired or wireless network interface 14, and the network interface 14 may optionally comprise a wired interface and/or a wireless interface (e.g. WI-FI interface, bluetooth interface, etc.), typically used to establish a communication connection between the computer apparatus 1 and other electronic devices.
Optionally, the computer device 1 may further comprise a user interface, which may comprise a Display (Display), an input unit such as a Keyboard (Keyboard), and optionally a standard wired interface, a wireless interface. Alternatively, in some embodiments, the display may be an LED display, a liquid crystal display, a touch-sensitive liquid crystal display, an OLED (Organic Light-Emitting Diode) touch, or the like. The display may also be referred to as a display screen or display unit, as appropriate, for displaying information processed in the computer device 1 and for displaying a visual user interface.
Fig. 5 shows only a computer device 1 with components 11-14 and a computer program, it being understood by a person skilled in the art that the structure shown in fig. 5 does not constitute a limitation of the computer device 1, and may comprise fewer or more components than shown, or may combine certain components, or a different arrangement of components.
The present invention also provides a computer readable storage medium having a computer program stored thereon, which, when executed by a processor, can implement steps 101 to 103 as shown in fig. 1. In the alternative, the processor may implement the functions of the modules or units in the above-described embodiments of the apparatus when executing the computer program.
In the several embodiments provided in this application, it should be understood that the disclosed systems and methods may be implemented in other ways. For example, the system embodiments described above are merely illustrative, e.g., the division of the elements is merely a logical functional division, and there may be additional divisions when actually implemented, e.g., multiple elements or components may be combined or integrated into another system, or some features may be omitted or not performed. Alternatively, the coupling or direct coupling or communication connection shown or discussed with each other may be an indirect coupling or communication connection via some interfaces, devices or units, which may be in electrical, mechanical or other form.
The units described as separate units may or may not be physically separate, and units shown as units may or may not be physical units, may be located in one place, or may be distributed on a plurality of network units. Some or all of the units may be selected according to actual needs to achieve the purpose of the solution of this embodiment.
In addition, each functional unit in the embodiments of the present invention may be integrated in one processing unit, or each unit may exist alone physically, or two or more units may be integrated in one unit. The integrated units may be implemented in hardware or in software functional units.
The integrated units, if implemented in the form of software functional units and sold or used as stand-alone products, may be stored in a computer readable storage medium. Based on such understanding, the technical solution of the present invention may be embodied essentially or in part or all of the technical solution or in part in the form of a software product stored in a storage medium, including instructions for causing a computer device (which may be a personal computer, a server, or a network device, etc.) to perform all or part of the steps of the method according to the embodiments of the present invention. And the aforementioned storage medium includes: a U-disk, a removable hard disk, a Read-Only Memory (ROM), a random access Memory (RAM, random Access Memory), a magnetic disk, or an optical disk, or other various media capable of storing program codes.
The above embodiments are only for illustrating the technical solution of the present invention, and not for limiting the same; although the invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims (10)

1. An image processing method for exposure imaging, comprising:
acquiring an original lattice image, wherein the original lattice image at least comprises an acute angle graph with an angle smaller than a first threshold value;
detecting the linear distance between two intersection points of two side lines of the target acute angle graph in a preset reference direction, and determining the linear distance as two target intersection points of a second threshold value;
determining a triangular region formed by the intersection points of the two targets and the target acute angle graph as a target region, eliminating pixel rows with the distance between exposure points smaller than the second threshold value in the same pixel row in the target region, and generating a corrected image; the corrected image is used for exposure imaging.
2. The method of claim 1, wherein eliminating pixel rows in the target area having a pitch of exposure points in the same pixel row less than the second threshold comprises:
and modifying all pixel points in the target area into exposure points.
3. The method of claim 1, wherein eliminating pixel rows in the target area having a pitch of exposure points in the same pixel row less than the second threshold comprises:
the edges of the two side lines of the target acute angle pattern and the pixel points extending inwards are set as non-exposure points.
4. A method according to claim 3, further comprising:
and setting the pixel points in the line segment where the two target intersection points are located as exposure points.
5. The method according to any one of claims 1 to 4, further comprising:
and acquiring a photoresist process parameter, and inquiring a first threshold value of the photoresist process parameter association mapping.
6. The method according to any one of claims 1 to 4, wherein the preset reference direction is perpendicular to the pixel row direction when the minimum acute angle between the angular bisector of the target acute angle pattern and the direction in which the pixel row is located is less than 45 degrees; when the minimum acute angle between the angular bisector of the target acute angle graph and the direction of the pixel row is not smaller than 45 degrees, the preset reference direction is parallel to the direction of the pixel row.
7. An image processing system for exposure imaging, comprising:
the acquisition module is used for acquiring an original dot matrix image, wherein the original dot matrix image at least comprises an acute angle graph with an angle smaller than a first threshold value;
the detection module is used for detecting the linear distance between two intersection points of two edge lines of the target acute angle graph in the preset reference direction and determining two target intersection points with the linear distance being a second threshold value;
and the correction module is used for determining a triangular area formed by the intersection points of the two targets and the target acute angle graph as a target area, eliminating pixel rows with the distance between exposure points smaller than the second threshold value in the same pixel row in the target area, and generating a correction image, wherein the correction image is used for exposure imaging.
8. The system of claim 7, wherein the correction module comprises:
and the first correction unit is used for correcting all pixel points in the target area into exposure points.
9. A computer device comprising a processor for implementing the method according to any of claims 1 to 6 when executing a computer program stored in a memory.
10. A computer-readable storage medium having stored thereon a computer program, characterized by: the computer program, when executed by a processor, implements the method of any one of claims 1 to 6.
CN202410143321.0A 2024-01-31 2024-01-31 Image processing method, system and related equipment for exposure imaging Pending CN117826543A (en)

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Application Number Priority Date Filing Date Title
CN202410143321.0A CN117826543A (en) 2024-01-31 2024-01-31 Image processing method, system and related equipment for exposure imaging

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