CN117806132A - Illumination optical system - Google Patents
Illumination optical system Download PDFInfo
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- CN117806132A CN117806132A CN202410071326.7A CN202410071326A CN117806132A CN 117806132 A CN117806132 A CN 117806132A CN 202410071326 A CN202410071326 A CN 202410071326A CN 117806132 A CN117806132 A CN 117806132A
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- 230000003287 optical effect Effects 0.000 title claims abstract description 195
- 238000005286 illumination Methods 0.000 title claims abstract description 34
- 241000276498 Pollachius virens Species 0.000 claims abstract description 10
- 238000003384 imaging method Methods 0.000 claims description 27
- 238000001259 photo etching Methods 0.000 claims description 9
- 238000001459 lithography Methods 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims description 2
- 229910052753 mercury Inorganic materials 0.000 claims description 2
- 238000000206 photolithography Methods 0.000 claims 1
- 239000000463 material Substances 0.000 description 6
- 239000011521 glass Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses an illumination optical system, which comprises a light source, a first optical integrator, a second optical integrator and an illuminated surface; the light of the light source sequentially passes through the first optical integrator, the second optical integrator reaches the irradiated surface, and the condition of Kohler illumination is met between the light source and the irradiated surface; the first optical integrator and the second optical integrator are fly-eye lenses or optical rods; the illumination optical system provided by the invention improves the uniformity of light energy distribution at any position in the optical system; thereby improving the thermal stability of projection exposure, improving the exposure precision and prolonging the service life of an optical system.
Description
Technical Field
The present invention relates to an apparatus for semiconductor lithography processes, and more particularly to an illumination optical system.
Background
In a typical exposure system, light emitted from a light source enters a fly-eye lens, and a plurality of images of the light source, also referred to as secondary light sources, are formed at a rear focal point. The light of the secondary light source passes through the subsequent optical lens group, and the irradiation area and the aperture are controlled, so that a surface with uniform energy distribution is formed. A mask is typically placed at this location and the pattern of the mask is subsequently replicated onto the wafer by the projection optics so that the light energy distribution across the wafer should also be uniform.
However, in other positions of the optical system, the light energy distribution is uneven, which brings about irregular thermal deformation of the lens of the optical system, and affects the lithography accuracy. The heat is unevenly heated, and the heat dissipation effect of the heat dissipation system cannot be achieved. And meanwhile, the high-energy area can cause irreversible damage to the optical material and the coating film, so that the service life of the system is shortened.
Disclosure of Invention
The technical problem to be solved by the invention is to provide an illumination optical system which can improve the thermal stability of projection exposure, improve the exposure precision and prolong the service life of the optical system.
The technical scheme adopted by the invention for solving the technical problems is to provide an illumination optical system, which comprises a light source, a first optical integrator, a second optical integrator and an irradiated surface; the light of the light source sequentially passes through the first optical integrator, the second optical integrator reaches the irradiated surface, and the condition of Kohler illumination is met between the light source and the irradiated surface.
Further, the first optical integrator is a fly-eye lens, and the second optical integrator is an optical rod; the light rays of the light source are incident to the first optical integrator through the first collimating lens; the incident end face b of the first optical integrator is positioned on the diaphragm face of the first collimating lens, and the emergent end face a' of the first optical integrator is conjugate with the light source face a to form images of a plurality of light sources; the light passing through the first optical integrator is incident to the second optical integrator through the second collimating lens, and the incident end face b' of the second optical integrator is conjugated with the emergent end face b of the first optical integrator.
Further, the light of the incident end face b ' of the second optical integrator reaches the emergent end face c after being reflected by the reflecting surface around the optical rod for multiple times, then enters the irradiated face c ' through the double telecentric lens, and forms a copy pattern of the mask plate surface on the imaging face c″ through the projection lens to finish photoetching, and the emergent end face c, the irradiated face c ' and the imaging face c″ are in a conjugate relation. The second optical integrator incident end face b' and the projection lens stop face b″ are in a conjugate relationship.
Further, the first optical integrator is a fly-eye lens, and the second optical integrator is a fly-eye lens; the light rays of the light source are incident to the first optical integrator through the first collimating lens; the incident end face b of the first optical integrator is positioned on the diaphragm face of the first collimating lens, and the emergent end face a' of the first optical integrator is conjugate with the light source face a to form images of a plurality of light sources; the light passing through the first optical integrator is incident to the second optical integrator through the second collimating lens, and the incident end face b' of the second optical integrator is conjugated with the emergent end face b of the first optical integrator.
Further, the light of the incident end face b 'of the second optical integrator passes through the fly-eye lens, then enters the irradiated face c' through the illumination lens, and forms a copy pattern of the mask plate surface on the imaging face c″ through the projection lens to complete photoetching, the incident end face b ', the irradiated face c' and the imaging face c″ are in a conjugate relationship, and the emergent end face a″ of the second optical integrator and the diaphragm face b″ of the projection lens are in a conjugate relationship. .
Further, the first optical integrator is an optical rod, and the second optical integrator is an optical rod; the light of the light source is incident to the incident surface a' of the first optical integrator through the imaging lens; the light source surface a and the incident end surface a' are conjugated; the light rays of the incident end face a' of the first optical integrator reach the emergent end face b after being reflected for multiple times by the reflecting surface around the optical rod, and reach the second optical integrator through the second collimating lens; the incident end face b' of the second optical integrator and the emergent end face b of the first optical integrator meet the kohler illumination relation.
Further, the light of the incident end face b 'of the second optical integrator reaches the emergent end face c after being reflected for multiple times by the reflecting surface around the optical rod, then enters the irradiated face c' through the double telecentric lens, and then forms a copy pattern of the mask plate surface on the imaging face c″ through the projection lens to finish photoetching, the emergent end face c, the irradiated face c 'and the imaging face c″ are in a conjugate relationship, and the incident end face b' and the projection lens diaphragm face b″ are in a conjugate relationship.
Further, the first optical integrator is an optical rod, and the second optical integrator is a fly-eye lens; the light of the light source is incident to the incidence surface a' of the first optical integrator through the imaging lens; wherein the light source surface is conjugated with the incident section a'; the light rays of the incident end face a' of the first optical integrator reach the emergent end face b after being reflected for multiple times by the reflecting surface around the optical rod, and reach the second optical integrator through the second collimating lens; the incident end face b' of the second optical integrator and the emergent end face b of the first optical integrator meet the conjugate relation.
Further, the light of the incident end face b ' of the second optical integrator passes through the fly eye lens, then enters the irradiated face c ' through the double telecentric lens, and then forms a copy pattern of the mask plate surface on the imaging face c″ through the projection lens to complete photoetching, the incident end face b ', the irradiated face c ' and the imaging face c″ are both in a conjugate relationship, and the incident end face b ' of the second optical integrator and the emergent end face b of the first optical integrator meet the conjugate relationship. .
Further, the wavelength range of the light source is 190nm-450nm; the light source is a KrF excimer laser providing 248nm, or an ArF excimer laser providing 193nm, or a semiconductor laser providing 405nm, or a mercury lamp or LED.
Compared with the prior art, the invention has the following beneficial effects: the illumination optical system provided by the invention improves the uniformity of light energy distribution at any position in the optical system; thereby improving the thermal stability of projection exposure, improving the exposure precision and prolonging the service life of an optical system.
Drawings
Fig. 1 is a schematic view of an exposure system provided with an illumination optical system according to an embodiment of the present invention;
FIG. 2 is a schematic view of an exposure system according to a second embodiment of the present invention;
fig. 3 (a) and 3 (b) are schematic diagrams of fly-eye lenses in the illumination optical system of the present invention;
FIG. 4 is a schematic view of an exposure system according to a third embodiment of the present invention;
fig. 5 is a schematic view of an exposure system according to a fourth embodiment of the present invention.
Marked in the figure as:
1 light source 2 first collimating lens 3 first optical integrator
4 second collimating lens 5 second optical integrator 6 double telecentric lens
7 projection lens
Detailed Description
The invention is further described below with reference to the drawings and examples.
Fig. 1 is a schematic view of an exposure system including an illumination optical system according to an embodiment of the present invention.
Referring to fig. 1, the direction of horizontal propagation of light is defined as Z-axis, the direction parallel to fig. 1 is Y-axis, and the direction perpendicular to fig. 1 is X-axis. The exposure system in fig. 1 is provided with a light source 1 for exposure, the wavelength of the light source 1 being in the range of 190nm to 450nm, for example, a KrF excimer laser capable of providing 248nm, an ArF excimer laser capable of providing 193nm, or a semiconductor laser capable of providing 405 nm. The light of the light source 1 passes through the first collimating lens 2 and enters the first optical integrator 3, the emergent end face b of the first optical integrator 3 is positioned on the diaphragm surface of the first collimating lens 2, the kohler illumination is met, the emergent end face a' of the first optical integrator 3 is conjugated with the light source surface a, a plurality of light source images are formed, the light source images are also called secondary light source images, and the number of the secondary light source images is determined by the number of the compound glasses. The light passing through the first optical integrator 3 passes through the second collimating lens 4 and is incident on the second optical integrator 5; the first optical integrator 3 is a fly-eye lens, the second optical integrator 5 is an optical rod, and the incident end face b 'of the second optical integrator 5 is conjugated with the emergent end face b of the first optical integrator 3, so that the energy uniformity of the incident end face b' is ensured through superposition of a plurality of light fields. The light rays of the incident end face b ' (which can become three-time light source images) of the second optical integrator 5 reach the emergent end face c of the second optical integrator 5 after being reflected by the reflecting surface around the optical rod for multiple times, the condition of kohler illumination is also met between the incident end face b ' and the emergent end face c, and the energy distribution of the emergent end face c is formed by superposition of a plurality of light fields of the incident end face b ', so that the energy uniformity of the emergent end face c is ensured. Then, the light enters an irradiated surface c', namely a mask (mask) surface through a double telecentric lens 6, and forms a high-precision copy pattern of the mask surface on an imaging surface c "(wafer surface) through a projection lens 7. And (5) completing photoetching. The emitting surface c, the irradiated surface c' and the imaging surface c″ are both in a conjugate relationship, so that the energy of the surfaces is uniformly distributed. The incident end face b' and the diaphragm face b″ of the projection lens 7 are also conjugate, so that the energy distribution of the diaphragm face b″ is also uniform. The uniformity of the energy distribution in the projection lens 7 is ensured for each optical lens face. Because the material and the coating of each lens have certain absorption to light energy, the uniform heated state of the lens is ensured. The projection lens 7 ensures the stability of optical performance in the heating process. Meanwhile, because the high point of energy aggregation is not generated, the cost of materials and coating films is also more favorable, and the service life is longer.
Fig. 2 is a second embodiment of the present invention, the first optical integrator 3 is a fly-eye lens, and the second optical integrator 5 is a fly-eye lens. The light of the light source 1 passes through the first collimating lens 2 and enters the first optical integrator 3, the emergent end face b of the first optical integrator 3 is positioned on the diaphragm surface of the first collimating lens 2, the kohler illumination is met, the incident end face a' of the first optical integrator 3 is conjugated with the light source surface a, a plurality of light source images are formed, the light source images are also called secondary light source images, and the number of the secondary light source images is determined by the number of the compound glasses. The light passing through the first optical integrator 3 passes through the second collimating lens 4 and is incident on the second optical integrator 5; the light beam of the incident end face b 'of the second optical integrator passes through the fly eye lens, then enters the irradiated face c' through the double telecentric lens 6, and forms a copy pattern of the mask plate surface on the imaging face c″ through the projection lens 7 to complete photoetching, wherein the incident end face b ', the irradiated face c' and the imaging face c″ are in a conjugate relationship. The exit end face a "and the diaphragm face b" of the second optical integrator are also conjugate, so that the energy distribution of the diaphragm face b "is also uniform. The uniformity of the energy distribution in the respective optical lens surfaces in the double telecentric lens 6 and the projection lens 7 is ensured.
The material of the optical integrator must be chosen to be transparent in the wavelength range of use, typically glass or crystal. Fig. 3 (a) and 3 (b) are schematic diagrams of fly-eye lens configurations. An image of the light source is formed on each fly-eye lens. 3a are arranged close to the light source, 3b near the focal point of 3 a. 3a and 3b may be of different materials and radii of curvature. In fig. 3 (b), another compound eye design is shown, with glass material between b and a'.
Fig. 4 is a third embodiment of the present invention, the first optical integrator 3 being an optical rod, and the second optical integrator 5 being an optical rod. The light of the light source 1 enters the first optical integrator 3 through the imaging lens 2, the incident end surface a' of the first optical integrator 3 is conjugate with the light source surface a, and the light is reflected by the first optical integrator 3 for multiple times to form a plurality of light source images, which are also called secondary light source images. And the emergent end face b of the first optical integrator 3 is overlapped by a plurality of light fields, so that the energy uniformity of the b surface is ensured. The light passing through the first optical integrator 3 passes through the second collimating lens 4 and is incident into the second optical integrator 5, wherein the incident end face b 'of the optical rod is conjugated with the emergent end face b of the first optical integrator 3, and the uniformity of the energy of the incident end face b' is ensured. The light beam of the incident end face b ' (which can become a three-time light source image) reaches the emergent end face c of the second optical integrator 5 after being reflected by the reflecting surface around the optical rod for multiple times, and the condition of kohler illumination is also satisfied between the incident end face b ' and the emergent end face c, and the energy distribution of the emergent end face c of the second optical integrator 5 is formed by superposition of a plurality of light fields of the incident end face b '. The energy uniformity of the c surface is ensured. Then, the light enters an irradiated surface c', namely a mask (mask) surface through a double telecentric lens 6, and forms a high-precision copy pattern of the mask surface on an imaging surface c "(wafer surface) through a projection lens 7. And (5) completing photoetching. Wherein c, c', c "are all in a conjugated relationship, so that the energy of these facets is uniformly distributed. The incident end face b' and the diaphragm face b″ are also conjugate, so that the energy distribution of the diaphragm face b″ is also uniform. The uniformity of the energy distribution in the respective optical lens surfaces in the double telecentric lens 6 and the projection lens 7 is ensured.
Fig. 5 is a fourth embodiment of the present invention, the first optical integrator 3 is an optical rod, and the second optical integrator 5 is a fly-eye lens. The light of the light source 1 enters the first optical integrator 3 through the imaging lens 2, the incident end surface a' of the first optical integrator 3 is conjugate with the light source surface a, and the light is reflected by the first optical integrator for multiple times to form a plurality of light source images, which are also called secondary light source images. And overlapping a plurality of light fields on the emergent end face b of the first optical integrator to ensure the energy uniformity of the surface b. The light passing through the first optical integrator 3 passes through the second collimating lens 4 and is incident into the second optical integrator 5, wherein the incident end face b 'of the fly-eye lens is conjugated with the emergent end face b of the first optical integrator 3, and the uniformity of the energy of the b' face is ensured. b 'are incident on the illuminated surface c', i.e. the mask (mask) surface, through a second optical integrator and a double telecentric lens 6. The incidence end face b ' of the fly-eye lens is conjugated with the irradiation face c ', and the energy distribution of the irradiation face c ' is formed by superposition of a plurality of light fields of b ', so that the energy uniformity of the face c ' is ensured. Then, a high-precision copy pattern of the mask surface is formed on the imaging surface c "(wafer surface) through the projection lens 7. And (5) completing photoetching. The incident end face b 'and the irradiated face c' of the fly-eye lens and the imaging face c "are in conjugate relation, so that the energy of the faces is uniformly distributed. The entrance end face b ' of the fly-eye lens and the exit end face c of the fly-eye lens meet the kohler illumination condition, so that the energy distribution of the c-face is also uniform, and the exit end face c of the fly-eye lens is conjugate with the diaphragm face b ', so that the energy distribution of the diaphragm face b ' is also uniform. The uniformity of the energy distribution in the respective optical lens surfaces in the double telecentric lens 6 and the projection lens 7 is ensured.
While the invention has been described with reference to the preferred embodiments, it is not intended to limit the invention thereto, and it is to be understood that other modifications and improvements may be made by those skilled in the art without departing from the spirit and scope of the invention, which is therefore defined by the appended claims.
Claims (10)
1. An illumination optical system is characterized by comprising a light source, a first optical integrator, a second optical integrator and an irradiated surface; the light of the light source sequentially passes through the first optical integrator, the second optical integrator reaches the irradiated surface, and the condition of Kohler illumination is met between the light source and the irradiated surface.
2. The illumination optical system according to claim 1, wherein the first optical integrator is a fly-eye lens and the second optical integrator is an optical rod; the light rays of the light source are incident to the first optical integrator through the first collimating lens; the incident end face b of the first optical integrator is positioned on the diaphragm face of the first collimating lens, and the emergent end face a' of the first optical integrator is conjugate with the light source face a to form images of a plurality of light sources; the light passing through the first optical integrator is incident to the second optical integrator through the second collimating lens, and the incident end face b' of the second optical integrator is in conjugate relation with the incident end face b of the first optical integrator.
3. The illumination optical system as claimed in claim 2, wherein the light beam of the incident end face b 'of the second optical integrator reaches the exit end face c after being reflected by the reflecting surface around the optical rod for multiple times, and then enters the irradiated face c' through the double telecentric lens, and forms the copy pattern of the mask plate surface on the imaging face c "through the projection lens to complete the photoetching, the exit end face c, the irradiated face c 'and the imaging face c" are in a conjugate relationship, and the incident end face b' of the second optical integrator and the diaphragm face b "of the projection lens are in a conjugate relationship.
4. The illumination optical system according to claim 1, wherein the first optical integrator is a fly-eye lens and the second optical integrator is a fly-eye lens; the light rays of the light source are incident to the first optical integrator through the first collimating lens; the incident end face b of the first optical integrator is positioned on the diaphragm face of the first collimating lens, and the emergent end face a' of the first optical integrator is conjugate with the light source face a to form images of a plurality of light sources; the light passing through the first optical integrator is incident to the second optical integrator through the second collimating lens, and the incident end face b' of the second optical integrator is in conjugate relation with the incident end face b of the first optical integrator.
5. The illumination optical system as recited in claim 4, wherein the light beam from the incident end face b 'of the second optical integrator passes through the fly-eye lens, then enters the illuminated face c' through the illumination lens, and then forms the copy pattern of the mask plate surface on the imaging face c "through the projection lens to complete the lithography, and the incident end face b ', the illuminated face c' and the imaging face c" are both in a conjugate relationship, and the exit end face a "of the second optical integrator and the diaphragm face b" of the projection lens are both in a conjugate relationship.
6. The illumination optical system of claim 1, wherein the first optical integrator is an optical rod and the second optical integrator is an optical rod; the light of the light source is incident to the incident surface a' of the first optical integrator through the imaging lens; the light source surface a and the incident end surface a' are conjugated; the light rays of the incident end face a' of the first optical integrator reach the emergent end face b after being reflected for multiple times by the reflecting surface around the optical rod, and reach the second optical integrator through the second collimating lens; the incident end face b' of the second optical integrator and the emergent end face b of the first optical integrator meet the kohler illumination relation.
7. The illumination optical system as recited in claim 6, wherein the light beam from the incident end face b 'of the second optical integrator reaches the exit end face c after being reflected by the reflecting surface around the optical rod for multiple times, and then enters the irradiated face c' through the double telecentric lens, and then passes through the projection lens, and the image forming face c "forms a copy pattern of the mask plate surface to complete photolithography, wherein the exit end face c, the irradiated face c 'and the image forming face c" are in a conjugate relationship, and the incident end face b' and the projection lens diaphragm face b "are in a conjugate relationship.
8. The illumination optical system according to claim 1, wherein the first optical integrator is an optical rod and the second optical integrator is a fly-eye lens; the light of the light source is incident to the incidence surface a' of the first optical integrator through the imaging lens; wherein the light source surface is conjugated with the incident section a'; the light rays of the incident end face a' of the first optical integrator reach the emergent end face b after being reflected for multiple times by the reflecting surface around the optical rod, and reach the second optical integrator through the second collimating lens; the incident end face b' of the second optical integrator and the emergent end face b of the first optical integrator meet the conjugate relation.
9. The illumination optical system as recited in claim 8, wherein the light beam of the incident end face b 'of the second optical integrator passes through the fly-eye lens, then enters the illuminated face c' through the illumination lens, and then forms the copy pattern of the mask plate surface on the imaging face c "through the projection lens to complete the lithography, the incident end face b ', the illuminated face c' and the imaging face c" are both in a conjugate relationship, and the exit end face c and the diaphragm face b "of the projection lens are in a conjugate relationship.
10. The illumination optical system according to claim 1, wherein the wavelength of the light source ranges from 190nm to 450nm; the light source is a KrF excimer laser providing 248nm, or an ArF excimer laser providing 193nm, or a semiconductor laser providing 405nm, or a mercury lamp or LED.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202410071326.7A CN117806132A (en) | 2024-01-17 | 2024-01-17 | Illumination optical system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202410071326.7A CN117806132A (en) | 2024-01-17 | 2024-01-17 | Illumination optical system |
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| CN117806132A true CN117806132A (en) | 2024-04-02 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202410071326.7A Pending CN117806132A (en) | 2024-01-17 | 2024-01-17 | Illumination optical system |
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- 2024-01-17 CN CN202410071326.7A patent/CN117806132A/en active Pending
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