CN117800596A - Low-expansion low-shrinkage low-tension high-Young modulus material and production method thereof - Google Patents
Low-expansion low-shrinkage low-tension high-Young modulus material and production method thereof Download PDFInfo
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- 239000000463 material Substances 0.000 title claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 239000011521 glass Substances 0.000 claims abstract description 73
- 229910006404 SnO 2 Inorganic materials 0.000 claims abstract description 10
- 238000002844 melting Methods 0.000 claims abstract description 7
- 230000008018 melting Effects 0.000 claims abstract description 7
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 31
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 28
- 239000007788 liquid Substances 0.000 claims description 28
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 12
- 239000002994 raw material Substances 0.000 claims description 10
- 238000001914 filtration Methods 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 9
- 238000001816 cooling Methods 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 7
- 239000008395 clarifying agent Substances 0.000 claims description 6
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 6
- 229910052697 platinum Inorganic materials 0.000 claims description 6
- 238000005352 clarification Methods 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 5
- 229910000629 Rh alloy Inorganic materials 0.000 claims description 4
- 238000000465 moulding Methods 0.000 claims description 4
- PXXKQOPKNFECSZ-UHFFFAOYSA-N platinum rhodium Chemical compound [Rh].[Pt] PXXKQOPKNFECSZ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052703 rhodium Inorganic materials 0.000 claims description 4
- 239000010948 rhodium Substances 0.000 claims description 4
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 4
- 238000003280 down draw process Methods 0.000 claims description 3
- 238000000265 homogenisation Methods 0.000 claims description 3
- 229910000476 molybdenum oxide Inorganic materials 0.000 claims description 3
- 239000003345 natural gas Substances 0.000 claims description 3
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 claims description 3
- 238000007493 shaping process Methods 0.000 claims description 3
- 238000000137 annealing Methods 0.000 abstract description 4
- 239000000126 substance Substances 0.000 abstract description 4
- 238000002360 preparation method Methods 0.000 abstract description 3
- 230000007797 corrosion Effects 0.000 abstract description 2
- 238000005260 corrosion Methods 0.000 abstract description 2
- 238000009776 industrial production Methods 0.000 abstract description 2
- 238000005516 engineering process Methods 0.000 description 6
- AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Chemical compound [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 description 4
- 230000001276 controlling effect Effects 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 230000007547 defect Effects 0.000 description 3
- 239000000156 glass melt Substances 0.000 description 3
- 239000000956 alloy Substances 0.000 description 2
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 2
- BYFGZMCJNACEKR-UHFFFAOYSA-N aluminium(i) oxide Chemical compound [Al]O[Al] BYFGZMCJNACEKR-UHFFFAOYSA-N 0.000 description 2
- IWOUKMZUPDVPGQ-UHFFFAOYSA-N barium nitrate Chemical compound [Ba+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O IWOUKMZUPDVPGQ-UHFFFAOYSA-N 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 1
- 229910021502 aluminium hydroxide Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/095—Glass compositions containing silica with 40% to 90% silica, by weight containing rare earths
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Abstract
The invention provides a low-expansion low-shrinkage low-tension high-Young modulus material and a production method thereof, wherein the material comprises the following components in percentage by mole: 61-67 parts of S iO 2 0.5 to 4.5 parts of B 2 O 3 A l in 11.5-15.5 weight portions 2 O 3 5 to 15 parts of MgO, 1 to 10 parts of CaO, 3 to 9.5 parts of BaO, 0.001 to 0.1 part of SrO, 0.01 to 1 part of ZnO and 0.001 to 1 part of MoO 3 0.001 to 0.7 part of CeO 2 0.001 to 0.2 part of SnO 2 0.001 to 0.2 part of SnO; the invention provides the display electronic glass, the preparation method and the application thereof, and the display electronic glass is environment-friendly, has good expansibility and contractibility, has high quality, can shorten the length of a forming area, and has higher annealing point temperature and lower melting temperature and applicationForming temperature; after the glass is thinned, the glass still has higher mechanical strength; moreover, the display electronic glass has excellent chemical corrosion resistance and lower production cost, and is suitable for large-scale industrial production.
Description
Technical Field
The invention belongs to the field of glass manufacturing, and particularly relates to a low-expansion low-shrinkage low-tension high-Young modulus material and a production method thereof.
Background
With the rapid development of technology, the demand for various display devices is growing, and a new OLED panel technology, ileap, is an OLED technology combining maskless evaporation and photolithography, which can realize high performance, ultra-low power consumption and low cost HMO (high mobility Oxide semiconductor) technology, and is a new Oxide back plate technology combining LTPS and Oxide advantages. eLEAP is an acronym for English. Wherein E is more friendly to the environment, L is Lithography with maskless depositon, E is ultra-long service life, low power consumption and high brightness, and A is a graph which can be made into any shape. The opening ratio is higher, wiring requirements are finer, so that the size requirements on internal defects of glass are stricter, such as bubbles, stones, stains, scratches, glass powder and the like, and the expansion performance requirements on the glass are higher. The temperature of the glass at high temperature molding needs to be matched with the surface tension, and the dissolution and discharge speed of bubbles in the glass liquid is influenced by the action of the surface tension. The eLEAP technology has higher requirements for displaying electronic glass and has higher requirements for defects and thickness;
the existing display electronic glass has the problems of poor thermal expansion and shrinkage, unstable performance before and after heat treatment and para-position dislocation;
in summary, the present invention provides a low expansion, low shrinkage, low tension, high young's modulus material and a method for producing the same, so as to solve the above-mentioned problems.
Disclosure of Invention
In order to solve the technical problems, the invention provides a low-expansion low-shrinkage low-tension high-Young modulus material and a production method thereof, which are used for solving the problems that the electronic glass in the prior art is poor in thermal expansion and shrinkage, unstable in performance before and after heat treatment, and can have para-position dislocation.
A low expansion low shrinkage low tension high Young's modulus material comprises the components of display electronic glass in terms of mole ratio: 61-67 parts of SiO 2 0.5 to 4.5 parts of B 2 O 3 11.5 to 15.5 parts of Al 2 O 3 5 to 15 parts of MgO, 1 to 10 parts of CaO, 3 to 9.5 parts of BaO, 0.001 to 0.1 part of SrO, 0.01 to 1 part of ZnO and 0.001 to 1 part of MoO 3 0.001 to 0.7 part of CeO 2 0.001 to 0.2 part of SnO 2 0.001 to 0.2 part of SnO.
Further, the contents of the components of the glass raw materials in mole percent satisfy Q= 839.31-918.68;
wherein q=a+b 90+c 1500+750 (d+e+f+g+h+m);
preferably q=850 to 915, more preferably q=860 to 912;
wherein a=sio 2 /Al 2 O 3 ；
B＝SiO 2 /(SiO 2 +Al 2 O 3 )；
C＝B 2 O 3 /(SiO 2 +Al 2 O 3 )；
D＝MgO/(MgO+CaO+BaO+ZnO)；
E＝CaO/(MgO+CaO+BaO+ZnO)；
F＝BaO/(MgO+CaO+BaO+ZnO)；
G＝ZnO/(MgO+CaO+BaO+ZnO)；
H＝MoO 3 /(MgO+CaO+BaO+ZnO)；
M＝MoO 3 /(SiO 2 +Al 2 O 3 )。
Further, the following is a mole percentage, wherein:
SiO 2 +Al 2 O 3 the value of (2) is 74.5 to 81.5, preferably 75 to 81, more preferably 75.5 to 80.5;
SiO 2 /Al 2 O 3 the value of (2) is 4.14 to 5.83, preferably 4.3 to 5.6, more preferably 4.35 to 5.55;
SiO 2 /(SiO 2 +Al 2 O 3 ) The value of (2) is 0.01 to 0.06, preferably 0.015 to 0.059, more preferably 0.02 to 0.058;
B 2 O 3 /(SiO 2 +Al 2 O 3 ) The value of (2) is 0.81 to 0.85, preferably 0.81 to 0.84, more preferably 0.812 to 0.835;
the value of MgO+CaO+BaO+ZnO is 14.96 to 22.4, preferably 15 to 22.1, more preferably 15.5 to 22;
MgO/(MgO+CaO+BaO+ZnO) has a value of 0.23 to 0.76, preferably 0.24 to 0.75, more preferably 0.3 to 0.7;
the value of CaO/(MgO+CaO+BaO+ZnO) is 0.06 to 0.5, preferably 0.1 to 0.45, more preferably 0.15 to 0.42;
the value of BaO/(MgO+CaO+BaO+ZnO) is 0.15 to 0.54, preferably 0.18 to 0.51, more preferably 0.2 to 0.5;
the value of ZnO/(MgO+CaO+BaO+ZnO) is 0 to 0.05, preferably 0.01 to 0.049, more preferably 0.012 to 0.48;
MoO 3 the value/(MgO+CaO+BaO+ZnO) is 0 to 0.03, preferably 0.01 to 0.03, more preferably 0.012 to 0.29.
Further, the SnO 2 、SnO、SrNO 3 、Ba(NO 3 ) 2 And Ce (Ce) 2 O 3 As a clarifying agent;
wherein SnO 2 The content of (2) is 0.001 to 0.2mol%, preferably 0.01 to 0.15mol%; the SnO content is 0.001 to 0.2mol%, preferably 0.01 to 0.15mol%; ce (Ce) 2 O 3 The content of (C) is 0.001 to 0.5mol%, preferably 0.01 to 0.1mol%; srNO 3 The content of (2) is 0.001 to 0.1mol%, preferably 0.001 to 0.08mol%; ba (NO) 3 ) 2 The content of (2) is 0.001 to 0.4mol%, preferably 0.001 to 0.35mol%;
wherein the value of the clarifying agent is 0.05 to 0.96, preferably 0.08 to 0.8, more preferably 0.1 to 0.6, in mole percent.
A method for producing a low expansion low shrinkage low tension high young's modulus material, comprising the steps of:
step one: adding raw materials into a kiln through a spiral automatic feeding device, heating the kiln by adopting a molybdenum oxide electrode, providing energy by adopting a ratio of G/E (G represents natural gas for providing energy and E represents electric energy for providing energy) of 0.4-0.75, controlling the length of a material mountain to be controlled to be 0.3-0.5 of the length of the kiln in the length direction, controlling the pressure of the kiln to be 6-25 Pa, adding the current and the flame direction of a burning gun to the glass liquid in the flowing direction perpendicular to the energy, adding the glass liquid into the kiln through the feeding device, wherein the G/E ratio is 0.4-0.75, and melting glass liquid in the kiln for 16-28 h to obtain clear glass liquid;
step two: and homogenizing, clarifying, cooling and forming the glass liquid component temperature to obtain the low-expansion high-Young modulus display electronic glass.
Step three: the clarified glass liquid is clarified by negative pressure and ultrasonic bubble filtration, and the bubble filtration and clarification are carried out at the temperature of 1580-1650 ℃, preferably 1590-1630 ℃, more preferably 1595-1630 ℃.
Step four: and cooling and shaping the homogenized clarified glass liquid, and producing the glass by adopting the methods of molding, overflow, float and crack down-draw method to obtain the glass for display electronics.
In the second step, the glass liquid is clarified for 2 hours, cooled for 1 to 1.5 hours and molded for 15 to 30 minutes.
Furthermore, in the third step, the filter screen for filtering and clarifying ultrasonic bubbles can be one of the 1, 2 and 3 sets of filter screens of the 'well', 'O', 'triangle and polygon' and is matched and fixed in the glass liquid channel, the material can be platinum, rhodium and platinum-rhodium alloy, and the aperture can be matched and mixed with the caliber of multiple filter screens for homogenization.
Compared with the prior art, the invention has the following beneficial effects:
1. the invention provides the display electronic glass, the preparation method and the application thereof, which are environment-friendly, have good expansibility and contractibility, have high quality, can shorten the length of a forming area, and have higher annealing point temperature and lower melting temperature and forming temperature; after the glass is thinned, the glass still has higher mechanical strength; moreover, the display electronic glass has excellent chemical corrosion resistance and lower production cost, and is suitable for large-scale industrial production.
2. The invention obtains the display electronic glass with low expansion, low shrinkage and high Young modulus through the matching adjustment of the chemical composition of the display electronic glass and the content of hydroxyl (OH-) in the melt.
3. In the invention, the content of hydroxyl in the glass melt can regulate and control the surface tension of the display electronic glass melt, so that the hydroxyl in the display electronic glass melt is treated under the precondition that the chemical composition of the main body of the display electronic glass is unchangedThe content of the radical (OH-) is regulated, and B is introduced through boric acid and boron gangue 2 O 3 Introduction of Al by aluminium hydroxide and alumina 2 O 3 BaO is introduced through barium carbonate and barium nitrate, hydroxyl is controlled in the raw materials, and then the composition ratio of the raw materials is matched, so that the display electronic glass with low expansion and high Young modulus can be obtained.
Detailed Description
Embodiments of the present invention are described in further detail below with reference to examples. The following examples are illustrative of the invention but are not intended to limit the scope of the invention.
The invention provides a low-expansion low-shrinkage low-tension high-Young modulus material, which comprises the following components in percentage by mole: 61-67 parts of SiO 2 0.5 to 4.5 parts of B 2 O 3 11.5 to 15.5 parts of Al 2 O 3 5 to 15 parts of MgO, 1 to 10 parts of CaO, 3 to 9.5 parts of BaO, 0.001 to 0.1 part of SrO, 0.01 to 1 part of ZnO and 0.001 to 1 part of MoO 3 0.001 to 0.7 part of CeO 2 0.001 to 0.2 part of SnO 2 0.001 to 0.2 part of SnO.
As one embodiment of the present invention, the contents of the components of the glass raw material satisfy q= 839.31 to 918.68 in mole percent;
wherein q=a+b 90+c 1500+750 (d+e+f+g+h+m);
preferably q=850 to 915, more preferably q=860 to 912;
wherein a=sio 2 /Al 2 O 3 ；
B＝SiO 2 /(SiO 2 +Al 2 O 3 )；
C＝B 2 O 3 /(SiO 2 +Al 2 O 3 )；
D＝MgO/(MgO+CaO+BaO+ZnO)；
E＝CaO/(MgO+CaO+BaO+ZnO)；
F＝BaO/(MgO+CaO+BaO+ZnO)；
G＝ZnO/(MgO+CaO+BaO+ZnO)；
H＝MoO 3 /(MgO+CaO+BaO+ZnO)；
M＝MoO 3 /(SiO 2 +Al 2 O 3 )。
As an embodiment of the present invention, in mole percent, wherein:
SiO 2 +Al 2 O 3 the value of (2) is 74.5 to 81.5, preferably 75 to 81, more preferably 75.5 to 80.5;
SiO 2 /Al 2 O 3 the value of (2) is 4.14 to 5.83, preferably 4.3 to 5.6, more preferably 4.35 to 5.55;
SiO 2 /(SiO 2 +Al 2 O 3 ) The value of (2) is 0.01 to 0.06, preferably 0.015 to 0.059, more preferably 0.02 to 0.058;
B 2 O 3 /(SiO 2 +Al 2 O 3 ) The value of (2) is 0.81 to 0.85, preferably 0.81 to 0.84, more preferably 0.812 to 0.835;
the value of MgO+CaO+BaO+ZnO is 14.96 to 22.4, preferably 15 to 22.1, more preferably 15.5 to 22;
MgO/(MgO+CaO+BaO+ZnO) has a value of 0.23 to 0.76, preferably 0.24 to 0.75, more preferably 0.3 to 0.7;
the value of CaO/(MgO+CaO+BaO+ZnO) is 0.06 to 0.5, preferably 0.1 to 0.45, more preferably 0.15 to 0.42;
the value of BaO/(MgO+CaO+BaO+ZnO) is 0.15 to 0.54, preferably 0.18 to 0.51, more preferably 0.2 to 0.5;
the value of ZnO/(MgO+CaO+BaO+ZnO) is 0 to 0.05, preferably 0.01 to 0.049, more preferably 0.012 to 0.48;
MoO 3 the value/(MgO+CaO+BaO+ZnO) is 0 to 0.03, preferably 0.01 to 0.03, more preferably 0.012 to 0.29.
As one embodiment of the present invention, snO 2 、SnO、SrNO 3 、Ba(NO 3 ) 2 And Ce (Ce) 2 O 3 As a clarifying agent;
wherein SnO 2 The content of (2) is 0.001 to 0.2mol%, preferably 0.01 to 0.15mol%; the SnO content is 0.001 to 0.2mol%, preferably 0.01 to 0.15mol%; ce (Ce) 2 O 3 The content of (C) is 0.001 to 0.5mol%, preferably 0.01 to 0.1mol%; srNO 3 The content of (C) is 0.001 to the whole0.1mol%, preferably 0.001 to 0.08mol%; ba (NO) 3 ) 2 The content of (2) is 0.001 to 0.4mol%, preferably 0.001 to 0.35mol%;
wherein the value of the clarifying agent is 0.05 to 0.96, preferably 0.08 to 0.8, more preferably 0.1 to 0.6, in mole percent.
A method for producing a low expansion low shrinkage low tension high young's modulus material, comprising the steps of:
step one: adding raw materials into a kiln through a spiral automatic feeding device, heating the kiln by adopting a molybdenum oxide electrode, providing energy by adopting a ratio of G/E (G represents natural gas for providing energy and E represents electric energy for providing energy) of 0.4-0.75, controlling the length of a material mountain to be controlled to be 0.3-0.5 of the length of the kiln in the length direction, controlling the pressure of the kiln to be 6-25 Pa, adding the current and the flame direction of a burning gun to the glass liquid in the flowing direction perpendicular to the energy, adding the glass liquid into the kiln through the feeding device, wherein the G/E ratio is 0.4-0.75, and melting glass liquid in the kiln for 16-28 h to obtain clear glass liquid;
step two: and homogenizing, clarifying, cooling and forming the glass liquid component temperature to obtain the low-expansion high-Young modulus display electronic glass.
Step three: the clarified glass liquid is clarified by negative pressure and ultrasonic bubble filtration, and the bubble filtration and clarification are carried out at the temperature of 1580-1650 ℃, preferably 1590-1630 ℃, more preferably 1595-1630 ℃.
Step four: and cooling and shaping the homogenized clarified glass liquid, and producing the glass by adopting the methods of molding, overflow, float and crack down-draw method to obtain the glass for display electronics.
In the second step, the glass liquid is clarified for 2 hours, cooled for 1 to 1.5 hours and molded for 15 to 30 minutes.
As an implementation mode of the invention, in the third step, the filter screen for ultrasonic bubble filtration clarification can be one type of filter screen 1, 2 and 3 sets of "well", "O", triangle and polygon "which are matched and fixed in the glass liquid channel, the material can be platinum, rhodium and platinum rhodium alloy material, and the aperture can be matched and mixed with multiple filter screen apertures for homogenization.
Wherein the diameter or nominal diameter/side length/diagonal length of the filter screen is about 0.5-10 mm;
wherein the diameter or nominal diameter of the cylinder or the circumcircle diameter or nominal diameter of the prism is about 10 to about 45 millimeters;
wherein, the filter screen is made of platinum, rhodium and platinum-rhodium alloy materials;
wherein, the aperture of the filter screen can be formed by matching the apertures of filter screens with the same shape, and also can be formed by combining, the bottom of the filter screen is taken as a zero point, the position of the bottom is 0 to 1/3, and the aperture of the filter screen is 0.5 to 5mm in diameter/side length/diagonal line length; the diameter of the filter screen is 5-10 mm from the diameter/side length/diagonal line at the position of 1/3-3/3.
Examples
Preparing raw materials: contains SiO in a molar amount of 61% based on the total molar amount, calculated as oxide 2 Al with a molar amount of 13.5% 2 O 3 B in a molar amount of 4.3% 2 O 3 13.5% MgO, 3.25% CaO, 4.3% BaO, 0.05% ZnO and 0.003% MoO 3 And 0.1mol% SnO.
1Kg of raw materials are weighed and mixed uniformly, the mixture is poured into a platinum crucible, then heated in an electric furnace at 1550 ℃ for 4 hours, heated to 1620 ℃ for 2 hours, and stirred, homogenized and clarified by using a platinum rod. And casting molten glass into a cast iron grinding tool to form a specified blocky glass product, annealing the glass product in an annealing furnace for 1 hour, and turning off a power supply and cooling along with the furnace. The glass article is then cut, ground, polished, then rinsed with deionized water and dried.
Examples 2 to 28
Display electronic glasses were prepared according to the procedure of example 1, except that the compositions of tables 1-2 were used. The performance of the resulting display electronic glasses 1 to 28 was measured, and the results are shown in Table 1.
Comparative examples 1 to 6
Display electronic glasses were prepared according to the procedure of example 1, except that the compositions of table 2 were prepared. The performance of the obtained display electronic glasses D1 to D6 was measured, and the results are shown in Table 2.
TABLE 2
In the above embodiments, q= 839.31 to 918.68; b with boric acid introduction 2 O 3 Accounting for 20 to 40 percent of the total amount of B2O 3; al introduced by aluminum hydroxide 2 O 3 Accounting for 50 to 70 percent of the total amount of Al2O 3; the BaO introduced by the barium carbonate accounts for 60 percent of the total BaO100 percent; the G/E ratio is 0.4-0.45, the glass is ensured to have proper melting temperature, and the glass material with high quality, low expansion and high modulus and the preparation method can be obtained by melting.
As can be seen from the examples in tables 1 to 28, the process according to the invention makes use of a composition containing a specific content of SiO 2 、Al 2 O 3 、B 2 O 3 、MgO、CaO、SrO、BaO、CeO 2 、ZrO 2 、SnO 2 、La 2 O 3 Glass prepared from the composition of (a) and having a density of less than 2.5-2.69 g/cm 3 The expansion coefficient in the range of 50-350 ℃ is lower than 30.3-39.8X10 -7 The Young modulus is not less than 82.9GPa, the surface tension is 321-359, the bubble defective rate is not more than 0.2%, the solid defect defective rate is not more than 0.025%, and the like.
The embodiments of the present invention have been shown and described for the purpose of illustration and description, it being understood that the above embodiments are illustrative and not to be construed as limiting the invention, and that variations, modifications, alternatives and variations may be made therein by one of ordinary skill in the art without departing from the scope of the invention.
Claims (7)
1. A low expansion low shrinkage low tension high young's modulus material characterized by: the composition of the display electronic glass comprises the following components in mole ratio: 61-67 parts of SiO 2 0.5 to 4.5 parts of B 2 O 3 11.5 to 15.5 parts of Al 2 O 3 5 to 15 parts of MgO, 1 to 10 parts of CaO, 3 to 9.5 parts of BaO, 0.001 to 0.1 part of SrO, 0.01 to 1 part of ZnO and 0.001 to 1 part of MoO 3 0.001 to 0.7 part of CeO 2 0.001 to 0.2 part of SnO 2 0.001 to 0.2 part of SnO.
2. The low expansion, low shrinkage, low tension, high young's modulus material of claim 1, wherein: the content of each component of the glass raw material is calculated according to mole percent to meet the requirement of Q= 839.31-918.68;
wherein q=a+b 90+c 1500+750 (d+e+f+g+h+m);
preferably q=850 to 915, more preferably q=860 to 912;
wherein a=sio 2 /Al 2 O 3 ；
B＝SiO 2 /(SiO 2 +Al 2 O 3 )；
C＝B 2 O 3 /(SiO 2 +Al 2 O 3 )；
D＝MgO/(MgO+CaO+BaO+ZnO)；
E＝CaO/(MgO+CaO+BaO+ZnO)；
F＝BaO/(MgO+CaO+BaO+ZnO)；
G＝ZnO/(MgO+CaO+BaO+ZnO)；
H＝MoO 3 /(MgO+CaO+BaO+ZnO)；
M＝MoO 3 /(SiO 2 +Al 2 O 3 )。
3. The low expansion, low shrinkage, low tension, high young's modulus material of claim 1, wherein: the following components are calculated in mole percent:
SiO 2 +Al 2 O 3 the value of (2) is 74.5 to 81.5, preferably 75 to 81, more preferably 75.5 to 80.5;
SiO 2 /Al 2 O 3 the value of (2) is 4.14 to 5.83, preferably 4.3 to 5.6, more preferably 4.35 to 5.55;
SiO 2 /(SiO 2 +Al 2 O 3 ) The value of (2) is 0.01 to 0.06, preferably 0.015 to 0.059, more preferably 0.02 to 0.058;
B 2 O 3 /(SiO 2 +Al 2 O 3 ) The value of (2) is 0.81 to 0.85, preferably 0.81 to 0.84, more preferably 0.812 to 0.835;
the value of MgO+CaO+BaO+ZnO is 14.96 to 22.4, preferably 15 to 22.1, more preferably 15.5 to 22;
MgO/(MgO+CaO+BaO+ZnO) has a value of 0.23 to 0.76, preferably 0.24 to 0.75, more preferably 0.3 to 0.7;
the value of CaO/(MgO+CaO+BaO+ZnO) is 0.06 to 0.5, preferably 0.1 to 0.45, more preferably 0.15 to 0.42;
the value of BaO/(MgO+CaO+BaO+ZnO) is 0.15 to 0.54, preferably 0.18 to 0.51, more preferably 0.2 to 0.5;
the value of ZnO/(MgO+CaO+BaO+ZnO) is 0 to 0.05, preferably 0.01 to 0.049, more preferably 0.012 to 0.48;
MoO 3 the value/(MgO+CaO+BaO+ZnO) is 0 to 0.03, preferably 0.01 to 0.03, more preferably 0.012 to 0.29.
4. The low expansion, low shrinkage, low tension, high young's modulus material of claim 1, wherein: the SnO 2 、SnO、SrNO 3 、Ba(NO 3 ) 2 And Ce (Ce) 2 O 3 As a clarifying agent;
wherein SnO 2 The content of (2) is 0.001 to 0.2mol%, preferably 0.01 to 0.15mol%; the SnO content is 0.001 to 0.2mol%, preferably 0.01 to 0.15mol%; ce (Ce) 2 O 3 The content of (C) is 0.001 to 0.5mol%, preferably 0.01 to 0.1mol%; srNO 3 The content of (2) is 0.001 to 0.1mol%, preferably 0.001 to 0.08mol%; ba (NO) 3 ) 2 The content of (2) is 0.001 to 0.4mol%, preferably 0.001 to 0.35mol%;
wherein the value of the clarifying agent is 0.05 to 0.96, preferably 0.08 to 0.8, more preferably 0.1 to 0.6, in mole percent.
5. A production method of a low-expansion low-shrinkage low-tension high-Young modulus material is characterized by comprising the following steps of: the method comprises the following steps:
step one: adding raw materials into a kiln through a spiral automatic feeding device, heating the kiln by adopting a molybdenum oxide electrode, providing energy by adopting a ratio of G/E (G represents natural gas for providing energy and E represents electric energy for providing energy) of 0.4-0.75, controlling the length of a material mountain to be controlled to be 0.3-0.5 of the length of the kiln in the length direction, controlling the pressure of the kiln to be 6-25 Pa, adding the current and the flame direction of a burning gun to the glass liquid in the flowing direction perpendicular to the energy, adding the glass liquid into the kiln through the feeding device, wherein the G/E ratio is 0.4-0.75, and melting glass liquid in the kiln for 16-28 h to obtain clear glass liquid;
step two: and homogenizing, clarifying, cooling and forming the glass liquid component temperature to obtain the low-expansion high-Young modulus display electronic glass.
Step three: the clarified glass liquid is clarified by negative pressure and ultrasonic bubble filtration, and the bubble filtration and clarification are carried out at the temperature of 1580-1650 ℃, preferably 1590-1630 ℃, more preferably 1595-1630 ℃.
Step four: and cooling and shaping the homogenized clarified glass liquid, and producing the glass by adopting the methods of molding, overflow, float and crack down-draw method to obtain the glass for display electronics.
6. The method for producing a low expansion, low shrinkage, low tension and high young's modulus material according to claim 5, wherein: in the second step, the glass liquid is clarified for 2 hours, cooled for 1 to 1.5 hours and molded for 15 to 30 minutes.
7. The method for producing a low expansion, low shrinkage, low tension and high young's modulus material according to claim 5, wherein: in the third step, the filter screen for ultrasonic bubble filtration clarification can be one of 1 set, 2 sets and 3 sets of filter screens of 'well', 'O', 'triangle and polygon' which are matched and fixed in the glass liquid channel, the material can be platinum, rhodium and platinum rhodium alloy, and the aperture can be matched and mixed with multiple filter screen apertures for homogenization.
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