CN117761967A - Nanometer impression flat pressing equipment - Google Patents
Nanometer impression flat pressing equipment Download PDFInfo
- Publication number
- CN117761967A CN117761967A CN202410092433.8A CN202410092433A CN117761967A CN 117761967 A CN117761967 A CN 117761967A CN 202410092433 A CN202410092433 A CN 202410092433A CN 117761967 A CN117761967 A CN 117761967A
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- imprinting
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- embossing
- sealing
- substrate
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- 238000003825 pressing Methods 0.000 title claims abstract description 14
- 239000000758 substrate Substances 0.000 claims abstract description 33
- 238000007789 sealing Methods 0.000 claims abstract description 31
- 238000000034 method Methods 0.000 claims description 32
- 238000004049 embossing Methods 0.000 claims description 29
- 230000008569 process Effects 0.000 claims description 22
- 239000000463 material Substances 0.000 claims description 18
- 238000006073 displacement reaction Methods 0.000 claims description 11
- 238000001127 nanoimprint lithography Methods 0.000 claims description 6
- 230000001174 ascending effect Effects 0.000 claims description 2
- 238000005516 engineering process Methods 0.000 abstract description 10
- 239000003292 glue Substances 0.000 abstract description 6
- 239000011248 coating agent Substances 0.000 abstract description 4
- 238000000576 coating method Methods 0.000 abstract description 4
- 238000007641 inkjet printing Methods 0.000 abstract description 4
- 238000005507 spraying Methods 0.000 abstract description 3
- 238000004528 spin coating Methods 0.000 abstract description 2
- 239000002086 nanomaterial Substances 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 12
- 230000001276 controlling effect Effects 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000001746 injection moulding Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 230000033001 locomotion Effects 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000004038 photonic crystal Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000003578 releasing effect Effects 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
Landscapes
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
Abstract
The invention discloses nano-imprinting flat pressing equipment which comprises a base, wherein an imprinting box is arranged at the top of the base, a sealing component is arranged in the imprinting box in a moving manner, a driving component for driving the sealing component to move is arranged at the bottom of the imprinting box, a substrate is arranged at the top of the sealing component, a clamp is arranged at the top of the sealing component in a moving manner, a curing component is arranged in the middle of the clamp, and an imprinting component is arranged at the bottom of the clamp; by adopting the platen press technology, the imprinting glue is coated in an ink-jet printing mode, the ink-jet printing can be carried out according to the specific imprinting position and the imprinting thickness, the coating thickness is between 100nm and 500 mu m, and the spraying is required to be carried out in a specific area instead of the whole spin coating, so that the glue cost can be saved.
Description
Technical Field
The invention relates to the technical field of nano-imprinting, in particular to nano-imprinting flat pressing equipment.
Background
Micro-nano technology focuses on the properties and applications of substances and structures on the scale of nanometers. At this scale, the material exhibits properties such as quantum effects, surface effects, etc., which are quite different from those of the macroscopic scale. Nanoimprinting allows the fabrication of materials and devices with unique properties and functions by precisely controlling and manipulating nanoscale structures.
Micro-nano fabrication involves the process of precisely controlling and preparing materials on the nanometer scale. Nanoimprinting is a key technology in nano-fabrication that enables the fabrication of nanostructures over large areas, providing new properties and functionality in a variety of applications. Nanoimprinting has wide application in the fields of optics and electronics. Optical elements, electronic devices and sensors, such as nanophotonics devices, nanoelectrodes, gratings, photonic crystals, etc., on the micrometer and nanometer scale can be prepared by nanoimprint techniques.
The nanoimprint apparatus mainly has the following working principles: (1) Hot Embossing (Hot Embossing): hot stamping is a common nanoimprint technique whose principle of operation involves heating a template (typically made of metal or silicon) and then transferring the nanostructures in the template to a substrate by applying pressure. Hot embossing can be used to produce micro-nanostructures such as nanograting and microfluidic chips; (2) UV light curable embossing (UV Nanoimprint Lithography): this method irradiates a curable photosensitive resin with Ultraviolet (UV) light. The nanostructures on the template are transferred to the photosensitive resin by means of photolithography and then cured using a UV light source. After curing, a replica of the nanostructure is formed; (3) magnetic imprinting (Magnetic Nanoimprint Lithography): the magnetic imprinting uses a magnetic template, and the surface of the template is provided with tiny magnetic elements. Simultaneously applying a magnetic field, contacting the template with the substrate and applying pressure so that the nanostructures on the magnetic template are transferred to the substrate; (4) Magnetic relief (Magnetic Force-Assisted Nanoimprint Lithography): this method combines magnetic force and imprinting techniques. In the nanoimprint process, better nanostructure transmission and positioning control can be realized through the adjustment of a magnetic field; (5) Injection nanoimprint (Injection Molding Nanoimprint Lithography): this method combines conventional injection molding and nanoimprint techniques. The preparation of the nanostructure is realized by injecting a thermoplastic polymer into a template and then imprinting at a certain temperature and pressure; (6) Laser induced imprinting (Laser-Assisted Nanoimprint Lithography): this method uses a laser to heat, thereby achieving nanostructure transfer between the template and the substrate. Precise control of the laser allows heating in specific areas, thus achieving higher resolution.
Ultraviolet nanoimprint technology is one of the main technologies for manufacturing large-area 3D micro-nano structures, and is currently being used in academia and industry. However, the speed of attaching the template, the integrity of attaching the template and the demolding after the imprinting are completed in the imprinting process, which are several important imprinting links, lead to the difficulty of mass rapid production of nano imprinting. Particularly, the line width requirement of tens of nanometers for the production of nano structures such as semiconductor production lines not only presents challenges to the imprinting material, but also presents great challenges to the fit matching degree of the entire process flow of imprinting. In addition, compared with the photolithography technology, the advantages of energy saving and material saving of the nanoimprint technology need to be further emphasized.
It is desirable to have a new method for nanoimprint fabrication process that replicates the precise pattern on the nanometer scale, which is different from the existing process schemes, and is suitable for commercial mass production in batch quantities.
The nanoimprint equipment taking the ultraviolet light curing nanoimprint technology as the core is a currently mainstream nanoimprint process route; the existing nano imprinting equipment is difficult to imprint patterns with nano-scale precision, and the production efficiency requirement for a semiconductor production line is met.
Disclosure of Invention
The invention aims to provide nano-imprinting platen press equipment for solving the problems in the background technology.
In order to achieve the above purpose, the present invention provides the following technical solutions: the utility model provides a flat pressing equipment of nanometer impression, includes the base station, the base station top is equipped with the impression case, remove in the impression case and be equipped with seal assembly, the impression bottom of the case portion is equipped with and is used for the drive seal assembly removes drive assembly, seal assembly top is equipped with the substrate, seal assembly top removes and is equipped with the anchor clamps, the anchor clamps middle part is equipped with the curing assembly, the anchor clamps bottom is equipped with the impression subassembly.
Preferably, the sealing assembly comprises a chuck for fixing the substrate in the embossing box in a lifting manner, the bottom of the chuck is connected with the side wall of the embossing box, a sealing piece is arranged in a telescopic manner, and a sealing ring is arranged at the top of the embossing box.
Preferably, the outer ring of the chuck is provided with a plurality of groups of laser displacement sensors, the laser displacement sensors are arranged at 120-degree angles with the center of the chuck, the side wall of the chuck is communicated with the embossing box, the embossing box is provided with a diversion trench, and the chuck is communicated with a vacuum pump through the diversion trench.
Preferably, the sealing element is a corrugated pipe and is arranged in a funnel shape.
Preferably, the driving assembly comprises a six-axis platform arranged on the top of the base platform.
Preferably, the curing assembly comprises a light-transmitting part arranged in the middle of the clamp, and an ultraviolet curing lamp is arranged at the top of the light-transmitting part.
Preferably, the imprinting assembly comprises a substrate arranged at the bottom of the clamp, and a structural layer for imprinting is arranged at the bottom of the substrate.
Preferably, the process flow comprises the following steps:
s1, preparing an imprinting material on the top of a substrate by adopting an ink-jet process;
s2, sealing the embossing box and vacuumizing;
s3, embossing treatment is carried out by controlling the ascending of the six-axis platform, and then curing operation is carried out on the embossing material by an ultraviolet curing lamp;
s4, achieving demolding operation by controlling multi-degree-of-freedom multi-directional descent of the six-axis platform.
The invention has the beneficial effects that:
by adopting the platen press technology, the imprinting glue is coated in an ink-jet printing mode, the ink-jet printing can be carried out according to the specific imprinting position and the imprinting thickness, the coating thickness is between 100nm and 500 mu m, and the spraying is required to be carried out in a specific area instead of the whole spin coating, so that the glue cost can be saved.
The whole imprinting process is controlled to be carried out in a vacuum state, so that impurities such as bubbles can be effectively removed, bubbles are avoided in the imprinting process, and the product yield and the imprinting efficiency are improved.
The six-axis platform is controlled to realize multi-degree-of-freedom multidirectional descending movement, and finally the demolding is realized, so that the drawing-up demolding, inclined line demolding and the like can be performed according to requirements, and the selectivity of the demolding direction is increased.
Drawings
FIG. 1 is a nano-imprinting platen press according to the present invention;
FIG. 2 is a process flow of the nano-imprinting platen press of the present invention;
FIG. 3 is a schematic diagram of a position sensor in an embodiment of the present invention.
In the figure: 11. an ultraviolet curing lamp; 12. a light transmitting member; 13. a clamp; 14. a substrate; 15. a structural layer; 16. a substrate; 17. a chuck; 18. a seal; 19. a base station; 20. an embossing box; 21. an ink jet tube; 22. imprinting material; 110. a seal ring; 111. a laser displacement sensor; 112. a six-axis platform.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Referring to fig. 1, the invention provides a nano-imprinting platen press device, which comprises a base 19 for bearing the device, wherein an imprinting box 20 is arranged at the top of the base 19, a sealing component is arranged in the imprinting box 20, a driving component for driving the sealing component to move is arranged at the bottom of the imprinting box 20, a substrate 16 is arranged at the top of the sealing component, a clamp 13 is arranged at the top of the sealing component in a moving manner, a curing component is arranged in the middle of the clamp 13, and an imprinting component is arranged at the bottom of the clamp 13.
In particular, the substrate 16 is a hard material, including but not limited to glass, silicon dioxide, monocrystalline silicon, quartz, or sapphire material, that serves to receive the transfer structure.
Specifically, the seal assembly includes the lift is equipped with in the impression case 20 and is used for fixing the chuck 17 of substrate 16, chuck 17 bottom is connected the flexible sealing member 18 that is equipped with of impression case 20 lateral wall, impression case 20 top is equipped with sealing washer 110, descends through control anchor clamps 13 for the basement 14 that anchor clamps 13 bottom set up supports tightly with sealing washer 110, and realizes the closure effect to impression case 20 through sealing member 18, isolated external environment.
In particular, the seal 18 is a bellows and is provided in a funnel shape.
As shown in fig. 3, specifically, the outer ring of the chuck 17 is provided with a plurality of groups of laser displacement sensors 111, an included angle between each group of laser displacement sensors 111 and the center of the chuck 17 is 120 degrees, each group of laser displacement sensors 111 comprises three laser displacement sensors 111 which are linearly arranged up and down, and the up and down displacement of the bellows is regulated and controlled through the position information of the three laser displacement sensors 111, so as to complete the imprinting laminating action; the lateral wall of the chuck 17 is communicated with the imprinting case 20 and is provided with a diversion trench, the chuck 17 is communicated with a vacuum pump through the diversion trench, and the imprinting case 20 is vacuumized through controlling the vacuum pump, so that impurities such as bubbles are effectively removed, and the yield and the imprinting speed are improved.
Specifically, the driving assembly includes a six-axis platform 112 provided at the top of the base 19, the model of the six-axis platform 112 is HXP200S-MECA, and the attaching and releasing actions in the imprinting process can be completed by controlling the six-axis platform 112 to move up and down.
Specifically, the clamp 13 is a hollow annular metal ring, the inner ring is provided with the light-transmitting member 12, the bottom of the outer ring of the clamp 13 is fixedly provided with the substrate 14 and the structural layer 15 through mechanical clamping or screws, and the substrate 14 and the structural layer 15 are prevented from being displaced in the imprinting process.
Specifically, the curing assembly comprises a light-transmitting piece 12 arranged in the middle of the clamp 13, wherein the light-transmitting piece 12 is made of glass or quartz and the like, and plays roles of sealing a cavity and transmitting ultraviolet light; the light-transmitting member 12 is provided on top with an ultraviolet curing lamp 11 for ultraviolet curing the imprint material 22.
Specifically, the imprinting assembly includes a substrate 14 disposed at the bottom of the fixture 13, and made of a hard material, so that the substrate 14 is not deformed due to the vacuum during the vacuum process; the bottom of the substrate 14 is provided with a structural layer 15 for imprinting, the material of the structural layer is polymer template glue or transparent inorganic layer, and the lower surface of the structural layer is a micro-nano structure to be replicated.
As shown in fig. 2, specifically, the process flow includes the following steps:
s1, preparing an imprinting material 22 on top of a substrate 16 by an ink-jet process; in the ink-jet process, the ink-jet tube 21 is utilized for selective spraying, the coating thickness is between 100nm and 500 mu m, the method is controlled by software, the proper glue amount can be calculated through arranging the target impression structure, and reasonable glue-dropping arrangement is carried out, so that the cost is saved.
S2, sealing the embossing box 20 and vacuumizing; the device comprises a control clamp 13 which descends to be abutted against the top of an embossing box 20, the embossing box 20 is sealed through the matching of a substrate 14, a sealing ring 110 and a sealing piece 18, and then the vacuum pump is used for vacuumizing the embossing box 20, so that bubbles are prevented from being generated in the embossing and laminating process.
S3, controlling the six-axis platform 112 to ascend, driving the chuck 17 to stretch the corrugated pipe to ascend synchronously, enabling the substrate 16 to be abutted against the structural layer 15 on the base 14, discharging bubbles between the substrate 16 and the structural layer 15, realizing imprinting treatment, and curing the imprinting material 22 through the ultraviolet curing lamp 11;
s4, after the imprinting material 22 is solidified, multi-degree-of-freedom multi-directional descending motion is realized by controlling the six-axis platform 112, and finally demolding is realized, so that pulling-up demolding, inclined line demolding and the like can be performed according to requirements, and the selectivity of the demolding direction is increased.
Specifically, by reasonably inkjet-coating different imprinting structures, then sealing the imprinting case 20, then vacuumizing the imprinting case 20 by a vacuum pump, then tightly attaching the imprinting substrate 14 to the imprinting substrate 16, and applying pressure, air bubbles between the imprinting substrate 14 and the imprinting substrate 16 are completely removed.
The foregoing description of the preferred embodiments of the invention is not intended to be limiting, but rather is intended to cover all modifications, equivalents, or alternatives falling within the spirit and principles of the invention.
Claims (8)
1. A nanoimprint lithography apparatus comprising a base station (19), characterized in that: the novel stamping device is characterized in that an embossing box (20) is arranged at the top of the base station (19), a sealing assembly is arranged in the embossing box (20), a driving assembly used for driving the sealing assembly to move is arranged at the bottom of the embossing box (20), a substrate (16) is arranged at the top of the sealing assembly, a clamp (13) is arranged at the top of the sealing assembly in a moving mode, a curing assembly is arranged in the middle of the clamp (13), and an embossing assembly is arranged at the bottom of the clamp (13).
2. The nano-imprinting platen-pressing apparatus according to claim 1, wherein: the sealing assembly comprises a chuck (17) used for fixing the substrate (16) in the embossing box (20) in a lifting mode, the bottom of the chuck (17) is connected with the side wall of the embossing box (20) and is provided with a sealing piece (18) in a telescopic mode, and the top of the embossing box (20) is provided with a sealing ring (110).
3. A nano-imprinting platen-pressing apparatus according to claim 2, wherein: the outer ring of chuck (17) is equipped with a plurality of laser displacement sensor (111), laser displacement sensor (111) with chuck (17) center contained angle is 120 degrees setting, chuck (17) lateral wall intercommunication embossing case (20) are equipped with the guiding gutter, chuck (17) are through the guiding gutter intercommunication has the vacuum pump.
4. A nano-imprinting platen-pressing apparatus according to claim 2, wherein: the sealing element (18) is a corrugated pipe and is arranged in a funnel shape.
5. The nano-imprinting platen-pressing apparatus according to claim 1, wherein: the driving assembly comprises a six-axis platform (112) arranged at the top of the base station (19).
6. The nano-imprinting platen-pressing apparatus according to claim 1, wherein: the curing assembly comprises a light-transmitting piece (12) arranged in the middle of the clamp (13), and an ultraviolet curing lamp (11) is arranged at the top of the light-transmitting piece (12).
7. The nano-imprinting platen-pressing apparatus according to claim 1, wherein: the imprinting assembly comprises a substrate (14) arranged at the bottom of the clamp (13), and a structural layer (15) for imprinting is arranged at the bottom of the substrate (14).
8. The nano imprinting process flow is characterized in that: the process flow adopts the nano-imprinting platen press equipment according to any one of claims 1-7, and comprises the following steps:
s1, preparing an imprinting material (22) on the top of a substrate (16) by adopting an ink-jet process;
s2, sealing the embossing box (20) and vacuumizing;
s3, embossing treatment is carried out by controlling the ascending of the six-axis platform (112), and then the embossing material (22) is solidified by the ultraviolet solidifying lamp (11);
s4, achieving the stripping operation by controlling multi-degree-of-freedom multi-directional descent of the six-axis platform (112).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202410092433.8A CN117761967A (en) | 2024-01-23 | 2024-01-23 | Nanometer impression flat pressing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202410092433.8A CN117761967A (en) | 2024-01-23 | 2024-01-23 | Nanometer impression flat pressing equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117761967A true CN117761967A (en) | 2024-03-26 |
Family
ID=90310888
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202410092433.8A Pending CN117761967A (en) | 2024-01-23 | 2024-01-23 | Nanometer impression flat pressing equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN117761967A (en) |
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2024
- 2024-01-23 CN CN202410092433.8A patent/CN117761967A/en active Pending
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