CN117706750A - Confocal microscope and image distortion correction method - Google Patents
Confocal microscope and image distortion correction method Download PDFInfo
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Abstract
The invention relates to a confocal microscope and an image distortion correction method, which comprises the following steps: preparing a two-dimensional MEMS scanning galvanometer distortion testing device; measuring a distortion characteristic image of each two-dimensional MEMS scanning galvanometer to be tested; assembling and debugging a confocal microscope, and calculating the optical magnification M of an optical system formed by a relay lens and an objective lens in the confocal microscope; obtaining an imaging distortion image of the confocal microscope through calculation at the optical magnification M; generating an image distortion correction model according to the imaging distortion image; performing image distortion correction on an actual distorted image by using an image distortion correction model: the invention can greatly reduce the after-sale supporting cost of the instrument and equipment.
Description
Technical Field
The invention relates to the technical field of microscope imaging, in particular to a confocal microscope and an image distortion correction method.
Background
The laser scanning confocal imaging has wide application in the field of biological medicine, and has various realization forms, wherein the point scanning confocal imaging mainly adopts a galvanometer or a rotary polygon mirror to scan and operate a laser beam, so that the laser beam performs point-by-point and line-by-line scanning movement on a sample, an optical signal on the sample is recorded in real time by adopting a photoelectric detector, and a two-dimensional or three-dimensional image of the sample can be obtained through digital image reconstruction.
MEMS is an English abbreviation of Micro-Electro-Mechanical System system, and a scanning galvanometer designed and manufactured by adopting MEMS technology, namely the MEMS galvanometer, has the characteristics of small volume, light weight and the like, and is suitable for being used as a handheld optical imaging inspection device.
However, the disadvantages of the MEMS galvanometer are also obvious, and when the optical imaging inspection device scans the light beam by using the MEMS galvanometer, the obtained confocal image has more obvious complex two-dimensional scanning distortion, and the vibration characteristics of different MEMS galvanometers are different, namely, the image distortion caused by each MEMS galvanometer is different.
In the prior art, the following problems exist in the whole confocal microscope measurement and correction of image distortion: on the one hand, the whole machine image distortion testing process is complex and difficult, and the image distortion measurement is greatly influenced by subjective factors such as the capability of an operator. On the other hand, after the MEMS galvanometer type skin confocal microscope is sold to an end user, the scanning galvanometer is a wearing part, the galvanometer needs to be replaced under the conditions of abrasion and the like on the surface of the galvanometer, the user mainly is a hospital, after the galvanometer is replaced on site in the hospital, the image distortion of the whole machine needs to be measured, a distortion correction model is regenerated according to the distortion measurement condition so as to correct the image distortion, and because the image distortion measurement condition is often lacking on site in the hospital, the instrument may need to be returned to a factory for maintenance, so that the after-sales support cost of the instrument equipment is greatly increased.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provides a confocal microscope and an image distortion correction method.
The invention provides a confocal microscope image distortion correction method, which has the following technical scheme:
a confocal microscope image distortion correction method is characterized in that: the method comprises the following steps:
s1, preparing a set of two-dimensional MEMS scanning galvanometer distortion testing device, and preparing a placing window for placing at least one two-dimensional MEMS scanning galvanometer;
s2, measuring the distortion characteristic images of each two-dimensional MEMS scanning galvanometer to be tested, obtaining a set of the distortion characteristic images of all the two-dimensional MEMS scanning galvanometers to be tested, and recording and storing the set;
s3, assembling and debugging a confocal microscope, and calculating the optical magnification M of an optical system formed by a relay lens and an objective lens in the confocal microscope;
s4, based on the optical magnification M, obtaining an imaging distortion image of the confocal microscope through calculation;
s5, generating an image distortion correction model according to the imaging distortion image obtained in the step S4;
s6, performing image distortion correction on the distorted image acquired by the confocal microscope by using the image distortion correction model.
According to the technical scheme, the method comprises the steps of firstly manufacturing a set of two-dimensional MEMS scanning galvanometer distortion testing device, measuring distortion characteristic images of all two-dimensional MEMS scanning galvanometers in a production batch in advance, associating the distortion characteristic images with corresponding two-dimensional MEMS galvanometers, further, when the MEMS galvanometer type skin confocal microscope is assembled and regulated, directly measuring distortion images of the whole confocal microscope is not needed, only the distortion characteristic images corresponding to the two-dimensional MEMS scanning galvanometers which are measured in advance and recorded and stored are called out, and the distortion characteristic images are multiplied by optical zoom multiples of an optical system composed of a relay lens and an objective lens in the confocal microscope to obtain distortion images of the whole confocal microscope, and on the basis, an image distortion correction model is produced, and correction of distortion images is achieved through pixel shifting of the distortion images. The whole machine image distortion testing process is simple, and the image distortion measurement is greatly reduced by subjective factors such as the capability of operators.
The method can realize the pre-distortion characteristic image test of all two-dimensional MEMS vibrating mirrors used in the production batch, on one hand, the unqualified two-dimensional MEMS vibrating mirrors with serious out-of-standard distortion can be checked, the unqualified two-dimensional MEMS vibrating mirrors are prevented from flowing into the subsequent production assembly, unnecessary man-hour waste is caused, on the other hand, the MEMS vibrating mirrors and the corresponding distortion characteristic images can be associated together for management, for example, the MEMS vibrating mirrors are marked with a serial number, the serial number corresponds to a specific distortion characteristic image, when the assembly and the debugging of the MEMS vibrating mirror type skin confocal microscope are completed, the distortion characteristic image corresponding to the adopted MEMS vibrating mirrors is called, the image distortion of the whole confocal microscope can be calculated through simple mathematical operation, the image distortion correction model is regenerated to realize the correction of distortion, more importantly, when the two-dimensional MEMS scanning vibrating mirrors are damaged and need to be replaced, only a new two-dimensional MEMS scanning vibrating mirror is installed on site, and then the original stored vibrating mirror distortion characteristic image of the system is replaced by the characteristic image file of the new vibrating mirror, so that the image distortion correction of the confocal microscope can be realized rapidly, and the after-sales equipment cost of the confocal microscope can be greatly reduced.
Preferably, the step S1 includes the steps of:
s11, selecting a laser as a light source, a PBS (polarization beam splitter) prism as a beam splitter, a scanning lens as an adjusting device, a grid distortion test target as a test object, a photoelectric converter as equipment for converting an optical signal into an electric signal, and an image collector as equipment for converting the electric signal into image information;
s12, preparing a placing window for placing at least one two-dimensional MEMS scanning galvanometer;
s13, emitting signal light through the light source, and generating reflected light by using the PBS prism;
s14, arranging the placing window, the scanning lens and the grid distortion test target in sequence along the transmission direction of the reflected light, and arranging the grid distortion test target at the focal plane position of the scanning lens;
s15, arranging the PBS prism and the photoelectric converter in sequence along the reverse direction of the transmission of the reflected light, and electrically connecting the photoelectric converter with the image collector to form a set of two-dimensional MEMS scanning galvanometer distortion testing device;
in the existing scheme, when a grid distortion test target is adopted as a control sample for imaging, water or gel needs to be filled between an objective lens and the control sample, so that the method is quite inconvenient. In addition, because the imaging magnification of the objective lens is very high, the size of the grid distortion test target is very small, the grid distortion test target is difficult to position in an imaging visual field when imaging is carried out, the depth of field of imaging is very short, the grid distortion test target also needs to be accurately focused along the optical axis direction of the objective lens, the XYZ position of the grid distortion test target in the imaging visual field needs to be adjusted by means of a precise XYZ three-dimensional precise moving mechanism, and a relatively deep adjustment technician is needed to complete the operations.
According to the preferred scheme of the method, the distortion characteristic image of the MEMS scanning galvanometer is measured at the focal plane of the scanning lens, and the focal length of the scanning lens is far longer than that of the objective lens, so that the grid distortion test target is adopted to measure distortion, water and gel do not need to be filled between the scanning lens and the grid distortion test target, in addition, the requirement on the placement position accuracy of the grid distortion test target is very low, the measuring process is simple, convenient and rapid, and the dilemma is further overcome.
Preferably, the step S2 includes the steps of:
s21, placing at least one two-dimensional MEMS scanning galvanometer on the placing window prepared in the step S12, and taking the two-dimensional MEMS scanning galvanometer as a two-dimensional MEMS scanning galvanometer to be tested;
s22, a lambda/4 wave plate is placed between the scanning lens and the grid distortion test target;
s23, emitting signal light through the light source, acquiring distortion characteristic images of each two-dimensional MEMS scanning galvanometer to be tested through the image collector, obtaining a set of the distortion characteristic images of all the two-dimensional MEMS scanning galvanometers to be tested, and storing the set;
and further, the distortion characteristic images of all the tested two-dimensional MEMS scanning galvanometers are measured in advance, and the distortion characteristic images and the corresponding two-dimensional MEMS galvanometers are associated together and stored.
Preferably, in the step S3, the process of assembling and debugging the confocal microscope includes the following steps;
s31, setting a mounting part for mounting a two-dimensional MEMS scanning galvanometer in the confocal microscope, wherein the mounting part is detachably matched with the two-dimensional MEMS scanning galvanometer;
s32, taking a distortion characteristic image from the set of distortion characteristic images obtained in the step S23, and finding out a two-dimensional MEMS scanning galvanometer corresponding to the distortion characteristic image;
s33, using the two-dimensional MEMS scanning galvanometer obtained in the step S32 as a galvanometer, and installing the galvanometer on the installation part, and assembling and debugging the relay lens and the objective lens to obtain a confocal microscope;
because the mounting seat is matched with the two-dimensional MEMS scanning galvanometer in a searching and writing way, when the originally mounted two-dimensional MEMS scanning galvanometer is damaged and needs to be replaced, a new two-dimensional MEMS scanning galvanometer with distortion characteristic images acquired can be directly mounted on site.
Preferably, in the step S4, the formula for calculating the imaging distortion image of the confocal microscope includes:
I distortion of ＝M×I mi ，
Wherein I is Distortion of An imaging distortion image representative of the confocal microscope, I mi Representing a distorted feature image taken in said step S32.
Preferably, the step S6 includes the following steps;
s61, acquiring an actual object through the confocal microscope to obtain an image signal of the actual object:
and S62, performing pixel shift on the image signal obtained in the step S61 by using the image distortion correction model so as to correct a distorted image, and outputting a correction result.
The invention provides a confocal microscope, which has the following technical scheme:
a confocal microscope, the confocal microscope comprising:
a laser for generating signal light;
a beam splitter for generating reflected light;
the two-dimensional MEMS scanning galvanometer is used for realizing scanning sampling of a sample;
the in-object optical system comprises a relay lens and an objective lens, and is used for amplifying and focusing light reflected by a sample to obtain an amplified light signal of the sample;
the photoelectric conversion module is used for converting the amplified optical signal of the sample into an electrical signal;
the image forming module is used for converting the electric signal into an image signal, generating an image distortion correction model based on the distortion characteristic image of the two-dimensional MEMS scanning galvanometer acquired by the confocal microscope image distortion correction method in the technical scheme, and carrying out image distortion correction on the image signal through the image distortion correction model to acquire a corrected image;
wherein,
the two-dimensional MEMS scanning galvanometer and the optical system in the object are sequentially arranged along the transmission direction of the reflected light, the beam splitter and the photoelectric conversion module are sequentially arranged along the transmission reverse direction of the reflected light, and the electric signal output end of the photoelectric conversion module is electrically connected with the image forming module.
According to the confocal microscope in the technical scheme, an amplified light signal of a sample is obtained through an optical system in an object comprising a relay lens and an objective lens, then the amplified light signal enters a beam splitter along the reverse propagation direction of reflected light, and enters a photoelectric conversion module after being transmitted by the beam splitter to form an electric signal, and enters an image forming module to be subjected to distortion correction by the image forming module. The image forming module adopts a new mode, generates an image distortion correction model based on the distortion characteristic image of the two-dimensional MEMS scanning galvanometer obtained by the confocal microscope image distortion correction method in the technical scheme, corrects the image distortion of the image signal through the image distortion correction model, obtains corrected images, improves correction efficiency, ensures precision, has small calculation complexity of image correction, has advancement, and reduces the after-sale support cost of the microscope.
Preferably, the confocal microscope further comprises a mounting seat, wherein the mounting seat is used for mounting a two-dimensional MEMS scanning galvanometer, and the mounting seat is detachably connected with the two-dimensional MEMS scanning galvanometer; thereby realizing the replacement of the two-dimensional MEMS scanning galvanometer.
Preferably, a scanning lens is arranged between the two-dimensional MEMS scanning galvanometer and the optical train in the object along the transmission direction of the reflected light; and the scanning speed and the imaging speed can be adjusted to be in a linear relation, so that the correction and the imaging accuracy are ensured to be controllable.
Preferably, the image forming module includes establishing an electrical connection relationship:
an input terminal for acquiring an image signal;
the information acquisition unit is used for acquiring the optical magnification M of the optical system in the object and the distortion characteristic image of the two-dimensional MEMS scanning galvanometer;
the model building unit is used for acquiring an imaging distortion image and generating an image distortion correction model by using the imaging distortion image;
the corrected image output unit is used for carrying out image distortion correction on the image signal according to the image distortion correction model to obtain a corrected image;
wherein,
the input end is electrically connected with the electric signal output end of the photoelectric conversion module;
and further, the distortion image is corrected, and the corrected image is output.
Drawings
FIG. 1 is a flow chart of a method for correcting image distortion of a confocal microscope according to a first embodiment of the invention;
FIG. 2 is a schematic diagram of a two-dimensional MEMS scanning galvanometer distortion testing apparatus according to an embodiment of the invention;
FIG. 3 is a schematic diagram of a mesh distortion test target according to an embodiment of the present invention;
FIG. 4 is a schematic diagram of a confocal microscope according to a second embodiment of the invention;
fig. 5 is a schematic diagram of an image forming module according to a second embodiment of the invention.
Detailed Description
The technical scheme of the invention will be clearly and completely described below by adopting two embodiments and combining the drawings in the embodiments of the invention.
Example 1
The image distortion correction method of the confocal microscope provided by the embodiment comprises the following steps:
s1, preparing a set of two-dimensional MEMS scanning galvanometer distortion testing device, and preparing a placing window for placing at least one two-dimensional MEMS scanning galvanometer;
in this embodiment, step S1 includes the following steps:
s11, selecting a laser as a light source, a PBS (polarization beam splitter) prism as a beam splitter, a scanning lens as an adjusting device, a grid distortion test target as a test object, a photoelectric converter as equipment for converting an optical signal into an electric signal, and an image collector as equipment for converting the electric signal into image information;
s12, preparing a placing window for placing at least one two-dimensional MEMS scanning galvanometer;
s13, emitting signal light through a light source, and generating reflected light by using a PBS prism;
s14, arranging the placing window, the scanning lens and the grid distortion test targets in sequence along the transmission direction of the reflected light, and arranging the grid distortion test targets at the focal plane position of the scanning lens;
s15, arranging the PBS prism and the photoelectric converter in sequence along the reverse direction of the transmission of the reflected light, and electrically connecting the photoelectric converter with the image collector to form a set of two-dimensional MEMS scanning galvanometer distortion testing device.
S2, measuring the distortion characteristic images of each two-dimensional MEMS scanning galvanometer to be tested, obtaining a set of the distortion characteristic images of all the two-dimensional MEMS scanning galvanometers to be tested, and recording and storing the set;
preferably, the step S2 includes the steps of:
s21, placing at least one two-dimensional MEMS scanning galvanometer on the placing window prepared in the step S12, and taking the two-dimensional MEMS scanning galvanometer as a two-dimensional MEMS scanning galvanometer to be tested;
s22, a lambda/4 wave plate is arranged between the scanning lens and the grid distortion test target;
s23, emitting signal light through a light source, acquiring distortion characteristic images of each two-dimensional MEMS scanning galvanometer to be tested through an image collector, obtaining a set of the distortion characteristic images of all the two-dimensional MEMS scanning galvanometers to be tested, and storing the set.
As an implementation manner, an optical path diagram of the two-dimensional MEMS scanning galvanometer distortion testing apparatus prepared in this example is shown in fig. 2, and in fig. 2, a laser is used as a light source, and a photoelectric converter includes a reflecting mirror, a pinhole lens, a pinhole, and a photodetector. The light beam S emitted by the light source is reflected by the polarized beam splitting PBS prism, enters the two-dimensional MEMS scanning galvanometer, is reflected by the scanning galvanometer and enters the scanning lens, the light beam emitted from the scanning lens forms an intermediate image surface at the image surface of the scanning lens, continuously propagates forwards and enters the relay lens, then enters the lambda/4 wave plate, the lambda/4 wave plate modulates the incident linearly polarized light vibrating in the S direction into circularly polarized light, the light beam enters the grid distortion test target after being emitted from the lambda/4 wave plate, the light beam is focused into a punctiform light spot on the grid distortion test target, and the focused light spot formed by the light beam on the grid distortion test target moves point by point.
The light beam reflected or scattered by the grid distortion test target reenters the lambda/4 wave plate, is subjected to phase modulation again by the lambda/4 wave plate, converts the polarization state of the light beam emitted from the lambda/4 wave plate into polarized light in the P direction, sequentially enters a relay lens, a scanning lens and a two-dimensional MEMS scanning galvanometer, then enters a PBS prism and is transmitted, and then enters a reflecting mirror 2, a pinhole lens, a pinhole and a photoelectric detector. The photoelectric detector converts the detected sample optical signal into an electric signal, and the two-dimensional or three-dimensional image of the sample can be finally obtained through image reconstruction by the image collector by combining the angle (the position of the light spot on the grid distortion test target) information of the galvanometer.
S3, assembling and debugging a confocal microscope, and calculating the optical magnification M of an optical system formed by a relay lens and an objective lens in the confocal microscope;
in step S3 of the present embodiment, the process of assembling and debugging the confocal microscope includes the following steps;
s31, selecting an existing confocal microscope, setting a mounting part for mounting a two-dimensional MEMS scanning galvanometer in the confocal microscope, and setting the mounting part to be detachably matched with the two-dimensional MEMS scanning galvanometer, wherein the mounting part can be realized through threads or screws;
s32, taking a distortion characteristic image from the set of distortion characteristic images obtained in the step S23, and finding out a two-dimensional MEMS scanning galvanometer corresponding to the distortion characteristic image;
s33, using the two-dimensional MEMS scanning galvanometer obtained in the step S32 as a galvanometer, and installing the galvanometer on an installation part, and assembling and debugging the relay lens and the objective lens, thereby obtaining the confocal microscope.
S4, obtaining an imaging distortion image of the confocal microscope through calculation based on the optical magnification M;
in one embodiment, in step S4, the formula for calculating the imaging distortion image of the confocal microscope is:
I distortion of ＝M×I mi ，
Wherein I is Distortion of Imaging distortion image representing confocal microscope, I mi Representing a distorted feature image taken in step S32.
S5, generating an image distortion correction model according to the imaging distortion image obtained in the step S4.
S6, performing image distortion correction on a distorted image acquired by the confocal microscope by using an image distortion correction model;
in this embodiment, step S6 includes the following steps;
s61, acquiring an actual object through a confocal microscope to obtain an image signal of the actual object:
s62, performing pixel shift on the image signal obtained in the step S61 by using an image distortion correction model to correct a distorted image, and outputting a correction result.
As shown in fig. 1, in the implementation process, a set of two-dimensional MEMS scanning galvanometer distortion testing apparatus may be first fabricated as described in step S1, in which a batch of two-dimensional MEMS scanning galvanometers to be tested is installed, and the number of the two-dimensional MEMS scanning galvanometers in the production batch is denoted as n. Subsequently, a certain two-dimensional MEMS scanning galvanometer distortion characteristic image I of the current production batch is measured mi Repeating the process to obtain distortion characteristic images I of all two-dimensional MEMS scanning galvanometers in the production batch mi And recording and storing, wherein m represents a production batch, i represents an ith two-dimensional MEMS scanning galvanometer of the batch, and the value of the ith two-dimensional MEMS scanning galvanometer is from 1 to n. Then assembling and debugging (MEMS galvanometer type) skin confocal microscope, calculating optical magnification M of an optical system formed by a relay lens and an objective lens in the confocal microscope, and calculating I mi And (8) obtaining an imaging distortion image of the whole confocal microscope, generating an image distortion correction model, and correcting the distortion image by shifting pixels of the distortion image.
In the two-dimensional MEMS scanning galvanometer distortion testing device, the two-dimensional MEMS scanning galvanometer can be replaced; measuring a distortion image at the mirror surface of the scanning lens by a two-dimensional MEMS scanning galvanometer distortion testing device, and recording a distortion characteristic image corresponding to the two-dimensional MEMS scanning galvanometer; multiplying the vibrating mirror distortion characteristic image by the zoom multiple of an optical zoom system consisting of a relay lens and an objective lens to obtain a distortion image of the whole MEMS vibrating mirror type skin confocal microscope; and generating an image distortion correction model according to the whole machine distortion image, and correcting the whole machine distortion image.
Example two
Based on the method for correcting image distortion of a confocal microscope according to the first embodiment of the present invention, the present embodiment further provides a confocal microscope, which includes:
a laser for generating signal light;
a beam splitter for generating reflected light;
the two-dimensional MEMS scanning galvanometer is used for realizing scanning sampling of a sample;
the in-object optical system comprises a relay lens and an objective lens, and is used for amplifying and focusing light reflected by a sample to obtain an amplified light signal of the sample;
the photoelectric conversion module is used for converting the amplified optical signal of the sample into an electrical signal;
the image forming module is used for converting the electric signal into an image signal, generating an image distortion correction model based on the distortion characteristic image of the two-dimensional MEMS scanning galvanometer acquired by the confocal microscope image distortion correction method, and carrying out image distortion correction on the image signal through the image distortion correction model to acquire a corrected image;
wherein,
the two-dimensional MEMS scanning galvanometer and the optical system in the object are sequentially arranged along the transmission direction of the reflected light, the beam splitter and the photoelectric conversion module are sequentially arranged along the transmission reverse direction of the reflected light, and the electric signal output end of the photoelectric conversion module is electrically connected with the image forming module.
The confocal microscope of this embodiment also includes the mount pad, and the mount pad is used for installing two-dimensional MEMS scanning galvanometer, and the mount pad can dismantle with two-dimensional MEMS scanning galvanometer and be connected. Meanwhile, a scanning lens is arranged between the two-dimensional MEMS scanning galvanometer and the optical system in the object along the transmission direction of the reflected light.
In this embodiment, the image forming module includes a module for establishing an electrical connection relationship:
an input terminal for acquiring an image signal;
the information acquisition unit is used for acquiring the optical magnification M of the optical system in the object and the distortion characteristic image of the two-dimensional MEMS scanning galvanometer;
the model building unit is used for acquiring an imaging distortion image and generating an image distortion correction model by using the imaging distortion image;
the corrected image output unit is used for carrying out image distortion correction on the image signal according to the image distortion correction model to obtain a corrected image;
wherein,
the input end is electrically connected with the electric signal output end of the photoelectric conversion module.
As shown in fig. 4, as an embodiment, the photoelectric conversion module may include a reflecting mirror 1, a pinhole lens, and a photoelectric detector, and the optical system may include a relay lens and an objective lens, and a reflecting mirror 2 may be disposed between the relay lens and the objective lens, so as to ensure smooth light paths and reasonable device distribution. The objective lens can amplify and focus the light reflected by the sample so that the information of the tiny observation object can be collected.
While the present invention has been shown and described with respect to two particular embodiments, it will be apparent to those skilled in the art that various changes, modifications, substitutions and alterations can be made herein without departing from the spirit and scope of the invention as defined by the appended claims and their equivalents.
Claims (10)
1. A confocal microscope image distortion correction method is characterized in that: the method comprises the following steps:
s1, preparing a set of two-dimensional MEMS scanning galvanometer distortion testing device, and preparing a placing window for placing at least one two-dimensional MEMS scanning galvanometer;
s2, measuring the distortion characteristic images of each two-dimensional MEMS scanning galvanometer to be tested, obtaining a set of the distortion characteristic images of all the two-dimensional MEMS scanning galvanometers to be tested, and recording and storing the set;
s3, assembling and debugging a confocal microscope, and calculating the optical magnification M of an optical system formed by a relay lens and an objective lens in the confocal microscope;
s4, based on the optical magnification M, obtaining an imaging distortion image of the confocal microscope through calculation;
s5, generating an image distortion correction model according to the imaging distortion image obtained in the step S4;
s6, performing image distortion correction on the distorted image acquired by the confocal microscope by using the image distortion correction model.
2. The confocal microscope image distortion correction method according to claim 1, wherein: the step S1 includes the steps of:
s11, selecting a laser as a light source, a PBS (polarization beam splitter) prism as a beam splitter, a scanning lens as an adjusting device, a grid distortion test target as a test object, a photoelectric converter as equipment for converting an optical signal into an electric signal, and an image collector as equipment for converting the electric signal into image information;
s12, preparing a placing window for placing at least one two-dimensional MEMS scanning galvanometer;
s13, emitting signal light through the light source, and generating reflected light by using the PBS prism;
s14, arranging the placing window, the scanning lens and the grid distortion test target in sequence along the transmission direction of the reflected light, and arranging the grid distortion test target at the focal plane position of the scanning lens;
s15, arranging the PBS prism and the photoelectric converter in sequence along the reverse direction of the transmission of the reflected light, and electrically connecting the photoelectric converter with the image collector to form a set of two-dimensional MEMS scanning galvanometer distortion testing device.
3. The confocal microscope image distortion correction method according to claim 2, wherein: the step S2 includes the steps of:
s21, placing at least one two-dimensional MEMS scanning galvanometer on the placing window prepared in the step S12, and taking the two-dimensional MEMS scanning galvanometer as a two-dimensional MEMS scanning galvanometer to be tested;
s22, a lambda/4 wave plate is placed between the scanning lens and the grid distortion test target;
s23, emitting signal light through the light source, acquiring distortion characteristic images of each two-dimensional MEMS scanning galvanometer to be tested through the image collector, obtaining a set of the distortion characteristic images of all the two-dimensional MEMS scanning galvanometers to be tested, and storing the set.
4. A confocal microscope image distortion correction method according to claim 3, wherein: in the step S3, the process of assembling and debugging the confocal microscope comprises the following steps of;
s31, setting a mounting part for mounting a two-dimensional MEMS scanning galvanometer in the confocal microscope, wherein the mounting part is detachably matched with the two-dimensional MEMS scanning galvanometer;
s32, taking a distortion characteristic image from the set of distortion characteristic images obtained in the step S23, and finding out a two-dimensional MEMS scanning galvanometer corresponding to the distortion characteristic image;
and S33, using the two-dimensional MEMS scanning galvanometer obtained in the step S32 as a galvanometer, and installing the galvanometer on the installation part, and assembling and debugging the relay lens and the objective lens, thereby obtaining the confocal microscope.
5. The confocal microscope image distortion correction method of claim 4, wherein: in the step S4, the formula for calculating the distorted image of the confocal microscope includes:
I distortion of ＝M×I mi ，
Wherein I is Distortion of An imaging distortion image representative of the confocal microscope, I mi Representing a distorted feature image taken in said step S32.
6. The confocal microscope image distortion correction method of claim 5, wherein: the step S6 comprises the following steps of;
s61, acquiring an actual object through the confocal microscope to obtain an image signal of the actual object:
and S62, performing pixel shift on the image signal obtained in the step S61 by using the image distortion correction model so as to correct a distorted image, and outputting a correction result.
7. A confocal microscope, characterized by: the confocal microscope includes:
a laser for generating signal light;
a beam splitter for generating reflected light;
the two-dimensional MEMS scanning galvanometer is used for realizing scanning sampling of a sample;
the in-object optical system comprises a relay lens and an objective lens, and is used for amplifying and focusing light reflected by a sample to obtain an amplified light signal of the sample;
the photoelectric conversion module is used for converting the amplified optical signal of the sample into an electrical signal;
an image forming module, configured to convert the electrical signal into an image signal, and generate an image distortion correction model based on the distortion characteristic image of the two-dimensional MEMS scanning galvanometer acquired by the confocal microscope image distortion correction method according to any one of claims 1 to 6, and perform image distortion correction on the image signal by using the image distortion correction model, so as to acquire a corrected image;
wherein,
the two-dimensional MEMS scanning galvanometer and the optical system in the object are sequentially arranged along the transmission direction of the reflected light, the beam splitter and the photoelectric conversion module are sequentially arranged along the transmission reverse direction of the reflected light, and the electric signal output end of the photoelectric conversion module is electrically connected with the image forming module.
8. The confocal microscope of claim 7, wherein: the confocal microscope further comprises a mounting seat, wherein the mounting seat is used for mounting the two-dimensional MEMS scanning galvanometer, and the mounting seat is detachably connected with the two-dimensional MEMS scanning galvanometer.
9. The confocal microscope of claim 8, wherein: and a scanning lens is arranged between the two-dimensional MEMS scanning galvanometer and the optical train in the object along the transmission direction of the reflected light.
10. The confocal microscope of claim 9, wherein: the image forming module includes a module for establishing an electrical connection relationship:
an input terminal for acquiring an image signal;
the information acquisition unit is used for acquiring the optical magnification M of the optical system in the object and the distortion characteristic image of the two-dimensional MEMS scanning galvanometer;
the model building unit is used for acquiring an imaging distortion image and generating an image distortion correction model by using the imaging distortion image;
the corrected image output unit is used for carrying out image distortion correction on the image signal according to the image distortion correction model to obtain a corrected image;
wherein,
the input end is electrically connected with the electric signal output end of the photoelectric conversion module.
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