CN117701233A - Photosensitive polyimide glue solution suitable for coating and coating method thereof - Google Patents
Photosensitive polyimide glue solution suitable for coating and coating method thereof Download PDFInfo
- Publication number
- CN117701233A CN117701233A CN202311780786.9A CN202311780786A CN117701233A CN 117701233 A CN117701233 A CN 117701233A CN 202311780786 A CN202311780786 A CN 202311780786A CN 117701233 A CN117701233 A CN 117701233A
- Authority
- CN
- China
- Prior art keywords
- coating
- film
- agent
- photosensitive polyimide
- solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 168
- 239000011248 coating agent Substances 0.000 title claims abstract description 156
- 239000003292 glue Substances 0.000 title claims abstract description 142
- 229920001721 polyimide Polymers 0.000 title claims abstract description 105
- 239000004642 Polyimide Substances 0.000 title claims abstract description 75
- 239000002904 solvent Substances 0.000 claims abstract description 96
- 239000011347 resin Substances 0.000 claims abstract description 68
- 229920005989 resin Polymers 0.000 claims abstract description 68
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 31
- 239000003112 inhibitor Substances 0.000 claims abstract description 23
- 238000006116 polymerization reaction Methods 0.000 claims abstract description 23
- 239000003431 cross linking reagent Substances 0.000 claims abstract description 21
- 239000003999 initiator Substances 0.000 claims abstract description 17
- 239000002518 antifoaming agent Substances 0.000 claims abstract description 13
- 239000002270 dispersing agent Substances 0.000 claims abstract description 11
- 239000011256 inorganic filler Substances 0.000 claims abstract description 11
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 11
- 239000002994 raw material Substances 0.000 claims abstract description 3
- 239000000243 solution Substances 0.000 claims description 132
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 claims description 84
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 claims description 74
- 239000002002 slurry Substances 0.000 claims description 72
- 239000002313 adhesive film Substances 0.000 claims description 65
- 238000003756 stirring Methods 0.000 claims description 53
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 52
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 49
- 229940116333 ethyl lactate Drugs 0.000 claims description 42
- 230000001681 protective effect Effects 0.000 claims description 34
- 238000009835 boiling Methods 0.000 claims description 33
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 claims description 32
- 230000009969 flowable effect Effects 0.000 claims description 32
- 239000013530 defoamer Substances 0.000 claims description 26
- 239000009719 polyimide resin Substances 0.000 claims description 25
- 239000007788 liquid Substances 0.000 claims description 21
- 229910021485 fumed silica Inorganic materials 0.000 claims description 18
- 150000004985 diamines Chemical class 0.000 claims description 17
- 239000000377 silicon dioxide Substances 0.000 claims description 17
- 239000007787 solid Substances 0.000 claims description 17
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims description 16
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 16
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 15
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 12
- 238000002156 mixing Methods 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 9
- 238000006243 chemical reaction Methods 0.000 claims description 8
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 8
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 6
- 238000010030 laminating Methods 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 238000011161 development Methods 0.000 claims description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 4
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 claims description 4
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 claims description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 4
- 125000003277 amino group Chemical group 0.000 claims description 4
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical group CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 claims description 4
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 claims description 4
- 238000001035 drying Methods 0.000 claims description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 4
- 239000010445 mica Substances 0.000 claims description 4
- 229910052618 mica group Inorganic materials 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 claims description 4
- 239000000843 powder Substances 0.000 claims description 4
- MQAHXEQUBNDFGI-UHFFFAOYSA-N 5-[4-[2-[4-[(1,3-dioxo-2-benzofuran-5-yl)oxy]phenyl]propan-2-yl]phenoxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC2=CC=C(C=C2)C(C)(C=2C=CC(OC=3C=C4C(=O)OC(=O)C4=CC=3)=CC=2)C)=C1 MQAHXEQUBNDFGI-UHFFFAOYSA-N 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000003960 organic solvent Substances 0.000 claims description 3
- 238000010992 reflux Methods 0.000 claims description 3
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 claims description 2
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 claims description 2
- YXAOOTNFFAQIPZ-UHFFFAOYSA-N 1-nitrosonaphthalen-2-ol Chemical compound C1=CC=CC2=C(N=O)C(O)=CC=C21 YXAOOTNFFAQIPZ-UHFFFAOYSA-N 0.000 claims description 2
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 claims description 2
- YIJYFLXQHDOQGW-UHFFFAOYSA-N 2-[2,4,6-trioxo-3,5-bis(2-prop-2-enoyloxyethyl)-1,3,5-triazinan-1-yl]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCN1C(=O)N(CCOC(=O)C=C)C(=O)N(CCOC(=O)C=C)C1=O YIJYFLXQHDOQGW-UHFFFAOYSA-N 0.000 claims description 2
- MSTZGVRUOMBULC-UHFFFAOYSA-N 2-amino-4-[2-(3-amino-4-hydroxyphenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]phenol Chemical compound C1=C(O)C(N)=CC(C(C=2C=C(N)C(O)=CC=2)(C(F)(F)F)C(F)(F)F)=C1 MSTZGVRUOMBULC-UHFFFAOYSA-N 0.000 claims description 2
- VXTJVMWIVSZHNI-UHFFFAOYSA-N 2-amino-4-propylphenol Chemical compound CCCC1=CC=C(O)C(N)=C1 VXTJVMWIVSZHNI-UHFFFAOYSA-N 0.000 claims description 2
- GTELLNMUWNJXMQ-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical class OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCC(CO)(CO)CO GTELLNMUWNJXMQ-UHFFFAOYSA-N 0.000 claims description 2
- IEVADDDOVGMCSI-UHFFFAOYSA-N 2-hydroxybutyl 2-methylprop-2-enoate Chemical compound CCC(O)COC(=O)C(C)=C IEVADDDOVGMCSI-UHFFFAOYSA-N 0.000 claims description 2
- NJRHMGPRPPEGQL-UHFFFAOYSA-N 2-hydroxybutyl prop-2-enoate Chemical compound CCC(O)COC(=O)C=C NJRHMGPRPPEGQL-UHFFFAOYSA-N 0.000 claims description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 claims description 2
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 claims description 2
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 claims description 2
- SYUYTOYKQOAVDW-UHFFFAOYSA-N 2-nitrosonaphthalen-1-ol Chemical compound C1=CC=C2C(O)=C(N=O)C=CC2=C1 SYUYTOYKQOAVDW-UHFFFAOYSA-N 0.000 claims description 2
- NBAUUNCGSMAPFM-UHFFFAOYSA-N 3-(3,4-dicarboxyphenyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C1=CC=CC(C(O)=O)=C1C(O)=O NBAUUNCGSMAPFM-UHFFFAOYSA-N 0.000 claims description 2
- BQGXXEGJJMEZMZ-UHFFFAOYSA-N 3-(n-ethyl-3-hydroxy-4-nitrosoanilino)propane-1-sulfonic acid Chemical compound OS(=O)(=O)CCCN(CC)C1=CC=C(N=O)C(O)=C1 BQGXXEGJJMEZMZ-UHFFFAOYSA-N 0.000 claims description 2
- XESZUVZBAMCAEJ-UHFFFAOYSA-N 4-tert-butylcatechol Chemical compound CC(C)(C)C1=CC=C(O)C(O)=C1 XESZUVZBAMCAEJ-UHFFFAOYSA-N 0.000 claims description 2
- RZWRYPGAUIOOMK-UHFFFAOYSA-N 5-nitroso-8-quinolinol Chemical compound C1=CN=C2C(O)=CC=C(N=O)C2=C1 RZWRYPGAUIOOMK-UHFFFAOYSA-N 0.000 claims description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims description 2
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 claims description 2
- 241000208818 Helianthus Species 0.000 claims description 2
- 235000003222 Helianthus annuus Nutrition 0.000 claims description 2
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 2
- UBUCNCOMADRQHX-UHFFFAOYSA-N N-Nitrosodiphenylamine Chemical compound C=1C=CC=CC=1N(N=O)C1=CC=CC=C1 UBUCNCOMADRQHX-UHFFFAOYSA-N 0.000 claims description 2
- XQVWYOYUZDUNRW-UHFFFAOYSA-N N-Phenyl-1-naphthylamine Chemical compound C=1C=CC2=CC=CC=C2C=1NC1=CC=CC=C1 XQVWYOYUZDUNRW-UHFFFAOYSA-N 0.000 claims description 2
- 239000004698 Polyethylene Substances 0.000 claims description 2
- 239000002202 Polyethylene glycol Substances 0.000 claims description 2
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 2
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 claims description 2
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 claims description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 2
- 150000001412 amines Chemical class 0.000 claims description 2
- 150000004984 aromatic diamines Chemical class 0.000 claims description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 claims description 2
- 239000004305 biphenyl Substances 0.000 claims description 2
- WOSVXXBNNCUXMT-UHFFFAOYSA-N cyclopentane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1CC(C(O)=O)C(C(O)=O)C1C(O)=O WOSVXXBNNCUXMT-UHFFFAOYSA-N 0.000 claims description 2
- LTYMSROWYAPPGB-UHFFFAOYSA-N diphenyl sulfide Chemical compound C=1C=CC=CC=1SC1=CC=CC=C1 LTYMSROWYAPPGB-UHFFFAOYSA-N 0.000 claims description 2
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 claims description 2
- 238000007756 gravure coating Methods 0.000 claims description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 claims description 2
- OTRIMLCPYJAPPD-UHFFFAOYSA-N methanol prop-2-enoic acid Chemical compound OC.OC.OC(=O)C=C.OC(=O)C=C OTRIMLCPYJAPPD-UHFFFAOYSA-N 0.000 claims description 2
- 229950000688 phenothiazine Drugs 0.000 claims description 2
- 229920001223 polyethylene glycol Polymers 0.000 claims description 2
- 239000013557 residual solvent Substances 0.000 claims description 2
- 238000007650 screen-printing Methods 0.000 claims description 2
- OAXARSVKYJPDPA-UHFFFAOYSA-N tert-butyl 4-prop-2-ynylpiperazine-1-carboxylate Chemical compound CC(C)(C)OC(=O)N1CCN(CC#C)CC1 OAXARSVKYJPDPA-UHFFFAOYSA-N 0.000 claims description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 2
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 claims description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims 2
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 claims 1
- 238000005406 washing Methods 0.000 claims 1
- 238000004062 sedimentation Methods 0.000 abstract description 37
- 239000000945 filler Substances 0.000 abstract description 21
- 230000007547 defect Effects 0.000 abstract description 19
- 238000009833 condensation Methods 0.000 abstract description 10
- 230000005494 condensation Effects 0.000 abstract description 10
- 239000003513 alkali Substances 0.000 abstract 1
- 238000012360 testing method Methods 0.000 description 34
- 238000001514 detection method Methods 0.000 description 22
- 230000002950 deficient Effects 0.000 description 21
- 230000000052 comparative effect Effects 0.000 description 19
- 230000032798 delamination Effects 0.000 description 17
- 238000010790 dilution Methods 0.000 description 15
- 239000012895 dilution Substances 0.000 description 15
- 238000000206 photolithography Methods 0.000 description 15
- 238000003860 storage Methods 0.000 description 10
- 238000001259 photo etching Methods 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 5
- 239000011342 resin composition Substances 0.000 description 4
- QQGYZOYWNCKGEK-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 QQGYZOYWNCKGEK-UHFFFAOYSA-N 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 2
- HDGLPTVARHLGMV-UHFFFAOYSA-N 2-amino-4-(1,1,1,3,3,3-hexafluoropropan-2-yl)phenol Chemical compound NC1=CC(C(C(F)(F)F)C(F)(F)F)=CC=C1O HDGLPTVARHLGMV-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 229920005575 poly(amic acid) Polymers 0.000 description 2
- 230000001376 precipitating effect Effects 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- ODJQKYXPKWQWNK-UHFFFAOYSA-N 3,3'-Thiobispropanoic acid Chemical compound OC(=O)CCSCCC(O)=O ODJQKYXPKWQWNK-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- GCNKJQRMNYNDBI-UHFFFAOYSA-N [2-(hydroxymethyl)-2-(2-methylprop-2-enoyloxymethyl)butyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(CC)COC(=O)C(C)=C GCNKJQRMNYNDBI-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J179/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09J161/00 - C09J177/00
- C09J179/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C09J179/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/04—Non-macromolecular additives inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/08—Macromolecular additives
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K2003/2227—Oxides; Hydroxides of metals of aluminium
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2467/00—Presence of polyester
- C09J2467/005—Presence of polyester in the release coating
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Paints Or Removers (AREA)
Abstract
The invention discloses a photosensitive polyimide glue solution suitable for coating and a coating method thereof. The glue solution is prepared from the following raw materials in parts by weight: the viscosity of the glue solution is controlled between 800 cps and 1500cps, and the glue solution comprises alkali water-soluble resin, a photo-crosslinking agent, a photo-initiator, a polymerization inhibitor, an inorganic filler, a dispersing agent, a defoaming agent, a leveling agent, an anti-settling agent, a solvent and the like. The glue solution can reach normal temperature for 48 hours without sedimentation, the coated glue film can be baked to obtain the glue film with better thickness uniformity which is within +/-1 mu m deviation, and the surface has no defects of air holes, vertical bars, filler condensation points and the like.
Description
Technical Field
The invention belongs to the technical field of high polymer materials and semiconductor packaging, and particularly relates to a photosensitive polyimide glue solution suitable for coating and a coating method thereof.
Background
SAW surface filter devices in electronic products are currently a hollow structured electronic component. The hollow structure is divided into a roof and a wall. Because of the hollow structure, the hollow structure needs to be covered on a cavity formed by a wall body in a film mode, then photoetching and developing are carried out, finally, a stable cavity is obtained through heat curing, and other working procedures are carried out.
CN 113646882a, the photosensitive resin composition provided can improve the high sensitivity of the cap portion of the hollow structure and can be well patterned by photolithography. The photosensitive resin sheet using the photosensitive resin composition of the present invention is useful for the use of a hollow structure for covering an electronic component having a hollow structure. CN 115236938A provides and a negative photosensitive polyamic acid ester resin composition, and preparation and application thereof, wherein the negative photosensitive polyamic acid ester resin composition is suitable for manufacturing a hollow cavity similar to that in filter manufacturing and needing photoetching development. The invention solves the problems that the size of the opening after photoetching development of the photosensitive solid adhesive film formed by the photosensitive adhesive is small and the size of the opening is large, and the electric performance reliability of the later process is affected. However, there is no mention of how glue is suitable for coating.
The photosensitive film for a filter is generally a thick film of 20 μm or more, and it is required to have good uniformity of film thickness and to control the film thickness deviation within + -1 μm. Meanwhile, the defects of air holes, orange peel, vertical bars, filler condensation points and the like cannot appear on the surface.
Disclosure of Invention
The invention aims to provide a photosensitive polyimide glue solution suitable for coating.
The photosensitive polyimide glue solution suitable for coating provided by the invention is prepared from the following raw materials: the coating comprises alkaline water-soluble resin, a photo-crosslinking agent, a photoinitiator, a polymerization inhibitor, an inorganic filler, a dispersing agent, a defoaming agent, a leveling agent, an anti-settling agent and a solvent.
The weight portions of the components are as follows: 100 parts by mass of an alkaline water-soluble resin, 40-100 parts by mass of a photo-crosslinking agent, 0.1-0.5 part by mass of a photoinitiator, 0.1-5 parts by mass of a polymerization inhibitor, 60-467 parts by mass of an inorganic filler, 1-5 parts by mass of a dispersing agent, 0.05-1 part by mass of a defoaming agent, 0.01-1 part by mass of a leveling agent, 0.01-2 parts by mass of an anti-settling agent and 100-300 parts by mass of a solvent.
For coating, the smaller the viscosity of the coating dope, the stronger the continuous coating property. However, too low a viscosity of the dope may result in uncontrollable fluidity of the dope during coating, and poor edge property after coating, and outflow of the dope may occur. Meanwhile, the viscosity of the glue solution is too low, which is unfavorable for the stability of the filler in the glue solution and easy sedimentation. In contrast, the higher the viscosity of the glue solution, the worse the coating property of the glue solution, and the film thickness uniformity is difficult to control, and the defects of vertical channels, filler condensation points and the like are easy to appear on the surface of the obtained glue film.
In order to achieve both the coatability of the dope, the surface defect after coating and the anti-settling property of the filler, the viscosity of the dope is controlled to be 800-1550cps, preferably 1000-1300cps.
Preferably, the molecular weight of the alkaline water-soluble resin is 15000-35000 in order to maintain the film forming property and the photolithography developing property of the adhesive film.
Preferably, in order to increase the universality of the glue solution to the additive, the alkaline water-soluble resin is an alkaline water-soluble PI resin. Because the PI resin does not contain esterified branched chains, the problem of unstable glue solution caused by the acid-base property of the additive is not easy to occur.
The alkaline water-soluble PI resin is prepared by the following steps:
(A) Adding diamine into an organic solvent, and stirring to dissolve the diamine to form a homogeneous diamine solution;
(B) Adding dianhydride and a molecular weight regulator into the homogeneous diamine solution formed in the step (A);
(C) Adding toluene into the reaction system of the step (B), and heating and refluxing to obtain a resin solution;
(D) Mixing the resin solution with a poor solvent to precipitate solid resin; the solid resin was washed and dried to obtain an alkaline water-soluble PI resin.
Further:
in the step (A), the diamine is diamine containing hydroxyl;
The diamine containing hydroxyl groups may be selected from: at least one of 2, 2-bis (3-amino-4-hydroxyphenyl) hexafluoropropane (6 FAP), 2-bis (3-amino-4-hydroxyphenyl) propane, 3' -dihydroxybenzidine, and an aromatic diamine having the structural formula shown below:
the organic solvent is NMP (N-methyl pyrrolidone);
in step (B), the dianhydride may be selected from: at least one of hexafluorodianhydride (6 FDA), 3', 4' -Benzophenone Tetracarboxylic Dianhydride (BTDA), bisphenol A dianhydride (BPADA), 4' -biphenyl ether dianhydride (ODPA), diphenyl sulfide dianhydride (TDPA), 3', 4' -biphenyl tetracarboxylic dianhydride (BPDA), 2,3',3,4' -biphenyl tetracarboxylic dianhydride (alpha-BPDA), pyromellitic dianhydride (PMDA), bicyclo [2.2.2] oct-7-ene-2, 3,5, 6-tetracarboxylic dianhydride, and 1,2,3, 4-cyclopentanetetracarboxylic dianhydride.
The molecular weight regulator is phthalic anhydride;
the molar ratio of the diamine in the step (A) to the dianhydride and the molecular weight modifier in the step (B) may be as follows: 1:0.999-0.98:0.002-0.04;
in the step (C), the temperature of the heating reflux can be 180 ℃ and the time can be 4-6h;
in step (D), the poor solvent may be selected from: at least one of water, ethanol and isopropanol.
Preferably, the photocrosslinking agent may be selected from: at least one of 2-hydroxymethyl methacrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, 2-hydroxybutyl methacrylate, 2-hydroxymethyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 2-hydroxybutyl acrylate, glycidyl methacrylate, ethylene glycol diethyl ether acrylate and polyethylene glycol methacrylate, ethoxylated trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, tris (2-hydroxyethyl) isocyanurate triacrylate and tricyclic sunflower dimethanol diacrylate.
Preferably, the photoinitiator may be selected from: at least one of IRGACURE OXE01, IRGACURE OXE02, IRGACURE OXE 03.
Preferably, the polymerization inhibitor may be selected from: hydroquinone, 4-methoxyphenol, N-nitrosodiphenylamine, p-t-butylcatechol, phenothiazine, N-phenylnaphthylamine, 2, 6-di-t-butylp-methylphenol, 5-nitroso-8-hydroxyquinoline, 1-nitroso-2-naphthol, 2-nitroso-1-naphthol, and 2-nitroso-5- (N-ethyl-sulfopropylamino) phenol.
Preferably, the inorganic filler may be selected from: at least one of silica, mica powder, alumina, yttria, and the like.
Among them, the silica is preferably angular silica (commercially available) having a size of 0.2 to 3. Mu.m.
The mica powder is preferably a dry-produced mica powder (commercially available) having a size of 0.2 to 6. Mu.m, preferably 0.5 to 3. Mu.m.
The alumina (commercially available) has a size of 0.2-3 μm.
The yttrium oxide (commercially available) has a size of 0.2 to 3. Mu.m, preferably 0.5 to 1.5. Mu.m.
In order to maintain the anti-molding performance and film forming property of the photosensitive adhesive film after coating and film forming, the inorganic filler accounts for 30-70% of the total solid matter;
Preferably, the dispersant is a silane coupling agent free of free amine groups and mercapto groups, preferably, the dispersant is KH570 (γ - (methacryloyloxy) propyl trimethoxysilane) having a double bond.
Preferably, the defoamer is organosilicon and cannot contain free amine groups and mercapto groups; KS-603 defoamer and KS-66 defoamer are preferred.
Preferably, the leveling agent cannot contain free amine groups and mercapto groups and is selected from acrylic esters; BYK-354, BYK-361N are preferred.
Preferably, the anti-settling agent does not contain free amine and mercapto groups, preferably fumed silica.
Preferably, the solvent consists of a high boiling point solvent and a low boiling point solvent.
The mass ratio of the high-boiling point solvent to the low-boiling point solvent is 3:2-1:2 (preferably 3:2-1:1) for adjusting the coating speed and the drying speed.
The high boiling point solvent may be selected from: one or two of N-methyl pyrrolidone and gamma-butyrolactone.
The low boiling point solvent may be selected from: one or a mixture of several of N, N' -dimethylformamide, ethyl lactate, propylene glycol methyl ether acetate, cyclopentanone, tetrahydrofuran, ethyl acetate and butyl acetate.
According to one embodiment of the invention, the solvent consists of N-methyl pyrrolidone, gamma-butyrolactone and ethyl lactate according to a mass ratio of 2:1:2, and mixing the materials in proportion.
According to another embodiment of the invention, the solvent is prepared from N-methyl pyrrolidone and ethyl lactate according to a mass ratio of 1:1, and mixing the materials in proportion.
According to a further embodiment of the invention, the solvent consists of N-methyl pyrrolidone and ethyl lactate according to a mass ratio of 1:2, and mixing the materials in proportion.
According to one embodiment of the invention, the solvent is prepared from N-methyl pyrrolidone, gamma-butyrolactone and propylene glycol methyl ether acetate according to a mass ratio of 2:1:2, and mixing the materials in proportion.
The preparation method of the photosensitive polyimide glue solution suitable for coating comprises the following steps:
(a) Mixing and stirring alkaline water-soluble resin, a photo-crosslinking agent, a photo-initiator, a polymerization inhibitor and part of solvent, and keeping the resin for later use after the resin is dissolved;
(b) Mixing and stirring inorganic filler, dispersing agent and part of solvent, and forming flowable slurry for later use;
(c) Mixing and stirring the defoaming agent and the residual solvent, and standing by after a uniform solution is formed;
(d) Dispersing the clear resin liquid in the step (a) into the slurry formed in the step (b) at a high speed, and respectively adding an anti-settling agent, a defoaming agent diluted in the step (c) and a leveling agent to obtain uniformly dispersed slurry;
(f) And carrying out vacuum defoaming on the slurry to obtain the photosensitive polyimide glue solution suitable for coating.
In the step (a), the stirring speed is 100-300r/min, and the stirring time is more than or equal to 12h.
In the step (b), the stirring speed is 100-300r/min, and the stirring time is more than or equal to 12h.
In the step (c), the stirring speed is 100-300r/min, and the stirring time is more than or equal to 2h.
In the step (d), the high-speed dispersion speed is 1000-3000r/min, and the dispersion time is 1-3h.
In the step (f), the vacuum degree of the vacuum defoaming is 0.1MPa, and the defoaming time is 0.5-1h.
The invention also provides a coating method of the photosensitive polyimide glue solution suitable for the preparation.
The coating method of the photosensitive polyimide glue solution provided by the invention comprises the following steps:
(1) Coating: coating the photosensitive polyimide glue solution suitable for coating on the surface of a support film;
(2) Pre-baking: baking the photosensitive polyimide glue solution coated on the surface of the support film to form a photosensitive solid glue film with the support film;
(3) And (3) laminating a protective film: and bonding the protective film and the photosensitive solid adhesive film with the support film to obtain the negative photosensitive solid adhesive film subjected to alkaline water development.
In the step (1) of the method, the material of the support film comprises PET, TPX, PP plasma film; the thickness of the support film may be 25 to 100. Mu.m, preferably 30 to 50. Mu.m.
The coating method is selected from knife coating, slot coating, micro-gravure coating, screen printing, etc.
The coating speed of the coating may be 1-100mm/s.
In the method step (2), the baking conditions are as follows: baking for 1-60 min at 80-100 deg.C with hot plate or hot air. The photosensitive performance of the glue solution after forming the glue film can be destroyed when the temperature exceeds 100 ℃, the solvent is volatilized slower and the baking time is long when the temperature is lower than 80 ℃, and the baking efficiency is reduced.
In the step (3), the protective film is made of PE, PP or PET;
the thickness of the protective film is 25-50 μm, preferably 30-50 μm; the protective film is not easy to be too thin, and the too thin is easy to deform in the attaching process. Too thick is not beneficial to winding.
The attaching of the protective film is carried out at 70-90 ℃;
the laminating pressure of the protective film is 0.1-0.5 MPa.
The laminating needs to have certain temperature and pressure, and the protection film just can be better with the glued membrane laminating. But the bonding temperature is lower than the baking temperature, so that the secondary volatilization of the solvent during bonding is avoided.
The negative photosensitive solid adhesive film prepared by the method and developed by the alkaline water system also belongs to the protection scope of the invention.
Compared with the prior art, the invention has the following beneficial technical effects:
the invention is based on the problem of coating in the research and development process, and the invention is a photosensitive polyimide solution and coating method for coating. The photosensitive polyimide glue solution obtained by the invention is coated, and the surface of the obtained glue film has no defects and better uniformity of the film thickness. The photosensitive polyimide solution and the coating method can effectively consider the coating efficiency and the retention of photoetching properties, and the film thickness uniformity and the defect-free film surface play a decisive role in the process operability repeatability and the yield of the photosensitive polyimide film formed by the photosensitive polyimide glue solution in the film pasting process.
Drawings
FIG. 1 is a schematic illustration of measuring film thickness at selected edge and center locations according to the 9-point method;
FIG. 2 is a photograph showing the surface state of the adhesive film prepared in example 1;
FIG. 3 is a photograph of the dope prepared in example 1 stored for 96 hours without precipitation;
FIG. 4 is a photograph showing the precipitation of the dope prepared in example 1 after 120 hours of storage;
FIG. 5 is a microscope photograph of the photosensitive polyimide film obtained in example 1 subjected to photolithography to obtain a pattern;
FIG. 6 is a microscopic photograph of the pattern obtained by photolithography of the photosensitive polyimide film obtained in example 4;
FIG. 7 is a photograph of a vertical bar defect of the adhesive film prepared in comparative example 2;
FIG. 8 is a photograph showing the surface state of the adhesive film prepared in comparative example 3;
FIG. 9 is a microscopic photograph of the photo-sensitive polyimide film obtained in comparative example 3 by photolithography to obtain a pattern;
FIG. 10 is a graph showing defects in bubble and filler condensation points of the adhesive film prepared in comparative example 5.
Detailed Description
The following detailed description of the invention is provided in connection with the accompanying drawings that are presented to illustrate the invention and not to limit the scope thereof. The examples provided below are intended as guidelines for further modifications by one of ordinary skill in the art and are not to be construed as limiting the invention in any way.
The experimental methods in the following examples, unless otherwise specified, are conventional methods, and are carried out according to techniques or conditions described in the literature in the field or according to the product specifications. Materials, reagents and the like used in the examples described below are commercially available unless otherwise specified.
The method for detecting the adhesive film in the following embodiment comprises the following steps:
Selecting square blocks with the size of 10cm from the middle of the adhesive film; according to the 9-point method, the film thickness is measured at the edge and the middle (shown in figure 1), the square is placed in a strong light detection table, and the defect phenomena such as bubbles, filler condensation points, vertical bars and the like are observed.
And (3) observing the stability of the glue solution: 5ml of the glue solution was placed in a 10ml transparent colorless sample bottle, and the presence or absence of sedimentation was observed every 24 hours.
The alumina used in the examples below was purchased from Hangzhou Hengna, model alpha; the silicon dioxide is purchased from Anhuixin Jintong material, model XY-01.
Example 1
40.29g of 2-bis (3-amino-4-hydroxyphenyl) hexafluoropropane was dissolved in 250g of NMP, and stirred at room temperature until dissolved. 44.42g of 6FDA is added after the diamine is completely dissolved, 2.96g of phthalic anhydride is added after 20 hours of reaction, and the reaction is continued for 5 hours. 100ml of toluene was added to the reaction system, and the temperature was raised to 180℃and the mixture was refluxed for 5 hours to obtain a polyimide resin solution.
Pouring the polyimide resin solution into 5L of deionized water, precipitating solid, filtering, and drying in vacuum to obtain polyimide resin. The molecular weight of the polyimide resin was 30000.
In a thousands of ultra clean room equipped with yellow light, 100g of polyimide resin, 50g of trimethylolpropane trimethacrylate (photo-crosslinking agent), 0.2g IRGACURE OXE03 (photo-initiator), 0.2g of hydroquinone (polymerization inhibitor), 50g of solvent (N-methylpyrrolidone: gamma-butyrolactone: ethyl lactate=2:1:2, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16 hours, and the resin was completely dissolved.
In a thousands of ultra clean room equipped with yellow light, 50g of alumina (size 1 μm), 100g of silica (size 1 μm), 2g of KH570, 150g of solvent (N-methylpyrrolidone: γ -butyrolactone: ethyl lactate=2:1:2, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16 hours to form a flowable slurry.
0.5g KS-66 was mixed with 20g solvent (N-methylpyrrolidone: γ -butyrolactone: ethyl lactate=2:1:2, mass ratio), and stirred in a beaker at a stirring speed of 180r/min for 3 hours.
The high-speed dispersing machine is started, the high-speed dispersing speed is 2000r/min, resin clear liquid, flowable slurry, dilution defoamer, 1g of fumed silica and 1.0g of BYK-361N are poured into the high-speed dispersing tank, and the high-speed dispersing time is 1.5h, so that the slurry which is uniformly dispersed is obtained.
And (3) carrying out vacuum defoaming on the slurry, wherein the vacuum degree is 0.1MPa, and the defoaming time is 0.5h, so as to obtain the photosensitive polyimide glue solution suitable for coating, and the viscosity of the test glue solution is 1005cps.
And coating and testing the obtained photosensitive polyimide glue solution.
A PET release film was used as a support film, with a thickness of 50. Mu.m.
The coating was performed using a doctor blade at a coating speed of 50mm/s and a coating thickness of 100. Mu.m, and baked in a hot air oven at 80℃for 10 minutes.
And (3) attaching a 36-mu m PET protective film on the baked adhesive film by using the pressure of 0.2MPa to obtain the photosensitive adhesive film with a three-layer structure.
And (3) performing glue film detection: as a result, the thickness was found to be (. Mu.m), and the film thickness deviation was found to be within.+ -. 1. Mu.m. The results are shown in Table 1.
TABLE 1
0.039 | 0.040 | 0.039 |
0.040 | 0.041 | 0.040 |
0.040 | 0.041 | 0.039 |
Defective results are presented: defect free (as shown in fig. 2).
5mL of the glue solution was placed in a 10mL sample bottle, and no sedimentation was observed for 24h, 48h,72h and 96h (as shown in FIG. 3). Delamination occurred after 120h (as shown in FIG. 4).
After the photosensitive polyimide glue solution is used for forming a photosensitive polyimide glue film through the method, film pasting and photoetching are carried out to obtain a microscopic picture of a pattern, and the photoetching is normal (as shown in figure 5).
Example 2
The overall viscosity of the dope was reduced to 856cps by adding the solvent to 60g of the resin clear solution as compared with example 1.
The preparation method of the resin clear liquid comprises the following steps: in a thousands of ultra clean room equipped with yellow light, 100g of polyimide resin, 50g of trimethylolpropane trimethacrylate (photo-crosslinking agent), 0.2g IRGACURE OXE03 (photo-initiator), 0.2g of hydroquinone (polymerization inhibitor), 60g (N-methylpyrrolidone: gamma-butyrolactone: ethyl lactate=2:1:2, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16 hours, and the resin was completely dissolved.
A PET release film was used as a support film, with a thickness of 50. Mu.m.
The coating was performed using a doctor blade at a coating speed of 100mm/s and a coating thickness of 100. Mu.m, and baked in a hot air oven at 80℃for 10 minutes.
And (3) attaching a 36-mu m PET protective film on the baked adhesive film by using the pressure of 0.2MPa to obtain the photosensitive adhesive film with a three-layer structure.
And (3) performing glue film detection: as a result, the thickness was found to be (. Mu.m), and the film thickness deviation was found to be within.+ -. 1. Mu.m. The results are shown in Table 2.
TABLE 2
0.038 | 0.038 | 0.038 |
0.038 | 0.039 | 0.039 |
0.038 | 0.038 | 0.038 |
Defective results are presented: defect-free.
5mL of the glue solution is placed in a 10mL sample bottle, and no sedimentation is observed for 24h, 48h and 72 h. Layering sedimentation occurs after 96 hours. Photolithography is normal.
Example 3
The solvent of the resin clear solution was reduced to 42g and the overall viscosity of the dope increased to 1527cps as compared to example 1.
The preparation method of the resin clear liquid comprises the following steps: in a thousands of ultra clean room equipped with yellow light, 100g of polyimide resin, 50g of trimethylolpropane trimethacrylate (photo-crosslinking agent), 0.2g IRGACURE OXE03 (photo-initiator), 0.2g of hydroquinone (polymerization inhibitor), 42g of solvent (N-methylpyrrolidone: gamma-butyrolactone: ethyl lactate=2:1:2, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16 hours, and the resin was completely dissolved.
A PET release film was used as a support film, with a thickness of 50. Mu.m.
Blade coating was used at a coating speed of 10mm/s and a coating thickness of 100. Mu.m. Baking in 80deg.C hot air for 10min.
And (3) attaching a 36-mu m PET protective film on the baked adhesive film by using the pressure of 0.2MPa to obtain the photosensitive adhesive film with a three-layer structure.
And (3) performing glue film detection: as a result, the thickness was found to be (. Mu.m), and the film thickness deviation was found to be within.+ -. 1. Mu.m. The results are shown in Table 3.
TABLE 3 Table 3
0.041 | 0.041 | 0.040 |
0.039 | 0.039 | 0.041 |
0.039 | 0.040 | 0.040 |
Defective results are presented: defect-free.
5mL of the glue solution is placed in a 10mL sample bottle, and no sedimentation is observed for 24h, 48h, 72h and 96 h. Layering sedimentation occurs after 120 h. Photolithography is normal.
Example 4
In contrast to example 1, the dianhydride in the resin was replaced with ODPA.
40.29g of 2-bis (3-amino-4-hydroxyphenyl) hexafluoropropane was dissolved in 250g of NMP, and stirred at room temperature until dissolved. 31.02g of ODPA is added after the diamine is completely dissolved, 2.96g of phthalic anhydride is added after 20 hours of reaction, and the reaction is continued for 5 hours. 100ml of toluene was added to the reaction system, and the temperature was raised to 180℃and the mixture was refluxed to obtain a polyimide resin solution.
Pouring the polyimide resin solution into 5L of deionized water, precipitating solid, filtering, and drying in vacuum to obtain polyimide resin. The molecular weight of the polyimide resin was 25000.
In a thousands of ultra clean room equipped with yellow light, 100g of polyimide resin, 50g of trimethylolpropane trimethacrylate (photo-crosslinking agent), 0.2g IRGACURE OXE03 (photo-initiator), 0.2g of hydroquinone (polymerization inhibitor), 40g of solvent (N-methylpyrrolidone: gamma-butyrolactone: ethyl lactate=2:1:2, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16 hours, and the resin was completely dissolved.
In a thousands of ultra clean room equipped with yellow light, 50g of alumina (size 1 μm), 100g of silica (size 1 μm), 2g of KH570, 150g of solvent (N-methylpyrrolidone: γ -butyrolactone: ethyl lactate=2:1:2, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16 hours to form a flowable slurry.
0.5g KS-66 was mixed with 20g solvent (N-methylpyrrolidone: γ -butyrolactone: ethyl lactate=2:1:2, mass ratio), and stirred in a beaker at a stirring speed of 180r/min for 3 hours.
The high-speed dispersing machine is started, the high-speed dispersing speed is 2000r/min, resin clear liquid, flowable slurry, dilution defoamer, 1g of fumed silica and 1.0g of BYK-361N are poured into the high-speed dispersing tank, and the high-speed dispersing time is 1.5h, so that the slurry which is uniformly dispersed is obtained.
And (3) carrying out vacuum defoaming on the slurry, wherein the vacuum degree is 0.1MPa, and the defoaming time is 0.5h, so as to obtain the photosensitive polyimide glue solution suitable for coating, and the viscosity of the test glue solution is 977cps.
The obtained photosensitive polyimide glue solution is subjected to coating test.
A PET release film was used as a support film, with a thickness of 50. Mu.m.
Blade coating was used at a coating speed of 50mm/s and a coating thickness of 100. Mu.m. Baking in 80deg.C hot air for 10min.
And (3) attaching a 50 mu m PP protective film on the baked adhesive film by using the pressure of 0.2MPa to obtain the photosensitive adhesive film with the three-layer structure.
And (3) performing glue film detection: as a result, the thickness was found to be (. Mu.m), and the film thickness deviation was found to be within.+ -. 1. Mu.m. The results are shown in Table 4.
TABLE 4 Table 4
0.040 | 0.041 | 0.040 |
0.039 | 0.039 | 0.040 |
0.040 | 0.041 | 0.041 |
Defective results are presented: defect-free.
5mL of the glue solution is placed in a 10mL sample bottle, and no sedimentation is observed for 24h, 48h,72h and 96 h. Delamination occurred after 120 h. Photolithography is normal (as shown in fig. 6).
From the comparison of examples 1, 2, 3 and 4, the viscosity of the photosensitive polyimide glue solution is between 800 and 1550cps, and the glue film with good film thickness uniformity and no defect on the surface of the film can be obtained after coating. Meanwhile, the maximum storage at normal temperature reaches 96 hours without sedimentation, which is greater than the index of 48 hours without sedimentation in normal temperature storage. When the resin structures are different, the formula can also enable the coating glue solution to reach a better coating state, and the photoetching is normal.
Example 5
The ratio of high boiling point and low boiling point solvents compared to example 1 was from 3:2 to 1:1.
in a thousands of ultra clean room equipped with yellow light, 100g of polyimide resin, 50g of trimethylolpropane trimethacrylate (photo-crosslinking agent), 0.2g IRGACURE OXE03 (photo-initiator), 0.2g of hydroquinone (polymerization inhibitor), 53g of solvent (N-methylpyrrolidone: ethyl lactate=1:1, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16 hours, and the resin was completely dissolved.
In a thousands of ultra clean room equipped with yellow light, 50g of alumina (size 1 μm), 100g of silica (size 1 μm), 2g of KH570, 150g of solvent (N-methylpyrrolidone: ethyl lactate=1:1, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16 hours to form a flowable slurry.
0.5g KS-66 was mixed with 20g solvent (N-methylpyrrolidone: ethyl lactate=1:1, mass ratio), and stirred in a beaker at a stirring speed of 180r/min for 3h.
The high-speed dispersing machine is started, the high-speed dispersing speed is 2000r/min, resin clear liquid, flowable slurry, dilution defoamer, 1g of fumed silica and 1.0g of BYK-361N are poured into the high-speed dispersing tank, and the high-speed dispersing time is 1.5h, so that the slurry which is uniformly dispersed is obtained.
And (3) carrying out vacuum defoaming on the slurry, wherein the vacuum degree is 0.1MPa, and the defoaming time is 0.5h, so as to obtain the photosensitive polyimide glue solution suitable for coating, and the viscosity of the test glue solution is 1103cps.
And coating and testing the obtained photosensitive polyimide glue solution.
A PET release film was used as a support film, with a thickness of 50. Mu.m.
The coating was performed using a doctor blade at a coating speed of 55mm/s and a coating thickness of 100. Mu.m, and baked in a hot air oven at 80℃for 9 minutes.
And (3) attaching a 36-mu m PET protective film on the baked adhesive film by using the pressure of 0.2MPa to obtain the photosensitive adhesive film with a three-layer structure.
And (3) performing glue film detection: as a result, the thickness was found to be (. Mu.m), and the film thickness deviation was found to be within.+ -. 1. Mu.m. The results are shown in Table 5.
TABLE 5
0.041 | 0.040 | 0.039 |
0.040 | 0.041 | 0.040 |
0.040 | 0.041 | 0.039 |
Defective results are presented: defect-free.
5mL of the glue solution is placed in a 10mL sample bottle, and no sedimentation is observed for 24h, 48h and 72 h. Delamination occurred after 96 hours.
Example 6
The ratio of high boiling point and low boiling point solvents compared to example 1 was from 3:2 to 1:2.
in a thousands of ultra clean room equipped with yellow light, 100g of polyimide resin, 50g of trimethylolpropane trimethacrylate (photo-crosslinking agent), 0.2g IRGACURE OXE03 (photo-initiator), 0.2g of hydroquinone (polymerization inhibitor), 62g of solvent (N-methylpyrrolidone: ethyl lactate=1:2, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16 hours, and the resin was completely dissolved.
In a thousands of ultra clean room equipped with yellow light, 50g of alumina (size 1 μm), 100g of silica (size 1 μm), 2g of KH570, 150g of solvent (N-methylpyrrolidone: ethyl lactate=1:2, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16 hours to form a flowable slurry.
0.5g KS-66 was mixed with 20g solvent (N-methylpyrrolidone: ethyl lactate=1:2, mass ratio), and stirred in a beaker at a stirring speed of 180r/min for 3h.
The high-speed dispersing machine is started, the high-speed dispersing speed is 2000r/min, resin clear liquid, flowable slurry, dilution defoamer, 1g of fumed silica and 1.0g of BYK-361N are poured into the high-speed dispersing tank, and the high-speed dispersing time is 1.5h, so that the slurry which is uniformly dispersed is obtained.
And (3) carrying out vacuum defoaming on the slurry, wherein the vacuum degree is 0.1MPa, and the defoaming time is 0.5h, so as to obtain the photosensitive polyimide glue solution suitable for coating, and the viscosity of the test glue solution is 1092cps.
And coating and testing the obtained photosensitive polyimide glue solution.
A PET release film was used as a support film, with a thickness of 50. Mu.m.
Blade coating was used at a coating speed of 55mm/s and a coating thickness of 100. Mu.m. Baking in 80deg.C hot air for 7min.
And (3) attaching a 36-mu m PET protective film on the baked adhesive film by using the pressure of 0.2MPa to obtain the photosensitive adhesive film with a three-layer structure.
And (3) performing glue film detection: as a result, the thickness was found to be (. Mu.m), and the film thickness deviation was found to be within.+ -. 1. Mu.m. The results are shown in Table 6.
TABLE 6
0.038 | 0.040 | 0.039 |
0.039 | 0.039 | 0.38 |
0.039 | 0.039 | 0.038 |
Defective results are presented: defect-free.
5mL of the glue solution is taken and placed in a 10mL sample bottle, and no sedimentation is caused after 24h and 48h observation. Delamination occurred after 72 h.
Example 7
In contrast to example 1, the low boiling solvent "ethyl lactate" was replaced with "propylene glycol methyl ether acetate".
In a thousands of ultra clean room equipped with yellow light, 100g of polyimide resin, 50g of trimethylolpropane trimethacrylate (photo-crosslinking agent), 0.2g IRGACURE OXE03 (photo-initiator), 0.2g of hydroquinone (polymerization inhibitor), 50g of solvent (N-methylpyrrolidone: gamma-butyrolactone: propylene glycol methyl ether acetate=2:1:2, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16 hours, and the resin was completely dissolved.
In a thousand-level ultra clean room equipped with yellow light, 50g of alumina, 100g of silica, 2g of KH570, 150g of solvent (N-methylpyrrolidone: γ -butyrolactone: propylene glycol methyl ether acetate=2:1:2, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16 hours to form a flowable slurry.
0.5g KS-66 was mixed with 20g solvent (N-methylpyrrolidone: gamma-butyrolactone: propylene glycol methyl ether acetate=2:1:2, mass ratio), and stirred in a beaker at a stirring speed of 180r/min for 3 hours.
The high-speed dispersing machine is started, the high-speed dispersing speed is 2000r/min, resin clear liquid, flowable slurry, dilution defoamer, 1g of fumed silica and 1.0g of BYK-361N are poured into the high-speed dispersing tank, and the high-speed dispersing time is 1.5h, so that the slurry which is uniformly dispersed is obtained.
And (3) carrying out vacuum defoaming on the slurry, wherein the vacuum degree is 0.1MPa, and the defoaming time is 0.5h, so as to obtain the photosensitive polyimide glue solution suitable for coating, and the viscosity of the test glue solution is 1088cps.
And coating and testing the obtained photosensitive polyimide glue solution.
A PET release film was used as a support film, with a thickness of 50. Mu.m.
Blade coating was used at a coating speed of 50mm/s and a coating thickness of 100. Mu.m. Baking in 80deg.C hot air for 10min.
And (3) attaching a 36-mu m PET protective film on the baked adhesive film by using the pressure of 0.2MPa to obtain the photosensitive adhesive film with a three-layer structure.
And (3) performing glue film detection: as a result, the thickness was found to be (. Mu.m), and the film thickness deviation was found to be within.+ -. 1. Mu.m. The results are shown in Table 7.
TABLE 7
0.039 | 0.040 | 0.039 |
0.041 | 0.040 | 0.040 |
0.040 | 0.041 | 0.040 |
Defective results are presented: defect-free.
5mL of the glue solution is placed in a 10mL sample bottle, and no sedimentation is observed for 24h, 48h,72h and 96 h. Delamination occurred after 120 h. Photolithography is normal.
From examples 1, 5, 6 and 7, the ratio of the solvent high boiling point and low boiling point solvents of the photosensitive polyimide dope was from 3: 2-1: 2, to obtain the film with good uniformity and no defect on the film surface. However, changing the ratio of the solvent to the high and low boiling point solvents affects the coating speed and baking time of the adhesive film. Meanwhile, the low boiling point solvent may be replaced with other low boiling point solvents. The high boiling point solvent may also be a single high boiling point solvent. The maximum storage at normal temperature reaches 96 hours without sedimentation, which is greater than the index of 48 hours without sedimentation in normal temperature storage. Photolithography is normal.
Example 8
Compared to example 1, 0.5g of defoamer was replaced with 0.3g of KS-603.
0.3g KS-603 was mixed with 20g solvent (N-methylpyrrolidone: γ -butyrolactone: ethyl lactate=2:1:2, mass ratio), and stirred in a beaker at a stirring speed of 180r/min for 3 hours.
The high-speed dispersing machine is started, the high-speed dispersing speed is 2000r/min, resin clear liquid, flowable slurry, dilution defoamer, 1g of fumed silica and 1.0g of BYK-361N are poured into the high-speed dispersing tank, and the high-speed dispersing time is 1.5h, so that the slurry which is uniformly dispersed is obtained.
And (3) carrying out vacuum defoaming on the slurry, wherein the vacuum degree is 0.1MPa, and the defoaming time is 0.5h, so as to obtain the photosensitive polyimide glue solution suitable for coating, and the viscosity of the test glue solution is 996cps.
And coating and testing the obtained photosensitive polyimide glue solution.
A PET release film was used as a support film, with a thickness of 50. Mu.m.
Blade coating was used at a coating speed of 50mm/s and a coating thickness of 100. Mu.m. Baking in 80deg.C hot air for 10min.
And (3) attaching a 36-mu m PET protective film on the baked adhesive film by using the pressure of 0.2MPa to obtain the photosensitive adhesive film with a three-layer structure.
And (3) performing glue film detection: as a result, the thickness was found to be (. Mu.m), and the film thickness deviation was found to be within.+ -. 1. Mu.m. The results are shown in Table 8.
TABLE 8
0.040 | 0.041 | 0.040 |
0.040 | 0.040 | 0.039 |
0.040 | 0.040 | 0.039 |
Defective results are presented: defect-free.
5mL of the glue solution is placed in a 10mL sample bottle, and no sedimentation is observed for 24h, 48h,72h and 96 h. Delamination occurred after 120 h. Photolithography is normal.
Example 9
1.0g of BYK-361N leveling agent was replaced by 0.8g of BYK-354 in comparison with example 1.
The high-speed dispersing machine is started, the high-speed dispersing speed is 2000r/min, resin clear liquid, flowable slurry, dilution defoamer, 1g of fumed silica and 0.8g of BYK-354N are poured into the high-speed dispersing tank, and the high-speed dispersing time is 1.5h, so that the slurry which is uniformly dispersed is obtained.
And (3) carrying out vacuum defoaming on the slurry, wherein the vacuum degree is 0.1MPa, and the defoaming time is 0.5h, so as to obtain the photosensitive polyimide glue solution suitable for coating, and the viscosity of the test glue solution is 1028cps.
The obtained photosensitive polyimide glue solution is subjected to coating test.
A PET release film was used as a support film, with a thickness of 50. Mu.m.
Blade coating was used at a coating speed of 50mm/s and a coating thickness of 100. Mu.m. Baking in 80deg.C hot air for 10min.
And (3) attaching a 50 mu m PP protective film on the baked adhesive film by using the pressure of 0.2MPa to obtain the photosensitive adhesive film with the three-layer structure.
And (3) performing glue film detection: as a result, the thickness was found to be (. Mu.m), and the film thickness deviation was found to be within.+ -. 1. Mu.m. The results are shown in Table 9.
TABLE 9
0.041 | 0.040 | 0.040 |
0.040 | 0.040 | 0.040 |
0.039 | 0.039 | 0.039 |
Defective results are presented: defect-free.
5mL of the glue solution is placed in a 10mL sample bottle, and no sedimentation is observed for 24h, 48h,72h and 96 h. Delamination occurred after 120 h. Photolithography is normal.
From examples 1, 8 and 9, the defoamer and leveling agent of the photosensitive polyimide dope can be replaced with each other in the preferred material, but the amount to be used needs to be adjusted. Replacement of the defoamer and leveling agent does not cause an influence on the normal-temperature storability. The maximum storage at normal temperature reaches 96 hours without sedimentation, which is greater than the index of 48 hours without sedimentation in normal temperature storage.
Example 10
The filler content was increased from 50% to 70% compared to example 1.
In a thousands of ultra clean room equipped with yellow light, 100g of polyimide resin, 50g of trimethylolpropane trimethacrylate (photo-crosslinking agent), 0.2g IRGACURE OXE03 (photo-initiator), 0.2g of hydroquinone (polymerization inhibitor), 50g of solvent (N-methylpyrrolidone: gamma-butyrolactone: ethyl lactate=2:1:2, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16 hours, and the resin was completely dissolved.
In a thousand-level ultra clean room equipped with yellow light, 117g of alumina, 233g of silica, 4.5g of KH570, 200g of solvent (N-methylpyrrolidone: γ -butyrolactone: ethyl lactate=2:1:2, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16 hours to form a flowable slurry.
0.5g KS-66 was mixed with 20g solvent (N-methylpyrrolidone: γ -butyrolactone: ethyl lactate=2:1:2, mass ratio), and stirred in a beaker at a stirring speed of 180r/min for 3 hours.
The high-speed dispersing machine is started, the high-speed dispersing speed is 2000r/min, resin clear liquid, flowable slurry, dilution defoamer, 1g of fumed silica and 1.0g of BYK-361N are poured into the high-speed dispersing tank, and the high-speed dispersing time is 1.5h, so that the slurry which is uniformly dispersed is obtained.
And (3) carrying out vacuum defoaming on the slurry, wherein the vacuum degree is 0.1MPa, and the defoaming time is 0.5h, so as to obtain the photosensitive polyimide glue solution suitable for coating, and the viscosity of the test glue solution is 823cps.
The obtained photosensitive polyimide glue solution is subjected to coating test.
A PET release film was used as a support film, with a thickness of 50. Mu.m.
Blade coating was used at a coating speed of 100mm/s and a coating thickness of 100. Mu.m. Baking in 80deg.C hot air for 5min.
And (3) attaching a 50 mu m PP protective film on the baked adhesive film by using the pressure of 0.2MPa to obtain the photosensitive adhesive film with the three-layer structure.
And (3) performing glue film detection: as a result, the thickness was found to be (. Mu.m), and the film thickness deviation was found to be within.+ -. 1. Mu.m. The results are shown in Table 10.
Table 10
0.037 | 0.038 | 0.038 |
0.037 | 0.038 | 0.037 |
0.036 | 0.038 | 0.037 |
Defective results are presented: defect-free.
5mL of the glue solution is taken and placed in a 10mL sample bottle, and no sedimentation is caused after 24h and 48h observation. Delamination occurred after 72 h. Photolithography is normal.
Example 11
Compared with example 1, the filler content was reduced from 50% to 30%.
In a thousands of ultra clean room equipped with yellow light, 100g of polyimide resin, 50g of trimethylolpropane trimethacrylate (photo-crosslinking agent), 0.2g IRGACURE OXE03 (photo-initiator), 0.2g of hydroquinone (polymerization inhibitor), 50g of solvent (N-methylpyrrolidone: gamma-butyrolactone: ethyl lactate=2:1:2, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16 hours, and the resin was completely dissolved.
21g of alumina (size 1 μm), 43g of silica (size 1 μm), 4.5g of KH570, 100g of solvent (N-methylpyrrolidone: gamma-butyrolactone: ethyl lactate=2:1:2, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16h in a thousands of ultra clean room equipped with yellow light, to form a flowable slurry.
0.5g KS-66 was mixed with 20g solvent (N-methylpyrrolidone: γ -butyrolactone: ethyl lactate=2:1:2, mass ratio), and stirred in a beaker at a stirring speed of 180r/min for 3 hours.
The high-speed dispersing machine is started, the high-speed dispersing speed is 2000r/min, resin clear liquid, flowable slurry, dilution defoamer, 1g of fumed silica and 1.0g of BYK-361N are poured into the high-speed dispersing tank, and the high-speed dispersing time is 1.5h, so that the slurry which is uniformly dispersed is obtained.
And (3) carrying out vacuum defoaming on the slurry, wherein the vacuum degree is 0.1MPa, and the defoaming time is 0.5h, so as to obtain the photosensitive polyimide glue solution suitable for coating, and the viscosity of the test glue solution is 1378cps.
The obtained photosensitive polyimide glue solution is subjected to coating test.
A PET release film was used as a support film, with a thickness of 50. Mu.m.
Blade coating was used at a coating speed of 50mm/s and a coating thickness of 100. Mu.m. Baking in 80deg.C hot air for 13min.
And (3) attaching a 50 mu m PP protective film on the baked adhesive film by using the pressure of 0.2MPa to obtain the photosensitive adhesive film with the three-layer structure.
And (3) performing glue film detection: as a result, the thickness was found to be (. Mu.m), and the film thickness deviation was found to be within.+ -. 1. Mu.m. The results are shown in Table 11.
TABLE 11
0.042 | 0.042 | 0.042 |
0.043 | 0.042 | 0.041 |
0.042 | 0.041 | 0.041 |
Defective results are presented: defect-free.
5mL of the glue solution is placed in a 10mL sample bottle, and no sedimentation is observed for 24h, 48h, 72h, 96h, 120h and 144 h. Delamination occurred after 168 h. Photolithography is normal.
According to the embodiment 1, 10 and 11, the filler content of the photosensitive polyimide glue solution is from 30% to 70%, so that the photosensitive polyimide glue solution can be stored for more than 48 hours at normal temperature without sedimentation, and can be maximally 144 hours without sedimentation. The photosensitive polyimide glue solution has good film thickness uniformity after coating and no defect on the surface. Photolithography is normal. It should be noted that as the filler content changes, the solvent content of the flowable slurry will also change.
Comparative example 1
The overall viscosity of the dope was reduced to 655cps by adding the solvent to 70g of the resin clear solution as compared to example 1.
In a thousands of ultra clean room equipped with yellow light, 100g of polyimide resin, 50g of trimethylolpropane trimethacrylate (photo-crosslinking agent), 0.2g IRGACURE OXE03 (photo-initiator), 0.2g of hydroquinone (polymerization inhibitor), 70g of solvent (N-methylpyrrolidone: gamma-butyrolactone: ethyl lactate=2:1:2, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16 hours, and the resin was completely dissolved.
A PET release film was used as a support film, with a thickness of 50. Mu.m.
Blade coating was used at a coating speed of 120mm/s and a coating thickness of 100. Mu.m. Baking in 80deg.C hot air for 10min.
And (3) attaching a 36-mu m PET protective film on the baked adhesive film by using the pressure of 0.2MPa to obtain the photosensitive adhesive film with a three-layer structure.
And (3) performing glue film detection: as a result, the thickness was found to be (. Mu.m), and the film thickness deviation was found to be within.+ -. 1. Mu.m. The results are shown in Table 12.
Table 12
0.035 | 0.036 | 0.035 |
0.035 | 0.036 | 0.035 |
0.036 | 0.035 | 0.035 |
Defective results are presented: defect-free.
5mL of the glue solution is placed in a 10mL sample bottle, and no sedimentation is observed for 24 hours. Delamination subsides after 48 h.
Comparative example 2
The solvent of the resin clear solution was reduced to 37g and the overall viscosity of the dope was increased to 1921cps as compared to example 1.
In a thousands of ultra clean room equipped with yellow light, 100g of polyimide resin, 50g of trimethylolpropane trimethacrylate (photo-crosslinking agent), 0.2g IRGACURE OXE03 (photo-initiator), 0.2g of hydroquinone (polymerization inhibitor), 37g of solvent (N-methylpyrrolidone: gamma-butyrolactone: ethyl lactate=2:1:2, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16 hours, and the resin was completely dissolved.
A PET release film was used as a support film, with a thickness of 50. Mu.m.
Blade coating was used at a coating speed of 10mm/s and a coating thickness of 100. Mu.m. Baking in 80deg.C hot air for 10min.
And (3) attaching a 36-mu m PET protective film on the baked adhesive film by using the pressure of 0.2MPa to obtain the photosensitive adhesive film with a three-layer structure.
And (3) performing glue film detection: as a result, the thickness was found to be (. Mu.m), and the film thickness deviation was found to be within.+ -. 1. Mu.m. The results are shown in Table 13.
TABLE 13
0.042 | 0.044 | 0.040 |
0.045 | 0.042 | 0.043 |
0.045 | 0.045 | 0.040 |
Defective results are presented: there are vertical stripes. (as shown in FIG. 7)
5mL of the glue solution is placed in a 10mL sample bottle, and no sedimentation is observed for 24h, 48h, 72h, 96h, 120h, 144h and 168 h. Layering sedimentation occurs after 192 h.
From the comparison of example 1, comparative examples 1 and 2, it is apparent that the uniformity of the coated dope and the surface defect are not problematic when the viscosity of the dope is < 800cps, but only 24g of normal temperature storage without sedimentation can be maintained, and storage without sedimentation cannot be achieved for 48 hours at normal temperature. When the viscosity is more than 1500cps, the storage property at normal temperature is better, and no sedimentation is achieved for 168 hours. However, the thickness uniformity of the adhesive film was poor, and the deviation was more than + -1 μm. Meanwhile, vertical stripes appear after coating, resulting in surface defects.
Comparative example 3
The ratio of high boiling point and low boiling point solvents compared to example 1 was from 3:2 to 3:1.
in a thousands of ultra clean room equipped with yellow light, 100g of polyimide resin, 50g of trimethylolpropane trimethacrylate (photo-crosslinking agent), 0.2g IRGACURE OXE03 (photo-initiator), 0.2g of hydroquinone (polymerization inhibitor), 50g of solvent (N-methylpyrrolidone: gamma-butyrolactone: ethyl lactate=2:1:1, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16 hours, and the resin was completely dissolved.
In a thousand-level ultra clean room equipped with yellow light, 50g of alumina, 100g of silica, 2g of KH570, 150g of solvent (N-methylpyrrolidone: gamma-butyrolactone: ethyl lactate=2:1:1, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16 hours to form a flowable slurry.
0.5g KS-66 was mixed with 20g solvent (N-methylpyrrolidone: γ -butyrolactone: ethyl lactate=2:1:1, mass ratio), and stirred in a beaker at a stirring speed of 180r/min for 3 hours.
The high-speed dispersing machine is started, the high-speed dispersing speed is 2000r/min, resin clear liquid, flowable slurry, dilution defoamer, 1g of fumed silica and 1.0g of BYK-361N are poured into the high-speed dispersing tank, and the high-speed dispersing time is 1.5h, so that the slurry which is uniformly dispersed is obtained.
And (3) carrying out vacuum defoaming on the slurry, wherein the vacuum degree is 0.1MPa, and the defoaming time is 0.5h, so as to obtain the photosensitive polyimide glue solution suitable for coating, and the viscosity of the test glue solution is 877cps.
The obtained photosensitive polyimide glue solution is subjected to coating test.
A PET release film was used as a support film, with a thickness of 50. Mu.m.
Blade coating was used at a coating speed of 10mm/s and a coating thickness of 100. Mu.m. The phenomenon of sticking hands still occurs when the glass is baked for 30min in hot air baking at 80 ℃, and the solvent volatility is poor.
Changing the coating conditions: blade coating was used at a coating speed of 10mm/s and a coating thickness of 100. Mu.m. Baking in hot air at 105deg.C for 10min.
And (3) attaching a 36-mu m PET protective film on the baked adhesive film by using the pressure of 0.2MPa to obtain the photosensitive adhesive film with a three-layer structure.
And (3) performing glue film detection: as a result, the thickness was found to be (. Mu.m), and the film thickness deviation was found to be within.+ -. 1. Mu.m. The results are shown in Table 14.
TABLE 14
0.041 | 0.040 | 0.040 |
0.041 | 0.039 | 0.041 |
0.040 | 0.041 | 0.040 |
Defective results are presented: the phenomenon of filler condensation point occurs. (as shown in FIG. 8)
5mL of the glue solution is placed in a 10mL sample bottle, and no sedimentation is observed for 24h, 48h, 72h and 96 h. Delamination occurred after 120 h. And (3) baking the film in hot air at 105 ℃ for 10 minutes to obtain a photosensitive film with abnormal photoetching, failure of the photosensitive polyimide film and no optical etching performance. (as in FIG. 9)
Comparative example 4
The ratio of high boiling point and low boiling point solvents compared to example 1 was from 3:2 to 1:3.
in a thousands of ultra clean room equipped with yellow light, 100g of polyimide resin, 50g of trimethylolpropane dimethacrylate (photo-crosslinking agent), 0.2g IRGACURE OXE03 (photo-initiator), 0.2g of hydroquinone (polymerization inhibitor), 70g of solvent (N-methylpyrrolidone: gamma-butyrolactone: ethyl lactate=2:1:9, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16 hours, and the resin was completely dissolved.
In a thousand-level ultra clean room equipped with yellow light, 50g of alumina, 100g of silica, 2g of KH570, 150g of solvent (N-methylpyrrolidone: gamma-butyrolactone: ethyl lactate=2:1:9, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16 hours to form a flowable slurry.
0.5g KS-66 was mixed with 20g solvent (N-methylpyrrolidone: γ -butyrolactone: ethyl lactate=2:1:9, mass ratio), and stirred in a beaker at a stirring speed of 180r/min for 3 hours.
The high-speed dispersing machine is started, the high-speed dispersing speed is 2000r/min, resin clear liquid, flowable slurry, dilution defoamer, 1g of fumed silica and 1.0g of BYK-361N are poured into the high-speed dispersing tank, and the high-speed dispersing time is 1.5h, so that the slurry which is uniformly dispersed is obtained.
And (3) carrying out vacuum defoaming on the slurry, wherein the vacuum degree is 0.1MPa, and the defoaming time is 0.5h, so as to obtain the photosensitive polyimide glue solution suitable for coating, and the viscosity of the test glue solution is 1338cps.
And coating and testing the obtained photosensitive polyimide glue solution.
A PET release film was used as a support film, with a thickness of 50. Mu.m.
Blade coating was used at a coating speed of 50mm/s and a coating thickness of 100. Mu.m. Baking in 80deg.C hot air for 5min.
And (3) attaching a 36-mu m PET protective film on the baked adhesive film by using the pressure of 0.2MPa to obtain the photosensitive adhesive film with a three-layer structure.
And (3) performing glue film detection: as a result, the thickness was found to be (. Mu.m), and the film thickness deviation was found to be within.+ -. 1. Mu.m. The results are shown in Table 15.
TABLE 15
0.039 | 0.040 | 0.040 |
0.040 | 0.039 | 0.041 |
0.040 | 0.041 | 0.040 |
Defective results are presented: defect-free. But the phenomenon of surface dryness occurs. The anti-sticking problem can occur after the adhesive film is placed at normal temperature.
5mL of the glue solution is placed in a 10mL sample bottle, and no sedimentation is observed for 24h, 48h, 72h and 96 h. Delamination occurred after 120 h.
From the comparison of example 1, comparative examples 3, 4, it is seen that when the high boiling point solvent: the ratio of low boiling point solvent is greater than 3:2, after the baking temperature is increased, the solvent causes the failure of the photosensitive adhesive film, and meanwhile, the phenomenon that the surface of the adhesive film also has a filler condensation point appears. When a high boiling point solvent: the ratio of low boiling point solvents is less than 1:2, the surface dry phenomenon is easy to occur, and the adhesive film is easy to have the anti-adhesion phenomenon at normal temperature. This is because the low boiling point solvent is easily volatilized, and the surface of the adhesive film is easily skinned, so that the solvent inside the adhesive film is not easily volatilized.
Comparative example 5
In contrast to example 1, the defoamer was replaced with BYK-054 which was free of silicon.
0.5g of BYK-054 was mixed with 20g of solvent (N-methylpyrrolidone: gamma-butyrolactone: ethyl lactate=2:1:2, mass ratio), and stirred in a beaker at a stirring speed of 180r/min for 3h.
The high-speed dispersing machine is started, the high-speed dispersing speed is 2000r/min, resin clear liquid, flowable slurry, dilution defoamer, 1g of fumed silica and 1.0g of BYK-361N are poured into the high-speed dispersing tank, and the high-speed dispersing time is 1.5h, so that the slurry which is uniformly dispersed is obtained.
And (3) carrying out vacuum defoaming on the slurry, wherein the vacuum degree is 0.1MPa, and the defoaming time is 0.5h, so as to obtain the photosensitive polyimide glue solution suitable for coating, and the viscosity of the test glue solution is 1097cps.
The obtained photosensitive polyimide glue solution is subjected to coating test.
A PET release film was used as a support film, with a thickness of 50. Mu.m.
Blade coating was used at a coating speed of 50mm/s and a coating thickness of 100. Mu.m. Baking in 80deg.C hot air for 10min.
And (3) attaching a 36-mu m PET protective film on the baked adhesive film by using the pressure of 0.2MPa to obtain the photosensitive adhesive film with a three-layer structure.
And (3) performing glue film detection: as a result, the thickness was found to be (. Mu.m), and the film thickness deviation was found to be within.+ -. 1. Mu.m. The results are shown in Table 16.
Table 16
0.039 | 0.040 | 0.039 |
0.040 | 0.041 | 0.040 |
0.040 | 0.041 | 0.039 |
Defective results are presented: there are bubbles and filler condensation points. (as shown in FIG. 10)
5mL of the glue solution is placed in a 10mL sample bottle, and the solution is observed for 24h, 48h,72h and 96h without sedimentation. Delamination occurred after 120 h.
Comparative example 6
In contrast to example 1, the leveling agent was replaced with BYK-399.
The high-speed dispersing machine is started, the high-speed dispersing speed is 2000r/min, resin clear liquid, flowable slurry, dilution defoamer, 1g of fumed silica and 1.0g of BYK-399 are poured into the high-speed dispersing tank, and the high-speed dispersing time is 1.5h, so that the slurry which is uniformly dispersed is obtained.
And (3) carrying out vacuum defoaming on the slurry, wherein the vacuum degree is 0.1MPa, and the defoaming time is 0.5h, so as to obtain the photosensitive polyimide glue solution suitable for coating, and the viscosity of the test glue solution is 1045cps.
The obtained photosensitive polyimide glue solution is subjected to coating test.
A PET release film was used as a support film, with a thickness of 50. Mu.m.
Blade coating was used at a coating speed of 50mm/s and a coating thickness of 100. Mu.m. Baking in 80deg.C hot air for 10min.
And (3) attaching a 50 mu m PP protective film on the baked adhesive film by using the pressure of 0.2MPa to obtain the photosensitive adhesive film with the three-layer structure.
And (3) performing glue film detection: as a result, the thickness was found to be (. Mu.m), and the film thickness deviation was found to be within.+ -. 1. Mu.m. The results are shown in Table 17.
TABLE 17
0.039 | 0.040 | 0.038 |
0.043 | 0.032 | 0.041 |
0.040 | 0.040 | 0.037 |
Defective results are presented: has vertical stripe defect.
5mL of the glue solution is placed in a 10mL sample bottle, and the solution is observed for 24h, 48h,72h and 96h without sedimentation. Delamination occurred after 120 h.
From a comparison of example 1, comparative examples 6 and 7, it is evident that other defoamers and leveling agents cause defects to the coated film surface.
Comparative example 7
In contrast to example 1, the filler content was increased to 80%.
200g of alumina, 400g of silica, 2.5g of KH570, 270g of solvent (N-methylpyrrolidone: gamma-butyrolactone: ethyl lactate=2:1:2, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16h in a thousands of ultra clean room equipped with yellow light, to form a flowable slurry.
0.5g KS-66 was mixed with 20g solvent (N-methylpyrrolidone: γ -butyrolactone: ethyl lactate=2:1:2, mass ratio), and stirred in a beaker at a stirring speed of 180r/min for 3 hours.
The high-speed dispersing machine is started, the high-speed dispersing speed is 2000r/min, resin clear liquid, flowable slurry, dilution defoamer, 1g of fumed silica and 1.0g of BYK-361N are poured into the high-speed dispersing tank, and the high-speed dispersing time is 1.5h, so that the slurry which is uniformly dispersed is obtained.
And (3) carrying out vacuum defoaming on the slurry, wherein the vacuum degree is 0.1MPa, and the defoaming time is 0.5h, so as to obtain the photosensitive polyimide glue solution suitable for coating, and the viscosity of the test glue solution is 819cps.
The obtained photosensitive polyimide glue solution is subjected to coating test.
A PET release film was used as a support film, with a thickness of 50. Mu.m.
Blade coating was used at a coating speed of 100mm/s and a coating thickness of 100. Mu.m. Baking in 80deg.C hot air for 5min.
And (3) attaching a 50 mu m PP protective film on the baked adhesive film by using the pressure of 0.2MPa to obtain the photosensitive adhesive film with the three-layer structure.
And (3) performing glue film detection: as a result, the thickness was found to be (. Mu.m), and the film thickness deviation was found to be within.+ -. 1. Mu.m. The results are shown in Table 18.
TABLE 18
0.040 | 0.040 | 0.039 |
0.039 | 0.038 | 0.038 |
0.040 | 0.039 | 0.039 |
Defective results are presented: the filler condensation point occurs.
5mL of the glue solution is taken and placed in a 10mL sample bottle, and no sedimentation is caused after 24h and 48h observation. Delamination occurred after 72 h.
Comparative example 8
In contrast to example 1, the filler content was reduced to 20%.
In a thousand-level ultra clean room equipped with yellow light, 12g of alumina, 25g of silica, 1.5g of KH570, and 100g of solvent (N-methylpyrrolidone: γ -butyrolactone: ethyl lactate=2:1:2, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16 hours to form a flowable slurry.
0.5g KS-66 was mixed with 20g solvent (N-methylpyrrolidone: γ -butyrolactone: ethyl lactate=2:1:2, mass ratio), and stirred in a beaker at a stirring speed of 180r/min for 3 hours.
The high-speed dispersing machine is started, the high-speed dispersing speed is 2000r/min, resin clear liquid, flowable slurry, diluting defoamer, 0.5g fumed silica and 1.0g BYK-361N are poured into the high-speed dispersing tank, and the high-speed dispersing time is 1.5h, so that the slurry which is uniformly dispersed is obtained.
And (3) carrying out vacuum defoaming on the slurry, wherein the vacuum degree is 0.1MPa, and the defoaming time is 0.5h, so as to obtain the photosensitive polyimide glue solution suitable for coating, and the viscosity of the test glue solution is 1067cps.
And coating and testing the obtained photosensitive polyimide glue solution.
A PET release film was used as a support film, with a thickness of 50. Mu.m.
Blade coating was used at a coating speed of 50mm/s and a coating thickness of 100. Mu.m. Baking in 80deg.C hot air for 15min.
And (3) attaching a 50 mu m PP protective film on the baked adhesive film by using the pressure of 0.2MPa to obtain the photosensitive adhesive film with the three-layer structure.
And (3) performing glue film detection: as a result, the thickness was found to be (. Mu.m), and the film thickness deviation was found to be within.+ -. 1. Mu.m. The results are shown in Table 19.
TABLE 19
0.040 | 0.040 | 0.039 |
0.039 | 0.038 | 0.038 |
0.040 | 0.039 | 0.039 |
Defective results are presented: defect-free.
5mL of the glue solution is placed in a 10mL sample bottle, and no sedimentation is observed for 24h, 48h, 72h, 96h, 120h and 144 h. Delamination occurred after 168 h.
However, the filler content of less than 30% affects other properties of the photosensitive paste after forming the adhesive film, and is not included in the scope of the present patent.
From comparison of comparative examples 8 and 9 in example 1, it is evident that when the filler content is more than 70%, the dispersibility of the filler is poor, resulting in defects of the condensation point of the filler after coating.
Comparative example 9
In contrast to example 1, no anti-settling agent was present.
The high-speed dispersing machine is started, the high-speed dispersing speed is 2000r/min, resin clear liquid, flowable slurry, dilution defoamer and 1.0g BYK-361N are poured into the high-speed dispersing tank, and the high-speed dispersing time is 1.5h, so that slurry with uniform dispersion is obtained.
And (3) carrying out vacuum defoaming on the slurry, wherein the vacuum degree is 0.1MPa, and the defoaming time is 0.5h, so as to obtain the photosensitive polyimide glue solution suitable for coating, and the viscosity of the test glue solution is 1085cps.
And coating and testing the obtained photosensitive polyimide glue solution.
A PET release film was used as a support film, with a thickness of 50. Mu.m.
Blade coating was used at a coating speed of 50mm/s and a coating thickness of 100. Mu.m. Baking in 80deg.C hot air for 10min.
And (3) attaching a 36-mu m PET protective film on the baked adhesive film by using the pressure of 0.2MPa to obtain the photosensitive adhesive film with a three-layer structure.
And (3) performing glue film detection: as a result, the thickness was found to be (. Mu.m), and the film thickness deviation was found to be within.+ -. 1. Mu.m. The results are shown in Table 20.
Table 20
0.039 | 0.040 | 0.039 |
0.040 | 0.041 | 0.040 |
0.040 | 0.041 | 0.039 |
Defective results are presented: defect-free.
5mL of the glue solution is put into a 10mL sample bottle, and layering occurs after 24 hours.
Comparative example 10
In contrast to example 1, no defoamer or leveling agent was added
In a thousands of ultra clean room equipped with yellow light, 100g of polyimide resin, 50g of trimethylolpropane trimethacrylate (photo-crosslinking agent), 0.2g IRGACURE OXE03 (photo-initiator), 0.2g of hydroquinone (polymerization inhibitor), 70g of solvent (N-methylpyrrolidone: gamma-butyrolactone: ethyl lactate=2:1:2, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16 hours, and the resin was completely dissolved.
In a thousand-level ultra clean room equipped with yellow light, 50g of alumina, 100g of silica, 2g of KH570, 150g of solvent (N-methylpyrrolidone: gamma-butyrolactone: ethyl lactate=2:1:2, mass ratio) were placed in a three-necked flask and stirred at a stirring speed of 100r/min for 16 hours to form a flowable slurry.
And (3) starting the high-speed dispersing machine, wherein the high-speed dispersing speed is 2000r/min, pouring resin clear liquid, flowable slurry and 1g of fumed silica into the high-speed dispersing tank, and the high-speed dispersing time is 1.5h, so as to obtain uniformly dispersed slurry.
And (3) carrying out vacuum defoaming on the slurry, wherein the vacuum degree is 0.1MPa, and the defoaming time is 0.5h, so as to obtain the photosensitive polyimide glue solution suitable for coating, and the viscosity of the test glue solution is 1207cps.
The obtained photosensitive polyimide glue solution is subjected to coating test.
A PET release film was used as a support film, with a thickness of 50. Mu.m.
Blade coating was used at a coating speed of 50mm/s and a coating thickness of 100. Mu.m. Baking in 80deg.C hot air for 10min.
And (3) attaching a 50 mu m PP protective film on the baked adhesive film by using the pressure of 0.2MPa to obtain the photosensitive adhesive film with the three-layer structure.
And (3) performing glue film detection: as a result, the thickness was found to be (. Mu.m), and the film thickness deviation was found to be within.+ -. 2. Mu.m. The results are shown in Table 21.
Table 21
0.038 | 0.040 | 0.039 |
0.040 | 0.042 | 0.040 |
0.040 | 0.041 | 0.039 |
Defective results are presented: has bubbles and vertical stripe defects.
5mL of the glue solution is taken and placed in a 10mL sample bottle, and no sedimentation is caused after 24h and 48h observation. Delamination occurred after 72 h.
From the comparison of comparative examples 10 and 11 in example 1, it is understood that an antifoaming agent and a leveling agent are required to help reduce or avoid defects on the surface of the adhesive film and to improve the uniformity of the film thickness.
The present invention is described in detail above. It will be apparent to those skilled in the art that the present invention can be practiced in a wide range of equivalent parameters, concentrations, and conditions without departing from the spirit and scope of the invention and without undue experimentation. While the invention has been described with respect to specific embodiments, it will be appreciated that the invention may be further modified. In general, this application is intended to cover any variations, uses, or adaptations of the invention following, in general, the principles of the invention and including such departures from the present disclosure as come within known or customary practice within the art to which the invention pertains. The application of some of the basic features may be done in accordance with the scope of the claims that follow.
Claims (13)
1. A photosensitive polyimide gum solution suitable for coating, characterized in that: the photosensitive polyimide glue solution is prepared from the following raw materials in parts by weight: the coating comprises alkaline water-soluble resin, a photo-crosslinking agent, a photoinitiator, a polymerization inhibitor, an inorganic filler, a dispersing agent, a defoaming agent, a leveling agent, an anti-settling agent and a solvent;
The weight portions of the components are as follows: 100 parts by mass of an alkaline water-soluble resin, 40-100 parts by mass of a photo-crosslinking agent, 0.1-0.5 part by mass of a photoinitiator, 0.1-5 parts by mass of a polymerization inhibitor, 60-467 parts by mass of an inorganic filler, 1-5 parts by mass of a dispersing agent, 0.05-1 part by mass of a defoaming agent, 0.01-1 part by mass of a leveling agent, 0.01-2 parts by mass of an anti-settling agent and 100-300 parts by mass of a solvent;
the alkaline water-soluble resin is alkaline water-soluble polyimide resin, and the molecular weight is 15000-35000.
2. The photosensitive polyimide dope suitable for coating according to claim 1, wherein: the viscosity of the photosensitive polyimide glue solution is controlled between 800 and 1550 cps.
3. The photosensitive polyimide dope suitable for coating according to claim 1 or 2, wherein: the alkaline water-soluble polyimide resin is prepared by the following steps:
(A) Adding diamine into an organic solvent, and stirring to dissolve the diamine to form a homogeneous diamine solution;
(B) Adding dianhydride and a molecular weight regulator into the homogeneous diamine solution formed in the step (A);
(C) Adding toluene into the reaction system of the step (B), and heating and refluxing to obtain a resin solution;
(D) Mixing the resin solution with a poor solvent to precipitate solid resin; washing and drying the solid resin to obtain alkaline water-soluble polyimide resin;
in the step (A), the diamine is diamine containing hydroxyl;
in the step (B), the dianhydride may be selected from: at least one of hexafluorodianhydride, 3', 4' -benzophenone tetracarboxylic dianhydride, bisphenol a dianhydride, 4' -biphenyl ether dianhydride, diphenyl sulfide dianhydride, 3', 4' -biphenyl tetracarboxylic dianhydride, 2,3',3,4' -biphenyl tetracarboxylic dianhydride, pyromellitic anhydride, bicyclo [2.2.2] oct-7-ene-2, 3,5, 6-tetracarboxylic dianhydride, 1,2,3, 4-cyclopentanetetracarboxylic dianhydride;
in the step (B), the molecular weight regulator is phthalic anhydride.
4. A photosensitive polyimide gum solution suitable for coating according to claim 3, characterized in that:
the diamine containing hydroxyl groups is selected from: at least one of 2, 2-bis (3-amino-4-hydroxyphenyl) hexafluoropropane (6 FAP), 2-bis (3-amino-4-hydroxyphenyl) propane, 3' -dihydroxybenzidine, and an aromatic diamine having the structural formula shown below:
5. the photosensitive polyimide dope suitable for coating according to claim 1 or 2, wherein: the photocrosslinking agent is selected from: at least one of 2-hydroxymethyl methacrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, 2-hydroxybutyl methacrylate, 2-hydroxymethyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 2-hydroxybutyl acrylate, glycidyl methacrylate, ethylene glycol diethyl ether acrylate and polyethylene glycol methacrylate, ethoxylated trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, tris (2-hydroxyethyl) isocyanurate triacrylate and tricyclic sunflower dimethanol diacrylate;
Or, the photoinitiator is selected from: at least one of IRGACURE OXE01, IRGACURE OXE02, IRGACURE OXE 03;
or, the polymerization inhibitor is selected from: at least one of hydroquinone, 4-methoxyphenol, N-nitrosodiphenylamine, p-t-butylcatechol, phenothiazine, N-phenylnaphthylamine, 2, 6-di-t-butyl-p-methylphenol, 5-nitroso-8-hydroxyquinoline, 1-nitroso-2-naphthol, 2-nitroso-1-naphthol, and 2-nitroso-5- (N-ethyl-sulfopropylamino) phenol;
or, the inorganic filler is selected from: at least one of silica, mica powder, alumina and yttria;
or the dispersing agent is a silane coupling agent which does not contain free amino and sulfhydryl groups;
or, the defoamer: an organosilicon defoamer which cannot contain free amine groups and mercapto groups;
or, the leveling agent: the acrylic leveling agent cannot contain free amino and mercapto;
or, the anti-settling agent: free amine and thiol groups cannot be contained.
6. The photosensitive polyimide gum solution suitable for coating according to claim 5, wherein:
the dispersing agent is KH570 with double bond;
or, the defoaming agent is at least one of KS-603 defoaming agent and KS-66 defoaming agent;
Or, the leveling agent is at least one of BYK-354 and BYK-361N;
or, the anti-settling agent is fumed silica.
7. The photosensitive polyimide dope suitable for coating according to claim 1 or 2, wherein: the inorganic filler accounts for 30-70% of the mass of the total solids in the photosensitive polyimide glue solution.
8. The photosensitive polyimide dope suitable for coating according to claim 1 or 2, wherein: the solvent consists of a high boiling point solvent and a low boiling point solvent; the mass ratio of the high-boiling point solvent to the low-boiling point solvent is 3:2-1: 2.
9. The photosensitive polyimide glue solution suitable for coating according to claim 8, wherein: the high boiling point solvent is selected from: one or two of N-methyl pyrrolidone and gamma-butyrolactone;
the low boiling point solvent is selected from: one or a mixture of several of N, N' -dimethylformamide, ethyl lactate, propylene glycol methyl ether acetate, cyclopentanone, tetrahydrofuran, ethyl acetate and butyl acetate.
10. A process for preparing a photosensitive polyimide gum solution suitable for coating as claimed in any one of claims 1 to 9, comprising the steps of:
(a) Mixing and stirring alkaline water-soluble resin, a photo-crosslinking agent, a photo-initiator, a polymerization inhibitor and part of solvent, and keeping the resin for later use after the resin is dissolved;
(b) Mixing and stirring inorganic filler, dispersing agent and part of solvent, and forming flowable slurry for later use;
(c) Mixing and stirring the defoaming agent and the residual solvent, and standing by after a uniform solution is formed;
(d) Dispersing the clear resin liquid in the step (a) into the slurry formed in the step (b) at a high speed, and respectively adding an anti-settling agent, a defoaming agent diluted in the step (c) and a leveling agent to obtain uniformly dispersed slurry;
(f) And carrying out vacuum defoaming on the slurry to obtain the photosensitive polyimide glue solution suitable for coating.
11. A method of coating a photosensitive polyimide gum solution suitable for coating as claimed in any one of claims 1 to 9, comprising the steps of:
(1) Coating: applying the photosensitive polyimide dope suitable for coating as claimed in any one of claims 1 to 9 to a surface of a support film;
(2) Pre-baking: baking the photosensitive polyimide glue solution coated on the surface of the support film to form a photosensitive solid glue film with the support film;
(3) And (3) laminating a protective film: and (3) attaching the protective film to the photosensitive solid film with the support film to obtain the negative photosensitive solid film subjected to alkaline water development.
12. The coating method according to claim 11, characterized in that: in the step (1), the thickness of the support film is 25-100 μm;
or, in the step (1), the coating method is selected from at least one of the following: blade coating, slot coating, gravure coating, screen printing;
or, in the step (1), the coating speed of the coating is 1-100mm/s;
or, in the step (2), the baking conditions are as follows: baking for 1-60 min at 80-100 ℃ by hot plate or hot air;
or, in the step (3), the protective film is selected from PE, PP or PET materials;
or the thickness of the protective film is 25-50 mu m,
or, the attaching of the protective film is carried out at 70-90 ℃; the laminating pressure of the protective film is 0.1-0.5 MPa.
13. The negative photosensitive solid adhesive film of alkaline aqueous development prepared by the coating method of claim 11 or 12.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202311780786.9A CN117701233B (en) | 2023-12-22 | 2023-12-22 | Photosensitive polyimide glue solution suitable for coating and coating method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202311780786.9A CN117701233B (en) | 2023-12-22 | 2023-12-22 | Photosensitive polyimide glue solution suitable for coating and coating method thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
CN117701233A true CN117701233A (en) | 2024-03-15 |
CN117701233B CN117701233B (en) | 2024-08-02 |
Family
ID=90144125
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202311780786.9A Active CN117701233B (en) | 2023-12-22 | 2023-12-22 | Photosensitive polyimide glue solution suitable for coating and coating method thereof |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN117701233B (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101068852A (en) * | 2004-12-16 | 2007-11-07 | 日本化药株式会社 | Unsaturated group-containing polyimide resin, photosensitive resin composition containing same, and cured product thereof |
CN101466777A (en) * | 2006-07-11 | 2009-06-24 | 日本化药株式会社 | Photosensitive, aqueous alkaline solution-soluble polyimide resin and photosensitive resin composition containing the same |
JP2012212003A (en) * | 2011-03-31 | 2012-11-01 | Nippon Kayaku Co Ltd | Photosensitive resin composition |
CN104854508A (en) * | 2012-12-20 | 2015-08-19 | 东丽株式会社 | Photosensitive resin composition, method for producing heat-resistant resin film and display device |
CN115407610A (en) * | 2022-11-03 | 2022-11-29 | 明士(北京)新材料开发有限公司 | Photosensitive resin composition and preparation method and application thereof |
-
2023
- 2023-12-22 CN CN202311780786.9A patent/CN117701233B/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101068852A (en) * | 2004-12-16 | 2007-11-07 | 日本化药株式会社 | Unsaturated group-containing polyimide resin, photosensitive resin composition containing same, and cured product thereof |
CN101466777A (en) * | 2006-07-11 | 2009-06-24 | 日本化药株式会社 | Photosensitive, aqueous alkaline solution-soluble polyimide resin and photosensitive resin composition containing the same |
JP2012212003A (en) * | 2011-03-31 | 2012-11-01 | Nippon Kayaku Co Ltd | Photosensitive resin composition |
CN104854508A (en) * | 2012-12-20 | 2015-08-19 | 东丽株式会社 | Photosensitive resin composition, method for producing heat-resistant resin film and display device |
CN115407610A (en) * | 2022-11-03 | 2022-11-29 | 明士(北京)新材料开发有限公司 | Photosensitive resin composition and preparation method and application thereof |
Also Published As
Publication number | Publication date |
---|---|
CN117701233B (en) | 2024-08-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN110903700B (en) | Photovoltaic ink composition and patterned transparent packaging backboard for ink-jet printing process | |
TWI534529B (en) | Photosensitive resin composition and its application | |
DE102011012242A1 (en) | Polyimide resin composition for semiconductor devices, method of forming film in semiconductor devices using the same and semiconductor devices | |
CN110144140B (en) | Mixed photocuring ink-jet ink composition suitable for LED photocuring and mixer | |
CN115407610B (en) | Photosensitive resin composition, preparation method and application thereof | |
CN101290473A (en) | Photosensitive resin composition and method of making the same | |
CN110698670A (en) | Carborane modified polyimide film and preparation method thereof | |
CN101807001A (en) | Photosensitive resin composition and application thereof | |
CN114280887A (en) | Negative photosensitive solid glue film developed by alkaline water system and preparation method thereof | |
CN117701233B (en) | Photosensitive polyimide glue solution suitable for coating and coating method thereof | |
JP2010189631A (en) | Inkjet ink | |
JP5367809B2 (en) | Photosensitive resin composition and cured film | |
CN116333303B (en) | Anti-mould-pressing alkaline aqueous development photosensitive adhesive film and application thereof | |
CN112500570B (en) | Flexible display device, polyamic acid varnish for display, and polyimide film | |
CN104992998B (en) | Heat conduction backboard for crystalline silicon assembly, and preparation method thereof | |
CN112574411B (en) | Polyimide precursor, polyimide film, preparation method of polyimide film and display device | |
KR102537045B1 (en) | Laser-debondable composition, laminate thereof, and laser-debonding method | |
JP2022044020A (en) | Polyamide acid, polyamide acid solution, polyimide, polyimide film, laminate and flexible device, and method for producing polyimide film | |
CN115236938B (en) | Negative photosensitive polyamic acid ester resin composition and use thereof | |
CN116577965A (en) | Negative photosensitive solid adhesive film and preparation method thereof | |
CN117210141B (en) | Development-resistant photosensitive adhesive film and preparation and application thereof | |
CN110283344B (en) | Preparation method of photocuring crosslinked polyimide film | |
CN106634644A (en) | Preparation method of refractivity-adjustable macromolecular bonding film | |
CN117555204B (en) | Negative photosensitive polyimide glue solution and glue film suitable for flexible circuit board | |
CN116589900B (en) | High-temperature-resistant water-based insulating paint and preparation method thereof |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |